JP5658997B2 - Charged particle beam drawing apparatus and drawing data generation method - Google Patents

Description

  In the present invention, a pattern corresponding to a figure included in drawing data is formed by irradiating a sample having a resist coated on the upper surface with a charged particle beam transmitted through the first shaping aperture and the second shaping aperture. The present invention relates to a charged particle beam drawing apparatus for drawing on a resist of a sample and a drawing data generation method for generating drawing data used in the charged particle beam drawing apparatus.

  Conventionally, a pattern corresponding to a figure included in drawing data is obtained by irradiating a sample coated with a resist with a charged particle beam transmitted through the first shaping aperture and the second shaping aperture. There is known a charged particle beam drawing apparatus for drawing on a resist. An example of this type of charged particle beam drawing apparatus is described in FIG. 1 of Patent Document 1 (Japanese Patent Laid-Open No. 9-293669).

  In paragraph 0053 of Patent Document 1, a drawing data generation process for converting the format of design data and generating drawing data is described. Further, in FIG. 4 and paragraphs 0057 to 0060 of Patent Document 1, the shape of a figure having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the sample resist is charged to the sample resist. A process (arbitrary angle division process) for changing to match the horizontal sectional shape of the particle beam is described.

Japanese Patent Laid-Open No. 9-293669

  By the way, the design data may include a figure that is approximately expressed by a polygon figure having a large number of minute sides, such as an elliptic figure. In that case, in conventional general drawing data generation processing, arbitrary angle division processing is performed for each of a large number of minute sides of an elliptical figure, and as a result, the figure included in the drawing data after format conversion is processed. There has been a problem that the number increases and the amount of drawing data increases.

  In view of the above-described problems, the present invention provides a charged particle beam drawing apparatus and a drawing data generation method capable of reducing the number of figures included in drawing data after format conversion and reducing the amount of drawing data. The purpose is to do.

According to one aspect of the present invention, the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture is irradiated on the sample having the resist coated on the upper surface thereof, thereby being included in the drawing data. If the design data contains a drawing unit that draws a pattern corresponding to the figure on the sample resist and a figure that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the sample resist, An arbitrary angle dividing unit that executes processing for changing the shape of the figure included in the design data so that the shape of the figure after execution matches the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample; Included in the design data before the processing by the format conversion unit that converts the format of the design data to generate drawing data and the arbitrary angle division unit A polygonal shape having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated on the resist of the sample, and a graphic shape changing unit that executes processing for reducing the number of vertices. A charged particle beam drawing apparatus is provided.
Further, according to one aspect of the present invention, the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture is irradiated to the sample having the resist coated on the upper surface thereof, thereby being included in the drawing data. A drawing unit that draws a pattern corresponding to the figure on the resist of the sample;
When the polygon data having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, the polygon graphic included in the design data is divided. An intermediate data generation unit for generating a plurality of adjacent trapezoidal figures having a common side and generating intermediate data;
When the intermediate data includes a figure having a shape that does not match the horizontal cross-sectional shape of the charged particle beam applied to the sample resist, the shape of the figure after processing is applied to the sample resist. An arbitrary angle dividing unit that executes a process of changing the shape of the figure included in the intermediate data so as to match the horizontal sectional shape of the charged particle beam to be
A format conversion unit that converts the format of the intermediate data to generate drawing data;
A plurality of adjacent trapezoidal figures having shapes that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample among the figures included in the intermediate data before execution of processing by the arbitrary angle dividing unit On the other hand, a graphic shape changing unit that deletes the common side and executes a process of changing the plurality of adjacent trapezoidal figures into one trapezoidal figure is provided.

Alternatively, the pattern corresponding to the figure included in the drawing data is irradiated by irradiating the sample having the resist coated on the upper surface with a charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture. A drawing section for drawing on the resist of
By dividing the polygonal figure included in the design data when the polygonal figure having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, An intermediate data generation unit for generating a plurality of adjacent trapezoidal figures having a common side and generating intermediate data;
When the intermediate data includes a plurality of adjacent trapezoidal figures that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample, the shape of the figure after execution of the process is An arbitrary angle dividing unit that executes a process of changing the shape of a plurality of adjacent trapezoidal figures included in the intermediate data so as to match the horizontal sectional shape of the charged particle beam irradiated to the resist;
A format conversion unit that converts the format of the intermediate data to generate drawing data;
For a plurality of adjacent figures whose shape change processing has been executed by the arbitrary angle division unit, the figure shape is changed to a grid shape, merge processing is performed to reduce the number of figures, and merging There is provided a charged particle beam drawing apparatus comprising a graphic shape changing unit that executes a process of removing a portion where a plurality of figures overlap with the process.

Alternatively, the pattern corresponding to the figure included in the drawing data is irradiated by irradiating the sample having the resist coated on the upper surface with a charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture. A drawing section for drawing on the resist of
By dividing the polygonal figure included in the design data when the polygonal figure having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, An intermediate data generation unit for generating a plurality of adjacent trapezoidal figures having a common side and generating intermediate data;
A format conversion unit that converts the format of the intermediate data to generate drawing data;
When a plurality of adjacent trapezoid figures that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample are included in the intermediate data, the figure is compared with the plurality of adjacent trapezoid figures. A graphic shape changing unit for executing a merge process for changing the shape to a grid shape and reducing the number of figures, and for removing a portion where a plurality of figures overlap with the merge process; A charged particle beam writing apparatus is provided.

According to another aspect of the present invention, the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture is irradiated onto the sample having the resist coated on the upper surface thereof, thereby being included in the drawing data. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus that draws a pattern corresponding to a figure on a sample resist, it does not match the horizontal sectional shape of the charged particle beam irradiated to the sample resist If the design data includes polygonal figures with shapes, determine whether the conditions for reducing the number of vertices of the polygonal figure are satisfied, and then determine the number of vertices of the polygonal figure. If the conditions for reduction are satisfied, the figure that executed the process to reduce the number of vertices of the polygon figure and then the process to reduce the number of vertices Drawing data characterized by executing processing to change the shape so as to match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample, and generating drawing data by converting the format of the design data A generation method is provided.
Moreover, according to another aspect of the present invention, the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture is irradiated onto the sample having the resist coated on the upper surface thereof, thereby rendering the drawing data. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus for drawing a pattern corresponding to an included figure on a resist of the sample,
When the polygon data having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, the polygon graphic included in the design data is divided. By generating a plurality of adjacent trapezoid figures having a common side, and generating intermediate data including data of the plurality of adjacent trapezoid figures,
When generating the intermediate data, the data of the plurality of adjacent trapezoidal figures are continuously defined on the intermediate data, and a polygonal figure before division is applied to a charged particle beam irradiated onto the resist of the sample. The information indicating that the shape does not match the horizontal cross-sectional shape is included in the data of the plurality of adjacent trapezoidal figures,
To delete a common side of the plurality of adjacent trapezoidal figures having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample among the figures included in the intermediate data Whether or not the above conditions are satisfied,
If the condition for deleting the common side is satisfied, execute the process of deleting the common side,
The shape of the plurality of adjacent trapezoidal figures that have been subjected to the process of deleting the common side is changed to one trapezoidal figure so as to match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample. In addition to executing processing, drawing data is generated by converting the format of the intermediate data.

Alternatively, the pattern corresponding to the figure included in the drawing data is irradiated by irradiating the sample coated with the resist with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus for drawing on a resist of
By dividing the polygonal figure included in the design data when the polygonal figure having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, Generating a plurality of adjacent trapezoid figures having a common side, and generating intermediate data including data of a plurality of adjacent trapezoid figures,
When generating the intermediate data, a plurality of adjacent trapezoidal figures are defined continuously on the intermediate data, and the polygonal figure before division is irradiated with the horizontal cross-sectional shape of the charged particle beam irradiated onto the resist of the sample. Include information indicating that the shape does not match in the data of multiple adjacent trapezoid figures,
Of the figures included in the intermediate data, the figure shape is changed to the grid shape for multiple adjacent trapezoid figures that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample. Then, a merge process for reducing the number of figures is executed, a process for removing a portion where a plurality of figures overlap with the merge process is executed, and at the same time, the intermediate data format is converted to generate drawing data. A drawing data generation method is provided.

  According to the present invention, the number of figures included in drawing data after format conversion can be reduced, and the amount of drawing data can be reduced.

1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to a first embodiment. FIG. 2 is a detailed view of a control computer 10b1 of the control unit 10b shown in FIG. It is a figure for demonstrating an example of the pattern P which can be drawn on the resist of the sample M by one shot of the charged particle beam 10a1b in the charged particle beam drawing apparatus 10 of 1st Embodiment. It is the figure which showed roughly an example of the drawing data D2 shown in FIG. It is a figure for demonstrating the arbitrary angle division | segmentation process performed by the arbitrary angle division | segmentation part 10b1a2 of the drawing data generation part 10b1a. It is a figure for demonstrating the vertex number reduction process of the arbitrary angle figures performed by the figure shape change part 10b1a1 of the drawing data generation part 10b1a. It is a figure for demonstrating the vertex number reduction process of the arbitrary angle figures performed by the figure shape change part 10b1a1 of the drawing data generation part 10b1a. Data of the polygonal figure FGPL before the processing for reducing the number of vertices of an arbitrary angle figure by the figure shape changing part 10b1a1 of the drawing data generating part 10b1a and the arbitrary angle figure by the figure shape changing part 10b1a1 of the drawing data generating part 10b1a It is the figure which showed the data of polygon figure FGPL 'after the number-of-vertex reduction process of this was performed. It is the figure which showed the flowchart of the vertex number reduction process of the arbitrary angle figures performed by the figure shape change part 10b1a1 of the drawing data generation part 10b1a. Drawing data generation processing of the charged particle beam drawing apparatus 10 of the first embodiment in which processing for reducing the number of vertices of a polygonal figure having a large number of minute sides and a polygonal figure having a large number of minute sides are performed. It is a figure for comparing and explaining the drawing data generation process in which the process which reduces the number of vertices is not performed. Drawing data generation processing of the charged particle beam drawing apparatus 10 of the first embodiment in which processing for reducing the number of vertices of a polygonal figure having a large number of minute sides and a polygonal figure having a large number of minute sides are performed. It is a figure for comparing and explaining the drawing data generation process in which the process which reduces the number of vertices is not performed. A vertex number reduction process executed by the graphic shape changing unit 10b1a1 of the drawing data generating unit 10b1a for the polygonal graphic (arbitrary angle graphic) FGPL2 in which the X-axis direction dimension Lx and the Y-axis direction dimension Ly are smaller than the threshold value Sm will be described. FIG. It is detail drawing of the control computer 10b1 of the charged particle beam drawing apparatus 10 of 3rd Embodiment. Intermediate data generation processing executed by the intermediate data generation unit 10b1a4 of the drawing data generation unit 10b1a of the charged particle beam drawing apparatus 10 of the third embodiment and a plurality of adjacent trapezoidal figures FGPLa executed by the figure shape changing unit 10b1a1 , FGPLb, FGPLc, and FGPLd are diagrams for explaining common side reduction processing. Data of the polygonal figure FGPL and the intermediate data generation process before the intermediate data generation process by the intermediate data generation unit 10b1a4 of the drawing data generation unit 10b1a of the charged particle beam drawing apparatus 10 of the third embodiment are executed. It is the figure which showed the data of the several trapezoid figure FGPLa, FGPLb, FGPLc, and FGPLd mutually adjacent after being done. It is a detailed view of the control computer 10b1 of the charged particle beam drawing apparatus 10 of the fourth embodiment. In order to describe an arbitrary angle division process executed by the arbitrary angle division unit 10b1a2 of the drawing data generation unit 10b1a of the charged particle beam drawing apparatus 10 of the fourth embodiment and a graphic shape change process executed by the graphic shape change unit 10b1a1. FIG. In order to describe an arbitrary angle division process executed by the arbitrary angle division unit 10b1a2 of the drawing data generation unit 10b1a of the charged particle beam drawing apparatus 10 of the fourth embodiment and a graphic shape change process executed by the graphic shape change unit 10b1a1. FIG.

