JP5090404B2 - Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same - Google Patents

Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same Download PDF

Info

Publication number
JP5090404B2
JP5090404B2 JP2009150515A JP2009150515A JP5090404B2 JP 5090404 B2 JP5090404 B2 JP 5090404B2 JP 2009150515 A JP2009150515 A JP 2009150515A JP 2009150515 A JP2009150515 A JP 2009150515A JP 5090404 B2 JP5090404 B2 JP 5090404B2
Authority
JP
Japan
Prior art keywords
optical semiconductor
epoxy resin
resin composition
tablet
particle size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009150515A
Other languages
Japanese (ja)
Other versions
JP2011009394A (en
Inventor
貴光 太田
武司 森下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2009150515A priority Critical patent/JP5090404B2/en
Publication of JP2011009394A publication Critical patent/JP2011009394A/en
Application granted granted Critical
Publication of JP5090404B2 publication Critical patent/JP5090404B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Processes Of Treating Macromolecular Substances (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Description

本発明は、光半導体封止用樹脂タブレットの製法およびそれによって得られる光半導体封止用樹脂タブレット、並びにそれを用いた光半導体装置に関するものである。   TECHNICAL FIELD The present invention relates to a method for producing an optical semiconductor sealing resin tablet, an optical semiconductor sealing resin tablet obtained thereby, and an optical semiconductor device using the same.

従来から、光半導体素子は、一般にセラミックパッケージあるいはプラスチックパッケージによって封止され装置化されている。しかしながら、上記セラミックパッケージは、構成材料が比較的高価であることと、量産性に劣るため、最近では、プラスチックパッケージを用いることが主流となっている。なかでも、エポキン樹脂組成物を、予めタブレット状に打錠成形したものを原料としてトランスファーモールド成形を行うことが、モールド時の作業性、量産性およびモールド後の信頼性の点で優れている。   2. Description of the Related Art Conventionally, an optical semiconductor element is generally sealed and formed into a device by a ceramic package or a plastic package. However, since the ceramic package is relatively expensive in terms of constituent materials and is inferior in mass productivity, the use of plastic packages has recently become the mainstream. In particular, performing transfer molding using a raw material obtained by tableting the epochine resin composition in advance into a tablet shape is excellent in terms of workability at the time of molding, mass productivity, and reliability after molding.

ところが、光半導体封止用のエポキシ樹脂組成物は、エポキシ樹脂、硬化剤、硬化促進剤の各成分が比較的分散しにくく、全体を均一に混合分散させることが容易でないため、その反応が不均一となって成型むらや成型反応ボイドが発生しやすいという問題がある。そして、これらのむらやボイドが原因となって、光学むらを生じ、光半導体装置の信頼性を損なうという問題がある。   However, the epoxy resin composition for sealing an optical semiconductor does not react easily because the components of the epoxy resin, the curing agent, and the curing accelerator are relatively difficult to disperse and it is not easy to uniformly mix and disperse the whole. There is a problem that it becomes uniform and molding irregularities and molding reaction voids are likely to occur. Then, due to these unevenness and voids, there is a problem that optical unevenness occurs and the reliability of the optical semiconductor device is impaired.

そこで、エポキシ樹脂組成物を、非常に細かく微粉砕したものを用いることにより、組成物の均一分散性を確保し、上記成型むらや成型反応ボイドを解消もしくは大幅に改善して光学むらを低減する技術(特許文献1を参照)が提案されている。   Therefore, by using a finely pulverized epoxy resin composition, uniform dispersion of the composition is ensured, and the above-mentioned molding unevenness and molding reaction void are eliminated or greatly improved to reduce optical unevenness. A technique (see Patent Document 1) has been proposed.

特開平3−3258号公報JP-A-3-3258

たしかに、エポキシ樹脂組成物を非常に細かく微粉砕したものは、均一分散性に優れ、光学むらの解消に優れた効果を奏する。しかしながら、粒径が小さいため打錠性が悪く、タブレットの外観不良(欠け、割れ、上下面のえぐれ等)や重量ばらつきに伴う不良品の発生、取扱時の崩壊等、種々の問題を有しているため、その改善が強く望まれている。   Certainly, a finely pulverized epoxy resin composition is excellent in uniform dispersibility and has an excellent effect in eliminating optical unevenness. However, since the particle size is small, tableting properties are poor, and there are various problems such as poor appearance of the tablet (chips, cracks, top and bottom gaps, etc.), generation of defective products due to weight variations, collapse during handling, etc. Therefore, the improvement is strongly desired.

本発明は、このような事情に鑑みなされたもので、微粉末のエポキシ樹脂組成物を用いながら、打錠成形によって、高い歩留りで高品質のタブレットを得ることのできる光半導体封止用樹脂タブレットの製法と、それによって得られる光半導体封止用樹脂タブレットと、それを用いた光半導体装置の提供を、その目的とする。   The present invention has been made in view of such circumstances, and a resin tablet for encapsulating an optical semiconductor that can obtain a high-quality tablet with high yield by tableting molding using a fine powder epoxy resin composition. It is an object of the present invention to provide an optical semiconductor sealing resin tablet obtained thereby and an optical semiconductor device using the same.

上記の目的を達成するために、本発明は、エポキシ樹脂、硬化剤および硬化促進剤を含有する平均粒径50〜200μmの微粉末状エポキシ樹脂組成物を準備する工程と、上記微粉末状エポキシ樹脂組成物を、造粒工程を経由させることにより、平均粒径500〜1800μmの粒状エポキシ樹脂組成物を得る工程と、上記粒状エポキシ樹脂組成物をタブレット状に打錠成形する工程とを備えた光半導体封止用樹脂タブレットの製法を第1の要旨とする。   In order to achieve the above object, the present invention provides a step of preparing a fine powdery epoxy resin composition having an average particle size of 50 to 200 μm containing an epoxy resin, a curing agent and a curing accelerator, and the fine powdery epoxy The resin composition was provided with a step of obtaining a granular epoxy resin composition having an average particle size of 500 to 1800 μm by passing through a granulation step, and a step of tableting the granular epoxy resin composition into a tablet. The manufacturing method of the resin tablet for optical semiconductor sealing is a 1st summary.

