JP5448625B2 - Cleaning method and apparatus without rinsing process - Google Patents
Cleaning method and apparatus without rinsing process Download PDFInfo
- Publication number
- JP5448625B2 JP5448625B2 JP2009177897A JP2009177897A JP5448625B2 JP 5448625 B2 JP5448625 B2 JP 5448625B2 JP 2009177897 A JP2009177897 A JP 2009177897A JP 2009177897 A JP2009177897 A JP 2009177897A JP 5448625 B2 JP5448625 B2 JP 5448625B2
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- Prior art keywords
- cleaning
- tank
- steam
- component
- cleaning agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims description 129
- 238000000034 method Methods 0.000 title claims description 49
- 239000012459 cleaning agent Substances 0.000 claims description 64
- 238000010438 heat treatment Methods 0.000 claims description 35
- 238000005406 washing Methods 0.000 claims description 21
- 230000007246 mechanism Effects 0.000 claims description 15
- 238000013020 steam cleaning Methods 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000000926 separation method Methods 0.000 claims description 11
- HXELGNKCCDGMMN-UHFFFAOYSA-N [F].[Cl] Chemical compound [F].[Cl] HXELGNKCCDGMMN-UHFFFAOYSA-N 0.000 claims description 9
- -1 glycol ethers Chemical class 0.000 claims description 9
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical compound COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 claims description 5
- DJXNLVJQMJNEMN-UHFFFAOYSA-N 2-[difluoro(methoxy)methyl]-1,1,1,2,3,3,3-heptafluoropropane Chemical compound COC(F)(F)C(F)(C(F)(F)F)C(F)(F)F DJXNLVJQMJNEMN-UHFFFAOYSA-N 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 claims description 5
- 229940104872 methyl perfluoroisobutyl ether Drugs 0.000 claims description 5
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 claims description 4
- DFUYAWQUODQGFF-UHFFFAOYSA-N 1-ethoxy-1,1,2,2,3,3,4,4,4-nonafluorobutane Chemical compound CCOC(F)(F)C(F)(F)C(F)(F)C(F)(F)F DFUYAWQUODQGFF-UHFFFAOYSA-N 0.000 claims description 4
- SQEGLLMNIBLLNQ-UHFFFAOYSA-N 1-ethoxy-1,1,2,3,3,3-hexafluoro-2-(trifluoromethyl)propane Chemical compound CCOC(F)(F)C(F)(C(F)(F)F)C(F)(F)F SQEGLLMNIBLLNQ-UHFFFAOYSA-N 0.000 claims description 4
- 229940045180 ethyl perfluoroisobutyl ether Drugs 0.000 claims description 4
- CWIFAKBLLXGZIC-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(2,2,2-trifluoroethoxy)ethane Chemical compound FC(F)C(F)(F)OCC(F)(F)F CWIFAKBLLXGZIC-UHFFFAOYSA-N 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 2
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- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
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- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 2
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 2
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 2
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
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- 239000002280 amphoteric surfactant Substances 0.000 description 2
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- 239000002518 antifoaming agent Substances 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
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- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Natural products CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
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- 125000004122 cyclic group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
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- 229910052731 fluorine Inorganic materials 0.000 description 2
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- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
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- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 231100000053 low toxicity Toxicity 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
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- YCOZIPAWZNQLMR-UHFFFAOYSA-N pentadecane Chemical compound CCCCCCCCCCCCCCC YCOZIPAWZNQLMR-UHFFFAOYSA-N 0.000 description 2
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- 239000011347 resin Substances 0.000 description 2
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- 239000003381 stabilizer Substances 0.000 description 2
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 2
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- DOFPYUKLKZWQTD-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,5,5-decafluoropentane Chemical compound FC(F)C(F)C(F)(F)C(F)(F)C(F)(F)F DOFPYUKLKZWQTD-UHFFFAOYSA-N 0.000 description 1
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Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
本発明は、機械部品、精密機械部品、光学機械部品等の加工時に使用される加工油類、グリース類、ワックス類や電気電子部品のハンダ付け時に使用されるフラックス類及び液晶等のあらゆる汚れを洗浄するのに好適な、洗浄方法及び洗浄装置に関するものである。 The present invention eliminates all kinds of dirt such as processing oils, greases, waxes used in the machining of mechanical parts, precision machine parts, optical machine parts, etc. The present invention relates to a cleaning method and a cleaning apparatus suitable for cleaning.
機械部品、精密機械部品、光学機械部品等の加工時には種々の加工油類、例えば、切削油、プレス油、引抜き油、熱処理油、防錆油、潤滑油等、グリース類又はワックス類等が使用されるが、これらの汚れは最終的には除去する必要があり、溶剤による除去が一般的に行われている。 When processing machine parts, precision machine parts, optical machine parts, etc., various processing oils such as cutting oil, press oil, drawing oil, heat treatment oil, rust preventive oil, lubricating oil, greases or waxes are used. However, these soils need to be finally removed, and removal by a solvent is generally performed.
また、電子回路の接合方法としてはハンダ付けが最も一般的に行われているが、ハンダ付けすべき金属表面の酸化物の除去清浄化、再酸化防止、ハンダ濡れ性の改良の目的で、ロジンを主成分としたフラックスでハンダ付け面を予め処理することが通常行われている。このフラックス残渣は金属の腐食や絶縁性の低下の原因となるため、ハンダ付け終了後、十分に除去する必要がある。 Soldering is the most commonly used method for joining electronic circuits, but rosin is used for the purpose of removing and cleaning oxides on the metal surface to be soldered, preventing reoxidation, and improving solder wettability. In general, the soldering surface is pre-treated with a flux containing as a main component. Since this flux residue causes corrosion of the metal and deterioration of insulation, it is necessary to remove it sufficiently after the soldering is completed.
これらの洗浄、除去には、不燃性で毒性が低く、優れた溶解能を示す等、多くの特徴を有することから、1,1,2−トリクロロ−1,2,2−トリフルオロエタン(以下CFC113という)やCFC113とアルコールなどを混合した溶剤で洗浄していたが、オゾン層破壊等の地球環境汚染問題が指摘され、日本では1995年末にその生産が全廃された。このCFC113の代替品として、3,3−ジクロロ−1,1,1,2,2−ペンタフルオロプロパンと1,3−ジクロロ−1,1,2,2,3−ペンタフルオロプロパンの混合物(以下HCFC225という)等のハイドロクロロフルオロカーボンが提案されているが、これらもオゾン層破壊能があるため、日本では2020年にその使用が禁止される予定である。 These washing and removal have many characteristics such as nonflammability, low toxicity and excellent solubility, so that 1,1,2-trichloro-1,2,2-trifluoroethane (hereinafter referred to as “removable”) CFC113) or a mixture of CFC113 and alcohol was used for cleaning, but global environmental pollution problems such as ozone depletion were pointed out, and production was abolished in Japan at the end of 1995. As an alternative to the CFC 113, a mixture of 3,3-dichloro-1,1,1,2,2-pentafluoropropane and 1,3-dichloro-1,1,2,2,3-pentafluoropropane (hereinafter referred to as “CFC 113”) Hydrochlorofluorocarbons (such as HCFC225) have been proposed, but these are also expected to be banned in Japan in 2020 due to their ability to destroy the ozone layer.
