JP5568904B2 - Semiconductor device - Google Patents

Description

  The present invention relates to a structure of an insulated gate bipolar transistor (hereinafter abbreviated as IGBT) having a trench gate structure.

Power devices play a central role as switching elements in power conversion devices such as inverters and converters. Among power devices, IGBTs are widely used in various voltage regions because they have good gate controllability and can achieve a low on-voltage due to the conductivity modulation effect. In the breakdown voltage class of 3300 V or higher, a planar gate IGBT having a gate electrode provided on the surface of a semiconductor substrate is mainly used. On the other hand, in a breakdown voltage class of 1700 V or less, a trench gate structure IGBT in which a trench (trench) is formed on the surface of a semiconductor substrate, an oxide film is formed in the trench, and a gate electrode such as conductive polysilicon is buried. Application has become mainstream. The trench gate structure can have a finer cell structure than the planar gate structure and is a characteristic of the planar gate structure JFET region (a portion where current is concentrated in a region sandwiched between adjacent p base regions) Is not in the trench gate structure, the on-voltage can be further reduced. The IGBT is a bipolar device, and the on-voltage drop, which is a conduction loss in the on state, is mostly a voltage drop in the drift region. Therefore, strengthening the so-called injection enhancement (IE) effect that confines carriers (electrons, holes) in the drift region as much as possible also leads to a low on-voltage. As a surface structure having the IE effect, for example, there is an IEGT structure in which a part of the inversion layer channel is inactivated and holes are accumulated in a drift region near the channel portion (Patent Document 1). In addition, there is an IGBT having a microcell structure in which a P base layer is partially formed in a silicon mesa portion sandwiched between trench sidewalls (Patent Document 2). FIG. 13 shows a cross-sectional view of the microcell structure IGBT described in Patent Document 2. In FIG. 13, a plurality of stripe trenches are provided, and the p base layer 5 is dispersed between the trenches and arranged in an island shape. An n ⁺ emitter layer 6 is selectively formed on the island-shaped p base layer 5. In order to enhance the IE effect with the structure of FIG. 13, for example, based on the cross-sectional view of FIG. 14, the silicon mesa width between trenches (the width of the p base layer 5) is shortened and ^- to deepen the depth of the trench gate 12, which protrudes into the drift layer 1. In this way, the rate at which the turn-off holes arrive at the emitter electrode 11 through portions other than the channel in the p base layer 5 decreases. Further, when the gate is turned on, an electron accumulation layer is formed at the interface between the gate electrode 12 and the gate oxide film 3 on the side wall portion inside the n ⁻ drift layer 1. Therefore, holes are attracted and accumulated around the bottom of the gate electrode 12 by Coulomb force. From the above, the conductivity modulation in the n ⁻ drift layer 1 further proceeds and the resistance of the drift region is reduced. When the IE effect is enhanced in this manner, as disclosed in Non-Patent Document 1, the trade-off characteristics between the on-voltage and the turn-off loss at a constant current density (for example, 100 A / cm ² ) are improved. 14 has a minimum mesa width between the n ⁺ emitter layer 6 and the trench gate 4, between the p ⁺ contact layer 7 and the n ⁺ emitter layer 6, and between the contact region (emitter electrode) 11 and the p ⁺ contact layer. 7 or the accuracy of alignment with the n ⁺ emitter layer 6 and the size error of each region. For example, the dimensions of the respective parts shown in FIG. 14 are values that can be formed in a manufacturing process in which the minimum processing capability is 0.6 μm. In that case, the mesa width is 4.2 μm. Thus, reducing the mesa width as much as possible leads to enhancement of the IE effect, and a low on-voltage can be achieved.

In order to further reduce the mesa width for the purpose of lowering the ON voltage as described above, the n ⁺ emitter layer 7 which is selectively provided in the direction parallel to the paper surface in FIG. As shown in FIG. 15, it may be selectively provided in a (depth) direction that is uniform in the direction parallel to the paper surface and perpendicular to the paper surface. This is because it is not necessary to use all of the inversion layers formed on the trench sidewalls as channels. A basic configuration for this is disclosed in FIG. 9.218 in Non-Patent Document 1. Specifically, the p ⁺ contact layer 7 and the contact opening 16 are not specified, but their positions are easily conceivable. For example, the p ⁺ contact layer 7 may be provided on the surface of the p base layer 5 excluding the n ⁺ emitter layer 6 on the front main surface. FIG. 16 shows a different example of the cross-sectional view along AA ′ in FIG.

