JP5217141B2 - Color filter and manufacturing method thereof - Google Patents

Description

  The present invention relates to a color filter used for, for example, a liquid crystal display device and a manufacturing method thereof.

  In a liquid crystal display device, a color filter and a liquid crystal driving side substrate are opposed to each other, a liquid crystal compound is sealed between them to form a thin liquid crystal layer, and the liquid crystal alignment in the liquid crystal layer is electrically controlled by the liquid crystal driving side substrate. Then, display is performed by selectively changing the amount of transmitted light or reflected light of the color filter.

  In general, a color filter used in a liquid crystal display device or the like has a light shielding portion and red, green, and blue colored layers formed on a substrate. In such a color filter, as a method of forming a colored layer, a photosensitive resin layer made of a photosensitive resin is formed on a base material on which a light shielding portion is formed, and pattern exposure is performed on the photosensitive resin layer. After that, a photolithography method is used in which a desired colored pattern is formed by development.

  Such colored patterns are usually formed at intervals so that gaps are formed between the colored patterns on the light shielding portion. However, when a liquid crystal display device is manufactured using a color filter having such a gap, the liquid crystal enters the gap between the colored patterns, and the amount of liquid crystal used is increased accordingly. In particular, since this gap exists on a non-display area not related to display, unnecessary liquid crystal is injected, resulting in a problem of high cost.

In order to avoid such a problem, the colored patterns may be formed in close contact with each other on the light shielding portion so that no gap is generated between the colored patterns. However, in this case, since a high positional accuracy is required at the time of forming the colored pattern, the colored pattern is actually formed overlappingly on the light shielding portion, so that a raised portion called horn is formed on the edge portion of the pattern. As a result, the alignment of the liquid crystal is disturbed by the horn.
In addition, the prior art aiming at reduction of the amount of liquid crystals as described above has not been found.

  Therefore, it is desired to provide a color filter that can reduce the amount of liquid crystal that enters a gap generated between colored layers and that can be manufactured without increasing the number of steps.

  The present invention includes a base material, a light shielding portion formed in a pattern on the base material, a colored layer formed in an opening of the light shielding portion on the base material, and the colored layer on the light shielding portion. A color filter having a filling layer formed only in the gap and an alignment control protrusion formed on the colored layer, wherein the filling layer is made of the same material as the alignment control protrusion. A characteristic color filter is provided.

  According to the present invention, it is possible to fill the gaps between the colored layers by forming a filling layer in the gaps between the colored layers. When the color filter of the present invention is used in a liquid crystal display device, extra liquid crystal is used. The amount can be reduced. According to the present invention, since the filling layer and the alignment control protrusion are made of the same material, the alignment control protrusion and the filling layer are collectively formed by, for example, a photolithography method using a multi-tone mask. Therefore, it is possible to form a filling layer without increasing the number of steps.

  In the said invention, it is preferable that the columnar spacer is formed on the said light-shielding part, and the said filling layer consists of the same material as the said columnar spacer. This is because in the case of a color filter having a columnar spacer, in addition to the alignment control protrusion and the filling layer, the columnar spacer can be formed in a lump, which is advantageous in terms of manufacturing efficiency.

  Moreover, in the said invention, it is preferable that the transparent electrode layer is formed at least between the said orientation control protrusion and the said colored layer, and between the said filling layer and the said light-shielding part. This is because it is possible to collectively form the filling layer and the alignment control protrusion on the transparent electrode layer.

  The present invention also includes a base material, a light shielding portion formed in a pattern on the base material, a colored layer formed in an opening of the light shielding portion on the base material, and the above-described light shielding portion. A method for producing a color filter having a filling layer formed only in a gap between colored layers, and an alignment control protrusion formed on the colored layer, wherein the photosensitive layer is photosensitive on the light shielding portion and the colored layer. A photosensitive resin layer forming step for forming a photosensitive resin layer made of a resin, and the photosensitive resin layer is exposed and developed using a multi-tone mask, and the filling layer made of the photosensitive resin and the orientation control are developed. And a dissimilar member batch forming step for simultaneously forming the protrusions for use.

  According to the present invention, it is possible to form the filling layer without increasing the number of steps by forming the filling layer and the alignment control protrusions together.

  In the present invention, it is preferable that the different member batch forming step is a step of simultaneously forming a columnar spacer made of the photosensitive resin. This is because the manufacturing process is further simplified.

  According to the present invention, there is an effect that it is possible to provide a color filter that can reduce the amount of liquid crystal entering a gap generated between colored layers and can be manufactured without increasing the number of steps.

