JP5493959B2 - Pattern forming apparatus, pattern forming method, and display element manufacturing apparatus - Google Patents

Description

  The present invention relates to a pattern forming apparatus, a pattern forming method, and a display element manufacturing apparatus.

  As display elements constituting display devices such as display devices, for example, liquid crystal display elements, organic electroluminescence (organic EL) elements, electrophoretic elements used for electronic paper, and the like are known. As one of methods for manufacturing these elements, for example, a method called a roll-to-roll method (hereinafter simply referred to as “roll method”) is known (for example, refer to Patent Document 1).

  In the roll method, a single sheet-like substrate wound around a substrate supply side roller is sent out, the substrate is transported while being wound up by a substrate recovery side roller, and the substrate is sent out after being sent out. In this manner, a pattern such as a display circuit or a driver circuit is sequentially formed on a substrate until it is formed. In recent years, for example, there is a great demand for large display devices, and a technique for forming a pattern over a wide area on a substrate is required.

International Publication No. 2006/100868 Pamphlet

However, for example, when a pattern such as ink is formed and applied to a substrate using a pattern forming unit such as a transfer roller such as a stamper, the size of the transfer roller that can be manufactured is limited to a pattern that requires accuracy. One transfer roller may not be able to handle it.
In view of the circumstances as described above, it is an object of the present invention to provide a pattern forming apparatus, a pattern forming method, and a display element manufacturing apparatus that require accuracy.

  According to the first aspect of the present invention, the first pattern application unit that applies the first pattern to the substrate and the second pattern application unit that applies the second pattern to the substrate include the second pattern. The application unit is provided with a pattern forming apparatus that applies the second pattern such that a part of the first pattern and a part of the second pattern overlap each other in a direction intersecting the substrate transport direction.

  According to a second aspect of the present invention, there is provided a pattern forming method for applying a pattern on a substrate, wherein the substrate feeding step of feeding the substrate in a predetermined direction and a direction in which a part of the pattern intersects the feeding direction of the substrate. There is provided a pattern forming method including a pattern forming step of applying a pattern on a substrate so as to overlap each other.

  According to a third aspect of the present invention, there is provided a display device in which a transport device for transporting a substrate and a pattern forming device for applying a pattern on the substrate are used, and the pattern forming device of the present invention is used as the pattern forming device. A manufacturing apparatus is provided.

  According to the present invention, a pattern can be formed so that unevenness is not noticeable.

The figure which shows the whole structure of the substrate processing apparatus which concerns on 1st Embodiment of this invention. The top view which shows the structure of the processing apparatus of the substrate processing apparatus which concerns on 1st Embodiment. The side view which shows the structure of the processing apparatus which concerns on 1st Embodiment. The top view which shows the structure of a part of processing apparatus which concerns on 1st Embodiment. FIG. 5 is an operation diagram showing a pattern forming process according to the first embodiment. FIG. 5 is an operation diagram showing a pattern forming process according to the first embodiment. FIG. 5 is an operation diagram showing a pattern forming process according to the first embodiment. FIG. 5 is an operation diagram showing a pattern forming process according to the first embodiment. Schematic of the pattern which concerns on 1st Embodiment. Schematic of the pattern which concerns on 1st Embodiment. Schematic of the pattern which concerns on 1st Embodiment. Schematic of the pattern which concerns on 2nd Embodiment of this invention. The schematic diagram of the pattern concerning a 2nd embodiment. The schematic diagram of the pattern concerning a 2nd embodiment. The schematic diagram of the pattern concerning a 2nd embodiment.

[First Embodiment]
Hereinafter, a first embodiment of the present invention will be described with reference to the drawings.
FIG. 1 is a diagram showing a configuration of a substrate processing apparatus (display element manufacturing apparatus) FPA according to the present embodiment. The substrate processing apparatus FPA is an apparatus that processes the sheet substrate FB while transporting the sheet substrate (substrate) FB formed in a strip shape in the longitudinal direction. The substrate processing apparatus FPA is used, for example, when manufacturing a display element such as a liquid crystal display element, an organic EL element, and an electrophoretic element. In the present embodiment, a case where an organic EL element is formed using the substrate processing apparatus FPA will be described as an example. The sheet substrate FB is formed so as to have flexibility. The flexibility in the present embodiment refers to a property that allows the substrate to be bent without breaking or breaking even when a predetermined force of at least about its own weight is applied to the substrate. The flexibility varies depending on the material, size, thickness, environment such as temperature, etc. of the substrate. In addition, as the sheet | seat board | substrate FB, a heat resistant resin film, stainless steel, etc. can be used, for example.

  Hereinafter, in the description of the substrate processing apparatus FPA, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to the XYZ orthogonal coordinate system. In the following drawings, in the XYZ orthogonal coordinate system, the conveyance direction of the sheet substrate FB (longitudinal direction of the sheet substrate FB) is the X-axis direction, and the direction orthogonal to the conveyance direction of the sheet substrate FB (short side of the sheet substrate FB) Direction) is a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction is a Z-axis direction.

  As shown in FIG. 1, the substrate processing apparatus FPA includes a substrate supply unit SU that supplies a sheet substrate FB, a substrate processing unit PR that processes the sheet substrate FB, a substrate recovery unit CL that recovers the sheet substrate FB, and And a control part CONT for controlling each of these parts. The substrate processing apparatus FPA is installed and used in a factory, for example.

