JP5115004B2 - Chamfering device, chamfering method and sintered magnet - Google Patents

Chamfering device, chamfering method and sintered magnet Download PDF

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JP5115004B2
JP5115004B2 JP2007091246A JP2007091246A JP5115004B2 JP 5115004 B2 JP5115004 B2 JP 5115004B2 JP 2007091246 A JP2007091246 A JP 2007091246A JP 2007091246 A JP2007091246 A JP 2007091246A JP 5115004 B2 JP5115004 B2 JP 5115004B2
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sintered magnet
grindstone
outer peripheral
rotating
chamfering
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JP2008246627A (en
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美津男 田中
俊明 佐々木
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Hitachi Metals Ltd
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Description

この発明は、面取り装置、面取り方法および焼結磁石に関し、より特定的には、焼結磁石の円形の外周縁を面取りする面取り装置および面取り方法、ならびに外周縁が面取りされた焼結磁石に関する。   The present invention relates to a chamfering device, a chamfering method, and a sintered magnet, and more particularly to a chamfering device and a chamfering method for chamfering a circular outer peripheral edge of a sintered magnet, and a sintered magnet having a chamfered outer peripheral edge.

一般に、モータ等に用いられる円筒状の永久磁石の外周縁には、表面処理の際に表面処理膜を容易に形成するためや、モータの組み立ての際に欠けを防止するために、面取り面が形成される。永久磁石の外周縁を面取りする装置として、カップ型の砥石のテーパーする内周面に永久磁石の外周縁を圧接させる面取り装置が知られている。しかし、このような面取り装置では、砥石の内周面の特定箇所に永久磁石が接するので、砥石の内周面が線状に偏磨耗し、砥石の寿命が短いという問題があった。   Generally, a chamfered surface is provided on the outer peripheral edge of a cylindrical permanent magnet used in a motor or the like in order to easily form a surface treatment film during surface treatment or to prevent chipping during motor assembly. It is formed. As a device for chamfering the outer peripheral edge of a permanent magnet, a chamfering device is known in which the outer peripheral edge of a permanent magnet is pressed against the tapered inner peripheral surface of a cup-type grindstone. However, in such a chamfering device, since the permanent magnet is in contact with a specific portion of the inner peripheral surface of the grindstone, there is a problem that the inner peripheral surface of the grindstone is unevenly worn linearly and the life of the grindstone is short.

このような問題を解決するためにたとえば特許文献1には、一方の回転軸が他方の回転軸に対して傾くように配置される円筒状のワークと円柱状の砥石とをそれぞれ回転させつつ、砥石を軸方向に往復移動させる面取り装置が開示されている。特許文献1の技術によれば、砥石の偏磨耗を抑えることができ、砥石の寿命を延ばすことができる。特許文献1の面取り装置では、ワークの外周縁の周速度および砥石の外周面の周速度よりも大きい速度で砥石を軸方向に移動させることは構造上困難であるので、ワークの面取り面に略周方向に延びる研磨目が形成されると考えられる。
特開2001−179580号公報
In order to solve such a problem, for example, in Patent Document 1, while rotating a cylindrical workpiece and a columnar grindstone arranged so that one rotating shaft is inclined with respect to the other rotating shaft, A chamfering device for reciprocating a grindstone in the axial direction is disclosed. According to the technique of Patent Document 1, uneven wear of the grindstone can be suppressed, and the life of the grindstone can be extended. In the chamfering device of Patent Document 1, it is structurally difficult to move the grindstone in the axial direction at a speed larger than the peripheral speed of the outer peripheral edge of the work and the peripheral speed of the outer peripheral face of the grindstone. It is considered that polishing eyes extending in the circumferential direction are formed.
JP 2001-179580 A

通常、面取りされたワークには、バリを取り除くとともに角部を丸めるためのバレル処理が施される。しかし、面取り面に周方向に延びる長い研磨目が形成されたワークでは、バレル処理の際に面取り面およびその近傍が長い研磨目に沿って大きく欠けやすいという問題があった。この問題は、ワークとしてたとえば希土類焼結磁石等の脆い焼結磁石を用いる場合に顕著であった。   Normally, a chamfered workpiece is subjected to barrel processing for removing burrs and rounding corners. However, in a work in which long cuffs extending in the circumferential direction are formed on the chamfered surface, there is a problem that the chamfered surface and the vicinity thereof are easily chipped along the long crevice during barrel treatment. This problem is remarkable when a brittle sintered magnet such as a rare earth sintered magnet is used as the workpiece.

それゆえに、この発明の主たる目的は、砥石の寿命を延ばすことができかつ面取り面に短い研磨目を形成できる、面取り装置および面取り方法を提供することである。
この発明の他の目的は、欠けにくい焼結磁石を提供することである。
Therefore, a main object of the present invention is to provide a chamfering apparatus and a chamfering method which can extend the life of a grindstone and can form a short polishing mark on a chamfered surface.
Another object of the present invention is to provide a sintered magnet that is not easily chipped.

