JP5473308B2 - Chemical supply device for flush toilet - Google Patents

Description

  The present invention relates to a chemical supply device for flush toilets.

  In general, flush toilets are treated with various chemicals for the purpose of disinfection, deodorization, washing, and the like. This chemical treatment method varies depending on the type of flush toilet, but for example, there is a method in which a chemical is directly put into a toilet bowl or a washing water storage tank, and a chemical is placed in a water supply part of the washing water storage tank. However, in such a method, there are various problems such as frequent and uneconomical drug exchange work, and these problems are particularly serious in public toilets with many uses.

Therefore, conventionally, a chemical supply device for flush toilets that automatically supplies a necessary amount of chemical solution for the purpose of disinfection, deodorization, washing, etc. to the flush toilet every time flush water flows into the flush toilet (particularly a urinal). Is known (see Patent Document 1 and Patent Document 2).
Japanese Patent Publication No.49-21541 JP 2003-96873 A

  The above-mentioned chemical supply device for flush toilets is provided with a branch pipe branched from a wash water supply pipe for supplying wash water, and a part of the wash water flowing in the wash water supply pipe is taken from this branch pipe and mixed with the chemical liquid. However, when the pressure in the cleaning water supply pipe decreases near the end of the cleaning water supply, the cleaning water mixed with the chemical solution returns to the cleaning water supply pipe through the branch pipe again to each flush toilet. Supplied. At this time, in the conventional case, a chemical bottle is placed upside down in a case capable of storing a predetermined amount of liquid, and mixed with washing water so that the chemical liquid oozes out from the chemical bottle into the case little by little. In addition, the amount of cleaning water taken into the case is controlled by a valve mechanism disposed between the case and the branch pipe. Therefore, the concentration of the chemical solution mixed in the cleaning water depends on the amount of the chemical solution that oozes when the cleaning water is taken into the case. For this reason, when the flush toilet is used continuously, the time until the washing water is taken into the case after the chemical solution that has accumulated in the case first is mixed with the washing water and discharged once. There is a problem that the concentration of the chemical solution is not stable, for example, the amount of the chemical solution accumulated in the case is shorter than that of the previous time and the concentration of the chemical solution becomes lower. In addition, since the consumption of the chemical solution varies depending on the frequency of use of the flush toilet, the chemical solution may already be consumed during regular maintenance. In addition, in order to control the amount of washing water flowing into the case, a valve mechanism must be provided between the branch pipe and the case, and accordingly, the structure is complicated. A device for ensuring the correct operation of the mechanism is also required.

  The present invention has been made in view of the above, and it is possible to stabilize the concentration of the chemical solution contained in the wash water as compared with the prior art, and the structure is simpler than that of the prior art, and the arrangement space can be made more compact. It is an object of the present invention to provide a toilet bowl chemical supply apparatus. Moreover, this invention makes it a subject to provide the chemical | medical solution supply apparatus for flush toilets which can stabilize the consumption of a chemical | medical solution rather than the conventional apparatus irrespective of the usage frequency of a flush toilet.

In order to solve the above-mentioned problem, in the present invention according to claim 1, there is provided a chemical supply device for a flush toilet that supplies a chemical to wash water supplied to a flush toilet,
A washing water passage section connected to a washing water supply path leading to a discharge port for discharging the washing water into the flush toilet ;
A washing water intake chamber into which the washing water passing through the washing water passage section is taken in;
A first chemical chamber communicated with the washing water intake chamber;
A second chemical chamber communicated with the first chemical chamber;
A chemical supply mechanism for supplying a chemical to the second chemical chamber,
Wash water passing through the wash water passage is taken into the wash water intake chamber, compresses the gas in the wash water intake chamber, and is mixed with the chemical solution,
When the pressure of the washing water passing portion is lowered, the by expansion of the wash water uptake chamber gas, the washing water chemical is mixed, Ri configuration der extruded into the wash water passage section, and
The chemical supply mechanism is
A chemical solution storage unit for storing a chemical solution, which is communicated with the washing water intake chamber;
A nozzle that is attached to the chemical solution storage unit and faces the second chemical solution chamber and that can supply a predetermined amount of the chemical solution to the second chemical solution chamber is provided. A chemical supply device for flush toilets is provided.
In the present invention according to claim 2, the chemical solution storage portion of the chemical solution supply mechanism is disposed at an upper portion of the cleaning water intake chamber, and is communicated via a communication pipe that connects the cleaning water intake chamber and the chemical solution storage portion. And the second chemical solution chamber is provided in a positional relationship facing the lower end of the cylindrical portion, and the nozzle is provided at the lower end of the cylindrical portion. 2. The chemical supply device for a flushing machine according to claim 1, wherein the nozzle faces the second chemical solution chamber .
According to a third aspect of the present invention, the chemical liquid storage section of the chemical liquid supply mechanism is disposed outside the cleaning water intake chamber, and is communicated via a communication pipe that connects the cleaning water intake chamber and the chemical liquid storage section. A chemical solution supply device for a water washer according to claim 1 is provided.
In this invention of Claim 4, the chemical | medical solution storage part of the said chemical | medical solution supply mechanism is formed in the substantially cylindrical shape which has an opening part in the upper end vicinity, is arrange | positioned in the said washing water intake chamber, and is washed water through the said opening part. The chemical supply device for a flush toilet according to claim 1 , wherein the chemical supply device is in communication with an intake chamber .
In this invention of Claim 5, the said nozzle is 50 micrometers-0.5mm in internal diameter , The chemical solution supply apparatus for flush toilets of any one of Claims 1-4 is provided.
In this invention of Claim 6, the pressure adjustment unit which is interposed in the connection part of the said washing water passage part and the said washing water supply path, and raises the pressure of the washing water taken in into a washing water passage part from a washing water supply path is provided. Furthermore, the chemical | medical solution supply apparatus for flush toilets of any one of Claims 1-5 characterized by the above-mentioned is provided.

