JP5476193B2 - Particle counting system - Google Patents
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- 239000002245 particle Substances 0.000 title claims description 90
- 238000010790 dilution Methods 0.000 claims description 76
- 239000012895 dilution Substances 0.000 claims description 76
- 238000011144 upstream manufacturing Methods 0.000 claims description 31
- 230000010365 information processing Effects 0.000 claims description 29
- 238000005259 measurement Methods 0.000 claims description 23
- 239000007787 solid Substances 0.000 claims description 6
- 239000013618 particulate matter Substances 0.000 description 13
- 238000007865 diluting Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 4
- 101100023111 Schizosaccharomyces pombe (strain 972 / ATCC 24843) mfc1 gene Proteins 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 238000009530 blood pressure measurement Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
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Description
本発明は、エンジンの排出ガスに含まれるＰＭ等の固体粒子数を計測する粒子数計測システムに関するものである。 The present invention relates to a particle number measuring system for measuring the number of solid particles such as PM contained in engine exhaust gas.
エンジンからの排出物質の１つである粒子状物質（ＰＭ：Ｐａｒｔｉｃｕｌａｔｅ Ｍａｔｔｅｒｓ）の測定方法としては、フィルタを用いてＰＭを捕集し、そのＰＭ質量を図るフィルタ質量法が周知である。ところで、ＰＭ排出量が微量となり、フィルタ重量法では精度面で厳しい状況となってきている。そのような状況のもと、フィルタ重量法の代替法として開発されたものが、排出ガス中のＰＭの数を計測する手法である。その具体的なシステム構成としては、例えば粒子数計測装置の前段に、エンジンの排出ガスをエア等で希釈する希釈ユニットを設け、その希釈した排出ガスの一部を当該粒子数計測装置に導いて、その中に含まれる粒子数をカウントするようにしたものが知られている（特許文献１参照）。 As a method for measuring particulate matter (PM), which is one of exhaust substances from the engine, a filter mass method is known in which PM is collected using a filter and the PM mass is measured. By the way, the amount of PM emission is very small, and the filter weight method has become severe in terms of accuracy. Under such circumstances, a method developed as an alternative to the filter weight method is a method for measuring the number of PM in exhaust gas. As a specific system configuration, for example, a dilution unit for diluting the exhaust gas of the engine with air or the like is provided in the front stage of the particle number measuring device, and a part of the diluted exhaust gas is led to the particle number measuring device. In addition, there is known one that counts the number of particles contained therein (see Patent Document 1).
従来、このようなシステムにおいて、希釈ユニットは、特許文献２に示すように、排ガスが流れるメイン流路と希釈ガスが流れる希釈ガス流路との接続点又はその下流近傍に設けた希釈器と、その希釈器に導入される排出ガスの質量流量を測定するための流量測定機構と、希釈器に同じく導入される希釈ガスの質量流量を制御する希釈ガス流量制御部と、排出ガスの質量流量を可変させる排出ガス流量制御部と、を備えている。そして、この希釈ユニットに流れ込んでくる排出ガスの流量を、前記流量測定機構で測定するとともに排出ガス流量制御部で制御して、所望の希釈比を実現するように構成されている。 Conventionally, in such a system, as shown in Patent Document 2, the dilution unit includes a diluter provided near or at a connection point between a main flow path through which exhaust gas flows and a dilution gas flow path through which dilution gas flows, A flow rate measuring mechanism for measuring the mass flow rate of the exhaust gas introduced into the diluter, a dilution gas flow control unit for controlling the mass flow rate of the dilution gas introduced into the diluter, and a mass flow rate of the exhaust gas An exhaust gas flow rate control unit that is variable. The flow rate of the exhaust gas flowing into the dilution unit is measured by the flow rate measuring mechanism and controlled by the exhaust gas flow rate control unit to realize a desired dilution ratio.
そして、流量制御機構は、流体抵抗となるオリフィス部と、そのオリフィス部の差圧を測定する圧力センサと、上流側の絶対圧を測定する圧力センサとを備えており、オリフィス部の上下流の圧力情報等に基づいて、別に設けた情報処理装置が、希釈器に導入される排出ガスの質量流量を算出できるように構成されている。 The flow rate control mechanism includes an orifice part that serves as a fluid resistance, a pressure sensor that measures a differential pressure of the orifice part, and a pressure sensor that measures an absolute pressure on the upstream side. Based on pressure information or the like, a separately provided information processing device is configured to calculate the mass flow rate of the exhaust gas introduced into the diluter.
しかしながら、希釈ユニットの上流側にオリフィス部、差圧測定用の圧力センサ、絶対圧測定用の圧力センサ及び温調器を設けることによって、粒子数計測システムが大きくなってしまうという問題があるとともに、部品点数が増えることによってコスト増大の問題もある。 However, by providing an orifice part, a pressure sensor for differential pressure measurement, a pressure sensor for absolute pressure measurement, and a temperature controller on the upstream side of the dilution unit, there is a problem that the particle number measurement system becomes large, There is also a problem of increased cost due to the increase in the number of parts.
また、この粒子数計測システムにおいては、希釈ユニットと粒子数計測装置との間にバイパス流路を設け、そのバイパス流路にマスフローコントローラにより流量制御されたエアを供給することによって希釈ユニットから粒子数計測装置に導かれる排出ガスの流量を調整するようにしている。 Further, in this particle number measurement system, a bypass channel is provided between the dilution unit and the particle number measurement device, and the number of particles is supplied from the dilution unit by supplying air whose flow rate is controlled by the mass flow controller to the bypass channel. The flow rate of the exhaust gas led to the measuring device is adjusted.