上述の目的を達成するために、請求項1に記載の面取り装置は、円形の外周縁を有する筒状または柱状の焼結磁石の面取り装置であって、円柱状の砥石、前記焼結磁石を周方向に回転させる第1回転手段、前記砥石の外周面の周速度が前記焼結磁石の外周縁の周速度よりも大きくなるように前記砥石を周方向に回転させる第2回転手段、前記焼結磁石と前記砥石とを一方の回転軸が他方の回転軸に対して90°傾きかつ一方の回転軸が他方の回転軸に交わらないように配置する配置手段、前記焼結磁石の外周縁が前記砥石の外周面に接するように前記焼結磁石と前記砥石との少なくともいずれか一方を他方側に移動させる第1移動手段、および前記焼結磁石の外周縁が前記砥石の外周面上を往復移動するように前記焼結磁石と前記砥石との少なくともいずれか一方を前記砥石の軸方向に移動させる第2移動手段を備え、前記配置手段は、前記第1回転手段によって回転される回転部および前記回転部とともに回転可能な爪を含み、前記爪で前記焼結磁石の外周面を挟むことによって、前記回転部と同軸上にかつ前記焼結磁石の端面が真下を向くように前記焼結磁石を保持するIn order to achieve the above object, a chamfering device according to claim 1 is a chamfering device for a cylindrical or columnar sintered magnet having a circular outer peripheral edge, and includes a cylindrical grindstone and the sintered magnet. First rotating means for rotating in the circumferential direction; second rotating means for rotating the grindstone in the circumferential direction so that the peripheral speed of the outer peripheral surface of the grindstone is larger than the peripheral speed of the outer peripheral edge of the sintered magnet; Arrangement means for arranging the magnet and the grindstone so that one rotation axis is inclined by 90 ° with respect to the other rotation axis and one rotation axis does not cross the other rotation axis, and the outer peripheral edge of the sintered magnet is First moving means for moving at least one of the sintered magnet and the grindstone to the other side so as to be in contact with the outer circumferential surface of the grindstone, and the outer peripheral edge of the sintered magnet reciprocate on the outer circumferential surface of the grindstone A small amount of the sintered magnet and the grindstone move so as to move. Ku comprising a second moving means for moving either the axial direction of the grinding wheel even, said positioning means includes a rotatable pawl with the rotating portion and the rotating portion which is rotated by said first rotating means, said By sandwiching the outer peripheral surface of the sintered magnet with claws, the sintered magnet is held so as to be coaxial with the rotating portion and so that the end surface of the sintered magnet faces directly below .

請求項2に記載の面取り方法は、筒状または柱状の焼結磁石の円形の外周縁を面取りする面取り方法であって、前記焼結磁石と円柱状の砥石とを一方の回転軸が他方の回転軸に対して90°傾きかつ一方の回転軸が他方の回転軸に交わらないように配置する工程、前記砥石の外周面の周速度が前記焼結磁石の外周縁の周速度よりも大きくなるように前記焼結磁石と前記砥石とをそれぞれ周方向に回転させる工程、および前記焼結磁石の外周縁が前記砥石の外周面に接するように前記焼結磁石と前記砥石との少なくともいずれか一方を他方側に移動させつつ前記焼結磁石の外周縁が前記砥石の外周面上を往復移動するように前記焼結磁石と前記砥石との少なくともいずれか一方を前記砥石の軸方向に移動させる工程を備え、前記配置する工程では、回転部とともに回転可能な爪で前記焼結磁石の外周面を挟むことによって、前記回転部と同軸上にかつ前記焼結磁石の端面が真下を向くように前記焼結磁石を保持し、前記回転させる工程では、前記回転部を周方向に回転させることによって、前記爪で保持された前記焼結磁石を周方向に回転させるThe chamfering method according to claim 2 is a chamfering method for chamfering a circular outer peripheral edge of a cylindrical or columnar sintered magnet, wherein one of the rotating shafts of the sintered magnet and the cylindrical grindstone is the other. The step of disposing 90 ° with respect to the rotation axis and one rotation axis not intersecting the other rotation axis, the peripheral speed of the outer peripheral surface of the grindstone is larger than the peripheral speed of the outer peripheral edge of the sintered magnet Rotating the sintered magnet and the grindstone in the circumferential direction as described above, and at least one of the sintered magnet and the grindstone so that the outer peripheral edge of the sintered magnet is in contact with the outer peripheral surface of the grindstone Moving at least one of the sintered magnet and the grindstone in the axial direction of the grindstone so that the outer peripheral edge of the sintered magnet reciprocates on the outer peripheral surface of the grindstone while moving in equipped with, said arranging step By sandwiching the outer peripheral surface of the sintered magnet with a claw that can rotate together with the rotating part, the sintered magnet is held coaxially with the rotating part and so that the end face of the sintered magnet faces directly below, In the rotating step, the sintered magnet held by the claw is rotated in the circumferential direction by rotating the rotating portion in the circumferential direction .