  In the substrate processing apparatus FPA, the sheet substrate FB to be processed has a dimension in the Y direction (short direction) of, for example, about 1 m to 2 m, and a dimension in the X direction (longitudinal direction) of, for example, 10 m or more. Yes. Of course, this dimension is only an example and is not limited thereto. For example, the dimension in the Y direction of the sheet substrate FB may be 50 cm or less, or 2 m or more. Moreover, the dimension of the X direction of the sheet | seat board | substrate FB may be 10 m or less.

  The substrate supply unit SU sends, for example, the sheet substrate FB wound in a roll shape to the substrate processing unit PR. The substrate supply unit SU is provided with, for example, a shaft around which the sheet substrate FB is wound, a rotation drive source that rotates the shaft, and the like. In addition, for example, a configuration in which a cover portion that covers the sheet substrate FB wound in a roll shape or the like may be provided.

  The substrate collection unit CL collects the sheet substrate FB from the substrate processing unit PR in a roll shape, for example. Similar to the substrate supply unit SU, the substrate recovery unit CL is provided with a shaft portion for winding the sheet substrate FB, a rotational drive source for rotating the shaft portion, a cover portion for covering the recovered sheet substrate FB, and the like. ing. In addition, when the sheet substrate FB is cut into a panel shape, for example, in the substrate processing unit PR, the sheet substrate FB is recovered in a state different from the rolled state, for example, collected in a stacked state. It may be configured to collect.

  The substrate processing unit PR transports the sheet substrate FB supplied from the substrate supply unit SU to the substrate recovery unit CL, and processes the processing surface Fp of the sheet substrate FB in the course of transport. The substrate processing unit PR includes a processing device 60, a transfer device 70, and an alignment device 80.

  The transport device 70 includes a roller device R that transports, for example, the sheet substrate FB to the substrate recovery unit CL in the substrate processing unit PR. For example, a plurality of roller devices R are provided along the conveyance path of the sheet substrate FB. A drive mechanism (not shown) is attached to at least some of the plurality of roller devices R. As the roller device R rotates, the sheet substrate FB is conveyed in the X-axis direction. For example, a part of the plurality of roller devices R may be configured to be movable in a direction orthogonal to the transport direction.

  The alignment apparatus 80 performs an alignment operation on the sheet substrate FB. The alignment apparatus 80 includes an alignment camera 81 that detects the position state of the sheet substrate FB, and the sheet substrate FB based on the detection result of the alignment camera 81 in the X direction, Y direction, Z direction, θX direction, θY direction, and θZ direction. And a drive mechanism 82 for fine adjustment. The drive mechanism 82 can be configured to align the sheet substrate FB by adjusting the position of the roller device R, for example. Of course, another member that adjusts the position of the sheet substrate FB may be arranged, and the drive mechanism 82 may adjust the position of the other member.

  The processing apparatus (pattern forming apparatus) 60 has various apparatuses for forming constituent elements (for example, a partition wall, a light emitting layer, a switching element, and a wiring) of the organic EL element on the processing surface Fp of the sheet substrate FB. ing. As such an apparatus, a partition wall forming apparatus for forming the partition BA on the processing surface Fp, a light emitting layer forming apparatus for forming a light emitting layer, a semiconductor forming apparatus for forming a switching element, an electrode forming apparatus, Examples thereof include an insulating layer forming apparatus and a wiring forming apparatus for forming a wiring.

  As an apparatus for forming such a component of the organic EL element, for example, a coating apparatus (for example, an ink jet type coating apparatus, a spin coat type coating apparatus, a transfer apparatus, a printing apparatus, etc.), a film forming apparatus such as a vapor deposition apparatus or a sputtering apparatus Alternatively, a developing device, a surface modifying device, a cleaning device, or the like is used. Each of these apparatuses is appropriately provided, for example, on the conveyance path of the sheet substrate FB. In the present embodiment, a case where a coating apparatus is used as the processing apparatus 60 will be described as an example. More specifically, the case where a transfer device is used in the coating device will be described as an example.

FIG. 2 is a diagram illustrating a configuration when the processing device 60 is viewed in the −Z direction.
As illustrated in FIG. 2, the processing apparatus 60 includes a transfer roller 61 that transfers, for example, a predetermined pattern P to the sheet substrate FB. Examples of the pattern P transferred to the sheet substrate FB include a wiring pattern and a light emitting layer pattern. Of course, patterns for other components may be used. In the present embodiment, a case where a plurality of belt-like patterns are transferred will be described as an example. A plurality of (for example, four) transfer rollers 61 are provided along the Y direction.

  The plurality of transfer rollers 61 </ b> A to 61 </ b> D are formed in, for example, a cylindrical shape, have substantially the same roller diameter, and are formed so that the dimensions in the Y direction are substantially the same. Among the plurality of transfer rollers 61A to 61D, for example, the transfer roller 61A is disposed closest to the + Y side, and is sequentially disposed in the order of the transfer roller 61B, the transfer roller 61C, and the transfer roller 61D in the −Y direction from the transfer roller 61A. Yes.

  Of the plurality of transfer rollers 61A to 61D, the transfer roller 61A (first pattern application unit) and the transfer roller 61C (first pattern application unit) are attached to a common rotating shaft member 62, and the transfer roller 61B ( The second pattern application unit) and the transfer roller 61D (second pattern application unit) are attached to a common rotating shaft member 63.

  The rotating shaft member 62 and the rotating shaft member 63 are disposed, for example, in parallel with the Y direction, and are provided so as to be rotatable in the θY direction. Further, the rotary shaft member 62 and the rotary shaft member 63 are arranged at positions shifted from each other in the X direction. The transfer roller 61A and the transfer roller 61C attached to the rotary shaft member 62 are respectively arranged at the same position in the X direction, and the transfer roller 61B and the transfer roller 61D attached to the rotary shaft member 63 are at the same position in the X direction. Each is arranged.