  Hereinafter, the color filter of the present invention and the manufacturing method thereof will be described in detail.

A. Color Filter First, the color filter of the present invention will be described. The color filter of the present invention includes a base material, a light shielding portion formed in a pattern on the base material, a colored layer formed in an opening of the light shielding portion on the base material, and the light shielding portion. A color filter having a filling layer formed only in a gap between the colored layers and an alignment control protrusion formed on the colored layer, wherein the filling layer is made of the same material as the alignment control protrusion. It is characterized by.

The color filter of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic sectional view showing an example of the color filter of the present invention. As shown in FIG. 1, the color filter 10 includes a light shielding part 2 formed in a pattern on the base material 1, a colored layer 3 formed in an opening of the light shielding part 2, and the light shielding part 2. A filling layer 4 formed in a gap between the colored layers 3 and an alignment control protrusion 5 formed on the colored layer 3, and the filling layer 4 and the alignment control protrusion 5 are formed of the same material. It is what has been.
Here, in the present invention, the fact that the filling layer is formed only in the gaps between the colored layers means that there is no filling layer on the colored layer. Moreover, the absence of the filler layer on the colored layer means that the thickness of the filler layer in the portion laminated on the colored layer is 10 nm or less .

In the present invention, since the filling layer is formed in the gap between the colored layers, the gap generated between the colored layers can be filled. As a result, when the color filter of the present invention is used in a liquid crystal display device, the amount of liquid crystal entering the gap between the colored layers can be reduced, so that the amount of extra liquid crystal used can be reduced and the cost can be reduced. Become.
In the present invention, since the filling layer and the alignment control protrusion are made of the same material, the filling layer and the alignment control protrusion are simultaneously formed by, for example, a photolithography method using a multi-tone mask. can do. Therefore, it is possible to form the filling layer without increasing the number of steps in the production of the color filter, and it is possible to avoid an increase in production cost.
Hereinafter, the color filter of the present invention will be described in detail for each component.

1. First, the packed bed in the present invention will be described. The filling layer in the present invention is not particularly limited as long as it is formed in the gap between the colored layers on the light shielding portion described later, and is made of the same material as the alignment control protrusion described later, and is transparent. Or may be colored.

  The filling layer in the present invention is formed for the purpose of reducing the amount of liquid crystal injected into the gap generated between the colored layers when the color filter of the present invention is used in a liquid crystal display device. Therefore, the shape of the filling layer, the volume ratio of the filling layer with respect to the gap between the colored layers, and the like are not particularly limited as long as the amount of liquid crystal entering the gap between the colored layers can be reduced.

  The filling layer is formed in the gap between the colored layers, but may be in contact with the colored layer in the gap between the colored layers or may be separated.

  In the present invention, the maximum thickness from the substrate surface to the filling layer surface is not more than the maximum thickness from the substrate surface to the colored layer surface, that is, the maximum height of the filling layer surface is the maximum height of the colored layer surface. It is preferable not to exceed. This is because if the thickness from the substrate surface to the filling layer surface is too larger than the thickness from the substrate surface to the colored layer surface, it may cause alignment failure of the liquid crystal.

In addition, as the maximum thickness from the substrate surface to the filling layer surface, specifically, when the maximum thickness from the substrate surface to the colored layer surface is 1, it is preferably about 0.6 to 1.2, In particular, it is preferably 0.6 to 1. This is because if the thickness from the substrate surface to the filling layer surface is too small, the obtained effect may be too small.
Such a thickness can be calculated by observation using a scanning electron microscope (SEM).

  The formation position of the filling layer is not particularly limited as long as it is a gap between the colored layers on the light shielding portion described later, and may be all the gaps generated between the colored layers, or a part generated between the colored layers. In the present invention, all the gaps generated between the colored layers are preferable.

  The material for forming the filling layer is not particularly limited as long as it is the same material as the alignment control protrusion described later, but in the present invention, it preferably contains a photosensitive resin. This is because the filling layer and the alignment control protrusion can be collectively formed by a photolithography method using a multi-tone mask. The formation material of the alignment control protrusion will be described in detail in “2. Orientation control protrusion” which will be described later, and will not be described here.

2. Next, the alignment control protrusion in the present invention will be described. The alignment control protrusions in the present invention are formed on a colored layer to be described later. The alignment control protrusion is provided to control the alignment state of liquid crystal molecules when the color filter of the present invention is used in a liquid crystal display device.

