JP5360527B2 - Pretreatment method for electroless plating on magnetic materials - Google Patents

Pretreatment method for electroless plating on magnetic materials Download PDF

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JP5360527B2
JP5360527B2 JP2008117046A JP2008117046A JP5360527B2 JP 5360527 B2 JP5360527 B2 JP 5360527B2 JP 2008117046 A JP2008117046 A JP 2008117046A JP 2008117046 A JP2008117046 A JP 2008117046A JP 5360527 B2 JP5360527 B2 JP 5360527B2
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孝志 渡辺
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Fuji Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a pretreatment method for a magnetic material, which imparts a stronger adhesion to a plated film which has been formed than a conventional pretreatment method such as a treatment of activating the surface with palladium, which is conducted for enhancing the adhesiveness of the plated film, when subjecting the magnetic material to electroless plating treatment. <P>SOLUTION: The pretreatment method prior to the electroless plating treatment for the magnetic material includes previously treating the magnetic material in an aqueous solution which contains a boron hydride compound and/or a derivative thereof and is adjusted to alkalinity of a pH of 9 or higher. This method is preferably employed when the magnetic material is ferrite. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、磁性材料への無電解めっきの前処理方法に関する。   The present invention relates to a pretreatment method for electroless plating on a magnetic material.

フェライトは、磁性材料の代表であり、酸化鉄を主成分とするセラミックの総称である。   Ferrite is a representative of magnetic materials and is a general term for ceramics mainly composed of iron oxide.

磁性材料、例えばフェライトへの無電解めっきの場合、めっき膜の密着性が低いという問題がある。フェライトへのめっき膜の密着性を向上させるためには、特殊な前処理が必要で、乾式めっき方法、パラジウム表面活性化処理方法のいずれかが一般的に使用される。例えば、特許文献1では、湿式電解めっきに対する前処理として乾式めっきを行っている。また、特許文献2では、パラジウム表面活性化処理を行った後、無電解めっきを行っている。   In the case of electroless plating on a magnetic material such as ferrite, there is a problem that the adhesion of the plating film is low. In order to improve the adhesion of the plating film to the ferrite, a special pretreatment is required, and either a dry plating method or a palladium surface activation treatment method is generally used. For example, in Patent Document 1, dry plating is performed as a pretreatment for wet electrolytic plating. In Patent Document 2, electroless plating is performed after the palladium surface activation treatment.

乾式めっき方法を前処理とする無電解めっき方法は、スパッタ等で1000〜3000Å程度成膜した皮膜上に無電解めっきを実施する方法である。即ち、1000〜3000Å程度の膜を成膜する成膜工程と、形成された被膜表面を活性化する活性化処理工程と、無電解めっき工程の3工程で実施する方法である。   An electroless plating method using a dry plating method as a pretreatment is a method in which electroless plating is performed on a film having a thickness of about 1000 to 3000 mm formed by sputtering or the like. That is, it is a method that is performed in three steps: a film forming step for forming a film of about 1000 to 3000 mm, an activation treatment step for activating the formed film surface, and an electroless plating step.

一方、パラジウム表面活性化処理方法は、密着向上を狙い、酸でエッチング後にパラジウムの触媒処理を実施し、このパラジウム触媒を起点にして無電解めっきを成膜する方法である。即ち、まず、磁性材料表面をエッチングするエッチング工程と、磁性材料表面に触媒であるパラジウムを付与する触媒付与工程と、付与された触媒を活性化する触媒活性化工程と、無電解めっき工程の4工程で実施する方法である。   On the other hand, the palladium surface activation treatment method is a method of aiming at adhesion improvement, performing a catalyst treatment of palladium after etching with an acid, and forming an electroless plating film starting from this palladium catalyst. That is, first, an etching process for etching the surface of the magnetic material, a catalyst application process for applying palladium as a catalyst to the surface of the magnetic material, a catalyst activation process for activating the applied catalyst, and an electroless plating process. It is a method carried out in a process.

