JP5179767B2 - Substrate processing apparatus, display method thereof, data collection method, and event collection program - Google Patents

Description

  The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that records operation information logs and component states as log data.

Generally, an apparatus controller is mounted on a substrate processing apparatus.
This type of device controller has a configuration in which a control unit and an operation unit are connected by a LAN and the operation unit is connected to a host computer. When the device controller downloads process recipes and tables from the host computer to the memory, the setting value acquisition module acquires the process recipe setting values in the memory and sends them to each sub controller. Each sub controller is based on the setting values. The substrate processing apparatus is controlled.
By the way, in the device controller, in order to improve operability, a download button for downloading a recipe, a command button for executing a command for control, and a command input window are displayed on the operation screen of the display unit, and during the recipe RUN, That is, during the execution of substrate processing based on recipe setting values, attempts have been made to execute commands or download recipes using the buttons and command input window.

Here, when an incorrect recipe is downloaded and executed, or when an incorrect command is executed during the recipe RUN, an unexpected failure may occur in the substrate processing apparatus and the substrate processing.
In such a case, a system that can determine the cause of the failure and restore the entire system is required.
Therefore, the present applicants are attempting to solve this type of problem by a system that logs a command execution history during the recipe RUN and analyzes the log data.
According to this system, since the log data is stored in the database, the cause of the failure can be identified by referring to the log data history when the failure occurs, so that the system can be recovered.

  However, since the above log data does not have information on when (which device) and how and in what situation, there is only history information while the recipe is running. Analysis becomes difficult, and recovery work takes a long time.

  The present invention has been made in view of the above problems, and by collecting information on the operation of the substrate processing apparatus and displaying it on the screen, failure analysis at the time of failure occurrence is facilitated, and time required for restoration work is reduced. The purpose is to shorten.

In order to achieve the above object, the present invention provides a substrate processing apparatus including a controller having a control unit that controls a substrate to be processed and an operation unit that includes an operation screen for giving an instruction to the control unit. The controller collects and stores command operations and file editing operations such as recipes / tables in the operation unit, and collects status changes of the substrate processing apparatus and the parts constituting the substrate processing apparatus. Storage means for storing, display means for displaying the stored information on the operation screen, file editing operations such as the command operation and the recipe / tables, the substrate processing apparatus and the substrate processing A change in the status of the components constituting the apparatus is displayed on the same screen together with the date and time when it occurred, the subject that generated it, and the generated instruction.

  According to the present invention, all information during operation of the substrate processing apparatus can be displayed on the screen. Therefore, when a failure occurs in the substrate processing apparatus, the cause can be easily found. In addition, since the cause of the failure can be found in a short time, the time until system recovery can be shortened.

  In the best mode for carrying out the present invention, as an example, the substrate processing apparatus is configured as a semiconductor manufacturing apparatus that performs processing steps in a method of manufacturing a semiconductor device (IC). In the following description, a case where a vertical apparatus (hereinafter simply referred to as a substrate processing apparatus) that performs oxidation, diffusion processing, CVD processing, or the like is applied to the substrate as the substrate processing apparatus will be described. The present invention can also be applied to other substrate processing apparatuses such as a single wafer processing apparatus.

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to FIGS. (1-1 Configuration of the substrate processing apparatus)
FIG. 1 is a plan perspective view showing a substrate processing apparatus applied to the present invention, and FIG. 2 is a side perspective view of the substrate processing apparatus shown in FIG.

As shown in FIGS. 1 and 2, the substrate processing apparatus 100 of the present embodiment using a hoop (substrate container; hereinafter referred to as a pod) 110 as a wafer carrier storing a wafer (substrate) 200 made of silicon or the like includes a housing. A body 111 is provided.
A front maintenance port 103 as an opening provided for maintenance is opened at the front front portion of the front wall 111a of the housing 111, and front maintenance doors 104 and 104b for opening and closing the front maintenance port 103 are respectively built. Attached.
A pod loading / unloading port (substrate container loading / unloading port) 112 is opened on the front wall 111a of the casing 111 so as to communicate between the inside and the outside of the casing 111. The pod loading / unloading port 112 has a front shutter (substrate container loading / unloading port). The loading / unloading opening / closing mechanism 113 is opened and closed. A load port (substrate container delivery table) 114 is installed on the front front side of the pod loading / unloading port 112. The load port 114 is configured such that the pod 110 is placed and aligned. The pod 110 is carried onto the load port 114 by an in-process carrying device (not shown), and is also carried out from the load port 114.

A rotary pod shelf (substrate container mounting shelf) 105 is installed at an upper portion of the casing 111 in a substantially central portion in the front-rear direction. The rotary pod shelf 105 stores a plurality of pods 110. It is configured. That is, the rotary pod shelf 105 is vertically arranged and intermittently rotated in a horizontal plane, and a plurality of shelf plates (substrate container mounts) radially supported by the column 116 at each of the four upper and lower positions. Stand) 117.
The plurality of shelf plates 117 are configured to hold the pod 110 in a state where a plurality of pods 110 are respectively placed.
A pod transfer device (substrate container transfer device) 118 is installed between the load port 114 and the rotary pod shelf 105 in the housing 111, and the pod transfer device 118 moves up and down while holding the pod 110. A pod elevator (substrate container lifting mechanism) 118a and a pod transfer mechanism (substrate container transfer mechanism) 118b as a transfer mechanism are configured. The pod transfer device 118 is a continuous pod elevator 118a and pod transfer mechanism 118b. By operation, the pod 110 is transported between the load port 114, the rotary pod shelf 105, and the pod opener (substrate container lid opening / closing mechanism) 121.

A sub-housing 119 is constructed across the rear end of the lower portion of the housing 111 at a substantially central portion in the front-rear direction.
A pair of wafer loading / unloading ports (substrate loading / unloading ports) 120 for loading / unloading the wafer 200 into / from the sub-casing 119 are arranged on the front wall 119a of the sub-casing 119 in two vertical stages. A pair of pod openers 121 and 121 are installed at the wafer loading / unloading ports 120 and 120 at the upper and lower stages, respectively.
The pod opener 121 includes mounting bases 122 and 122 on which the pod 110 is placed, and cap attaching / detaching mechanisms (lid attaching / detaching mechanisms) 123 and 123 for attaching and detaching caps (lids) of the pod 110.
The pod opener 121 is configured to open and close the wafer loading / unloading port of the pod 110 by attaching / detaching the cap of the pod 110 placed on the placing table 122 by the cap attaching / detaching mechanism 123.

