JP5391892B2 - Photocatalyst-coated body and photocatalyst coating liquid - Google Patents
Photocatalyst-coated body and photocatalyst coating liquid Download PDFInfo
- Publication number
- JP5391892B2 JP5391892B2 JP2009167795A JP2009167795A JP5391892B2 JP 5391892 B2 JP5391892 B2 JP 5391892B2 JP 2009167795 A JP2009167795 A JP 2009167795A JP 2009167795 A JP2009167795 A JP 2009167795A JP 5391892 B2 JP5391892 B2 JP 5391892B2
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- JP
- Japan
- Prior art keywords
- photocatalyst
- coating liquid
- particles
- coated body
- hydrophobic group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000011941 photocatalyst Substances 0.000 title claims description 145
- 238000000576 coating method Methods 0.000 title claims description 64
- 239000011248 coating agent Substances 0.000 title claims description 62
- 239000007788 liquid Substances 0.000 title claims description 38
- 239000002245 particle Substances 0.000 claims description 87
- 230000001699 photocatalysis Effects 0.000 claims description 48
- 229910044991 metal oxide Inorganic materials 0.000 claims description 33
- 150000004706 metal oxides Chemical class 0.000 claims description 33
- 229920001296 polysiloxane Polymers 0.000 claims description 28
- 239000000839 emulsion Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 23
- 125000001165 hydrophobic group Chemical group 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 229940100890 silver compound Drugs 0.000 claims description 15
- 150000003379 silver compounds Chemical class 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 8
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- AYKOTYRPPUMHMT-UHFFFAOYSA-N silver;hydrate Chemical compound O.[Ag] AYKOTYRPPUMHMT-UHFFFAOYSA-N 0.000 claims 2
- 239000003054 catalyst Substances 0.000 claims 1
- -1 and members Substances 0.000 description 71
- 239000010410 layer Substances 0.000 description 31
- 239000000047 product Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 18
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 17
- 230000000694 effects Effects 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 229940121375 antifungal agent Drugs 0.000 description 10
- 230000006866 deterioration Effects 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 230000000843 anti-fungal effect Effects 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 8
- 239000006096 absorbing agent Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000004611 light stabiliser Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229910052709 silver Inorganic materials 0.000 description 7
- 239000004332 silver Substances 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 6
- 239000012964 benzotriazole Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 229910052809 inorganic oxide Inorganic materials 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 241000195493 Cryptophyta Species 0.000 description 5
- 229920001214 Polysorbate 60 Polymers 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000010422 painting Methods 0.000 description 5
- 241000894006 Bacteria Species 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000003945 anionic surfactant Substances 0.000 description 4
- 239000003429 antifungal agent Substances 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000003995 emulsifying agent Substances 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 238000009413 insulation Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000002736 nonionic surfactant Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 150000005215 alkyl ethers Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 210000003298 dental enamel Anatomy 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- ARVUDIQYNJVQIW-UHFFFAOYSA-N (4-dodecoxy-2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 ARVUDIQYNJVQIW-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- CDOUZKKFHVEKRI-UHFFFAOYSA-N 3-bromo-n-[(prop-2-enoylamino)methyl]propanamide Chemical compound BrCCC(=O)NCNC(=O)C=C CDOUZKKFHVEKRI-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- NWGKJDSIEKMTRX-AAZCQSIUSA-N Sorbitan monooleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O NWGKJDSIEKMTRX-AAZCQSIUSA-N 0.000 description 2
- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 2
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- LWZFANDGMFTDAV-BURFUSLBSA-N [(2r)-2-[(2r,3r,4s)-3,4-dihydroxyoxolan-2-yl]-2-hydroxyethyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O LWZFANDGMFTDAV-BURFUSLBSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 125000005605 benzo group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- FLPKSBDJMLUTEX-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) 2-butyl-2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]propanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)C(C(=O)OC1CC(C)(C)N(C)C(C)(C)C1)(CCCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 FLPKSBDJMLUTEX-UHFFFAOYSA-N 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002609 medium Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- UJRDRFZCRQNLJM-UHFFFAOYSA-N methyl 3-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OC)=CC(N2N=C3C=CC=CC3=N2)=C1O UJRDRFZCRQNLJM-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- AQIXEPGDORPWBJ-UHFFFAOYSA-N pentan-3-ol Chemical compound CCC(O)CC AQIXEPGDORPWBJ-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000007540 photo-reduction reaction Methods 0.000 description 2
- 238000013033 photocatalytic degradation reaction Methods 0.000 description 2
- 239000001965 potato dextrose agar Substances 0.000 description 2
- TURAMGVWNUTQKH-UHFFFAOYSA-N propa-1,2-dien-1-one Chemical group C=C=C=O TURAMGVWNUTQKH-UHFFFAOYSA-N 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229950006451 sorbitan laurate Drugs 0.000 description 2
- 235000011067 sorbitan monolaureate Nutrition 0.000 description 2
- 229950004959 sorbitan oleate Drugs 0.000 description 2
- 229950003429 sorbitan palmitate Drugs 0.000 description 2
- 229950011392 sorbitan stearate Drugs 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- NWPIOULNZLJZHU-UHFFFAOYSA-N (1,2,2,6,6-pentamethylpiperidin-4-yl) 2-methylprop-2-enoate Chemical compound CN1C(C)(C)CC(OC(=O)C(C)=C)CC1(C)C NWPIOULNZLJZHU-UHFFFAOYSA-N 0.000 description 1
- BUFCQVRLKYIQJP-UHFFFAOYSA-N (2,2,6,6-tetramethylpiperidin-4-yl) prop-2-enoate Chemical compound CC1(C)CC(OC(=O)C=C)CC(C)(C)N1 BUFCQVRLKYIQJP-UHFFFAOYSA-N 0.000 description 1
- POLSVAXEEHDBMJ-UHFFFAOYSA-N (2-hydroxy-4-octadecoxyphenyl)-phenylmethanone Chemical compound OC1=CC(OCCCCCCCCCCCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 POLSVAXEEHDBMJ-UHFFFAOYSA-N 0.000 description 1
- SXJSETSRWNDWPP-UHFFFAOYSA-N (2-hydroxy-4-phenylmethoxyphenyl)-phenylmethanone Chemical compound C=1C=C(C(=O)C=2C=CC=CC=2)C(O)=CC=1OCC1=CC=CC=C1 SXJSETSRWNDWPP-UHFFFAOYSA-N 0.000 description 1
- CUNWUEBNSZSNRX-RKGWDQTMSA-N (2r,3r,4r,5s)-hexane-1,2,3,4,5,6-hexol;(z)-octadec-9-enoic acid Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O.CCCCCCCC\C=C/CCCCCCCC(O)=O CUNWUEBNSZSNRX-RKGWDQTMSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MJZQXNZJXYLXHB-UHFFFAOYSA-N (3-benzoyl-4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C(C(=O)C=2C=CC=CC=2)=C1 MJZQXNZJXYLXHB-UHFFFAOYSA-N 0.000 description 1
- DVVFXZNTIXZGJW-UHFFFAOYSA-N (3-benzoyl-4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1C(=O)C1=CC=CC=C1 DVVFXZNTIXZGJW-UHFFFAOYSA-N 0.000 description 1
- IMNBHNRXUAJVQE-UHFFFAOYSA-N (4-benzoyl-3-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound OC1=CC(OC(=O)C(=C)C)=CC=C1C(=O)C1=CC=CC=C1 IMNBHNRXUAJVQE-UHFFFAOYSA-N 0.000 description 1
- LJWQJECMFUGUDV-UHFFFAOYSA-N (4-benzoyl-3-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC(OC(=O)C=C)=CC=C1C(=O)C1=CC=CC=C1 LJWQJECMFUGUDV-UHFFFAOYSA-N 0.000 description 1
- WNSJTIUVLYUNTD-UHFFFAOYSA-N (4-cyano-1,2,2,6,6-pentamethylpiperidin-4-yl) 2-methylprop-2-enoate Chemical compound CN1C(C)(C)CC(C#N)(OC(=O)C(C)=C)CC1(C)C WNSJTIUVLYUNTD-UHFFFAOYSA-N 0.000 description 1
- AAZSHFMGBXXYIB-UHFFFAOYSA-N (4-cyano-2,2,6,6-tetramethylpiperidin-4-yl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C#N)CC(C)(C)NC(C)(C)C1 AAZSHFMGBXXYIB-UHFFFAOYSA-N 0.000 description 1
- AQNUOTPCFOUIAA-UHFFFAOYSA-N (4-imino-1,2,2,6,6-pentamethylpiperidin-3-yl) 2-methylprop-2-enoate Chemical compound CN1C(C)(C)CC(=N)C(OC(=O)C(C)=C)C1(C)C AQNUOTPCFOUIAA-UHFFFAOYSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- LPMBTLLQQJBUOO-KTKRTIGZSA-N (z)-n,n-bis(2-hydroxyethyl)octadec-9-enamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)N(CCO)CCO LPMBTLLQQJBUOO-KTKRTIGZSA-N 0.000 description 1
- WPARMABOLAOINO-UHFFFAOYSA-N 1,2,2,6,6-Pentamethyl-4-piperidinyl acrylate Chemical compound CN1C(C)(C)CC(OC(=O)C=C)CC1(C)C WPARMABOLAOINO-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LNSPAJSYRRSIJV-UHFFFAOYSA-N 1-ethoxypropyl acetate Chemical compound CCOC(CC)OC(C)=O LNSPAJSYRRSIJV-UHFFFAOYSA-N 0.000 description 1
- ZQUROMIGLUXXNW-UHFFFAOYSA-N 1-triethoxysilylpropan-2-ol Chemical compound CCO[Si](CC(C)O)(OCC)OCC ZQUROMIGLUXXNW-UHFFFAOYSA-N 0.000 description 1
- AFAZQMFMBKQIDW-UHFFFAOYSA-N 1-trimethoxysilylpropan-2-ol Chemical compound CO[Si](OC)(OC)CC(C)O AFAZQMFMBKQIDW-UHFFFAOYSA-N 0.000 description 1
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 1
- DOZGRCMRCPSZHG-UHFFFAOYSA-N 2-(4-benzoyl-3-hydroxyphenoxy)ethyl 2-methylprop-2-enoate Chemical compound OC1=CC(OCCOC(=O)C(=C)C)=CC=C1C(=O)C1=CC=CC=C1 DOZGRCMRCPSZHG-UHFFFAOYSA-N 0.000 description 1
- NMMXJQKTXREVGN-UHFFFAOYSA-N 2-(4-benzoyl-3-hydroxyphenoxy)ethyl prop-2-enoate Chemical compound OC1=CC(OCCOC(=O)C=C)=CC=C1C(=O)C1=CC=CC=C1 NMMXJQKTXREVGN-UHFFFAOYSA-N 0.000 description 1
- XDNLOGRBAYJSMQ-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC(C(C)(C)CC(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O XDNLOGRBAYJSMQ-UHFFFAOYSA-N 0.000 description 1
- ZMWRRFHBXARRRT-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-methylbutan-2-yl)phenol Chemical compound CCC(C)(C)C1=CC(C(C)(C)CC)=CC(N2N=C3C=CC=CC3=N2)=C1O ZMWRRFHBXARRRT-UHFFFAOYSA-N 0.000 description 1
- OLFNXLXEGXRUOI-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-bis(2-phenylpropan-2-yl)phenol Chemical compound C=1C(N2N=C3C=CC=CC3=N2)=C(O)C(C(C)(C)C=2C=CC=CC=2)=CC=1C(C)(C)C1=CC=CC=C1 OLFNXLXEGXRUOI-UHFFFAOYSA-N 0.000 description 1
- LHPPDQUVECZQSW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-ditert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O LHPPDQUVECZQSW-UHFFFAOYSA-N 0.000 description 1
- IYAZLDLPUNDVAG-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound CC(C)(C)CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 IYAZLDLPUNDVAG-UHFFFAOYSA-N 0.000 description 1
- UZUNCLSDTUBVCN-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-(2-phenylpropan-2-yl)-4-(2,4,4-trimethylpentan-2-yl)phenol Chemical compound C=1C(C(C)(C)CC(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C(O)C=1C(C)(C)C1=CC=CC=C1 UZUNCLSDTUBVCN-UHFFFAOYSA-N 0.000 description 1
- VQMHSKWEJGIXGA-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-6-dodecyl-4-methylphenol Chemical compound CCCCCCCCCCCCC1=CC(C)=CC(N2N=C3C=CC=CC3=N2)=C1O VQMHSKWEJGIXGA-UHFFFAOYSA-N 0.000 description 1
- VCYCUECVHJJFIQ-UHFFFAOYSA-N 2-[3-(benzotriazol-2-yl)-4-hydroxyphenyl]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 VCYCUECVHJJFIQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- ZHTLMPWATZQGAP-UHFFFAOYSA-N 2-triethoxysilylethanol Chemical compound CCO[Si](CCO)(OCC)OCC ZHTLMPWATZQGAP-UHFFFAOYSA-N 0.000 description 1
