JP5393065B2 - Levitation separator - Google Patents

Levitation separator Download PDF

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JP5393065B2
JP5393065B2 JP2008166758A JP2008166758A JP5393065B2 JP 5393065 B2 JP5393065 B2 JP 5393065B2 JP 2008166758 A JP2008166758 A JP 2008166758A JP 2008166758 A JP2008166758 A JP 2008166758A JP 5393065 B2 JP5393065 B2 JP 5393065B2
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tank
levitation
floating
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JP2010005519A (en
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和彦 清水
友明 宮ノ下
裕一郎 鳥羽
俊朗 國東
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Organo Corp
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Description

本発明は、被処理水中の被処理物質に気泡を付着させ、被処理物質を浮上物として分離する浮上分離装置の技術に関する。   The present invention relates to a technique of a levitation separation device that attaches bubbles to a substance to be treated in water to be treated and separates the substance to be treated as a floating substance.

従来、被処理水中に含まれるSS成分、油分等の被処理物質を除去する方法として、被処理水と気泡とを混合して、浮上槽に供給し、被処理物質に気泡を付着させて浮上槽の水面に浮上させ、被処理物質を分離する浮上処理が知られている。なお、処理効率を上げるために、被処理水を浮上槽に供給する前に、凝集剤を添加して、被処理水中に含まれる被処理物質をフロック化させることも行われている。   Conventionally, as a method of removing SS components, oils, and other substances to be treated contained in the water to be treated, the water to be treated and bubbles are mixed and supplied to the levitation tank. A levitation process is known that floats on the surface of a tank and separates a substance to be treated. In addition, in order to raise processing efficiency, before supplying to-be-processed water to a levitation tank, a flocculant is added and the to-be-processed substance contained in to-be-processed water is made to flock.

図8は、従来の浮上分離装置の構成を示す模式図である。この浮上分離装置4において、浮上槽70には、槽体を構成する外周壁72の内側に、下端が槽内中間部に至る内周壁74が外周壁72の内周に沿って設けられている。外周壁72及び内周壁74は円筒形である。外周壁72と内周壁74との間は、内周壁74によって浮上物が進入するのが防止され、処理水が集水される処理水室76が形成されている。浮上槽70内の中央部分には、上部および下部が開放されたガイド筒78が設けられ、このガイド筒78内には、浮上槽70の底部70aの中央から延設され、ガイド筒78内で開口する導入管80が設けられている。導入管80には、浮上槽70外にて被処理水流入管82が接続されている。また、被処理水流入管82には、加圧水流入管84が接続され、ここから加圧タンク等で高圧下で空気が溶解した加圧水が供給されている。   FIG. 8 is a schematic diagram showing a configuration of a conventional floating separation apparatus. In the levitation separation device 4, the levitation tank 70 is provided with an inner peripheral wall 74, which has a lower end reaching the intermediate part in the tank, along the inner periphery of the outer peripheral wall 72, inside the outer peripheral wall 72 constituting the tank body. . The outer peripheral wall 72 and the inner peripheral wall 74 are cylindrical. Between the outer peripheral wall 72 and the inner peripheral wall 74, the inner peripheral wall 74 prevents a levitated material from entering, and a treated water chamber 76 in which treated water is collected is formed. A guide cylinder 78 having an open upper and lower part is provided in the central portion of the levitation tank 70. The guide cylinder 78 extends from the center of the bottom 70 a of the levitation tank 70, and is provided in the guide cylinder 78. An opening introducing pipe 80 is provided. A treated water inflow pipe 82 is connected to the introduction pipe 80 outside the floating tank 70. Further, a pressurized water inflow pipe 84 is connected to the treated water inflow pipe 82, and pressurized water in which air is dissolved under high pressure is supplied from here through a pressurized tank or the like.

浮上分離装置4の運転方法を説明する。例えば、加圧水流入管84を介して、処理水に高圧下において空気を溶解させた加圧水を被処理水流入管82に供給し、加圧水と被処理水が混合された混合液が被処理水流入管82を通り、導入管80を介し、浮上槽70のガイド筒78内に供給される。浮上槽70内では、加圧水中に溶解していた気体が気泡として析出し、被処理水中に含まれる被処理物質に付着し、被処理物質が浮上分離される。被処理物質が除去された処理水は、処理水室76の下端部76aから処理水室76を通り、浮上槽70の外周壁72の上端の越流堰をオーバーフローして調整槽86に供給され、ここに接続されている処理水排出管88により系外に排出される。   A method for operating the levitation separator 4 will be described. For example, pressurized water in which air is dissolved in the treated water under high pressure is supplied to the treated water inflow pipe 82 via the pressurized water inflow pipe 84, and a mixed liquid in which the pressurized water and the treated water are mixed passes through the treated water inflow pipe 82. As described above, the gas is supplied into the guide cylinder 78 of the levitation tank 70 through the introduction pipe 80. In the levitation tank 70, the gas dissolved in the pressurized water is precipitated as bubbles and adheres to the material to be treated contained in the water to be treated, and the material to be treated is floated and separated. The treated water from which the material to be treated has been removed passes from the lower end 76 a of the treated water chamber 76 through the treated water chamber 76, overflows the overflow weir at the upper end of the outer peripheral wall 72 of the floating tank 70, and is supplied to the adjusting tank 86. The treated water discharge pipe 88 connected here discharges the outside of the system.

ここで、図8に示す浮上分離装置4では、導入管80、ガイド筒78を通って浮上槽70内に流入した被処理水は、浮上槽70の内周壁74に向かって流れ、内周壁74に達すると、内周壁74に沿って、下降する。この下降流の流速が速いと、浮力が十分でない被処理物質が、下降流に伴い内周壁74の下端を越え処理水室76に流れ込んで、処理水の水質を悪化させる。このように、内周壁74に沿った下降流が早くなるのは、浮上槽70内に、浮上分離処理に使用されていない部分(例えば、図8に示す網掛け部)が、多く存在するからであり、被処理物質の除去において、浮上槽70全体を有効に使用することができないと、浮上分離が効率的に行えないという問題がある。   Here, in the levitation separation device 4 shown in FIG. 8, the water to be treated that flows into the levitation tank 70 through the introduction pipe 80 and the guide cylinder 78 flows toward the inner peripheral wall 74 of the levitation tank 70, and the inner peripheral wall 74. , It descends along the inner peripheral wall 74. When the flow rate of the downward flow is high, the material to be treated having insufficient buoyancy flows into the treated water chamber 76 over the lower end of the inner peripheral wall 74 along with the downward flow, thereby deteriorating the quality of the treated water. Thus, the reason why the downward flow along the inner peripheral wall 74 becomes faster is because there are many portions (for example, the shaded portions shown in FIG. 8) that are not used for the floating separation process in the floating tank 70. In the removal of the material to be treated, there is a problem that the floating separation cannot be performed efficiently unless the entire floating tank 70 can be used effectively.

図8に示す浮上分離装置4の一般的な水面積負荷(浮上槽70の水平断面積に対する処理水量(線速度LV))は、5〜10m/hである。図8に示す浮上分離装置4では、LVを上記範囲より高くすると、処理水の水質が悪化しやすい。   The general water area load (the amount of treated water (linear velocity LV) with respect to the horizontal sectional area of the levitation tank 70) of the levitation separator 4 shown in FIG. 8 is 5 to 10 m / h. In the levitation separator 4 shown in FIG. 8, when the LV is higher than the above range, the quality of the treated water tends to deteriorate.

また、特許文献1には、図8に示す浮上分離装置4より、LVを高くすることが可能な浮上分離装置が提案されている。図9は、特許文献1の浮上分離装置の構成を示す模式図である。図9に示す浮上分離装置5において、浮上槽90の周壁90aは矩形であり、浮上槽90内は、上部開放の隔壁92a、下部開放の隔壁92bにより、被処理水が縦方向に迂回して流れる三つの室、第1の室94、第2の室96、第3の室98に区画されている。また、第2の室96の隔壁92aと隔壁92bとの間には、整流板100が水平に設置されている。整流板100には、複数の整流孔100aが形成されており、第2の室96から第3の室98に至る水は整流板100を通過する。第1の室94には、被処理水流入管102に接続されている。また、加圧水流入管104の一端は第1の室94に接続され、他端は空気溶解タンク105の出口に接続されている。第3の室98には、処理水排出管106が接続されている。空気溶解タンク105と処理排出管106との間には、ポンプ110を介して連通管111が接続され、処理水排出管106を通る処理水の一部が連通管111を通り、空気溶解タンク105に供給される。空気溶解タンク105では、処理水に空気を溶解させ、加圧水が製造される。   Further, Patent Document 1 proposes a levitation separator that can increase the LV compared to the levitation separator 4 shown in FIG. FIG. 9 is a schematic diagram showing the configuration of the flotation separation device of Patent Document 1. As shown in FIG. In the levitation separator 5 shown in FIG. 9, the peripheral wall 90a of the levitation tank 90 is rectangular, and in the levitation tank 90, water to be treated is detoured in the vertical direction by the upper open partition 92a and the lower open partition 92b. It is divided into three chambers that flow, a first chamber 94, a second chamber 96, and a third chamber 98. A rectifying plate 100 is horizontally installed between the partition wall 92a and the partition wall 92b of the second chamber 96. A plurality of rectifying holes 100 a are formed in the rectifying plate 100, and water from the second chamber 96 to the third chamber 98 passes through the rectifying plate 100. The first chamber 94 is connected to the treated water inflow pipe 102. One end of the pressurized water inflow pipe 104 is connected to the first chamber 94, and the other end is connected to the outlet of the air dissolution tank 105. A treated water discharge pipe 106 is connected to the third chamber 98. A communication pipe 111 is connected between the air dissolution tank 105 and the treatment discharge pipe 106 via a pump 110, and part of the treated water passing through the treatment water discharge pipe 106 passes through the communication pipe 111, and the air dissolution tank 105. To be supplied. In the air dissolution tank 105, air is dissolved in the treated water to produce pressurized water.