さらに、近年、塩素原子を全く含まないハイドロフルオロカーボン類(以下HFCという)やハイドロフルオロエーテル類(以下HFEという)等のオゾン層破壊能が全くなく、不燃性のフッ素系溶剤が提案されているが、塩素原子を含まないために溶解能が低く、単独では洗浄剤として使用できない。 Further, in recent years, non-flammable fluorine-based solvents having no ozone layer destructive ability such as hydrofluorocarbons (hereinafter referred to as HFC) and hydrofluoroethers (hereinafter referred to as HFE) containing no chlorine atom have been proposed. Since it does not contain chlorine atoms, its solubility is low and it cannot be used alone as a cleaning agent.
特許文献1、特許文献2等に、HFCやHFE等の非塩素系フッ素化合物と汚れに対する洗浄力の向上を目的とした特定の条件を満たす化合物との混合溶剤が開示されている。これらの発明により上記問題点は解決され、オゾン層破壊能がなく溶解能に優れた非引火性の洗浄剤組成物が得られるものの、洗浄工程の後に揮発性に優れるHFCやHFEでリンスするリンス工程が必要となり、省スペース化する場合の課題となっている。
代替洗浄剤として、ハロゲン系溶剤以外にも炭化水素系溶剤やアルコール系溶剤などを用いた非水系洗浄剤、酸、アルカリ或いは界面活性剤等が配合された水系洗浄剤の開発が進められているが、同様に装置が大型化するなどの課題があり十分な解決には至っていない。
Patent Document 1,
As alternative cleaning agents, non-aqueous cleaning agents using hydrocarbon solvents or alcohol solvents in addition to halogen solvents, and aqueous cleaning agents containing acids, alkalis or surfactants are being developed. However, there is a problem such as an increase in the size of the apparatus, and it has not been solved sufficiently.
本発明は、あらゆるタイプの汚れに対して、HCFC225に匹敵するような洗浄力を示すと共に低毒性で、引火性が低く、オゾン層破壊の恐れが全くない洗浄性に優れる高沸点溶剤を含有する洗浄剤を用いて、被洗浄物表面における汚れの再付着による洗浄性の低下を防止し、かつ、揮発性に優れるHFCやHFEによるリンス工程がなく省スペースを可能とする洗浄方法及び洗浄装置を提供することを課題とする。 The present invention contains a high-boiling solvent that exhibits detergency comparable to that of HCFC225 against all types of soils, has low toxicity, low flammability, and excellent detergency without any risk of ozone layer destruction. A cleaning method and a cleaning apparatus that use a cleaning agent to prevent deterioration in cleaning properties due to re-adhesion of dirt on the surface of an object to be cleaned, and eliminate the need for a rinsing process using HFC or HFE, which has excellent volatility. The issue is to provide.
本発明者は、前記課題を達成するための洗浄方法及び洗浄装置につき種々の検討を重ねた結果、蒸発速度の異なる20℃における蒸気圧が1.33×103Pa以上の非塩素系フッ素化合物(a)と20℃における蒸気圧が1.33×103Pa未満の成分(b)とを一定の組成比で併用し、かつ、洗浄時の洗浄条件として、「洗浄槽温度」と「洗浄槽温度と蒸気ゾーン温度との温度差」とを規定することで、洗浄剤を加熱して得られる凝縮液によるリンス工程のない洗浄方法で、HCFC225と同等の洗浄性及び乾燥性の得られることを見出した。 As a result of repeated studies on the cleaning method and the cleaning apparatus for achieving the above-mentioned problems, the present inventor has found that the chlorine pressure at 20 ° C. having a different evaporation rate is 1.33 × 10 3 Pa or more of a non-chlorine fluorine compound. (A) and a component (b) having a vapor pressure of less than 1.33 × 10 3 Pa at 20 ° C. are used in combination at a constant composition ratio, and “cleaning bath temperature” and “cleaning” By stipulating the “temperature difference between the bath temperature and the steam zone temperature”, the cleaning method without the rinse step using the condensate obtained by heating the cleaning agent can provide the same cleaning and drying properties as HCFC225. I found.
具体的には20℃における蒸気圧が1.33×103Pa以上である非塩素系フッ素化合物(a)80〜95重量%、20℃における蒸気圧が1.33×103Pa未満の成分(b)5〜20重量%とを含有する洗浄剤により洗浄した後、前記洗浄剤を加熱して得られる蒸気により蒸気洗浄する物品を洗浄する工程において、洗浄槽温度が25〜45℃、洗浄槽温度と蒸気ゾーン温度との温度差が10〜40℃の洗浄条件で洗浄することで、リンス工程がない洗浄方法において、HCFC225と同等の洗浄性が得られるだけでなく、優れた乾燥性の得られることを見出し、本発明を完成するに至った。
本発明の態様は以下に記載する通りである。
Specifically, a non-chlorine fluorine compound (a) having a vapor pressure at 20 ° C. of 1.33 × 10 3 Pa or more is 80 to 95% by weight, and a component having a vapor pressure at 20 ° C. of less than 1.33 × 10 3 Pa. (B) In a step of cleaning an article to be steam cleaned with steam obtained by heating the cleaning agent after cleaning with a cleaning agent containing 5 to 20% by weight, the cleaning tank temperature is 25 to 45 ° C. By washing under a washing condition in which the temperature difference between the bath temperature and the steam zone temperature is 10 to 40 ° C., in a washing method without a rinsing step, not only a washing performance equivalent to that of HCFC225 is obtained, but also an excellent drying property As a result, the present invention was completed.
Aspects of the present invention are as described below.
本発明の第1の態様は、(a)20℃における蒸気圧が1.33×103Pa以上である非塩素系フッ素化合物80〜95重量%、(b)20℃における蒸気圧が1.33×103Pa未満の成分5〜20重量%とを含有する洗浄剤により洗浄槽で洗浄する工程、及び、前記洗浄剤を加熱して得られる蒸気により洗浄する工程を含み、かつ被洗浄物に付着した洗浄剤をリンスする工程を有さない洗浄方法において、前記洗浄槽の温度が25〜45℃、洗浄槽の温度と蒸気により洗浄するゾーンの温度の差が10〜40℃であることを特徴とする洗浄方法である。 In the first aspect of the present invention, (a) a non-chlorine fluorine compound having a vapor pressure at 20 ° C. of 1.33 × 10 3 Pa or more is 80 to 95% by weight, and (b) the vapor pressure at 20 ° C. is 1. Including a step of cleaning in a cleaning tank with a cleaning agent containing 5 to 20% by weight of a component less than 33 × 10 3 Pa, and a step of cleaning with steam obtained by heating the cleaning agent. In the cleaning method that does not include the step of rinsing the cleaning agent adhering to the cleaning tank, the temperature of the cleaning tank is 25 to 45 ° C., and the difference between the temperature of the cleaning tank and the temperature of the zone that is cleaned with steam is 10 to 40 ° C. A cleaning method characterized by the above.
本発明の第2の態様は、成分(a)が、ハイドロフルオロカーボン(HFC)及び/又はハイドロフルオロエーテル(HFE)を含有することを特徴とする第1の態様に記載の洗浄方法である。 A second aspect of the present invention is the cleaning method according to the first aspect, wherein the component (a) contains hydrofluorocarbon (HFC) and / or hydrofluoroether (HFE).