- BOSZBTFBHSYELP-UHFFFAOYSA-N 2-trimethoxysilylethanol Chemical compound CO[Si](OC)(OC)CCO BOSZBTFBHSYELP-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- RLWDBZIHAUEHLO-UHFFFAOYSA-N 3-[3-tert-butyl-5-(5-chlorobenzotriazol-2-yl)-4-hydroxyphenyl]propyl 2-methylprop-2-enoate Chemical compound CC(C)(C)C1=CC(CCCOC(=O)C(=C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O RLWDBZIHAUEHLO-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- NMUBRRLYMADSGF-UHFFFAOYSA-N 3-triethoxysilylpropan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCO NMUBRRLYMADSGF-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- YATIYDNBFHEOFA-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-ol Chemical compound CO[Si](OC)(OC)CCCO YATIYDNBFHEOFA-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 description 1
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 description 1
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical class C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 1
- YKVAWSVTEWXJGJ-UHFFFAOYSA-N 4-chloro-2-methylsulfanylthieno[3,2-d]pyrimidine Chemical compound CSC1=NC(Cl)=C2SC=CC2=N1 YKVAWSVTEWXJGJ-UHFFFAOYSA-N 0.000 description 1
- VMRIVYANZGSGRV-UHFFFAOYSA-N 4-phenyl-2h-triazin-5-one Chemical compound OC1=CN=NN=C1C1=CC=CC=C1 VMRIVYANZGSGRV-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 241000228245 Aspergillus niger Species 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical class OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 241000588731 Hafnia Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- AOMUHOFOVNGZAN-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)dodecanamide Chemical compound CCCCCCCCCCCC(=O)N(CCO)CCO AOMUHOFOVNGZAN-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- DIOYAVUHUXAUPX-KHPPLWFESA-N Oleoyl sarcosine Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)N(C)CC(O)=O DIOYAVUHUXAUPX-KHPPLWFESA-N 0.000 description 1
- 229920006197 POE laurate Polymers 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical class CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DCBNMBIOGUANTC-UHFFFAOYSA-N [5-[(5-benzoyl-4-hydroxy-2-methoxyphenyl)methyl]-2-hydroxy-4-methoxyphenyl]-phenylmethanone Chemical compound COC1=CC(O)=C(C(=O)C=2C=CC=CC=2)C=C1CC(C(=CC=1O)OC)=CC=1C(=O)C1=CC=CC=C1 DCBNMBIOGUANTC-UHFFFAOYSA-N 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 150000004703 alkoxides Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000001098 anti-algal effect Effects 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- OSIVCXJNIBEGCL-UHFFFAOYSA-N bis(2,2,6,6-tetramethyl-1-octoxypiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(OCCCCCCCC)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(OCCCCCCCC)C(C)(C)C1 OSIVCXJNIBEGCL-UHFFFAOYSA-N 0.000 description 1
- YWDBZVIHZORXHG-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-1-yl) decanedioate Chemical compound CC1(C)CCCC(C)(C)N1OC(=O)CCCCCCCCC(=O)ON1C(C)(C)CCCC1(C)C YWDBZVIHZORXHG-UHFFFAOYSA-N 0.000 description 1
- GOJOVSYIGHASEI-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) butanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCC(=O)OC1CC(C)(C)NC(C)(C)C1 GOJOVSYIGHASEI-UHFFFAOYSA-N 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- SODJJEXAWOSSON-UHFFFAOYSA-N bis(2-hydroxy-4-methoxyphenyl)methanone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=C(OC)C=C1O SODJJEXAWOSSON-UHFFFAOYSA-N 0.000 description 1
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 1
- WUAIVKFIBCXSJI-UHFFFAOYSA-N butane-1,3-diol;butane-1,4-diol Chemical compound CC(O)CCO.OCCCCO WUAIVKFIBCXSJI-UHFFFAOYSA-N 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical class OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000004567 concrete Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- ATGKAFZFOALBOF-UHFFFAOYSA-N cyclohexyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C1CCCCC1 ATGKAFZFOALBOF-UHFFFAOYSA-N 0.000 description 1
- MEWFSXFFGFDHGV-UHFFFAOYSA-N cyclohexyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C1CCCCC1 MEWFSXFFGFDHGV-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- NRMUHDACMQEQMT-UHFFFAOYSA-N diethoxy(diheptyl)silane Chemical compound CCCCCCC[Si](OCC)(OCC)CCCCCCC NRMUHDACMQEQMT-UHFFFAOYSA-N 0.000 description 1
- UDFQIGODCFRNJY-UHFFFAOYSA-N diethoxy(dihexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)CCCCCC UDFQIGODCFRNJY-UHFFFAOYSA-N 0.000 description 1
- YETKAVVSNLUTEQ-UHFFFAOYSA-N diethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OCC)(OCC)CCCCCCCC YETKAVVSNLUTEQ-UHFFFAOYSA-N 0.000 description 1
- VDXFKFNGIDWIQQ-UHFFFAOYSA-N diethoxy(dipentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)CCCCC VDXFKFNGIDWIQQ-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 description 1
- VVKJJEAEVBNODX-UHFFFAOYSA-N diethoxy-di(propan-2-yl)silane Chemical compound CCO[Si](C(C)C)(C(C)C)OCC VVKJJEAEVBNODX-UHFFFAOYSA-N 0.000 description 1
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 1
- DZBCKWWFOPPOCW-UHFFFAOYSA-N diheptyl(dimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)CCCCCCC DZBCKWWFOPPOCW-UHFFFAOYSA-N 0.000 description 1
- CYICXDQJFWXGTC-UHFFFAOYSA-N dihexyl(dimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)CCCCCC CYICXDQJFWXGTC-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- TYXIAHKLJMLPIP-UHFFFAOYSA-N dimethoxy(dioctyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)CCCCCCCC TYXIAHKLJMLPIP-UHFFFAOYSA-N 0.000 description 1
- LXAPXYULCIKKNK-UHFFFAOYSA-N dimethoxy(dipentyl)silane Chemical compound CCCCC[Si](OC)(OC)CCCCC LXAPXYULCIKKNK-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- JVUVKQDVTIIMOD-UHFFFAOYSA-N dimethoxy(dipropyl)silane Chemical compound CCC[Si](OC)(OC)CCC JVUVKQDVTIIMOD-UHFFFAOYSA-N 0.000 description 1
- VHPUZTHRFWIGAW-UHFFFAOYSA-N dimethoxy-di(propan-2-yl)silane Chemical compound CO[Si](OC)(C(C)C)C(C)C VHPUZTHRFWIGAW-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- WUVIUCNKVRGMFD-UHFFFAOYSA-N disilanyl(propan-2-yl)silane Chemical compound C(C)(C)[SiH2][SiH2][SiH3] WUVIUCNKVRGMFD-UHFFFAOYSA-N 0.000 description 1
- 229940079886 disodium lauryl sulfosuccinate Drugs 0.000 description 1
- KHIQYZGEUSTKSB-UHFFFAOYSA-L disodium;4-dodecoxy-4-oxo-3-sulfobutanoate Chemical compound [Na+].[Na+].CCCCCCCCCCCCOC(=O)C(S(O)(=O)=O)CC([O-])=O.CCCCCCCCCCCCOC(=O)C(S(O)(=O)=O)CC([O-])=O KHIQYZGEUSTKSB-UHFFFAOYSA-L 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000002320 enamel (paints) Substances 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229940031957 lauric acid diethanolamide Drugs 0.000 description 1
- 229940071145 lauroyl sarcosinate Drugs 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-L malate(2-) Chemical compound [O-]C(=O)C(O)CC([O-])=O BJEPYKJPYRNKOW-UHFFFAOYSA-L 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- LAQFLZHBVPULPL-UHFFFAOYSA-N methyl(phenyl)silicon Chemical compound C[Si]C1=CC=CC=C1 LAQFLZHBVPULPL-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 229950002083 octabenzone Drugs 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- XQAABEDPVQWFPN-UHFFFAOYSA-N octyl 3-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OCCCCCCCC)=CC(N2N=C3C=CC=CC3=N2)=C1O XQAABEDPVQWFPN-UHFFFAOYSA-N 0.000 description 1
- DMFXLIFZVRXRRR-UHFFFAOYSA-N octyl 3-[3-tert-butyl-5-(5-chlorobenzotriazol-2-yl)-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OCCCCCCCC)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O DMFXLIFZVRXRRR-UHFFFAOYSA-N 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-M oleate Chemical compound CCCCCCCC\C=C/CCCCCCCC([O-])=O ZQPPMHVWECSIRJ-KTKRTIGZSA-M 0.000 description 1
- 150000005527 organic iodine compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- DYUMLJSJISTVPV-UHFFFAOYSA-N phenyl propanoate Chemical compound CCC(=O)OC1=CC=CC=C1 DYUMLJSJISTVPV-UHFFFAOYSA-N 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 239000002504 physiological saline solution Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- YBBJKCMMCRQZMA-UHFFFAOYSA-N pyrithione Chemical class ON1C=CC=CC1=S YBBJKCMMCRQZMA-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- CAVXVRQDZKMZDB-UHFFFAOYSA-M sodium;2-[dodecanoyl(methyl)amino]ethanesulfonate Chemical compound [Na+].CCCCCCCCCCCC(=O)N(C)CCS([O-])(=O)=O CAVXVRQDZKMZDB-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229960005078 sorbitan sesquioleate Drugs 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003558 thiocarbamic acid derivatives Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 229940094989 trimethylsilane Drugs 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 239000002888 zwitterionic surfactant Substances 0.000 description 1
Landscapes
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Catalysts (AREA)
- Paints Or Removers (AREA)
Description
本発明は、有害ガス分解性および防カビ・防藻性に優れる光触媒塗装体に関する。
あるいは、建造物、乗物およびそれらを構成する部材、複合材に有害ガス分解性および防カビ・防藻性等の光触媒機能を、コーティング層を形成することにより付与可能な光触媒コーティング液に関する。
The present invention relates to a photocatalyst-coated body excellent in harmful gas decomposability and antifungal / algae resistance.
Alternatively, the present invention relates to a photocatalyst coating solution that can impart a photocatalytic function such as harmful gas decomposability and fungiproof / algaeproofing properties to buildings, vehicles, members constituting them, and composite materials by forming a coating layer.
酸化チタンなどの光触媒が、近年建築物の建造物、乗物およびそれらを構成する部材、複合材など多くの用途において利用されている。
屋外用途については、基材表面に光触媒を塗装することにより、光エネルギーを利用してNOx、SOx等の有害物質の分解機能、防カビ・防藻性等を付与することが可能となる。
In recent years, photocatalysts such as titanium oxide have been used in many applications such as buildings of buildings, vehicles, members constituting them, and composite materials.
For outdoor use, by applying a photocatalyst to the surface of the substrate, it is possible to impart a function of decomposing toxic substances such as NOx and SOx, antifungal and antialgal properties, etc. using light energy.
建築物の建造物、乗物およびそれらを構成する部材、複合材などの場合、上記光触媒機能を付与したい基材の表面は、意匠性を持たせるためにエナメル塗装されていたり、エナメル塗装の上にクリア塗装されている場合が多い。
そこに直接光触媒層を形成しようとすると、エナメル塗装面やクリア塗装面は主として有機物で構成されているため、長期的には光触媒層と上記塗装面の界面に存在する光触媒粒子による影響や紫外線の影響により塗装面が劣化するという問題を生じる。
In the case of building structures, vehicles, and members, composite materials, etc., the surface of the base material to which the photocatalytic function is to be applied is enameled or applied on top of the enamel to provide design. Often painted clear.
If an attempt is made to directly form a photocatalyst layer, the enameled or clear-coated surface is mainly composed of organic matter, so the effects of photocatalyst particles existing at the interface between the photocatalyst layer and the above-mentioned painted surface, and The problem is that the painted surface deteriorates due to the influence.
そのために、従来、エナメル塗装面やクリア塗装面と、光触媒層との間に、無機成分の多いバリア層を形成することが行われている(特開2007−167718号公報)。
しかし、バリア層を形成すると、コストアップになるだけでなく、工数がかかり、手軽に光触媒機能を付与できない。
For this reason, conventionally, a barrier layer containing a large amount of inorganic components has been formed between the enamel-coated surface, the clear-coated surface, and the photocatalyst layer (Japanese Patent Laid-Open No. 2007-167718).
However, when the barrier layer is formed, not only the cost is increased, but also man-hours are required and the photocatalytic function cannot be easily provided.
そこで、エナメル塗装面やクリア塗装面の劣化を抑制しつつ光触媒機能を発揮し、さらに好適には塗布時に異臭や環境汚染がなく、最も好適には基材表面の紫外線による劣化も抑制する、基材に直接塗布して光触媒機能層を形成する、光触媒塗装体、あるいは光触媒コーティング液が必要とされる。 Therefore, the photocatalytic function is exhibited while suppressing the deterioration of the enameled surface or the clear painted surface, more preferably, there is no off-flavor or environmental pollution during application, and most preferably the deterioration of the substrate surface due to ultraviolet rays is suppressed. A photocatalyst-coated body or a photocatalyst coating liquid that directly coats the material to form a photocatalytic functional layer is required.