  The sub-housing 119 constitutes a transfer chamber 124 that is fluidly isolated from the installation space of the pod transfer device 118 and the rotary pod shelf 105. A wafer transfer device (substrate transfer device) 125 is installed in the front area of the transfer chamber 124, and the wafer transfer device 125 can rotate or linearly move the wafer 200 in the horizontal direction. (Substrate transfer device) 125a and a wafer transfer device elevator (substrate transfer device lifting mechanism) 125b for raising and lowering the wafer transfer device main body 125a. By continuous operation of the wafer transfer device elevator 125b and the wafer transfer device main body 125a, a boat (substrate holder) 217 with the tweezer (substrate holding body) 125c of the wafer transfer device main body 125a as the mounting portion of the wafer 200 is used. The wafer 200 is loaded (charged) and unloaded (discharged).

As shown in FIG. 1, a supply fan and a dust proof are provided to supply a clean atmosphere or clean air 133 that is an inert gas to the right end of the transfer chamber 124 opposite to the wafer transfer device elevator 125 b side. A clean unit 134 composed of a filter is installed, and a notch alignment device 135 is provided as a substrate alignment device for aligning the circumferential position of the wafer 200 between the wafer transfer device main body 125a and the clean unit 134. is set up.
The clean air 133 blown out from the clean unit 134 is circulated through the notch aligning device 135 and the wafer transfer device main body 125a and then sucked in through a duct (not shown) to be exhausted outside the casing 111. It is circulated to the primary side (supply side) which is the suction side of the clean unit 134, and is again blown out into the transfer chamber 124 by the clean unit 134.

In the rear region of the transfer chamber 124, a casing (hereinafter referred to as a pressure-resistant casing) 140 having a confidential performance capable of maintaining a pressure lower than atmospheric pressure (hereinafter referred to as negative pressure) is installed. A load lock chamber 141 which is a load lock type standby chamber having a capacity capable of accommodating the boat 217 is formed by the pressure-resistant housing 140.
A wafer loading / unloading opening (substrate loading / unloading opening) 142 is formed in the front wall 140a of the pressure-resistant housing 140, and the wafer loading / unloading opening 142 is opened and closed by a gate valve (substrate loading / unloading opening / closing mechanism) 143. It has become.
A gas supply pipe 144 for supplying nitrogen gas to the load lock chamber 141 and an exhaust pipe 145 for creating a negative pressure by exhausting the load lock chamber 141 are connected to the pair of side walls of the pressure-resistant housing 140, respectively. Has been.
A processing furnace 202 is provided above the load lock chamber 141.
The lower end portion of the processing furnace 202 is configured to be opened and closed by a furnace port gate valve (furnace port opening / closing mechanism) 147.
A furnace port gate valve cover 149 that accommodates the furnace port gate valve 147 when the lower end portion of the processing furnace 202 is opened is attached to the upper end portion of the front wall 140 a of the pressure-resistant housing 140.

As shown in FIG. 1, a boat elevator (substrate holder lifting mechanism) 115 for lifting and lowering the boat 217 is installed in the pressure-resistant housing 140. A seal cap 219 serving as a lid is horizontally installed on an arm 128 serving as a connector coupled to the boat elevator 115.
The seal cap 219 is configured to support the boat 217 vertically and to close the lower end opening of the processing furnace 202.
The boat 217 includes a plurality of holding members so that a plurality of (for example, about 50 to 125) wafers 200 are horizontally held in a state where their centers are aligned in the vertical direction. It is configured.

(1-2 Operation of the substrate processing apparatus 100)
As shown in FIGS. 1 and 2, when the pod 110 is supplied to the load port 114, the pod loading / unloading port 112 is opened by the front shutter 113, and the pod 110 above the load port 114 is enclosed by the pod transfer device 118. It is carried into the body 111 from the pod loading / unloading port 112.
The loaded pod 110 is automatically transported and delivered by the pod transport device 118 to the designated shelf 117 of the rotary pod shelf 105, temporarily stored, and then one pod opener from the shelf 117. It is conveyed to 121 and transferred to the mounting table 122, or directly transferred to the pod opener 121 and transferred to the mounting table 122.
At this time, the wafer loading / unloading port 120 of the pod opener 121 is closed by the cap attaching / detaching mechanism 123, and the transfer chamber 124 is filled with clean air 133. For example, the transfer chamber 124 is filled with nitrogen gas as clean air 133, so that the oxygen concentration is set to 20 ppm or less, which is much lower than the oxygen concentration inside the casing 111 (atmosphere).

The pod 110 mounted on the mounting table 122 has its opening-side end face pressed against the opening edge of the wafer loading / unloading port 120 on the front wall 119a of the sub-housing 119, and the cap is removed by the cap attaching / detaching mechanism 123. The wafer loading / unloading port of the pod 110 is opened.
Further, when the wafer loading / unloading opening 142 of the load lock chamber 141 whose interior is previously set at atmospheric pressure is opened by the operation of the gate valve 143, the wafer 200 is removed from the pod 110 by the tweezer 125c of the wafer transfer device main body 125a. After being picked up through the wafer loading / unloading port and aligned with the wafer 200 by the notch aligning device 135, the wafer is loaded into the load lock chamber 141 through the wafer loading / unloading opening 142, transferred to the boat 217 and loaded (wafer charging).
The wafer transfer device main body 125 a that has delivered the wafer 200 to the boat 217 returns to the pod 110 and loads the next wafer 200 into the boat 217.

  During the loading operation of the wafer 200 to the boat 217 by the wafer transfer device 125 in the one (upper or lower) pod opener 121, the other (lower or upper) pod opener 121 has a rotary pod shelf 105 or load port. Another pod 110 is transferred from 114 by the pod transfer device 118, and the opening operation of the pod 110 by the pod opener 121 is simultaneously performed.

When a predetermined number of wafers 200 are loaded into the boat 217, the wafer loading / unloading opening 142 is closed by the gate valve 143, and the load lock chamber 141 is decompressed by evacuation from the exhaust pipe 145.
When the load lock chamber 141 is reduced to the same pressure as that in the processing furnace 202, the lower end portion of the processing furnace 202 is opened by the furnace port gate valve 147. At this time, the furnace port gate valve 14
7 is carried into the furnace port gate valve cover 149 and accommodated therein.
Subsequently, the seal cap 219 is raised by the elevator 161 of the boat elevator 115, and the boat 217 supported by the seal cap 219 is loaded into the processing furnace 202.

After loading, arbitrary processing is performed on the wafer 200 in the processing furnace 202.
After the processing, the boat 217 is pulled out by the boat elevator 115, and the gate valve 143 is opened after the pressure inside the load lock chamber 141 is restored to atmospheric pressure. After that, the wafer 200 and the pod 110 are discharged to the outside of the casing 111 in the reverse order of the above-described procedure, except for the wafer 200 alignment process in the notch alignment device 135.

