JP5662270B2 - Beautiful electrogalvanized steel strip - Google Patents

Beautiful electrogalvanized steel strip Download PDF

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JP5662270B2
JP5662270B2 JP2011155519A JP2011155519A JP5662270B2 JP 5662270 B2 JP5662270 B2 JP 5662270B2 JP 2011155519 A JP2011155519 A JP 2011155519A JP 2011155519 A JP2011155519 A JP 2011155519A JP 5662270 B2 JP5662270 B2 JP 5662270B2
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steel strip
layer
electrogalvanized
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淳 安井
淳 安井
敬士 二葉
敬士 二葉
徹行 中岸
徹行 中岸
柴田 大介
大介 柴田
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Nippon Steel Corp
Asahi Chemical Co Ltd
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Nippon Steel and Sumitomo Metal Corp
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Description

本発明は、従来の電気亜鉛めっき設備で効率よく製造可能であるにもかかわらず、従来の電気亜鉛めっき鋼帯と比較して外観品位に優れ、家電製品や土木・建築材料、自動車等に用いる際に好適な、美麗な電気亜鉛めっき鋼帯と、この電気亜鉛めっき鋼帯にクロムフリー皮膜を設けたクロムフリー被覆鋼帯とに関する。   The present invention is excellent in appearance quality compared to conventional electrogalvanized steel strips, although it can be efficiently manufactured by conventional electrogalvanizing equipment, and is used for home appliances, civil engineering / building materials, automobiles, etc. In particular, the present invention relates to a beautiful electrogalvanized steel strip and a chromium-free coated steel strip provided with a chromium-free coating on the electrogalvanized steel strip.

電気亜鉛めっき鋼帯は、犠牲防食作用に優れているため、従来から家電製品や土木・建築材料、自動車等の広範な産業分野で使用されている。特に近年は、環境負荷物質削減の動きが強まり、電気亜鉛めっき鋼帯の上層として、従来のクロメート皮膜の代わりに有機または無機のクロムフリー被覆を施し、更なる耐食性や耐指紋性を付与させたクロムフリー被覆電気亜鉛めっき鋼帯が使用されている。これらの鋼帯は、その優れた耐食性や耐指紋性を活かして無塗装で使用される例が数多くあるため、表面外観(表面ムラ、色調バラツキ)にも優れていることが要求される。近年、薄型TVパネルなどをはじめとする部品の大型化により、表面外観美麗化の要望がますます重要になっている。   Since the electrogalvanized steel strip is excellent in sacrificial anticorrosive action, it has been conventionally used in a wide range of industrial fields such as home appliances, civil engineering / building materials, and automobiles. Especially in recent years, the trend of reducing environmentally hazardous substances has been strengthened, and organic or inorganic chromium-free coating has been applied instead of the conventional chromate film as the upper layer of the electrogalvanized steel strip to provide further corrosion resistance and fingerprint resistance. Chrome-free coated electrogalvanized steel strip is used. These steel strips are required to be excellent in surface appearance (surface unevenness, color tone variation) because there are many examples where they are used without coating taking advantage of their excellent corrosion resistance and fingerprint resistance. In recent years, due to the increase in the size of parts such as thin TV panels, the demand for beautification of the surface appearance has become increasingly important.

電気亜鉛めっき鋼帯の表面外観不良(表面ムラ、色調バラツキ)の原因としては種々考えられているが、主な原因は、電気亜鉛めっき鋼帯に電析した亜鉛めっき結晶の向きや大きさが部分的に異なるために、部分ごとに光の反射率が異なり、表面外観不良(表面ムラ、色調バラツキ、主に明度のバラツキ)として目視で認識されるものである。   There are various possible causes for surface appearance defects (surface unevenness, color variation) of the electrogalvanized steel strip. The main cause is the orientation and size of the galvanized crystals deposited on the electrogalvanized steel strip. Since it is partially different, the reflectance of light is different for each part, and is visually recognized as a surface appearance defect (surface unevenness, color variation, mainly brightness variation).

電析した亜鉛めっき結晶の向きや大きさが部分的に異なる原因は次のように考えられている。亜鉛めっきの結晶は電析により一定の方向や大きさに成長(エピタキシャル成長)する性質があり、結晶の析出形態は電析条件や母材鋼帯表面の状態に大きく影響を受けることが知られているが、めっき母材(冷延鋼帯)の表面に酸化皮膜や汚れ、不純物元素、母材結晶粒サイズ等の不均一部分(例えばA部とB部)が生じていると、これら部分から一定の方向や大きさに(A部とB部では別々の方向と大きさに)亜鉛めっきの結晶の成長が起こり、最終的な電気亜鉛めっき鋼帯最表面の亜鉛めっき結晶の向きや大きさが部分ごとに異なったものとなる。   The reason why the direction and size of the electrodeposited galvanized crystals are partially different is considered as follows. Zinc-plated crystals have the property of growing in a certain direction and size (epitaxial growth) by electrodeposition, and it is known that the crystal precipitation form is greatly influenced by the electrodeposition conditions and the condition of the base steel strip surface. However, if there are non-uniform parts (for example, A part and B part) such as oxide film, dirt, impurity elements, and base crystal grain size on the surface of the plating base material (cold rolled steel strip), The direction and size of the galvanized crystal on the outermost surface of the final electrogalvanized steel strip will grow in a certain direction and size (separate directions and sizes in part A and B). Will be different for each part.

従って、電気亜鉛めっき鋼帯の表面外観不良(表面ムラ、色調バラツキ)を防止するためには、(1)母材(冷延鋼帯)表面の酸化皮膜や汚れ、不純物元素、結晶粒サイズ等の不均一部分をなくす、或いは(2)亜鉛めっきの電析結晶が一定の方向や大きさに成長(エピタキシャル成長)する性質を抑制する必要がある。   Therefore, in order to prevent surface appearance defects (surface unevenness, color variations) of the electrogalvanized steel strip, (1) oxide film and dirt on the base metal (cold rolled steel strip) surface, impurity elements, crystal grain size, etc. (2) It is necessary to suppress the property that the electrodeposited crystal of galvanizing grows in a certain direction and size (epitaxial growth).

(1)の母材(冷延鋼帯)表面の酸化皮膜や汚れ、不純物元素、結晶粒サイズ等の不均一部分をなくす手法としてはこれまでにも種々の方法が提案されているが、主なものは電気亜鉛めっきを実施する前にプレ電気めっきや置換めっきをする方法が挙げられる。   Various methods have been proposed so far to eliminate non-uniform parts such as oxide film, dirt, impurity elements, and crystal grain size on the surface of the base metal (cold rolled steel strip). For example, a method of performing pre-electroplating or displacement plating before performing electrogalvanization can be mentioned.

例えば特開平8−134688号公報には電気亜鉛めっきの下層にCoとNiからなるめっき層を施す方法が開示されている。また、特開平9−202993号公報には電気亜鉛めっきの下層に0.5〜100mg/m2のCu若しくはCoもしくはこれらの合金めっき層を施す方法が開示されている。さらに特開2000−192282号公報には電気亜鉛めっきの下層に1〜5g/m2の0.02〜2wt%Sn−Zn合金めっき層を施す方法が開示されている。 For example, JP-A-8-134688 discloses a method of applying a plating layer made of Co and Ni to a lower layer of electrogalvanizing. Japanese Patent Application Laid-Open No. 9-202993 discloses a method of applying 0.5 to 100 mg / m 2 of Cu or Co or an alloy plating layer thereof to the lower layer of electrogalvanizing. Furthermore, Japanese Patent Application Laid-Open No. 2000-192282 discloses a method of applying a 1 to 5 g / m 2 0.02 to 2 wt% Sn—Zn alloy plating layer to a lower layer of electrogalvanizing.

しかし、これらの電気亜鉛めっき鋼帯の下層に別の化学組成のめっき層を形成させる手法は、別の化学組成のめっき層を形成させるためのめっき浴やめっきを電析させるための通電装置等が必要で、商業的な生産性を考えた場合には好ましくなかった。   However, the method of forming a plating layer with a different chemical composition below the electrogalvanized steel strip is a plating bath for forming a plating layer with a different chemical composition, an energizing device for electrodepositing plating, etc. This is not desirable when considering commercial productivity.

近年、母材(冷延鋼帯)の焼鈍効率をあげるために、高温で焼鈍した後、気水冷却(水噴霧による冷却)する方法が一般化している。気水冷却をした場合には鋼帯表面が酸化されるため、冷却後に酸洗による酸化皮膜の除去とNiめっきを行うこともまた一般化している。この方法では、鋼帯表面にNiめっき層が形成されるが、この場合のNiめっきの付着量は一般に1〜20mg/m2程度と非常に低付着量であるため、付着ムラを生ずる(Niが鋼帯表面に点々と島状に付着する)ことが多い。Niめっきに付着ムラがあると、上層に析出する電気亜鉛めっきの結晶の成長がNiめっきの付着量の影響を受けるため、かえってめっきの表面ムラを助長するという欠点があった。 In recent years, in order to increase the annealing efficiency of a base material (cold rolled steel strip), a method of air-water cooling (cooling by water spray) after annealing at a high temperature has become common. Since the steel strip surface is oxidized when air-water cooling is performed, it is also common to remove the oxide film by pickling and to perform Ni plating after cooling. In this method, a Ni plating layer is formed on the surface of the steel strip. In this case, the amount of Ni plating deposited is generally as low as 1 to 20 mg / m 2 , so that uneven adhesion occurs (Ni Often adhere to the surface of the steel strip in islands). If there is uneven adhesion on the Ni plating, the growth of electrogalvanized crystals deposited on the upper layer is affected by the amount of adhesion of the Ni plating, which in turn has the disadvantage of promoting the uneven surface of the plating.

(2)の亜鉛めっきの電析結晶が一定の方向や大きさに成長(エピタキシャル成長)する性質を抑制する手法についても、種々の方法が提案されている。主なものは、電気亜鉛めっき浴中に他の金属成分や陰イオン、有機物等を添加する方法である。   Various methods have also been proposed for the method (2) of suppressing the property that the galvanized electrodeposited crystal grows in a certain direction and size (epitaxial growth). The main method is to add other metal components, anions, organic substances, etc. to the electrogalvanizing bath.

