JP5569945B2 - 核スピン偏極検出装置および核スピン偏極検出方法 - Google Patents
核スピン偏極検出装置および核スピン偏極検出方法 Download PDFInfo
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- JP5569945B2 JP5569945B2 JP2011546122A JP2011546122A JP5569945B2 JP 5569945 B2 JP5569945 B2 JP 5569945B2 JP 2011546122 A JP2011546122 A JP 2011546122A JP 2011546122 A JP2011546122 A JP 2011546122A JP 5569945 B2 JP5569945 B2 JP 5569945B2
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- 230000010287 polarization Effects 0.000 title claims description 69
- 238000001514 detection method Methods 0.000 title claims description 20
- 238000000926 separation method Methods 0.000 claims description 35
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 14
- 238000005481 NMR spectroscopy Methods 0.000 claims description 11
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 5
- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 5
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 claims 1
- 239000002096 quantum dot Substances 0.000 claims 1
- 239000000523 sample Substances 0.000 description 19
- 230000005355 Hall effect Effects 0.000 description 11
- 238000005259 measurement Methods 0.000 description 7
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000005283 ground state Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000005658 nuclear physics Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
- G01R33/28—Details of apparatus provided for in groups G01R33/44 - G01R33/64
- G01R33/32—Excitation or detection systems, e.g. using radio frequency signals
- G01R33/323—Detection of MR without the use of RF or microwaves, e.g. force-detected MR, thermally detected MR, MR detection via electrical conductivity, optically detected MR
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N24/00—Investigating or analyzing materials by the use of nuclear magnetic resonance, electron paramagnetic resonance or other spin effects
- G01N24/08—Investigating or analyzing materials by the use of nuclear magnetic resonance, electron paramagnetic resonance or other spin effects by using nuclear magnetic resonance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66984—Devices using spin polarized carriers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/20—Arrangements or instruments for measuring magnetic variables involving magnetic resonance
- G01R33/28—Details of apparatus provided for in groups G01R33/44 - G01R33/64
- G01R33/30—Sample handling arrangements, e.g. sample cells, spinning mechanisms
- G01R33/307—Sample handling arrangements, e.g. sample cells, spinning mechanisms specially adapted for moving the sample relative to the MR system, e.g. spinning mechanisms, flow cells or means for positioning the sample inside a spectrometer
Description
例えば非特許文献1には、GaAs系二次元量子井戸の二次元面に垂直に磁場を加え、その際に生じる分数量子ホール効果の特性や整数量子ホール効果の特性から核スピン偏極を検出する方法が開示されている(非特許文献1)。
例えば、非特許文献2および非特許文献3には、GaAs二次元系の核スピン制御に円偏光を用いた技術が開示されている(非特許文献2、非特許文献3)。
磁場強度は例えば8T程度である。
具体的な手順は以下の通りである。
まず、核スピン偏極の検出対象として、図1Bに示すような構造を有するInSb二次元量子構造を用意した。
次に、作製した試料3を核スピン偏極装置1内に載置し、磁場を加えた。本実施例では、磁場を0〜15Tまで変化させながらチャンバ2の外側にある図示しない超伝導マグネット等を用いて直流磁場を図1Aの上下方向に印加し、傾斜装置5を用いて試料3を回転させて、傾斜角度を変えては磁場を変化させて、磁気抵抗効果を測定した。
具体的には、試料3の外側に巻いたコイル7に交流電流を流すことで、In核ならびにSb核の共鳴周波数に対応する振動磁場を試料3に加えた。
2 チャンバ
3 試料
5 傾斜装置
7 コイル
9 電源
11 電源
13 抵抗測定器
Claims (13)
- 二次元量子構造を磁場中で傾斜させてランダウ準位分離とゼーマン準位分離を交差させる交差部と、
前記二次元量子構造の核スピンを偏極させる偏極部と、
を有し、
前記交差部がランダウ準位分離とゼーマン準位分離を交差させた部分の核スピンの偏極を検出することを特徴とする核スピン偏極検出装置。 - 前記偏極部は、
前記二次元量子構造に電流を流すことにより、核スピンを偏極させることを特徴とする請求項1記載の核スピン偏極検出装置。 - 前記交差部がランダウ準位分離とゼーマン準位分離を交差させた部分のうち、交差時に異なるスピン状態のドメインが形成されている部分を選択する選択部を有し、
前記選択部が選択した部分の核スピン偏極を検出することを特徴とする請求項2記載の核スピン偏極検出装置。 - 前記二次元量子構造に電流を流した際の、前記交差部がランダウ準位分離とゼーマン準位分離を交差させた部分の抵抗変化から核スピン偏極を検出することを特徴とする請求項2または3のいずれか一項に記載の核スピン偏極検出装置。
- 前記二次元量子構造は、InSb、InAs、InGaAsのいずれかであることを特徴とする請求項1〜4のいずれか一項に記載の核スピン偏極検出装置。
