JP5429175B2 - Semiconductor light receiving element and manufacturing method thereof - Google Patents

Description

  The present invention relates to a semiconductor light receiving element such as a photodiode and a method for manufacturing the same.

  In recent years, with the increase in the speed of optical fiber communication systems and the increase in the amount of communication information, high speed operation and high reliability of semiconductor light receiving elements such as photodiodes are required. If the light receiving element is formed on an electrically insulating or semi-insulating substrate, the element capacity is reduced and high-speed response characteristics can be realized. A photodiode having this type of element structure is disclosed in, for example, Japanese Patent Application Laid-Open No. 2005-328036 and Japanese Patent Application Laid-Open No. 2005-129789.

  For example, the photodiode disclosed in Patent Document 2 has an n-type high-concentration carrier layer, an n-type light absorption layer, an n-type cap layer, and a p-type light receiving region on the main surface of the semi-insulating substrate. It has a laminated structure that is laminated in order. Further, the p-side contact electrode is formed so as to be electrically connected to the p-type light receiving region. Since this photodiode has a mesa structure (structure having a trapezoidal cross section), the n-side contact electrode is formed so as to be electrically connected to the n-type high-concentration carrier layer through the side surface of the mesa structure.

  Prior art documents relating to photodiodes include Patent Document 3 (Japanese Patent Laid-Open No. 2001-298211) and Patent Document 4 (Japanese Patent Laid-Open No. 2003-197953) in addition to the aforementioned Patent Document 1 and Patent Document 2. .

JP 2005-328036 A JP 2005-129789 A JP 2001-298211 A JP 2003-197953 A

  When a photodiode having a mesa structure including a light absorption layer is manufactured, the side surface of the mesa structure is not smooth, which may deteriorate the device characteristics without uniforming the thickness of the protective film. The main reason why the side surface of the mesa structure is not smooth is that when the mesa structure is formed by etching, the amount of lateral etching (side etching) differs between the light absorption layer and the adjacent layer.

  FIG. 1 is a schematic cross-sectional view showing the structure of a semiconductor light receiving element 100 having a mesa structure. In this semiconductor light receiving element 100, an n-type buffer layer 102, an n-type etching stop layer 103 and a mesa structure 108 are stacked on a semi-insulating substrate 101. The mesa structure 108 has a structure in which an n-type buffer layer 104, a light absorption layer 105, a p-type buffer layer 106, and a p-type contact layer 107 are laminated in this order. A protective film (passivation film) 120 is formed so as to cover the entire mesa structure 108, and the p-side electrode 121 is in contact with the upper surface of the p-type contact layer 107 through the opening of the protective film 120. Is formed. On the other hand, at the base end portion of the mesa structure 108, the annular electrode portion of the n-side electrode 122 is formed so as to be in contact with the n-type etching stop layer 103 through the opening of the protective film 120, thereby forming the contact region 111. Yes.

  The mesa structure 108 is formed by processing a crystal structure epitaxially grown on the semi-insulating substrate 101 by etching using a mask. Here, the n-type etching stop layer 103 functions as an etching stopper having an etching rate several times slower than the etching rate of the constituent material of the mesa structure 108. Therefore, the progress of etching can be stopped by the n-type etching stop layer 103. However, as shown in FIG. 1, the side wall of the mesa structure 108 is smoothed due to the difference in the amount of side etching between the light absorption layer 105 and the n-type buffer layer 104 and the p-type buffer layer 106 adjacent thereto. Don't be. For example, using different materials, a first semiconductor layer 906, a second semiconductor layer 905, a third semiconductor layer 904, a fourth semiconductor layer 903, and a fifth semiconductor layer 906 are formed over a substrate 907 as shown in FIG. When the mesa structure 108 is formed with an etching solution having a selective ratio by stacking five layers including the semiconductor layer 902 using the mask 901, the shape of the mesa side wall is different in the amount of side etching due to different materials. A level difference is generated according to 910. Even when the mesa structure is formed of the same material, the side etching amount differs depending on whether the mesa structure is disposed on the top of the mesa structure or in the vicinity of the substrate 907. Therefore, in particular, a side wall of a material with a large side etching amount laminated immediately below a material with a small side etching amount has a significant difference in the side etching amount, and the upper layer protrudes like a eave. When the protective film 908 is formed on the mesa structure formed in this manner, depending on the film formation method, if there is directivity in the material supply and film formation direction, the protective film is uniformly applied on the surface. It is difficult to form (911 in FIG. 10). In particular, when directivity is recognized in the material supply as in the case of plasma CVD, these influences are large, and as shown in FIG. 10, the film thickness becomes thinner in the vicinity of the eaves than other regions. The composition is shifted and the thickness of the protective film 120 is not uniform. This deteriorates the element characteristics of the semiconductor light receiving element 100 and decreases the yield. When the p-type buffer layer 106 protrudes like an eave, the film thickness of the protective film 120 is not uniform at the boundary 115 between the light absorption layer 105 and the p-type buffer layer 106 on the light absorption layer 105. The problem of deterioration of device characteristics becomes more serious.

  FIG. 2 is a schematic cross-sectional view showing the structure of a semiconductor light receiving element 200 having another mesa structure. In this semiconductor light receiving element 200, an n-type buffer layer 202 and a mesa structure 203 are stacked on a semi-insulating substrate 201. The mesa structure 203 has a structure in which an n-type buffer layer 204, a light absorption layer 205, a p-type buffer layer 206, and a p-type contact layer 207 are laminated in this order. A protective film (passivation film) 220 is formed so as to cover the entire mesa structure 203, and the p-side electrode 221 is in contact with the upper surface of the p-type contact layer 207 through the opening of the protective film 220. Is formed. On the other hand, an n-side electrode 222 is formed in an annular groove surrounding the mesa structure 203. The n-side electrode 222 is electrically connected to the mesa structure 203 through the n-type buffer layer 202. Note that an AR coating 225 which is an antireflection film is provided on the back surface of the substrate 201.

  The mesa structure 203 is formed by etching a crystal structure epitaxially grown on the semi-insulating substrate 201 using a mask to form an annular groove. Here, the crystal structure to be etched is composed of a plurality of crystal layers having different compositions, but since the etching conditions are selected such that the etching rates of these crystal layers are approximately the same, these crystal layers are not selected with respect to the etching rate. Etching (hereinafter referred to as “non-selective etching”). If such non-selective etching is used, the side walls of the mesa structure 203 can be smoothed as shown in FIG.

  Since the n-side electrode 222 must be electrically connected to the mesa structure 203 via the n-type buffer layer 202, it is necessary to keep the deepest portion of the annular groove portion in the middle of the n-type buffer layer 202. Therefore, in order to improve the yield, as shown in FIG. 2, it is necessary to relatively increase the thickness of the n-type buffer layer 202 and to control the etching time with high accuracy. However, when the n-type buffer layer 202 is thickened, an increase in epitaxial crystal growth time and an increase in the consumption of raw materials occur, resulting in an increase in manufacturing cost. On the other hand, if the n-type buffer layer 202 is made thinner, the allowable range of etching conditions for avoiding over-etching is narrowed, and it is necessary to find the optimum etching conditions and test the conditions. Cost increases. Therefore, the minimum thickness considering the manufacturing cost is strictly present in the thickness of the n-type buffer layer 202.