例えば、特開平8−158090号公報には、めっき浴中に平均分子量が1000〜10万のポリオキシアルキレンまたはそのアルキルエーテルを1〜500ppmの濃度範囲で存在させる電気亜鉛めっき鋼帯の製法が、特開平8−188899号公報には、表面の平均結晶粒径が38μm以下である母材鋼帯上に、Sn、In、Bi及びSbよりなる群から選択される少なくとも1種を総量として0.0008〜0.05wt%含有するめっき浴を用いる電気亜鉛めっき方法が、特開平9−256192号公報には、表面のフェライト平均結晶粒径が38μm以下である鋼帯を母材として用い、フルオロ錯イオンを100〜5000ppm含有する亜鉛めっき浴中で電気亜鉛めっきを行う外観の均一性に優れた電気亜鉛めっき鋼帯の製造方法が、特開2000−192282号公報には、1〜50g/lのジアリルジメチルアンモニウムクロライド−二酸化イオウ共重合物(PAS)を添加した酸性亜鉛めっき液を用いて電気めっきする電気亜鉛めっき鋼帯の製造方法がそれぞれ開示されている。   For example, JP-A-8-158090 discloses a method for producing an electrogalvanized steel strip in which polyoxyalkylene having an average molecular weight of 1000 to 100,000 or an alkyl ether thereof is present in a concentration range of 1 to 500 ppm in a plating bath. In JP-A-8-188899, the total amount of at least one selected from the group consisting of Sn, In, Bi, and Sb on a base steel strip having an average crystal grain size of 38 μm or less on the surface is set to 0. An electrogalvanizing method using a plating bath containing 0008 to 0.05 wt% is disclosed in Japanese Patent Application Laid-Open No. 9-256192 using a steel strip having a surface average ferrite grain size of 38 μm or less as a base material. There is provided a method for producing an electrogalvanized steel strip excellent in uniformity in appearance in which electrogalvanization is performed in a zinc plating bath containing 100 to 5000 ppm of ions. Japanese Patent Application Laid-Open No. 2000-192282 discloses a method for producing an electrogalvanized steel strip that is electroplated using an acidic zinc plating solution to which 1 to 50 g / l diallyldimethylammonium chloride-sulfur dioxide copolymer (PAS) is added. Are each disclosed.

しかし、電気亜鉛めっき浴中に他の金属イオン成分や陰イオン、有機物等を添加する方法のうち、添加成分が亜鉛とともに共析する性質のもの(主に金属イオン)である場合には、ラインスピードの変化によってめっきの電析のため鋼帯に通電される電流密度が変化した場合に電流密度の変化に伴い共析量も変化し、共析量の変化によりめっきの明度が変化したり、かえってムラを助長することもあるという問題があった。また、亜鉛めっき中に金属イオン成分が金属として共析すると、部分的に微小な局部電池が形成され、耐食性の低下を招くという点でも好ましくなかった。   However, among the methods of adding other metal ion components, anions, organic substances, etc. to the electrogalvanizing bath, if the additive component has the property of eutectoid with zinc (mainly metal ions), When the current density applied to the steel strip changes due to the change in speed due to the electrodeposition of the plating, the amount of eutectoid changes with the change in the current density, the brightness of the plating changes due to the change in the amount of eutectoid, On the contrary, there was a problem that unevenness was sometimes promoted. In addition, when the metal ion component is eutectoidally formed as a metal during galvanization, it is not preferable in that a small local battery is partially formed and the corrosion resistance is lowered.

一方、添加成分が亜鉛とともに共析しない性質のもの(陰イオン、有機物等)である場合は、浴中濃度を一定量に管理する必要があるが、浴中濃度を迅速かつ正確に分析する方法が金属イオンに比べて難しく、高コストになるという不利点があった。電気亜鉛めっき浴は、めっき前の酸洗浴等とは異なり、通常は再建浴はせずに、電析や持ち出しにより消費された成分を補給しつつ恒久的に使用するのが一般的である。従って、浴中濃度を迅速かつ正確に分析して不足成分の補給ができないと、効果に必要な量の添加成分(陰イオン、有機物等)が不足して、めっきの明度が変化し、かえってムラを助長するという欠点があった。   On the other hand, when the additive component does not co-deposit with zinc (anion, organic matter, etc.), it is necessary to control the concentration in the bath to a certain level, but the method for analyzing the concentration in the bath quickly and accurately However, there is a disadvantage that it is difficult and expensive as compared with metal ions. Unlike the pickling bath before plating, etc., the electrogalvanizing bath is generally used permanently without reconstructing the bath and replenishing components consumed by electrodeposition or taking out. Therefore, if the concentration in the bath cannot be quickly and accurately analyzed and insufficient components cannot be replenished, the amount of additional components (anions, organic substances, etc.) necessary for the effect will be insufficient, and the brightness of the plating will change, which will cause unevenness. There was a drawback of promoting.

亜鉛めっきの電析結晶が一定の方向や大きさに成長(エピタキシャル成長)する性質を抑制する別の方法として、電気亜鉛めっきの前処理として実施される脱脂液や酸洗液中に種々の有機物や無機物を添加する方法も提案されている。   As another method for suppressing the property that the galvanized electrodeposited crystal grows in a certain direction and size (epitaxial growth), various organic substances can be used in a degreasing solution or pickling solution that is implemented as a pretreatment for galvanizing. A method of adding an inorganic substance has also been proposed.

例えば、特開平9−59788号公報には、電気亜鉛めっき前の酸洗溶液中に、第一級アミン(但し、ベンジルアミンを除く)、第二級アミン、第三級アミン、第四級アンモニウム塩および複素環式化合物よりなる群から選択される、酸性液中でカチオンを形成する少なくとも1種の窒素含有有機化合物を含有させる方法が開示されている。   For example, JP-A-9-59788 discloses a primary amine (excluding benzylamine), secondary amine, tertiary amine, and quaternary ammonium in a pickling solution before electrogalvanizing. Disclosed is a method of containing at least one nitrogen-containing organic compound that forms a cation in an acidic liquid, selected from the group consisting of salts and heterocyclic compounds.

特開平2002−309393号公報には、めっき前の母材鋼帯を、平均分子量が1000〜200000のアミノ基を有する水溶性ポリマーを5ppm以上含有する酸性水溶液に接触させる電気亜鉛めっき鋼帯の製造方法が開示されている。   JP-A-2002-309393 discloses the production of an electrogalvanized steel strip in which a base steel strip before plating is brought into contact with an acidic aqueous solution containing 5 ppm or more of a water-soluble polymer having an amino group having an average molecular weight of 1,000 to 200,000. A method is disclosed.

特開2003−64493号公報には、めっき母材鋼帯の酸化皮膜に対して還元作用を有し、かつ該酸化皮膜を溶解除去可能な酸洗促進剤およびカルボニル基またはチオカルボニル基を持つ有機化合物を含有する酸洗液を用いてめっき前酸洗を実施する方法が開示されている。特開2003−64493号公報にはさらに、めっき前の酸洗溶液中にコロイダルシリカを添加する方法も開示されている。   Japanese Patent Application Laid-Open No. 2003-64493 discloses a pickling accelerator having a reducing action on an oxide film of a plating base steel strip and an organic compound having a carbonyl group or a thiocarbonyl group that can dissolve and remove the oxide film. A method of performing pickling before plating using a pickling solution containing a compound is disclosed. JP-A-2003-64493 further discloses a method of adding colloidal silica into the pickling solution before plating.

しかし、本発明者らの知見では、これらの方法は何れも鋼帯表面に第1層としてNiめっき層が存在しない場合や、Niめっき層が存在しても付着量のバラツキが少ない場合には効果を示すが、Niめっき層の付着量のバラツキが大きい場倍、特にNiめっき層の付着量のバラツキが平均付着量の10%を超える場合には不十分であった。   However, according to the knowledge of the present inventors, in any of these methods, when the Ni plating layer does not exist as the first layer on the surface of the steel strip, or when the amount of adhesion is small even if the Ni plating layer exists, Although the effect is shown, it was insufficient when the variation of the adhesion amount of the Ni plating layer was large, particularly when the variation of the adhesion amount of the Ni plating layer exceeded 10% of the average adhesion amount.

特開平8−134688号公報JP-A-8-134688 特開平9−202993号公報JP 9-202993 A 特開2000−192282号公報JP 2000-192282 A 特開平8−158090号公報JP-A-8-158090 特開平8−188899号公報JP-A-8-188899 特開平9−256192号公報JP-A-9-256192 特開2000−192282号公報JP 2000-192282 A 特開平9−59788号公報JP 9-59788 A 特開平2002−309393号公報Japanese Patent Laid-Open No. 2002-309393 特開2003−64493号公報JP 2003-64493 A

本発明は上記のような事情を鑑みてなされたものであって、その目的は表面外観不良(表面ムラ、色調バラツキ)のない電気亜鉛めっき鋼帯を提供しようとするものである。特に第1層として鋼帯表面上にNiめっき層が形成されており、そのめっき層に付着量のバラツキが存在する場合でも、表面外観不良(表面ムラ、色調バラツキ)のない電気亜鉛めっき鋼帯を提供しようとするものである。   The present invention has been made in view of the above circumstances, and an object thereof is to provide an electrogalvanized steel strip free from surface appearance defects (surface unevenness, color variation). In particular, a Ni plating layer is formed on the surface of the steel strip as the first layer, and even if there is a variation in the amount of adhesion on the plating layer, there is no surface appearance defect (surface unevenness, color variation) electrogalvanized steel strip Is to provide.

上記課題を解決するために、本発明者らは鋭意検討を重ねた結果、付着量にバラつきがあるNiめっき層が鋼帯表面上に存在していても、この上に電析する亜鉛めっき結晶のエピタキシャル成長を抑制し、その結果として電気亜鉛めっき鋼帯の表面外観のムラを抑制するためには、Niめっき層と電気亜鉛めっき層の間に1種以上のアミン化合物とS(硫黄)含有官能基を持つ有機化合物とからなる層を設けることが有効であるとの知見を得て、本発明をなすに至った。   In order to solve the above-mentioned problems, the present inventors have conducted intensive studies, and as a result, even if a Ni plating layer with a variation in the amount of adhesion exists on the surface of the steel strip, a galvanized crystal is deposited on this surface. In order to suppress the epitaxial growth of steel and, as a result, to suppress unevenness in the surface appearance of the electrogalvanized steel strip, one or more amine compounds and an S (sulfur) -containing functional group are provided between the Ni plating layer and the electrogalvanizing layer. Obtaining knowledge that it is effective to provide a layer made of an organic compound having a group, the present invention has been made.

本発明は、鋼帯の少なくとも一方の面において、電気亜鉛めっき層の下に、任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであるNiめっき層を有する電気亜鉛めっき鋼帯であって、該電気亜鉛めっき層の表面の任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつの10個所の明度(L値)を測定した時の最大明度と最小明度の明度差の平均明度に対する割合が2%以下であることを特徴とする電気亜鉛めっき鋼帯である。 In the present invention, at least one surface of a steel strip is measured under 10 parts of 10 mm square ( 1 cm 2 ) continuous in the width direction of the steel strip under an electrogalvanized layer at an arbitrary portion. An electrogalvanized steel strip having a Ni plating layer having an average adhesion amount of 1 to 30 mg / m 2, which is a 10 mm square ( 1 cm) continuous in the width direction of the steel strip at an arbitrary portion of the surface of the electrogalvanized layer 2 ) An electrogalvanized steel strip characterized in that the ratio of the brightness difference between the maximum brightness and the minimum brightness to the average brightness when the brightness (L value) at 10 locations is measured is 2% or less.