  The chemical supply device for a flush toilet according to the present invention comprises a flush water passage connected to a flush water supply path leading to a discharge port for discharging flush water into the flush toilet, and an intake port facing the flush water passage. The cleaning water passing through the cleaning water passage portion is taken in, and the cleaning water intake chamber is formed in a sealed manner except for the intake port, and the gas compressed in the cleaning water intake chamber expands By utilizing this, the cleaning water mixed with the chemical solution is pushed out to the cleaning water passage section. Unlike the prior art, there is no need to provide a valve mechanism between the washing water intake chamber and the washing water passage portion, and the structure is simple and a compact device can be obtained. For this reason, even if it is disposed in the middle of the washing water supply pipe constituting the washing water supply path, or it is mounted on the outer surface of the flush toilet (particularly the urinal) or the side wall, it is compact. Therefore, it does not get in the way, and furthermore, it is arranged in a small space for arranging piping systems provided within the thickness range of the upper and side walls of the flush toilet (particularly the urinal). It is also possible. Moreover, since it is the structure which returns to a wash water passage part using the pressure of the gas which raises by taking in wash water in a wash water intake chamber, an attachment position is provided in the upper part in a flush toilet (especially urinal). The position may be lower than the position where the washing water discharge port is formed, and the degree of freedom of the attachment position is high, and various types of flush toilets can be accommodated.

  In addition, the cleaning water intake chamber for taking in the cleaning water and the second chemical liquid chamber in which the chemical liquid having a high chemical concentration is not directly communicated with each other, but the first chemical liquid chamber is interposed therebetween. . In addition, the cleaning water taken in at the previous washing is not completely discharged to the washing water passage portion side but remains in a predetermined amount in the washing water intake chamber, and the first chemical chamber, Wash water has also infiltrated into the second chemical chamber. The chemical concentration of the residual liquid in which the cleaning water and the chemical liquid are mixed is highest in the residual liquid in the second chemical liquid chamber, and then becomes the residual liquid in the first chemical liquid chamber, and the residual liquid in the cleaning water intake chamber. Has the lowest concentration. Therefore, the newly introduced wash water mixes with these residual liquids by the stirring action when it flows in, but the first chemical chamber is interposed between the wash water intake chamber and the second chemical solution chamber. Therefore, a large amount of liquid with high chemical concentration in the second chemical chamber does not mix, and mainly the residual liquid in the washing water intake chamber and the liquid with low chemical concentration held in the first chemical chamber (low Concentration chemical). Thereby, the chemical | medical solution density | concentration of the washing water returned to the washing water passage part side becomes a substantially stable suitable density | concentration, without becoming high concentration. Moreover, even if it is used continuously, the liquid with high chemical concentration in the second chemical chamber (high concentration chemical solution) is not consumed at a stretch, and the chemical concentration in the wash water supplied to the flush toilet is relatively low. A stable concentration can be obtained.

  Further, when a mechanism equipped with a nozzle capable of supplying a predetermined amount of chemical solution to the second chemical solution chamber is used as the chemical solution supply mechanism, the consumption amount (consumption time) of the chemical solution almost flows out from the nozzle to the second chemical solution chamber. Therefore, it is possible to stabilize the replacement time of the chemical solution storage unit itself or the replenishment time of the chemical solution to the chemical solution storage unit, and to appropriately set the maintenance time.

  Furthermore, by adopting a configuration in which the chemical solution storage portion of the chemical solution supply mechanism and the cleaning water intake chamber are communicated, the internal pressures of both become equal, and the cleaning water can be prevented from flowing into the chemical solution storage portion side.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a longitudinal sectional view showing a schematic configuration of a flush toilet bowl chemical supply device 1 according to a first embodiment of the present invention. As shown in FIG. 1, the flush toilet bowl chemical supply device 1 of the present embodiment includes a flush water passage unit 10, a main body unit 20, and a chemical solution supply mechanism 30.

