JP5501918B2 - Optical element manufacturing method and optical element produced by the method - Google Patents

Optical element manufacturing method and optical element produced by the method Download PDF

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JP5501918B2
JP5501918B2 JP2010221852A JP2010221852A JP5501918B2 JP 5501918 B2 JP5501918 B2 JP 5501918B2 JP 2010221852 A JP2010221852 A JP 2010221852A JP 2010221852 A JP2010221852 A JP 2010221852A JP 5501918 B2 JP5501918 B2 JP 5501918B2
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optical element
retardation
adhesive
resin
quartz
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JP2012076298A (en
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孝朗 齋藤
崇 高橋
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Topcon Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings

Description

本発明は、光学素子の製造方法およびその方法により作製された光学素子に関し、例えば、光ピックアップ用の位相差板として用いる複屈折材料および保持基板の製造方法およびその方法により作製された位相差光学素子、および回折素子、プリズム、レンズなどの光学素子に関する。   The present invention relates to an optical element manufacturing method and an optical element manufactured by the method, and for example, a birefringent material used as a retardation plate for an optical pickup and a manufacturing method of a holding substrate and a phase difference optical manufactured by the method The present invention relates to an optical element such as a diffraction element, a prism, and a lens.

光ピックアップ用の位相差板としては、位相差フィルムや水晶基板など複屈折材料が用いられている。   A birefringent material such as a retardation film or a quartz substrate is used as a retardation plate for an optical pickup.

また、DVD(登録商標)とCD(登録商標)あるいはBlu−rayDisc(登録商標)が共用できる光ピックアップにおいて、同一光学系に複数の波長の光が使用される場合には、任意の位相差を持つ複屈折材料を複数枚積層して作製された、複数の波長において機能する位相差板が用いられている。   In addition, in an optical pickup that can share DVD (registered trademark) and CD (registered trademark) or Blu-ray Disc (registered trademark), when light of a plurality of wavelengths is used in the same optical system, an arbitrary phase difference is set. A retardation plate that is produced by laminating a plurality of birefringent materials and that functions at a plurality of wavelengths is used.

この中で用いられる位相差板のうち、例えば位相差フィルムをガラスなどの固定基板と接合する場合には、特許文献1に示すように接着剤や粘着材を用いることが知られている。   Among the retardation plates used in this, for example, when a retardation film is bonded to a fixed substrate such as glass, it is known to use an adhesive or a pressure-sensitive adhesive as shown in Patent Document 1.

また、積層位相差板を製作するために位相差フィルム同士を接合する場合には、特許文献2に示すような接合技術を用いることが知られている。   Moreover, when joining retardation films in order to manufacture a laminated phase difference plate, using the joining technique as shown in patent document 2 is known.

特許第3458895号公報Japanese Patent No. 3458895 特開2001−277433号公報JP 2001-277433 A

光ピックアップ用の位相差板では、例えば特許文献1に記載のような接合方法では、接着剤の塗布膜厚ムラにより、位相差板として求められる透過波面収差特性が悪化することがある。また、光線透過率に関しても、位相差板と接着剤の屈折率差に影響されて、透過率が低下してしまう。   In a phase difference plate for an optical pickup, for example, in the joining method described in Patent Document 1, transmission wavefront aberration characteristics required as a phase difference plate may be deteriorated due to uneven coating film thickness of the adhesive. Further, the light transmittance is also affected by the difference in refractive index between the retardation plate and the adhesive, and the transmittance is lowered.

さらに、湿度試験などの信頼性試験において、接着剤の剥離などが起こり、品質低下を起こすこともある。   Furthermore, in a reliability test such as a humidity test, the adhesive may be peeled off and the quality may be deteriorated.