このような浮上分離装置5において、被処理水流入管102から第1の室94に流入した被処理水、空気溶解タンク105から加圧水流入管104を通り第1の室94に流入した加圧水は、液面に向かって上昇して、隣接する第2の室96に流入する。第2の室96では、被処理水中の被処理物質が浮上物として液面上に浮かび、下部に処理水が得られる。このような浮上分離処理された処理水は、整流板100の整流孔100aを通り、第3の室98から処理水排出管106へ排出される。   In such a levitation separation device 5, the water to be treated that has flowed into the first chamber 94 from the water to be treated inflow pipe 102, and the pressurized water that has flowed into the first chamber 94 from the air dissolution tank 105 through the pressurized water inflow pipe 104 are liquid. It rises toward the surface and flows into the adjacent second chamber 96. In the second chamber 96, the substance to be treated in the water to be treated floats on the liquid surface as a floating substance, and treated water is obtained at the bottom. The treated water that has been subjected to such a floating separation process passes through the rectifying hole 100 a of the rectifying plate 100 and is discharged from the third chamber 98 to the treated water discharge pipe 106.

図9に示す浮上分離装置5でも、第2の室96の隔壁92bに沿って下降する被処理水の下降流の流速は速くなる。しかし、図9に示す浮上分離装置5には、整流板100が設けられているため、整流板100の整流効果により、隔壁92bに沿って下降する被処理水の下降流がそのままの勢いで、第3の室98側へ流れることが防止される。その結果、被処理物質が下降流と共に第3の室98側へ流れ込むこと等が抑制され、図9に示す浮上分離装置5は、図8に示す浮上分離装置4より高容積負荷での処理が可能となる。   Also in the levitation separation apparatus 5 shown in FIG. 9, the flow rate of the downflow of the water to be treated that descends along the partition wall 92b of the second chamber 96 is increased. However, since the levitation separation device 5 shown in FIG. 9 is provided with the rectifying plate 100, due to the rectifying effect of the rectifying plate 100, the downward flow of the water to be treated descending along the partition wall 92b remains as it is, The flow to the third chamber 98 side is prevented. As a result, the material to be treated is prevented from flowing into the third chamber 98 side along with the downward flow, and the levitating separation device 5 shown in FIG. 9 can be processed at a higher volume load than the levitating separation device 4 shown in FIG. It becomes possible.

米国特許出願公開第2005/0115881号明細書US Patent Application Publication No. 2005/0115881

図9に示す浮上分離装置5は、浮上槽90の周壁90aが矩形であって、周壁90aの一端側に設けられる第1の室94から被処理水が供給され、他端側に設けられる第3の室98から処理水が排出される構造である。このような構造において、第1の室94から隔壁92bへ流れる被処理水の流れ(すなわち、浮上槽の液面を流れる被処理水の流れ)は、図8に示す浮上分離装置において、ガイド筒78から内周壁74に向かって拡がりながら流れる被処理水の流れ(すなわち、浮上槽の液面を流れる被処理水の流れ)より速い流速となる。   In the levitation separation apparatus 5 shown in FIG. 9, the peripheral wall 90a of the levitation tank 90 is rectangular, the water to be treated is supplied from the first chamber 94 provided on one end side of the peripheral wall 90a, and the first is provided on the other end side. 3, the treated water is discharged from the third chamber 98. In such a structure, the flow of the water to be treated flowing from the first chamber 94 to the partition wall 92b (that is, the flow of the water to be treated flowing on the liquid surface of the levitation tank) is a guide cylinder in the levitation separation apparatus shown in FIG. The flow rate becomes faster than the flow of the water to be treated flowing from 78 to the inner peripheral wall 74 (that is, the flow of the water to be treated flowing on the liquid surface of the levitation tank).

また、浮上分離装置の負荷を上げれば、浮上槽90の液面を流れる被処理水の流速はさらに速くなると共に、隔壁92bに沿って下降する下降流の流速も速くなる。その結果、隔壁92b側の整流板100に、速い流速の下降流が衝突することになり、整流板100の整流効果を充分に得ることが難しくなり、被処理物質が下降流と共に第3の室98側へ流れ込むこと等を充分に抑制することができず、処理水の水質が悪化しやすくなる。したがって、図9に示すような浮上分離装置5でも、処理水の水質を悪化させることなく処理量を増加するには、装置を大型化する必要がある。   Further, when the load of the floating separation device is increased, the flow rate of the water to be treated flowing on the liquid surface of the floating tank 90 is further increased, and the flow rate of the descending flow descending along the partition wall 92b is also increased. As a result, a downward flow having a high flow velocity collides with the rectifying plate 100 on the side of the partition wall 92b, and it becomes difficult to sufficiently obtain the rectifying effect of the rectifying plate 100. It cannot suppress sufficiently that it flows into 98 side, etc., and the quality of treated water tends to deteriorate. Therefore, even in the floating separation apparatus 5 as shown in FIG. 9, it is necessary to enlarge the apparatus in order to increase the throughput without deteriorating the quality of the treated water.

そこで、本発明の目的は、小型な装置設備で高速処理が可能な浮上分離装置を提供することにある。   Accordingly, an object of the present invention is to provide a floating separation apparatus capable of high-speed processing with a small apparatus.

本発明は、被処理水中の被処理物質に気泡を付着させ、被処理物質を浮上物として分離する浮上分離装置であって、浮上槽と、前記浮上槽を垂直方向上部及び下部に区画する整流板と、前記上部に被処理水を流入させる流入部と、前記浮上槽に設けられ、前記被処理物質が分離した処理水を前記下部から集水する集水部とを有し、前記整流板には、前記処理水を通水させる複数の整流孔が形成され、前記流入部は、前記上部の中心部で開口し、当該開口部から前記上部に被処理水を流入させる。   The present invention is a levitation separator that attaches bubbles to a substance to be treated in water to be treated and separates the substance to be treated as a floating substance, and rectifies the levitation tank and the levitation tank into a vertical upper part and a lower part A plate, an inflow portion for allowing treated water to flow into the upper portion, and a water collecting portion that is provided in the floating tank and collects treated water separated from the treated material from the lower portion, Are formed with a plurality of rectifying holes for allowing the treated water to flow therethrough, and the inflow portion is opened at the center of the upper portion, and the treated water is caused to flow into the upper portion from the opening.

また、前記浮上分離装置において、前記浮上槽は円筒状であることが好ましい。   In the levitation separation apparatus, the levitation tank is preferably cylindrical.

また、前記浮上分離装置において、前記浮上槽の液面に浮上した浮上物を掻き寄せる浮上物スキマーと、前記被処理物質のうち浮上槽の底部に沈殿した沈殿物を掻き寄せる沈殿物掻き寄せ機と、を備えることが好ましい。   Further, in the flotation separation apparatus, a levitated skimmer that rakes the levitated matter floating on the liquid level of the levitation tank, and a deposit raker that rakes the deposit that has settled at the bottom of the levitating tank among the substances to be treated. And preferably.

また、前記浮上分離装置において、前記被処理物質のうち前記整流板上に沈殿した沈殿物を前記整流孔に排出する整流板スクレーパーを備えることが好ましい。   Moreover, it is preferable that the levitation separation apparatus further includes a rectifying plate scraper that discharges the sediment that has settled on the rectifying plate out of the material to be treated into the rectifying holes.

本発明の浮上分離装置では、小型な装置設備で高速処理が可能である。   In the floating separation apparatus of the present invention, high-speed processing is possible with small equipment.

本発明の実施の形態について以下説明する。本実施形態は本発明を実施する一例であって、本発明は本実施形態に限定されるものではない。   Embodiments of the present invention will be described below. This embodiment is an example for carrying out the present invention, and the present invention is not limited to this embodiment.