しかしながら、マスフローコントローラを用いているので、粒子数計測システムとして大きくなってしまうだけでなく、コスト増大の問題もある。 However, since the mass flow controller is used, not only the particle number measuring system becomes large, but also there is a problem of cost increase.
そこで本発明は、上記問題点を一挙に解決するためになされたものであり、粒子数計測システムの構成を簡単化及びコンパクト化するとともに、そのコストを削減することをその主たる所期課題とするものである。 Therefore, the present invention has been made to solve the above-mentioned problems all at once, and the main aim is to simplify and downsize the configuration of the particle number measurement system and to reduce its cost. Is.
すなわち本発明に係る粒子数計測システムは、エンジンの排出ガスを導入するための排出ガス導入ポートと、希釈ガスを導入するための希釈ガス導入ポートと、前記排出ガス導入ポートに一端が接続されたメイン流路と、前記希釈ガス導入ポートに一端が接続され、他端が前記メイン流路に接続された希釈ガス流路と、前記メイン流路及び前記希釈ガス流路との接続点又はその下流近傍に設けた希釈器と、前記希釈ガス流路に設けられ、前記希釈器に導入される希釈ガスの流量を制御する希釈ガス流量制御部と、前記希釈器の下流にバルブを介して設けられ、希釈された排出ガス中の固体粒子数を計測するものであって、定流量機能を有する粒子数計測装置と、前記メイン流路における前記希釈器及び前記粒子数計測装置の間から分岐して設けられ、定流量器及びバルブが設けられたバイパス流路と、前記メイン流路及び前記バイパス流路の合流点下流に接続され、前記メイン流路及び前記バイパス流路に排出ガスを導入するための吸引ポンプと、前記希釈ガス流量制御部により制御される希釈ガス流量と、前記粒子数計測装置を流れる流量である装置流量と、前記バイパス流路上の定流量器の設定流量とを受け付けて、前記希釈ガス流量と前記装置流量及び前記設定流量の合計流量とから排出ガスの希釈率を算出する情報処理装置と、を備えることを特徴とする。
That is, in the particle number measurement system according to the present invention, one end is connected to the exhaust gas introduction port for introducing the exhaust gas of the engine, the dilution gas introduction port for introducing the dilution gas, and the exhaust gas introduction port. One end connected to the main flow path, the dilution gas introduction port, the other end connected to the main flow path, and a connection point between the main flow path and the dilution gas flow path, or downstream thereof A diluter provided in the vicinity, a diluting gas flow rate controller provided in the diluting gas flow path for controlling the flow rate of the diluting gas introduced into the diluter, and provided downstream of the diluter via a valve. , Measuring the number of solid particles in the diluted exhaust gas, and branching between the particle number measuring device having a constant flow rate function and the diluter and the particle number measuring device in the main flow path Setting A bypass passage provided with a constant flow device and a valve, and connected to a downstream of a junction of the main passage and the bypass passage, for introducing exhaust gas into the main passage and the bypass passage. Receiving a suction pump, a dilution gas flow rate controlled by the dilution gas flow rate control unit, a device flow rate that is a flow rate that flows through the particle number measurement device, and a set flow rate of a constant flow device on the bypass flow path , And an information processing device for calculating a dilution rate of the exhaust gas from the dilution gas flow rate and the total flow rate of the device flow rate and the set flow rate .
このようなものであれば、希釈ガス流量制御部により制御される希釈ガス流量と、粒子数計測装置の装置流量及びバイパス流路上の定流量器の設定流量の合計流量と、から排出ガスの希釈率を算出するようにしているので、従来希釈ユニットに流入する排出ガスの流量を測定していた流量測定機構を不要とすることができ、システム構成を簡単化及びコンパクト化することができるとともに、コストダウンを可能にすることができる。また、従来、粒子数計測装置が設けられた流路及びバイパス流路毎に設けていた吸引ポンプを共通化させているので、これによってもシステム構成を簡単化及びコンパクト化することができ、システムのコストダウンを可能にすることができる。 If this is the case, the dilution gas flow rate is controlled by the dilution gas flow rate control unit, the total flow rate of the device flow rate of the particle number measuring device and the constant flow rate device on the bypass flow path, and dilution of the exhaust gas. Since the rate is calculated, the flow rate measuring mechanism that has conventionally measured the flow rate of the exhaust gas flowing into the dilution unit can be eliminated, the system configuration can be simplified and made compact, Cost can be reduced. In addition, since the suction pump that has been provided for each of the flow path and the bypass flow path in which the particle number measuring device is conventionally used is made common, the system configuration can be simplified and made compact by this, too. The cost can be reduced.
バイパス流路上の定流量器がシステムに組み込んだ状態（初期）の設定流量と異なることがあり、これによる希釈比率の変動を防止するためには、前記情報処理装置が、前記粒子数計測装置の上流に設けたバルブを閉じ、前記バイパス流路に設けたバルブを開けて、前記希釈ガス流量制御部により制御された流量を前記バイパス流路上に流すことによって前記バイパス流路上の定流量器の設定流量を校正することが望ましい。 The constant flow device on the bypass flow path may be different from the set flow rate in the state (initial) incorporated in the system, and in order to prevent the fluctuation of the dilution ratio due to this, the information processing device is connected to the particle number measuring device. Setting the constant flow device on the bypass flow path by closing the valve provided upstream, opening the valve provided in the bypass flow path, and allowing the flow rate controlled by the dilution gas flow rate control unit to flow on the bypass flow path It is desirable to calibrate the flow rate.