A charged particle beam drawing apparatus according to a first embodiment of the present invention will be described below. FIG. 1 is a schematic configuration diagram of a charged particle beam drawing apparatus 10 according to the first embodiment. FIG. 2 is a detailed view of the control computer 10b1 of the control unit 10b shown in FIG. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, the sample M is irradiated with a charged particle beam 10a1b such as a mask, a wafer, or the like on which a resist is applied. A drawing unit 10a for drawing a target pattern on the resist is provided. In the charged particle beam drawing apparatus 10 of the first embodiment, for example, an electron beam is used as the charged particle beam 10a1b. However, in the charged particle beam drawing apparatus 10 of the second embodiment, instead of the charged particle beam 10a1b, for example, It is also possible to use a charged particle beam other than an electron beam such as an ion beam.
In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, a charged particle gun 10a1a and deflectors 10a1c, 10a1d, 10a1e, which deflect the charged particle beam 10a1b irradiated from the charged particle gun 10a1a, 10a1f and a movable stage 10a2a on which a sample M to be drawn by the charged particle beam 10a1b deflected by the deflectors 10a1c, 10a1d, 10a1e, and 10a1f is placed in the drawing unit 10a.

Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, a movable stage 10a2a on which a sample M is placed is placed in a drawing chamber 10a2 that constitutes a part of the drawing unit 10a. Has been placed. For example, the movable stage 10a2a is configured to be movable in the X-axis (see FIG. 3) direction (left-right direction in FIG. 1) and the Y-axis (see FIG. 3) direction (front side-back side direction in FIG. 1). Yes. Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 1, an optical barrel 10a1 that constitutes a part of the drawing unit 10a includes a charged particle gun 10a1a and deflectors 10a1c, 10a1d, 10a1e, 10a1f, lenses 10a1g, 10a1h, 10a1i, 10a1j, 10a1k, a first molded aperture 10a1l, and a second molded aperture 10a1m are arranged.
Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 2, a drawing data generation unit 10b1a, a shot data generation unit 10b1g, a deflection control unit 10b1h, and a stage control unit 10b1i are controlled by a control computer. 10b1. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 2, when the design data D1 is input to the control computer 10b1 of the charged particle beam drawing apparatus 10, drawing is performed by the drawing data generation unit 10b1a. Data D2 is generated. Next, shot data for irradiating the charged particle beam 10a1b for drawing a pattern on the resist of the sample M is generated by the shot data generation unit 10b1g based on the drawing data D2. For example, shot data generated by the shot data generation unit 10b1g is sent to the deflection control unit 10b1h. Next, as shown in FIGS. 1 and 2, the deflectors 10a1c, 10a1d, 10a1e, and 10a1f are controlled by the deflection controller 10b1h based on the shot data, and as a result, the charged particle beam 10a1b from the charged particle gun 10a1a becomes the sample. The desired position of the M resist is irradiated.

Specifically, in the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 1 and 2, a deflection control circuit 10b1h uses a deflection control circuit based on shot data generated by the shot data generation unit 10b1g. By controlling the blanking deflector 10a1c via 10b2, the charged particle beam 10a1b irradiated from the charged particle gun 10a1a transmits, for example, the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l. The sample M is irradiated, or whether the sample M is not irradiated by being blocked by a portion other than the opening 10a1l ′ of the first shaping aperture 10a1l, for example, is switched. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the irradiation time of the charged particle beam 10a1b can be controlled by controlling the blanking deflector 10a1c.
In the charged particle beam drawing apparatus 10 according to the first embodiment, as shown in FIGS. 1 and 2, the deflection control unit 10b1h sets the deflection control circuit 10b3 based on the shot data generated by the shot data generation unit 10b1g. The charged particle beam 10a1b transmitted through the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l is deflected by the beam size variable deflector 10a1d. Is done. Next, a part of the charged particle beam 10a1b deflected by the beam size variable deflector 10a1d is transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m. That is, in the charged particle beam drawing apparatus 10 according to the first embodiment, the charge applied to the resist of the sample M is adjusted by adjusting the amount and direction of deflection of the charged particle beam 10a1b by the beam size variable deflector 10a1d. The horizontal cross-sectional shape and size of the particle beam 10a1b can be adjusted.

FIG. 3 is a diagram for explaining an example of a pattern P that can be drawn on the resist of the sample M by one shot of the charged particle beam 10a1b in the charged particle beam drawing apparatus 10 of the first embodiment. In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, a pattern P (see FIG. 3A) is drawn on the resist of the sample M by the charged particle beam 10a1b. At this time, a part of the charged particle beam 10a1b irradiated from the charged particle gun 10a1a (see FIG. 1) is transmitted through, for example, a square opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l. As a result, the horizontal sectional shape of the charged particle beam 10a1b transmitted through the opening 10a1l ′ of the first shaping aperture 10a1l becomes, for example, a substantially square shape. Next, a part of the charged particle beam 10a1b transmitted through the opening 10a1l ′ of the first shaping aperture 10a1l is allowed to pass through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m.
Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, the aperture 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l is transmitted. By deflecting the charged particle beam 10a1b by the deflector 10a1d (see FIG. 1), the horizontal sectional shape of the charged particle beam 10a1b that can be transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m is obtained. For example, it can be rectangular (square or rectangular), for example, an isosceles triangle. Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, the aperture 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m is transmitted. The charged particle beam 10a1b is continuously irradiated to a predetermined position of the resist of the sample M for a predetermined irradiation time, so that the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m is transmitted through the sample. A pattern P (see FIG. 3A) having substantially the same shape as the horizontal sectional shape of the charged particle beam 10a1b irradiated to the M resist can be drawn on the resist of the sample M.

That is, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 3A, the aperture 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l is transmitted. By controlling the amount and orientation of the charged particle beam 10a1b deflected by the deflector 10a1d (see FIG. 1) by the deflection control unit 10b1h (see FIG. 2), for example, FIG. 3 (B), FIG. 3 (C) FIG. 3D shows a substantially rectangular (square or rectangular) pattern P having a set of sides parallel to the X axis and a set of sides parallel to the Y axis, as shown in FIGS. (F), a side parallel to the X axis and a side parallel to the Y axis as shown in FIGS. 3 (G), 3 (H) and 3 (I) form an angle of 45 ° with the X axis. A roughly isosceles triangular pattern P having a hypotenuse and charged particles It can be drawn on the resist of the sample M with a single shot over arm 10A1b.
Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on the shot data generated by the shot data generation unit 10b1g, the deflection control circuit 10b1h performs a deflection control circuit. By controlling the main deflector 10a1e via 10b4, the charged particle beam 10a1b transmitted through the opening 10a1m ′ (see FIG. 3A) of the second shaping aperture 10a1m is deflected by the main deflector 10a1e. . Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on the shot data generated by the shot data generation unit 10b1g, the deflection control circuit 10b1h performs a deflection control circuit. By controlling the sub deflector 10a1f via 10b5, the charged particle beam 10a1b deflected by the main deflector 10a1e is further deflected by the sub deflector 10a1f. That is, in the charged particle beam drawing apparatus 10 according to the first embodiment, for example, the amount and direction of the charged particle beam 10a1b deflected by the main deflector 10a1e and the sub deflector 10a1f are adjusted to adjust the resist of the sample M. It is possible to adjust the irradiation position of the charged particle beam 10a1b irradiated to the beam.
Furthermore, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 1 and 2, for example, based on shot data generated by the shot data generation unit 10b1g, a stage control circuit is provided by the stage control unit 10b1i. The movement of the movable stage 10a2a is controlled via 10b6.

In the example shown in FIGS. 1 and 2, design data (CAD data, layout data) D1 created by, for example, a semiconductor integrated circuit designer is input to the control computer 10b1 of the charged particle beam drawing apparatus 10, and then drawing is performed. The data generation unit 10b1a converts the design data D1 into a format for the charged particle beam drawing apparatus 10 and generates drawing data D2. In general, the design data D1 includes a large number of minute patterns, and the data amount of the design data D1 is considerably large. Furthermore, generally, when the design data D1 or the like is converted into another format, the data amount of the converted data further increases. In view of this point, the design data D1 and the drawing data D2 employ data hierarchization to reduce the amount of data.
FIG. 4 is a diagram schematically showing an example of the drawing data D2 shown in FIG. In the example shown in FIG. 4, the drawing data D2 (see FIG. 2) applied to the charged particle beam drawing apparatus 10 of the first embodiment is, for example, a chip layer CP, a frame layer FR lower than the chip layer CP, The block hierarchy BL is lower than the frame hierarchy FR, the cell hierarchy CL is lower than the block hierarchy BL, and the graphic hierarchy FG is lower than the cell hierarchy CL. Specifically, in the example illustrated in FIG. 4, for example, a chip CP1 that is a part of the elements of the chip hierarchy CP corresponds to three frames FR1, FR2, and FR3 that are part of the elements of the frame hierarchy FR. Yes. Also, for example, a frame FR2 that is a part of the elements of the frame hierarchy FR corresponds to 18 blocks BL00,..., BL52 that are a part of the elements of the block hierarchy BL. Further, for example, the block BL21 which is a part of the elements of the block hierarchy BL corresponds to a plurality of cells CLA, CLB, CLC, CLD,. Further, for example, a cell CLA that is a part of the elements of the cell hierarchy CL corresponds to a large number of figures FG1, FG2,. In the charged particle beam drawing apparatus 10 of the first embodiment, a large number of patterns corresponding to a large number of figures FG1, FG2,... (See FIG. 4) included in the drawing data D2 (see FIG. 2) are charged particle beams 10a1b. (See FIG. 1), the image is drawn on the resist of the sample M (see FIG. 1).