図1は、本実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。図2は、本実施形態に係る浮上分離装置の構成の一例を示す模式上面図である。図1に示す浮上分離装置1は、浮上槽10、流入部12、排出部14、整流板22を備える。   FIG. 1 is a schematic cross-sectional view showing an example of the configuration of the levitation separation apparatus according to the present embodiment. FIG. 2 is a schematic top view showing an example of the configuration of the levitation separation apparatus according to the present embodiment. The levitation separation device 1 shown in FIG. 1 includes a levitation tank 10, an inflow portion 12, a discharge portion 14, and a rectifying plate 22.

図1及び図2に示すように、浮上槽10の周壁10aは円筒形とされ、浮上槽10の底部10bは中央に向かって低位となるホッパ状とされている。また、底部10bの中央には、被処理物質のうちの沈殿物を溜めるピット18が設けられている。ピット18には、不図示の沈殿物排出口が設けられ、沈殿物排出管19が接続されている。浮上槽10の周壁10aは、矩形とされてもよい。しかし、浮上槽10の周壁10aを円筒形とすることにより、浮上槽10の中心部に配置される流入部12の開口部(開口部については後述する)から周壁10aまで、被処理水が拡がりながら流れることになる。従って、流入部12から出るときの流速は比較的速いが、周壁10aに当たる際の表面部の流れは比較的遅くなる。その結果、周壁10aのある一部分で急速な下降流が生じることもなく、急速な下降流により生じる処理水の水質の悪化を効果的に抑制することができる。   As shown in FIGS. 1 and 2, the peripheral wall 10a of the levitation tank 10 has a cylindrical shape, and the bottom 10b of the levitation tank 10 has a hopper shape that becomes lower toward the center. A pit 18 is provided at the center of the bottom portion 10b to collect a deposit of the material to be treated. The pit 18 is provided with a sediment discharge port (not shown), and a sediment discharge pipe 19 is connected thereto. The peripheral wall 10a of the floating tank 10 may be rectangular. However, by forming the peripheral wall 10a of the levitation tank 10 into a cylindrical shape, the water to be treated spreads from the opening portion (the opening portion will be described later) of the inflow portion 12 disposed at the center of the levitation tank 10 to the peripheral wall 10a. It will flow while. Therefore, although the flow velocity when exiting the inflow portion 12 is relatively fast, the flow of the surface portion when hitting the peripheral wall 10a is relatively slow. As a result, a rapid downward flow does not occur in a part of the peripheral wall 10a, and the deterioration of the quality of the treated water caused by the rapid downward flow can be effectively suppressed.

浮上槽10には、集水部10cが設けられている。集水部10cは、被処理物質を除去した処理水を後述する浮上槽10の下部20bから集水するものであり、浮上槽10の下部20b側、すなわち整流板22より垂直方向下方に配置される。   The floating tank 10 is provided with a water collecting part 10c. The water collecting part 10c collects treated water from which the material to be treated has been removed from the lower part 20b of the floating tank 10, which will be described later, and is disposed on the lower part 20b side of the floating tank 10, that is, below the current plate 22 in the vertical direction. The

また、浮上槽10には、被処理物質のうち、液面に浮上した浮上物23(いわゆるスカム)を排出するための浮上物ポット24が設けられている。なお、通常の場合には、浮上槽10の表面上に浮上物を掻き寄せるスキマーが設けられており、浮上物を浮上物ポット24に掻き寄せる。また、浮上物ポット24は、掻き寄せられてくる浮上物が水面上から浮上物ポット24内に落下するように、その浮上槽10側の境界部分に水面下から水面上に至るスロープを有することが好適である。   The levitation tank 10 is provided with a levitation object pot 24 for discharging the levitation material 23 (so-called scum) that has floated on the liquid surface among the substances to be treated. In a normal case, a skimmer is provided on the surface of the levitation tank 10 to scrape the levitated matter, and the levitated matter is raked up to the levitated pot 24. The levitated pot 24 has a slope extending from below the surface of the water to the surface of the water so that the levitated object that is raked down falls into the levitated object pot 24 from the surface of the water. Is preferred.

浮上槽10内には、浮上槽10を垂直方向の上部20a及び下部20bに区画する整流板22が設けられている。そして、整流板22には、処理水を通水させる複数の整流孔22aが形成されている。整流板22は一体構造であってもよいが、複数に分割したものであってもよい。   A rectifying plate 22 is provided in the levitation tank 10 to divide the levitation tank 10 into an upper part 20a and a lower part 20b in the vertical direction. And the baffle plate 22 is formed with a plurality of baffle holes 22a through which the treated water flows. The rectifying plate 22 may have an integral structure or may be divided into a plurality of parts.

図3は、本発明の他の実施形態に係る浮上分離装置の構成の一例を示す上面模式図である。図3に示すように、4つの扇型状分割体25により、浮上槽10を上部20a及び下部20bに区画する整流板22が形成されている。なお、扇型状分割体25の枚数は特に制限されるものではない。整流板22の機能については、後述する。   FIG. 3 is a schematic top view showing an example of the configuration of a levitation separation apparatus according to another embodiment of the present invention. As shown in FIG. 3, a rectifying plate 22 that divides the floating tank 10 into an upper part 20 a and a lower part 20 b is formed by four fan-shaped divided bodies 25. The number of the fan-shaped divided bodies 25 is not particularly limited. The function of the current plate 22 will be described later.

流入部12は、ガイド筒26と、ガイド筒26内に設けられる導入管28と有する。導入管28には、被処理水流入管30が接続され、導入管28は浮上槽10の底部10bの中央に形成されたピット18から浮上槽10内に延設されている。被処理水流入管30には加圧水流入管32が接続されている。浮上槽10内に設けられるガイド筒26は、底部10bや、周壁10aにフレームなどで固定される。また、ガイド筒26を上方から吊り下げてもよい。ガイド筒26を設けることにより、導入管28から供給される被処理水及び加圧水を浮上槽10の中央部分から均一に流入させることができる。   The inflow portion 12 includes a guide tube 26 and an introduction pipe 28 provided in the guide tube 26. A treated water inflow pipe 30 is connected to the introduction pipe 28, and the introduction pipe 28 extends from the pit 18 formed in the center of the bottom 10 b of the levitation tank 10 into the levitation tank 10. A pressurized water inflow pipe 32 is connected to the treated water inflow pipe 30. The guide tube 26 provided in the floating tank 10 is fixed to the bottom 10b and the peripheral wall 10a with a frame or the like. The guide tube 26 may be suspended from above. By providing the guide tube 26, the water to be treated and the pressurized water supplied from the introduction pipe 28 can be uniformly introduced from the central portion of the levitation tank 10.

本実施形態の流入部12は、浮上槽10の上部20aの中心部で開口しており、当該開口部から浮上槽10の上部20aに(加圧水を混合させた)被処理水を供給させる。ここで、本実施形態のように流入部12が、ガイド筒26と導入管28から構成されている場合、少なくともガイド筒26の開口部26aが上部20aの中心部で開口していればよい。本実施形態の流入部12は、必ずしもガイド筒26を備える必要はない。例えば、流入部12が導入管28のみから構成されていてもよい。この場合、導入管28の開口部28aが上部20aの中心部で開口している必要がある。いずれにしても、被処理水は、浮上槽10の上部20aの中心部に流入させる必要がある。浮上槽10の上部20aの水平断面における中心から周壁10aまでの距離に対し、中心から1/3以内の領域に流入することが好ましい。   The inflow part 12 of this embodiment is opened at the center of the upper part 20a of the levitation tank 10, and the treated water (mixed with pressurized water) is supplied from the opening to the upper part 20a of the levitation tank 10. Here, when the inflow part 12 is comprised from the guide cylinder 26 and the inlet tube 28 like this embodiment, the opening part 26a of the guide cylinder 26 should just open in the center part of the upper part 20a. The inflow portion 12 of this embodiment does not necessarily need to include the guide tube 26. For example, the inflow portion 12 may be composed only of the introduction pipe 28. In this case, the opening 28a of the introduction pipe 28 needs to open at the center of the upper portion 20a. In any case, the water to be treated needs to flow into the central portion of the upper portion 20a of the floating tank 10. It is preferable to flow into a region within 1/3 from the center with respect to the distance from the center to the peripheral wall 10a in the horizontal section of the upper portion 20a of the levitation tank 10.

流入部12の開口部(図1ではガイド筒26の開口部26a)の位置は、浮上槽10の上部20a、すなわち整流板22より垂直方向上方であれば特に制限されるものではない。しかし、流入部12の開口部の位置が液面付近にあると、流入部12の開口部から供給される被処理水が液面に噴き上げて、液面を乱し、液面に浮上した浮上物23の再沈降を招く虞がある。   The position of the opening portion of the inflow portion 12 (in FIG. 1, the opening portion 26a of the guide tube 26) is not particularly limited as long as it is vertically above the upper portion 20a of the levitation tank 10, that is, the rectifying plate 22. However, if the position of the opening of the inflow portion 12 is near the liquid level, the water to be treated supplied from the opening of the inflow portion 12 spouts up to the liquid surface, disturbs the liquid surface, and floats to the liquid surface. There is a risk of re-sedimentation of the object 23.