また、本発明は、そのなかでも、特に、上記造粒工程において、上記微粉末状エポキシ樹脂組成物を、粗粒状エポキシ樹脂組成物に造粒後、整粒工程を経由させることにより、平均粒径500〜1800μmの粒状エポキシ樹脂組成物を得るようにした光半導体封止用樹脂タブレットの製法を第2の要旨とし、それらのなかでも、特に、上記微粉末状エポキシ樹脂組成物を準備する工程において、平均粒径500〜1000μmの粉砕エポキシ樹脂組成物を、ターボミルによって微粉砕加工するようにした光半導体封止用樹脂タブレットの製法を第3の要旨とする。   In addition, among the above, the present invention, in particular, in the granulation step, after the fine powder epoxy resin composition is granulated into a coarse granular epoxy resin composition, the average particle size is passed through the granulation step. The manufacturing method of the resin tablet for optical semiconductor sealing which obtained the granular epoxy resin composition of diameter 500-1800 micrometers is made into the 2nd summary, and the process of preparing the said fine powder epoxy resin composition especially among them The third gist is a method for producing an optical semiconductor sealing resin tablet in which a pulverized epoxy resin composition having an average particle size of 500 to 1000 μm is finely pulverized by a turbo mill.

そして、本発明は、上記第1〜第3のいずれかの要旨である製法によって得られる光半導体封止用樹脂タブレットであって、エポキシ樹脂、硬化剤および硬化促進剤を含有する平均粒径50〜200μmの微粉末状エポキシ樹脂組成物が、平均粒径500〜1800μmの粒状に造粒された状態で、タブレット状に打錠成形されている光半導体封止用樹脂タブレットを第4の要旨とする。   And this invention is the resin tablet for optical semiconductor sealing obtained by the manufacturing method which is the summary of any one of said 1st-3rd, Comprising: Average particle diameter 50 containing an epoxy resin, a hardening | curing agent, and a hardening accelerator A resin tablet for encapsulating an optical semiconductor formed into a tablet in a state where a fine powdery epoxy resin composition of ~ 200 μm is granulated into granules having an average particle diameter of 500 to 1800 μm To do.

さらに、本発明は、上記第4の要旨である光半導体封止用樹脂タブレットを用いて光半導体素子を封止してなる光半導体装置を第5の要旨とする。   Furthermore, this invention makes the 5th summary the optical-semiconductor device formed by sealing an optical semiconductor element using the resin tablet for optical-semiconductor sealing which is the said 4th summary.

すなわち、本発明者らは、光半導体封止用のエポキシ樹脂組成物であって、平均粒径が50〜200μmという微粉末に調製したものであっても、折れや割れ等を生じることなく良好に打錠成形する方法について、鋭意研究を重ねた。その結果、微粉末を直接打錠成形するのではなく、一旦、比較的径の大きな粒状に造粒した後、打錠するようにすると、脆くない、良好なタブレットが、高い歩留りで得られることを見いだし、本発明に到達した。   That is, the present inventors are an epoxy resin composition for encapsulating optical semiconductors, and even when prepared to a fine powder having an average particle size of 50 to 200 μm, it is good without causing breakage or cracking. Intensive research was conducted on the method of tableting. As a result, if a fine powder is not directly compressed and molded, but once granulated to a relatively large particle size and then tableted, a good tablet that is not brittle and can be obtained with a high yield is obtained. And the present invention has been reached.

なお、本発明において、「平均粒径」とは、レーザ回折散乱式粒度分布測定装置を用いて測定される平均粒径のことをいう。   In the present invention, the “average particle size” means an average particle size measured using a laser diffraction / scattering particle size distribution measuring apparatus.

本発明の光半導体封止用樹脂タブレットの製法によれば、平均粒径50〜200μmという、非常に粒径の小さな微粉末状のエポキシ樹脂組成物を、一旦径の大きな粒状に造粒した後打錠成形するため、微粉末状のエポキシ樹脂組成物が緻密かつ均一に分散した状態を維持したまま、欠けや割れを生じることなく、良好に打錠成形することができる。   According to the method for producing an optical semiconductor encapsulating resin tablet of the present invention, after finely pulverizing a fine powdery epoxy resin composition having an average particle size of 50 to 200 μm into a large particle size. For tableting, tableting can be performed satisfactorily without chipping or cracking while maintaining a finely and uniformly dispersed state of the finely divided epoxy resin composition.

なお、上記製法のなかでも、特に、上記造粒工程において、上記微粉末状エポキシ樹脂組成物を、粗粒状エポキシ樹脂組成物に造粒後、整粒工程を経由させるようにしたものは、得られる粒状エポキシ樹脂組成物の粒度分布を、上記整粒工程において高い精度で設定することができるため、より良好な成果が得られる。   Among the above-mentioned production methods, in particular, in the granulation step, the fine powder epoxy resin composition is granulated into a coarse granular epoxy resin composition and then passed through the granulation step. Since the particle size distribution of the granular epoxy resin composition to be obtained can be set with high accuracy in the sizing step, a better result can be obtained.

また、上記製法のなかでも、特に、上記微粉末状エポキシ樹脂組成物を準備する工程において、平均粒径500〜1000μmの粉砕エポキシ樹脂組成物を、ターボミルによって微粉砕加工すると、効率よく、均一な微粉末を得ることができ、好適である。   Further, among the above production methods, in particular, in the step of preparing the fine powder epoxy resin composition, when the pulverized epoxy resin composition having an average particle size of 500 to 1000 μm is finely pulverized by a turbo mill, it is efficient and uniform. A fine powder can be obtained and is suitable.

そして、本発明の、上記製法によって得られる光半導体封止用樹脂タブレットは、微粉末のエポキシ樹脂組成物が高密度で打錠成形されており、欠けや割れ等の外観不良や、保形性不良、重量ばらつきがないため、トランスファーモールド成形により光半導体素子を封止するための樹脂原料として用いる際の作業性、量産性およびモールド後の信頼性の点で優れている。   And the resin tablet for sealing an optical semiconductor obtained by the above production method of the present invention is formed by compressing and molding a fine powder epoxy resin composition at a high density, resulting in poor appearance such as chipping and cracking, and shape retention. Since there is no defect or weight variation, it is excellent in terms of workability, mass productivity, and reliability after molding when used as a resin raw material for sealing an optical semiconductor element by transfer molding.