このような基材に直接1コートで光触媒機能を発揮する光触媒コーティング組成物としては、例えば、シラン変性された光触媒粒子と、コロイダルシリカと、シリコーン重合体エマルジョン粒子を含んでなる水系汚染防止用組成物が知られている(特開2008−31297号公報)。
更に、特開2008−31297号には、「上述した光触媒(a1)は、好適にPt、Rh、Ru、Nb、Cu、Sn、Ni、Feなどの金属及び/又はこれらの酸化物を添加あるいは固定化したり、シリカや多孔質リン酸カルシウム等で被覆したり(例えば特開平10−244166号公報参照)して使用することもできる。」と開示されている。
As such a photocatalyst coating composition that directly exerts a photocatalytic function on one substrate, for example, a composition for preventing water pollution comprising silane-modified photocatalyst particles, colloidal silica, and silicone polymer emulsion particles. Things are known (Japanese Patent Laid-Open No. 2008-31297).
Further, JP-A-2008-31297 states that “the above-mentioned photocatalyst (a1) is preferably added with a metal such as Pt, Rh, Ru, Nb, Cu, Sn, Ni, Fe and / or an oxide thereof. It can also be used after being fixed or coated with silica, porous calcium phosphate or the like (see, for example, JP-A-10-244166).
しかしながら、特開2008−31297号公報に開示されているような光触媒にCu及び/又はこれらの酸化物を添加するのでは、銀が光触媒作用で還元され、防カビ・防藻効果を期待する場合、効果が弱くなる。
そこで、本発明では、上記事情に鑑み、基材の劣化を抑制しつつ有害ガス分解性および防カビ・防藻性にも優れる光触媒塗装体および光触媒コーティング液を提供することを目的とする。
However, when Cu and / or oxides thereof are added to a photocatalyst as disclosed in Japanese Patent Application Laid-Open No. 2008-31297, silver is reduced by the photocatalytic action, and an antifungal / algae-proof effect is expected. , The effect becomes weaker.
Therefore, in view of the above circumstances, an object of the present invention is to provide a photocatalyst-coated body and a photocatalyst coating liquid that are excellent in harmful gas decomposability and antifungal / algae-proof properties while suppressing deterioration of the substrate.
すなわち、本発明の光触媒塗装体は、基材と、前記基材上に設けられた光触媒層とを備えた光触媒塗装体であって、前記光触媒層は、光触媒コーティング液を塗布後乾燥することにより得られ、前記光触媒コーティング液は、疎水性基を有する物質により部分的に被覆或いは変性処理されている金属酸化物よりなる光触媒粒子と、シリコーンエマルジョンと、水溶性の銀化合物とを備え、かつ、前記光触媒粒子は、還元力よりも酸化力が強い光触媒粒子であることを特徴とする光触媒塗装体である。 That is, the photocatalyst-coated body of the present invention is a photocatalyst-coated body comprising a base material and a photocatalyst layer provided on the base material, and the photocatalyst layer is dried by applying a photocatalyst coating liquid. The obtained photocatalyst coating liquid comprises photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group, a silicone emulsion, and a water-soluble silver compound, and The photocatalyst particles are photocatalyst particles having a higher oxidizing power than a reducing power.
また、本発明の光触媒コーティング液は、疎水性基を有する物質により部分的に被覆或いは変性処理されている金属酸化物よりなる光触媒粒子と、シリコーンエマルジョンと、水溶性の銀化合物とを備え、かつ、前記光触媒粒子は、還元力よりも酸化力が強い光触媒粒子であることを特徴とする光触媒コーティング液である。 The photocatalyst coating solution of the present invention comprises photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group, a silicone emulsion, and a water-soluble silver compound, and The photocatalyst particles are photocatalyst particles having a stronger oxidizing power than a reducing power.
光触媒塗装体
本発明の光触媒塗装体は、基材と、前記基材上に設けられた光触媒層とを備えた光触媒塗装体であって、前記光触媒層は、光触媒コーティング液を塗布後乾燥することにより得られ、前記光触媒コーティング液は、疎水性基を有する物質により部分的に被覆或いは変性処理されている金属酸化物よりなる光触媒粒子と、シリコーンエマルジョンと、水溶性の銀化合物とを備え、かつ、前記光触媒粒子は、還元力よりも酸化力が強い光触媒粒子であることを特徴とする光触媒塗装体である。
このような構成にすることにより、基材の劣化を抑制しつつ有害ガス分解性および防カビ・防藻性にも優れる光触媒塗装体および光触媒コーティング液を提供することが可能となる。
その理由は以下のように考えられる。光触媒コーティング液を基材に塗布した後に乾燥するとき、水の蒸発に伴い、表面エネルギーの小さな上記光触媒性金属酸化物粒子とともに水の表面への拡散に伴い、水に溶解している水溶性の銀化合物は表面へ移動する。それにより、塗装体表面は乾燥完了時には上記光触媒性金属酸化物粒子と銀化合物とが高濃度に互いに離間しつつ存在するようになる。ここで、本発明では光触媒粒子が酸化力が還元力よりも強い光触媒粒子であるので、銀化合物が適度に離間して存在することで、銀の光還元作用をほとんど生じることなく、光触媒と銀との相互作用により光触媒酸化力を強めることができ、有害ガス分解性および防カビ・防藻性にも優れるようになる。
かつ、上記塗装体では、上記光触媒性金属酸化物粒子が基材側ではなく、表面側に高濃度に存在するので、光触媒と基材との界面での反応を抑制しつつ光触媒粒子の紫外線吸収により紫外線劣化をも抑制できるようになる。
Photocatalyst-coated body The photocatalyst-coated body of the present invention is a photocatalyst-coated body including a base material and a photocatalyst layer provided on the base material, and the photocatalyst layer is dried after applying a photocatalyst coating liquid. The photocatalyst coating liquid obtained by the process comprises photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group, a silicone emulsion, and a water-soluble silver compound, and The photocatalyst particles are photocatalyst particles having an oxidizing power stronger than a reducing power.
With such a configuration, it is possible to provide a photocatalyst-coated body and a photocatalyst coating liquid that are excellent in harmful gas decomposability and mold-proof / algae-proof properties while suppressing deterioration of the substrate.
The reason is considered as follows. When the photocatalyst coating liquid is applied to the substrate and dried, the water-soluble water soluble in the water as the water evaporates, along with the photocatalytic metal oxide particles having a small surface energy, and diffusion to the surface of the water. The silver compound moves to the surface. As a result, the photocatalytic metal oxide particles and the silver compound are present at a high concentration while being separated from each other on the surface of the coated body when drying is completed. Here, in the present invention, the photocatalyst particles are photocatalyst particles whose oxidizing power is stronger than the reducing power. Therefore, the silver compound is present at an appropriate distance, so that the photocatalyst and the silver are hardly generated with almost no photoreduction action of silver. The photocatalytic oxidative power can be enhanced by the interaction with, and it is also excellent in harmful gas decomposability and mold / algae resistance.
In the coated body, since the photocatalytic metal oxide particles are present at a high concentration on the surface side, not on the substrate side, the UV absorption of the photocatalyst particles is suppressed while suppressing the reaction at the interface between the photocatalyst and the substrate. This makes it possible to suppress the deterioration of ultraviolet rays.
本発明の好ましい形態によれば、前記光触媒塗装体には、さらに、シリカ粒子が添加されているようにする。
そうすることで膜強度が向上する。
According to a preferred embodiment of the present invention, silica particles are further added to the photocatalyst-coated body.
By doing so, the film strength is improved.
前記疎水性基を有する物質は、疎水性基を有するシラン及び/又は疎水性基を有するシリコーンであるようにする。
そのようにすることで、光触媒性金属酸化物粒子表面の被覆、変性の形態を制御しやすくなる。
The substance having a hydrophobic group may be a silane having a hydrophobic group and / or a silicone having a hydrophobic group.
By doing so, it becomes easy to control the coating and modification forms on the surface of the photocatalytic metal oxide particles.
本発明の好ましい形態によれば、前記光触媒コーティング液中に含有される硬化性シリコーンエマルジョンの硬化物は、前記光触媒層中に85質量%以上、好ましくは90%以上含有されるようにする。
ここで、硬化物の質量とは、105℃乾燥時における恒量値をいう。
85%以上にすることにより、2μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることができるとともに、着色剤を添加しない場合に透明な光触媒層が形成可能となる。
さらに、90%以上にすることにより、5μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることができるとともに、着色剤を添加しない場合に透明な光触媒層が形成可能となる。
According to a preferred embodiment of the present invention, the cured product of the curable silicone emulsion contained in the photocatalyst coating liquid is contained in the photocatalyst layer at 85% by mass or more, preferably 90% or more.
Here, the mass of hardened | cured material means the constant value at the time of 105 degreeC drying.
By setting it to 85% or more, a high photocatalytic decomposition activity can be obtained even in a film having a long transfer process on the surface, such as a thick film exceeding 2 μm, and a transparent photocatalytic layer when no colorant is added. Can be formed.
Furthermore, by setting it to 90% or more, a high photocatalytic decomposition activity can be obtained even in a film having a long movement process on the surface, such as a thick film exceeding 5 μm, and transparent when no colorant is added. A photocatalytic layer can be formed.
本発明の好ましい形態によれば、前記光触媒層中に含有される光触媒性金属酸化物粒子は、0質量%をこえ5質量%未満であるようにする。
そうすることにより、基材の劣化を抑制できる。
According to a preferred embodiment of the present invention, the photocatalytic metal oxide particles contained in the photocatalyst layer are more than 0% by mass and less than 5% by mass.
By doing so, deterioration of the substrate can be suppressed.
本発明の好ましい形態によれば、前記光触媒層の膜厚は、2μmをこえ20μm未満、好ましくは5μmをこえ20μm未満であるようにする。
そうすることで、基材への紫外線の影響を低めることができ、紫外線による基材の劣化を有効に抑制できる。
According to a preferred embodiment of the present invention, the film thickness of the photocatalyst layer is more than 2 μm and less than 20 μm, preferably more than 5 μm and less than 20 μm.
By doing so, the influence of the ultraviolet-ray to a base material can be lowered | hung and degradation of the base material by an ultraviolet-ray can be suppressed effectively.
本発明の好ましい形態によれば、前記硬化性シリコーンエマルジョンの平均粒径は、前記光触媒性金属酸化物粒子および前記シリカ粒子の平均粒径よりも大きいようにする。
そうすることで、光触媒性金属酸化物粒子の表面への移動が顕著になる。
従って、光触媒性金属酸化物粒子が表面に移動しやすくなり、2μmをこえる厚膜のような表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることの可能な光触媒塗装体を提供することがより容易となる。
According to a preferred embodiment of the present invention, the average particle size of the curable silicone emulsion is larger than the average particle size of the photocatalytic metal oxide particles and the silica particles.
By doing so, the movement of the photocatalytic metal oxide particles to the surface becomes remarkable.
Accordingly, the photocatalytic metal oxide particles easily move to the surface, and a photocatalyst-coated body capable of obtaining a high degree of photocatalytic decomposition activity even in a film having a long moving process on a surface such as a thick film exceeding 2 μm is provided. It will be easier to do.
本発明の好ましい形態によれば、前記光触媒層は透明であるようにする。
そうすることで、基材がエナメル塗装やクリア塗装の場合、その意匠性を有効に活かしつつ2μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることの可能な光触媒塗装体を提供することがより容易となる。
According to a preferred embodiment of the present invention, the photocatalyst layer is transparent.
By doing so, when the base material is enamel coating or clear coating, high photocatalytic degradation activity can be obtained even for a film with a long travel distance on the surface, such as a thick film exceeding 2 μm while effectively utilizing its design properties. It becomes easier to provide a photocatalyst-coated body capable of this.
ここで、「透明」の度合いとしては、波長550nmにおいての光触媒層の直線透過率を70%以上、より好ましくは80%以上確保するとより好ましい。そうすることで下地の色味、意匠を損なうことなく表現することが可能となる。また透明度の高いガラスやプラスチックなどにコーティングしても透明性を損なわずに済む。 Here, as the degree of “transparency”, it is more preferable to secure the linear transmittance of the photocatalyst layer at a wavelength of 550 nm of 70% or more, more preferably 80% or more. By doing so, it becomes possible to express without impairing the color and design of the groundwork. Moreover, even if it is coated on highly transparent glass or plastic, the transparency is not impaired.
本発明の好ましい形態によれば、光触媒性金属酸化物粒子としては、アナターゼ型酸化チタン、ルチル型酸化チタン、ブルッカイト型酸化チタン、酸化錫、酸化亜鉛、チタン酸ストロンチウム、酸化タングステン、酸化セリウムのような金属酸化物の粒子や、これら粒子を複数種複合させた粒子や、これらの粒子を部分的にシリカ、アルミナ等で被覆した粒子等が好適に利用可能である。 According to a preferred embodiment of the present invention, the photocatalytic metal oxide particles include anatase type titanium oxide, rutile type titanium oxide, brookite type titanium oxide, tin oxide, zinc oxide, strontium titanate, tungsten oxide and cerium oxide. Suitable metal oxide particles, particles obtained by combining a plurality of these particles, particles obtained by partially covering these particles with silica, alumina, or the like can be suitably used.
