JP5347652B2 - Substrate lifting / lowering transfer apparatus and substrate processing / transfer system - Google Patents

Abstract

In a substrate elevating transferring device, a first posture shifting member having a first posture shifting maintenance member is arranged on one side of a first substrate processing device in a way shaking around a horizontal axle center; a second posture shifting member having a second posture shifting maintenance member is arranged on one side of a second substrate processing device in a way shaking around a horizontal axle center; a circular member which extends along the vertical direction in a circulation walking way is vertically arranged on a supporting frame on one side of the first posture shifting member; and a plurality of elevating maintenance members are arranged on the circumference direction of the circular member at an interval. The substrate elevating transferring device can sufficiently reduce the plane area occupation and effectively use the space in the factory.

Description

  The present invention relates to a substrate lifting and lowering transfer apparatus and a substrate processing transfer system used in the field of clean transfer and the like.

Etc.

  In the field of clean transfer, a substrate such as a glass substrate is moved up and down (transfer) between a first substrate processing apparatus disposed on a lower floor and a second substrate processing apparatus disposed on an upper floor. A substrate lifting / lowering transfer device to be performed may be used, and a configuration of a general substrate lifting / lowering transfer device is as follows.

  That is, an elevating guide extending in the vertical direction is provided in the vicinity of the first substrate processing apparatus, and an elevating table for supporting the substrate is provided in the elevating guide so as to be raised and lowered. Further, a lifting motor for lifting the lifting table is provided at an appropriate position of the lifting guide. Here, when the lifting table is positioned at a height corresponding to the first substrate processing apparatus, the substrate can be drawn out and sent out from the first substrate processing apparatus, and is compatible with the second substrate processing apparatus. The substrate can be pulled out and sent out to the second substrate processing apparatus when positioned at the height position.

  Therefore, the elevating body is lowered by driving the elevating motor and is positioned at a height position corresponding to the first substrate processing apparatus. Next, the substrate is pulled out from the first substrate processing apparatus to the lifting table. And the raising / lowering body is raised by the drive of the raising / lowering motor, and is located in the height position corresponding to a 2nd substrate processing apparatus. Further, the substrate is sent from the lifting table to the second substrate processing apparatus.

  As described above, the substrate can be moved up and down from the first substrate processing apparatus to the second substrate processing apparatus. In addition, by causing the substrate lifting / lowering apparatus to perform an operation reverse to the above-described operation, the substrate can be moved up and down from the second substrate processing apparatus to the first substrate processing apparatus.

  In addition, there exists a thing shown to patent document 1 as a prior art relevant to this invention.

JP-A-1-318247

By the way, as described above, in a general substrate lifting / lowering transfer device, the lifting guide for supporting the substrate is provided on the lifting guide so that it can be lifted, so that the substrate is lifted and lowered while maintaining the lying posture. As a plane space (installation space), at least a plane area (planar space) corresponding to one substrate is required. For this reason, it is difficult to make effective use of the space of the factory. In particular, in recent years, the increase in the size of substrates has been rapidly progressing, and the above-mentioned problems have become more prominent.

  Therefore, an object of the present invention is to provide a substrate lifting / lowering transfer device having a novel configuration that can solve the above-described problems.

According to a first aspect of the present invention, there is provided a first substrate processing apparatus disposed on a lower floor and performing processing on a substrate, and a substrate disposed immediately above the first substrate processing apparatus on an upper floor. In the substrate lifting / lowering apparatus for moving the substrate up and down with respect to the second substrate processing apparatus for processing the substrate, the substrate is swung around a horizontal axis on one side of the first substrate processing apparatus on the lower floor. It is provided so as to be movable, and is configured to switch between a lying posture and a standing posture by swinging, and includes a first posture switching holder for holding the substrate, and switches the substrate posture between the lying posture and the standing posture. A first posture switching member, a first posture switching actuator that swings the first posture switching member, and a swingable axis around a horizontal axis on one side of the second substrate processing apparatus on the upper floor. A second holding and holding the substrate With the attitude switching retainer is configured to switch to a standing position and horizontal position by swinging the second posture switching member for switching the orientation of the substrate in the standing position and horizontal position, said second position switch A second posture switching actuator that swings the member, and an endless member that is provided on the support frame standing on one side of the first posture switching member on the lower floor so as to be able to circulate and extends in the vertical direction A traveling actuator that circulates the endless member, and a plurality of lifting holders that are provided at intervals in the circumferential direction on the endless member and hold the substrate in a standing posture . The one posture switching member switches from the lying posture to the standing posture when the substrate is sent out from the first substrate processing apparatus side or from the standing posture when the substrate is sent out to the first substrate processing apparatus side. The first posture switching member in the lying posture is configured to overlap with the first substrate processing apparatus in a plan view, and the second posture switching member is configured to switch the substrate to the second substrate. The second posture switching member is configured to switch from a standing posture to a lying posture when being sent to the processing apparatus side or to switch from a lying posture to a standing posture when the substrate is sent from the second substrate processing apparatus side. The gist is that the second substrate processing apparatus is configured to overlap with the second substrate processing apparatus in plan view .

