JP5657806B2 - シールド変調された同調可能なインダクタデバイス - Google Patents
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Description
本明細書に記載される主題の実施形態は概して、集積化インダクタデバイスに関する。より具体的には、主題の実施形態は、同調可能なインダクタンスを有する集積化インダクタデバイスに関する。
Claims (15)
- 半導体デバイスであって、
半導体材料層と、
前記半導体材料層の上に形成されるゲート構造と、
前記半導体デバイスのための電界効果トランジスタを含む前記半導体材料層内に画定される第1の連続リング状活性領域と、
前記ゲート構造の上かつ前記第1の連続リング状活性領域の上に形成される誘電材料層と、
前記誘電材料層の上に形成される導電性インダクタループであって、前記導電性インダクタループと関連するインダクタンスを変調するように前記電界効果トランジスタが制御される導電性インダクタループと、
前記半導体材料層内に画定され、前記第1の連続リング状活性領域と絶縁した、活性半導体材料の二次リング状領域であって、該二次リング状領域内に画定される二次ソース領域および二次ドレイン領域を有する二次リング状領域と、
前記活性半導体材料の前記二次リング状領域の上に直角に重なる二次ゲート構造と、を備え、
前記導電性インダクタループは、前記活性半導体材料の前記第1の連続リング状活性領域の上に重なる第1の巻きと、前記活性半導体材料の前記二次リング状領域の上に重なる第2の巻きとを備える、半導体デバイス。 - 前記ゲート構造のそれぞれは、前記導電性インダクタループに垂直な主縦軸を有する、請求項1に記載の半導体デバイス。
- 前記導電性インダクタループは、第1の平面内に存在し、
前記第1の平面に平行である基準面に対する前記導電性インダクタループの投影は、前記基準面に対する前記第1の連続リング状活性領域の投影の範囲内にある、請求項1に記載の半導体デバイス。 - 前記電界効果トランジスタの導電状態および非導電状態を制御する、前記電界効果トランジスタに連結されるトランジスタ電圧コントローラをさらに備える、請求項1に記載の半導体デバイス。
- 前記トランジスタ電圧コントローラは、前記ゲート構造に連結され、前記ゲート構造のための共通ゲート電圧を変調することによって前記電界効果トランジスタの導電状態および非導電状態を制御する、請求項4に記載の半導体デバイス。
- 前記トランジスタ電圧コントローラは、前記電界効果トランジスタを導電状態にバイアスして、前記導電性インダクタループが前記第1の連続リング状活性領域内にループ電流を誘導することを可能にし、
前記トランジスタ電圧コントローラは、前記電界効果トランジスタを非導電状態にバイアスして、前記導電性インダクタループが前記第1の連続リング状活性領域内にループ電流を誘導するのを抑止する、請求項4に記載の半導体デバイス。 - 集積化インダクタデバイスであって、
導電性インダクタループと、
トランジスタ配置であって、該トランジスタ配置内に画定されるソース領域およびドレイン領域を有する活性半導体材料の第1の連続リング状領域と、前記活性半導体材料の前記第1の連続リング状領域の上に直角に重なるゲート構造とを備えるトランジスタ配置と、
前記導電性インダクタループと前記トランジスタ配置との間の誘電材料であって、前記トランジスタ配置が、前記集積化インダクタデバイスのインダクタンスに影響を及ぼす、前記集積化インダクタデバイスの電圧変調されたシールドとして機能する、誘電材料と、を備え、
前記導電性インダクタループは、第1の巻きおよび第2の巻きを備え、
前記第1の巻きは、前記活性半導体材料の前記第1の連続リング状領域の上に重なり、
前記トランジスタ配置は、前記活性半導体材料の前記第1の連続リング状領域から絶縁された、活性半導体材料の二次リング状領域であって、該二次リング状領域内に画定される二次ソース領域および二次ドレイン領域を有する二次リング状領域をさらに備え、
前記第2の巻きは、前記活性半導体材料の前記二次リング状領域の上に重なる、集積化インダクタデバイス。 - 前記トランジスタ配置に連結され、前記活性半導体材料の前記第1の連続リング状領域の導電状態および非導電状態を制御するトランジスタ電圧コントローラをさらに備える、請求項7に記載の集積化インダクタデバイス。
- 前記トランジスタ配置に連結され、前記活性半導体材料の前記第1の連続リング状領域および前記活性半導体材料の前記二次リング状領域の導電状態および非導電状態を独立して制御するトランジスタ電圧コントローラをさらに備える、請求項7に記載の集積化インダクタデバイス。
- 前記トランジスタ配置は、前記活性半導体材料の前記第1の連続リング状領域を、前記導電性インダクタループによって誘導されるループ電流を収容する導電性パスに転換するために、導電状態で動作するようにバイアスされ、