In the charged particle beam drawing apparatus 10 of the first embodiment, the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l (see FIG. 3A) and the second shaping aperture 10a1m (see FIG. 3A). )) Of the charged particle beam 10a1b (see FIG. 3 (A)) that is transmitted through the opening 10a1m ′ (see FIG. 3 (A)) and irradiates the resist of the sample M (see FIG. 3 (A)). Only a figure (non-arbitrary figure) having a shape that matches the cross-sectional shape is included in the design data D1 (see FIGS. 1 and 2), and the opening 10a1l ′ of the first shaping aperture 10a1l and the second shaping aperture 10a1m A figure (arbitrary figure) having a shape that does not match the horizontal sectional shape of the charged particle beam 10a1b that is transmitted through the opening 10a1m ′ and is applied to the resist of the sample M is designed data. The shape of the arbitrary angle figure matches the horizontal cross-sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M when it is not included in the data D1 (see FIG. 1 and FIG. 2). Is included in the design data D1 without being executed by the arbitrary angle dividing unit 10b1a2 (see FIG. 2) of the drawing data generating unit 10b1a (see FIG. 2). Patterns corresponding to all the non-arbitrary figures are drawn on the resist of the sample M by the charged particle beam 10a1b.
On the other hand, in the charged particle beam drawing apparatus 10 of the first embodiment, the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l (see FIG. 3A) and the second shaping aperture 10a1m (FIG. 3). A charged particle beam 10a1b (see FIG. 3A) that is transmitted through the opening 10a1m ′ (see FIG. 3A) of FIG. 3A and irradiates the resist of the sample M (see FIG. 3A). Arbitrary angle division of the drawing data generation unit 10b1a (see FIG. 2) when the design data D1 (see FIGS. 1 and 2) includes a figure (arbitrary angle figure) having a shape that does not match the horizontal sectional shape of Charged particle beam 10a1b (FIG. 3 (A)) that irradiates the resist of sample M (see FIG. 3 (A)) with the shape of an arbitrary angle figure included in design data D1 by unit 10b1a2 (see FIG. 2). reference) Processing for changing the shape (shape of the non-optional angle figure) matching the horizontal sectional shape (any angle division processing) is executed. As a result, in the charged particle beam drawing apparatus 10 of the first embodiment, all the figures in the design data D1 including the figure changed from the shape of the arbitrary angle figure to the shape of the non-arbitrary angle figure by the arbitrary angle division process are applied. A corresponding pattern can be drawn on the resist of the sample M by the charged particle beam 10a1b.

FIG. 5 is a diagram for explaining an arbitrary angle division process executed by the arbitrary angle division unit 10b1a2 (see FIG. 2) of the drawing data generation unit 10b1a (see FIG. 2). In the example shown in FIG. 5A, the side AB of the figure FGA is configured by a line segment parallel to the X axis, the side BC is configured by a line segment parallel to the Y axis, and the side CA is It is constituted by a line segment having an angle θ other than 45 ° such as 20 °. That is, in the charged particle beam drawing apparatus 10 of the first embodiment having the opening 10a1l ′ of the first shaping aperture 10a1l and the opening 10a1m ′ of the second shaping aperture 10a1m having a shape as shown in FIG. The horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist (see FIG. 3A) and the side CA (see FIG. 5A) of the figure FGA (see FIG. 5A). ))) Cannot be matched. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the figure FGA (see FIG. 5A) has a shape that does not match the horizontal sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M. Corresponds to figure (arbitrary angle figure).
Therefore, in the charged particle beam drawing apparatus 10 according to the first embodiment, for example, the arbitrary angle dividing unit 10b1a2 (see FIG. 2) of the drawing data generation unit 10b1a (see FIG. 2) uses, for example, FIGS. Arbitrary angle division processing as shown in FIG. 5 is performed on the arbitrary angle graphic FGA (see FIG. 5A). Specifically, in the example shown in FIGS. 5A and 5B, since the width dimension WA of the arbitrary angle graphic FGA is larger than the predetermined threshold value Smin, the arbitrary angular graphic FGA has a width dimension equal to or smaller than the threshold value Smin. It is divided into a plurality of arbitrary angle figures FGA1 ′ and FGA2 ′ having SA. Next, the shapes of the plurality of arbitrary angle figures FGA1 ′ and FGA2 ′ are changed, and the horizontal cross-sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated on the resist of the sample M (see FIG. 3A) Non-arbitrary-angle figures FGA1 and FGA2 having a shape that matches In the example shown in FIGS. 5A and 5B, errors δAin and δAout between the arbitrary angle graphic FGA before the shape is changed and the non-arbitrary graphic FGA1 and FGA2 after the shape is changed are Divide so that they are equal to each other and the errors δAin and δAout are within a range between a predetermined lower limit value δmin of several nm and a predetermined upper limit value δmax of several tens of nm, for example (δmin ≦ δAin = δAout ≦ δmax). The number (number of divisions) of the subsequent arbitrary angle figures FGA1 ′ and FGA2 ′ is set.

In the example shown in FIG. 5C, the side DE of the figure FGB is configured by a line segment parallel to the X axis, the side EF is configured by a line segment parallel to the Y axis, and the side FD is relative to the X axis. For example, a line segment having an angle θ other than 45 °, such as 20 °. That is, in the charged particle beam drawing apparatus 10 of the first embodiment having the opening 10a1l ′ of the first shaping aperture 10a1l and the opening 10a1m ′ of the second shaping aperture 10a1m having a shape as shown in FIG. The horizontal cross-sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist (see FIG. 3A) and the side FD (see FIG. 5C) of the figure FGB (see FIG. 5C). ))) Cannot be matched. That is, in the charged particle beam drawing apparatus 10 of the first embodiment, the figure FGB (see FIG. 5C) has a shape that does not match the horizontal sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M. Corresponds to figure (arbitrary angle figure).
Therefore, in the charged particle beam drawing apparatus 10 of the first embodiment, for example, FIG. 5C and FIG. 5D are performed by the arbitrary angle division unit 10b1a2 (see FIG. 2) of the drawing data generation unit 10b1a (see FIG. 2). ) Is performed on the arbitrary-angle graphic FGB (see FIG. 5C). Specifically, in the example shown in FIG. 5C and FIG. 5D, the width dimension WB of the arbitrary-angle figure FGB is equal to or smaller than the threshold value Smin, and therefore, shown in FIG. 5A and FIG. 5B. Unlike the example, the arbitrary angle figure FGB is not divided. Next, the shape of the arbitrary angle figure FGB is changed to have a shape that matches the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated on the resist of the sample M (see FIG. 3A). A non-arbitrary figure FGB1 is generated. In the example shown in FIGS. 5C and 5D, the errors δBin and δBout between the arbitrary angle figure FGB before the shape change and the non-arbitrary figure FGB1 after the shape change are equal to each other. And the value of the threshold value Smin is set so that the errors δBin and δBout are not more than the upper limit value δmax (δAin = δAout ≦ δmax).

In the charged particle beam drawing apparatus 10 of the first embodiment, for example, as shown in FIGS. 5A to 5D, the shape is changed to an arbitrary angle figure FGA before the shape is changed. The errors δAin, δAout with the non-arbitrary figures FGA1 and FGA2 after the reduction are less than or equal to the upper limit value δmax, and the arbitrary-angle graphic FGB before the shape is changed, and the non-arbitrary-angle graphic FGB1 after the shape is changed Since the arbitrary angle division processing is executed so that the errors δBin and δBout of the error are equal to or lower than the upper limit value δmax, the design data D1 (FIGS. 1 and 2) includes arbitrary angle figures FGA and FGB. In addition, a desired drawing accuracy can be achieved.
In the example shown in FIG. 5A to FIG. 5D, the non-arbitrary angle figures FGA1, FGA2, and FGB1 after execution of the arbitrary angle division process are formed only by the side parallel to the X axis and the side parallel to the Y axis. The charged particle beam drawing apparatus 10 according to the first embodiment, which is configured but has an opening 10a1l ′ of the first shaping aperture 10a1l and an opening 10a1m ′ of the second shaping aperture 10a1m, as shown in FIG. Then, it is possible to execute the arbitrary angle division processing so that the non-arbitrary angle figure after execution of the arbitrary angle division processing has a side that forms an angle of 45 ° with respect to the X axis.

Incidentally, the design data D1 (see FIGS. 1 and 2) input to the charged particle beam drawing apparatus 10 of the first embodiment may include an arbitrary angle figure such as an elliptic figure. In general, in design data (CAD data) D1, an elliptical figure is approximately represented by a polygonal figure having a large number of minute sides. On the other hand, in the charged particle beam drawing apparatus 10 of the first embodiment having the opening 10a1l ′ of the first shaping aperture 10a1l and the opening 10a1m ′ of the second shaping aperture 10a1m having a shape as shown in FIG. The horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist (see FIG. 3A) does not match most of the many minute sides of the elliptical figure. Therefore, for example, a conventional general charged particle beam drawing apparatus having an opening 10a1l ′ of the first shaping aperture 10a1l and an opening 10a1m ′ of the second shaping aperture 10a1m having a shape as shown in FIG. In the conventional general drawing data generation apparatus for generating the drawing data D2 (see FIG. 2) applicable to the particle beam drawing apparatus from the design data D1 (see FIGS. 1 and 2), FIG. Horizontal cross section of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist of the sample M (see FIG. 3A) as shown in FIG. The side FD that does not match the shape (see FIG. 5C) is changed to a side GH that matches the horizontal sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M (see FIG. 5D). That process), was performed for each of a number of small sides of the oval shape.
As a result, for example, a conventional general charged particle beam drawing apparatus having an opening 10a1l ′ of the first shaping aperture 10a1l and an opening 10a1m ′ of the second shaping aperture 10a1m having a shape as shown in FIG. In a conventional general drawing data generation apparatus for generating drawing data D2 (see FIG. 2) applicable to a charged particle beam drawing apparatus from design data D1 (see FIGS. 1 and 2), for example, an oval figure or the like When the design data D1 (see FIG. 1 and FIG. 2) includes an arbitrary angle figure having a large number of minute sides as described above, there is a problem that the load of the arbitrary angle division process increases and the throughput decreases. . In view of this problem, the charged particle beam drawing apparatus 10 according to the first embodiment having the opening 10a1l ′ of the first shaping aperture 10a1l and the opening 10a1m ′ of the second shaping aperture 10a1m as shown in FIG. Then, in order to reduce the load of arbitrary angle division processing when an arbitrary angle figure having a large number of minute sides such as an elliptic figure is included in the design data D1 (see FIGS. 1 and 2), drawing is performed. The graphic shape changing unit 10b1a1 (see FIG. 2) of the data generating unit 10b1a (see FIG. 2) executes a process of reducing the number of vertices of an arbitrary angular figure having a large number of minute sides.

