JP5672628B2 - Method for manufacturing transfer foil and labeled article, and laminate - Google Patents

Description

  The present invention relates to a transfer foil, a method for manufacturing a labeled article, and a laminate that can be used for manufacturing a transfer foil.

  Conventionally, various thermal transfer media are known. Examples of the thermal transfer medium include a thermal transfer ribbon that transfers a thermoplastic resin such as wax, and a sublimation transfer ribbon that sublimates and transfers a sublimable dye. Such a thermal transfer medium generally includes a base film having a thickness of about 4 μm to 6 μm.

  A hologram transfer foil such as a hologram transfer ribbon is also known as a thermal transfer medium. This hologram transfer foil has a configuration in which a base film, a release layer, a hologram forming layer, a reflective layer, and an adhesive layer are laminated in this order. An uneven structure such as a relief hologram, a diffraction grating, and a scattering structure is formed on the main surface of the hologram forming layer on the reflection layer side. In this hologram transfer foil, an arbitrary pattern is transferred as a collection of fine dots, for example, using a thermal transfer means such as a thermal head.

  When transferring from the hologram transfer foil to the transfer target, high resolution is required. Further, the display body transferred from the transfer foil to the transfer target body is required to have strong adhesion with the transfer target body.

  However, the hologram transfer foil is composed of a number of layers as described above. Therefore, the hologram transfer foil has a relatively large film thickness. Therefore, in order to satisfy the above requirements, it is necessary to make the base film as thin as possible and to transfer heat from the thermal transfer means to the adhesive layer with high efficiency.

Japanese Patent Laid-Open No. 4-281589 JP 2007-118563 A

  An object of the present invention is to provide a technique for producing a transfer foil having high quality with a high yield.

According to the first aspect of the present invention, the first support layer, the second support layer that is releasably supported on one main surface of the first support layer, and the other main main layer of the first support layer. and providing a laminate comprising a resin layer peelably supported on the surface, to at least a portion of the surface of the tree fat layer side of the product Sotai, and the embossing, et Nbosu after machining, a method for producing a transfer foil comprising a peeling the product layer body or we second support layer laminate, between the first support layer and the second backing layer And a release layer and a laminate layer facing the first support layer with the release layer interposed therebetween, and the laminate further includes a release layer between the first support layer and the resin layer. , Forming a reflective layer on at least part of the embossed portion of the resin layer, and heat-sensitive adhesion facing the resin layer with the reflective layer in between Method for producing a transfer foil and was further comprises forming a is provided.

  According to the 2nd side surface of this invention, the manufacturing method of the labeled article which comprises carrying out thermal transfer of the transfer foil manufactured by the method which concerns on a 1st side surface to a to-be-transferred body is provided.

According to the third aspect of the present invention, there is provided a laminate obtained by the transfer foil manufacturing method according to the first aspect, and the first support layer and the first support layer can be peeled on one main surface. A supported second support layer , a resin layer supported releasably on the other main surface of the first support layer, and embossed on at least a portion of the one main surface ; A release layer provided between the first support layer and the second support layer, a laminate layer provided facing the first support layer with the release layer interposed therebetween, and a first support layer, A release layer provided between the resin layer, a reflective layer provided on at least a part of the embossed portion of the resin layer, and a resin layer facing the resin layer A laminate comprising the heat-sensitive adhesive layer thus provided is provided.

  According to the present invention, a technique for producing a transfer foil having high quality with high yield is provided.

Sectional drawing which shows an example of the laminated body used for the manufacturing method of the transfer foil which concerns on 1 aspect of this invention. FIG. 10 is a cross-sectional view illustrating one step of a method according to one embodiment of the present invention. FIG. 10 is a cross-sectional view illustrating another step of the method according to one embodiment of the present invention. FIG. 10 is a cross-sectional view illustrating another step of the method according to one embodiment of the present invention. Sectional drawing which shows an example of the transfer foil manufactured by the method which concerns on 1 aspect of this invention. Sectional drawing which shows the other example of the transfer foil manufactured by the method which concerns on 1 aspect of this invention. Sectional drawing which shows an example of the labeled article manufactured by the method which concerns on 1 aspect of this invention.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, in each figure, the same referential mark is attached | subjected to the component which exhibits the same or similar function, and the overlapping description is abbreviate | omitted.

