JP5395850B2 - mask - Google Patents

Description

  The present invention relates to a mask.

  There is a two-layered mask in which a layer formed by plating and having a printed pattern opening and a layer formed by plating and having a mesh pattern opening are stacked. In particular, in a two-layered mask, there is a mask in which a mesh that forms a mesh pattern opening is not connected at an acute angle at a portion that overlaps an edge of a printed pattern opening (see Patent Document 1). Thereby, at the time of printing, the ink paste is prevented from being clogged and solidified in the mesh pattern opening formed in the portion overlapping the edge of the printing pattern opening. Further, there is a mesh in which a plurality of holes are formed in a honeycomb structure (see Patent Document 2).

JP 2006-347099 A JP-A-8-52951

The conventional mesh was manufactured by controlling the shape and size of the holes formed at the end of the mesh formation region from the relationship between the shape and size of the holes formed at other parts (other ends). There is nothing. For this reason, in the conventional mesh, the amount of ink paste transmitted at the end is different from the amount of ink paste transmitted at other portions. Therefore, for example, when printing is performed with a mask using a conventional mesh, the ink paste cannot be uniformly applied to the end portion of the portion where the mesh is formed with other portions.
In addition, in order to control the amount of ink paste permeated at the end of the mesh formation region, the shape of the hole formed at the end may be deformed while ignoring the regularity with the holes formed at other portions. There is a risk that the strength of the steel will decrease.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a mask manufactured using a mesh having a high strength and capable of uniformly applying an ink paste to a portion where the mesh is formed.

Mask according to the present invention, the central portion of the predetermined rectangular area diamond shaped holes are regularly formed, the sides at the end of the rectangular area (peripheral portion) which forms part of the sides and the rectangular region of the rhombus Is a mask having a mesh for printing pattern openings in which pentagonal holes including a part of the rectangular pattern are regularly formed. At the end excluding the corners (four corners) of the rectangular region, two sides of the rhombus and a rectangle A home base-shaped pentagonal hole is formed with a part of the side of the region as one side and two opposite sides parallel to the side of the rectangular region. And a diamond-shaped pentagonal hole having two sides that are orthogonal to each other and two sides that form a rectangular region and two sides that are parallel to each other. A rib with a predetermined width is formed between them, and is formed at the end of the rectangular area excluding the corners (four corners). The home base-shaped pentagonal holes are arranged so as to be symmetrical with the home base-shaped pentagonal holes formed at the opposite ends, and are diamond-shaped at the corners of the rectangular region. The pentagonal holes are arranged so as to be paired on the diagonal line of the rectangular area, and are formed at the end of the rectangular area excluding the area of the rhombic hole formed at the center of the rectangular area and the corners (four corners) of the rectangular area And the area of the diamond-shaped pentagonal holes formed at the corners of the rectangular region is larger than the area of the diamond-shaped holes and the home-base-shaped pentagonal holes. Characterized by being made smaller .

Also, a two-layer structure mask according to the present invention, the central portion of the predetermined rectangular area diamond shaped holes are regularly formed, the ends of the rectangular area (peripheral portion) and a portion of the rhombus sides A layer having a mesh for printing pattern opening in which pentagonal holes including a part of a side forming a rectangular region are regularly formed, and a printing pattern having a printing opening provided on one surface of the layer having the mesh. A two-layer structure mask having a layer, and a layer having a mesh for printing pattern opening, has two sides of a rhombus and one side forming a rectangular region at an end portion excluding corners (four corners) of the rectangular region. A home-base pentagonal hole is formed with two sides facing each other parallel to the side forming the rectangular region. The corner of the rectangular region forms a rectangular region with one side of the rhombus Two sides that are part of two sides and are perpendicular to each other and form a rectangular area Diamond-shaped pentagonal holes each consisting of two parallel sides are formed, and ribs of a predetermined width are formed between each hole, and formed at the end of the rectangular area excluding the corners (four corners) The home base-shaped pentagonal holes are arranged so as to be symmetrical with the home base-shaped pentagonal holes formed at the opposite ends, and are diamond-shaped at the corners of the rectangular region. The pentagonal holes are arranged so as to be paired on the diagonal line of the rectangular area, and are formed at the end of the rectangular area excluding the area of the rhombic hole formed at the center of the rectangular area and the corners (four corners) of the rectangular area And the area of the diamond-shaped pentagonal holes formed at the corners of the rectangular region is larger than the area of the diamond-shaped holes and the home-base-shaped pentagonal holes. Characterized by being made smaller .