同様に、前記情報処理装置が、前記バイパス流路に設けたバルブを閉じ、前記粒子数計測装置の上流に設けたバルブを開けて、前記希釈ガス流量制御部により制御された流量を前記メイン流路に流すことによって前記粒子数計測装置の装置流量を校正することが望ましい。 Similarly, the information processing device closes a valve provided in the bypass flow channel and opens a valve provided upstream of the particle number measuring device, so that the flow rate controlled by the dilution gas flow rate control unit is the main flow rate. It is desirable to calibrate the apparatus flow rate of the particle number measuring apparatus by flowing it through a path.
上記のように定流量器の設定流量を校正したとしても、校正時における流路内の温度及び圧力と粒子測定時における流路内の温度及び圧力が異なることから、定流量器を流れる流量が変動してしまう。この問題を解決するためには、前記情報処理装置が、前記バイパス流路上の定流量器の校正時におけるその定流量器上流近傍の温度及び圧力と、粒子数測定時における前記バイパス流路上の定流量器上流近傍の温度及び圧力とをパラメータとして、前記バイパス流路上の定流量器の設定流量を補正することが望ましい。 Even if the set flow rate of the constant flow device is calibrated as described above, the flow rate through the constant flow device is different because the temperature and pressure in the flow channel at the time of calibration are different from the temperature and pressure in the flow channel at the time of particle measurement. It will fluctuate. In order to solve this problem, the information processing apparatus has a temperature and pressure in the vicinity of the upstream of the constant flow device at the time of calibration of the constant flow device on the bypass flow channel, and a constant on the bypass flow channel at the time of particle number measurement. It is desirable to correct the set flow rate of the constant flow device on the bypass flow path using the temperature and pressure near the upstream of the flow device as parameters.
同様にして、前記情報処理装置が、前記粒子数計測装置の装置流量の校正時におけるその粒子数計測装置上流近傍の温度及び圧力と、粒子数測定時における前記粒子数計測装置上流近傍の温度及び圧力とをパラメータとして、前記粒子数計測装置の装置流量を補正することが望ましい。 Similarly, the information processing device has a temperature and pressure in the vicinity of the upstream of the particle number measurement device at the time of calibration of the device flow rate of the particle number measurement device, and a temperature and pressure in the vicinity of the upstream of the particle number measurement device at the time of particle number measurement. It is desirable to correct the apparatus flow rate of the particle number measuring apparatus using pressure as a parameter.
このように構成した本発明によれば、粒子数計測システムの構成を簡単化及びコンパクト化するとともに、そのコストを削減することができる。 According to the present invention configured as described above, the configuration of the particle number measuring system can be simplified and made compact, and the cost can be reduced.
以下に本発明に係る粒子数計測システムの一実施形態について図面を参照して説明する。 An embodiment of a particle number measuring system according to the present invention will be described below with reference to the drawings.
本実施形態に係る粒子数計測システム１００は、排出ガス導入ポートＰＴ１から内部に設けたメイン流路ＭＬにエンジンの排出ガスを導いて、それに希釈や気化等を施した後、メイン流路ＭＬに設けた粒子数計測装置２で前記排出ガス中の固体粒子であるＰＭを測定するものである。 In the particle number measurement system 100 according to the present embodiment, the exhaust gas of the engine is guided from the exhaust gas introduction port PT1 to the main flow path ML provided therein, and diluted, vaporized, and the like, and then is supplied to the main flow path ML. The PM, which is a solid particle in the exhaust gas, is measured by the provided particle number measuring device 2.
前記排出ガス導入ポートＰＴ１は、図示しないエンジンからの排気ラインに接続されており、この排出ガス導入ポートＰＴ１に、例えばエンジンからの直接の排出ガスもしくは全流希釈トンネルや分流希釈トンネルで希釈された排出ガスが導かれるように構成している。なお、以下で排出ガスというときは、上述したような希釈された排出ガスも含む意味で用いることとする。 The exhaust gas introduction port PT1 is connected to an exhaust line from an engine (not shown). The exhaust gas introduction port PT1 is diluted with, for example, a direct exhaust gas from the engine or a full-flow dilution tunnel or a diversion dilution tunnel. The exhaust gas is guided. In the following description, the exhaust gas is used to include the diluted exhaust gas as described above.
この排出ガス導入ポートＰＴ１から開閉バルブＶ１を介して内部に導入された排出ガスは、一部は第１バイパス路ＢＬ１から排出され、その残りが、直列に設けた複数段（本実施形態では２段）の希釈器ＰＮＤ１、ＰＮＤ２に導かれて希釈ガスであるエアによって希釈される。 Part of the exhaust gas introduced into the interior from the exhaust gas introduction port PT1 via the opening / closing valve V1 is exhausted from the first bypass passage BL1, and the remainder is a plurality of stages provided in series (2 in this embodiment). Stage) diluters PND1 and PND2, and are diluted by air as a dilution gas.
なお、エアは、希釈ガス導入ポートＰＴ２からレギュレータＲＥＧを介して複数の希釈ガス流路ＤＬ１〜ＤＬ３を経て、メイン流路ＭＬの各所又は第２バイパス流路ＢＬ２に供給される。 Note that air is supplied from the dilution gas introduction port PT2 to the various locations of the main flow path ML or the second bypass flow path BL2 via the regulator REG and the plurality of dilution gas flow paths DL1 to DL3.