  The rotating shaft members 62 and 63 are connected to driving devices 64 and 65, respectively. The driving devices 64 and 65 have motor mechanisms (not shown) that rotate the rotation shaft members 62 and 63 in the θY direction, respectively, and drive the rotation shaft members 62 and 63 in the X direction, the Y direction, and the Z direction, respectively. An actuator mechanism (not shown). The operations of the drive devices 64 and 65 are controlled by, for example, the control unit CONT.

  The rotation shaft member 62 is disposed on the upstream side (−X direction) of the sheet substrate FB in the conveyance direction (X direction) with respect to the rotation shaft member 63. Therefore, the set of the transfer roller 61A and the transfer roller 61C is arranged on the −X side from the set of the transfer roller 61B and the transfer roller 61D. As described above, the plurality of transfer rollers 61 </ b> A to 61 </ b> D are arranged at positions shifted in the conveyance direction of the sheet substrate FB.

  The plurality of transfer rollers 61A to 61D have transfer portions 66A to 66D, respectively. The transfer portions 66A to 66D are portions where the pattern P to be transferred onto the sheet substrate FB is disposed. The first patterns P1 are arranged on the transfer portions 66A and 66C of the transfer rollers 61A and 61C provided on the −X side, respectively. The second patterns P2 are arranged in the transfer portions 66B and 66D of the transfer rollers 61B and 61D provided on the + X side, respectively. In the present embodiment, the first pattern P1 and the second pattern P2 respectively disposed in the transfer portions 66A to 66D are transferred onto the sheet substrate FB, so that the pattern P is applied onto the sheet substrate FB. ing.

  As the configuration of the transfer units 66A to 66D, for example, a supply port for droplets or the like constituting the pattern P is disposed, and the droplets or the like are applied from the transfer units 66A to 66D to the sheet substrate FB to form the pattern P. The structure to form may be sufficient. In addition, as the configuration of the transfer portions 66A to 66D, for example, a pattern P is previously formed in a pattern forming apparatus (not shown), and the previously formed pattern P is pasted on the transfer portions 66A to 66D. It doesn't matter.

  For these transfer portions 66A to 66D, the transfer target region 10 is provided on the sheet substrate FB. The transferred region 10 is a region on the sheet substrate FB to which the pattern P is transferred by the transfer units 66A to 66D. The transfer area 10 includes, for example, a transfer area 10A corresponding to the transfer section 66A, a transfer area 10B corresponding to the transfer section 66B, a transfer area 10C corresponding to the transfer section 66C, and a transfer area corresponding to the transfer section 66D. The region 10D is included.

  In the present embodiment, the transfer part 66A and the transfer part 66B are arranged in a state in which a part of each other overlaps when viewed in the X direction. For this reason, the sheet substrate FB is provided with an overlapping region 11 where the transferred region 10A and the transferred region 10B overlap. In the overlapping area 11, the first pattern P1 and the second pattern P2 are transferred in an overlapping state.

  The transfer part 66B and the transfer part 66C are arranged in a state in which a part of each other overlaps when viewed in the X direction. For this reason, the sheet substrate FB is provided with an overlapping region 12 where the transferred region 10B and the transferred region 10C overlap. The overlapping region 12 is transferred in a state where the second pattern P2 and the first pattern P1 are overlapped by the two transfer portions 66B and 66C.

  In addition, the transfer part 66C and the transfer part 66D are arranged in a state in which a part thereof overlaps when viewed in the X direction. For this reason, the sheet substrate FB is provided with an overlapping region 13 where the transferred region 10C and the transferred region 10D overlap. The overlapping area 13 is transferred in a state where the first pattern P1 and the second pattern P2 are overlapped by the two transfer portions 66C and 66D.

  The sum of the dimensions in the Y direction of the overlapping regions 11 to 13 is preferably, for example, 25% or less of the dimension in the Y direction of the sheet substrate FB, for example, in terms of cost reduction. The sum of the dimensions in the Y direction of the overlapping region 11 is, for example, at least twice the mechanical position error of the transfer roller 61 in the Y direction (for example, several tens of times) from the aspect of ensuring the transfer accuracy of the transfer roller 61. It is preferable to be about twice.

  As described above, the sheet substrate FB is provided with the transferred region 10 (10A to 10D) to which the pattern P is transferred by the transfer units 66A to 66D, and the first pattern P1 and the second pattern P2 are overlapped. A plurality of overlapping regions 11 to 13 to be transferred are provided.

  Of the first pattern P1 and the second pattern P2 arranged in the transfer portions 66A to 66D, the first pattern P1 and the second pattern P2 applied to the overlapping regions 11 to 13 of the sheet substrate FB are other regions. The layer thickness is thinner than the first pattern P1 and the second pattern P2 applied to the film. For this reason, the application amounts of the first pattern P1 and the second pattern P2 applied to the overlapping regions 11 to 13 are smaller than the application amounts of the first pattern P1 and the second pattern P2 applied to other regions. Become.

  In the present embodiment, a case where a plurality of strip-like patterns extending in the X direction and having substantially the same shape and layer thickness are applied as a pattern P on the sheet substrate FB will be described as an example. For this reason, for example, the layer thickness and the coating amount of the first pattern P1 and the second pattern P2 applied to the overlapping regions 11 to 13 are the same as the layer thickness of the first pattern P1 and the second pattern P2 applied to other regions. It is halved. Further, the first pattern P1 and the second pattern P2 applied to a region different from the overlapping regions 11 to 13 have substantially the same layer thickness.