  In the mask according to the present invention, rhombic holes having the same shape are regularly formed in the central portion of the rectangular region, and the ink paste can be uniformly applied to the central portion. In the mask according to the present invention, a pentagonal hole formed at the opposite end and a pentagonal hole having a symmetrical shape are formed at the ends excluding the corners of the rectangular region, and uniform between the opposite ends. An ink paste can be applied. Furthermore, since the mask according to the present invention has holes regularly formed up to the end portion, there is no portion with low strength.

FIG. 3 is a diagram showing an opening shape of a mesh 3 according to the first embodiment. FIG. 3 is a functional block diagram illustrating functions of the mesh pattern creation device 100 according to the first embodiment. 5 is a flowchart showing a flow of mesh pattern data creation processing according to the first embodiment. Explanatory drawing of calculation of the width of a rhombus. Explanatory drawing of the process which arranges a rhombus. Explanatory drawing of the process which merges the polygon formed in the edge part and the adjacent rhombus. Explanatory drawing of the process which adjusts the area of a figure. Explanatory drawing of the process which adjusts the width | variety of the rib. Explanatory drawing of the other example of the process which arranges a rhombus. Explanatory drawing of the process which moves a rhombus. Explanatory drawing of the process which manufactures the mask of the 1 layer structure which has a mesh in the printing pattern opening 51 part. The figure which shows the mask of 1 layer structure which has a mesh in the printing pattern opening 51 part. Explanatory drawing of the process which manufactures the mask of the 2 layer structure which has a layer which has a mesh, and the resin layer which has the printing pattern opening 51. FIG. Explanatory drawing of the process which manufactures the metal mask of the 2 layer structure which has the layer which has a mesh, and the metal layer which has the printing pattern opening 51. FIG. The figure which shows an example of the hardware constitutions of the mesh pattern production apparatus 100.

Embodiment 1 FIG.
In this embodiment, a mesh 3 in which a plurality of rhombuses (an example of a regular figure) having the same side length (width) S5 is formed in a predetermined rectangular region 10 will be described.

FIG. 1 is a diagram showing the opening shape of the mesh 3 according to this embodiment.
As shown in FIG. 1, the mesh 3 according to this embodiment has regularly arranged rhombus holes 31 having the same length (width) S5 of a plurality of sides in a specified X × Y rectangular region 10. Is formed. A rhombus hole 31 is formed at the center of the rectangular area 10, and one end of the rhombus forming the rhomboid hole 31 and one side forming the rectangular area 10 are formed at the end (peripheral part) of the rectangular area 10. Polygonal holes (an example of a deformed figure) 32 and 33 are formed by the portion. A pentagonal hole 32 having a part of the side forming the rectangular region 10 as one side is formed at the end of the rectangular region 10 excluding the corners (four corners). At the corner of the rectangular region 10, a pentagonal hole 33 is formed with a part of two sides forming the rectangular region 10 as one side. A rib 14 having a predetermined width is formed between the holes 31, 32 and 33.
The polygonal holes 32 and 33 formed at the end portions of the rectangular region 10 are symmetrical with the polygonal holes 32 and 33 formed at the opposite end portions. In particular, the opening area of the pentagonal hole 32 formed at the end in the vertical direction excluding the corners of the rectangular region 10 is the same as the opening area of the rhombic hole 31.
As described above, since the mesh 3 according to this embodiment has a plurality of identical rhombic holes 31 formed in the central portion of the rectangular region 10, the ink paste is uniformly applied to the entire central portion of the rectangular region 10. Can be applied. In addition, since the pentagonal hole 32 having the same opening area as the rhomboid hole 31 is formed at the end in the vertical direction excluding the corners of the rectangular region 10, the ink paste is uniformly applied together with the central portion of the rectangular region 10. can do.
In addition, the mesh 3 according to this embodiment has high strength because holes are regularly formed.