また、特許文献3には、フェライトをハロゲン化パラジウム含有溶液で前処理した後、導電性金属塩、還元剤および水酸化ホウ素化合物を含むアルカリ性水溶液からなるめっき液と接触させてフェライト上に導電性金属膜を形成する導電性金属被膜つきフェライトの製造方法が開示されている。   Further, in Patent Document 3, after pretreatment of ferrite with a solution containing palladium halide, the ferrite is brought into contact with a plating solution made of an alkaline aqueous solution containing a conductive metal salt, a reducing agent and a boron hydroxide compound, so that the conductivity is provided on the ferrite. A method for producing a ferrite with a conductive metal film forming a metal film is disclosed.

特開昭60−24382号公報JP-A-60-24382 特開2005−194542号公報JP 2005-194542 A 特開昭64−57799号公報JP-A 64-57799

いずれの方法も、工程が複雑かつ多段階であり、十分な成膜後のめっき密着を確保することが難しい。   Both methods have complicated and multi-stage processes, and it is difficult to ensure sufficient plating adhesion after film formation.

また、特許文献3で、水酸化ホウ素化合物が用いられてはいるものの、前処理に水酸化ホウ素化合物が用いられているのではなく、めっき液の一成分として用いられているのみであり、実施例と比較例の対比からめっき液の一成分として水酸化ホウ素化合物を用いることの効果は記載されているものの、水酸化ホウ素化合物が果たす機能・メカニズムについては何も開示されていない。   Further, in Patent Document 3, although a boron hydroxide compound is used, the boron hydroxide compound is not used for pretreatment, but only as a component of the plating solution. Although the effect of using a boron hydroxide compound as one component of the plating solution is described from the comparison between the example and the comparative example, nothing is disclosed about the function and mechanism of the boron hydroxide compound.

上述のような状況に鑑み、本発明は、パラジウム表面活性化処理等の従来の前処理方法に比べて、成膜後に強固なめっき密着を得られる磁性材料への前処理方法を提供することにある。   In view of the situation as described above, the present invention provides a pretreatment method for a magnetic material capable of obtaining strong plating adhesion after film formation as compared with conventional pretreatment methods such as palladium surface activation treatment. is there.

即ち、本発明の磁性材料への無電解めっきの前処理方法は、水素化ホウ素系化合物および/またはその誘導体、およびpH調整剤からなる水溶液で磁性材料を処理することを特徴とする。
更に、本発明は、磁性材料の無電解めっき方法を包含する。この無電解メッキ方法は、(a)水素化ホウ素系化合物および/またはその誘導体、およびpH調整剤からなる水溶液で磁性材料を処理する工程と、(b)工程(a)で処理した磁性材料を、水洗後、未乾燥の状態で無電解めっきする工程とを含むことを特徴とする。
That is, the pretreatment method of electroless plating on a magnetic material according to the present invention is characterized in that the magnetic material is treated with an aqueous solution comprising a borohydride compound and / or a derivative thereof, and a pH adjuster.
Furthermore, the present invention includes a method for electroless plating of a magnetic material. This electroless plating method includes the steps of (a) treating a magnetic material with an aqueous solution comprising a borohydride compound and / or derivative thereof , and a pH adjuster; and (b) treating the magnetic material treated in step (a). And a step of electroless plating in an undried state after washing with water.

本発明の無電解めっきの前処理方法によれば、磁性材料と直接めっき反応が起こるため、密着が良好となり、かつ、エッチングによる基板の強度低下がない。また、高価な貴金属系の触媒を使用しないため、めっき前処理の直材のコストダウン可能であるという特徴を有する。また、本発明によれば、水素化ホウ素系化合物またはその誘導体の水溶液への浸漬工程と、無電解めっき工程の2工程で無電解めっきを行うことができるので、工数の低減が可能となる。   According to the pretreatment method of electroless plating of the present invention, since a direct plating reaction occurs with the magnetic material, adhesion is good and there is no reduction in the strength of the substrate due to etching. Further, since an expensive noble metal-based catalyst is not used, the cost of the direct material for the plating pretreatment can be reduced. In addition, according to the present invention, since the electroless plating can be performed in two steps of the borohydride compound or its derivative in an aqueous solution and the electroless plating step, the number of steps can be reduced.

