JP5356769B2 - Mounting table - Google Patents

Mounting table Download PDF

Info

Publication number
JP5356769B2
JP5356769B2 JP2008266479A JP2008266479A JP5356769B2 JP 5356769 B2 JP5356769 B2 JP 5356769B2 JP 2008266479 A JP2008266479 A JP 2008266479A JP 2008266479 A JP2008266479 A JP 2008266479A JP 5356769 B2 JP5356769 B2 JP 5356769B2
Authority
JP
Japan
Prior art keywords
mounting
wafer
mounting table
tyco
mounting body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2008266479A
Other languages
Japanese (ja)
Other versions
JP2010098056A (en
Inventor
榮一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2008266479A priority Critical patent/JP5356769B2/en
Priority to TW098134784A priority patent/TWI487047B/en
Priority to KR1020090097783A priority patent/KR101557507B1/en
Priority to CN2009102041594A priority patent/CN101728298B/en
Publication of JP2010098056A publication Critical patent/JP2010098056A/en
Application granted granted Critical
Publication of JP5356769B2 publication Critical patent/JP5356769B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2865Holding devices, e.g. chucks; Handlers or transport devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/04Housings; Supporting members; Arrangements of terminals
    • G01R1/0408Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2601Apparatus or methods therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2884Testing of integrated circuits [IC] using dedicated test connectors, test elements or test circuits on the IC under test

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

本発明は、ウエハ等の被検査体の電気的特性検査を行う際に、被検査体を載置する載置台に関し、更に詳しくは、例えばタイコウエハのように外周縁部の環状突起で囲まれた凹陥部を有する被検査体に用いられる載置台に関する。   The present invention relates to a mounting table on which an object to be inspected is placed when inspecting an electrical property of the object to be inspected such as a wafer, and more specifically, for example, surrounded by an annular protrusion at an outer peripheral edge like a Tyco wafer. The present invention relates to a mounting table used for an object to be inspected having a recess.

検査装置は、一般に、被検査体(例えば、ウエハ)を搬送するローダ室と、ローダ室から搬送されたウエハの電気的特性検査を行うプローバ室と、を備えている。プローバ室は、ウエハを載置する移動可能な載置台と、載置台の上方に配置されたプローブカードと、ウエハの複数の電極パッドとプローブカードの複数のプローブとのアライメントを行うアライメント機構と、を備え、アライメント後のウエハの複数の電極パッドと複数のプローブとを電気的に接触させ、テスタからの検査用信号に基づいて所定の電気的特性検査を行う。   In general, an inspection apparatus includes a loader chamber for transferring an object to be inspected (for example, a wafer) and a prober chamber for inspecting electrical characteristics of the wafer transferred from the loader chamber. The prober chamber includes a movable mounting table for mounting a wafer, a probe card disposed above the mounting table, an alignment mechanism for aligning a plurality of electrode pads on the wafer and a plurality of probes on the probe card, The plurality of electrode pads and the plurality of probes on the aligned wafer are brought into electrical contact with each other, and a predetermined electrical characteristic inspection is performed based on an inspection signal from the tester.

載置台は、例えば図7の(a)に示すように、ウエハ(図示せず)を載置するトッププレート1と、トッププレート1と一体化された絶縁体2と、を備え、昇降体3を介してXYステージ(図示せず)上で昇降可能に構成されている。トッププレート1の上面には吸着手段が形成され、吸着手段を介してウエハがトッププレーの上面に吸着、固定される。   For example, as shown in FIG. 7A, the mounting table includes a top plate 1 on which a wafer (not shown) is mounted, and an insulator 2 integrated with the top plate 1. It can be moved up and down on an XY stage (not shown). Adsorption means is formed on the upper surface of the top plate 1, and the wafer is adsorbed and fixed to the upper surface of the top play via the adsorption means.

ウエハの電気的特性検査を行う時には、ウエハが吸着手段を介してトッププレート1の上面に吸着、固定された後、載置台がXYステージを介して水平方向に移動する共にトッププレート1が昇降体を介して昇降し、ウエハの複数の電極パッドとプローブカードの複数のプローブとが電気的に接触し、所定の電気的特性検査が行われる。   When electrical characteristics inspection of a wafer is performed, after the wafer is sucked and fixed on the upper surface of the top plate 1 via the suction means, the mounting table moves in the horizontal direction via the XY stage and the top plate 1 is lifted and lowered. The plurality of electrode pads on the wafer and the plurality of probes on the probe card are in electrical contact with each other, and a predetermined electrical property inspection is performed.

而して、トッププレート1は、図7の(b)に示すように、例えばアルミナ等のセラミックス焼結体1Aと、このセラミック焼結体1Aの上面に形成された金等の導電性金属からなる導体被膜1Bと、を有している。導体被膜1Bは、例えばイオンプレーティング等によって電極として形成されている。電極1Bは、テスタ側に接続され、テスタ側から所定の検査用信号が印加される。また、絶縁体2は、ジルコンコージライト等のセラミック焼結体によって形成されている。   Thus, as shown in FIG. 7B, the top plate 1 is made of a ceramic sintered body 1A such as alumina and a conductive metal such as gold formed on the upper surface of the ceramic sintered body 1A. A conductor coating 1B. The conductor coating 1B is formed as an electrode by, for example, ion plating. The electrode 1B is connected to the tester side, and a predetermined inspection signal is applied from the tester side. The insulator 2 is formed of a ceramic sintered body such as zircon cordierite.