    On the other hand, in the case of an IGBT, it is necessary to suppress the saturation current of the element so that the element can be turned off as nondestructively as possible when the element is short-circuited. For this reason, the design must be such that the density of the channel actually formed on the side surface of the trench is lower than the channel density that can be theoretically formed. Furthermore, in the case of trench gate manufacturing, the chip cost is reduced because the manufacturing process is more complicated than planar gate IGBT, such as polysilicon planarization (etchback) or control of the overlap amount between the source / emitter layer and the gate electrode. There is a problem of becoming higher. Therefore, in order to provide a switching device with higher added value and lower cost, it is also necessary to study a simpler manufacturing method and a suitable device structure while maintaining the performance of the IGBT. As an example, Patent Document 3 discloses an IGBT structure including both a planar gate and a trench gate. A representative diagram thereof is shown in FIG. Inversion layers are respectively formed on the trench side wall portion 15a of the p base layer 5 and the substrate surface 15b of the planar gate portion.

    Further, Patent Documents 4 and 5 disclose a structure in which a planar gate and a trench gate intersect each other. The representative figures are shown in FIGS. 18 and 19, respectively. In FIG. 18, the gate electrode 40 embedded in the trench 37 and the auxiliary gate electrode 43 in the planar portion are orthogonal to each other. Also in FIG. 19, the electrode filled in the trench 57 and the second gate extraction electrode 62 arranged orthogonal to the trench 57 are connected.

JP-A-5-243561 JP 2006-210547 A US Pat. No. 6,303,410 JP 2000-228519 A JP 2004-31386 A

B. Jayant Baliga, “Fundamentals of Power Semiconductor Devices” (USA), 1st edition, Schuplinger Science + Business Media Springer Science + Business Media), 2008, p. 1004

As described above, if the IE effect is strengthened and the amount of accumulated holes is increased, the parasitic thyristor may be latched up at the time of turn-off. There is a need. For this purpose, in the element shown in FIG. 14, it is only necessary that the electrical resistance of the route from the channel region under the n ⁺ emitter layer 6 to the p ⁺ contact layer 7 is small. The p ⁺ contact layer 7 is formed to diffuse as much as possible to the lower end of the n ⁺ emitter layer 6 so that the layer does not affect the gate threshold value of the IGBT. For example, the length (L) of the above-described hole path in FIG. 14 is 0.2 μm. In order to obtain the latch-up resistance equivalent to that of the device structure of FIG. 14 in the device structure of FIG. 15, the shortest distance L _C from the center of the n ⁺ emitter layer 6 to the p ⁺ contact layer 7 in FIG. Must be equivalent. In that case, in FIG. 16, the length L _A of the n ⁺ emitter layer 6 formed alternately with the p ⁺ contact layer 7 is

It becomes.

Even when the p ⁺ contact layer 7 having a length of 0.6 μm is formed by a process having a minimum dimension of 0.6 μm, the channel ratio is 40% of the repetition pitch of the n ⁺ emitter layer 6 and the p ⁺ contact layer 7. Here, the channel ratio is the ratio of the area of the effective current path of electrons or holes to the area of the trench channel formed on the trench sidewall. In consideration of dimensional deviation in manufacturing, alignment accuracy, and variation in lot-to-lot diffusion, the length of the n ⁺ emitter layer 6 is further shortened, and the upper limit of the channel width ratio is limited. Also, heat generation on the surface side in the on state or the like is localized in the 40% channel region described above, and heat generation is concentrated in the channel region, which affects the short-circuit withstand capability of the element, which is not preferable.

Further, the electron current flowing in the inversion layer channel formed in the trench sidewall 19 in FIG. 16 is concentrated under the n ⁺ emitter layer 6. Here, the majority of holes are attracted to electrons by Coulomb force and flow from below the n ⁺ emitter layer 6 to the contact opening 16 in the p ⁺ contact layer 7. Therefore, the larger the hole current (density) in the path L _D, exceed the built-in voltage of the voltage drop in the path L _D is, n ⁺ pn junction formed between the emitter layer 6 and the p base layer 5 It becomes easy and the latch-up tolerance of the element is impaired.