また、本発明の、上記光半導体封止用樹脂タブレットを用いて光半導体素子の封止がなされた光半導体装置は、微粉末状のエポキシ樹脂組成物に由来する均一反応硬化体によって封止されているため、光学むら等がなく、信頼性の高い、高品質のものとなる。   Moreover, the optical semiconductor device in which the optical semiconductor element is sealed using the resin tablet for optical semiconductor sealing of the present invention is sealed with a uniform reaction cured body derived from a fine powder epoxy resin composition. Therefore, there is no optical unevenness, and it is highly reliable and of high quality.

(a)〜(d)は、いずれも本発明の一実施の形態である光半導体封止用樹脂タブレットの製法の説明図である。(A)-(d) is explanatory drawing of the manufacturing method of the resin tablet for optical semiconductor sealing which is one embodiment of this invention. 上記本発明の一実施の形態に用いる乾式圧縮造粒機の模式的な説明図である。It is typical explanatory drawing of the dry-type compression granulator used for one embodiment of the above-mentioned present invention. 上記本発明の一実施の形態におけるエポキシ樹脂組成物の粒度分布の変化を説明する線図である。It is a diagram explaining the change of the particle size distribution of the epoxy resin composition in one embodiment of the said invention.

まず、本発明に用いられる光半導体封止用エポキシ樹脂組成物は、エポキシ樹脂と硬化剤と硬化促進剤とを用いて得られるものである。なお、シリカ粉末等の充填剤は光の透過を損なうことから使用しない。   First, the epoxy resin composition for optical semiconductor encapsulation used in the present invention is obtained using an epoxy resin, a curing agent, and a curing accelerator. A filler such as silica powder is not used because it impairs light transmission.

上記エポキシ樹脂としては、着色の少ないものが好ましく、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、脂環式エポキシ樹脂、トリグリシジルイソシアネート,ヒダントインエポキシ等の含複素環エポキシ樹脂、水添加ビスフェノールA型エポキシ樹脂、脂肪族系エポキシ樹脂、グリシジルエーテル型エポキシ樹脂等があげられる。これらは、単独でもしくは2種以上を併せて用いることができる。   As the above-mentioned epoxy resin, those with little coloring are preferable. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, alicyclic epoxy resin, triglycidyl isocyanate, hydantoin epoxy and other heterocyclic rings Examples thereof include epoxy resins, water-added bisphenol A type epoxy resins, aliphatic epoxy resins, glycidyl ether type epoxy resins and the like. These may be used alone or in combination of two or more.

上記硬化剤としては、硬化時または硬化後に樹脂組成物の硬化体に着色の少ない酸無水物が好適である。例えば、無水フタル酸,無水マレイン酸,無水トリメリット酸,無水ピロメリット酸,ヘキサヒドロ無水フタル酸,テトラヒドロ無水フタル酸,無水メチルナジック酸,無水ナジック酸,無水グルタル酸等があげられる。また、他の硬化剤としては、アミン系硬化剤であるメタフェニレンジアミン,ジメチルジフェニルメタン,ジアミノジフェニルスルホン,m−キシレンジアミン,テトラエチレンペンタミン,ジエチルアミン,プロピルアミン等や、フェノール樹脂系硬化剤等があげられる。これらも、単独で用いても2種以上を併用してもよい。   As the curing agent, an acid anhydride that is less colored on the cured product of the resin composition at the time of curing or after curing is suitable. Examples thereof include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, hexahydrophthalic anhydride, tetrahydrophthalic anhydride, methyl nadic anhydride, nadic anhydride, glutaric anhydride, and the like. Other curing agents include amine curing agents such as metaphenylenediamine, dimethyldiphenylmethane, diaminodiphenylsulfone, m-xylenediamine, tetraethylenepentamine, diethylamine, propylamine, and phenol resin curing agents. can give. These may be used alone or in combination of two or more.

そして、上記硬化促進剤としては、トリエタノールアミン等の三級アミンや、2−メチルイミダゾール等のイミダゾール類、テトラフェニルホスホニウム・テトラフェニルボーレートや、トリフェニルホスフィン等の有機リン化合物、1,8−ジアザビシクロ〔5,4,0〕ウンデセン−7や1,5−ジアザビシクロ〔4,3,0〕ノネン−5等のジアザビシクロアルケン系化合物等があげられる。これらも、単独で用いても2種以上を併用してもよい。   Examples of the curing accelerator include tertiary amines such as triethanolamine, imidazoles such as 2-methylimidazole, organophosphorus compounds such as tetraphenylphosphonium / tetraphenylborate, triphenylphosphine, 1,8- And diazabicycloalkene compounds such as diazabicyclo [5,4,0] undecene-7 and 1,5-diazabicyclo [4,3,0] nonene-5. These may be used alone or in combination of two or more.

なお、上記光半導体封止用エポキシ樹脂組成物には、上記各成分以外に必要に応じて着色防止剤,滑沢剤,変性剤,劣化防止剤,離型剤等の添加剤が用いられる。   In addition to the above-described components, additives such as a coloring inhibitor, a lubricant, a modifier, a deterioration inhibitor, and a release agent are used in the epoxy resin composition for sealing an optical semiconductor as necessary.

上記着色防止剤としては、フェノール系化合物,アミン系化合物,有機硫黄系化合物,ホスフィン系化合物等があげられる。   Examples of the anti-coloring agent include phenolic compounds, amine compounds, organic sulfur compounds, and phosphine compounds.

また、上記滑沢剤としては、ステアリン酸,ステアリン酸マグネシウム,ステアリン酸カルシウム等のワックスやタルク等があげられる。なお、上記滑沢剤を配合する場合、その配合量は、打錠成形条件に応じて適宜設定されるが、例えば、樹脂組成物全体の0.1〜0.4重量%に設定することが好適である。   Examples of the lubricant include waxes such as stearic acid, magnesium stearate, and calcium stearate, and talc. In addition, when mix | blending the said lubricant agent, the compounding quantity is suitably set according to tableting molding conditions, For example, it can set to 0.1 to 0.4 weight% of the whole resin composition. Is preferred.

