JP5407841B2 - Triarylamine derivative having reactive silyl group, inorganic material, and dye-sensitized photoelectric conversion device - Google Patents
Triarylamine derivative having reactive silyl group, inorganic material, and dye-sensitized photoelectric conversion device Download PDFInfo
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- JP5407841B2 JP5407841B2 JP2009292453A JP2009292453A JP5407841B2 JP 5407841 B2 JP5407841 B2 JP 5407841B2 JP 2009292453 A JP2009292453 A JP 2009292453A JP 2009292453 A JP2009292453 A JP 2009292453A JP 5407841 B2 JP5407841 B2 JP 5407841B2
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- 125000005259 triarylamine group Chemical group 0.000 title claims description 21
- 238000006243 chemical reaction Methods 0.000 title claims description 20
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 title claims description 20
- 229910010272 inorganic material Inorganic materials 0.000 title claims description 11
- 239000011147 inorganic material Substances 0.000 title claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- 125000001424 substituent group Chemical group 0.000 claims description 19
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 125000003277 amino group Chemical group 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 125000004423 acyloxy group Chemical group 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 150000001721 carbon Chemical group 0.000 claims description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 4
- ZBKFYXZXZJPWNQ-UHFFFAOYSA-N isothiocyanate group Chemical group [N-]=C=S ZBKFYXZXZJPWNQ-UHFFFAOYSA-N 0.000 claims description 4
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M thiocyanate group Chemical group [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 3
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 description 59
- 0 CC(C)[*+](C(C)C)C1=C(C)CCCC1 Chemical compound CC(C)[*+](C(C)C)C1=C(C)CCCC1 0.000 description 43
- -1 dimethyl fluorenyl group Chemical group 0.000 description 24
- 239000000243 solution Substances 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 15
- 150000002430 hydrocarbons Chemical group 0.000 description 15
- 229910003480 inorganic solid Inorganic materials 0.000 description 14
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 239000007787 solid Substances 0.000 description 11
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 238000001269 time-of-flight mass spectrometry Methods 0.000 description 8
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 5
- 235000019341 magnesium sulphate Nutrition 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 125000005504 styryl group Chemical group 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 4
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 238000004128 high performance liquid chromatography Methods 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical class C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- CYPYTURSJDMMMP-WVCUSYJESA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].[Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 CYPYTURSJDMMMP-WVCUSYJESA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- HZAXSRREJZMVJP-UHFFFAOYSA-N COC=1C=C(C=C[SiH](C(C)C)C(C)C)C=CC1 Chemical compound COC=1C=C(C=C[SiH](C(C)C)C(C)C)C=CC1 HZAXSRREJZMVJP-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- AFVZCAYHDYANOO-UHFFFAOYSA-N OC1=CC(=C(C=C1)Br)[SiH](C(C)C)C(C)C Chemical compound OC1=CC(=C(C=C1)Br)[SiH](C(C)C)C(C)C AFVZCAYHDYANOO-UHFFFAOYSA-N 0.000 description 2
- FFYSRJBAAYDXFQ-UHFFFAOYSA-N OC=1C(=C(C=CC1)Br)[SiH](C(C)C)C(C)C Chemical compound OC=1C(=C(C=CC1)Br)[SiH](C(C)C)C(C)C FFYSRJBAAYDXFQ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- BTXCCJUSEHKINF-UHFFFAOYSA-N [SiH3]c1ccccc1Br Chemical compound [SiH3]c1ccccc1Br BTXCCJUSEHKINF-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 238000004453 electron probe microanalysis Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000002608 ionic liquid Substances 0.000 description 2
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 description 2
- 125000005394 methallyl group Chemical group 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 2
- PDJQCHVMABBNQW-MIXQCLKLSA-L (1z,5z)-cycloocta-1,5-diene;rhodium;dichloride Chemical compound [Cl-].[Cl-].[Rh].[Rh].C\1C\C=C/CC\C=C/1.C\1C\C=C/CC\C=C/1 PDJQCHVMABBNQW-MIXQCLKLSA-L 0.000 description 1
- ISHFYECQSXFODS-UHFFFAOYSA-M 1,2-dimethyl-3-propylimidazol-1-ium;iodide Chemical compound [I-].CCCN1C=C[N+](C)=C1C ISHFYECQSXFODS-UHFFFAOYSA-M 0.000 description 1
- ARSMIBSHEYKMJT-UHFFFAOYSA-M 1,3-dimethylimidazolium iodide Chemical compound [I-].CN1C=C[N+](C)=C1 ARSMIBSHEYKMJT-UHFFFAOYSA-M 0.000 description 1
- LBHLGZNUPKUZJC-UHFFFAOYSA-N 1-butyl-1-methylpyrrolidin-1-ium;cyanoiminomethylideneazanide Chemical compound [N-]=C=NC#N.CCCC[N+]1(C)CCCC1 LBHLGZNUPKUZJC-UHFFFAOYSA-N 0.000 description 1
- ICIVTHOGIQHZRY-UHFFFAOYSA-N 1-butyl-3-methylimidazol-3-ium;cyanoiminomethylideneazanide Chemical compound [N-]=C=NC#N.CCCCN1C=C[N+](C)=C1 ICIVTHOGIQHZRY-UHFFFAOYSA-N 0.000 description 1
- FRZPYEHDSAQGAS-UHFFFAOYSA-M 1-butyl-3-methylimidazol-3-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+]=1C=CN(C)C=1 FRZPYEHDSAQGAS-UHFFFAOYSA-M 0.000 description 1
- XREPTGNZZKNFQZ-UHFFFAOYSA-M 1-butyl-3-methylimidazolium iodide Chemical compound [I-].CCCCN1C=C[N+](C)=C1 XREPTGNZZKNFQZ-UHFFFAOYSA-M 0.000 description 1
- DADKKHHMGSWSPH-UHFFFAOYSA-N 1-butyl-3-methylpyridin-1-ium Chemical compound CCCC[N+]1=CC=CC(C)=C1 DADKKHHMGSWSPH-UHFFFAOYSA-N 0.000 description 1
- IKQCDTXBZKMPBB-UHFFFAOYSA-M 1-ethyl-3-methylimidazol-3-ium;iodide Chemical compound [I-].CCN1C=C[N+](C)=C1 IKQCDTXBZKMPBB-UHFFFAOYSA-M 0.000 description 1
- CZIUVCSYOGFUPH-UHFFFAOYSA-M 1-hexyl-3-methylimidazol-3-ium;iodide Chemical compound [I-].CCCCCC[N+]=1C=CN(C)C=1 CZIUVCSYOGFUPH-UHFFFAOYSA-M 0.000 description 1
- RVEJOWGVUQQIIZ-UHFFFAOYSA-N 1-hexyl-3-methylimidazolium Chemical compound CCCCCCN1C=C[N+](C)=C1 RVEJOWGVUQQIIZ-UHFFFAOYSA-N 0.000 description 1
- IVCMUVGRRDWTDK-UHFFFAOYSA-M 1-methyl-3-propylimidazol-1-ium;iodide Chemical compound [I-].CCCN1C=C[N+](C)=C1 IVCMUVGRRDWTDK-UHFFFAOYSA-M 0.000 description 1
- FGYADSCZTQOAFK-UHFFFAOYSA-N 1-methylbenzimidazole Chemical compound C1=CC=C2N(C)C=NC2=C1 FGYADSCZTQOAFK-UHFFFAOYSA-N 0.000 description 1
- SFPQDYSOPQHZAQ-UHFFFAOYSA-N 2-methoxypropanenitrile Chemical compound COC(C)C#N SFPQDYSOPQHZAQ-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
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- YCOXTKKNXUZSKD-UHFFFAOYSA-N as-o-xylenol Natural products CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- WXNOJTUTEXAZLD-UHFFFAOYSA-L benzonitrile;dichloropalladium Chemical compound Cl[Pd]Cl.N#CC1=CC=CC=C1.N#CC1=CC=CC=C1 WXNOJTUTEXAZLD-UHFFFAOYSA-L 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- SUDHVXIPIDQEIT-UHFFFAOYSA-N bis(1,1,2,2,2-pentafluoroethylsulfonyl)azanide;1-ethyl-3-methylimidazol-3-ium Chemical compound CCN1C=C[N+](C)=C1.FC(F)(F)C(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)C(F)(F)F SUDHVXIPIDQEIT-UHFFFAOYSA-N 0.000 description 1
- INDFXCHYORWHLQ-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)azanide;1-butyl-3-methylimidazol-3-ium Chemical compound CCCCN1C=C[N+](C)=C1.FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F INDFXCHYORWHLQ-UHFFFAOYSA-N 0.000 description 1
- LUWJQOLQUXTUGM-UHFFFAOYSA-N bis(trifluoromethylsulfonyl)methylsulfonyl-trifluoromethane;1,2-dimethyl-3-propylimidazol-1-ium Chemical compound CCCN1C=C[N+](C)=C1C.FC(F)(F)S(=O)(=O)[C-](S(=O)(=O)C(F)(F)F)S(=O)(=O)C(F)(F)F LUWJQOLQUXTUGM-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 235000011089 carbon dioxide Nutrition 0.000 description 1
- IETKMTGYQIVLRF-UHFFFAOYSA-N carbon monoxide;rhodium;triphenylphosphane Chemical compound [Rh].[O+]#[C-].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 IETKMTGYQIVLRF-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- NLCBUHMLTVFFMZ-UHFFFAOYSA-L cobalt(2+);cyclopenta-2,4-dien-1-yl(diphenyl)phosphane;iron(2+);dichloride Chemical compound [Fe+2].Cl[Co]Cl.C1=C[CH-]C(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1.C1=C[CH-]C(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 NLCBUHMLTVFFMZ-UHFFFAOYSA-L 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- YEIOLSIOGKBJAR-UHFFFAOYSA-L cyclopenta-2,4-dien-1-yl(diphenyl)phosphane;iron(2+);nickel(2+);dichloride Chemical compound [Fe+2].Cl[Ni]Cl.C1=C[CH-]C(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1.C1=C[CH-]C(P(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 YEIOLSIOGKBJAR-UHFFFAOYSA-L 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
- VVAOPCKKNIUEEU-PHFPKPIQSA-L dichloro(cycloocta-1,5-diene)platinum(ii) Chemical compound Cl[Pt]Cl.C\1C\C=C/CC\C=C/1 VVAOPCKKNIUEEU-PHFPKPIQSA-L 0.000 description 1
- GSENNYNYEKCQGA-UHFFFAOYSA-N dichloro-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(Cl)C(C)C GSENNYNYEKCQGA-UHFFFAOYSA-N 0.000 description 1
- YNHIGQDRGKUECZ-UHFFFAOYSA-N dichloropalladium;triphenylphosphanium Chemical compound Cl[Pd]Cl.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-N 0.000 description 1
- WIWBLJMBLGWSIN-UHFFFAOYSA-L dichlorotris(triphenylphosphine)ruthenium(ii) Chemical compound [Cl-].[Cl-].[Ru+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 WIWBLJMBLGWSIN-UHFFFAOYSA-L 0.000 description 1
- LCSNDSFWVKMJCT-UHFFFAOYSA-N dicyclohexyl-(2-phenylphenyl)phosphane Chemical group C1CCCCC1P(C=1C(=CC=CC=1)C=1C=CC=CC=1)C1CCCCC1 LCSNDSFWVKMJCT-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- CNXMDTWQWLGCPE-UHFFFAOYSA-N ditert-butyl-(2-phenylphenyl)phosphane Chemical group CC(C)(C)P(C(C)(C)C)C1=CC=CC=C1C1=CC=CC=C1 CNXMDTWQWLGCPE-UHFFFAOYSA-N 0.000 description 1
- WSUTUEIGSOWBJO-UHFFFAOYSA-N dizinc oxygen(2-) Chemical compound [O-2].[O-2].[Zn+2].[Zn+2] WSUTUEIGSOWBJO-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- ZJYYHGLJYGJLLN-UHFFFAOYSA-N guanidinium thiocyanate Chemical compound SC#N.NC(N)=N ZJYYHGLJYGJLLN-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 238000004770 highest occupied molecular orbital Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000003392 indanyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- SNHMUERNLJLMHN-UHFFFAOYSA-N iodobenzene Chemical compound IC1=CC=CC=C1 SNHMUERNLJLMHN-UHFFFAOYSA-N 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- BMGNSKKZFQMGDH-FDGPNNRMSA-L nickel(2+);(z)-4-oxopent-2-en-2-olate Chemical compound [Ni+2].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O BMGNSKKZFQMGDH-FDGPNNRMSA-L 0.000 description 1
- ZBRJXVVKPBZPAN-UHFFFAOYSA-L nickel(2+);triphenylphosphane;dichloride Chemical compound [Cl-].[Cl-].[Ni+2].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 ZBRJXVVKPBZPAN-UHFFFAOYSA-L 0.000 description 1
- 150000002825 nitriles Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- UUEVFMOUBSLVJW-UHFFFAOYSA-N oxo-[[1-[2-[2-[2-[4-(oxoazaniumylmethylidene)pyridin-1-yl]ethoxy]ethoxy]ethyl]pyridin-4-ylidene]methyl]azanium;dibromide Chemical compound [Br-].[Br-].C1=CC(=C[NH+]=O)C=CN1CCOCCOCCN1C=CC(=C[NH+]=O)C=C1 UUEVFMOUBSLVJW-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- PENAXHPKEVTBLF-UHFFFAOYSA-L palladium(2+);prop-1-ene;dichloride Chemical compound [Pd+]Cl.[Pd+]Cl.[CH2-]C=C.[CH2-]C=C PENAXHPKEVTBLF-UHFFFAOYSA-L 0.000 description 1
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- RJQWVEJVXWLMRE-UHFFFAOYSA-N platinum;tritert-butylphosphane Chemical compound [Pt].CC(C)(C)P(C(C)(C)C)C(C)(C)C.CC(C)(C)P(C(C)(C)C)C(C)(C)C RJQWVEJVXWLMRE-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- JFZKOODUSFUFIZ-UHFFFAOYSA-N trifluoro phosphate Chemical compound FOP(=O)(OF)OF JFZKOODUSFUFIZ-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
Landscapes
- Photovoltaic Devices (AREA)
- Hybrid Cells (AREA)
Description
本発明は、新規な反応性シリル基を有するトリアリールアミン誘導体、これを表面に固定した無機材料及び色素増感型光電変換素子に関する。 TECHNICAL FIELD The present invention relates to a novel triarylamine derivative having a reactive silyl group, an inorganic material having the surface fixed thereto, and a dye-sensitized photoelectric conversion element.