FIG. 3 is a diagram illustrating a configuration when the processing device 60 is viewed in the Y direction.
As shown in FIGS. 2 and 3, the set of the transfer roller 61A and the transfer roller 61C and the set of the transfer roller 61B and the transfer roller 61D are arranged at a predetermined interval in the X direction. In the X direction, there is a pattern edge detection mechanism (timing adjustment unit) 67 and a roller position adjustment mechanism (position adjustment unit) between the set of transfer roller 61A and transfer roller 61C and the set of transfer roller 61B and transfer roller 61D. ) 6 is provided.

  The pattern edge detection mechanism 67 detects the tip PE of the first pattern P1 applied on the sheet substrate FB. The pattern edge detection mechanism 67 has, for example, an optical sensor that can detect the tip of the first pattern P1. The pattern edge detection mechanism 67 is provided on at least one of the + Z side and the −Z side of the sheet substrate FB. When the pattern edge detection mechanism 67 is disposed on the −Z side of the sheet substrate FB, the tip of the first pattern P1 is detected through the sheet substrate FB. Therefore, when the sheet substrate FB has light transmittance, the pattern edge detection mechanism 67 disposed on the −Z side of the sheet substrate FB can be preferably used. Although FIG. 3 shows an example in which the sheet substrate FB is arranged on both the + Z side and the −Z side, it is needless to say that the arrangement may be arranged on only one of them.

  The roller position adjustment mechanism 6 is based on, for example, three position detection mechanisms 6AB, 6BC, and 6CD that detect the positional relationship between two transfer rollers 61 adjacent in the Y direction, and detection results of the position detection mechanisms 6AB, 6BC, and 6CD. Drive mechanisms 6E to 6H for driving the transfer roller 61 at least in the Y direction.

FIG. 4 is a diagram showing, for example, a position detection mechanism 6AB and drive mechanisms 6E and 6G as an example of the roller position adjustment mechanism 6. As shown in FIG.
The position detection mechanism 6AB is disposed, for example, at an interval from both the transfer roller 61A and the transfer roller 61B in the X direction. The position detection mechanism 6AB is provided so as to straddle between the transfer roller 61A and the transfer roller 61B in the Y direction, for example. The position detection mechanism 6AB detects the position (first reference position) of the −Y side end of the transfer roller 61A, and the −Y side of the first pattern P1 of the transfer unit 66A from the −Y side end of the transfer roller 61A. The distance t1 to the end is calculated. The position detection mechanism 6AB detects the position (second reference position) of the + Y side end of the transfer roller 61B, and the + Y side end of the second pattern P2 of the transfer unit 66B from the + Y side end of the transfer roller 61B. The distance t2 to the part is calculated.

  Although illustration is omitted, the position detection mechanism 6BC is disposed, for example, at an interval from both the transfer roller 61B and the transfer roller 61C in the X direction. The position detection mechanism 6BC is provided so as to straddle between the transfer roller 61B and the transfer roller 61C in the Y direction, for example. The position detection mechanism 6BC detects the position (first reference position) of the −Y side end of the transfer roller 61B, and the −Y side of the second pattern P2 of the transfer unit 66B from the −Y side end of the transfer roller 61B. Calculate the distance to the edge. Further, the position detection mechanism 6BC detects the position (second reference position) of the + Y side end of the transfer roller 61C, and extends from the + Y side end of the transfer roller 61C to the first pattern P1 + Y side end of the transfer unit 66C. The distance is calculated.

  Although not shown, the position detection mechanism 6CD is disposed, for example, at an interval from both the transfer roller 61C and the transfer roller 61D in the X direction. The position detection mechanism 6CD is provided so as to straddle between the transfer roller 61C and the transfer roller 61D in the Y direction, for example. The position detection mechanism 6CD detects the position (first reference position) of the −Y side end of the transfer roller 61C, and the −Y side of the first pattern P1 of the transfer unit 66C from the −Y side end of the transfer roller 61C. Calculate the distance to the edge. Further, the position detection mechanism 6CD detects the position (second reference position) of the + Y side end of the transfer roller 61D, and the + Y side end of the second pattern P2 of the transfer unit 66D from the + Y side end of the transfer roller 61D. The distance to the part is calculated.

  The substrate processing apparatus FPA having the configuration shown in FIGS. 1 to 4 manufactures a display element such as an organic EL element by a so-called roll-to-roll method (hereinafter referred to as a roll method) under the control of the control unit CONT. . Hereinafter, a process of manufacturing a display element using the substrate processing apparatus FPA having the above configuration will be described.

  First, the belt-like sheet substrate FB is wound around a roller (not shown) provided in the substrate supply unit SU. The control unit CONT causes the sheet substrate FB to be sent out from the substrate supply unit SU, winds up the sent sheet substrate FB with a roller of the substrate recovery unit CL, and transports the sheet substrate FB.

  The control unit CONT adjusts the position of the sheet substrate FB using the alignment device 80 between the time when the sheet substrate FB is fed and the time when the sheet substrate FB is wound, and the transfer unit 70 of the substrate processing unit PR transfers the sheet substrate FB to the sheet substrate FB. The substrate is appropriately transported in the substrate processing unit PR (substrate feeding process). Further, the control unit CONT causes the processing device 60 to sequentially form components of the display element, for example, the pattern P, on the sheet substrate FB while conveying the sheet substrate FB (pattern forming step).