  The washing water passage part 10 is formed in a substantially L-shaped cross section including a vertical part 11 and a horizontal part 12, a washing water inlet 11 a is provided on the vertical part 11 side, and a washing water outlet 12 a is provided at an arbitrary position of the horizontal part 12. Is provided. The cleaning water inlet 11a and the cleaning water outlet 12a are connected to a cleaning water supply path for supplying cleaning water. The cleaning water supply path here refers to a path through which the cleaning water passes to a discharge port (not shown) provided for discharging the cleaning water into the flush toilet, that is, supplying the cleaning water. The flush water supply pipe 2 and one end is a connecting portion 3a connected to the flush water supply pipe 2, and the other end is a discharge port (not shown) provided for discharging flush water into the flush toilet. And a toilet pipe 3 disposed within the thickness range of the upper wall and side wall of the flush toilet (particularly a urinal). The cleaning water passage 10 may be connected to any position as long as it is in the cleaning water supply path. For example, the cleaning water supply pipe 2 is cut and interposed in the middle of the cleaning water supply pipe 2. Or can be interposed between the wash water supply pipe 2 and the connection part 3a of the toilet pipe 3. In the present embodiment, as shown in FIG. 1, the cleaning water inlet 11 a is connected to the cleaning water supply pipe 2, and the cleaning water outlet 12 a is connected to the connection portion 3 a of the toilet pipe 3.

  As shown in FIGS. 1 and 2, the main body portion 20 is configured to include a cleaning water intake chamber 21, a first chemical solution chamber 22, and a second chemical solution chamber 23. In the present embodiment, the washing water passage portion 10 is integrally provided adjacent to the main body portion 20, and the washing water intake chamber 21 is provided via the intake port 21 a formed in the partition wall 15 therebetween. Yes. The washing water intake chamber 21 forms a sealed space where the portion excluding the intake port 21a is substantially sealed, and the washing water flows into the sealed space.

  The first chemical chamber 22 communicates with the cleaning water intake chamber 21 via the first communication path 22a, and communicates with the second chemical liquid chamber 23 via the second communication path 23a. Therefore, the wash water taken into the wash water intake chamber 21 can flow (movable) into the chemical solution chambers 22 and 23 through these communication passages 22a and 23a, and the wash water mixed with the chemical solution is washed water. As the pressure on the passage 10 side decreases, the chemical solution chambers 22 and 23 can move from the chemical chambers 22 and 23 toward the cleaning water intake chamber 21 through the communication passages 22a and 23a.

  The second communication path 23a is opened at a predetermined height from the bottom surface of the second chemical chamber 23 (see FIG. 1). The second chemical solution chamber 23 is directly supplied with a chemical solution from a chemical solution supply mechanism 30 to be described later. Wash water flows through the chemical chamber 22 and the second communication passage 23a. Accordingly, only the chemical liquid is not always stored in the second chemical liquid chamber 23, and a liquid having a higher chemical concentration (high concentration chemical liquid) is stored as compared with the first chemical liquid chamber 22. Yes.

  The chemical solution supply mechanism 30 includes a chemical solution storage unit 31 provided above the second chemical solution chamber 23, a tube 32 extending from the chemical solution storage unit 31, and a nozzle 33 provided at the tip of the tube 32. Yes. The nozzle 33 faces the second chemical chamber 23. The preferred range of the nozzle 33 is different depending on the capacity of the chemical solution storage unit 31, the viscosity of the chemical solution, the length of the nozzle 33 itself, etc., but a thin cylindrical member made of metal or synthetic resin having an inner diameter of 50 μm to 0.5 mm is used. Used. The supply of the chemical liquid from the nozzle 33 to the second chemical liquid chamber 23 is performed when the cleaning water flows in and the cleaning water intake chamber 21 is at a high pressure, and the first chemical liquid chamber 22 and the second chemical liquid are supplied. Since the chemical liquid is pressed in the direction in which the chemical liquid does not flow out from the tip of the nozzle 33 through the chamber 23, it is difficult for the chemical liquid to flow out from the nozzle 33 only for a short time. However, there is almost no use at night, and even during the daytime, the washing water is flowing for several tens of seconds per hour because it is several tens of seconds. The effect is virtually negligible. That is, the outflow amount of the chemical solution from the nozzle 33 per day may be obtained in consideration of the inner diameter of the nozzle 33, the viscosity of the chemical solution, and the like without considering the time during which the cleaning water flows, which is a fluctuation factor. The consumption amount (consumption time) of the chemical solution filled in the portion 31 is almost stable regardless of the frequency of use of the flush toilet. For this reason, the maintenance interval for exchanging the chemical solution storage unit 31 or replenishing the chemical solution can also be stabilized.