芳香族アミン類は、広く機能材料として用いられており、工業的に有用な化合物である。例えば特許文献1(特開2000−239236号公報)には、有機ELの分野において正孔注入材料や正孔輸送材料に用いられており、トリアリールアミン骨格を有するアミンが優れた正孔輸送能力を持つことが知られている。しかし、この化合物は、溶剤への溶解性及び結着樹脂との相溶性が乏しいため、性能が低下するという問題があった。そこで特許文献2(特開2008−56571号公報)では、構造を変えることで溶解性及び結着樹脂との相溶性を改善する試みがなされている。 Aromatic amines are widely used as functional materials and are industrially useful compounds. For example, in Patent Document 1 (Japanese Patent Laid-Open No. 2000-239236), an amine having a triarylamine skeleton, which is used for a hole injection material and a hole transport material in the field of organic EL, has an excellent hole transport capability. It is known to have However, since this compound has poor solubility in a solvent and compatibility with a binder resin, there has been a problem that performance is lowered. Therefore, Patent Document 2 (Japanese Patent Laid-Open No. 2008-56571) attempts to improve solubility and compatibility with a binder resin by changing the structure.
一方、特許文献3(特開2006−134649号公報)には、トリアリールアミン誘導体が色素増感太陽電池に使用できることが示されている。これらはいずれもアンカーと呼ばれる末端に位置するカルボキシル基が酸化チタン粒子と化学結合することで、多孔質膜に固定され、高い変換効率を示すことが記載されている。また、非特許文献1(CHEM. COMMUN. 2003年1456−1457ページ)には、溶液の濃度が濃いほど、酸化チタン粒子への吸着が速くなることが記載されている。 On the other hand, Patent Document 3 (Japanese Patent Laid-Open No. 2006-134649) shows that a triarylamine derivative can be used in a dye-sensitized solar cell. It is described that both of these are fixed to the porous membrane by a chemical bond between the carboxyl group located at the terminal called an anchor and the titanium oxide particles, and exhibit high conversion efficiency. Non-Patent Document 1 (CHEM. COMMUN. 2003, pages 1456 to 1457) describes that the higher the concentration of the solution, the faster the adsorption to the titanium oxide particles.
しかしながら、化合物の骨格、構造を変えることでHOMO−LUMO間のエネルギーギャップが変化し、他の素子構成材料との電子的な相互作用が低下する可能性がある。また、特許文献3に記載されている化合物は、カルボキシル基を有していることから会合しやすく溶解性が低くなり、その結果、反応に多量の溶媒が必要であったり、シリカゲルクロマトグラフィーによる精製を行うとカラム中で固体が析出してしまうという問題があった。また、濃度の高い溶液が作れないため酸化チタン上への吸着が遅くなるという問題もあった。 However, changing the skeleton and structure of the compound changes the energy gap between HOMO and LUMO, which may reduce electronic interaction with other device constituent materials. In addition, since the compound described in Patent Document 3 has a carboxyl group, it easily associates and has low solubility. As a result, a large amount of solvent is required for the reaction, or purification by silica gel chromatography is performed. There was a problem that solids precipitated in the column. Moreover, since a highly concentrated solution cannot be made, there is also a problem that adsorption onto titanium oxide is delayed.
そのため、溶剤への溶解性、樹脂への相溶性に優れ、かつ無機材料表面に固定できる新規なトリアリールアミン類の開発が望まれていた。 Therefore, development of novel triarylamines that have excellent solubility in solvents and compatibility with resins and can be fixed on the surface of inorganic materials has been desired.
本発明は、上記要望に応えたもので、溶解性に優れ、無機材料表面に固定できる新規な反応性シリル基を有するトリアリールアミン誘導体、及びこれを表面に固定した無機材料並びに色素増感型光電変換素子を提供することを目的とする。 The present invention is a solution to the above-mentioned demands, a triarylamine derivative having a novel reactive silyl group that has excellent solubility and can be fixed on the surface of an inorganic material, and an inorganic material and dye-sensitized type on which the surface is fixed. An object is to provide a photoelectric conversion element.
本発明者らは、上記目的を達成するため鋭意検討を行った結果、下記一般式(1)で表される反応性シリル基を有する新規なトリアリールアミン誘導体が、溶解性、耐久性に優れ、無機材料表面に固定できることを見出し、本発明をなすに至った。 As a result of intensive studies to achieve the above object, the present inventors have found that a novel triarylamine derivative having a reactive silyl group represented by the following general formula (1) has excellent solubility and durability. The present inventors have found that it can be fixed on the surface of an inorganic material and have made the present invention.
従って、本発明は、下記の反応性シリル基を有するトリアリールアミン誘導体及び無機材料並びに色素増感型光電変換素子を提供する。
〔請求項1〕
下記一般式(1)で表される反応性シリル基を有するトリアリールアミン誘導体。
(式中、R6〜R19は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20の1価炭化水素基、非置換又は置換の炭素数1〜20のオルガノキシ基、水素原子、及び二置換のアミノ基から選択される置換基を表し、R6〜R19のうち隣接する2つは互いに結合してこれらが結合する炭素原子と共に環を形成してもよい。R1〜R5は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20の1価炭化水素基、非置換又は置換の炭素数1〜20のオルガノキシ基、水素原子、二置換のアミノ基、及びSiR20R21R22で表される反応性のシリル基から選択される置換基を表す。ただしR1〜R5のうち1つは、SiR20R21R22で表される反応性のシリル基である。R20、R21はそれぞれ独立に、非置換又は置換の炭素数1〜20の1価炭化水素基、炭素数1〜20のアシロキシ基、水酸基、水素原子、メルカプト基、非置換又は置換のアミノ基、シアナート基、イソシアナート基、チオシアナート基及びイソチオシアナート基から選択される置換基を表す。R22 は水酸基である。Aは非置換又は置換の2価の共役性置換基を示し、nは0〜10の整数である。)
〔請求項2〕
上記一般式(1)において、R20、R21が炭素数1〜10の1価炭化水素基である請求項1記載のトリアリールアミン誘導体。
〔請求項3〕
請求項1又は2記載のトリアリールアミン誘導体を表面に固定した無機材料。
〔請求項4〕
請求項1又は2記載のトリアリールアミン誘導体を使用した色素増感型光電変換素子。
Accordingly, the present invention provides the following triarylamine derivatives and inorganic materials having a reactive silyl group, and a dye-sensitized photoelectric conversion element.
[Claim 1]
A triarylamine derivative having a reactive silyl group represented by the following general formula (1).
(Wherein R 6 to R 19 may be the same or different and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted organooxy group having 1 to 20 carbon atoms, It represents a substituent selected from a hydrogen atom and a disubstituted amino group, and two adjacent R 6 to R 19 may be bonded to each other to form a ring together with the carbon atom to which they are bonded. 1 to R 5 may be the same or different and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted organooxy group having 1 to 20 carbon atoms, a hydrogen atom, disubstituted And a substituent selected from a reactive silyl group represented by SiR 20 R 21 R 22 , wherein one of R 1 to R 5 is represented by SiR 20 R 21 R 22. that is a reactive silyl group .R 20, R 21 are each independently an unsubstituted or Conversion monovalent hydrocarbon group having 1 to 20 carbon atoms, an acyloxy group having a carbon number of 1-20, a hydroxyl group, water atom, a mercapto group, an unsubstituted or substituted amino group, a cyanate group, isocyanate group, thiocyanate group and .R represents a substituent selected from the isothiocyanate group 22 is water group .A is a divalent conjugated substituent unsubstituted or substituted, n represents an integer of 0.)
[Claim 2 ]
In the general formula (1), R 20, R 21 is a monovalent triarylamine derivative according to claim 1, wherein a hydrocarbon group having 1 to 10 carbon atoms.
[Claim 3 ]
An inorganic material having the triarylamine derivative according to claim 1 or 2 fixed on a surface thereof.
[Claim 4 ]
A dye-sensitized photoelectric conversion element using the triarylamine derivative according to claim 1 or 2 .
本発明により、新規な反応性シリル基を有するトリアリールアミン誘導体及びそれを表面に固定した無機材料が提供される。本発明のトリアリールアミン誘導体は、様々な溶媒への溶解性や樹脂との相溶性に優れており、有機色素材料として有用である。 According to the present invention, a novel triarylamine derivative having a reactive silyl group and an inorganic material having the surface fixed thereto are provided. The triarylamine derivative of the present invention is excellent in solubility in various solvents and compatibility with resins, and is useful as an organic dye material.
本発明の反応性シリル基を有するトリアリールアミン誘導体は、下記一般式(1)で表される。
上記一般式(1)において、R6〜R19は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20、好ましくは1〜10の1価炭化水素基、非置換又は置換の炭素数1〜20、好ましくは1〜10のオルガノキシ基、水素原子、二置換のアミノ基から選択される置換基を表し、R6〜R19のうち隣接する2つは互いに結合してこれらが結合する炭素原子と共に環を形成してもよい。 In the general formula (1), R 6 to R 19 may be the same or different and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, unsubstituted or substituted. Represents a substituent selected from an organoxy group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, a hydrogen atom, and a disubstituted amino group, and adjacent two of R 6 to R 19 are bonded to each other. A ring may be formed together with the carbon atom to which is bonded.