    The present invention has been made in view of the above circumstances, and provides a semiconductor device having a high latch-up resistance and a short-circuit resistance while exhibiting a low on-voltage due to an extremely fine silicon mesa.

In order to achieve the above object, in the present invention,
A first conductivity type drift layer,
A plurality of trenches formed in the surface of the drift layer ;
A trench gate formed through an insulating film in the trench,
A mesa region sandwiched between two adjacent trenches;
Two adjacent mesa regions adjacent to the outside of each of the two adjacent trenches;
A second conductivity type base layer formed on the surface of the mesa region and having a diffusion depth shallower than the trench and having a higher impurity concentration than the drift layer;
The adjacent mesa region is a semiconductor region of a first conductivity type or a second conductivity type,
Crossing the two trenches via the insulating film on the base layer and in contact with the trench gate, extending from the two trenches to the surface of the two adjacent mesa regions, and at the upper part of the adjacent mesa region a planar gate formed in plurality in the longitudinal direction of the terminated, and the trench,
A second conductivity type contact layer formed at a higher impurity concentration than the base layer and spaced apart from the planar gate on the base layer;
The contact layer is formed in the mesa region so as to contact the two trenches along the longitudinal direction of the trench, and reaches the contact layer so as to sandwich the contact layer from a lower end portion of the adjacent planar gate . a first conductivity type emitter layer, and having a.
The semiconductor region may be a second conductivity type, and the semiconductor region may be the same diffusion layer as the base layer.
The semiconductor region may be a first conductivity type, the base layer may be provided in a plurality of island shapes dispersed in the longitudinal direction of the trench, and the planar arrangement of the base layer may be a checkered pattern.
It may further have a second conductivity type collector layer of the second main surface of the semiconductor substrate.
Further, an inversion layer channel having the same conductivity type as that of the emitter layer is formed on the surface of the base layer facing the planar gate through the insulating film in response to voltage application to the trench gate and planar gate exceeding a threshold value. And
The two emitter layers facing each other across the surface of the base layer below the planar gate may be connected by the inversion layer channel.

(Operation) According to the configuration of the present invention, the inversion layer channel formed in the p base layer on the side wall of the trench gate is not only in the vicinity of the n ⁺ emitter layer 6, but also the portion where the planar gate and the trench gate are in contact with the inversion layer channel. Become. Therefore, almost the entire inversion layer channel on the side wall portion of the trench gate provided orthogonal to the planar gate becomes an electron injection path, and the channel width is significantly wider than the conventional structure. On the other hand, the provision of the planar gate portion increases the effective channel length of the inversion layer channel.

As described above, by increasing the channel width, holes flowing under the n ⁺ emitter layer 6 are dispersed on the trench gate sidewall and the planar channel of the planar gate, and the hole current density is remarkably reduced. As a result, even if the trench density is increased by setting the mesa width to the minimum width acceptable by the process technology, the latch-up resistance can be greatly improved. Further, the IE effect is enhanced by minimizing the mesa width, and the trade-off characteristic between the turn-off loss and the conduction loss is improved. On the other hand, since the effective channel length is increased by the effect of the surface channel of the planar gate, the saturation current density can be kept relatively small. Furthermore, the heat generation density localized in the vicinity of the channel is relaxed, and the short-circuit resistance is improved.

It is a principal part perspective sectional view of the semiconductor device concerning an embodiment of this invention. It is a principal part perspective sectional view of the semiconductor device concerning an embodiment of this invention. It is a principal part top view of the semiconductor device concerning embodiment of this invention. 2 is a fragmentary cross-sectional view of the semiconductor device according to the embodiment of the present invention, taken along line AA ′ in FIG. It is sectional drawing to which the inversion layer channel part of FIGS. 3-1 was expanded. It is principal part sectional drawing along line 2B 'of a semiconductor device concerning an embodiment of this invention. FIG. 3 is a main-portion cross-sectional view of the semiconductor device according to the embodiment of the present invention, taken along the line 2C-C 'in FIG. It is principal part sectional drawing of the semiconductor device concerning another embodiment corresponded to FIGS. FIG. 5 is a cross-sectional view of main parts of a semiconductor device according to another embodiment corresponding to FIG. 4. FIG. 6 is a fragmentary cross-sectional view of a semiconductor device according to another embodiment corresponding to FIG. 5; It is a principal part top view of the semiconductor device concerning another embodiment of this invention. It is principal part sectional drawing along the FIG. 9AA 'line of the semiconductor device concerning another embodiment of this invention. It is principal part sectional drawing along line BB 'of FIG. 9B of the semiconductor device concerning another embodiment of this invention. It is principal part sectional drawing along CC FIG. 9C 'of the semiconductor device concerning another embodiment of this invention. It is principal part sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example. It is principal part perspective sectional drawing of the semiconductor device of a prior art example.