  In the present embodiment, the water amount adjusting member 13 is provided in order to adjust the amount of water taken into the wash water intake chamber 21 from the horizontal portion 12 of the wash water passage portion 10 through the intake port 21a. In the present embodiment, as shown in FIG. 1, a part having an inclined surface 13 a inclined in the longitudinal direction and a columnar member whose inclination angle of the inclined surface 13 a is not constant in the circumferential direction is used. Yes. Accordingly, when the inclined surface 13a having a large inclination angle is rotated so as to be positioned below the intake port 21a, the amount of water in contact with the inclined surface 13a is relatively increased, so that the cleaning taken in from the intake port 21a is performed. While the amount of water increases, when the inclined surface 13a with a small inclination angle is rotated so as to be positioned below the intake port 21a, the amount of water that contacts the inclined surface 13a and goes into the intake port 21a decreases. The amount of washing water taken in from the intake port 21a decreases. Therefore, in this embodiment, the amount of water taken into the washing water intake chamber 21 can be easily adjusted simply by rotating the water amount adjusting member 13.

  According to this embodiment, when the wash water flowing through the wash water supply pipe 2 flows into the wash water passage 10, the wash water flows out from the wash water outlet 12 a into the toilet pipe 3, and from the discharge port of each flush toilet inside the flush toilet Discharged. At this time, part of the washing water passing through the washing water passage 10 is taken into the washing water intake chamber 21 from the intake port 21a. Since the washing water intake chamber 21 is a sealed space, when the washing water is taken in, the gas in the washing water intake chamber 21 is compressed. The amount of wash water taken up is proportional to the internal pressure of the wash water passage 10. When washing water is taken into the washing water intake chamber 21, a part of the taken washing water flows into the first chemical chamber 22 through the first communication path 22a, and further through the second communication path 23a. It slightly flows into the second chemical chamber 23 as well. Here, in the cleaning water intake chamber 21, the first chemical solution chamber 22, and the second chemical solution chamber 23, residual liquid from the previous cleaning remains. The chemical liquid concentration is the lowest in the residual liquid in the washing water intake chamber 21, the residual liquid in the first chemical liquid chamber 22 (low concentration chemical liquid) is higher than that, and the residual liquid in the second chemical liquid chamber 23 ( High concentration chemicals) are the highest. When the cleaning water flows in, it is mixed with the residual liquid having the lowest chemical concentration in the cleaning water intake chamber 21 by the stirring action, and also through the first communication path 22a, the first chemical chamber 22 is mixed. It mixes relatively well with the residual liquid (low concentration chemical). On the other hand, the amount mixed with the residual liquid (high concentration chemical liquid) in the second chemical liquid chamber 23 is small. The second communication path 23a is opened at a predetermined height from the bottom surface of the second chemical chamber 23, so that a predetermined amount of high-concentration chemical is continuously maintained. The chemical solution in 23 is not consumed every time the washing water flows.

  When the supply of the cleaning water is near the end, the internal pressure of the cleaning water supply pipe 2 and the cleaning water passage 10 decreases, so that the gas compressed in the cleaning water intake chamber 21 expands (restores), and the cleaning water The wash water that has been taken into the take-in chamber 21 and mixed with the residual liquid in the wash water take-in chamber 21 and the first chemical liquid chamber 22 as described above is pushed out to the wash water passage 10 and the toilet pipe 3 And supplied into the flush toilet through the discharge port. However, not all of the cleaning water taken into the cleaning water intake chamber 21 is pushed out to the cleaning water passage part 10, but a part of it remains. Normally, the first chemical liquid chamber 22 and the second chemical liquid chamber 23 are filled with the residual liquid, and when the chemical liquid is dropped into the second chemical liquid chamber 23 from the nozzle 33 of the chemical supply mechanism 30 described above. Accordingly, the high concentration chemical solution in the second chemical solution chamber 23 moves into the first chemical solution chamber 22. Further, the low-concentration chemical solution in the first chemical solution chamber 22 moves into the cleaning water intake chamber 21 and is further diluted with the liquid remaining in the cleaning water intake chamber 21 and remains. When the flush toilet is used continuously, the above-described operation is repeated, and the newly flowing wash water does not mix directly with the high-concentration chemical solution in the second chemical solution chamber 23 and mainly takes in the wash water. Since the residual liquid in the chamber 21 and the residual liquid in the first chemical liquid chamber 22 (low concentration chemical liquid) are mixed, cleaning water having a stable chemical concentration can be supplied regardless of the frequency of use.

  3 and 4 are views showing the second and third embodiments of the present invention. In the case of the first embodiment, the chemical solution storage unit 31 of the chemical solution supply mechanism 30 is formed open to the atmosphere, although not shown in FIG. For this reason, when washing water is taken into the sealed washing water intake chamber 21, the inside of the washing water intake chamber 21 becomes higher than atmospheric pressure, and the tube 32 connected to the chemical solution storage unit 31 via the nozzle 33 is connected to the tube 32. There is a possibility that the washing water flows in and further flows back into the chemical solution storage unit 31. The second and third embodiments are characterized by including a device for eliminating such inconvenience. That is, in the flush toilet bowl chemical supply devices 200 and 300 according to the second and third embodiments, the chemical solution storage portions 231 and 331 of the chemical solution supply mechanisms 230 and 330 and the cleaning water intake chambers 221 and 321 communicate with each other. The internal pressure is balanced.