  In view of the above, an object of the present invention is to provide a semiconductor light-receiving element having a mesa structure on an insulating or semi-insulating substrate and having a configuration capable of avoiding deterioration of element characteristics. is there.

  Another object of the present invention is a method for manufacturing a semiconductor light-receiving element having a mesa structure on an insulating or semi-insulating substrate, which can avoid deterioration of element characteristics without increasing the manufacturing cost. It is to provide a manufacturing method.

  According to the present invention, an electrically semi-insulating or insulating substrate, a first conductivity type first buffer layer formed on a main surface of the substrate, and a first buffer layer formed on the first buffer layer. And a light absorbing layer that generates electron-hole pairs in response to incident light, an etching stop layer formed on the light absorbing layer, a first conductivity type formed on the etching stop layer, and Is a second buffer layer of the opposite second conductivity type, a first electrode electrically connected to the first buffer layer, a second electrode electrically connected to the second buffer layer, and the first electrode There is provided a semiconductor light receiving element comprising: 1 buffer layer; a protective film covering the light absorption layer and the second buffer layer. In this semiconductor light receiving element, at least the second buffer layer constitutes a first mesa structure, and the first buffer layer, the light absorption layer, and the etching stop layer are formed immediately below the first mesa structure. The mesa structure of 2 is comprised, The planar view area | region of the said 2nd mesa structure includes the planar view area | region of the said 1st mesa structure, and is wider than the planar view area | region of the said 1st mesa structure .

  According to the present invention, the first buffer layer of the first conductivity type on the main surface of the electrically semi-insulating or insulating substrate and the light absorption that generates electron-hole pairs in response to incident light. Laminating a layer and an etching stop layer in this order; and forming a laminated structure including a second buffer layer of a second conductivity type opposite to the first conductivity type on the etching stop layer; Forming the first mesa structure by selectively etching the stacked structure using the etching stop layer as an etching stopper; and etching the etching stop layer, the light absorption layer, and the first buffer layer Thereby forming a second mesa structure, forming a first electrode electrically connected to the first buffer layer at an end of the second mesa structure, and the second buffer layer The method of manufacturing a semiconductor light receiving device comprising: a step, a of the second electrode is formed on the first mesa structure on which is electrically connected is provided.

  As described above, the semiconductor light receiving element according to the present invention can make the film thickness of the protective film covering the first mesa structure uniform, and the photoelectric conversion region is located away from the outer peripheral edge of the second mesa structure. It has a configuration that can be provided. Therefore, it is possible to provide a semiconductor light-receiving element that can realize high reliability and yield improvement.

  According to the method of manufacturing a semiconductor light receiving element according to the present invention, the thickness of the protective film covering the first mesa structure can be made uniform, and if the etching conditions are optimized, the second mesa structure is covered. The thickness of the protective film can also be made uniform. In addition, it is possible to ensure electrical connection between the second electrode and the second buffer layer. Therefore, it is possible to provide a method for manufacturing a semiconductor light receiving element capable of avoiding deterioration of element characteristics without increasing manufacturing cost and realizing high reliability, yield improvement, and cost reduction.

  The above-described object and other objects, features, and advantages will become more apparent from the preferred embodiments described below and the accompanying drawings.

It is a schematic sectional drawing which shows the structure of the semiconductor light receiving element which has a mesa structure. It is a schematic sectional drawing which shows the structure of the semiconductor light receiving element which has another mesa structure. 1 is a perspective view schematically showing an external appearance of a semiconductor light receiving element according to a first embodiment of the present invention. FIG. 4 is a schematic cross-sectional view taken along line 4a-4a of the semiconductor light receiving element of FIG. It is a perspective view which shows roughly the external appearance of the semiconductor light receiving element of 2nd Embodiment which concerns on this invention. FIG. 6 is a schematic cross-sectional view of the semiconductor light receiving element of FIG. 5 taken along line 6a-6a. It is a perspective view which shows roughly the external appearance of the semiconductor light receiving element of 3rd Embodiment which concerns on this invention. It is a schematic sectional drawing in alignment with the 8a-8a line | wire of the semiconductor light receiving element of FIG. It is a figure explaining a related technique. It is a figure explaining a related technique.

  Embodiments according to the present invention will be described below with reference to the drawings. In all the drawings, the same components are denoted by the same reference numerals, and detailed description thereof is appropriately omitted so as not to overlap.

(First embodiment)
FIG. 3 is a perspective view schematically showing the appearance of the semiconductor light receiving element 10 of the first embodiment according to the present invention, and FIG. 4 is a schematic view taken along the line 4a-4a of the semiconductor light receiving element 10 of FIG. It is sectional drawing.

  As shown in FIG. 4, the semiconductor light receiving element 10 includes first conductive type (n-type) buffer layers 12 and 14 formed on the main surface of a substrate 11 that is electrically semi-insulating or insulating. Have. A light absorption layer 15 that generates electron-hole pairs in response to incident light is formed on the buffer layer 14, and the first absorption stop layer 18 is interposed on the light absorption layer 15 via the i-type etching stop layer 18. A first mesa structure 31 including a buffer layer 16 of a second conductivity type (p-type) opposite to the one conductivity type is formed. A protective film (passivation film) 20 is formed so as to cover the light absorption layer 15, the i-type etching stop layer 18, and the first mesa structure 31. The n-side electrode 22 is formed so as to be electrically connected to the buffer layer 12, and the p-side electrode 21 is electrically connected to the p-type buffer layer 16 on the first mesa structure 31. Is formed. With such a configuration, a pin junction is formed between the p-side electrode 21 and the n-side electrode 22.

The first mesa structure 31 has a structure in which the i-type buffer layer 23, the p-type buffer layer 16, and the p-type contact layer 17 are stacked in this order on the i-type etching stop layer 18. The i-type etching stop layer 18 is an intrinsic semiconductor layer interposed between the light absorption layer 15 and the i-type buffer layer 23 or a semiconductor layer having a carrier concentration close to non-doping. Specifically, the carrier concentration of the i-type etching stop layer 18 is 1E16 cm ⁻³ or less. In this way, when a reverse bias is applied between the p-side electrode 21 and the n-side electrode 22, a voltage is applied to the light absorption layer 15, and only the portion immediately below the first mesa structure 31 absorbs light. The converted signal can be converted to an electrical signal at high speed. When the substrate 11 is an InP substrate, the i-type etching stop layer 18 has an In (1-x) Ga (x) As (y) P (1-y) (0 ≦ x ≦ 0.48) lattice-matched to InP. , 0 ≦ y ≦ 1), and In (1-p−) lattice-matches the semiconductor layers (p-type buffer layer 16, p-type contact layer 17 and i-type buffer layer 23) constituting the first mesa structure to InP. q) Ga (p) Al (q) As (0 ≦ p ≦ 0.48, 0 ≦ q ≦ 0.48) is preferable. At this time, as a material of these semiconductor layers, it is more preferable to select a composition ratio so that the band gap of each semiconductor is larger than the signal light (˜1.2 μm). Specifically, in the i-type etching stop layer 18, it is more preferable that the Ga composition is 20% or less and the As composition is 44% or less. By doing so, the i-type etching stop layer 18 has an etching rate several times slower than the etching rate of the constituent material of the first mesa structure 31 during the etching process of the first mesa structure 31. It can function as an etching stopper.