上記特徴を有する本発明の電気亜鉛めっき鋼帯は、より具体的には、鋼帯の少なくとも一方の面において、下から順に、任意の部分で鋼帯の幅方向に連続して10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであり、かつその時の最大付着量と最小付着量の付着量差の平均付着量に対する割合が10%以上であるNiめっき層からなる第1層と、それぞれ1種以上のアミン化合物およびS(硫黄)含有官能基を持つ有機化合物からなり、付着量がこれらの有機化合物の総量で0.002mg/m以上、1mg/m以下である第2層と、95質量%以上のZnを含有する電気亜鉛めっき層からなる第3層と、を有している。 More specifically, the electrogalvanized steel strip of the present invention having the above-described features is a 10 mm square ( 1 cm) continuously in the width direction of the steel strip at an arbitrary portion in order from the bottom on at least one surface of the steel strip. 2 ) The average adhesion amount when measuring the adhesion amount at 10 locations is 1 to 30 mg / m 2 , and the ratio of the difference between the maximum adhesion amount and the minimum adhesion amount to the average adhesion amount is 10% or more And a first layer composed of a Ni plating layer, and an organic compound having at least one amine compound and an S (sulfur) -containing functional group, and the adhesion amount is 0.002 mg / m 2 in total of these organic compounds. As mentioned above, it has the 2nd layer which is 1 mg / m < 2 > or less, and the 3rd layer which consists of an electrogalvanized layer containing 95 mass% or more of Zn.

アミン化合物は好ましくはポリエチレンイミン及びその誘導体から選ばれた少なくとも1種の化合物であり、S含有官能基を持つ有機化合物は好ましくはチオ尿素及びその誘導体から選ばれた少なくとも1種の化合物である。   The amine compound is preferably at least one compound selected from polyethyleneimine and derivatives thereof, and the organic compound having an S-containing functional group is preferably at least one compound selected from thiourea and derivatives thereof.

好ましくは、前記第2層は、アミン化合物とS含有官能基を持つ有機化合物とを含有する酸性液に浸漬することによって鋼帯表面にアミン化合物とS含有官能基を持つ有機化合物とを吸着させることにより形成された層である。   Preferably, the second layer adsorbs the amine compound and the organic compound having the S-containing functional group on the surface of the steel strip by immersing in an acidic liquid containing the amine compound and the organic compound having the S-containing functional group. It is a layer formed by this.

前記酸性液は、アミン化合物とS含有官能基を持つ有機化合物とに加えて、鉄及びニッケルの酸化物の除去を促進する化合物を含有していることが好ましい。
前記鉄及びニッケルの酸化物の除去を促進する化合物は、好ましくは飽和低級カルボン酸及びその塩から選ばれた少なくとも1種の化合物である。
In addition to the amine compound and the organic compound having an S-containing functional group, the acidic liquid preferably contains a compound that promotes removal of iron and nickel oxides.
The compound that promotes the removal of the iron and nickel oxides is preferably at least one compound selected from saturated lower carboxylic acids and salts thereof.

別の側面から、本発明は、鋼帯の少なくとも一方の面において、前記電気亜鉛めっき層の上層として、又は前記第3層の上層の第4層として、クロムフリー皮膜を有する、上記電気亜鉛めっき鋼帯を基材とするクロムフリー被覆鋼帯である。   From another aspect, the present invention provides the above electrogalvanized plating having a chromium-free coating as an upper layer of the electrogalvanized layer or a fourth layer of the upper layer of the third layer on at least one surface of a steel strip. It is a chromium-free coated steel strip based on a steel strip.

本発明によれば、第1層のNiめっきの付着量のばらつきが10%以上ある場合であっても、美麗な電気亜鉛めっき鋼帯やクロムフリー電気亜鉛めっき鋼帯が得られる。従って、本発明は、高温焼鈍と気水冷却された冷延鋼帯を母材とし、電気亜鉛めっき前に酸洗とニッケル薄めっきが施される方法で製造される電気亜鉛めっき鋼帯に適用するのに非常に適しており、電気亜鉛めっき鋼帯に特有の優れた耐食性と耐指紋性に加えて、表面ムラや色調バラツキが極めて抑制された美麗な外観を有するため、無塗装で使用される用途において特に優位性を発揮する。   According to the present invention, a beautiful electrogalvanized steel strip or a chromium-free electrogalvanized steel strip can be obtained even when the variation in the amount of adhesion of the first layer of Ni plating is 10% or more. Therefore, the present invention is applied to an electrogalvanized steel strip manufactured by a method in which pickling and thin nickel plating are performed before electrogalvanizing using a cold-rolled steel strip cooled at high temperature and air-water cooled as a base material. In addition to the excellent corrosion resistance and fingerprint resistance characteristic of electrogalvanized steel strip, it has a beautiful appearance with extremely suppressed surface unevenness and color variation, so it can be used without painting. In particular, it has an advantage in applications.

以下、本発明をその特定の実施形態を例にとってより具体的に説明する。ただし、以下の説明は例示を目的とし、本発明を制限するものではない。
本発明に係る電気亜鉛めっき鋼帯は、鋼帯の少なくとも一方の面において、電気亜鉛めっき層の下に、任意の部分で鋼帯の幅方向に連続した1cm2ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/m2であるNiめっき層を有する電気亜鉛めっき鋼帯であり、かつ、該電気亜鉛めっき層の表面の任意の部分で鋼帯の幅方向に連続した1cm2ずつの10個所の明度(L値)を測定した時の最大明度と最小明度の明度差の平均明度に対する割合が2%以下であることを特徴とする。この特徴を有する限り、母材の鋼帯や電気亜鉛めっきおよびその前処理の手法は特に制限されない。
Hereinafter, the present invention will be described more specifically by taking specific embodiments thereof as examples. However, the following description is for illustrative purposes and does not limit the present invention.
Electro-galvanized steel strip according to the present invention, in at least one surface of the strip, below the electro-galvanized layer, measuring the adhesion amount of 1 cm 2 by 10 positions continuous in the width direction of the steel strip in any part An electrogalvanized steel strip having a Ni plating layer with an average adhesion amount of 1 to 30 mg / m 2 , and continuous in the width direction of the steel strip at any part of the surface of the electrogalvanized layer The ratio of the brightness difference between the maximum brightness and the minimum brightness when the brightness (L value) at 10 locations of 1 cm 2 is measured is 2% or less. As long as it has this feature, the steel strip of the base material, the electrogalvanizing and the pretreatment method are not particularly limited.

本発明に係る上記特徴を有する電気亜鉛めっき鋼帯は、鋼帯の少なくとも一方の面において、Niめっき層からなる第1層と、特定の有機化合物からなる第2層と、電気亜鉛めっき層からなる第3層とを有することにより実現することができるので、以下ではこの態様について説明する。   The electrogalvanized steel strip having the above-described features according to the present invention includes, on at least one surface of the steel strip, a first layer made of a Ni plating layer, a second layer made of a specific organic compound, and an electrogalvanized layer. Since this can be realized by having the third layer, this embodiment will be described below.

母材として使用する鋼帯は限定されず、一般的に電気亜鉛めっきの母材として使用されているものであればどのような鋼帯にも本発明を適用できる。一般的な炭素鋼の範囲であれば、鋼中成分や強度、焼鈍方法(箱焼鈍や連続焼鈍)に関係なく適用可能である。また、母材としては、加工性に優れていることから冷間圧延後に焼鈍を実施した冷延鋼帯を使用することが望ましいが、焼鈍をしていない冷延鋼帯や、熱延後酸洗を実施した熱延酸洗鋼帯も適用できる。   The steel strip used as the base material is not limited, and the present invention can be applied to any steel strip that is generally used as a base material for electrogalvanizing. If it is the range of general carbon steel, it is applicable irrespective of the component in steel, intensity | strength, and the annealing method (box annealing or continuous annealing). In addition, as a base material, it is desirable to use a cold-rolled steel strip that has been annealed after cold rolling because of its excellent workability. A hot-rolled pickled steel strip that has been washed can also be applied.

冷延鋼帯は、冷間圧延後の焼鈍が、生産性に優れた高温焼鈍と気水冷却とにより行われたものでよい。この場合、上述したように、鋼帯表面が酸化されているため、酸洗による酸化皮膜の除去と、ニッケルストライクめっきと呼ばれる薄いNiめっきが施されるのが一般的である。このNiめっきは、次に述べる第1層を構成することができる。   The cold-rolled steel strip may be obtained by annealing after cold rolling by high-temperature annealing and air-water cooling excellent in productivity. In this case, as described above, since the steel strip surface is oxidized, the removal of the oxide film by pickling and the thin Ni plating called nickel strike plating are generally performed. This Ni plating can constitute the first layer described below.

第1層の薄いNiめっき層は、めっき母材の鋼帯(好ましくは焼鈍冷延鋼帯)と電気亜鉛めっきとの密着性を向上させる働きがある。すなわち、母材鋼帯の表面に、母材鋼帯全体を覆いつくさない程度の少量のNiが存在すると、第2層の電気亜鉛めっきが析出する際にこのNiを起点として電気亜鉛めっきの析出が起こり易く、NiとZnは良好なめっき密着性を有するため、電気亜鉛めっきの母材鋼帯との密着性が向上すると考えられている。   The thin Ni plating layer of the first layer serves to improve the adhesion between the steel strip (preferably an annealed cold rolled steel strip) of the plating base material and the electrogalvanizing. That is, when a small amount of Ni is present on the surface of the base steel strip so as not to cover the entire base steel strip, when the second layer of electrogalvanizing precipitates, the deposition of electrogalvanizing starts from this Ni Since Ni and Zn have good plating adhesion, it is considered that the adhesion with the base steel strip of electrogalvanization is improved.

Niめっきを付与する目的は、母材鋼帯の全体を均一に覆って耐食性の向上を図るような目的とは異なり、少量のNiを鋼帯表面に点々と島状に付着させてそのNiを起点とした電気亜鉛めっきの析出を補助することにある。従って、Niめっきの付着量はミクロ的にみると均一ではないので、連続する1cm2の範囲を測定した時の平均付着量として表記する。 The purpose of applying Ni plating is different from the purpose of uniformly covering the entire base steel strip to improve the corrosion resistance, and depositing a small amount of Ni on the surface of the steel strip in islands. The purpose is to assist the deposition of electrogalvanizing as a starting point. Therefore, since the adhesion amount of Ni plating is not uniform when viewed microscopically, it is expressed as an average adhesion amount when a continuous range of 1 cm 2 is measured.