本発明においては、無電解めっきの前処理として、水素化ホウ素系化合物および/またはその誘導体の水溶液で磁性材料を処理する。   In the present invention, as a pretreatment for electroless plating, a magnetic material is treated with an aqueous solution of a borohydride compound and / or a derivative thereof.

水素化ホウ素系化合物としては、水素化ホウ素ナトリウム、水素化ホウ素カリウム、水素化ホウ素リチウムなどを挙げることができ、水素化ホウ素系化合物の誘導体としては、ジメチルアミンボラン、トリメチルアミンボランなどのアルキルアミンボランを挙げることができる。水素化ホウ素系化合物やその誘導体としては単独の化合物であってもよく複数の化合物の混合物であってもよい。   Examples of the borohydride compounds include sodium borohydride, potassium borohydride, lithium borohydride, and the like. Derivatives of the borohydride compounds include alkylamine boranes such as dimethylamine borane and trimethylamine borane. Can be mentioned. The borohydride compound or derivative thereof may be a single compound or a mixture of a plurality of compounds.

無電解めっきの対象となる磁性材料としては、フェライトが好ましく用いられ、磁性材料として、フェライトを用いた場合に本発明の前処理方法が好適となる。   Ferrite is preferably used as the magnetic material to be electrolessly plated, and the pretreatment method of the present invention is suitable when ferrite is used as the magnetic material.

本発明における磁性材料への前処理の実施方法は、濃度と温度を設定した前記水溶液への浸漬である。この水溶液は上述の水素化ホウ素系化合物の水溶液であってもよく、水素化ホウ素系化合物の誘導体の水溶液であってもよく、両者の混合物の水溶液であってもよい。磁性材料、例えばフェライトを水素化ホウ素系化合物および/またはその誘導体の水溶液に浸漬すると、磁性材料の表面は、水素化ホウ素系化合物および/またはその誘導体により、還元反応が進行し、酸化鉄の一部が金属鉄に還元されるか、ホウ素化物に変化する。この反応過程では、水素ガスが発生する。   In the present invention, the pretreatment method for the magnetic material is immersion in the aqueous solution in which the concentration and temperature are set. This aqueous solution may be an aqueous solution of the above-described borohydride compound, an aqueous solution of a derivative of a borohydride compound, or an aqueous solution of a mixture of both. When a magnetic material such as ferrite is immersed in an aqueous solution of a borohydride compound and / or derivative thereof, a reduction reaction proceeds on the surface of the magnetic material by the borohydride compound and / or derivative thereof, and one surface of iron oxide is obtained. Part is reduced to metallic iron or converted to boride. In this reaction process, hydrogen gas is generated.

この金属鉄やホウ素化物が無電解めっきの反応起点となる。   This metallic iron or boride is the reaction starting point for electroless plating.

前処理に使用する前記水溶液の濃度については還元反応を生じさせる濃度であれば特に限定はなく、濃度の最低は、還元反応が可能な最低の濃度であり、温度、時間、処理量により調整する。濃度の上限は、水素化ホウ素系化合物および/または誘導体が溶媒である水に可溶な上限である。   The concentration of the aqueous solution used for the pretreatment is not particularly limited as long as it causes a reduction reaction, and the minimum concentration is the lowest concentration at which a reduction reaction is possible, and is adjusted by temperature, time, and throughput. . The upper limit of the concentration is an upper limit where the borohydride compound and / or derivative is soluble in water as a solvent.