また、第１バイパス流路ＢＬ１は、後述する粒子数計測装置２の下流においてメイン流路ＭＬと合流しており、開閉バルブＶ２、及びバイパス流路ＢＬ１を流れる流量を一定に保つ、クリティカルオリフィス等の定流量器ＣＦＯ１がこの順で設けられている。さらに、メイン流路ＭＬ及びバイパス流路（第１バイパス流路ＢＬ１の他、後述するその他のバイパス流路ＢＬ２、ＢＬ３も含む。）の合流点下流には、メイン流路ＭＬ及びバイパス流路ＢＬ１〜ＢＬ３を負圧にして排出ガスを導入するための吸引ポンプＰが接続されている。また、吸引ポンプＰの上流側近傍には、吸引ポンプＰの吸引力の変動を平滑化するためのバッファチャンバＢＣが設けられている。 The first bypass flow path BL1 merges with the main flow path ML downstream of the particle number measuring apparatus 2 described later, and maintains a constant flow rate through the opening / closing valve V2 and the bypass flow path BL1, etc. Constant flow device CFO1 is provided in this order. Furthermore, the main channel ML and the bypass channel BL1 are arranged downstream of the junction of the main channel ML and the bypass channel (including the first bypass channel BL1 and other bypass channels BL2 and BL3 described later). A suction pump P is connected for introducing exhaust gas under a negative pressure of BL3. A buffer chamber BC for smoothing fluctuations in the suction force of the suction pump P is provided in the vicinity of the upstream side of the suction pump P.
第１希釈器ＰＮＤ１は、メイン流路ＭＬと希釈ガス流路ＤＬとの接続点又はその下流近傍に設けられており、第１希釈器ＰＮＤ１に導入された排出ガスを加熱するとともにその排出ガスを希釈するものである。 The first diluter PND1 is provided at a connection point between the main flow path ML and the diluting gas flow path DL or in the vicinity of the downstream thereof, and heats the exhaust gas introduced into the first diluter PND1 and transmits the exhaust gas. To dilute.
この第１希釈器ＰＮＤ１に導入される被希釈ガスである排出ガスは、その質量流量が第１希釈器ＰＮＤ１の上流、より具体的には接続点上流に設けられた流量測定機構３により測定されている。 The exhaust gas that is the gas to be diluted introduced into the first diluter PND1 is measured by the flow rate measuring mechanism 3 provided upstream of the first diluter PND1, more specifically, upstream of the connection point. ing.
この流量測定機構３は、流体抵抗となるオリフィス部３１と、そのオリフィス部３１の差圧を測定する圧力センサ３２と、上流側の絶対圧を測定する圧力センサ３３と、流体の温度を調整する温調器３４とを備えており、オリフィス部３１の上下流の圧力情報及び温調器３４からの温度情報に基づいて、別に設けた情報処理装置４（特に図２参照）が、第１希釈器ＰＮＤ１に導入される排出ガスの質量流量を算出できるように構成されている。情報処理装置４は、ＣＰＵ、メモリ、入力手段、ディスプレイ等を備え、メモリに格納した所定プログラムにしたがってＣＰＵや周辺機器が協働して動作する汎用乃至専用のいわゆるコンピュータである。 The flow rate measuring mechanism 3 adjusts the temperature of the fluid, the orifice part 31 that becomes a fluid resistance, the pressure sensor 32 that measures the differential pressure of the orifice part 31, the pressure sensor 33 that measures the absolute pressure on the upstream side, and the fluid temperature. The temperature controller 34 is provided, and based on the pressure information on the upstream and downstream of the orifice portion 31 and the temperature information from the temperature controller 34, the information processing device 4 (see FIG. 2 in particular) provided separately performs the first dilution. The mass flow rate of the exhaust gas introduced into the container PND1 can be calculated. The information processing apparatus 4 includes a CPU, a memory, an input unit, a display, and the like, and is a general-purpose or dedicated so-called computer in which the CPU and peripheral devices operate in cooperation according to a predetermined program stored in the memory.
また、第１希釈器ＰＮＤ１に導入される希釈ガスは、希釈ガス流路ＤＬ１上に設けられた希釈ガス流量制御部ＭＦＣ１によりその質量流量が制御されている。この希釈ガス流量制御部ＭＦＣ１は、前記情報処理装置４から目標流量データを与えられると、内部に設けた流量センサ（図示しない）で測定される実流量が、目標流量データの値（以下、目標流量とも言う）となるように、内部のバルブ（図示しない）を調整してローカルで流量制御するものである。この目標流量は、前記情報処理装置４によって、希釈比率から算出される。 Further, the mass flow rate of the dilution gas introduced into the first diluter PND1 is controlled by the dilution gas flow rate control unit MFC1 provided on the dilution gas flow path DL1. When the dilution gas flow rate control unit MFC1 is provided with the target flow rate data from the information processing device 4, the actual flow rate measured by a flow sensor (not shown) provided therein is the value of the target flow rate data (hereinafter referred to as target flow rate data). The flow rate is controlled locally by adjusting an internal valve (not shown) so that the flow rate is also referred to. This target flow rate is calculated from the dilution ratio by the information processing device 4.
また、第１希釈器ＰＮＤ１の下流には、揮発性粒子を気化させるための蒸発器ＥＵが設けられるとともに、第１希釈器ＰＮＤ１及び蒸発器ＥＵの間から分岐して、粒子数計測装置２の下流においてメイン流路ＭＬに合流する第２バイパス流路ＢＬ２が設けられている。なお、蒸発器ＥＵは、３００〜４００度に加熱されている。 Further, an evaporator EU for vaporizing volatile particles is provided downstream of the first diluter PND1, and branches from between the first diluter PND1 and the evaporator EU, so that the particle number measuring device 2 A second bypass flow path BL2 that joins the main flow path ML is provided downstream. The evaporator EU is heated to 300 to 400 degrees.