従来の図7に示す載置台は、上述のようにトッププレート1のセラミック焼結体1Aの上面にイオンプレーティングによって電極1Bが形成されているため、車載用のパワーデバイス等のように高電圧、高電流を印加して電気的特性検査を行うと、ウエハの下面に施されたAg等の金属被膜の金属成分がトッププレート1の電極1Bへ移動して電極1Bが変色し、その表面抵抗が高くなり、検査の信頼性を低下させる問題があった。そのため、従来は、トッププレート1が変色すると、載置台を新しいものと交換している。   In the conventional mounting table shown in FIG. 7, the electrode 1B is formed by ion plating on the upper surface of the ceramic sintered body 1A of the top plate 1 as described above. When the electrical characteristics are inspected by applying a high current, the metal component of the metal coating such as Ag applied to the lower surface of the wafer moves to the electrode 1B of the top plate 1 to discolor the electrode 1B, and its surface resistance As a result, there is a problem that the reliability of inspection is lowered. Therefore, conventionally, when the top plate 1 changes color, the mounting table is replaced with a new one.

また、ウエハに関して云えば、最近のウエハは極端に薄くなってその搬送が難しいため、ウエハ下面の外周縁部全周に亘って環状突起を形成し、ウエハの変形を防止したタイコウエハが使用されている。このタイコウエハの場合にも他のウエハの場合と同様に載置台のトッププレート1の電極1Bが金属成分によって変色する問題があった。   In terms of wafers, recent wafers are extremely thin and difficult to transport. Therefore, Tyco wafers are used in which annular protrusions are formed around the entire outer periphery of the lower surface of the wafer to prevent wafer deformation. Yes. In the case of this Tyco wafer, as in the case of other wafers, there is a problem that the electrode 1B of the top plate 1 of the mounting table changes color due to the metal component.

尚、この種の載置台が例えば特許文献1、2に記載されている。特許文献1の載置台は、トッププレートが石英、ポリテトラフルオロエチレン等の絶縁材によって形成され、その上面に金蒸着等によって形成された導電体層が形成され、その下面にシールド部材が配置されている。特許文献2には絶縁材料からなるトッププレートの上面にのみ導体被膜が形成された載置台が記載されている。   In addition, this kind of mounting base is described in patent documents 1 and 2, for example. In the mounting table of Patent Document 1, the top plate is formed of an insulating material such as quartz or polytetrafluoroethylene, the conductor layer formed by gold vapor deposition or the like is formed on the top surface, and the shield member is disposed on the bottom surface. ing. Patent Document 2 describes a mounting table in which a conductor coating is formed only on the top surface of a top plate made of an insulating material.

特開昭63−138745JP 63-138745 A 特開昭62−291937JP 62-291937 A

しかしながら、従来の載置台の場合には、高電圧、高電流を用いる電気的特性検査を繰り返すと、ウエハからトッププレート1への金属成分の移動によりトッププレート1の表面が変色し、表面抵抗が高くなるとトッププレート1以外の本来交換しなくても良い載置台の構成部品も交換するため、交換費用が高くなる問題があった。   However, in the case of the conventional mounting table, when the electrical property inspection using high voltage and high current is repeated, the surface of the top plate 1 is discolored due to the movement of the metal component from the wafer to the top plate 1, and the surface resistance is reduced. If the height is increased, components other than the top plate 1 that do not need to be replaced are also replaced. Therefore, there is a problem that the replacement cost is increased.

本発明は、上記課題を解決するためになされたもので、高電圧、高電流を用いる電気的特性検査によってトッププレート(載置体)が変色して汚染されても、載置台の載置体だけを交換し、他の構成部品を交換する必要がなく、交換費用を削減することができる載置台を提供することを目的としている。   The present invention has been made to solve the above-described problems, and even when the top plate (mounting body) is discolored and contaminated by electrical characteristic inspection using high voltage and high current, the mounting body of the mounting table. It is an object of the present invention to provide a mounting table that can reduce the replacement cost without replacing only the other components.

本発明の請求項1に記載の載置台は、下面の外周縁部全周に亘って形成された環状突起で囲まれる凹陥部を有する被検査体の電気的特性検査を行うために、上記被検査体を載置する載置台であって、上記被検査体の載置面を有する載置体と、上記載置体が着脱可能に固定された絶縁体とを備え、上記載置体は上記被検査体の凹陥部と嵌合し且つ上記載置面が上記被検査体の下面と接触するように形成された載置部と、上記載置部の外側に形成され且つ上記環状突起を受け入れる環状平面部と、を有し、締結部材を用いて上記載置体が上記環状平面部において上記絶縁体に固定されることを特徴とするものである。   According to a first aspect of the present invention, there is provided a mounting table for performing an electrical property inspection of an object to be inspected having a recessed portion surrounded by an annular protrusion formed over the entire outer peripheral edge of the lower surface. A mounting table for mounting an inspection body, comprising: a mounting body having a mounting surface for the object to be inspected; and an insulator to which the above-mentioned mounting body is detachably fixed. A mounting portion that is fitted to a recessed portion of the object to be inspected and the above-described mounting surface is in contact with the lower surface of the object to be inspected, and is formed outside the above-described mounting portion and receives the annular protrusion. And the mounting body is fixed to the insulator in the annular plane portion using a fastening member.

また、本発明の請求項2に記載の載置台は、請求項1に記載の発明において、大きさの異なる複数の上記被検査体の凹陥部に即した載置部を有する載置体を複数備えていることを特徴とするものである。   A mounting table according to a second aspect of the present invention is the mounting table according to the first aspect, wherein a plurality of mounting bodies having mounting portions corresponding to the recessed portions of the plurality of test objects having different sizes are provided. It is characterized by having.

また、本発明の請求項3に記載の載置台は、請求項1または請求項2に記載の発明において、上記載置体は、上記載置面に導体被膜が形成されていることを特徴とするものである。   The mounting table according to claim 3 of the present invention is characterized in that, in the invention according to claim 1 or 2, the mounting body has a conductor film formed on the mounting surface. To do.

また、本発明の請求項4に記載の載置台は、請求項3に記載の発明において、上記載置体は、上記導体被膜の汚染された時に交換されることを特徴とするものである。   According to a fourth aspect of the present invention, there is provided a mounting table according to the third aspect, wherein the mounting body is replaced when the conductor film is contaminated.