A substrate processing chamber (not shown) in the processing furnace 202 is partitioned by a Si-containing material containing Si, preferably quartz, and a gas pipe and an exhaust pipe (both not shown) communicate with each other. Yes.
The exhaust pipe is connected to a vacuum pump as a vacuum exhaust device.
The gas piping is branched into a plurality of portions so as to selectively introduce a processing gas such as a source gas, a replacement gas, and a cleaning into the substrate processing chamber of the processing furnace 202.
Each branch portion of the branched gas pipe is provided with an open / close valve and a flow rate control valve (not shown) such as a mass flow controller from the upstream side to the downstream side.
The partition member that partitions the substrate processing chamber is provided with a heater for raising the temperature to the substrate processing temperature by uniformly heating the substrate processing chamber.
This heater is composed of a resistance heater or an induction heater, and is connected to an apparatus controller of the substrate processing apparatus via a temperature controller.
The exhaust pipe open / close valve, the gas pipe open / close valve, the gas pipe flow control valve, and the vacuum pump are each connected to an apparatus controller of the substrate processing apparatus via a valve controller.
When a control instruction based on the process recipe is output from the apparatus controller to the temperature controller and each valve controller, the temperature control of the substrate processing chamber, the open / close control of the open / close valve of the exhaust pipe, the gas piping, the opening degree of the flow control valve, Substrate processing is performed by controlling the temperature of the heater and starting the vacuum pump.

For example, in the case of a substrate film forming process, a vacuum pump is activated and the pressure in the substrate processing chamber is adjusted by controlling the opening degree of the opening / closing valve of the exhaust pipe. Further, the temperature of the substrate processing chamber is raised to the substrate processing temperature by the temperature control of the heater. Thereafter, only the open / close valve of the gas branch for supplying the source gas is opened, the source gas supply source and the substrate processing chamber are communicated, and the source gas whose flow rate is controlled by the flow rate control valve is the substrate processing chamber. To be introduced.
When an inert gas is supplied as a processing gas to the substrate processing chamber instead of the source gas, the atmosphere in the substrate processing chamber is purged.
Further, when the etching gas is supplied as the processing gas, the deposits attached to the inner surfaces of the substrate processing chamber and the piping are removed by the etching gas.

(2-1 Device controller 1)
FIG. 3 is a block diagram showing a configuration of the device controller 1.
The device controller 1 includes a control unit 2 and an operation unit 3. The control unit 2 and the operation unit 3 are each configured by a known computer, and each include a data transmission / reception module 4 for data communication.
The data transmission / reception module 4 of the control unit 2 and the data transmission / reception module 4 of the operation unit 3 are communicably connected via a LAN 5.
(Configuration of operation unit 3)
The operation unit 3 includes a hard disk 11 as a fixed storage device, an operation unit side memory 12, a data transmission / reception module 4 for data transmission / reception, a monitor 10 as a display unit for displaying a screen, and a user on these screens. And key input device 1 for inputting instructions of device workers
3 and a display control unit 14 that draws various operation buttons on the screen of the monitor 10 and captures instructions of the operation buttons.
When an operation key (not shown) is displayed on the screen of the monitor 10 and the substrate processing apparatus 100 is operated by this operation key, the key input device 13 may be removed or abolished.

The hard disk 11 stores various programs such as an OS and an initial (initialization) program of the operation unit 3 and screen files referred to by the programs in advance.
Further, as will be described later, the hard disk 11 has a database DB storing operation information logs, component information, and user operation logs of the substrate processing apparatus 100 from the start to the stop of the apparatus controller 1. Built.
The CPU (not shown) of the operation unit 3, the hard disk 11, and the operation unit side memory 12 are capable of data communication via buses (not shown).
(Operation of the operation unit 3)
When the apparatus controller 1 is activated, the CPU of the operation unit 3 activates the initial program.
An operation screen (described later) stored in the screen file of the hard disk 11 is displayed on the monitor 10, and then various buttons are displayed on the operation screen by the display control unit 14.
When the user selects a file such as a recipe or table using each button on the operation screen or an operation key having the same function as the key input device 13 and touches (instructs) a button for executing download, the display control unit 14 The instruction is detected by. When a touch is detected, the CPU of the operation unit 3 permits downloading and downloads files such as recipes and tables selected on the operation screen to the operation unit side memory 12.
After downloading, the CPU transfers the files such as the recipe and tables downloaded to the operation unit side memory 12 to the control unit side memory 15 of the control unit 2. The transfer path includes the data transmission / reception module 4 of the operation unit 3, the LAN 5, the data transmission / reception module 4 of the control unit 2, the bus, and the control unit side memory 15. Further, when downloading, the device controller 1 is once saved and the device controller 1 is restarted. When the device controller 1 is restarted, the downloaded file or the like is downloaded from the hard disk 11 to the operation unit side memory 12. Alternatively, it may be downloaded to the control unit side memory 15.
For example, a process recipe and an ABORT recipe correspond to the downloaded recipe, and various tables such as an alarm condition table correspond to the tables. The process recipe refers to a recipe in which a substrate transport system sub-controller (described later), a substrate processing system sub-controller (described later) and a substrate processing system sequence and set values for each step of the sequence are set. The ABORT recipe is a recipe that defines a procedure for recovery processing (a procedure for bringing the processing furnace 202 of the substrate processing apparatus 100 into a safe state).
The operation unit 3 has a function of collecting event logs as well as collecting data from the control unit 2. For example, when the downloaded process recipe is executed, an event from the substrate processing system sub-controller (for example, an event transmitted from a valve controller, a temperature controller, or the like) or an event from the substrate transport system sub-controller ( Data indicating a change in the situation from the wafer transfer device 125 or the like). In addition, instructions on the operation screen of the monitor 10 (command execution instructions, etc.) are collected. Further, command request instructions from the host computer 18 are also collected. Data collected by the operation unit 3 is stored in the database DB of the hard disk 11. Further, the monitor 10 of the operation unit 3 edits and creates the process recipe and the like, and all of these histories are also stored in the database DB. Further, the database DB stores the date and time when the data was generated, the location where the data was generated, the subject that generated the data, and the like together with the data. Note that the data collection period may be changed by designating it on the operation screen of the monitor 10, but is normally performed from the time of starting the apparatus to the time of stopping the apparatus. Here, the event means all instructions related to the state of the apparatus, input of commands, uploading and downloading of various files, file editing, alarm status, and initial / shutdown described later with reference to FIG.

