JP5310671B2 - Glass substrate for magnetic recording medium and method for manufacturing the same - Google Patents

Glass substrate for magnetic recording medium and method for manufacturing the same Download PDF

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JP5310671B2
JP5310671B2 JP2010174446A JP2010174446A JP5310671B2 JP 5310671 B2 JP5310671 B2 JP 5310671B2 JP 2010174446 A JP2010174446 A JP 2010174446A JP 2010174446 A JP2010174446 A JP 2010174446A JP 5310671 B2 JP5310671 B2 JP 5310671B2
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glass substrate
peripheral side
magnetic recording
recording medium
outer peripheral
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JP2012035330A (en
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出 鹿島
一晃 石橋
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AGC Inc
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Description

本発明は、ガラス基板の内周側面または外周側面の少なくとも一方を砥石で研削する磁気記録媒体用ガラス基板の製造方法に関する。   The present invention relates to a method for manufacturing a glass substrate for a magnetic recording medium, in which at least one of an inner peripheral side surface and an outer peripheral side surface of a glass substrate is ground with a grindstone.

近年の磁気ディスクの高記録密度化にともない、磁気記録媒体用ガラス基板への要求特性が年々厳しくなってきている。磁気ディスクの高記録密度化を達成するために、ガラス基板主平面の異物欠陥を低減して主平面の平滑性を向上することが求められている。また、情報記録媒体としての信頼性を向上させるため、ガラス基板の機械的強度を高くすることが求められている。   With the recent increase in recording density of magnetic disks, the required characteristics for glass substrates for magnetic recording media are becoming more and more severe year by year. In order to achieve a higher recording density of a magnetic disk, it is required to reduce foreign matter defects on the main surface of the glass substrate and improve the smoothness of the main surface. Moreover, in order to improve the reliability as an information recording medium, it is required to increase the mechanical strength of the glass substrate.

磁気記録媒体用ガラス基板の側面部を平滑性高く仕上げることは、ガラス基板の機械的強度の向上、側面部の凹凸に捕捉される異物の低減、側面部の凹凸がカセットの樹脂部材を削ることにより発生する異物の低減、などの効果があり、磁気ディスクの高記録密度化と信頼性を向上させるうえで重要である。   Finishing the side surface of the glass substrate for magnetic recording media with high smoothness improves the mechanical strength of the glass substrate, reduces foreign matter trapped by the unevenness of the side surface, and the unevenness of the side surface scrapes the resin member of the cassette. This is important for improving the recording density and reliability of the magnetic disk.

磁気記録媒体用ガラス基板の側面部は、端面研削工程でガラス基板の内周側面または外周側面の少なくとも一方を砥石で研削後、端面研磨工程でガラス基板の側面部を研磨して、平滑に仕上げられる。しかし、端面研削工程で深いクラック(以下、加工変質層と称す。)が生じると、次の端面研磨工程で加工変質層を充分に除去できず、磁気記録媒体用ガラス基板の側面部に加工変質層が残留し、平滑な側面部とならない。   The side surface of the glass substrate for magnetic recording media is smoothened by grinding at least one of the inner or outer peripheral surface of the glass substrate with a grindstone in the end surface grinding process and then polishing the side surface of the glass substrate in the end surface polishing process. It is done. However, if a deep crack (hereinafter referred to as a work-affected layer) occurs in the end surface grinding process, the work-affected layer cannot be sufficiently removed in the next end face polishing process, and the work deterioration is caused on the side surface of the glass substrate for magnetic recording media. The layer remains and does not have a smooth side.

磁気記録媒体用ガラス基板の側面部を平滑に仕上げる端面研削方法として、研削されるガラス基板の側面部に供給する冷却液の温度を28℃以下に調整し、研削中に砥石から砥粒が抜け落ちることを抑制しながらガラス基板の側面部を研削する方法が提案されている(特許文献1)。しかし、特許文献1の研削方法は、砥石に深い加工変質層を生じさせる要因がある場合、冷却液の温度を28℃以下としても深い加工変質層の発生抑制が難しく、平滑な側面部にできないおそれがある。   As an end face grinding method for smoothly finishing the side surface portion of the glass substrate for magnetic recording media, the temperature of the coolant supplied to the side surface portion of the glass substrate to be ground is adjusted to 28 ° C. or less, and the abrasive grains fall off from the grindstone during grinding. A method of grinding a side surface portion of a glass substrate while suppressing this is proposed (Patent Document 1). However, in the grinding method of Patent Document 1, when there is a factor that causes a deep work-affected layer on the grindstone, it is difficult to suppress the generation of the deep work-affected layer even if the coolant temperature is 28 ° C. or lower, and a smooth side surface cannot be obtained. There is a fear.

特開2007−98483号公報JP 2007-98483 A

本発明は、側面部または面取り部の平滑性に優れる磁気記録媒体用ガラス基板の提供を目的とする。また、側面部または面取り部の平滑性に優れる磁気記録媒体用ガラス基板に高い生産性で研削する端面研削方法、及び該端面研削方法を用いた端面研磨工程を有する磁気記録媒体用ガラス基板の製造方法の提供を目的とする。   An object of this invention is to provide the glass substrate for magnetic recording media which is excellent in the smoothness of a side part or a chamfer part. Further, an end surface grinding method for grinding a glass substrate for magnetic recording medium having excellent smoothness of a side surface portion or a chamfered portion with high productivity, and manufacture of a glass substrate for magnetic recording medium having an end surface polishing step using the end surface grinding method The purpose is to provide a method.