  Embodiments of the invention will be described in the following examples. Hereinafter, although the first conductivity type is n-type and the second conductivity type is p-type, the present invention can be similarly realized even if the n-type and p-type are interchanged. In the following description, the first and second inversion layer channels of the first conductivity type are referred to as first and second trench channels, and the third inversion layer channel is referred to as a planar channel.

FIG. 1-1 is a perspective cross-sectional view of the first embodiment of the present invention when a main part is cut out. Here, if the groove portion constituting the trench gate in front of FIG. 1-1 is a first trench, the trench gate formed in the first trench is drawn to prevent the drawing from becoming complicated. Only the interface with the oxide film on the side wall of the mesa is drawn. A plurality of stripe-shaped trenches are provided on the surface of the semiconductor substrate having the n ⁻ drift layer 1. A gate oxide film 3 is provided on all inner sidewalls of the trench and part of the surface of the semiconductor substrate between the trenches. A planar gate 12a is provided on the gate oxide film 3 provided on a part of the surface of the semiconductor substrate, a trench gate 12b is provided on the gate oxide film 3 inside the trench, and the planar gate 12a, the trench gate 12b, A gate structure consisting of A p base layer 5 is provided on the surface of the n ⁻ drift layer 1. Between the planar gates of the mesa portion provided with the planar gate, an n ⁺ emitter layer 6 and a p ⁺ contact layer 7 are arranged in parallel to the longitudinal direction of the planar gate. On the other hand, only the p base layer is formed in the mesa portion adjacent via the trench gate. These two mesa portions are periodically provided between the trench gates, but only the mesa portion provided with the planar gate may be used.

FIG. 1-2 is a perspective sectional view further enlarging the cell portion of FIG. 1-1. A cell is a region sandwiched between two planar gates in a mesa portion. Two n ⁺ emitter layers 6 and one p ⁺ contact layer 7 are formed, and an interlayer insulating film (not shown) is opened. Thus, the emitter electrode is in contact with the surface of the semiconductor substrate. Here, if the groove portion constituting the trench gate in front of FIG. 1-2 is a first trench, the trench gate formed in the first trench is drawn to prevent the drawing from becoming complicated. Is omitted, and only the interface with the oxide film on the side wall of the mesa is drawn. In addition, the second inversion layer channel formed at the interface between the oxide film of the next trench adjacent to the first trench and the p base layer 5 through the mesa portion is located on the depth side of the drawing. Although not shown in order not to be complicated, it is described that the second inversion layer channel is formed in the same manner as the first inversion layer channel. Further, the drawing of the planar gate at the most front side in the drawing is omitted so as not to be complicated. When a voltage (for example, 15 V) larger than a threshold voltage (for example, 5.0 to 6.0 V) is applied to the gate electrode composed of the planar gate 12 a and the trench gate 12 b, the p base layer 5 is applied to the plurality of planar gates 12 a. Since the first and second inversion layer channels are provided continuously across the trench, the first and second inversion layer channels are also formed continuously at the trench sidewall interface. Therefore, it can be seen that the first inversion layer channel 15a has a wide channel width. Further, since a planar channel is also formed on the surface below the planar gate portion, the first and second inversion layer channels are all connected through the third inversion layer channel 15b. Therefore, the effective length of the channel (effective channel length) depends on the planar gate length in the longitudinal direction of the trench, and can be set freely.

In the on state, electrons are injected from the n ⁺ emitter layer 6 into the n ⁻ drift layer 1 via the first and second inversion layer channels. Since the first and second inversion layer channels are formed in a wide region of the trench sidewall, electrons can spread not only in the vicinity of the n ⁺ emitter layer 6 but also in the inversion layer and reach the n ⁻ drift layer 1. The electron current density in the inversion layer can be made relatively low. Further, since the planar (third inversion layer) channel 15b is connected to the trench (first inversion layer) channel 15a, electrons pass from the n ⁺ emitter layer through the planar channel and trench channel on the surface to the n ⁻ drift layer 1. Injected into.