(Configuration of control unit 2)
The control unit 2 includes a data transmission / reception module 4 connected to the data transmission / reception module 4 of the operation unit 3 via the LAN 5, a control unit side memory 15, and a setting value acquisition module for acquiring a setting value.
The controller 2 includes various controllers such as the front shutter 113, the boat elevator 115, the pod transfer device 118, the pod opener 121, the wafer transfer device 125, the gate valve 143, and the notch alignment device 135 (hereinafter referred to as these controllers). Collectively referred to as a sub-controller of the substrate transfer system), the on-off valve of the exhaust pipe 145, the on-off valves of the gas pipe, the flow rate control valves of the gas pipe, and the controller of the vacuum pump (hereinafter these controllers are generically referred to) And a sub-controller of the substrate processing system).

In this embodiment, a process recipe setting value acquisition module 16 for acquiring a process recipe setting value as the setting value acquisition module, and an alarm condition setting value acquisition module 17 for acquiring a setting value of an alarm condition table. However, it is assumed that other setting value acquisition modules are also provided as necessary.
Note that these setting value acquisition modules are configured by programs or hardware.

(Operation of the control unit 2)
When the apparatus controller 1 is activated and the initial program is activated by the CPU, files such as process recipes and alarm condition tables in the operation unit side memory 12 are transferred to the control unit side memory 15.
In the control unit 2, the process recipe setting value acquisition module 16 and the alarm condition table setting value acquisition module 17 refer to the control unit side memory 15, and set the setting values for each step of the substrate processing sequence set by the process recipe. Obtain this and output it to the sub-controller of the substrate transport system and the sub-controller of the substrate processing system.

When the substrate transfer system sub-controller and the substrate processing system sub-controller receive the transmission of the set values from the process recipe setting value acquisition module 16 and the alarm condition table setting value acquisition module 17, the front shutter 113, the boat elevator 115, The substrate transfer system such as the pod transfer device 118, the pod opener 121, the wafer transfer device 125, the gate valve 143, and the notch alignment device 135 is controlled based on the set values, and a plurality of valve controllers and temperature controllers are set based on the set values. The substrate processing to be controlled is executed.
Further, when the alarm condition set in the alarm condition table is satisfied, the CPU outputs a warning operation signal to the alarm or buzzer, operates the alarm or buzzer, and informs the surroundings of the abnormality.
Further, depending on the type of abnormality, the ABORT recipe set in the alarm condition table is executed. Further, the control unit 2 receives data from each of the sub-controllers described above and transmits it to the operation unit 3.
Here, as the substrate processing, a thermal CVD reaction is generated by supplying a raw material gas to the substrate processing chamber in a state where the temperature is set to a predetermined temperature, and a film having a predetermined film thickness is formed on the film formation surface of the wafer 200. Forming an oxide film on the surface of the wafer 200 by supplying, for example, oxygen decomposed by an external combustion apparatus to the substrate processing chamber, and heating the wafer 200 in the substrate processing chamber And diffusion treatment for removing distortion of the crystal lattice.

(Log system configuration)
FIG. 4 is an explanatory diagram of a log system showing an event log logging function of the substrate processing apparatus 100. In FIG. 4, for convenience, the control unit 2 of the apparatus controller 1 is omitted, but the substrate processing system sub-controller and the substrate transport system sub-controller are connected to the operation unit 3 via the control unit 2. It shall be. Further, although the substrate processing system sub-controller and the substrate transport system controller are separated, they can be combined into one (the control unit 2).
In FIG. 4, an event log collection program as an event log collection means for collecting events of the substrate processing apparatus 100 including the host computer 18 and constructing an event log database DB is a fixed storage device such as the hard disk 11 or ROM. Stored in In the present embodiment, the event log collection program is executed by the CPU of the operation unit 3, but may be executed by the CPU of the control unit 2.

The event log collection program collects various events that occur in the substrate processing system. Event log collection starts when the apparatus controller 1 is started and ends when the substrate processing system is stopped.
Here, the substrate processing system refers to the entire substrate processing system including the substrate processing apparatus 100, the host computer 18, and the apparatus controller 1.
The “event” refers to a specific event of the substrate processing apparatus 100 generated by the operation of the user or the substrate processing apparatus 100, that is, the operation information of the user or the substrate processing apparatus 100 and the state of the components constituting the substrate processing apparatus 100. This is an event of the substrate processing apparatus 100 corresponding to a change in the component state and a change in the component state, that is, a process.
The logging function is a function for storing event log data (hereinafter referred to as an event log) in an event log file, that is, storing it so that it can be referred to later.

When the event log collection program is activated, an event log log collection command is issued from the CPU of the operation unit 3, and is sent from the operation unit 3 to the sub-controller of the substrate transport system and the sub-controller of the substrate processing system via the operation unit side memory 12. Sent.
The log collection command is also transmitted to the host computer 18 through the operation unit side memory 12.
Event logs in the host computer 18 collected by the host computer 18 are transmitted to the CPU of the operation unit 3 via the operation unit side memory 12.
The event log in the sub controller of the substrate transport system collected by the sub controller of the substrate transport system is transmitted to the CPU of the operation unit 3 via the operation unit side memory 12.
The event log in the substrate processing sub-controller collected by the substrate processing sub-controller is transmitted to the CPU of the operation unit 3 via the operation unit side memory 12, and the event log collected by the display control unit 14 is It is transmitted to the CPU of the operation unit 3.
The event log collected by issuing the log collection command by the event log collection program includes the event occurrence time, event occurrence part information (user name or device name), event classification information, and event name information indicating the event content. Are added and sequentially stored in the event log file in CSV format. This event log file constructs the database DB of the hard disk 11.

(Event log file)
FIG. 5 shows classification of events that occur in the substrate processing system.
The events of the substrate processing system are (1) state of the substrate processing apparatus 100 (State), (2) command input, (3) download, (4) file editing, (5) alarm status, (6) initials. / Classified by major items of shutdown, and further classified by sub-items.

  Hereinafter, the event shown in FIG. 5 and its contents will be described.