  First, in the second embodiment of FIG. 3, the chemical solution storage unit 231 is disposed in the cleaning water intake chamber 221 and the vicinity of the upper end of the chemical solution storage unit 231 is opened. In this embodiment, the chemical | medical solution storage part 231 formed in the substantially cylinder shape provided with the opening part 231a in the upper end surface is used. As a result, the internal pressures of the cleaning water intake chamber 221 and the chemical solution storage unit 231 become equal through the opening 231a.

  In the state where the cleaning water is not flowing, the chemical liquid is supplied via the nozzle 233 to the second chemical liquid due to the height difference between the liquid level of the chemical liquid in the chemical liquid storage portion 231 and the bottom wall portion 221a of the cleaning water intake chamber 221. Since it is dropped into the chamber 223, a high-concentration chemical solution is stored. When the cleaning water flows and the cleaning water flows into the cleaning water intake chamber 221, the gas in the sealed cleaning water intake chamber 221 is compressed to increase the internal pressure, and the inside of the chemical solution storage unit 231 is opened via the opening 231a. The pressure increases. This prevents the cleaning water from flowing into the chemical solution storage unit 231 through the nozzle 233. Further, the wash water taken into the wash water taking-in chamber 221 flows into the first chemical chamber 222 through the first communication path 222a. Similarly to the above embodiment, the first chemical solution chamber 222 stores a chemical solution having a lower concentration than the high concentration chemical solution remaining in the second chemical solution chamber 223 remaining in the previous cleaning, and a cleaning water intake chamber. Liquid having a lower chemical concentration is accumulated in 221, and the wash water that has flowed in mainly mixes the liquid in the wash water intake chamber 221 and the low concentration chemical in the first chemical chamber 222. On the other hand, when the supply of the cleaning water is near the end, the internal pressure of the cleaning water passage portion 210 decreases, so that the gas compressed in the cleaning water intake chamber 221 expands and is taken into the cleaning water intake chamber 221. The cleaning water mixed mainly with the residual liquid in the cleaning water intake chamber 221 and the residual liquid (low concentration chemical liquid) in the first chemical liquid chamber 222 is pushed out to the cleaning water passage section 210 and supplied into the flush toilet. Is done. Other configurations and operations are the same as those of the first embodiment, but the present embodiment has an advantage that the washing water can be prevented from flowing into the chemical solution storage portion 231 side.

  In the third embodiment of FIG. 4, the chemical solution storage portion 331 is disposed outside the washing water intake chamber 321, while the upper wall portions of both are connected by a communication pipe 340. Accordingly, in this embodiment as well, as in the third embodiment, the internal pressures of the chemical solution storage unit 331 and the cleaning water intake chamber 321 are equalized via the communication pipe 340, and the cleaning water flows into the chemical solution storage unit 331 side. Can be prevented. In FIG. 4, a nozzle 333 is provided on the bottom wall of the chemical solution storage portion 331, and first and second chemical solution chambers 322 and 323 are provided in lower chambers through the bottom wall. The second chemical chamber 323 is provided directly below the nozzle 333 and has a cylindrical shape with an upper surface opening, and stores a high concentration chemical. The first chemical solution chamber 322 corresponds to the space around the second chemical solution chamber 323, and the chemical solution overflowing from the upper surface opening of the second chemical solution chamber 322 is diluted with washing water and stored. The first chemical chamber 323 communicates with the cleaning water intake chamber 321 through the first communication path 322a.

  In a state where the washing water is not flowing, the chemical liquid is dropped into the second chemical liquid chamber 323 via the nozzle 333, and a high concentration chemical liquid is stored. When the cleaning water flows and the cleaning water flows into the cleaning water intake chamber 321, the gas in the sealed cleaning water intake chamber 321 is compressed to increase the internal pressure, and the chemical solution storage unit 331 is connected via the communication pipe 340. The pressure increases. This prevents the cleaning water from flowing into the chemical solution storage unit 331 through the nozzle 333. The washing water taken into the washing water intake chamber 321 flows into the first chemical chamber 322 through the first communication path 322a. In the first chemical liquid chamber 322, the high-concentration chemical liquid overflowing from the second chemical liquid chamber 323 is diluted and accumulated, and the diluted chemical liquid (low-concentration chemical liquid) is mixed with the washing water. Of course, the liquid remaining in the washing water intake chamber 321 is also mixed during this period. When the supply of the wash water is near the end, the internal pressure of the wash water passage section 310 is reduced, so that the gas compressed in the wash water intake chamber 321 expands and is taken into the wash water intake chamber 321, mainly. The cleaning water mixed with the residual liquid in the cleaning water intake chamber 321 and the residual liquid (low concentration chemical liquid) in the first chemical liquid chamber 322 is pushed out to the cleaning water passage section 310 and supplied into the flush toilet. . Other configurations and operations are the same as those of the above-described embodiments, but the present embodiment also has an advantage that it is possible to prevent the washing water from flowing into the chemical solution storage portion 331 as in the second embodiment. .