  In the claims and specification of the present application, “provided” means not only directly provided but also indirectly provided via an intervening member. Similarly, “arranged” means not only being provided directly but also indirectly provided via an interposition member. In addition, “substrate processing” means substrate transport processing, substrate process processing, substrate storage processing, and the like, and the process processing includes etching processing, CVD processing, PVD processing, and the like.

  According to the first feature, the substrate positioned at a predetermined position of the first substrate processing apparatus is held by the first posture switching holder. Next, the first posture switching member is swung by driving the first posture switching actuator to switch the substrate posture from the lying posture to the standing posture. Then, the substrate in an upright position is held by the lifting / lowering holder positioned at a height corresponding to the first substrate processing apparatus, and the holding state by the first attitude switching holder is released. Furthermore, the endless member is circulated in one direction by driving the traveling actuator, and the substrate is raised while being kept in an upright position. By repeating the above-described operation, a plurality of substrates can be sent from the first substrate processing apparatus side to the substrate lifting / lowering apparatus side.

  After releasing the holding state by the first posture switching holder, the endless member is circulated in one direction by driving the driving actuator, and the lifting holder holding the board is moved to the second board. It is located at a height position corresponding to the processing device. Next, a board | substrate is hold | maintained by the said 2nd attitude | position switching holder, and the holding state by the said raising / lowering holder is cancelled | released. Then, by driving the second posture switching actuator, the second posture switching member is swung to switch the substrate posture from the standing posture to the lying posture, and the holding state by the second posture switching holder is released. . By repeating the above-described operation, a plurality of substrates can be sent out from the substrate lifting / lowering apparatus side to the second substrate processing apparatus side.

  As described above, the substrate can be moved up and down (transferred) from the first substrate processing apparatus to the second substrate processing apparatus. Further, by performing an operation reverse to the above-described operation, the substrate can be moved up and down from the second substrate processing apparatus to the first substrate processing apparatus.

In short, the first posture switching member having the first posture switching holder is provided on one side of the first substrate processing device so as to be swingable around a horizontal axis, and the second substrate processing device includes: The second posture switching member having the second posture switching holder on one side is provided so as to be swingable around a horizontal axis, and a plurality of the lifting holders are circumferentially provided on the endless member. As described above, the substrate can be moved up and down while maintaining an upright posture as described above, and is a part of the substrate lifting and lowering transfer device , and the first substrate processing apparatus or the first in the plan view. The planar space of the part protruding from the two-substrate processing apparatus can be suppressed to less than the plane area of one substrate.

  Further, the endless member extending in the vertical direction is provided on the support frame so as to be able to circulate, and the endless member is provided with a plurality of raising and lowering holders at intervals in the circumferential direction. The substrate can be moved up and down continuously from the first substrate processing apparatus to the second substrate processing apparatus or from the second substrate processing apparatus to the second substrate processing apparatus.

  A second feature of the present invention is a substrate processing transfer system that performs processing and up-and-down transfer with respect to a substrate, and is disposed on the lower floor, and is disposed on the upper floor. A second substrate processing apparatus configured to process a substrate, and a substrate lifting / lowering transfer apparatus having a first feature for moving the substrate up and down between the first substrate processing apparatus and the second substrate processing apparatus; The gist is that

  According to the 2nd characteristic, there exists an effect | action similar to the effect | action by a 1st characteristic.