[Event classification]
(1) State of substrate processing apparatus (State):
(1-1) System: “Start”, “Stop”
The “start” event occurs when the device controller 1 is started, and the “stop” event occurs when the device controller 1 is stopped.
The “startup” event occurs when the device controller 1 is energized, and is transmitted from the operation unit side memory 12 to the CPU of the operation unit 3.
The “stop” event is generated by executing a stop command or a stop button on the operation screen of the device controller 1 or a lower screen of the operation screen.
The generation unit of these events is the device controller 1.
(1-2) Host computer control mode: “Host offline”, “Ampt Online”, “Local, Remote”
These events occur at the time of Host offline, Attempt Online, Local time, and Remote time.
These events are transmitted to the CPU of the operation unit 3 by the operation unit side memory 12.
The event generation unit is the host computer 18.
(1-3) Device status: “Not Ready”, “Ready”, “Run”
These events occur when the substrate processing apparatus 100 is Not Ready, Ready, or Run.
“Not Ready” means that the apparatus is not ready, “Ready” means ready, and “Run” means that a process recipe is being executed.
The event generation unit is the device controller 1.
(1-4) Pm status: “Power ON”, “Shut Down”, “Initial”, “Go Idle”, “Idle”, “Go Standby”, “Standby”, “Run”, “Go End”, “End” "," Go Abort "," Abort "," Go Reset "," Reset "
These events indicate the state of the process module, that is, the processing furnace 202.
The event “Power ON” is when the power is turned on, the event “ShutDown” is when the substrate processing apparatus 100 is stopped, the event “Initial” is initializing, the “Go Idle” is the transition to Idle, the “Go Standby” ”Event during transition to“ Standby ”,“ Run ”event during substrate processing,“ Go End ”during End, ie during substrate processing,“ Go Abort ”during transition to“ Abort ”,“ “Abort” occurs during recovery processing of each part of the substrate processing apparatus 100, “Go Reset” occurs during transition to “Reset”, and “Reset” occurs when the substrate processing apparatus 100 is reset.
These events are transmitted from the CPU of the operation unit 3 to the sub controller of the substrate processing system.
The event generation unit is the operation unit 3.
(1-5) Recipe: “Process recipe start”, “Reset recipe start”, “Idle recipe start”, “Abort recipe start”
These events occur when a process recipe starts, when a reset recipe starts, when an idle recipe starts, and when an abort recipe starts.
In the event of “process recipe start”, substrate processing is performed in the sequence order of the process recipe.
In the event of “reset recipe start”, the controller set in the sequence of the reset recipe sequence is reset.
The reset recipe is prepared not only for the apparatus controller 1 but also for all the controllers of the substrate processing system, and is reset for each controller.
The “idle recipe start” event occurs before the process recipe is executed, and controls the substrate processing system of the substrate processing apparatus 100 to an idle state.
In the event of “abort recipe start”, the recovery process of the apparatus and parts is performed in a predetermined procedure. The recovery procedure and items differ depending on the device and parts to be recovered.
(1-6) Recipe: “Process recipe normal end”, “Process recipe abnormal end”, “Reset recipe normal end”, “Idle recipe normal end during reset recipe abnormal end”, “Idle recipe abnormal end”, “Abort recipe normal end”, “Abort recipe abnormal end”, “Step start”, “Step end”
These events occur at the end of the event (1-8) and are transmitted from the CPU of the control unit 2 to the CPU of the operation unit 3.
(1-7) Scheduled maintenance: “reaching maintenance start value”, “recovering maintenance start value”, “reaching maintenance limit value”, “recovering maintenance limit value”
The event “maintenance start value reached” occurs, for example, when a predetermined amount of reaction by-product adheres to the partition wall of the substrate processing chamber, etc., when the trapped amount of the exhaust trap reaches a predetermined amount, The event “recovery of maintenance start value” occurs at the end of replacement of parts for maintenance. Maintenance targets for substrate processing systems include clogging due to reaction by-products adhering to the inner surface of the substrate processing chamber, piping and nozzles, clogging of the exhaust trap, wear of the rotating shaft and oscillating parts, poor lubrication, heater Deterioration, wear of moving parts of the actuator, and the like.
The “maintenance recovery value” is a value that defines these upper limits in use.
The “maintenance limit value” is a limit value that causes a failure when used, but is usually determined with a suitable margin.
The “maintenance value reached” event occurs when the upper limit value is reached, and the “maintenance value recovery” event occurs when the sensor or pickup detects that it has been recovered by the measurement after maintenance.
The event generation unit is a sensor that detects the maintenance amount of each unit described above, and is transmitted to the CPU through the substrate processing system sub-controller and the substrate transport system sub-controller.
Other sub-items include Cjob, Pjob, schedule maintenance, material, and N2 purge.

(2) Command input:
(2-1) System commands: “Abort”, “Stop”, “Reset”, “Idle”, “Pose”, “Resume”
These commands occur when a system command (instruction) is executed to the system, that is, the substrate processing system.
The “Abort” event is executed when the recovery process command (Abort) is executed, the “Stop” event is executed when the stop process command (Stop) is executed, and the “Reset” event is executed by the reset process command (Stop). When the “Reset” is executed, the “Idle” event is executed when the idle process execution command (Idle) is executed, and the “Pose” event is executed when the pause command (Pose) is executed. These events are generated when an instruction (Resume) relating to the retention of processing is executed.
These events are generated by the operation of the command key or the execution key after inputting the command.
The event generation unit is the monitor 10 of the operation unit 3.
(2-2) PM command: “Abort”, “Idle”, “Standby”, “Start”, “End”, “Reset”, “Manual”, “Hold”, “Release”, “Skip”, “Jump” "
These events are generated by executing commands in the device controller 1.
The “Abort” event is a standby command of the “Standby” event when the recovery process command (Abort) is executed, the “Idle” event is the idle process execution command (Idle). When (Standby) is executed, a “Start” event is executed when a start instruction is executed (Reset), an “End” event is executed when an end instruction (End) is executed, and a “Reset” event is executed. When the reset command (Reset) is executed, the “Munual” event is executed when the manual mode command (Mual) is executed, the “Hold” event is executed when the hold command (Hold) is executed, The “Release” event has a release command (Release) When it is line, when the events of "Skip" is a skip instruction (Skip) has been executed, the event of "Jump" when the instruction of the jump (Jump) has been executed, respectively generated.
Other sub-items include Pjob command, Cjob command, buzzer, carrier transfer, wafer transfer, and boat transfer. Each event of this command input occurs when an input is made by the key input device 13 on the operation screen or when a command button is pressed on the screen. Since the user performs input on the operation screen, the name of the user who performed the input is displayed on the event log screen (FIG. 7) described later when these commands are instructed.

(3) Download:
(3-1) Process recipe: “Download”
(3-2) ABORT recipe (recipe that defines the contents and procedure of recovery): “Download”
This is an event indicating whether a file such as a recipe or table stored in the hard disk 11 of the operation unit 3 has been downloaded (whether a download instruction has occurred). Not only (3-1) process recipes and (3-2) ABORT recipes as shown in FIG. 5, but also alarm recipes, reset recipes and the like are listed as sub-items.
Each event of this item is generated when the download button is pressed and when the execution button is pressed after selection on the screen. The download event is detected by the display control unit 14 and transmitted to the CPU of the operation unit 3. The event generation part is displayed by the user name in FIG. 7 described later, as in the case of the command event.