また、例えば特許文献2に記載のような接合方法では、有機溶剤を用いた溶媒溶接のため、製造後の製品に残留溶剤があり、経時劣化して品質低下を引き起こす懸念がある。また環境負荷物質を使用することから、このような方法は、好ましい製造方法ではない。   Moreover, in the joining method as described in Patent Document 2, for example, there is a residual solvent in a manufactured product due to solvent welding using an organic solvent. Moreover, since an environmentally hazardous substance is used, such a method is not a preferable manufacturing method.

本発明は、2つの部材を、接着剤、接合膜等を用いることなく、透過波面収差特性や透過率、耐湿性を維持したまま接合することが可能となる光学素子の製造方法及びその方法を用いて製造した光学素子を提供することを目的とする。   The present invention provides an optical element manufacturing method and method capable of bonding two members while maintaining transmission wavefront aberration characteristics, transmittance, and moisture resistance without using an adhesive, a bonding film, or the like. An object of the present invention is to provide an optical element manufactured using the same.

本発明の解決手段を例示すると、次のとおりである。   Examples of the solving means of the present invention are as follows.

(1)ガラス、樹脂、水晶のいずれか2つの基板の表面に、水酸基が存在するように親水化処理を施し、ガラス、樹脂、水晶のいずれか2つの基板の処理表面同士を密着させた後に、50℃〜150℃に加熱し、1〜10MPaの圧力で加圧することによって、接着剤、接着膜なしで接合させて光学素子を作製することを特徴とする光学素子の製造方法。 (1) After applying hydrophilic treatment on the surface of any two substrates of glass, resin, or quartz so that a hydroxyl group exists, and bringing the treated surfaces of any two substrates of glass, resin, or quartz into close contact with each other A method for producing an optical element, comprising heating to 50 ° C. to 150 ° C. and pressurizing at a pressure of 1 to 10 MPa to produce an optical element by bonding without an adhesive and an adhesive film.

(2)請求項1に記載の光学素子の製造方法において、平面度が高い基材に、ガラス、樹脂、水晶のいずれか2つの基板の処理表面同士を密着させた状態の光学素子を載置し、光学素子の上側から耐熱性樹脂で弾性を有する部材で加圧することを特徴とする光学素子の製造方法。 (2) In the method for manufacturing an optical element according to claim 1, the optical element in a state in which the processing surfaces of any two substrates of glass, resin, and quartz are in close contact with a base material having high flatness is placed. And pressurizing with a member having elasticity with a heat-resistant resin from the upper side of the optical element.

(3)光学素子は、位相差板、回折素子、プリズム、レンズのいずれか1つであることを特徴とする光学素子の製造方法。 (3) The method of manufacturing an optical element, wherein the optical element is any one of a retardation plate, a diffraction element, a prism, and a lens.

(4)請求項1ないし3のいずれか1項に記載の光学素子の製造方法において、ガラス、樹脂、水晶のいずれか2つの基板の表面は、表面の酸素を介した共有結合または水素結合により接合されていることを特徴とする光学素子の製造方法。 (4) In the method of manufacturing an optical element according to any one of claims 1 to 3, the surface of any two substrates of glass, resin, and quartz is formed by covalent bonding or hydrogen bonding via oxygen on the surface. A method for manufacturing an optical element, wherein the optical element is bonded.

(5)ガラス、樹脂、水晶のいずれか2つの基板の表面に、水酸基が存在するように親水化処理を施し、ガラス、樹脂、水晶のいずれか2つの基板の処理表面同士を密着させた後に、50℃〜150℃に加熱し、1〜10MPaの圧力で加圧することによって、接着剤、接着膜なしで接合されていることを特徴とする光学素子。 (5) After performing hydrophilic treatment on the surface of any two substrates of glass, resin, or quartz so that a hydroxyl group exists and bringing the treated surfaces of any two substrates of glass, resin, or quartz into close contact with each other An optical element characterized by being bonded without an adhesive or an adhesive film by heating to 50 ° C. to 150 ° C. and pressurizing at a pressure of 1 to 10 MPa.