図4は、本実施形態に係る浮上分離装置の一部拡大模式断面図である。ガイド筒26は、整流板22に設けられた嵌挿孔に挿入されている。整流板22の嵌挿孔とガイド筒26との間に隙間が形成される場合には、当該隙間から被処理水が流れ、処理水の水質を悪化させないように、当該隙間を塞ぐ止水板34が設けられることが好ましい。止水板34はボルト及びナット等の締結具36により整流板22に固定されている。また、導入管28は、ガイド筒26に設けられた嵌挿孔に挿入されている。ガイド筒26の嵌挿孔と導入管28との間に隙間が形成される場合には、上記同様に当該隙間を塞ぐ止水板34が設けられることが好ましい。止水板34はボルト及びナット等の締結具36によりガイド筒26に固定されている。なお、ガイド筒26の外周にフランジを設け、このフランジに整流板22の端部を固定することも好適である。   FIG. 4 is a partially enlarged schematic cross-sectional view of the levitation separator according to this embodiment. The guide cylinder 26 is inserted into a fitting insertion hole provided in the rectifying plate 22. When a gap is formed between the insertion hole of the rectifying plate 22 and the guide tube 26, a water stop plate that blocks the gap so that the water to be treated flows from the gap and the quality of the treated water is not deteriorated. 34 is preferably provided. The water stop plate 34 is fixed to the current plate 22 by fasteners 36 such as bolts and nuts. The introduction tube 28 is inserted into a fitting insertion hole provided in the guide tube 26. When a gap is formed between the insertion hole of the guide tube 26 and the introduction pipe 28, it is preferable to provide a water stop plate 34 that closes the gap as described above. The water stop plate 34 is fixed to the guide tube 26 by fasteners 36 such as bolts and nuts. It is also preferable to provide a flange on the outer periphery of the guide tube 26 and fix the end of the rectifying plate 22 to this flange.

排出部14は、処理水取出管38、水位調整槽40、処理水排出管42を備える。処理水取出管38の一端は、浮上槽10に設けられた集水部10cに接続されており、処理水取出管38の他端は、水位調整槽40の入口に接続されている。また、水位調整槽40の出口には処理水排出管42が接続されている。   The discharge unit 14 includes a treated water extraction pipe 38, a water level adjustment tank 40, and a treated water discharge pipe 42. One end of the treated water outlet pipe 38 is connected to a water collecting part 10 c provided in the floating tank 10, and the other end of the treated water outlet pipe 38 is connected to the inlet of the water level adjusting tank 40. A treated water discharge pipe 42 is connected to the outlet of the water level adjustment tank 40.

次に、本実施形態に係る浮上分離装置による運転方法の一例を説明する。まず、被処理水流入管30から被処理水を流入させると共に、加圧水流入管32から高圧下で気体を溶解させた加圧水を流入させる。加圧水は、処理水の一部を加圧タンクに導入し、ここにおいて高圧下で空気を溶解させて生成する。   Next, an example of the operation method by the levitation separator according to the present embodiment will be described. First, the water to be treated is caused to flow from the water to be treated inflow pipe 30 and the pressurized water in which the gas is dissolved from the pressure water inflow pipe 32 under high pressure. Pressurized water is generated by introducing a portion of treated water into a pressurized tank, where air is dissolved under high pressure.

加圧水流入管32を通る加圧水は、被処理水流入管30を通る被処理水に混合される。被処理水及び加圧水からなる混合液は被処理水流入管30から、導入管28に供給される。被処理水及び加圧水は導入管28を介し、導入管28の開口部28aからガイド筒26内に供給される。ガイド筒26内に供給された(浮上槽10の液面に向かって上昇する)被処理水及び加圧水は、ガイド筒26の開口部26aから浮上槽10の上部20aに流入する。浮上槽10の上部20a(及びガイド筒26内)は、大気圧状態であるため、加圧水に溶解していた気体が気泡として析出し、被処理水中の被処理物質(SS成分、油分等)に付着し、被処理物質が浮上分離される。このようにして浮上した被処理物質(浮上物23)は、浮上物ポット24に収集される。浮上物23の収集は、通常、後述する浮上物スキマーによって行われるが、その他の方法によって行われてもよい。浮上物ポット24に収集された浮上物23は、浮上物ポット24の排出口に接続された浮上物排出管44から排出される。気泡の発生方法としては、上記のように加圧水を用いる方法に制限されるものではなく、その他に、例えば、界面活性剤等の気泡発生剤を被処理水に添加する方法等であってもよい。また、被処理水自体を空気溶解タンクに導入し、ここで被処理水に直接空気を溶解する全量加圧方式を採用してもよい。   The pressurized water that passes through the pressurized water inflow pipe 32 is mixed with the treated water that passes through the treated water inflow pipe 30. A mixed liquid composed of water to be treated and pressurized water is supplied from the water to be treated inflow pipe 30 to the introduction pipe 28. The water to be treated and the pressurized water are supplied into the guide tube 26 from the opening 28 a of the introduction pipe 28 through the introduction pipe 28. Water to be treated and pressurized water supplied into the guide cylinder 26 (rising toward the liquid level of the levitation tank 10) flow into the upper part 20 a of the levitation tank 10 from the opening 26 a of the guide cylinder 26. Since the upper part 20a of the levitation tank 10 (and the inside of the guide cylinder 26) is in an atmospheric pressure state, the gas dissolved in the pressurized water is precipitated as bubbles, and becomes a substance to be treated (SS component, oil, etc.) in the treated water. It adheres and the material to be treated floats and is separated. The material to be treated (the levitated material 23) that has floated in this manner is collected in the levitated material pot 24. The collection of the floating object 23 is normally performed by a floating object skimmer described later, but may be performed by other methods. The float 23 collected in the float pot 24 is discharged from the float discharge pipe 44 connected to the discharge port of the float pot 24. The method of generating bubbles is not limited to the method using pressurized water as described above, but may be a method of adding a bubble generating agent such as a surfactant to the water to be treated. . Alternatively, a whole-pressure method may be employed in which the water to be treated itself is introduced into an air dissolution tank and air is directly dissolved in the water to be treated.

ガイド筒26の開口部26aから浮上槽10の上部20aに供給された被処理水が、浮上槽10の周壁10aに達すると、周壁10aに沿って流れる下降流となる。そこで、本実施形態では、ガイド筒26の開口部26aが浮上槽10の上部20aの中心部において垂直方向上方に開口するとともに、浮上槽10の周壁10aを円筒状にすることが好ましい。上記構成によって、図2に示すように被処理水は放射状に拡がりながら流れる分散流れとなって、浮上槽10の周壁10aに達する。その結果、開口部26aから供給された被処理水の流れは、浮上槽10の周壁10aに到達するまでに緩やかになり、周壁10aに沿って流れる被処理水の下降流も緩やかになる。したがって、急速な下降流によって生じる処理水の水質の悪化は抑制される。   When the water to be treated supplied from the opening 26a of the guide tube 26 to the upper portion 20a of the levitation tank 10 reaches the peripheral wall 10a of the levitation tank 10, a downward flow flows along the peripheral wall 10a. Therefore, in the present embodiment, it is preferable that the opening 26a of the guide cylinder 26 opens vertically upward at the center of the upper portion 20a of the levitation tank 10, and the peripheral wall 10a of the levitation tank 10 is cylindrical. With the above configuration, the water to be treated becomes a dispersed flow that spreads radially and reaches the peripheral wall 10a of the levitation tank 10 as shown in FIG. As a result, the flow of the water to be treated supplied from the opening 26a becomes gentle before reaching the peripheral wall 10a of the levitation tank 10, and the downward flow of the water to be treated flowing along the peripheral wall 10a also becomes gentle. Therefore, deterioration of the quality of the treated water caused by the rapid downward flow is suppressed.