Next, a method for creating mesh pattern data of the mesh 3 according to this embodiment will be described.
FIG. 2 is a functional block diagram illustrating functions of the mesh pattern creation device 100 that creates mesh pattern data. FIG. 3 is a flowchart showing a flow of mesh pattern data creation processing.
The mesh pattern creation device 100 includes a data input unit 101, a calculation unit 102, a laying unit 103, a merging unit 104, an adjustment unit 105, and a data generation unit 106. The mesh pattern creation device 100 creates mesh pattern data by operating as follows.
<S31: Data Input Step>
The data input unit 101 uses, as input data, the vertical and horizontal widths (X and Y lengths) of the rectangular region 10, the minimum size of the diamond-shaped holes 31, the width of the ribs 14, and the processing limit value. Input and store in storage.
In the following description, the rhombus is a figure obtained by inclining a square by 45 degrees. The size of the rhomboid hole 31 is represented by the length of one side of the rhombus (S4 in FIG. 1). Here, since the rhombus is a figure in which the square is inclined by 45 degrees, the width of the rhombus (the length of the diagonal line, S5 in FIG. 1) can be calculated from the length S4 of one side of the input rhombus. That is, approximately 1.41 times the input length S4 of the side is the rhombus width S5.
Further, the maximum number (number of meshes) of holes to be formed per unit area (for example, 1 inch) may be input without inputting the minimum size of the diamond-shaped holes 31. In this case, the minimum size (length S4 of one side) of the diamond-shaped hole 31 can be calculated from the input number of meshes and the width of the rib 14.
<S32: Calculation step>
The calculation unit 102 has a predetermined rhombus width S5 that fits in the vertical direction of the rectangular area 10 with the ribs 14 having the specified width interposed therebetween, and is the largest in the specified width at or above the specified width. The close diamond width S5 is calculated by the processor.
That is, as shown in FIG. 4, the calculation unit 102 starts with a rhombus that is in contact with the side that forms the upper end of the rectangular region 10, and arranges rhombuses with the same width while sandwiching the ribs 14 with the specified width therebetween. Then, the width S5 of the rhombus ending with the rhombus in contact with the side forming the lower end of the rectangular area 10 is calculated. In particular, the calculation unit 102 calculates the width S5 closest to the input width that is equal to or larger than the rhombus width input in the data input step.
<S33: laying step>
The laying portion 103 regularly arranges the diamonds having the widths calculated in the calculation step by the processing device with the ribs 14 interposed therebetween so as to cover the rectangular region 10.
For example, as shown in FIG. 5, polygons and rhombuses are arranged in order from the left and right center of the rectangular area 10. That is, first, as shown in FIG. 5A, a rhombus row having a width S5 calculated in the calculation step so that the left and right centers of the rectangular region 10 and the left and right centers of the rhombus match, Line up diamonds that fit exactly in the vertical direction. The rhombus rows that just fit in the vertical direction start from a rhombus of width S5 that touches the edge forming the upper end of the rectangular area 10, and the rhombuses of width S5 are arranged with the ribs 14 of the specified width in between. This is a row ending with a diamond having a width S5 in contact with the side forming the lower end of the rectangular region 10. Next, as shown in FIG. 5B, rows having triangles at both ends are arranged with ribs 14 having widths designated on both sides of the rhombic row arranged in advance. A row having triangles at both ends means that the vertical width of one side of the upper edge of the rectangular region 10 is one half of the width S5 minus one half of the width L of the rib 14. Starting from a triangle having a width, a rhombus having a width S5 is arranged while sandwiching a rib 14 having a specified width therebetween, and a vertical width having a side that forms the lower end of the rectangular region 10 is a width S5. This is a row ending with a triangle having a width obtained by subtracting ½ of the width L of the rib 14 from ½ of. Then, as shown in FIG. 5C, the rhombus columns and the columns having triangles at both ends are alternately arranged until the entire rectangular region 10 is covered.
<S34: Merge step>
When the polygon formed at the end in the horizontal direction of the rectangular area 10 is less than the processing limit value, the merging unit 104 merges the polygon and the adjacent rhombus or trapezoid with the polygon by the processing device.
For example, as shown in FIG. 6, the polygon formed at the end portion in the horizontal direction is merged with the adjacent rhombus and polygon (triangle). That is, as shown in FIG. 6A, when the polygon formed at the end in the horizontal direction is small and less than the processing limit value, the polygon formed at the end in the horizontal direction is first deleted. Next, the side parallel to the side forming the vertical end of the rectangular region 10 is extended from the vertical vertex of the adjacent rhombus and polygon (triangle) to the horizontal end of the rectangular region 10. Then, as shown in FIG. 6B, a large polygon (pentagon and trapezoid) is formed from the sides of the adjacent rhombus and polygon (triangle) and the side forming the lateral end of the rectangular region 10. .
In FIG. 6, the column adjacent to the polygon formed at the end in the horizontal direction is a column composed of a rhombus and a polygon (triangle). However, the adjacent column may be a column in which only rhombuses are formed. In this case as well, the polygon formed at the end in the horizontal direction is first deleted. Next, the side parallel to the side forming the vertical end of the rectangular region 10 is extended from the vertical apex of the adjacent rhombus to the horizontal end of the rectangular region 10. Then, a large polygon (pentagon) may be formed from the side of the adjacent rhombus and the side forming the lateral end of the rectangular region 10.
<S35: Area adjustment step>
The adjustment unit 105 adjusts the area of the polygon (triangle) formed at the end in the vertical direction excluding the end in the horizontal direction by the processing device so that the area is the same as the area of the rhombus.
For example, in the state shown in FIG. 7A, as shown in FIG. 7B, the vertical end of the rectangular region 10 from the end point in the horizontal direction of the rhombus formed at the vertical end. A perpendicular is drawn to the part to form a pentagon. Next, as shown in FIG.7 (c), each rhombus and the pentagon of the edge part of a horizontal direction are extended | stretched to the vertical direction. Further, the pentagon formed at the end portion in the vertical direction is reduced by the amount of expansion of the rhombus and the pentagon. Then, the area of the reduced pentagon is made the same as the area of the enlarged rhombus.
<S36: Rib adjustment step>
The adjusting unit 105 further adjusts the wide rib 14 formed between the pentagon and the pentagon to the rib 14 having the width specified in the data input step by the processing device.
As shown in FIG. 8 (a), the width L8 of the rib 14 formed between the pentagon and the pentagon is the width L7 of the rib 14 formed between the rhombus and the rhombus or between the rhombus and the pentagon (specified The width of the rib 14 is wider. Therefore, as shown in FIG. 8B, the adjustment unit 105 increases the area of the pentagon so that the width L7 of the rib 14 formed between the pentagon and the pentagon is changed to the specified width L7 of the rib 14. . In addition, since the area of the pentagon formed at the end is expanded, the pentagon formed at the end does not have the same area as the rhombus. Therefore, the rhombus is enlarged and the pentagon formed at the end is reduced so that the area of the pentagon formed at the end excluding the corner is the same as that of the rhombus.
<S37: Data generation step>
The data generation unit 106 generates mesh pattern data having the rhombus and the pentagon adjusted in the merging step (S34) and the rib adjustment step (S36) as holes, and stores them in the storage device.
By manufacturing the mesh 3 based on the mesh pattern data, the mesh 3 as shown in FIG. 1 can be manufactured. A method for manufacturing the mesh 3 will be described in a later embodiment.