According to the present invention, a planar space of a part of the substrate lifting / lowering apparatus and protruding from the first substrate processing apparatus or the second substrate processing apparatus in a plan view is suppressed to less than a plane area of one substrate. Therefore, the plane space of the substrate processing transfer system can be sufficiently reduced, and the factory space can be effectively used.

  In addition, since a plurality of substrates can be moved up and down continuously from the first substrate processing apparatus to the second substrate processing apparatus or from the second substrate processing apparatus to the second substrate processing apparatus, the substrates are moved up and down. The cycle time (tact time) can be shortened to improve the efficiency of a series of operations related to the substrate.

It is a sectional side view which shows the substrate processing transfer system which concerns on embodiment of this invention. It is a sectional side view which shows operation | movement of the substrate processing transfer system which concerns on embodiment of this invention. It is a sectional side view which shows operation | movement of the substrate processing transfer system which concerns on embodiment of this invention. FIG. 4 is a view taken along line IV-IV in FIG. 1. It is the figure along the VV line in FIG. It is a perspective view of the periphery of the clamper for raising / lowering. It is a figure which shows the unclamping operation | movement of the raising / lowering clamper.

  An embodiment of the present invention will be described with reference to FIGS. In the drawings, “FF” indicates the forward direction, “FR” indicates the backward direction, “L” indicates the left direction, and “R” indicates the right direction.

  As shown in FIG. 1, a substrate processing transfer system 1 according to an embodiment of the present invention is a system that performs transfer processing (an example of processing) and up-down transfer for a substrate W such as a glass substrate. Then, the substrate processing transfer system 1 is arranged on the lower floor LF and the first substrate transport processing apparatus (an example of the first substrate processing apparatus) 3 that performs transport processing on the substrate W, and the upper floor UF. A second substrate transfer processing apparatus (an example of a second substrate processing apparatus) 5 that is disposed and performs transfer processing on the substrate W, and a substrate between the first substrate transfer processing apparatus 3 and the second substrate transfer processing apparatus 5 And a substrate up-and-down transfer device 7 that moves up and down with respect to W.

  The configuration of the first substrate transfer processing apparatus 3 of the substrate processing transfer system 1 is as follows.

  That is, as shown in FIGS. 1 and 4, the lower floor LF is provided with a first processing apparatus main body 9, and the first processing apparatus main body 9 serves as a base of the first substrate transfer processing apparatus 3. It constitutes. The first processing apparatus main body 9 is provided with a plurality of first levitation units 11 for levitation of the substrate W by the pressure of air, and a frame shape for ejecting air is formed on the upper surface of each first levitation unit 11. Nozzles 11n are respectively formed, and each nozzle 11n is configured to be inclined toward the unit center with respect to the vertical direction as disclosed in JP-A-2006-182563.

  Instead of forming the frame-shaped nozzle 11n on the upper surface of each first levitation unit 11, a plurality of nozzles having a round hole shape may be formed.

  The first processing apparatus main body 9 is provided with a pair of first roller support members 13 extending in the transport direction (left-right direction) and spaced apart in the transport width direction (front-rear direction). The plurality of first transport rollers 15 that support the substrate W so as to be transportable are provided around the horizontal axis and spaced apart from each other in the transport direction. A first transport motor 17 that rotates the plurality of first transport rollers 15 is provided at an appropriate position of each first roller support member 13, and an output shaft (illustrated) of each first transport motor 17 is provided. (Not shown) is linked to the rotation shafts (not shown) of the plurality of first transport rollers 15 via a linkage mechanism (not shown) composed of a worm and a wheel.

  The configuration of the second substrate transfer processing apparatus 5 of the substrate processing transfer system 1 is as follows.

  That is, as shown in FIGS. 1 and 5, a second processing apparatus main body 19 is provided on the upper floor UF, and the second processing apparatus main body 19 serves as a base of the second substrate transfer processing apparatus 5. It constitutes. Further, the second processing apparatus main body 19 is provided with a plurality of second levitation units 21 for levitation of the substrate W by the pressure of air, and on the upper surface of each second levitation unit 21, the first levitation unit 11 and Similarly, a frame-like nozzle 21n for ejecting air is formed.