R6〜R19の例としては、水素原子、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、t−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等のアルキル基、シクロペンチル基、シクロヘキシル基等のシクロアルキル基、ベンジル基、2−フェニルエチル基、3−フェニルプロピル基等のアラルキル基、フェニル基、トリル基等のアリール基、ビニル基、アリル基等のアルケニル基等の1価炭化水素基、メトキシ基、エトキシ基、ブトキシ基、tert−ブトキシ基、ヘキシルオキシ基、フェノキシ基等のオルガノキシ基、ジメチルアミノ基、ジエチルアミノ基等の二置換のアミノ基等が挙げられ、また1価炭化水素基、オルガノキシ基の水素原子の1個又はそれ以上がアシル基、アシロキシ基、フッ素、塩素等のハロゲン原子等によって置換したもの等が挙げられる。
また、上記R6〜R19のうち隣接する2つが互いに結合してこれらが結合するフェニル基中の炭素原子と共に炭素数1〜30、特に1〜20の環を形成してもよく、例えば、これらが結合するフェニル基と共にインダニル基、ナフチル基、アントラニル基、フルオレニル基、ジメチルフルオレニル基、ジエチルフルオレニル基、ジブチルフルオレニル基、ジオクチルフルオレニル基、カルバゾリル基等を形成することができる。
Examples of R 6 to R 19 are hydrogen atom, methyl group, ethyl group, propyl group, isopropyl group, butyl group, t-butyl group, pentyl group, hexyl group, heptyl group, octyl group and other alkyl groups, cyclopentyl Group, cycloalkyl group such as cyclohexyl group, aralkyl group such as benzyl group, 2-phenylethyl group and 3-phenylpropyl group, aryl group such as phenyl group and tolyl group, alkenyl group such as vinyl group and allyl group, etc. And monovalent hydrocarbon groups, methoxy groups, ethoxy groups, butoxy groups, tert-butoxy groups, hexyloxy groups, phenoxy groups and other organoxy groups, dimethylamino groups, diethylamino groups and the like, and the like. One or more hydrogen atoms of a monovalent hydrocarbon group or organoxy group are acyl groups, acyloxy groups, fluorine, chlorine, etc. And those obtained by replacing the halogen atom and the like.
Moreover, two adjacent R 6 to R 19 may be bonded to each other to form a ring having 1 to 30 carbon atoms, particularly 1 to 20 carbon atoms, together with carbon atoms in the phenyl group to which they are bonded. Form indanyl group, naphthyl group, anthranyl group, fluorenyl group, dimethyl fluorenyl group, diethyl fluorenyl group, dibutyl fluorenyl group, dioctyl fluorenyl group, carbazolyl group, etc. together with the phenyl group to which they are bonded. Can do.
R1〜R5は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20、好ましくは1〜10の1価炭化水素基、非置換又は置換の炭素数1〜20、好ましくは1〜10のオルガノキシ基、水素原子、二置換のアミノ基、及びSiR20R21R22で表される反応性のシリル基から選択される置換基を表す。 R 1 to R 5 may be the same or different, and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, an unsubstituted or substituted carbon group having 1 to 20 carbon atoms, preferably Represents a substituent selected from 1 to 10 organoxy groups, a hydrogen atom, a disubstituted amino group, and a reactive silyl group represented by SiR 20 R 21 R 22 .
R1〜R5の1価炭化水素基、オルガノキシ基、水素原子、二置換のアミノ基の例としては、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、イソブチル基、tert−ブチル基、ペンチル基、シクロペンチル基、へキシル基、シクロへキシル基、ヘプチル基、オクチル基、デシル基、ビニル基、アリル基、メタリル基、ブテニル基、フェニル基等の1価炭化水素基や、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、tert−ブトキシ基、フェノキシ基等のオルガノキシ基、水素原子、ジメチルアミノ基、ジエチルアミノ基等の二置換アミノ基等が挙げられ、また1価炭化水素基、オルガノキシ基の水素原子の1個又はそれ以上がアシル基、アシロキシ基、フッ素、塩素等のハロゲン原子等によって置換したもの等が挙げられる。 Examples of the monovalent hydrocarbon group of R 1 to R 5 , organoxy group, hydrogen atom, and disubstituted amino group include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert- Monovalent hydrocarbon groups such as butyl group, pentyl group, cyclopentyl group, hexyl group, cyclohexyl group, heptyl group, octyl group, decyl group, vinyl group, allyl group, methallyl group, butenyl group, phenyl group, Organoxy groups such as methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, isobutoxy group, tert-butoxy group and phenoxy group, disubstituted amino groups such as hydrogen atom, dimethylamino group and diethylamino group In addition, one or more hydrogen atoms of a monovalent hydrocarbon group or organoxy group are acyl groups, acyloxy groups, fluorine Such as those substituted with a halogen atom such as chlorine and the like.
一般式(1)において、R1〜R5のうち1つは、ケイ素置換基のうち少なくとも一つが反応性を有しているSiR20R21R22で表される反応性のシリル基である。 In the general formula (1), one of R 1 to R 5 is a reactive silyl group represented by SiR 20 R 21 R 22 in which at least one of the silicon substituents has reactivity. .
ここで、R20、R21はそれぞれ独立に、非置換又は置換の炭素数1〜20、特に1〜10の1価炭化水素基、非置換又は置換の炭素数1〜20、特に1〜10のアシロキシ基、水酸基、水素原子、メルカプト基、非置換又は置換のアミノ基、シアナート基、イソシアナート基、チオシアナート基、イソチオシアナート基から選択される置換基を表し、R22 は水酸基を表す。 Here, R 20 and R 21 are each independently an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, particularly 1 to 10 carbon atoms , an unsubstituted or substituted carbon atom having 1 to 20 carbon atoms, particularly 1 to 10 carbon atoms. acyloxy group, a hydroxyl group, water atom, a mercapto group, an unsubstituted or substituted amino group, a cyanate group, an isocyanate group, a thiocyanate group, a substituent selected from the isothiocyanate group, R 22 is hydroxyl group a representative.
R20〜R22の1価炭化水素基としては、直鎖状、分岐状又は環状のアルキル基、アルケニル基、アリール基、アラルキル基等が挙げられ、またこれらの基の水素原子の1個又はそれ以上がアシル基、アシロキシ基、フッ素、塩素等のハロゲン原子等によって置換したもの等が挙げられる。 The monovalent hydrocarbon group R 20 to R 22, a linear, one branched or cyclic alkyl group, alkenyl group, aryl group, aralkyl group, or a hydrogen atom of these groups Or the thing etc. which the more substituted by halogen atoms, such as an acyl group, an acyloxy group, fluorine, and chlorine, etc. are mentioned.
R20、R21の例としては、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、シクロペンチル基、へキシル基、シクロへキシル基、ヘプチル基、オクチル基、デシル基、ビニル基、アリル基、メタリル基、ブテニル基、フェニル基等の1価炭化水素基や、アセトキシ基、トリフルオロアセトキシ基、ベンゾイルオキシ基等のアシロキシ基、アミノ基、メチルアミノ基、ジメチルアミノ基、ジエチルアミノ基等の非置換又は置換のアミノ基、水酸基、水素原子、メルカプト基、シアノ基、イソシアナート基、チオシアナート基、イソチオシアナート基等が挙げられる。これらの中でも1価炭化水素基が好ましく、イソプロピル基、イソブチル基、sec−ブチル基、シクロペンチル基、シクロヘキシル基がより好ましい。 Examples of R 20 and R 21 include methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, cyclopentyl group, hexyl group, cyclohexyl group, heptyl group, octyl group, decyl group, vinyl group, allyl group, methallyl group, butenyl group, or a monovalent hydrocarbon group such as a phenyl group, a Setokishi group, trifluoroacetoxy group, benzoyloxy group acyloxy group, amino group, methylamino group, dimethylamino group, an unsubstituted or substituted amino group such as a diethylamino group, a hydroxyl group, a hydrogen atom, a mercapto group, a cyano group, isocyanate group, thiocyanate group, isothiocyanate group Etc. Among these, a monovalent hydrocarbon group is preferable, and an isopropyl group, an isobutyl group, a sec-butyl group, a cyclopentyl group, and a cyclohexyl group are more preferable.
R 22 は、水酸基が好ましい。 R 22 is preferably a hydroxyl group.
SiR20R21R22で表される基の具体例としては、ジメチルヒドロキシシリル基、ジエチルヒドロキシシリル基、ジイソプロピルヒドロキシシリル基、ジシクロペンチルヒドロキシシリル基、ジシクロヘキシルヒドロキシシリル基、ジ−sec−ブチルヒドロキシシリル基、tert−ブチルメチルヒドロキシシリル基、ジイソブチルヒドロキシシリル基、シクロヘキシルメチルヒドロキシシリル基等が挙げられる。 Specific examples of the group represented by SiR 20 R 21 R 22, di methyl hydroxy silyl group, diethyl-hydroxy silyl group, diisopropyl hydroxy silyl group, dicyclopentyl hydroxy silyl group, dicyclohexyl hydroxy silyl group, di -sec- butyl hydroxy Examples include silyl group, tert-butylmethylhydroxysilyl group, diisobutylhydroxysilyl group, cyclohexylmethylhydroxysilyl group and the like .
Aは、非置換又は置換の2価の共役性置換基であり、該置換基は、−S−、−O−、−NH−等の基を含んでもよい。このような2価の共役性置換基としては、下記に示すものが挙げられる。
nは、0〜10の整数であり、好ましくは0〜5の整数、より好ましくは0〜3の整数である。
A is an unsubstituted or substituted divalent conjugated substituent, and the substituent may include a group such as —S—, —O—, and —NH—. Examples of such divalent conjugated substituents include those shown below.
n is an integer of 0 to 10, preferably an integer of 0 to 5, more preferably an integer of 0 to 3.
下記に示すように、X、Y、Zを定義した場合、上記一般式(1)で表される化合物はX−Y−Zと表記できる。一般式(1)で表される化合物は、下記に例示するようなX、Y、Zを任意に組み合わせた化合物である。 As shown below, when X, Y, and Z are defined, the compound represented by the general formula (1) can be expressed as XYZ. The compound represented by the general formula (1) is a compound in which X, Y and Z are arbitrarily combined as exemplified below.
(式中、R1〜R19、A、nは上記と同じである。)
(In the formula, R 1 to R 19 , A and n are the same as above.)
Xの具体例としては、以下のものが挙げられる。
(式中、Meはメチル基、Etはエチル基、Buはブチル基、t−Buはtert−ブチル基、MeOはメトキシ基である。以下、同じ。)
Specific examples of X include the following.
(In the formula, Me is a methyl group, Et is an ethyl group, Bu is a butyl group, t-Bu is a tert-butyl group, and MeO is a methoxy group. The same applies hereinafter.)
Yの具体例としては、以下のものが挙げられる。
Zの具体例としては、以下のものが挙げられる。
一般式(1)で表される化合物のうち、特に好ましい化合物としては、下記のものが挙げられる。
本発明の一般式(1)で表される化合物の製造方法は、ハロゲン−メタル交換でケイ素剤との反応等でも製造できるが、下記一般式(2)と下記一般式(3)、又は下記一般式(4)と下記一般式(5)を遷移金属触媒の存在下で反応させて製造する方法が効率がよいため好ましい。 Although the manufacturing method of the compound represented by General formula (1) of this invention can also be manufactured by reaction with a silicon agent etc. by halogen-metal exchange, the following General formula (2) and the following General formula (3), or the following A method of reacting General Formula (4) with the following General Formula (5) in the presence of a transition metal catalyst is preferable because of its high efficiency.