本発明では、第1層のNiめっき層の付着量は、鋼帯の幅方向に連続して1cm2ずつ10箇所の付着量を測定した際の平均付着量で1mg/m2以上、30mg/m2以下である。このNiめっき層の平均付着量が1mg/m2未満では、電気亜鉛めっきの密着性が不足し、例えば、深絞り成型を実施した際の電気亜鉛めっきの密着性が不十分となる。一方、Niめっき層の平均付着量が30mg/m2を超えると、生産時のラインスピードを低下させる必要がある上、コスト面でも不利である。 In the present invention, the amount of adhesion of the first Ni plating layer is 1 mg / m 2 or more and 30 mg / m 2 in terms of the average amount of adhesion when 10 sites of 1 cm 2 are continuously measured in the width direction of the steel strip. m 2 or less. When the average adhesion amount of the Ni plating layer is less than 1 mg / m 2 , the adhesion of electrogalvanization is insufficient, and for example, the adhesion of electrogalvanization when deep drawing is performed becomes insufficient. On the other hand, when the average adhesion amount of the Ni plating layer exceeds 30 mg / m 2 , it is necessary to reduce the line speed during production, which is disadvantageous in terms of cost.

めっき母材の鋼帯にこのような低付着量のNiめっきを実施しようとすると、種々の原因で鋼帯の幅方向にNiめっきの付着量の差が発生する。そして、このようなNiめっきの付着量の差があると、その上に電析する亜鉛めっきの結晶のサイズや配向が異なるため、美麗な電気亜鉛めっき鋼帯が得られない。この理由から、従来は、鋼帯の幅方向に連続して1cm2ずつ10箇所の付着量を測定した際のNiめっきの付着量における最大付着量と最小付着量の差である付着量差の割合を10%より少なく抑える必要があった。そのためには鋼帯生産時のラインスピードを低下させる等の工夫が必要であり、生産性を阻害していた。 When an attempt is made to perform such low adhesion amount Ni plating on the steel strip of the plating base material, a difference in the adhesion amount of Ni plating occurs in the width direction of the steel strip due to various reasons. If there is such a difference in the amount of Ni plating deposited, the size and orientation of the galvanized crystals deposited on the Ni plating are different, so that a beautiful electrogalvanized steel strip cannot be obtained. For this reason, in the past, the difference in adhesion amount, which is the difference between the maximum adhesion amount and the minimum adhesion amount in the Ni plating adhesion amount when measuring the adhesion amount at 10 locations in 1 cm 2 increments in the width direction of the steel strip. It was necessary to keep the ratio below 10%. To that end, it was necessary to devise measures such as reducing the line speed during steel strip production, which hindered productivity.

本発明では、鋼帯の幅方向に連続して1cm2ずつ10箇所の付着量を測定した際の最大付着量と最小付着量の差の平均付着量に対する割合が10%以上と大きい、高い生産性で製造される鋼帯である場合でも、安定して美麗な電気亜鉛めっき鋼帯及びクロムフリー電気亜鉛めっき鋼帯を得ることが可能である。従って、第1層のNiめっき層の上記付着量差の割合は好ましくは10%以上である。このような大きな付着量差がある時に本発明の効果がより明確となるからである。この付着量差の割合は、例えば50%を超えてもよく、100%またはそれ以上に達してもよい。この割合の上限は特に制限されないが、一般には150%以内であることが好ましい。 In the present invention, the ratio of the difference between the maximum adhesion amount and the minimum adhesion amount when measuring the adhesion amount at 10 locations of 1 cm 2 continuously in the width direction of the steel strip is as high as 10% or more and high production. Even in the case of a steel strip manufactured with the property, it is possible to obtain a stable and beautiful electrogalvanized steel strip and chromium-free electrogalvanized steel strip. Therefore, the ratio of the difference in the adhesion amount of the first Ni plating layer is preferably 10% or more. This is because the effect of the present invention becomes clearer when there is such a large difference in adhesion amount. The proportion of the difference in adhesion amount may exceed 50%, for example, and may reach 100% or more. The upper limit of this ratio is not particularly limited, but generally it is preferably within 150%.

第1層のNiめっき層は電気めっきにより形成される。Niめっきは、ニッケルイオンを含有する水溶液に鋼帯を浸漬して所定の通電量にてNiを析出させる方法であればどのような方法でも構わない。一般的なNiストライクめっきは塩化ニッケルを含有する塩化浴を使用して行われるが、そのような通常のストライクめっき法を採用することで第1層を形成することができる。Niめっきは、母材鋼帯が焼鈍冷延鋼帯である場合には、連続焼鈍後の酸洗直後に実施するのが好ましいが、時間をおいてから、または電気亜鉛めっき鋼帯の直前に実施することも可能である。   The first Ni plating layer is formed by electroplating. The Ni plating may be performed by any method as long as the steel strip is immersed in an aqueous solution containing nickel ions and Ni is deposited at a predetermined amount of current. Although general Ni strike plating is performed using a chloride bath containing nickel chloride, the first layer can be formed by employing such a normal strike plating method. Ni plating is preferably performed immediately after pickling after continuous annealing when the base steel strip is an annealed cold rolled steel strip, but after a while or immediately before the electrogalvanized steel strip. It is also possible to implement.

この第1層のNiめっき層の上に、従来は電気亜鉛めっきを施すのであるが、本発明では第2層として、少なくとも1種のアミン化合物と、少なくとも1種のS含有官能基を持つ有機化合物という、2種類の有機化合物からなる層を、電気亜鉛めっきを施す前に形成する。この第2層を形成することが、本発明の特徴である。   Conventionally, electrogalvanizing is performed on the first Ni plating layer. In the present invention, the second layer is an organic material having at least one amine compound and at least one S-containing functional group. A layer made of two types of organic compounds, called compounds, is formed before electrogalvanizing. Forming this second layer is a feature of the present invention.

アミン化合物は、水溶液中ではカチオン性アミンとして選択的にニッケル原子に物理吸着により配位しやすいという特徴をもつ。一方、S含有官能基を持つ有機化合物は、硫黄原子がもつ非共有電子対が選択的に鉄原子に化学吸着により配位しやすいという特徴をもつ。   An amine compound is characterized in that it is easily coordinated to a nickel atom by physical adsorption selectively as a cationic amine in an aqueous solution. On the other hand, an organic compound having an S-containing functional group has a feature that a lone pair of a sulfur atom is easily selectively coordinated to an iron atom by chemical adsorption.

アミン化合物とS含有官能基を持つ有機化合物の各1種以上からなる第2層を形成することにより、第1層のNiめっき層が島状に不均一かつ部分的に鋼帯表面を覆っていても、鋼帯表面のNiにはアミン化合物が選択的に吸着し、FeにはS含有官能基を持つ有機化合物が選択的に吸着することで、鋼帯表面の全体が第2層を構成する有機化合物で被覆され、その上層に電析する亜鉛の結晶配向が鋼帯の全面で一定となり、美麗なムラのない電気亜鉛めっき鋼帯の製造が可能となる。   By forming a second layer composed of at least one of an amine compound and an organic compound having an S-containing functional group, the Ni plating layer of the first layer is unevenly and partly covered with an island shape. However, the amine compound is selectively adsorbed on Ni on the surface of the steel strip, and the organic compound having an S-containing functional group is selectively adsorbed on Fe, so that the entire surface of the steel strip constitutes the second layer. The crystal orientation of zinc coated with an organic compound and electrodeposited on the upper layer is constant over the entire surface of the steel strip, and it is possible to produce a beautiful electro-galvanized steel strip with no unevenness.

これに対し、アミン化合物のみから第2層を形成する場合には、この有機化合物が選択的にNiの上に吸着しやすいため、第1層のNiめっき層に付着量ムラがあると、Niの付着量の少ない部分で第2層が形成されにくいと考えられる。そのため、第3層の電気亜鉛めっきのムラが発生してしまう。   On the other hand, in the case where the second layer is formed only from the amine compound, this organic compound is likely to be selectively adsorbed onto Ni. It is considered that the second layer is difficult to be formed in a portion where the amount of adhering is small. Therefore, unevenness of the electrogalvanization of the third layer occurs.

また、S含有官能基を持つ有機化合物のみから第2層を形成する場合には、この有機化合物は選択的にFeに吸着しやすいため、第1層のNiめっき層の付着量の多い部分の上には第2層が形成されにくいと考えられる。そのため、やはり第3層の電気亜鉛めっきにムラが発生する。   Further, when the second layer is formed only from an organic compound having an S-containing functional group, this organic compound is likely to be selectively adsorbed to Fe, so that the portion of the first Ni plating layer with a large amount of adhesion is used. It is considered that the second layer is hardly formed on the top. As a result, the third layer of electrogalvanizing is also uneven.

このようにアミン化合物とS含有官能基を有する有機化合物の両方が必要であるので、アミン化合物だけを2種以上使用するか、S含有官能基を持つ化合物だけを2種以上しても、本発明による効果を確実に達成することはできない。   Thus, since both an amine compound and an organic compound having an S-containing functional group are necessary, even if two or more amine compounds are used or only two or more compounds having an S-containing functional group are used, The effects of the invention cannot be achieved reliably.

第2層におけるアミン化合物とS含有官能基を持つ有機化合物の付着量は、それらの総和で0.002mg/m2以上、1mg/m2以下とする。この付着量が0.002mg/m2より少ないと、その上層に電析する亜鉛の結晶配向の変化が十分でなく、美麗なムラのない電気亜鉛めっき鋼帯が得られない。一方、この付着量が1mg/m2を超えると、上層に電析する電気亜鉛めっきの密着性が低下する。また高付着量を得るためには処理液の濃度を濃くせざるを得ないためコスト的にも好ましくない。 The adhesion amount of the amine compound and the organic compound having an S-containing functional group in the second layer is 0.002 mg / m 2 or more and 1 mg / m 2 or less in total. If the adhesion amount is less than 0.002 mg / m 2, the change in the crystal orientation of zinc electrodeposited on the upper layer is not sufficient, and a beautiful non-uniform electrogalvanized steel strip cannot be obtained. On the other hand, when the adhesion amount exceeds 1 mg / m 2 , the adhesion of the electrogalvanized electrodeposited on the upper layer is lowered. Further, in order to obtain a high adhesion amount, the concentration of the treatment liquid must be increased, which is not preferable in terms of cost.

アミン化合物の例としては、脂肪族、脂環式および芳香族の各種アミン化合物、ヘテロ原子としてNを含有するヘテロ環化合物などが挙げられ、水溶性の化合物を使用することが好ましい。分子中のアミノ基の数が多い有機化合物が好ましいので、ポリアミン、中でも、ポリエチレンイミンのようなポリアルキレンポリアミン及びその誘導体が、効果が大きく最も好ましい。   Examples of the amine compound include various aliphatic, alicyclic and aromatic amine compounds, and heterocyclic compounds containing N as a hetero atom, and it is preferable to use a water-soluble compound. Since organic compounds having a large number of amino groups in the molecule are preferred, polyamines, especially polyalkylene polyamines such as polyethyleneimine and derivatives thereof are most preferred because of their great effects.