前処理温度は、常温から沸騰点まで使用可能であるが、50〜80℃の温度範囲とすることが好ましい。   The pretreatment temperature can be used from room temperature to the boiling point, but is preferably in the temperature range of 50 to 80 ° C.

前記水溶液は、pHが9以上のアルカリ性に調整して用いるのが好ましい。PHが9未満では、自己分解が極端に多くなり、結果として反応活性が劣ることになる。この水溶液の調整には水酸化ナトリウムなどのアルカリ金属水酸化物が好ましく用いられる。   The aqueous solution is preferably used by adjusting the pH to 9 or higher. When PH is less than 9, self-decomposition becomes extremely large, resulting in poor reaction activity. For the adjustment of this aqueous solution, an alkali metal hydroxide such as sodium hydroxide is preferably used.

浸漬時間は、使用する薬品、温度、濃度により異なるが、一般的には1〜180分の範囲とすることが好ましい。   The immersion time varies depending on the chemicals used, the temperature, and the concentration, but is generally preferably in the range of 1 to 180 minutes.

浸漬後は、水洗後、未乾燥の状態で、無電解めっき浴へ持込めばよい。無電解めっき浴へ持込むことで、無電解めっき反応が、還元された金属鉄またはほう素化物を起点に開始し、所定のめっき成膜が実施できる。   After immersion, after washing with water, it may be brought into an electroless plating bath in an undried state. By bringing it into the electroless plating bath, the electroless plating reaction starts from the reduced metallic iron or boride, and a predetermined plating film can be formed.

無電解めっきで被膜を形成するための金属化合物、還元剤、めっき条件等は、通常の無電解めっきで用いられるものであればいずれも用いることができる。   Any metal compound, reducing agent, plating conditions, etc. for forming a film by electroless plating can be used as long as they are used in normal electroless plating.

以下、実施例を用いて本発明をさらに説明する。   The present invention will be further described below using examples.

<実施例1>
フェライトからなる磁性材料をpH=10、濃度40g/L、温度60℃の水素化ホウ素ナトリウム水溶液に2時間浸漬した後、無電解Cuめっきを施した。成膜後の密着力を、2mm幅ピール試験により測定した。その結果を表1に示す。
<Example 1>
A magnetic material made of ferrite was immersed in an aqueous solution of sodium borohydride at pH = 10, a concentration of 40 g / L, and a temperature of 60 ° C. for 2 hours, and then subjected to electroless Cu plating. The adhesion after film formation was measured by a 2 mm width peel test. The results are shown in Table 1.

<実施例2>
フェライトからなる磁性材料をpH=11、濃度30g/L、温度70℃のジメチルアミンボラン水溶液に2時間浸漬した後、無電解Cuめっきを施した。成膜後の密着力を、2mm幅ピール試験により測定した。その結果を表1に示す。
<Example 2>
A magnetic material made of ferrite was immersed in an aqueous dimethylamine borane solution having a pH of 11, a concentration of 30 g / L, and a temperature of 70 ° C. for 2 hours, and then subjected to electroless Cu plating. The adhesion after film formation was measured by a 2 mm width peel test. The results are shown in Table 1.

<比較例1>
フェライトからなる磁性材料表面に2.5時間スパッタでCrを成膜して、3000Åの膜を形成した。次いで、10%硫酸水溶液に0.5時間浸漬してその表面の活性化処理を行った後、無電解Cuめっきを施した。成膜後の密着力を、2mm幅ピール試験により測定した。その結果を表1に示す。Cr成膜及び活性化処理に要した全前処理時間は、3時間である。
<Comparative Example 1>
A Cr film was formed on the surface of the magnetic material made of ferrite by sputtering for 2.5 hours to form a 3000 mm film. Next, after immersing in a 10% sulfuric acid aqueous solution for 0.5 hours to perform activation treatment on the surface, electroless Cu plating was performed. The adhesion after film formation was measured by a 2 mm width peel test. The results are shown in Table 1. The total pretreatment time required for the Cr film formation and activation treatment is 3 hours.