本発明の好ましい形態によれば、光触媒性金属酸化物粒子は10nm以上100nm未満の平均粒径を有するのが好ましく、より好ましくは10nm以上60nm以下である。なお、この平均粒径は、走査型電子顕微鏡により20万倍の視野に入る任意の100個の粒子の長さを測定した個数平均値として算出される。 According to a preferred embodiment of the present invention, the photocatalytic metal oxide particles preferably have an average particle size of 10 nm or more and less than 100 nm, more preferably 10 nm or more and 60 nm or less. The average particle diameter is calculated as a number average value obtained by measuring the length of any 100 particles that enter a 200,000-fold field of view with a scanning electron microscope.
粒子の形状としては真球が最も良いが、略円形や楕円形でも良く、その場合の粒子の長さは((長径+短径)/2)として略算出される。この範囲内であると、耐候性、有害ガス分解性、および所望の各種被膜特性(透明性、塗膜強度等)が効率良く発揮される。 As the shape of the particle, a true sphere is the best, but it may be approximately circular or elliptical, and the length of the particle in this case is approximately calculated as ((major axis + minor axis) / 2). Within this range, weather resistance, harmful gas decomposability, and various desired coating properties (transparency, coating strength, etc.) are efficiently exhibited.
また、本発明の好ましい態様によれば、光触媒性金属酸化物粒子は3nm以上30nm未満の平均結晶子径を有するのが好ましく、より好ましくは5nm以上20nm以下である。なお、この平均粒径は、粉末X線回折法により得られるX線プロファイルの3強線の積分幅からシェラー式により算出される。 According to a preferred embodiment of the present invention, the photocatalytic metal oxide particles preferably have an average crystallite size of 3 nm or more and less than 30 nm, more preferably 5 nm or more and 20 nm or less. The average particle diameter is calculated by the Scherrer equation from the integral width of the three strong lines of the X-ray profile obtained by the powder X-ray diffraction method.
本発明の水溶性の銀化合物としては、銀(I)化合物の好ましい例としては、グルコン酸塩、硫酸塩、リンゴ酸塩、乳酸塩、硝酸塩、ギ酸塩、酢酸塩、キレート等が好適に利用できる。 As the water-soluble silver compound of the present invention, preferred examples of the silver (I) compound include gluconate, sulfate, malate, lactate, nitrate, formate, acetate, chelate and the like. it can.
本発明の好ましい形態によれば、光触媒コーティング液にはノニオン性界面活性剤またはアニオン性界面活性剤が、エマルジョンの製造過程で添加される乳化剤とは別に添加されてもよい。
ノニオン性界面活性剤としては、HLB値が10〜20の界面活性剤が好ましい。その種類としては、例えば、ポリオキシエチレンラウリルエーテル、ポリオキシエチレントリデシルエーテル、ポリオキシエチレンセチルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンオレイルエーテル、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルエステル、ポリオキシエチレンアルキルフェノールエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンラウラート、ポリオキシエチレンステアレート、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンオレエート、ソルビタンアルキルエステル、ポリオキシエチレンソルビタンアルキルエステル、ポリエーテル変性シリコーン、ポリエステル変性シリコーン、ソルビタンラウラート、ソルビタンステアレート、ソルビタンパルミテート、ソルビタンオレエート、ソルビタンセスキオレエート、ポリオキシエチレンソルビタンラウラート、ポリオキシエチレンソルビタンステアレート、ポリオキシエチレンソルビタンパルミテート、ポリオキシエチレンソルビタンオレエート、グリセロールステアレート、ポリグリセリン脂肪酸エステル、アルキルアルキロールアミド、ラウリン酸ジエタノールアミド、オレイン酸ジエタノールアミド、オキシエチレンドデシルアミン、ポリオキシエチレンドデシルアミン、ポリオキシエチレンアルキルアミン、ポリオキシエチレンオクタデシルアミン、ポリオキシエチレンアルキルプロピレンジアミン、ポリオキシエチレンオキシプロピレンブロックポリマー、ポリオキシエチレンステアレート等が好適に利用できる。
アニオン性界面活性剤としては、スルホン酸ポリオキシエチレンアルキルフェニルエーテルアンモニウム塩、スルホン酸ポリオキシエチレンアルキルフェニルエーテルナトリウム塩、脂肪酸ナトリウムセッケン、脂肪酸カリセッケン、ジオクチルスルホコハク酸ナトリウム、アルキルサルフェート、アルキルエーテルサルフェート、アルキルサルフェートソーダ塩、アルキルエーテルサルフェートソーダ塩、ポリオキシエチレンアルキルエーテルサルフェート、ポリオキシエチレンアルキルエーテルサルフェートソーダ塩、アルキルサルフェートTEA塩、ポリオキシエチレンアルキルエーテルサルフェートTEA塩、2−エチルヘキシルアルキル硫酸エステルナトリウム塩、アシルメチルタウリン酸ナトリウム、ラウロイルメチルタウリン酸ナトリウム、ドデシルベンゼンスルホン酸ナトリウム、スルホコハク酸ラウリル2ナトリウム、ポリオキシエチレンスルホコハク酸ラウリル2ナトリウム、ポリカルボン酸、オレオイルザルコシン、アミドエーテルサルフェート、ラウロイルザルコシネート、スルホFAエステルナトリウム塩等が好適に利用可能である。
According to a preferred embodiment of the present invention, a nonionic surfactant or an anionic surfactant may be added to the photocatalyst coating liquid separately from the emulsifier added during the emulsion production process.
As the nonionic surfactant, a surfactant having an HLB value of 10 to 20 is preferable. As the type, for example, polyoxyethylene lauryl ether, polyoxyethylene tridecyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene alkyl ether, polyoxyethylene alkyl ester, Polyoxyethylene alkyl phenol ether, polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene laurate, polyoxyethylene stearate, polyoxyethylene alkyl phenyl ether, polyoxyethylene oleate, sorbitan alkyl ester, poly Oxyethylene sorbitan alkyl ester, polyether modified silicone, polyester modified Ricone, sorbitan laurate, sorbitan stearate, sorbitan palmitate, sorbitan oleate, sorbitan sesquioleate, polyoxyethylene sorbitan laurate, polyoxyethylene sorbitan stearate, polyoxyethylene sorbitan palmitate, polyoxyethylene sorbitan oleate , Glycerol stearate, polyglycerol fatty acid ester, alkyl alkylolamide, lauric acid diethanolamide, oleic acid diethanolamide, oxyethylene dodecylamine, polyoxyethylene dodecylamine, polyoxyethylene alkylamine, polyoxyethylene octadecylamine, polyoxy Ethylene alkylpropylenediamine, polyoxyethyleneoxypropylene block polymer Mer, polyoxyethylene stearate and the like can be suitably used.
Examples of the anionic surfactant include polyoxyethylene alkylphenyl ether ammonium salt of sulfonic acid, sodium salt of polyoxyethylene alkylphenyl ether of sulfonic acid, fatty acid sodium soap, fatty acid potassium soap, dioctyl sodium sulfosuccinate, alkyl sulfate, alkyl ether sulfate, alkyl Sulfate salt, alkyl ether sulfate soda salt, polyoxyethylene alkyl ether sulfate, polyoxyethylene alkyl ether sulfate soda salt, alkyl sulfate TEA salt, polyoxyethylene alkyl ether sulfate TEA salt, 2-ethylhexyl alkyl sulfate sodium salt, acyl Sodium methyl taurate, sodium lauroyl methyl taurate , Sodium dodecylbenzenesulfonate, disodium lauryl sulfosuccinate, disodium polyoxyethylene sulfosuccinate lauryl, polycarboxylic acid, oleoyl sarcosine, amide ether sulfate, lauroyl sarcosinate, sulfo FA ester sodium salt, etc. Is available.
本発明の好ましい形態によれば、シリカ粒子は、好ましくは10nmを超え200nm以下、より好ましくは20nmを超え100nm以下の平均粒径を有する。なお、この平均粒径は、走査型電子顕微鏡により20万倍の視野に入る任意の100個の粒子の長さを測定した個数平均値として算出される。粒子の形状としては真球が最も良いが、略円形や楕円形でも良く、その場合の粒子の長さは((長径+短径)/2)として略算出される。 According to a preferred embodiment of the present invention, the silica particles preferably have an average particle size of more than 10 nm and 200 nm or less, more preferably more than 20 nm and 100 nm or less. The average particle diameter is calculated as a number average value obtained by measuring the length of any 100 particles that enter a 200,000-fold field of view with a scanning electron microscope. As the shape of the particle, a true sphere is the best, but it may be approximately circular or elliptical, and the length of the particle in this case is approximately calculated as ((major axis + minor axis) / 2).
光触媒性金属酸化物粒子を部分的に被覆または変性処理する疎水性基を有する物質としては、例えば、1〜3官能シラン、シリコーン等が好適に利用できる。
疎水性基を有する物質によりされた光触媒性金属酸化物粒子における、被覆または変性処理に用いる物質の量は、光触媒性金属酸化物粒子量に対して0.1〜20質量%が好ましく、より好ましくは1〜10質量%である。
As the substance having a hydrophobic group that partially coats or modifies the photocatalytic metal oxide particles, for example, 1-3 functional silanes, silicones and the like can be suitably used.
In the photocatalytic metal oxide particles made of a substance having a hydrophobic group, the amount of the substance used for coating or modifying treatment is preferably 0.1 to 20% by mass, more preferably based on the amount of the photocatalytic metal oxide particles. Is 1-10 mass%.
本発明において用いる疎水性基を有するシランとしては、例えばメチルトリメトキシシラン、メチルトリエトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、イソプロピルトリメトキシシラン、イソプロピルトリエトキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ペンチルトリメトキシシラン、n−ヘキシルトリメトキシシラン、n−ヘプチルトリメトキシシラン、n−オクチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、アリルトリメトキシシラン、シクロヘキシルトリメトキシシラン、シクロヘキシルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルトリエトキシシラン、3,3,3−トリフロロプロピルトリメトキシシラン、3,3,3−トリフロロプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、2−ヒドロキシエチルトリメトキシシラン、2−ヒドロキシエチルトリエトキシシラン、2−ヒドロキシプロピルトリメトキシシラン、2−ヒドロキシプロピルトリエトキシシラン、3−ヒドロキシプロピルトリメトキシシラン、3−ヒドロキシプロピルトリエトキシシラン、3−メルカプトプロピルトリメトキシシラン、3−メルカプトプロピルトリエトキシシラン、3−イソシアナートプロピルトリメトキシシラン、3−イソシアナートプロピルトリエトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、3−(メタ)アクリルオキシプロピルトリメトキシシラン、3−(メタ)アタクリルオキシプロピルトリエトキシシラン、3−(メタ)アクリロイルオキシプロピルトリn−プロポキシシラン、3−(メタ)アクリロイルオキシプロピルトリイソプロポキシシラン、3−ウレイドプロピルトリメトキシシラン、3−ウレイドプロピルトリエトキシシラン等のトリアルコキシシラン類;ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジイソプロピルジメトキシシラン、ジイソプロピルジエトキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ペンチルジメトキシシラン、ジ−n−ペンチルジエトキシシラン、ジ−n−ヘキシルジメトキシシラン、ジ−n−ヘキシルジエトキシシラン、ジ−n−ヘプチルジメトキシシラン、ジ−n−ヘプチルジエトキシシラン、ジ−n−オクチルジメトキシシラン、ジ−n−オクチルジエトキシシラン、ジ−n−シクロヘキシルジメトキシシラン、ジ−n−シクロヘキシルジエトキシシラン、ジフェニルジメトキシシラン、ジフェニルジエトキシシラン、3−(メタ)アクリロイルオキシプロピルメチルジメトキシシラン等のジアルコキシシラン類;トリメチルメトキシシラン、トリメチルエトキシシラン等のモノアルコキシシラン類等を挙げることができる。また、これらは、単独で又は2種以上を混合して使用することができる。 Examples of the silane having a hydrophobic group used in the present invention include methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, isopropyltrisilane. Methoxysilane, isopropyltriethoxysilane, n-butyltrimethoxysilane, n-butyltriethoxysilane, n-pentyltrimethoxysilane, n-hexyltrimethoxysilane, n-heptyltrimethoxysilane, n-octyltrimethoxysilane, Vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, cyclohexyltrimethoxysilane, cyclohexyltriethoxysilane, phenyltrimethoxysilane, phenyltrie Xysilane, 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, 3,3,3-trifluoropropyltriethoxysilane, 3-aminopropyltrimethoxy Silane, 3-aminopropyltriethoxysilane, 2-hydroxyethyltrimethoxysilane, 2-hydroxyethyltriethoxysilane, 2-hydroxypropyltrimethoxysilane, 2-hydroxypropyltriethoxysilane, 3-hydroxypropyltrimethoxysilane, 3-hydroxypropyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-isocyanatopropyltrimethoxysilane, 3-isocyanate pro Rutriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl Triethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (meth) acryloyloxypropyltri-n-propoxysilane, 3- (meth) acryloyloxy Trialkoxysilanes such as propyltriisopropoxysilane, 3-ureidopropyltrimethoxysilane, and 3-ureidopropyltriethoxysilane; dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, and diethyl Rudiethoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, diisopropyldimethoxysilane, diisopropyldiethoxysilane, di-n-butyldimethoxysilane, di-n-butyldiethoxysilane, di-n -Pentyldimethoxysilane, di-n-pentyldiethoxysilane, di-n-hexyldimethoxysilane, di-n-hexyldiethoxysilane, di-n-heptyldimethoxysilane, di-n-heptyldiethoxysilane, di- n-octyldimethoxysilane, di-n-octyldiethoxysilane, di-n-cyclohexyldimethoxysilane, di-n-cyclohexyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, 3- (meth) acryloyloxypropylmethyl Dialkoxysilane such as dimethoxysilane; trimethylmethoxysilane, monoalkoxysilane such as trimethyl silane, and the like. Moreover, these can be used individually or in mixture of 2 or more types.