本発明は、主平面と、内周側面と、外周側面とからなる中心部に円孔を有する円盤形状の磁気記録媒体用ガラス基板の製造方法であって、該磁気記録媒体用ガラス基板の製造方法は、板形状を有するガラス基板の形状付与工程と、前記ガラス基板の内周側面または外周側面の少なくとも一方を砥石で研削する端面研削工程と、前記ガラス基板の内周側面または外周側面の少なくとも一方を研磨する端面研磨工程と、前記ガラス基板の主平面の研磨工程と、前記ガラス基板の洗浄工程と、を有し、前記端面研削工程は、ガラス基板の内周側面または外周側面の少なくとも一方に研削液を供給するとともに、砥石とガラス基板を相対的に動かし、砥石の研削面をガラス基板の内周側面または外周側面の少なくとも一方に接触させて研削するものであり、前記砥石は砥粒が結合剤により結合されてなる砥石であり、該砥粒はレーザ回折散乱方式の粒度分布測定装置を用いて測定した粒子径の最大粒子径dmaxと最小粒子径dminとの差である砥粒粒度分布幅△d(=dmax−dmin)が23μm以下であり、かつ平均粒子径が10μm〜40μmであることを特徴とする磁気記録媒体用ガラス基板の製造方法を提供する。 The present invention relates to a method of manufacturing a disk substrate for a magnetic recording medium having a circular hole in a central portion including a main plane, an inner peripheral side surface, and an outer peripheral side surface, and the manufacturing of the glass substrate for a magnetic recording medium The method includes a shape imparting step of a glass substrate having a plate shape, an end surface grinding step of grinding at least one of an inner peripheral side surface or an outer peripheral side surface of the glass substrate with a grindstone, and at least an inner peripheral side surface or an outer peripheral side surface of the glass substrate. An end surface polishing step for polishing one side, a polishing step for the main plane of the glass substrate, and a cleaning step for the glass substrate, wherein the end surface grinding step is at least one of an inner peripheral side surface or an outer peripheral side surface of the glass substrate. In addition to supplying the grinding fluid to the glass substrate, the grindstone and the glass substrate are moved relatively, and the grinding surface of the grindstone is brought into contact with at least one of the inner peripheral side surface or the outer peripheral side surface of the glass substrate for grinding. Ri, the grinding wheel is a grinding wheel made of are joined by abrasive grain binder, the abrasive grains and the maximum particle diameter dmax and the minimum diameter dmin of the particle diameter measured using a particle size distribution measuring device of laser diffraction scattering method a difference abrasive grain size distribution width △ d (= dmax-dmin) is Ri der less 23 .mu.m, and a method of manufacturing a glass substrate for a magnetic recording medium having an average particle diameter and wherein 10μm~40μm der Rukoto provide.

本発明の端面研削工程を有する磁気記録媒体用ガラス基板の製造方法は、側面部または面取り部の平滑性に優れる磁気記録媒体用ガラス基板を高い生産性で製造できる。本発明の磁気記録媒体用ガラス基板の製造方法により造られた磁気記録媒体用ガラス基板の上に、磁性層などの薄膜を形成して製造した磁気ディスクは、磁気ヘッドの浮上量を容易に低下でき、機械的強度に優れるため、磁気ディスクの高記録密度化と信頼性を向上できる。   The method for producing a glass substrate for a magnetic recording medium having an end surface grinding step of the present invention can produce a glass substrate for a magnetic recording medium having excellent smoothness of a side surface or a chamfered portion with high productivity. A magnetic disk manufactured by forming a thin film such as a magnetic layer on a glass substrate for a magnetic recording medium manufactured by the method for manufacturing a glass substrate for a magnetic recording medium of the present invention easily reduces the flying height of the magnetic head. In addition, since it has excellent mechanical strength, it is possible to increase the recording density and reliability of the magnetic disk.

磁気記録媒体用ガラス基板の斜視図。The perspective view of the glass substrate for magnetic recording media. 磁気記録媒体用ガラス基板の断面斜視図。The cross-sectional perspective view of the glass substrate for magnetic recording media. ガラス基板の内周側面または外周側面を砥石で研削する端面研削工程を説明する概略図。Schematic explaining the end surface grinding process which grinds the inner peripheral side surface or outer peripheral side surface of a glass substrate with a grindstone. 砥粒粒度分布幅が23μm以下である砥石の研削面の拡大断面図。The expanded sectional view of the grinding surface of the grindstone whose abrasive grain size distribution width is 23 micrometers or less. 砥粒粒度分布幅が23μmを超える砥石の研削面の拡大断面図。The expanded sectional view of the grinding surface of the grindstone whose abrasive grain size distribution width exceeds 23 micrometers. ピット欠陥がない面取り部(良品)の顕微鏡観察画像。Microscopic observation image of chamfered part (good product) without pit defects. ピット欠陥がある面取り部の顕微鏡観察画像。Microscopic observation image of chamfer with pit defects. 例1で使用した砥石に含まれる砥粒の粒度分布を示すグラフ。The graph which shows the particle size distribution of the abrasive grain contained in the grindstone used in Example 1. FIG. 例2で使用した砥石に含まれる砥粒の粒度分布を示すグラフ。The graph which shows the particle size distribution of the abrasive grain contained in the grindstone used in Example 2. FIG. 例3で使用した砥石に含まれる砥粒の粒度分布を示すグラフ。4 is a graph showing the particle size distribution of abrasive grains contained in the grindstone used in Example 3.

以下、本発明を実施するための形態について説明するが、本発明は以下に記載される実施形態に限らない。   Hereinafter, although the form for implementing this invention is demonstrated, this invention is not restricted to embodiment described below.

まず、本発明の磁気記録媒体用ガラス基板10の斜視図を図1に、磁気記録媒体用ガラス基板10を切断したものの断面斜視図を図2に示す。図1と図2において各符号は、磁気記録媒体用ガラス基板の主平面101、内周側面102、外周側面103、内周面取り部104、外周面取り部105をそれぞれ示す。   First, FIG. 1 shows a perspective view of a glass substrate 10 for a magnetic recording medium according to the present invention, and FIG. 2 shows a cross-sectional perspective view of the glass substrate 10 for a magnetic recording medium cut. In FIG. 1 and FIG. 2, each symbol indicates a main plane 101, an inner peripheral side surface 102, an outer peripheral side surface 103, an inner peripheral chamfered portion 104, and an outer peripheral chamfered portion 105 of the magnetic recording medium glass substrate.

一般に、磁気記録媒体用ガラス基板及び磁気ディスクの製造工程は、以下の工程を含む。(1)フロート法、フュージョン法またはプレス成形法などで成形されたガラス素基板を、中心部に円孔を有する円盤形状に加工する。(2)ガラス基板の内周側面と外周側面を面取り加工する。(3)ガラス基板の側面部と面取り部を端面研磨する。(4)ガラス基板の上下主平面を研磨する。研磨工程は、1次研磨のみでも良く、1次研磨と2次研磨を行っても良く、2次研磨の後に3次研磨を行っても良い。(5)ガラス基板を精密洗浄し、磁気記録媒体用ガラス基板を製造する。(6)磁気記録媒体用ガラス基板の上に磁性層などの薄膜を形成し、磁気ディスクを製造する。   Generally, the manufacturing process of the glass substrate for magnetic recording media and the magnetic disk includes the following processes. (1) A glass base substrate molded by a float method, a fusion method, a press molding method, or the like is processed into a disk shape having a circular hole at the center. (2) Chamfering the inner peripheral side surface and the outer peripheral side surface of the glass substrate. (3) The side surfaces and chamfered portions of the glass substrate are end-polished. (4) The upper and lower main planes of the glass substrate are polished. The polishing step may be only primary polishing, primary polishing and secondary polishing may be performed, or tertiary polishing may be performed after secondary polishing. (5) The glass substrate is precisely cleaned to produce a glass substrate for a magnetic recording medium. (6) A thin film such as a magnetic layer is formed on a glass substrate for a magnetic recording medium to manufacture a magnetic disk.