  The second processing apparatus main body 19 is provided with a pair of second roller support members 23 extending in the transport direction so as to be separated from each other in the transport width direction, and the substrate W can be transported to each second roller support member 23. A plurality of second transport rollers 25 that are supported by each other are provided around the horizontal axis so as to be rotatable and spaced apart from each other in the transport direction. A second transport motor 27 for rotating the plurality of second transport rollers 25 is provided at an appropriate position of each second roller support member 23, and an output shaft (illustrated) of each second transport motor 27 is provided. (Not shown) is linked to the rotation shafts (not shown) of the plurality of second transport rollers 25 via an interlocking mechanism (not shown) made up of a worm and a wheel.

  A specific configuration of the substrate lifting / lowering transfer device 7 of the substrate processing transfer system 1 is as follows.

  As shown in FIGS. 1 and 4, in the vicinity of the left side of the first processing apparatus main body 9 of the first substrate transfer processing apparatus 3, the posture of the substrate W is set to the standing posture (the posture indicated by the phantom line in FIG. 1) and the lying posture. A first attitude switching member 29 that switches to (an attitude shown by a solid line in FIG. 1) is provided to be swingable (rotatable) around a horizontal axis via a pair of brackets 31. Further, the first posture switching member 29 includes a first swing shaft 33 rotatably provided via a pair of brackets 31 in the vicinity of the left side of the first processing apparatus main body 9 of the first substrate transfer processing apparatus 3. A pair of first oscillating arms 35 integrally formed on the outer peripheral surface of the first oscillating shaft 33 and extending in parallel with each other, and a substrate provided on each first oscillating arm 35 at intervals in the longitudinal direction. A plurality of first posture switching suction pads (an example of a first posture switching holder) 37 that sucks the back surface of W. One bracket 31 is provided with a first attitude switching motor 39 (an example of a first attitude switching actuator) that swings the first attitude switching member 29, and this first attitude switching motor 39. The output shaft (not shown) is coupled to the first swing shaft 33 through a coupling (not shown) or the like. Here, even if the first posture switching member 29 is swung, the pair of first swing arms 35 does not interfere with the first levitation unit 11.

  Instead of providing the first posture switching suction pad 37 on the first swing arm 35, the first posture switching Bernoulli for holding the back surface of the substrate W in a non-contact manner as another first posture switching holder. A chuck (not shown) or a first posture switching clamper (not shown) for gripping (holding) an end of the substrate W may be provided.

  As shown in FIGS. 1, 3, and 5, in the vicinity of the left side of the second processing apparatus main body 19 of the second substrate transfer processing apparatus 5, the position of the substrate W is in an upright position (position shown by a solid line in FIG. 3). And a second posture switching member 41 that switches between a lying posture and a posture indicated by a virtual line in FIG. 3 is provided so as to be swingable (rotatable) around a horizontal axis via a pair of brackets 43. The second posture switching member 41 includes a second swinging shaft 45 rotatably provided via a pair of brackets 43 in the vicinity of the left side of the second processing apparatus main body 19 of the second substrate transfer processing apparatus 5. A pair of second oscillating arms 47 integrally formed on the outer peripheral surface of the second oscillating shaft 45 and extending in parallel, and each second oscillating arm 47 being provided with a space in the longitudinal direction, and a substrate A plurality of second posture switching suction pads (an example of a second posture switching holder) 49 that sucks the back surface of W. One bracket 43 is provided with a second posture switching motor 51 (an example of a second posture switching actuator) 51 that swings the second posture switching member 41, and this second posture switching motor 51. The output shaft (not shown) is coupled to the second swing shaft 45 via a coupling (not shown) or the like. Here, even if the second posture switching member 41 is swung, the pair of second rocking arms 47 does not interfere with the second floating unit 21.

  Instead of providing the second posture switching suction pad 49 on the second swing arm 47, the second posture switching Bernoulli for holding the back surface of the substrate W in a non-contact manner as another second posture switching holder. A chuck (not shown) or a second posture switching clamper (not shown) for gripping (an example of holding) the end of the substrate W may be provided.