In the above description, in the laying step (S33), polygons and rhombuses are arranged in order from the center in the horizontal direction. However, as shown in FIG. 9, rhombuses may be arranged in order from the end of the rectangular region 10 (left end in FIG. 9). First, as shown in FIG. 9A, the left end of the rectangular area 10 is a pentagon having the same area as the rhombus calculated in the calculation step (S32), and the vertical width is calculated in the calculation step. A row having a pentagon having a width S5 at the center and a trapezoid having a width in the longitudinal direction obtained by subtracting 1/2 of the width L of the rib 14 from 1/2 of the width S5 is arranged. Next, as shown in FIG. 9B, a rhombic row is arranged next to the previously arranged row with the ribs 14 therebetween. Next, as shown in FIG. 9C, a row having triangles at both ends is arranged next to the rhombus row with the ribs 14 therebetween. Then, as shown in FIG. 9 (d), the process of arranging the rows having triangles at both ends and the rhombus rows alternately with the ribs 14 between them is continued until the entire rectangular area 10 is covered.
As described above, when the rhombuses are arranged in order from the left side, the polygon formed at the end in the horizontal direction may not have a line-symmetric shape. In this case, the adjustment unit 105 is configured such that the polygon formed by the sides forming the rectangular region 10 and the sides of the rhombus arranged in the laying step is symmetrical with the polygons at the opposite ends. The shape adjustment step to be adjusted by the processing device is executed after the laying step (S33) or the merging step (S34).
For example, as illustrated in FIG. 10, the adjustment unit 105 adjusts the polygon formed in the horizontal direction to be line symmetric by shifting the rhombus and the polygon in the horizontal direction. That is, as shown in FIG. 10A, it is assumed that the polygons at the end portions in the horizontal direction arranged in the laying step are asymmetric. That is, in FIG. 10A, the polygon at the left end is smaller than the polygon at the right end. Therefore, the rhombus and the polygon are shifted to the right. And as shown in FIG.10 (b), let the polygon of the edge part of a horizontal direction be line symmetry.

  Note that the rhombus spread method in the spread step (S33) is not limited to the method described above, and any method may be used. However, in the case of not using the above-described method, there is a possibility that the polygon formed not only at the horizontal end but also at the vertical end is not line symmetric with the polygon formed at the opposite end. . If the polygon formed at the end in the vertical direction is not line symmetric with the polygon formed at the opposite end, it becomes line symmetric after the laying step (S33) or the merging step (S34). Need to be adjusted.

