JP5364253B2 - Laser introduction device for laser microscope and laser microscope - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a laser-introducing device for a laser microscope by which a plurality of laser beams introduced into a laser microscope can simply and quickly be adjusted into a predetermined state, and to provide the laser microscope that has the laser-introducing device. <P>SOLUTION: The laser-introducing device 100, for the laser microscope for introducing the plurality of laser beams L1 and L2 into the laser microscope, includes an independent laser adjusting means 10 which is provided on the independent path of one laser beam L2 and adjusts the introduced state of the laser beam L2 into the laser microscope and a shared laser adjusting means 20 which is provided on the common optical path of at least two laser beams L1 and L2, including the laser beam L2, after passing through the independent laser adjusting means 10 and adjusts the introduced state of at least two laser beams L1 and L2, into the laser microscope, in such a state that the relative relation of at least two laser beams L1 and L2 is maintained. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to a laser introduction device for a laser microscope for introducing a plurality of laser beams into a laser microscope, and a laser microscope having the same.

  In recent years, as a laser microscope using a plurality of laser beams, for example, a coherent anti-Stokes Raman scattering microscope (hereinafter, appropriately referred to as a CARS microscope) is known. As this CARS microscope, two laser beams having a wavelength difference corresponding to the molecular frequency of the specimen to be observed are coaxially synthesized and condensed at the same position of the specimen to detect CARS scattered light generated from the specimen. Is known (see, for example, Patent Document 1).

  Further, as another laser microscope using a plurality of laser beams, for example, two laser light sources that generate a one-photon excitation phenomenon and an ultrashort pulse laser light source that generates a two-photon excitation phenomenon on a specimen are used. There is also known a laser microscope in which laser beams from three laser light sources are selectively focused on the same position of a specimen through a common optical path (see, for example, Patent Document 2).

  In this way, in a laser microscope that condenses a plurality of laser beams at the same position of the specimen, each laser is focused on the optical axis of a condensing lens for condensing the laser light provided on the microscope onto the specimen. It is necessary to adjust and introduce light into a predetermined state. As an external laser introducing device having such an adjustment mechanism, for example, a pupil projection optical system that projects an entrance pupil of a condenser lens of a laser microscope onto an external pupil outside the laser microscope, and a laser on the optical axis of the projected external pupil There is known an external laser introduction device having an optical axis alignment mechanism for substantially matching the optical axes of light and a wavefront polarity adjustment mechanism for adjusting the wavefront curvature of laser light at an external pupil position (for example, (See Patent Document 3).

Japanese translation of PCT publication No. 2002-520612 JP 2003-57554 A JP 2006-292882 A

  According to the external laser introducing device disclosed in Patent Document 3 above, the entrance pupil of the condenser lens of the laser microscope is projected onto the external pupil outside the laser microscope, and the laser light to be introduced is introduced into the projected external pupil. Since the optical axis adjustment and the wavefront curvature adjustment are performed, the laser beam can be easily and quickly adjusted to a predetermined state with respect to the condenser lens.

  However, the external laser introducing device disclosed in Patent Document 3 can individually adjust the laser beams to be introduced, but maintains a relative relationship between a plurality of laser beams including the adjusted laser beams. Cannot be adjusted. For this reason, each time the condensing position on the specimen surface is changed, it is necessary to adjust the converging position by adjusting the wavefront curvature for each laser beam, which is complicated and takes time. Is concerned.

  Accordingly, an object of the present invention made in view of such a point is to provide a laser introduction device for a laser microscope that can easily and quickly adjust a plurality of laser beams to be introduced into a laser microscope, and a laser microscope including the same. It is to provide.