ここで、流入部12の開口部(図1ではガイド筒26の開口部26a)の形状は特に制限されるものではないが、流入部12の開口部から供給される被処理水が放射状に分散し易くなる点で、その上部において上方に向けてテーパ状に広がっていることが好ましい。また、流入部12の開口部の水平断面積は、特に制限されるものではないが、流入部12を流れる被処理水の流速を適切に制御することができる点で、好ましくは浮上槽10の水平断面積の1/30〜1/3の範囲、より好ましくは浮上槽10の水平断面積の1/20〜1/8の範囲とするのがよい。流入部12の開口部の水平断面積が浮上槽10の水平断面積の1/30より小さいと、流入部12から出る際の被処理水の流速が速くなるため、被処理水は浮上槽10の表層部を流れ、開口部から浮上槽10の周壁10aに向かって流れる被処理水の流速も速くなり、浮上槽10の液面に乱れが生じやすく、液面に浮上した浮上物23の再沈降を招く虞がある。また、浮上槽10の周壁10aに沿って流れる被処理水の下降流も速くなるため、整流板22の全体を有効に利用することができず、その整流効果が減少し、処理水の水質が悪化する可能性がある。また、流入部12の開口部の水平断面積が浮上槽10の水平断面積の1/3より大きいと、浮上槽10の面積を確保することが難しくなり、浮上槽10の水面積負荷が大きくなり、効率的な浮上処理が行えなくなる。   Here, the shape of the opening of the inflow portion 12 (in FIG. 1, the opening 26a of the guide tube 26) is not particularly limited, but the water to be treated supplied from the opening of the inflow portion 12 is dispersed radially. From the viewpoint of facilitating this, it is preferable that the upper portion of the upper portion spreads in a tapered shape. In addition, the horizontal cross-sectional area of the opening of the inflow portion 12 is not particularly limited, but it is preferable that the flow rate of the water to be treated flowing through the inflow portion 12 can be appropriately controlled. It is good to set it as the range of 1/20 to 1/8 of the horizontal cross-sectional area of the horizontal cross-sectional area of the horizontal cross-sectional area of the horizontal tank of the floating tank 10, More preferably. If the horizontal cross-sectional area of the opening of the inflow portion 12 is smaller than 1/30 of the horizontal cross-sectional area of the levitation tank 10, the flow rate of the water to be treated when exiting the inflow portion 12 is increased. The flow rate of the water to be treated flowing from the opening toward the peripheral wall 10a of the levitation tank 10 is increased, the liquid surface of the levitation tank 10 is likely to be disturbed, and the floating object 23 that has floated to the liquid surface is regenerated. There is a risk of causing sedimentation. Moreover, since the downflow of the to-be-processed water which flows along the surrounding wall 10a of the levitation tank 10 also becomes fast, the whole rectification | straightening board 22 cannot be used effectively, the rectification | straightening effect reduces and the quality of treated water is reduced. It can get worse. Moreover, when the horizontal cross-sectional area of the opening part of the inflow part 12 is larger than 1/3 of the horizontal cross-sectional area of the levitation tank 10, it becomes difficult to ensure the area of the levitation tank 10, and the water area load of the levitation tank 10 is large. Therefore, efficient levitation processing cannot be performed.

浮上槽10の上部20aにおいて、被処理物質が除去された処理水は、整流板22に設けた整流孔22aを通り、浮上槽10の下部20bに供給される。整流板22を設けることにより、上部20aから下部20bへ流れる処理水の流れは整流されるため、周壁10aに沿って流れる被処理水の下降流がそのままの流速で、下部20bへ流れることが防止される。すなわち、上部20aから下部20bへ流れる処理水の流速は、整流板22の整流効果により、どの場所でもほぼ均一とされる。その結果、浮上槽10の上部20a全体を浮上分離処理に使用することが可能となり、効率的に気泡を被処理物質に付着させることができるため、処理能力を向上させることができる。また、気泡が付着しても浮上することができない比重の重い被処理物質(沈殿物)や、気泡が十分付着しなかった被処理物質が、周壁10a下方の底部10bに局所的に沈殿することがなく、底部10b全体に沈殿する。このように、被処理物質の除去において、浮上槽10全体を有効に使用することができるため、装置の小型化、浮上分離槽装置の高速処理が可能となる。   In the upper part 20 a of the levitation tank 10, the treated water from which the substance to be treated has been removed passes through the rectifying holes 22 a provided in the rectifying plate 22 and is supplied to the lower part 20 b of the levitation tank 10. By providing the rectifying plate 22, the flow of the treated water flowing from the upper part 20a to the lower part 20b is rectified, so that the downward flow of the treated water flowing along the peripheral wall 10a is prevented from flowing to the lower part 20b at the same flow rate. Is done. That is, the flow rate of the treated water flowing from the upper part 20a to the lower part 20b is made almost uniform everywhere due to the rectifying effect of the rectifying plate 22. As a result, the entire upper part 20a of the levitation tank 10 can be used for the levitation separation process, and bubbles can be efficiently attached to the material to be treated, so that the processing capacity can be improved. In addition, a material to be treated (precipitate) having a high specific gravity that cannot float even if bubbles are attached, or a material to be treated to which bubbles are not sufficiently adhered are locally deposited on the bottom 10b below the peripheral wall 10a. It settles in the whole bottom part 10b. Thus, since the entire levitation tank 10 can be used effectively in the removal of the substance to be treated, the apparatus can be downsized and the levitation separation tank apparatus can be processed at high speed.

整流板22に形成された整流孔22aを通って、浮上槽10の下部20bに供給された処理水は、浮上槽10の集水部10cから処理水取出管38を通り、水位調整槽40に供給される。水位調整槽40には可動堰41が設けられている。この可動堰41の高さを調整することで、浮上槽10における水位を調整でき、浮上槽10の水位が浮上物23の浮上物ポット24への排出に適した水位に調整される。そして、処理水が水位調整槽40の出口から処理水排出管42へ排出される。なお、可動堰41を間欠的に上昇させ、これによって浮上槽10内の浮上物23を浮上物ポット24へオーバーフローさせることも可能である。   The treated water supplied to the lower portion 20b of the levitation tank 10 through the rectifying holes 22a formed in the rectifying plate 22 passes from the water collection section 10c of the levitation tank 10 through the treated water extraction pipe 38 to the water level adjustment tank 40. Supplied. A movable weir 41 is provided in the water level adjustment tank 40. By adjusting the height of the movable weir 41, the water level in the levitation tank 10 can be adjusted, and the water level in the levitation tank 10 is adjusted to a water level suitable for discharging the float 23 to the float pot 24. Then, the treated water is discharged from the outlet of the water level adjustment tank 40 to the treated water discharge pipe 42. In addition, it is also possible to raise the movable weir 41 intermittently and thereby overflow the floating material 23 in the floating tank 10 to the floating material pot 24.

図5は、本発明の他の実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。図5に示すように、浮上分離装置2は、浮上槽46、流入部12、排出部54、整流板22を備える。図5に示す浮上分離装置2において、図1に示す浮上分離装置1と同様の構成については同一の符合を付している。   FIG. 5 is a schematic cross-sectional view showing an example of the configuration of a flotation separation apparatus according to another embodiment of the present invention. As shown in FIG. 5, the levitation separation device 2 includes a levitation tank 46, an inflow portion 12, a discharge portion 54, and a rectifying plate 22. In the floating separation apparatus 2 shown in FIG. 5, the same reference numerals are given to the same components as those in the floating separation apparatus 1 shown in FIG.

浮上槽46には、外周壁48と、外周壁48の内周に沿って形成される内周壁50とが設けられている。浮上槽46の外周壁48及び内周壁50は、上記説明したように矩形状より円筒形とされることが好ましい。浮上槽46の底部46aは中央に向かって低位となるホッパ状とされている。また、浮上槽46の底部46aの中央には、沈殿物を溜めるピット18が設けられている。   The floating tank 46 is provided with an outer peripheral wall 48 and an inner peripheral wall 50 formed along the inner periphery of the outer peripheral wall 48. As described above, the outer peripheral wall 48 and the inner peripheral wall 50 of the levitation tank 46 are preferably cylindrical rather than rectangular. The bottom 46a of the levitation tank 46 has a hopper shape that becomes lower toward the center. A pit 18 for collecting sediment is provided at the center of the bottom 46a of the levitation tank 46.

浮上槽46の外周壁48と内周壁50との間には、処理水が集水される処理水室52が形成されている。処理水室52の集水部52aは、整流板22により区画された浮上槽46の下部20bから処理水を集水させるために、浮上槽46の下部20b側、すなわち整流板22より垂直方向下方に配置される。   A treated water chamber 52 for collecting treated water is formed between the outer peripheral wall 48 and the inner peripheral wall 50 of the levitation tank 46. The water collecting part 52a of the treated water chamber 52 is vertically below the rectifying plate 22 in order to collect treated water from the lower part 20b of the floating tank 46 partitioned by the rectifying plate 22. Placed in.