6 and 7 are diagrams for explaining the vertex number reduction processing of an arbitrary angle graphic executed by the graphic shape changing unit 10b1a1 (see FIG. 2) of the drawing data generating unit 10b1a (see FIG. 2). FIG. 8 shows the data of the polygonal graphic FGPL (see FIG. 6A) before the graphic shape changing unit 10b1a1 of the drawing data generating unit 10b1a performs the vertex number reduction processing of the arbitrary angle graphic, and the drawing data generating unit. It is the figure which showed the data of polygon figure FGPL '(refer FIG.7 (C)) after the vertex number reduction process of the arbitrary angle figures by the figure shape change part 10b1a1 of 10b1a was performed. FIG. 9 is a diagram showing a flowchart of the vertex number reduction processing of an arbitrary angle graphic executed by the graphic shape changing unit 10b1a1 of the drawing data generating unit 10b1a.
In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 2, when the design data D1 is input to the drawing data generation unit 10b1a, the figure included in the design data D1 is displayed for each figure. 9 is executed by the figure shape changing unit 10b1a1.
Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 9, when the vertex number reduction process is started, in step S100, the design data D1 (see FIGS. 1 and 2). For each graphic included in the table, a determination is made as to whether or not the graphic (polygonal graphic) needs to be processed in step S106 to reduce the number of vertexes of the graphic. If YES is determined, the process proceeds to step S101, and the vertex number reduction process is substantially started. On the other hand, if it is determined NO, the vertex number reduction process is not substantially executed, and then the fracture process is executed by the arbitrary angle dividing unit 10b1a2 (see FIG. 2).

  As an example, the design data D1 (see FIGS. 1 and 2) input to the drawing data generation unit 10b1a (see FIG. 2) is added to a polygonal figure (arbitrary angle figure) FGPL (see FIG. 6 (see FIG. 6)). A case in which (see A) is included will be described. In the example shown in FIGS. 6A and 8A, the data of the polygonal figure (arbitrary-angle figure) FGPL (see FIG. 6A) included in the design data D1 is the data shown in FIG. As shown in FIG. 6, a header including information indicating that the graphic data is represented by the vertex sequence and information indicating that the number of vertices is 10, and coordinate data (x1, y1) of the vertex p1 (see FIG. 6A) ), Coordinate data (x2, y2) of vertex p2 (see FIG. 6A), coordinate data (x3, y3) of vertex p3 (see FIG. 6A), and vertex p4 (FIG. 6A) )) Coordinate data (x4, y4), vertex p5 (see FIG. 6A) coordinate data (x5, y5), and vertex p6 (see FIG. 6A) coordinate data (x6, y6) ), The coordinate data (x7, y7) of the vertex p7 (see FIG. 6A), and the vertex p8 (see FIG. 6A). Coordinate data (x8, y8), coordinate data (x9, y9) of vertex p9 (see FIG. 6A), and coordinate data (x10, y10) of vertex p10 (see FIG. 6A) It is configured.

In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 9, in step S100, the header (see FIG. 8A) of polygon graphic (arbitrary angle graphic) FGPL data (see FIG. 8A). A), the information that the number of vertices is 10 is read, it is determined that the figure (arbitrary figure) needs to be processed in step S106 to reduce the number of vertices of the figure, and the process proceeds to step S101. Next, in step S101, the value of the coefficient i is set to 1, and from the polygon graphic (arbitrary angle graphic) FGPL data (see FIG. 8A), the polygon graphic (arbitrary angle graphic) FGPL (FIG. The coordinate data (x1, y1) of the apex p1 (see FIG. 6A) of 6 (A) is read. Further, the value of the coefficient k is set to 1.
Next, in step S102, from the polygon figure (arbitrary angle figure) FGPL data (see FIG. 8A), the vertex p2 (FIG. 6) of the polygon figure (arbitrary angle figure) FGPL (see FIG. 6A). (A)) coordinate data (x2, y2) is read. Next, in step S103, an X-axis direction component L12x (see FIG. 6A) and a Y-axis direction component L12y (see FIG. 6A) of the distance between the vertex p1 and the vertex p2 are calculated. Next, in step S104, it is determined whether or not the X-axis direction component L12x is smaller than a predetermined threshold value Sm (see FIG. 6A). In the example shown in FIG. 6A, YES is determined, and the process proceeds to step S105. Next, in step S105, it is determined whether or not the Y-axis direction component L12y is smaller than a threshold value Sm (see FIG. 6A). In the example shown in FIG. 6A, YES is determined, and the process proceeds to step S106. Next, in step S106, as shown in FIGS. 6A and 6B, a process of deleting the vertex p2 is executed, and 1 is added to the value of the coefficient k, so that the value of k becomes 2. It returns to step S102.

Next, in step S102, from the polygon figure (arbitrary angle figure) FGPL data (see FIG. 8A), the vertex p3 (FIG. 6) of the polygon figure (arbitrary angle figure) FGPL (see FIG. 6A). The coordinate data (x3, y3) of (A) is read. Next, in step S103, an X-axis direction component L13x (see FIG. 6A) and a Y-axis direction component L13y (see FIG. 6A) of the distance between the vertex p1 and the vertex p3 are calculated. Next, in step S104, it is determined whether or not the X-axis direction component L13x is smaller than a threshold value Sm (see FIG. 6A). In the example shown in FIG. 6A, NO is determined, and the process proceeds to step S107 without executing the process of deleting the vertex p3 in step S106. Next, in step S107, the sum of the value of the coefficient i (1 at this stage) and the value of the coefficient k (2 at this stage) (3 at this stage) is set as the new value of the coefficient i.
Similarly, the processing from step S102 to step S107 is executed in a loop for the remaining seven times. As a result, as shown in FIGS. 6B and 6C, the process of deleting the vertex p4 is executed, and the process of deleting the vertex p5 is not executed. Further, as shown in FIGS. 6C and 7A, the process of deleting the vertex p6 is executed, and the process of deleting the vertex p7 is not executed. Further, as shown in FIGS. 7A and 7B, the process of deleting the vertex p8 is executed, and the process of deleting the vertex p9 is not executed. Further, as shown in FIGS. 7B and 7C, a process of deleting the vertex p10 is executed. As a result, as shown in FIG. 7C, vertices p2, p4, p6, p8, and p10 (see FIG. 6A) of the polygonal figure (arbitrary-angle figure) FGPL (see FIG. 6A) are obtained. A polygonal figure (arbitrary-angle figure) FGPL ′ (see FIG. 7C) that has been deleted and whose shape has been changed is generated. Next, as shown in FIG. 9, an arbitrary angle dividing process is executed by the arbitrary angle dividing unit 10b1a2 (see FIG. 2) on the polygonal figure (arbitrary angle figure) FGPL '(see FIG. 7C).

In the example shown in FIG. 7C and FIG. 8B, the polygonal figure (arbitrary-angle figure) FGPL ′ after the vertex number reduction processing is executed by the figure shape changing unit 10b1a1 (see FIG. 7C) 8B, as shown in FIG. 8B, a header including information indicating that the data is graphic data represented by a vertex sequence and information indicating that the number of vertices is 5, and a vertex p1 (FIG. 7C). Coordinate data (x1, y1) of reference), coordinate data (x3, y3) of vertex p3 (see FIG. 7C), and coordinate data (x5, y5) of vertex p5 (see FIG. 7C) And coordinate data (x7, y7) of the vertex p7 (see FIG. 7C) and coordinate data (x9, y9) of the vertex p9 (see FIG. 7C).
In the charged particle beam drawing apparatus 10 of the first embodiment, for example, as shown in FIGS. 6 and 7, a polygonal figure (arbitrary angle figure) FGPL having a large number of minute sides (see FIG. 6A). ) Is deleted by the graphic shape changing unit 10b1a1 (see FIG. 2) of the drawing data generating unit 10b1a (see FIG. 2). The processing of deleting the vertices p2, p4, p6, p8, and p10 (see FIG. 6A) is performed. Therefore, it is executed by the arbitrary angle division unit 10b1a2 (see FIG. 2) of the drawing data generation unit 10b1a (see FIG. 2), compared with the case where the process of reducing the number of vertices of the polygonal figure having a large number of minute sides is not executed. It is possible to reduce the load of the arbitrary angle division processing.

10 and 11 show the drawing data generation process of the charged particle beam drawing apparatus 10 according to the first embodiment in which the process of reducing the number of vertices of a polygonal figure having a large number of minute sides is executed, and a large number of minute figures. It is a figure for comparing and explaining the drawing data generation process in which the process which reduces the number of vertices of the polygon figure which has a side is not performed. In the example shown in FIGS. 10 and 11, a polygonal figure (arbitrary angle) having a large number of minute sides is included in the design data D1 (see FIGS. 1 and 2) input to the drawing data generation unit 10b1a (see FIG. 2). Figure) An elliptic figure approximately expressed by FGEP (see FIGS. 10A and 11A) and an opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l (see FIG. 3A). A)) and the second molding aperture 10a1m (see FIG. 3A) through the opening 10a1m ′ (see FIG. 3A) and irradiate the resist of the sample M (see FIG. 3A). Side ab, bc, cd, de, ef, fg, gh, hi, ij, ja (FIG. 10 (A) and FIG. 11 () that match the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3 (A)). A) Non-appointment with only see) And angular shapes FGC (see FIG. 10 (A) and FIG. 11 (A)) are included.
In the charged particle beam drawing apparatus 10 of the first embodiment, a polygonal figure (arbitrary angle figure) FGEP (see FIG. 10A) having a large number of minute sides and a non-arbitrary angle figure FGC (FIG. 10A). When the design data D1 (see FIG. 1 and FIG. 2) including the reference is input to the drawing data generation unit 10b1a (see FIG. 2), a polygon figure (arbitrary angle figure) having a large number of minute sides is input. ) A process of reducing the number of vertices for FGEP (step S106 in FIG. 9) is executed by the graphic shape changing unit 10b1a1 (see FIG. 2). As a result, a polygonal figure (arbitrary-angle figure) FGEP ′ (see FIG. 10B) with a reduced number of vertices is generated as in the examples shown in FIGS. Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, the arbitrary angle dividing unit 10b1a2 (see FIG. 2) performs an arbitrary angle dividing process as shown in FIGS. 5 (A) and 5 (B). This is executed for a square figure (arbitrary figure) FGEP ′ (see FIG. 10B).