Further, in the above description, it has been described that a mesh pattern matching a rectangular area is generated in one rectangular area. However, region data (for example, Gerber data) having a plurality of rectangular regions is input in the data input step (S31), and a plurality of rectangles possessed by the region data in the processing (mesh pattern generation step) after the calculation step (S32). For each rectangular area, mesh pattern data matching (suitable) the rectangular area may be generated. Here, the vertical and horizontal widths (X and Y lengths) of the rectangular area may be different for each rectangular area.
The area data includes information on the vertical and horizontal widths (X and Y lengths) of each rectangular area and the position (for example, the coordinates of the center) of each rectangular area. That is, in the data input step (S31), when the area data is input, the data input unit 101 can acquire the vertical and horizontal widths (X and Y lengths) of each rectangular area from the area data. it can. Further, in the data generation step (S37), the data generation unit 106 can arrange each rectangular area based on the position information of each rectangular area. That is, the data generation unit 106 can generate mesh pattern data suitable for each rectangular area of a plurality of rectangular areas arranged at a predetermined position. For example, when each rectangular area indicates a print pattern, the data generation unit 106 can generate mesh pattern data suitable for the print pattern opening portion for each print pattern opening portion of the plurality of print pattern openings. .

Embodiment 2. FIG.
In this embodiment, a method for manufacturing the mask 50 having the mesh pattern indicated by the mesh pattern data created in the above embodiment in the print pattern opening 51 portion will be described. In addition, a method of manufacturing a two-layer mask having a manufactured mesh layer and a layer having a printed pattern opening will be described.

First, a method of manufacturing a mask 50 having a mesh pattern such as a rhombus structure indicated by the mesh pattern data created in the above-described embodiment in the printed pattern opening 51 portion will be described with reference to FIG.
First, as shown in FIG. 11A, a base material 41 is prepared. As the material of the base material 41, for example, a conductive base material such as SUS (stainless steel, stainless steel, steel plate, aluminum) can be used. Alternatively, a non-conductive base material on which a conductive film is formed may be used. For example, a base material obtained by vapor-depositing a conductive material such as Ni, Cr, or ITO (Indium Tin Oxide) film on glass may be used. Then, a resist 42 is laminated on the base material 41 as shown in FIG.
Next, the mesh pattern data created in the above embodiment is input to the direct drawing machine that irradiates the ultraviolet laser into the print pattern opening 51 portion. Then, the mesh pattern indicated by the mesh pattern data is directly drawn on the resist 42 using a direct drawing machine. That is, the mesh pattern portion indicated by the mesh pattern data is exposed. Then, develop. Then, as shown in FIG. 11C, the resist 42 remains only at the position corresponding to the opening corresponding to the mesh pattern.
Next, as shown in FIG. 11 (d), a metal layer 43 having a mesh pattern shape is formed on the base material 41 by plating such as nickel except for the region where the resist 42 is formed. That is, since the metal layer 43 is formed in a portion other than the resist 42 left at the position corresponding to the mesh pattern, the metal layer 43 has an opening corresponding to the mesh pattern.
And as shown in FIG.11 (e), the resist 42 is peeled and the metal layer 43 is peeled from the base material 41. FIG. As a result, the mask 50 having openings corresponding to a plurality of mesh patterns is formed by the metal layer 43 with the ribs 14 being sandwiched between the print pattern openings 51. That is, the mask 50 having an opening corresponding to the mesh pattern as shown in FIG.
In the above description, the resist 42 is exposed using a direct drawing machine. However, a pattern film having a mesh pattern indicated by the mesh pattern data created in the above embodiment may be created, and the resist 42 may be exposed using the created pattern film, glass letterpress or the like.
In addition, when mesh pattern data is generated by inputting area data having a plurality of rectangular areas, each rectangular area of the plurality of rectangular areas is set as a printing pattern opening 51, and the printing pattern opening 51 is configured as shown in FIG. A mask 50 having openings corresponding to the mesh pattern can be manufactured. That is, when manufacturing the mask 50 having a plurality of print pattern openings 51 and having a mesh 50 in each print pattern opening 51 portion, area data in which each print pattern opening 51 is a rectangular area is input in advance. If the mesh pattern data is generated, a mask 50 having a mesh pattern that matches the print pattern opening 51 can be manufactured at each print pattern opening 51 portion.