  Prior to the pattern formation step, the control unit CONT arranges the patterns P (first pattern P1 and second pattern P2) on the transfer units 66A to 66D of the transfer rollers 61A to 61D. After the pattern P is arranged in the transfer parts 66A to 66D, the control part CONT adjusts the positions of the transfer rollers 61A to 61D by the roller position adjustment mechanism 6 (position adjustment process). In the position adjustment step, the control unit CONT adjusts the positions of the transfer rollers 61A to 61D by adjusting the drive amounts of the drive mechanisms 6E to 6H based on the detection results of the position detection mechanisms 6AB, 6BC, and 6CD, for example.

  In the pattern forming step, as shown in FIGS. 5 and 6, the control unit CONT moves the rotary shaft member 62 in the −Z direction via the driving device 64, and is arranged on the transfer rollers 61 </ b> A and 61 </ b> C. The pattern P1 is pressed onto the sheet substrate FB. In this state, the control unit CONT rotates the rotary shaft member 62 in the θY direction via the drive device 64. By this operation, the first pattern P1 is transferred onto the sheet substrate FB, and the first pattern P1 is applied to the sheet substrate FB in layers.

  The first pattern P1 is formed on the transferred region 10A and the transferred region 10C on the sheet substrate FB. FIG. 9 shows a state in which the first pattern P1 is applied to the transfer area 10A by the transfer roller 61A. As shown in FIG. 9, the layer thickness h2 of the first pattern P1 formed in the overlapping region 11 is half the layer thickness h1 of the first pattern P1 formed in the other transferred region 10A. Although not shown, the layer thickness of the pattern P formed in the overlapping regions 12 and 13 is also approximately half the layer thickness of the first pattern P1 formed in the other transferred region 10C.

  When the first pattern P1 is transferred onto the sheet substrate FB, the control unit CONT adjusts the rotation of the rotary shaft member 62 so that the moving speed of the transfer sections 66A and 66C and the conveying speed of the sheet substrate FB are substantially equal. To do. By this adjustment operation, the first pattern P1 can be prevented from being bent or pulled.

  When the transfer of the first pattern P1 is started, the control unit CONT operates the pattern edge detection mechanisms 67A and 67C so that the tip PE of the first pattern P1 can be detected. As shown in FIGS. 5 and 6, the first pattern P1 is applied to the sheet substrate FB while being conveyed in the + X direction. The leading edge PE of the first pattern P1 moves in the + X direction as the sheet substrate FB is conveyed, and approaches the −Z side of the pattern edge detection mechanisms 67A and 67C. When the leading edge PE in the transport direction of the first pattern P1 is detected by the pattern edge detection mechanisms 67A and 67C, a detection signal is transmitted from the pattern edge detection mechanisms 67A and 67C to the control unit CONT.

  After receiving the detection signal, the control unit CONT starts the transfer operation of the second pattern P2. For example, as shown in FIGS. 7 and 8, the control unit CONT moves the rotating shaft member 63 in the −Z direction, and presses the second pattern P2 arranged on the transfer rollers 61B and 61D against the sheet substrate FB. The controller CONT rotates the rotating shaft member 63 in the θY direction after pressing the second pattern P2 against the sheet substrate FB. By this operation, the second pattern P2 is transferred onto the sheet substrate FB, and the second pattern P2 is applied in layers on the sheet substrate FB.

  The control unit CONT uses the pattern edge detection mechanisms 67A and 67C as described above, so that the tip PE of the second pattern P2 is aligned with the tip PE of the first pattern P1 in the −Z direction of the rotary shaft member 63. The movement speed and the movement timing of the are controlled. Further, the control unit CONT adjusts the rotation of the rotary shaft member 63 so that the moving speeds of the transfer units 66B and 66D are substantially equal to the conveyance speed of the sheet substrate FB.

  Through the above operation, the second pattern P2 is formed on the transfer area 10B and the transfer area 10D on the sheet substrate FB. FIG. 10 shows a state in which, for example, the second pattern P2 is applied to the transfer area 10B by the transfer roller 61B. FIG. 10 is a diagram for explaining the application state of the second pattern P2, and shows the application state when the second pattern P2 is applied on the sheet substrate FB alone.

  As shown in FIG. 10, the second pattern P <b> 2 is formed in a region including the overlapping region 11. The layer thickness h2 of the second pattern P2 formed in the overlapping region 11 is half of the layer thickness h1 of the second pattern P2 formed in the other transferred region 10B. Although not shown in FIG. 10, the layer thickness of the second pattern P2 formed in the overlapping regions 12 and 13 is also the same as that of the second pattern P2 formed in the other transferred region 10B or 10D. Half the layer thickness.

  Therefore, the second pattern P2 applied by the pattern formation process of the present embodiment is formed so as to overlap the first pattern P1 in the overlapping regions 11 to 13 as shown in FIG. For this reason, on the sheet | seat board | substrate FB, the pattern P is formed in the state in which the 1st pattern P1 and the 2nd pattern P2 were connected to the Y direction by the overlapping areas 11-13.

  The layer thickness h2 of the first pattern P1 and the second pattern P2 applied to the overlapping regions 11 to 13 of the sheet substrate FB is the layer thickness h1 of the first pattern P1 and the second pattern P2 applied to other regions. Half the layer thickness. Therefore, the sum of the layer thickness h2 of the first pattern P1 applied to the overlapping regions 11 to 13 and the layer thickness h2 of the second pattern P2 is the first pattern P1 and the second pattern P2 applied to other regions. Is substantially equal to the layer thickness h1. Therefore, on the sheet substrate FB, a plurality of strip-like patterns having the same shape are applied as the pattern P so as to extend in the X direction with substantially the same layer thickness. After the pattern P is formed, other components of the organic EL element are formed on the sheet substrate FB. As described above, an organic EL element is manufactured as a display element.