請求項1に記載の面取り装置では、焼結磁石と砥石とを、一方の回転軸が他方の回転軸に対して90°傾きかつ一方の回転軸が他方の回転軸に交わらないように配置し、砥石の外周面の周速度が焼結磁石の外周縁の周速度よりも大きくなるようにそれぞれ回転させる。そして、外周縁が外周面に接するように焼結磁石と砥石との少なくともいずれか一方を他方側に移動させつつ外周縁が外周面上を往復移動するように焼結磁石と砥石との少なくともいずれか一方を砥石の軸方向に移動させる。このように焼結磁石と砥石とを配置して相対的に移動させることによって、砥石の外周面を有効に利用して焼結磁石の外周縁を面取りでき、砥石の寿命を延ばすことができる。また、このように焼結磁石と砥石とを配置して外周面の周速度が外周縁の周速度よりも大きくなるようにそれぞれ回転させることによって、外周縁を焼結磁石の略径方向に研削できる。これによって、周方向に交わる方向に延びる短い研磨目を焼結磁石の面取り面に形成できる。請求項2に記載の面取り方法についても同様である。   In the chamfering apparatus according to claim 1, the sintered magnet and the grindstone are arranged such that one rotation axis is inclined by 90 ° with respect to the other rotation axis and one rotation axis does not intersect the other rotation axis. The peripheral speed of the outer peripheral surface of the grindstone is rotated so as to be larger than the peripheral speed of the outer peripheral edge of the sintered magnet. Then, at least one of the sintered magnet and the grindstone so that the outer peripheral edge reciprocates on the outer peripheral surface while moving at least one of the sintered magnet and the grindstone to the other side so that the outer peripheral edge is in contact with the outer peripheral surface. One of them is moved in the axial direction of the grindstone. By disposing and relatively moving the sintered magnet and the grindstone in this way, the outer peripheral surface of the sintered magnet can be chamfered effectively using the outer peripheral surface of the grindstone, and the life of the grindstone can be extended. In addition, by arranging the sintered magnet and the grindstone in this way and rotating them so that the peripheral speed of the outer peripheral surface is larger than the peripheral speed of the outer peripheral edge, the outer peripheral edge is ground in the substantially radial direction of the sintered magnet. it can. As a result, it is possible to form a short polishing line extending in the circumferential direction on the chamfered surface of the sintered magnet. The same applies to the chamfering method according to claim 2.

この発明によれば、砥石の寿命を延ばすことができかつ焼結磁石の面取り面に短い研磨目を形成できる。
また、欠けにくい焼結磁石が得られる。
According to the present invention, it is possible to extend the life of the grindstone and to form short polishing marks on the chamfered surface of the sintered magnet.
Moreover, a sintered magnet that is difficult to chip can be obtained.

以下、図面を参照して、この発明の実施の形態について説明する。
図1を参照して、面取り装置10は、焼結磁石100の円形の外周縁102{図2(a)参照}を面取りすることによって、面取り面104を有する焼結磁石100a{図2(b)参照}を得るために用いられる。円筒状の焼結磁石100はたとえばNd−Fe−B磁石等の希土類焼結磁石であり、焼結磁石100を面取りすることによって得られる焼結磁石100aはたとえばモータ等に用いられる。
Embodiments of the present invention will be described below with reference to the drawings.
Referring to FIG. 1, the chamfering device 10 chamfers the circular outer peripheral edge 102 of the sintered magnet 100 {see FIG. 2 (a)}, whereby the sintered magnet 100a having the chamfered surface 104 {FIG. 2 (b). ) Reference}. Cylindrical sintered magnet 100 is a rare earth sintered magnet such as an Nd-Fe-B magnet, and sintered magnet 100a obtained by chamfering sintered magnet 100 is used for a motor or the like, for example.

図1に示すように、面取り装置10は、保持ユニット12および砥石ユニット14を含む。保持ユニット12は、基台16、基台16上に設けられるロボットアーム18、およびロボットアーム18に設けられるロボットハンド20を含む。   As shown in FIG. 1, the chamfering device 10 includes a holding unit 12 and a grindstone unit 14. The holding unit 12 includes a base 16, a robot arm 18 provided on the base 16, and a robot hand 20 provided on the robot arm 18.

ロボットアーム18は、基台16上に設けられる支持部21、支持部21上に設けられる回転部22、回転部22に連結される第1アーム24、第1アーム24に連結される第2アーム26、および第2アーム26に連結される第3アーム28を含む。
支持部21は、回転部22を鉛直方向(矢印A方向)に延びる回転軸を中心として回転させるためのモータ30を含む。
The robot arm 18 includes a support unit 21 provided on the base 16, a rotation unit 22 provided on the support unit 21, a first arm 24 coupled to the rotation unit 22, and a second arm coupled to the first arm 24. 26 and a third arm 28 coupled to the second arm 26.
The support unit 21 includes a motor 30 for rotating the rotating unit 22 around a rotation axis extending in the vertical direction (arrow A direction).

第1アーム24は、図1の紙面に直交する方向(水平方向の一方向)に延びる連結シャフト31aを介して回転部22に連結され、図示しないサーボモータによって連結シャフト31aを支点として回転部22に対して揺動される。第2アーム26は、連結シャフト31aに平行な連結シャフト31bを介して第1アーム24に連結され、図示しないサーボモータによって連結シャフト31bを支点として第1アーム24に対して揺動される。第3アーム28は、連結シャフト31aおよび31bに平行な連結シャフト31cを介して第2アーム26に連結され、連結シャフト31cを支点として図示しないサーボモータによって第2アーム26に対して揺動される。このような第1アーム24、第2アーム26および第3アーム28の揺動によって、ロボットハンド20ひいてはロボットハンド20に保持される焼結磁石100が矢印A方向および矢印B方向(水平方向の他の方向)の少なくともいずれか一方に移動される。つまり、ロボットアーム18は、第1アーム24、第2アーム26および第3アーム28の3つのアームの直線補間動作を実行可能に構成され、ロボットハンド20(焼結磁石100)を矢印A方向および矢印B方向の少なくともいずれか一方に移動させる。   The first arm 24 is connected to the rotating portion 22 via a connecting shaft 31a extending in a direction orthogonal to the paper surface of FIG. 1 (one direction in the horizontal direction), and the rotating portion 22 with the connecting shaft 31a as a fulcrum by a servo motor (not shown). Is swung with respect to. The second arm 26 is connected to the first arm 24 via a connecting shaft 31b parallel to the connecting shaft 31a, and is swung with respect to the first arm 24 about the connecting shaft 31b by a servo motor (not shown). The third arm 28 is connected to the second arm 26 via a connecting shaft 31c parallel to the connecting shafts 31a and 31b, and is swung relative to the second arm 26 by a servo motor (not shown) with the connecting shaft 31c as a fulcrum. . By such swinging of the first arm 24, the second arm 26, and the third arm 28, the robot hand 20 and consequently the sintered magnet 100 held by the robot hand 20 are moved in the directions indicated by arrows A and B (other than the horizontal direction). In at least one of the directions). That is, the robot arm 18 is configured to be able to perform linear interpolation operation of the three arms of the first arm 24, the second arm 26, and the third arm 28, and moves the robot hand 20 (sintered magnet 100) in the direction of arrow A and Move in at least one of the directions of arrow B.

