JP5339319B2 - Heat treatment apparatus and heat treatment method - Google Patents

Description

  The present invention relates to a heat treatment apparatus and a heat treatment method for heat-treating a surface of a substrate made of a metal or an alloy.

  The present applicant heat-treats the surface of a substrate having at least a surface layer made of titanium, a titanium alloy, a titanium alloy oxide, or titanium oxide at a high temperature using, for example, a combustion flame of a gas mainly containing hydrocarbons. It is possible to manufacture a multifunctional material having a carbon-doped titanium oxide layer that has excellent durability (high hardness, scratch resistance, abrasion resistance, chemical resistance, heat resistance) and functions as a visible light responsive photocatalyst. (See Patent Document 1).

  However, since the surface of the substrate must be directly heated with a combustion flame such as acetylene, there is a problem that the mass productivity is poor. In addition, it has been known that the same treatment can be performed by heating at high temperature in a combustion gas atmosphere, but no specific treatment method has been proposed.

WO 2005/056866

  In view of the above-described circumstances, the present invention provides a heat treatment apparatus and a heat treatment method for efficiently performing heat treatment for forming an oxide layer by heat-treating a substrate whose surface is made of a metal or an alloy with good productivity. This is the issue.

A first aspect of the present invention that solves the above-described problems is a heat treatment apparatus that heat-treats a substrate having a surface made of a metal or an alloy, and at least a fuel gas is introduced and a gas burner that ejects combustion gas from the tip, A fuel gas introduction means for introducing fuel gas into the gas burner, a combustion chamber having an introduction port for introducing a combustion flame released from the gas burner, a chamber provided separately from the combustion chamber and mounting the substrate A processing chamber for heat treatment, a communication portion comprising a connecting pipe communicating the combustion chamber and the processing chamber, and a combustion gas ejected from the gas burner is introduced from the communication portion to make the combustion gas uniform in the processing chamber. comprising a processing atmosphere forming means for forming a an atmosphere, and an inert gas introducing means for adjusting the reactivity of the combustion gases with an inert gas inlet guide into the processing chamber, the processing Kiri囲Forming means, and characterized by comprising control means for controlling the flow of combustion gas introduced from the communication portion to control and opening and closing of the gas outlet comprises a gas discharge port provided in said processing chamber It is in the heat treatment apparatus.

In such a first aspect, the combustion flame from the gas burner is introduced into the combustion chamber and the combustion gas is introduced from the combustion chamber into the processing chamber to form a uniform atmosphere of the combustion gas, thereby being placed in the processing chamber. The surface of the substrate can be heat-treated, and can be processed efficiently and with good productivity. Further, the combustion gas introduced from the communication portion flows toward the gas discharge port, and forms a uniform combustion gas atmosphere in the processing chamber. Furthermore, the reactivity of the combustion gas can be controlled by introducing the inert gas through the inert gas introducing means.

According to a second aspect of the present invention, in the heat treatment apparatus according to the first aspect, the processing atmosphere forming means includes an air flow control device provided in the processing chamber, and is a combustion gas introduced from the communication portion It is in the heat processing apparatus characterized by controlling the flow of water.

In the second aspect, the flow of the combustion gas from the communication portion is controlled via the airflow control device, and a uniform atmosphere of the combustion gas is formed in the processing chamber.

According to a third aspect of the present invention, in the heat treatment apparatus according to the second aspect, the air flow control device is at least one of a flow control plate and a fan provided in the processing chamber. In the processing unit.

In the third aspect, the flow of the combustion gas introduced from the communication portion is controlled by at least one of the flow control plate and the fan, and a uniform atmosphere of the combustion gas is formed in the processing chamber.

According to a fourth aspect of the present invention, in the heat treatment apparatus according to any one of the first to third aspects, the processing atmosphere forming unit is provided in a housing that forms a wall of the processing chamber and the processing chamber. And a rotational movement device that rotationally drives at least one of the mounting tables on which the substrate is mounted.

In the fourth aspect, at least one of the casing and the mounting table is rotationally driven, and the atmosphere of the combustion gas around the base placed on the mounting table is made uniform.