FIG. 2 is a plan view of an essential part in the active region of the semiconductor device of the present invention. FIG. 1-1 corresponds to the structure seen from the surface side of the semiconductor substrate. In FIG. 2, the p base layer 5 is uniformly provided on the surface. A plurality of linear trenches are formed in parallel so as to penetrate the p base layer 5 in a direction perpendicular to the paper surface and reach the n ⁻ drift layer 1 (not visible in FIG. 2). As for the mesa portion, a planar gate 12a is provided between the trenches so as to be orthogonal to the trench gate 12b. The planar gate 12a terminates inside an adjacent mesa portion with the trench interposed therebetween, and only the p base layer 5 exists in the adjacent mesa portion. When the mesa width is extremely narrow and cannot be cut in the direction perpendicular to the trench, a planar gate film and a polysilicon gate are provided on the surface of the p base layer 5 in the adjacent mesa portion, and the planar gate 12a in the direction perpendicular to the trench is provided on the surface. You may connect with. In a region surrounded by the two trench gates 12b and the planar gate 12a intersecting with the trench gate, an n ⁺ emitter layer 6 formed by self-alignment by the planar gate is provided. Further, a p ⁺ contact layer 7 is provided in a region sandwiched between the n ⁺ emitter layers 6. Then, the emitter of the interlayer insulating film 8 (not shown in FIG. 2) so that the two n ⁺ emitter layers 6 and the p ⁺ contact layer 7 are exposed and separated from the planar gate 12a and the trench gate 12b. A contact opening 16 with the electrode 11 (not shown in FIG. 2) is formed.

FIG. 3A is a cross-sectional view of the main part along the line AA ′ in FIG. The AA ′ line corresponds to a line along the inner sidewall of the trench. n ^- and planar gate 12a is provided on one main surface of the drift layer 1, the n on the other principal surface ^- further contact with n field stop layer 9 and the n field stop layer 9 in contact with the drift layer 1 A p collector layer 10 is provided in connection with the collector electrode 14. The trench sidewall 19 passes through the p base layer 5 and reaches the n ⁻ drift layer, and becomes the bottom portion 18 of the trench gate. Further, in the region of the trench side wall 19, the p base layer 5 portion becomes an inversion layer channel when the gate electrode is on.

FIG. 3-2 shows a schematic diagram of an electron flow in which the inversion layer channel portion is enlarged. The arrows in the figure are streamlines indicating the flow of electrons. When the gate electrode is on, electrons mainly flow into the first inversion layer channel 15a on the trench side wall from two kinds of locations. One is from the well-known n ⁺ emitter layer 6 and the other is from the third inversion layer channel 15b formed on the lower surface of the planar gate 12a, which is a feature of the present invention. By the injection of electrons from the third inversion layer channel 15b, almost the entire first inversion layer channel 15a of the trench gate side wall portion 19 becomes an electron injection path, and the channel width becomes much wider than that of the conventional structure. For this reason, the holes flowing under the n ⁺ emitter layer 6 in the ON state are dispersed in the trench gate sidewall and the surface channel of the planar gate, and the hole current density is remarkably reduced. As a result, even if the trench density is increased by setting the mesa width to the minimum width acceptable by the process technology, the latch-up resistance can be greatly improved. Further, the IE effect is enhanced by minimizing the mesa width, and the trade-off characteristic between the turn-off loss and the conduction loss is improved.

  Further, since the planar gate 12a is provided, the third inversion layer channel 15b is formed on the surface below the planar gate as shown in FIG. 1-2, so that the first inversion layer channel 15a on the trench sidewall is included. The effective channel length becomes longer. For this reason, the saturation current density can be kept relatively small. In addition, since the electron and hole current densities in the vicinity of the channel are reduced as described above, the heat generation density localized in the vicinity of the inversion layer channel is also reduced, and the short circuit resistance is improved.

  FIG. 4 is a cross-sectional view of a main part along the line BB ′ in FIG. The BB ′ line is a line parallel to the planar gate 12a intersecting the trench, and is a line passing through the center of the planar gate 12a. When the gate electrode is on, a third inversion layer channel is formed on the lower surface of the planar gate 12a. A first inversion layer channel is also formed on the inner side wall of the trench gate 12b.