浮上槽46内には、浮上槽46を垂直方向の上部20a及び下部20bに区画する整流板22が設けられている。そして、整流板22には、処理水を通水させる複数の整流孔22aが形成されている。流入部12は、ガイド筒26と、ガイド筒26内に設けられる導入管28と有する。導入管28には、被処理水流入管30が接続され、導入管28は浮上槽46の底部46aの中央に形成されたピット18から浮上槽10内に延設されている。被処理水流入管30には加圧水流入管32が接続されている。浮上槽46内に設けられるガイド筒26は、装置外部から不図示のフレーム等により浮上槽46内に固定されている。本実施形態では、流入部12は、浮上槽46の上部20aの中心部において垂直方向上方に開口しており、当該開口部から浮上槽46の上部20aに被処理水が供給される。   In the levitation tank 46, a rectifying plate 22 is provided that divides the levitation tank 46 into an upper part 20a and a lower part 20b in the vertical direction. And the baffle plate 22 is formed with a plurality of baffle holes 22a through which the treated water flows. The inflow portion 12 includes a guide tube 26 and an introduction pipe 28 provided in the guide tube 26. A treated water inflow pipe 30 is connected to the introduction pipe 28, and the introduction pipe 28 extends into the levitation tank 10 from a pit 18 formed at the center of the bottom 46 a of the levitation tank 46. A pressurized water inflow pipe 32 is connected to the treated water inflow pipe 30. The guide cylinder 26 provided in the levitation tank 46 is fixed in the levitation tank 46 from the outside of the apparatus by a frame (not shown) or the like. In the present embodiment, the inflow portion 12 is opened upward in the vertical direction at the center of the upper portion 20a of the levitation tank 46, and the water to be treated is supplied from the opening to the upper portion 20a of the levitation tank 46.

排出部54は、調整槽56、処理水排出管58を備える。調整槽56は、浮上槽46の外周壁48の外周に設置されており、調整槽56の出口には処理水排出管58が接続されている。   The discharge unit 54 includes an adjustment tank 56 and a treated water discharge pipe 58. The adjustment tank 56 is installed on the outer periphery of the outer peripheral wall 48 of the levitation tank 46, and a treated water discharge pipe 58 is connected to the outlet of the adjustment tank 56.

次に、本実施形態に係る浮上分離装置2による運転方法の一例を説明する。まず、被処理水流入管30から被処理水を流入させると共に、加圧水流入管32から加圧水を流入させる。加圧水流入管32を通る加圧水は、被処理水流入管30を通る被処理水に供給される。被処理水及び加圧水は被処理水流入管30を通過し、導入管28に供給される。被処理水及び加圧水は導入管28を通過し、導入管28の開口部28aからガイド筒26内に供給される。ガイド筒26内を通る(浮上槽46の液面に向かって上昇する)被処理水及び加圧水は、ガイド筒26の開口部26aから浮上槽46の上部20aに供給される。本実施形態では、ガイド筒26の開口部26aが浮上槽46の上部20aの中心部において垂直方向上方に開口しているため、被処理水は放射状に分散される流れとなって、浮上槽46の内周壁50に達する。浮上槽46の上部20a(及びガイド筒26内)では、加圧水が大気圧状態となり、加圧水に溶解していた気体が気泡として析出されるため、被処理水中の被処理物質(SS成分、油分等)に付着し、被処理物質が浮上分離される。浮上分離した浮上物23は、浮上槽46に設けられる不図示の浮上物ポットに収集される。浮上物23の収集は、通常、後述する浮上物スキマーによって行われるものであるが、その他の方法により行われてもよい。浮上物ポットに収集された浮上物23は、浮上物ポットの排出口に接続された不図示の浮上物排出管から排出される。   Next, an example of the operation method by the levitation separator 2 according to the present embodiment will be described. First, the water to be treated is caused to flow from the water to be treated inflow pipe 30 and the pressurized water is caused to flow from the pressure water inflow pipe 32. The pressurized water that passes through the pressurized water inflow pipe 32 is supplied to the treated water that passes through the treated water inflow pipe 30. The treated water and the pressurized water pass through the treated water inflow pipe 30 and are supplied to the introduction pipe 28. The water to be treated and the pressurized water pass through the introduction pipe 28 and are supplied into the guide tube 26 from the opening 28 a of the introduction pipe 28. Water to be treated and pressurized water passing through the guide cylinder 26 (rising toward the liquid level of the levitation tank 46) are supplied from the opening 26a of the guide cylinder 26 to the upper portion 20a of the levitation tank 46. In the present embodiment, since the opening 26a of the guide tube 26 opens vertically upward at the center of the upper portion 20a of the levitation tank 46, the water to be treated becomes a flow that is radially dispersed, and the levitation tank 46 Reaches the inner peripheral wall 50 of. In the upper part 20a of the levitation tank 46 (and in the guide cylinder 26), the pressurized water is in an atmospheric pressure state, and the gas dissolved in the pressurized water is precipitated as bubbles, so that the substance to be treated (SS component, oil content, etc.) in the treated water The material to be treated is floated and separated. The levitated material 23 that has been levitated and separated is collected in a levitated material pot (not shown) provided in the levitating tank 46. The collection of the levitated object 23 is normally performed by a levitated skimmer described later, but may be performed by other methods. The floating material 23 collected in the floating material pot is discharged from a floating material discharge pipe (not shown) connected to the discharge port of the floating material pot.

浮上槽46の上部20aにおいて、被処理物質が除去された処理水は、整流板22に設けた整流孔22aを通り、浮上槽46の下部20bに供給される。整流板22を設けることにより、上部20aから下部20bへ流れる処理水の流れは整流される。整流板22に形成された整流孔22aを通って、浮上槽46の下部20bに供給された処理水は、浮上槽46の集水部52aから処理水室52を通り、浮上槽46の外周壁48をオーバーフローして調整槽56に供給される。調整槽56に供給された処理水は、調整槽56の出口から処理水排出管58へ排出される。   In the upper part 20 a of the levitation tank 46, the treated water from which the substance to be treated has been removed passes through the rectifying holes 22 a provided in the rectifying plate 22 and is supplied to the lower part 20 b of the levitation tank 46. By providing the rectifying plate 22, the flow of treated water flowing from the upper part 20a to the lower part 20b is rectified. The treated water supplied to the lower portion 20b of the levitation tank 46 through the rectifying hole 22a formed in the rectifying plate 22 passes through the treated water chamber 52 from the water collecting portion 52a of the levitation tank 46, and the outer peripheral wall of the levitation tank 46. 48 is overflowed and supplied to the adjustment tank 56. The treated water supplied to the adjustment tank 56 is discharged from the outlet of the adjustment tank 56 to the treated water discharge pipe 58.

このような構成でも、円筒型の浮上槽10およびその浮上槽内を上下に仕切る整流板22を用い、被処理物質の除去において、浮上槽全体を有効に使用することができるため、装置の小型化、浮上分離槽装置の高速処理が可能となる。   Even in such a configuration, the entire levitation tank can be effectively used in removing the material to be treated by using the cylindrical levitation tank 10 and the rectifying plate 22 that vertically partitions the inside of the levitation tank. And high-speed processing of the floating separation tank apparatus are possible.

図6は、本発明の他の実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。図6に示す浮上分離装置3は、図1に示す浮上分離装置1に浮上物スキマー60、沈殿物掻き寄せ機62、整流板スクレーパー64を設けたものである。図6に示す浮上分離装置3において、図1に示す浮上分離装置1と同様の構成については、同一の符合を付し、その説明を省略する。   FIG. 6 is a schematic cross-sectional view showing an example of the configuration of a levitation separator according to another embodiment of the present invention. The floating separation device 3 shown in FIG. 6 is obtained by providing the floating separation device 1 shown in FIG. 1 with a floating material skimmer 60, a sediment scraper 62, and a current plate scraper 64. In the levitation separator 3 shown in FIG. 6, the same components as those of the levitation separator 1 shown in FIG.

浮上物スキマー60は、液面に浮上した浮上物23を掻き寄せるためのものである。浮上物スキマー60は、モータ66のシャフトに固定されている。モータ66が駆動することにより、浮上物スキマー60が回転され、液面に浮上した浮上物が掻き寄せられる。浮上物スキマー60は、羽根、螺旋羽根等のスクレーパー部を有しており、水面の流れ及びスクレーパー部の移動により浮上物23が半径方向外側に移動させられ、浮上槽10に設けられた浮上物ポット24に集められ、浮上物排出管44から排出される。浮上物スキマー60を設けることにより、浮上物23を効率的に排出することができるため、処理水の水質悪化を抑制することができる。   The levitated skimmer 60 is for scraping the levitated matter 23 that has levitated to the liquid surface. The levitated skimmer 60 is fixed to the shaft of the motor 66. When the motor 66 is driven, the levitated skimmer 60 is rotated, and the levitated matter that has levitated to the liquid surface is scraped. The levitated skimmer 60 has scraper portions such as blades and spiral vanes, and the levitated matter 23 is moved radially outward by the flow of the water surface and the movement of the scraper portion, and the levitated matter provided in the levitating tank 10. They are collected in the pot 24 and discharged from the floating material discharge pipe 44. By providing the levitated skimmer 60, the levitated material 23 can be efficiently discharged, so that deterioration of the quality of the treated water can be suppressed.