- 請求項1〜5のいずれか一項に記載の核スピン偏極検出装置を有することを特徴とする核磁気共鳴装置。
- 請求項6記載の核磁気共鳴装置を有することを特徴とする量子ビット。
- 請求項1〜5のいずれか一項に記載の核スピン偏極検出装置を有し、得られたNMRスペクトルの四重極分離からひずみを検出することを特徴とする半導体のひずみ検出装置。
- 二次元量子構造を磁場中で傾斜させてランダウ準位分離とゼーマン準位分離を交差させる第1の工程と、
前記二次元量子構造の核スピンを偏極させる第2の工程と、
前記第1の工程が交差させた部分の核スピンの偏極を検出する第3の工程と、
を有することを特徴とする核スピン偏極検出方法。 - 前記第2の工程は、
前記二次元量子構造に電流を流すことにより、核スピンを偏極させることを特徴とする請求項9記載の核スピン偏極検出方法。 - 前記第1の工程と前記第2の工程の間に行われ、前記第1の工程がランダウ準位分離とゼーマン準位分離を交差させた部分のうち、交差時に異なるスピン状態のドメインが形成されている部分を選択する第4の工程をさらに有し、
前記第3の工程は、前記第4の工程が選択した部分の核スピン偏極を検出することを特徴とする請求項10記載の核スピン偏極検出方法。 - 前記第3の工程は、
前記二次元量子構造に電流を流した際の、前記第1の工程がランダウ準位分離とゼーマン準位分離を交差させた部分の抵抗変化から核スピン偏極を検出することを特徴とする請求項10または11のいずれか一項に記載の核スピン偏極検出方法。 - 前記二次元量子構造は、InSb、InAs、InGaAsのいずれかであることを特徴とする請求項9〜12のいずれか一項に記載の核スピン偏極検出方法。
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JP2011546122A JP5569945B2 (ja) | 2009-12-18 | 2010-12-14 | 核スピン偏極検出装置および核スピン偏極検出方法 |
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PCT/JP2010/072438 WO2011074558A1 (ja) | 2009-12-18 | 2010-12-14 | 核スピン偏極検出装置および核スピン偏極検出方法 |
JP2011546122A JP5569945B2 (ja) | 2009-12-18 | 2010-12-14 | 核スピン偏極検出装置および核スピン偏極検出方法 |
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US (1) | US9310449B2 (ja) |
EP (1) | EP2515134A4 (ja) |
JP (1) | JP5569945B2 (ja) |
WO (1) | WO2011074558A1 (ja) |
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JP2014027074A (ja) * | 2012-07-26 | 2014-02-06 | Nippon Telegr & Teleph Corp <Ntt> | 核スピン状態の制御方法、検出方法、制御装置および検出装置 |
CN112113991B (zh) * | 2020-09-25 | 2021-08-31 | 吉林大学 | 一种非局域电阻式核磁共振测量方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH08220033A (ja) * | 1995-02-08 | 1996-08-30 | Yamagata Pref Gov Technopolis Zaidan | 常磁性種の分析方法 |
US5917322A (en) * | 1996-10-08 | 1999-06-29 | Massachusetts Institute Of Technology | Method and apparatus for quantum information processing |
US20030023651A1 (en) * | 2001-04-11 | 2003-01-30 | Whaley K. Birgit | Quantum computation |
JP2006066603A (ja) * | 2004-08-26 | 2006-03-09 | Nippon Telegr & Teleph Corp <Ntt> | 原子核スピン状態制御装置及び検出装置 |
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US7148683B2 (en) * | 2001-10-25 | 2006-12-12 | Intematix Corporation | Detection with evanescent wave probe |
US7291891B2 (en) * | 2001-12-06 | 2007-11-06 | Japan Science And Technology Agency | In-solid nuclear spin quantum calculation device |
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2010
- 2010-12-14 EP EP10837584.1A patent/EP2515134A4/en not_active Withdrawn
- 2010-12-14 JP JP2011546122A patent/JP5569945B2/ja not_active Expired - Fee Related
- 2010-12-14 US US13/516,380 patent/US9310449B2/en not_active Expired - Fee Related
- 2010-12-14 WO PCT/JP2010/072438 patent/WO2011074558A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH08220033A (ja) * | 1995-02-08 | 1996-08-30 | Yamagata Pref Gov Technopolis Zaidan | 常磁性種の分析方法 |
US5917322A (en) * | 1996-10-08 | 1999-06-29 | Massachusetts Institute Of Technology | Method and apparatus for quantum information processing |
US20030023651A1 (en) * | 2001-04-11 | 2003-01-30 | Whaley K. Birgit | Quantum computation |
JP2006066603A (ja) * | 2004-08-26 | 2006-03-09 | Nippon Telegr & Teleph Corp <Ntt> | 原子核スピン状態制御装置及び検出装置 |
Non-Patent Citations (2)
Title |
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JPN4006001723; 佐藤敏幸 他: '高感度電気的検出ESR(EDMR)装置の開発' 山形県工業技術センター報告 No.30, 199903, pp.31-33 * |
JPN7013004324; Y Hirayama et al.: 'Electron-spin/nuclear-spin interactions and NMR in semiconductors' Semicond.Sci.Technol. Vol.24 No.2, 200902, pp.1-22 * |
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WO2011074558A1 (ja) | 2011-06-23 |
EP2515134A1 (en) | 2012-10-24 |
US9310449B2 (en) | 2016-04-12 |
JPWO2011074558A1 (ja) | 2013-04-25 |
US20120256629A1 (en) | 2012-10-11 |
EP2515134A4 (en) | 2013-09-18 |
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