FIG. 5 is a cross-sectional view of an essential part along the line CC ′ in FIG. The CC ′ line is parallel to the trench and passes through the middle of the planar gate 12a and the cell. The emitter electrode 11 is provided over the cell on the CC ′ line and is connected to the p ⁺ contact layer 7 and the n ⁺ emitter layer 6. Further, a passivation film 13 made of polyimide or silicon nitride film is provided.

As shown in FIG. 3B, the channel ratio can be set large by adjusting the length La of the planar gate 12a sandwiched between the n ⁺ emitter layers 6. For example, in a process where the minimum processing capability (minimum line width) is 0.6 μm, the width of the p ⁺ contact layer 7 is set to a minimum line width of 0.6 μm. At this time, the width of the n ⁺ emitter layer 6 formed between the end portion of the planar gate 12a and the p ⁺ contact layer 7 can be 0.2 μm. The value of La is 1.6 μm. The unit length of the periodic structure of the cell along the line AA ′ in FIG. 2 is 0.2 + 0.6 + 0.2 + 1.6 = 2.6 μm. On the other hand, since the effective width of the current path of electrons or holes in the first inversion layer channel 15a is a portion excluding the lower portion of the p ⁺ contact layer 7 with respect to this periodic length, 0.2 + 0.2 + 1. 6 = 2.0 μm, and the channel ratio is 2.0 / 2.6 = 77%. On the other hand, in the case of the conventional example, since the current path is only under the n ⁺ emitter layer 6, the effective width is 0.4 μm and the ratio is 40%. Therefore, in the embodiment of the present invention, the channel ratio can be exactly five times that of the conventional example. As a result, in the embodiment of the present invention, the heat generated near the current path of the trench channel when current is applied can be reduced to about half that of the conventional example, and the short-circuit tolerance can be improved.

In addition, the electron current from the n ⁺ emitter layer 6 in the ON state is dispersed in the first inversion layer channel 15a and the third inversion layer channel 15b, and is below the n ⁺ emitter layer 6 as compared with the conventional example having the same current capacity. The hole current density can be reduced. As a result, the latch-up resistance can be higher than that of the conventional structure.

  Furthermore, the impact of the mesa width reduction effect by reducing the minimum processing capability (minimum line width) of the process is also great. For example, when the minimum line width is 0.6 μm, in the cell on the mesa portion of FIG. 2, the width of the contact opening 17 and the trench sidewall is the minimum line width, and the width of the contact opening 17 is 1.2 μm. The width is 0.6 + 1.2 + 0.6 = 2.4 μm. On the other hand, if the minimum line width can be reduced from 0.6 to 0.25 μm, the width of the contact opening 17 and the trench sidewall can be 0.25 μm, and the width of the contact opening 17 can be 0.5 μm. The mesa width is 1.0 μm and can be about 42%. Such reduction in the mesa width can greatly improve the trade-off characteristics between the on-voltage Von and the turn-off loss Eoff.

  In Example 1, the depth of the p base layer 5 is uniform over the entire surface. This is because the p base layer 5 is formed before the gate stack formation process by the gate oxide film 3, gate electrode polysilicon deposition and patterning. By forming the p base layer 5 before forming the gate stack, conversely, compared to the case where the p base layer 5 is formed after forming the gate stack, the gate oxide film is formed by boron ion implantation for forming the p base layer 5. Damage introduction is avoided, and gate reliability can be greatly improved.

  FIG. 6 shows a second embodiment of the present invention and is a cross-sectional view of relevant parts corresponding to FIG. Compared with the first embodiment, the p base layer 5 is introduced and diffused only inside the cell, and the p base layer 5 is a lateral diffusion portion under the planar gate 12a. Therefore, in FIG. 7, the junction depth of the mesa portion where the planar gate 12 a is not formed is the depth of the p base layer 5. The same applies to FIG. 7 is a cross-sectional view of a main part corresponding to FIG. 4, and FIG. 8 is a cross-sectional view of a main part corresponding to FIG.

  FIG. 9 is a plan view of an essential part in the third embodiment of the present invention. The feature of the third embodiment is that the p base layer 5 introduced only inside the cell is included and a plurality of cells adjacent to each other with the planar gate 12a interposed therebetween, for example, four cells as shown in FIG. The unit is arranged in a checkered pattern. By arranging the units in a checkered pattern in this manner, the mesa region sandwiched between the trenches is connected to the emitter electrode, and the potential of the mesa region can be fixed without becoming a floating potential. Furthermore, since the region where the gate electrode faces the emitter structure is reduced, the gate-emitter capacitance can be reduced.