本発明の第3の態様は、成分(a)が、2H,2H,4H,4H,4H−ペンタフルオロブタン(HFC365mfc)、2H,3H−パーフルオロペンタン(HFC43−10mee)、メチルパーフルオロブチルエーテル、メチルパーフルオロイソブチルエーテル及びこれらの混合物、エチルパーフルオロブチルエーテル、エチルパーフルオロイソブチルエーテル及びこれらの混合物、1,1,2,2−テトラフルオロ−1−(2,2,2−トリフルオロエトキシ)エタン(HFE347pc−f)及び4H,5H,5H−ヘプタフルオロシクロペンタンから選ばれる一種又は二種以上の組み合わせを含有することを特徴とする第1又は第2の態様に記載の洗浄方法である。 In a third embodiment of the present invention, the component (a) is 2H, 2H, 4H, 4H, 4H-pentafluorobutane (HFC365mfc), 2H, 3H-perfluoropentane (HFC43-10mee), methyl perfluorobutyl ether, Methyl perfluoroisobutyl ether and mixtures thereof, ethyl perfluorobutyl ether, ethyl perfluoroisobutyl ether and mixtures thereof, 1,1,2,2-tetrafluoro-1- (2,2,2-trifluoroethoxy) ethane The cleaning method according to the first or second aspect, comprising one or a combination of two or more selected from (HFE347pc-f) and 4H, 5H, 5H-heptafluorocyclopentane.
本発明の第4の態様は、成分(b)が、グリコールエーテル類、グリコールエーテルアセテート類、エステル類及び炭化水素類からなる群から選ばれる一種以上の化合物を含有することを特徴とする第1〜3のいずれか1つの態様に記載の洗浄方法である。 According to a fourth aspect of the present invention, the component (b) contains one or more compounds selected from the group consisting of glycol ethers, glycol ether acetates, esters and hydrocarbons. It is a washing | cleaning method as described in any one aspect of -3.
本発明の第5の態様は、洗浄剤により被洗浄物を洗浄するための洗浄槽、前記洗浄槽内における洗浄剤温度を調整する機構、前記洗浄剤を構成する少なくとも一種の成分の蒸気を発生させるための加熱機構を有する加熱槽、前記加熱槽から発生した蒸気で蒸気洗浄するための蒸気ゾーン、発生した蒸気を凝縮して得られた凝縮液から水分を除去するための水分離槽、前記洗浄剤を洗浄槽と加熱槽との間で循環する機構、を有し、被洗浄物に付着した洗浄剤をリンスする為の機構を有さない第1〜4のいずれか1つの態様に記載の洗浄方法に用いられる洗浄装置である。 According to a fifth aspect of the present invention, there is provided a cleaning tank for cleaning an object to be cleaned with a cleaning agent, a mechanism for adjusting a cleaning agent temperature in the cleaning tank, and a vapor of at least one component constituting the cleaning agent. A heating tank having a heating mechanism for making the steam, a steam zone for steam cleaning with steam generated from the heating tank, a water separation tank for removing moisture from the condensate obtained by condensing the generated steam, A mechanism for circulating the cleaning agent between the cleaning tank and the heating tank, and any one of the first to fourth aspects having no mechanism for rinsing the cleaning agent attached to the object to be cleaned This is a cleaning device used in the cleaning method.
本発明は、20℃における蒸気圧が1.33×103Pa以上である非塩素系フッ素化合物(a)80〜95重量%、20℃における蒸気圧が1.33×103Pa未満の成分(b)5〜20重量%とを含有する洗浄剤により洗浄した後、前記洗浄剤を加熱して得られる蒸気により蒸気洗浄する物品を洗浄する工程において、洗浄槽温度を25〜45℃にコントロールし、成分(b)の優れた汚れ溶解性と成分(a)の汚れ成分に対する溶解性が液温上昇により著しく向上する温度効果とを組み合わせることで、20℃における蒸気圧が1.33×103Pa未満の乾燥しにくい成分(b)の添加濃度を抑制したまま、優れた汚れ溶解性を保持することを可能とし、かつ、成分(b)の添加濃度を抑制したことで、洗浄槽温度と蒸気ゾーン温度との温度差を10〜40℃にコントロールすることにより、蒸気ゾーンにおいて被洗浄物表面で凝縮する凝縮液のみによる成分(b)及び洗浄剤中に溶解する汚れ成分を蒸気洗浄することが可能となり、リンス工程がない洗浄方法においてもHCFC225と同等の洗浄性及び優れた乾燥性の得られる洗浄を可能とした。 The present invention relates to a non-chlorine fluorine compound (a) having a vapor pressure at 20 ° C. of 1.33 × 10 3 Pa or more, 80 to 95% by weight, and a component having a vapor pressure at 20 ° C. of less than 1.33 × 10 3 Pa. (B) After washing with a cleaning agent containing 5 to 20% by weight, the temperature of the cleaning tank is controlled to 25 to 45 ° C. in the step of cleaning an article to be steam cleaned with steam obtained by heating the cleaning agent. The vapor pressure at 20 ° C. is 1.33 × 10 5 by combining the excellent soil solubility of component (b) with the temperature effect that the solubility of component (a) in the soil component is remarkably improved by increasing the liquid temperature. It is possible to maintain excellent soil solubility while suppressing the addition concentration of the component (b) which is difficult to dry at less than 3 Pa, and by suppressing the addition concentration of the component (b), the washing tank temperature And steam zone By controlling the temperature difference from 10 degrees to 10 degrees Celsius, it is possible to steam clean the component (b) consisting solely of the condensate condensed on the surface of the object to be cleaned in the steam zone and the dirt component dissolved in the cleaning agent. Thus, even in a cleaning method without a rinsing step, it was possible to perform cleaning with the same cleaning performance as HCFC225 and excellent drying properties.
本発明について、以下具体的に説明する。
まず、本明細書において用いる用語について説明する。
本明細書において、「洗浄」とは被洗浄物に付着している汚れを次工程に影響のないレベルまで除去することである。また、「リンス」とは洗浄後、被洗浄物に付着している汚れ成分を含む洗浄剤を汚れ成分の含まれない溶剤に置換することである。蒸気洗浄とは被洗浄物表面にわずかに残留する汚れ成分を、被洗浄物と蒸気との温度差によって被洗浄物表面で凝縮する液体で除去することである。また、「汚れ成分」とは、被洗浄物から除去したい成分を表す。例えば精密部品に付着した加工油、プリント基板に付着したフラックス残渣、液晶セルのギャップ間に残留した液晶等が挙げられる。
The present invention will be specifically described below.
First, terms used in this specification will be described.
In this specification, “cleaning” refers to removing dirt adhering to an object to be cleaned to a level that does not affect the next process. “Rinse” is to replace a cleaning agent containing a dirt component adhering to an object to be cleaned with a solvent containing no dirt component after washing. The vapor cleaning is to remove a slightly contaminated component remaining on the surface of the object to be cleaned with a liquid that condenses on the surface of the object to be cleaned due to a temperature difference between the object to be cleaned and the steam. The “dirt component” represents a component that is desired to be removed from the object to be cleaned. For example, processing oil adhering to precision parts, flux residue adhering to the printed circuit board, liquid crystal remaining between the gaps of the liquid crystal cell, and the like can be mentioned.