<比較例2〜5>
フェライトからなる磁性材料表面に凹凸を設けるためのエッチング処理後、めっき反応の起点となるパラジウム触媒付与とその触媒の活性化処理後に無電解Cuめっきを実施した。エッチングは、5%程度の弗化水素酸水溶液を用いて行った。エッチングは、密着を確保する重要な工程であり、処理時間により、密着力が変化するので、比較例2では14時間、比較例3では23時間、比較例4では72時間、比較例5では105時間かけてエッチングを行った。いずれの比較例もエッチング処理後のパラジウム触媒付与に0.5時間、触媒活性化処理に0.5時間かかった。無電解Cuめっきによる成膜後の密着力を、2mm幅ピール試験により測定した。その結果を表1に示す。
<Comparative Examples 2-5>
After the etching treatment for providing irregularities on the surface of the magnetic material made of ferrite, the electroless Cu plating was performed after the application of the palladium catalyst as the starting point of the plating reaction and the activation treatment of the catalyst. Etching was performed using about 5% hydrofluoric acid aqueous solution. Etching is an important process to ensure adhesion, and the adhesion force varies depending on the processing time. Therefore, Comparative Example 2 is 14 hours, Comparative Example 3 is 23 hours, Comparative Example 4 is 72 hours, and Comparative Example 5 is 105 hours. Etching was performed over time. In any of the comparative examples, it took 0.5 hour for the application of the palladium catalyst after the etching treatment and 0.5 hour for the catalyst activation treatment. The adhesion after film formation by electroless Cu plating was measured by a 2 mm width peel test. The results are shown in Table 1.

Figure 0005360527
Figure 0005360527

表1から明らかなように、比較例1に示す乾式めっき前処理法では前処理に3時間、比較例2〜5に示すエッチング及びパラジウム活性化による前処理法では前処理に15時間以上かかっており、しかも無電解Cuめっきで形成された膜の密着性は弗酸エッチング14時間で0.037N(3.8gf)、弗酸エッチング105時間でも0.314N(32.0gf)と実施例1、2で得られた無電解Cuめっき膜の密着性に比べて劣っていることがわかる。   As is apparent from Table 1, the dry plating pretreatment method shown in Comparative Example 1 takes 3 hours for the pretreatment, and the pretreatment methods for etching and palladium activation shown in Comparative Examples 2 to 5 take 15 hours or more. Moreover, the adhesion of the film formed by electroless Cu plating was 0.037 N (3.8 gf) after 14 hours of hydrofluoric acid etching, and 0.314 N (32.0 gf) after 105 hours of hydrofluoric acid etching. 2 is inferior to the adhesion of the electroless Cu plating film obtained in 2.

即ち、本発明の前処理方法によれば、従来の前処理方法に比べて、より短時間で、強固な密着を得ることができることがわかる。   That is, according to the pretreatment method of the present invention, it can be seen that firm adhesion can be obtained in a shorter time than the conventional pretreatment method.

<比較実施例1>
フェライトからなる磁性材料をpH=10、濃度5〜50g/L、温度20〜70℃の水素化ホウ素ナトリウム水溶液に0.5〜3時間浸漬する前処理を施した後、無電解Cuめっきを施した。成膜後のめっき膜の密着力を、2mm幅ピール試験により測定した。
<Comparative Example 1>
A pretreatment is performed in which a magnetic material made of ferrite is immersed in an aqueous solution of sodium borohydride at pH = 10, a concentration of 5 to 50 g / L, and a temperature of 20 to 70 ° C. for 0.5 to 3 hours, and then electroless Cu plating is applied. did. The adhesion of the plated film after film formation was measured by a 2 mm width peel test.