本発明の光半導体封止用樹脂タブレットは、これらの成分を用いて、例えば、つぎのようにして製造することができる。すなわち、まず、上記各成分原料を混合し加温して溶融樹脂とした後、冷却・固形化して粉砕することにより、Bステージ状(半硬化状)の光半導体封止用エポキシ樹脂組成物の粉砕物を得る。   The resin tablet for encapsulating an optical semiconductor of the present invention can be produced using these components, for example, as follows. That is, first, the above component raw materials are mixed and heated to form a molten resin, and then cooled, solidified and pulverized to produce a B-stage (semi-cured) epoxy resin composition for optical semiconductor encapsulation. A pulverized product is obtained.

上記粉砕方法としては、ボールミルを用いた粉砕等があげられる。このとき、粉砕物は、例えば平均粒径500〜1000μm、なかでも、500〜800μmに設定することが、つぎの微粉砕工程をスムーズに行う上で好適である。この粉砕物は、図1(a)に模式的に示すように、比較的大きな粉砕片の集合物である。   Examples of the pulverization method include pulverization using a ball mill. At this time, the pulverized product is preferably set to have an average particle size of 500 to 1000 μm, particularly 500 to 800 μm, in order to smoothly perform the next pulverization step. This pulverized product is a collection of relatively large pulverized pieces as schematically shown in FIG.

つぎに、上記粉砕物を、ターボミル等を用いて微粉砕加工することにより、平均粒径50〜200μmの微粉末状にする。この微粉末は、図1(b)に模式的に示すように、きめ細かいものである。とりわけ、上記ターボミルを用いて微粉砕すると、効率よく、均一な微粉末を得ることができ、好適である。   Next, the pulverized product is finely pulverized using a turbo mill or the like to form a fine powder having an average particle size of 50 to 200 μm. This fine powder is fine as shown schematically in FIG. In particular, fine pulverization using the above-described turbo mill is preferable because it can efficiently obtain uniform fine powder.

そして、上記微粉末を、乾式圧縮造粒機等を用いて造粒する。このとき、まず比較的大きな粗粒状(平均粒径2000〜4000μm程度)にした後、整粒工程を経由させることによって、平均粒径500〜1800μmの粒状にすることが好適である。上記粗粒状物は、例えば図1(c)に模式的に示すように、上記微粉末を、バインダーを用いることなく板状に圧縮成形して粗く粒状にしたもので、微粉末が不規則な形状の粒状に集まって、細かい粉が飛散しないようになっている。   Then, the fine powder is granulated using a dry compression granulator or the like. At this time, it is preferable to first make a relatively large coarse particle (average particle diameter of about 2000 to 4000 μm) and then pass through a sizing step to form a particle having an average particle diameter of 500 to 1800 μm. For example, as schematically shown in FIG. 1 (c), the coarse granular material is obtained by compression-molding the fine powder into a plate shape without using a binder, and the fine powder is irregular. It gathers in the shape of the shape and prevents fine powder from scattering.

また、上記粗粒状物を整粒したものは、例えば図1(d)に模式的に示すように、粗粒状物の不規則な形状が整えられて、粒の形状が揃い、極端に大きな粒子や極端に小さな粒が排除され、適度な平均粒径(500〜1800μm)の粒状物となっているため、打錠成形時の充填密度を高くすることができる。そして、各粒状物は、前段階の粗粒状物と同様、反応状態が均一化された微粉末で構成されている。   In addition, the coarse-grained product is sized so that, for example, as shown schematically in FIG. 1 (d), an irregular shape of the coarse-grained material is arranged, the shape of the particles is uniform, and extremely large particles. In addition, since extremely small particles are excluded and the particles have an appropriate average particle size (500 to 1800 μm), the packing density during tableting can be increased. And each granular material is comprised with the fine powder by which the reaction state was equalized similarly to the coarse granular material of the previous step.

したがって、上記粒状エポキシ樹脂組成物は、各粒状物が、反応状態が均一化された微粉末で構成されており、しかも粒状物の平均粒径が大きいため、打錠成形性が向上しており、打錠成形時に、欠けや割れ、重量ばらつきを生じることがない。   Therefore, in the granular epoxy resin composition, each granular material is composed of fine powder with a uniform reaction state, and the average particle size of the granular material is large, so that the tableting moldability is improved. No chipping, cracking or weight variation occurs during tableting.

そして、上記粒状エポキシ樹脂組成物を用いて打錠成形することにより得られるタブレットは、上記のとおり、欠けや割れ、重量ばらつきを生じることがなく、高品質のタブレットとなる。   And the tablet obtained by carrying out tableting using the said granular epoxy resin composition does not produce a chip | tip, a crack, and weight dispersion | variation as above-mentioned, and turns into a high quality tablet.

そして、上記タブレットを樹脂原料として用い、トランスファーモールド成形により光半導体素子を封止してなる光半導体装置は、微粉末状のエポキシ樹脂組成物に由来する均一反応硬化体によって封止されることになるため、光学むら等がなく、信頼性の高い、高品質のものとなる。したがって、この光半導体装置を作動させて画像を得た場合には、光学むらによる縞模様が生じることがなく、鮮明な画像が得られるという利点を有する。   And the optical semiconductor device formed by sealing the optical semiconductor element by transfer molding using the tablet as a resin raw material is sealed with a uniform reaction cured body derived from a fine powder epoxy resin composition. As a result, there is no optical unevenness, and the reliability is high and the quality is high. Accordingly, when an image is obtained by operating this optical semiconductor device, there is an advantage that a sharp image is obtained without causing a stripe pattern due to optical unevenness.