第２バイパス流路ＢＬ２には、希釈ガス流量制御部ＭＦＣ２が設けられた希釈ガス流路ＤＬ２が接続されている。またバイパス流路ＢＬ２には、開閉バルブＶ３、及び第２バイパス流路ＢＬ２を流れる流量を一定に保つ、クリティカルオリフィス等の定流量器ＣＦＯ２が設けられている。このような構成により、希釈ガス流量制御部ＭＦＣ２が情報処理装置４によって制御されることにより、第２バイパス流路ＢＬ２に流入する希釈ガスが調整され、その結果、メイン流路ＭＬから第２バイパス流路ＢＬ２に流入する排出ガスの質量流量を調節する。 A dilution gas flow path DL2 provided with a dilution gas flow rate control unit MFC2 is connected to the second bypass flow path BL2. In addition, the bypass flow path BL2 is provided with a switching flow valve C3 and a constant flow device CFO2 such as a critical orifice that keeps the flow rate flowing through the second bypass flow path BL2 constant. With such a configuration, the dilution gas flow rate control unit MFC2 is controlled by the information processing device 4 to adjust the dilution gas flowing into the second bypass flow path BL2, and as a result, the second bypass flow from the main flow path ML. The mass flow rate of the exhaust gas flowing into the flow path BL2 is adjusted.
第２希釈器ＰＮＤ２は、メイン流路ＭＬと希釈ガス流路ＤＬ３との接続点又はその下流近傍に設けられており、第２希釈器ＰＮＤ２に導入される排出ガスを冷却するとともにその排出ガスを希釈するものである。 The second diluter PND2 is provided at a connection point between the main flow path ML and the diluting gas flow path DL3 or in the vicinity of the downstream thereof, and cools the exhaust gas introduced into the second diluter PND2 and sends the exhaust gas to the second diluter PND2. To dilute.
第２希釈器ＰＮＤ２に導入される希釈ガスは、希釈ガス流路ＤＬ３に設けられた希釈ガス流量制御部ＭＦＣ３によりその質量流量が制御されている。この希釈ガス流量制御部ＭＦＣ３は、前記希釈ガス流量制御部ＭＦＣ１と同様に、前記情報処理装置４から目標流量データを与えられると、内部に設けた流量センサ（図示しない）で測定される実流量が、目標流量データの値（以下、目標流量とも言う）となるように、内部のバルブ（図示しない）を調整してローカルで流量制御するものである。この目標流量は、前記情報処理装置４によって、希釈比率から算出される。 The dilution gas introduced into the second diluter PND2 has its mass flow rate controlled by a dilution gas flow rate control unit MFC3 provided in the dilution gas flow path DL3. The dilution gas flow rate control unit MFC3, like the dilution gas flow rate control unit MFC1, receives the target flow rate data from the information processing device 4, and is measured by a flow sensor (not shown) provided therein. However, the flow rate is controlled locally by adjusting an internal valve (not shown) so that the value of the target flow rate data (hereinafter also referred to as a target flow rate) is obtained. This target flow rate is calculated from the dilution ratio by the information processing device 4.
このような構成において、第１希釈器ＰＮＤ１及びその近傍から第２希釈器ＰＮＤ２に至る配管を図示しないヒータ等の加熱手段を有する温度調節器により、例えば１５０度以上に加熱されている。これにより、配管内壁へのＰＭの付着や凝集等を防止して、計数誤差を抑制している。 In such a configuration, the pipe from the first diluter PND1 and the vicinity thereof to the second diluter PND2 is heated to, for example, 150 degrees or more by a temperature controller having a heating unit such as a heater (not shown). This prevents PM from adhering or agglomerating on the inner wall of the pipe, thereby suppressing counting errors.
また、第２希釈器ＰＮＤ２の下流には、第１希釈器ＰＮＤ１及び第２希釈器ＰＮＤ２により希釈された排出ガス中の固体粒子数を計測する粒子数計測装置２が開閉バルブＶ５を介して設けられるとともに、第２希釈器ＰＮＤ２及び粒子数計測装置２の間、具体的には開閉バルブＶ５上流から分岐して、粒子数計測装置２の下流においてメイン流路ＭＬと合流する第３バイパス流路ＢＬ３が設けられている。 Further, downstream of the second diluter PND2, a particle number measuring device 2 for measuring the number of solid particles in the exhaust gas diluted by the first diluter PND1 and the second diluter PND2 is provided via an open / close valve V5. And a third bypass channel that branches from the second diluter PND2 and the particle number measuring device 2, specifically from the upstream side of the open / close valve V5, and merges with the main channel ML downstream of the particle number measuring device 2. BL3 is provided.
このバイパス流路ＢＬ３には、バイパス流路ＢＬ３を流れる流量を一定に保つ、クリティカルオリフィス等の定流量器ＣＦＯ３、及び開閉バルブＶ４がこの順で設けられている。なお、開閉バルブＶ５及び粒子数計測装置３の間には、開閉バルブＶ６及びフィルタをこの順で設けた大気開放通路ＡＬが形成されており、吸引ポンプＰの停止時などに開閉バルブＶ５が閉じられる際に、開閉バルブＶ６を開けて粒子数計測装置２内を大気開放させる。 The bypass channel BL3 is provided with a constant flow rate device CFO3 such as a critical orifice and an on-off valve V4 in this order, which keep the flow rate flowing through the bypass channel BL3 constant. An open air passage AL having an open / close valve V6 and a filter in this order is formed between the open / close valve V5 and the particle number measuring device 3, and the open / close valve V5 is closed when the suction pump P is stopped. When opened, the open / close valve V6 is opened to open the particle number measuring device 2 to the atmosphere.