浸漬時間を2時間に固定して、水素化ホウ素ナトリウム水溶液の濃度、温度を変化させたときのめっき膜の密着力の変化を図1に示す。   FIG. 1 shows changes in the adhesion of the plating film when the immersion time is fixed at 2 hours and the concentration and temperature of the sodium borohydride aqueous solution are changed.

また、水素化ホウ素ナトリウム濃度5g/L、温度60℃の場合、水素化ホウ素ナトリウム濃度20g/L、温度20℃の場合、及び水素化ホウ素ナトリウム濃度40g/L、温度50℃の場合について、浸漬処理時間を変化させたときのめっき膜の密着力の変化を図2に示す。   Further, when the sodium borohydride concentration is 5 g / L and the temperature is 60 ° C., the sodium borohydride concentration is 20 g / L and the temperature is 20 ° C., and the sodium borohydride concentration is 40 g / L and the temperature is 50 ° C. FIG. 2 shows changes in the adhesion of the plating film when the processing time is changed.

図1から、水素化ホウ素ナトリウム濃度30〜50g/L、温度60〜70℃、2hrの浸漬処理では、比較例1に示す乾式めっき前処理法と同程度以上の密着力を確保可能であることがわかる。一方、図1、2に示すように30g/L未満の低濃度、あるいは、図2に示すように2hr未満の処理時間では、十分な密着力が得られないことがわかる。   From FIG. 1, it is possible to ensure an adhesive strength equal to or higher than that of the dry plating pretreatment method shown in Comparative Example 1 in the immersion treatment at a sodium borohydride concentration of 30 to 50 g / L, a temperature of 60 to 70 ° C., and 2 hours. I understand. On the other hand, it can be seen that sufficient adhesion cannot be obtained at a low concentration of less than 30 g / L as shown in FIGS. 1 and 2 or at a treatment time of less than 2 hr as shown in FIG.

<比較実施例2>
フェライトからなる磁性材料をpH=11、濃度10〜30g/L、温度50〜70℃のジメチルアミンボラン水溶液に0.5〜2時間浸漬する前処理を施した後、無電解Cuめっきを施した。成膜後のめっき膜の密着力を、2mm幅ピール試験により測定した。
<Comparative Example 2>
A pretreatment of immersing a magnetic material made of ferrite in a dimethylamine borane aqueous solution having a pH = 11, a concentration of 10 to 30 g / L, and a temperature of 50 to 70 ° C. for 0.5 to 2 hours, followed by electroless Cu plating . The adhesion of the plated film after film formation was measured by a 2 mm width peel test.

ジメチルアミンボラン水溶液の濃度を10g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を図3に示す。   FIG. 3 shows changes in the adhesion of the plating film when the concentration of the aqueous dimethylamine borane solution is fixed at 10 g / L and the aqueous solution temperature and the immersion time are changed.

また、ジメチルアミンボラン水溶液の濃度を20g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を図4に、ジメチルアミンボラン水溶液の濃度を30g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を図5に示す。   FIG. 4 shows the change in adhesion of the plating film when the concentration of the aqueous dimethylamine borane solution is fixed at 20 g / L and the aqueous solution temperature and immersion time are changed. The concentration of the aqueous dimethylamine borane solution is 30 g / L. FIG. 5 shows the change in the adhesion of the plating film when the aqueous solution temperature and the immersion time are changed.

図3〜5に示したように、ジメチルアミンボランも、比較実施例1の水素化ホウ素ナトリウムと同様に濃度、温度、処理時間により、磁性材料との密着力は変化した。   As shown in FIGS. 3 to 5, dimethylamine borane also changed its adhesion with the magnetic material depending on the concentration, temperature, and treatment time, similar to sodium borohydride in Comparative Example 1.