なお、最終的に得られる粒状エポキシ樹脂組成物の平均粒径が500μm未満では、造粒化による打錠成形性向上効果が乏しく、逆に、平均粒径が1800μmを超えると、打錠成形性は問題がないが、粒子同士が大きく光半導体封止に用いる際に、ボイドや硬化不良が生じて光学むらの原因となるおそれがあり、実用的でない。   If the average particle size of the finally obtained granular epoxy resin composition is less than 500 μm, the effect of improving tableting moldability by granulation is poor, and conversely, if the average particle size exceeds 1800 μm, the tableting moldability Although there is no problem, when the particles are large and used for sealing an optical semiconductor, voids and curing defects may occur, causing optical unevenness, which is not practical.

また、上記粒状エポキシ樹脂組成物は、受光素子等の光半導体素子の樹脂封止に用いられるため、光学的観点から透明のものが好ましい。この場合の「透明」とは、上記粒状エポキシ樹脂組成物の硬化物が400nmにおける透過率が98%以上のものをいう。   Moreover, since the said granular epoxy resin composition is used for resin sealing of optical semiconductor elements, such as a light receiving element, a transparent thing is preferable from an optical viewpoint. In this case, “transparent” means that the cured product of the granular epoxy resin composition has a transmittance of 98% or more at 400 nm.

さらに、上記粒状エポキシ樹脂組成物の製造には、乾式圧縮造粒機と整粒機とを組み合わせて用いているが、最近の乾式圧縮造粒機には、それ自体に、整粒機能を兼ね備えているものが多く、そのようなタイプを用いることが好適である。その代表的な構成を、図2に模式的に示す。   Furthermore, in the production of the above granular epoxy resin composition, a dry compression granulator and a granulator are used in combination. However, recent dry compression granulators themselves have a granulation function. It is preferable to use such a type. A typical configuration thereof is schematically shown in FIG.

この装置は、原料を供給するためのホッパ1と、下流側に設けられた2個一対の圧延ロール2側に原料を押し込むためのスクリュー・パドル部3と、上記圧延ロール2間で圧縮され板状に取り出される成形品を粗粒状に粉砕する粉砕器4と、得られた粗粒状物を整粒するためのグラニュレータ5とを備えている。6は減圧ユニットである。   This apparatus includes a hopper 1 for supplying a raw material, a screw / paddle part 3 for pushing the raw material into a pair of two rolling rolls 2 provided on the downstream side, and a plate compressed between the rolling rolls 2. A pulverizer 4 for pulverizing a molded product taken out into a coarse shape and a granulator 5 for sizing the obtained coarse granular material are provided. 6 is a decompression unit.

この装置によれば、粉砕器4によって、所望の粗粒状物を得た後、グラニュレータ5により、目的とする平均粒径の粒状エポキシ樹脂組成物を得ることができる。   According to this apparatus, after obtaining a desired coarse granular material by the pulverizer 4, a granular epoxy resin composition having a target average particle diameter can be obtained by the granulator 5.

なお、上記一連の製法において、造粒前の微粉末の粒度分布Aと、粗粒状物の粒度分布Bと、整粒された最終的な粒状物の粒度分布Cの一例を、図3に示す。ただし、各粒度分布は、JIS標準篩によって確認したものである。この図によれば、平均粒径100μmの微粉末が、平均粒径2000〜4000μmという大きさの粗粒状物になり、整粒工程を経由することによって、なだらかな粒度分布の、平均粒径750μmの造粒物となることがわかる。   In addition, in the above-mentioned series of manufacturing methods, an example of the particle size distribution A of the fine powder before granulation, the particle size distribution B of the coarse particles, and the particle size distribution C of the final granulated particles is shown in FIG. . However, each particle size distribution is confirmed by a JIS standard sieve. According to this figure, a fine powder having an average particle size of 100 μm becomes a coarse granular material having an average particle size of 2000 to 4000 μm, and by passing through a sizing process, the average particle size of 750 μm with a gentle particle size distribution is obtained. It turns out that it becomes a granulated product.

ただし、本発明において、エポキシ樹脂組成物の微粉末を、造粒工程において、まず粗粒状物とした後、整粒工程において粒状エポキシ樹脂組成物にすることは、必ずしも必要ではなく、微粉末を、整粒工程を経由することなく、直接、平均粒径500〜1800μmの粒状エポキシ樹脂組成物に造粒しても差し支えない。得られる粒状物の平均粒径が1800μmを超えない限り、良好な打錠成形性と組成物の均一分散性を確保することができるからである。   However, in the present invention, the fine powder of the epoxy resin composition is first made into a coarse granular product in the granulation step, and then it is not always necessary to make the granular epoxy resin composition in the granulating step. The granulated epoxy resin composition having an average particle diameter of 500 to 1800 μm may be directly granulated without going through the granulating step. This is because good tableting moldability and uniform dispersibility of the composition can be ensured as long as the average particle size of the obtained granular material does not exceed 1800 μm.

また、上記製法において、原料として用いる平均粒径50〜200μmの微粉末状エポキシ樹脂組成物は、吸湿しやすく、吸湿すると、エポキシ樹脂組成物の硬化物のガラス転移温度が低下するという不都合を招くため、乾燥気流中等の水分の少ない環境下で行うことが好ましい。   Moreover, in the said manufacturing method, the fine powdery epoxy resin composition with an average particle diameter of 50-200 micrometers used as a raw material is easy to absorb moisture, and if it absorbs moisture, it will cause the problem that the glass transition temperature of the hardened | cured material of an epoxy resin composition falls. Therefore, it is preferable to carry out in an environment with little moisture such as in a dry air flow.

さらに、上記粒状エポキシ樹脂組成物を用いてタブレットを打錠成形する際の条件は、粒状エポキシ樹脂組成物の組成や平均粒径、粒度分布等に応じて適宜調整されるが、一般に、その打錠成形時の圧縮率は、90〜96%に設定することが好適である。すなわち、圧縮率の値が90%より小さいと、タブレットの密度が低くなって割れやすくなるおそれがあり、逆に、圧縮率の値が96%より大きいと、打錠時にクラックが発生して離型時に欠けや折れが生じるおそれがあるからである。   Furthermore, the conditions for tableting the tablet using the granular epoxy resin composition are appropriately adjusted according to the composition, average particle size, particle size distribution, etc. of the granular epoxy resin composition. The compression rate at the time of tablet molding is preferably set to 90 to 96%. That is, if the compressibility value is less than 90%, the density of the tablet may be reduced and it may be easily cracked. Conversely, if the compressibility value is greater than 96%, cracks may occur during tableting and release. This is because chipping or breakage may occur during molding.