(6)請求項4に記載の光学素子において、平面度が高い基材に、ガラス、樹脂、水晶のいずれか2つの基板の処理表面同士を密着させた状態で載置し、その上側から耐熱性樹脂で弾性を有する部材で加圧することによって接合されていることを特徴とする光学素子。 (6) In the optical element according to claim 4, the substrate is mounted on a base material having high flatness in a state where the processing surfaces of any two substrates of glass, resin, and quartz are in close contact with each other, and heat resistance is applied from above. An optical element that is bonded by pressurizing with an elastic member made of a functional resin.

(7)請求項4ないし6のいずれか1項に記載の光学素子において、位相差板、回折素子、プリズム、レンズのいずれか1つであることを特徴とする光学素子。 (7) The optical element according to any one of claims 4 to 6, wherein the optical element is any one of a retardation plate, a diffraction element, a prism, and a lens.

(8)請求項4ないし7のいずれか1項に記載の光学素子において、ガラス、樹脂、水晶のいずれか2つの基板の表面は、表面の酸素を介した共有結合または水素結合により接合されていることを特徴とする光学素子。 (8) In the optical element according to any one of claims 4 to 7, the surfaces of any two substrates of glass, resin, and quartz are joined by covalent bonding or hydrogen bonding via oxygen on the surface. An optical element.

本発明によれば、樹脂、ガラス、水晶などの部材の接合する表面に水酸基が存在するように親水化処理を施し、部材同士を貼り合せて平面度が高い基材上に載置し、上側から耐熱性樹脂で弾性を有する部材で加圧することで、部材同士を接合することができる。   According to the present invention, a hydrophilic treatment is performed so that a hydroxyl group exists on the surface to which a member such as resin, glass, or quartz is bonded, the members are bonded to each other, and placed on a substrate having high flatness. The members can be joined together by applying pressure with a member having elasticity with a heat resistant resin.

本発明においては、接着剤、粘着剤、接合膜などを一切必要としないので、接着剤の塗布膜厚ムラや粘着材の膜厚ムラにより位相差板として求められる透過波面収差特性が悪化することが全くない。   In the present invention, since no adhesive, pressure-sensitive adhesive, bonding film or the like is required, transmission wavefront aberration characteristics required as a retardation plate are deteriorated due to uneven coating thickness of adhesive or uneven thickness of adhesive. There is no.

また、光線透過率に関しても、同一基材を接合した場合には、接着剤を用いる場合に比べ屈折率差を持つ層がないために透過率低下がない。   Regarding the light transmittance, when the same base material is bonded, there is no reduction in transmittance because there is no layer having a difference in refractive index compared to the case where an adhesive is used.

さらに、湿度試験などの信頼性試験においても、接着剤の剥離などが全く発生せず、高品質を保つことができる。   Furthermore, even in a reliability test such as a humidity test, no peeling of the adhesive occurs and high quality can be maintained.

また、有機溶剤を用いた溶媒溶接による接合方法と比較しても、本発明によれば、残留溶剤による経時劣化の懸念がなく、また環境負荷物質を排出しない。   Further, even when compared with a joining method by solvent welding using an organic solvent, according to the present invention, there is no fear of deterioration with time due to the residual solvent, and no environmentally hazardous substance is discharged.

また、樹脂位相差フィルムを用いた位相差板や水晶位相差板を接着剤や粘着材で貼り合せた位相差板のように、有機材料を部材に用いた位相差板はBD波長のレーザ光の照射により有機材料部分の劣化が生じる懸念があるが、本発明の製造方法により作製された水晶位相差板であれば、そのような劣化の懸念が全くない。   In addition, a retardation plate using an organic material as a member, such as a retardation plate using a resin retardation film or a quartz retardation plate bonded with an adhesive or an adhesive, is a BD wavelength laser beam. There is a concern that the organic material portion may be deteriorated by the irradiation, but there is no concern of such deterioration if the quartz phase difference plate is produced by the manufacturing method of the present invention.