(4) File editing:
(4-1) Process recipe: “New creation”, “Edit”, “Delete”, “Copy”, “Copy (overwrite)”, “Move”, “Move (overwrite)”, “Rename”, “Attribute” Change"
(4-2): ABORT recipes “New creation”, “Edit”, “Delete”, “Copy”, “Copy (overwrite)”, “Move”, “Move (overwrite)”, “Rename”, “ Attribute change "
This is an event indicating whether a file such as a recipe or a table stored in the hard disk 11 of the operation unit 3 has been edited / created (whether an instruction to edit / create a file has occurred). In addition to (4-1) process recipe and (4-2) ABORT recipe as shown in FIG. 5, an alarm recipe, a reset recipe, and the like are listed as sub items.
Each event of this item occurs when the edit button on the operation screen is pressed. The file editing event is detected by the display control unit 14 and transmitted to the CPU of the operation unit 3. This event generation part is also displayed by the user name in FIG.

(5) Alarm status:
(5-1) Operation unit 3: “occurrence of failure”, “recovery from failure”, “confirmation of failure (execution of recovery action (reexecution))”, “confirmation of failure (execution of recovery action (continuation)) "," Check for failure (execute recovery action (suspend)) "," Check for failure (execute recovery action (recovery check)) "
These events are a failure of the substrate processing apparatus 100 by the operation unit 3, that is, when an alarm is generated, when a failure is recovered, when a failure is confirmed (recovery action (reexecution) is executed), when a failure is confirmed (recovery action (recovery action ( This error occurs when a failure is confirmed (execution of recovery action (suspend)) and when a failure is confirmed (execution of recovery action (recovery confirmation)).
In this case, the failure includes a failure of the operation unit 3 itself.
The event generation unit is the operation unit 3.
(5-2) Control unit 2: “occurrence of failure”, “recovery from failure”, “confirmation of failure (execution of recovery action (reexecution))”, “confirmation of failure (execution of recovery action (continuation)) "," Check for failure (execute recovery action (suspend)) "," Check for failure (execute recovery action (recovery check)) "
These events are a failure of the substrate processing apparatus 100 by the control unit 2, that is, when an alarm is generated, when a failure is recovered, when a failure is confirmed (recovery action (reexecution) is executed), when a failure is confirmed (recovery action (recovery action ( This error occurs when a failure is confirmed (execution of recovery action (suspend)) and when a failure is confirmed (execution of recovery action (recovery confirmation)).
These events are output from the control unit 2 to the CPU of the operation unit 3. The event generation unit is the control unit 2.
In addition, as shown in FIG. 5, other (5-3) temperature controller and (5-4) valve controller are included. These are similar events. In these cases, however, the occurrence of an event is referred to as PM in FIG.

(6) Initial / Shutdown:
(6-1) Initials: There are events such as “system (whole) initial start” and “system (whole) initial end”.
These events occur at the start of the system (whole) initial and at the end of the system (whole), respectively. The operation unit side memory 12, the substrate transport system sub-controller, the substrate processing system sub-controller, and the operation unit 3 Sent to the CPU.
The event generation unit is the operation unit 3.
(6-2) Shutdown (shutdown after setup): There are events such as “shutdown of the entire system”, “power off of the entire system”, and the like.
These events occur when the entire system is shut down or when the entire system is powered off, and are transmitted from the display control unit 14, the substrate transport system sub-controller, and the substrate processing system sub-controller to the CPU of the operation unit 3.
The event generation unit is the operation unit 3.

(Event log file structure)
6A shows an event log file by the event log collection program, FIG. 6B shows a table ID and table name of the event log file, and FIG. 6C shows a table structure of the event log file. .
In the present embodiment, the event log file name is EventLog. mdb, the table ID is YYYY-MM-DD, YYYY in the table name is the year, MM is the month, and DD is the day. The event log file table name is the event log information table name.

The table structure is a structure for a CSV format file. As shown in FIG. 6C, a number is automatically set by Pid (AutoNumber), and a date is set by Date. .
Date is generated for each event and added to the event log file. The unit of Date is date and time.
KeyWord indicates a major item name of an event such as a state (State) of the substrate processing apparatus 100, and Publisher indicates an issuer AAA, BBB, an apparatus name EQIPMENT, PM1, or the like. In the event, the number (No) of the CSV file is stored.
Event 1 stores event classification names following major items such as the control mode and system command of the host computer 18, and Events 2, 3, and 4 store event names such as Abort, Stop, and Edit, respectively. .

(Event log screen)
FIG. 7 shows an example of an event log screen displayed on the operation screen. In the figure, G1 is an operation screen, G2 is an event log screen, and D is a dialog. The event log is displayed in a scrollable dialog D cell.
The event log includes a table number by Event, a date when the event occurred by Date, a major item name such as command by KeyWord, an event classification name following a major item such as “Pm command notification” by Argument 1, AAA by Publisher, A user name such as BBB, a device name such as EQUIIPMENT, PM1, and the like are displayed, and an event such as [Not Ready] → [Ready] is displayed following Argment1. In the event log screen G2, various search buttons for searching the event log include, for example, “STATUS”, “COMMAND”, “DOWNLOAD”, “EDIT”, “ALARM”, “INIT / S DOWN”. Buttons, “previous search” button, “next search” button are displayed, and “ascending order” button, “descending order” as rearrangement buttons for rearranging event logs in ascending order or descending order "Button. The event log screen is provided with an extraction time setting window W for determining the extraction time.
As described above, the event log of all events includes analysis information of when (Date), who (Publisher), how (KeyWord), (Argent1), and how (Argent1, Argent2, ... n). . For this reason, it becomes easy to analyze who performed what operation in what event in one event log.
In the case of an event of “download”, data related to the event may be added in addition to the fact that the event has occurred with a time stamp, such as recording the name of the downloaded file and the type of alarm. . In this way, the cause and the file information to be analyzed increase, so that the analysis work time can be shortened, thereby shortening the time until the substrate processing system is restored.

(Example of failure analysis using the event log screen)
Hereinafter, an example of a failure analysis procedure using the event log screen will be described.
For example, it is assumed that a defective processing lot in which the in-plane distribution is non-uniform when the in-plane film thickness distribution of the substrate is measured is generated.
In the process recipe, a substrate processing sequence is set, and for each step of the sequence, a set value to be output to the sub controller of the substrate processing system, specifically, a set value of temperature for the temperature controller, an exhaust pipe opening / closing valve Are set, a set value for the flow control valve of the gas pipe, and a substrate processing time.
As a cause of occurrence of the defect processing lot,
[1] When processing is performed by a process recipe that does not conform to substrate processing or a process recipe in which some of the setting values are changed,
[2] If an old process recipe in memory is used,
[3] When troubles such as malfunctions occur in the opening / closing of the gas piping on / off valve and the flow control of the flow control valve, the concentration of the raw material gas supplied to the substrate processing chamber becomes unstable.
[4] When a malfunction occurs in the open / close valve of the exhaust pipe and the control of the pressure in the substrate processing chamber becomes unstable,
[5] If the exhaust trap or piping leaks or becomes clogged, and the control of the substrate processing chamber pressure fluctuates,
[6] When the temperature control of the substrate processing chamber by the heater becomes unstable due to the change of the heater over time,
[7] If an incorrect command is executed,
Etc. are considered.