本発明によれば、高電圧、高電流を用いる電気的特性検査によってトッププレート(載置体)が変色して汚染されても、載置台の載置体だけを交換し、他の構成部品を交換する必要がなく、交換費用を削減することができる載置台を提供することができる。   According to the present invention, even if the top plate (mounting body) is discolored and contaminated by electrical characteristic inspection using high voltage and high current, only the mounting body of the mounting table is replaced, and other components are replaced. There is no need for replacement, and a mounting table that can reduce replacement costs can be provided.

以下、図1〜図6に示す実施形態に基づいて本発明を説明する。尚、各図中、図1は本発明の載置台の一実施形態を適用した検査装置の一例を部分的に破断して示す正面図、図2は図1に示す載置台を取り出して示す断面図、図3は図2に示す載置台を分解して示す斜視図、図4は本発明の載置台の他の実施形態を示す断面図、図5は図4に示す載置台を分解して示す斜視図、図6の(a)、(b)はそれぞれ大きさの異なるウエハに適合する載置体の一部を破断して示す側面図である。   Hereinafter, the present invention will be described based on the embodiment shown in FIGS. In each figure, FIG. 1 is a partially cutaway front view showing an example of an inspection apparatus to which an embodiment of the mounting table of the present invention is applied, and FIG. 2 is a cross-sectional view showing the mounting table shown in FIG. 3 is an exploded perspective view showing the mounting table shown in FIG. 2, FIG. 4 is a cross-sectional view showing another embodiment of the mounting table of the present invention, and FIG. 5 is an exploded view of the mounting table shown in FIG. FIGS. 6A and 6B are side views showing a part of a mounting body adapted to a wafer having a different size. FIG.

第1の実施形態
まず、本実施形態の載置台を備えた検査装置について図1〜図3を参照しながら説明する。検査装置は、例えば図1に示すように、被検査体、例えばタイコウエハ(Taiko
Wafer)Wの電気的特性検査を行うプローバ室10と、プローバ室10にタイコウエハWを搬送するローダ室(図示せず)と、を備えている。本実施形態で用いられるタイコウエハWには例えば複数のパワーデバイスが形成されている。このタイコウエハWは、下面の外周縁部全周に亘って形成された環状突起で囲まれる凹陥部を有し、極めて薄く形成されている本体部の撓みを防止して、取り扱いやすい構造になっている。
First Embodiment First, an inspection apparatus provided with a mounting table according to the present embodiment will be described with reference to FIGS. As shown in FIG. 1, for example, the inspection apparatus is an object to be inspected such as a Tyco wafer (Taiko wafer).
A prober chamber 10 for inspecting the electrical characteristics of the wafer W and a loader chamber (not shown) for transferring the Tyco wafer W to the prober chamber 10 are provided. For example, a plurality of power devices are formed on the Tyco wafer W used in the present embodiment. This Tyco wafer W has a recessed portion surrounded by an annular protrusion formed over the entire circumference of the outer peripheral edge of the lower surface, and has a structure that is easy to handle by preventing the bending of the extremely thin main body. Yes.

プローバ室10は、図1に示すように、タイコウエハWを載置する載置台20と、載置台20をX、Y方向へ移動させるXYテーブル30と、載置台20の上方に配置されたプローブカード40と、プローブカード40の複数のプローブ41と載置台20上のタイコウエハWの複数の電極パッド(図示せず)とのアライメントを行うアライメント機構(図示せず)と、プローブカード40の上面の複数の端子電極と電気的に接続されたテストヘッド50と、を備え、アライメント機構によって載置台20上のタイコウエハWの複数の電極パッドとプローブカード40の複数のプローブ41とのアライメントを行った後、複数のプローブ41と複数の電極パッドとを電気的に接触させてタイコウエハWに形成されたパワーデバイスに高電圧、高電流を印加して電気的特性検査を行う。載置台20は、図1に示すようにXYテーブル30に設けられた昇降体20Aによって昇降するようになっている。   As shown in FIG. 1, the prober chamber 10 includes a mounting table 20 on which a Tyco wafer W is mounted, an XY table 30 that moves the mounting table 20 in the X and Y directions, and a probe card disposed above the mounting table 20. 40, an alignment mechanism (not shown) for aligning a plurality of probes 41 of the probe card 40 and a plurality of electrode pads (not shown) of the Tyco wafer W on the mounting table 20, and a plurality of upper surfaces of the probe card 40 A test head 50 electrically connected to the terminal electrode, and after alignment of the plurality of electrode pads of the Tyco wafer W on the mounting table 20 and the plurality of probes 41 of the probe card 40 by the alignment mechanism, A high voltage, high voltage is applied to a power device formed on the Tyco wafer W by electrically contacting the plurality of probes 41 and the plurality of electrode pads. Inspecting electrical characteristics by applying the flow. As shown in FIG. 1, the mounting table 20 is moved up and down by a lifting body 20 </ b> A provided on the XY table 30.

また、載置台20は、図1に示すようにテストヘッド50に同軸ケーブル51の中心導体を介して電気的に接続されている。そして、検査時にプローブ41から半導体ウエハWの電極パッドに検査用信号を印加すると共にテストヘッド50から載置台20の載置体に検査用信号を印加し、C−V法等により半導体ウエハWの所定の容量測定等を行う。   Further, the mounting table 20 is electrically connected to the test head 50 via the central conductor of the coaxial cable 51 as shown in FIG. Then, at the time of inspection, an inspection signal is applied from the probe 41 to the electrode pad of the semiconductor wafer W, and an inspection signal is applied from the test head 50 to the mounting body of the mounting table 20. Perform a predetermined capacity measurement.