沈殿物掻き寄せ機62は、浮上槽10の底部10bに沈殿した沈殿物を掻き寄せるためのものである。沈殿物掻き寄せ機62はガイド筒26に取り付けられると共に、支持体68により沈殿物掻き寄せ機62の角度調整、補強がなされている。そして、ガイド筒26は、モータ66のシャフトに取り付けられ、モータ66の駆動により回転される。すなわち、沈殿物掻き寄せ機62はモータ66の駆動により、ガイド筒26と一体に回転される。沈殿物掻き寄せ機62が回転することにより、浮上槽10の底部10bに沈殿した沈殿物が掻き寄せられ、浮上槽10のピット18に集められ、沈殿物排出管19から排出される。なお、この沈殿物掻き寄せ機62も、羽根、螺旋羽根等のスクレーパー部を有しており、このスクレーパー部によって内側方向に沈殿物を掻き寄せる。   The sediment scraper 62 is for scraping the sediment deposited on the bottom 10 b of the floating tank 10. The sediment scraper 62 is attached to the guide tube 26, and the angle of the sediment scraper 62 is reinforced by a support 68. The guide cylinder 26 is attached to the shaft of the motor 66 and is rotated by driving of the motor 66. That is, the sediment scraper 62 is rotated integrally with the guide cylinder 26 by the drive of the motor 66. As the sediment scraper 62 rotates, the sediment deposited on the bottom 10 b of the floating tank 10 is scraped, collected in the pit 18 of the floating tank 10, and discharged from the sediment discharge pipe 19. In addition, this sediment scraper 62 also has scraper parts, such as a blade | wing and a spiral blade, and scrapes a sediment inward by this scraper part.

ここで、従来は、沈殿物を清掃するため定期的なメンテナンスが必要であったが、沈殿物掻き寄せ機62を設けることにより、沈殿物を効率的に排出することができるため、メンテナンス回数を減らし、装置の長期連続運転が可能となる。   Here, in the past, regular maintenance was required to clean the sediment. However, by providing the sediment scraper 62, the sediment can be efficiently discharged, so the number of maintenance times is reduced. The system can be operated continuously for a long time.

整流板スクレーパー64は、整流板22に沈殿した沈殿物を掻き取り、整流板22の整流孔22aから下方に落下排出するためのものである。整流板スクレーパー64は、ガイド筒26に取り付けられており、モータ66の駆動により、ガイド筒26と一体に回転される。整流板スクレーパー64が回転することにより、整流板22に沈殿した沈殿物が掻き取られ、整流板22の整流孔22aから沈殿物が排出される。整流板スクレーパー64を設けることにより、整流板22を清掃するためのメンテナンス回数を減らし、装置の長期連続運転が可能となる。整流板スクレーパー64も羽根等を有するが、この羽根は、沈殿物を半径方向に輸送する必要はない。しかし、処理水の集水部10cから遠い方向に沈殿物を輸送する方が好ましいため、沈殿物を内側に掻き寄せる羽根とすること好適である。   The rectifying plate scraper 64 scrapes the sediment that has settled on the rectifying plate 22 and drops it downward from the rectifying holes 22a of the rectifying plate 22 to discharge it. The rectifying plate scraper 64 is attached to the guide cylinder 26, and is rotated integrally with the guide cylinder 26 by driving of the motor 66. As the rectifying plate scraper 64 rotates, the sediment deposited on the rectifying plate 22 is scraped off, and the precipitate is discharged from the rectifying holes 22 a of the rectifying plate 22. By providing the rectifying plate scraper 64, the number of times of maintenance for cleaning the rectifying plate 22 is reduced, and long-term continuous operation of the apparatus becomes possible. The baffle scraper 64 also has blades or the like, but the blades do not have to transport sediment in the radial direction. However, since it is preferable to transport the precipitate in a direction far from the water collection portion 10c of the treated water, it is preferable to use a blade that scrapes the precipitate inward.

なお、浮上物スキマー60、沈殿物掻き寄せ機62、整流板スクレーパー64の回転数は同一でなく、それぞれ異ならせてもよい。しかし、同一回転数とすれば、減速機構等が不要で、駆動機構を簡単にできる。特に、対象物に応じて、羽根の傾斜を適切なものに設定することが好適である。   Note that the rotational speeds of the levitated skimmer 60, the sediment scraper 62, and the current plate scraper 64 are not the same, and may be different from each other. However, if the rotation speed is the same, a speed reduction mechanism or the like is unnecessary, and the drive mechanism can be simplified. In particular, it is preferable to set the blade inclination to an appropriate value according to the object.

以下、実施例および比較例を挙げ、本発明をより具体的に詳細に説明するが、本発明は、以下の実施例に限定されるものではない。   EXAMPLES Hereinafter, although an Example and a comparative example are given and this invention is demonstrated in detail more concretely, this invention is not limited to a following example.

(実施例1)
図1の浮上分離装置1に、図6の浮上物スキマー60を取り付けた浮上分離装置を用い、下記の条件で被処理水の浮上分離処理を行い、浮上分離後の処理水の濁度を測定した。浮上分離装置に供給する被処理水は、予め凝集処理槽(サイズ:3000L、1600mmΦ×高さ2000mm)で凝集処理したものを用いた。
<浮上分離装置サイズ>
浮上槽:1600mmΦ
ガイド筒:300mmΦ
<試験条件>
被処理水:戸田市工業用水にカオリンを10mg/L、フミンを1mg/L添加したもの
被処理水濁度:8.7度
凝集処理時に用いた凝集剤:ポリ塩化アルミニウム(PAC)を30mg/L添加
凝集時の被処理水pH:7(pH調整剤としてHCl、NaOHを添加)
被処理水流量:50m/hr
加圧水比:20%
通水速度:30.9m/h
浮上物スキマー速度:2分/周
試験時間:14日間連続運転
Example 1
Using the floatation separation apparatus with the floatation skimmer 60 of FIG. 6 attached to the floatation separation apparatus 1 of FIG. 1, the surface separation of the treated water is performed under the following conditions, and the turbidity of the treated water after the floatation separation is measured. did. The water to be treated supplied to the levitation separator was previously agglomerated in a flocculation tank (size: 3000 L, 1600 mmΦ × height 2000 mm).
<Floating separator size>
Levitation tank: 1600mmΦ
Guide tube: 300mmΦ
<Test conditions>
Water to be treated: Toda City industrial water added with 10 mg / L of kaolin and 1 mg / L of humin Water to be treated Turbidity: 8.7 degrees Flocculant used during agglomeration treatment: Polyaluminum chloride (PAC) 30 mg / L L addition Water to be treated at the time of aggregation pH: 7 (addition of HCl and NaOH as pH adjusters)
Processed water flow rate: 50 m 3 / hr
Pressurized water ratio: 20%
Water flow rate: 30.9m / h
Float skimmer speed: 2 minutes / lap Test time: 14 days continuous operation

(実施例2)
図1の浮上分離装置1に、図6の浮上物スキマー60及び整流板スクレーパー64を取り付けた浮上分離装置を用いたこと以外は、実施例1と同様の条件で試験を行った。整流板スクレーパー64の速度は、2分/周とした。
(Example 2)
The test was performed under the same conditions as in Example 1 except that the levitating separation apparatus 1 of FIG. 1 was equipped with the levitating skimmer 60 and the current plate scraper 64 of FIG. The speed of the current plate scraper 64 was 2 minutes / circumference.

(実施例3)
図6の浮上分離装置3(すなわち、浮上物スキマー60、整流板スクレーパー64及び沈殿物掻き寄せ機62を備えている)を用い、実施例1と同様の条件で試験を行い、さらに、浮上槽10のピット18に溜まった沈殿物を沈殿物排出管19から2時間に1回引き抜いた。また、整流板スクレーパー64の速度、沈殿物掻き寄せ機62の速度は、それぞれ2分/周とした。
(Example 3)
A test was performed under the same conditions as in Example 1 using the floating separator 3 of FIG. 6 (that is, the float skimmer 60, the current plate scraper 64, and the sediment scraper 62). The sediment accumulated in the 10 pits 18 was extracted from the sediment discharge pipe 19 once every 2 hours. Moreover, the speed of the baffle scraper 64 and the speed of the sediment scraper 62 were each 2 minutes / circumference.

図7は、実施例1〜3における処理水濁度の結果を表す図である。図7に示すように、実施例1、すなわち浮上物スキマー60を取り付けた浮上分離装置を用いると、連続運転10日目の値を除けば、処理水の濁度は平均して2度以下となった。被処理水の濁度は平均して8.7度であるから、被処理水の浮上分離処理としては充分であると判断できる。連続運転10日目において、処理水濁度が高くなった理由は、整流板22、浮上槽10の底部10bに沈殿した沈殿物が一気に集水部10cに流れ込んだためである。   FIG. 7 is a diagram illustrating the results of treated water turbidity in Examples 1 to 3. As shown in FIG. 7, the turbidity of the treated water averaged 2 degrees or less on average, except for the value of the 10th day of continuous operation, when using the floating separator with the floating skimmer 60 attached thereto in Example 1. became. Since the turbidity of the water to be treated is 8.7 degrees on average, it can be determined that it is sufficient as a floating separation process for the water to be treated. The reason why the treated water turbidity increased on the 10th day of continuous operation is that the sediment precipitated on the rectifying plate 22 and the bottom portion 10b of the levitation tank 10 flowed into the water collecting portion 10c all at once.