本発明において用いる疎水性基を有するシリコーンとしては、上記シランの(部分)加水分解・縮合物が好適に利用できる。 As the silicone having a hydrophobic group used in the present invention, a (partial) hydrolysis / condensation product of the above silane can be suitably used.
硬化性シリコーンエマルジョンとは、基材に塗布し乾燥する際に、シリコーンエマルジョン中に存在する官能基により硬化重合反応を生じ、それに伴い硬化膜を生成しうるシリコーンエマルジョンをいう。
ここで、硬化反応には、加水分解・縮合反応、光重合反応等が好適に利用できる。
硬化反応が加水分解・縮合反応の場合には、官能基としてアルコキシド基を有し、加水分解・縮合反応によりシロキサン結合を生成する硬化性シリコーンエマルジョンが好適に利用できる。
The curable silicone emulsion refers to a silicone emulsion that, when applied to a substrate and dried, causes a curing polymerization reaction due to a functional group present in the silicone emulsion, thereby forming a cured film.
Here, a hydrolysis / condensation reaction, a photopolymerization reaction, or the like can be suitably used for the curing reaction.
When the curing reaction is a hydrolysis / condensation reaction, a curable silicone emulsion having an alkoxide group as a functional group and generating a siloxane bond by the hydrolysis / condensation reaction can be suitably used.
硬化性シリコーンエマルジョンには、上記硬化反応を生じる官能基の他に、乳化重合による有機架橋部と、水に分散するための表面部分が存在する。
有機架橋部は、ビニル基とビニル基が重合したエチレン架橋部のようなラジカル重合により生成した架橋部が好適に利用できる。ラジカル重合により生成した架橋部であれば、特に炭化水素基に限定されず、種々の変性基の組合せが好適に利用可能である。
表面部分は、例えば、界面活性剤等の乳化剤が固定され水に分散可能に形成されている。
In addition to the functional group that causes the curing reaction, the curable silicone emulsion includes an organic cross-linked portion by emulsion polymerization and a surface portion for dispersing in water.
As the organic crosslinking part, a crosslinking part produced by radical polymerization such as an ethylene crosslinking part in which a vinyl group and a vinyl group are polymerized can be suitably used. As long as it is a crosslinked part produced by radical polymerization, it is not particularly limited to a hydrocarbon group, and a combination of various modifying groups can be suitably used.
The surface portion is formed so that, for example, an emulsifier such as a surfactant is fixed and can be dispersed in water.
硬化性シリコーンエマルジョンには、上記硬化反応を生じる官能基、有機架橋部以外に珪素原子に結合する有機基が存在してもよい。ここで、有機基としては、アルキル基、フェニル基、シクロアルキル基等の炭化水素基や、その水素の一部が変性基に置換された有機基が挙げられる。ここで、変性基としては、アミノ基、カルボキシル基、メルカプト基、アクリル基、エポキシ基等が好適に利用できる。 In the curable silicone emulsion, an organic group bonded to a silicon atom may be present in addition to the functional group causing the curing reaction and the organic cross-linking portion. Here, examples of the organic group include hydrocarbon groups such as an alkyl group, a phenyl group, and a cycloalkyl group, and organic groups in which a part of the hydrogen is substituted with a modifying group. Here, as the modifying group, an amino group, a carboxyl group, a mercapto group, an acrylic group, an epoxy group, or the like can be suitably used.
次に、エマルジョンの乳化剤として使用される界面活性剤について述べる。界面活性剤としては、従来公知のノニオン系、カチオン系、アニオン系各種界面活性剤、及びラジカル重合可能な官能基を含有する反応性乳化剤が適用可能である。更に、ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル、ポリオキシエチレンカルボン酸エステル、ソルビタンエステル、ポリオキシエチレンソルビタンエステルなどのノニオン系界面活性剤、アルキルトリメチルアンモニウムクロライド、アルキルベンジルアンモニウムクロライドなどのカチオン系界面活性剤、アルキル又はアルキルアリル硫酸塩、アルキル又はアルキルアリルスルフォン酸塩、ジアルキルスルフォコハク酸塩などのアニオン系界面活性剤、アミノ酸型、ベタイン型などの両性イオン型界面活性剤、特開平8−27347号公報中に記されている分子中にスルフォン酸塩、ポリオキシエチレン鎖、第4級アンモニウム塩などの基を含有するラジカル重合可能な(メタ)アクリレート、スチレン、マレイン酸エステル化合物などの誘導体を含む各種反応性界面活性剤を示すことができる。 Next, the surfactant used as an emulsifier for the emulsion will be described. As the surfactant, conventionally known nonionic, cationic, and anionic surfactants and reactive emulsifiers containing functional groups capable of radical polymerization can be applied. Furthermore, nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, polyoxyethylene carboxylic acid ester, sorbitan ester, polyoxyethylene sorbitan ester, and cations such as alkyltrimethylammonium chloride and alkylbenzylammonium chloride Surfactants, alkyl or alkyl allyl sulfates, anionic surfactants such as alkyl or alkyl allyl sulfonates, dialkyl sulphosuccinates, zwitterionic surfactants such as amino acid types and betaine types, Radically polymerizable (meth) acrylate containing a group such as sulfonate, polyoxyethylene chain, quaternary ammonium salt in the molecule described in JP-A-8-27347, Styrene, can exhibit various reactive surfactants containing derivatives such as maleic acid ester compound.
これらの界面活性剤は1種又は2種以上を使用してもよい。界面活性剤は、エマルジョン中の樹脂固形分の0.5〜15重量%使用するのが好ましく、特には1〜10重量%使用するのがよい。 These surfactants may be used alone or in combination of two or more. The surfactant is preferably used in an amount of 0.5 to 15% by weight, particularly 1 to 10% by weight, based on the resin solid content in the emulsion.
本発明では光触媒層中にシリカ粒子以外の無機酸化物粒子が含まれていてもよい。無機酸化物粒子は、光触媒粒子と共に層を形成可能な無機酸化物の粒子であれば特に限定されず、あらゆる種類の無機酸化物の粒子が使用可能である。そのような無機酸化物粒子の例としては、アルミナ、ジルコニア、セリア、イットリア、酸化錫、酸化鉄、酸化マンガン、酸化ニッケル、酸化コバルト、ハフニア等の単一酸化物の粒子;およびチタン酸バリウム、ケイ酸カルシウム、ホウ酸アルミニウム、チタン酸カリウム等の複合酸化物の粒子が挙げられる。 In the present invention, the photocatalyst layer may contain inorganic oxide particles other than silica particles. The inorganic oxide particles are not particularly limited as long as they are inorganic oxide particles capable of forming a layer together with the photocatalyst particles, and any kind of inorganic oxide particles can be used. Examples of such inorganic oxide particles include alumina, zirconia, ceria, yttria, tin oxide, iron oxide, manganese oxide, nickel oxide, cobalt oxide, hafnia and other single oxide particles; and barium titanate, Examples thereof include composite oxide particles such as calcium silicate, aluminum borate, and potassium titanate.
光触媒層中に、紫外線吸収剤を配合させてもよい。紫外線吸収剤の含有量は、光触媒活性の発現を阻害せずに耐候性を向上できる量であれば制限はないが、例えば、光触媒層に0.001〜10質量%、好ましくは0.01〜5質量%含有させることが好ましい。 You may mix | blend a ultraviolet absorber in a photocatalyst layer. The content of the ultraviolet absorber is not limited as long as the weather resistance can be improved without inhibiting the expression of the photocatalytic activity. For example, 0.001 to 10% by mass, preferably 0.01 to 10% by weight in the photocatalyst layer. It is preferable to contain 5 mass%.
本発明に使用できる紫外線吸収剤としては、ベンゾフェノン系、ベンゾトリアゾール系、トリアジン系紫外線吸収剤を好適に例示することができる。 Preferred examples of the ultraviolet absorber that can be used in the present invention include benzophenone-based, benzotriazole-based, and triazine-based ultraviolet absorbers.
とりわけ、トリアジン系紫外線吸収剤が化学的に安定なため好ましい。トリアジン系紫外線吸収剤として具体的には、ヒドロキシフェニルトリアジンまたはその誘導体が好適に利用できる。 In particular, a triazine ultraviolet absorber is preferable because it is chemically stable. Specifically, hydroxyphenyltriazine or a derivative thereof can be suitably used as the triazine-based ultraviolet absorber.
上記ベンゾフェノン系の紫外線吸収剤としては、具体的には、2,4−ジヒドロキシベンゾフェノン、2−ヒドロキシ−4−メトキシベンゾフェノン、2−ヒドロキシ−4−メトキシベンゾフェノン−5−スルホン酸、2−ヒドロキシ−4−n−オクトキシベンゾフェノン、2−ヒドロキシ−4−n−ドデシルオキシベンゾフェノン、2−ヒドロキシ−4−ベンジルオキシベンゾフェノン、ビス(5−ベンゾイル−4−ヒドロキシ−2−メトキシフェニル)メタン、2,2’−ジヒドロキシ−4−メトキシベンゾフェノン、2,2’−ジヒドロキシ−4,4’ジメトキシベンゾフェノン、2,2’,4,4’−テトラヒドロキシベンゾフェノン、4−ドデシルオキシ−2−ヒドロキシベンゾフェノン、2−ヒドロキシ−4−メトキシ−2’−カルボキシベンゾフェノン、2−ヒドロキシ−4−ステアリルオキシベンゾフェノン、オクタベンゾン、及び2−ヒドロキシ−4−アクリロキシベンゾフェノン、2−ヒドロキシ−4−メタクリロキシベンゾフェノン、2−ヒドロキシ−5−アクリロキシベンゾフェノン、2−ヒドロキシ−5−メタクリロキシベンゾフェノン、2−ヒドロキシ−4−(アクリロキシ−エトキシ)ベンゾフェノン、2−ヒドロキシ−4−(メタクリロキシ−エトキシ)ベンゾフェノン、2−ヒドロキシ−4−(メタクリロキシ−ジエトキシ)ベンゾフェノン、2−ヒドロキシ−4−(アクリロキシ−トリエトキシ)ベンゾフェノン等の重合性のベンゾフェノン系紫外線吸収剤やそれらの(共)重合物などが挙げられる。 Specific examples of the benzophenone-based ultraviolet absorber include 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, and 2-hydroxy-4. -N-octoxybenzophenone, 2-hydroxy-4-n-dodecyloxybenzophenone, 2-hydroxy-4-benzyloxybenzophenone, bis (5-benzoyl-4-hydroxy-2-methoxyphenyl) methane, 2,2 ' -Dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'dimethoxybenzophenone, 2,2 ', 4,4'-tetrahydroxybenzophenone, 4-dodecyloxy-2-hydroxybenzophenone, 2-hydroxy- 4-methoxy-2'- Ruboxybenzophenone, 2-hydroxy-4-stearyloxybenzophenone, octabenzone, and 2-hydroxy-4-acryloxybenzophenone, 2-hydroxy-4-methacryloxybenzophenone, 2-hydroxy-5-acryloxybenzophenone, 2-hydroxy -5-methacryloxybenzophenone, 2-hydroxy-4- (acryloxy-ethoxy) benzophenone, 2-hydroxy-4- (methacryloxy-ethoxy) benzophenone, 2-hydroxy-4- (methacryloxy-diethoxy) benzophenone, 2-hydroxy- Examples thereof include polymerizable benzophenone-based ultraviolet absorbers such as 4- (acryloxy-triethoxy) benzophenone and (co) polymers thereof.