なお、上記磁気記録媒体用ガラス基板及び磁気ディスクの製造工程において、各工程間にガラス基板洗浄(工程間洗浄)やガラス基板表面のエッチング(工程間エッチング)を実施してもよい。さらに、磁気記録媒体用ガラス基板に高い機械的強度が求められる場合、ガラス基板の表層に強化層を形成する強化工程(例えば、化学強化工程)を研磨工程前、または研磨工程後、あるいは研磨工程間で実施してもよい。   In the manufacturing process of the glass substrate for magnetic recording medium and the magnetic disk, glass substrate cleaning (inter-process cleaning) or etching of the glass substrate surface (inter-process etching) may be performed between the processes. Furthermore, when high mechanical strength is required for the glass substrate for magnetic recording media, a strengthening step (for example, a chemical strengthening step) for forming a reinforcing layer on the surface layer of the glass substrate is performed before the polishing step, after the polishing step, or the polishing step. You may carry out between.

本発明において、磁気記録媒体用ガラス基板は、アモルファスガラスでもよく、結晶化ガラスでもよく、ガラス基板の表層に強化層を有する強化ガラス(例えば、化学強化ガラス)でもよい。また、本発明のガラス基板のガラス素基板は、フロート法で造られたものでも良く、フュージョン法で造られたものでも良く、プレス成形法で造られたものでもよい。   In the present invention, the glass substrate for a magnetic recording medium may be amorphous glass, crystallized glass, or tempered glass (for example, chemically tempered glass) having a tempered layer on the surface layer of the glass substrate. Moreover, the glass base substrate of the glass substrate of the present invention may be made by a float method, may be made by a fusion method, or may be made by a press molding method.

本発明は、(2)ガラス基板の内周側面と外周側面を面取り加工する端面研削工程に関し、磁気記録媒体用ガラス基板の端面研削加工に係るものである。   The present invention relates to (2) an end surface grinding process for chamfering an inner peripheral side surface and an outer peripheral side surface of a glass substrate, and relates to an end surface grinding process of a glass substrate for a magnetic recording medium.

図3は、ガラス基板の外周側面を砥石で研削する端面研削工程を説明する概略図である。図3において、20は砥石、201は砥粒、202は研削面、205は基台、30は研削液供給ノズル、301は研削液、をそれぞれ示す。図1と図2で示した内容と同一のものには同符号を付し、その説明を省略する。なお、ガラス基板の内周側面についても同様である。   FIG. 3 is a schematic view for explaining an end surface grinding step of grinding the outer peripheral side surface of the glass substrate with a grindstone. In FIG. 3, 20 is a grindstone, 201 is abrasive grains, 202 is a grinding surface, 205 is a base, 30 is a grinding fluid supply nozzle, and 301 is a grinding fluid. The same components as those shown in FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof is omitted. The same applies to the inner peripheral side surface of the glass substrate.

図4は砥石の研削面の拡大断面図である。図4Aは砥粒粒度分布幅が23μm以下である砥石の研削面を模式的に示す拡大断面図、図4Bは砥粒粒度分布幅が23μmを超える砥石の研削面を模式的に示す拡大断面図をそれぞれ示す。図4Aと図4Bにおいて、203は粒子径が大きな砥粒、204は結合剤をそれぞれ示す。なお、図3と同一内容のものには同符号を付し、その説明を省略する。   FIG. 4 is an enlarged cross-sectional view of the grinding surface of the grindstone. 4A is an enlarged cross-sectional view schematically showing a grinding surface of a grindstone having an abrasive grain size distribution width of 23 μm or less, and FIG. 4B is an enlarged cross-sectional view schematically showing a grinding surface of a grindstone having an abrasive grain size distribution width exceeding 23 μm. Respectively. 4A and 4B, 203 indicates abrasive grains having a large particle diameter, and 204 indicates a binder. Note that components having the same contents as those in FIG.

磁気記録媒体用ガラス基板10の外周側面103は、ガラス基板の側面を研削する砥石20をセットした端面研削装置を用い、研削液供給ノズル30から研削面202に対して研削液301を供給するとともに、磁気記録媒体用ガラス基板10と砥石20を相対的に動かし、ガラス基板の外周側面103と研削面202とを接触させて研削される。   The outer peripheral side surface 103 of the glass substrate 10 for magnetic recording medium is supplied with the grinding fluid 301 from the grinding fluid supply nozzle 30 to the grinding surface 202 using an end surface grinding device on which a grindstone 20 for grinding the side surface of the glass substrate is set. Then, the glass substrate 10 for magnetic recording medium and the grindstone 20 are relatively moved, and the outer peripheral side surface 103 and the grinding surface 202 of the glass substrate are brought into contact with each other to be ground.

本発明者は、ガラス基板の側面部または面取り部に深い加工変質層がない磁気記録媒体用ガラス基板10を高い生産性で造る手段を検討した結果、磁気記録媒体用ガラス基板10の内周側面102または外周側面103の少なくとも一方を砥石で研削する端面研削工程において、砥石20に含有される砥粒201の砥粒粒度分布幅△dを23μm以下とすると有効であることを見出した。   As a result of studying means for producing the glass substrate 10 for magnetic recording medium having no deep work-affected layer on the side surface portion or chamfered portion of the glass substrate with high productivity, the inventor has found that the inner peripheral side surface of the glass substrate 10 for magnetic recording medium. In an end face grinding process in which at least one of 102 or the outer peripheral side surface 103 is ground with a grindstone, it has been found that it is effective to set the abrasive grain size distribution width Δd of the abrasive grains 201 contained in the grindstone 20 to 23 μm or less.

砥石20に含有される砥粒201の砥粒粒度分布幅△dが23μm以下であると、例えば図4Aに示すような研削面202でガラス基板の側面を研削するため、ガラス基板の側面部または面取り部に深い加工変質層が発生しない。しかし、砥石20に含有される砥粒201の砥粒粒度分布幅△dが23μmを超えた場合、例えば図4Bに示すような粒子径の大きな砥粒203が突出した研削面202でガラス基板の側面を研削するため、ガラス基板の側面部または面取り部は、研削面より突出した粒子径の大きな砥粒203によって大きなダメージを受け、深い加工変質層を生じるおそれがある。   When the abrasive grain size distribution width Δd of the abrasive grains 201 contained in the grindstone 20 is 23 μm or less, for example, the side surface of the glass substrate is ground by the grinding surface 202 as shown in FIG. A deep work-affected layer does not occur in the chamfer. However, when the abrasive grain size distribution width Δd of the abrasive grains 201 contained in the grindstone 20 exceeds 23 μm, the grinding surface 202 on which the abrasive grains 203 having a large particle diameter as shown in FIG. Since the side surface is ground, the side surface portion or the chamfered portion of the glass substrate may be greatly damaged by the abrasive grains 203 having a large particle diameter protruding from the ground surface, thereby generating a deep work-affected layer.