而して、本実施形態の載置台20は、図2、図3に示すように、タイコウエハWを載置する載置体(従来のトッププレートに相当する)21と、載置体21が着脱可能に取り付けられた絶縁体22と、を備え、載置体21が複数(例えば、4本)の締結部材(例えば、ネジ部材)23を介して絶縁体22に対して締結、固定されている。図2に示すように載置体21と絶縁体22の間には絶縁リング24が介在し、載置体21と絶縁体22は絶縁リング24が介在した状態で4本のネジ部材23によって締結されている。   Thus, as shown in FIGS. 2 and 3, the mounting table 20 of the present embodiment includes a mounting body 21 (which corresponds to a conventional top plate) 21 on which the Tyco wafer W is mounted and a mounting body 21 that is detachable. The mounting body 21 is fastened and fixed to the insulator 22 via a plurality of (for example, four) fastening members (for example, screw members) 23. . As shown in FIG. 2, an insulating ring 24 is interposed between the mounting body 21 and the insulator 22, and the mounting body 21 and the insulator 22 are fastened by four screw members 23 with the insulating ring 24 interposed. Has been.

載置体21について更に説明すると、載置体21の上面には図2、図3に示すようにタイコウエハWの凹陥部と嵌合する載置部21Aが隆起して形成され、載置体21の上面の載置部21Aの外側にはタイコウエハWの環状突起が接触する環状平面部21Bとして形成されている。この環状平面部21Bは環状突起の幅と実質的に同一幅に形成されている。そのため、載置体21の上面にタイコウエハWを載置すると、載置部21AがタイコウエハWの凹陥部に嵌入してタイコウエハWの下面が載置部21Aの載置面に接触すると共に環状突起の下面が環状平面部21Bと全領域で接触する。また、図2、図3に示すように載置体21の環状平面部21Bには例えば4本のネジ部材23の頭部が嵌まり込む切欠部21Cが周方向に等間隔を空けて形成され、それぞれの切欠部21Cの底面にはネジ部材23が貫通する孔が形成されている。尚、タイコウエハWの環状突起は載置体21の環状平面部21Bと接触しない構造であっても良い。   The mounting body 21 will be further described. On the top surface of the mounting body 21, a mounting portion 21 </ b> A that fits into the recessed portion of the Tyco wafer W is formed to protrude as shown in FIGS. 2 and 3. An annular flat surface portion 21B is formed on the outer surface of the mounting portion 21A on the upper surface of the wafer. The annular flat portion 21B is formed to have substantially the same width as the annular protrusion. Therefore, when the Tyco wafer W is placed on the upper surface of the placement body 21, the placement portion 21A is fitted into the recessed portion of the Tyco wafer W so that the lower surface of the Tyco wafer W comes into contact with the placement surface of the placement portion 21A and the annular protrusions are formed. The lower surface is in contact with the annular flat surface portion 21B in the entire region. In addition, as shown in FIGS. 2 and 3, the annular flat surface portion 21 </ b> B of the mounting body 21 is formed with notches 21 </ b> C into which, for example, the heads of four screw members 23 are fitted at equal intervals in the circumferential direction. A hole through which the screw member 23 passes is formed on the bottom surface of each cutout portion 21C. The annular protrusion of the Tyco wafer W may have a structure that does not contact the annular flat surface portion 21B of the mounting body 21.

更に、図2、図3に示すように載置体21の載置面には放射状に分布する複数の吸引孔21Dが形成され(図2ではその一部のみ表示)、これらの吸引孔21Dは図2に示すように載置体21の下面に所定のパターンで形成された浅い溝21Eに通じている。これらの溝21Eは互いに連通していると共に載置体21の下面に接合されたカバー25によって封止されている。このカバー25は、図2に示すように締結部材(例えば、ネジ部材)26によって載置体21の下面に接合される。そして、溝21Eとカバー25によって形成された空間には排気装置(図示せず)が接続されており、排気装置が空間内を排気するようにしてある。従って、載置体21上にタイコウエハWを載置し、排気装置で吸引孔21D及び空間内の空気を排気すると、タイコウエハWが載置部21Aに吸着、固定される。   Further, as shown in FIGS. 2 and 3, a plurality of suction holes 21D that are radially distributed are formed on the mounting surface of the mounting body 21 (only a part thereof is shown in FIG. 2). As shown in FIG. 2, it leads to a shallow groove 21E formed in a predetermined pattern on the lower surface of the mounting body 21. These grooves 21 </ b> E communicate with each other and are sealed by a cover 25 joined to the lower surface of the mounting body 21. As shown in FIG. 2, the cover 25 is joined to the lower surface of the mounting body 21 by a fastening member (for example, a screw member) 26. An exhaust device (not shown) is connected to the space formed by the groove 21E and the cover 25, and the exhaust device exhausts the space. Accordingly, when the Tyco wafer W is placed on the placement body 21 and the air in the suction holes 21D and the space is exhausted by the exhaust device, the Tyco wafer W is attracted and fixed to the placement portion 21A.

絶縁体22の外周縁部全周には上方に突出する環状突起22Aが形成され、この環状突起22Aの上面には載置体21の4箇所の貫通孔に対応するネジ孔22Bが形成さている。この環状突起22Aと載置体21の外周縁部の下面の間に絶縁リング24が配置され、この絶縁リング24にも載置体21の4箇所の貫通孔に対応する貫通孔が形成されている。絶縁体22は、例えば従来と同様にジルコンコージライト等のセラミック焼結体からなる絶縁材料によって形成されている。   An annular protrusion 22A that protrudes upward is formed on the entire circumference of the outer peripheral edge of the insulator 22, and screw holes 22B corresponding to the four through holes of the mounting body 21 are formed on the upper surface of the annular protrusion 22A. . An insulating ring 24 is disposed between the annular protrusion 22A and the lower surface of the outer peripheral edge of the mounting body 21, and through holes corresponding to the four through holes of the mounting body 21 are also formed in the insulating ring 24. Yes. The insulator 22 is formed of an insulating material made of a ceramic sintered body such as zircon cordierite, for example, as in the conventional case.