FIG. 12 is a view showing a mask 50 provided with a mesh manufactured by the manufacturing method described with reference to FIG. FIG. 12A is a cross-sectional view of the mask 50 (AA ′ cross-sectional view of FIG. 12B). Although the mesh pattern is originally formed in the printed pattern opening 51, the shape is shown. Is not shown in the figure because it becomes complicated. FIG.12 (b) is the figure seen from the D direction of Fig.12 (a). FIG. 12C is a diagram illustrating an example of a mesh formed in one print pattern opening 51 portion among the plurality of print pattern openings 51 in FIG.
A plurality of printed pattern openings 51 are formed in the mask 50. As shown in FIG. 12C, each printed pattern opening 51 is formed with a mesh manufactured by the manufacturing method described with reference to FIG. That is, a mesh having openings corresponding to the mesh pattern as shown in FIG. 1 is formed in each print pattern opening 51.
When the thickness (plate thickness) of the mask 50 is thin, the printed pattern opening 51 is not strong and may be damaged from the printed pattern opening 51 portion. Therefore, as described above, the print pattern portion is given a mesh to increase the strength of the print pattern portion. In particular, the mesh pattern described in the above embodiment has high mesh strength because pores are regularly formed in the honeycomb structure or the like. Therefore, the strength of the print pattern portion of the mask 50 is particularly increased by forming the mesh of the mesh pattern described in the above embodiment in the print pattern portion. In FIG. 12, the print pattern is indicated by a rectangle, but the print pattern may not be a complete rectangle. That is, it may be a substantially rectangular shape with rounded corners. By giving roundness to the corner portion, it is possible to prevent the load from being concentrated on the corner portion of the print pattern and damage from the corner portion.

Next, based on FIG. 13, a layer (mask 50) in which a plurality of print pattern openings 51 having a mesh are formed, and a print opening 49 without a mesh formed so as to overlap the print pattern openings 51 in which the mesh is formed. A method for manufacturing a two-layered mask having a resin layer having the following will be described. FIG. 13A is a cross-sectional view of the mask 50. Although the mesh pattern is originally formed in the print pattern opening 51, the shape is complicated, and thus the illustration is omitted.
As shown in FIGS. 13A and 13B, the layer (mask 50) having the manufactured mesh (metal layer 43) is stretched. FIG.13 (b) is the figure seen from the E direction of Fig.13 (a). The outer periphery of the mask 50 is attached to the work side (printing surface side) with an adhesive or the like around the inside of the opening of the ridge 46 having an opening attached to the screen frame 45, and the mask 50 is directed outward (screen) by the tension of the ridge 46. It is assumed that it is stretched in the direction of the frame 45). In FIG. 13B, the flange 46 and the mask 50 are bonded to each other at a margin 47. That is, the mask 50 is bonded to the combination 44 (a framed frame).
Next, as shown in FIG. 13C, a photosensitive resin 48 is applied to the mask 50 bonded to the combination 44 and dried or cured. Next, the printed pattern is drawn on the dried or cured photosensitive resin 48 using a direct drawing machine. In this case, exposure may be performed using a pattern film. Then, when developed, as shown in FIG. 13D, a mesh-free printing opening 49 is formed in the dried or cured photosensitive resin 48. The print openings 49 are formed so as to overlap the print pattern openings 51 where the mesh of the mask 50 is formed.
As a result, a layer (mask 50) having openings corresponding to a plurality of mesh patterns with the ribs 14 sandwiched between the print pattern openings 51 and a resin layer 48 having mesh-free print openings 49 on the upper surface of the mask 50 are provided. A two-layer mask is manufactured. That is, a two-layered mask having a layer (mask 50) having a printed pattern opening 51 having openings corresponding to a mesh pattern as shown in FIG. 1 and a resin layer 48 having printed openings 49 is manufactured.
When the mask 50 is stretched, the mask 50 is bonded not to the work side of the ridge 46 but to the ink side (squeegee side) as shown in FIG. 50 and the photosensitive resin 48 may be sandwiched.

  In the mask manufacturing process, the mesh is stretched. When stretched, the mesh is pulled outward. Here, the mesh produced from the mesh pattern data created in the above embodiment has a high strength against pulling force because the mesh pattern is regularly formed in a honeycomb structure or the like. Therefore, the mesh is not torn even when it is stretched.