(When estimating the cause of the defect processing lot as using the wrong process recipe)
[8] First, it is confirmed whether or not the set value of the process recipe in the control unit side memory 15 is suitable for the film forming process. In this case, the production information screen corresponding to the process recipe is opened, and the process recipe used for the current substrate processing is specified from the hard disk 11 based on the production history on the production information screen. Next, this process recipe corresponding to the process recipe in the control unit side memory 15 is opened on the event log screen, and it is determined whether or not the set value of the process recipe is suitable for the current substrate processing.
As a result of this determination, if at least a part of the set values is not compatible with the current substrate processing, the film forming processing has been performed by the wrong process recipe.
In such a case, how the wrong process recipe was used is identified.
[9] On the event log screen G2 (see FIG. 7), a “DOWN” button (download button) which is one of the search means is touched, and an event log before the failure occurrence time is displayed on the event log screen G2. Displayed on the dialog D, and thereafter, finds the event log closest to the failure occurrence time in the event log having the event of “download”.
[10] Next, in the event log in which the event log sub-item is displayed as “process recipe” and the event is “download”, the event log is searched for before the failure, preferably the most recent event log. The displayed process recipes are sequentially opened to search for a process recipe having the same setting conditions as the setting contents of the process recipe in the control unit side memory 15.
[11] When the corresponding process recipe is found, the cause of the defective processing lot is specified from the other components constituting the event log. In this case, since the user name is always displayed on the event log screen G2 as another component, a specific cause is specified by a situation report from the user.
[12] If the corresponding event log cannot be found in [10], it is estimated that the process recipe for the previous substrate processing was used for the current film formation. In such a case, on the event log screen G2, the “INST / S DOWN” button (initial / shutdown button) is touched, and events related to system restart such as “Pmc shutdown” and “system restart” are configured. Find the event log for the element. If the corresponding event log cannot be found, the cause of the defective processing lot is that the process recipe prior to the current film formation process was used, or that a newly created recipe or a recipe used in the past was edited It can be estimated that the recipe was used.
[13] When it is estimated that the cause of the defective processing lot is caused by editing or newly creating a recipe, the “EDIT” button, which is one of the search means, is touched on the event log screen G2.
Then, an event log related to editing is displayed in the dialog D. From dialog D, sub-item is “process recipe”, events are “create new”, “edit”, “delete”, “copy”, “copy (overwrite)”, “move”, “move (overwrite)” ”Is searched for a log file at the time before the occurrence of the failure after the film forming process is started.
[14] When the corresponding event log is found in [13], the contents of the process recipe displayed in the event log are opened, and if the process recipe setting conditions in the control unit side memory 15 are the same, the process recipe Editing causes a scrap lot.
[15] If a process recipe having the same content as the process recipe setting condition in the control unit side memory 15 cannot be found in [14], the process returns to [2] to search for a process recipe for substrate processing before the current film forming process. The setting condition is compared with the setting condition of the control unit side memory 15. When the setting conditions are the same, it can be estimated that the previous process recipe was used. Next, the cause is specified from the explanation of the circumstances of the user.
When the previous process recipe is not used as the process recipe of the current film forming process, the “STATUS” button as the search means is touched on the event log screen G2. The event log related to STATUS (substrate processing apparatus state) is displayed in the dialog D of the event log screen G2. From the event log before the occurrence of the failure in the dialog D, “maintenance start value reached”, “maintenance limit” Search for the event “reaching value”.
In [16] and [15], when a corresponding recipe is found, the same event log for “reaching maintenance start value” and “reaching maintenance limit value”, “recovery of maintenance start value”, “ Search the event log for the event "Recovery maintenance limit value". If the corresponding event log cannot be found, it is because the fault has not been recovered.

As described above, according to the log system according to the present embodiment, log data other than recipe RUN during recipe RUN, that is, command operation, download or edit / creation of process recipe / tables, and history of component status It becomes possible to elucidate the cause of the failure. In addition, since the failure can be specified on the event log screen G2 on the operation screen G1, the cause of the failure can be specified accurately in a relatively short time. Therefore, even when a failure occurs in the substrate processing system, the system can be restored in a short time.
In addition, all event logs from the start to stop of the substrate processing system are collected, and the time series and the device that generated the event log can also be specified. A reproduction test can be performed to reproduce, and the cause of the failure can be identified by this reproduction test.

[Appendix]
Hereinafter, preferred modes according to the present embodiment will be additionally described.
[Appendix 1]
A substrate processing apparatus comprising a controller having a control unit for controlling a substrate to be processed and an operation unit having an operation screen for giving an instruction to the control unit, wherein the controller includes the operation unit Storage means for collecting and storing command operations and file editing operations such as recipes / tables, and collecting and storing status changes of the substrate processing apparatus and parts constituting the substrate processing apparatus, and the stored Display means for displaying information on the operation screen, file editing operations such as the command operation and the recipe / tables, and status changes of the components constituting the substrate processing apparatus and the substrate processing apparatus, A substrate processing apparatus configured to be displayed on the same screen together with the date and time of occurrence, the subject that has occurred, and the instructions that have been generated.
Here, the change in the status of the component refers to, for example, a change in the status of the substrate processing chamber due to a reaction by-product or a change in the component over time.
When command operations and recipe table editing operations are stored in the storage means and displayed on the operation screen, when a failure occurs, the cause of the failure can be identified from its history, and the state change of the component is stored in the storage means. When the failure occurs, the cause of the failure can be identified from the history when the failure occurs.

[Appendix 2]
Collecting means for collecting various event logs related to operation operations from starting to stopping of the substrate processing apparatus, display means for displaying the event logs collected by the collecting means on the operation screen, and A substrate processing apparatus configured to analyze an operation history related to the driving operation from the event log displayed on the operation screen.
[Appendix 3]
In Supplementary Note 2, each of the event logs includes classification information for each event type, event information indicating the content of the event, event occurrence time information indicating an event occurrence time, and event generation unit information indicating an event generation unit The substrate processing apparatus is configured such that the search unit searches the information as a searcher.
[Appendix 4]
The substrate processing apparatus according to claim 3, wherein the searcher is displayed on the screen.
[Appendix 5]
The substrate processing apparatus according to appendix 3, wherein the event log includes user information.
[Appendix 6]
A substrate processing apparatus, wherein the event information is recipe / table download information or editing information.
[Appendix 7]
In a substrate processing method for controlling substrate processing by a controller having a control unit for controlling the processing of a substrate and an operation unit having an operation screen for giving an instruction to the control unit, the controller Information stored in the storage means for collecting command operations and recipe / table editing operations in the operation unit and grasping and storing status changes of the substrate processing apparatus and parts constituting the substrate processing apparatus is displayed on the operation screen. A board processing method that displays and analyzes the history of command operations, editing operations, and component status changes.

