JP5260660B2 - 荷電粒子ビームを制御する技術 - Google Patents
荷電粒子ビームを制御する技術 Download PDFInfo
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- JP5260660B2 JP5260660B2 JP2010525024A JP2010525024A JP5260660B2 JP 5260660 B2 JP5260660 B2 JP 5260660B2 JP 2010525024 A JP2010525024 A JP 2010525024A JP 2010525024 A JP2010525024 A JP 2010525024A JP 5260660 B2 JP5260660 B2 JP 5260660B2
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H15/00—Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0473—Changing particle velocity accelerating
- H01J2237/04735—Changing particle velocity accelerating with electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0475—Changing particle velocity decelerating
- H01J2237/04756—Changing particle velocity decelerating with electrostatic means
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Particle Accelerators (AREA)
Description
Claims (19)
- 荷電粒子ビームが通過できる開口部を有する複数の電極を含む加速段と、
前記複数の電極に電気的に結合された複数の抵抗器と、
前記複数の電極及び前記複数の抵抗器に電気的に結合された複数のスイッチと、を備え、
前記複数のスイッチの各々は、複数の動作モードでそれぞれ選択的に切り替えられるように構成される、荷電粒子加速/減速システム。 - 加速電圧を与える第1の電源と、
減速電圧を与える第2の電源と、
前記第1の電源に電気的に結合された第1のスイッチと、
前記第2の電源に電気的に結合された第2のスイッチと、
をさらに備える、請求項1に記載の荷電粒子加速/減速システム。 - 前記第2のスイッチは、高電圧環境で動作するように構成される、請求項2に記載の荷電粒子加速/減速システム。
- 前記複数の抵抗器は、抵抗器の直列連鎖を構成する、請求項1に記載の荷電粒子加速/減速システム。
- 各々のスイッチは、直列連鎖の前記複数の抵抗器の少なくとも1つに並列に電気的に接続される、請求項4に記載の荷電粒子加速/減速システム。
- 複数のアクチュエータをさらに備える、請求項1に記載の荷電粒子加速/減速システム。
- 各々のスイッチは、複数のアクチュエータの各1つにそれぞれ接続される、請求項6に記載の荷電粒子加速/減速システム。
- 少なくとも1つのスイッチは加圧流体により作動し、該加圧流体は加圧空気、加圧気体及び加圧液体から成るグループから選択される、請求項1に記載の荷電粒子加速/減速システム。
- 少なくとも1つのスイッチは電気信号により作動し、該電気信号はリレーにより送信される、請求項1に記載の荷電粒子加速/減速システム。
- 前記複数のスイッチの少なくとも1つは、前記連鎖の前記複数の抵抗器の少なくとも1つに直列接続され、
前記少なくとも1つの直列接続された電気スイッチ及び前記少なくとも1つの抵抗器は、前記複数の抵抗器の少なくとも他の1つに並列接続される、請求項5に記載の荷電粒子加速/減速システム。 - 荷電粒子ビームが通過できる開口部を有する複数の電極を含む加速段と、
複数の抵抗器アセンブリと、を備え、
各々の抵抗器アセンブリは、
支持構造の2つの電気接点間に電気的に接続され、各々の電気接点は前記複数の電極の各1つに電気的に接続された、少なくとも1つの抵抗器と、
該少なくとも1つの抵抗器に並列に前記2つの電気接点間に電気的に接続されたスイッチと、を備える、荷電粒子加速/減速システム。 - 前記支持構造はプリント基板である、請求項11に記載の荷電粒子加速/減速システム。
- 前記複数の抵抗器アセンブリの少なくとも1つは、前記2つの電気接点間の前記スイッチに直列に電気的に接続された少なくとも1つの追加の抵抗器をさらに備える、請求項12に記載の荷電粒子加速/減速システム。
- 各々のスイッチは、空気圧で制御される、請求項11に記載の荷電粒子加速/減速システム。
- 各々のスイッチは、電気的に制御される、請求項11に記載の荷電粒子加速/減速システム。
- 前記複数の抵抗器アセンブリの前記スイッチは、少なくとも2つのグループに分けられる、請求項11に記載の荷電粒子加速/減速システム。
- 前記少なくとも2つのグループの各々のグループの前記スイッチは、通常、選択的に動作する、請求項16に記載の荷電粒子加速/減速システム。
- 前記抵抗器アセンブリの各々は、高誘電強度材料中に注封される、請求項11に記載の荷電粒子加速/減速システム。
- 前記高誘電強度材料は、熱伝導性のエポキシ樹脂及びシリコーンベースの化合物から成るグループから選択される、請求項18に記載の荷電粒子加速/減速システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/854,852 | 2007-09-13 | ||
US11/854,852 US7820986B2 (en) | 2007-09-13 | 2007-09-13 | Techniques for controlling a charged particle beam |
PCT/US2008/076163 WO2009036267A2 (en) | 2007-09-13 | 2008-09-12 | Techniques for controlling a charged particle beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010539656A JP2010539656A (ja) | 2010-12-16 |
JP5260660B2 true JP5260660B2 (ja) | 2013-08-14 |