According to a fifth aspect of the present invention, in the heat treatment apparatus according to any one of the first to fourth aspects, an auxiliary heater is provided on the inner wall of the processing chamber to make the temperature distribution in the processing chamber uniform. It is in the heat processing apparatus characterized by the above-mentioned.

In the fifth aspect, the temperature distribution in the processing chamber is further uniformized by the auxiliary heater.

According to a sixth aspect of the present invention, in the heat treatment apparatus according to any one of the first to fifth aspects, the processing chamber includes an introduction port for introducing the substrate and a discharge port for discharging the substrate. The heat treatment apparatus is characterized by comprising conveying means for conveying the substrate so as to pass through the treatment chamber through a discharge port.

In the sixth aspect, the substrate is transported by the transport means and passes through the processing chamber, so that the heat treatment is continuously performed.

A seventh aspect of the invention, said the first to the heat treatment apparatus according to any one of aspects 6, the processing chamber is in by Ri pressurized state to the introduction of the atmospheric pressure or the combustion gas It is in the heat treatment apparatus.

According the seventh aspect may be the processing chamber to perform heat treatment of the substrate with due Ri pressurized state to the introduction of the atmospheric pressure or combustion gases.

An eighth aspect of the present invention is the heat treatment apparatus according to any one of the first to seventh aspects, further comprising combustion gas heating means for heating the combustion gas in the middle of the connecting pipe or in the processing chamber. The heat treatment apparatus is characterized.

In the eighth aspect, the combustion gas introduced into the combustion chamber is heated by the combustion gas heat treatment means when being introduced into the processing chamber via the communicating portion which is a communication pipe or in the processing chamber.

A ninth aspect of the present invention is the heat treatment apparatus according to any one of the first to eighth aspects, further comprising a cooling device that cools the combustion gas in the middle of the connecting pipe. It is in.

In the ninth aspect, the combustion gas introduced into the combustion chamber is cooled by the cooling device while being introduced into the processing chamber via the communication portion which is a communication pipe, and then heated by the combustion gas heating processing means. .

According to a tenth aspect of the present invention, there is provided a heat treatment method for heat-treating a substrate having a surface made of a metal or an alloy, wherein at least a fuel gas that is a gas containing a compound containing at least carbon is introduced and a combustion gas is introduced from the tip. A gas burner for injecting fuel, a fuel gas introduction means for introducing fuel gas into the gas burner, a combustion chamber having an introduction port for introducing a combustion flame released from the gas burner, and provided separately from the combustion chamber and the A treatment chamber in which a substrate is placed and heat-treated; a communication portion comprising a connecting pipe that connects the combustion chamber and the treatment chamber; and a combustion gas ejected from the gas burner is introduced from the communication portion to perform the treatment. a treatment atmosphere forming means for forming a uniform atmosphere in the combustion gases to the chamber, the inert gas guide for adjusting the reactivity of the combustion gases with an inert gas inlet guide into the processing chamber And the processing atmosphere forming means includes a gas discharge port provided in the processing chamber, and controls the flow of the combustion gas introduced from the communication portion by controlling the opening and closing of the gas discharge port. The processing apparatus is used to place the substrate in the processing chamber, and the combustion gas ejected from the gas burner is introduced into the processing chamber through the communication portion, and the combustion chamber has a uniform atmosphere in the processing chamber In this heat treatment method, an oxide layer which is a carbon-doped oxide layer is formed on the surface of the substrate by forming and heat-treating.

In the tenth aspect, the combustion gas obtained by introducing the combustion flame from the gas burner into the combustion chamber, introducing the combustion gas from the combustion chamber into the processing chamber, and combusting the fuel gas composed of a gas containing at least a compound containing carbon. By forming a uniform atmosphere and heat-treating the surface of the substrate placed in the treatment chamber, an oxide layer that is a carbon-doped oxide layer is formed on the surface of the substrate efficiently and with good productivity. be able to. Further, the heat treatment can be performed while controlling the reactivity of the combustion gas by introducing an inert gas.