Specifically, in the example shown in FIGS. 10B and 10C, in the arbitrary angle dividing process by the arbitrary angle dividing unit 10b1a2 (see FIG. 2), the polygonal figure (arbitrary figure) FGEP ′ (FIG. 10B) is divided into a plurality of arbitrary angle figures FGEPa and FGEPb (see FIG. 10B). Next, the shape of each arbitrary angle figure FGEPa, FGEPb is changed to match the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated on the resist of the sample M (see FIG. 3A). Non-arbitrary-angle figures FGEPa1 and FGEPb1 (see FIG. 10C) having a shape are generated. Specifically, in the example shown in FIG. 10, the arbitrary angle graphic FGEP before the shape change (see FIG. 10A) and the non-arbitrary graphic FGEPa1 and FGEPb1 after the shape change (FIG. 10 ( The threshold value Sm (FIG. 6) used in the vertex number reduction process so that the error with respect to (see (C)) is not more than a predetermined upper limit value δmax (see FIGS. 5B and 5D) of several tens of nm, for example. And the value of FIG. 7) is set.
Further, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 10C and 10D, the fracture processing for the non-arbitrary figure FGC is performed by the arbitrary angle dividing unit 10b1a2 (FIG. 2). The non-arbitrary-angle figures FGC1, FGC2, and FGC3 are generated. Specifically, in the example shown in FIGS. 10C and 10D, charged particles are irradiated with a non-arbitrary figure FGC on the resist of the sample M (see FIG. 3A) by the fracture process. The rectangular figure FGC1 having only sides ab, bk, kj, and ja that match the horizontal sectional shape of the beam 10a1b (see FIG. 3A), and the horizontal sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M A trapezoidal figure FGC2 having only matching sides cd, de, ek, kc and a trapezoidal figure having only sides fg, gh, hi, if matching the horizontal sectional shape of the charged particle beam 10a1b irradiated to the resist of the sample M It is divided into FGC3.
Next, in the charged particle beam drawing apparatus 10 according to the first embodiment, the format conversion unit 10b1a3 (see FIG. 2) includes non-arbitrary figures FGEPa1, FGEPb1, FGC1, FGC2, and FGC3 (see FIG. 10D). The format of the design data D1 (see FIGS. 1 and 2) is converted, and drawing data D2 (see FIG. 2) is generated.

On the other hand, in the charged particle beam drawing apparatus or the drawing data generation apparatus in which the processing for reducing the number of vertices of a polygon figure having a large number of minute sides is not performed during the drawing data generation process, the polygon figure having a large number of minute sides The design data D1 (see FIGS. 1 and 2) including the (arbitrary-angle graphic) FGEP (see FIG. 11A) and the non-arbitrary-angle graphic FGC (see FIG. 11A) is the drawing data generation unit. When input to 10b1a (see FIG. 2), the process of reducing the number of vertices (step S106 in FIG. 9) is not executed for a polygonal figure (arbitrary angle figure) FGEP having a large number of minute sides. The arbitrary angle dividing unit 10b1a2 (see FIG. 2) executes an arbitrary angle dividing process on the polygonal figure (arbitrary angle figure) FGEP (see FIG. 11A).
Specifically, in the example shown in FIG. 11, in the arbitrary angle division processing by the arbitrary angle dividing unit 10b1a2 (see FIG. 2), the polygonal figure (arbitrary angle figure) FGEP (see FIG. 11A) is a polygon. A figure (arbitrary angle figure) FGEP is divided into a number of trapezoidal figures (arbitrary angle figures) FGEP1 ′, FGEP2 ′, FGEP3 ′,. Is done. Next, as in the example shown in FIGS. 5C and 5D, a number of trapezoidal figures (arbitrary-angle figures) FGEP1 ′, FGEP2 ′, FGEP3 ′,..., FGEPn ′ (see FIG. 11B) A number of non-arbitrary figures having a shape that matches the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated on the resist of the sample M (see FIG. 3A). FGEP1, FGEP2, FGEP3,..., FGEPn (see FIG. 11C) are generated.
That is, in the charged particle beam drawing apparatus or the drawing data generation apparatus in which the process of reducing the number of vertices of the polygonal figure FGEP (see FIG. 11A) having a large number of minute sides is not performed during the drawing data generation process, Compared to the charged particle beam drawing apparatus 10 of the first embodiment in which processing for reducing the number of vertices of a polygonal figure FGEP (see FIG. 10A) having a large number of minute sides is performed during data generation processing, Arbitrary angle figures FGEP1 ′, FGEP2 ′, FGEP3 ′,..., FGEPn ′ (see FIG. 11B) that are subjected to arbitrary angle division processing by the arbitrary angle dividing unit 10b1a2 (see FIG. 2) are very large. The load of corner division processing increases, and the throughput decreases.

In the charged particle beam drawing apparatus or the drawing data generation apparatus in which the process of reducing the number of vertices of a polygonal figure having a large number of minute sides is not performed during the drawing data generation process, the format conversion unit 10b1a3 (see FIG. 2) , The format of the design data D1 (see FIGS. 1 and 2) including the non-arbitrary angle figures FGEP1, FGEP2, FGEP3,..., FGEPn, FGC1, FGC2, and FGC3 (see FIG. 11D) is converted, Drawing data D2 (see FIG. 2) is generated.
That is, in the charged particle beam drawing apparatus or the drawing data generation apparatus in which the process of reducing the number of vertices of the polygonal figure FGEP (see FIG. 11A) having a large number of minute sides is not performed during the drawing data generation process, Compared to the charged particle beam drawing apparatus 10 of the first embodiment in which processing for reducing the number of vertices of a polygonal figure FGEP (see FIG. 10A) having a large number of minute sides is performed during data generation processing, Non-arbitrary figures FGEP1, FGEP2, FGEP3,..., FGEPn, FGC1, FGC2, FGC3 included in the design data D1 (see FIGS. 1 and 2) whose format is converted by the format converter 10b1a3 (see FIG. 2). (See Fig. 11 (D)). The number of format conversion processing loads increases and throughput decreases. Further, the data amount of the drawing data D2 (see FIG. 2) after the format conversion is increased.
In other words, the charged particle beam drawing according to the first embodiment in which processing for reducing the number of vertices of a polygonal figure FGEP (see FIG. 10A) having a large number of minute sides is executed during the drawing data generation processing. According to the apparatus 10, a charged particle beam drawing apparatus or drawing data generation in which processing for reducing the number of vertices of a polygonal figure FGEP (see FIG. 11A) having a large number of minute sides is not performed during the drawing data generation process. Compared to the apparatus, it is possible to improve the throughput by reducing the load of arbitrary angle division processing and reducing the processing load of format conversion, and further included in the drawing data D2 after format conversion (see FIG. 2). The number of figures can be reduced, and as a result, the data amount of the drawing data D2 after format conversion can be reduced.

12 illustrates a graphic shape changing unit 10b1a1 (FIG. 2) of the drawing data generating unit 10b1a (see FIG. 2) for a polygonal graphic (arbitrary angle graphic) FGPL2 in which the X-axis direction dimension Lx and the Y-axis direction dimension Ly are smaller than the threshold value Sm. It is a figure for demonstrating the vertex number reduction process performed by reference.
Polygonal figure (arbitrary angle figure) FGPL2 (FIG. 12 (FIG. 12) in which the X-axis direction dimension Lx (see FIG. 12) and the Y-axis direction dimension Ly (see FIG. 12) are smaller than the threshold value Sm (see FIGS. 6, 7, and 12). A)) is included in the design data D1 (see FIGS. 1 and 2), the charged particle beam drawing apparatus 10 of the first embodiment has vertices as shown in FIGS. A number of vertex reduction processing as shown in FIG. 12A and FIG. 12B, not the number reduction processing, is frequently performed by the graphic shape changing unit 10b1a1 (see FIG. 2) of the drawing data generation unit 10b1a (see FIG. 2). This is executed for a square graphic (arbitrary graphic) FGPL2 (see FIG. 12A).
Specifically, in the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIGS. 12A and 12B, the figure shape changing unit of the drawing data generating unit 10b1a (see FIG. 2). The process of reducing the number of vertices p1, p2, p3, p4, p5, p6, p7, p8, p9, and p10 of the polygonal figure (arbitrary angle figure) FGPL2 by 10b1a1 (see FIG. 2) Is executed for FGPL2, and as a result, has a centroid G ′ at the same position as the centroid G of the polygon figure (arbitrary angle figure) FGPL2, and is the same as the polygon figure (arbitrary angle figure) FGPL2. A rectangular figure (non-arbitrary figure) FGPL2 ′ having an X-axis direction dimension Lx and a Y-axis direction dimension Ly is generated.
In the example shown in FIGS. 6, 7, and 12, a constant threshold value Sm is used. However, in the charged particle beam drawing apparatus 10 of the first embodiment, the processes in steps S <b> 104 and S <b> 105 (see FIG. 9). It is also possible to use a different threshold value Sm for each vertex on which is executed. Specifically, for example, when it is determined whether or not to delete the vertex p2 (see FIG. 6A), the threshold value Sm calculated based on the slope of the side between the vertices p1 and p2 is used, for example, the vertex p3. When it is determined whether or not to delete (see FIG. 6B), the threshold value Sm calculated based on the slope of the side between the vertices p1 and p3 is used, for example, the vertex p4 (see FIG. 6B). It is also possible to use the threshold value Sm calculated based on the inclination of the side between the vertices p3 and p4 when it is determined whether or not to delete. Alternatively, when the number of vertices reduction process is executed for a polygonal figure (arbitrary angle figure) FGPL (see FIG. 6A), it is based on the average value of the inclinations of all sides of the polygonal figure (arbitrary angle figure) FGPL. It is also possible to use the threshold value Sm calculated as described above. In any case, an arbitrary angle figure such as the figure FGEP (see FIG. 10A) before the shape is changed by the process of the figure shape changing unit 10b1a1 (see FIG. 2) and the figure shape changing unit 10b1a1. And errors δBin and δBout (FIG. 5) from non-arbitrary figures such as the figures FGEPa1 and FGEPb1 (see FIG. 10D) after the shape is changed by the processing of the arbitrary angle dividing unit 10b1a2 (see FIG. 2). The value of the threshold Sm is set so that (see (D)) is equal to or less than the upper limit value δmax (see (D) in FIG. 5).

Hereinafter, a third embodiment of the charged particle beam drawing apparatus of the present invention will be described. The charged particle beam drawing apparatus 10 of the third embodiment is configured in substantially the same manner as the charged particle beam drawing apparatus 10 of the first embodiment described above, except for the points described below. FIG. 13 is a detailed view of the control computer 10b1 of the charged particle beam drawing apparatus 10 of the third embodiment.
In the charged particle beam drawing apparatus 10 of the first embodiment, as shown in FIG. 2, the intermediate data D3 is not generated by the drawing data generation unit 10b1a. However, in the charged particle beam drawing apparatus 10 of the third embodiment, as shown in FIG. As shown in FIG. 13, the intermediate data D3 is generated from the design data D1 by the intermediate data generation unit 10b1a4 of the drawing data generation unit 10b1a.
That is, in the charged particle beam drawing apparatus 10 of the third embodiment, the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l (see FIG. 3A) and the second shaping aperture 10a1m (FIG. 3). A charged particle beam 10a1b (see FIG. 3A) that is transmitted through the opening 10a1m ′ (see FIG. 3A) of FIG. 3A and irradiates the resist of the sample M (see FIG. 3A). Included in the intermediate data D3 generated from the design data D1 when the figure (arbitrary angle figure) having a shape that does not match the horizontal cross-sectional shape is included in the design data D1 (see FIGS. 1 and 13). The shape of the arbitrary angle figure that matches the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist of the sample M (see FIG. 3A) Shape) Process of (arbitrary angle division processing) is performed by any angle division portion 10b1a2 rendering data generation unit 10B1a (see FIG. 13) (see FIG. 13). As a result, in the charged particle beam drawing apparatus 10 according to the third embodiment, all the figures in the intermediate data D3 including the figure changed from the shape of the arbitrary angle figure to the shape of the non-arbitrary figure by the arbitrary angle division process are displayed. A corresponding pattern can be drawn on the resist of the sample M by the charged particle beam 10a1b.