  As described above, according to this embodiment, the transfer rollers 61A and 61C for applying the first pattern P1 to the sheet substrate FB and the transfer rollers 61B and 61D for applying the second pattern P2 to the sheet substrate FB are provided. The transfer rollers 61B and 61D have the second pattern P2 such that a part of the first pattern P1 and a part of the second pattern P2 overlap each other in the direction (Y direction) intersecting the transport direction (X direction) of the sheet substrate FB. Therefore, the first pattern P1 and the second pattern P2 are connected in the Y direction with the overlapping portions (overlapping regions 11 to 13) serving as reference positions. As a result, the first pattern P1 and the second pattern P2 can be smoothly connected, so that the pattern P can be formed so that pattern unevenness (and thus display unevenness and display defect) is not noticeable. As described above, in this embodiment, pattern unevenness that affects display characteristics such as display unevenness and display defects is reduced.

[Second Embodiment]
Next, a second embodiment of the present invention will be described.
In the present embodiment, the case where a pattern P having a different overlapping state between the first pattern P1 and the second pattern P2 is formed as an example will be described. In the present embodiment, the pattern P is formed in the same process using the substrate processing apparatus having the same configuration as the substrate processing apparatus FPA described in the first embodiment. Further, in the points other than the overlapping state of the pattern P, the same explanation as that of the first embodiment is possible.

  12-14 is a figure which shows the pattern P formed by a pattern formation process. 12 to 14, for example, similarly to FIGS. 9 to 11 of the first embodiment, patterns P (first pattern P1 and second pattern P) are formed on the transfer target areas 10A and 10B and the overlapping area 11 by the transfer rollers 61A and 61B. The pattern P2) is formed. Of course, the contents described in FIGS. 12 to 14 and the following description are applicable to the transferred regions 10C and 10D and the overlapping regions 12 and 13 as well.

  As shown in FIGS. 12 to 14, the overlapping region 11 provided on the sheet substrate FB is formed wider in the Y direction than in the case of the first embodiment. Specifically, the overlapping region 11 is formed in a dimension including a plurality of strip-like patterns (for example, two) in the Y direction. In the present embodiment, in the overlapping region 11, two belt-like patterns of the first pattern P1 and two belt-like patterns of the second pattern P2 overlap each other. Of course, the number of the strip-like patterns included in the overlapping region 11 may be three or more (for example, about eight).

  As shown in FIG. 12, the band-shaped pattern in the overlapping region 11 in the first pattern P1 is applied so that the layer thickness gradually decreases as it reaches the -Y direction. Moreover, as shown in FIG. 13, the strip | belt-shaped pattern in the duplication area | region 11 among the 2nd patterns P2 is apply | coated so that a layer thickness may become small gradually as it goes to + Y direction.

  However, as shown in FIG. 14, for example, in the overlapping region 11, the first pattern P <b> 1 is formed so that a substantially flat pattern P is formed when the first pattern P <b> 1 and the second pattern P <b> 2 are overlapped. It is applied so that the sum of the layer thickness and the layer thickness of the second pattern P2 is substantially equal to the layer thickness of the first pattern P1 and the second pattern P2 in other regions.

  In the present embodiment, for example, as illustrated in FIG. 15, it may be assumed that the application position of the second pattern P2 is shifted in the Y direction with respect to the first pattern P1. In such a case, for example, if the pitch in the Y direction of the first pattern P1 and the second pattern P2 is t and the amount of deviation in the Y direction between the first pattern P1 and the second pattern P2 is d, the overlapping region 11 The pitch of the four belt-like patterns formed across the two is (t−d / 3). Therefore, even if the first pattern P1 and the second pattern P2 are shifted in the Y direction, the patterns P are formed at equal intervals in the region straddling the overlapping region 11.

  Such a shift in the pitch of the pattern P between the overlapping region 11 and other regions is one third of the shift amount (d) between the first pattern P1 and the second pattern P2. In addition, the deviation occurs only in two places on both sides in the Y direction with respect to the overlapping region 11 in the pattern P. For this reason, when the pattern P is viewed with the naked eye, the deviation of the pitch can hardly be confirmed.

  As described above, according to the present embodiment, the size in the Y direction of the overlapping regions 11 to 13 is further increased, and a plurality of strips of the first pattern P1 and the second pattern P2 in the overlapping regions 11 to 13 are included. Since the patterns are overlapped, the connection between the first pattern P1 and the second pattern P2 can be made smoother. Thereby, the pattern P can be formed so that unevenness is not conspicuous.

  Further, according to the present embodiment, by applying the first pattern P1 and the second pattern P2 in an overlapping manner, for example, the application position is shifted in the Y direction between the first pattern P1 and the second pattern P2. Even in this case, the pitch deviation in the Y direction of the pattern P can be made inconspicuous.