前記トランジスタ配置は、前記活性半導体材料の前記第1の連続リング状領域を、前記導電性インダクタループによって誘導されるループ電流の形成を抑止する非導電性パスに転換するために、非導電状態で動作するようにバイアスされる、請求項7に記載の集積化インダクタデバイス。 - 半導体基板上に形成される集積化インダクタであって、第1の巻きおよび第2の巻きを備える導電性インダクタループを有する集積化インダクタと、
トランジスタ配置であって、該トランジスタ配置内に画定されるソース領域およびドレイン領域を有する活性半導体材料の第1の連続リング状領域と、前記活性半導体材料の前記第1の連続リング状領域の上に直角に重なるゲート構造とを備え、前記集積化インダクタによって誘導されるループ電流を変調するために前記半導体基板上に形成されるトランジスタ配置と、
前記集積化インダクタを前記トランジスタ配置から絶縁するための誘電材料と、
前記トランジスタ配置の導電性動作状態および非導電性動作状態を選択するために前記トランジスタ配置に連結されるコントローラであって、前記トランジスタ配置の導電性動作状態は、前記トランジスタ配置内に誘導されるループ電流の形成を可能にし、前記トランジスタ配置の非導電性動作状態は、前記トランジスタ配置内に誘導されるループ電流の形成を抑止する、コントローラと、を備え、
前記第1の巻きは、前記活性半導体材料の前記第1の連続リング状領域の上に重なり、
前記トランジスタ配置は、前記活性半導体材料の前記第1の連続リング状領域から絶縁された、活性半導体材料の二次リング状領域であって、該二次リング状領域内に画定される二次ソース領域および二次ドレイン領域を有する二次リング状領域をさらに備え、
前記トランジスタ配置は、前記活性半導体材料の前記二次リング状領域の上に直角に重なる二次ゲート構造をさらに備え、
前記第2の巻きは、前記活性半導体材料の前記二次リング状領域の上に重なる、半導体デバイス。 - 前記半導体基板は、半導体材料を備え、
前記トランジスタ配置は、前記半導体材料内に画定される活性領域と、前記活性領域内に画定されるソース領域と、前記活性領域内に画定されるドレイン領域と、前記活性領域の上に且つ前記活性領域に直角に形成されるゲート構造とを備え、前記ソース領域、前記ドレイン領域および前記ゲート構造は、電界効果トランジスタを形成するために協働する、請求項11に記載の半導体デバイス。 - 前記コントローラは、前記電界効果トランジスタを導電状態にバイアスして、前記集積化インダクタが前記活性領域内にループ電流を誘導することを可能にし、
前記コントローラは、前記電界効果トランジスタを非導電状態にバイアスして、前記集積化インダクタが前記活性領域内にループ電流を誘導するのを抑止する、請求項12に記載の半導体デバイス。 - 前記活性領域は、前記集積化インダクタの導電性インダクタループの下に重なる、連続し且つ隣接するリングを形成する、請求項12に記載の半導体デバイス。
- 前記半導体基板は、半導体材料を備え、
前記トランジスタ配置は、前記半導体材料内に画定される活性領域と、前記活性領域内に画定されるソース領域と、前記活性領域内に画定されるドレイン領域と、前記活性領域の上に且つ前記活性領域に直角に形成されるゲート構造とを備え、前記ソース領域、前記ドレイン領域および前記ゲート構造は、直列に連結された複数の電界効果トランジスタを形成するために協働する、請求項11に記載の半導体デバイス。
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US12/904,812 US8466536B2 (en) | 2010-10-14 | 2010-10-14 | Shield-modulated tunable inductor device |
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PCT/US2011/056184 WO2012051435A2 (en) | 2010-10-14 | 2011-10-13 | Shield-modulated tunable inductor device |
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US8816397B2 (en) * | 2012-12-21 | 2014-08-26 | The United States Of America As Represented By The Secretary Of The Army | Ring-shaped transistors providing reduced self-heating |
CN103327418B (zh) * | 2013-05-21 | 2018-04-27 | 深圳Tcl新技术有限公司 | 终端数据云分享的控制方法、服务器及终端 |
US9275986B2 (en) * | 2013-11-14 | 2016-03-01 | Infineon Technologies Ag | Transistor and tunable inductance |
US9583554B1 (en) * | 2014-12-23 | 2017-02-28 | Altera Corporation | Adjustable ground shielding circuitry |