The invention according to claim 1 that achieves the above object is a laser introducing device for a laser microscope for introducing a plurality of laser beams into a laser microscope,
A single laser adjusting means which is provided in a single optical path of one laser beam and adjusts the state of introduction of the laser beam into the laser microscope;
State of introduction of the at least two laser lights into the laser microscope provided in common to the at least two laser lights in a common optical path of at least two laser lights including the laser light that has passed through the single laser adjusting means A common laser adjustment means for simultaneously adjusting
The single laser adjustment means and said common laser adjusting device, even without less, the wavefront curvature adjusting means for adjusting the wavefront curvature of the laser beam of the plurality of laser light provided to the laser microscope to the pupil of the lens for focusing Have
It is characterized by this.

The invention according to claim 2 is the laser introduction device for a laser microscope according to claim 1,
The wavefront curvature adjusting means has a relay optical system including a lens that can move at least in the optical axis direction, and adjusts the wavefront curvature of the laser light to the pupil by moving the lens in the optical axis direction. it is characterized in that the configuration was.

The invention according to claim 3 is the laser introduction device for a laser microscope according to claim 1 ,
The wavefront curvature adjusting means has a relay optical system including a lens that can move at least in the optical axis direction, and adjusts the wavefront curvature of the laser light to the pupil by moving the lens in the optical axis direction. It is characterized by comprising.

The invention according to claim 4 is the laser introduction device for a laser microscope according to any one of claims 1 to 3 ,
Each of the single laser adjusting unit and the common laser adjusting unit further includes a position adjusting unit that adjusts the position of the laser beam to the pupil .

The invention according to claim 5 is the laser introduction device for a laser microscope according to claim 4 ,
The position adjusting means has a reflection optical system including a displaceable mirror for adjusting a reflection angle of the laser beam, and is configured to adjust the position of the laser beam to the pupil by displacing the mirror. It is characterized by.

The invention according to claim 6 is the laser introduction device for a laser microscope according to claim 4 ,
The position adjusting means has a displaceable lens that refracts and transmits laser light, and displaces the lens so that its optical axis is decentered with respect to a reference optical axis, whereby the position of the laser light to the pupil It is characterized in that it is configured to adjust.

The invention according to claim 7 is the laser introduction device for a laser microscope according to any one of claims 1 to 6 ,
Each of the single laser adjusting unit and the common laser adjusting unit includes an angle adjusting unit that adjusts an angle of the laser beam to the pupil .

The invention according to claim 8 is the laser introduction device for a laser microscope according to claim 7 ,
The angle adjusting means has a reflection optical system including a displaceable mirror for adjusting the reflection angle of the laser beam, and is configured to adjust the angle of the laser beam to the pupil by displacing the mirror. It is characterized by.

The invention according to claim 9 is the laser introduction device for a laser microscope according to claim 7 ,
The angle adjusting means has a displaceable lens that refracts and transmits laser light, and displaces the lens so that its optical axis is decentered with respect to a reference optical axis, whereby the angle of the laser light to the pupil It is characterized in that it is configured to adjust.

Furthermore, the invention of the laser microscope according to claim 10 that achieves the above object comprises the laser introduction device for a laser microscope according to any one of claims 1 to 9 .

  According to the present invention, the single optical path of one laser beam is provided with the single laser adjusting means for adjusting the state of introduction of the laser beam into the laser microscope, and the common optical path of at least two laser beams including this laser beam is provided. Since the common laser adjustment means for adjusting the introduction state of these at least two laser lights to the laser microscope is maintained while maintaining the relative relationship between them, the plurality of laser lights introduced into the laser microscope are brought into a predetermined state. It becomes possible to adjust easily and quickly.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First embodiment)
FIG. 1 is a conceptual diagram showing the basic configuration of a laser introducing device for a laser microscope according to a first embodiment of the present invention. This laser introducing apparatus 100 uses a laser microscope (not shown) by sharing the optical paths of the two laser beams, the first laser beam L1 and the second laser beam L2, by the optical path combining optical element 1 including a half mirror and a dichroic mirror. To be introduced. Here, the first laser light L1 and the second laser light L2 may have different wavelengths or may have the same wavelength. The first laser light L1 and the second laser light L2 can be obtained from independent laser light sources, although not shown, or the laser light from one laser light source is divided into two, and one of them is the first laser light. It is also possible to obtain the second laser beam L2 by converting the wavelength of the other beam to the light L1 as necessary.