According to an eleventh aspect of the present invention, in the heat treatment method according to the tenth aspect, the fuel gas introduced into the gas burner is a gas containing hydrocarbon as a main component. is there.

In the eleventh aspect, the surface of the substrate is heat-treated in an atmosphere of combustion gas obtained by burning a fuel gas containing hydrocarbon as a main component.

A twelfth aspect of the present invention is the heat treatment method according to the eleventh aspect, wherein the hydrocarbon-based gas contains 30% by volume or more of an unsaturated hydrocarbon. It is in.

In the twelfth aspect, the surface of the substrate is heat-treated in an atmosphere of combustion gas obtained by burning a fuel gas containing 30% by volume or more of unsaturated hydrocarbon.

A thirteenth aspect of the present invention is the heat treatment method according to the eleventh or twelfth aspect, wherein the hydrocarbon-based gas contains 50% by volume or more of acetylene. is there.

In the thirteenth aspect, the surface of the substrate is heat-treated in an atmosphere of combustion gas containing 50% by volume or more of acetylene.

According to a fourteenth aspect of the present invention, in the heat treatment method according to any one of the tenth to thirteenth aspects, the carbon of the oxide layer is doped in a state of being bonded to a metal constituting the oxide layer. It is in the heat processing method characterized by having.

In the fourteenth aspect, the carbon-doped oxide layer doped with carbon in a state of being bonded to the metal constituting the oxide layer can be efficiently formed with good productivity.

A fifteenth aspect of the present invention, in the heat treatment method according to the 10-14 or aspects, that the processing chamber is subjected to heat treatment in due Ri pressurized state to the introduction of the atmospheric pressure or the combustion gas In the heat treatment method.

Such fifteenth aspect may be the processing chamber to perform heat treatment of the substrate with due Ri pressurized state to the introduction of the atmospheric pressure or combustion gases.

  ADVANTAGE OF THE INVENTION According to this invention, the heat processing apparatus and the heat processing method which perform efficiently the heat processing which heat-processes the base | substrate which consists of a metal or an alloy and forms an oxide layer, and favorable productivity can be provided.

  Hereinafter, the present invention will be described in detail based on embodiments.

  FIG. 1 is a schematic cross-sectional view of a heat treatment apparatus according to an embodiment. As shown in FIG. 1, the heat treatment apparatus includes a box-shaped lower casing 10 and an upper casing 11 that define a combustion chamber 1 and a processing chamber 2. The lower housing 10 and the upper housing 11 are formed of a heat-resistant and heat-insulating material such as brick and ceramic, for example, and the lower housing 10 and the upper housing 11 are divided into upper and lower portions by a partition wall 12 and the lower housing Reference numeral 10 denotes the combustion chamber 1, and the upper housing 11 serves as the processing chamber 2, and both communicate with each other via a through-hole 13 that is a communication portion formed in the partition wall 12. A mounting table 14 on which the substrate 3 is mounted is provided in the processing chamber 2, and a heater 15 is provided on the inner wall of the processing chamber 2.

  The gas burner 20 is provided in a state in which a tip end portion is inserted into the combustion chamber 1 through an introduction port 21 provided in the lower housing 10. A fuel tank 23 is connected to the gas burner 20 via a valve 22 as fuel gas introduction means. The gas burner 20 is mixed with a fuel gas and a gas containing oxygen, for example, air at a predetermined mixing ratio. It can be introduced.

  On the other hand, the upper part of the upper housing 11 is opened and closed by a lid 16 so as to be opened and closed. The lid 16 is provided with a plurality of gas discharge ports 17 for discharging gas. The gas discharge port 17 includes an adjustment lid 17a so that the gas discharge amount can be adjusted.

  Therefore, when the combustion gas is ejected together with the combustion flame from the gas burner 20, the combustion gas in the combustion chamber 1 flows into the processing chamber 2 through the through-hole 13, and the combustion gas flowing into the processing chamber 2 By independently controlling the opening and closing of each of the gas discharge ports 17, the atmosphere of the combustion gas in the processing chamber 2 can be made uniform. In this case, since the combustion gas fills the processing chamber 2 in a heated state, the temperature in the processing chamber 2 is also uniformed, and it is not necessary to heat in particular. If this is likely to occur, the temperature distribution may be made uniform by heating through the heater 15 as an auxiliary.