本発明における洗浄方法は蒸気圧が高い成分(a)と蒸気圧の低い成分(b)とを含有する洗浄剤による洗浄工程とその後工程として、前記洗浄剤を加熱して得られる蒸気の凝縮液による蒸気洗浄工程からなる。成分(a)に求められる性能は、乾燥性を高めるために蒸気圧が高く(20℃における蒸気圧が1.33×103Pa以上)、蒸発消耗量を抑制するために蒸気比重が大きいことである。成分(b)に求められる性能は、蒸気圧が低く(20℃における蒸気圧が1.33×103Pa未満)、成分(a)及び汚れ成分に対する優れた溶解性能を示すことである。 The cleaning method in the present invention is a condensate of steam obtained by heating the cleaning agent as a cleaning step and a subsequent step using a cleaning agent containing the component (a) having a high vapor pressure and the component (b) having a low vapor pressure. It consists of a steam cleaning process. The performance required for the component (a) is that the vapor pressure is high in order to improve the drying property (the vapor pressure at 20 ° C. is 1.33 × 10 3 Pa or more) and the vapor specific gravity is large in order to suppress the evaporation consumption. It is. The performance required for the component (b) is that the vapor pressure is low (the vapor pressure at 20 ° C. is less than 1.33 × 10 3 Pa), and exhibits excellent dissolution performance for the component (a) and the soil component.
本発明に係る洗浄方法に必須の洗浄工程は、被洗浄物に残留する汚れ成分を除去し洗浄する工程で、洗浄槽に貯留する各種洗浄剤による洗浄を主体として、必要に応じて、超音波、揺動、液中噴流などの物理的な力を加える機構などを含む工程である。 The cleaning process essential for the cleaning method according to the present invention is a process for removing and cleaning the dirt components remaining in the object to be cleaned, and mainly cleaning with various cleaning agents stored in the cleaning tank, and ultrasonic waves as necessary. , A process including a mechanism for applying a physical force such as rocking or submerged jet.
具体的な洗浄工程としては、洗浄するための洗浄槽、前記洗浄剤槽内における洗浄剤温度を調整する機構、洗浄剤を加熱することにより蒸気を発生させるための加熱機構を有する加熱槽あるいは蒸留槽、発生した蒸気を凝縮して得られる凝縮液から水分を除去するための水分離槽からなる。加熱槽あるいは蒸留槽のヒーターにより加熱されて発生した蒸気は冷却管により凝縮され、凝縮した液は水分離槽で水分を分離した後洗浄槽、加熱槽あるいは蒸留槽の順にオーバーフローする。必要に応じて、加熱槽あるいは蒸留槽中に蓄積する汚れ成分を分離するためのポンプ、フィルター及び比重差を利用した静置槽等のあらゆる機構を設置することができる。 Specific cleaning steps include a cleaning tank for cleaning, a mechanism for adjusting the temperature of the cleaning agent in the cleaning agent tank, a heating tank or a distillation having a heating mechanism for generating steam by heating the cleaning agent. It consists of a tank and a water separation tank for removing moisture from the condensate obtained by condensing the generated steam. Vapor generated by heating by the heater of the heating tank or distillation tank is condensed by the cooling pipe, and the condensed liquid overflows in the order of the washing tank, heating tank or distillation tank after separating water in the water separation tank. If necessary, various mechanisms such as a pump for separating dirt components accumulated in the heating tank or the distillation tank, a filter, and a stationary tank using a difference in specific gravity can be installed.
本発明の洗浄工程における必須条件は、洗浄槽温度を25〜45℃、好ましくは30〜45℃又は25〜40℃、さらに好ましくは30〜40℃にコントロールすることである。この範囲においてHCFC225に匹敵する優れた洗浄性が得られる。 The essential condition in the washing step of the present invention is to control the washing tank temperature to 25 to 45 ° C, preferably 30 to 45 ° C or 25 to 40 ° C, more preferably 30 to 40 ° C. In this range, excellent detergency comparable to that of HCFC225 is obtained.
さらに、本発明に係る洗浄方法に必須の蒸気洗浄工程は、洗浄工程に続き、被洗浄物表面にわずかに残留する汚れ成分を、被洗浄物と蒸気との温度差によって被洗浄物表面で凝縮する液体で除去し洗浄する工程で、乾燥性し難い20℃における蒸気圧が1.33×103Pa未満の成分(b)を含む洗浄剤で洗浄する工程において、リンス工程のない洗浄方法を可能とし、洗浄現場における作業効率の大幅な改善が可能となると共に省スペースが可能となる。 Further, the steam cleaning process essential to the cleaning method according to the present invention is a process of condensing a slight amount of dirt components remaining on the surface of the object to be cleaned on the surface of the object to be cleaned due to a temperature difference between the object to be cleaned and the steam. A cleaning method without a rinsing step in a step of cleaning with a cleaning agent containing a component (b) having a vapor pressure at 20 ° C. of less than 1.33 × 10 3 Pa, which is difficult to dry in the step of cleaning with a liquid to be removed. This makes it possible to greatly improve the work efficiency at the cleaning site and to save space.
具体的な蒸気洗浄工程としては、被洗浄物表面に僅かに残留する汚れ成分を被洗浄物と蒸気との温度差によって被洗浄物表面で凝縮する液体で除去する蒸気洗浄するための機構を含む工程である。 The specific steam cleaning process includes a mechanism for steam cleaning that removes a slightly contaminated component remaining on the surface of the object to be cleaned with a liquid that condenses on the surface of the object to be cleaned due to a temperature difference between the object to be cleaned and the steam. It is a process.
本発明の蒸気洗浄工程における必須条件は、洗浄槽温度と蒸気ゾーン温度との温度差を10〜40℃、好ましくは15〜40℃又は10〜30℃、さらに好ましくは15〜30℃にコントロールすることである。この範囲において充分な凝縮液量により、高い蒸気洗浄が得られることでリンス工程のない洗浄方法が可能となる。 The essential condition in the steam cleaning step of the present invention is to control the temperature difference between the cleaning tank temperature and the steam zone temperature to 10 to 40 ° C, preferably 15 to 40 ° C or 10 to 30 ° C, more preferably 15 to 30 ° C. That is. A high steam cleaning can be obtained with a sufficient amount of condensate within this range, thereby enabling a cleaning method without a rinsing step.
本発明の洗浄方法に使用する洗浄剤に用いる20℃における蒸気圧が1.33×103Pa以上の非塩素系フッ素化合物(a)は、20℃における蒸気圧が1.33×103Pa以上あれば特に種類を問わないが、例えば、下記一般式(1)で特定される環状HFC、下記一般式(2)で特定される鎖状HFC、又は下記一般式(3)で特定されるHFEの、塩素原子を含まない、炭素原子、水素原子、酸素原子、フッ素原子からなる化合物、及びこれらの中から選ばれる2種以上の化合物の組み合わせ等を挙げることができる。 Chlorine-fluorine compound vapor pressure at 20 ° C. using a washing agent used for the cleaning method is not less than 1.33 × 10 3 Pa (a) of the present invention, the vapor pressure at 20 ° C. is 1.33 × 10 3 Pa The type is not particularly limited as long as it is above, but, for example, a cyclic HFC specified by the following general formula (1), a chain HFC specified by the following general formula (2), or specified by the following general formula (3) Examples include HFE compounds containing no chlorine atom, consisting of carbon atoms, hydrogen atoms, oxygen atoms, fluorine atoms, and combinations of two or more compounds selected from these.