S含有官能基を持つ有機化合物の例としては、チオカルボニル基(>C=S)基もしくはチオール(−SH)を有する化合物や、ヘテロ原子としてSを含有するヘテロ環化合物が挙げられ、やはり水溶性の化合物を使用することが好ましい。中でも、チオ尿素及びその誘導体が、効果が大きいので好ましい。なお、チオ尿素のようにさらにアミノ基(−NH)も含有する場合、このアミノ基は反応性に乏しく、Feへの吸着効果を示さない。そこで、チオ尿素及びその誘導体、広義には、チオカルボニル基、チオール基又は−S−部分とアミノ基の両方を持つ有機化合物は、本発明ではS含有官能基を持つ有機化合物として扱う。 Examples of the organic compound having an S-containing functional group include a compound having a thiocarbonyl group (> C═S) group or a thiol (—SH), and a heterocyclic compound containing S as a hetero atom, which is also water-soluble. It is preferable to use a chemical compound. Of these, thiourea and its derivatives are preferable because of their great effects. In the case also contain further amino groups (-NH 2) as thiourea, the amino group is poor in reactivity, exhibits no adsorption effect on Fe. Therefore, thiourea and its derivatives, in a broad sense, thiocarbonyl groups, thiol groups, or organic compounds having both an -S- moiety and an amino group are treated as organic compounds having an S-containing functional group in the present invention.

第2層として、アミン化合物とS含有官能基を持つ有機化合物という2種類の有機化合物からなる層を形成させる方法は特に限定されないが、第1層として前述したNiめっき層を有する鋼帯を、1種以上のアミン化合物およびS含有官能基を持つ1種以上の有機化合物を溶解させた溶液、好ましくは水溶液に浸漬して.これらの化合物をNiめっき層の表面に吸着させる方法、この溶液を用いて、鋼帯に通電しながら電気的もしくは静電的に吸着させる方法、この溶液を噴霧または他の方法で塗布した後、乾燥させる方法などが可能である。溶媒は水が好ましいが、次に述べるように酸性液とすることがより好ましい。   As a second layer, a method of forming a layer composed of two kinds of organic compounds, that is, an amine compound and an organic compound having an S-containing functional group is not particularly limited, but the steel strip having the Ni plating layer described above as the first layer, It is immersed in a solution, preferably an aqueous solution, in which one or more amine compounds and one or more organic compounds having an S-containing functional group are dissolved. A method of adsorbing these compounds on the surface of the Ni plating layer, a method of using this solution to adsorb electrically or electrostatically while energizing a steel strip, and applying this solution by spraying or other methods, The method of drying etc. is possible. The solvent is preferably water, but more preferably an acidic solution as described below.

第2層を形成する方法として最も好ましいのは、電気亜鉛めっきの前処理として一般に実施されている酸洗処理に使用する酸洗浴(すなわち、酸性液)中に、1種以上のアミン化合物とS含有官能基を持つ1種以上の有機化合物とを添加し、酸洗と同時に、鋼帯表面(この表面は薄いNiめっき層を有するが、Niめっきは島状に不均一に付着しているため、部分的は鉄が表面露出している)にこれらの有機化合物を吸着させることによって、アミン化合物とS含有官能基を持つ有機化合物とからなる第2層を形成する方法である。酸洗浴にアミン化合物及びS含有官能基を持つ有機化合物を添加して、これらの化合物を酸洗浴中に溶解または懸濁させ、この酸洗浴中に鋼帯を通板することにより、酸洗を行いながら鋼帯表面にアミン化合物及びS含有官能基を持つ有機化合物を、NiやFeとの配位結合により強固に吸着させることによって、第2層が形成される。   The most preferable method for forming the second layer is one or more amine compounds and S in a pickling bath (that is, an acid solution) used in a pickling treatment generally performed as a pretreatment for electrogalvanizing. At least one organic compound having a functional group contained is added, and at the same time as pickling, the surface of the steel strip (this surface has a thin Ni plating layer, but Ni plating adheres unevenly in islands) This is a method of forming a second layer composed of an amine compound and an organic compound having an S-containing functional group by adsorbing these organic compounds to a partly exposed iron). By adding an amine compound and an organic compound having an S-containing functional group to the pickling bath, dissolving or suspending these compounds in the pickling bath, and passing a steel strip in the pickling bath, pickling is performed. The second layer is formed by firmly adsorbing an organic compound having an amine compound and an S-containing functional group on the surface of the steel strip by coordination with Ni or Fe.

特に酸洗により鋼帯のNiめっき表面に新鮮な金属鉄や金属ニッケルが露出した直後は、アミン化合物及びS含有官能基を持つ有機化合物が鉄またはニッケルに最も容易に配位結合して吸着されやすく、安定で均一な第2層が形成されやすいことを本発明者らは数々の実験により明らかにした。この方法であれば、既存の電気亜鉛めっき鋼帯生産設備の改造や追加のプロセスを必要とせず、既存設備のみで生産が可能であり、非常に効率的である。   Immediately after fresh metal iron or nickel is exposed on the surface of the Ni strip of the steel strip by pickling, amine compounds and organic compounds having S-containing functional groups are most easily coordinated and adsorbed to iron or nickel. The present inventors have clarified through experiments that it is easy to form a second layer that is easy, stable and uniform. This method is very efficient because it does not require modification of an existing electrogalvanized steel strip production facility or an additional process, and can be produced only with the existing facility.

酸洗浴へのアミン化合物とS含有官能基を持つ有機化合物の添加量は、酸洗処理とその後の水洗後に鋼帯表面に残留するこれらの有機化合物の付着量が、それらの総和で0.002mg/m2以上、1mg/m2以下となるように選択する。 The addition amount of the amine compound and the organic compound having an S-containing functional group to the pickling bath is such that the adhesion amount of these organic compounds remaining on the steel strip surface after pickling treatment and subsequent water washing is 0.002 mg in total. / M 2 or more and 1 mg / m 2 or less.

アミン化合物とS含有官能基を持つ有機化合物の割合は特に規定されないが、アミン化合物とS含有官能基を持つ有機化合物が、ともに最低の付着量である0.002mg/m2以上となるようにすることが好ましい。 The ratio of the amine compound and the organic compound having an S-containing functional group is not particularly limited, but both the amine compound and the organic compound having an S-containing functional group have a minimum adhesion amount of 0.002 mg / m 2 or more. It is preferable to do.

酸洗浴の種類は特に限定されないが、一般には塩酸または硫酸をベースとする酸浴である。本発明に従ってアミン化合物とS含有官能基を持つ有機化合物とを添加することを除けば、酸洗処理は電気亜鉛めっき鋼帯の酸洗処理に慣用されている条件で行うことができる。   The type of the pickling bath is not particularly limited, but is generally an acid bath based on hydrochloric acid or sulfuric acid. Except for adding an amine compound and an organic compound having an S-containing functional group in accordance with the present invention, the pickling treatment can be performed under conditions commonly used for pickling treatment of electrogalvanized steel strip.

第2層を形成するのに用いるアミン化合物とS含有官能基を持つ有機化合物を含有する酸性液(例、酸洗浴)中に、鋼帯表面に存在する鉄及びニッケルの酸化物の除去を促進する化合物を同時に添加すると、鉄及びニッケルの酸化物が除去されて、アミン化合物及びS含有官能基を持つ有機化合物が鋼帯上の鉄及びニッケルにより容易に吸着しやすくなるため、上層に電析する電気亜鉛めっきの結晶配向がさらに均一化することが期待できる。   Accelerates the removal of iron and nickel oxides present on the surface of steel strips in acidic liquids (eg pickling baths) containing amine compounds and organic compounds with S-containing functional groups used to form the second layer When the compound to be added is added at the same time, the oxides of iron and nickel are removed, and the organic compounds having amine compounds and S-containing functional groups are easily adsorbed by iron and nickel on the steel strip. It can be expected that the crystal orientation of the electrogalvanizing is further uniformized.

鋼帯表面に形成された鉄及びニッケルの酸化物の除去を促進させる化合物の例としては
一般的に酸洗促進剤と呼ばれる種類の化合物の中から適当なもの選んで使用することができる。酸洗促進剤としてこれまでに多様な無機および有機化合物が知られているが、本発明で使用するのに特に好ましいのは、飽和低級カルボン酸である。カルボン酸はモノカルボン酸とジ又はポリカルボン酸のいずれでもよい。適当な飽和低級カルボン酸の例は、ギ酸、酢酸、プロピオン酸、シュウ酸、マロン酸などである。
As an example of the compound that promotes the removal of iron and nickel oxides formed on the surface of the steel strip, a suitable one can be selected from a kind of compound generally called a pickling accelerator. Although various inorganic and organic compounds have been known so far as pickling accelerators, saturated lower carboxylic acids are particularly preferred for use in the present invention. The carboxylic acid may be either a monocarboxylic acid or a di- or polycarboxylic acid. Examples of suitable saturated lower carboxylic acids are formic acid, acetic acid, propionic acid, oxalic acid, malonic acid and the like.

チオール類やアミン類の中にも酸洗促進剤と呼ばれるものもある。しかし、本発明者らの検討によれば、前述した鉄及びニッケルの酸化物の除去を促進させる効果は必ずしも認められなかった。そこで、本発明では、これらは、アミン化合物またはS含有官能基を持つ有機化合物とみなし、これらと同時に、前述したような鉄及びニッケルの酸化物の除去を促進する化合物を添加するのが好ましい。   Some thiols and amines are called pickling accelerators. However, according to the study by the present inventors, the effect of promoting the removal of the iron and nickel oxides described above was not necessarily recognized. Therefore, in the present invention, these are regarded as amine compounds or organic compounds having an S-containing functional group, and at the same time, it is preferable to add a compound that promotes the removal of iron and nickel oxides as described above.

ここで鋼帯表面に存在する鉄及びニッケルの酸化物の除去を促進する化合物(=酸洗促進剤)とは、酸性浴中にその化合物を添加することで、非添加のときよりも酸洗が促進される化合物のことである。酸洗が促進されるかどうかの確認方法は、化合物非添加の酸の酸洗減量(一定サイズの鋼帯を一定濃度及び温度の酸液に一定時間浸漬した際の重量の減少量)を調査しておき、次に一定量の化合物を添加した際の酸洗減量を調査して、化合物を添加した際の酸洗減量が大きければその化合物は酸洗促進剤であると定義する。   Here, the compound (= pickling accelerator) that promotes the removal of iron and nickel oxides present on the surface of the steel strip means that the compound is added to the acid bath and pickled more than when it is not added. It is a compound that promotes. The method for confirming whether pickling is promoted is to investigate the acid pickling reduction amount of the compound-free acid (weight reduction when a steel strip of a certain size is immersed in an acid solution of a certain concentration and temperature for a certain period of time). Then, the amount of pickling loss when a certain amount of a compound is added is investigated, and if the amount of pickling loss when a compound is added is large, the compound is defined as a pickling accelerator.