また、上記ベンゾトリアゾール系の紫外線吸収剤として具体的には、2−(2’−ヒドロキシ−5’−メチルフェニル)ベンゾトリアゾール、2−(2’−ヒドロキシ−5’−tert−ブチルフェニル)ベンゾトリアゾール、2−(2’−ヒドロキシ−3’,5’−ジ−tert−ブチルフェニル)ベンゾトリアゾール、2−(2−ヒドロキシ−5−tert−オクチルフェニル)ベンゾトリアゾール、2−(2−ヒドロキシ−3,5−ジ−tert−オクチルフェニル)ベンゾトリアゾール、2−〔2’−ヒドロキシ−3’,5’−ビス(α,α’−ジメチルベンジル)フェニル〕ベンゾトリアゾール)、メチル−3−〔3−tert−ブチル−5−(2H−ベンゾトリアゾール−2−イル)−4−ヒドロキシフェニル〕プロピオネートとポリエチレングリコール(分子量300)との縮合物(チバジャパン(株)製、製品名:TINUVIN−1130)、イソオクチル−3−〔3−(2H−ベンゾトリアゾール−2−イル)−5−tert−ブチル−4−ヒドロキシフェニル〕プロピオネート(チバジャパン(株)製、製品名:TINUVIN−384)、2−(3−ドデシル−5−メチル−2−ヒドロキシフェニル)ベンゾトリアゾール(チバジャパン(株)製、製品名:TINUVIN−571)、2−(2’−ヒドロキシ−3’−tert−ブチル−5’−メチルフェニル)−5−クロロベンゾトリアゾール、2−(2’−ヒドロキシ−3’,5’−ジ−tert−アミルフェニル)ベンゾトリアゾール、2−(2’−ヒドロキシ−4’−オクトキシフェニル)ベンゾトリアゾール、2−〔2’−ヒドロキシ−3’−(3”,4”,5”,6”−テトラヒドロフタルイミドメチル)−5’−メチルフェニル 〕ベンゾトリアゾール、2,2−メチレンビス〔4−(1,1,3,3−テトラメチルブチル)−6−(2H−ベンゾトリアゾール−2−イル)フェノール〕、2−(2H−ベンゾトリアゾール−2−イル)−4,6−ビス(1−メチル−1−フェニルエチル)フェノール(チバジャパン(株)製、製品名:TINUVIN−900)、及び2−(2’−ヒドロキシ−5’−メタクリロキシエチルフェニル)−2H−ベンゾトリアゾール(大塚化学(株)製、製品名:RUVA−93)、2−(2’−ヒドロキシ−5’−メタクリロキシエチル−3−tert−ブチルフェニル)−2H−ベンゾトリアゾール、2−(2’−ヒドロキシ−5’−メタクリリルオキシプロピル−3−tert−ブチルフェニル)−5−クロロ−2H−ベンゾトリアゾール、3−メタクリロイル−2−ヒドロキシプロピル−3−〔3’−(2”−ベンゾトリアゾリル)−4−ヒドロキシ−5−tert−ブチル〕フェニルプロピオネート(チバジャパン(株)製、製品名:CGL−104)等の重合性のベンゾトリアゾール系紫外線吸収剤やそれらの(共)重合物の他、TINUVIN−384−2(製品名、チバジャパン(株)製)、TINUVIN−99−2(製品名、チバジャパン(株)製)、TINUVIN−109(製品名、チバジャパン(株)製)、TINUVIN−328(製品名、チバジャパン(株)製)、TINUVIN−928(製品名、チバジャパン(株)製)などが挙げられる。 Specific examples of the benzotriazole-based UV absorber include 2- (2′-hydroxy-5′-methylphenyl) benzotriazole and 2- (2′-hydroxy-5′-tert-butylphenyl) benzo. Triazole, 2- (2′-hydroxy-3 ′, 5′-di-tert-butylphenyl) benzotriazole, 2- (2-hydroxy-5-tert-octylphenyl) benzotriazole, 2- (2-hydroxy- 3,5-di-tert-octylphenyl) benzotriazole, 2- [2′-hydroxy-3 ′, 5′-bis (α, α′-dimethylbenzyl) phenyl] benzotriazole), methyl-3- [3 -Tert-butyl-5- (2H-benzotriazol-2-yl) -4-hydroxyphenyl] propionate Condensate with polyethylene glycol (molecular weight 300) (product name: TINUVIN-1130, manufactured by Ciba Japan Co., Ltd.), isooctyl-3- [3- (2H-benzotriazol-2-yl) -5-tert-butyl- 4-hydroxyphenyl] propionate (manufactured by Ciba Japan Co., Ltd., product name: TINUVIN-384), 2- (3-dodecyl-5-methyl-2-hydroxyphenyl) benzotriazole (manufactured by Ciba Japan Co., Ltd., product name) : TINUVIN-571), 2- (2′-hydroxy-3′-tert-butyl-5′-methylphenyl) -5-chlorobenzotriazole, 2- (2′-hydroxy-3 ′, 5′-di-) tert-amylphenyl) benzotriazole, 2- (2'-hydroxy-4'-octoxyphenyl) benzo Riazole, 2- [2′-hydroxy-3 ′-(3 ″, 4 ″, 5 ″, 6 ″ -tetrahydrophthalimidomethyl) -5′-methylphenyl] benzotriazole, 2,2-methylenebis [4- (1 , 1,3,3-tetramethylbutyl) -6- (2H-benzotriazol-2-yl) phenol], 2- (2H-benzotriazol-2-yl) -4,6-bis (1-methyl- 1-phenylethyl) phenol (manufactured by Ciba Japan Co., Ltd., product name: TINUVIN-900), and 2- (2′-hydroxy-5′-methacryloxyethylphenyl) -2H-benzotriazole (Otsuka Chemical Co., Ltd.) Product name: RUVA-93), 2- (2′-hydroxy-5′-methacryloxyethyl-3-tert-butylphenyl) -2H-benzotriazo 2- (2′-hydroxy-5′-methacrylyloxypropyl-3-tert-butylphenyl) -5-chloro-2H-benzotriazole, 3-methacryloyl-2-hydroxypropyl-3- [3′- Polymerizable benzotriazole ultraviolet absorbers such as (2 "-benzotriazolyl) -4-hydroxy-5-tert-butyl] phenylpropionate (manufactured by Ciba Japan Co., Ltd., product name: CGL-104) In addition to these (co) polymers, TINUVIN-384-2 (product name, manufactured by Ciba Japan), TINUVIN-99-2 (product name, manufactured by Ciba Japan), TINUVIN-109 (product name) , Ciba Japan Co., Ltd.), TINUVIN-328 (Product Name, Ciba Japan Co., Ltd.), TINUVIN-928 (Product Name, Ciba) Made Yapan Co., Ltd.), and the like.
また、本発明の光触媒層において、ヒンダードアミン系及び/又はヒンダードフェノール系等の光安定剤を更に含有するものは、上記紫外線吸収剤との相乗効果により、本発明の光触媒層は卓越した耐候性、耐光性を示すため好ましい。 Further, in the photocatalyst layer of the present invention, those further containing a hindered amine-based and / or hindered phenol-based light stabilizer, the photocatalyst layer of the present invention has excellent weather resistance due to a synergistic effect with the ultraviolet absorber. In view of light resistance, it is preferable.
特に、本発明の好ましい形態によれば、紫外線吸収剤としてヒドロキシフェニルトリアジン化合物を、光安定剤としてヒンダードアミン化合物を配合させるとよい。そうすることで、光触媒層による380nm未満の短波長の紫外線の吸収性能が安定する。 In particular, according to a preferred embodiment of the present invention, a hydroxyphenyl triazine compound may be blended as an ultraviolet absorber and a hindered amine compound as a light stabilizer. By doing so, the absorption performance of ultraviolet rays having a short wavelength of less than 380 nm by the photocatalyst layer is stabilized.
本発明の光触媒層中の光安定剤の含有量は、光触媒活性の発現を阻害せずに耐候性を向上できる量であれば制限はないが、例えば光触媒層に0.001〜10質量%、好ましくは0.01〜5質量%含有させることが好ましい。
ヒンダードアミン系光安定剤の具体例としては、ビス(2,2,6,6−テトラメチル−4−ピペリジル)サクシネート、ビス(2,2,6,6−テトラメチルピペリジル)セバケート、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)2−(3,5−ジ−tert−ブチル−4−ヒドロキシベンジル)−2−ブチルマロネート、1−〔2−〔3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピニルオキシ〕エチル〕−4−〔3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピニルオキシ〕−2,2,6,6−テトラメチルピペリジン、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)セバケートとメチル−1,2,2,6,6−ペンタメチル−4−ピペリジル−セバケートの混合物(チバジャパン(株)製、製品名:TINUVIN−292)、ビス(1−オクトキシ−2,2,6,6−テトラメチル−4−ピペリジル)セバケート、TINUVIN−123(製品名、チバジャパン(株)製)、TINUVIN−111FDL(製品名、チバジャパン(株)製)、TINUVIN292(製品名、チバジャパン(株)製)、及び1,2,2,6,6−ペンタメチル−4−ピペリジルメタクリレート、1,2,2,6,6−ペンタメチル−4−ピペリジルアクリレート、2,2,6,6−テトラメチル−4−ピペリジルメタクリレート、2,2,6,6−テトラメチル−4−ピペリジルアクリレート、1,2,2,6,6−ペンタメチル−4−イミノピペリジルメタクリレート、2,2,6,6,−テトラメチル−4−イミノピペリジルメタクリレート、4−シアノ−2,2,6,6−テトラメチル−4−ピペリジルメタクリレート、4−シアノ−1,2,2,6,6−ペンタメチル−4−ピペリジルメタクリレートなどの重合性のヒンダードアミン系紫外線吸収剤やそれらの(共)重合物を挙げることができる。
The content of the light stabilizer in the photocatalyst layer of the present invention is not limited as long as the weather resistance can be improved without inhibiting the expression of photocatalytic activity, but for example 0.001 to 10% by mass in the photocatalyst layer, It is preferable to contain 0.01-5 mass% preferably.
Specific examples of the hindered amine light stabilizer include bis (2,2,6,6-tetramethyl-4-piperidyl) succinate, bis (2,2,6,6-tetramethylpiperidyl) sebacate, bis (1, 2,2,6,6-pentamethyl-4-piperidyl) 2- (3,5-di-tert-butyl-4-hydroxybenzyl) -2-butylmalonate, 1- [2- [3- (3 5-Di-tert-butyl-4-hydroxyphenyl) propynyloxy] ethyl] -4- [3- (3,5-di-tert-butyl-4-hydroxyphenyl) propynyloxy] -2,2,6 6-tetramethylpiperidine, bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate and methyl-1,2,2,6,6-pentamethyl-4-piperidyl-sebake Mixture (product name: TINUVIN-292, manufactured by Ciba Japan Co., Ltd.), bis (1-octoxy-2,2,6,6-tetramethyl-4-piperidyl) sebacate, TINUVIN-123 (product name, Ciba Japan Co., Ltd.), TINUVIN-111FDL (product name, manufactured by Ciba Japan Co., Ltd.), TINUVIN 292 (product name, manufactured by Ciba Japan Co., Ltd.), and 1,2,2,6,6-pentamethyl-4- Piperidyl methacrylate, 1,2,2,6,6-pentamethyl-4-piperidyl acrylate, 2,2,6,6-tetramethyl-4-piperidyl methacrylate, 2,2,6,6-tetramethyl-4-piperidyl Acrylate, 1,2,2,6,6-pentamethyl-4-iminopiperidyl methacrylate, 2,2,6,6, -tetramethyl Such as ru-4-iminopiperidyl methacrylate, 4-cyano-2,2,6,6-tetramethyl-4-piperidyl methacrylate, 4-cyano-1,2,2,6,6-pentamethyl-4-piperidyl methacrylate, etc. Examples thereof include polymerizable hindered amine ultraviolet absorbers and their (co) polymers.
また、ヒンダードフェノール系光安定剤の具体例としては、ビス(3,5−tert−ブチル)−4−ヒドロキシトルエン、TINUVIN−144(製品名、チバジャパン(株)製)等を挙げることができる。 Specific examples of the hindered phenol light stabilizer include bis (3,5-tert-butyl) -4-hydroxytoluene, TINUVIN-144 (product name, manufactured by Ciba Japan Co., Ltd.), and the like. it can.
光触媒層には、有機防カビ剤が配合されていてもよい。例として、有機窒素硫黄系化合物、ピリチオン系化合物、有機ヨウ素系化合物、トリアジン系化合物、イソチアゾリン系化合物、イミダゾール系化合物、ピリジン系化合物、ニトリル系化合物、チオカーバメート系化合物、チアゾール系化合物、有機よう素化合物、ジスルフィド系化合物が挙げられ、単独もしくは混合物として用いられる。防カビ剤は一般に藻を防ぐ効果も合わせ持つものが多いことから、防カビ剤を添加することによって、カビと藻の両方を抑制することも期待できる。 An organic antifungal agent may be blended in the photocatalyst layer. Examples include organic nitrogen sulfur compounds, pyrithione compounds, organic iodine compounds, triazine compounds, isothiazoline compounds, imidazole compounds, pyridine compounds, nitrile compounds, thiocarbamate compounds, thiazole compounds, and organic iodine. Compounds and disulfide compounds may be mentioned and used alone or as a mixture. Since many antifungal agents generally have an effect of preventing algae, addition of the antifungal agent can be expected to suppress both mold and algae.