第3アーム28は、第2アーム26に連結される駆動部32、および駆動部32に回転可能に設けられる柱状の回転部34を含む。回転部34の一端は駆動部32内に設けられるモータ36に連結される。また、回転部34の他端にはワーク100を保持するロボットハンド20が設けられる。ロボットハンド20は、3本の爪38を有するいわゆる3本爪型に構成される。ロボットハンド20は、3本の爪38で焼結磁石100の外周面106を挟むことによって、焼結磁石100を回転部34と同軸上に保持する。   The third arm 28 includes a drive unit 32 coupled to the second arm 26 and a columnar rotation unit 34 that is rotatably provided to the drive unit 32. One end of the rotating unit 34 is connected to a motor 36 provided in the driving unit 32. A robot hand 20 that holds the workpiece 100 is provided at the other end of the rotating unit 34. The robot hand 20 is configured in a so-called three-claw shape having three claws 38. The robot hand 20 holds the sintered magnet 100 coaxially with the rotating portion 34 by sandwiching the outer peripheral surface 106 of the sintered magnet 100 with the three claws 38.

このような保持ユニット12では、焼結磁石100の端面108{図2(a)参照}が真下を向くように焼結磁石100を保持する。そして、その状態でモータ36を駆動させることによって、矢印A方向に延びる回転軸S1(一点鎖線で示す)を中心として回転部34ひいては焼結磁石100を周方向(矢印C1方向:図4参照)に回転させる。   In such a holding unit 12, the sintered magnet 100 is held so that the end face 108 of the sintered magnet 100 {see FIG. 2 (a)} faces directly below. Then, by driving the motor 36 in this state, the rotating part 34 and the sintered magnet 100 are circumferentially arranged around the rotation axis S1 (indicated by the alternate long and short dash line) extending in the arrow A direction (arrow C1 direction: see FIG. 4). Rotate to

砥石ユニット14は、基台40、基台40上に設けられるL字状の板状部材42、板状部材42に取り付けられるモータ44、基台40上に設けられるスピンドルユニット46、およびスピンドルユニット46に取り付けられる砥石48を含む。   The grindstone unit 14 includes a base 40, an L-shaped plate-like member 42 provided on the base 40, a motor 44 attached to the plate-like member 42, a spindle unit 46 provided on the base 40, and a spindle unit 46. Including a grindstone 48 attached to the.

スピンドルユニット46は、矢印B方向に延びるスピンドルシャフト50、およびスピンドルシャフト50を回転可能に支持する支持部52を含む。スピンドルシャフト50の一端はモータ44に連結される。また、スピンドルシャフト50の他端には砥石48が取り付けられる。砥石48は、矢印B方向に延びる円柱状に形成される。砥石48としては、超硬合金からなるベースにダイヤモンド砥粒を電着したもの等が用いられる。   The spindle unit 46 includes a spindle shaft 50 extending in the direction of arrow B, and a support portion 52 that rotatably supports the spindle shaft 50. One end of the spindle shaft 50 is connected to the motor 44. A grindstone 48 is attached to the other end of the spindle shaft 50. The grindstone 48 is formed in a cylindrical shape extending in the arrow B direction. As the grindstone 48, a base made of a cemented carbide alloy with diamond abrasive grains electrodeposited or the like is used.

このような砥石ユニット14では、モータ44を駆動させることによって、矢印B方向に延びる回転軸S2(一点鎖線で示す)を中心としてスピンドルシャフト50ひいては砥石48を周方向(矢印C2方向:図4参照)に回転させる。   In such a grindstone unit 14, by driving the motor 44, the spindle shaft 50 and the grindstone 48 are moved in the circumferential direction (arrow C2 direction: see FIG. 4) around a rotation axis S2 (shown by a one-dot chain line) extending in the arrow B direction. ) To rotate.

この実施形態では、モータ36が第1回転手段に相当し、モータ44が第2回転手段に相当し、ロボットアーム18が第1および第2移動手段として機能する。また、配置手段は、ロボットアーム18、ロボットハンド20およびスピンドルユニット46を含む。   In this embodiment, the motor 36 corresponds to first rotating means, the motor 44 corresponds to second rotating means, and the robot arm 18 functions as first and second moving means. The arrangement means includes the robot arm 18, the robot hand 20, and the spindle unit 46.