  5-7 is a figure which shows the 4th Embodiment of this invention. The flush toilet chemical supply device 400 according to the fourth embodiment is provided with a wash water intake chamber 421 and a chemical storage part 431 in a casing 450. Specifically, a cleaning water intake chamber 421 is provided at a lower portion of the casing 450, and a first partition wall portion (also serving as an upper wall portion of the cleaning water intake chamber 421 and a bottom wall portion of the chemical solution storage portion 431) 460 is separated. A chemical solution storage portion 431 is provided on the top of the lever.

  A first chemical chamber 422 and a second chemical chamber 423 are provided at a lower portion of the cleaning water intake chamber 421 with a second partition wall portion 470 functioning as a bottom wall portion of the cleaning water intake chamber 421 interposed therebetween. Yes. The second chemical chamber 423 is formed in a cylindrical shape corresponding to the vicinity of the center of the second partition wall portion 470, and a first chemical chamber 422 is provided surrounding the periphery.

  The second partition wall 470 is provided with a first communication passage 422a that penetrates in the thickness direction, and the cleaning water that has flowed into the cleaning water intake chamber 421 flows from the first communication passage 422a to the first chemical solution. Flows into the chamber 422. A second communication passage 423a is formed through the peripheral wall portion forming the cylindrical second chemical liquid chamber 423 at a predetermined height from the bottom surface of the second chemical liquid chamber 423. Accordingly, the liquid can move between the second chemical chamber 423 and the first chemical chamber 422 through the second communication path 423a.

  Near the center of the first partition wall portion 460, a cylindrical portion 432 extending downward from the chemical solution storage portion 431 side is provided. A nozzle support member 432 a is attached to the lower end of the cylindrical portion 432. The nozzle 433 is supported at the center of the nozzle support member 432a. Since both the cylindrical part 432 and the second chemical liquid chamber 423 are provided in the vicinity of the center of each partition wall part 460, 470, the positional relationship in which the lower end of the cylindrical part 432 and the second chemical liquid chamber 423 face each other. As a result, the nozzle 433 supported by the nozzle support member 432 a provided at the lower end of the cylindrical portion 432 is disposed at a position facing the second chemical solution chamber 423.

  In addition, a communication hole 461 that penetrates the first partition wall 460 in the thickness direction is provided in a portion of the first partition wall 460 that is located around the cylindrical portion 432, and the communication hole 461 has a predetermined length of communication. A tube 440 is attached. Specifically, the communication pipe 440 is attached to the communication hole 461 so as to be substantially vertical upward, and the upper end opening 440 a of the communication pipe 440 is positioned in the upper space of the chemical solution storage section 431. As a result, the internal pressure of the cleaning water intake chamber 421 and the internal pressure of the chemical solution storage portion 431 are equalized via the communication pipe 440.

  Here, the washing water passage 410 is provided at the lower part of the casing 450. The first chemical chamber 422 is not formed over the entire circumference around the second chemical chamber 423 when viewed from the plane, but is provided with a wall portion 422b in a part of the circumferential direction. A hole that penetrates the wall portion 422b in the thickness direction and the upper end faces the cleaning water intake chamber 421 serves as a cleaning water intake port 421a. And the washing water passage part 410 is connected to the lower end of this intake port 421a. Accordingly, the cleaning water intake chamber 421 and the chemical solution storage portion 431 are substantially sealed except for the intake port 421a.

  According to the present embodiment, in the state where the cleaning water is not flowing, the chemical solution in the chemical solution storage unit 431 is dripped into the second chemical solution chamber 423 via the cylinder portion 432 and the nozzle 433. For this reason, a high concentration chemical solution is stored in the second chemical solution chamber 423. Since the second chemical liquid chamber 423 and the first chemical liquid chamber 422 are communicated with each other via the second communication path 423a, the chemical liquid moves from the second chemical liquid chamber 423 into the first chemical liquid chamber 422. In addition, the chemical solution diluted to a low concentration in the first chemical solution chamber 422 is accumulated. In addition, although a predetermined amount of liquid from the previous cleaning remains in the cleaning water intake chamber 421, the chemical concentration of the liquid is lower than the chemical concentration in the first chemical chamber 422. This is the same as in the above embodiments. When washing water flows in this state, as shown in FIG. 8, the washing water flows into the urinal as it is from the in-urinal pipe 3 provided at the upper part of the urinal through the pressure adjustment unit 140 described later. A part of the cleaning water flows into the cleaning water intake chamber 421 from the intake port 421a through the cleaning water passage part 410 connected to the pipe part 141 of the pressure adjustment unit 140.