FIG. 10 is a cross-sectional view of main parts along the line AA ′ in FIG. 9. n ^- and planar gate 12a is provided on one main surface of the drift layer 1, the n on the other principal surface ^- further contact with n field stop layer 9 and the n field stop layer 9 in contact with the drift layer 1 A p collector layer 10 is provided in connection with the collector electrode 14. The trench sidewall 19 passes through the p base layer 5 and reaches the n ⁻ drift layer, and becomes the bottom portion 18 of the trench gate. Further, in the region of the trench side wall 19, the p base layer 5 portion becomes an inversion layer channel when the gate electrode is on.

FIG. 11 is a cross-sectional view of a main part along the line BB ′ in FIG. The BB ′ line is a line parallel to the planar gate 12a intersecting the trench, and is a line passing through the center of the planar gate 12a. When the gate electrode is on, a third inversion layer channel is formed on the lower surface of the planar gate 12a. A first inversion layer channel is also formed on the inner side wall of the trench gate 12b. In the third embodiment, the p base layer 5 is not formed in the mesa portion sandwiched between the two mesas where the planar gate is formed, and the n ⁻ drift layer 1 is formed. This is because the p base layer 5 introduced only in the cell portion is arranged in a checkered pattern as in the second embodiment.

FIG. 12 is a cross-sectional view of the main part along the line CC ′ in FIG. 9. The CC ′ line is parallel to the trench and passes through the middle of the planar gate 12a and the cell. The emitter electrode 11 is provided over the cell on the CC ′ line and is connected to the p ⁺ contact layer 7 and the n ⁺ emitter layer 6. Further, a passivation film 13 made of polyimide or silicon nitride film is provided. An emitter electrode 11 is formed across the four cells and is connected to the p ⁺ contact layer 7 and the n ⁺ emitter layer 6.

1 n ⁻ drift layer 3 gate oxide film 5 p base layer 6 n ⁺ emitter layer 7 p ⁺ contact layer 8 interlayer insulating film 11 emitter electrode 12 gate electrode 13 passivation film 14 collector electrode

Claims (5)

A first conductivity type drift layer,
A plurality of trenches formed in stripes on the surface of the drift layer ;
A trench gate formed through an insulating film in the trench,
A mesa region sandwiched between two adjacent trenches;
Two adjacent mesa regions adjacent to the outside of each of the two adjacent trenches;
A second conductivity type base layer formed on the surface of the mesa region and having a diffusion depth shallower than the trench and having a higher impurity concentration than the drift layer;
The adjacent mesa region is a semiconductor region of a first conductivity type or a second conductivity type,
Crossing the two trenches via the insulating film on the base layer, contacting the trench gate, extending from the two trenches to the surface of the two adjacent mesa regions, and terminating at the upper portion of the adjacent mesa region a planar gate having a plurality formed and the longitudinal direction of the trench,
A second conductivity type contact layer formed at a higher impurity concentration than the base layer and spaced apart from the planar gate on the base layer;
The contact layer is formed in the mesa region so as to contact the two trenches along the longitudinal direction of the trench, and reaches the contact layer so as to sandwich the contact layer from a lower end portion of the adjacent planar gate . wherein a has a first conductivity type emitter layer. 2. The semiconductor device according to claim 1, wherein the semiconductor region is of a second conductivity type, and the semiconductor region is the same diffusion layer as the base layer. The semiconductor region is of a first conductivity type, the base layer is dispersed in the longitudinal direction of the trench and provided in a plurality of island shapes, and the planar arrangement of the base layer is a checkered pattern. Item 14. The semiconductor device according to Item 1. The semiconductor device according to claim 1, further comprising a second conductivity type collector layer on a second main surface of the semiconductor substrate. An inversion layer channel of the same conductivity type as that of the emitter layer is formed on the surface of the base layer facing the planar gate through the insulating film in response to voltage application to the trench gate and the planar gate above a threshold value.
5. The semiconductor device according to claim 1, wherein two emitter layers facing each other across a base layer surface under the planar gate are connected by the inversion layer channel.