ついで、図1、図3および図4を参照して、面取り装置10の主要動作について説明する。
まず、保持ユニット12によってベルトコンベア等から焼結磁石100が取得される。そして、図1に示すように、取得された焼結磁石100が、保持ユニット12によってその回転軸S1が砥石48の回転軸S2に対して90°傾きかつその回転軸S1が砥石48の回転軸S2に交わらないように保持される(図4参照)。つまり、面取り装置10では、焼結磁石100の回転軸S1が砥石48の回転軸S2に対して90°傾きかつ焼結磁石100の回転軸S1が砥石48の回転軸S2に交わらないように焼結磁石100と砥石48とが配置される。
Next, the main operation of the chamfering apparatus 10 will be described with reference to FIGS. 1, 3, and 4.
First, the sintered magnet 100 is acquired from the belt conveyor or the like by the holding unit 12. Then, as shown in FIG. 1, the obtained sintered magnet 100 is rotated 90 ° with respect to the rotation axis S2 of the grindstone 48 by the holding unit 12 and the rotation axis S1 is the rotation axis of the grindstone 48. It is held so as not to cross S2 (see FIG. 4). That is, in the chamfering apparatus 10, the sintered magnet 100 is rotated so that the rotation axis S 1 of the sintered magnet 100 is inclined by 90 ° with respect to the rotation axis S 2 of the grindstone 48 and the rotation axis S 1 of the sintered magnet 100 does not intersect the rotation axis S 2 of the grindstone 48. A magnet 100 and a grindstone 48 are arranged.

つづいて、モータ36を駆動させてロボットハンド20ひいては焼結磁石100を矢印C1方向(図4参照)に回転させるとともにモータ44を駆動させて砥石48を矢印C2方向(図4参照)に回転させる。面取り装置10では、砥石48の外周面48aの周速度が焼結磁石100の外周縁102の周速度の40倍以上になるようにモータ36が焼結磁石100を回転させかつモータ44が砥石48を回転させる。   Subsequently, the motor 36 is driven to rotate the robot hand 20 and thus the sintered magnet 100 in the direction of arrow C1 (see FIG. 4), and the motor 44 is driven to rotate the grindstone 48 in the direction of arrow C2 (see FIG. 4). . In the chamfering device 10, the motor 36 rotates the sintered magnet 100 and the motor 44 rotates the grindstone 48 so that the peripheral speed of the outer peripheral surface 48 a of the grindstone 48 is 40 times or more the peripheral speed of the outer peripheral edge 102 of the sintered magnet 100. Rotate.

そして、焼結磁石100を矢印A方向(焼結磁石100の軸方向)かつ砥石48側(ここでは下側)に移動させる(送る)ように、ロボットアーム18が直線補間動作を実行する。これによって、図3および図4に示すように焼結磁石100の外周縁102が砥石48の外周面48aに接する。その後、焼結磁石100を矢印A方向かつ砥石48側に移動させつつ矢印B方向(砥石48の軸方向)に往復移動させるように、ロボットアーム18が直線補間動作を実行する。これによって、外周縁102が外周面48aに圧接しつつ外周縁102が外周面48a上で往復移動し、外周縁102が面取りされる。   Then, the robot arm 18 performs a linear interpolation operation so that the sintered magnet 100 is moved (sent) in the direction of arrow A (the axial direction of the sintered magnet 100) and the grindstone 48 side (here, the lower side). As a result, as shown in FIGS. 3 and 4, the outer peripheral edge 102 of the sintered magnet 100 is in contact with the outer peripheral surface 48 a of the grindstone 48. Thereafter, the robot arm 18 performs a linear interpolation operation so that the sintered magnet 100 is reciprocated in the direction of arrow B (the axial direction of the grindstone 48) while moving the sintered magnet 100 in the direction of arrow A and toward the grindstone 48. As a result, the outer peripheral edge 102 reciprocates on the outer peripheral surface 48a while the outer peripheral edge 102 is pressed against the outer peripheral surface 48a, and the outer peripheral edge 102 is chamfered.

その後、焼結磁石100が矢印A方向かつ砥石48側に所定量(所定時間)移動されれば外周縁102の面取りが終了し、面取り面104が形成された焼結磁石100a{図2(b)参照}が保持ユニット12によってベルトコンベア等に与えられる。   Thereafter, if the sintered magnet 100 is moved by a predetermined amount (predetermined time) in the direction of arrow A and toward the grindstone 48, the chamfering of the outer peripheral edge 102 is completed, and the sintered magnet 100a having the chamfered surface 104 formed therein {FIG. ) Reference} is given to the belt conveyor or the like by the holding unit 12.

このような面取り装置10によれば、焼結磁石100を矢印A方向に移動させつつ矢印B方向に往復移動させることによって、外周面48aの全面を有効に利用して外周縁102を面取りでき、砥石の寿命を延ばすことができる。また、焼結磁石100と砥石48とを、回転軸S1が回転軸S2に対して90°傾きかつ回転軸S1と回転軸S2とが交わらないように配置し、外周面48aの周速度が外周縁102の周速度よりも大きくなるようにそれぞれ回転させることによって、外周縁102を焼結磁石100の略径方向(矢印D方向:図4参照)に研削できる。これによって、矢印C1方向(図4参照)に交わる方向に延びる短い研磨目(研削目)を面取り面104{図2(b)参照}に形成できる。   According to such a chamfering apparatus 10, by reciprocating the sintered magnet 100 in the direction of the arrow B while moving the sintered magnet 100 in the direction of the arrow A, the outer peripheral edge 102 can be chamfered effectively using the entire outer peripheral surface 48a. The life of the wheel can be extended. Further, the sintered magnet 100 and the grindstone 48 are arranged such that the rotation axis S1 is inclined by 90 ° with respect to the rotation axis S2 and the rotation axis S1 and the rotation axis S2 do not intersect with each other. The outer peripheral edge 102 can be ground in the substantially radial direction of the sintered magnet 100 (arrow D direction: see FIG. 4) by rotating the peripheral edge 102 so as to be larger than the peripheral speed of the peripheral edge 102. As a result, a short polishing line (grinding line) extending in a direction intersecting with the arrow C1 direction (see FIG. 4) can be formed on the chamfered surface 104 {see FIG.