粒子数計測装置２は、アルコールやブタノールなどの有機ガスを過飽和状態で混入させて排出ガス中のＰＭに付着させることにより、このＰＭを大きな径に成長させ、成長したＰＭをスリットから排出して、出てきた粒子にレーザ光にて計数するものである。この粒子数計測装置２は、成長したＰＭをスリットから排出するように構成していることから、そのスリットが定流量器としての機能を有し、粒子測定装置２には一定流量の排出ガスが流れることになる。 The particle number measuring apparatus 2 mixes organic gas such as alcohol or butanol in a supersaturated state and adheres to the PM in the exhaust gas, thereby growing the PM to a large diameter, and discharging the grown PM from the slit. The particles that come out are counted with a laser beam. Since this particle number measuring device 2 is configured to discharge the grown PM from the slit, the slit has a function as a constant flow device, and the particle measuring device 2 has an exhaust gas at a constant flow rate. Will flow.
このような構成により、２段の希釈器ＰＮＤ１、ＰＮＤ２で希釈された排出ガスの一部が粒子数計測装置２に導かれ、その排出ガスに含まれる固体粒子数が計数される。そして、粒子数計測装置２で測定された計数データは、前記情報処理装置４に出力されて適宜処理される。 With such a configuration, part of the exhaust gas diluted by the two-stage diluters PND1 and PND2 is guided to the particle number measuring device 2, and the number of solid particles contained in the exhaust gas is counted. Then, the count data measured by the particle number measuring device 2 is output to the information processing device 4 and appropriately processed.
しかして、本実施形態の情報処理装置４は、希釈ガス流量制御部ＭＦＣ３により制御される希釈ガス流量Ｑ１と、粒子数計測装置２を流れる流量である装置流量Ｑ２及び第３バイパス流路ＢＬ３上の定流量器ＣＦＯ３の設定流量Ｑ３の合計流量Ｑ２＋Ｑ３と、から排出ガスの希釈比率を算出する。具体的に情報処理装置４は、希釈比率を（Ｑ２＋Ｑ３）／（Ｑ２＋Ｑ３−Ｑ１）により算出する。このように構成することによって、第２希釈器ＰＮＤ２に導入される排出ガスの質量流量を測定する流量測定機構を不要としている。 Thus, the information processing apparatus 4 of this embodiment includes a dilution gas flow rate Q 1 that is controlled by the dilution gas flow rate control unit MFC3, device flow rate Q 2 and a third bypass passage is a flow through the particle number measuring apparatus 2 The dilution ratio of the exhaust gas is calculated from the total flow rate Q 2 + Q 3 of the set flow rate Q 3 of the constant flow device CFO 3 on BL 3 . Specifically, the information processing device 4 calculates the dilution ratio by (Q 2 + Q 3 ) / (Q 2 + Q 3 −Q 1 ). With this configuration, a flow rate measuring mechanism for measuring the mass flow rate of the exhaust gas introduced into the second diluter PND2 is not necessary.
また本実施形態の情報処理装置４は、粒子数計測装置２の上流に設けた開閉バルブＶ５を閉じ、第３バイパス流路ＢＬ３に設けた開閉バルブＶ４を開けて、希釈ガス流量制御部ＭＦＣ３により制御された流量Ｑ１を第３バイパス流路ＢＬ３上に流すことによって第３バイパス流路ＢＬ３上の定流量器ＣＦＯ３の設定流量を校正する。なお、この校正の際の定流量器ＣＦＯ３の上流近傍の圧力及び温度を圧力センサＰ１及び温度センサＴ１により測定し、情報処理装置４が、その測定データを校正データと関連付けて記憶する。 Further, the information processing apparatus 4 of the present embodiment closes the opening / closing valve V5 provided upstream of the particle number measuring apparatus 2 and opens the opening / closing valve V4 provided in the third bypass flow path BL3, and the dilution gas flow rate control unit MFC3 calibrating the third set flow rate of the constant flow apparatus CFO3 on bypass passage BL3 by flowing a controlled flow rate Q 1 on the third bypass passage BL3. The pressure and temperature in the vicinity of the upstream of the constant flow device CFO3 at the time of calibration are measured by the pressure sensor P1 and the temperature sensor T1, and the information processing apparatus 4 stores the measurement data in association with the calibration data.
一方、情報処理装置４は、第３バイパス流路ＢＬ３に設けた開閉バルブＶ４を閉じ、粒子数計測装置２の上流に設けた開閉バルブＶ５を開けて、希釈ガス流量制御部ＭＦＣ３により制御された流量Ｑ１をメイン流路ＭＬに流すことによって粒子数計測装置２の装置流量を校正する。なお、この校正の際の粒子数計測装置２の上流近傍の圧力及び温度を圧力センサＰ２及び温度センサＴ２により測定し、情報処理装置４が、その測定データを校正データと関連付けて記憶する。 On the other hand, the information processing device 4 is controlled by the dilution gas flow rate control unit MFC3 by closing the open / close valve V4 provided in the third bypass flow path BL3 and opening the open / close valve V5 provided upstream of the particle number measuring device 2. to calibrate the device flow rate of the particle number measuring device 2 by passing a flow Q 1 to the main flow path ML. The pressure and temperature in the vicinity of the upstream of the particle number measuring device 2 at the time of calibration are measured by the pressure sensor P2 and the temperature sensor T2, and the information processing device 4 stores the measurement data in association with the calibration data.