  As shown in FIG. 4, the stacked structure including the buffer layers 12, 14, the light absorption layer 15, and the i-type etching stop layer 18 constitutes a second mesa structure immediately below the first mesa structure 31. . The n-side electrode 22 is electrically connected to the buffer layer 12 in the contact area CA at the outer peripheral end of the second mesa structure.

  As shown in FIGS. 3 and 4, the second mesa structure includes a light receiving portion A1, a connecting portion A2, and an electrode pad portion A3. The light receiving part A1 is located immediately below the first mesa structure 31, and the planar view area (area occupied by the planar view shape) of the light receiving part A1 includes the planar view area of the first mesa structure 31. Yes. On the other hand, the electrode pad portion A3 is formed away from the first mesa structure 31 in the in-plane direction of the substrate 11, and the n-side electrode 22 is formed on the entire surface including the end portion of the electrode pad portion A3. A film is formed.

  The connection portion A2 has an elongated shape having a longitudinal direction in the in-plane direction of the substrate 11, and connects the electrode pad portion A3 and the light receiving portion A1 in the in-plane direction of the substrate 11. The outer peripheral end of the light receiving portion A1 is continuously connected to one end in the longitudinal direction of the connection portion A2, and the outer peripheral end of the electrode pad portion A3 is continuously connected to the other end in the longitudinal direction of the connection portion A2. As shown in FIG. 3, the connection portion A2, the light receiving portion A1, and the electrode pad portion A3 have a dumbbell shape.

  Further, as shown in FIG. 3, the planar view region of the second mesa structure including the light receiving portion A1, the connection portion A2, and the electrode pad portion A3 includes the planar view region of the first mesa structure 31, and It is wider than the planar view region of the first mesa structure 31. Therefore, there is a step between the outer peripheral end of the first mesa structure 31 and the outer peripheral end of the second mesa structure, and the light receiving unit A1 of the second mesa structure has an outer periphery of the first mesa structure 31. It has an overhanging portion 32 with respect to the end.

  The manufacturing method of the semiconductor light receiving element 10 having the above configuration includes the following basic steps (a) to (f).

(A) A first conductivity type (n-type) first buffer layer and an electron / hole pair are generated on the main surface of the electrically insulative or insulating substrate 11 according to incident light. A step of laminating a light absorption layer and an i-type etching stop layer in this order.
(B) forming a stacked structure including a second buffer layer of a second conductivity type (p-type) opposite to the first conductivity type on the i-type etching stop layer;
(C) A step of forming the first mesa structure 31 shown in FIG. 4 by selectively etching the stacked structure using the i-type etching stop layer as an etching stopper.
(D) Etching the i-type etching stop layer, the light absorption layer, and the first buffer layer to process the buffer layers 12, 14, the light absorption layer 15, and the i-type etching stop processed as shown in FIG. Forming a second mesa structure comprising layer 18;
(E) A step of forming the n-side electrode 22 electrically connected to the buffer layer 12 at the end of the second mesa structure.
(F) A step of forming the p-side electrode 21 electrically connected to the buffer layer 16 on the first mesa structure 31.

  Hereinafter, a preferred method for manufacturing the semiconductor light receiving element 10 will be described in more detail.

  As the substrate 11, for example, a group III-V compound semiconductor substrate doped with iron (Fe) such as a GaAs substrate or an InP substrate may be used. Alternatively, an InP substrate or a GaAs substrate into which impurities are introduced so as to have a semi-insulating property can be used as the substrate 11. On this substrate 11, buffer layers 12 and 14, a light absorption layer 15, an i-type etching stop layer 18, an i-type buffer layer 23, by molecular beam epitaxy (MBE) or metal organic vapor phase epitaxy (MOVPE). Crystal layers constituting the p-type buffer layer 16 and the p-type contact layer 17 are sequentially epitaxially grown (steps (a) to (b)). Examples of the constituent material of these epitaxial crystal layers include InP, GaInP, AlInP, AlGaInP, InGaAs, InAlAs, InAlGaAs, and InGaAsP. As the constituent material of the light absorption layer 15, a material having a band gap smaller than the energy corresponding to the wavelength of the signal light incident on the semiconductor light receiving element 10 may be used.

  Specifically, an InP substrate doped with Fe as the substrate 41, an n-type InP layer as the n-type buffer layers 12 and 14, an undoped i-type InGaAs layer as the light absorption layer 15, and an i-type etching stop layer 18 are used. A non-doped InP layer, an i-type InAlAs layer as the i-type buffer layer 23, a p-type InAlAs layer as the p-type buffer layer 16, and a p-type InGaAs layer as the p-type contact layer 17 can be used. What is necessary is just to produce the thickness of the n-type buffer layer 12 by 0.1 micrometer or more and 2 micrometers or less. From the viewpoint of reducing the resistance and improving the production efficiency, it is more preferable to produce the film at 0.2 μm or more and 1 μm or less. The thickness of the light absorption layer 15 should just be in the range of about 0.1 micrometer-2.0 micrometers, for example. The film thickness of the i-type buffer layer 23 may be about 0.5 μm or less.

  Next, a mask pattern is formed on the laminated structure epitaxially grown on the substrate 11, and wet etching using this is performed to form the first mesa structure 31 (step (c)). When the i-type etching stop layer 18 is a non-doped InP layer, a citric acid-based or phosphoric acid-based liquid that reduces the etching rate of the InP layer can be used as the etchant liquid. After the first mesa structure 31 is formed, the mask pattern is removed.

  The planar view region of the first mesa structure 31 of this embodiment has a circular shape, and the size thereof is substantially the same as the size of the light receiving region. The diameter of the light receiving region (light receiving diameter) may be in the range of about 8 μm to 80 μm, for example, about 20 μm. When the light receiving diameter is set to 20 μm, the mask pattern may be formed so that the diameter of the first mesa structure 31 in the plan view region is set to 20 μm.

  Next, a mask pattern that covers the first mesa structure 31 is formed, and non-selective etching using the mask pattern is performed to form a second mesa structure (step (d)). That is, wet etching is performed using etching conditions (such as the type of etchant and temperature conditions) in which the etching rates of the i-type etching stop layer, the light absorption layer, and the first buffer layer before processing are comparable. Thereby, the side wall of the second mesa structure can be smoothed. For example, an aqueous bromine solution or a mixed solution of bromine and methanol may be used as the etchant, but the present invention is not limited to this. After the second mesa structure is formed, the mask pattern is removed.