CnH2n−mFm ・・・・・(1)
(式中、4≦n≦6、5≦m≦2n−1の整数を示す)
CxH2x+2−yFy ・・・・・(2)
(式中、4≦x≦6、5≦y≦12の整数を示す)
CsF2s+1OR ・・・・・(3)
(式中、4≦s≦6、Rは炭素数1〜3のアルキル基)
環状HFCの具体例としては3H,4H,4H−パーフルオロシクロブタン、4H,5H,5H−パーフルオロシクロペンタン(例えばゼオローラH(商品名))、5H,6H,6H−パーフルオロシクロヘキサン等を挙げることができる。鎖状HFCの具体例としては1H,2H−パーフルオロブタン、1H,3H−パーフルオロブタン、2H,3H−パーフルオロブタン、4H,4H−パーフルオロブタン、1H,1H,3H−パーフルオロブタン、1H,1H,4H−パーフルオロブタン、1H,2H,3H−パーフルオロブタン、1H,2H,3H,4H−パーフルオロブタン、2H,2H,4H,4H,4H−パーフルオロブタン(HFC365mfc)、1H,2H−パーフルオロペンタン、1H,4H−パーフルオロペンタン、2H,3H−パーフルオロペンタン(HFC43−10mee)、2H,4H−パーフルオロペンタン、2H,5H−パーフルオロペンタン、1H,2H,3H−パーフルオロペンタン、1H,3H,5H−パーフルオロペンタン、1H,5H,5H−パーフルオロペンタン、2H,2H,4H−パーフルオロペンタン、1H,2H,4H,5H−パーフルオロペンタン、1H,4H,5H,5H,5H−パーフルオロペンタン、1H,2H−パーフルオロヘキサン、2H,3H−パーフルオロヘキサン、2H,4H−パーフルオロヘキサン、2H,5H−パーフルオロヘキサン、3H,4H−パーフルオロヘキサン等を挙げることができる。HFEの具体例としてはメチルパーフルオロブチルエーテル、メチルパーフルオロイソブチルエーテル及びこれらの混合物(HFE7100)、メチルパーフルオロペンチルエーテル、メチルパーフルオロシクロヘキシルエーテル、エチルパーフルオロブチルエーテル、エチルパーフルオロイソブチルエーテル及びこれらの混合物(HFE7200)、エチルパーフルオロペンチルエーテル、及び1,1,2,2−テトラフルオロ−1−(2,2,2−トリフルオロエトキシ)エタン(HFE347pc−f)等を挙げることができる。
C n H 2n-m F m (1)
(In the formula, integers of 4 ≦ n ≦ 6, 5 ≦ m ≦ 2n−1 are shown)
C x H 2x + 2-y F y (2)
(In the formula, an integer of 4 ≦ x ≦ 6, 5 ≦ y ≦ 12 is shown)
C s F 2s + 1 OR (3)
(Wherein 4 ≦ s ≦ 6, R is an alkyl group having 1 to 3 carbon atoms)
Specific examples of the cyclic HFC include 3H, 4H, 4H-perfluorocyclobutane, 4H, 5H, 5H-perfluorocyclopentane (for example, Zeolora H (trade name)), 5H, 6H, 6H-perfluorocyclohexane, and the like. Can do. Specific examples of the chain HFC include 1H, 2H-perfluorobutane, 1H, 3H-perfluorobutane, 2H, 3H-perfluorobutane, 4H, 4H-perfluorobutane, 1H, 1H, 3H-perfluorobutane, 1H, 1H, 4H-perfluorobutane, 1H, 2H, 3H-perfluorobutane, 1H, 2H, 3H, 4H-perfluorobutane, 2H, 2H, 4H, 4H, 4H-perfluorobutane (HFC365mfc), 1H , 2H-perfluoropentane, 1H, 4H-perfluoropentane, 2H, 3H-perfluoropentane (HFC43-10mee), 2H, 4H-perfluoropentane, 2H, 5H-perfluoropentane, 1H, 2H, 3H- Perfluoropentane, 1H, 3H, 5H-perfluoropentane, 1H, H, 5H-perfluoropentane, 2H, 2H, 4H-perfluoropentane, 1H, 2H, 4H, 5H-perfluoropentane, 1H, 4H, 5H, 5H, 5H-perfluoropentane, 1H, 2H-perfluoro Examples include hexane, 2H, 3H-perfluorohexane, 2H, 4H-perfluorohexane, 2H, 5H-perfluorohexane, 3H, 4H-perfluorohexane, and the like. Specific examples of HFE include methyl perfluorobutyl ether, methyl perfluoroisobutyl ether and mixtures thereof (HFE7100), methyl perfluoropentyl ether, methyl perfluorocyclohexyl ether, ethyl perfluorobutyl ether, ethyl perfluoroisobutyl ether and mixtures thereof. (HFE7200), ethyl perfluoropentyl ether, 1,1,2,2-tetrafluoro-1- (2,2,2-trifluoroethoxy) ethane (HFE347pc-f), and the like.
これら(a)非塩素系フッ素化合物の中から選ばれる1種又は2種以上の化合物を組み合わせて用いることができるが、好ましくは地球温暖化係数の低いHFC又はHFEを挙げることができる。より好ましくは、HFC365mfc、4H,5H,5H−パーフルオロシクロペンタン(例えばゼオローラH(商品名))、メチルパーフルオロブチルエーテルとメチルパーフルオロイソブチルエーテル及びHFE7100、エチルパーフルオロブチルエーテルとエチルパーフルオロイソブチルエーテル及びHFE7200、HFE347pc−fを挙げることができる。さらに好ましくは引火点抑制効果に優れるメチルパーフルオロブチルエーテル、メチルパーフルオロイソブチルエーテル及びHFE7100や洗浄剤として適した汚れ溶解能を有するHFC365mfcを挙げることができる。特に洗浄剤を非引火性とするためには成分(a)である非塩素系フッ素化合物を含有する必要がある。 One or two or more compounds selected from these (a) non-chlorine fluorine compounds can be used in combination, preferably HFC or HFE having a low global warming potential. More preferably, HFC365mfc, 4H, 5H, 5H-perfluorocyclopentane (for example, Zeolora H (trade name)), methyl perfluorobutyl ether and methyl perfluoroisobutyl ether and HFE7100, ethyl perfluorobutyl ether and ethyl perfluoroisobutyl ether and HFE7200, HFE347pc-f can be mentioned. More preferably, mention may be made of methyl perfluorobutyl ether, methyl perfluoroisobutyl ether, HFE7100, and HFC365mfc having a soil dissolving ability suitable as a cleaning agent, which are excellent in flash point suppression effect. In particular, in order to make the cleaning agent non-flammable, it is necessary to contain a non-chlorine fluorine compound as component (a).