外周面48aの周速度を外周縁102の周速度の40倍以上にすることによって、確実に外周縁102を略矢印D方向(図4参照)に研削でき、確実に面取り面104に略放射状に延びる短い研磨目を形成できる。   By setting the peripheral speed of the outer peripheral surface 48 a to 40 times or more the peripheral speed of the outer peripheral edge 102, the outer peripheral edge 102 can be reliably ground in the direction of the arrow D (see FIG. 4), and reliably on the chamfered surface 104. A short abrasive line can be formed.

ついで、従来技術の面取り装置で面取りされた焼結磁石と、面取り装置10で面取りされた焼結磁石との比較例について説明する。なお、いずれの面取り装置においても外周縁102の直径(外径)が32mmの焼結磁石100を面取りした。   Next, a comparative example of the sintered magnet chamfered by the chamfering device of the prior art and the sintered magnet chamfered by the chamfering device 10 will be described. In any of the chamfering apparatuses, the sintered magnet 100 having a diameter (outer diameter) of the outer peripheral edge 102 of 32 mm was chamfered.

従来技術の面取り装置では、焼結磁石100とカップ型の砥石とを同軸上に配置し、焼結磁石100の外周縁102をカップ型の砥石のテーパーする内周面に圧接させつつそれぞれを周方向に回転させることによって外周縁102を面取りした。   In the chamfering device of the prior art, the sintered magnet 100 and the cup-type grindstone are arranged coaxially, and the outer peripheral edge 102 of the sintered magnet 100 is pressed against the tapered inner peripheral surface of the cup-type grindstone. The outer peripheral edge 102 was chamfered by rotating in the direction.

面取り装置10では、端面48b(図4参照)の直径が30mmの円柱状の砥石48を用いた。また、面取り装置10では、外周縁102の回転数が120rpmになるように焼結磁石100を回転させ、外周面48aの回転数が6000rpmになるように砥石48を回転させた。この条件から直径×円周率×回転数を用いて外周縁102の周速度、および外周面48aの周速度を求めると、外周縁102の周速度は約0.2m/sとなり、外周面48aの周速度は約9.4m/sとなる。したがって、外周面48aの周速度は外周縁102の周速度の約47倍となる。   In the chamfering apparatus 10, a cylindrical grindstone 48 having an end surface 48b (see FIG. 4) with a diameter of 30 mm was used. Moreover, in the chamfering apparatus 10, the sintered magnet 100 was rotated so that the rotation speed of the outer peripheral edge 102 was 120 rpm, and the grindstone 48 was rotated so that the rotation speed of the outer peripheral surface 48a was 6000 rpm. If the peripheral speed of the outer peripheral edge 102 and the peripheral speed of the outer peripheral surface 48a are obtained from this condition using diameter × circularity × rotational speed, the peripheral speed of the outer peripheral edge 102 is about 0.2 m / s, and the outer peripheral surface 48a. The peripheral speed is about 9.4 m / s. Therefore, the peripheral speed of the outer peripheral surface 48 a is about 47 times the peripheral speed of the outer peripheral edge 102.

従来技術の面取り装置によって面取りされた焼結磁石の要部を図5に示し、面取り装置10によって面取りされた焼結磁石の要部を図6に示す。
従来技術の面取り装置では、外周縁を周方向に研削するので、図5に示すように面取り面に周方向に延びる研磨目が形成される。一方、面取り装置10では、回転軸S1と回転軸S2との傾きが90°でありかつ砥石48の外周面48aの周速度が焼結磁石100の外周縁102の周速度よりも大幅に大きいので、焼結磁石100を略矢印D方向(図4参照)に研削できる。これによって、図6に示すように、面取り面に略放射状に延びる研磨目を形成できる。
The principal part of the sintered magnet chamfered by the chamfering apparatus of the prior art is shown in FIG. 5, and the principal part of the sintered magnet chamfered by the chamfering apparatus 10 is shown in FIG.
In the conventional chamfering apparatus, since the outer peripheral edge is ground in the circumferential direction, a polishing mark extending in the circumferential direction is formed on the chamfered surface as shown in FIG. On the other hand, in the chamfering device 10, the inclination between the rotation shaft S <b> 1 and the rotation shaft S <b> 2 is 90 °, and the peripheral speed of the outer peripheral surface 48 a of the grindstone 48 is significantly larger than the peripheral speed of the outer peripheral edge 102 of the sintered magnet 100. The sintered magnet 100 can be ground substantially in the direction of arrow D (see FIG. 4). As a result, as shown in FIG. 6, it is possible to form polished eyes extending substantially radially on the chamfered surface.

一般に、バリを取り除くとともに角部を丸めるために、たとえば砥粒と面取りされた複数の焼結磁石とを入れた容器を回転させることによって、面取りされた焼結磁石にバレル処理を施すことが知られている。   In general, in order to remove burrs and round corners, for example, rotating a container containing abrasive grains and a plurality of chamfered sintered magnets to barrel the chamfered sintered magnets is known. It has been.