  Next, a heat treatment method using such a heat treatment apparatus will be described.

  By placing the base 3 made of metal or alloy on the mounting table 14 and introducing a mixed gas of fuel gas and air into the gas burner 20 and burning it, the combustion gas filled in the combustion chamber 1 passes through the through-hole. 13 is introduced into the processing chamber 2. At this time, the adjustment lid 17a is adjusted to control the gas discharge from the gas discharge port 17 so that the atmosphere of the combustion gas in the processing chamber 2 is uniform. As a result, the heated combustion gas is uniformly filled in the processing chamber 2, the surface of the base 3 placed on the mounting table 14 is processed, and an oxide layer is formed.

  Although the mounting table 14 has two stages for simplification, it is possible to process a large number of substrates 3 at the same time by using more stages.

  Here, as the base 3, for example, a fuel gas introduced into the gas burner 20 using a member made of titanium or a titanium alloy or a member made of a metal other than titanium or a member made of ceramics provided with a titanium layer or a titanium alloy layer. As described above, a carbon-doped titanium oxide layer can be formed by using a gas containing a compound containing at least carbon. Such a carbon-doped titanium oxide layer is doped with carbon in a Ti-C bond state, and is excellent in durability (high hardness, scratch resistance, abrasion resistance, chemical resistance, heat resistance) and visible. It functions as a photoresponsive photocatalyst.

  In order to form such a carbon-doped titanium oxide layer relatively easily, a gas containing a hydrocarbon as a main component, preferably a gas containing 30% by volume or more of an unsaturated hydrocarbon, as a fuel gas, More preferably, a gas containing 50% by volume or more of acetylene is used.

  Moreover, when using such a combustion gas, it is preferable to make it a reduced state combustion gas, and it is preferable to set the mixing ratio of the combustion gas and the oxygen-containing gas to an excessive fuel gas state.

  In the heat treatment apparatus described above, the fuel gas and air are mixed and introduced into the gas burner 20 at a predetermined ratio, but the fuel gas and air are introduced into the gas burner 20 in a controllable manner. Also good. Alternatively, the introduction port 21 into which the gas burner 20 is inserted may be made larger than the outer diameter of the gas burner 20 so that only the fuel gas is introduced into the gas burner 20 and the air may be introduced through the introduction port 21. Further, in the apparatus described above, the tip of the gas burner 20 is used in a state inserted into the combustion chamber 1, but the tip of the gas burner 20 is present in the vicinity of the insertion port or outside the insertion port and is ejected from the tip of the gas burner 20. The combustion gas to be produced may be introduced into the combustion chamber 1.

  Further, in order to obtain a reduced combustion gas, carbon monoxide may be introduced together with or in the fuel gas instead of adjusting the air-fuel ratio so that unburned fuel gas is generated.

  The thickness of the oxide layer by such heat treatment varies depending on the heat treatment time, the heat treatment temperature, the properties of the combustion gas, and the like. In addition, when a high temperature treatment is to be performed, the reaction rate is too fast and the thickness of the oxide layer to be formed may be difficult to control. However, an inert gas is separately introduced to reduce the reaction rate. Thus, control can be facilitated. As the inert gas, nitrogen, argon, helium, or the like can be used, and carbon dioxide can be used. Here, nitrogen can be introduced at low cost by using a nitrogen generator, and since argon is a gas having a large specific gravity, it is useful for lowering the reaction rate at the bottom, and helium gas has good heat conduction, so There is an advantage that it takes a short time to reach the furnace temperature immediately after the introduction. In addition, carbon dioxide has an advantage that it can be obtained at a low cost.

  Further, in the heat treatment apparatus described above, a gas discharge port 17 is provided as a processing atmosphere forming means in the processing chamber 2, and combustion introduced from the through-hole 13 by controlling the opening and closing of the gas discharge port 17 by the adjustment lid 17 a. Although the gas flow is controlled, the gas discharge port 17 is not necessarily provided. For example, the gas is escaped from the gap between the upper housing 11 and the lid body 16 to control the flow of the combustion gas. Also good.