つぎに、実施例について比較例と併せて説明する。ただし、本発明は、以下の実施例に限定されるものではない。   Next, examples will be described together with comparative examples. However, the present invention is not limited to the following examples.

〔実施例1〕
下記の原料を、下記の割合で加熱溶解し混合した後、冷却・固形化して粉砕し、平均粒径500〜800μmのBステージ状の光半導体封止用エポキシ樹脂組成物を作製した。
[Example 1]
The following raw materials were heated and dissolved at the following ratio, mixed, cooled, solidified and pulverized to produce a B-stage epoxy resin composition for optical semiconductor encapsulation having an average particle size of 500 to 800 μm.

<エポキシ樹脂組成物の組成a>
ビスフェノールA型エポキシ樹脂(エポキシ当量650) 60 重量部
脂環式エポキシ樹脂(ダイセル化学社製、EHPE−3150) 40 〃
硬化剤:テトラヒドロ無水フタル酸 36 〃
触媒 :ジメチルベンズアミン 1.2 〃
ステアリン酸 0.1 〃
<Composition a of epoxy resin composition>
Bisphenol A type epoxy resin (epoxy equivalent 650) 60 parts by weight Alicyclic epoxy resin (manufactured by Daicel Chemical Industries, EHPE-3150) 40 〃
Hardener: Tetrahydrophthalic anhydride 36 〃
Catalyst: Dimethylbenzamine 1.2 〃
Stearic acid 0.1 〃

つぎに、このBステージ状の光半導体封止用エポキシ樹脂組成物を、ターボミル(ターボ工業社製、T250−4JS)によって微粉砕することにより、平均粒径100μmの微粉末状エポキシ樹脂組成物を得た。   Next, this B stage-like epoxy resin composition for encapsulating an optical semiconductor is pulverized by a turbo mill (T250-4JS, manufactured by Turbo Kogyo Co., Ltd.) to obtain a fine powder epoxy resin composition having an average particle size of 100 μm. Obtained.

そして、上記微粉末状エポキシ樹脂組成物を、ローラコンパクタ(ターボ工業社製、WP160×60N1型)にかけ、自然脱気、スクリュー回転数48rpm、圧延ロール水冷にて、平均粒径2000〜4000μmの粗粒状エポキシ樹脂組成物を得た。   Then, the fine powdery epoxy resin composition is applied to a roller compactor (manufactured by Turbo Kogyo Co., Ltd., WP160 × 60N1 type), natural degassing, screw rotation speed 48 rpm, rolling roll water cooling, and a coarse particle having an average particle diameter of 2000 to 4000 μm. A granular epoxy resin composition was obtained.

そして、上記粗粒状エポキシ樹脂組成物を、ロールグラニュレータ(日本グラニュレーター社製、テスト機:1531型)にて、造粒と整粒を行うことにより、目的とする光半導体封止用エポキシ樹脂組成物を得た。そして、得られた光半導体封止用樹脂組成物を、20号ロータリー打錠機を用いて打錠成形することにより、表1に示すような圧縮率の光半導体封止用樹脂タブレットを1000個得た。   Then, the above-mentioned coarse granular epoxy resin composition is granulated and sized by a roll granulator (manufactured by Nippon Granulator Co., Ltd., test machine: Model 1531). A composition was obtained. And 1000 resin tablets for optical semiconductor sealing of the compressibility as shown in Table 1 were formed by tableting the obtained resin composition for optical semiconductor sealing using a No. 20 rotary tableting machine. Obtained.

〔実施例2〜9、比較例1、2〕
光半導体封止用樹脂組成物を製造する過程において、下記の表1、表2に示すように、その平均粒径の大きさを変えた。また、必要に応じて、ステアリン酸の配合量を変えることにより、打錠成形が最もよい状態でなされるよう調整した。それ以外は、上記実施例1と同様にした。
[Examples 2 to 9, Comparative Examples 1 and 2]
In the process of producing the resin composition for sealing an optical semiconductor, the average particle size was changed as shown in Tables 1 and 2 below. Moreover, it adjusted so that tableting shaping | molding might be made in the best state by changing the compounding quantity of a stearic acid as needed. Other than that, it was the same as in Example 1 above.

そして、得られた全個に対して、欠け、クラック、脆さ、えぐれの有無と、重量ばらつきを確認し、下記のとおり評価した。そして、それらの結果と総合判定を、下記の表1、表2に併せて示した。
◎…全数良。
○…不良率が30%以下。
△…不良率が30%を超える。
×…全数不良。
And with respect to all the obtained pieces, the presence or absence of chipping, cracks, brittleness, erosion, and weight variation were confirmed and evaluated as follows. And those results and comprehensive judgment were combined with the following Table 1 and Table 2, and were shown.
◎… All numbers are good.
○ The defect rate is 30% or less.
Δ: The defect rate exceeds 30%.
X: Total number is poor.

Figure 0005090404
Figure 0005090404

Figure 0005090404
Figure 0005090404

上記の結果から、実施例1〜9品は、いずれも外観不良や重量ばらつきが殆ど生じず、打錠成形によって高品質の光半導体封止用樹脂タブレットが得られることがわかる。これに対し、比較例1品は、打錠することができないものであった。また、比較例2品は、微粉末ではないため、打錠成形することはできたが、欠け、クラック、えぐれが多く発生した。   From the above results, it can be seen that all of the products of Examples 1 to 9 have almost no appearance defects and weight variations, and a high-quality resin tablet for sealing an optical semiconductor can be obtained by tableting. On the other hand, the product of Comparative Example 1 could not be tableted. In addition, since the product of Comparative Example 2 was not a fine powder, it could be tablet-molded, but a lot of chipping, cracking and punching occurred.