表面処理された基材の状態の説明図。Explanatory drawing of the state of the base material by which the surface treatment was carried out. 加圧時の各部材の配置の説明図。Explanatory drawing of arrangement | positioning of each member at the time of pressurization. 加熱・加圧後の接合された状態の説明図。Explanatory drawing of the joined state after a heating and pressurization.

本発明の好ましい1つの実施形態においては、ガラス、樹脂、水晶のいずれかで形成された2つの基板の表面に水酸基が存在するように、親水化処理を施し、その後、ガラス、樹脂、水晶のいずれかで形成された2つの基板の表面同士を密着させた後に、平面度が高い基材上に載置し、上側から耐熱性樹脂で弾性を有する部材で挟みこみ、50℃〜150℃に加熱し、1〜10MPaの圧力で加圧することによって、ガラス、樹脂、水晶のいずれかで形成された2つの基板の表面は、表面の酸素を介した共有結合または水素結合により接合される。つまり、2つの基板の表面は、接着剤、接着膜なしで接合されるのである。   In one preferred embodiment of the present invention, a hydrophilic treatment is performed so that hydroxyl groups are present on the surfaces of two substrates formed of glass, resin, or quartz, and then glass, resin, or quartz is used. After the surfaces of the two substrates formed in any one of them are brought into close contact with each other, they are placed on a substrate having high flatness, and are sandwiched between members having elasticity with a heat resistant resin from above, and are kept at 50 ° C. to 150 ° C. By heating and pressurizing at a pressure of 1 to 10 MPa, the surfaces of the two substrates formed of any one of glass, resin, and quartz are bonded by covalent bonding or hydrogen bonding via oxygen on the surface. That is, the surfaces of the two substrates are bonded without an adhesive or an adhesive film.

また、本発明の光学素子は、ガラス、樹脂、水晶のいずれか2つの基板の表面に、水酸基が存在するように親水化処理を施し、その後、ガラス、樹脂、水晶のいずれかで形成された2つの基板の表面同士を密着させた後に、平面度が高い基材上に載置し、上側から耐熱性樹脂で弾性を有する部材で挟みこみ、50℃〜150℃に加熱され、1〜10MPaの圧力で加圧されることによって、接着剤、接着膜なしで接合されている。その結果、ガラス、樹脂、水晶のいずれかで形成された2つの基板の表面は、表面の酸素を介した共有結合または水素結合により接合されている。   In addition, the optical element of the present invention was formed of any one of glass, resin, and quartz after applying a hydrophilic treatment on the surface of any two substrates of glass, resin, and quartz so that a hydroxyl group exists. After the surfaces of the two substrates are brought into close contact with each other, they are placed on a substrate having high flatness, sandwiched between members having elasticity with a heat-resistant resin from the upper side, heated to 50 ° C. to 150 ° C., and 1 to 10 MPa. It is joined without the adhesive and the adhesive film. As a result, the surfaces of the two substrates formed of any one of glass, resin, and quartz are joined by covalent bonds or hydrogen bonds via oxygen on the surfaces.

また、前述の光学素子は、好ましくは、位相差板、回折素子、プリズム、レンズのいずれか1つである。   In addition, the above-described optical element is preferably any one of a retardation plate, a diffraction element, a prism, and a lens.

図示例の説明
光学素子が位相差板である場合について、特に樹脂である位相差フィルム(位相差板)同士を接合する場合について、図を基に説明する。
Description of Illustrated Example A case where the optical element is a retardation plate, particularly a case where phase difference films (retardation plates) made of resin are bonded to each other will be described with reference to the drawings.

以下、位相差フィルム(位相差板)同士の接合による位相差光学素子の作製を説明する。   Hereinafter, the production of the retardation optical element by joining the retardation films (retardation plates) will be described.

位相差光学素子となる2枚の位相差フィルム1、2を用意する。   Two retardation films 1 and 2 to be a retardation optical element are prepared.