  As a result, a dumbbell-shaped second mesa structure as shown in FIG. 3 is formed. Further, as shown in FIG. 4, a step is formed between the first mesa structure 31 and the second mesa structure, and an overhang portion 32 is formed. Since the lower limit of the length d2 of the overhanging portion 32 depends on the fabrication accuracy, it is desirable to set the length d2 to 5 μm or more if a mesa structure is formed using a contact mask. When the mesa structure is formed by a method with higher manufacturing accuracy (for example, a method using a projection type exposure apparatus), the lower limit of the length d2 can be set to about 1 μm.

  The length d2 of the overhanging portion 32 may be about 10 μm, but is not limited to this. If the length d2 is set to be equal to or greater than the thickness of the depletion layer formed when the semiconductor light receiving element 10 is driven, an electric field reducing effect on the side wall of the light receiving portion A1 can be produced. The depletion layer is formed in a region including the i-type buffer layer 23, the light absorption layer 15, and the i-type etching stop layer 18. Usually, since the thickness of the depletion layer is designed to be 5 μm or less, if the length d2 is at least about 5 μm, in many cases, this electric field reduction effect can be caused. Therefore, the length d2 may be designed to be within a range of 5 μm or more and 50 μm or less.

  On the other hand, when the thickness d3 of the depletion layer exceeds 5 μm, it is desirable to design the length d2 of the overhanging portion 32 to exceed d3 in order to produce an electric field reducing effect on the side wall of the light receiving unit A1.

  The connection part A2 of the second mesa structure is formed to have a width of 5 μm to 10 μm and a length of 10 μm to 200 μm. The length of the connection portion A2 is determined according to the element size of the semiconductor light receiving element 10. Since the general element size is about 200 μm × 200 μm to 500 μm × 500 μm, the element size of the semiconductor light receiving element 10 may be set to about 300 μm × 300 μm, for example.

  As shown in FIG. 3, the planar view region of the light receiving unit A1 having the second mesa structure has a circular shape. In order to suppress the influence of the dark current, the width Dw of the planar view region of the connection portion A2 is preferably 10% or less of the circumferential length of the light receiving portion A1 and 5 μm or more. When the circumference of the light receiving part A1 is 125.6 μm (= 2 × 3.14 × 20 μm), the width Dw can be set to 12 μm, which is 10% of the circumference, or a value in the vicinity thereof.

  After the second mesa structure as described above is formed, a protective film (passivation film) 20 that covers the second mesa structure and the first mesa structure 31 is formed. The protective film 20 may be formed by depositing an insulating film such as a silicon nitride film by plasma CVD, for example. By etching using a photolithography technique, an opening for the p-side electrode is formed in the insulating film, and at the same time, the insulating film at the end including the side wall of the electrode pad portion A3 is removed.

  Next, the n-side electrode 22 that is electrically connected to the n-type buffer layer 12 is formed at the end of the second mesa structure by vacuum deposition or sputtering (step (e)). At the same time, the p-side electrode 21 electrically connected to the p-type buffer layer 16 through the p-type contact layer 17 is formed on the first mesa structure 31 (step (f)). Thereafter, post-processes such as polishing, electrode wiring, and AR film formation are performed.

  The effects produced by the semiconductor light receiving element 10 manufactured as described above are as follows.

  In the semiconductor light receiving element 10, since the i-type etching stop layer 18 is interposed between the light absorption layer 15 and the p-type buffer layer 16, p-type etching is performed by using the i-type etching stop layer 18 as an etching stopper. A first mesa structure 31 including the buffer layer 16 can be formed. Accordingly, different etching conditions (such as the type of etchant and temperature conditions) can be applied to the first mesa structure 31 and the second mesa structure. Therefore, when forming the second mesa structure, the light absorption layer 15 is formed. Etching conditions that can smooth the mesa side walls of the n-type buffer layer 14 underneath are also employable. Therefore, the upper and lower layers of the light absorption layer 15 can be prevented from projecting sideways, and the boundary between the light absorption layer 15 and the n-type buffer layer 14 can be uniformly covered with the protective film 20. In addition, since the allowable range of etching conditions for forming the second mesa structure can be widened, the side wall of the first mesa structure 31 having a composition significantly different from that of the light absorption layer 15 is smoothed, and this first The film thickness of the protective film 20 covering one mesa structure 31 can be made uniform.

  It is also possible to optimize the etching conditions so as to smooth the side walls of the second mesa structure. According to the above manufacturing method, the first mesa structure 31 is formed using the etching stop layer 18 located above the light absorption layer 15 (step (c)), and then the i-type etching stop layer 18 and the light absorption. The layer 15 and the buffer layers 12 and 14 are non-selectively etched to form a second mesa structure (step (d)). Therefore, the side wall of the second mesa structure can be smoothed, and the thickness of the protective film 20 covering the second mesa structure can be made uniform.

  In addition, since the material of the light absorption layer 15 can be selected regardless of the etching conditions for the first mesa structure 31, the degree of freedom in selecting the material of the light absorption layer can be increased.

  Furthermore, since the planar view region of the second mesa structure is wider than the planar view region of the first mesa structure 31, there is a step between the first mesa structure 31 and the second mesa structure, The outer peripheral end of the second mesa structure is located outside the outer peripheral end of the first mesa structure. The photoelectric conversion region that generates electron / hole pairs in response to incident light is limited to the region immediately below the first mesa structure 31 and the vicinity thereof. Therefore, since this photoelectric conversion region is provided at a position away from the outer peripheral end of the second mesa structure, even if the film thickness of the protective film 20 formed on the side wall of the second mesa structure is not uniform. The possibility that the photoelectric conversion region is affected by the non-uniformity can be reduced.

  Since the n-side electrode 22 is electrically connected to the n-type buffer layer 12 through the end of the second mesa structure, even if the n-type buffer layer 12 is a thin film, the n-side electrode 22 and the n-type electrode 22 An electrical connection with the buffer layer 12 can be reliably ensured. Therefore, no element failure due to over-etching occurs, so that the etching conditions can be easily set and the yield is improved. Further, the manufacturing cost can be reduced by making the n-type buffer layer 12 thinner.

  Further, the semiconductor light receiving element 10 forms the first mesa structure 31 using the i-type etching stop layer 18 located above the light absorption layer 15, and then the etching stop layer 18, the light absorption layer 15, and the n-type. The buffer layer 12 is etched to form a second mesa structure. Therefore, different etching conditions (such as etchant type and temperature conditions) can be applied to the first mesa structure 31 and the second mesa structure. Therefore, since the allowable range of the etching conditions for forming the first mesa structure 31 is wide, the side wall of the first mesa structure 31 including the p-type buffer layer 16 having a composition significantly different from that of the light absorption layer 15 is smoothed. Thus, the thickness of the protective film 20 covering the first mesa structure 31 can be made uniform.

  Further, by applying non-selective etching conditions such that the etching rates of the light absorption layer 15 and the n-type buffer layer 12 are approximately the same, the side wall of the second mesa structure is smoothed, and the second mesa is smoothed. The film thickness of the protective film 20 covering the structure can be made uniform. Furthermore, since the material of the light absorption layer 15 can be selected regardless of the etching conditions for the first mesa structure 31, the degree of freedom in selecting the material of the light absorption layer 15 can be increased.