  The material used for the alignment control protrusion can be the same as that used for the alignment control protrusion in a general color filter. In the present invention, it is preferable that the material used for the orientation control protrusion includes a photosensitive resin. This is because the inclusion of the photosensitive resin makes it possible to collectively form the filling layer by a photolithography method using a multi-tone mask as described later.

  As the photosensitive resin used for the alignment control protrusion, either a negative photosensitive resin or a positive photosensitive resin can be used.

  The negative photosensitive resin is not particularly limited, and those generally used can be used. For example, a chemically amplified photosensitive resin based on a crosslinked resin, specifically, a chemically amplified photosensitive resin in which a crosslinking agent is added to polyvinylphenol and an acid generator is further added. For example, what has an alkali-soluble resin, a polyfunctional polymerizable monomer, and a photoinitiator as a main component can be used.

  As the alkali-soluble resin, it is preferable that an aromatic ring is contained in a weight ratio of 25% or more, or those aromatic ring structures are contained in the main chain of the resin. ) M-101, M-102, M-110, benzyl methacrylate, or a copolymer of styrene and (meth) acrylic acid. Especially, the polymer etc. which introduce | transduced the acrylic group through the epoxy group to the one part carboxylic acid group part of a styrene-acrylic acid-benzyl methacrylate copolymer are used suitably. In these copolymers, for the purpose of imparting adhesion, film-forming property, chemical resistance, etc., other polymerizable monomers may be added to form a terpolymer or a multi-polymer of higher.

  In addition, an aromatic ring-containing epoxy resin or novolac resin represented by the following chemical structural formulas (1) to (4) is reacted with an organic acid to open an epoxy group, and then reacted with an acid anhydride. And those which are monoesterified to be alkali-soluble.

M represents an integer of 0 or more, n represents an integer of 1 or more, and R ^{1 to} R ⁸ each independently represent H, CH ₃ or a halogen atom. R ⁹ and R ¹⁰ are H or CH ₃ . Further, E represents a linking group represented by the following (5).

  These can introduce a polymerizable double bond into a side chain by using (meth) acrylic acid as an organic acid when ring-opening an epoxy group. Thereby, it is possible to increase the sensitivity.

  In addition, an aromatic ring-containing resin obtained by reacting an acid anhydride with a cardo compound or a bisphenol A compound represented by the following structural formula (6), (7), or (8) may also be used. it can.

N represents an integer of 1 or more, and R ¹¹ or R ¹² represents H or CH ₃ . R ^{13 and} R ¹⁴ each independently represent H, CH ₃ or a halogen atom.

  Moreover, as said alkali-soluble resin, what contains 25% or more of alicyclic hydrocarbons by weight ratio or those alicyclic hydrocarbons are contained in the principal chain of resin is preferable. Specific examples thereof include IBXA, V # 155, manufactured by Osaka Organic Chemical Industry Co., Ltd., CH manufactured by Mitsubishi Rayon Co., Ltd., FA-511A, FA-512A, FA-513M manufactured by Hitachi Chemical Co., Ltd. Mention may be made of copolymers of FA-544A or FA-513M and (meth) acrylic acid. In these copolymers, for the purpose of imparting adhesion, film-forming property, chemical resistance, etc., other polymerizable monomers may be added to form a terpolymer or a multi-polymer of higher.

  In addition, an alicyclic hydrocarbon-containing epoxy resin represented by the following chemical structural formulas (9) and (10) is reacted with an organic acid to open an epoxy group, and then reacted with an acid anhydride. And monoesterified to make it soluble in alkali.

M represents an integer of 0 or more, n represents an integer of 1 or more, R ¹⁵ and R ¹⁶ represent H or CH ₃ , and R ¹⁷ represents H, CH ₃ or a halogen atom. E represents a linking group represented by the following (5).

  In addition, an aromatic ring-containing resin obtained by reacting an acid anhydride with a hydrogenated bisphenol A compound as represented by the following structural formula (11) or the like can also be used.

R ¹⁸ and R ¹⁹ represent H or CH ₃ .

  In addition, in this invention, it is preferable to use alkali-soluble resin which has an acrylic group among the above-mentioned.

  The polyfunctional polymerizable monomer further includes an aliphatic polyhydroxy compound such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, tetra Propylene glycol, neopentyl glycol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,10-decanediol, trimethylolpropane, pentaerythritol, di Di- or poly (meth) acrylic esters such as pentaerythritol, sorbitol, mannitol, dimethylol tricyclodecane monoacrylate, dimethylol tricyclodecane diacrylate, etc. Alicyclic monomers and aromatic polyhydroxy compounds, such as hydroquinone, resorcinol, catechol, pyrogallol, and di or poly (meth) acrylic acid esters such as bisphenol A and the like. Among these, dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), tetramethylpentatriacrylate (TMPTA) and the like are preferably used.