実施例2、すなわち浮上物スキマー60及び整流板スクレーパー64を取り付けた浮上分離装置を用いると、実施例1より処理水の濁度を低下させることができた。さらに、14日間の連続運転でも、処理水の濁度が急激に高くなることもなく、安定した処理が可能であることがわかった。これは、整流板スクレーパー64により、沈殿物が整流板22に堆積することがなくなったため、沈殿物が処理水と共に浮上槽10から排出されることが抑制された結果である。   The turbidity of the treated water could be reduced as compared with Example 1 when Example 2 was used, that is, when the levitating separator equipped with the levitated skimmer 60 and the current plate scraper 64 was used. Furthermore, it was found that even in continuous operation for 14 days, the turbidity of the treated water does not increase rapidly and stable treatment is possible. This is a result of the sediment being prevented from being deposited on the rectifying plate 22 by the rectifying plate scraper 64, so that the sediment is prevented from being discharged from the floating tank 10 together with the treated water.

実施例3、すなわち浮上物スキマー60、整流板スクレーパー64及び沈殿物掻き寄せ機62を取り付けた浮上分離装置を用いると、実施例2より処理水の濁度を低下させることができた。これは、整流板22及び浮上槽10の底部10bに堆積した沈殿物が、整流板スクレーパー64及び沈殿物掻き寄せ機62により掻き寄せられて沈殿物排出管19から排出されたため、沈殿物が処理水と共に浮上槽10から排出されることがさらに抑制された結果である。   When the floating separator equipped with the float skimmer 60, the baffle scraper 64, and the sediment scraper 62 was used in Example 3, the turbidity of the treated water could be reduced as compared with Example 2. This is because the sediment deposited on the rectifying plate 22 and the bottom portion 10b of the levitation tank 10 is scraped by the rectifying plate scraper 64 and the sediment scraper 62 and discharged from the sediment discharge pipe 19, so that the sediment is treated. It is the result that it was further controlled that it was discharged from floating tank 10 with water.

本実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。It is a schematic cross section which shows an example of a structure of the floating separation apparatus which concerns on this embodiment. 本実施形態に係る浮上分離装置の構成の一例を示す模式上面図である。It is a model top view which shows an example of a structure of the floating separation apparatus which concerns on this embodiment. 本発明の他の実施形態に係る浮上分離装置の構成の一例を示す上面模式図である。It is an upper surface schematic diagram which shows an example of a structure of the floating separation apparatus which concerns on other embodiment of this invention. 本発明の実施形態に係る浮上分離装置の構成の一例を示す一部拡大模式断面図である。It is a partially expanded schematic cross section which shows an example of a structure of the floating separation apparatus which concerns on embodiment of this invention. 本発明の他の実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。It is a schematic cross section which shows an example of a structure of the floating separation apparatus which concerns on other embodiment of this invention. 本発明の他の実施形態に係る浮上分離装置の構成の一例を示す模式断面図である。It is a schematic cross section which shows an example of a structure of the floating separation apparatus which concerns on other embodiment of this invention. 実施例1〜3における処理水濁度の結果を表す図である。It is a figure showing the result of the treated water turbidity in Examples 1-3. 従来の浮上分離装置の構成を示す模式図である。It is a schematic diagram which shows the structure of the conventional floating separation apparatus. 特許文献1の浮上分離装置の構成を示す模式図である。It is a schematic diagram which shows the structure of the floating separation apparatus of patent document 1.

符号の説明Explanation of symbols

1〜5 浮上分離装置、10,46,70,90 浮上槽、10a,90a 周壁、10b,46a,70a 底部、10c,52a 集水部、12 流入部、14,54 排出部、18 ピット、19 沈殿物排出管、20a 上部、20b 下部、22,100 整流板、22a,100a 整流孔、23 浮上物、24 浮上物ポット、25 扇型状分割体、26,78 ガイド筒、26a 開口部、28,80 導入管、28a 開口部、30,82,102 被処理水流入管、32,84,104 加圧水流入管、34 止水板、36 締結具、38 処理水取出管、40 水位調整槽、41 可動堰、42,58,88,106 処理水排出管、44 浮上物排出管、48,72 外周壁、50,74 内周壁、52,76 処理水室、56,86 調整槽、60 浮上物スキマー、62 沈殿物掻き寄せ機、64 整流板スクレーパー、66 モータ、68 支持体、76a 下端部、92a,92b 隔壁、94 第1の室、96 第2の室、98 第3の室、105 空気溶解タンク、110 ポンプ、111 連通管。   1-5 Floating separation device 10, 46, 70, 90 Floating tank, 10a, 90a Perimeter wall, 10b, 46a, 70a Bottom, 10c, 52a Water collecting part, 12 Inflow part, 14, 54 Discharge part, 18 pits, 19 Precipitate discharge pipe, 20a upper part, 20b lower part, 22,100 rectifying plate, 22a, 100a rectifying hole, 23 levitated object, 24 levitated substance pot, 25 fan-shaped divided body, 26, 78 guide tube, 26a opening, 28 , 80 Introducing pipe, 28a opening, 30, 82, 102 treated water inflow pipe, 32, 84, 104 pressurized water inflow pipe, 34 water stop plate, 36 fastener, 38 treated water outlet pipe, 40 water level adjusting tank, 41 movable Weir, 42, 58, 88, 106 Treated water discharge pipe, 44 Floating matter discharge pipe, 48, 72 Outer peripheral wall, 50, 74 Inner peripheral wall, 52, 76 Treated water chamber, 56, 86 Tank, 60 Levitated skimmer, 62 Sediment scraper, 64 Rectifier scraper, 66 Motor, 68 Support, 76a Lower end, 92a, 92b Bulkhead, 94 First chamber, 96 Second chamber, 98 Third Chamber, 105 air dissolution tank, 110 pump, 111 communication pipe.

Claims (3)

被処理水中の被処理物質に気泡を付着させ、被処理物質を浮上物として分離する浮上分離装置であって、
円筒状の浮上槽と、前記浮上槽を垂直方向上部及び下部に区画する整流板と、前記上部に被処理水を流入させる流入部と、前記浮上槽に設けられ、前記被処理物質が分離された処理水を前記下部から集水する集水部とを有し、
前記整流板には、前記処理水を通水させる複数の整流孔が形成され、
前記流入部は、前記上部の中心部で開口し、当該開口部から前記上部に被処理水を流入させるガイド筒と、前記被処理水を上向流で前記ガイド筒に導入する導入管と、を有し、
前記開口部の水平断面積は、前記浮上槽の水平断面積の1/30〜1/3の範囲であることを特徴とする浮上分離装置。
A levitation separation device that attaches bubbles to a substance to be treated in the water to be treated and separates the substance to be treated as a floating substance,
A cylindrical levitation tank, a rectifying plate that divides the levitation tank into an upper part and a lower part in the vertical direction, an inflow part for allowing water to be treated to flow into the upper part, and the levitation tank are provided to separate the substance to be treated. And a water collection part for collecting the treated water from the lower part,
The rectifying plate is formed with a plurality of rectifying holes for allowing the treated water to flow therethrough,
The inlet portion is opened in the center of the upper, and the guide tube from the opening Ru allowed to flow into the water to be treated to the upper, the inlet pipe for introducing into the guide tube the treatment water upflow Have
The horizontal separation area of the opening is in the range of 1/30 to 1/3 of the horizontal sectional area of the levitation tank.
請求項1に記載の浮上分離装置であって、前記浮上槽の液面に浮上した浮上物を掻き寄せる浮上物スキマーと、前記被処理物質のうち浮上槽の底部に沈殿した沈殿物を掻き寄せる沈殿物掻き寄せ機と、を備えることを特徴とする浮上分離装置。 It is a floatation separation apparatus of Claim 1, Comprising: The float skimmer which scrapes the float which floated on the liquid level of the said float tank, and the deposit which settled to the bottom part of the float tank of the said to-be-processed substance is scraped A flotation separator comprising: a sediment scraper; 請求項1又は2に記載の浮上分離装置であって、前記被処理物質のうち前記整流板上に沈殿した沈殿物を前記整流孔から下方に排出する整流板スクレーパーを備えることを特徴とする浮上分離装置。 The levitation separation apparatus according to claim 1 or 2 , further comprising a rectifying plate scraper that discharges sediments deposited on the rectifying plate out of the material to be treated downward from the rectifying holes. Separation device.
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