上記一般式(2)において、R6〜R19及びAは式(1)で定義したものと同じ置換基を表し、nは0〜10の整数である。一般式(2)で表される化合物は、X−An−CH=CH2で表され、一般式(2)で表される化合物の具体例としては、上述したX、Aで例示したもの及びnの任意の組み合わせからなる化合物を例示することができる。一般式(2)で表される化合物として、より具体的には、下記のものが例示できる。 In the general formula (2), R 6 ~R 19 and A represent the same substituents as defined in formula (1), n is an integer of 0. The compound represented by the general formula (2) is represented by X—A n —CH═CH 2 , and specific examples of the compound represented by the general formula (2) include those exemplified for X and A described above. And a compound consisting of any combination of n. Specific examples of the compound represented by the general formula (2) include the following.
上記一般式(3)において、Halは塩素原子、臭素原子又はヨウ素原子を表し、R1〜R5は式(1)で定義したものと同じ置換基を表す。一般式(3)で表される化合物は、Z−Halで表され、一般式(3)で表される化合物の具体例としては、上述したZ、Halで例示したものの任意の組み合わせからなる化合物を例示することができる。 In the general formula (3), Hal represents a chlorine atom, a bromine atom or an iodine atom, R 1 to R 5 represent the same substituent as defined in formula (1). The compound represented by the general formula (3) is represented by Z-Hal, and as a specific example of the compound represented by the general formula (3), a compound comprising any combination of those exemplified above for Z and Hal. Can be illustrated.
上記一般式(3)で表される化合物として、より具体的には、o−ヒドロキシジイソプロピルシリルクロロベンゼン、o−ヒドロキシジ−sec−ブチルシリルクロロベンゼン、o−ヒドロキシジシクロペンチルシリルクロロベンゼン、o−ヒドロキシジシクロヘキシルシリルクロロベンゼン、o−ヒドロキシシクロヘキシルメチルシリルクロロベンゼン、o−ヒドロキシ−tert−ブチルメチルシリルクロロベンゼン、o−ヒドロキシジイソプロピルシリルブロモベンゼン、o−ヒドロキシジ−sec−ブチルシリルブロモベンゼン、o−ヒドロキシジシクロペンチルシリルブロモベンゼン、o−ヒドロキシジシクロヘキシルシリルブロモベンゼン、o−ヒドロキシシクロヘキシルメチルシリルブロモベンゼン、o−ヒドロキシ−tert−ブチルメチルシリルブロモベンゼン、o−ヒドロキシジイソプロピルシリルヨードベンゼン、o−ヒドロキシジ−sec−ブチルシリルヨードベンゼン、o−ヒドロキシジシクロペンチルシリルヨードベンゼン、o−ヒドロキシジシクロヘキシルシリルヨードベンゼン、o−ヒドロキシシクロヘキシルメチルシリルヨードベンゼン、o−ヒドロキシ−tert−ブチルメチルシリルヨードベンゼン、m−ジイソプロピルメトキシシリルクロロベンゼン、m−ジ−sec−ブチルメトキシシリルクロロベンゼン、m−ジシクロペンチルメトキシシリルクロロベンゼン、m−ジシクロヘキシルメトキシシリルクロロベンゼン、m−シクロヘキシルメチルメトキシシリルクロロベンゼン、m−tert−ブチルメチルメトキシシリルクロロベンゼン、m−ジイソプロピルメトキシシリルブロモベンゼン、m−ジ−sec−ブチルメトキシシリルブロモベンゼン、m−ジシクロペンチルメトキシシリルブロモベンゼン、m−ジシクロヘキシルメトキシシリルブロモベンゼン、m−シクロヘキシルメチルメトキシシリルブロモベンゼン、m−tert−ブチルメチルメトキシシリルブロモベンゼン、m−ジイソプロピルメトキシシリルヨードベンゼン、m−ジ−sec−ブチルメトキシシリルヨードベンゼン、m−ジシクロペンチルメトキシシリルヨードベンゼン、m−ジシクロヘキシルメトキシシリルヨードベンゼン、m−シクロヘキシルメチルメトキシシリルヨードベンゼン、m−tert−ブチルメチルメトキシシリルヨードベンゼン、m−ジイソプロピルエトキシシリルクロロベンゼン、m−ジ−sec−ブチルエトキシシリルクロロベンゼン、m−ジシクロペンチルエトキシシリルクロロベンゼン、m−ジシクロヘキシルエトキシシリルクロロベンゼン、m−シクロヘキシルメチルエトキシシリルクロロベンゼン、m−tert−ブチルメチルエトキシシリルクロロベンゼン、m−ジイソプロピルエトキシシリルブロモベンゼン、m−ジ−sec−ブチルエトキシシリルブロモベンゼン、m−ジシクロペンチルエトキシシリルブロモベンゼン、m−ジシクロヘキシルエトキシシリルブロモベンゼン、m−シクロヘキシルメチルエトキシシリルブロモベンゼン、m−tert−ブチルメチルエトキシシリルブロモベンゼン、m−ジイソプロピルエトキシシリルヨードベンゼン、m−ジ−sec−ブチルエトキシシリルヨードベンゼン、m−ジシクロペンチルエトキシシリルヨードベンゼン、m−ジシクロヘキシルエトキシシリルヨードベンゼン、m−シクロヘキシルメチルエトキシシリルヨードベンゼン、m−tert−ブチルメチルエトキシシリルヨードベンゼン、m−ヒドロキシジイソプロピルシリルクロロベンゼン、m−ヒドロキシジ−sec−ブチルシリルクロロベンゼン、m−ヒドロキシジシクロペンチルシリルクロロベンゼン、m−ヒドロキシジシクロヘキシルシリルクロロベンゼン、m−ヒドロキシシクロヘキシルメチルシリルクロロベンゼン、m−ヒドロキシ−tert−ブチルメチルシリルクロロベンゼン、m−ヒドロキシジイソプロピルシリルブロモベンゼン、m−ヒドロキシジ−sec−ブチルシリルブロモベンゼン、m−ヒドロキシジシクロペンチルシリルブロモベンゼン、m−ヒドロキシジシクロヘキシルシリルブロモベンゼン、m−ヒドロキシシクロヘキシルメチルシリルブロモベンゼン、m−ヒドロキシ−tert−ブチルメチルシリルブロモベンゼン、m−ヒドロキシジイソプロピルシリルヨードベンゼン、m−ヒドロキシジ−sec−ブチルシリルヨードベンゼン、m−ヒドロキシジシクロペンチルシリルヨードベンゼン、m−ヒドロキシジシクロヘキシルシリルヨードベンゼン、m−ヒドロキシシクロヘキシルメチルシリルヨードベンゼン、m−ヒドロキシ−tert−ブチルメチルシリルヨードベンゼン、p−ジイソプロピルメトキシシリルクロロベンゼン、p−ジ−sec−ブチルメトキシシリルクロロベンゼン、p−ジシクロペンチルメトキシシリルクロロベンゼン、p−ジシクロヘキシルメトキシシリルクロロベンゼン、p−シクロヘキシルメチルメトキシシリルクロロベンゼン、p−tert−ブチルメチルメトキシシリルクロロベンゼン、p−ジイソプロピルメトキシシリルブロモベンゼン、p−sec−ブチルメトキシシリルブロモベンゼン、p−ジシクロペンチルメトキシシリルブロモベンゼン、p−ジシクロヘキシルメトキシシリルブロモベンゼン、p−シクロヘキシルメチルメトキシシリルブロモベンゼン、p−tert−ブチルメチルメトキシシリルブロモベンゼン、p−ジイソプロピルメトキシシリルヨードベンゼン、p−ジ−sec−ブチルメトキシシリルヨードベンゼン、p−ジシクロペンチルメトキシシリルヨードベンゼン、p−ジシクロヘキシルメトキシシリルヨードベンゼン、p−シクロヘキシルメチルメトキシシリルヨードベンゼン、p−tert−ブチルメチルメトキシシリルヨードベンゼン、p−ジイソプロピルエトキシシリルクロロベンゼン、p−ジ−sec−ブチルエトキシシリルクロロベンゼン、p−ジシクロペンチルエトキシシリルクロロベンゼン、p−ジシクロヘキシルエトキシシリルクロロベンゼン、p−シクロヘキシルメチルエトキシシリルクロロベンゼン、p−tert−ブチルメチルエトキシシリルクロロベンゼン、p−ジイソプロピルエトキシシリルブロモベンゼン、p−ジ−sec−ブチルエトキシシリルブロモベンゼン、p−ジシクロペンチルエトキシシリルブロモベンゼン、p−ジシクロヘキシルエトキシシリルブロモベンゼン、p−シクロヘキシルメチルエトキシシリルブロモベンゼン、p−tert−ブチルメチルエトキシシリルブロモベンゼン、p−ジイソプロピルエトキシシリルヨードベンゼン、p−ジ−sec−ブチルエトキシシリルヨードベンゼン、p−ジシクロペンチルエトキシシリルヨードベンゼン、p−ジシクロヘキシルエトキシシリルヨードベンゼン、p−シクロヘキシルメチルエトキシシリルヨードベンゼン、p−tert−ブチルメチルエトキシシリルヨードベンゼン、p−ヒドロキシジイソプロピルシリルクロロベンゼン、p−ヒドロキシジ−sec−ブチルシリルクロロベンゼン、p−ヒドロキシジシクロペンチルシリルクロロベンゼン、p−ヒドロキシジシクロヘキシルシリルクロロベンゼン、p−ヒドロキシシクロヘキシルメチルシリルクロロベンゼン、p−ヒドロキシ−tert−ブチルメチルシリルクロロベンゼン、p−ヒドロキシジイソプロピルシリルブロモベンゼン、p−ヒドロキシジ−sec−ブチルシリルブロモベンゼン、p−ヒドロキシジシクロペンチルシリルブロモベンゼン、p−ヒドロキシジシクロヘキシルシリルブロモベンゼン、p−ヒドロキシシクロヘキシルメチルシリルブロモベンゼン、p−ヒドロキシ−tert−ブチルメチルシリルブロモベンゼン、p−ヒドロキシジイソプロピルシリルヨードベンゼン、p−ヒドロキシジ−sec−ブチルシリルヨードベンゼン、p−ヒドロキシジシクロペンチルシリルヨードベンゼン、p−ヒドロキシジシクロヘキシルシリルヨードベンゼン、p−ヒドロキシシクロヘキシルメチルシリルヨードベンゼン、p−ヒドロキシ−tert−ブチルメチルシリルヨードベンゼン等が挙げられる。 More specifically, as the compound represented by the above general formula (3), o-hydroxydiisopropylsilylchlorobenzene, o-hydroxydi-sec-butylsilylchlorobenzene, o-hydroxydicyclopentylsilylchlorobenzene, o-hydroxydicyclohexylsilyl Chlorobenzene, o-hydroxycyclohexylmethylsilylchlorobenzene, o-hydroxy-tert-butylmethylsilylchlorobenzene, o-hydroxydiisopropylsilylbromobenzene, o-hydroxydi-sec-butylsilylbromobenzene, o-hydroxydicyclopentylsilylbromobenzene, o-hydroxydicyclohexylsilylbromobenzene, o-hydroxycyclohexylmethylsilylbromobenzene, o-hydroxy-ter -Butylmethylsilylbromobenzene, o-hydroxydiisopropylsilyliodobenzene, o-hydroxydi-sec-butylsilyliodobenzene, o-hydroxydicyclopentylsilyliodobenzene, o-hydroxydicyclohexylsilyliodobenzene, o-hydroxycyclohexylmethylsilyl Iodobenzene, o-hydroxy-tert-butylmethylsilyliodobenzene, m-diisopropylmethoxysilylchlorobenzene, m-di-sec-butylmethoxysilylchlorobenzene, m-dicyclopentylmethoxysilylchlorobenzene, m-dicyclohexylmethoxysilylchlorobenzene, m- Cyclohexylmethylmethoxysilylchlorobenzene, m-tert-butylmethylmethoxysilylchloroben M-diisopropylmethoxysilylbromobenzene, m-di-sec-butylmethoxysilylbromobenzene, m-dicyclopentylmethoxysilylbromobenzene, m-dicyclohexylmethoxysilylbromobenzene, m-cyclohexylmethylmethoxysilylbromobenzene, m- tert-butylmethylmethoxysilylbromobenzene, m-diisopropylmethoxysilyliodobenzene, m-di-sec-butylmethoxysilyliodobenzene, m-dicyclopentylmethoxysilyliodobenzene, m-dicyclohexylmethoxysilyliodobenzene, m-cyclohexylmethyl Methoxysilyliodobenzene, m-tert-butylmethylmethoxysilyliodobenzene, m-diisopropylethoxysilylchloroben Zen, m-di-sec-butylethoxysilylchlorobenzene, m-dicyclopentylethoxysilylchlorobenzene, m-dicyclohexylethoxysilylchlorobenzene, m-cyclohexylmethylethoxysilylchlorobenzene, m-tert-butylmethylethoxysilylchlorobenzene, m-diisopropylethoxy Silylbromobenzene, m-di-sec-butylethoxysilylbromobenzene, m-dicyclopentylethoxysilylbromobenzene, m-dicyclohexylethoxysilylbromobenzene, m-cyclohexylmethylethoxysilylbromobenzene, m-tert-butylmethylethoxysilyl Bromobenzene, m-diisopropylethoxysilyliodobenzene, m-di-sec-butylethoxysilyliodine Benzene, m-dicyclopentylethoxysilyliodobenzene, m-dicyclohexylethoxysilyliodobenzene, m-cyclohexylmethylethoxysilyliodobenzene, m-tert-butylmethylethoxysilyliodobenzene, m-hydroxydiisopropylsilylchlorobenzene, m-hydroxydibenzene -Sec-butylsilylchlorobenzene, m-hydroxydicyclopentylsilylchlorobenzene, m-hydroxydicyclohexylsilylchlorobenzene, m-hydroxycyclohexylmethylsilylchlorobenzene, m-hydroxy-tert-butylmethylsilylchlorobenzene, m-hydroxydiisopropylsilylbromobenzene, m -Hydroxydi-sec-butylsilylbromobenzene, m-hydroxydi Clopentylsilylbromobenzene, m-hydroxydicyclohexylsilylbromobenzene, m-hydroxycyclohexylmethylsilylbromobenzene, m-hydroxy-tert-butylmethylsilylbromobenzene, m-hydroxydiisopropylsilyliodobenzene, m-hydroxydi-sec- Butylsilyliodobenzene, m-hydroxydicyclopentylsilyliodobenzene, m-hydroxydicyclohexylsilyliodobenzene, m-hydroxycyclohexylmethylsilyliodobenzene, m-hydroxy-tert-butylmethylsilyliodobenzene, p-diisopropylmethoxysilylchlorobenzene, p-di-sec-butylmethoxysilylchlorobenzene, p-dicyclopentylmethoxysilylchloro Benzene, p-dicyclohexylmethoxysilylchlorobenzene, p-cyclohexylmethylmethoxysilylchlorobenzene, p-tert-butylmethylmethoxysilylchlorobenzene, p-diisopropylmethoxysilylbromobenzene, p-sec-butylmethoxysilylbromobenzene, p-dicyclopentylmethoxy Silylbromobenzene, p-dicyclohexylmethoxysilylbromobenzene, p-cyclohexylmethylmethoxysilylbromobenzene, p-tert-butylmethylmethoxysilylbromobenzene, p-diisopropylmethoxysilyliodobenzene, p-di-sec-butylmethoxysilyliodine Benzene, p-dicyclopentylmethoxysilyliodobenzene, p-dicyclohexylmethoxysilyliodine , P-cyclohexylmethylmethoxysilyliodobenzene, p-tert-butylmethylmethoxysilyliodobenzene, p-diisopropylethoxysilylchlorobenzene, p-di-sec-butylethoxysilylchlorobenzene, p-dicyclopentylethoxysilylchlorobenzene, p- Dicyclohexylethoxysilylchlorobenzene, p-cyclohexylmethylethoxysilylchlorobenzene, p-tert-butylmethylethoxysilylchlorobenzene, p-diisopropylethoxysilylbromobenzene, p-di-sec-butylethoxysilylbromobenzene, p-dicyclopentylethoxysilylbromo Benzene, p-dicyclohexylethoxysilylbromobenzene, p-cyclohexylmethylethoxysilyl Bromobenzene, p-tert-butylmethylethoxysilylbromobenzene, p-diisopropylethoxysilyliodobenzene, p-di-sec-butylethoxysilyliodobenzene, p-dicyclopentylethoxysilyliodobenzene, p-dicyclohexylethoxysilyliodobenzene P-cyclohexylmethylethoxysilyliodobenzene, p-tert-butylmethylethoxysilyliodobenzene, p-hydroxydiisopropylsilylchlorobenzene, p-hydroxydi-sec-butylsilylchlorobenzene, p-hydroxydicyclopentylsilylchlorobenzene, p-hydroxy Dicyclohexylsilylchlorobenzene, p-hydroxycyclohexylmethylsilylchlorobenzene, p-hydroxy-te rt-butylmethylsilylchlorobenzene, p-hydroxydiisopropylsilylbromobenzene, p-hydroxydi-sec-butylsilylbromobenzene, p-hydroxydicyclopentylsilylbromobenzene, p-hydroxydicyclohexylsilylbromobenzene, p-hydroxycyclohexylmethylsilyl Bromobenzene, p-hydroxy-tert-butylmethylsilylbromobenzene, p-hydroxydiisopropylsilyliodobenzene, p-hydroxydi-sec-butylsilyliodobenzene, p-hydroxydicyclopentylsilyliodobenzene, p-hydroxydicyclohexylsilyliodine Benzene, p-hydroxycyclohexylmethylsilyliodobenzene, p-hydroxy-tert-butylmethyl Lil iodobenzene, and the like.
上記一般式(4)において、Halは塩素原子、臭素原子又はヨウ素原子を表し、R6〜R19及びAは式(1)で定義したものと同じ置換基を表し、nは0〜10の整数である。一般式(4)で表される化合物は、X−An−Halで表され、一般式(4)で表される化合物の具体例としては、上述したX、A、Halで例示したもの及びnの任意の組み合わせからなる化合物が挙げられる。一般式(4)で表される化合物として、より具体的には、下記のものが例示できる。 In the general formula (4), Hal is a chlorine atom, bromine atom or iodine atom, R 6 to R 19 and A represent the same substituents as those defined in formula (1), n of 0 It is an integer. The compound represented by the general formula (4) is represented by X-A n -Hal, and specific examples of the compound represented by the general formula (4) include those exemplified above for X, A, and Hal. The compound which consists of arbitrary combinations of n is mentioned. Specific examples of the compound represented by the general formula (4) include the following.
上記一般式(5)において、R1〜R5は式(1)で定義したものと同じ置換基を表す。一般式(5)で表される化合物は、Z−CH=CH2でも表される。 In the general formula (5), R 1 to R 5 represent the same substituent as defined in formula (1). The compound represented by the general formula (5) is also represented by Z—CH═CH 2 .
上記一般式(5)で表される化合物の具体例としては、o−ヒドロキシジイソプロピルシリルスチレン、o−ヒドロキシジ−sec−ブチルシリルスチレン、o−ヒドロキシジシクロペンチルシリルスチレン、o−ヒドロキシジシクロヘキシルシリルスチレン、o−ヒドロキシシクロヘキシルメチルシリルスチレン、o−ヒドロキシ−tert−ブチルメチルシリルスチレン、o−メトキシジイソプロピルシリルスチレン、o−メトキシジ−sec−ブチルシリルスチレン、o−メトキシジシクロペンチルシリルスチレン、o−メトキシジシクロヘキシルシリルスチレン、o−メトキシシクロヘキシルメチルシリルスチレン、o−メトキシ−tert−ブチルメチルシリルスチレン、m−ヒドロキシジイソプロピルシリルスチレン、m−ヒドロキシジ−sec−ブチルシリルスチレン、m−ヒドロキシジシクロペンチルシリルスチレン、m−ヒドロキシジシクロヘキシルシリルスチレン、m−ヒドロキシシクロヘキシルメチルシリルスチレン、m−ヒドロキシ−tert−ブチルメチルシリルスチレン、m−メトキシジイソプロピルシリルスチレン、m−メトキシジ−sec−ブチルシリルスチレン、m−メトキシジシクロペンチルシリルスチレン、m−メトキシジシクロヘキシルシリルスチレン、m−メトキシシクロヘキシルメチルシリルスチレン、m−メトキシ−tert−ブチルメチルシリルスチレン、p−ヒドロキシジイソプロピルシリルスチレン、p−ヒドロキシジ−sec−ブチルシリルスチレン、p−ヒドロキシジシクロペンチルシリルスチレン、p−ヒドロキシジシクロヘキシルシリルスチレン、p−ヒドロキシシクロヘキシルメチルシリルスチレン、p−ヒドロキシ−tert−ブチルメチルシリルスチレン、p−メトキシジイソプロピルシリルスチレン、p−メトキシジ−sec−ブチルシリルスチレン、p−メトキシジシクロペンチルシリルスチレン、p−メトキシジシクロヘキシルシリルスチレン、p−メトキシシクロヘキシルメチルシリルスチレン、p−メトキシ−tert−ブチルメチルシリルスチレン等が挙げられる。 Specific examples of the compound represented by the general formula (5) include o-hydroxydiisopropylsilylstyrene, o-hydroxydi-sec-butylsilylstyrene, o-hydroxydicyclopentylsilylstyrene, o-hydroxydicyclohexylsilylstyrene, o-hydroxycyclohexylmethylsilylstyrene, o-hydroxy-tert-butylmethylsilylstyrene, o-methoxydiisopropylsilylstyrene, o-methoxydi-sec-butylsilylstyrene, o-methoxydicyclopentylsilylstyrene, o-methoxydicyclohexylsilylstyrene O-methoxycyclohexylmethylsilylstyrene, o-methoxy-tert-butylmethylsilylstyrene, m-hydroxydiisopropylsilylstyrene, m-hydride Xidi-sec-butylsilylstyrene, m-hydroxydicyclopentylsilylstyrene, m-hydroxydicyclohexylsilylstyrene, m-hydroxycyclohexylmethylsilylstyrene, m-hydroxy-tert-butylmethylsilylstyrene, m-methoxydiisopropylsilylstyrene, m -Methoxydi-sec-butylsilylstyrene, m-methoxydicyclopentylsilylstyrene, m-methoxydicyclohexylsilylstyrene, m-methoxycyclohexylmethylsilylstyrene, m-methoxy-tert-butylmethylsilylstyrene, p-hydroxydiisopropylsilylstyrene, p-hydroxydi-sec-butylsilylstyrene, p-hydroxydicyclopentylsilylstyrene, p-hydroxydi Cyclohexylsilyl styrene, p-hydroxycyclohexylmethylsilyl styrene, p-hydroxy-tert-butylmethylsilyl styrene, p-methoxydiisopropylsilyl styrene, p-methoxydi-sec-butylsilyl styrene, p-methoxydicyclopentylsilyl styrene, p -Methoxydicyclohexylsilylstyrene, p-methoxycyclohexylmethylsilylstyrene, p-methoxy-tert-butylmethylsilylstyrene and the like.
上記一般式(2)で表されるビニル基含有トリアリールアミンと上記一般式(3)で表されるハロフェニルケイ素化合物、又は上記一般式(4)で表されるハロゲン含有トリアリールアミンと上記一般式(5)で表されるビニルフェニルケイ素化合物を反応させるために使用する遷移金属触媒としては、パラジウム触媒、ルテニウム触媒、ロジウム触媒、白金触媒、コバルト触媒、ニッケル触媒が挙げられるが、なかでもパラジウム触媒が好ましい。 The vinyl group-containing triarylamine represented by the general formula (2) and the halophenyl silicon compound represented by the general formula (3), or the halogen-containing triarylamine represented by the general formula (4) and the above Examples of the transition metal catalyst used for reacting the vinylphenylsilicon compound represented by the general formula (5) include a palladium catalyst, a ruthenium catalyst, a rhodium catalyst, a platinum catalyst, a cobalt catalyst, and a nickel catalyst. Palladium catalysts are preferred.