  As shown in FIGS. 1, 4, and 5, a pair of support frames 53 extending in the up-down direction are erected in the vicinity of the left side of the first posture switching member 29. The front and rear are separated and integrally connected. In addition, an upper rotating wheel 55 such as an upper pulley or an upper sprocket is rotatably provided at the upper part of each support frame 53 via a common upper rotating shaft 57. A lower rotary wheel 59 such as a pulley or a lower sprocket is rotatably provided via a common lower rotary shaft 61. Further, an endless member 63 such as an endless belt or an endless chain that extends in the vertical direction and can be circulated is wound around the upper rotating wheel 55 and the lower rotating wheel 59 in a corresponding relationship. In other words, an endless member 63 is provided in each support frame 53 so as to be able to circulate through the upper rotating wheel 55 and the lower rotating wheel 59. A traveling motor (an example of a traveling actuator) 65 that circulates the pair of endless members 63 is provided at an appropriate position above one of the support frames 53, and an output shaft of the traveling motor 65 is provided. (Not shown) is coupled to a common upper rotary shaft 57 via a coupling (not shown).

  As shown in FIGS. 1, 6, and 7, the pair of endless members 63 are provided with a plurality of connecting bars 67 extending in the front-rear direction so as to be spaced apart and connected in the circumferential direction. Elevating clampers (an example of an elevating holder) 69 for holding the end of the standing substrate W are provided at both ends of each connecting bar 67. In other words, the pair of endless members 63 are provided with a plurality of lifting clampers 69 at intervals in the circumferential direction via the plurality of connecting bars 67. Each lifting clamper 69 includes a clamper body 71 provided on the connecting bar 67, a fixed clamp claw 73 provided integrally with the clamper body 71, and a clamp direction / unclamp on the clamper body 71. A movable clamp claw 77 that is provided so as to be able to swing (rotate) via a clamp pin 75 in the direction and that grips the end of the substrate W in cooperation with the fixed clamp claw 73, and a base of the movable clamp claw 77 An operating lever 79 provided integrally, and a spring 81 provided between the connecting bar 67 and the operating lever 79 in the clamper main body 71 and biasing the movable clamp pawl 77 in the clamping direction are provided.

  A first unclamping air cylinder (an example of a first unclamping actuator) 83 is provided at an appropriate position below each support frame 53 via an upper mounting arm 85, and this first unclamping air is provided. The cylinder 83 presses the operating lever 79 in the lifting clamper 69 located at a height corresponding to the first substrate transfer processing device 3, and the movable clamp pawl 77 is resisted against the biasing force of the spring 81 in the unclamping direction. Swinging (an example of movement). Similarly, a second unclamping air cylinder (an example of a second unclamping actuator) 87 is provided at an appropriate position above each support frame 53 via a lower mounting arm 89. The clamping air cylinder 87 presses the operating lever 79 in the lifting clamper 69 located at a height corresponding to the second substrate transfer processing device 5, and the movable clamping pawl 77 is resisted against the biasing force of the spring 81. It swings in the unclamping direction.

  It should be noted that, instead of providing the lifting clamper 69 via the connecting bar 67 to the pair of endless members 63, a lifting suction pad (not shown) for sucking the surface of the substrate W is connected as another lifting holder. It may be provided via a bar 67 or the like.

  Then, the effect | action and effect of embodiment of this invention are demonstrated.

  While ejecting air from the nozzles 11n of the plurality of first levitation units 11, the plurality of first conveyance rollers 15 are rotated by driving the pair of first conveyance motors 17 so that the substrate W is levitated and conveyed leftward. Then, it can be positioned above the standby pair of first swing arms 35 (a predetermined position of the first substrate transfer processing apparatus 3) (see FIG. 4).

  After the substrate W is positioned on the upper side of the pair of first swing arms 35 that are on standby, the back surface of the substrate W is sucked by the plurality of first posture switching suction pads 37 and, as shown in FIG. The unclamping air cylinder 83 is driven to swing the movable clamp claw 77 in the lifting clamper 69 located at a height corresponding to the first substrate transfer processing device 3 in the unclamping direction against the urging force of the spring 81. (See FIG. 7). Next, as shown in FIG. 1, the first posture switching member 29 is swung by driving the first posture switching motor 39 to switch the posture of the substrate W from the lying posture to the standing posture. Then, by stopping the driving of each first unclamping air cylinder 83, the end of the substrate W in the standing posture is gripped by the lifting clamper 69 positioned at the height corresponding to the first substrate transfer processing device 3, The suction state by the first posture switching suction pad 37 is released. Further, as shown in FIG. 2, the endless member 63 is circulated in one direction by driving the traveling motor 65 to raise the substrate W while maintaining the standing posture. By repeating the above-described operation, a plurality of substrates W can be sent from the first substrate transfer processing apparatus 3 side to the substrate lifting / lowering transfer apparatus 7 side.