  The wash water taken into the wash water take-in chamber 421 mixes with the residual liquid in the wash water take-in chamber 421 and passes through the first communication path 422a and is located below the second partition wall 470. It flows into the chemical chamber 422. As described above, the chemical solution having a lower concentration than the chemical solution in the second chemical solution chamber 423 is accumulated in the first chemical solution chamber 422, and the chemical solution is mixed with the cleaning water. In addition, as in the above embodiments, the cleaning water slightly flows into the second chemical chamber 423 and is mixed. Near the end of the supply of the cleaning water, the internal pressure of the cleaning water passage 410 decreases, so that the gas compressed in the cleaning water intake chamber 421 expands (restores) and mainly remains in the cleaning water intake chamber 421. Wash water mixed with the residual liquid (low-concentration chemical liquid) in the first chemical chamber 422 is pushed out to the wash water passage section 410 and returned into the pipe section 141 of the pressure adjustment unit 140 and inside the urinal. To be supplied. In addition, when the same apparatus as what was shown to FIGS. 5-7 was manufactured and the mixing amount of the chemical | medical solution was measured, the ratio of 2 cc / day (0.083 cc / hour) from the nozzle 433 in the 2nd chemical | medical solution chamber 423 is obtained. In the case of dripping, the chemical amount of the cleaning water returned from the cleaning water intake chamber 421 to the cleaning water passage 410 (that is, the residual liquid in the cleaning water intake chamber 421 and the residual liquid in the first chemical chamber 422 (low The concentration of the chemical solution in the washing water when it is stirred and mixed) is about 0.02 cc on average, and is diluted to an appropriate concentration as the concentration of the chemical solution supplied to the flush toilet (for example, a urinal) .

  When the cleaning water flows into the cleaning water intake chamber 421 from the intake port 421a through the cleaning water passage portion 410, the gas in the cleaning water intake chamber 421 that is substantially sealed except for the intake port 421a is compressed. The internal pressure increases, and the pressure in the chemical solution storage portion 431 that communicates with the cleaning water intake chamber 421 via the communication pipe 440 also increases. As a result, the internal pressure of the cleaning water intake chamber 421 and the internal pressure of the chemical solution storage unit 431 become equal, and the cleaning water is prevented from flowing back to the chemical solution storage unit 431 side through the nozzle 433. This is the same as in the second and third embodiments, but in this embodiment, the nozzle 433 is attached to the tip of a predetermined length of the cylindrical portion 432 extending downward from the chemical solution storage portion 431. Moreover, the backflow prevention effect to the chemical | medical solution storage part 431 of washing water is higher than each said embodiment. In addition, since the chemical solution storage portion 431 is disposed in the upper part of the washing water intake chamber 421, there is an advantage that the chemical solution is easily produced even with a thin nozzle due to the height difference. Further, a slim appearance can be obtained by arranging the cleaning water intake chamber 421 and the chemical solution storage portion 431 in the vertical direction.

  Here, as shown in FIG. 8, the flush toilet bowl chemical supply devices 200, 300, and 400 according to the second to fourth embodiments are attached to the outer surface of the side wall portion of the flush toilet (urinal), for example. used. In this case, as shown in FIG. 8, the washing water passage portions 210, 310, and 410 are washing water supply paths disposed in the upper space 100 of the urinal, and a flow rate adjustment unit and a solenoid are interposed in the middle. It is connected to the pipe 3 in the toilet bowl. However, since the internal pressure of the toilet 3 pipe 3 is lower than that of the wash water supply pipe 2 located outside the toilet, the pressure sufficient for the wash water supplied via the wash water passages 210, 310, 410 is sufficient. Does not act, and there is a case where the cleaning water cannot be pumped into the cleaning water intake chambers 221, 321, 421 which are substantially sealed spaces. Therefore, when the pressure is insufficient, it is preferable to provide a pressure adjustment unit 140 as shown in FIGS.

  The pressure adjustment unit 140 includes a pipe portion 141 and a through-passage 142a that is disposed in the pipe portion 141 and through which the liquid passes. The flow rate is provided so that the angle can be adjusted in the pipe passage 141 by a screw member 142b. A control member 142 is provided. The pipe part 141 is provided with a connection hole 141a to which one end of the washing water passage parts 210, 310, 410 is connected. The toilet pipe 3 is connected to both end portions 141b and 141c of the pipe portion 141, and one end of the wash water passage portions 210, 310, and 410 is connected to the connection hole 141a.

  In this state, the screw member 142b is rotated to adjust the angle of the flow control member 142. Accordingly, the flow rate passing through the through passage 142a can be controlled, the internal pressure in the cleaning water passage portions 210, 310, 410 connected to the connection hole 141a is increased, and the cleaning water is supplied into the cleaning water intake chambers 221, 321, 421. Can be pumped. Note that the pressure adjustment unit 140 is not limited to the case where the washing water passage portions 210, 310, 410 are connected to the toilet pipe 3, but the case where the pressure adjustment unit 140 is connected to the washing water supply pipe 2 as in the first embodiment. Of course, it can be provided if necessary.