First, a method for manufacturing a transfer foil according to one embodiment of the present invention will be described.
FIG. 1 is a cross-sectional view illustrating an example of a laminate used in a method for manufacturing a transfer foil according to one embodiment of the present invention. A laminated body 100 shown in FIG. 1 includes a first support layer 10, a second support layer 20, a release layer 30, a laminate layer 40, a resin layer 50, and a release layer 60. Hereinafter, each of these layers will be described in order.

(First support layer)
The 1st support body layer 10 functions as a base material for supporting the display body 210 so that peeling is possible in the transfer foil 200 mentioned later.

  The first support layer 10 is made of, for example, a film or a sheet. Examples of the material of the first support layer 10 include polyester resins, polyamide resins, polyolefin resins, vinyl resins, acrylic resins, imide resins, and styrene resins. Further, a cellulose film may be used as the first support layer 10. The material of the first support layer 10 is preferably a polyester resin, and more preferably polyethylene terephthalate.

  The thickness of the first support layer 10 is preferably in the range of 2.5 μm to 12 μm, more preferably in the range of 2.5 μm to 9.0 μm, and still more preferably in the range of 2.5 μm to 4.0 μm. And If this thickness is excessively large, thermal diffusion from the thermal transfer means to the transfer foil 200 is difficult to occur. Therefore, the transfer efficiency of the transfer foil 200 is reduced. On the other hand, if the thickness is excessively small, the mechanical strength during transfer is weakened.

(Second support layer)
The second support layer 20 is detachably formed on one main surface of the first support layer 10. When the second support layer 20 is provided, the transfer foil 200 having high quality can be manufactured with high yield, as will be described in detail later.

  The second support layer 20 is made of, for example, a film or a sheet. As a material of the 2nd support body layer 20, the thing similar to having demonstrated previously as a material of the 1st support body layer 10 can be used, for example. The material of the second support layer 20 is preferably a polyester-based resin, and more preferably polyethylene terephthalate-polybutylene terephthalate-polyethylene naphthalate or polyethylene terephthalate. When such a configuration is employed, the heat resistance and mechanical strength of the second support layer 20 are particularly increased.

  The thickness of the second support layer 20 is preferably in the range of 12 μm to 50 μm, more preferably in the range of 16 μm to 25 μm. If this thickness is excessively small, the effect of the second support layer 20 in the manufacturing process described later is reduced. If this thickness is excessively large, the manufacturing cost of the transfer foil 200 increases. The thickness of the second support layer 20 may be larger than the thickness of the first support layer 10, may be equal to the thickness of the first support layer 10, or smaller than the thickness of the first support layer 10. May be.

(Release layer)
The release layer 30 is provided between the first support layer 10 and the second support layer 20. The release layer 30 is in contact with the main surface of the first support layer 10 facing the second support layer 20. The release layer 30 plays a role of supporting the second support layer 20 on the first support layer 10 so as to be peelable together with a laminate layer 40 described later. In addition, as a material of the release layer 30, a well-known thing can be used.

(Laminate layer)
The laminate layer 40 faces the first support layer 10 between the first support layer 10 and the second support layer 20 with the release layer 30 interposed therebetween. The laminate layer 40 is in contact with the main surface of the second support layer 20 facing the first support layer 10. The laminate layer 40 plays a role of detachably supporting the second support layer 20 on the first support layer 10 together with the release layer 30 described above.

  As a material of the laminate layer 40, for example, an adhesive for dry lamination can be used. As a material of the laminate layer 40, it is preferable to use a material having high hardness in order to increase the strength of the laminate 100 in the manufacturing process described later. For the same reason, when a reactive adhesive is used as the material of the laminate layer 40, it is preferable to sufficiently cure it.

  The release layer 30 and the laminate layer 40 described above are formed as follows, for example. In the first method, the release layer 30 and the laminate layer 40 are laminated in this order on one main surface of the first support layer 10. Thereafter, the surface on the laminate layer 40 side of the obtained laminate and one main surface of the second support layer 20 are bonded together. In the second method, the release layer 30 is provided on one main surface of the first support layer 10, and the laminate layer 40 is provided on one main surface of the second support layer 20. Then, these are bonded together.

  In the above description, the configuration using the release layer 30 and the laminate layer 40 to support the second support layer 20 in a peelable manner on the first support layer 10 has been described. The means for releasably supporting the second support layer 20 on the top is not limited thereto.