  After the suction state by the plurality of first posture switching suction pads 37 is released, the endless member 63 is circulated in one direction by driving the running motor 65 as shown in FIG. Is moved to a height position corresponding to the second substrate transfer processing apparatus 5. Next, the back surface of the substrate W is sucked by a plurality of second posture switching suction pads 49 and is positioned at a height position corresponding to the second substrate transport processing apparatus 5 by driving each second unclamping air cylinder 87. The movable clamp pawl 77 in the lifting clamper 69 is swung in the unclamping direction against the urging force of the spring 81 to release the gripping state by the lifting clamper 69 (see FIG. 7). Then, as shown in FIG. 3, the second posture switching member 41 is swung by driving the second posture switching motor 51 to switch the posture of the substrate W from the standing posture to the lying posture, and a plurality of second posture switching. The suction state by the suction pad 49 is released. By repeating the above-described operation, a plurality of “substrates W” can be sent out from the substrate lifting / lowering transfer device 7 side to the second substrate transfer processing device 5 side.

  After the suction state by the plurality of second posture switching suction pads 49 is released, air is ejected from the nozzles 21n of the plurality of second levitation units 21, and a plurality of second transport motors 27 are driven to drive a plurality of second By rotating the transport roller 25, the substrate W can be lifted and transported in the right direction and positioned at a predetermined position of the second substrate transport processing apparatus 5 (see FIG. 5).

  As described above, the transfer processing of the substrate W by the first substrate transfer processing apparatus 3, the up-and-down transfer of the substrate W from the first substrate transfer processing apparatus 3 to the second substrate transfer processing apparatus 5, and the substrate by the second substrate transfer processing apparatus 5 W transport processing can be performed sequentially. In addition, by performing an operation reverse to the above-described operation, the substrate W is transferred by the second substrate transfer processing apparatus 5 and the substrate W is moved up and down from the second substrate transfer processing apparatus 5 to the first substrate transfer processing apparatus 3. , And the substrate W transfer processing by the first substrate transfer processing apparatus 3 can be sequentially performed.

In short, a first posture switching member 29 having a plurality of first posture switching suction pads 37 is provided in the vicinity of the left side of the first substrate transfer processing device 3 so as to be able to swing around a horizontal axis, thereby transferring the second substrate. A second posture switching member 41 having a plurality of second posture switching suction pads 49 is provided in the vicinity of the left side of the processing apparatus 5 so as to be able to swing around a horizontal axis, and a plurality of elevating members are moved up and down by a pair of endless members 63. Since the clamper 69 is provided at intervals in the circumferential direction, as described above, the substrate W can be moved up and down while maintaining an upright position . The planar space of the portion protruding from the one substrate transfer processing apparatus 3 or the second substrate transfer processing apparatus 5 can be suppressed to less than the plane area of one substrate W.

  A pair of endless members 63 extending in the vertical direction are provided on the pair of support frames 53 so as to be able to circulate, and a plurality of lifting clampers 69 are provided on the pair of endless members 63 at intervals in the circumferential direction. Therefore, the plurality of substrates W can be moved up and down continuously from the first substrate transfer processing apparatus 3 to the second substrate transfer processing apparatus 5 or from the second substrate transfer processing apparatus 5 to the first substrate transfer processing apparatus 3. it can.

Therefore, according to the embodiment of the present invention, the plane space of a part of the substrate lifting / lowering transfer device 7 and protruding from the first substrate transfer processing device 3 or the second substrate transfer processing device 5 in a plan view is taken as one substrate W Therefore, it is possible to sufficiently reduce the plane space of the substrate processing transfer system 1 and to effectively use the factory space.

  In addition, a plurality of substrates W can be moved up and down continuously from the first substrate transfer processing device 3 to the second substrate transfer processing device 5 or from the second substrate transfer processing device 5 to the first substrate transfer processing device 3. In addition, the cycle time of the vertical movement of the substrate W can be shortened, and the efficiency of a series of operations relating to the substrate W can be improved.