  In the present embodiment, the single laser adjusting means 10 is provided in the single optical path of the second laser light L2, and the common laser adjusting means 20 is provided in the common optical path of the first laser light L1 and the second laser light L2. The laser beam L1 is transmitted through the optical path synthesizing optical element 1 and then introduced into the laser microscope via the common laser adjusting means 20, and the second laser light L2 is passed through the single laser adjusting means 10 and the optical path synthesizing optical element 1 Then, it is introduced into the laser microscope through the common laser adjusting means 20.

  FIG. 2 is a schematic configuration diagram of the inside of the single laser adjusting unit 10 and the common laser adjusting unit 20 shown in FIG. As shown in FIG. 2, the single laser adjusting unit 10 and the common laser adjusting unit 20 are configured in the same manner.

  That is, the single laser adjusting unit 10 is provided with a position / angle adjusting unit 11 and a wavefront curvature adjusting unit 12. The position / angle adjusting means 11 is provided with a reflection optical system having two mirrors 11a and 11b that sequentially reflect incident second laser light L2 and that can be rotated and displaced about axes orthogonal to each other. 11b, the position of the second laser beam L2 on the reference plane 2 orthogonal to the optical axis in the common optical path set in advance and the angle to the reference plane 2 can be adjusted. Configure. In FIG. 2, for clarity of illustration, the mirrors 11a and 11b are illustrated so as to be capable of rotational displacement in the same direction.

  Further, the wavefront curvature adjusting means 12 is provided with a relay optical system having two groups of lenses 12a and 12b, and the lens 12a on the incident side is moved in the optical axis direction by the moving stage 12c. 2 The wavefront curvature of the laser beam L2 is configured to be adjustable.

  Similarly, the common laser adjustment unit 20 includes a position / angle adjustment unit 21 having two mirrors 21a and 21b constituting a reflection optical system, two groups of lenses 22a and 22b and a moving stage 22c constituting a relay optical system. And a wavefront curvature adjusting means 22 is provided. The common laser adjusting unit 20 maintains the relative relationship between the incident first laser beam L1 and the second laser beam L2 by the two mirrors 21a and 21b of the position / angle adjusting unit 21, and the first laser beam L1. Further, the position of the second laser beam L2 on the reference plane 2 and the angle to the reference plane 2 are adjusted, and the incident side lens 22a is moved in the optical axis direction via the moving stage 22c of the wavefront curvature adjusting means 22. Similarly, the wavefront curvatures of the first laser beam L1 and the second laser beam L2 on the reference plane 2 are adjusted while maintaining the relative relationship between the incident first laser beam L1 and the second laser beam L2. To be configured.

  Here, the positions of the first laser beam L1 and the second laser beam L2 on the reference plane 2 are determined by setting the two-dimensional XY coordinate axes on the reference plane 2 as shown in FIG. The coordinates of the intersection of the two laser beams L2 on the reference plane 2, that is, (x1, y1) for the first laser beam L1 and (x2, y2) for the second laser beam L2 are defined as the positions of the respective laser beams. Can do.

  Further, the angles of the first laser beam L1 and the second laser beam L2 on the reference plane 2 are the angles formed by the first laser beam L1 and the second laser beam L2 and the normal line of the reference plane 2 as shown in FIG. Are θ1 and θ2, and the angle formed between the mapping of the first laser beam L1 and the second laser beam L2 to the reference plane 2 and the X axis or the Y axis is ψ1 and ψ2, the first laser beam L1 has (θ1, ψ1) and the second laser light L2 can be defined as (θ2, ψ2).