従って、載置体21を絶縁体22上に取り付ける時には、まず載置体21の下面にネジ部材26を介してカバー25を接合して溝21Eを封止する。次いで、絶縁体22の環状突起22Aのネジ孔22Bに絶縁リング24の貫通孔を合わせて配置し、絶縁リング24の貫通孔に載置体21の切欠部21Cの貫通孔を合わせて載置体21を載置する。その後、ネジ部材23を用いて載置体21及び絶縁リング24を絶縁体22に締結、固定することによって載置台20として形成することができる。 Therefore, when mounting the mounting body 21 on the insulator 22, the cover 25 is first joined to the lower surface of the mounting body 21 via the screw member 26 to seal the groove 21E. Next, the through hole of the insulating ring 24 is aligned with the screw hole 22B of the annular protrusion 22A of the insulator 22 and the through hole of the cutout portion 21C of the mounting body 21 is aligned with the through hole of the insulating ring 24. 21 is placed. Thereafter, the mounting body 21 and the insulating ring 24 can be fastened and fixed to the insulating body 22 using the screw member 23 to form the mounting table 20.

次に、動作について説明する。プローバ室10内で載置台20がローダ室からプリアライメントされたタイコウエハWを受け取ると、タイコウエハWの凹陥部と載置体21の載置部21Aが嵌合する。この時、タイコウエハWの下面が載置部21Aの載置面と接触すると共に、タイコウエハWの環状突起が環状平面21Bの全領域と接触する。この状態で排気装置が駆動してタイコウエハWを載置部21Aの載置面に吸着固定する。次いで、XYテーブル30が作動して載置台20がX方向及びY方向へ移動し、アライメント機構を介してタイコウエハWとプローブカード40のプローブ41とのアライメントを行う。   Next, the operation will be described. When the mounting table 20 receives the pre-aligned Tyco wafer W from the loader chamber in the prober chamber 10, the recessed portion of the Tyco wafer W and the mounting portion 21A of the mounting body 21 are fitted. At this time, the lower surface of the Tyco wafer W is in contact with the placement surface of the placement portion 21A, and the annular protrusion of the Tyco wafer W is in contact with the entire area of the annular plane 21B. In this state, the exhaust device is driven to suck and fix the Tyco wafer W on the mounting surface of the mounting portion 21A. Next, the XY table 30 is operated to move the mounting table 20 in the X direction and the Y direction, so that the alignment between the Tyco wafer W and the probe 41 of the probe card 40 is performed via the alignment mechanism.

然る後、載置台20がプローブ41の真下へ移動し、昇降体20Aを介して載置台20が上昇し、タイコウエハWの複数の電極パッドと複数のプローブ41とが接触し、更に載置体21がオーバードライブされてタイコウエハWの電極パッドとプローブ41とが電気的に接触する。この状態でテストヘッド50からプローブ41を介してタイコウエハWへ高電圧(例えば5kV)、高電流(例えば、100A)の高周波信号を印加すると共に載置体21へ検査用信号を印加して、パワーデバイスについて所定の電気的特性検査を行う。   Thereafter, the mounting table 20 is moved directly below the probe 41, the mounting table 20 is lifted through the lifting body 20A, the plurality of electrode pads of the Tyco wafer W and the plurality of probes 41 are in contact, and the mounting body is further moved. 21 is overdriven, and the electrode pad of the Tyco wafer W and the probe 41 are in electrical contact. In this state, a high voltage (for example, 5 kV) and high current (for example, 100 A) high-frequency signal is applied from the test head 50 to the Tyco wafer W via the probe 41, and an inspection signal is applied to the mounting body 21. A predetermined electrical property test is performed on the device.

タイコウエハWの全てのパワーデバイスについて所定の検査を終了した後、載置台20はローダ室側へ移動し、検査済みのタイコウエハをローダ室へ引き渡すと共に次のタイコウエハを受け取って上述の検査を繰り返す。検査を繰り返していると、タイコウエハW下面の金属(例えば、Ag)被膜からAgが載置体21の導体被膜へ移動し導体被膜が金属によって変色し、導体被膜の表面抵抗が高くなり、検査の信頼性を低下させる虞がある。この場合、本実施形態では、オペレータが載置体21のみを簡単に交換することができる。即ち、載置台20の4本のネジ部材23を取り外すことにより載置体21を絶縁体22から分離して取り外すことができる。次いで、新品の載置体21を絶縁リング24を介してネジ部材23によって簡単に絶縁体22に締結し、固定することができる。   After completing the predetermined inspection for all the power devices on the Tyco wafer W, the mounting table 20 moves to the loader chamber side, delivers the inspected Tyco wafer to the loader chamber, receives the next Tyco wafer, and repeats the above inspection. If the inspection is repeated, Ag moves from the metal (for example, Ag) film on the lower surface of the Tyco wafer W to the conductor film of the mounting body 21, the conductor film is discolored by the metal, and the surface resistance of the conductor film is increased. There is a risk of reducing reliability. In this case, in this embodiment, the operator can easily replace only the mounting body 21. That is, the mounting body 21 can be separated from the insulator 22 and removed by removing the four screw members 23 of the mounting table 20. Next, the new mounting body 21 can be easily fastened and fixed to the insulator 22 by the screw member 23 through the insulating ring 24.