  Further, when the height interval between the lower floor LF and the upper floor UF is large, the number of lift clampers 69 can be increased and the substrate lift transfer device 7 can be used as a device for storing a large number of substrates W. it can.

  In addition, this invention is not restricted to description of the above-mentioned embodiment, It can implement in a various aspect. Further, the scope of rights encompassed by the present invention is not limited to these embodiments.

LF Lower floor UF Upper floor W Substrate 1 Substrate processing transfer system 3 First substrate transfer processing device 5 Second substrate transfer processing device 7 Substrate lifting transfer device 11 First floating unit 15 First transfer roller 17 First transfer motor 21 Second levitation unit 25 Second transport roller 27 Second transport motor 29 First posture switching member 33 First swing shaft 35 First swing arm 37 First posture switching suction pad 39 First posture switching motor 41 Second posture switching member 45 Second swing shaft 47 Second swing arm 49 Second posture switching suction pad 51 Second posture switching motor 53 Support frame 55 Upper rotating wheel 59 Lower rotating wheel 63 Endless member 65 Traveling Motor 67 Connecting bar 69 Elevator clamp 71 Clamper body 73 Fixed clamp pawl 77 Movable clamp pawl 79 Actuating lever 81 Spring 8 3 First unclamping air cylinder 87 Second unclamping air cylinder

Claims (3)

A first substrate processing apparatus that is disposed on the lower floor and performs processing on the substrate, and a second substrate that is disposed immediately above the first substrate processing apparatus on the upper floor and performs processing on the substrate. In the substrate lifting / lowering apparatus that moves the substrate up and down with the processing apparatus,
The lower floor is provided on one side of the first substrate processing apparatus so as to be swingable about a horizontal axis, and is configured to switch between a lying posture and a standing posture by swinging, and holds the substrate. A first posture switching member that includes a first posture switching holder and switches the posture of the substrate between a lying posture and a standing posture;
A first posture switching actuator for swinging the first posture switching member;
Swingably provided around a horizontal axis on one side of the second substrate processing apparatus in the upper story floor, a second attitude switching holder for holding a substrate, and a horizontal position by swinging A second posture switching member configured to switch to a standing posture and switching the posture of the substrate between a lying posture and a standing posture;
A second posture switching actuator for swinging the second posture switching member;
An endless member extending in the up-down direction, provided to be able to circulate on a support frame standing on one side of the first posture switching member on the lower floor ;
A travel actuator for circulating the endless member;
A plurality of lifting and lowering holders that are provided at intervals in the circumferential direction on the endless member and hold the substrate in an upright position ; and
The first posture switching member switches from a lying posture to a standing posture when the substrate is sent out from the first substrate processing apparatus side, or switches from a standing posture to a lying posture when the substrate is fed to the first substrate processing apparatus side. The first posture switching member in the lying posture is configured to overlap the first substrate processing apparatus in plan view,
The second posture switching member switches from a standing posture to a lying posture when the substrate is sent to the second substrate processing apparatus, or switches from a lying posture to a standing posture when the substrate is sent from the second substrate processing device side. The substrate raising / lowering transfer apparatus , wherein the second attitude switching member in the lying attitude is configured to overlap the second substrate processing apparatus in plan view . Each lifting / lowering holder is a lifting / lowering clamper having a pair of clamp claws and gripping an end of the substrate,
A first unclamping actuator for moving at least one of the clamping claws in the lifting clamper located at a height corresponding to the first substrate processing apparatus in an unclamping direction;
And a second unclamping actuator for moving at least one of the clamp claws in the lifting clamper located at a height corresponding to the second substrate processing apparatus in an unclamping direction. Item 2. The substrate lifting and lowering apparatus according to Item 1. In a substrate processing transfer system that performs processing and up / down transfer for a substrate,
A first substrate processing apparatus disposed on the lower floor for processing a substrate;
A second substrate processing apparatus disposed on the upper floor for processing a substrate;
3. A substrate processing / transfer system comprising: the substrate lifting / lowering apparatus according to claim 1, wherein the substrate is moved up and down between the first substrate processing apparatus and the second substrate processing apparatus. .

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