  Furthermore, in the manufacturing method according to the present embodiment, the n-type electrode 22 can be electrically connected to the p-type buffer layer 16 via the end of the second mesa structure. Even so, the electrical connection between the n-type electrode 22 and the n-type buffer layer 12 can be reliably ensured.

  As described above, it is possible to provide the semiconductor light receiving element 10 and its manufacturing method capable of realizing high reliability, yield improvement, and manufacturing cost reduction.

(Second Embodiment)
Next, a second embodiment according to the present invention will be described. FIG. 5 is a perspective view schematically showing the appearance of the semiconductor light receiving element 40 of the second embodiment, and FIG. 6 is a schematic cross-sectional view of the semiconductor light receiving element 40 of FIG. 5 taken along line 6a-6a. .

  The semiconductor light receiving element 40 includes a first conductivity type (n-type) buffer layer 42 formed on the main surface of a substrate 41 that is electrically semi-insulating or insulating. On this buffer layer 42, a light absorption layer 45 that generates electron-hole pairs in response to incident light is formed. On this light absorption layer 45, an i-type etching stop layer 48 is interposed. A first mesa structure 61 including a buffer layer 46 of a second conductivity type (p-type) opposite to the first conductivity type is formed. A protective film (passivation film) 50 is formed so as to cover the light absorption layer 45, the i-type etching stop layer 48 and the first mesa structure 61. An n-side electrode 52 is formed so as to be electrically connected to the buffer layer 42, and is electrically connected to the p-type buffer layer 46 via the p-type contact layer 47 on the first mesa structure 61. A p-side electrode 51 is formed so as to be connected. With such a configuration, a pin junction is formed between the p-side electrode 51 and the n-side electrode 52.

  The first mesa structure 61 has a structure in which a p-type buffer layer 46 and a p-type contact layer 47 are stacked in this order on an i-type etching stop layer 48. The i-type etching stop layer 48 is an intrinsic semiconductor layer interposed between the light absorption layer 45 and the p-type buffer layer 46 or a semiconductor layer having a carrier concentration close to non-doping. The carrier concentration and material of the i-type etching stop layer 48 can be selected in the same manner as the i-type etching stop layer 18 of the first embodiment. The material of the first mesa structure 61 can be the same as that of the first mesa structure 31 of the first embodiment. By doing so, the i-type etching stop layer 48 has an etching rate several times slower than the etching rate of the constituent material of the first mesa structure 61 during the etching process of the first mesa structure 61. It can function as an etching stopper.

  As illustrated in FIG. 6, the stacked structure including the buffer layer 42, the light absorption layer 45, and the i-type etching stop layer 48 constitutes a second mesa structure immediately below the first mesa structure 61. The n-side electrode 52 is electrically connected to the buffer layer 42 in the contact area CA at the outer peripheral end of the second mesa structure.

  As shown in FIGS. 5 and 6, the second mesa structure includes a light receiving portion B1, a connecting portion B2, and an electrode pad portion B3. The light receiving unit B1 is located immediately below the first mesa structure 61, and the planar view region of the light receiving unit B1 includes the planar view region of the first mesa structure 61. On the other hand, the electrode pad portion B3 is formed away from the first mesa structure 61 in the in-plane direction of the substrate 41, and the n-side electrode 52 is formed on the entire surface including the end portion of the electrode pad portion B3. A film is formed. Furthermore, as shown in FIG. 5, the planar view region of the electrode pad portion B3 is formed in an annular shape so as to surround the planar view region of the light receiving portion B1. The connecting portion B2 connects the inner peripheral end of the electrode pad portion B3 and the outer peripheral end of the light receiving portion B1 in the in-plane direction of the substrate 41.

  Further, as shown in FIG. 6, the plan view region (the region occupied by the plan view shape) of the second mesa structure including the light receiving unit B <b> 1, the connection unit B <b> 2, and the electrode pad unit B <b> 3 is the first mesa structure 61. It includes a planar view area and is wider than the planar view area of the first mesa structure 61. Therefore, there is a step between the outer peripheral end of the first mesa structure 61 and the outer peripheral end of the second mesa structure, and the light receiving part B1 of the second mesa structure has an outer periphery of the first mesa structure 61. It has an overhanging portion 62 with respect to the end.

  The manufacturing method of the semiconductor light receiving element 40 having the above configuration includes the following basic steps (a) to (f).

(A) On the principal surface of the electrically semi-insulating or insulating substrate 41, a first conductivity type (n-type) first buffer layer and electron / hole pairs are generated in accordance with incident light. A step of laminating a light absorption layer and an i-type etching stop layer in this order.
(B) forming a stacked structure including a second buffer layer of a second conductivity type (p-type) opposite to the first conductivity type on the i-type etching stop layer;
(C) A step of forming the first mesa structure 61 shown in FIG. 6 by selectively etching the stacked structure using the i-type etching stop layer as an etching stopper.
(D) By etching the i-type etching stop layer, the light absorption layer, and the first buffer layer, the buffer layer 42, the light absorption layer 45, and the i-type etching stop layer 48 processed as shown in FIG. Forming a second mesa structure comprising:
(E) A step of forming an n-side electrode 52 electrically connected to the buffer layer 42 at the end of the second mesa structure.
(F) A step of forming the p-side electrode 51 electrically connected to the buffer layer 46 on the first mesa structure 61.

  Hereinafter, a preferred method for manufacturing the semiconductor light receiving element 40 will be described in more detail.

  As the substrate 41, the same substrate as that of the substrate 11 (FIG. 4) of the first embodiment may be used. Crystal layers constituting the n-type buffer layer 42, the light absorption layer 45, the i-type etching stop layer 48, the p-type buffer layer 46, and the p-type contact layer 47 are sequentially formed on the substrate 41 by MBE or MOVPE. Epitaxial growth is performed (steps (a) to (b)). Examples of the constituent material of these epitaxial crystal layers include InP, GaInP, AlInP, AlGaInP, InGaAs, InAlAs, InAlGaAs, and InGaAsP. Further, as the constituent material of the light absorption layer 45, a material having a band gap larger than the energy corresponding to the wavelength of the signal light incident on the semiconductor light receiving element 40 may be used.

  Specifically, an Fe-doped InP substrate as the substrate 41, an n-type InP layer as the n-type buffer layer 42, a non-doped i-type InGaAs layer as the light absorption layer 45, and a non-doped i as the i-type etching stop layer 48 are used. The p-type InP layer, the p-type InAlAs layer as the p-type buffer layer 46, and the p-type InGaAs layer as the p-type contact layer 47 can be used.

  Next, a mask pattern is formed on the laminated structure epitaxially grown on the substrate 41, and wet etching using this is performed to form the first mesa structure 61 (step (c)). When the i-type etching stop layer 48 is a non-doped InP layer, a citric acid-based or phosphoric acid-based liquid that lowers the etching rate of the InP layer can be used as the etchant liquid. After the first mesa structure 61 is formed, the mask pattern is removed.

  The planar view region of the first mesa structure 61 of the present embodiment has a circular shape, and the size thereof is substantially the same as the size of the light receiving region. The diameter of the light receiving region (light receiving diameter) may be in the range of about 8 μm to 80 μm, for example, about 20 μm. When the light receiving diameter is set to 20 μm, the mask pattern may be formed so that the diameter of the first mesa structure 61 in the plan view region is set to 20 μm.