FIG. 14 shows an intermediate data generation process and a figure shape change unit executed by the intermediate data generation unit 10b1a4 (see FIG. 13) of the drawing data generation unit 10b1a (see FIG. 13) of the charged particle beam drawing apparatus 10 of the third embodiment. It is a figure for demonstrating the common edge deletion process of several mutually adjacent trapezoid figure FGPLa, FGPLb, FGPLc, and FGPLd performed by 10b1a1 (refer FIG. 13). FIG. 15 shows a polygonal figure FGPL before the intermediate data generation processing by the intermediate data generation unit 10b1a4 of the drawing data generation unit 10b1a of the charged particle beam drawing apparatus 10 of the third embodiment is performed (see FIG. 14A). And data of a plurality of adjacent trapezoidal figures FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 14B) after the intermediate data generation process is executed. Specifically, FIG. 15A shows data of the polygonal figure FGPL included in the design data D1 (see FIG. 13), and FIG. 15B shows a plurality of data included in the intermediate data D3. Data of trapezoidal figures FGPLa, FGPLb, FGPLc, and FGPLd adjacent to each other are shown.
In the charged particle beam drawing apparatus 10 of the third embodiment, as shown in FIG. 13, when the design data D1 is input to the drawing data generation unit 10b1a, intermediate data generation processing is executed by the intermediate data generation unit 10b1a4. Intermediate data D3 is generated.

As an example, the design data D1 (see FIGS. 1 and 13) input to the drawing data generation unit 10b1a (see FIG. 13) is added to a polygonal figure (arbitrary angle figure) FGPL (see FIG. 14 (see FIG. 14)). A description will be given of the intermediate data generation process in the case where A) is included. In the example shown in FIGS. 14 and 15, the data of the polygonal figure (arbitrary angle figure) FGPL (see FIG. 14A) included in the design data D1 is the vertex as shown in FIG. A header including information indicating that the graphic data is represented by a column and information indicating that the number of vertices is 10, coordinate data of vertex A (see FIG. 14A), and vertex B (FIG. 14A) Reference coordinate data, vertex C (see FIG. 14A) coordinate data, vertex D (see FIG. 14A) coordinate data, and vertex E (see FIG. 14A) coordinate data , Vertex F (see FIG. 14A) coordinate data, vertex G (see FIG. 14A) coordinate data, vertex H (see FIG. 14A) coordinate data, and vertex I ( 14A) and the coordinate data of the vertex J (see FIG. 14A). It is configured me.
In the example shown in FIGS. 14 and 15, when the intermediate data generation process is executed, the polygonal figure (arbitrary angle figure) FGPL (see FIG. 14A) is divided, and as a result, the common sides BI, CH, Four adjacent trapezoidal figures (arbitrary angle figures) FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 14B) having DG (see FIG. 14B) are generated. In the example shown in FIGS. 14 and 15, the data of four adjacent trapezoidal figures (arbitrary angle figures) FGPLa, FGPLb, FGPLc, and FGPLd are configured as shown in FIG.

Specifically, as shown in FIG. 15B, trapezoidal figure FGPLa (see FIG. 14B) data includes, for example, “header” and “trapezoid type (for example, a set of sides AJ parallel to the Y axis). , BI (refer to FIG. 14B) ”,“ arrangement position (for example, coordinate data of vertex A (refer to FIG. 14B)) ”, and“ height dimension (for example, side BI (FIG. 14)). (Length) (see (B)) ”,“ width dimension (distance between sides AJ, BI (see FIG. 14B)) ”, and“ arbitrary figure information ”.
“Arbitrary angle graphic information” includes, for example, “header” and “data length (specifically, the data of trapezoid graphic FGPLa, trapezoid graphic FGPLb, trapezoid graphic FGPLc, and trapezoid graphic FGPLd). Data length) "," number of figures (specifically, numbers 4 of trapezoidal figures FGPLa, FGPLb, FGPLc, FGPLd (see FIG. 14B) adjacent to each other) "and" original figure type (details: Information in the “header” of FIG. 15A, that is, information indicating that the original figure FGPL (see FIG. 14A) was a polygonal figure (arbitrary-angle figure)) and “original figure ( "X-axis direction dimension Lx of polygonal figure FGPL) (see FIG. 14A)" and "Y-axis direction dimension Ly of original figure (polygonal figure FGPL)" (see FIG. 14A) ". ing. That is, in the charged particle beam drawing apparatus 10 according to the third embodiment, data of the polygonal graphic FGPL in the design data D1 (see FIG. 13) (see FIG. 15A) by the graphic shape changing unit 10b1a1 (see FIG. 13). ) Of the trapezoidal figure FGPLa (see FIG. 15B) of the trapezoidal figure FGPLa in the intermediate data D3 (see FIG. 13) even if the header (see FIG. 15A) cannot be read. By reading “information” (see FIG. 15B), it is possible to grasp that the trapezoidal figures FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 14B) adjacent to each other are arbitrary-angle figures.

Further, as shown in FIG. 15B, the trapezoid graphic FGPLb (see FIG. 14B) includes, for example, “header” and “trapezoid type (for example, a set of sides BI, CH parallel to the Y axis). (Refer to FIG. 14B) ”,“ arrangement position (for example, coordinate data of vertex B (see FIG. 14B)) ”, and“ height dimension (for example, side CH (see FIG. 14B) ))) And “width dimension (distance between sides BI, CH (see FIG. 14B))”. Further, the data of the trapezoid figure FGPLc (see FIG. 14B) has, for example, “header” and “trapezoid type (for example, a pair of sides CH and DG parallel to the Y axis (see FIG. 14B)). ”),“ Arrangement position (for example, coordinate data of vertex C (see FIG. 14B)) ”,“ height dimension (for example, length of side CH (see FIG. 14B)) ”, “Width dimension (distance between sides CH, DG (see FIG. 14B))” is included. Further, the data of the trapezoid figure FGPLd (see FIG. 14B) has, for example, “header” and “trapezoid type (for example, a pair of sides DG and EF parallel to the Y axis (see FIG. 14B)). ”),“ Arrangement position (for example, coordinate data of vertex D (see FIG. 14B)) ”,“ height dimension (for example, length of side DG (see FIG. 14B)) ”, “Width dimension (distance between sides DG, EF (see FIG. 14B))” is included.
Further, in the charged particle beam drawing apparatus 10 according to the third embodiment, for example, trapezoid graphic FGPLa data, trapezoid graphic FGPLb data, trapezoid graphic FGPLc data, and trapezoid graphic FGPLd data (see FIG. 15B). A plurality of adjacent trapezoidal graphic data are defined in a lump on the intermediate data D3 (see FIG. 13). Further, two adjacent trapezoidal graphic data are continuously defined on the intermediate data D3. Specifically, in the examples shown in FIGS. 14B and 15B, the data of trapezoidal figures FGPLa and FGPLb adjacent to each other are defined continuously on the intermediate data D3, and the trapezoidal figures FGPLb, FGPLb, The data of FGPLc is continuously defined on the intermediate data D3, and the data of trapezoidal figures FGPLc and FGPLd adjacent to each other are continuously defined on the intermediate data D3.

Next, in the charged particle beam drawing apparatus 10 according to the third embodiment, FIG. 13 illustrates a plurality of trapezoidal figures adjacent to each other including “arbitrary angle graphic information” (see FIG. 15B). As shown, the common side deletion process is executed by the graphic shape changing unit 10b1a1. Specifically, in the example shown in FIG. 14B, “arbitrary figure information” is included in the data of four adjacent trapezoid figures FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 15B). Therefore, the common edge deletion process is executed by the graphic shape changing unit 10b1a1 on the four adjacent trapezoidal figures FGPLa, FGPLb, FGPLc, and FGPLd.
Specifically, in the example shown in FIG. 14B, when the common edge deletion process for four adjacent trapezoid figures FGPLa, FGPLb, FGPLc, and FGPLd is started, first, two adjacent ones are adjacent to each other. It is determined whether or not to delete the common side BI of the trapezoidal figures FGPLa and FGPLb. In the example shown in FIG. 14B, since the width dimension La of the trapezoidal figure FGPLa in the direction orthogonal to the common side BI (X-axis direction) is smaller than the threshold value Sm, as shown in FIG. Is deleted. Next, it is determined whether or not to delete the common side CH of two mutually adjacent trapezoid figures FGPLb and FGPLc. In the example shown in FIG. 14B, the total value Lab of the width dimension La of the trapezoidal figure FGPLa and the width dimension Lb of the trapezoidal figure FGPLb in the direction orthogonal to the common side CH (X-axis direction) is equal to or greater than the threshold value Sm. As shown in FIG. 14C, the common side CH is not deleted. As a result, in the example shown in FIGS. 14B and 14C, the graphic shape changing unit 10b1a1 (see FIG. 13) merges two adjacent trapezoidal figures FGPLa and FGPLb, The shapes of the trapezoid figures FGPLa and FGPLb adjacent to each other are changed to the shape of one trapezoid figure FGPLab.