砥石20に含有される砥粒201の砥粒粒度分布幅△dは23μm以下であり、好ましくは22μm以下、特に好ましくは20μm以下である。   The abrasive grain size distribution width Δd of the abrasive grains 201 contained in the grindstone 20 is 23 μm or less, preferably 22 μm or less, and particularly preferably 20 μm or less.

本発明の砥石20に含有される砥粒の平均粒子径は、10μm〜40μmであることが好ましい。砥粒の平均粒子径が10μm未満であると、研削の加工速度が低く、生産性に劣るおそれがある。砥粒の平均粒子径が40μmを超えた場合、研削の加工速度は高いが、ガラス基板の側面部または面取り部に深い加工変質層を生じさせ、平滑性に優れる側面部または面取り部を有する磁気記録媒体用ガラス基板が得られないおそれがある。   The average particle size of the abrasive grains contained in the grindstone 20 of the present invention is preferably 10 μm to 40 μm. When the average particle diameter of the abrasive grains is less than 10 μm, the grinding processing speed is low and the productivity may be inferior. When the average particle diameter of the abrasive grains exceeds 40 μm, the grinding processing speed is high, but a deep work-affected layer is formed in the side surface portion or chamfered portion of the glass substrate, and the side surface portion or chamfered portion having excellent smoothness is produced. There is a possibility that a glass substrate for recording medium cannot be obtained.

砥石20に含有される砥粒201の平均粒子径は、10μm〜40μmが好ましく、10μm〜35μmが更に好ましく、10μm〜30μmが特に好ましい。   The average particle diameter of the abrasive grains 201 contained in the grindstone 20 is preferably 10 μm to 40 μm, more preferably 10 μm to 35 μm, and particularly preferably 10 μm to 30 μm.

なお、砥粒の粒子径は、レーザ回折散乱方式の粒度分布測定装置を用いて測定する。   The particle diameter of the abrasive grains is measured using a laser diffraction / scattering particle size distribution measuring apparatus.

本発明において砥石20は、砥粒201としてダイヤモンド砥粒、アルミナ砥粒、炭化ケイ素砥粒のいずれか1つ以上の砥粒を含む。前記砥粒のなかでも、ダイヤモンド砥粒が、研削の加工速度が高く、加工変質層を発生させ難いため好ましい。砥粒201を結合する結合剤204としては、金属、樹脂、またはガラス質(ビトリファイド)のいずれか1つ以上の結合剤を用いる。   In the present invention, the grindstone 20 includes, as the abrasive grains 201, at least one of diamond abrasive grains, alumina abrasive grains, and silicon carbide abrasive grains. Among the abrasive grains, diamond abrasive grains are preferable because the grinding speed is high and it is difficult to generate a work-affected layer. As the binder 204 that binds the abrasive grains 201, any one or more binders of metal, resin, or vitreous (vitrified) are used.

本発明の端面研削工程を有する磁気記録媒体用ガラス基板の製造方法で造られた磁気記録媒体用ガラス基板の内周側面または外周側面のうち少なくとも一方は、ピット欠陥の数が5個/mm以下である。 At least one of the inner peripheral side surface and the outer peripheral side surface of the glass substrate for magnetic recording medium manufactured by the method for manufacturing a glass substrate for magnetic recording medium having the end surface grinding step of the present invention has a number of pit defects of 5 / mm 2. It is as follows.

磁気記録媒体用ガラス基板の内周側面や外周側面のピット欠陥の数が5個/mmを超えた場合、磁気記録媒体用ガラス基板の機械的強度が低下し、磁気ディスクとしたときに情報記録媒体としての信頼性に劣るおそれがある。また、ガラス基板の側面部の凹凸に捕捉された異物や、ガラス基板の側面部の凹凸がカセットの樹脂部材を削ることにより発生する異物が、磁気記録媒体用ガラス基板の主平面に付着して磁気ディスクとしたときに表面異物欠陥となり、磁気ディスクのHDD(ハードディスクドライブ)試験において磁気ヘッドの浮上姿勢を乱し、磁気ヘッドが磁気ディスクに接触する障害を引き起こすおそれがある。 When the number of pit defects on the inner and outer peripheral sides of the glass substrate for magnetic recording media exceeds 5 / mm 2 , the mechanical strength of the glass substrate for magnetic recording media decreases and information is obtained when a magnetic disk is obtained. There is a possibility that the reliability as a recording medium is inferior. In addition, foreign matter trapped in the irregularities on the side surface of the glass substrate or foreign matter generated when the irregularities on the side surface of the glass substrate scrape the resin member of the cassette adhere to the main plane of the glass substrate for magnetic recording media. When a magnetic disk is used, a surface foreign matter defect may occur, and the flying position of the magnetic head may be disturbed in an HDD (Hard Disk Drive) test of the magnetic disk, causing a failure of the magnetic head to contact the magnetic disk.

磁気記録媒体用ガラス基板の内周側面または外周側面のうち少なくとも一方におけるピット欠陥の数は、3個/mm以下が好ましく、1個/mm以下が更に好ましく、0個/mmが特に好ましい。 The number of pit defects on at least one of the inner peripheral side surface and the outer peripheral side surface of the glass substrate for magnetic recording media is preferably 3 / mm 2 or less, more preferably 1 / mm 2 or less, particularly 0 / mm 2. preferable.

さらに、本発明の端面研削工程を有する磁気記録媒体用ガラス基板の製造方法で造られた磁気記録媒体用ガラス基板の内周面取り部または外周面取り部のうち少なくとも一方は、ピット欠陥の数が5個/mm以下である。 Furthermore, at least one of the inner peripheral chamfered portion and the outer peripheral chamfered portion of the glass substrate for magnetic recording medium manufactured by the method for manufacturing a glass substrate for magnetic recording medium having the edge grinding step of the present invention has 5 pit defects. Pieces / mm 2 or less.