パラジウム触媒の具体例としては、ジ−μ−クロロビス[(η−アリル)パラジウム(II)]、酢酸パラジウム、トリス(ジベンジリデンアセトン)ジパラジウム(0)、ビス(ベンゾニトリル)ジクロロパラジウム(II)、トランス−ジクロロビス(トリフェニルホスフィン)パラジウム(II)、ジクロロ(η−シクロオクタ−1,5−ジエン)パラジウム(II)、トランス−ジ−μ−ブロモ−ビス[o−(ジメシチルホスフィノ)−3,5−ジメチルベンジル]ジパラジウム(II)、トランス−ジ−μ−クロロ−ビス[o−(ジメシチルホスフィノ)−3,5−ジメチルベンジル]ジパラジウム(II)、トランス−ジ−μ−ヨード−ビス[o−(ジメシチルホスフィノ)−3,5−ジメチルベンジル]ジパラジウム(II)、トランス−ジ−μ−アセテート−ビス[o−(t−ブチル−o−トリルホスフィノ)ベンジル]ジパラジウム(II)、トランス−ジ−μ−アセテート−ビス[o−(ジ−t−ブチルホスフィノ)ベンジル]ジパラジウム(II)、トランス−ジ−μ−アセテート−ビス[o−(ジ−o−トリルホスフィノ)ベンジル]ジパラジウム(II)等が挙げられる。ルテニウム触媒の具体例としては、塩化ルテニウム(III)、トリス(トリフェニルホスフィン)ルテニウム(II)ジクロリド等が挙げられる。ロジウム触媒の具体例としては、クロロ(1,5−シクロオクタジエン)ロジウム(I)ダイマー、トリス(トリフェニルホスフィン)ロジウム(I)クロリド等が挙げられる。白金触媒の具体例としては、ビス(トリ−tert−ブチルホスフィン)白金(0)、ジクロロ(1,5−シクロオクタジエン)白金(II)等が挙げられる。コバルト触媒の具体例としては、[1,1’−ビス(ジフェニルホスフィノ)フェロセン]コバルト(II)ジクロリド、塩化コバルト(II)六水和物等が挙げられる。ニッケル触媒の具体例としては、ビス(2,4−ペンタンジオナト)ニッケル(II)水和物、ビス(トリフェニルホスフィン)ニッケル(II)ジクロリド、[1,1’−ビス(ジフェニルホスフィノ)フェロセン]ニッケル(II)ジクロリド等が挙げられる。
遷移金属触媒の使用量は、上記式(2)又は式(5)の化合物1モルに対し0.0001〜10モル、特に0.001〜1モルが好ましい。
Specific examples of the palladium catalyst include di-μ-chlorobis [(η-allyl) palladium (II)], palladium acetate, tris (dibenzylideneacetone) dipalladium (0), bis (benzonitrile) dichloropalladium (II). , Trans-dichlorobis (triphenylphosphine) palladium (II), dichloro (η-cycloocta-1,5-diene) palladium (II), trans-di-μ-bromo-bis [o- (dimesitylphosphino) −3,5-dimethylbenzyl] dipalladium (II), trans-di-μ-chloro-bis [o- (dimesitylphosphino) -3,5-dimethylbenzyl] dipalladium (II), trans-di -Μ-iodo-bis [o- (dimesitylphosphino) -3,5-dimethylbenzyl] dipalladium (II), -Di-μ-acetate-bis [o- (t-butyl-o-tolylphosphino) benzyl] dipalladium (II), trans-di-μ-acetate-bis [o- (di-t-butylphosphino) Benzyl] dipalladium (II), trans-di-μ-acetate-bis [o- (di-o-tolylphosphino) benzyl] dipalladium (II), and the like. Specific examples of the ruthenium catalyst include ruthenium (III) chloride, tris (triphenylphosphine) ruthenium (II) dichloride, and the like. Specific examples of the rhodium catalyst include chloro (1,5-cyclooctadiene) rhodium (I) dimer, tris (triphenylphosphine) rhodium (I) chloride, and the like. Specific examples of the platinum catalyst include bis (tri-tert-butylphosphine) platinum (0), dichloro (1,5-cyclooctadiene) platinum (II), and the like. Specific examples of the cobalt catalyst include [1,1′-bis (diphenylphosphino) ferrocene] cobalt (II) dichloride, cobalt chloride (II) hexahydrate and the like. Specific examples of the nickel catalyst include bis (2,4-pentanedionato) nickel (II) hydrate, bis (triphenylphosphine) nickel (II) dichloride, [1,1′-bis (diphenylphosphino) Ferrocene] nickel (II) dichloride and the like.
The usage-amount of a transition metal catalyst is 0.0001-10 mol with respect to 1 mol of compounds of said Formula (2) or Formula (5), Especially 0.001-1 mol is preferable.
上記一般式(1)で表される化合物の製造方法では、反応を行う際に配位子を添加してもよい。このような配位子の例としては、トリフェニルホスフィン、トリ−o−トリルホスフィン、トリブチルホスフィン、トリ−tert−ブチルホスフィン、トリシクロヘキシルホスフィン、ジ−tert−ブチルホスフィノビフェニル、ジシクロヘキシルホスフィノビフェニル、亜リン酸トリフェニル等のリン化合物が挙げられる。
これらの配位子の使用量は、触媒として添加した化合物の遷移金属原子に対して0.5〜2当量が好ましく、特に0.8〜1.5当量が好ましい。
In the method for producing the compound represented by the general formula (1), a ligand may be added during the reaction. Examples of such ligands include triphenylphosphine, tri-o-tolylphosphine, tributylphosphine, tri-tert-butylphosphine, tricyclohexylphosphine, di-tert-butylphosphinobiphenyl, dicyclohexylphosphinobiphenyl, Examples include phosphorus compounds such as triphenyl phosphite.
The amount of these ligands used is preferably 0.5 to 2 equivalents, particularly preferably 0.8 to 1.5 equivalents, based on the transition metal atom of the compound added as a catalyst.
上記製造方法では、反応を行う際に塩基を添加することが好ましい。塩基としては、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、炭酸水素ナトリウム、炭酸水素カリウム等の無機塩、ナトリウムメトキシド、カリウムメトキシド、ナトリウムエトキシド、カリウムエトキシド等の金属アルコキシド、メチルアミン、ジエチルアミン、トリエチルアミン、ピリジン等の有機塩基が挙げられる。
塩基の使用量は、上記式(2)又は式(5)の化合物1モルに対し0.1〜10モル、特に1〜3モルが好ましい。
In the said manufacturing method, it is preferable to add a base when performing reaction. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium methoxide, potassium methoxide, sodium ethoxide, potassium ethoxide, etc. Organic bases such as metal alkoxide, methylamine, diethylamine, triethylamine, pyridine and the like can be mentioned.
The amount of the base used is preferably from 0.1 to 10 mol, particularly preferably from 1 to 3 mol, per 1 mol of the compound of the above formula (2) or formula (5).
本発明の製造方法においては、反応時に重合禁止剤を添加してもよい。重合禁止剤としては、ハイドロキノン、t−ブチルカテコール、2,6−ジ−tert−ブチル−4−メチルフェノール等が挙げられ、特に2,6−ジ−tert−ブチル−4−メチルフェノールが好ましい。
重合禁止剤の使用量は、上記式(2)又は式(5)の化合物1モルに対し0.001〜10モル、特に0.01〜0.1モルが好ましい。
In the production method of the present invention, a polymerization inhibitor may be added during the reaction. Examples of the polymerization inhibitor include hydroquinone, t-butylcatechol, 2,6-di-tert-butyl-4-methylphenol, and 2,6-di-tert-butyl-4-methylphenol is particularly preferable.
The amount of the polymerization inhibitor used is preferably 0.001 to 10 mol, particularly preferably 0.01 to 0.1 mol, per 1 mol of the compound of the above formula (2) or formula (5).
溶媒は、ニトリル系溶媒やアミド系溶媒が好ましく、具体例として、アセトニトリル、プロピオニトリル、ジメチルアセトアミド、ジメチルホルムアミド又はこれらの混合溶媒等が挙げられる。 The solvent is preferably a nitrile solvent or an amide solvent, and specific examples include acetonitrile, propionitrile, dimethylacetamide, dimethylformamide, or a mixed solvent thereof.
上記反応の反応温度は、0℃〜200℃、特に120℃〜180℃が好ましい。反応時間は1〜20時間、特に1〜10時間が好ましい。 The reaction temperature of the above reaction is preferably 0 ° C to 200 ° C, particularly preferably 120 ° C to 180 ° C. The reaction time is preferably 1 to 20 hours, particularly 1 to 10 hours.
本発明の一般式(1)で表される化合物は、ケイ素置換基のうち少なくとも一つが反応性置換基である反応性のシリル基を有しており、無機固体表面に結合させて無機材料として利用することができる。 The compound represented by the general formula (1) of the present invention has a reactive silyl group in which at least one of the silicon substituents is a reactive substituent, and is bonded to an inorganic solid surface as an inorganic material. Can be used.
無機固体は限定されないが、例えばシリコン、ゲルマニウム、ガリウム、インジウム、鉄、ニッケル、銅、コバルト、クロム、モリブデン、ルテニウム、銀、真鍮、ステンレススチール等の金属、酸化ケイ素、酸化ゲルマニウム、酸化チタン、酸化亜鉛、酸化ジルコニウム、酸化スズ、酸化アルミニウム、酸化マグネシウム、酸化インジウム、チタン酸バリウム、チタン酸ジルコン酸鉛、酸化インジウムスズ、酸化アルミニウム亜鉛、酸化インジウム亜鉛、フッ素ドープ酸化スズ等の金属酸化物、ソーダライムガラス、ホウケイ酸ガラス等のガラス等が挙げられる。固体材料の表面形状についても限定されず、平面、曲面、マイクロ構造、ナノ構造等いずれにも適用することができる。 Examples of inorganic solids include, but are not limited to, metals such as silicon, germanium, gallium, indium, iron, nickel, copper, cobalt, chromium, molybdenum, ruthenium, silver, brass, and stainless steel, silicon oxide, germanium oxide, titanium oxide, and oxide. Zinc, zirconium oxide, tin oxide, aluminum oxide, magnesium oxide, indium oxide, barium titanate, lead zirconate titanate, indium tin oxide, zinc oxide zinc, indium zinc oxide, fluorine-doped tin oxide and other metal oxides, soda Examples of the glass include lime glass and borosilicate glass. The surface shape of the solid material is not limited, and can be applied to any of flat surfaces, curved surfaces, microstructures, nanostructures, and the like.
無機固体が表面に水酸基等の反応点を有する場合はそのまま使用してもよいが、水酸基が少ない場合には親水化処理を行うことが好ましく、酸素プラズマ処理、コロナ処理、UVオゾン処理等の乾式処理やピラニア溶液を用いた湿式処理によって無機固体表面を酸化的に親水化処理し、表面水酸基の数を増やすことができる。 When the inorganic solid has a reactive site such as a hydroxyl group on the surface, it may be used as it is, but when there are few hydroxyl groups, it is preferable to perform a hydrophilic treatment, such as oxygen plasma treatment, corona treatment, UV ozone treatment, etc. The surface of the inorganic solid can be oxidatively hydrophilized by a treatment or a wet treatment using a piranha solution to increase the number of surface hydroxyl groups.
無機固体と一般式(1)で表される化合物とを接触させる方法は任意である。例えば、一般式(1)で表される化合物の溶液を調製し、固体材料を浸漬する液相法、反応室内に一般式(1)で表される化合物を揮発させ、無機固体と接触させて気相で吸着製膜する気相法等が挙げられる。 A method of bringing the inorganic solid into contact with the compound represented by the general formula (1) is arbitrary. For example, a solution of the compound represented by the general formula (1) is prepared, a liquid phase method in which a solid material is immersed, the compound represented by the general formula (1) is volatilized in a reaction chamber, and contacted with an inorganic solid. Examples thereof include a gas phase method in which an adsorption film is formed in the gas phase.