  Furthermore, in addition to or instead of such control, an air flow control device such as a flow control plate or a fan may be provided in the processing chamber 2 as the processing atmosphere forming means. The flow control plate controls the flow of combustion gas introduced into the processing chamber 2 from the through-hole 13, and is, for example, a fin-like member, and controls the flow of fuel gas to control the gas in the processing chamber 2. It makes the atmosphere uniform. In addition, the fan forms a flow in the combustion gas in the processing chamber 2 to make the atmosphere of the combustion gas uniform. For example, as shown in FIG. 2, a fan 18 is provided in the upper part of the processing chamber 2 and the combustion gas staying in the upper part is moved to form a uniform atmosphere. In addition, since the position, size, and number of the through-holes 13 are one of the important elements for forming a uniform atmosphere, the positions and sizes of the gas discharge ports 17, the arrangement of the flow control plate, etc. It is important to design and provide the arrangement and size in consideration of the relationship.

  Moreover, since the uniform atmosphere is the atmosphere of the base 3 placed on the mounting table 14, a uniform atmosphere may be formed by rotating the mounting table 14 about the vertical axis. . Furthermore, the combustion gas in the processing chamber 2 can also be agitated and a uniform atmosphere can be formed by rotationally driving the upper casing 11 having a rectangular horizontal section defining the processing chamber 2 about the vertical axis. At this time, the mounting table 14 may be rotationally driven at the same time.

  In the heat treatment apparatus described above, the combustion chamber 1 is provided adjacent to the treatment chamber 2 and the combustion gas is directly introduced into the treatment chamber 2 through the through-hole 13 provided in the partition wall 12. The temperature can be controlled by the combustion temperature in the gas burner 20, and may be supplementarily controlled by the heater 15 as necessary. Of course, the heat treatment temperature may be controlled by heating the combustion gas with the heater 15 in the processing chamber 2 while keeping the combustion temperature low.

  In addition, when providing the combustion chamber 1 and the processing chamber 2 adjacently in this way, the combustion chamber 1 may be arrange | positioned at the upper part, and both may be arranged side by side.

  Further, the combustion chamber 1 and the processing chamber 2 may be separated.

  In FIG. 3, the heat processing apparatus which concerns on embodiment which made both separate is shown. As shown in the figure, the combustion chamber 1A is constituted by a casing 10A, and the processing chamber 2A is defined by a casing 11A and a lid body 16A, which communicate with each other via a communication pipe 31 serving as a communication portion. In the middle of the communication pipe 31, a cooling device 32 is provided.

  In such a heat treatment apparatus, the combustion gas ejected into the combustion chamber 1 </ b> A by the gas burner 20 is once cooled by the cooling device 32 through the communication pipe 31, then introduced into the treatment chamber 2 </ b> A and heated by the heater 15. Then, the substrate 3 on the mounting table 14 is subjected to a heat treatment. In such a heat treatment apparatus, after combustion gas is generated, it is supplied into the processing chamber 2A while being temporarily held in the cooling device 32, so that the supply amount can be easily controlled, and temperature control is performed. There is an advantage that it is easy to perform. Note that a heating device may be provided between the cooling device 32 of the communication pipe 31 and the processing chamber 2A to control the temperature of the combustion gas introduced into the processing chamber 2A, or a temperature control device instead of the cooling device 32. A combustion gas whose temperature is controlled may be supplied to the processing chamber 2A.

  As described above, the heat treatment apparatus of the present invention may be slightly pressurized due to the introduction of the combustion gas into the treatment chambers 2 and 2A, but basically performs the heat treatment in an atmospheric pressure environment. Therefore, heat treatment can be easily performed. In the heat treatment apparatus of the above-described embodiment, the upper portions of the casings 11 and 11A constituting the processing chambers 2 and 2A are opened, and the base body 3 is introduced and discharged by opening the lids 16 and 16A. Therefore, the heat treatment can be performed efficiently and with good productivity.

  Moreover, although the heat processing by the heat processing apparatus mentioned above turns into batch processing, the heat processing apparatus which can perform continuous heat processing is also realizable.