従来技術の面取り装置によって面取りされた焼結磁石では、面取り面に周方向に延びる長い研磨目が形成されるために、バレル処理の際に他の焼結磁石と衝突することによって面取り後の外周縁近傍(図5参照)が欠けやすく、長い研磨目に沿って欠けの範囲も広くなりやすい。一方、面取り装置10によって面取りされた焼結磁石100aでは、面取り面104に略放射状に延びる短い研磨目が形成されるので、他の焼結磁石100aと衝突しても面取り後の外周縁近傍(図6参照)が欠けにくく、たとえ欠けたとしてもその範囲を小さくできる。   In the sintered magnet chamfered by the chamfering device of the prior art, since a long polishing mark extending in the circumferential direction is formed on the chamfered surface, the outer surface after chamfering is caused by colliding with another sintered magnet during barrel processing. The vicinity of the periphery (see FIG. 5) is likely to be chipped, and the range of the chip is likely to be wide along a long polishing eye. On the other hand, in the sintered magnet 100a chamfered by the chamfering device 10, since the short crevice extending substantially radially is formed on the chamfered surface 104, even if it collides with other sintered magnets 100a, the vicinity of the outer peripheral edge after chamfering ( 6), the range can be reduced.

このように面取り装置10によって面取りされた焼結磁石100aは、面取り面104に略放射状に延びる短い研磨目が形成されることによって、バレル処理の際に面取り面104およびその近傍が欠けにくく、生産性が良好である。   The sintered magnet 100a chamfered by the chamfering apparatus 10 in this way is formed with short grinding marks extending substantially radially on the chamfered surface 104, so that the chamfered surface 104 and the vicinity thereof are less likely to be chipped during barrel processing. Good properties.

なお、上述の実施形態では、第1および第2移動手段をロボットアーム18によって構成する場合について説明したが、第1および第2移動手段は任意に構成できる。たとえば、第1移動手段として第1アクチュエータによって焼結磁石を砥石側に移動させ、第2移動手段として第2アクチュエータによって焼結磁石を砥石の軸方向に移動させるようにしてもよい。   In the above-described embodiment, the case where the first and second moving units are configured by the robot arm 18 has been described. However, the first and second moving units can be arbitrarily configured. For example, the sintered magnet may be moved to the grindstone side by the first actuator as the first moving means, and the sintered magnet may be moved in the axial direction of the grindstone by the second actuator as the second moving means.

また、上述の実施形態では、鉛直方向に並ぶように焼結磁石と砥石とを配置する場合について説明したが、一方の回転軸と他方の回転軸との傾きが90°であれば焼結磁石と砥石との配置態様は特に限定されない。たとえば、焼結磁石の回転軸が水平方向に延びて砥石の回転軸が鉛直方向に延びるように焼結磁石と砥石とを配置してもよいし、焼結磁石の回転軸と砥石の回転軸とがそれぞれ水平方向に延びるように焼結磁石と砥石とを配置してもよい。   Further, in the above-described embodiment, the case where the sintered magnet and the grindstone are arranged so as to be aligned in the vertical direction has been described. However, if the inclination between one rotating shaft and the other rotating shaft is 90 °, the sintered magnet There is no particular limitation on the arrangement of the grindstone. For example, the sintered magnet and the grindstone may be arranged such that the rotating shaft of the sintered magnet extends in the horizontal direction and the rotating shaft of the grindstone extends in the vertical direction, or the rotating shaft of the sintered magnet and the rotating shaft of the grindstone A sintered magnet and a grindstone may be arranged so that each extends in the horizontal direction.

さらに、上述の実施形態では、焼結磁石を移動させる場合について説明したが、この発明はこれに限定されない。焼結磁石と砥石との少なくともいずれか一方を移動させることによって、砥石の外周面に焼結磁石の外周縁を圧接させればよい。また、焼結磁石と砥石との少なくともいずれか一方を移動させることによって、焼結磁石の外周縁を砥石の外周面上で往復移動させればよい。   Furthermore, although the above-mentioned embodiment demonstrated the case where a sintered magnet was moved, this invention is not limited to this. What is necessary is just to press-contact the outer periphery of a sintered magnet to the outer peripheral surface of a grindstone by moving at least any one of a sintered magnet and a grindstone. Moreover, what is necessary is just to reciprocate the outer periphery of a sintered magnet on the outer peripheral surface of a grindstone by moving at least any one of a sintered magnet and a grindstone.

なお、上述の実施形態では、円筒状の焼結磁石を面取りする場合について説明したが、この発明はこれに限定されない。たとえば円柱状の焼結磁石を面取りしてもよい。   In addition, although the above-mentioned embodiment demonstrated the case where a cylindrical sintered magnet was chamfered, this invention is not limited to this. For example, a cylindrical sintered magnet may be chamfered.

この発明の一実施形態を示す側面図解図である。It is a side view solution figure showing one embodiment of this invention. 焼結磁石を示す斜視図であり、(a)は面取り前の焼結磁石を示し、(b)は面取り後の焼結磁石を示す。It is a perspective view which shows a sintered magnet, (a) shows the sintered magnet before chamfering, (b) shows the sintered magnet after chamfering. 図1の状態から焼結磁石を鉛直方向かつ砥石側に移動させた状態を示す側面図解図である。It is a side view solution figure which shows the state which moved the sintered magnet to the vertical direction and the grindstone side from the state of FIG. 焼結磁石の外周縁と砥石の外周面とが接触した状態を示す斜視図解図である。It is a perspective view solution figure which shows the state which the outer periphery of the sintered magnet and the outer peripheral surface of the grindstone contacted. 従来の面取り装置によって面取りされた焼結磁石の要部を示す図解図である。It is an illustration figure which shows the principal part of the sintered magnet chamfered by the conventional chamfering apparatus. この発明の面取り装置によって面取りされた焼結磁石の要部を示す図解図である。It is an illustration figure which shows the principal part of the sintered magnet chamfered by the chamfering apparatus of this invention.