  Furthermore, the wavefront curvatures of the first laser beam L1 and the second laser beam L2 on the reference plane 2 are as shown in FIG. 5 for the first laser beam L1 at the position (x1, y1) on the reference plane 2. The second laser beam L2 can be defined as the wavefront curvature R2 at the position (x2, y2) on the reference plane 2.

  According to the present embodiment, by adjusting the reflection direction of the second laser light L2 by the two mirrors 11a and 11b constituting the position / angle adjusting means 11 of the single laser adjusting means 10, the second on the reference plane 2 is adjusted. For example, the position (x2, y2) and the angle (θ2, ψ2) of the laser beam L2 are matched with the position (x1, y1) and the angle (θ1, ψ1) of the first laser beam L1 on the reference plane 2, respectively. Can be adjusted independently. Similarly, the incident-side lens 12a of the relay optical system constituting the wavefront curvature adjusting unit 12 of the single laser adjusting unit 10 is moved in the optical axis direction by the moving stage 12c, so that the second laser beam L2 on the reference plane 2 The wavefront curvature R2 can be independently adjusted, for example, so as to coincide with the wavefront curvature R1 of the first laser light L1 on the reference surface 2.

  Further, the first laser beam L1 and the second laser beam L2 are adjusted by adjusting the reflection directions of the first laser beam L1 and the second laser beam L2 by the two mirrors 21a and 21b constituting the position / angle adjusting unit 21 of the common laser adjusting unit 20. While maintaining the relative relationship of the second laser light L2, the positions and angles of the first laser light L1 and the second laser light L2 on the reference surface 2 are simultaneously adjusted so as to coincide with the optical axis on the reference surface 2, for example. can do. Similarly, the first laser beam L1 and the second laser beam are obtained by moving the incident side lens 22a of the relay optical system constituting the wavefront curvature adjusting unit 22 of the common laser adjusting unit 20 in the optical axis direction by the moving stage 22c. While maintaining the relative relationship of L2, the wavefront curvatures of the first laser beam L1 and the second laser beam L2 on the reference surface 2 can be adjusted simultaneously.

  Therefore, according to the present embodiment, for example, the single laser adjustment unit 10 adjusts the second laser beam L2 to be in the same state as the first laser beam L1 on the reference plane 2, and further performs common laser adjustment. The first laser beam L1 introduced into the laser microscope is adjusted by the means 20 so that the first laser beam L1 and the second laser beam L2 are aligned with the optical axis of the common optical path and have a desired wavefront curvature. The second laser beam L2 can be easily and quickly adjusted so as to be condensed at the same position.

  Here, as shown in FIG. 6, the reference surface 2 preferably has a condensing lens 31 that condenses the laser light provided in the laser microscope 30 to which the first laser light L1 and the second laser light L2 are introduced. It is set to coincide with the pupil position 31a. Of course, the pupil position 31a is not limited to the actual pupil position of the condenser lens 31, and may be a position optically conjugate with it.

  Thus, if the reference plane 2 is set to the pupil position 31a of the condenser lens 31, the condensing position P of the first laser light L1 and the second laser light L2 collected by the condenser lens 31 is the pupil position. It changes in accordance with the position, angle, and wavefront curvature of the first laser beam L1 and the second laser beam L2 at 31a. Therefore, the first laser beam L1 and the second laser beam L2 are adjusted by the single laser adjusting unit 10 and the common laser adjusting unit 20 so that the first laser beam L1 and the second laser beam L2 are in a desired state at the pupil position 31a. The condensing position P of the first laser light L1 and the second laser light L2 can be easily and quickly adjusted to a desired position.

  Specifically, as shown in FIG. 7A, the positions or angles of the first laser light L1 and the second laser light L2 at the pupil position 31a of the condenser lens 31, for example, from the state indicated by the broken line to the solid line By adjusting to the state shown by, the condensing position in the X direction or the Y direction can be adjusted from P1 to P2 in the condensing surface by the condensing lens 31. Further, as shown in FIG. 7B, by adjusting the wavefront curvatures of the first laser beam L1 and the second laser beam L2 at the pupil position 31a, for example, from the state indicated by the broken line to the state indicated by the solid line, The condensing position can be adjusted from P3 to P4 in the axis (Z) direction.