本発明の洗浄剤においては、加工油類、グリース類、ワックス類やフラックス類等のあらゆる汚れに対する洗浄力の向上及びリンス性の向上を目的に20℃における蒸気圧が1.33×103Pa未満の成分から選ばれる化合物(b)の一種、又は二種以上の組み合わせを使用する必要がある。例えば、種々の炭化水素類、アルコール類、ケトン類及びエーテル結合及び/又はエステル結合を有する有機化合物等の、各種汚れに対して良好な洗浄性を有し、且つ20℃における蒸気圧が1.33×103Pa未満の化合物である。成分(b)の蒸気圧が、この範囲にあるときに、本願発明に係る洗浄性に優れた洗浄剤が得られる。好ましくは、20℃において6.66×102Pa以下であり、さらに好ましくは1.33×102Pa以下である。以下、成分(b)を溶剤の種類ごとに例示する。 In the cleaning agent of the present invention, the vapor pressure at 20 ° C. is 1.33 × 10 3 Pa for the purpose of improving detergency and rinsing performance against all kinds of dirt such as processing oils, greases, waxes and fluxes. It is necessary to use one or a combination of two or more compounds (b) selected from less than components. For example, various hydrocarbons, alcohols, ketones, and organic compounds having an ether bond and / or an ester bond, etc. have a good detergency against various stains, and the vapor pressure at 20 ° C. is 1. It is a compound of less than 33 × 10 3 Pa. When the vapor pressure of the component (b) is within this range, a cleaning agent having excellent cleaning properties according to the present invention can be obtained. Preferably, it is 6.66 × 10 2 Pa or less at 20 ° C., and more preferably 1.33 × 10 2 Pa or less. Hereinafter, component (b) is illustrated for every kind of solvent.
炭化水素類の具体例としてはデカン、ウンデカン、ドデカン、トリデカン、テトラデカン、ペンタデカン、メンタン、ビシクロヘキシル、シクロドデカン、2,2,4,4,6,8,8−ヘプタメチルノナン等があげられ、アルコール類の具体例としてはn−ブタノール、イソブタノール、sec−ブタノール、イソアミルアルコール、n−ヘプタノール、n−オクタノール、n−ノナノール、n−デカノール、n−ウンデカノール、ベンジルアルコール、フルフリルアルコール、エチレングリコール、プロピレングリコール等が挙げられ、ケトン類の具体例としてはメチル−n−アミルケトン、ジイソブチルケトン、ジアセトンアルコール、ホロン、イソホロン、シクロヘキサノン、アセトフェノン等が挙げられる。エーテル結合を有する有機化合物とは、分子構造の中にエーテル結合(C−O−C)を少なくとも1個以上含有する化合物であり、エステル結合を有する有機化合物とは、分子構造の中にエステル結合(−COO−)を少なくとも1個以上含有する化合物である。具体例として、エーテル結合を有する化合物としては、エチレングリコールモノ−n−ヘキシルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ−n−プロピルエーテル、ジエチレングリコールモノ−i−プロピルエーテル、ジエチレングリコールモノ−n−ブチルエーテル、ジエチレングリコールモノ−i−ブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノ−n−プロピルエーテル、プロピレングリコールモノ−i−プロピルエーテル、プロピレングリコールモノ−n−ブチルエーテル、プロピレングリコールモノ−i−ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノ−n−プロピルエーテル、ジプロピレングリコールモノ−i−プロピルエーテル、ジプロピレングリコールモノ−n−ブチルエーテル、ジプロピレングリコールモノ−i−ブチルエーテル、トリプロピレングリコールモノメチルエーテル、3−メトキシブタノール、3−メチル−3−メトキシブタノール、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジ−n−ブチルエーテル、ジプロピレングリコールジメチルエーテル等を挙げることができる。エステル結合を有する化合物としては酢酸−n−ブチル、酢酸イソアミル、酢酸−2−エチルヘキシル、アセト酢酸メチル、アセト酢酸エチル、乳酸メチル、乳酸エチル、乳酸プロピル、乳酸ブチル、γ−ブチルラクトン、コハク酸ジメチル、グルタル酸ジメチル、アジピン酸ジメチル、ジエチレングリコールモノブチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノブチルエーテルアセテート、3−メチル−3−メトキシブチルアセテート等が挙げられる。
洗浄剤における成分(a)の割合は80〜95重量%、好ましくは80〜90重量%であり、成分(b)の割合は5〜20重量%、好ましくは10〜20重量%である。この範囲において、充分な洗浄性、乾燥性及び非引火性が得られる。
Specific examples of hydrocarbons include decane, undecane, dodecane, tridecane, tetradecane, pentadecane, menthane, bicyclohexyl, cyclododecane, 2,2,4,4,6,8,8-heptamethylnonane, and the like. Specific examples of alcohols include n-butanol, isobutanol, sec-butanol, isoamyl alcohol, n-heptanol, n-octanol, n-nonanol, n-decanol, n-undecanol, benzyl alcohol, furfuryl alcohol, ethylene glycol Propylene glycol and the like, and specific examples of ketones include methyl-n-amyl ketone, diisobutyl ketone, diacetone alcohol, phorone, isophorone, cyclohexanone, acetophenone, and the like. An organic compound having an ether bond is a compound containing at least one ether bond (C—O—C) in the molecular structure, and an organic compound having an ester bond is an ester bond in the molecular structure. It is a compound containing at least one (—COO—). Specific examples of the compound having an ether bond include ethylene glycol mono-n-hexyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-i-propyl ether, diethylene glycol mono-n. -Butyl ether, diethylene glycol mono-i-butyl ether, propylene glycol monomethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-i-propyl ether, propylene glycol mono-n-butyl ether, propylene glycol mono-i-butyl ether, di Propylene glycol monomethyl ether, dipropylene glycol mono-n- Propyl ether, dipropylene glycol mono-i-propyl ether, dipropylene glycol mono-n-butyl ether, dipropylene glycol mono-i-butyl ether, tripropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, Examples include diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol di-n-butyl ether, and dipropylene glycol dimethyl ether. Compounds having an ester bond include: n-butyl acetate, isoamyl acetate, 2-ethylhexyl acetate, methyl acetoacetate, ethyl acetoacetate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, γ-butyllactone, dimethyl succinate Dimethyl glutarate, dimethyl adipate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monobutyl ether acetate, 3-methyl-3-methoxybutyl acetate and the like.
The proportion of component (a) in the cleaning agent is 80 to 95% by weight, preferably 80 to 90% by weight, and the proportion of component (b) is 5 to 20% by weight, preferably 10 to 20% by weight. In this range, sufficient cleaning properties, drying properties and non-flammability can be obtained.
本発明の洗浄剤には、必要に応じて本願の効果を損ねない範囲で各種助剤、例えば,界面活性剤、安定剤、消泡剤、紫外線吸収剤等を必要に応じて添加しても良い。 In the cleaning agent of the present invention, various auxiliary agents such as surfactants, stabilizers, antifoaming agents, ultraviolet absorbers and the like may be added as necessary as long as the effects of the present application are not impaired. good.
以下に本発明の洗浄剤に添加できる添加剤の具体例を例示する。 Specific examples of additives that can be added to the cleaning agent of the present invention are shown below.