符号の説明Explanation of symbols

10 面取り装置
12 保持ユニット
14 砥石ユニット
18 ロボットアーム
20 ロボットハンド
30,36,44 モータ
46 スピンドルユニット
48 砥石
48a 外周面
100,100a 焼結磁石
102 外周縁
104 面取り面
S1,S2 回転軸
DESCRIPTION OF SYMBOLS 10 Chamfering device 12 Holding unit 14 Grinding wheel unit 18 Robot arm 20 Robot hand 30, 36, 44 Motor 46 Spindle unit 48 Grinding wheel 48a Outer peripheral surface 100, 100a Sintered magnet 102 Outer peripheral edge 104 Chamfered surface S1, S2 Rotating shaft

Claims (2)

円形の外周縁を有する筒状または柱状の焼結磁石の面取り装置であって、
円柱状の砥石、
前記焼結磁石を周方向に回転させる第1回転手段、
前記砥石の外周面の周速度が前記焼結磁石の外周縁の周速度よりも大きくなるように前記砥石を周方向に回転させる第2回転手段、
前記焼結磁石と前記砥石とを一方の回転軸が他方の回転軸に対して90°傾きかつ一方の回転軸が他方の回転軸に交わらないように配置する配置手段、
前記焼結磁石の外周縁が前記砥石の外周面に接するように前記焼結磁石と前記砥石との少なくともいずれか一方を他方側に移動させる第1移動手段、および
前記焼結磁石の外周縁が前記砥石の外周面上を往復移動するように前記焼結磁石と前記砥石との少なくともいずれか一方を前記砥石の軸方向に移動させる第2移動手段を備え
前記配置手段は、前記第1回転手段によって回転される回転部および前記回転部とともに回転可能な爪を含み、前記爪で前記焼結磁石の外周面を挟むことによって、前記回転部と同軸上にかつ前記焼結磁石の端面が真下を向くように前記焼結磁石を保持する、面取り装置。
A chamfering device for a cylindrical or columnar sintered magnet having a circular outer periphery,
Cylindrical whetstone,
First rotating means for rotating the sintered magnet in the circumferential direction;
Second rotating means for rotating the grindstone in the circumferential direction so that the peripheral speed of the outer peripheral surface of the grindstone is larger than the peripheral speed of the outer peripheral edge of the sintered magnet;
Arrangement means for arranging the sintered magnet and the grindstone so that one rotation axis is inclined by 90 ° with respect to the other rotation axis and one rotation axis does not cross the other rotation axis,
First moving means for moving at least one of the sintered magnet and the grindstone to the other side so that the outer circumferential edge of the sintered magnet is in contact with the outer circumferential surface of the grindstone, and the outer circumferential edge of the sintered magnet is A second moving means for moving at least one of the sintered magnet and the grindstone in the axial direction of the grindstone so as to reciprocate on the outer peripheral surface of the grindstone ;
The arrangement means includes a rotating portion rotated by the first rotating means and a claw that can rotate together with the rotating portion, and the outer peripheral surface of the sintered magnet is sandwiched between the claws so as to be coaxial with the rotating portion. And the chamfering apparatus which hold | maintains the said sintered magnet so that the end surface of the said sintered magnet faces right below .
筒状または柱状の焼結磁石の円形の外周縁を面取りする面取り方法であって、
前記焼結磁石と円柱状の砥石とを一方の回転軸が他方の回転軸に対して90°傾きかつ一方の回転軸が他方の回転軸に交わらないように配置する工程、
前記砥石の外周面の周速度が前記焼結磁石の外周縁の周速度よりも大きくなるように前記焼結磁石と前記砥石とをそれぞれ周方向に回転させる工程、および
前記焼結磁石の外周縁が前記砥石の外周面に接するように前記焼結磁石と前記砥石との少なくともいずれか一方を他方側に移動させつつ前記焼結磁石の外周縁が前記砥石の外周面上を往復移動するように前記焼結磁石と前記砥石との少なくともいずれか一方を前記砥石の軸方向に移動させる工程を備え
前記配置する工程では、回転部とともに回転可能な爪で前記焼結磁石の外周面を挟むことによって、前記回転部と同軸上にかつ前記焼結磁石の端面が真下を向くように前記焼結磁石を保持し、
前記回転させる工程では、前記回転部を周方向に回転させることによって、前記爪で保持された前記焼結磁石を周方向に回転させる、面取り方法。
A chamfering method for chamfering a circular outer periphery of a cylindrical or columnar sintered magnet,
Arranging the sintered magnet and the cylindrical grindstone so that one rotation axis is inclined by 90 ° with respect to the other rotation axis and one rotation axis does not cross the other rotation axis;
Rotating the sintered magnet and the grindstone in the circumferential direction so that the peripheral speed of the outer peripheral surface of the grindstone is larger than the peripheral speed of the outer peripheral edge of the sintered magnet, and the outer peripheral edge of the sintered magnet So that the outer peripheral edge of the sintered magnet reciprocates on the outer peripheral surface of the grindstone while moving at least one of the sintered magnet and the grindstone to the other side so as to contact the outer peripheral surface of the grindstone A step of moving at least one of the sintered magnet and the grindstone in the axial direction of the grindstone ,
In the arranging step, the sintered magnet is arranged so that the outer peripheral surface of the sintered magnet is sandwiched between claws that can rotate together with the rotating portion, so that the end surface of the sintered magnet faces directly below the rotating portion. Hold
In the rotating step , the chamfering method of rotating the sintered magnet held by the claw in the circumferential direction by rotating the rotating portion in the circumferential direction .
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