光触媒コーティング液
本発明による光触媒コーティング液は、疎水性基を有する物質により部分的に被覆或いは変性処理されている金属酸化物よりなる光触媒粒子と、シリコーンエマルジョンと、水溶性の銀化合物とを備え、かつ、前記光触媒粒子は、還元力よりも酸化力が強い光触媒粒子であることを特徴とする光触媒コーティング液である。
このような構成にすることにより、基材の劣化を抑制しつつ有害ガス分解性および防カビ・防藻性にも優れる光触媒塗装体および光触媒コーティング液を提供することが可能となる。
その理由は以下のように考えられる。光触媒コーティング液を基材に塗布した後に乾燥するとき、水の蒸発に伴い、表面エネルギーの小さな上記光触媒性金属酸化物粒子とともに水の表面への拡散に伴い、水に溶解している水溶性の銀化合物は表面へ移動する。それにより、塗装体表面は乾燥完了時には上記光触媒性金属酸化物粒子と銀化合物とが高濃度に互いに離間しつつ存在するようになる。ここで、本発明では光触媒粒子が酸化力が還元力よりも強い光触媒粒子であるので、銀化合物が適度に離間して存在することで、銀の光還元作用をほとんど生じることなく、光触媒と銀との相互作用により光触媒酸化力を強めることができ、有害ガス分解性および防カビ・防藻性にも優れるようになる。
かつ、上記塗装体では、上記光触媒性金属酸化物粒子が基材側ではなく、表面側に高濃度に存在するので、光触媒と基材との界面での反応を抑制しつつ光触媒粒子の紫外線吸収により紫外線劣化をも抑制できるようになる。
Photocatalyst coating liquid The photocatalyst coating liquid according to the present invention comprises photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group, a silicone emulsion, and a water-soluble silver compound. In addition, the photocatalyst particle is a photocatalyst coating liquid characterized in that the photocatalyst particle has an oxidizing power stronger than a reducing power.
With such a configuration, it is possible to provide a photocatalyst-coated body and a photocatalyst coating liquid that are excellent in harmful gas decomposability and mold-proof / algae-proof properties while suppressing deterioration of the substrate.
The reason is considered as follows. When the photocatalyst coating liquid is applied to the substrate and dried, the water-soluble water soluble in the water as the water evaporates, along with the photocatalytic metal oxide particles having a small surface energy, and diffusion to the surface of the water. The silver compound moves to the surface. As a result, the photocatalytic metal oxide particles and the silver compound are present at a high concentration while being separated from each other on the surface of the coated body when drying is completed. Here, in the present invention, the photocatalyst particles are photocatalyst particles whose oxidizing power is stronger than the reducing power. Therefore, the silver compound is present at an appropriate distance, so that the photocatalyst and the silver are hardly generated with almost no photoreduction action of silver. The photocatalytic oxidative power can be enhanced by the interaction with, and it is also excellent in harmful gas decomposability and mold / algae resistance.
In the coated body, since the photocatalytic metal oxide particles are present at a high concentration on the surface side, not on the substrate side, the UV absorption of the photocatalyst particles is suppressed while suppressing the reaction at the interface between the photocatalyst and the substrate. This makes it possible to suppress the deterioration of ultraviolet rays.
本発明の好ましい形態によれば、前記光触媒塗装体には、さらに、シリカ粒子が添加されているようにする。
そうすることで膜強度が向上する。
According to a preferred embodiment of the present invention, silica particles are further added to the photocatalyst-coated body.
By doing so, the film strength is improved.
本発明の好ましい形態によれば、前記疎水性基を有する物質は、疎水性基を有するシラン及び/又は疎水性基を有するシリコーンであるようにする。
そのようにすることで、光触媒性金属酸化物粒子表面の被覆、変性の形態を制御しやすくなる。
According to a preferred embodiment of the present invention, the substance having a hydrophobic group is a silane having a hydrophobic group and / or a silicone having a hydrophobic group.
By doing so, it becomes easy to control the coating and modification forms on the surface of the photocatalytic metal oxide particles.
本発明の好ましい形態によれば、前記光触媒コーティング液中に含有される硬化性シリコーンエマルジョンの硬化物は、前記光触媒コーティング液の乾燥物に対して85質量%以上、好ましくは90%以上含有されるようにする。
ここで、硬化物の質量とは、105℃乾燥時における恒量値をいう。
85%以上にすることにより、2μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることができるとともに、着色剤を添加しない場合に透明な光触媒層が形成可能となる。
さらに、90%以上にすることにより、5μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることができるとともに、着色剤を添加しない場合に透明な光触媒層が形成可能となる。
According to a preferred embodiment of the present invention, the cured product of the curable silicone emulsion contained in the photocatalyst coating solution is contained in an amount of 85% by mass or more, preferably 90% or more, based on the dried product of the photocatalyst coating solution. Like that.
Here, the mass of hardened | cured material means the constant value at the time of 105 degreeC drying.
By setting it to 85% or more, a high photocatalytic decomposition activity can be obtained even in a film having a long transfer process on the surface, such as a thick film exceeding 2 μm, and a transparent photocatalytic layer when no colorant is added. Can be formed.
Furthermore, by setting it to 90% or more, a high photocatalytic decomposition activity can be obtained even in a film having a long movement process on the surface, such as a thick film exceeding 5 μm, and transparent when no colorant is added. A photocatalytic layer can be formed.
本発明の好ましい形態によれば、光触媒コーティング液中に含有される光触媒性金属酸化物粒子は、前記光触媒コーティング液の乾燥物に対して0質量%をこえ5質量%未満であるようにする。
そうすることにより、基材の劣化を抑制できる。
According to a preferred embodiment of the present invention, the photocatalytic metal oxide particles contained in the photocatalyst coating solution are more than 0% by mass and less than 5% by mass with respect to the dried product of the photocatalyst coating solution.
By doing so, deterioration of the substrate can be suppressed.
本発明の好ましい形態によれば、前記硬化性シリコーンエマルジョンの平均粒径は、前記光触媒性金属酸化物粒子の平均粒径よりも大きいようにする。
そうすることで、光触媒性金属酸化物粒子の表面に移動が顕著になる。
従って、光触媒性金属酸化物粒子がシリコーンエマルジョンに束縛されずに表面に移動しやすくなり、2μmをこえる厚膜のような、表面に移動行程の長い膜においても、高度な光触媒分解活性を得ることの可能な光触媒コーティング組成物を提供することがより容易となる。
According to a preferred embodiment of the present invention, the average particle size of the curable silicone emulsion is made larger than the average particle size of the photocatalytic metal oxide particles.
By doing so, movement becomes remarkable on the surface of the photocatalytic metal oxide particles.
Accordingly, the photocatalytic metal oxide particles are easily transferred to the surface without being bound by the silicone emulsion, and a high photocatalytic degradation activity can be obtained even in a film having a long moving process on the surface, such as a thick film exceeding 2 μm. It is easier to provide a possible photocatalytic coating composition.
光触媒コーティング液には、上記「光触媒金属酸化物粒子」、「水溶性の銀化合物」、「硬化性シリコーンエマルジョン」の他、下記に限定されないが、「シリカ粒子」、「シリカ粒子以外の無機酸化物粒子」、「界面活性剤」「金属または金属化合物」、「紫外線吸収剤」、「光安定剤」、「有機防カビ剤」等を配合させることができる。
尚、「光触媒金属酸化物粒子」、「水溶性の銀化合物」、「硬化性シリコーンエマルジョン」に関連する事項、「シリカ粒子」、「シリカ粒子以外の無機酸化物粒子含有」、「金属または金属化合物添加」、「界面活性剤の配合」、「紫外線吸収剤の配合」、「光安定剤の配合」、「防藻剤の配合」については、「光触媒塗装体」の項で述べた全ての内容が好適に利用できる。
The photocatalyst coating liquid is not limited to the following, in addition to the above “photocatalyst metal oxide particles”, “water-soluble silver compound”, “curable silicone emulsion”, but “silica particles”, “inorganic oxidation other than silica particles” Product particles "," surfactants "," metals or metal compounds "," ultraviolet absorbers "," light stabilizers "," organic antifungal agents ", and the like.
Items related to “photocatalytic metal oxide particles”, “water-soluble silver compounds”, “curable silicone emulsion”, “silica particles”, “containing inorganic oxide particles other than silica particles”, “metal or metal” For "compound addition", "surfactant blending", "UV absorber blending", "light stabilizer blending", and "algaeproofing blending", all of those mentioned in the section "Photocatalyst coating" The contents can be suitably used.
本発明の光触媒コーティング液においては、水に可溶又は水と均一分散可能な沸点が100℃以上の被膜形成助剤を配合することができる。この被膜形成助剤は大部分の水分が気化した後も被膜中に残存し、完全硬化するまで被膜に流動性を付与することにより気化時に荒れた被膜の修復を行い、特に被膜に均一性を付与するものである。良好な被膜を得るためには、非反応性の被膜形成助剤は最終的には硬化被膜から消失することが必要であり、エステル交換反応によりケイ素原子と結合する可能性のある水酸基は含まないことが好ましい。そのため、被膜形成助剤は100℃以上、好ましくは100〜250℃、特に100〜200℃の沸点の有機溶剤であることが好ましい。沸点が高すぎると被膜中に残存しやすくなることがある。具体的には、1−ブタノール、イソブチルアルコール、2−ペンタノール、3−ペンタノール、イソペンチルアルコール、乳酸メチル、乳酸エチル、3−メチル−3−メトキシブタノール等のアルコール類、1,2−プロパンジオール、1,3−ブタンジオール1,4−ブタンジオール、2,3−ブタンジオール、1,5−ペンタンジオール、2−メチル−2,4−ペンタンジオール、グリセリン、トリメチロールプロパン等のポリオール類、2−ブトキシエタノール、2−フェノキシエタノール、2−エトキシエチルアセタート、2−ブトキシエチルアセタート、ジエチレングリコールモノブチルエーテルアセタート等のエチレングリコール誘導体、1−メトキシ−2−プロパノール、1−エトキシ−2−プロパノール、1−メトキシ−2−メチルエチルアセタート、1−エトキシ−2−メチルエチルアセタート、ジプロピレングリコール、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテルアセタート等のプロピレングリコール誘導体、3−メトキシブチルアセタート等のブチレングリコール誘導体、シクロヘキサノン等のケトン類、酢酸ブチル、酢酸イソブチル、γ−ブチロラクトン、炭酸プロピレン、ジブチルフタレート等のエステル類等を例示することができる。特に、2−エトキシエチルアセタート、2−ブトキシエチルアセタート、ジエチレングリコールモノブチルエーテルアセタート、1−エトキシ−2−メチルエチルアセタート、ジプロピレングリコールモノメチルエーテルアセタート等のアルキレングリコール誘導体がレベリング性の点から好ましい。これらの有機溶剤は、メタノールやエタノール等の低沸点アルコール類と比較して水溶性に劣るため、エマルジョンの安定性を損なわず、均一な被膜の形成にのみ寄与する。 In the photocatalyst coating liquid of the present invention, a film-forming aid having a boiling point of 100 ° C. or higher that is soluble in water or can be uniformly dispersed in water can be blended. This film-forming aid remains in the film even after most of the water has evaporated, and it provides fluidity to the film until it is completely cured, thereby repairing the film that was rough at the time of vaporization. It is given. In order to obtain a good film, the non-reactive film-forming aid must eventually disappear from the cured film, and does not contain hydroxyl groups that can be bonded to silicon atoms by transesterification. It is preferable. Therefore, the film forming aid is preferably an organic solvent having a boiling point of 100 ° C. or higher, preferably 100 to 250 ° C., particularly 100 to 200 ° C. If the boiling point is too high, it may easily remain in the film. Specifically, alcohols such as 1-butanol, isobutyl alcohol, 2-pentanol, 3-pentanol, isopentyl alcohol, methyl lactate, ethyl lactate, and 3-methyl-3-methoxybutanol, 1,2-propane Polyols such as diol, 1,3-butanediol 1,4-butanediol, 2,3-butanediol, 1,5-pentanediol, 2-methyl-2,4-pentanediol, glycerin, trimethylolpropane, Ethylene glycol derivatives such as 2-butoxyethanol, 2-phenoxyethanol, 2-ethoxyethyl acetate, 2-butoxyethyl acetate, diethylene glycol monobutyl ether acetate, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, 1-methoxy-2 Propylene glycol derivatives such as methyl ethyl acetate, 1-ethoxy-2-methyl ethyl acetate, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether acetate, 3-methoxybutyl Examples include butylene glycol derivatives such as acetate, ketones such as cyclohexanone, esters such as butyl acetate, isobutyl acetate, γ-butyrolactone, propylene carbonate, and dibutyl phthalate. In particular, alkylene glycol derivatives such as 2-ethoxyethyl acetate, 2-butoxyethyl acetate, diethylene glycol monobutyl ether acetate, 1-ethoxy-2-methylethyl acetate, dipropylene glycol monomethyl ether acetate are leveling properties. To preferred. Since these organic solvents are inferior in water solubility as compared with low boiling alcohols such as methanol and ethanol, they do not impair the stability of the emulsion and contribute only to the formation of a uniform film.
上記被膜形成助剤の添加量は、シリコーン樹脂100重量部に対して0〜20重量部、特に1〜15重量部とすることが好ましい。20重量部を超えて添加すると、硬化終了後も被膜中に残存する被膜形成助剤の量が多くなるため、被膜の特性が不十分なものとなることがある。 The amount of the film forming aid added is preferably 0 to 20 parts by weight, particularly 1 to 15 parts by weight, based on 100 parts by weight of the silicone resin. If added in excess of 20 parts by weight, the amount of the film-forming aid remaining in the film after the curing is increased, and the film characteristics may be insufficient.