以上説明したように本実施形態によれば、タイコウエハWの載置面を有する載置体21と、載置体21が固定された絶縁体22とを備え、載置体21はタイコウエハWの凹陥部と嵌合し且つタイコウエハWの下面と接触するように形成された載置部21Aと、載置部21Aの外側に形成され且つタイコウエハWの環状突起を受け入れる環状平面部21Bと、を有し、ネジ部材23を用いて載置体21が環状平面部21Bにおいて絶縁体に固定されているため、パワーデバイスに高電圧、高電流を印加して電気的特性検査を繰り返し行い、載置体21の導体被膜がタイコウエハWの金属成分によって変色して表面抵抗が高くなっても、ネジ部材23を介して載置体21のみを簡単に交換することができ、絶縁体22及び絶縁リング24を継続して使用することができ、載置台20の交換費用を削減することができる。   As described above, according to the present embodiment, the mounting body 21 having the mounting surface of the Tyco wafer W and the insulator 22 to which the mounting body 21 is fixed are provided. A mounting portion 21A formed so as to be in contact with the lower surface of the Tyco wafer W, and an annular flat surface portion 21B formed outside the mounting portion 21A and receiving the annular protrusion of the Tyco wafer W. Since the mounting body 21 is fixed to the insulator in the annular plane portion 21B using the screw member 23, the electrical characteristics inspection is repeatedly performed by applying a high voltage and a high current to the power device. Even if the conductor coating of the material changes color due to the metal component of the Tyco wafer W and the surface resistance increases, only the mounting body 21 can be easily replaced via the screw member 23, and the insulator 22 and the insulating ring 24 are continued. Shi Can be used, it is possible to reduce the replacement cost of the mounting table 20.

第2の実施形態
本実施形態の載置台20’は、基本的にはタイコウエハWの吸着手段が異なること以外は第1の実施形態に準じて構成されている。本実施形態においても第1の実施形態と同一または相当部分には同一符号を付して説明する。
Second Embodiment The mounting table 20 ′ of the present embodiment is basically configured according to the first embodiment except that the suction means for the Tyco wafer W is different. In the present embodiment, the same or corresponding parts as those in the first embodiment are denoted by the same reference numerals.

即ち、本実施形態の載置台20’は、図4、図5に示すように載置体21及び絶縁体22を備えている。載置体21の上面には、第1の実施形態と同様に載置部21A及び環状平面部21Bが形成されている。本実施形態では第1の実施形態のようにカバー25が不要であり、カバー25から絶縁体22側へ突出するネジ部材26用の空間を省略できるため、絶縁リング24を設けなくても良い。   That is, the mounting table 20 ′ of this embodiment includes a mounting body 21 and an insulator 22 as shown in FIGS. 4 and 5. On the upper surface of the mounting body 21, a mounting portion 21A and an annular flat surface portion 21B are formed as in the first embodiment. In this embodiment, unlike the first embodiment, the cover 25 is unnecessary, and the space for the screw member 26 protruding from the cover 25 toward the insulator 22 can be omitted. Therefore, the insulating ring 24 may not be provided.

而して、本実施形態のタイコウエハWの吸着手段は、載置部21Aの載置面に形成された複数の環状溝21FによってタイコウエハWを吸着する構造になっている。即ち、複数の環状溝21Fは、それぞれ図4、図5に示すように載置部21Aの載置面の中心を囲む同心円状に形成されている。これらの環状溝21Fには載置部21Aの表層部にある流路(図示せず)から吸引孔21Dがそれぞれ1個ずつ開口するように形成されている。これらの吸引孔21Dは図5に示すように径方向に一直線上に配置され、それぞれ互いに載置部21A表層部の流路を介して連通している。径方向外側の吸引孔21Dには載置部21Aの内部に配置された吸引部21Gが連通し、吸引部21Gに接続された排気装置(図示せず)を介して複数の環状溝21Fから空気を排気することによってタイコウエハWを載置部21Aに吸着、固定するようにしてある。   Therefore, the suction means for the Tyco wafer W of this embodiment has a structure for sucking the Tyco wafer W by the plurality of annular grooves 21F formed on the placement surface of the placement portion 21A. That is, the plurality of annular grooves 21F are formed concentrically around the center of the placement surface of the placement portion 21A as shown in FIGS. Each of the annular grooves 21F is formed so that one suction hole 21D is opened from a flow path (not shown) in the surface layer portion of the placement portion 21A. These suction holes 21D are arranged in a straight line in the radial direction as shown in FIG. 5, and communicate with each other via a flow path of the mounting portion 21A. A suction part 21G disposed inside the mounting part 21A communicates with the suction hole 21D on the radially outer side, and air is discharged from the plurality of annular grooves 21F via an exhaust device (not shown) connected to the suction part 21G. Is evacuated to attract and fix the Tyco wafer W to the mounting portion 21A.

以上説明したように本実施形態によれば、タイコウエハWの吸着手段を簡素化することができる他、本実施形態においても第1の実施形態と同様に作用効果を期することができる。   As described above, according to the present embodiment, the suction means for the Tyco wafer W can be simplified, and also in the present embodiment, the same operational effects can be expected as in the first embodiment.

第3の実施形態
本実施形態の載置台20”は、大きさの異なるタイコウエハWに対応する載置体を備えていること以外は第1、第2の実施形態に準じて構成されている。本実施形態でも第1の実施形態と同一または相当部分には同一符号を付して説明する。
Third Embodiment A mounting table 20 ″ of the present embodiment is configured according to the first and second embodiments, except that a mounting body corresponding to a Tyco wafer W having a different size is provided. In this embodiment, the same or corresponding parts as those in the first embodiment are denoted by the same reference numerals.

本実施形態の載置台20”は、図6の(a)、(b)に示すようにタイコウエハWの大きさに即した載置体21を備えている。同図の(a)に示す載置体21は、例えば200mm径のタイコウエハWに用いられるもので、第1、第2の実施形態の載置台20、20’それぞれの載置体21と同様の構造を備えているため、その説明を省略する。   As shown in FIGS. 6A and 6B, the mounting table 20 ″ of the present embodiment includes a mounting body 21 corresponding to the size of the Tyco wafer W. The mounting shown in FIG. The mounting body 21 is used for, for example, a 200 mm diameter Tyco wafer W and has the same structure as the mounting body 21 of each of the mounting tables 20 and 20 ′ of the first and second embodiments. Is omitted.