界面活性剤としては、アニオン系界面活性剤、カチオン系界面活性剤、ノニオン系界面活性剤及び両性界面活性剤を添加しても良い。アニオン系界面活性剤としては、炭素数が6〜20の脂肪酸、ドデシルベンゼンスルホン酸等のアルカリ金属、アルカノールアミン及びアミン塩等が挙げられる。カチオン系界面活性剤としては、第4級アンモニウム塩等が挙げられる。ノニオン系界面活性剤としては、アルキルフェノール、炭素数が8〜18の直鎖又は分岐の脂肪族アルコールのエチレンオキサイド付加物、ポリエチレンオキサイドポリプロピレンオキサイドのブロックポリマー等が挙げられる。両性界面活性剤としては、ベタイン型、アミノ酸型等が挙げられる。 As the surfactant, an anionic surfactant, a cationic surfactant, a nonionic surfactant, and an amphoteric surfactant may be added. Examples of the anionic surfactant include fatty acids having 6 to 20 carbon atoms, alkali metals such as dodecylbenzenesulfonic acid, alkanolamines and amine salts. Examples of the cationic surfactant include quaternary ammonium salts. Examples of nonionic surfactants include alkylphenols, ethylene oxide adducts of linear or branched aliphatic alcohols having 8 to 18 carbon atoms, and block polymers of polyethylene oxide polypropylene oxide. Examples of amphoteric surfactants include betaine type and amino acid type.
金属の腐食、発錆及び変色を抑制するための安定剤としてはニトロメタン、ニトロエタン等のニトロアルカン類、1,2−ブチレンオキサイド等のエポキシド類、1,4−ジオキサン等のエーテル類、トリエタノールアミン等のアミン類、1,2,3−ベンゾトリアゾール類等が挙げられる。 Stabilizers for inhibiting metal corrosion, rusting and discoloration include nitroalkanes such as nitromethane and nitroethane, epoxides such as 1,2-butylene oxide, ethers such as 1,4-dioxane, and triethanolamine And the like, 1,2,3-benzotriazoles and the like.
消泡剤としては、自己乳化シリコーン、シリコン、脂肪酸、高級アルコール、ポリプロピレングリコールポリエチレングリコール及びフッ素系界面活性剤等が挙げられる。 Examples of the antifoaming agent include self-emulsifying silicone, silicon, fatty acid, higher alcohol, polypropylene glycol polyethylene glycol, and fluorine-based surfactant.
洗浄工程には洗浄性を向上することを目的とした浸漬、揺動、振動、液中噴流及び超音波等の物理的な方法を組み合わせることにより、効果的な洗浄が可能となる。蒸気洗浄工程では、洗浄剤の蒸気を発生させるための加熱機構を有する加熱槽で発生した蒸気が洗浄装置内で液体や気体に状態変化しながら循環することによって連続的に汚れ成分と分離され、蒸気ゾーンにおいて清浄度の高い凝縮液による蒸気洗浄が可能となる。 The cleaning process can be effectively cleaned by combining physical methods such as immersion, rocking, vibration, submerged jet, and ultrasonic waves for the purpose of improving the cleaning performance. In the steam cleaning process, the steam generated in the heating tank having a heating mechanism for generating the steam of the cleaning agent is continuously separated from the soil component by circulating while changing the state into a liquid or gas in the cleaning device, Steam cleaning with a highly clean condensate is possible in the steam zone.
本発明の洗浄方法は洗浄剤により被洗浄物表面の汚れ成分を除去すると共に、後工程における洗浄剤を加熱して得られる凝縮液による蒸気洗浄により、リンス工程のない優れた洗浄方法と言える。 The cleaning method of the present invention can be said to be an excellent cleaning method without a rinsing step by removing the dirt component on the surface of the object to be cleaned with the cleaning agent and steam cleaning with a condensate obtained by heating the cleaning agent in the subsequent step.
具体的な洗浄方法及び洗浄装置を添付図面によって説明する。
本発明の洗浄装置では、主に洗浄剤に含まれる蒸気圧の高い成分(a)とわずかに含まれる成分(b)が洗浄装置内で液体や気体に状態変化させながら循環することによって、被洗浄物に付着しているわずかに残留している可能性の有る汚れ成分を蒸気洗浄することができる。図1は本発明の態様(5)に記載の洗浄装置の一例である。主な構造として洗浄液を入れる洗浄槽1及び加熱槽2、洗浄剤の蒸気に満たされる蒸気ゾーン3、蒸発した洗浄剤を冷却管4によって凝縮し、凝縮した液と冷却管に付着した水とを静置分離するための水分離槽5,洗浄剤を洗浄槽1と加熱槽2との間で循環するための機構6,7とからなる。実際の洗浄においては被洗浄物を専用のジグやカゴ等に入れて、洗浄装置内を洗浄槽1、蒸気ゾーン3の順に通過させながら洗浄を完了させる。
A specific cleaning method and cleaning apparatus will be described with reference to the accompanying drawings.
In the cleaning device of the present invention, the component (a) having a high vapor pressure contained in the cleaning agent and the component (b) slightly contained in the cleaning agent are circulated while changing the state into a liquid or gas in the cleaning device, thereby It is possible to perform a steam cleaning of a slightly contaminated soil component adhering to the cleaning object. FIG. 1 is an example of the cleaning apparatus according to the aspect (5) of the present invention. The cleaning tank 1 and the
洗浄槽1では、冷却管8により一定温度にコントロールしながら被洗浄物に付着した汚れを超音波9で洗浄除去する。この時、物理的な力としては揺動や洗浄剤の液中噴流等のこれまでの洗浄機に採用されている物理的な力であれば、いかなる方法を使用しても良い。
In the cleaning tank 1, dirt attached to the object to be cleaned is cleaned and removed by the
蒸気ゾーン3では、主に本発明の洗浄剤に含まれる蒸気圧の高い成分(a)の蒸気とわずかに含まれる成分(b)の蒸気を冷却管4で凝縮させ水分離槽5に集め冷却管10により凝縮液の液温を下げた後、凝縮液は、水分離槽5に集められた後、配管11から洗浄槽1に入り、オーバーフローして矢印12のように加熱槽2に入り、ヒーター13で加熱され、その組成の一部又は全部が蒸気となって矢印14のように冷却管4で凝縮された後、配管15から水分離槽5に戻る。
In the steam zone 3, the steam of the component (a) having a high steam pressure and the steam of the component (b) slightly contained in the cleaning agent of the present invention are condensed in the cooling pipe 4 and collected in the water separation tank 5 for cooling. After the temperature of the condensate is lowered by the pipe 10, the condensate is collected in the water separation tank 5 and then enters the washing tank 1 from the
加熱槽2で発生した蒸気に満たされた蒸気ゾーン3で行う蒸気洗浄は、被洗浄物表面で蒸気が凝縮することによりできた液中に汚れ成分が全く含まれないので、洗浄工程最後の仕上げ洗浄として有効である。
In the steam cleaning performed in the steam zone 3 filled with the steam generated in the
洗浄槽1と加熱槽2との間で洗浄剤を循環するための機構6,7は、洗浄剤を加熱槽2から配管7を通って循環ポンプ6で洗浄槽1に送液し、洗浄槽1からオーバーフローして矢印12のように加熱槽2に戻すことによって、洗浄槽1と加熱槽2の洗浄剤組成を常に同一に保ち、洗浄槽1における洗浄剤の組成変動を抑制し、安定した洗浄性を得ることができる。
The
本発明を実施例に基づいて説明する。なお、洗浄方法及び洗浄装置による効果は以下のようにして測定、評価した。
(1)実機洗浄試験
図1に示す洗浄装置の洗浄槽1、蒸留槽2、水分離槽5に洗浄剤を入れ、蒸留槽2の洗浄剤をヒーター13により加熱沸騰させ、金属加工油が付着した被洗浄物を洗浄槽1、蒸気ゾーン3の順に移動して、脱脂洗浄性について、以下の操作及び洗浄条件により測定した。
1)浸漬洗浄条件
洗浄槽1:30秒、液量4.8L、超音波/45kHz、80W
2)蒸気洗浄条件
蒸気ゾーン3:30秒、蒸留槽2(液量4.0L)の洗浄剤を加熱して得られる蒸気により蒸気洗浄する。
The present invention will be described based on examples. The effects of the cleaning method and the cleaning apparatus were measured and evaluated as follows.