If one of the two laser beams to be used is more frequently accompanied by changes in the oscillation parameters such as wavelength, pulse width, beam position, etc., a laser with more frequent changes in the oscillation parameters is replaced with a single laser. It may be preferable to set the second laser light L2 that passes through the adjusting means 10 because only the adjustment of the single laser adjusting means 10 is often required when changing the oscillation parameter.

(Second Embodiment)
FIG. 8 is a schematic configuration diagram of a laser introducing device for a laser microscope according to the second embodiment of the present invention. This laser introducing device 200 is the same as the laser introducing device 100 of the first embodiment except that the single laser adjusting means 40 is also provided in the single optical path of the first laser light L1 reaching the optical element 1 for optical path synthesis.

  Similarly to the single laser adjustment unit 10 and the common laser adjustment unit 20, the single laser adjustment unit 40 includes a position / angle adjustment unit 41 having two mirrors 41a and 41b constituting a reflection optical system, and a relay optical system. And a wavefront curvature adjusting means 42 having two groups of lenses 42a and 42b and a moving stage 42c. The single laser adjusting unit 40 is configured to adjust the position of the incident first laser light L1 on the reference surface 2 and the angle to the reference surface 2 by the two mirrors 41a and 41b of the position / angle adjusting unit 41. At the same time, the wavefront curvature of the first laser beam L1 on the reference plane 2 is adjusted by moving the incident side lens 42a in the optical axis direction via the moving stage 42c of the wavefront curvature adjusting means 42. Since other configurations are the same as those of the first embodiment, the same components are denoted by the same reference numerals, and description thereof is omitted.

  Therefore, according to the present embodiment, the position, angle, and wavefront curvature of the first laser light L1 on the reference surface 2 can be independently adjusted by the single laser adjusting means 40, and the second laser can be adjusted by the single laser adjusting means 10. The position, angle, and wavefront curvature of the light L2 on the reference plane 2 can be adjusted independently, and the first laser is maintained while the relative relationship between the first laser light L1 and the second laser light L2 is maintained by the common laser adjusting means 20. Since the position, angle, and wavefront curvature of the light L1 and the second laser light L2 on the reference surface 2 can be adjusted simultaneously, the first laser light L1 and the first laser light L1 introduced into the laser microscope can be adjusted as in the first embodiment. The two laser beams L2 can be easily and quickly adjusted so as to be condensed at the same position.

  Also in the present embodiment, the reference surface 2 preferably collects the laser beams provided in the laser microscope 30 to which the first laser beam L1 and the second laser beam L2 are introduced, as shown in FIG. It is set to coincide with the pupil position 31a of the condensing lens 31 that emits light or a position conjugate with it.

  In this way, the position, angle, and wavefront curvature of the first laser beam L1 and the second laser beam L2 at the pupil position 31a are adjusted by the corresponding single laser adjusting units 40 and 10, respectively. The condensing position P of the first laser light L1 and the second laser light L2 can be individually adjusted. Further, the position, angle, and wavefront curvature of the first laser beam L1 and the second laser beam L2 at the pupil position 31a are adjusted by the common laser adjusting unit 20, so that the relative relationship between the first laser beam L1 and the second laser beam L2 is adjusted. With the relationship maintained, the condensing position P of the first laser beam L1 and the second laser beam L2 in the laser microscope 30 can be adjusted simultaneously.

(Third embodiment)
FIG. 10 is a schematic configuration diagram of a laser microscope including a laser introduction device according to the third embodiment of the present invention. The laser microscope 50 includes the laser introducing device 100 of the first embodiment shown in FIG. 6, and the first laser beam L1 and the second laser beam L2 are simultaneously or selectively applied to the laser introducing device 100. The laser light emitted from the common laser adjusting means 20 is condensed on the specimen 54 through the galvano scanner 51, the relay lenses 52a and 52b, and the condenser lens 53, and the specimen 54 is collected by the galvano scanner 51. Dimension scanning is performed.