磁気記録媒体用ガラス基板の内周面取り部や外周面取り部のピット欠陥の数が5個/mmを超えた場合、磁気記録媒体用ガラス基板の機械的強度が低下し、磁気ディスクとしたときに情報記録媒体としての信頼性に劣るおそれがある。また、ガラス基板の面取り部の凹凸に捕捉された異物や、ガラス基板の面取り部の凹凸がカセットの樹脂部材を削ることにより発生する異物が、磁気記録媒体用ガラス基板の主平面に付着して磁気ディスクの表面異物欠陥となり、磁気ディスクのHDD(ハードディスクドライブ)試験において磁気ヘッドの浮上姿勢を乱し、磁気ヘッドが磁気ディスクに接触する障害を引き起こすおそれがある。 When the number of pit defects in the inner peripheral chamfered portion or outer peripheral chamfered portion of the glass substrate for magnetic recording medium exceeds 5 / mm 2 , the mechanical strength of the glass substrate for magnetic recording medium decreases and the magnetic disk is obtained. In addition, the reliability as an information recording medium may be inferior. In addition, foreign matter trapped by the irregularities of the chamfered portion of the glass substrate or foreign matter generated when the irregularities of the chamfered portion of the glass substrate scrape the resin member of the cassette adhere to the main plane of the glass substrate for magnetic recording media. There is a possibility that the surface of the magnetic disk may become defective, and the flying position of the magnetic head may be disturbed in the HDD (Hard Disk Drive) test of the magnetic disk, causing a failure of the magnetic head to contact the magnetic disk.

磁気記録媒体用ガラス基板の内周面取り部または外周面取り部うち少なくとも一方におけるピット欠陥の数は、3個/mm以下が好ましく、1個/mm以下が更に好ましく、0個/mmが特に好ましい。 The number of pit defects in at least one of the inner peripheral chamfered portion or the outer peripheral chamfered portion of the glass substrate for magnetic recording medium is preferably 3 pieces / mm 2 or less, more preferably 1 piece / mm 2 or less, and 0 pieces / mm 2. Particularly preferred.

なお、磁気記録媒体用ガラス基板10の内周側面102、外周側面103、内周面取り部104、及び外周面取り部105のピット欠陥の数は、以下の手順で評価する。   The number of pit defects in the inner peripheral side surface 102, the outer peripheral side surface 103, the inner peripheral chamfered portion 104, and the outer peripheral chamfered portion 105 of the glass substrate 10 for magnetic recording medium is evaluated by the following procedure.

ガラス基板の表面を、フッ酸や硝酸を含む酸性のエッチング溶液を用いて5μmエッチングし、側面部と面取り部に残留する加工変質層(クラックやキズなど)を等方的にエッチングして観察しやすい大きさの凹部(ピット欠陥106)とする。直径(または長径)が10μm以上の円形状または楕円形状の凹部をピット欠陥106とし、光学顕微鏡を用いてピット欠陥106の数をカウントした。ピット欠陥106を評価する位置は、ガラス基板の内周側面102、外周側面103、内周面取り部104、外周面取り部105の全領域で実施してもよく、選択した特定領域で実施してもよい。   The surface of the glass substrate is etched by 5 μm using an acidic etching solution containing hydrofluoric acid or nitric acid, and the work-affected layer (cracks, scratches, etc.) remaining on the side surface and the chamfered portion is isotropically etched and observed. The concave portion (pit defect 106) is easily sized. A circular or elliptical recess having a diameter (or major axis) of 10 μm or more was defined as a pit defect 106, and the number of pit defects 106 was counted using an optical microscope. The position where the pit defect 106 is evaluated may be performed in the entire area of the inner peripheral side surface 102, the outer peripheral side surface 103, the inner peripheral chamfered portion 104, and the outer peripheral chamfered portion 105 of the glass substrate, or in a selected specific region. Good.

図5にピット欠陥106がない面取り部の顕微鏡観察画像を、図6にピット欠陥106がある面取り部の顕微鏡観察画像を、それぞれ示す。図6に示す面取り部は、端面研削工程において大きなダメージを受け、ガラス基板の面取り部に深い加工変質層が発生したものである。   FIG. 5 shows a microscope observation image of the chamfered portion without the pit defect 106, and FIG. 6 shows a microscope observation image of the chamfered portion with the pit defect 106, respectively. The chamfered portion shown in FIG. 6 is a portion in which a severely damaged layer is generated in the chamfered portion of the glass substrate due to significant damage in the end surface grinding process.

本発明によれば、ガラス基板の側面部または面取り部のうち少なくとも一方においてピット欠陥106がない磁気記録媒体用ガラス基板を高い生産性で製造できる。   According to the present invention, a glass substrate for a magnetic recording medium having no pit defect 106 in at least one of a side surface portion or a chamfered portion of the glass substrate can be manufactured with high productivity.

以下に実施例及び比較例を挙げて本発明を更に説明するが、本発明はこれにより何ら制限されるものではない。   Examples The present invention will be further described below with reference to examples and comparative examples, but the present invention is not limited thereby.

[磁気記録媒体用ガラス基板の形状付与工程]
外径65mm、内径20mm、板厚0.635mmの磁気記録媒体用ガラス基板用に、フロート法で成形されたSiOを主成分とするガラス基板を中心部に円孔を有する円盤形状のガラス基板に加工した。
[Shape imparting step of glass substrate for magnetic recording medium]
A disk-shaped glass substrate having a circular hole at the center of a glass substrate mainly composed of SiO 2 formed by a float process for a glass substrate for a magnetic recording medium having an outer diameter of 65 mm, an inner diameter of 20 mm, and a plate thickness of 0.635 mm. It was processed into.

[磁気記録媒体用ガラス基板の端面研削工程]
中心部に円孔を有する円盤形状のガラス基板の内周側面と外周側面を、面取り幅0.15mm、面取り角度45°の磁気記録媒体用ガラス基板が得られるように、ダイヤモンド砥粒を含有する砥石を用いて研削した。
[End surface grinding process of glass substrate for magnetic recording media]
It contains diamond abrasive grains so that a glass substrate for a magnetic recording medium having a chamfering width of 0.15 mm and a chamfering angle of 45 ° is obtained on the inner and outer peripheral sides of a disk-shaped glass substrate having a circular hole in the center. Grind using a grindstone.

端面研削工程において、砥石に含まれるダイヤモンド砥粒の砥粒粒度分布幅△dが異なる砥石を用いて、ガラス基板の側面部を研削した結果を表1に示す。表1において、例1は実施例、例2と例3は比較例である。   Table 1 shows the results of grinding the side surface portion of the glass substrate using a grindstone having a different grain size distribution width Δd of diamond abrasive grains contained in the grindstone in the end face grinding step. In Table 1, Example 1 is an example, and Examples 2 and 3 are comparative examples.