  These polyfunctional polymerizable monomers may be used as a mixture of two or more, such as acrylamide, diacetone acrylamide, 2-hydroxyethyl acrylate, t-butyl acrylate, cyclohexyl acrylate, benzyl acrylate, 2-phenoxyethyl acrylate, etc. These monofunctional polymerizable monomers may be used in combination.

  Further, as the photopolymerization initiator, Irgacure 651, 184, 1173, 907, 369, 819 manufactured by Ciba Specialty Chemicals, TPO manufactured by CGI124 or BASF, Kaycure DTEX manufactured by Nippon Kayaku Co., Ltd., or In addition to benzophenones such as 4,4′-diethylaminobenzophenone and 4,4′-dimethylaminobenzophenone, biimidazole compounds and triazine compounds can be exemplified.

  Moreover, it does not specifically limit as positive type photosensitive resin, What is generally used can be used. Specifically, a photosensitive resin using a novolac resin as a base resin can be used.

  In addition, when making the above-mentioned filling layer colored, what added colorants, such as a pigment and dye, to the said photosensitive resin can be used.

3. Colored layer Next, the colored layer in this invention is demonstrated. The colored layer in the present invention is formed on the base material to be described later, formed in an opening section defined by the light shielding portion, and formed so as to have a gap between the colored layers on the light shielding portion.

  As illustrated in FIG. 1, the colored layer in the present invention is generally composed of a red colored pattern 3R, a green colored pattern 3G, and a blue colored pattern 3B. The colored pattern shape in the colored layer can be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type, and the colored area can be arbitrarily set.

  In addition, about the material of the colored layer used for this invention, the material used for the colored layer of a well-known color filter can be used.

  In the present invention, the method for forming such a colored layer is not particularly limited as long as it can be formed so as to have a gap on the light shielding portion. It can be the same as the formation method of a colored layer, for example, a photolithography method, an inkjet method, a printing method, or the like.

4). Next, the light shielding part in the present invention will be described. The light-shielding part in the present invention is formed in a pattern on a substrate to be described later, and can be the same as that used as a light-shielding part in a general color filter.

  As such a light shielding portion, for example, a metal thin film such as chromium having a thickness of about 1000 to 2000 mm may be formed by sputtering, vacuum deposition, or the like, and the thin film may be patterned. Alternatively, a method in which a layer containing light-shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments in a resin binder is formed by a photolithography method, a printing method, or the like may be used.

5. Next, the substrate in the present invention will be described. The substrate in the present invention is not particularly limited as long as it is generally used for color filters, and is a transparent rigid material having no flexibility such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate and the like. Alternatively, a transparent flexible material having flexibility such as a transparent resin film and an optical resin plate can be used.

6). Color Filter The color filter of the present invention may have other members as necessary in addition to the filling layer, the orientation control protrusion, the colored layer, the light shielding portion, and the base material. Examples of other members include columnar spacers, transparent electrode layers, and alignment films. In addition, the color filter in the present invention has a configuration in which no overcoat layer is formed.
Hereinafter, the columnar spacer, the transparent electrode layer, and the alignment film will be described.

(Columnar spacer)
The columnar spacer used in the present invention is formed on the light shielding portion, that is, on the non-display area.
In the present invention, the columnar spacer is preferably made of the same material as the filling layer and the alignment control protrusion. This is because the filling layer, the alignment control protrusion, and the columnar spacer can be formed at a time, which is advantageous in terms of manufacturing efficiency.

The material used for the columnar spacer can be the same as that used for the columnar spacer in a general color filter. In the present invention, the material used for the columnar spacer preferably contains a photosensitive resin. This is because the inclusion of the photosensitive resin makes it possible to collectively form the filling layer by a photolithography method using a multi-tone mask or the like.
The material used for forming the columnar spacer can be the same as the material used for the alignment control protrusion described in the above section “2. Orientation control protrusion”. Omitted.

  The width and shape of the columnar spacer are particularly limited as long as they can be selectively formed on the light-shielding portion on the substrate and can maintain a predetermined cell gap over the entire substrate. Is not to be done. The width of the columnar spacer is about 5 μm to 20 μm. Furthermore, the shape of the columnar spacer may be a columnar shape, and may be any of a columnar shape, a prismatic shape, a truncated cone shape, and the like.