  In the present embodiment, the pupil position 53a of the condensing lens 53 is used as a reference plane, and adjustment is performed by the laser introducing device 100 so that the first laser beam L1 and the second laser beam L2 are in a desired state on the reference plane. .

  Therefore, according to the present embodiment, the position, angle, and wavefront curvature of the second laser light L2 at the pupil position 53a are adjusted using the single laser adjusting means 10, thereby the second laser light L2 with respect to the specimen 54 is adjusted. A condensing position can be adjusted, for example so that it may correspond with the condensing position of the 1st laser beam L1. Further, the first laser light L1 and the second laser light L2 are adjusted by adjusting the position, angle, and wavefront curvature of the first laser light L1 and the second laser light L2 at the pupil position 53a using the common laser adjusting means 20. In this state, the condensing positions of the first laser beam L1 and the second laser beam L2 with respect to the specimen 54 can be adjusted simultaneously.

  Specifically, as shown in the flowchart in FIG. 11, first, the condensing position of the second laser beam L2 with respect to the specimen 54 by the position / angle adjusting unit 11 and / or the wavefront curvature adjusting unit 12 of the single laser adjusting unit 10. Is adjusted to coincide with the condensing position of the first laser beam L1 (step S1). After that, the first laser beam L1 and the second laser beam L2 are kept in the overlapping state of the converging spots, and the first laser beam is adjusted by the position / angle adjusting unit 21 and / or the wavefront curvature adjusting unit 22 of the common laser adjusting unit 20. The condensing positions of the light L1 and the second laser light L2 are adjusted (step S2). As a result, the first laser light L1 and the second laser light L2 can be adjusted easily and quickly so as to be condensed at a desired position of the specimen 54.

(Fourth embodiment)
FIG. 12 is a schematic configuration diagram of a laser microscope including a laser introduction device according to the fourth embodiment of the present invention. This laser microscope 60 includes the laser introducing device 200 of the second embodiment shown in FIG. 8, and the first laser beam L1 and the second laser beam L2 are simultaneously or selectively applied to the laser introducing device 200. The laser light emitted from the common laser adjusting means 20 is condensed on the specimen 64 through the galvano scanner 61, the relay lenses 62a and 62b and the condenser lens 63, and the specimen 64 is collected by the galvano scanner 61. Dimension scanning is performed.

  Also in the present embodiment, the pupil position 63a of the condensing lens 63 is used as a reference plane, and the first laser beam L1 and the second laser beam L2 are adjusted by the laser introducing device 200 on the reference plane so as to be in a desired state. To do.

  Therefore, according to the present embodiment, the position, angle, and wavefront curvature of the first laser beam L1 and the second laser beam L2 at the pupil position 63a are adjusted by the corresponding single laser adjusting units 40 and 10, respectively. The condensing positions of the first laser beam L1 and the second laser beam L2 in the laser microscope 60 can be individually adjusted. Further, the position, angle, and wavefront curvature of the first laser beam L1 and the second laser beam L2 at the pupil position 63a are adjusted by the common laser adjusting unit 20, so that the relative relationship between the first laser beam L1 and the second laser beam L2 is increased. With the relationship maintained, the condensing positions of the first laser beam L1 and the second laser beam L2 in the laser microscope 60 can be adjusted simultaneously. Thereby, the condensing position with respect to the sample 64 of the 1st laser beam L1 and the 2nd laser beam L2 can be adjusted freely.