図6の(b)に示す載置体21は、150mm径のウエハWに用いられるものである。この載置体21の外径は図6の(a)に示す載置体21の外径と同一の大きさに形成され、その載置部21Aが150mm径のウエハWと嵌合する外径に形成されている。そのため、載置部21Aを囲む環状平面部21Bが図6の(a)に示すものよりも幅広に形成されている。そして、環状平面部21Bの外周縁部に沿って4本のネジ部材を取り付ける切欠部21Cが周方向に等間隔を隔てて形成されている。載置部21Aの外径は、タイコウエハWの大きさに応じて複数準備されている。   A mounting body 21 shown in FIG. 6B is used for a wafer W having a diameter of 150 mm. The outer diameter of the mounting body 21 is formed to be the same size as the outer diameter of the mounting body 21 shown in FIG. 6A, and the mounting portion 21A fits the wafer W having a diameter of 150 mm. Is formed. Therefore, the annular flat surface portion 21B surrounding the placement portion 21A is formed wider than that shown in FIG. And the notch part 21C which attaches four screw members along the outer peripheral part of the cyclic | annular plane part 21B is formed at equal intervals in the circumferential direction. A plurality of outer diameters of the mounting portion 21A are prepared according to the size of the Tyco wafer W.

従って、タイコウエハWの大きさが200mmから150mmに切り換える場合には図6の(a)に示す載置体21を同図の(b)に示す載置体21と交換するだけでタイコウエハWのサイズ変更に対応することができる。このように本実施形態の載置台20”は、複数種のタイコウエハWのサイズに即した載置体21を準備しておくことで、一つの載置台20がサイズの異なる複数のタイコウエハW対応することができる。   Accordingly, when the size of the Tyco wafer W is switched from 200 mm to 150 mm, the size of the Tyco wafer W can be simply changed by replacing the placement body 21 shown in FIG. 6A with the placement body 21 shown in FIG. Can respond to changes. As described above, the mounting table 20 ″ according to the present embodiment prepares the mounting body 21 corresponding to the sizes of a plurality of types of Tyco wafers W, so that one mounting table 20 corresponds to a plurality of Tyco wafers W having different sizes. be able to.

尚、本発明は、上記実施形態に何等制限されるものではなく、必要に応じて適宜設計変更することができる。   In addition, this invention is not restrict | limited at all to the said embodiment, A design change can be suitably carried out as needed.

本発明は、下面の外周縁部全周に亘って形成された環状突起で囲まれる凹陥部を有する被検査体の電気的特性検査に用いられる検査装置に好適に利用することができる。   INDUSTRIAL APPLICABILITY The present invention can be suitably used for an inspection apparatus used for inspecting an electrical property of an object to be inspected having a recessed portion surrounded by an annular protrusion formed over the entire outer peripheral edge of the lower surface.

本発明の載置台の一実施形態を適用した検査装置の一例を部分的に破断して示す正面図である。It is a front view partially broken and showing an example of an inspection device to which one embodiment of the mounting base of the present invention is applied. 図1に示す載置台を取り出して示す断面図である。It is sectional drawing which takes out and shows the mounting base shown in FIG. 図2に示す載置台を分解して示す斜視図である。It is a perspective view which decomposes | disassembles and shows the mounting base shown in FIG. 本発明の載置台の他の実施形態を示す断面図ある。It is sectional drawing which shows other embodiment of the mounting base of this invention. 図4に示す載置台を分解して示す斜視図である。It is a perspective view which decomposes | disassembles and shows the mounting base shown in FIG. (a)、(b)はそれぞれ大きさの異なるタイコウエハに適合する載置体の一部を破断して示す側面図である。(A), (b) is a side view which fractures | ruptures and shows a part of mounting body which fits the Tyco wafer from which size differs, respectively. (a)、(b)はそれぞれ従来の載置台の一例を示す分図で、(a)はその側面図、(b)は(a)に示す載置台の載置体の断面の一部を拡大して示す断面図である。(A), (b) is a fragmentary figure which shows an example of the conventional mounting base, respectively, (a) is the side view, (b) is a part of cross section of the mounting body of the mounting base shown in (a). It is sectional drawing expanded and shown.

符号の説明Explanation of symbols

20 載置台
21 載置体
21A 載置部
21B 環状平面部
22 絶縁体
23 ネジ部材(締結部材)
W タイコウエハ(被検査体)
DESCRIPTION OF SYMBOLS 20 Mounting base 21 Mounting body 21A Mounting part 21B Annular plane part 22 Insulator 23 Screw member (fastening member)
W Tyco wafer (inspected object)

Claims (4)

下面の外周縁部全周に亘って形成された環状突起で囲まれる凹陥部を有する被検査体の電気的特性検査を行うために、上記被検査体を載置する載置台であって、上記被検査体の載置面を有する載置体と、上記載置体が着脱可能に固定された絶縁体とを備え、上記載置体は上記被検査体の凹陥部と嵌合し且つ上記載置面が上記被検査体の下面と接触するように形成された載置部と、上記載置部の外側に形成され且つ上記環状突起を受け入れる環状平面部と、を有し、締結部材を用いて上記載置体が上記環状平面部において上記絶縁体に固定されることを特徴とする載置台。   A mounting table for mounting the object to be inspected in order to perform an electrical characteristic inspection of the object to be inspected having a recessed portion surrounded by an annular protrusion formed over the entire outer peripheral edge of the lower surface, A mounting body having a mounting surface for the object to be inspected, and an insulator on which the above-mentioned mounting body is detachably fixed; the above-mentioned mounting body fits into a recessed portion of the above-mentioned object to be inspected; A mounting portion formed so that the mounting surface is in contact with the lower surface of the object to be inspected, and an annular flat surface portion that is formed outside the mounting portion and receives the annular protrusion, and using a fastening member The mounting table is fixed to the insulator at the annular plane portion. 大きさの異なる複数の上記被検査体の凹陥部に即した載置部を有する載置体を複数備えていることを特徴とする請求項1に記載の載置台。   2. The mounting table according to claim 1, comprising a plurality of mounting bodies each having a mounting portion corresponding to the recessed portions of the plurality of test objects having different sizes. 上記載置体は、上記載置面に導体被膜が形成されていることを特徴とする請求項1または請求項2に記載の載置台。   The mounting table according to claim 1, wherein a conductor film is formed on the mounting surface. 上記載置体は、上記導体被膜の汚染された時に交換されることを特徴とする請求項3に記載の載置台。   The mounting table according to claim 3, wherein the mounting body is replaced when the conductor film is contaminated.
JP2008266479A 2008-10-15 2008-10-15 Mounting table Active JP5356769B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008266479A JP5356769B2 (en) 2008-10-15 2008-10-15 Mounting table
TW098134784A TWI487047B (en) 2008-10-15 2009-10-14 Loading platform
KR1020090097783A KR101557507B1 (en) 2008-10-15 2009-10-14 Mounting table
CN2009102041594A CN101728298B (en) 2008-10-15 2009-10-15 Mounting table