The technical scope of the present invention is not limited to the above-described embodiment, and appropriate modifications can be made without departing from the spirit of the present invention.
For example, in the above-described embodiment, the first pattern application unit and the second pattern application unit have been described using examples using transfer devices (transfer rollers 61A to 61D), but the present invention is not limited thereto. A configuration using an ink jet type coating apparatus, a spin coat type coating apparatus, a printing apparatus, or the like may be used. In this case, for example, only one type of apparatus such as an ink jet type coating apparatus, a spin coat type coating apparatus, a transfer apparatus, and a printing apparatus may be used, or a plurality of types of apparatuses may be used. For example, when an ink jet type coating apparatus is used, a liquid material in which the constituent material of the pattern P is dissolved or dispersed can be discharged onto the sheet substrate FB. In this case, it is required that the coating amount of the constituent material applied to the overlapping regions 11 to 13 be smaller than the coating amount of the constituent material applied to other regions. As such a configuration, for example, a configuration in which the distribution density of the nozzles ejected to the overlapping regions 11 to 13 is made smaller than the distribution density of the nozzles ejected to the other regions. In addition, for example, the concentration of the constituent material contained in the liquid material discharged to the overlapping regions 11 to 13 may be made smaller than the concentration of the constituent material contained in the liquid material discharged to other regions.

  Moreover, in the said embodiment, the 1st pattern by which the layer thickness of the 1st pattern P1 apply | coated to the overlapping area | regions 11-13 on the sheet | seat board | substrate FB and each layer thickness of the 2nd pattern P2 are apply | coated to another area | region. Although the case where it becomes half the layer thickness of P1 and the 2nd pattern P2 was mentioned as an example and demonstrated, it is not restricted to this.

  For example, the sum of the layer thickness of the first pattern P1 and the layer thickness of the second pattern P2 applied to the overlapping regions 11 to 13 is the layer thickness of the first pattern P1 and the second pattern P2 formed in other regions. , The layer thickness of the first pattern P1 applied to the overlapping regions 11 to 13 and the layer thickness of the second pattern P2 may be different.

  Moreover, in the said embodiment, although the case where each edge part of the Y direction of transfer roller 61A-61D was made into the reference position in the position adjustment process using the roller position adjustment mechanism 6 was demonstrated as an example, it is restricted to this. There is nothing to be done. For example, another member independent of the transfer rollers 61A to 61D may be arranged, and a predetermined position on the another member may be set as the reference position. In this case, the reference position is set to a position independent of the transfer rollers 61A to 61D.

  Moreover, in the said embodiment, in the position adjustment process using the roller position adjustment mechanism 6, the distance between each edge part of the Y direction of transfer roller 61A-61D and each edge part of the Y direction of transfer part 66A-66D. However, the present invention is not limited to this. For example, the portion formed in the overlapping regions 11 to 13 in the already formed pattern P is detected, and the driving mechanism 6E is based on the overlapping state of the first pattern P1 and the second pattern P2 in the overlapping regions 11 to 13. The drive amount of ˜6H may be adjusted. In this case, for example, a shift in the Y direction between the first pattern P1 and the second pattern P2 can be detected, and the drive amount can be adjusted according to the shift amount.

  As the pattern P that has already been formed, for example, the pattern P formed in an actual process may be used, or the pattern P that is formed in advance through experiments or simulations may be used. Further, for example, a pattern coating process may be performed, and the pattern P formed in the trial coating process may be used.

  In the above embodiment, the transfer rollers 61A and 61C as the first pattern application unit and the transfer rollers 61B and 61D as the second pattern application unit overlap in the direction (Y direction) intersecting the conveyance direction of the sheet substrate FB. However, the configuration is not necessarily limited to this as long as it is applied so that a part of the first pattern and a part of the second pattern overlap each other in the Y direction.

  As such a configuration, for example, a case where an ink jet type coating apparatus is used as the first pattern coating unit and the second pattern coating unit may be used. If the liquid material is ejected so that a part of the first pattern and a part of the second pattern overlap each other in the Y direction, for example, an ink jet type coating apparatus that configures the first pattern coating unit and the second pattern coating unit The configuration may be such that they are spaced apart from each other in the Y direction.

  For example, also when using a transfer roller as a 1st pattern application part and a 2nd pattern application part etc., you may arrange | position the transfer rollers spaced apart in the Y direction. For example, when the position in the Y direction of the sheet substrate FB changes in the transport path, the position in the Y direction of the sheet substrate FB applied by the first pattern application unit and the sheet applied by the second pattern application unit The position of the substrate FB in the Y direction may be different. In this case, since a part of the first pattern and a part of the second pattern are overlapped with each other in the Y direction, for example, the transfer rollers can be separated from each other in the Y direction according to the position of the sheet substrate FB. .

  Moreover, although the said embodiment gave and demonstrated the case where the some strip | belt-shaped pattern which has an equal shape was apply | coated on the sheet | seat board | substrate FB, it was not restricted to this. For example, the same description can be made even when a plurality of patterns having different shapes are applied on the sheet substrate FB, or when a pattern having a shape different from the belt-like pattern is applied. In this case, the shapes and layer thicknesses of the first pattern P1 and the second pattern P2 that overlap the overlapping regions 11 to 13 can be appropriately set according to the shape and layer thickness of the pattern P applied on the sheet substrate FB. .

  For example, the width in the Y direction of the overlapping region 11 in the present embodiment is not particularly limited in terms of cost, but is 25% or less with respect to the width in the Y direction of the transferred region 10A (or the transferred region 10B). It is desirable that In such a case, for example, the transfer roller 61A is adjusted so that the width in the Y direction of the overlapping region 11 is 25% or less with respect to the width in the Y direction of the transferred region 10A (or the transferred region 10B). . Note that the overlapping regions 12 and 13 in the present embodiment are the same as the overlapping region 11 and are not described.

  In addition, when the processing device 60 in the present embodiment forms a pattern (for example, the first pattern P1 and the second pattern P2) on the overlapping regions 11 to 13 in an overlapping manner, the alignment accuracy of the pattern formed in the overlapping region ( (Overlapping accuracy) can be made relatively moderate, and the pattern can be formed so that display unevenness is not noticeable.