  Specifically, as shown in the flowchart in FIG. 13, the adjustment by the single laser adjustment unit 10, the single laser adjustment unit 40, or the common laser adjustment unit 20 according to the target laser light whose focus position is to be adjusted (step S <b> 11). I do. That is, when the adjustment target is the first laser beam L1, depending on whether the adjustment direction of the condensing position is in the in-plane direction or the optical axis direction (step S12), in the in-plane direction, the single laser adjustment is performed. Adjustment is made by the position / angle adjustment means 41 of the means 40 (step S13), and in the case of the optical axis direction, adjustment is made by the wavefront curvature adjustment means 42 of the single laser adjustment means 40 (step S14).

  When the adjustment target is the second laser beam L2, depending on whether the adjustment direction of the condensing position is in the in-plane direction or the optical axis direction (step S15), in the in-plane direction, single laser adjustment is performed. Adjustment is made by the position / angle adjustment means 11 of the means 10 (step S16), and in the case of the optical axis direction, adjustment is made by the wavefront curvature adjustment means 12 of the single laser adjustment means 10 (step S17).

  Further, when the adjustment targets are the first laser beam L1 and the second laser beam L2, depending on whether the adjustment direction of the condensing position is the in-plane direction or the optical axis direction (step S18), In this case, adjustment is made by the position / angle adjustment means 21 of the common laser adjustment means 20 (step S19), and in the case of the optical axis direction, adjustment is made by the wavefront curvature adjustment means 22 of the common laser adjustment means 20 (step S20). .

In addition, this invention is not limited only to the said embodiment, Many deformation | transformation or a change is possible. For example, in the above embodiment, each of the position / angle adjustment means of the single laser adjustment means and the common laser adjustment means is constituted by two mirrors that can be rotated and displaced about axes orthogonal to each other. as shown in a) ~ (c), one of the lenses of the second group of lenses 72a and 72b, for example, a lens 72b on the exit side and displaceably configuration, by displacing the lens 72b, the optical axes _{O 1} By decentering with respect to the reference optical axis O ₀ , the position and angle of the laser light L on the reference surface can be adjusted.

  The wavefront curvature adjusting means is not limited to a relay optical system including a lens movable in the optical axis direction, and has at least a shape variable mirror that reflects laser light, and changes the shape of the reflection surface of the shape variable mirror. Thus, the wavefront curvature of the laser beam on the reference plane can be adjusted.

  In the above embodiment, the two laser beams, the first laser beam L1 and the second laser beam L2, are introduced. However, the present invention is effectively applied to the case where three or more laser beams are introduced. can do. For example, when three laser beams are introduced, a single laser adjustment unit is provided in each single optical path of the two laser beams and a common laser adjustment unit is provided in a common optical path of the three laser beams, or A single laser adjustment unit is provided in each single optical path of the three laser beams, and a common laser adjustment unit is provided in the common optical path of the three laser beams, so that the three laser beams are collected at desired positions in the laser microscope. Can be light.

  Furthermore, in the above-described embodiment, the single laser adjustment unit and the common laser adjustment unit are configured to be able to adjust three adjustment target items of the position, angle, and wavefront curvature of the laser beam, respectively. Of these, only one, for example, the focal position of the laser beam with respect to the laser microscope can be adjusted, or any two items can be adjusted.