  Next, a mask pattern covering the first mesa structure 61 is formed, and non-selective etching using the mask pattern is performed to form a second mesa structure (step (d)). That is, wet etching is performed using etching conditions (such as the type of etchant and temperature conditions) in which the etching rates of the i-type etching stop layer, the light absorption layer, and the first buffer layer before processing are comparable. Thereby, the side wall of the second mesa structure can be smoothed. For example, an aqueous bromine solution or a mixed solution of bromine and methanol may be used as the etchant, but the present invention is not limited to this. After the second mesa structure is formed, the mask pattern is removed.

  As a result, as shown in FIG. 5, a second mesa structure having an annular electrode pad portion B3 surrounding the outer periphery of the light receiving portion B1 is formed. Further, as shown in FIG. 6, a step is formed between the first mesa structure 61 and the second mesa structure, and an overhang portion 62 is formed. The length d2 of the overhang portion 62 may be at least about 5 μm, and preferably in the range of 5 μm to 20 μm. In addition, since the lower limit of the length d2 depends on the manufacturing accuracy, it is desirable to set the length d2 to 5 μm or more if a mesa structure is formed using a contact mask. When the mesa structure is formed by a method with higher manufacturing accuracy (for example, a method using a projection type exposure apparatus), the lower limit of the length d2 can be set to about 1 μm.

  The length d2 of the overhanging portion 62 may be about 10 μm, but is not limited to this. If the length d2 is set to be equal to or greater than the thickness of the depletion layer formed when the semiconductor light receiving element 40 is driven, an electric field reducing effect on the side wall of the light receiving portion B1 can be produced. The depletion layer is formed in a region including the p-type buffer layer 46, the i-type etching stop layer 48, and the light absorption layer 45. Usually, the thickness of the depletion layer is designed to be 5 μm or less. Therefore, if the length d2 is at least about 5 μm, in many cases, this electric field reduction effect can be caused. Therefore, the length d2 may be designed to be within a range of 5 μm or more and 50 μm or less.

  On the other hand, when the thickness d3 of the depletion layer exceeds 5 μm, it is desirable to design the length d2 of the protruding portion 62 to exceed d3 in order to produce an electric field reducing effect on the side wall of the light receiving unit B1.

  The connection portion B2 having the second mesa structure is formed to have a width of about 5 μm and a length of 10 μm to 50 μm.

  After the second mesa structure as described above is formed, a protective film (passivation film) 50 that covers the second mesa structure and the first mesa structure 61 is formed. The protective film 50 may be formed by depositing an insulating film such as a silicon nitride film by plasma CVD, for example. By etching using a photolithography technique, an opening for the p-side electrode is formed in this insulating film, and at the same time, the insulating film at the end including the side wall of the electrode pad portion B3 is removed.

  Next, an n-side electrode 52 that is electrically connected to the n-type buffer layer 42 at the end of the second mesa structure is formed by vacuum deposition or sputtering (step (e)). At the same time, the p-side electrode 51 electrically connected to the p-type buffer layer 46 through the p-type contact layer 47 is formed on the first mesa structure 61 (step (f)). Thereafter, post-processes such as polishing, electrode wiring, and AR film formation are performed.

  The effects exhibited by the semiconductor light receiving element 40 manufactured as described above are as follows.

  Similar to the first embodiment, the semiconductor light receiving element 40 of the second embodiment has a first mesa structure 61 above the semiconductor light receiving element 40, and immediately below the first mesa structure 61. Since it has the second mesa structure, the first mesa structure 61 and the second mesa structure have a configuration in which different etching conditions (such as etchant type and temperature condition) can be applied. Therefore, since the allowable range of the etching conditions for forming the first mesa structure 61 is wide, the side wall of the first mesa structure 61 having a composition greatly different from that of the light absorption layer 45 is smoothed, and the first mesa structure 61 is formed. The film thickness of the protective film 50 covering the structure 61 can be made uniform.

  Further, as in the first embodiment, it is possible to optimize the etching conditions so as to smooth the side wall of the second mesa structure. Since the material of the light absorption layer 45 can be selected regardless of the etching conditions for the first mesa structure 61, the degree of freedom in selecting the material of the light absorption layer 45 can be increased.

  As described above, since the planar view region of the second mesa structure is wider than the planar view region of the first mesa structure 61, there is a step between the first mesa structure 61 and the second mesa structure. The outer peripheral end of the second mesa structure is located outside the outer peripheral end of the first mesa structure 61. The photoelectric conversion region that generates electron / hole pairs in response to incident light is limited to the region immediately below the first mesa structure 61 and the vicinity thereof. Therefore, since this photoelectric conversion region is provided at a position away from the outer peripheral end of the second mesa structure, the film thickness of the protective film 50 formed on the side wall of the light receiving portion B1 of the second mesa structure is not uniform. Even so, the possibility that the photoelectric conversion region is affected by the non-uniformity can be reduced.

  Since the n-side electrode 52 is electrically connected to the n-type buffer layer 42 via the annular electrode pad portion B3 separated from the light receiving portion B1, the n-side electrode is formed even if the n-type buffer layer 42 is a thin film. The electrical connection between 52 and the n-type buffer layer 42 can be reliably ensured. Therefore, no element failure due to over-etching occurs, so that the etching conditions can be easily set and the yield is improved. In addition, the manufacturing cost can be reduced by reducing the thickness of the n-type buffer layer 42.

  As described above, also in the second embodiment, it is possible to provide the semiconductor light receiving element 40 and its manufacturing method capable of realizing high reliability, yield improvement, and manufacturing cost reduction.

(Third embodiment)
Next, a third embodiment according to the present invention will be described. FIG. 7 is a perspective view schematically showing the appearance of the semiconductor light receiving element 70 of the third embodiment, and FIG. 8 is a schematic cross-sectional view taken along the line 8a-8a of the semiconductor light receiving element 70 of FIG. . The semiconductor light receiving element 70 is the same as that of the second embodiment except that a p-type field relaxation layer 74 and an avalanche multiplication layer 79 are formed between the light absorption layer 75 and the n-type buffer layer 73. The structure is similar to that of the light receiving element 40.

  That is, the semiconductor light receiving element 70 of the third embodiment includes the first conductivity type (n-type) buffer layers 72 and 73 formed on the main surface of the electrically semi-insulating or insulating substrate 71. Have. On this buffer layer 73, an avalanche multiplication layer 79, a p-type electric field relaxation layer 74 and a light absorption layer 75 are formed. On this light absorption layer 75, an i-type etching stop layer 78 is interposed. A first mesa structure 91 including a buffer layer 76 of a second conductivity type (p-type) opposite to the first conductivity type is formed. A protective film (passivation film) 80 is formed to cover the first mesa structure 91, the i-type etching stop layer 78, the light absorption layer 75, the p-type electric field relaxation layer 74, and the avalanche multiplication layer 79. . An n-side electrode 82 is formed so as to be electrically connected to the buffer layer 72, and a p-side electrode 81 is electrically connected to the p-type buffer layer 76 on the first mesa structure 91. Is formed. With such a configuration, a pin junction is formed between the p-side electrode 81 and the n-side electrode 82.