さらに本実施形態の情報処理装置４は、第３バイパス流路ＢＬ３上の定流量器ＣＦＯ３の校正時におけるその定流量器ＣＦＯ３上流近傍の温度及び圧力と、粒子数測定時における第３バイパス流路ＢＬ３上の定流量器ＣＦＯ３上流近傍の温度及び圧力とをパラメータとして、バイパス流路上の定流量器の設定流量を補正する（補正後の設定流量Ｑ３’）。さらに、情報処理装置４は、粒子数計測装置２の装置流量の校正時におけるその粒子数計測装置２上流近傍の温度及び圧力と、粒子数測定時における粒子数計測装置２上流近傍の温度及び圧力とをパラメータとして、粒子数計測装置２の装置流量を補正する（補正後の設定流量Ｑ２’）。そして、情報処理装置４は、この補正の結果得られた装置流量Ｑ２’及び設定流量Ｑ３’を用いて希釈比率を算出し、第２希釈器ＰＮＤ２での希釈比率が一定となるように希釈ガス流量制御部ＭＦＣ３に目標流量データを与える。 Furthermore, the information processing apparatus 4 of the present embodiment includes the temperature and pressure in the vicinity of the upstream of the constant flow device CFO3 at the time of calibration of the constant flow device CFO3 on the third bypass flow channel BL3, and the third bypass flow channel at the time of particle number measurement. The set flow rate of the constant flow device on the bypass flow path is corrected using the temperature and pressure near the upstream of the constant flow device CFO3 on BL3 as parameters (corrected set flow rate Q 3 ′). Furthermore, the information processing device 4 is configured to detect the temperature and pressure in the vicinity of the upstream of the particle number measuring device 2 at the time of calibration of the device flow rate of the particle number measuring device 2, and Is used as a parameter to correct the apparatus flow rate of the particle number measuring apparatus 2 (set flow rate Q 2 ′ after correction). Then, the information processing apparatus 4 calculates the dilution ratio using the apparatus flow rate Q 2 ′ and the set flow rate Q 3 ′ obtained as a result of the correction so that the dilution ratio in the second diluter PND2 becomes constant. Target flow rate data is given to the dilution gas flow rate control unit MFC3.
＜本実施形態の効果＞
このように構成した本実施形態に係る粒子数計測システム１００によれば、希釈ガス流量制御部ＭＦＣ３により制御される希釈ガス流量Ｑ１と、粒子数計測装置２の装置流量Ｑ２及びバイパス流路ＢＬ３上の定流量器ＣＦＯ３の設定流量Ｑ３の合計流量Ｑ２＋Ｑ３と、から排出ガスの希釈率を算出するようにしているので、従来第２希釈器ＰＮＤ２に流入する排出ガスの流量を測定していた流量測定機構を不要とすることができ、システム構成を簡単化及びコンパクト化することができるとともに、コストダウンを可能にすることができる。また、従来、粒子数計測装置２が設けられた流路ＭＬ及びバイパス流路ＢＬ毎に設けていた吸引ポンプを共通化させているので、これによってもシステム構成を簡単化及びコンパクト化することができ、システムのコストダウンを可能にすることができる。
<Effect of this embodiment>
According to the particle counting system 100 of the present embodiment configured as described above, and the dilution gas flow rate Q 1 that is controlled by the dilution gas flow rate control unit MFC3, device flow rate Q 2 and the bypass passage of the particle number measuring apparatus 2 Since the dilution rate of the exhaust gas is calculated from the total flow rate Q 2 + Q 3 of the set flow rate Q 3 of the constant flow device CFO3 on BL3, the flow rate of the exhaust gas flowing into the second diluter PND2 is conventionally determined. The flow rate measuring mechanism which has been measured can be eliminated, the system configuration can be simplified and made compact, and the cost can be reduced. In addition, since the suction pump provided for each of the flow channel ML and the bypass flow channel BL provided with the particle number measuring device 2 is commonly used, the system configuration can be simplified and made compact in this way. The cost of the system can be reduced.
なお、本発明は前記実施形態に限られるものではない。 The present invention is not limited to the above embodiment.
例えば、前記実施形態では、粒子数計測装置２の内部に設けられた定流量器（ＣＦＯ）が温調されていない場合を想定しており、粒子数計測装置２の装置流量を、この粒子数計測装置２の上流近傍の圧力及び温度を用いて校正している。一方、粒子数計数装置２内部に設けられた定流量器（ＣＦＯ）が温調されている場合には、粒子数計測装置２の装置流量は、粒子数計測装置２の上流近傍の圧力を用いて校正すれば良く、その上流近傍の温度を用いて校正する必要はない。 For example, in the said embodiment, the case where the constant flow device (CFO) provided inside the particle number measuring device 2 is not temperature-controlled is assumed, and the device flow rate of the particle number measuring device 2 is set to the number of particles. Calibration is performed using the pressure and temperature in the vicinity of the upstream side of the measuring device 2. On the other hand, when the constant flow rate device (CFO) provided inside the particle number counting device 2 is temperature-controlled, the device flow rate of the particle number measuring device 2 uses the pressure near the upstream of the particle number measuring device 2. It is not necessary to calibrate using the temperature near the upstream.