つぎに、実施例1〜9で得られた光半導体封止用樹脂タブレットを用いて、実際に固体撮像素子であるエリアセンサーをダイレクトモールドして得られたものを用いてカメラを組み立て、それに強い平行光(10カンデラ)を当てカメラの絞りをF−32まで絞ったときの画像をディスプレイ画面に映した。その結果、いずれの実施例品の画像にも、光学むらは認められなかった。したがって、これらの実施例品を用いて光半導体素子を封止してなる光半導体装置は、光学むらによる影響を受けることがなく、優れた性能を有するものとなることがわかる。   Next, using the optical semiconductor sealing resin tablet obtained in Examples 1 to 9, the camera was assembled using what was actually obtained by direct molding of the area sensor, which is a solid-state imaging device, and strong against it. An image obtained when parallel camera (10 candela) was applied and the aperture of the camera was reduced to F-32 was displayed on the display screen. As a result, no optical unevenness was observed in the images of any of the examples. Therefore, it can be seen that the optical semiconductor device in which the optical semiconductor element is sealed using the products of these examples is not affected by the optical unevenness and has excellent performance.

〔実施例10〜14、比較例3〜6〕
上記組成aの光半導体封止用樹脂組成物とともに、下記の組成bの光半導体封止用樹脂組成物を準備した。
<エポキシ樹脂組成物の組成b>
トリグリシジルイソシアネート 105 重量部
ネオペンチルグリコール 20 〃
硬化剤:4−メチルヘキサヒドロ無水フタル酸 158 〃
触媒 :テトラ−n−ブチルホスホニウムO,O−ジエチルホスホロジチオエート
1.2 〃
ステアリン酸 0.4 〃
[Examples 10-14, Comparative Examples 3-6]
The optical semiconductor sealing resin composition of the following composition b was prepared with the optical semiconductor sealing resin composition of the said composition a.
<Composition b of epoxy resin composition>
Triglycidyl isocyanate 105 parts by weight Neopentyl glycol 20 〃
Curing agent: 4-methylhexahydrophthalic anhydride 158〃
Catalyst: Tetra-n-butylphosphonium O, O-diethyl phosphorodithioate
1.2 〃
Stearic acid 0.4 〃

そして、上記組成aもしくは組成bの光半導体封止用樹脂組成物を用い、表3、表4に示すように、その製造工程や最終的な平均粒径の大きさを変えた。また、必要に応じて、ステアリン酸の配合量および圧縮率を変えることにより、打錠成形が最もよい状態でなされるよう調整した。それ以外は、上記実施例1と同様にして、目的とする粒状もしくは粉末状(微粉末状を含む)の光半導体封止用樹脂組成物を得た。そして、19号ロータリー打錠機を用いて打錠成形を行い、光半導体封止用樹脂タブレットを各例ごとに1000個ずつ得た。これらについても、前記と同様にして、欠け、クラック、脆さ、えぐれの有無と、重量ばらつきを確認して評価した。そして、それらの結果と総合判定を、下記の表3、表4に併せて示した。   And the manufacturing process and the magnitude | size of the final average particle diameter were changed as shown in Table 3 and Table 4 using the resin composition for optical semiconductor sealing of the said composition a or the composition b. Moreover, it adjusted so that tableting shaping | molding might be made in the best state by changing the compounding quantity and compression rate of a stearic acid as needed. Other than that was carried out similarly to the said Example 1, and obtained the resin composition for optical semiconductor sealing of the target granular form or powder form (a fine powder form is included). And tableting molding was performed using No. 19 rotary tableting machine, and 1000 pieces of resin tablets for optical semiconductor sealing were obtained for each example. These were also evaluated in the same manner as described above by confirming the presence or absence of chipping, cracks, brittleness, and chipping, and weight variation. And those results and comprehensive judgment were combined with the following Table 3 and Table 4, and were shown.

Figure 0005090404
Figure 0005090404

Figure 0005090404
Figure 0005090404

上記の結果から、実施例10〜14品は、いずれも外観不良や重量ばらつきが殆ど生じず、打錠成形によって高品質の光半導体封止用樹脂タブレットが得られることがわかる。これに対し、比較例3、5品は、打錠することができないものであった。また、比較例4、6品は、微粉末ではないため、打錠成形することはできたが、クラック、えぐれ等が比較的多く発生した。   From the above results, it can be seen that the products of Examples 10 to 14 are almost free from appearance defects and weight variations, and a high-quality resin tablet for sealing an optical semiconductor can be obtained by tableting. On the other hand, Comparative Examples 3 and 5 could not be tableted. Further, since Comparative Examples 4 and 6 were not fine powders, they could be tablet-molded, but relatively many cracks, punches, etc. occurred.

つぎに、実施例10〜14で得られた光半導体封止用樹脂タブレットを用いて、実際に固体撮像素子であるエリアセンサーをダイレクトモールドして得られたものを用いてカメラを組み立て、それに強い平行光(10カンデラ)を当てカメラの絞りをF−32まで絞ったときの画像をディスプレイ画面に映した。その結果、いずれの実施例品の画像にも、光学むらは認められなかった。したがって、これらの実施例品を用いて光半導体素子を封止してなる光半導体装置は、光学むらによる影響を受けることがなく、優れた性能を有するものとなることがわかる。   Next, using the resin tablet for encapsulating optical semiconductors obtained in Examples 10 to 14, the camera was assembled using what was actually obtained by direct molding of the area sensor, which is a solid-state imaging device, and strong against it. An image obtained when parallel camera (10 candela) was applied and the aperture of the camera was reduced to F-32 was displayed on the display screen. As a result, no optical unevenness was observed in the images of any of the examples. Therefore, it can be seen that the optical semiconductor device in which the optical semiconductor element is sealed using the products of these examples is not affected by the optical unevenness and has excellent performance.

本発明は、光半導体素子の封止に用いられる光半導体封止用樹脂タブレットの製法と、それによって得られる光半導体封止用樹脂タブレットと、それを用いた光半導体装置に利用することができる。   INDUSTRIAL APPLICATION This invention can be utilized for the manufacturing method of the resin tablet for optical semiconductor sealing used for sealing of an optical semiconductor element, the resin tablet for optical semiconductor sealing obtained by it, and an optical semiconductor device using the same. .