従来の乾式めっき(スパッタ)と同程度の密着力0.294N(30gf)を得るためには、濃度10g/Lで70℃以上、且つ処理時間1時間以上、あるいは、20〜30g/Lで60℃以上且つ1時間以上とすればよいことが図3〜5からわかる。   In order to obtain an adhesion strength of 0.294 N (30 gf) similar to that of conventional dry plating (sputtering), a concentration of 10 g / L is 70 ° C. or more and a treatment time is 1 hour or more, or 20 to 30 g / L is 60 It can be seen from FIGS.

浸漬時間を2時間に固定して、水素化ホウ素ナトリウム水溶液の濃度、温度を変化させたときのめっき膜の密着力の変化を示す図である。It is a figure which shows the change of the adhesive force of a plating film when fixing immersion time to 2 hours and changing the density | concentration and temperature of sodium borohydride aqueous solution. 水素化ホウ素ナトリウム濃度5g/L、温度60℃の場合、水素化ホウ素ナトリウム濃度20g/L、温度20℃の場合、及び水素化ホウ素ナトリウム濃度40g/L、温度50℃の場合について、浸漬処理時間を変化させたときのめっき膜の密着力の変化を示す図である。Immersion treatment time for sodium borohydride concentration 5 g / L, temperature 60 ° C., sodium borohydride concentration 20 g / L, temperature 20 ° C., and sodium borohydride concentration 40 g / L, temperature 50 ° C. It is a figure which shows the change of the adhesive force of the plating film when changing this. ジメチルアミンボラン水溶液の濃度を10g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を示す図である。It is a figure which shows the change of the adhesive force of a plating film when the density | concentration of dimethylamine borane aqueous solution is fixed to 10 g / L, and aqueous solution temperature and immersion time are changed. ジメチルアミンボラン水溶液の濃度を20g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を示す図である。It is a figure which shows the change of the adhesive force of a plating film when the density | concentration of dimethylamine borane aqueous solution is fixed to 20 g / L, and aqueous solution temperature and immersion time are changed. ジメチルアミンボラン水溶液の濃度を30g/Lに固定して、水溶液温度と浸漬時間を変化させたときのめっき膜の密着力の変化を示す図である。It is a figure which shows the change of the adhesive force of a plating film when the density | concentration of dimethylamine borane aqueous solution is fixed to 30 g / L, and aqueous solution temperature and immersion time are changed.

Claims (4)

水素化ホウ素系化合物および/またはその誘導体、およびpH調整剤からなる水溶液で磁性材料を処理することを特徴とする磁性材料への無電解めっきの前処理方法。   A pretreatment method for electroless plating on a magnetic material, characterized by treating the magnetic material with an aqueous solution comprising a borohydride compound and / or a derivative thereof, and a pH adjuster. 前記水溶液がpHを9以上のアルカリ性に調整してなるものであることを特徴とする請求項1記載の磁性材料への無電解めっきの前処理方法。   2. The pretreatment method for electroless plating on a magnetic material according to claim 1, wherein the aqueous solution is prepared by adjusting the pH to an alkalinity of 9 or more. 前記磁性材料がフェライトであることを特徴とする請求項1または2記載の磁性材料への無電解めっきの前処理方法。   The pretreatment method for electroless plating on a magnetic material according to claim 1 or 2, wherein the magnetic material is ferrite. (a) 水素化ホウ素系化合物および/またはその誘導体、およびpH調整剤からなる水溶液で磁性材料を処理する工程と、
(b) 工程(a)で処理した磁性材料を、水洗後、未乾燥の状態で無電解めっきする工程と
を含むことを特徴とする磁性材料の無電解めっき方法。
(A) treating the magnetic material with an aqueous solution comprising a borohydride compound and / or derivative thereof , and a pH adjuster ;
(B) A method of electroless plating of a magnetic material, comprising the step of electroless plating the magnetic material treated in step (a) after washing with water and in an undried state.
JP2008117046A 2008-04-28 2008-04-28 Pretreatment method for electroless plating on magnetic materials Expired - Fee Related JP5360527B2 (en)

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