US20220413091A1 (en) * | 2021-06-28 | 2022-12-29 | Texas Instruments Incorporated | Field-aware metal fills for integrated circuit passive components |
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JP3488164B2 (ja) * | 2000-02-14 | 2004-01-19 | Necエレクトロニクス株式会社 | 半導体装置 |
JP2002198490A (ja) | 2000-12-26 | 2002-07-12 | Toshiba Corp | 半導体装置 |
JP4274730B2 (ja) | 2002-01-30 | 2009-06-10 | 株式会社ルネサステクノロジ | 半導体集積回路装置 |
US7061072B2 (en) | 2002-12-26 | 2006-06-13 | Jbcr Innovations, Llp | Integrated circuit inductors using driven shields |
CN100375283C (zh) * | 2003-05-29 | 2008-03-12 | 三菱电机株式会社 | 半导体装置 |
SE0302107D0 (sv) | 2003-07-18 | 2003-07-18 | Infineon Technologies Ag | Electromagnetic device and method of operating the same |
JP2005064263A (ja) | 2003-08-13 | 2005-03-10 | Rikogaku Shinkokai | 可変インダクタ |
US7268409B2 (en) * | 2004-05-21 | 2007-09-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Spiral inductor with electrically controllable resistivity of silicon substrate layer |
JP2006179596A (ja) * | 2004-12-21 | 2006-07-06 | Mitsubishi Electric Corp | 半導体装置 |
US7538652B2 (en) | 2006-08-29 | 2009-05-26 | International Business Machines Corporation | Electrical component tuned by conductive layer deletion |
JP4652434B2 (ja) | 2007-09-22 | 2011-03-16 | 太陽誘電株式会社 | 可変インダクタ及びこれを回路構成に組み入れた電子回路装置 |
US8559186B2 (en) | 2008-04-03 | 2013-10-15 | Qualcomm, Incorporated | Inductor with patterned ground plane |
US20100019300A1 (en) * | 2008-06-25 | 2010-01-28 | The Trustees Of Columbia University In The City Of New York | Multilayer integrated circuit having an inductor in stacked arrangement with a distributed capacitor |
US8374045B2 (en) * | 2009-12-07 | 2013-02-12 | Spansion Israel Ltd | Methods circuits devices and systems for operating an array of non-volatile memory cells |
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WO2012051435A2 (en) | 2012-04-19 |
US20120091558A1 (en) | 2012-04-19 |
KR101773996B1 (ko) | 2017-09-01 |
US8466536B2 (en) | 2013-06-18 |
CN103155149A (zh) | 2013-06-12 |
KR20130119437A (ko) | 2013-10-31 |
EP2628180B1 (en) | 2014-12-10 |
CN103155149B (zh) | 2016-11-02 |
WO2012051435A3 (en) | 2012-06-28 |
JP2013545292A (ja) | 2013-12-19 |
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