酸洗浴または酸性液を用いて上述した第2層を形成した場合には、酸洗浴または酸性液による処理後に水洗を行う。この水洗は常法に従って実施すればよい。
上記のようにしてアミン化合物及びS含有官能基を持つ有機化合物からなる第2層を形成した後、その上層の第3層として、95%以上のZnを含有する電気亜鉛めっき層を形成する。電気亜鉛めっき層を形成する方法は従来の電気亜鉛めっき法と同様で良い。使用する電気亜鉛めっき浴は、硫酸浴でも塩酸浴でも良い。めっき浴の組成も限定されない。
When the above-described second layer is formed using a pickling bath or an acidic solution, washing is performed after the treatment with the pickling bath or the acidic solution. This washing with water may be performed according to a conventional method.
After forming the second layer composed of the amine compound and the organic compound having an S-containing functional group as described above, an electrogalvanized layer containing 95% or more of Zn is formed as the third layer above the second layer. The method for forming the electrogalvanized layer may be the same as the conventional electrogalvanizing method. The electrogalvanizing bath used may be a sulfuric acid bath or a hydrochloric acid bath. The composition of the plating bath is not limited.

めっき浴のZnイオン濃度が電気亜鉛めっきに一般的に利用されている程度の濃度であれば、電気亜鉛めっき層の形成が可能である。但し商業的に製造されている電気亜鉛めっき浴には、一般に母材鋼帯から溶出するFeイオンかなりの割合で溶けているのが普通であり、他の不純物金属イオンも微量溶解している。そのため、第3層として形成する電気亜鉛めっき層のZn含有量は95%以上とする。電気亜鉛めっき層のZn含有量が95%より低いと、表面外観や耐食性の低下が起こる。   If the Zn ion concentration of the plating bath is a concentration that is generally used for electrogalvanizing, an electrogalvanized layer can be formed. However, in a commercially produced electrogalvanizing bath, generally, a considerable proportion of Fe ions eluted from the base steel strip is usually dissolved, and other impurity metal ions are also dissolved in a small amount. Therefore, the Zn content of the electrogalvanized layer formed as the third layer is 95% or more. When the Zn content of the electrogalvanized layer is lower than 95%, the surface appearance and corrosion resistance are lowered.

電気亜鉛めっきによりZnめっき層を析出させる際の電流密度は特に規定されず、電気亜鉛めっき鋼帯の製造に一般利用されているのと同様の電流密度でよい。一般的には電流密度は10〜100A/dm2程度である。通電方法は連続通電でも断続的なパルス通電でも良い。 The current density at the time of depositing the Zn plating layer by electrogalvanizing is not particularly defined, and may be the same as that generally used for the production of the electrogalvanized steel strip. In general, the current density is about 10 to 100 A / dm 2. The energization method may be continuous energization or intermittent pulse energization.

第3層として形成する95%以上のZnを含有する電気亜鉛めっき層の付着量は特には限定されないが、好ましくは5g/m2以上、100g/m2以下である。電気亜鉛めっき層の付着量が5g/m2以上にならないと、十分な耐食性付与効果が得られない。また、電気亜鉛めっきは不均一に析出しやすく、付着量が少ないとムラになり表面外観を損ないやすいので、その意味でも付着量を5g/m2以上とするのが好ましい。一方、電気亜鉛めっき層の付着量が100g/m2を超えると、耐食性付与効果が飽和する上、電気の使用量が上昇し、不経済である。 The adhesion amount of the electrogalvanized layer containing 95% or more of Zn formed as the third layer is not particularly limited, but is preferably 5 g / m 2 or more and 100 g / m 2 or less. If the adhesion amount of the electrogalvanized layer is not more than 5 g / m 2 , sufficient corrosion resistance imparting effect cannot be obtained. In addition, electrogalvanization tends to deposit unevenly, and if the amount of adhesion is small, it becomes uneven and the surface appearance tends to be impaired. Therefore, the amount of adhesion is preferably 5 g / m 2 or more. On the other hand, if the adhesion amount of the electrogalvanized layer exceeds 100 g / m 2 , the corrosion resistance imparting effect is saturated and the amount of electricity used is increased, which is uneconomical.

こうして、第1層のNiめっき層、第2層の上述した有機化合物層の上に、第3層としてZn含有量が95質量%以上の電気亜鉛めっき層を形成することによって、電気亜鉛めっき層の表面の任意の部分で鋼帯の幅方向に連続した1cm2ずつの10個所の明度(L値)を測定した時の最大明度と最小明度の明度差の平均明度に対する割合が2%以下という、表面ムラや色調バラツキが極めて抑制された、美麗な外観を有する電気亜鉛めっき鋼帯が得られる。この明度差は好ましくは1%以下、さらに好ましくは0.5%以下である。明度差が小さいほど表面ムラや色調バラツキが小さくなり、外観の美麗さが増す。 Thus, an electrogalvanized layer having a Zn content of 95% by mass or more is formed as a third layer on the first Ni plating layer and the second organic compound layer described above. The ratio of the brightness difference between the maximum brightness and the minimum brightness to the average brightness is 2% or less when measuring the lightness (L value) at 10 locations of 1cm 2 each in the width direction of the steel strip at any part of the surface of the steel sheet Thus, an electrogalvanized steel strip having a beautiful appearance with extremely suppressed surface unevenness and color variation can be obtained. This lightness difference is preferably 1% or less, more preferably 0.5% or less. The smaller the brightness difference, the smaller the surface unevenness and color variation, and the more beautiful the appearance is.

第3層として形成したZn含有量が95%以上の電気亜鉛めっき層の上に、第4層としてクロムフリー皮膜を設けることにより、第1層及び第2層の上に第3層として生成させた電気亜鉛めっき皮膜の美麗な外観という特徴をよりいっそう引き立てることができる。   By providing a chromium-free film as the fourth layer on the electrogalvanized layer having a Zn content of 95% or more formed as the third layer, a third layer is formed on the first layer and the second layer. Further, the beautiful appearance of the electrogalvanized film can be further enhanced.

第4層のクロムフリー皮膜の種類は特に制限されず、電気亜鉛めっきの上層に形成するために提案されている各種のクロムを含まない皮膜を利用することができる。典型的なクロムフリー皮膜は、透明若しくは半透明の厚み1μm前後の薄膜の有機樹脂皮膜、無機系皮膜、または有機無機複合皮膜である。有機樹脂皮膜としては、ウレタン樹脂、ポリエステル樹脂、エポキシ樹脂、アクリル樹脂、ポリイミド樹脂、シリコーン樹脂などの樹脂皮膜が例示される。無機系皮膜としては、シリカ系皮膜(例、エチルシリケートまたはその加水分解物から形成)、リチウムシリケート系皮膜、リン酸アルミニウム系皮膜などが例示される。無機系皮膜中に有機樹脂を含有させると、有機無機複合皮膜となる。   The kind of the chromium-free coating of the fourth layer is not particularly limited, and various types of chromium-free coatings proposed for forming an upper layer of electrogalvanizing can be used. A typical chromium-free film is a transparent or translucent thin organic resin film, inorganic film, or organic-inorganic composite film having a thickness of about 1 μm. Examples of the organic resin film include resin films such as urethane resin, polyester resin, epoxy resin, acrylic resin, polyimide resin, and silicone resin. Examples of the inorganic coating include a silica coating (eg, formed from ethyl silicate or a hydrolyzate thereof), a lithium silicate coating, an aluminum phosphate coating, and the like. When an organic resin is contained in the inorganic film, an organic-inorganic composite film is obtained.

第4層のクロムフリー皮膜が存在すると、第3層の電気亜鉛めっき層に部分的にZnの結晶サイズや配向面の違いがあった場合、この部分の明度差が大きく助長されて、表面外観の差として目立ったものにしてしまうという性質がある。第3層の電気亜鉛めっき層の上に第4層として薄膜の透明なクロムフリー皮膜が存在すると、第3層までの場合に比べて表面の明度がL値で10ポイント程度低下するが、予め第3層に明度差があると、第3層の明部も暗部も等しく約10ポイントずつ低下するので、こうして生じた明度差がちょうど人間の目に認識されやすい明度差の領域になるためであると考えられる。   When the fourth layer of chromium-free coating is present, if there is a difference in Zn crystal size or orientation in the third electrogalvanized layer, the brightness difference in this part is greatly promoted and the surface appearance It has the property of making it stand out as a difference. When a thin transparent chrome-free film as the fourth layer is present on the third electrogalvanized layer, the surface brightness decreases by about 10 points in terms of L value compared to the case up to the third layer. If there is a lightness difference in the third layer, the bright part and dark part of the third layer are equally reduced by about 10 points, so that the lightness difference thus generated becomes a region of lightness difference that is easily recognized by human eyes. It is believed that there is.

本発明では、第3層の電気亜鉛めっき層における上記明度差が2%以内と非常に小さいため、クロムフリー皮膜の形成によりこの明度が肉眼でよりはっきり見えるようになっても、なお外観のムラや色調バラツキが目立ちにくく、美麗な外観が保持される。第4層を形成した後に上記と同様に求めた明度差の割合も2%以内であることが好ましく、より好ましくは1%以内である。   In the present invention, the brightness difference in the third electrogalvanized layer is as small as 2% or less, so even if the brightness becomes more clearly visible to the naked eye by the formation of a chromium-free film, the unevenness of the appearance is still present. And color variations are not noticeable, and a beautiful appearance is maintained. The ratio of the difference in brightness obtained in the same manner as described above after forming the fourth layer is also preferably within 2%, more preferably within 1%.

第4層のクロムフリー皮膜の形成方法は特に制限されない。一般的に採用されている、ロールコーターで塗布する方法、スプレーで塗布した後、ロールで絞って厚みをコントロールする方法、スプレーで塗布した後、水洗して不要成分を洗い流す方法等が利用できる。塗布後に必要に応じて乾燥または焼付けを行う。クロムフリー皮膜の厚みも制限されない。典型的には1μm前後であるが、皮膜材質によっては、それより薄く、または厚くすることができる。一般に厚みは3μm以下とすることが好ましい。第4層のクロムフリー皮膜には、所望により、防錆成分、耐候性付与成分、潤滑性付与成分、皮膜強化成分(架橋剤、シランカップリング剤)などから選んだ1種または2種以上を適量含有させてもよい。   The method for forming the chromium-free film of the fourth layer is not particularly limited. There are generally used methods such as a method of applying with a roll coater, a method of applying with a spray and then squeezing with a roll to control the thickness, a method of applying with a spray and then washing away unnecessary components by washing with water. Dry or bake as necessary after application. The thickness of the chromium-free film is not limited. Typically, it is around 1 μm, but depending on the film material, it can be made thinner or thicker. In general, the thickness is preferably 3 μm or less. The chromium-free coating of the fourth layer is optionally selected from one or more selected from rust preventive components, weather resistance imparting components, lubricity imparting components, coating strengthening components (crosslinking agents, silane coupling agents), etc. An appropriate amount may be contained.