例1〜例3に記載の砥石で内周側面と外周側面を研削されたガラス基板は、下記に記載した端面研磨工程と主平面の研磨工程で加工した後、洗浄工程において洗浄乾燥され、内周側面と内周面取り部のピット欠陥数、外周側面と外周面取り部のピット欠陥数を評価した。   The glass substrate whose inner peripheral side surface and outer peripheral side surface were ground with the grindstone described in Examples 1 to 3 was processed in the end surface polishing step and the main plane polishing step described below, and then washed and dried in the cleaning step. The number of pit defects in the peripheral side surface and the inner peripheral chamfered portion and the number of pit defects in the outer peripheral side surface and the outer peripheral chamfered portion were evaluated.

図7A、図7Bと図7Cに、例1〜例3で使用した砥石に含まれる砥粒の粒度分布を、レーザ回折散乱方式の粒度分布測定装置で測定した結果を示す。図7Aは例1、図7Bは例2、図7Cは例3で使用した砥石に含まれる砥粒の粒度分布測定結果である。   7A, 7B and 7C show the results of measuring the particle size distribution of the abrasive grains contained in the grindstone used in Examples 1 to 3 with a particle size distribution measuring apparatus of a laser diffraction / scattering type. FIG. 7A shows the results of measurement of the particle size distribution of the abrasive grains contained in the grindstone used in Example 1, FIG. 7B shows the results of Example 2, and FIG.

例1で用いた砥石に含まれるダイヤモンド砥粒の砥粒粒度分布幅△dは19μmであり、例2で用いた砥石に含まれるダイヤモンド砥粒の砥粒粒度分布幅△dは24μmであり、例3で用いた砥石に含まれるダイヤモンド砥粒の砥粒粒度分布幅△dは29μmであった。   The abrasive grain size distribution width Δd of the diamond abrasive grains contained in the grindstone used in Example 1 is 19 μm, the abrasive grain size distribution width Δd of the diamond abrasive grains contained in the grindstone used in Example 2 is 24 μm, The abrasive grain size distribution width Δd of the diamond abrasive grains contained in the grindstone used in Example 3 was 29 μm.

内周側面の研削の加工速度は、内周側面の研削量を研削加工時間で除して求めた。内周側面の研削量は、高精度2次元寸法測定機(キーエンス社製、製品名:VM8040)を用いて測定した。内周側面研削前後においてガラス基板中央部の円孔の直径を測定し、内周側面研削前後の円孔の直径差を算出して研削量を求めた。
(内周側面の研削量)=((研削後ガラス基板の円孔の直径)−(研削前ガラス基板の円孔の直径))/2。
The grinding speed of the inner peripheral side surface was obtained by dividing the grinding amount of the inner peripheral side surface by the grinding time. The grinding amount of the inner peripheral side surface was measured using a high-precision two-dimensional dimension measuring machine (manufactured by Keyence Corporation, product name: VM8040). The diameter of the circular hole in the central portion of the glass substrate was measured before and after the inner peripheral side surface grinding, and the grinding amount was obtained by calculating the diameter difference between the circular holes before and after the inner peripheral side surface grinding.
(Grinding amount of inner peripheral surface) = ((diameter of circular hole in glass substrate after grinding) − (diameter of circular hole in glass substrate before grinding)) / 2.

外周側面の研削の加工速度は、外周側面の研削量を研削加工時間で除して求めた。外周側面の研削量は、外周側面研削前後においてガラス基板の外径をマイクロメータで測定し、外周側面研削前後の外径の直径差を算出して求めた。
(外周側面の研削量)=((研削前ガラス基板の外径の直径)−(研削後ガラス基板の外径の直径))/2。
The grinding speed of the outer peripheral side surface was obtained by dividing the grinding amount of the outer peripheral side surface by the grinding time. The grinding amount of the outer peripheral side surface was determined by measuring the outer diameter of the glass substrate with a micrometer before and after the outer peripheral side surface grinding and calculating the diameter difference between the outer diameters before and after the outer peripheral side surface grinding.
(Grinding amount of outer peripheral side surface) = ((diameter of outer diameter of glass substrate before grinding) − (diameter of outer diameter of glass substrate after grinding)) / 2.

[磁気記録媒体用ガラス基板の端面研磨工程]
内周側面部と内周面取り部を研磨ブラシと酸化セリウム砥粒を用いて内周端面研磨した。内周端面研磨は、内周側面の研磨量が7μmとなるように研磨時間を設定して実施した。内周端面研磨を行ったガラス基板は、アルカリ性洗剤を用いたスクラブ洗浄、アルカリ性洗剤溶液に浸漬した状態での超音波洗浄により、砥粒を洗浄除去した。
[End surface polishing step of glass substrate for magnetic recording medium]
The inner peripheral side surface portion and the inner peripheral chamfered portion were subjected to inner peripheral end surface polishing using a polishing brush and cerium oxide abrasive grains. The inner peripheral end surface polishing was performed by setting the polishing time so that the polishing amount on the inner peripheral side surface was 7 μm. The glass substrate on which the inner peripheral end face had been polished was cleaned and removed by scrub cleaning using an alkaline detergent and ultrasonic cleaning in a state immersed in an alkaline detergent solution.

内周端面研磨後、ガラス基板の外周側面部と外周面取り部を研磨ブラシと酸化セリウム砥粒を用いて外周端面研磨した。外周端面研磨は、外周側面の研磨量が7μmとなるように研磨時間を設定して実施した。外周端面研磨後のガラス基板は、アルカリ性洗剤を用いたスクラブ洗浄と、アルカリ性洗剤溶液に浸漬した状態での超音波洗浄により、砥粒を洗浄除去される。   After polishing the inner peripheral end surface, the outer peripheral side surface portion and outer peripheral chamfered portion of the glass substrate were subjected to outer peripheral end surface polishing using a polishing brush and cerium oxide abrasive grains. The outer peripheral end surface polishing was performed by setting the polishing time so that the polishing amount of the outer peripheral side surface was 7 μm. The glass substrate after the outer peripheral end surface polishing is cleaned and removed by scrub cleaning using an alkaline detergent and ultrasonic cleaning in a state immersed in an alkaline detergent solution.

[磁気記録媒体用ガラス基板の主平面の研磨工程]
端面加工後、研磨具としてダイヤモンド砥粒を含む固定砥粒工具と研磨液を用いて両面研磨装置によりガラス基板の上下主平面を1次研磨し、研磨液を洗浄除去した。
[Polishing process of main plane of glass substrate for magnetic recording medium]
After the end face processing, the upper and lower principal planes of the glass substrate were primarily polished by a double-side polishing apparatus using a fixed abrasive tool containing diamond abrasive grains as a polishing tool and a polishing liquid, and the polishing liquid was washed and removed.