Next, based on FIG. 14, a metal mask having a two-layer structure including a layer (mask 50) in which a plurality of printed pattern openings 51 having a mesh are formed and a metal layer having printed openings 49 without a mesh is manufactured. A method will be described.
First, as shown in FIGS. 11A to 11D, a metal layer 43 having a mesh pattern is formed on the base material 41 by plating such as nickel, except for the region where the resist 42 is formed. Subsequently, as shown in FIG. 14A, the resist 42 is peeled off. Next, as shown in FIG. 14B, a resist 52 is formed on the layer (mask 50) having the manufactured mesh (metal layer 43). Next, a printing pattern is drawn on the resist 52 using a direct drawing machine. In this case, exposure may be performed using a pattern film. Then, when developed, a resist 52 is formed in a portion that becomes the printing opening 49 as shown in FIG. Next, as shown in FIG. 14D, a metal layer 53 is formed on the mask 50 except for the portion where the resist 52 is formed. And as shown in FIG.14 (e), the resist 52 is peeled and it peels from a base material.
As a result, a layer having a plurality of print pattern openings 51 having openings corresponding to a plurality of mesh patterns with a rib 14 interposed between the print pattern openings 51 and a metal layer 53 having a print opening 49 without meshes 2. A layered metal mask is manufactured. That is, a metal mask having a two-layer structure including a layer (mask 50) having a printing pattern opening 51 having an opening corresponding to a mesh pattern as shown in FIG. 1 and a metal layer 53 having a printing opening 49 without mesh. Manufactured.
The print openings 49 are formed so as to overlap the print pattern openings 51 where the mesh of the mask 50 is formed.
The mask manufacturing method is merely an example, and the mask may be manufactured by other methods.

  The mesh and mask described above can be used not only for screen printing meshes and masks but also for ball mounting masks, bump forming masks, sieves, and the like.

That is, the mesh according to the above-described embodiment has the regular holes (diamond-shaped holes) regularly arranged in the center of the predetermined region and the regular holes in the peripheral portion in the predetermined region. It has a shape different from that of the hole but has a deformed hole (polygonal hole formed at the end) having the same area.
In other words, in the mesh according to the above embodiment, the regular hole forming portion (rib 14 forming the regular hole) in which regular holes having the same shape (diamond-shaped holes) are regularly arranged in the central portion of the predetermined region. And a deformed hole forming portion (rib 14 for forming a deformed hole) that forms a deformed hole of the same area but having a shape different from that of the regular hole in a peripheral portion within the predetermined region.

Further, the mesh according to the above embodiment is a mesh in which a mesh having a plurality of holes is formed in a predetermined region, and a hole whose side is the side of the predetermined region,
The area of the hole that does not make the side of the predetermined region a part of the side is the same.

Next, a hardware configuration of mesh pattern creation apparatus 100 in the above embodiment will be described.
FIG. 15 is a diagram illustrating an example of a hardware configuration of the mesh pattern creation device 100.
As shown in FIG. 15, the mesh pattern creating apparatus 100 includes a CPU 911 (also referred to as a central processing unit, a central processing unit, a processing unit, an arithmetic unit, a microprocessor, a microcomputer, and a processor) that executes a program. . The CPU 911 is connected to the ROM 913, the RAM 914, the LCD 901 (Liquid Crystal Display), the keyboard 902 (K / B), the communication board 915, and the magnetic disk device 920 via the bus 912, and controls these hardware devices. Instead of the magnetic disk device 920, a storage device such as an optical disk device or a memory card read / write device may be used.

  The ROM 913 and the magnetic disk device 920 are examples of a nonvolatile memory. The RAM 914 is an example of a volatile memory. The ROM 913, the RAM 914, and the magnetic disk device 920 are examples of a storage device (memory). The keyboard 902 and the communication board 915 are examples of input devices. The communication board 915 is an example of a communication device. Furthermore, the LCD 901 is an example of a display device.

  An operating system 921 (OS), a window system 922, a program group 923, and a file group 924 are stored in the magnetic disk device 920 or the ROM 913. The programs in the program group 923 are executed by the CPU 911, the operating system 921, and the window system 922.

The program group 923 includes “data input unit 101”, “calculation unit 102”, “laying unit 103”, “merging unit 104”, “adjustment unit 105”, “data generation unit 106”, “ Software, programs, and other programs that execute the functions described as the “deformation unit 107”, the “auxiliary hole forming unit 108”, and the like are stored. The program is read and executed by the CPU 911.
In the file group 924, information such as “the vertical and horizontal widths of the rectangular region 10”, “the minimum size of the rhombus holes 31”, “the width of the ribs 14”, “the processing limit value”, etc. Data, signal values, variable values, and parameters are stored as items of “file” and “database”. The “file” and “database” are stored in a recording medium such as a disk or a memory. Information, data, signal values, variable values, and parameters stored in a storage medium such as a disk or memory are read out to the main memory or cache memory by the CPU 911 via a read / write circuit, and extracted, searched, referenced, compared, and calculated. Used for the operation of the CPU 911 such as calculation / processing / output / printing / display. Information, data, signal values, variable values, and parameters are temporarily stored in the main memory, cache memory, and buffer memory during the operation of the CPU 911 for extraction, search, reference, comparison, calculation, calculation, processing, output, printing, and display. Is remembered.
In addition, the arrows in the flowchart in the above description mainly indicate input / output of data and signals, and the data and signal values are recorded in a memory of the RAM 914 and other recording media such as an optical disk. Data and signals are transmitted online via a bus 912, signal lines, cables, or other transmission media.