  The present invention can be applied not only to a semiconductor manufacturing apparatus but also to a substrate processing apparatus that processes a glass substrate such as an LCD apparatus. The film formation process includes, for example, a process for forming CVD, PVD, an oxide film, a nitride film, a process for forming a film containing metal, and the like. In this embodiment, the vertical apparatus is described, but the present invention is similarly applied to a single-wafer type substrate processing apparatus.

1 is a plan sectional view of a substrate processing apparatus according to an embodiment of the present invention. It is a sectional side view of the substrate processing apparatus concerning one embodiment of the present invention. It is a block diagram which shows the function of the substrate processing apparatus which concerns on one embodiment of this invention. It is a block diagram of the log system concerning one embodiment of the present invention. It is a figure which shows the classification of the event log file which concerns on one embodiment of this invention. 2A and 2B show log collection files according to an embodiment of the present invention, in which FIG. 1A shows a file name, FIG. 2B shows a file structure, and FIG. 2C shows a table structure. It is a figure which shows an example of the event log display screen which concerns on one embodiment of this invention.

Explanation of symbols

2 Control unit 3 Operation unit 10 Monitor (display unit)
11 Hard disk DB database

Claims (7)

A substrate processing apparatus comprising a controller having a control unit that controls a substrate to be processed, and an operation unit that includes an operation screen for giving an instruction to the control unit,
The controller is
Collecting means for collecting various events including events indicating an apparatus state, a command, a download, a file edit, an alarm state, and an initial / shutdown related to the operation from start to stop of the substrate processing apparatus;
An event indicating the command related to the command operation in the operation unit, an event indicating the file editing related to a file editing operation such as a recipe / table, an event indicating the download of the file, and an alarm state of parts constituting the substrate processing apparatus storage means for collecting and storing the various events, including events indicating initial / shutdown indicating the start and stop of the event and said controller,
Display means for displaying log information of the various events stored in the storage means on the operation screen;
One or more selected from the various events including at least the event related to the command operation, the event related to the file editing operation such as the recipe / tables, and the event related to the alarm state of the parts constituting the substrate processing apparatus. A substrate processing apparatus configured to display an event on the operation screen together with information indicating at least the date and time when the event occurred, the subject that generated the event, and the instruction that generated the event. A substrate processing apparatus comprising a controller having a control unit that controls a substrate to be processed, and an operation unit that includes an operation screen for giving an instruction to the control unit,
The controller is
Collecting means for collecting various events including events indicating an apparatus state, a command, a download, a file edit, an alarm state, and an initial / shutdown related to the operation from start to stop of the substrate processing apparatus;
An event indicating the command related to the command operation in the operation unit, an event indicating the file editing related to a file editing operation such as a recipe / table, an event indicating the download of the file, and an alarm state of parts constituting the substrate processing apparatus anda storage means for collecting and storing the various events, including events indicating initial / shutdown indicating the start and stop of the event and said controller,
Each of the events selected from the various events including at least the event related to the command operation, the event related to the file editing operation of the recipe / tables, and the event related to the alarm state of the parts constituting the substrate processing apparatus. A substrate processing apparatus configured to add at least the date and time when the event occurred, the subject that generated the event, and the instruction that generated the event.   The substrate processing apparatus according to claim 1, wherein the operation screen includes means for rearranging log information of the event.   The substrate processing apparatus according to claim 1, wherein the operation screen includes search means for narrowing down log information of the event by type or time of occurrence. A data collection method for a substrate processing apparatus comprising a controller having a control unit for controlling the processing of a substrate and an operation unit having an operation screen for giving an instruction to the control unit,
Collect various events related to the operation from start to stop of the substrate processing apparatus, including events indicating device status, command, download, file editing, alarm status and initial / shutdown,
Collected events indicating commands related to command operations in the operation unit, events indicating file editing related to file editing operations such as recipes / tables, events indicating downloading of the files, and parts constituting the substrate processing apparatus The log data of the event selected from the various events including the event related to the alarm state and the event indicating the initial / shutdown indicating start and stop of the controller includes the event occurrence time, the event occurrence unit information, A data collection method for a substrate processing apparatus, wherein event classification information and event name information indicating the contents of the event are added and stored. An event collection program that is executed by a substrate processing apparatus that includes a controller having a control unit that controls a substrate to be processed and an operation unit that includes an operation screen for giving an instruction to the control unit,
Collect various events related to the operation from start to stop of the substrate processing apparatus, including events indicating device status, command, download, file editing, alarm status and initial / shutdown,
An event indicating the command related to the command operation in the operation unit, an event indicating the file editing related to a file editing operation such as a recipe / table, an event indicating the download of the file, and an alarm state of parts constituting the substrate processing apparatus wherein collects various events and stores that includes an event indicating an initial / shutdown indicating the start and stop event and said controller,
When storing the event,
The event is selected for each of the events selected from the various events including an event related to the command operation, an event related to a file editing operation such as the recipe / tables, and an event related to an alarm state of a component constituting the substrate processing apparatus. An event collection program to which information indicating the date and time of occurrence, the subject that generated the event, or the instruction that generated the event is added. A display method for a substrate processing apparatus comprising a controller having a control unit that controls a substrate to be processed and an operation unit having an operation screen for giving an instruction to the control unit,
Collect various events related to the operation from start to stop of the substrate processing apparatus, including events indicating device status, command, download, file editing, alarm status and initial / shutdown,
At least an event indicating the command related to the command operation in the operation unit, an event indicating the file editing related to a file editing operation such as a recipe / table, an event indicating the download of the file, and an alarm state of components constituting the substrate processing apparatus Collecting and storing the various events including the event related to the event and the event indicating the initial / shutdown indicating start and stop of the controller;
When displaying the event on the operation screen,
Each of the events selected from the various events including at least the event related to the command operation, the event related to the file editing operation of the recipe / tables, and the event related to the alarm state of the parts constituting the substrate processing apparatus. The display method of the substrate processing apparatus configured to display on the operation screen together with information indicating the date and time when the event occurred, the subject that generated the event, and the instruction that generated the event.

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