JP5110678B2 - 磁気研磨方法 - Google Patents
磁気研磨方法 Download PDFInfo
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- JP5110678B2 JP5110678B2 JP2006139754A JP2006139754A JP5110678B2 JP 5110678 B2 JP5110678 B2 JP 5110678B2 JP 2006139754 A JP2006139754 A JP 2006139754A JP 2006139754 A JP2006139754 A JP 2006139754A JP 5110678 B2 JP5110678 B2 JP 5110678B2
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- polishing
- magnetic
- sample
- magnetic field
- cooling
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
Ra=0.072μm
Ry=0.465μm
という値を得た。なお、研磨を行う前のRa,Ryは、
Ra=0.653μm
Ry=4.701μm
であり、図3は表面粗さの測定結果を示すグラフ図である。
2 冷却装置
20 温度センサ
21 温度コントローラ
3 研磨バイト
30 永久磁石
4 磁気研磨液
Claims (1)
- 樹脂部材からなる研磨対象に対して研磨バイトを非接触に対面させ、周辺に存在させた磁気研磨液を連動することにより流体研磨を行う磁気研磨方法であって、
前記研磨バイトには磁場を発生する磁場発生源を設けて駆動手段と連係させ、前記研磨対象に対しては冷却手段を連係させ、前記磁気研磨液には砥粒を混合しておき、前記冷却手段を起動することにより前記研磨対象を収縮させて緻密にし、前記冷却手段により冷却した状態で前記駆動手段を起動することにより前記研磨バイトには所定の運動動作を行わせ、前記磁場発生源の磁場により前記磁気研磨液に時間的に定常的あるいは変動的な磁場を加えて流体研磨を行うことを特徴とする磁気研磨方法。
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JP2006139754A JP5110678B2 (ja) | 2006-05-19 | 2006-05-19 | 磁気研磨方法 |
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JP2006139754A JP5110678B2 (ja) | 2006-05-19 | 2006-05-19 | 磁気研磨方法 |
Publications (2)
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JP2007307664A JP2007307664A (ja) | 2007-11-29 |
JP5110678B2 true JP5110678B2 (ja) | 2012-12-26 |
Family
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JP2006139754A Expired - Fee Related JP5110678B2 (ja) | 2006-05-19 | 2006-05-19 | 磁気研磨方法 |
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JP (1) | JP5110678B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009255274A (ja) * | 2008-03-26 | 2009-11-05 | Fuji Xerox Co Ltd | 樹脂製外装材の表面の再生方法、及びそれを利用して表面が再生された樹脂製外装材を備える事務機器 |
KR101932413B1 (ko) * | 2017-08-29 | 2018-12-27 | 인하대학교 산학협력단 | 표면광택 생성장치 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000107996A (ja) * | 1998-07-30 | 2000-04-18 | Japan Science & Technology Corp | 磁気異方性工具を用いた表面処理方法およびその装置 |
JP2006082213A (ja) * | 2004-09-17 | 2006-03-30 | Fdk Corp | 削り加工と鏡面研磨の方法および削り加工・鏡面研磨装置 |
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