  The formation density (density) of the columnar spacers is appropriately selected in consideration of the thickness unevenness of the liquid crystal layer, the aperture ratio, the shape of the columnar spacers, the forming material, and the like. For example, if one columnar spacer is provided for one pixel, a necessary and sufficient spacer function is exhibited.

(Transparent electrode layer)
In this invention, it is preferable that the transparent electrode layer is formed on the said colored layer surface and between the said filling layer and the said light-shielding part. Thereby, since the columnar spacers and the alignment control protrusions are usually formed on the transparent electrode layer, the alignment control protrusions and the filling layer can be collectively formed.

  The transparent electrode layer used in the present invention is not particularly limited as long as it has transparency and conductivity, but a metal oxide thin film is usually used. Examples of such metal oxides include indium tin oxide (ITO), indium oxide, zinc oxide, and tin oxide.

(Alignment film)
As the alignment film used in the present invention, those generally used as alignment films for color filters for liquid crystal display devices can be widely used. As such an alignment film, for example, a rubbing film in which an alignment regulating force is expressed by rubbing a polymer film such as polyimide, or a film made of a photoreactive material or a photoisomerization material is irradiated with polarized light. Examples thereof include a photo-alignment film that exhibits an alignment regulating force.

B. Next, a method for producing a color filter of the present invention will be described. The method for producing a color filter of the present invention includes a base material, a light shielding part formed in a pattern on the base material, a colored layer formed in an opening of the light shielding part on the base material, and the light shielding part. A method of manufacturing a color filter having a filling layer formed only in a gap between the colored layers on a portion, and an alignment control protrusion formed on the colored layer, wherein the method is provided on the light shielding portion and the colored layer. And a photosensitive resin layer forming step for forming a photosensitive resin layer made of a photosensitive resin, and the photosensitive resin layer is exposed using a multi-tone mask, developed, and filled with the photosensitive resin layer. And a heterogeneous member collective forming step of simultaneously forming the layer and the alignment control protrusion.

FIG. 2 shows an example in which a filling layer and alignment control protrusions are formed in a lump according to the present invention. First, as shown to Fig.2 (a), it is photosensitive so that the light-shielding part 2 formed on the base material 1 and the colored layer 3 comprised from the red pattern 3R, the green pattern 3G, and the blue pattern 3B may be covered. The resin layer 11 is formed. Next, as shown in FIG. 2B, the photosensitive resin layer 11 is exposed with the exposure light L through the multi-tone mask 21.
The multi-tone mask 21 includes a light shielding film pattern 23 and a semi-transmissive film pattern 24 formed on a transparent substrate 22, a light shielding region 31 provided with the light shielding film pattern 23 on the transparent substrate 22, and a transparent A semi-transmissive region 32 in which only the semi-transmissive film pattern 24 is provided on the substrate 22 and a transmissive region 33 having only the transparent substrate 22 are included. In the multi-tone mask 21, the light-shielding region 31, the semi-transmissive region 32, and the transmissive region 33 have different transmittances. Therefore, the degree of photocuring reaction of the photosensitive resin layer varies depending on the transmittance of each region. By developing after exposure, the filling layer 4 and the alignment control protrusions 5 having different shapes and heights are collectively formed.

As described above, in the method for producing a color filter of the present invention, the filling layer and the alignment control protrusion can be formed simultaneously by one exposure, so the filling layer is formed without increasing the number of production steps. It becomes possible.
Hereinafter, each process in the manufacturing method of the color filter of this invention is demonstrated.

1. Photosensitive resin layer formation process The photosensitive resin layer formation process in this invention is a process of forming the photosensitive resin layer on the light shielding part and colored layer which were formed on the base material. In such a photosensitive resin layer forming step, for example, a photosensitive resin composition containing a photosensitive resin is applied to a light shielding portion and a colored layer formed on a base material, and a photosensitive resin layer is formed. It can be.

  In addition, since it described in detail in the above-mentioned "A. color filter" about the base material, the light-shielding part, and the colored layer, description here is abbreviate | omitted.

  The photosensitive resin composition used in this step can be, for example, a mixture of a photosensitive resin and a solvent. As the photosensitive resin, since the same material as the forming material of the filling layer and the alignment control protrusion described in the above section “A. Color filter” can be used, the description thereof is omitted here. Moreover, as said solvent, it can be made to be the same as that of the solvent contained in the photosensitive resin composition generally used for formation of the member in a color filter.

  Examples of the method for applying the photosensitive resin composition include spin coating, casting, dipping, bar coating, blade coating, roll coating, gravure coating, flexographic printing, and spray coating. Can do.