  DESCRIPTION OF SYMBOLS FPA ... Substrate processing apparatus FB ... Sheet substrate CONT ... Control part P (P1, P2) ... Pattern PE ... Tip 6 ... Roller position adjustment mechanism 6AB, 6BC, 6CD ... Position detection mechanism 6E-6H ... Drive mechanism 10 (10A-10D) ) ... area to be transferred 11 to 13 ... overlapping area 60 ... processing device 61 (61A to 61D) ... transfer roller 64 ... drive device 66A to 66D ... transfer section 67 (67A, 67C) ... pattern edge detection mechanism

Claims (13)

An apparatus for forming a predetermined pattern on the surface of the sheet substrate while conveying the flexible and strip-shaped sheet substrate in the longitudinal direction,
A first pattern application unit that applies a first pattern to one of a plurality of regions adjacent to each other in a short direction that intersects the longitudinal direction of the sheet substrate;
A second pattern application unit that applies a second pattern to the other of the plurality of regions of the sheet substrate ;
A part of the first pattern applied by the first pattern application part and a part of the second pattern applied by the second pattern application part are in the short direction of the sheet substrate. A position adjusting unit that adjusts a relative position between the first pattern application unit and the second pattern application unit with respect to the short direction of the sheet substrate so as to form an overlapping region that overlaps each other;
Based on the positional relationship between the first pattern application unit and the second pattern application unit, or the overlapping state of the first pattern and the second pattern in the overlapping region, the position adjustment unit is And a control unit that controls the pattern forming apparatus.   The first pattern application portion has a first reference portion provided at an end portion in a short direction of the sheet substrate,
  The second pattern application portion has a second reference portion provided at an end portion in a short direction of the sheet substrate,
  The pattern forming apparatus according to claim 1, further comprising a position detection mechanism that detects a relative position between the first reference portion and the second reference portion. The first pattern application unit forms the first pattern such that the layer thickness of the overlapping region in the first pattern is smaller than the layer thickness of other regions in the first pattern,
The second pattern coating unit, according to claim thickness of the overlap region in the second pattern to form the second pattern to be smaller than the thickness of other regions in the second pattern 1 Or the pattern formation apparatus of Claim 2 . The first pattern application unit forms the first pattern such that the application amount in the overlapping region of the first pattern is smaller than the application amount in other regions of the first pattern,
The said 2nd pattern application part forms a said 2nd pattern so that the application quantity in the said overlapping area of the said 2nd pattern may become smaller than the application quantity in the other area | region of the said 2nd pattern. The pattern forming apparatus according to claim 3 . The first pattern application unit and the second pattern application unit are arranged to be spaced apart from each other in the longitudinal direction of the sheet substrate and to be partially overlapped in the short direction of the sheet substrate. The pattern formation apparatus as described in any one of Claims 1-4 . Any one of Claims 1-5 provided with the timing adjustment part which adjusts the timing of application | coating of the said 1st pattern by the said 1st pattern application part, and application | coating of the said 2nd pattern by the said 2nd pattern application part. The pattern forming apparatus according to claim 1. The first pattern application unit and the second pattern application unit include a transfer device that forms a transfer pattern as the first pattern or the second pattern, and a print pattern as the first pattern or the second pattern. The pattern formation apparatus as described in any one of Claims 1-6 provided with at least 1 among the printing apparatuses to form, respectively.   A method of forming a predetermined pattern on the surface of the sheet substrate while transporting the flexible and strip-shaped sheet substrate in the longitudinal direction,
  The first pattern application unit applies the first pattern to one of the plurality of regions adjacent to each other in the lateral direction intersecting the longitudinal direction of the sheet substrate, and the second pattern application unit is applied to the other of the plurality of regions. A pattern application step of applying a second pattern;
  A part of the first pattern applied to the sheet substrate and a part of the second pattern form an overlapping region that overlaps each other in the short direction perpendicular to the longitudinal direction of the sheet substrate. And adjusting the relative position of the first pattern application part and the second pattern application part with respect to the short direction,
  The adjustment step includes
  Control is performed based on the positional relationship between the first pattern application unit and the second pattern application unit detected by the position detection mechanism, or the overlapping state of the first pattern and the second pattern in the overlapping region. A pattern forming method. The pattern application step, the respective first pattern and the second pattern, as the layer thickness in the overlap region is smaller than the layer thickness in the other regions, according to claim 8, which comprises coating the fabric Pattern forming method. The pattern application step, the total layer thickness in the overlap region between said first pattern and the second pattern, and RusoAtsu put to other areas of the first pattern and the second pattern The pattern forming method according to claim 9 , further comprising applying each of the first pattern and the second pattern so that the two are substantially the same. The pattern forming step includes
Coating the layer thickness of the first pattern in the overlapping region or the layer thickness of the second pattern in the overlapping region so as to decrease toward the front end in the short direction of the sheet substrate. The pattern formation method of Claim 9 or Claim 10 . The pattern application step, the first pattern coating unit according to claim 8 or al comprising adjusting the timing of the application of the second pattern by applying a second pattern coating portion of the first pattern by claims the pattern forming method according to any one of claim 11. A transport device for transporting a flexible sheet-shaped sheet substrate in the longitudinal direction ;
A pattern forming apparatus for applying a pattern on the sheet substrate;
The pattern forming apparatus according to any one of claims 1 to 7 is used as the pattern forming apparatus.
Display element manufacturing equipment.

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