位相差フィルム1、2の材料としては、ポリカーボネイト(PC)、シクロオレフィン系ポリマー(COP)、ポリスチレン、ポリエステル、ポリメタクリル酸メチル樹脂(PMMA)、ポリビニルアルコール(PVA)、トリアセチルセルロース(TAC)、セルロースアセテートの共重合体、ポリカーボネイト(PC)とポリスチレン(PS)の共重合体、ポリメタクリル酸メチル樹脂(PMMA)とポリスチレン(PS)の共重合体などがある。COPは具体的には三井化学製のアペル(登録商標)、日本ゼオン製のゼオノア(登録商標)、JSR製のアートンがある。   As materials for the retardation films 1 and 2, polycarbonate (PC), cycloolefin polymer (COP), polystyrene, polyester, polymethyl methacrylate resin (PMMA), polyvinyl alcohol (PVA), triacetyl cellulose (TAC), Examples thereof include a cellulose acetate copolymer, a polycarbonate (PC) and polystyrene (PS) copolymer, and a polymethyl methacrylate resin (PMMA) and polystyrene (PS) copolymer. Specifically, COP includes Apel (registered trademark) manufactured by Mitsui Chemicals, ZEONOR (registered trademark) manufactured by Nippon Zeon, and Arton manufactured by JSR.

これらのうち、同一材料あるいは異種材料からなる位相差フィルム1、2を接合することによって、位相差板として光学素子を作製する。   Among these, an optical element is produced as a retardation plate by bonding the retardation films 1 and 2 made of the same material or different materials.

本実施例の場合、例えばポリカーボネイト(PC)からなる位相差フィルム1、2を接合する。   In the case of the present embodiment, for example, retardation films 1 and 2 made of polycarbonate (PC) are joined.

まずポリカーボネイトからなる位相差フィルム1、2の表面を親水化するような表面処理を行う。好ましい方法としては、表面に紫外線を照射する。特に好ましい紫外線の照射条件を述べると、200nm以下の波長域の光を用い、10mW/cm2の照度で、少なくとも10秒、最も望ましくは30秒程度照射する。   First, a surface treatment is performed to make the surfaces of the retardation films 1 and 2 made of polycarbonate hydrophilic. As a preferred method, the surface is irradiated with ultraviolet rays. Particularly preferable ultraviolet irradiation conditions are as follows. Using light having a wavelength region of 200 nm or less, irradiation is performed at an illuminance of 10 mW / cm 2 for at least 10 seconds, and most desirably for about 30 seconds.

このような紫外線照射により、空気中の酸素及び紫外線照射により酸素から発生したオゾンが紫外線と作用して活性酸素が発生する。この活性酸素が、位相差フィルム1、2の表面を改質する。その結果、位相差フィルム1、2は、図1のようになり接合に適した表面状態になる。   By such ultraviolet irradiation, oxygen in the air and ozone generated from oxygen by the ultraviolet irradiation act on the ultraviolet rays to generate active oxygen. This active oxygen modifies the surfaces of the retardation films 1 and 2. As a result, the retardation films 1 and 2 are in a surface state suitable for bonding as shown in FIG.

紫外線の光源としては、172nmの輝線を持つエキシマランプが好ましいが、低圧水銀ランプ、キセノンランプ、重水素ランプを用いることができる。   As an ultraviolet light source, an excimer lamp having an emission line of 172 nm is preferable, but a low-pressure mercury lamp, a xenon lamp, or a deuterium lamp can be used.

また、基材表面にプラズマを照射した場合にも同様の表面改質を行うことができ、例えば大気圧プラズマ発生装置により発生したプラズマを照射した場合にも表面を親水化させる処理が可能である。   Also, the same surface modification can be performed when the substrate surface is irradiated with plasma. For example, the surface can be made hydrophilic even when the plasma generated by the atmospheric pressure plasma generator is irradiated. .