一般式(1)で表される化合物はそのまま使用することもできるし、無機固体と接触させる前に予め加水分解させておいてもよい。また、無機固体と接触させるにあたり必要量の水分を共存させることによって、加水分解と固体表面への固定を連続的に行わせることもできる。
一般式(1)で表される化合物が無機固体へ固定される量は、無機固体の種類や比表面積、表面水酸基の密度によって異なる。一般的に、固定される式(1)の化合物の最大数は無機固体表面の水酸基の数と同じである。ただし、固定された一般式(1)の化合物の投影面積が無機固体の表面水酸基一個あたりの表面積より大きい場合には、固定される式(1)の化合物の最大数は投影面積と無機固体の比表面積とにより決定される。式(1)の化合物と無機固体との接触方法を調節することにより、上記最大数を超えない範囲で任意に固定量を変化させることができる。
The compound represented by the general formula (1) can be used as it is, or may be hydrolyzed in advance before contacting with the inorganic solid. In addition, hydrolysis and fixation on the solid surface can be continuously performed by allowing a necessary amount of moisture to coexist with the inorganic solid.
The amount by which the compound represented by the general formula (1) is fixed to the inorganic solid varies depending on the kind of inorganic solid, the specific surface area, and the density of surface hydroxyl groups. In general, the maximum number of compounds of formula (1) to be fixed is the same as the number of hydroxyl groups on the surface of the inorganic solid. However, when the projected area of the fixed compound of the general formula (1) is larger than the surface area per surface hydroxyl group of the inorganic solid, the maximum number of fixed compounds of the formula (1) is the projected area and the inorganic solid It is determined by the specific surface area. By adjusting the contact method between the compound of formula (1) and the inorganic solid, the fixed amount can be arbitrarily changed within a range not exceeding the maximum number.
本発明の一般式(1)で表される化合物は、酸化チタン、酸化スズ、酸化亜鉛等のワイドバンドギャップ酸化物半導体と結合することができ、また可視光を吸収することができるので、色素増感型光電変換素子の色素として使用される。 The compound represented by the general formula (1) of the present invention can be combined with a wide band gap oxide semiconductor such as titanium oxide, tin oxide, and zinc oxide, and can absorb visible light. Used as a dye for sensitized photoelectric conversion elements.
具体的には、インジウムスズ酸化物やフッ素ドープ酸化スズに代表される透明導電性薄膜を表面に有するガラスやプラスチック基板上に、前記ワイドバンドギャップ酸化物半導体の微粒子を塗布して、厚さ1〜50μmに製膜する。この微粒子上に一般式(1)で表される化合物を接触させることにより結合させて、作用電極を作製する。この作用電極と対向電極とを、封止材により貼り合わせた後、電解液を注入して注入口を封止することにより、色素増感型光電変換素子を組み立てることができる。
一般式(1)で表される化合物の接触量は任意であるが、通常は固体の表面水酸基の数に対して過剰量を使用して接触させ、10倍モル以上の量を使用することが好ましい。
Specifically, fine particles of the wide band gap oxide semiconductor are coated on a glass or plastic substrate having a transparent conductive thin film typified by indium tin oxide or fluorine-doped tin oxide on the surface to obtain a thickness of 1 Film is formed to ˜50 μm. A working electrode is prepared by bonding the fine particles to a compound represented by the general formula (1) by bringing them into contact with each other. A dye-sensitized photoelectric conversion element can be assembled by bonding the working electrode and the counter electrode together with a sealing material, and then injecting an electrolytic solution to seal the injection port.
Although the contact amount of the compound represented by the general formula (1) is arbitrary, it is usually possible to use an excess amount with respect to the number of solid surface hydroxyl groups and use an amount of 10 times mol or more. preferable.
対向電極としては、電気化学的に触媒作用のある白金やカーボンを表面に有する基板を使用することが好ましく、具体的には白金板、表面に白金薄膜を有するチタン板、表面に白金薄膜を有する透明導電性薄膜付きのガラス、プラスチック基板、グラファイト等が使用できる。 As the counter electrode, a substrate having electrochemically catalytic platinum or carbon on the surface is preferably used. Specifically, a platinum plate, a titanium plate having a platinum thin film on the surface, and a platinum thin film on the surface are used. Glass with a transparent conductive thin film, a plastic substrate, graphite or the like can be used.
封止材の例としては、エポキシ樹脂等の熱硬化性樹脂、アイオノマー樹脂等の熱融着性樹脂等が挙げられる。作用電極と対向電極の間の封止材の厚みは前記ワイドバンドギャップ酸化物半導体薄膜の厚み以上であれば任意であるが、通常1〜100μmである。 Examples of the sealing material include a thermosetting resin such as an epoxy resin, a heat-fusible resin such as an ionomer resin, and the like. Although the thickness of the sealing material between a working electrode and a counter electrode is arbitrary as long as it is more than the thickness of the said wide band gap oxide semiconductor thin film, it is 1-100 micrometers normally.
電解液としては、通常ヨウ素を溶解させた有機液体やイオン液体が使用される。有機液体の例としては、アセトニトリル、プロピオニトリル、バレロニトリル、メトキシプロピオニトリル、ブチロラクトン、炭酸エチレン、炭酸プロピレン等が挙げられ、イオン液体の例としては、1,3−ジメチルイミダゾリウムアイオダイド、1−エチル−3−メチルイミダゾリウムアイオダイド、1−プロピル−3−メチルイミダゾリウムアイオダイド、1−ブチル−3−メチルイミダゾリウムアイオダイド、1−ヘキシル−3−メチルイミダゾリウムアイオダイド、1−ブチル−3−メチルイミダゾリウムテトラフルオロボレート、1−ブチル−3−メチルイミダゾリウムヘキサフルオロホスフェート、1−ブチル−3−メチルイミダゾリウムトリフルオロメタンスルホネート、1−エチル−3−メチルイミダゾリウムチオシアネート、1−ブチル−3−メチルイミダゾリウムチオシアネート、1−エチル−3−メチルイミダゾリウムビス(ペンタフルオロエチルスルホニル)イミド、1−ブチル−3−メチルイミダゾリウムビス(トリフルオロメチルスルホニル)イミド、1−ヘキシル−3−メチルイミダゾリウムビス(トリフルオロメチルスルホニル)イミド、1−ヘキシル−3−メチルイミダゾリウムトリス(ペンタフルオロエチル)トリフルオロホスフェート、1−ブチル−3−メチルイミダゾリウムヘキサフルオロアンチモネート、1−プロピル−2,3−ジメチルイミダゾリウムトリス(トリフルオロメタンスルホニル)メチド、1−ブチル−3−メチルイミダゾリウムジシアンアミド、1−ブチル−1−メチルピロリジニウムジシアンアミド、3−メチル−1−ブチルピリジニウムビス(トリフルオロメチルスルホニル)イミド等が挙げられる。 As the electrolytic solution, an organic liquid or an ionic liquid in which iodine is dissolved is usually used. Examples of organic liquids include acetonitrile, propionitrile, valeronitrile, methoxypropionitrile, butyrolactone, ethylene carbonate, propylene carbonate, etc. Examples of ionic liquids include 1,3-dimethylimidazolium iodide, 1-ethyl-3-methylimidazolium iodide, 1-propyl-3-methylimidazolium iodide, 1-butyl-3-methylimidazolium iodide, 1-hexyl-3-methylimidazolium iodide, 1- Butyl-3-methylimidazolium tetrafluoroborate, 1-butyl-3-methylimidazolium hexafluorophosphate, 1-butyl-3-methylimidazolium trifluoromethanesulfonate, 1-ethyl-3-methylimidazolium thiocyanate 1-butyl-3-methylimidazolium thiocyanate, 1-ethyl-3-methylimidazolium bis (pentafluoroethylsulfonyl) imide, 1-butyl-3-methylimidazolium bis (trifluoromethylsulfonyl) imide, -Hexyl-3-methylimidazolium bis (trifluoromethylsulfonyl) imide, 1-hexyl-3-methylimidazolium tris (pentafluoroethyl) trifluorophosphate, 1-butyl-3-methylimidazolium hexafluoroantimonate, 1-propyl-2,3-dimethylimidazolium tris (trifluoromethanesulfonyl) methide, 1-butyl-3-methylimidazolium dicyanamide, 1-butyl-1-methylpyrrolidinium dicyanamide, 3-methyl 1-butyl pyridinium bis (trifluoromethylsulfonyl) imide, and the like.
また、これらに加えて性能を向上させるためにヨウ化リチウム等の無機塩、グアニジウムチオシアネート、2,3−ジメチル−1−プロピルイミダゾリウムアイオダイド等の有機塩、4−tert−ブチルピリジン、N−メチルベンズイミダゾール等の塩基性化合物を電解液に添加することもできる。 In addition to these, in order to improve performance, inorganic salts such as lithium iodide, organic salts such as guanidinium thiocyanate, 2,3-dimethyl-1-propylimidazolium iodide, 4-tert-butylpyridine, A basic compound such as N-methylbenzimidazole can also be added to the electrolyte.
次に、本発明を実施例により更に具体的に説明するが、本発明は以下の実施例によって何ら限定されるものではない。なお、下記例において、Meはメチル基である。 EXAMPLES Next, although an Example demonstrates this invention further more concretely, this invention is not limited at all by the following examples. In the following examples, Me is a methyl group.