以下では、本発明について実験例を示して説明する。
(1)電気亜鉛めっき鋼帯及びクロムフリー被覆鋼帯の試験片の作成
以下、全ての試験において、普通鋼(0.8mm厚さ)の冷延焼鈍鋼帯から170mm×170mmに切り出した鋼板をめっき母材として使用し、実際の連続電気めっきラインの流動状況を模擬した小型フローセルを用いて、めっき液を所定の流速で1方向に流動させながら電気めっきを実施した。
Hereinafter, the present invention will be described with reference to experimental examples.
(1) Preparation of test pieces of electrogalvanized steel strip and chromium-free coated steel strip Hereinafter, in all tests, steel plates cut into 170 mm x 170 mm from cold-rolled annealed steel strip of ordinary steel (0.8 mm thickness) Electroplating was carried out while flowing the plating solution in one direction at a predetermined flow rate using a small flow cell that was used as a plating base material and simulated the flow state of an actual continuous electroplating line.

まず、鋼帯から切りだした鋼板を、30℃の10%NaOH水溶液中で10A/dm2の電流密度での電解脱脂を5分間実施した後、水流中で2分間水洗することにより脱脂した。 First, the steel sheet cut out from the steel strip was degreased by performing electrolytic degreasing at a current density of 10 A / dm 2 in a 10% NaOH aqueous solution at 30 ° C. for 5 minutes and then washing with water for 2 minutes.

この脱脂した鋼板に、表1に記載の条件で両面にニッケルめっきを施し、第1層のNiめっき層を形成した。Niの付着量は、電流密度と通電時間の調整によりを所定の付着量になるようにした。鋼帯の連続電気めっきでは、めっき浴における液の流れ方向は鋼帯の圧延方向に並行、従って、鋼帯の幅方向に対して垂直方向になる。この状態を模擬するため、本実施例における実験では、鋼板の圧延方向がめっき浴の流動方向と平行になるように鋼板をセットしてめっきした。   This degreased steel plate was subjected to nickel plating on both surfaces under the conditions shown in Table 1 to form a first Ni plating layer. The adhesion amount of Ni was adjusted to a predetermined adhesion amount by adjusting the current density and the energization time. In the continuous electroplating of the steel strip, the flow direction of the liquid in the plating bath is parallel to the rolling direction of the steel strip, and thus is perpendicular to the width direction of the steel strip. In order to simulate this state, in the experiment in this example, the steel plate was set and plated so that the rolling direction of the steel plate was parallel to the flow direction of the plating bath.

Figure 0005662270
Figure 0005662270

Niめっきを施した鋼板に、Niめっき浴における液の流れ方向と垂直方向(前記の通り、この方向は鋼帯連続めっきでは鋼帯の幅方向に相当)に10mm角(1cm2)で連続して10ヶ所サンプリングし、酸洗後に原子吸光法にて測定したNi付着量を検量線とした蛍光X線法により、それぞれの個所のNi付着量を測定した。 A steel plate subjected to Ni plating is continuous at a 10 mm square (1 cm 2 ) in the direction perpendicular to the liquid flow direction in the Ni plating bath (as described above, this direction corresponds to the width direction of the steel strip in continuous strip plating). The amount of Ni deposited at each location was measured by the fluorescent X-ray method using the amount of Ni deposited as measured by the atomic absorption method after pickling.

測定した10ヶ所のNi付着量の平均値を平均付着量とした。また、10ヶ所の付着量の最大付着量と最小付着量から付着量差(=最大付着量−最小付着量)の平均付着量に対する割合(%)を付着量バラツキとして求めた。それらの結果を表4にまとめて示す。   The average value of the measured Ni deposits at 10 locations was defined as the average deposit. Further, the ratio (%) of the difference in adhesion amount (= maximum adhesion amount−minimum adhesion amount) with respect to the average adhesion amount from the maximum adhesion amount and the minimum adhesion amount at 10 locations was determined as the adhesion amount variation. The results are summarized in Table 4.

第1層のNiめっき層を形成した鋼板を、表2に示した組成を有する酸洗液に、25℃で5秒間浸漬した後、水洗(スプレー)して、酸洗を行うと同時に、鋼板の両面にアミン化合物とS含有官能基を持つ有機化合物とからなる第2層を形成した。表2中、N含有化合物及びS含有化合物とあるのは、それぞれアミン化合物及びS含有官能基を持つ有機化合物の意味である。   The steel plate on which the first Ni plating layer is formed is dipped in a pickling solution having the composition shown in Table 2 for 5 seconds at 25 ° C., then washed with water (spray), pickled, and simultaneously pickled. A second layer comprising an amine compound and an organic compound having an S-containing functional group was formed on both sides of the substrate. In Table 2, “N-containing compound” and “S-containing compound” mean an organic compound having an amine compound and an S-containing functional group, respectively.

Figure 0005662270
Figure 0005662270

第2層を形成した各鋼板について、島津製作所製ESCA3200を用いて求めたN及びSの強度から、N原子及びS原子の含有率(質量%)を測定した。また同一の鋼板(第1層だけを形成したもの)を、アミン化合物及びS含有官能基を持つ有機化合物をいずれも添加していない同一の酸洗液で同じ条件下で酸洗したものについて同じ方法でN及びSの強度を測定し、その時の測定値との差から、第2層中のアミン化合物およびS含有官能基を持つ有機化合物の付着量をそれぞれ決定した。結果は表4にまとめて示す。   About each steel plate which formed the 2nd layer, the content rate (mass%) of N atom and S atom was measured from the intensity | strength of N and S calculated | required using Shimadzu Corporation ESCA3200. In addition, the same steel plate (formed only with the first layer) is pickled under the same conditions with the same pickling solution to which neither an amine compound nor an organic compound having an S-containing functional group is added. The strength of N and S was measured by the method, and the adhesion amount of the amine compound and the organic compound having the S-containing functional group in the second layer was determined from the difference from the measured value at that time. The results are summarized in Table 4.

上記方法で第2層を形成した鋼板に、表3に示した条件で電気亜鉛めっきを施し、第3層となる電気亜鉛めっき層を鋼板の両面に形成した。使用しためっき浴は、試験のつど新しく建浴したので、電気亜鉛めっき層のZn含有量は99%以上、実質的には100%であった。また、第1層の形成時と同様に、鋼板の圧延方向がめっき浴の流動方向と平行になるように鋼板をセットしてめっきした。   The steel sheet on which the second layer was formed by the above method was electrogalvanized under the conditions shown in Table 3, and an electrogalvanized layer serving as the third layer was formed on both surfaces of the steel sheet. Since the plating bath used was newly constructed every time of the test, the Zn content of the electrogalvanized layer was 99% or more, substantially 100%. Further, similarly to the formation of the first layer, the steel plate was set and plated such that the rolling direction of the steel plate was parallel to the flow direction of the plating bath.

Figure 0005662270
Figure 0005662270

電気亜鉛めっき層の付着量は、めっき後の鋼板を所定の大きさに切断して得た試験片を、インヒビター入りの希塩酸に浸漬して酸洗し、電気亜鉛めっきのみを溶解した後、重量法(酸洗前後の質量の差)により求めた。   The adhesion amount of the electrogalvanized layer was determined by immersing a test piece obtained by cutting the plated steel sheet into a predetermined size and immersing it in dilute hydrochloric acid containing an inhibitor, dissolving only the electrogalvanized, It was determined by the method (mass difference before and after pickling).

一部の鋼板については、電気亜鉛めっきを実施して第3層を形成した後、その片面にクロムフリーウレタン樹脂塗料(クリア塗料)を、焼付け後の膜厚が約1μmになるようにバーコーターで塗布し、100℃の最高到達板温(PMT)で焼付けを行い、室温まで放置冷却して、第4層のクロムフリー皮膜を形成した。   For some steel plates, after electrogalvanizing to form the third layer, a chrome-free urethane resin paint (clear paint) is applied to one side of the steel sheet, and the bar coater is adjusted so that the film thickness after baking is about 1 μm. The film was baked at a maximum plate temperature (PMT) of 100 ° C. and allowed to cool to room temperature to form a fourth layer of a chromium-free film.

第4層の付着量は、予め重量法で測定した既知膜厚の有機樹脂(クロムフリーウレタン樹脂)にて作成した検量線を使用した蛍光X線での測定結果から求めた。その結果を表4に示す。   The adhesion amount of the 4th layer was calculated | required from the measurement result in the fluorescent X ray using the analytical curve created with the organic resin (chromium free urethane resin) of the known film thickness measured beforehand by the gravimetric method. The results are shown in Table 4.

Figure 0005662270
Figure 0005662270

(2)性能調査
(2−1)めっきムラ
上記で作成した第1層〜第3層を有する電気亜鉛めっき鋼板または第1層〜第4層を有するクロムフリー被覆鋼板について、冷延鋼帯の幅方向に相当する方向(すなわち、電気亜鉛めっき浴における液流れ方向に垂直な方向)に連続した10mm角(1cm2)の大きさの10ヶ所の領域において、スガ試験機社製色差計SM−7−IS−2Bにより、ハンター表色系の明度(L値)を測定し、その10個の測定値から平均明度、最小明度、最大明度及び明度のバラツキ(明度差(=最大明度−最小明度)の平均明度に対する割合(%))を算出した。
(2) Performance investigation (2-1) Plating unevenness About the electrogalvanized steel sheet having the first to third layers or the chromium-free coated steel sheet having the first to fourth layers created above, In 10 areas of 10 mm square (1 cm 2 ) continuous in the direction corresponding to the width direction (that is, the direction perpendicular to the liquid flow direction in the electrogalvanizing bath), the color difference meter SM- manufactured by Suga Test Instruments Co., Ltd. The brightness (L value) of the Hunter color system is measured by 7-IS-2B, and the average brightness, the minimum brightness, the maximum brightness, and the brightness variation (lightness difference (= maximum brightness-minimum brightness) from the 10 measured values. ) To the average brightness (%)) was calculated.