Next, in the example shown in FIG. 14B, it is determined whether or not to delete the common side DG of two mutually adjacent trapezoid figures FGPLc and FGPLd. In the example shown in FIG. 14B, the width dimension Lc of the trapezoidal figure FGPLc in the direction orthogonal to the common side DG (X-axis direction) is smaller than the threshold value Sm. Therefore, as shown in FIG. Is deleted. As a result, in the example shown in FIGS. 14B and 14C, the graphic shape changing unit 10b1a1 (see FIG. 13) merges two adjacent trapezoidal graphics FGPLc and FGPLd, The shapes of the trapezoidal figures FGPLc and FGPLd adjacent to each other are changed to the shape of one trapezoidal figure FGPLcd.
Next, in the charged particle beam drawing apparatus 10 of the third embodiment, as shown in FIG. 13, for example, trapezoidal figures (arbitrary figure) FGPLab, FGPLcd (see FIG. 14C) and the like by the arbitrary angle dividing unit 10 b 1 a 2. As with the charged particle beam drawing apparatus 10 of the first embodiment, for example, an arbitrary angle division process as shown in FIG. 5 is performed on an arbitrary angle graphic such as that shown in FIG. Generated. Specifically, in the example shown in FIG. 14, an arbitrary angle figure FGPL (see FIG. 14A) before the shape is changed and a non-arbitrary angle figure (not shown) after the shape is changed. The threshold value Sm (FIG. 14B and FIG. 14) used in the common side deletion process so that the error is not more than a predetermined upper limit value δmax (see FIG. 5B and FIG. 5D) of, for example, several tens of nm. (C) is set.
Further, in the charged particle beam drawing apparatus 10 of the third embodiment, as shown in FIG. 13, the arbitrary angle figure FGC (see FIG. 13) included in the intermediate data D3 (see FIG. 13) is obtained by the arbitrary angle dividing unit 10b1a2. 10 (C)), as in the charged particle beam drawing apparatus 10 of the first embodiment, for example, fracture processing as shown in FIGS. Figures FGC1, FGC2, and FGC3 (see FIG. 10D) are generated.
Next, in the charged particle beam drawing apparatus 10 according to the third embodiment, as shown in FIG. 13, the format conversion unit 10b1a3 converts the format of the intermediate data D3 including the non-arbitrary figure (not shown). Then, drawing data D2 is generated.
In other words, according to the charged particle beam drawing apparatus 10 of the third embodiment in which the common side of a large number of adjacent trapezoid figures is deleted during the drawing data generation process, and the number of trapezoid figures is reduced. For example, compared to a charged particle beam drawing apparatus or drawing data generation apparatus in which the common sides of many adjacent trapezoid figures are not deleted during the drawing data generation process and the number of trapezoid figures is not reduced, drawing data D2 after format conversion The number of figures included in (see FIG. 13) can be reduced, and as a result, the amount of drawing data D2 after format conversion can be reduced.

Hereinafter, a fourth embodiment of the charged particle beam drawing apparatus of the present invention will be described. The charged particle beam drawing apparatus 10 of the fourth embodiment is configured in substantially the same manner as the charged particle beam drawing apparatus 10 of the third embodiment described above, except for the points described below. FIG. 16 is a detailed view of the control computer 10b1 of the charged particle beam drawing apparatus 10 of the fourth embodiment.
In the charged particle beam drawing apparatus 10 of the fourth embodiment, the opening 10a1l ′ (see FIG. 3A) of the first shaping aperture 10a1l (see FIG. 3A) and the second shaping aperture 10a1m (see FIG. 3A). )) Of the charged particle beam 10a1b (see FIG. 3 (A)) that is transmitted through the opening 10a1m ′ (see FIG. 3 (A)) and irradiates the resist of the sample M (see FIG. 3 (A)). When a graphic (arbitrary angle graphic) having a shape that does not match the cross-sectional shape is included in the design data D1 (see FIGS. 1 and 16), the arbitrary data included in the intermediate data D3 generated from the design data D1 The shape of the square figure matches the horizontal sectional shape of the charged particle beam 10a1b (see FIG. 3A) irradiated to the resist of the sample M (see FIG. 3A) (the shape of the non-arbitrary figure) To change to But it is performed by any angle division portion 10b1a2 rendering data generation unit 10B1a (see FIG. 16) (see FIG. 16) and graphics shape changing unit 10B1a1 (see FIG. 16). As a result, in the charged particle beam drawing apparatus 10 according to the fourth embodiment, all the figures in the intermediate data D3 including the figure changed from the shape of the arbitrary angle figure to the shape of the non-arbitrary angle figure by the processing are supported. The pattern can be drawn on the resist of the sample M by the charged particle beam 10a1b.

FIGS. 17 and 18 illustrate arbitrary angle division processing and graphics executed by the arbitrary angle division unit 10b1a2 (see FIG. 16) of the drawing data generation unit 10b1a (see FIG. 16) of the charged particle beam drawing apparatus 10 of the fourth embodiment. It is a figure for demonstrating the figure shape change process performed by shape change part 10b1a1 (refer FIG. 16).
In the charged particle beam drawing apparatus 10 of the fourth embodiment, as shown in FIG. 16, when the design data D1 is input to the drawing data generation unit 10b1a, the same as the charged particle beam drawing apparatus 10 of the third embodiment. In addition, the intermediate data generation processing is executed by the intermediate data generation unit 10b1a4, and the intermediate data D3 is generated.
As an example, the design data D1 (see FIGS. 1 and 16) input to the drawing data generation unit 10b1a (see FIG. 16) is added to a polygonal figure (arbitrary angle figure) FGPL (see FIG. 14 (see FIG. 14)). A description will be given of the intermediate data generation processing in the case where (see A) is included.
In the example shown in FIGS. 17 and 18, when the intermediate data generation process is executed, the polygonal figure (arbitrary angle figure) FGPL (see FIG. 14A) is divided, and as a result, the common sides BI, CH, Four adjacent trapezoidal figures (arbitrary angle figures) FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 17A) having DG (see FIG. 17A) are generated.

In the charged particle beam drawing apparatus 10 of the fourth embodiment, similarly to the charged particle beam drawing apparatus 10 of the third embodiment, data of the trapezoidal figure FGPLa in the intermediate data D3 (see FIG. 16) (FIG. 15B ))), The trapezoidal figures FGPLa, FGPLb, FGPLc, and FGPLd adjacent to each other (see FIG. 17A) are arbitrary angle figures. Can be grasped.
Further, in the charged particle beam drawing apparatus 10 of the fourth embodiment, for example, data of a trapezoid graphic FGPLa, data of a trapezoid graphic FGPLb, and data of a trapezoid graphic FGPLc are similar to the charged particle beam drawing apparatus 10 of the third embodiment. A plurality of adjacent trapezoidal graphic data, such as trapezoidal graphic FGPLd data (see FIG. 15B), are defined in a lump on intermediate data D3 (see FIG. 16). Further, two adjacent trapezoidal graphic data are continuously defined on the intermediate data D3.
Next, in the charged particle beam drawing apparatus 10 of the fourth exemplary embodiment, as shown in FIG. 16, for example, trapezoidal figures (arbitrary figure) FGPLa, FGPLb, FGPLc, FGPLd (FIG. 17A) 5), for example, as in the charged particle beam drawing apparatus 10 of the first embodiment, an arbitrary angle division process as shown in FIG. 5 is executed, and a non-arbitrary angle graphic FGPLa ′, FGPLb ′, FGPLc ′, and FGPLd ′ (see FIG. 17B) are generated.

Moreover, in the charged particle beam drawing apparatus 10 of the fourth embodiment, as shown in FIG. 16, the non-arbitrary figure FGC (see FIG. 16) included in the intermediate data D3 (see FIG. 16) is obtained by the arbitrary angle dividing unit 10b1a2. 10 (C)), for example, as in the charged particle beam drawing apparatus 10 of the first and third embodiments, for example, fracture processing as shown in FIG. 10 (C) and FIG. 10 (D) is performed. Non-arbitrary figures FGC1, FGC2, and FGC3 (see FIG. 10D) are generated.
Next, in the charged particle beam drawing apparatus 10 of the fourth embodiment, “arbitrary angle graphic information” (FIG. 15B) is displayed at a time point before the arbitrary angle division processing by the arbitrary angle division unit 10b1a2 (see FIG. 16) is executed. )) Is a plurality of adjacent trapezoidal figures (arbitrary angle figures) FGPLa, FGPLb, FGPLc, FGPLd (see FIG. 17A) included in the data, and non-arbitrary figures FGPLa ′, FGPLb ′, FGPLc. For “, FGPLd” (see FIG. 17B), as shown in FIG. 16, the graphic shape changing unit 10b1a1 executes graphic shape changing processing. Specifically, in the example shown in FIGS. 17B and 17C, four adjacent non-arbitrary-angle figures FGPLa ′, FGPLb ′, FGPLc ′, and FGPLd ′ (see FIG. 17B). A plurality of grids G11, G12,..., G53, G54 (see FIG. 17C) are set. Specifically, in the example shown in FIG. 17C, the X axis direction dimension tx and the Y axis direction dimension ty of each grid G11,..., G54 are the upper limit values δmax (FIG. 5B and FIG. 5D). Reference) and a predetermined coefficient.
Specifically, in the charged particle beam drawing apparatus 10 of the fourth embodiment, four non-arbitrary-angle graphics FGPLa ′, FGPLb ′, FGPLc ′, and FGPLd ′ adjacent to each other by the figure shape changing unit 10b1a1 (see FIG. 16). When the graphic shape changing process for (see FIG. 17D) is started, first, the shape of each non-arbitrary-angle graphic FGPLa ′, FGPLb ′, FGPLc ′, FGPLd ′ (see FIG. 17D) is changed. The shape is changed to one or more grids G11,..., G54 (see FIG. 17C). Specifically, in the example shown in FIG. 17D and FIG. 18A, the shape of the non-arbitrary figure FGPLa ′ (see FIG. 17D) is two grids G12 and G13 (FIG. 17C )) To generate a non-arbitrary figure FGPLa ″ (see FIG. 18A). Specifically, in the example shown in FIGS. 17D and 18A, the grid G12 is generated. Since the pattern area density of the non-arbitrary-angle figure FGPLa ′ (see FIG. 17D) in FIG. 17C is, for example, 50% or more, as a result of the figure shape changing process, the grid G12 (see FIG. C)) is determined to constitute a part of the non-arbitrary figure FGPLa ″ (see FIG. 18A). Furthermore, the pattern area density of the non-arbitrary-angle graphic FGPLa ′ (see FIG. 17D) in the grid G13 (see FIG. 17C) is, for example, 50% or more. It is determined that (see FIG. 17C) constitutes a part of the non-arbitrary figure FGPLa ″ (see FIG. 18A). On the other hand, the non-arbitrary figure in the grid G22 (see FIG. 17C). Since the pattern area density of FGPLa ′ (see FIG. 17D) is less than 50%, for example, as a result of the graphic shape changing process, the grid G22 (see FIG. It is determined that it does not constitute a part of (see (A)). In addition, since the pattern area density of the non-arbitrary-angle graphic FGPLa ′ (see FIG. 17D) in the grid G23 (see FIG. 17C) is, for example, less than 50%, the graphic shape changing process results in the grid G23. It is determined that (see FIG. 17C) does not constitute a part of the non-arbitrary figure FGPLa ″ (see FIG. 18A).