  The first mesa structure 91 has a structure in which a p-type buffer layer 76 and a p-type contact layer 77 are stacked in this order on an i-type etching stop layer 78. The i-type etching stop layer 78 is an intrinsic semiconductor layer interposed between the light absorption layer 75 and the p-type buffer layer 76 or a semiconductor layer having a carrier concentration close to non-doping. The carrier concentration and material of the i-type etching stop layer 78 can be selected in the same manner as the i-type etching stop layer 18 of the first embodiment. The material of the first mesa structure 91 can be the same as that of the first mesa structure 31 of the first embodiment. By doing so, the i-type etching stop layer 78 has an etching rate several times slower than the etching rate of the constituent material of the first mesa structure 91 during the etching process of the first mesa structure 91, so that the etching is performed. Can function as a stopper.

  As shown in FIG. 8, the laminated structure including the buffer layers 72 and 73, the avalanche multiplication layer 79, the p-type field relaxation layer 74, the light absorption layer 75, and the i-type etching stop layer 78 is the first mesa structure 91. A second mesa structure is formed immediately below the bottom. The n-side electrode 82 is electrically connected to the buffer layer 72 in the contact area CA at the outer peripheral end of the second mesa structure.

  As shown in FIGS. 7 and 8, the second mesa structure includes a light receiving portion C1, a connecting portion C2, and an electrode pad portion C3. As shown in FIG. 7, the planar view area of the electrode pad portion C3 is formed in an annular shape so as to surround the planar view area of the light receiving portion C1. The connecting portion C2 connects the inner peripheral end of the electrode pad portion C3 and the outer peripheral end of the light receiving portion C1 in the in-plane direction of the substrate 71.

  Further, as shown in FIG. 7, the planar view region of the second mesa structure including the light receiving portion C1, the connection portion C2, and the electrode pad portion C3 includes the planar view region of the first mesa structure 91, and It is wider than the planar view region of the first mesa structure 91. Therefore, there is a step between the outer peripheral end of the first mesa structure 91 and the outer peripheral end of the second mesa structure, and the light receiving unit C1 of the second mesa structure has an outer periphery of the first mesa structure 91. It has an overhanging portion 92 against the end.

  The manufacturing method of the semiconductor light receiving element 70 having the above configuration includes the following basic steps (a) to (f).

(A) A first conductivity type (n-type) first buffer layer, an avalanche multiplication layer, a p-type field relaxation layer, a light absorption layer on the main surface of the electrically semi-insulating or insulating substrate 71 And a step of laminating i-type etching stop layers in this order.
(B) forming a stacked structure including a second buffer layer of a second conductivity type (p-type) opposite to the first conductivity type on the i-type etching stop layer;
(C) A step of forming the first mesa structure 91 shown in FIG. 8 by selectively etching the stacked structure using the i-type etching stop layer as an etching stopper.
(D) by etching the first buffer layer, the avalanche multiplication layer, the p-type electric field relaxation layer, the light absorption layer, and the i-type etching stop layer, the n-type buffer layer 72 processed as shown in FIG. 73, a step of forming a second mesa structure including the avalanche multiplication layer 79, the p-type electric field relaxation layer 74, the light absorption layer 75, and the i-type etching stop layer 78.
(E) A step of forming an n-side electrode 82 electrically connected to the n-type buffer layer 72 at the end of the second mesa structure.
(F) A step of forming a p-side electrode 81 electrically connected to the p-type buffer layer 76 on the first mesa structure 91.

  Hereinafter, a preferred method for manufacturing the semiconductor light receiving element 70 will be described in more detail.

  As the substrate 71, the same substrate as the substrate 11 (FIG. 4) of the first embodiment may be used. Crystals constituting n-type buffer layers 72 and 73, avalanche multiplication layer 79, p-type electric field relaxation layer 74, light absorption layer 75, and i-type etching stop layer 78 are formed on this substrate 71 by MBE or MOVPE. Phases are epitaxially grown sequentially (steps (a) to (b)).

  Specifically, an Fe-doped InP substrate as the substrate 71, an n-type InP layer as the n-type buffer layer 72, an n-type InAlAs layer as the n-type buffer layer 73, and an i-type InAlAs as the avalanche multiplication layer 79 are used. The p-type InAlAs layer is used as the p-type field relaxation layer 74, the i-type InGaAs layer is used as the light absorption layer 75, the i-type InP layer is used as the i-type etching stop layer 78, and the p-type InAlAs layer is used as the p-type buffer layer 76. A p-type InGaAs layer can be used as the p-type contact layer 77, respectively.

  Next, a mask pattern is formed on the laminated structure epitaxially grown on the substrate 71, and wet etching using this is performed to form the first mesa structure 91 (step (c)). After the first mesa structure 91 is formed, the mask pattern is removed.

  The planar view region of the first mesa structure 91 of this embodiment has a circular shape, and the size thereof is substantially the same as the size of the light receiving region. The diameter of the light receiving region (light receiving diameter) may be in the range of about 8 μm to 80 μm, for example, about 20 μm. When the light receiving diameter is 20 μm, the mask pattern may be formed such that the diameter of the first mesa structure 91 in the plan view region is set to 20 μm.

  Next, a mask pattern that covers the first mesa structure 91 is formed, and non-selective etching using the mask pattern is performed to form a second mesa structure (step (d)). That is, the etching conditions (etchant type, temperature conditions, etc.) at which the etching rates of the n-type buffer layer, avalanche multiplication layer, p-type electric field relaxation layer, light absorption layer, and i-type etching stop layer are the same before processing. The used wet etching is performed. Thereby, the side wall of the second mesa structure can be smoothed. For example, an aqueous bromine solution or a mixed solution of bromine and methanol may be used as the etchant, but the present invention is not limited to this. After the second mesa structure is formed, the mask pattern is removed.

  As a result, as shown in FIG. 7, a second mesa structure having an annular electrode pad portion C3 surrounding the outer periphery of the light receiving portion C1 is formed. Further, as shown in FIG. 8, a step is formed between the first mesa structure 91 and the second mesa structure, and an overhanging portion 92 is formed. The length d2 of the overhang portion 92 may be at least about 5 μm, and preferably in the range of 5 μm to 20 μm. In addition, since the lower limit of the length d2 depends on the manufacturing accuracy, it is desirable to set the length d2 to 5 μm or more if a mesa structure is formed using a contact mask. When the mesa structure is formed by a method with higher manufacturing accuracy (for example, a method using a projection type exposure apparatus), the lower limit of the length d2 can be set to about 1 μm.

  The length d2 of the overhanging portion 92 may be about 10 μm, but is not limited to this. If the length d2 is set to be equal to or greater than the thickness of the depletion layer formed when the semiconductor light receiving element 70 is driven, an electric field reducing effect on the side wall of the light receiving portion C1 can be produced. The depletion layer is formed in a region including i-type etching stop layer 78, light absorption layer 75, p-type field relaxation layer 74, and avalanche multiplication layer 79. Usually, the thickness of the depletion layer is designed to be 5 μm or less. Therefore, if the length d2 is at least about 5 μm, in many cases, this electric field reduction effect can be caused. Therefore, the length d2 may be designed to be within a range of 5 μm or more and 50 μm or less.