  In FIG. 4, schematic structure of the heat processing apparatus which concerns on other embodiment is shown. As shown in the figure, the inside of the housing 11B provided separately from the housing 10B constituting the combustion chamber 1B is the processing chamber 2B, and the conveying means 40 is disposed below the processing chamber 2B. . Specifically, a movable shutter 19 that opens and closes in a vertical direction is provided on the left and right of the housing 11B in the drawing, and a conveyance belt 41 of the conveyance means 40 is disposed below the movable shutter 19. The conveyor belt 41 is driven by a pair of rolls 42 provided on both sides of the housing 10B. Therefore, the base 3 placed on the transport belt 41 stays in the processing chamber 2B for a predetermined time while being transported from the left to the right in the figure, for example, and thus continuous heat treatment is possible. It becomes.

  Note that means for performing such continuous processing is not particularly limited, and various conventionally known means can be employed.

  In FIG. 5, the schematic sectional drawing of the heat processing apparatus which concerns on other embodiment is shown. In this embodiment, instead of the conveyor belt 41, a carry-in / carry-in table 50 that carries in and out by reciprocating movement is provided, and a movable shutter 19A is provided on one side of a casing 11C that defines the processing chamber 2C. It is. The carry-in / carry-in table 50 is for carrying the substrate 3 on the substrate 3 and loading / unloading the substrate 3, and a plurality of the substrates may be provided around the housing 11C. Further, instead of the carry-in / carry-in table 50, a means for carrying out and carrying in only the base 3 may be provided.

  Furthermore, the heat treatment apparatus of the present invention may be provided with a pretreatment chamber and a posttreatment chamber before and after the treatment chamber.

  FIG. 6 illustrates an example of a heat treatment apparatus including a pretreatment chamber and a posttreatment chamber. As shown in FIG. 6, this heat treatment apparatus has a housing 60 that defines a pretreatment chamber 6 on the upstream side in the transport direction of the treatment chamber 2D housing 11D, and a posttreatment on the downstream side. A housing 70 that defines the chamber 7 is provided. The housing 11D and the housing 60 and the housing 70 are communicated with each other by movable shutters 19B and 19C, respectively. A movable shutter 61 is provided on the entrance side of the pretreatment chamber 6 of the housing 60, and a movable shutter 71 is provided on the exit side of the posttreatment chamber 7 of the housing 70. Further, a conveying belt 41A of the conveying means 40A is disposed so as to penetrate the movable shutter 71 from the movable shutter 61, and the conveying belt 41A is driven by a pair of rolls 42A provided outside the casings 60 and 70. It is like that. Therefore, the substrate 3 placed on the transport belt 41A stays in the pretreatment chamber 6, the treatment chamber 2D, and the posttreatment chamber 7 for a predetermined time while being transported from left to right in the drawing, for example. Thus, continuous heat treatment including pre-treatment and post-treatment becomes possible.

  The functions of the pretreatment chamber 6 and the posttreatment chamber 7 vary depending on the purpose of use.

  The pretreatment chamber 6 is basically a preheating treatment, and is preferably used for heat treatment for the purpose of removing distortion of the substrate 3 under conditions that do not oxidize. In this case, a heater is provided. That's fine. The post-treatment chamber 7 is used for the purpose of slow cooling or the purpose of aging treatment. In the case of the gradual cooling treatment, any heating means or heating and cooling means for holding at a predetermined temperature may be used. In addition, when performing an aging treatment, it is only necessary to have a rapid cooling means such as gas cooling, and then a heating means for heating to a predetermined temperature. In this case, a post-treatment chamber for rapid cooling and a subsequent heating The processing chamber may be a separate chamber.

  FIG. 7 shows an example of a heat treatment apparatus according to another embodiment. This embodiment has a structure in which a movable shutter is omitted as a conveying means instead of a belt conveyor, and the movable shutter is omitted, and the combustion chamber is disposed adjacent to the upper side of the processing chamber. Is.