  In each of the above-described embodiments, a case where the present invention is applied to a urinal is taken as an example. This is because it is most often used for urinals, but it is of course applicable to urinals (including both Japanese and Western styles).

FIG. 1 is a longitudinal sectional view showing a schematic configuration of a flush toilet bowl chemical supply apparatus according to a first embodiment of the present invention. FIG. 2 is a cross-sectional view taken along the line AA of FIG. Fig.3 (a) is a longitudinal cross-sectional view which shows schematic structure of the chemical | medical solution supply apparatus for flush toilets concerning the 2nd Embodiment of this invention, (b) is A arrow directional view of (a). Fig.4 (a) is a top view which shows schematic structure of the chemical | medical solution supply apparatus for flush toilets which concerns on the 3rd Embodiment of this invention, (b) is a longitudinal cross-sectional view. FIG. 5: is a figure which shows the external appearance structure of the chemical solution supply apparatus for flush toilets which concerns on the 4th Embodiment of this invention, (a) is a top view, (b) is a front view, (c) is a side view. is there. FIG. 6 is a cross-sectional view taken along line AA in FIG. FIG. 7 is a sectional view taken along line BB in FIG. FIG. 8 is a schematic view showing a state in which the main body of the flush toilet bowl medicine supply device shown in FIGS. 3 to 7 is disposed on the side wall of the flush toilet (urinal). 9A and 9B are diagrams for explaining the pressure adjustment unit, in which FIG. 9A is a transverse sectional view, FIG. 9B is a longitudinal sectional view, and FIG. 9C is an end view.

Explanation of symbols

1,200,300 Chemical supply device for flush toilet 2 Washing water supply pipe 3 Toilet piping 10, 210, 310, 410 Washing water passage 20 Main body 21, 221, 321, 421 Washing water intake chamber 22, 222, 322 , 422 First chemical chamber 23, 223, 323, 423 Second chemical chamber 30, 230, 330, 430 Chemical solution supply mechanism 31, 231, 331, 431 Chemical solution storage unit 33, 233, 333, 434 Nozzle 140 Pressure adjustment Unit 141 Pipe 142 Flow control member

Claims (6)

A chemical supply device for a flush toilet that supplies chemical to wash water supplied to a flush toilet,
A washing water passage section connected to a washing water supply path leading to a discharge port for discharging the washing water into the flush toilet ;
A washing water intake chamber into which the washing water passing through the washing water passage section is taken in;
A first chemical chamber communicated with the washing water intake chamber;
A second chemical chamber communicated with the first chemical chamber;
A chemical supply mechanism for supplying a chemical to the second chemical chamber,
Wash water passing through the wash water passage is taken into the wash water intake chamber, compresses the gas in the wash water intake chamber, and is mixed with the chemical solution,
When the pressure of the washing water passing portion is lowered, the by expansion of the wash water uptake chamber gas, the washing water chemical is mixed, Ri configuration der extruded into the wash water passage section, and
The chemical supply mechanism is
A chemical solution storage unit for storing a chemical solution, which is communicated with the washing water intake chamber;
A nozzle that is attached to the chemical solution storage unit and faces the second chemical solution chamber and that can supply a predetermined amount of the chemical solution to the second chemical solution chamber is provided. Chemical solution supply device for flush toilet. The chemical solution storage unit of the chemical solution supply mechanism is disposed at an upper portion of the cleaning water intake chamber, communicated with the communication tube through which the cleaning water intake chamber communicates with the chemical solution storage unit, and the chemical solution storage unit The second chemical chamber is provided in a positional relationship facing the lower end of the cylindrical portion, the nozzle is provided at the lower end of the cylindrical portion, and the nozzle is the second The chemical solution supply device for a water washer according to claim 1, wherein the chemical solution supply device faces the chemical solution chamber . The chemical solution storage section of the chemical solution supply mechanism is disposed outside the cleaning water intake chamber, and is communicated via a communication pipe that connects the cleaning water intake chamber and the chemical solution storage section. The chemical solution supply apparatus for water washer according to 1 . The chemical solution storage portion of the chemical solution supply mechanism is formed in a substantially cylindrical shape having an opening near the upper end, is disposed in the cleaning water intake chamber, and communicates with the cleaning water intake chamber through the opening. The chemical liquid supply device for flush toilets according to claim 1 characterized by the above-mentioned . The chemical supply device for a flush toilet according to any one of claims 1 to 4, wherein the nozzle has an inner diameter of 50 µm to 0.5 mm . The pressure adjusting unit is interposed in a connecting portion between the cleaning water passage and the cleaning water supply path, and further includes a pressure adjustment unit that increases the pressure of the cleaning water taken into the cleaning water passage from the cleaning water supply path. The chemical solution supply apparatus for flush toilets according to any one of 1 to 5 .

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