Similarly, in the example shown in FIGS. 17D and 18A, the shape of the non-arbitrary-angle figure FGPLc ′ (see FIG. 17D) has four grids G32, G33, G42, and G43 (FIG. 17). (See (C)), and a non-arbitrary figure FGPLc ″ (see FIG. 18A) is generated. Further, in the examples shown in FIGS. 17D and 18B, non-arbitrary figures FGPLc ″ are generated. The shape of the square graphic FGPLb ′ (see FIG. 17D) is changed to the shape of four grids G22, G23, G32, and G33 (see FIG. 17C), and the non-arbitrary graphic FGPLb ″ (FIG. 18 ( B)) is generated. Further, the shape of the non-arbitrary figure FGPLd ′ (see FIG. 17D) is changed to the shape of the two grids G52 and G53 (see FIG. 17C), and the non-arbitrary figure FGPLd ″ (FIG. 18 ( B)) is generated.
Next, in the example shown in FIG. 18, four non-arbitrary-angle graphics FGPLa ″, FGPLb ″, FGPLc ″, FGPLd ″ (FIG. 18A and FIG. )) Is merged to generate one non-arbitrary figure FGPL ″ (see FIG. 18D). On the other hand, in the example shown in FIG. 18, non-arbitrary figure FGPLb ″ (FIG. 18B )) And the non-arbitrary figure FGPLc ″ (see FIG. 18A) overlap at the positions of the two grids G32 and G33 (see FIG. 17C). When only the merge processing of the non-arbitrary angle figures FGPLa ″, FGPLb ″, FGPLc ″, and FGPLd ″ (see FIGS. 18A and 18B) is performed, the resist of the sample M (see FIG. 3A) is obtained. 2 of the Drawing data D2 (see FIG. 16) is generated in which the charged particle beam 10a1b (see FIG. 3A) is irradiated twice at positions corresponding to the dots G32 and G33 (see FIG. 17C). In view of this point, in the charged particle beam drawing apparatus 10 of the fourth embodiment, four non-arbitrary-angle figures FGPLa ″, FGPLb ″, FGPLc ″, FGPLd ″ (FIG. 18A and FIG. 18 ( B) (see FIG. 18 (C)) is executed when merge processing is performed, and a non-arbitrary figure FGPL ″ (see FIG. 18 (D)) is generated. The As a result, the charged particle beam drawing apparatus 10 of the fourth embodiment corresponds to two grids G32 and G33 (see FIG. 17C) of the resist of the sample M (see FIG. 3A). Drawing data D2 (see FIG. 16) in which the charged particle beam 10a1b (see FIG. 3A) is not irradiated twice at the position can be generated.

That is, in the example shown in FIGS. 17 and 18, four non-arbitrary angle graphics FGPLa ′, FGPLb ′, FGPLc ′, and FGPLd ′ (FIG. 17B shown in FIG. )) Is changed to the shape of one non-arbitrary figure FGPL ″ (see FIG. 18D).
Specifically, in the examples shown in FIGS. 17 and 18, arbitrary angle figures FGPLa, FGPLb, FGPLc, FGPLd (see FIG. 17A) before the shape is changed, and non-arbitrary shapes after the shape is changed. Each grid G11,..., So that the error from the angle figure FGPL ”(see FIG. 18D) is, for example, not more than the upper limit value δmax of several tens of nm (see FIG. 5B and FIG. 5D). An X-axis direction dimension tx (see FIG. 17C) and a Y-axis direction dimension ty (see FIG. 17C) of G54 (see FIG. 17C) are set.
In the charged particle beam drawing apparatus 10 according to the fourth embodiment, as shown in FIG. 16, an arbitrary angle dividing process (specifically, an arbitrary angle dividing unit 10b1a2 before the graphic shape changing process by the graphic shape changing unit 10b1a1) 17 (A) and FIG. 17 (B)) is executed, but in a modified example of the charged particle beam drawing apparatus 10 of the fourth embodiment, instead of arbitrary angle division by the arbitrary angle division unit 10b1a2. The processing is omitted, and the shape of the arbitrary angle graphics FGPLa, FGPLb, FGPLc, and FGPLd (see FIG. 17A) is changed to one or more grids G11,. It is also possible to change to the shape of

Next, in the charged particle beam drawing apparatus 10 of the fourth embodiment, as shown in FIG. 16, the format conversion unit 10b1a3 converts the format of the intermediate data D3 including the non-arbitrary figure (not shown). Then, drawing data D2 is generated.
In other words, the shapes of the plurality of figures FGPLa ′, FGPLb ′, FGPLc ′, FGPLd ′ (see FIG. 17B) are the grids G11,..., G54 (see FIG. 17C) during the drawing data generation process. According to the charged particle beam drawing apparatus 10 of the fourth embodiment in which a merge process for reducing the number of figures is executed while being changed to a shape, the number of figures is not reduced during the drawing data generation process. Compared to the particle beam drawing apparatus or the drawing data generation apparatus, the number of figures included in the drawing data D2 after the format conversion (see FIG. 16) can be reduced. As a result, the data amount of the drawing data D2 after the format conversion Can be reduced.
In the charged particle beam drawing apparatus 10 of the first, third, and fourth embodiments, drawing data generation processing is performed by the control computer 10b1 of the charged particle beam drawing apparatus 10 (see FIGS. 1, 2, 13, and 16). Although it is executed by the included drawing data generation unit 10b1a (see FIGS. 2, 13, and 16), in another example, instead of the design data (CAD data, layout data) D1, the charged particle beam drawing apparatus It is also possible to execute a drawing data generation process by a drawing data generation device (not shown) that generates the drawing data D2 (see FIG. 2, FIG. 13 and FIG. 16) by converting into the format for 10.
In the fifth embodiment, the above-described first to fourth embodiments and each example can be appropriately combined.

  The drawing data generation method of the present invention is applicable to, for example, a drawing data generation device for generating drawing data D2, an inspection device for inspecting drawing data D2, and the like.

DESCRIPTION OF SYMBOLS 10 Charged particle beam drawing apparatus 10a Drawing part 10a1b Charged particle beam 10a1l, 10a1m Molding aperture 10b1a Drawing data generation part 10b1a1 Graphic shape change part 10b1a2 Arbitrary angle division part 10b1a3 Format conversion part M Sample

Claims (5)

By irradiating the sample having the resist coated on the upper surface with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture, a pattern corresponding to the figure included in the drawing data is formed on the sample. A drawing section for drawing on the resist;
When the design data includes a figure having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the sample resist, the shape of the figure after execution of the process is irradiated to the sample resist. An arbitrary angle dividing unit that executes a process of changing the shape of the figure included in the design data so as to match the horizontal cross-sectional shape of the charged particle beam to be
A format conversion unit that converts the format of the design data to generate drawing data;
Before executing the processing by the arbitrary angle dividing unit, among the figures included in the design data, for polygonal figures having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample, A charged particle beam drawing apparatus comprising: a graphic shape changing unit that executes processing for reducing the number of vertices. By irradiating the sample having the resist coated on the upper surface with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture, a pattern corresponding to the figure included in the drawing data is formed on the sample. A drawing section for drawing on the resist;
When the polygon data having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, the polygon graphic included in the design data is divided. An intermediate data generation unit for generating a plurality of adjacent trapezoidal figures having a common side and generating intermediate data;
When the intermediate data includes a figure having a shape that does not match the horizontal cross-sectional shape of the charged particle beam applied to the sample resist, the shape of the figure after processing is applied to the sample resist. An arbitrary angle dividing unit that executes a process of changing the shape of the figure included in the intermediate data so as to match the horizontal sectional shape of the charged particle beam to be
A format conversion unit that converts the format of the intermediate data to generate drawing data;
A plurality of adjacent trapezoidal figures having shapes that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample among the figures included in the intermediate data before execution of processing by the arbitrary angle dividing unit On the other hand, a charged particle beam drawing apparatus comprising: a graphic shape changing unit that deletes a common side and executes a process of changing the plurality of adjacent trapezoidal figures to one trapezoidal figure . By irradiating the sample having the resist coated on the upper surface with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture, a pattern corresponding to the figure included in the drawing data is formed on the sample. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus for drawing on a resist,
When a polygon figure having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, a condition for reducing the number of vertices of the polygon figure is set. A determination is made as to whether or not the condition is satisfied, and if the condition for reducing the number of vertices of the polygonal figure is satisfied, a process of reducing the number of vertices of the polygonal figure is executed, The processing of changing the shape of the figure on which the processing for reducing the number is performed so as to match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample is performed, and the format of the design data is converted. A drawing data generation method characterized by generating drawing data. By irradiating the sample having the resist coated on the upper surface with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture, a pattern corresponding to the figure included in the drawing data is formed on the sample. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus for drawing on a resist,
When the polygon data having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, the polygon graphic included in the design data is divided. By generating a plurality of adjacent trapezoid figures having a common side, and generating intermediate data including data of the plurality of adjacent trapezoid figures,
When generating the intermediate data, the data of the plurality of adjacent trapezoidal figures are continuously defined on the intermediate data, and a polygonal figure before division is applied to a charged particle beam irradiated onto the resist of the sample. The information indicating that the shape does not match the horizontal cross-sectional shape is included in the data of the plurality of adjacent trapezoidal figures,
To delete a common side of the plurality of adjacent trapezoidal figures having a shape that does not match the horizontal sectional shape of the charged particle beam irradiated to the resist of the sample among the figures included in the intermediate data If the condition for deleting the common side is satisfied, then the process for deleting the common side is executed, and then the process for deleting the common side is executed. In addition, the process of changing the shape of the plurality of adjacent trapezoidal figures to one trapezoidal figure so as to match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample, A drawing data generation method characterized by generating drawing data by converting a format. By irradiating the sample having the resist coated on the upper surface with the charged particle beam transmitted through at least the first shaping aperture and the second shaping aperture, a pattern corresponding to the figure included in the drawing data is formed on the sample. In a drawing data generation method for generating drawing data used in a charged particle beam drawing apparatus for drawing on a resist,
When the polygon data having a shape that does not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample is included in the design data, the polygon graphic included in the design data is divided. By generating a plurality of adjacent trapezoid figures having a common side, and generating intermediate data including data of the plurality of adjacent trapezoid figures,
When generating the intermediate data, the data of the plurality of adjacent trapezoidal figures are continuously defined on the intermediate data, and a polygonal figure before division is applied to a charged particle beam irradiated onto the resist of the sample. The information indicating that the shape does not match the horizontal cross-sectional shape is included in the data of the plurality of adjacent trapezoidal figures,
Of the figures included in the intermediate data, the plurality of adjacent trapezoid figures having shapes that do not match the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample are processed after the processing is performed. The process of changing the shape of the trapezoidal figure was executed so that the shape of the figure matched the horizontal cross-sectional shape of the charged particle beam irradiated to the resist of the sample, and then the process of changing the shape was executed A portion in which the shape of the shape is changed to a grid shape for the plurality of adjacent shapes, merge processing for reducing the number of shapes is performed, and a plurality of shapes overlaps with the merge processing A drawing data generation method characterized in that the drawing data is generated by executing a process for removing the image data and converting the format of the intermediate data.

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