Family
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010525024A Active JP5260660B2 (ja) | 2007-09-13 | 2008-09-12 | 荷電粒子ビームを制御する技術 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7820986B2 (ja) |
JP (1) | JP5260660B2 (ja) |
KR (1) | KR101492534B1 (ja) |
CN (1) | CN101809714B (ja) |
TW (1) | TWI433194B (ja) |
WO (1) | WO2009036267A2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7999239B2 (en) * | 2007-12-10 | 2011-08-16 | Varian Semiconductor Equipment Associates, Inc. | Techniques for reducing an electrical stress in an acceleration/deceleraion system |
US7855361B2 (en) * | 2008-05-30 | 2010-12-21 | Varian, Inc. | Detection of positive and negative ions |
JP2012238403A (ja) * | 2011-05-10 | 2012-12-06 | Nissin Ion Equipment Co Ltd | イオン注入装置の制御方法 |
JP6086845B2 (ja) * | 2013-08-29 | 2017-03-01 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置及びイオン注入方法 |
GB201621587D0 (en) * | 2016-12-19 | 2017-02-01 | Shimadzu Corp | A transport device for transporting charged particles |
US10763071B2 (en) | 2018-06-01 | 2020-09-01 | Varian Semiconductor Equipment Associates, Inc. | Compact high energy ion implantation system |
WO2023201580A1 (zh) * | 2022-04-20 | 2023-10-26 | 华为技术有限公司 | 电源系统、电子光学镜组和扫描电子显微镜 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3238489A (en) * | 1962-06-11 | 1966-03-01 | Dale Electronics | Electrical resistor |
US4383180A (en) * | 1981-05-18 | 1983-05-10 | Varian Associates, Inc. | Particle beam accelerator |
JP3475563B2 (ja) | 1995-04-04 | 2003-12-08 | 日新電機株式会社 | イオンビームの加速装置 |
US6653642B2 (en) * | 2000-02-11 | 2003-11-25 | Varian Semiconductor Equipment Associates, Inc. | Methods and apparatus for operating high energy accelerator in low energy mode |
US6717079B2 (en) | 2002-06-21 | 2004-04-06 | Varian Semiconductr Equipmentassociates, Inc. | Electrical switches and methods of establishing an electrical connection |
JP4691347B2 (ja) | 2004-10-14 | 2011-06-01 | 株式会社アルバック | イオン注入装置 |
-
2007
- 2007-09-13 US US11/854,852 patent/US7820986B2/en active Active
-
2008
- 2008-09-12 CN CN200880109201.8A patent/CN101809714B/zh active Active
- 2008-09-12 WO PCT/US2008/076163 patent/WO2009036267A2/en active Application Filing
- 2008-09-12 JP JP2010525024A patent/JP5260660B2/ja active Active
- 2008-09-12 KR KR1020107007814A patent/KR101492534B1/ko active IP Right Grant
- 2008-09-15 TW TW097135334A patent/TWI433194B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2010539656A (ja) | 2010-12-16 |
US20090072163A1 (en) | 2009-03-19 |
US7820986B2 (en) | 2010-10-26 |
CN101809714B (zh) | 2013-03-06 |
TW200912986A (en) | 2009-03-16 |
WO2009036267A3 (en) | 2009-06-11 |
CN101809714A (zh) | 2010-08-18 |
WO2009036267A2 (en) | 2009-03-19 |
KR20100085909A (ko) | 2010-07-29 |
TWI433194B (zh) | 2014-04-01 |
KR101492534B1 (ko) | 2015-02-23 |
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