明度のばらつきの程度と目視で確認できためっきムラの程度を照らし合わせて以下の様に評点をつけた。
○:明度のバラツキが≦2%(目視でムラが認められない)
×:明度のバラツキが>2%(目視でムラが認められる)。
The following ratings were given in light of the degree of variation in brightness and the degree of plating unevenness that could be visually confirmed.
○: Lightness variation is ≦ 2% (unevenness is not visually recognized)
X: Lightness variation is> 2% (unevenness is observed visually).

(2−2)めっき密着性
上記の手法で第3層(電気亜鉛めっき)までを形成した電気亜鉛めっき鋼板を直径90mmの円形に打ち抜き、その質量を測定してW1とした。この鋼板に成型油を塗油し、内径50mm、肩R5mm、高さ25mmの円筒成形を実施した後、溶剤脱脂を行った。得られた成形材の円筒壁面部の外面にセロハンテープを張ってから剥離し、再び質量を測定してW2とした。W1−W2の値をめっきの剥離量として記録し、次のように評価した。
(2-2) Plating adhesion The electrogalvanized steel sheet formed up to the third layer (electrogalvanizing) by the above method was punched into a circle having a diameter of 90 mm, and its mass was measured to be W1. Molding oil was applied to the steel sheet, and after performing cylindrical molding with an inner diameter of 50 mm, a shoulder R of 5 mm, and a height of 25 mm, solvent degreasing was performed. A cellophane tape was applied to the outer surface of the cylindrical wall surface portion of the obtained molding material, and then peeled off. The mass was measured again to obtain W2. The value of W1-W2 was recorded as the amount of peeling of plating, and evaluated as follows.

○:めっき剥離量≦5mg(めっきの実質的な剥離無し)
×:めっき剥離量>5mg(めっきの実質的な剥離有り)
以上の試験結果を表5に示す。
○: Plating peeling amount ≦ 5 mg (no substantial peeling of plating)
×: Plating peeling amount> 5 mg (with substantial peeling of plating)
The test results are shown in Table 5.

Figure 0005662270
Figure 0005662270

表3〜表5からわかるように、発明例では、明度差が2%以内と明度のバラツキが小さく、目視でのムラも認められなかった。クロムフリー被覆を施したNo.8、9では、この被覆がない他の例に比べて明度が全体に10%程度低くなったが、明度差は2%以内にとどまっており、美麗な外観を保持していた。   As can be seen from Tables 3 to 5, in the inventive examples, the lightness difference was within 2%, the lightness variation was small, and no visual unevenness was observed. In Nos. 8 and 9 with the chrome-free coating, the brightness was about 10% lower than the other examples without this coating, but the difference in brightness remained within 2%, giving it a beautiful appearance. Was holding.

これに対し、アミン化合物とS含有官能基を持つ有機化合物からなる第2層の付着量が少なすぎたNo.10では、明度差が2%を超え、目視で外観にムラが認められた。一方、この第2層の付着量が多すぎたNo.11では、外観は良好であったが、電気亜鉛めっき層の密着性が低下した。また、第1層のNiめっき層の付着量が少なすぎたNo.12でも、やはり電気亜鉛めっき層の密着性が低下した。   On the other hand, in No. 10 in which the adhesion amount of the second layer composed of an amine compound and an organic compound having an S-containing functional group was too small, the brightness difference exceeded 2%, and the appearance was visually uneven. On the other hand, in No. 11 in which the amount of the second layer deposited was too large, the appearance was good, but the adhesion of the electrogalvanized layer was lowered. Further, even with No. 12 in which the amount of the first Ni plating layer deposited was too small, the adhesiveness of the electrogalvanized layer also decreased.

Claims (9)

鋼帯の少なくとも一方の面において、電気亜鉛めっき層の下に、任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであるNiめっき層を有する電気亜鉛めっき鋼帯であって、該電気亜鉛めっき層の表面の任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつの10個所の明度(L値)を測定した時の最大明度と最小明度の明度差の平均明度に対する割合が2%以下であることを特徴とする電気亜鉛めっき鋼帯。 On at least one surface of the steel strip, the average amount of deposit when 10 deposits of 10 mm square ( 1 cm 2 ) continuous in the width direction of the steel strip at an arbitrary portion under the electrogalvanized layer is measured. An electrogalvanized steel strip having a Ni plating layer of 1 to 30 mg / m 2 , each 10 mm square ( 1 cm 2 ) continuous in the width direction of the steel strip at any part of the surface of the electrogalvanized layer An electrogalvanized steel strip characterized in that the ratio of the brightness difference between the maximum brightness and the minimum brightness when the brightness (L value) at 10 locations is measured is 2% or less. 鋼帯の少なくとも一方の面において、電気亜鉛めっき層の下に、任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであるNiめっき層を有する電気亜鉛めっき鋼帯の上層にクロムフリー被覆を施したクロムフリー被覆電気亜鉛めっき鋼帯であって、該クロムフリー被覆の表面の任意の部分で鋼帯の幅方向に連続した10mm角(1cm ずつの10個所の明度(L値)を測定した時の最大明度と最小明度の明度差の平均明度に対する割合が2%以下であることを特徴とするクロムフリー被覆電気亜鉛めっき鋼帯。 On at least one surface of the steel strip, the average amount of deposit when 10 deposits of 10 mm square ( 1 cm 2 ) continuous in the width direction of the steel strip at an arbitrary portion under the electrogalvanized layer is measured. A chrome-free coated electrogalvanized steel strip having a chrome-free coating applied to an upper layer of an electrogalvanized steel strip having a Ni-plated layer of 1 to 30 mg / m 2 , wherein any portion of the surface of the chrome-free coating The ratio of the lightness difference between the maximum lightness and the minimum lightness when measuring 10 lightness (L value) at 10 mm square ( 1 cm 2 ) continuous in the width direction of the steel strip to the average lightness is 2% or less. Features a chrome-free coated electrogalvanized steel strip. 鋼帯の少なくとも一方の面において、下から順に、任意の部分で鋼帯の幅方向に連続して10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであり、かつその時の最大付着量と最小付着量の付着量差の平均付着量に対する割合が10%以上であるNiめっき層からなる第1層と、それぞれ1種以上のアミン化合物およびS(硫黄)含有官能基を持つ有機化合物からなり、付着量がこれらの有機化合物の総量で0.002mg/m以上、1mg/m以下である第2層と、95質量%以上のZnを含有する電気亜鉛めっき層からなる第3層と、を有する、請求項1記載の電気亜鉛めっき鋼帯。 On at least one surface of the steel strip, the average amount of deposit is 1 to 30 mg when the amount of deposit is measured in 10 mm squares ( 1 cm 2 ) in 10 mm square ( 1 cm 2 ) continuously in any part in the width direction in order from the bottom. / M 2 , and the ratio of the difference between the maximum adhesion amount and the minimum adhesion amount at that time to the average adhesion amount is 10% or more, a first layer composed of a Ni plating layer, and each one or more amine compounds and A second layer composed of an organic compound having an S (sulfur) -containing functional group, the adhesion amount of which is 0.002 mg / m 2 or more and 1 mg / m 2 or less in terms of the total amount of these organic compounds, and 95% by mass or more of Zn The electrogalvanized steel strip according to claim 1, further comprising a third layer made of an electrogalvanized layer containing 鋼帯の少なくとも一方の面において、下から順に、任意の部分で鋼帯の幅方向に連続して10mm角(1cm ずつ10個所の付着量を測定した時の平均付着量が1〜30mg/mであり、かつその時の最大付着量と最小付着量の付着量差の平均付着量に対する割合が10%以上であるNiめっき層からなる第1層と、それぞれ1種以上のアミン化合物およびS(硫黄)含有官能基を持つ有機化合物からなり、付着量がこれらの有機化合物の総量で0.002mg/m以上、1mg/m以下である第2層と、95質量%以上のZnを含有する電気亜鉛めっき層からなる第3層と、クロムフリー皮膜からなる第4層とを有する、請求項2記載のクロムフリー被覆電気亜鉛めっき鋼帯。 On at least one surface of the steel strip, the average amount of deposit is 1 to 30 mg when the amount of deposit is measured in 10 mm squares ( 1 cm 2 ) in 10 mm square ( 1 cm 2 ) continuously in any part in the width direction in order from the bottom. / M 2 , and the ratio of the difference between the maximum adhesion amount and the minimum adhesion amount at that time to the average adhesion amount is 10% or more, a first layer composed of a Ni plating layer, and each one or more amine compounds and A second layer composed of an organic compound having an S (sulfur) -containing functional group, the adhesion amount of which is 0.002 mg / m 2 or more and 1 mg / m 2 or less in terms of the total amount of these organic compounds, and 95% by mass or more of Zn The chromium-free-coated electrogalvanized steel strip according to claim 2, comprising a third layer made of an electrogalvanized layer containing bismuth and a fourth layer made of a chromium-free coating. アミン化合物がポリエチレンイミン及びその誘導体から選ばれた少なくとも1種の化合物である、請求項3または4記載の電気亜鉛めっき鋼帯。   The electrogalvanized steel strip according to claim 3 or 4, wherein the amine compound is at least one compound selected from polyethyleneimine and derivatives thereof. S含有官能基を持つ有機化合物がチオ尿素及びその誘導体から選ばれた少なくとも1種の化合物である請求項3〜5のいずれかに記載の電気亜鉛めっき鋼帯。   The electrogalvanized steel strip according to any one of claims 3 to 5, wherein the organic compound having an S-containing functional group is at least one compound selected from thiourea and derivatives thereof. 前記第2層が、アミン化合物とS含有官能基を持つ有機化合物とを含有する酸性液に浸漬することによって鋼帯表面にアミン化合物とS含有官能基を持つ有機化合物とを吸着させることにより形成された層である、請求項3〜6のいずれかに記載の電気亜鉛めっき鋼帯。   The second layer is formed by adsorbing an amine compound and an organic compound having an S-containing functional group on the surface of the steel strip by dipping in an acidic solution containing an amine compound and an organic compound having an S-containing functional group. The electrogalvanized steel strip according to any one of claims 3 to 6, which is a formed layer. 前記酸性液が、アミン化合物とS含有官能基を持つ有機化合物とに加えて、鉄及びニッケルの酸化物の除去を促進する化合物を含有している、請求項7記載の電気亜鉛めっき鋼帯。   The electrogalvanized steel strip according to claim 7, wherein the acidic liquid contains a compound that promotes removal of oxides of iron and nickel in addition to an amine compound and an organic compound having an S-containing functional group. 前記鉄及びニッケルの酸化物の除去を促進する化合物が、飽和低級カルボン酸及びその塩から選ばれた少なくとも1種の化合物である、請求項8に記載の電気亜鉛めっき鋼帯。   The electrogalvanized steel strip according to claim 8, wherein the compound that promotes removal of iron and nickel oxides is at least one compound selected from saturated lower carboxylic acids and salts thereof.
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