[実施例1]化合物(1−7)の合成
窒素雰囲気下、3−[4−(4−(ジフェニルアミノ)スチリル)スチリル]ブロモベンゼン269.6mg(0.51mmol)を脱水テトラヒドロフラン6mlに溶解させた。その後、ドライアイスバスで−70℃まで冷やし、2.6Mのn−ブチルリチウム0.4ml(1.04mmol)を約10分かけて滴下した。そのままの温度で30分攪拌した後、ジイソプロピルジクロロシラン235.0g(1.28mmol)を加え、徐々に室温まで昇温させ、終夜で攪拌を行った。炭酸水素ナトリウム水溶液を加えて反応を終了した後、分液操作により有機層を抽出した。得られた溶液を硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮し、HPLCにより精製し、黄色固体45.5mgを得た。この固体のNMRスペクトル及びMALDI−TOFMSスペクトルを測定した結果、下記に示す化合物(1−7)であることが確認された。
1H−NMR(300MHz,δ in CDCL3):1.00(d,J=7.4Hz,6H),1.08(d,J=7.1Hz,6H),1.18−1.34(m,2H),1.62(s,1H),6.95−7.14(m,12H),7.23−7.31(m,4H),7.36−7.60(m,9H),7.68(s,1H)
13C−NMR(75MHz,δ in CDCL3):12.43,16.94,17.21,123.05,123.53,124.52,126.62.126.82,127.22,127.35,128.00,128.07,128.26,128.61,129.28,131.48,132.49,133.34,135.84,136.41,136.50,137.00,147.38,147.52
MALDI−TOFMS m/z:579.0(M+)
1 H-NMR (300 MHz, δ in CDCL 3 ): 1.00 (d, J = 7.4 Hz, 6H), 1.08 (d, J = 7.1 Hz, 6H), 1.18-1.34 (M, 2H), 1.62 (s, 1H), 6.95-7.14 (m, 12H), 7.23-7.31 (m, 4H), 7.36-7.60 (m , 9H), 7.68 (s, 1H)
13 C-NMR (75 MHz, δ in CDCL 3 ): 12.43, 16.94, 17.21, 123.05, 123.53, 124.52, 126.6.2126.82, 127.22, 127 .35, 128.00, 128.07, 128.26, 128.61, 129.28, 131.48, 132.49, 133.34, 135.84, 136.41, 136.50, 137.00 , 147.38, 147.52
MALDI-TOFMS m / z: 579.0 (M + )
[実施例2]化合物(1−8)の合成
窒素雰囲気下、4−(4−(ジフェニルアミノ)スチリル)スチレン372.5mg(1.00mmol)、p−ヒドロキシジイソプロピルシリルブロモベンゼン288.6mg(1.01mmol)、炭酸ナトリウム159.0mg(1.50mmol)、2,6−ジ−tert−ブチル−4−メチルフェノール22.4mg(0.10mmol)、トランス−ジ−μ−アセテート−ビス[o−(ジ−o−トリルホスフィノ)ベンジル]ジパラジウム(II)16.7mg(0.018mmol)をジメチルアセトアミドl0mlに加え、145℃で8時間攪拌した。得られた溶液を減圧濃縮し、水とトルエンを加えた後、分液操作により有機層を抽出した。得られた溶液を硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮した後、HPLCにより精製して黄色固体191.0mgを得た。この固体のNMRスペクトル及びMALDI−TOFMSスペクトルを測定した結果、下記に示す化合物(1−8)であることが確認された。
1H−NMR(300MHz,δ in CDCL3):0.99(d,J=7.3Hz,6H),1.06(d,J=7.1Hz,6H),1.16−1.31(m,2H),1.73(s,1H),6.95−7.14(m,12H),7.22−7.29(m,4H),7.36−7.42(m,2H),7.46−7.57(m,8H)
13C−NMR(75MHz,δ in CDCL3):12.44,16.92,17.17,123.06,123.52,124.52,125.70.126.56,126.62,126.90,127.37,128.14,128.31,128.79,129.28,131.44,134.50,134.82,136.30,137.12,138.25,147.40,147.51
MALDI−TOFMS m/z:579.1(M+)
1 H-NMR (300 MHz, δ in CDCL 3 ): 0.99 (d, J = 7.3 Hz, 6H), 1.06 (d, J = 7.1 Hz, 6H), 1.16-1.31 (M, 2H), 1.73 (s, 1H), 6.95-7.14 (m, 12H), 7.22-7.29 (m, 4H), 7.36-7.42 (m , 2H), 7.46-7.57 (m, 8H)
13 C-NMR (75 MHz, δ in CDCL 3 ): 12.44, 16.92, 17.17, 123.06, 123.52, 124.52, 125.70.126.56, 126.62, 126 .90, 127.37, 128.14, 128.31, 128.79, 129.28, 131.44, 134.50, 134.82, 136.30, 137.12, 138.25, 147.40 1474.71
MALDI-TOFMS m / z: 579.1 (M + )
[実施例3]化合物(1−9)の合成
窒素雰囲気下、4−[4−(4−(ジフェニルアミノ)スチリル)スチリル]ブロモベンゼン526.4mg(1.00mmol)、m−メトキシジイソプロピルシリルスチレン248.0mg(1.00mmol)、炭酸ナトリウム158.5mg(1.50mmol)、2,6−ジ−tert−ブチル−4−メチルフェノール25.3mg(0.11mmol)、トランス−ジ−μ−アセテート−ビス[o−(ジ−o−トリルホスフィノ)ベンジル]ジパラジウム(II)22.6mg(0.024mmol)をジメチルアセトアミドl0mlに加え、150℃で8時間攪拌した。得られた溶液を減圧濃縮し、水とトルエンを加えた後、分液操作により有機層を抽出した。硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮した後、THF15ml、10%HCl溶液3mlを加え、2時間攪拌した。分液操作により有機層を抽出し、硫酸マグネシウムで乾燥した後、ロータリーエバポレーターにて減圧濃縮し、HPLCにより精製して黄色固体157.7mgを得た。この固体のNMRスペクトル及びMALDI−TOFMSスペクトルを測定した結果、下記に示す化合物(1−9)であることが確認された。
1H−NMR(300MHz,δ in CDCL3):1.00(d,J=7.3Hz,6H),1.08(d,J=7.1Hz,6H),1.15−1.31(m,2H),1.84(s,1H),7.00−7.06(m,6H),7.09−7.14(m,8H),7.23−7.29(m,5H),7.33−7.40(m,4H),7.43−7.58(m,8H),7.70(brS,1H)
MALDI−TOFMS m/z:681.4(M+)
1 H-NMR (300 MHz, δ in CDCL 3 ): 1.00 (d, J = 7.3 Hz, 6H), 1.08 (d, J = 7.1 Hz, 6H), 1.15 to 1.31 (M, 2H), 1.84 (s, 1H), 7.00-7.06 (m, 6H), 7.09-7.14 (m, 8H), 7.23-7.29 (m , 5H), 7.33-7.40 (m, 4H), 7.43-7.58 (m, 8H), 7.70 (brS, 1H)
MALDI-TOFMS m / z: 681.4 (M + )
[実施例4]化合物(1−13)の合成
窒素雰囲気下、5’−[N,N−ビス(9,9’−ジメチルフルオレン−2−イル)フェニル]−2,2’−ビチオフェン−5−エチレン241.2mg(0.36mmol)、m−ヒドロキシジイソプロピルシリルブロモベンゼン122.5mg(0.43mmol)、炭酸ナトリウム65.8mg(0.62mmol)、2,6−ジ−tert−ブチル−4−メチルフェノール13.3mg(0.06mmol)、トランス−ジ−μ−アセテート−ビス[o−(ジ−o−トリルホスフィノ)ベンジル]ジパラジウム(II)13.5mg(0.014mmol)をジメチルアセトアミド5mlに加え、150℃で17時間攪拌した。得られた溶液を減圧濃縮し、水とトルエンを加えた後、分液操作により有機層を抽出した。得られた溶液を硫酸マグネシウムにより乾燥し、ロータリーエバポレーターにて減圧濃縮した後、HPLCにより精製して褐色固体103.4mgを得た。この固体のNMRスペクトル及びMALDI−TOFMSスペクトルを測定した結果、下記に示す化合物(1−13)であることが確認された。
1H−NMR(300MHz,δ in CDCL3):0.99(d,J=7.3Hz,6H),1.07(d,J=7.1Hz,6H),1.14−1.33(m,2H),1.42(s,12H),1.70(s,1H),6.88(d,J=15.9Hz,1H),6.98(d,J=3.7Hz,1H),7.08−7.70(m,28H)
MALDI−TOFMS m/z:873.4(M+)
1 H-NMR (300 MHz, δ in CDCL 3 ): 0.99 (d, J = 7.3 Hz, 6H), 1.07 (d, J = 7.1 Hz, 6H), 1.14—1.33 (M, 2H), 1.42 (s, 12H), 1.70 (s, 1H), 6.88 (d, J = 15.9 Hz, 1H), 6.98 (d, J = 3.7 Hz) , 1H), 7.08-7.70 (m, 28H)
MALDI-TOFMS m / z: 873.4 (M + )
[実施例5、比較例1]化合物(1−7)及び化合物(15)の溶解度
実施例1で合成した化合物(1−7)及び比較例としてケイ素置換基を持たない下記化合物(15)のアセトニトリル、エタノールに対する溶解度を下記に示す方法により調べた。結果を表1に示す。
〔溶解度の測定方法〕
秤量した各化合物に、アセトニトリル、エタノール溶媒を加えて濃度が5mMとなるように溶液を調製し、溶け残りがあるかを調べた。化合物(15)では溶け残りがあったため、更に溶媒を加えて濃度が0.01mMとなるように溶液を調製して溶け残りがあるかを調べた。
[Example 5, Comparative Example 1] Solubility of Compound (1-7) and Compound (15) Compound (1-7) synthesized in Example 1 and the following compound (15) having no silicon substituent as a comparative example The solubility in acetonitrile and ethanol was examined by the following method. The results are shown in Table 1.
[Method of measuring solubility]
Acetonitrile and ethanol solvent were added to each weighed compound to prepare a solution so that the concentration was 5 mM, and it was examined whether there was any undissolved residue. Since there was undissolved residue in compound (15), a solvent was further added to prepare a solution having a concentration of 0.01 mM, and it was examined whether there was any undissolved residue.
[実施例6]化合物(1−13)の酸化チタン粒子表面への吸着
実施例4で合成した化合物(1−13)の5mMトルエン溶液を調製し、厚み5μmの酸化チタンナノ粒子膜を形成した導電性ガラス(フッ素ドープ酸化スズ)を24時間室温で浸漬した。基板をトルエンで洗浄した後、電子プローブマイクロ分析法(EPMA)及びX線光電子分光法(XPS)により表面の分析を行った。結果を表2に示す。各元素の相対感度係数の違いや分析方法による検出深さの違いによって検出されにくい元素があるが、二種の分析結果を総合すると有効量の化合物(1−13)が酸化チタン表面に吸着されていると判断される。
[Example 6] Adsorption of compound (1-13) onto the surface of titanium oxide particles A 5 mM toluene solution of the compound (1-13) synthesized in Example 4 was prepared to form a titanium oxide nanoparticle film having a thickness of 5 µm. Glass (fluorine-doped tin oxide) was immersed at room temperature for 24 hours. After the substrate was washed with toluene, the surface was analyzed by electron probe microanalysis (EPMA) and X-ray photoelectron spectroscopy (XPS). The results are shown in Table 2. Although there are elements that are difficult to detect due to differences in the relative sensitivity coefficient of each element and differences in detection depth depending on the analysis method, an effective amount of the compound (1-13) is adsorbed on the titanium oxide surface when the two analysis results are combined. It is judged that
Claims (4)
(式中、R6〜R19は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20の1価炭化水素基、非置換又は置換の炭素数1〜20のオルガノキシ基、水素原子、及び二置換のアミノ基から選択される置換基を表し、R6〜R19のうち隣接する2つは互いに結合してこれらが結合する炭素原子と共に環を形成してもよい。R1〜R5は、同一でも異なってもよく、それぞれ非置換又は置換の炭素数1〜20の1価炭化水素基、非置換又は置換の炭素数1〜20のオルガノキシ基、水素原子、二置換のアミノ基、及びSiR20R21R22で表される反応性のシリル基から選択される置換基を表す。ただしR1〜R5のうち1つは、SiR20R21R22で表される反応性のシリル基である。R20、R21はそれぞれ独立に、非置換又は置換の炭素数1〜20の1価炭化水素基、炭素数1〜20のアシロキシ基、水酸基、水素原子、メルカプト基、非置換又は置換のアミノ基、シアナート基、イソシアナート基、チオシアナート基及びイソチオシアナート基から選択される置換基を表す。R22 は水酸基である。Aは非置換又は置換の2価の共役性置換基を示し、nは0〜10の整数である。) A triarylamine derivative having a reactive silyl group represented by the following general formula (1).
(Wherein R 6 to R 19 may be the same or different and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted organooxy group having 1 to 20 carbon atoms, It represents a substituent selected from a hydrogen atom and a disubstituted amino group, and two adjacent R 6 to R 19 may be bonded to each other to form a ring together with the carbon atom to which they are bonded. 1 to R 5 may be the same or different and are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, an unsubstituted or substituted organooxy group having 1 to 20 carbon atoms, a hydrogen atom, disubstituted And a substituent selected from a reactive silyl group represented by SiR 20 R 21 R 22 , wherein one of R 1 to R 5 is represented by SiR 20 R 21 R 22. that is a reactive silyl group .R 20, R 21 are each independently an unsubstituted or Conversion monovalent hydrocarbon group having 1 to 20 carbon atoms, an acyloxy group having a carbon number of 1-20, a hydroxyl group, water atom, a mercapto group, an unsubstituted or substituted amino group, a cyanate group, isocyanate group, thiocyanate group and .R represents a substituent selected from the isothiocyanate group 22 is water group .A is a divalent conjugated substituent unsubstituted or substituted, n represents an integer of 0.)
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JP5299260B2 (en) * | 2009-12-24 | 2013-09-25 | 信越化学工業株式会社 | Method for surface treatment of solid material |
JP2011132165A (en) * | 2009-12-24 | 2011-07-07 | Shin-Etsu Chemical Co Ltd | Method for producing olefin compound comprising silanol group |
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