  As shown in FIG. 7, the casing 10C constituting the combustion chamber 1C is provided adjacent to the upper side of the casing 11E serving as the processing chamber 2E, and a plurality of through-holes 13A serving as communication portions are provided in both partition walls 12A. Is provided. A plurality of gas discharge ports 17A for controlling the flow of the combustion gas flowing into the processing chamber 2E and making the atmosphere of the combustion gas in the processing chamber 2E uniform is provided at the lower portion of the housing 11E.

  On the other hand, a conveying means 40B is disposed below the processing chamber 2E. Specifically, left and right in the figure are supported movably in the vertical direction, and a conveyor 43 that opens and closes the lower opening of the housing 11E is provided. That is, the mounting table 14 for mounting the substrate 3 is provided on the conveyor 43, and the substrate 3 can be moved in the vertical and horizontal directions in the figure while the substrate 3 is mounted on the mounting table 14, and the casing 11E. The lower opening is opened and closed, and the substrate 3 is carried into and out of the processing chamber 2E. Since the inside of the housing 11E is slightly positive pressure slightly higher than the atmospheric pressure, the sealing structure between the housing 11E and the conveyor 43 may be simple. Further, the housing 11E itself may be freely movable in the vertical direction so that it can be opened, or the upper wall of the housing 11E may be a separate body and movable together with the housing 10C. Furthermore, instead of making the conveyor 43 movable, the housing 11E may be movable together with the housing 10C.

  In such a heat treatment apparatus, the substrate 3 can be easily carried in and out, and particularly when a large amount of the substrate 3 is processed, there is an advantage that the carrying in and out can be simplified.

  Further, the combustion chamber 1C is disposed above the processing chamber 2E, the combustion gas having a high temperature is introduced into the lower processing chamber 2E, and the gas discharge port 17A is provided at the lower portion of the processing chamber 2E. There is an advantage that it is easy to maintain the temperature distribution over the direction and the uniformity of the atmosphere of the combustion gas.

  Heat treatment was performed using the heat treatment apparatus described in FIG.

  Acetylene and air were introduced into the gas burner 20 to form a combustion flame, and the combustion gas in the combustion chamber 1 was introduced into the processing chamber 2 through the through-hole 13. On the mounting table 14, a case formed of a titanium plate having a thickness of 0.3 mm was placed and the surface thereof was treated. The housing having a carbon-doped titanium oxide layer as a surface layer was formed by controlling the gas burner 20 so that the temperature in the processing chamber 2 was about 900 ° C. and performing heat treatment.

  The heat treatment apparatus and heat treatment method of the present invention can be employed in various fields and applications in which an oxide layer is formed by heat-treating a substrate having a surface made of metal or an alloy, for example, durability (high hardness, Heat treatment for obtaining scratch resistance, abrasion resistance, chemical resistance, and heat resistance) can be performed efficiently and with good productivity.

It is sectional drawing which shows schematic structure of the heat processing apparatus of one Embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention. It is sectional drawing which shows schematic structure of the heat processing apparatus of other embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 1A, 1B Combustion chamber 2, 2A, 2B Processing chamber 3 Base | substrate 10 Lower housing | casing 11 Upper housing | casing 10A, 10B, 10C, 11A, 11B, 11C Housing | casing 13 Through-hole 14 Mounting stand 15 Heater 16 Cover body 17 Gas Exhaust port 18 Fan 20 Gas burner

Claims (15)