(Resin layer)
The resin layer 50 is detachably supported on the other main surface of the first support layer 10. The resin layer 50 is embossed as will be described later.

  Examples of the material of the resin layer 50 include a thermoplastic resin, a thermosetting resin, and a radiation curable resin described later. The resin layer 50 may contain a dye or a pigment. In this way, a colored resin layer 50 is obtained.

  The thickness of the resin layer 50 is preferably in the range of 0.3 μm to 3.0 μm, more preferably in the range of 0.3 μm to 2.0 μm. In this way, the foil breakage of the transfer foil 200 is improved.

  The resin layer 50 is formed using, for example, a general printing method. Alternatively, the resin layer 50 may be formed using a coating method such as gravure coating, micro gravure coating, roll coating, kiss coating, die coating, and comma coating.

(Peeling layer)
The release layer 60 is provided between the first support layer 10 and the resin layer 50. The release layer 60 plays a role of allowing the first support layer 50 to be peeled off when transferring from the transfer foil 200.

  As the material of the release layer 60, a known material can be used. In order to improve the peeling performance, a release layer may be further provided between the first support layer 10 and the peeling layer 60.

  In addition, although the structure using the peeling layer 60 was employ | adopted in order to support the resin layer 50 on the 1st support body layer 10 so that peeling is possible, the resin layer 50 can be peeled on the 1st support body layer 10 above. The means to support is not limited to this. For example, the peelable resin layer 50 may be directly provided on the first support layer 10 by using a resin layer 50 having a peelability.

  The laminated body 100 shown in FIG. 1 is used for manufacturing the transfer foil 200 as described above. If the laminated body 100 shown in FIG. 1 is used, it becomes possible to manufacture the transfer foil 200 having high quality with a high yield, as will be described in detail later.

  FIG. 2 is a cross-sectional view illustrating one step of the method according to one embodiment of the present invention. FIG. 3 is a cross-sectional view illustrating another step of the method according to one embodiment of the present invention. FIG. 4 is a cross-sectional view illustrating another step of the method according to one embodiment of the present invention.

  In the process illustrated in FIG. 2, embossing is performed on at least a part of the surface of the laminate 100 on the resin layer 50 side. Thereby, a relief structure is formed on one main surface of the resin layer 50.

  This embossing can be performed, for example, by pressing a mold provided with fine convex portions against the resin layer 50.

  More specifically, for example, the original plate is pressed against the resin layer 50 containing a thermoplastic resin while applying heat. In this case, as the thermoplastic resin, for example, an acrylic resin, an epoxy resin, a cellulose resin, a vinyl resin, a mixture thereof, or a copolymer thereof is used.

  Alternatively, the embossing may be performed by a method in which heat is applied to the resin layer 50 containing a thermosetting resin while the original is pressed, and then the original is removed. In this case, as the thermosetting resin, for example, a urethane resin, a melamine resin, an epoxy resin, a phenol resin, a mixture thereof, or a copolymer thereof is used. In addition, this urethane resin is obtained, for example, by adding polyisocyanate as a crosslinking agent to acrylic polyol and polyester polyol having a reactive hydroxyl group and crosslinking them.

  Alternatively, this embossing may be performed by a method in which the material is cured by irradiating the resin layer 50 containing a radiation curable resin with radiation such as ultraviolet rays while the original is pressed, and then the original is removed. The radiation curable resin typically contains a polymerizable compound and an initiator.

  The original plate used for embossing is manufactured using, for example, an electron beam drawing apparatus. If it carries out like this, embossing can be formed with high precision. Usually, a reverse plate is manufactured by transferring the concavo-convex structure of the original plate, and a duplicate plate is manufactured by transferring the concavo-convex structure of the reverse plate. Then, if necessary, a reversal plate is manufactured using the copy plate as an original plate, and the concavo-convex structure of the reverse plate is transferred to further manufacture a copy plate. In actual production, a copy obtained in this way is usually used.

  As a relief structure formed by said embossing, the structure which exhibits functions, such as light diffusion, light scattering, light reflection, and light diffraction, is mentioned, for example. Alternatively, the relief structure may constitute a hairline pattern, a mat pattern, a line pattern, an interference pattern, or a satin pattern that expresses a unique glitter. Examples of the relief structure having light diffractive properties include a hologram or diffraction grating in which interference fringes due to light interference between object light and reference light are recorded in a concavo-convex pattern.