(1) Actual machine cleaning test A cleaning agent is put into the cleaning tank 1,
1) Immersion cleaning conditions Cleaning tank 1:30 seconds, liquid volume 4.8L, ultrasonic wave / 45kHz, 80W
2) Steam cleaning conditions Steam zone 3: 30 seconds, steam cleaning is performed with steam obtained by heating the cleaning agent in the distillation tank 2 (liquid amount: 4.0 L).
脱脂洗浄性は、洗浄した部品表面に残留する加工油を油分測定装置(OIL−20、セントラル科学(株)製)で残存油分量を測定する。評価は以下の基準により評価する。 In the degreasing and cleaning property, the remaining oil content is measured by using an oil content measuring device (OIL-20, manufactured by Central Science Co., Ltd.) for the processing oil remaining on the cleaned part surface. Evaluation is based on the following criteria.
◎:10μg/cm2未満
○:10μg/cm2以上〜20μg/cm2未満
×:20μg/cm2以上
試験に用いた金属加工油:
KZ216(商品名:カットアーバス、ユシロ化学工業(株)製)
D311(商品名:ダイラスト、大同化学工業(株)製)
YM358(商品名:カットアーバス、ユシロ化学工業(株)製)
[実施例1〜10]
表1に記載の組成で各成分を混合し目的の洗浄剤を得た。洗浄剤を用いて表1に記載の温度条件で上記実機洗浄試験を行ない、結果を表1にまとめた。成分(a)と成分(b)を含む洗浄剤により、洗浄槽温度25〜45℃、洗浄槽温度と蒸気ゾーンとの温度差を10〜40℃の条件で洗浄することで、リンス工程がない洗浄方法及び洗浄装置により優れた脱脂洗浄性が得られた。
[比較例1、2]
表1に記載の洗浄剤及び試験条件で上記実機洗浄試験を行ない、結果を表1にまとめた。成分(b)を全く含まないために十分な脱脂洗浄性が得られなかった。
[比較例3〜7]
表1に記載の洗浄剤及び試験条件で上記実機洗浄試験を行ない、結果を表1にまとめた。洗浄槽の温度と蒸気により洗浄するゾーンの温度の差が10℃未満のため、被洗浄物表面での凝縮液量が少ないために充分な脱脂洗浄性が得られなかった。
◎: less than 10μg / cm 2 ○: 10μg /
KZ216 (trade name: Cut Arbus, manufactured by Yushiro Chemical Industry Co., Ltd.)
D311 (Brand name: Da illustration, manufactured by Daido Chemical Industry Co., Ltd.)
YM358 (trade name: Cut Arbus, manufactured by Yushiro Chemical Industry Co., Ltd.)
[Examples 1 to 10]
Each component was mixed with the composition shown in Table 1 to obtain a desired cleaning agent. The actual machine cleaning test was performed under the temperature conditions described in Table 1 using the cleaning agent, and the results are summarized in Table 1. By the cleaning agent containing the component (a) and the component (b), there is no rinsing step by cleaning the cleaning bath temperature at 25 to 45 ° C. and the temperature difference between the cleaning bath temperature and the steam zone at 10 to 40 ° C. Excellent degreasing performance was obtained by the cleaning method and the cleaning apparatus.
[Comparative Examples 1 and 2]
The actual machine cleaning test was performed with the cleaning agents and test conditions described in Table 1, and the results are summarized in Table 1. Since the component (b) was not contained at all, sufficient degreasing and detergency was not obtained.
[Comparative Examples 3 to 7]
The actual machine cleaning test was performed with the cleaning agents and test conditions described in Table 1, and the results are summarized in Table 1. Since the difference between the temperature of the cleaning tank and the temperature of the zone to be cleaned with steam was less than 10 ° C., the amount of condensate on the surface of the object to be cleaned was small, so that sufficient degreasing and cleaning performance could not be obtained.
本発明の洗浄方法及び洗浄措置は、精密機械部品、光学機械部品等の加工時に使用される種々の加工油類やグリース類やワックス類、電気電子部品のハンダ付け時に使用されるフラックス類、基板製造時に使用されるスクリーンに付着したインキやペースト類及び樹脂吐出装置のミキシング部に付着した樹脂類を洗浄する洗浄分野で好適に利用できる。 The cleaning method and cleaning measures of the present invention include various processing oils and greases and waxes used when processing precision machine parts and optical machine parts, fluxes and boards used when soldering electrical and electronic parts, and substrates. It can be suitably used in the cleaning field for cleaning ink and paste attached to a screen used at the time of production and resins attached to a mixing portion of a resin discharge device.
1 洗浄槽
2 加熱槽
3 蒸気ゾーン
4 冷却管
5 水分離槽
6 循環ポンプ
7 洗浄剤用配管
8 冷却管
9 超音波
10 冷却管
11 凝縮液用配管
12 洗浄剤の流れ
13 ヒーター
14 蒸気の流れ
15 凝縮用配管
DESCRIPTION OF SYMBOLS 1
Claims (6)
前記洗浄剤を加熱して得られる蒸気により洗浄する工程を含み、かつ
被洗浄物に付着した洗浄剤をリンスする工程を有さない洗浄方法において、
前記洗浄槽の温度が25〜45℃、洗浄槽の温度と蒸気により洗浄するゾーンの温度の差が10〜40℃であることを特徴とする洗浄方法。 (A) 80 to 95% by weight of a non-chlorine fluorine compound having a vapor pressure at 20 ° C. of 1.33 × 10 3 Pa or higher, (b) Component 5 having a vapor pressure at 20 ° C. of less than 1.33 × 10 3 Pa A step of washing in a washing tank with a cleaning agent containing ~ 20% by weight, and
In a cleaning method including a step of cleaning with a steam obtained by heating the cleaning agent, and not having a step of rinsing the cleaning agent attached to an object to be cleaned.
The temperature of the said washing tank is 25-45 degreeC, The difference of the temperature of the zone wash | cleaned with the temperature of a washing tank and a vapor | steam is 10-40 degreeC, The cleaning method characterized by the above-mentioned.
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