  The thickness of the photosensitive resin layer after coating is appropriately adjusted according to the height of the alignment control protrusion to be formed. That is, the thickness of the photosensitive resin layer is adjusted so as to conform to the height of the alignment control protrusion that is higher than the filling layer.

  After application of the photosensitive resin composition, the photosensitive resin layer may be subjected to heat treatment (pre-baking).

2. Different member batch forming step In the present invention, the different member batch forming step is a step of exposing and developing the photosensitive resin layer using a multi-tone mask, and forming a filling layer and alignment control protrusions at a time. is there.

The multi-tone mask used in the present invention refers to a photomask generally used for forming members having different heights at once, and specifically, three types having different transmittances. This means a photomask having the above regions. As such a multi-tone mask, for example, a light-shielding film pattern and a semi-transmissive film pattern are formed on a transparent substrate, and a light-shielding region in which the light-shielding film pattern is provided on the transparent substrate, and a semi-transmissive film pattern on the transparent substrate. And a transmissive region having only a transparent substrate. Specifically, as illustrated in FIG. 2B, a light-shielding region 31 in which a light-shielding film pattern 23 and a semi-transmissive film pattern 24 are laminated in this order on the transparent substrate 22, and semi-transmissive on the transparent substrate 22. A multi-tone mask 21 having a semi-transmissive region 32 provided with only the film pattern 24 and a transmissive region 33 having only the transparent substrate 22, or a semi-transmissive film pattern on the transparent substrate 22 as illustrated in FIG. 24 and the light-shielding film pattern 23 are laminated in this order, a semi-transmissive area 32 in which only the semi-transmissive film pattern 24 is provided on the transparent substrate 22, and a transmissive area 33 having only the transparent substrate 22 And a multi-tone mask 21 '.
As for the multi-tone mask, reference can be made to, for example, JP-A-2006-18001.

  Further, the exposure method is not particularly limited, and for example, proximity exposure can be performed in which a multi-tone mask is arranged with a gap of about several tens of μm from the surface of the photosensitive resin layer to perform exposure. . This exposure causes a photocuring reaction in the irradiated area.

  After the exposure, development is performed. The photosensitive resin layer is partially removed by development. Specifically, a portion cured by exposure remains, and the other portion is selectively removed. The curing reaction proceeds sufficiently in the part exposed from the transmission region of the multi-tone mask, whereas the curing reaction is insufficient in the part exposed from the semi-transmission region. The control protrusion can be formed simultaneously. Development can be performed according to a general alkali development method.

  In addition, after the exposure and development, the formed filling layer and the alignment control protrusion may be subjected to heat treatment (post-bake). This heat treatment can be appropriately set, for example, at a temperature of 100 to 250 ° C. and a treatment time of about 10 to 60 minutes.

  Moreover, in this invention, it is preferable that the columnar spacer which consists of said photosensitive resin is further formed simultaneously by this process. This is because the manufacturing process is further simplified and the manufacturing cost can be reduced by forming the filling layer, the alignment control protrusions, and the columnar spacers at once.

  The filling layer, the columnar spacer, and the alignment control protrusion formed in this step are described in the above section “A. Color filter”, and thus the description thereof is omitted here.

3. Other Steps In the present invention, a step of forming various members in the color filter can be performed as necessary before the transparent resin layer forming step or after the different member batch forming step.

For example, a light shielding part forming step for forming a light shielding part on a base material, a colored layer forming step for forming a colored layer on a base material, and forming a transparent electrode layer so as to cover the light shielding part and the colored layer on the base material A transparent electrode layer forming step, an alignment film forming step for forming an alignment film on the outermost surface of the color filter, and the like can be performed. In the colored layer forming step, the colored layers are formed at intervals so that the colored layers do not contact each other on the light shielding portion.
Further, in the case where the columnar spacer is not formed in the different member batch forming step, the columnar spacer forming step of forming the columnar spacer on the light shielding portion can be performed.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

The following examples illustrate the present invention more specifically.
[Example 1]
(Preparation of photosensitive resin composition)
63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG) in the polymerization tank After charging, stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly. Thereafter, the mixture was stirred at 85 ° C. for 2 hours under a nitrogen stream, and further reacted at 100 ° C. for 1 hour. 7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution (solid content 50%). )
Next, the following materials were stirred and mixed at room temperature to obtain a photosensitive resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399): 24 parts by weight-Orthocresol novolac type epoxy resin (Oka Chemical Shell Epoxy Epicoat 180S70): 4 parts by weight Parts 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight diethylene glycol dimethyl ether: 52 parts by weight