  The relief structure includes, for example, a plurality of concave portions or convex portions arranged one-dimensionally or two-dimensionally. The minimum distance between the centers of the plurality of concave portions or convex portions is preferably in the range of 0.2 μm to 10 μm, and more preferably in the range of 0.5 μm to 2.0 μm.

  In the conventional transfer foil manufacturing method, the embossing is performed on a laminate that does not include the second support layer 20. The present inventors have found that the following problems can occur in this case. That is, in this case, expansion and contraction of the base film (corresponding to the first support layer 10 in the laminate 100) is likely to occur due to the embossing. As a result, generation of wrinkles in the base film, distortion of the image expressed by the relief structure, destruction of the laminate, and the like can occur. Therefore, in this case, the quality and / or yield of the transfer foil is relatively low. In addition, said problem becomes so remarkable that the thickness of a base film is small.

  On the other hand, the laminate 100 described above further includes the second support layer 20. Therefore, the film thickness and strength of the laminate 100 are larger than when the second support layer 20 is omitted. In addition, by providing the second support layer 20, the generation of wrinkles in the first support layer 10 can be suppressed. Therefore, even if it is a case where said embossing is performed, the problem mentioned above does not arise easily. Therefore, the quality and yield of the transfer foil 200 can be improved by adopting the above configuration.

  In the process shown in FIG. 3, the reflective layer 70 is formed on at least a part of the embossed portion of the resin layer 50.

  The reflective layer 70 plays a role of improving the visibility of the optical effect based on the relief structure, for example. Further, by providing this reflective layer 70, it becomes possible to provide a heat-sensitive adhesive layer 80 described later without reducing the visibility.

  The reflective layer 70 is, for example, a transparent thin film layer or an opaque metal thin film layer. Examples of the material of the reflective layer 70 include aluminum, tin, zinc sulfide, and titanium dioxide.

  The reflective layer 70 is formed by vapor deposition or sputtering of a metal material, for example. Alternatively, the reflective layer 70 may be formed by printing using an ink containing metal fine particles. Examples of the printing method include general methods such as gravure printing, flexographic printing, screen printing, and offset printing.

  In the case where the reflective layer 70 is partially provided, for example, the following method can be employed. That is, for example, a mask is used in the above-described vapor deposition or sputtering. Alternatively, pattern printing may be performed by the above printing method. Alternatively, once the reflective material is formed on the entire surface, a part thereof may be removed. In this case, for example, it is possible to employ a method of using washing ink as a reflective material and removing unnecessary portions by washing with water. Alternatively, in this case, an etching method through a mask and a laser processing method can also be employed. Note that the step shown in FIG. 3 may be omitted.

  In the step shown in FIG. 4, the second support layer 20 is peeled from the first support layer 10 together with the release layer 30 and the laminate layer 40. Thereby, the transfer foil 200 shown in FIG. 4 is obtained.

  As described above, in the stacked body 100, the second support layer 20 is provided so as to be peelable from the first support layer 10. Therefore, the transfer foil 200 without the second support layer 20 can be manufactured by peeling the second support layer 20.

  The transfer foil 200 shown in FIG. 4 has a configuration in which the second support layer 20, the release layer 30, and the laminate layer 40 are removed from the laminate 100 shown in FIG. Therefore, the thickness of the transfer foil 200 is equal to the thickness of the transfer foil manufactured by the conventional method. Therefore, the transfer foil 200 can exhibit excellent thermal transfer characteristics.

  Moreover, if the laminated body 100 provided with the 2nd support body layer 20 is used, it will also become possible to make the thickness of the 1st support body layer 10 small, without reducing the quality and yield of the transfer foil 200. In this case, the thickness of the transfer foil 200 can be made smaller than the thickness of the transfer foil manufactured by the conventional method. Therefore, in this case, it is possible to manufacture the transfer foil 200 having further excellent thermal transfer characteristics.

  The transfer foil 200 includes a display body 210 including a resin layer 50 and a reflective layer 70. The transfer foil 200 has a function of transferring the display body 210 to the transfer target. The transfer foil 200 is typically a transfer ribbon.

  FIG. 5 is a cross-sectional view illustrating an example of a transfer foil manufactured by the method according to an aspect of the present invention. The transfer foil 200 shown in FIG. 5 is the same as the transfer foil shown in FIG. 4 except that the transfer foil 200 further includes a heat-sensitive adhesive layer 80 facing the first support layer 10 with the display body 210 interposed therebetween. It has a configuration.