1次研磨後、研磨具として硬質ウレタン製の研磨パッドと酸化セリウム砥粒を含有する研磨液(平均粒子直径、以下、平均粒径と略す、約1.3μmの酸化セリウムを主成分した研磨液組成物)を用いて、両面研磨装置によりガラス基板の上下主平面を2次研磨し、砥粒を洗浄除去した。   After primary polishing, a polishing liquid containing a hard urethane polishing pad and cerium oxide abrasive grains as a polishing tool (an average particle diameter, hereinafter abbreviated as average particle diameter, a polishing liquid mainly composed of about 1.3 μm of cerium oxide) The upper and lower principal planes of the glass substrate were secondarily polished by a double-side polishing apparatus using the composition), and the abrasive grains were washed and removed.

次に、研磨具として軟質ウレタン製の研磨パッドと、コロイダルシリカを含有する研磨液(一次粒子の平均粒径が20〜30nmのコロイダルシリカを主成分とする研磨液組成物)を用いて、両面研磨装置によりガラス基板の上下主平面を3次研磨した。   Next, both surfaces using a polishing pad made of soft urethane as a polishing tool and a polishing liquid containing colloidal silica (polishing liquid composition mainly composed of colloidal silica having an average primary particle diameter of 20 to 30 nm) are used. The upper and lower main planes of the glass substrate were subjected to third polishing with a polishing apparatus.

[磁気記録媒体用ガラス基板の洗浄工程]
上下主平面を研磨したガラス基板は、アルカリ性洗剤によるスクラブ洗浄、アルカリ性洗剤溶液に浸漬した状態での超音波洗浄、純水に浸漬した状態での超音波洗浄、を順次行い、イソプロピルアルコール蒸気にて乾燥された。
[Cleaning process of glass substrate for magnetic recording medium]
The glass substrate whose upper and lower main surfaces are polished is sequentially subjected to scrub cleaning with an alkaline detergent, ultrasonic cleaning in a state immersed in an alkaline detergent solution, and ultrasonic cleaning in a state immersed in pure water. Dried.

ガラス基板を洗浄乾燥した後、磁気記録媒体用ガラス基板の側面部と面取り部の加工変質層を評価した。加工変質層の評価は、1ロット(200枚)から10枚のガラス基板を抜き取って実施した。   After the glass substrate was washed and dried, the work-affected layers on the side surface and the chamfered portion of the glass substrate for magnetic recording medium were evaluated. The evaluation of the work-affected layer was carried out by extracting 10 glass substrates from 1 lot (200 sheets).

磁気記録媒体用ガラス基板の側面部と面取り部の加工変質層の評価は、ガラス基板の表面をフッ酸と硝酸を含む酸性のエッチング溶液を用いて5μmエッチングし、加工変質層を光学顕微鏡で観察しやすい大きさいのピット欠陥としてから実施した。   The evaluation of the work-affected layer on the side surface and chamfered portion of the glass substrate for magnetic recording media is performed by etching the surface of the glass substrate with an acidic etching solution containing hydrofluoric acid and nitric acid, and observing the work-affected layer with an optical microscope. It was carried out after making a pit defect of a size easy to do.

ガラス基板の表面をエッチング溶液で5μmエッチングし、洗浄と乾燥を行った後、光学顕微鏡で観察しやすいサイズにガラス基板を切断し、切断したガラス基板片を試料台に固定してレーザ顕微鏡(オリンパス社製、製品名:LEXT OLS 3500)を用いて側面部と面取り部のピット欠陥を観察した。   The surface of the glass substrate is etched by 5 μm with an etching solution, washed and dried, then the glass substrate is cut to a size that can be easily observed with an optical microscope, and the cut glass substrate piece is fixed to a sample stage and a laser microscope (Olympus). Using a product name: EXT OLS 3500), pit defects at the side surface and the chamfered portion were observed.

レーザ顕微鏡の対物レンズは20倍を使用し、観察視野635μm×480μm(ピット欠陥観察領域の横幅107が635μmの観察領域)における、直径(または長径)が10μm以上の円形状または楕円形状を有するピット欠陥106の数をカウントした。ピット欠陥106の数のカウントは、上下主平面側の内周面取り部104と内周側面102、上下主平面側の外周面取り部105と外周側面103において、0°、90°、180°、270°の位置で実施した。   The objective lens of the laser microscope uses a 20 × magnification, and has a circular or elliptical shape with a diameter (or major axis) of 10 μm or more in an observation visual field of 635 μm × 480 μm (observation region where the lateral width 107 of the pit defect observation region is 635 μm). The number of defects 106 was counted. The count of the number of pit defects 106 is 0 °, 90 °, 180 °, 270 in the inner peripheral chamfered portion 104 and the inner peripheral side surface 102 on the upper and lower main plane side, and in the outer peripheral chamfered portion 105 and the outer peripheral side surface 103 on the upper and lower main plane side. It was carried out at the position of °.

上記測定位置でカウントしたピット欠陥106の数を、観察面積で除した数値を表1に示す。砥石に含まれるダイヤモンド砥粒の砥粒粒度分布幅△dが23μm以下である例1は、磁気記録媒体用ガラス基板の側面部と面取り部の加工変質層評価においてピット欠陥106がなく、側面部と面取り部の平滑性に優れる磁気記録媒体用ガラス基板が得られたことを確認した。   Table 1 shows numerical values obtained by dividing the number of pit defects 106 counted at the measurement position by the observation area. Example 1 in which the abrasive grain size distribution width Δd of the diamond abrasive grains contained in the grindstone is 23 μm or less has no pit defect 106 in the evaluation of the work-affected layer in the side surface portion and the chamfered portion of the glass substrate for magnetic recording medium, and the side surface portion It was confirmed that a glass substrate for a magnetic recording medium excellent in smoothness of the chamfered portion was obtained.

Figure 0005310671
Figure 0005310671

本発明は、板形状を有するガラス基板の側面部を研削する端面研削工程を有するガラス基板の製造方法に適用できる。本発明が適用できるガラス基板としては、磁気記録媒体用、フォトマスク用、液晶や有機EL等のディスプレイ用、光ピックアップ素子や光学フィルタ等の光学部品用などのガラス基板が具体的なものとして挙げられる。   INDUSTRIAL APPLICABILITY The present invention can be applied to a method for manufacturing a glass substrate having an end surface grinding process for grinding a side surface portion of a glass substrate having a plate shape. Specific examples of glass substrates to which the present invention can be applied include glass substrates for magnetic recording media, photomasks, displays such as liquid crystals and organic EL, and optical components such as optical pickup elements and optical filters. It is done.