本発明の光触媒コーティング液の溶媒は、主として水である。それにより塗膜形成時に有機物の揮発、蒸発に伴う異臭、環境汚染を有効に防止できる。 The solvent of the photocatalyst coating liquid of the present invention is mainly water. As a result, it is possible to effectively prevent the odor and environmental pollution associated with the volatilization and evaporation of organic substances during coating film formation.
また、光触媒コーティング液の固形分濃度は特に限定されないが、10〜60質量%とするのが塗布し易い点で好ましい。光触媒コーティング液なお、光触媒コーティング液中の構成成分の分析は、コーティング液を限外ろ過によって粒子成分と濾液に分離し、それぞれを赤外分光分析、ゲルパーミエーションクロマトグラフィー、蛍光X線分光分析などで分析し、スペクトルを解析することによって評価することができる。 Moreover, the solid content concentration of the photocatalyst coating liquid is not particularly limited, but it is preferably 10 to 60% by mass in terms of easy application. Photocatalyst coating liquid In addition, the components of the photocatalyst coating liquid are analyzed by separating the coating liquid into particle components and filtrate by ultrafiltration, and analyzing each of them by infrared spectroscopic analysis, gel permeation chromatography, fluorescent X-ray spectroscopic analysis, etc. And can be evaluated by analyzing the spectrum.
なお、上記「光触媒塗装体」「光触媒コーティング液」の項で述べた内容は、任意に組合わせることが可能である。 The contents described in the above-mentioned “photocatalyst-coated bodies” and “photocatalyst coating liquid” can be arbitrarily combined.
光触媒塗装体の製造方法
本発明の光触媒塗装体は、上記光触媒コーティング液を、基材上に塗布することにより簡単に製造することができる。光触媒層の塗装方法は、前記液剤を刷毛塗り、ローラー、スプレー、ロールコーター、フローコーター、ディップコート、流し塗り、スクリーン印刷等、一般に広く行われている方法を利用できる。コーティング液の基材への塗布後は、常温乾燥させればよく、あるいは必要に応じて加熱乾燥してもよい。
Method for Producing Photocatalyst-Coated Body The photocatalyst-coated body of the present invention can be easily produced by applying the photocatalyst coating liquid on a substrate. As a method for coating the photocatalyst layer, generally used methods such as brush coating, roller, spray, roll coater, flow coater, dip coating, flow coating, and screen printing can be used. After applying the coating liquid to the substrate, it may be dried at room temperature, or may be heat-dried as necessary.
基材
本発明に用いる基材は、無機材料、有機材料、複層材料を問わず種々の材料であってよく、その形状も限定されない。材料の観点からみた基材の好ましい例としては、金属、セラミック、ガラス、プラスチック、ゴム、石、セメント、コンクリ−ト、繊維、布帛、木、紙、それらの組合せ、それらの積層体、それらの表面に少なくとも一層の被膜を有するものが挙げられる。用途の観点からみた基材の好ましい例としては、建材、建物外装および内装、窓枠、窓ガラス、構造部材、乗物の外装及び塗装、機械装置や物品の外装、防塵カバー及び塗装、交通標識、各種表示装置、広告塔、道路用遮音壁、鉄道用遮音壁、橋梁、ガードレ−ルの外装及び塗装、トンネル内装及び塗装、碍子、太陽電池カバー、太陽熱温水器集熱カバー、ビニールハウス、車両用照明灯のカバー、屋外用照明器具、台、浴室材、キッチンパネル、流し台、レンジ、換気扇、空調、フィルター、便器、浴槽及び上記物品表面に貼着させるためのフィルム、シート、シール等が挙げられる。
Base Material The base material used in the present invention may be various materials regardless of inorganic materials, organic materials, and multilayer materials, and the shape thereof is not limited. Preferred examples of the substrate from the viewpoint of materials include metals, ceramics, glass, plastics, rubber, stones, cement, concrete, fibers, fabrics, wood, paper, combinations thereof, laminates thereof, Examples thereof include those having at least one layer of coating on the surface. Preferred examples of base materials from the viewpoint of applications include building materials, building exteriors and interiors, window frames, window glass, structural members, exteriors and coatings of vehicles, exteriors of machinery and articles, dust covers and coatings, traffic signs, Various display devices, advertising towers, sound insulation walls for roads, sound insulation walls for railways, bridges, guard rail exteriors and paintings, tunnel interiors and paintings, insulators, solar cell covers, solar water heater heat collection covers, plastic houses, vehicle lighting Covers, outdoor lighting fixtures, tables, bathroom materials, kitchen panels, sinks, ranges, ventilation fans, air conditioning, filters, toilets, bathtubs, and films, sheets, seals and the like for attachment to the surface of the article.
特に、本発明の光触媒塗装体は、太陽光に晒され、太陽光に含まれる紫外線により光触媒が光励起され、ガス分解や防カビ等の光酸化作用を生じるとともに、その紫外線により基材の劣化が生じるおそれのある利用形態で用いられるのが、特に好ましい。
そうような用途としては建材、建物外装、窓枠、窓ガラス、構造部材、乗物の外装及び塗装、機械装置や物品の外装、交通標識、広告塔、看板、道路用遮音壁、鉄道用遮音壁、橋梁、ガードレ−ルの外装及び塗装、トンネル内装及び塗装、碍子、太陽電池カバー、太陽熱温水器集熱カバー、ビニールハウス、車両用照明灯のカバー、屋外用照明器具、道路舗装等が挙げられる。
特に好適には、表面がエナメル塗装或いはクリア塗装されている基材が本発明の効果を充分に享受できるので最も好ましい。
In particular, the photocatalyst-coated body of the present invention is exposed to sunlight, and the photocatalyst is photoexcited by ultraviolet rays contained in the sunlight, causing photooxidation action such as gas decomposition and mold prevention, and deterioration of the substrate due to the ultraviolet rays. It is particularly preferable to use it in a usage form that may occur.
Such applications include building materials, building exteriors, window frames, window glass, structural members, exterior and painting of vehicles, exteriors of machinery and goods, traffic signs, advertising towers, signboards, sound insulation walls for roads, sound insulation walls for railways, bridges , Guard rail exteriors and paintings, tunnel interiors and paintings, insulators, solar cell covers, solar water heater heat collection covers, greenhouses, vehicular lighting lamp covers, outdoor lighting fixtures, road pavements and the like.
Particularly preferably, a substrate whose surface is enamel-coated or clear-coated is most preferable because the effect of the present invention can be fully enjoyed.
本発明を以下の例に基づいて具体的に説明するが、本発明はこれらの例に限定されるものではない。 The present invention will be specifically described based on the following examples, but the present invention is not limited to these examples.
実施例1.
3官能性シランで5%表面被覆したアナターゼ型酸化チタン粒子(平均結晶子径10nm)1.3質量部、3官能性シランで5%表面被覆したシリカ粒子(平均粒径50nm)8.7質量部、メチルフェニルシリコーンエマルジョン90質量部、ポリオキシエチレンアルキルエーテル5質量%、銀のアミン錯体0.007質量部、銀のアミン錯体0.003質量部配合した固形分濃度25質量%の光触媒水性コーティング液を調製し、透明なアクリル基材上に150℃×5分乾燥し、光触媒塗装体を得た。
得られた光触媒塗装体の光触媒層を断面観察したところ、膜厚は約3μmであり、アナターゼ型酸化チタン粒子とシリカ粒子が表面に高濃度に存在する様子が観察された。
また、光触媒塗装体の表面から観察したところ、塗装体を載置していた実験台が透けてみえた。
この光触媒塗装体について、光触媒による有害物質除去性能を、NOx分解性能を調べることにより確認した。ここで、光触媒によるNOx分解機能は、JISR1701−1「光触媒材料の空気浄化性能試験方法−第1部:窒素酸化物の除去性能」の試験法で行った。その結果、ΔNOxが0.5μmolを上回り、良好な結果を示した。
さらに、この光触媒塗装体について、抗カビ性能を確認した。前処理として1mW/cm2のBLB光を24時間照射したのち、下記した抗カビ性試験を行った。 こうして得られた50×50mmの大きさの光触媒塗装体について、以下の通り抗カビ性の評価を行った。試験菌としてポテトデキストロース寒天培地で、25℃で7〜14日前培養したAspergillus niger(NBRC6341)を用い、これを0.005重量%のスルホコハク酸ジオクチルナトリウムを含む生理食塩水中に分散させ胞子懸濁液を作成した。上記方法にて得られた光触媒塗装体に、前記胞子懸濁液を、試験片1枚あたり4〜6×105個/mLになるよう滴下し、抗カビ試験片とした。この試験片に、JIS R1702(2006)に記載のフィルム密着法に準じ、密着フィルムをかぶせ、保湿可能なシャーレ内に設置し、保湿ガラスを載せて試験に用いた。前記試験片をシャーレごとBLB光照射下に設置し、光触媒塗装体面で0.4mW/cm2になるようBLB光を24時間照射した。24時間照射後、胞子懸濁液を回収し、ポテトデキストロース寒天培地で培養し、生残菌数を計測した。抗カビ性は、得られた生残菌数の対数値と光触媒未加工の試験体の生残菌数の対数値の差を求めることによって得た。その結果、対数値は1を上回り、良好な結果を示した。
Example 1.
1.3 parts by mass of anatase-type titanium oxide particles (average crystallite size 10 nm) coated with 5% of trifunctional silane and 8.7 masses of silica particles (average particle size 50 nm) coated with 5% of trifunctional silane Part, methylphenyl silicone emulsion 90 parts by mass, polyoxyethylene alkyl ether 5% by mass, silver amine complex 0.007 parts by mass, silver amine complex 0.003 parts by mass, solid content concentration 25% by mass photocatalytic aqueous coating A liquid was prepared and dried on a transparent acrylic substrate at 150 ° C. for 5 minutes to obtain a photocatalyst-coated body.
When the photocatalyst layer of the obtained photocatalyst-coated body was observed in cross section, the film thickness was about 3 μm, and it was observed that anatase-type titanium oxide particles and silica particles were present at high concentrations on the surface.
Moreover, when it observed from the surface of the photocatalyst coating body, the experimental stand which mounted the coating body was seen through.
About this photocatalyst coating body, the harmful substance removal performance by a photocatalyst was confirmed by investigating NOx decomposition performance. Here, the NOx decomposition function by the photocatalyst was performed by the test method of JIS R1701-1 “Testing method for air purification performance of photocatalytic material—Part 1: Nitrogen oxide removal performance”. As a result, ΔNOx exceeded 0.5 μmol, indicating a good result.
Furthermore, antifungal performance was confirmed about this photocatalyst coating body. As a pretreatment, 1 mW / cm 2 of BLB light was irradiated for 24 hours, and then the antifungal test described below was performed. The anti-fungal property of the photocatalyst-coated body having a size of 50 × 50 mm thus obtained was evaluated as follows. Aspergillus niger (NBRC6341) previously cultured at 25 ° C. for 7 to 14 days on a potato dextrose agar medium as a test bacterium, this was dispersed in physiological saline containing 0.005% by weight of dioctyl sodium sulfosuccinate, and a spore suspension It was created. The spore suspension was dropped on the photocatalyst-coated body obtained by the above method so that the amount of the spore suspension was 4 to 6 × 10 5 pieces / mL per one test piece to obtain an anti-mold test piece. In accordance with the film adhesion method described in JIS R1702 (2006), the test piece was covered with an adhesion film, placed in a petri dish capable of moisture retention, and moisturized glass was placed and used for the test. The test piece was placed together with the petri dish under BLB light irradiation, and irradiated with BLB light for 24 hours so that the photocatalyst-coated body surface was 0.4 mW / cm 2 . After 24 hours of irradiation, the spore suspension was collected and cultured on a potato dextrose agar medium, and the number of surviving bacteria was counted. The antifungal property was obtained by calculating the difference between the logarithmic value of the obtained number of surviving bacteria and the logarithmic value of the number of surviving bacteria of the photocatalyst untreated specimen. As a result, the logarithmic value exceeded 1 and showed a good result.
Claims (12)
前記光触媒層は、光触媒コーティング液を塗布後乾燥することにより得られ、
前記光触媒コーティング液は、疎水性基を有する物質により部分的に被覆或いは変性処理されている金属酸化物よりなる光触媒粒子と、シリコーンエマルジョンと、水溶性の銀化合物と、水と、を備え、かつ、
前記光触媒粒子は、アナターゼ型酸化チタン粒子であることを特徴とする光触媒塗装体。 A photocatalyst-coated body comprising a substrate and a photocatalyst layer provided on the substrate,
The photocatalyst layer is obtained by applying a photocatalyst coating liquid and then drying,
The photocatalyst coating liquid comprises photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group, a silicone emulsion, a water-soluble silver compound, and water, and ,
The photocatalyst particles are anatase-type titanium oxide particles.
シリコーンエマルジョンと、
水溶性の銀化合物と、水と、を備え、
かつ、前記光触媒粒子は、アナターゼ型酸化チタン粒子であることを特徴とする光触媒コーティング液。 Photocatalyst particles made of a metal oxide partially coated or modified with a substance having a hydrophobic group;
Silicone emulsion,
A water-soluble silver compound and water,
And the said photocatalyst particle is an anatase type titanium oxide particle, The photocatalyst coating liquid characterized by the above-mentioned.
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