  As a material of the heat-sensitive adhesive layer 80, a known material can be used. The thickness of the heat-sensitive adhesive layer 80 is preferably in the range of 0.3 μm to 2.0 μm, more preferably in the range of 0.3 μm to 1.0 μm. In this way, it is possible to obtain a transfer foil 200 that has high adhesion to the transfer target and is excellent in foil breakage during transfer.

  The heat-sensitive adhesive layer 80 can be formed, for example, by the same coating method as described for the resin layer 50 previously. The heat-sensitive adhesive layer 80 may be formed after the process described with reference to FIG. 4 or may be formed before the above process.

  An adhesive anchor layer may be further provided between the display body 210 and the heat-sensitive adhesive layer 80. As a result, the adhesion between the display body 210 and the heat-sensitive adhesive layer 80 is further improved.

  FIG. 6 is a cross-sectional view illustrating another example of a transfer foil manufactured by the method according to one embodiment of the present invention. The transfer foil 200 shown in FIG. 6 is the same as the transfer foil shown in FIG. 5 except that the transfer foil 200 further includes an anti-sticking layer 90 facing the display body 210 with the first support layer 10 interposed therebetween. It has a configuration.

  The anti-sticking layer 90 includes a heat-resistant thermoplastic resin binder and a thermal release agent or a lubricant. Examples of the heat-resistant thermoplastic resin binder include acrylic resin, polyester resin, polyimide resin, polyamide resin, and polyamideimide resin. Examples of the thermal release agent or lubricant include waxes such as polyethylene wax and paraffin wax, fluororesin, and inorganic substance powder.

  The thickness of the anti-sticking layer 90 is preferably in the range of 0.01 μm to 1.0 μm, more preferably in the range of 0.1 μm to 0.4 μm. The anti-sticking layer 90 can be formed, for example, by the same coating method as described for the resin layer 50 above.

  FIG. 7 is a cross-sectional view illustrating an example of a labeled article manufactured by the method according to one embodiment of the present invention. The labeled article 300 shown in FIG. 7 includes a display body 210, a transfer target 301, and a heat-sensitive adhesive layer 80 interposed therebetween.

  The labeled article shown in FIG. 7 is manufactured by thermally transferring the transfer foil 200 described above to the transfer target 301. This thermal transfer is performed, for example, using a thermal transfer means such as a thermal printer. In the transfer foil 200, as described above, the thickness of the first support layer 10 can be particularly reduced. In this case, the transfer efficiency of the display body 210 from the transfer foil 200 to the transfer target 301 can be particularly increased.

  There are no particular restrictions on the type of labeled article 300 and the type of transfer target 301 corresponding thereto. For example, the labeled article 300 may be a medium including individual information such as a passport, a visa, an ID (identification) card, and a certificate. Alternatively, the labeled article 300 may be a product or its packaging.

(Example 1)
The transfer foil 200 shown in FIG. 6 was manufactured as follows.
First, a polyethylene terephthalate film having a thickness of 3 μm was prepared as the first support layer 10. Next, a release layer 30 was formed on one main surface of the film by gravure coating. The thickness of the release layer 30 was 0.4 μm.

  Next, a polyethylene terephthalate film having a film thickness of 25 μm was prepared as the second support layer 20. Next, a laminate layer 40 was formed on one main surface of this film by gravure coating. The film thickness of the laminate layer 40 was 4 μm.

  Then, the 1st support body layer 10 and the 2nd support body layer 20 faced each other so that the mold release layer 30 and the lamination layer 40 might mutually contact, and the thermal lamination process was performed. Thus, the laminated body which the 1st support body layer 10, the mold release layer 30, the laminate layer 40, and the 2nd support body layer 20 laminated | stacked in this order was obtained.

  Next, the peeling layer 60 and the resin layer 50 were formed on the main surface of the laminate on the first support layer 10 side by gravure coating. The film thicknesses of the release layer 60 and the resin layer 50 were both 0.6 μm. As described above, the laminate 100 shown in FIG. 1 was obtained.

  The surface on the resin layer 50 side of the obtained laminate 100 was subjected to hot press treatment using a roll embossing device. Thereby, a relief structure capable of displaying a hologram image was formed on the resin layer 50.