  In addition, what is described as “to part” in the above description may be “to circuit”, “to device”, “to device”, “to means”, and “to function”. It may be “step”, “˜procedure”, “˜processing”. In addition, what is described as “˜device” may be “˜circuit”, “˜device”, “˜device”, “˜means”, “˜function”, and “˜step”, “ ~ Procedure "," ~ process ". Furthermore, what is described as “to process” may be “to step”. That is, what is described as “˜unit” may be realized by firmware stored in the ROM 913. Alternatively, it may be implemented only by software, or only by hardware such as elements, devices, substrates, and wirings, by a combination of software and hardware, or by a combination of firmware. Firmware and software are stored in a recording medium such as ROM 913 as a program. The program is read by the CPU 911 and executed by the CPU 911. That is, the program causes a computer or the like to function as the “˜unit” described above. Alternatively, the computer or the like is caused to execute the procedures and methods of “to part” described above.

  3 mesh, 10 rectangular region, 14 ribs, 15 first row, 16 second row, 31 diamond-shaped holes, 32,33 pentagonal holes, 41 base material, 42,52 resist, 43,53 metal layer, 44 Combination, 45 screen frame, 46 mm, 47 margin, 48 photosensitive resin, 50 mask, 51 printing pattern opening, 100 mesh pattern creation device, 101 data input unit, 102 calculation unit, 103 padding unit, 104 merging unit, 105 Adjustment unit, 106 data generation unit, 107 deformation unit, 108 auxiliary hole formation unit.

Claims (2)

A rhombus is regularly formed in the center of the predetermined rectangular area, and a pentagon including a part of the rhombus and a part of the side forming the rectangular area at the end (peripheral part) of the rectangular area A mask having a mesh for printing pattern openings in which holes are regularly formed,
The end portion excluding the corners (four corners) of the rectangular area includes a rhombus and two opposite sides parallel to the rectangular area and a part of the rectangular area. A base-shaped pentagonal hole is formed, and at the corner of the rectangular region, one side of the rhombus and two sides forming a rectangular region are orthogonal to each other, and two sides forming a rectangular region Diamond-shaped pentagonal holes each consisting of two parallel sides are formed, and ribs of a predetermined width are formed between the holes,
The home base-shaped pentagonal holes formed at the ends excluding the corners (four corners) of the rectangular region are arranged so as to be symmetrical with the home-base pentagonal holes formed at the opposite ends. The diamond-shaped pentagonal holes formed at the corners of the rectangular region are arranged to be paired on the diagonal line of the rectangular region,
The area of the rhombic hole formed at the center of the rectangular region and the area of the home base-shaped pentagonal hole formed at the end excluding the corners (four corners) of the rectangular region are the same area, and the rectangular A mask characterized in that an area of a diamond-shaped pentagonal hole formed at a corner of a region is smaller than an area of the diamond-shaped hole and the home-base-shaped pentagonal hole. A rhombus is regularly formed in the center of the predetermined rectangular area, and a pentagon including a part of the rhombus and a part of the side forming the rectangular area at the end (peripheral part) of the rectangular area A two-layer structure mask comprising a layer having a mesh for printing pattern openings in which holes are regularly formed and a printing pattern layer having a printing opening provided on one surface of the layer having the mesh,
The layer having a mesh for opening the printing pattern,
The end portion excluding the corners (four corners) of the rectangular area includes a rhombus and two opposite sides parallel to the rectangular area and a part of the rectangular area. A base-shaped pentagonal hole is formed, and at the corner of the rectangular region, one side of the rhombus and two sides forming a rectangular region are orthogonal to each other, and two sides forming a rectangular region Diamond-shaped pentagonal holes each consisting of two parallel sides are formed, and ribs of a predetermined width are formed between the holes,
The home base-shaped pentagonal holes formed at the ends excluding the corners (four corners) of the rectangular region are arranged so as to be symmetrical with the home-base pentagonal holes formed at the opposite ends. The diamond-shaped pentagonal holes formed at the corners of the rectangular region are arranged to be paired on the diagonal line of the rectangular region,
The area of the rhombic hole formed at the center of the rectangular region and the area of the home base-shaped pentagonal hole formed at the end excluding the corners (four corners) of the rectangular region are the same area, and the rectangular A double-layer structure mask characterized in that an area of a diamond-shaped pentagonal hole formed at a corner of a region is smaller than an area of the diamond-shaped hole and the home-base-shaped pentagonal hole.

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