(Shading part forming process)
First, the following components were mixed and sufficiently dispersed in a sand mill to prepare a black pigment dispersion.
・ Black pigment: 23 parts by weight ・ Polymer dispersion (Bicchemy Japan Co., Ltd. Disperbyk111): 2 parts by weight ・ Solvent (diethylene glycol dimethyl ether): 75 parts by weight A composition was obtained.
-Black pigment dispersion: 61 parts by weight-Photosensitive resin composition: 20 parts by weight-Diethylene glycol dimethyl ether: 30 parts by weight And a 370mm x 470mm glass substrate (Asahi Glass Co., Ltd. AN material) with a thickness of 1.1mm On top of this, the light shielding part composition was applied by a spin coater and dried at 100 ° C. for 3 minutes to form a light shielding part having a film thickness of about 1 μm. The light-shielding part is exposed to a light-shielding pattern with an ultra-high pressure mercury lamp, and then developed with a 0.05 wt% aqueous potassium hydroxide solution. Thereafter, the glass substrate is left to stand in an atmosphere of 180 ° C. for 30 minutes for heat treatment. The light shielding portion was formed in the region where the light shielding portion should be formed.

(Colored layer formation process)
A red photosensitive resin composition having the following composition was applied by spin coating on the glass substrate on which the light shielding part was formed as described above (application thickness: 2.5 μm), and then dried in an oven at 70 ° C. for 3 minutes. . Next, a photomask is placed at a distance of 100 μm from the coating film of the red photosensitive resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer forming region using a 2.0 kW super high pressure mercury lamp by a proximity aligner. Irradiated for 2 seconds. Subsequently, it was immersed in a 0.05 wt% potassium hydroxide aqueous solution (liquid temperature: 23 ° C.) for 1 minute and alkali developed to remove only the uncured portion of the coating film of the red photosensitive resin composition. Thereafter, the glass substrate was left in an atmosphere of 180 ° C. for 30 minutes to perform heat treatment to form a red relief pattern in a region where a red pixel was to be formed.
a. Composition of red curable resin composition CI pigment red 177: 10 parts by weight Polysulfonic acid type polymer dispersant: 3 parts by weight Photosensitive resin composition: 5 parts by weight 3-methoxybutyl acetate: 82 parts by weight

Next, using the green photosensitive resin composition having the following composition, a green relief pattern was formed in a region where a green pixel was to be formed, in the same process as the red relief pattern formation.
b. Composition of green curable resin composition CI pigment green 36: 10 parts by weight Polysulfonic acid type polymer dispersant: 3 parts by weight Photosensitive resin composition: 5 parts by weight 3-methoxybutyl acetate: 82 parts by weight

Further, using a blue photosensitive resin composition having the following composition, a blue relief pattern is formed in a region where a blue pixel is to be formed in the same process as that for forming a red relief pattern, and red (R), green (G ) And blue (B) were formed. Note that gaps were formed on the light shielding portions between the colored layers of the respective colors.
c. Composition of blue curable resin composition CI pigment blue 15: 6: 10 parts by weight Polysulfonic acid type polymer dispersant: 3 parts by weight Photosensitive resin composition: 5 parts by weight 3-methoxybutyl acetate: 82 Parts by weight

(Transparent electrode layer forming process)
On the glass substrate on which the colored layer was formed as described above, a transparent electrode layer was formed by a DC magnetron sputtering method using argon and oxygen as discharge gases at a substrate temperature of 200 ° C. and using ITO as a target.

(Different parts batch forming process)
On the transparent electrode layer formed as described above, the photosensitive resin composition was applied by a spin coating method and dried to form a coating film. A three-tone photomask was placed at a distance of 100 μm from the coating film of the photosensitive resin composition, and irradiated with ultraviolet rays for 10 seconds by a proximity aligner using a 2.0 kW ultrahigh pressure mercury lamp. Next, it was immersed in a 0.05 wt% aqueous potassium hydroxide solution (liquid temperature: 23 ° C.) for 1 minute and alkali developed to remove only the uncured portion of the coating film of the photosensitive resin composition. Then, the glass substrate is left in an atmosphere of 200 ° C. for 30 minutes to perform heat treatment, and the same height as the alignment control protrusions and the colored layer (maximum thickness from the glass substrate surface to the colored layer surface, Filling layers having the same maximum thickness from the glass substrate surface to the filling layer surface were formed at predetermined positions.