10:磁気記録媒体用ガラス基板、101:磁気記録媒体用ガラス基板の主平面、102:内周側面、103:外周側面、104:内周面取り部、105:外周面取り部、106:ピット欠陥、107:ピット欠陥観察領域の横幅、
20:砥石、201:砥粒、202:研削面、203:粒子径が大きい砥粒、204:結合材、205:基材、
30:研削液供給ノズル、301:研削液。
10: glass substrate for magnetic recording medium, 101: main plane of glass substrate for magnetic recording medium, 102: inner peripheral side surface, 103: outer peripheral side surface, 104: inner peripheral chamfered portion, 105: outer peripheral chamfered portion, 106: pit defect, 107: width of pit defect observation area,
20: Whetstone, 201: Abrasive grain, 202: Grinding surface, 203: Abrasive grain with large particle diameter, 204: Binder, 205: Base material,
30: grinding fluid supply nozzle, 301: grinding fluid.

Claims (6)

主平面と、内周側面と、外周側面とからなる中心部に円孔を有する円盤形状の磁気記録媒体用ガラス基板の製造方法であって、
該磁気記録媒体用ガラス基板の製造方法は、板形状を有するガラス基板の形状付与工程と、前記ガラス基板の内周側面または外周側面の少なくとも一方を砥石で研削する端面研削工程と、前記ガラス基板の内周側面または外周側面の少なくとも一方を研磨する端面研磨工程と、前記ガラス基板の主平面の研磨工程と、前記ガラス基板の洗浄工程と、を有し、
前記端面研削工程は、ガラス基板の内周側面または外周側面の少なくとも一方に研削液を供給するとともに、砥石とガラス基板を相対的に動かし、砥石の研削面をガラス基板の内周側面または外周側面の少なくとも一方に接触させて研削するものであり、
前記砥石は砥粒が結合剤により結合されてなる砥石であり、該砥粒はレーザ回折散乱方式の粒度分布測定装置を用いて測定した粒子径の最大粒子径dmaxと最小粒子径dminとの差である砥粒粒度分布幅△d(=dmax−dmin)が23μm以下であり、かつ平均粒子径が10μm〜40μmであることを特徴とする磁気記録媒体用ガラス基板の製造方法。
A method for producing a disk-shaped glass substrate for a magnetic recording medium having a circular hole in a central portion comprising a main plane, an inner peripheral side surface, and an outer peripheral side surface,
The method for manufacturing a glass substrate for a magnetic recording medium includes a step of imparting a shape of a glass substrate having a plate shape, an end surface grinding step of grinding at least one of an inner peripheral side surface or an outer peripheral side surface of the glass substrate with a grindstone, and the glass substrate An end face polishing step for polishing at least one of the inner peripheral side surface or the outer peripheral side surface, a polishing step for the main plane of the glass substrate, and a cleaning step for the glass substrate,
In the end surface grinding step, the grinding liquid is supplied to at least one of the inner peripheral side surface or the outer peripheral side surface of the glass substrate, and the grindstone and the glass substrate are relatively moved, and the grinding surface of the grindstone is changed to the inner peripheral side surface or the outer peripheral side surface of the glass substrate. To grind in contact with at least one of
The grindstone is a grindstone in which abrasive grains are bonded by a binder, and the abrasive grains are the difference between the maximum particle diameter dmax and the minimum particle diameter dmin measured using a laser diffraction / scattering particle size distribution measuring apparatus. abrasive grain size distribution width △ d (= dmax-dmin) is Ri der less 23 .mu.m, and a method of manufacturing a glass substrate for a magnetic recording medium, wherein the average particle size of 10μm~40μm is.
前記砥粒は、ダイヤモンド砥粒である請求項に記載の磁気記録媒体用ガラス基板の製造方法。 The abrasive grains, method of manufacturing a glass substrate for a magnetic recording medium according to claim 1, which is a diamond abrasive grains. 磁気記録媒体用ガラス基板の内周側面または外周側面のうち少なくとも一方は、ピット欠陥の数が5個/mm以下である請求項1または2に記載の磁気記録媒体用ガラス基板の製造方法。 At least one method of manufacturing a glass substrate for a magnetic recording medium according to claim 1 or 2 carbon pit defects is 5 / mm 2 or less of the inner circumference side or the outer peripheral side surface of a glass substrate for a magnetic recording medium. 磁気記録媒体用ガラス基板は、内周側面と主平面との交差箇所または外周側面と主平面との交差箇所のうち少なくとも一方に面取り部が形成された磁気記録媒体用ガラス基板であって、
該面取り部はピット欠陥の数が5個/mm以下である請求項1〜のいずれかに記載の磁気記録媒体用ガラス基板の製造方法。
The glass substrate for a magnetic recording medium is a glass substrate for a magnetic recording medium in which a chamfered portion is formed in at least one of an intersection between the inner peripheral side surface and the main plane or an intersection between the outer peripheral side surface and the main plane,
Method of manufacturing a glass substrate for a magnetic recording medium according to any one of claims 1-3 chamfer the number of pits defects is 5 / mm 2 or less.
主平面と、内周側面と、外周側面とからなる中心部に円孔を有する円盤形状の磁気記録媒体用ガラス基板において、該磁気記録媒体用ガラス基板の内周側面または外周側面のうち少なくとも一方は、ピット欠陥の数が5個/mm以下であることを特徴とする磁気記録媒体用ガラス基板。 In a disk-shaped glass substrate for a magnetic recording medium having a circular hole in a central portion composed of a main plane, an inner peripheral side surface, and an outer peripheral side surface, at least one of the inner peripheral side surface and the outer peripheral side surface of the glass substrate for magnetic recording medium Is a glass substrate for a magnetic recording medium, wherein the number of pit defects is 5 / mm 2 or less. 主平面と、内周側面と、外周側面とからなる中心部に円孔を有する円盤形状の磁気記録媒体用ガラス基板であって、該磁気記録媒体用ガラス基板は、内周側面と主平面との交差箇所または外周側面と主平面との交差箇所のうち少なくとも一箇所に面取り部が形成されており、該面取り部はピット欠陥の数が5個/mm以下である請求項に記載の磁気記録媒体用ガラス基板。 A disk-shaped glass substrate for a magnetic recording medium having a circular hole in a central portion comprising a main plane, an inner peripheral side surface, and an outer peripheral side surface, the glass substrate for a magnetic recording medium comprising an inner peripheral side surface and a main plane of which the chamfered portion is formed on at least one portion of the intersection of the intersection or the outer peripheral side surface and the main plane, chamfer is according to claim 5 the number of pits defects is 5 / mm 2 or less Glass substrate for magnetic recording media.
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