また、200nm以下の光であればよいので、数nmから数十nm程度の電子線を照射する方法であってもよい。   Further, since light of 200 nm or less may be used, a method of irradiating an electron beam of about several nm to several tens of nm may be used.

次に上記表面処理を行った面同士を接触させ、加熱及び加圧処理を行う。このとき、加熱温度は50℃から150℃程度の範囲が有効で、最も望ましい温度は80℃程度である。加圧力は1〜10MPaの範囲が有効で、最も望ましい加圧力は約2MPaである。加圧の際の各部材の配置を図2に示した。表面処理を行った面同士を接触させたフィルム3を平面板4、5で挟み込む。フィルム3の下側に平面板4、上側に平面板5を配置してフィルム3を挟み込む。   Next, the surfaces subjected to the surface treatment are brought into contact with each other, and heating and pressure treatment are performed. At this time, the heating temperature is effectively in the range of about 50 ° C. to 150 ° C., and the most desirable temperature is about 80 ° C. The applied pressure is effectively in the range of 1 to 10 MPa, and the most desirable applied pressure is about 2 MPa. The arrangement of each member during pressurization is shown in FIG. The film 3 in which the surfaces subjected to the surface treatment are brought into contact with each other is sandwiched between the flat plates 4 and 5. The flat plate 4 is disposed below the film 3 and the flat plate 5 is disposed on the upper side to sandwich the film 3.

平面板4は鏡面加工された金属板あるいは光学研磨されたガラス基板などの平面度が高い基材を使用する。平面板5はシリコンゴムなど耐熱性ゴム状の平面基材を使用し、図示を省略した加圧機構によりフィルム3の上側から平面板5でフィルム3全面に均等に加圧する。平面板5は、断熱性ゴム状の平面基材のほか、耐熱性樹脂で弾性を有する部材であればよい。   The flat plate 4 uses a base material having high flatness such as a mirror-finished metal plate or an optically polished glass substrate. The flat plate 5 uses a heat-resistant rubber-like flat base material such as silicon rubber, and is uniformly pressed on the entire surface of the film 3 by the flat plate 5 from above the film 3 by a pressurizing mechanism (not shown). The flat plate 5 may be a heat-resistant resin and an elastic member in addition to the heat-insulating rubber-like flat base material.

処理時間は30秒〜300秒の範囲が有効で、最も望ましい処理時間は100秒程度である。   The processing time is effectively in the range of 30 to 300 seconds, and the most desirable processing time is about 100 seconds.

上記処理により、図3に示すように、位相差フィルム1、2の表面には酸素を介した共有結合または水素結合が形成され、位相差フィルム1、2が互いに強固に接合される。   By the above treatment, as shown in FIG. 3, covalent bonds or hydrogen bonds via oxygen are formed on the surfaces of the retardation films 1 and 2, and the retardation films 1 and 2 are firmly bonded to each other.

位相差フィルム1、2接合部は、外観上次のような特徴がある。すなわち、接着剤や粘着材を用いた場合に見られる接着層がなく、歪みなどが生じていない。   The phase difference films 1 and 2 have the following features in appearance. That is, there is no adhesive layer observed when an adhesive or a pressure-sensitive adhesive is used, and no distortion occurs.

前述の方法はポリカーボネイトのフィルム同士だけではなく、上述した位相差フィルム同士、あるいは異なる種類のフィルムとの接合にも採用することが可能である。   The above-described method can be used not only for bonding polycarbonate films but also for bonding the above-described retardation films or different types of films.

接合する基材の組み合わせの他の好適例としては、次のものがある。   Other preferred examples of the combination of substrates to be joined include the following.