(Columnar spacer formation process)
The photosensitive resin composition was applied by the spin coating method on the glass substrate on which the alignment control protrusions and the filling layer were formed as described above, and dried to form a coating film. A photomask was placed at a distance of 100 μm from the coating film of the photosensitive resin composition, and only a spacer formation region was irradiated with ultraviolet rays for 10 seconds using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Next, it was immersed in a 0.05 wt% aqueous potassium hydroxide solution (liquid temperature: 23 ° C.) for 1 minute and alkali developed to remove only the uncured portion of the coating film of the photosensitive resin composition. Thereafter, the glass substrate was left to stand in an atmosphere of 200 ° C. for 30 minutes to perform heat treatment, and a fixed columnar spacer having an upper end area of 100 μm ² and 3.8 μm was formed in the light shielding portion so as to have a predetermined number density. .

(Production of liquid crystal display device)
An alignment film made of polyimide was formed on the glass substrate on which the columnar spacers were formed as described above. Next, a required amount of VA liquid crystal is dropped on the glass substrate on which the TFT is formed, the above color filters are overlaid, and a UV curable resin is used as a sealing material, and 400 mJ / cm ² while applying a pressure of 0.3 kgf / cm ^{2 at} room temperature. Were bonded by exposing at an irradiation amount of, and a cell was assembled to obtain a liquid crystal display device.

[Comparative Example 1]
A liquid crystal display device was produced in the same manner as in Example 1 except that the filling layer was not formed.

[Evaluation]
The amount of liquid crystal injected into the liquid crystal display devices obtained in Example 1 and Comparative Example 1 was compared. The results are shown in Table 1 below. In addition, the amount of liquid crystal was expressed by calculating the respective amounts, assuming that the amount of liquid crystal of Comparative Example 1 in which the filling layer was not formed was 1.

充填層を形成した実施例１は、着色層間に隙間に充填層を形成しなかった比較例１と比べて、液晶の注入量（滴下量）を少なくすることができた。

In Example 1 in which the filling layer was formed, the amount of liquid crystal injected (drop amount) could be reduced as compared with Comparative Example 1 in which no filling layer was formed in the gap between the colored layers.

It is a schematic sectional drawing which shows an example of the color filter of this invention. It is process drawing which shows an example of the manufacturing method of the color filter of this invention. It is explanatory drawing which shows the other example of the manufacturing method of the color filter of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Light-shielding part 3 ... Colored layer 3R ... Red pattern 3G ... Green pattern 3B ... Blue pattern 4 ... Filling layer 5 ... Protrusion for orientation control 6 ... Columnar spacer 10 ... Color filter 11 ... Photosensitive resin layer 21 ... Multi-tone mask 22 ... Transparent substrate 23 ... Light-shielding film pattern 24 ... Semi-transmissive film pattern 31 ... Light-shielding area 32 ... Semi-transmissive area 33 ... Transmission area

Claims (5)

Only in the gap between the base material, the light shielding part formed in a pattern on the base material, the colored layer formed in the opening part of the light shielding part on the base material, and the colored layer on the light shielding part A color filter having a formed filling layer and an alignment control protrusion formed on the colored layer,
The filling layer is made of the same material as the orientation control protrusion,
When the maximum thickness from the substrate surface to the colored layer surface is 1, the maximum thickness from the substrate surface to the filling layer surface is in the range of 0.6 to 1.2, Color filter to be used.   The color filter according to claim 1, wherein a columnar spacer is formed on the light shielding portion, and the filling layer is made of the same material as the columnar spacer.   The transparent electrode layer is formed at least between the alignment control protrusion and the colored layer, and between the filling layer and the light-shielding portion. Color filter. Only in the gap between the base material, the light shielding part formed in a pattern on the base material, the colored layer formed in the opening part of the light shielding part on the base material, and the colored layer on the light shielding part A method for producing a color filter having a formed filling layer and an alignment control protrusion formed on the colored layer,
A photosensitive resin layer forming step of forming a photosensitive resin layer made of a photosensitive resin on the light shielding portion and the colored layer;
The photosensitive resin layer is exposed and developed using a multi-tone mask, and a filling layer made of the photosensitive resin and an alignment control protrusion are simultaneously formed, so that different types of members of different types are formed at once. A different member batch forming process,
In the different member batch forming step, when the maximum thickness from the substrate surface to the colored layer surface is 1, the maximum thickness from the substrate surface to the filling layer surface is 0.6 to 1.2. A method for producing a color filter, wherein the filling layer is formed so as to be within a range.   The method for producing a color filter according to claim 4, wherein the different member batch forming step is a step of simultaneously forming a columnar spacer made of the photosensitive resin.

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