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008266479A JP5356769B2 (en) 2008-10-15 2008-10-15 Mounting table

Publications (2)

Publication Number Publication Date
JP2010098056A JP2010098056A (en) 2010-04-30
JP5356769B2 true JP5356769B2 (en) 2013-12-04

Family

ID=42217664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008266479A Active JP5356769B2 (en) 2008-10-15 2008-10-15 Mounting table

Country Status (4)

Country Link
JP (1) JP5356769B2 (en)
KR (1) KR101557507B1 (en)
CN (1) CN101728298B (en)
TW (1) TWI487047B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5296117B2 (en) * 2010-03-12 2013-09-25 東京エレクトロン株式会社 Probe device
JP5345161B2 (en) * 2011-01-20 2013-11-20 東京エレクトロン株式会社 Wafer carrier for power device and inspection apparatus using this wafer carrier
JP2013211366A (en) * 2012-03-30 2013-10-10 Engineering System Kk Thin film formation method using electrostatic coating method
JP6001326B2 (en) * 2012-05-23 2016-10-05 東京エレクトロン株式会社 Probe device and wafer mounting table for probe device
CN103344794B (en) * 2013-06-24 2016-08-24 上海华力微电子有限公司 A kind of Multifunctional semiconductor sample fixture
JP6710603B2 (en) * 2016-08-05 2020-06-17 東京エレクトロン株式会社 Substrate placing method and substrate placing apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148219A (en) * 1995-11-21 1997-06-06 Nikon Corp Wafer adapter
JP2004265895A (en) * 2003-01-20 2004-09-24 Tokyo Electron Ltd Probe device equipped with optical precision distance meters and method of inspecting probe
JP2004265942A (en) * 2003-02-20 2004-09-24 Okutekku:Kk Method for detecting zero point of probe pin and probe
JP4559801B2 (en) * 2004-09-06 2010-10-13 東京エレクトロン株式会社 Wafer chuck
JP2006303339A (en) * 2005-04-25 2006-11-02 Sumitomo Electric Ind Ltd Holder for object to be processed, and wafer prober with it mounted
JP4685559B2 (en) * 2005-09-09 2011-05-18 東京エレクトロン株式会社 Method for adjusting parallelism between probe card and mounting table, inspection program storage medium, and inspection apparatus
JP4597894B2 (en) * 2006-03-31 2010-12-15 東京エレクトロン株式会社 Substrate mounting table and substrate processing apparatus
JP4068127B2 (en) * 2006-11-01 2008-03-26 東京エレクトロン株式会社 Static elimination device, static elimination method, and program recording medium
JP2008124292A (en) * 2006-11-14 2008-05-29 Disco Abrasive Syst Ltd Wafer positioning jig of processing apparatus
JP4965287B2 (en) * 2007-03-14 2012-07-04 東京エレクトロン株式会社 Mounting table
JP2010040856A (en) * 2008-08-06 2010-02-18 Sanyo Electric Co Ltd Probing apparatus

Also Published As

Publication number Publication date
KR20100042235A (en) 2010-04-23
JP2010098056A (en) 2010-04-30
TWI487047B (en) 2015-06-01
CN101728298A (en) 2010-06-09
KR101557507B1 (en) 2015-10-06
CN101728298B (en) 2011-12-21
TW201030871A (en) 2010-08-16

Similar Documents

Publication Publication Date Title
JP5356769B2 (en) Mounting table
KR101415551B1 (en) Electrostatic chuck, method of manufacturing the same and apparatus for processing a substrate including the same
KR101658816B1 (en) Wafer inspection interface and wafer inspection device
JP6895772B2 (en) Inspection equipment and contact method
JP6440587B2 (en) Suction plate, semiconductor device test apparatus, and semiconductor device test method
KR20160079700A (en) Substrate holding assistant member and substrate transfer apparatus
JP6490600B2 (en) Inspection unit
KR20110021936A (en) Semiconductor inspecting apparatus
JP5374079B2 (en) Inspection contact structure
JP2007178132A (en) Semiconductor inspection system and semiconductor inspection method
WO2008013273A1 (en) Socket for inspection
WO2023135889A1 (en) Probe card and test system
JP4509811B2 (en) Inspection jig
JP2010175507A (en) Electrical connection device
KR20160042189A (en) Socket for testing semiconductor package and method for manufacturing the same
JP2006120827A (en) Manufacturing method of semiconductor device
JP7267058B2 (en) inspection equipment
JP2004085261A (en) Probe pin and contactor
JP6873780B2 (en) A semiconductor inspection device including a conductive contactor, a conductive contactor unit, and a conductive contactor unit.
CN108254593B (en) Adsorption type testing device
JP2016211977A (en) Semiconductor chip test device and test method
WO2023197140A1 (en) Probe assembly, electrostatic chuck device, semiconductor device and method for adsorbing workpiece
JP2008226880A (en) Circuit board and electrical connecting apparatus using the same
KR940009570B1 (en) Semiconductor test equipment
JP6680176B2 (en) Evaluation apparatus and semiconductor chip evaluation method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110902

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130618

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130724

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130813

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130829

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5356769

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250