A heat treatment apparatus for heat-treating a substrate whose surface is made of a metal or alloy,
A gas burner that introduces at least fuel gas and ejects combustion gas from the tip; fuel gas introduction means for introducing fuel gas into the gas burner; and a combustion chamber having an inlet for introducing a combustion flame released from the gas burner; A treatment chamber that is provided separately from the combustion chamber and heat-treats by placing the substrate, a communication portion that includes a connecting pipe that communicates the combustion chamber and the treatment chamber, and combustion that is ejected from the gas burner a processing atmosphere creation means a gas is introduced from the communication portion to form a uniform atmosphere of the combustion gas in the process chamber, not to adjust the reactivity of the combustion gases with an inert gas inlet guide into the processing chamber comprising an active gas introduction means, is introduced from the process atmosphere forming means controls the and closing of the gas outlet comprises a gas discharge port provided in the processing chamber the communicating portion Heat treatment apparatus characterized by comprising a control means for controlling the flow of combustion gases that. The heat treatment apparatus according to claim 1,
The heat treatment apparatus, wherein the treatment atmosphere forming means includes an air flow control device provided in the treatment chamber, and controls a flow of combustion gas introduced from the communication portion. The heat treatment apparatus according to claim 2,
The heat treatment apparatus, wherein the air flow control device is at least one of a flow control plate and a fan provided in the processing chamber. In the heat processing apparatus as described in any one of Claims 1-3,
The processing atmosphere forming means includes a rotational movement device that rotationally drives at least one of a housing that forms a wall of the processing chamber and a mounting table that is provided in the processing chamber and on which the substrate is mounted. A heat treatment apparatus. In the heat processing apparatus as described in any one of Claims 1-4 ,
An auxiliary heater is provided on the inner wall of the processing chamber to make the temperature distribution in the processing chamber uniform. In the heat processing apparatus as described in any one of Claims 1-5 ,
The processing chamber has an introduction port for introducing the substrate and a discharge port for discharging the substrate, and further includes conveying means for conveying the substrate so as to pass through the treatment chamber through the introduction port and the discharge port. A heat treatment apparatus. In the heat processing apparatus as described in any one of Claims 1-6 ,
The processing chamber heat treatment apparatus, characterized in that in the by Ri pressurized state to the introduction of the atmospheric pressure or the combustion gases. In the heat treatment apparatus according to any one of claim 1 to 7
A heat treatment apparatus comprising combustion gas heating means for heating combustion gas in the middle of the connecting pipe or in the processing chamber. In the heat processing apparatus as described in any one of Claims 1-8 ,
A heat treatment apparatus comprising a cooling device for cooling the combustion gas in the middle of the connecting pipe. A heat treatment method for heat-treating a substrate having a surface made of a metal or an alloy,
A gas burner that introduces at least a fuel gas, which is a gas containing a compound containing at least carbon, and ejects a combustion gas from the tip; a fuel gas introduction means that introduces the fuel gas into the gas burner; and a combustion flame emitted from the gas burner A combustion chamber having an introduction port for introducing gas, a processing chamber that is provided separately from the combustion chamber, heats the base body, and a connecting pipe that communicates the combustion chamber and the processing chamber. a communicating portion, and the treatment atmosphere forming means combustion gas ejected from the gas burner is introduced from the communication portion to form a uniform atmosphere in the combustion gases to the processing chamber, the processing of an inert gas introduced City chamber An inert gas introduction means for adjusting the reactivity of the combustion gas, and the processing atmosphere forming means includes a gas exhaust port provided in the processing chamber, A heat treatment device that controls the opening and closing of the opening to control the flow of combustion gas introduced from the communication portion, and the substrate is placed in the processing chamber and the combustion gas ejected from the gas burner is communicated to the communication chamber. An oxide layer, which is a carbon-doped oxide layer, is formed on the surface of the substrate by introducing into the processing chamber through the section and forming a uniform atmosphere of combustion gas in the processing chamber and performing heat treatment. The heat processing method characterized by comprising. In the heat processing method of Claim 10 ,
The heat treatment method, wherein the fuel gas introduced into the gas burner is a gas containing hydrocarbon as a main component. In the heat processing method of Claim 11 ,
The heat treatment method, wherein the gas containing hydrocarbon as a main component contains 30% by volume or more of unsaturated hydrocarbon. The heat treatment method according to claim 11 or 12 ,
The heat treatment method, wherein the gas containing hydrocarbon as a main component contains 50% by volume or more of acetylene. In the heat processing method as described in any one of Claims 10-13 ,
The heat treatment method, wherein carbon of the oxide layer is doped in a state of being bonded to a metal constituting the oxide layer. In the heat processing method as described in any one of Claims 10-14 ,
Heat treatment wherein said treatment chamber and performing the heat treatment in due Ri pressurized state to the introduction of the atmospheric pressure or the combustion gases.

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