It is a conceptual diagram which shows the fundamental structure of the laser introduction apparatus for laser microscopes concerning 1st Embodiment of this invention. It is a schematic block diagram inside a single laser adjustment means and a common laser adjustment means shown in FIG. It is a figure for demonstrating the position of the laser beam in a reference plane. It is a figure for demonstrating the angle of the laser beam in a reference plane. It is a figure for demonstrating the wavefront curvature of the laser beam in a reference plane. It is a figure which shows the case where the reference plane is set to the pupil position of a condensing lens in 1st Embodiment. It is a figure for demonstrating the adjustment aspect of the condensing position by the structure of FIG. It is a schematic block diagram of the laser introduction apparatus for laser microscopes concerning 2nd Embodiment of this invention. It is a figure which shows the case where the reference plane is set to the pupil position of a condensing lens in 2nd Embodiment. It is a schematic block diagram of a laser microscope provided with the laser introduction apparatus which concerns on 3rd Embodiment of this invention. It is a flowchart which shows adjustment operation of the laser beam condensing position by the laser microscope of 3rd Embodiment. It is a schematic block diagram of a laser microscope provided with the laser introduction apparatus which concerns on 4th Embodiment of this invention. It is a flowchart which shows adjustment operation of the laser beam condensing position by the laser microscope of 4th Embodiment. It is a figure for demonstrating the modification of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Optical path composition optical element 2 Reference surface 10, 40 Single laser adjustment means 20 Common laser adjustment means 11, 21, 41 Position / angle adjustment means 12, 22, 42 Wavefront curvature adjustment means 11a, 11b, 21a, 21b, 41a, 42b Mirror 12a, 12b, 22a, 22b, 42a, 42b Lens 12c, 22c, 42c Moving stage 30, 50, 60 Laser microscope 31, 53, 63 Condensing lens 31a, 53a, 63a Pupil position 54, 64 Sample 72a, 72b Lens 100, 200 Laser introduction device

Claims (10)

A laser introduction device for a laser microscope for introducing a plurality of laser beams into a laser microscope,
A single laser adjusting means which is provided in a single optical path of one laser beam and adjusts the state of introduction of the laser beam into the laser microscope;
State of introduction of the at least two laser lights into the laser microscope provided in common to the at least two laser lights in a common optical path of at least two laser lights including the laser light that has passed through the single laser adjusting means A common laser adjustment means for simultaneously adjusting
The single laser adjustment means and said common laser adjusting device, even without less, the wavefront curvature adjusting means for adjusting the wavefront curvature of the laser beam of the plurality of laser light provided to the laser microscope to the pupil of the lens for focusing Have
A laser introducing device for a laser microscope characterized by the above.   The wavefront curvature adjusting means has a relay optical system including a lens that can move at least in the optical axis direction, and adjusts the wavefront curvature of the laser light to the pupil by moving the lens in the optical axis direction. The laser introducing device for a laser microscope according to claim 1, wherein the laser introducing device is configured.   The wavefront curvature adjusting means includes at least a variable shape mirror, and is configured to adjust a wavefront curvature of laser light to the pupil by changing a reflection surface shape of the variable shape mirror. The laser introduction apparatus for laser microscopes as described.   The said single laser adjustment means and the said common laser adjustment means each further have a position adjustment means to adjust the position of the laser beam to the said pupil, The Claim 1 characterized by the above-mentioned. Laser introduction device for laser microscope.   The position adjusting means has a reflection optical system including a displaceable mirror for adjusting a reflection angle of the laser beam, and is configured to adjust the position of the laser beam to the pupil by displacing the mirror. The laser introducing device for a laser microscope according to claim 4.   The position adjusting means has a displaceable lens that refracts and transmits laser light, and displaces the lens so that its optical axis is decentered with respect to a reference optical axis, whereby the position of the laser light to the pupil The laser introducing device for a laser microscope according to claim 4, wherein the laser introducing device is adjusted.   The laser according to claim 1, wherein each of the single laser adjustment unit and the common laser adjustment unit includes an angle adjustment unit that adjusts an angle of laser light to the pupil. Microscope laser introduction device.   The angle adjusting means has a reflection optical system including a displaceable mirror for adjusting the reflection angle of the laser beam, and is configured to adjust the angle of the laser beam to the pupil by displacing the mirror. The laser introducing device for a laser microscope according to claim 7.   The angle adjusting means has a displaceable lens that refracts and transmits laser light, and displaces the lens so that its optical axis is decentered with respect to a reference optical axis, whereby the angle of the laser light to the pupil The laser introduction device for a laser microscope according to claim 7, wherein the laser introduction device is configured to adjust the angle.   A laser microscope comprising the laser introduction device for a laser microscope according to any one of claims 1 to 9.

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