(a)樹脂の位相差フィルムとガラス基板の接合
(b)樹脂の位相差フィルムと水晶基板の接合
樹脂の位相差フィルムとガラス基板の接合は、フィルムの位相差板の板厚を調整する場
合に適用される。例えば、位相差フィルム単体では0.05mm程度であるが、0.5mmのガラス基板を接合すれば0.55mmとなり、剛性も得られる。
(A) Bonding of resin retardation film and glass substrate (b) Bonding of resin retardation film and crystal substrate For bonding of retardation film of resin and glass substrate, adjusting the thickness of the retardation film of the film Applies to For example, the retardation film itself is about 0.05 mm, but if a 0.5 mm glass substrate is bonded, it becomes 0.55 mm, and rigidity is also obtained.

また、接合するガラス基板が回折格子である場合、位相差フィルムと接合することによ
り偏光機能と回折機能を併せ持つ複合光学素子の作製が可能となる。
When the glass substrate to be bonded is a diffraction grating, it is possible to manufacture a composite optical element having both a polarizing function and a diffractive function by bonding to a retardation film.

樹脂の位相差フィルムと水晶基板の接合は、水晶基板が位相差板であれば、樹脂の位相
差フィルムの接合と同様に積層による位相差板の広帯域化が可能となる。
If the quartz substrate is a retardation plate, the resin retardation film and the quartz substrate can be bonded to each other in the same manner as the resin retardation film.

水晶基板同士の接合の場合、BD波長のレーザ光への耐光性が高い位相差板の作製が可能となる。   In the case of bonding between quartz substrates, a retardation plate having high light resistance to laser light having a BD wavelength can be produced.

つまり、樹脂の位相差フィルムを用いた位相差板や水晶の位相差板を接着剤や粘着材で貼り合せた位相差板のように、有機材料を部材に用いた位相差板は、BD波長のレーザ光の照射により有機材料部分の劣化が生じる懸念があるが、本発明の製造方法によれば、BD波長のレーザ光の照射による劣化の懸念がない水晶位相差板の作製が可能となる。   In other words, a retardation plate using an organic material as a member, such as a retardation plate using a resin retardation film, or a retardation plate obtained by bonding a quartz retardation plate with an adhesive or an adhesive, is a BD wavelength. Although there is a concern that the organic material portion may be deteriorated by the irradiation of the laser beam, according to the manufacturing method of the present invention, it is possible to manufacture a quartz phase difference plate that is not deteriorated by the irradiation of the laser beam having the BD wavelength. .

1、2 位相差フィルム
3 フィルム
4、5 平面板
1, 2 retardation film 3 film 4, 5 flat plate

Claims (2)

紫外線又はプラズマを照射するときに、2枚の光学樹脂からなる位相差フィルムの表面に、200nm以下の波長域の光を用い、10mW/cm2程度の照度で、少なくとも10秒照射し、水酸基が存在するように親水化処理を施し、その後、2枚の位相差フィルムの表面同士、すなわち2つの親水化処理表面同士を密着させ、かつ面精度が高い金属平面板あるいは面精度が高く弾性を有する部材で挟み込み、その状態で、それらの親水化処理表面に対して、50〜150℃に加熱し、1〜10MPaの圧力で加圧することによって、接着剤・接着膜のない形で、それらの親水化処理表面を接合することを特徴とする位相差光学素子の製造方法。 When irradiating with ultraviolet rays or plasma, the surface of the retardation film made of two optical resins is irradiated with light having a wavelength range of 200 nm or less at an illuminance of about 10 mW / cm 2 for at least 10 seconds, and a hydroxyl group is present. hydrophilized to, then, the surface between the two retardation films, namely two hydrophilic treatment surface was between close contact, and a member having a high elasticity is high surface accuracy metal flat plate or surface accuracy In that state, they are hydrophilized in the form without an adhesive / adhesive film by heating them to 50-150 ° C. and pressurizing them at a pressure of 1-10 MPa . A method for producing a phase difference optical element, characterized by joining treated surfaces. 請求項1に記載の製造方法により製造された位相差光学素子。
Retardation optical element manufactured by the manufacturing method according to claim 1.
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