また、前記実施形態では、第３バイパス流路ＢＬ３上の定流量器ＣＦＯ３の上流近傍に圧力センサＰ１及び温度センサＴ１を設け、メイン流路ＭＬの粒子数計測装置の上流近傍に圧力センサＰ１及び温度センサＴ１を設けているが、それら圧力センサ及び温度センサを共通としても良い。具体的には、メイン流路ＭＬと第３バイパス流路ＢＬ３との分岐点上流近傍に共通の圧力センサ及び温度センサを設けても良い。 In the embodiment, the pressure sensor P1 and the temperature sensor T1 are provided in the vicinity of the upstream of the constant flow rate device CFO3 on the third bypass flow path BL3, and the pressure sensor P1 and the temperature sensor T1 in the vicinity of the upstream of the particle number measuring device in the main flow path ML. Although the temperature sensor T1 is provided, the pressure sensor and the temperature sensor may be shared. Specifically, a common pressure sensor and temperature sensor may be provided in the vicinity of the branch point upstream of the main channel ML and the third bypass channel BL3.
その他、本発明は前記実施形態に限られず、その趣旨を逸脱しない範囲で種々の変形が可能であるのは言うまでもない。 In addition, it goes without saying that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention.
１００ ・・・粒子数計測システム
ＰＴ１ ・・・排出ガス導入ポート
ＰＴ２ ・・・希釈ガス導入ポート
ＭＬ ・・・メイン流路
ＤＬ ・・・希釈ガス流路
ＰＮＤ ・・・希釈器
ＭＦＣ ・・・希釈ガス流量制御部
Ｖ５ ・・・バルブ
２ ・・・粒子数計測装置
ＣＦＯ３・・・定流量器
Ｖ４ ・・・バルブ
ＢＬ ・・・バイパス流路
Ｐ ・・・吸引ポンプ
４ ・・・情報処理装置
100 ... Particle number measurement system PT1 ... Exhaust gas introduction port PT2 ... Dilution gas introduction port ML ... Main flow path DL ... Dilution gas flow path PND ... Diluter MFC ... Dilution Gas flow rate controller V5 ... Valve 2 ... Particle number measuring device CFO3 ... Constant flow rate device V4 ... Valve BL ... Bypass flow path P ... Suction pump 4 ... Information processing device
Claims (5)
希釈ガスを導入するための希釈ガス導入ポートと、
前記排出ガス導入ポートに一端が接続されたメイン流路と、
前記希釈ガス導入ポートに一端が接続され、他端が前記メイン流路に接続された希釈ガス流路と、
前記メイン流路及び前記希釈ガス流路との接続点又はその下流近傍に設けた希釈器と、
前記希釈ガス流路に設けられ、前記希釈器に導入される希釈ガスの流量を制御する希釈ガス流量制御部と、
前記希釈器の下流にバルブを介して設けられ、希釈された排出ガス中の固体粒子数を計測するものであって、定流量機能を有する粒子数計測装置と、
前記メイン流路における前記希釈器及び前記粒子数計測装置の間から分岐して設けられ、定流量器及びバルブが設けられたバイパス流路と、
前記メイン流路及び前記バイパス流路の合流点下流に接続され、前記メイン流路及び前記バイパス流路に排出ガスを導入するための吸引ポンプと、
前記希釈ガス流量制御部により制御される希釈ガス流量と、前記粒子数計測装置を流れる流量である装置流量と、前記バイパス流路上の定流量器の設定流量とを受け付けて、前記希釈ガス流量と前記装置流量及び前記設定流量の合計流量とから排出ガスの希釈率を算出する情報処理装置と、を備える粒子数計測システム。 An exhaust gas introduction port for introducing engine exhaust gas,
A dilution gas introduction port for introducing the dilution gas;
A main flow path having one end connected to the exhaust gas introduction port;
A dilution gas flow path having one end connected to the dilution gas introduction port and the other end connected to the main flow path;
A diluter provided at a connection point between the main flow path and the dilution gas flow path or in the vicinity thereof, and
A dilution gas flow rate control unit that is provided in the dilution gas flow path and controls the flow rate of the dilution gas introduced into the diluter;
A particle number measuring device that is provided downstream of the diluter and measures the number of solid particles in the diluted exhaust gas, and has a constant flow rate function;
A bypass channel provided with a constant flow device and a valve provided by branching from between the diluter and the particle number measuring device in the main channel;
A suction pump that is connected downstream of the confluence of the main flow path and the bypass flow path and introduces exhaust gas into the main flow path and the bypass flow path;
A dilution gas flow rate is controlled by the dilution gas flow rate control unit, and the unit flow rate is a flow rate through the particle counting device, accepts a set flow rate of the constant flow apparatus of the bypass flow path, and the dilution gas flow rate A particle number measurement system comprising: an information processing device that calculates a dilution rate of exhaust gas from the total flow rate of the device flow rate and the set flow rate .
The information processing device sets parameters of the temperature and pressure in the vicinity of the particle number measuring device upstream when the device flow rate of the particle number measuring device is calibrated, and the temperature and pressure in the vicinity of the particle number measuring device at the time of particle number measurement. The particle number measuring system according to claim 2, 3 or 4, wherein the apparatus flow rate of the particle number measuring apparatus is corrected.
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| AT509962B1 (en) | 2011-09-12 | 2015-05-15 | Avl List Gmbh | METHOD AND DEVICE FOR DETERMINING THE CONCENTRATION OF AEROSOLS IN HOT GASES, ESPECIALLY IN EXHAUST GASES FROM COMBUSTION ENGINES |
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| US20220229032A1 (en) * | 2019-07-22 | 2022-07-21 | Horiba, Ltd. | Exhaust gas analyzing device, gas supply method, and exhaust gas sampling device |
| CN115298531A (en) | 2020-03-26 | 2022-11-04 | 株式会社堀场制作所 | Diluter, analysis system and analysis method |
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