  On the other hand, when the thickness d3 of the depletion layer exceeds 5 μm, it is desirable to design the length d2 of the overhanging portion 92 to exceed d3 in order to produce an electric field reducing effect on the side wall of the light receiving unit C1.

  The connection portion C2 having the second mesa structure is formed to have a width of about 5 μm and a length of 10 μm to 50 μm.

  After the second mesa structure as described above is formed, a protective film (passivation film) 80 that covers the second mesa structure and the first mesa structure 91 is formed. The protective film 80 may be formed by depositing an insulating film such as a silicon nitride film by plasma CVD, for example. By etching using the photolithography technique, an opening for the p-side electrode is formed in this insulating film, and at the same time, the insulating film at the end including the side wall of the electrode pad portion C3 is removed.

  Next, an n-side electrode 82 that is electrically connected to the n-type buffer layer 72 at the end of the second mesa structure is formed by vacuum deposition or sputtering (step (e)). At the same time, the p-side electrode 81 electrically connected to the p-type buffer layer 76 through the p-type contact layer 77 is formed on the first mesa structure 91 (step (f)). Thereafter, post-processes such as polishing, electrode wiring, and AR film formation are performed.

  Since the avalanche amplification type semiconductor light receiving element 70 manufactured as described above also has a mesa structure similar to that of the semiconductor light receiving element 40 of the second embodiment, the same effects as those of the second embodiment can be obtained. . Therefore, also in the third embodiment, it is possible to provide an avalanche amplification type semiconductor light receiving element 70 and a method for manufacturing the same which can realize high reliability, yield improvement, and manufacturing cost reduction.

  As mentioned above, although embodiment of this invention was described with reference to drawings, these are the illustrations of this invention, Various structures other than the above are also employable. For example, in the semiconductor light receiving element 10 of the first embodiment, the p-type buffer layer 16 is connected to the i-type etching stop layer 18 through the i-type buffer layer 23, but the present invention is not limited to this. . The p-type buffer layer 16 may be formed so as to be in direct contact with the upper surface of the i-type etching stop layer 18 without forming the i-type buffer layer 23.

  Even when the p-type semiconductor layer and the n-type semiconductor layer are interchanged in the semiconductor light receiving elements 10, 40, and 70 of the first, second, and third embodiments, the first, second, and third implementations, respectively. A form having substantially the same effect as the form can be obtained.

  The present invention is not limited to the above embodiment. Various changes that can be understood by those skilled in the art can be made to the configuration and details of the present invention within the scope of the present invention.

  This application claims the priority on the basis of Japanese application Japanese Patent Application No. 2008-249681 for which it applied on September 29, 2008, and takes in those the indications of all here.

Claims (12)

An electrically semi-insulating or insulating substrate;
A first buffer layer of a first conductivity type formed on the main surface of the substrate;
A light absorbing layer formed on the first buffer layer and generating electron-hole pairs in response to incident light;
An etching stop layer formed on the light absorption layer;
A second buffer layer formed on the etching stop layer and having a second conductivity type opposite to the first conductivity type;
A first electrode electrically connected to the first buffer layer;
A second electrode electrically connected to the second buffer layer;
A protective film covering the first buffer layer, the light absorption layer, and the second buffer layer;
With
At least the second buffer layer constitutes a first mesa structure, and the first buffer layer, the light absorption layer and the etching stop layer constitute a second mesa structure immediately below the first mesa structure. And the planar view region of the second mesa structure includes the planar view region of the first mesa structure and is wider than the planar view region of the first mesa structure.   2. The semiconductor light receiving element according to claim 1, wherein the first electrode is formed at an end portion of the second mesa structure. The semiconductor light-receiving element according to claim 1,
The second mesa structure is
A light receiving unit that is located immediately below the first mesa structure and has a planar view region that includes the planar view region of the first mesa structure;
The first mesa structure is formed to be spaced apart in the in-plane direction of the substrate, and an electrode pad portion in which the first electrode is formed at an end portion;
A connection part for connecting the light receiving part and the electrode pad part in an in-plane direction of the substrate;
A semiconductor light receiving element. The semiconductor light receiving element according to claim 3,
The connecting portion has an elongated shape having a longitudinal direction in an in-plane direction of the substrate,
A semiconductor light receiving element, wherein an outer peripheral end of the light receiving portion is continuously connected to one end in the longitudinal direction of the connection portion, and an outer peripheral end of the electrode pad portion is continuously connected to the other longitudinal end of the connection portion.   4. The semiconductor light receiving element according to claim 3, wherein a planar view region of the electrode pad portion is formed in an annular shape so as to surround the light receiving portion. The semiconductor light-receiving element according to claim 3 or 4,
The planar view region of the light receiving unit has a circular shape,
The width of the planar view region of the connection portion is 10% or less of the peripheral length of the planar view region of the light receiving portion and 5 μm or more.   7. The semiconductor light receiving device according to claim 1, wherein a pin junction is formed between the first electrode and the second electrode. 8.   8. The semiconductor light receiving element according to claim 1, wherein the second mesa structure has an avalanche multiplication formed between the light absorption layer and the first buffer layer. 9. A semiconductor light receiving element including a layer.   9. The semiconductor light receiving device according to claim 1, wherein the etching stop layer is In (1-x) Ga (x) As (y) P (1-y) (0 ≦ x ≦ 0.48, 0 ≦ y ≦ 1), and the first mesa structure is In (1-pq) Ga (p) Al (q) As (0 ≦ p ≦ 0.48, 0 ≦ A semiconductor light receiving element configured by q ≦ 0.48). On the main surface of the electrically semi-insulating or insulating substrate, a first buffer layer of the first conductivity type, a light absorbing layer for generating electron / hole pairs in response to incident light, and an etching stop layer And laminating in this order;
Forming a stacked structure including a second buffer layer of a second conductivity type opposite to the first conductivity type on the etching stop layer;
Forming a first mesa structure by selectively etching the stacked structure using the etching stop layer as an etching stopper;
Forming a second mesa structure by etching the etching stop layer, the light absorption layer, and the first buffer layer;
Forming a first electrode electrically connected to the first buffer layer at an end of the second mesa structure;
Forming a second electrode electrically connected to the second buffer layer on the first mesa structure;
A method of manufacturing a semiconductor light receiving element comprising:   11. The method of manufacturing a semiconductor light receiving element according to claim 10, wherein the second mesa structure wet-selectively etches the etching stop layer, the light absorption layer, and the first buffer layer with respect to an etching rate. A method of manufacturing a semiconductor light receiving element formed by the method.   12. The method of manufacturing a semiconductor light receiving element according to claim 10, wherein the planar view region of the second mesa structure includes the planar view region of the first mesa structure, and the first mesa structure. A method for manufacturing a semiconductor light receiving element, which is wider than a planar view region of the structure.

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