  Subsequently, aluminum was deposited on the main surface including the relief structure of the resin layer 50 to form the reflective layer 70. The thickness of the reflective layer 70 was 50 nm.

  Next, a heat-sensitive adhesive layer 80 was formed on the reflective layer 70 by gravure coating. The film thickness of the heat-sensitive adhesive layer 80 was 0.5 μm.

  Next, the second support layer 20 was peeled from the first support layer 10 together with the laminate layer 40 and the release layer 30. Thus, the transfer foil 200 shown in FIG. 5 was obtained.

  Thereafter, an anti-sticking layer 90 was formed on the first support layer 10 by gravure coating. The film thickness of the anti-sticking layer 90 was 0.4 μm.

  As described above, the transfer foil 200 shown in FIG. 6 was obtained. The film thickness of this transfer foil 200 was 5 μm.

  As described above, in the transfer foil 200 thus obtained, the thickness of the first support layer 10 is 3 μm, and the total thickness is 5 μm. The transfer foil 200 has a smaller film thickness than a conventional general hologram transfer foil. Nevertheless, according to the method described above, such a transfer foil 200 could be produced in a high yield without causing problems such as distortion, wrinkles, and breakage during handling. That is, according to the method described above, it was found that the transfer foil 200 having high quality can be manufactured with high yield.

(Example 2)
Subsequently, thermal transfer was performed using the transfer foil 200 obtained in Example 1. A white card made of vinyl chloride was used as the transfer target. A thermal head was used as the thermal transfer means. As this thermal head, one having a resolution of 600 dpi was used.

  In the above configuration, independent dots were transferred from the transfer foil 200 to the transfer target. As a result, the reproducibility of the transferred dots was good. Further, no sticking between the thermal head and the transfer foil 200 occurred during thermal transfer. In addition, no chipping or pinholes were found in the transferred portion. That is, it was found that the transfer foil 200 has good thermal transfer characteristics.

  DESCRIPTION OF SYMBOLS 10 ... 1st support body layer, 20 ... 2nd support body layer, 30 ... Release layer, 40 ... Laminate layer, 50 ... Resin layer, 60 ... Release layer, 70 ... Reflective layer, 80 ... Thermal adhesive layer, 90 ... Anti-sticking layer, 100 ... laminate, 200 ... transfer foil, 210 ... display body, 300 ... article with label, 301 ... transferred body.

Claims (6)

A first support layer, a second support layer releasably supported on one main surface of the first support layer, and a releasable support on the other main surface of the first support layer Preparing a laminate including a resin layer formed;
Embossing at least part of the surface of the laminate on the resin layer side;
After said embossing a method for producing a transfer foil comprising a peeling the second support layer from the laminate,
The laminate includes a release layer between the first support layer and the second support layer, and a laminate layer facing the first support layer with the release layer interposed therebetween. In addition,
The laminate further includes a release layer between the first support layer and the resin layer,
Forming a reflective layer on at least a part of the embossed portion of the resin layer;
A method for producing a transfer foil, further comprising forming a heat-sensitive adhesive layer facing the resin layer with the reflective layer interposed therebetween. The method for producing a transfer foil according to claim 1, wherein the thickness of the first support layer is in the range of 2.5 μm to 12 μm. The method for producing a transfer foil according to claim 1 or 2 , wherein the thickness of the second support layer is in the range of 12 µm to 50 µm. The manufacturing method of the labeled article which comprised carrying out the thermal transfer of the transfer foil manufactured by the method of any one of Claims 1 thru | or 3 to a to-be-transferred body. The method for manufacturing a labeled article according to claim 4 , wherein the thermal transfer is performed using a thermal printer. It is a laminated body obtained with the manufacturing method of the transfer foil of any one of Claims 1 thru | or 3 , Comprising: It peels on one main surface of a 1st support body layer and the said 1st support body layer. A supported second support layer, a resin layer that is releasably supported on the other main surface of the first support layer , and is embossed on at least a portion of the one main surface ; A release layer provided between the first support layer and the second support layer, a laminate layer provided facing the first support layer with the release layer interposed therebetween, A release layer provided between the first support layer and the resin layer, a reflective layer provided on at least a part of the embossed portion of the resin layer, and the reflective layer A laminate comprising a heat-sensitive adhesive layer provided so as to face the resin layer .

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