Claims (5)

エポキシ樹脂、硬化剤および硬化促進剤を含有する平均粒径50〜200μmの微粉末状エポキシ樹脂組成物を準備する工程と、上記微粉末状エポキシ樹脂組成物を、造粒工程を経由させることにより、平均粒径500〜1800μmの粒状エポキシ樹脂組成物を得る工程と、上記粒状エポキシ樹脂組成物をタブレット状に打錠成形する工程とを備えたことを特徴とする光半導体封止用樹脂タブレットの製法。   By preparing a fine powdery epoxy resin composition having an average particle size of 50 to 200 μm containing an epoxy resin, a curing agent and a curing accelerator, and passing the fine powdery epoxy resin composition through a granulation step A resin tablet for encapsulating an optical semiconductor, comprising: a step of obtaining a granular epoxy resin composition having an average particle size of 500 to 1800 μm; and a step of tableting the granular epoxy resin composition into a tablet shape. Manufacturing method. 上記造粒工程において、上記微粉末状エポキシ樹脂組成物を、粗粒状エポキシ樹脂組成物に造粒後、整粒工程を経由させることにより、平均粒径500〜1800μmの粒状エポキシ樹脂組成物を得るようにした請求項1記載の光半導体封止用樹脂タブレットの製法。   In the granulation step, the fine powder epoxy resin composition is granulated into a coarse granular epoxy resin composition and then passed through a granulation step, thereby obtaining a granular epoxy resin composition having an average particle size of 500 to 1800 μm. The manufacturing method of the resin tablet for optical semiconductor sealing of Claim 1 which was made to do. 上記微粉末状エポキシ樹脂組成物を準備する工程において、平均粒径500〜1000μmの粉砕エポキシ樹脂組成物を、ターボミルによって微粉砕加工するようにした請求項1または2記載の光半導体封止用樹脂タブレットの製法。   3. The optical semiconductor encapsulating resin according to claim 1, wherein in the step of preparing the fine powder epoxy resin composition, the pulverized epoxy resin composition having an average particle diameter of 500 to 1000 μm is finely pulverized by a turbo mill. Tablet manufacturing method. 請求項1〜3のいずれか一項に記載の製法によって得られる光半導体封止用樹脂タブレットであって、エポキシ樹脂、硬化剤および硬化促進剤を含有する平均粒径50〜200μmの微粉末状エポキシ樹脂組成物が、平均粒径500〜1800μmの粒状に造粒された状態で、タブレット状に打錠成形されていることを特徴とする光半導体封止用樹脂タブレット。   A resin tablet for sealing an optical semiconductor obtained by the production method according to any one of claims 1 to 3, wherein the fine tablet has an average particle size of 50 to 200 µm and contains an epoxy resin, a curing agent, and a curing accelerator. A resin tablet for encapsulating an optical semiconductor, wherein the epoxy resin composition is granulated into a tablet having a mean particle size of 500 to 1800 μm. 請求項4記載の光半導体封止用樹脂タブレットを用いて光半導体素子を封止してなる光半導体装置。 An optical semiconductor device formed by sealing an optical semiconductor element using the resin tablet for optical semiconductor sealing according to claim 4.
JP2009150515A 2009-06-25 2009-06-25 Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same Expired - Fee Related JP5090404B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009150515A JP5090404B2 (en) 2009-06-25 2009-06-25 Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009150515A JP5090404B2 (en) 2009-06-25 2009-06-25 Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same

Publications (2)

Publication Number Publication Date
JP2011009394A JP2011009394A (en) 2011-01-13
JP5090404B2 true JP5090404B2 (en) 2012-12-05

Family

ID=43565719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009150515A Expired - Fee Related JP5090404B2 (en) 2009-06-25 2009-06-25 Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same

Country Status (1)

Country Link
JP (1) JP5090404B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101900549B1 (en) * 2015-06-30 2018-09-19 삼성에스디아이 주식회사 Granule type epoxy resin composition for encapsulating a semiconductor deviece and semiconductor device encapsuled by using the same
WO2017003087A1 (en) * 2015-06-30 2017-01-05 삼성에스디아이 주식회사 Granular epoxy resin composition for semiconductor device encapsulation, and semiconductor device encapsulated by using same
JP7434025B2 (en) 2019-10-02 2024-02-20 日東電工株式会社 Resin molded product for optical semiconductor encapsulation and its manufacturing method
JP7510843B2 (en) 2020-02-27 2024-07-04 日東電工株式会社 Resin molding for sealing optical semiconductors, optical semiconductor sealing material, and optical semiconductor device
JP7465703B2 (en) 2020-03-30 2024-04-11 日東電工株式会社 Resin molding for sealing optical semiconductors and method for producing same
KR20210150294A (en) 2020-06-03 2021-12-10 닛토덴코 가부시키가이샤 Resin molded article for optical semiconductor encapsulation
JP7538666B2 (en) 2020-09-08 2024-08-22 日東電工株式会社 Resin moldings for sealing optical semiconductors

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2656350B2 (en) * 1989-05-30 1997-09-24 日東電工株式会社 Optical semiconductor device, method for producing the same, and resin composition for encapsulating optical semiconductor used therein
JP3135926B2 (en) * 1997-08-07 2001-02-19 松下電工株式会社 Epoxy resin encapsulant for molding semiconductor chips and method of manufacturing the same
JPH11111741A (en) * 1997-10-08 1999-04-23 Hitachi Chem Co Ltd Epoxy resin tablet for sealing optical semiconductor and optical semiconductor sealed with same tablet
JP3888767B2 (en) * 1998-04-01 2007-03-07 住友ベークライト株式会社 Method for producing epoxy resin composition for encapsulating granular semiconductor
JP4682556B2 (en) * 2003-09-19 2011-05-11 日本電気硝子株式会社 Low melting point sealing composition, low melting point glass paste and low melting point glass tablet
JP2009001433A (en) * 2007-06-19 2009-01-08 Nippon Electric Glass Co Ltd Sealing material
JP5086945B2 (en) * 2008-09-05 2012-11-28 株式会社東芝 Manufacturing method of semiconductor device

Also Published As

Publication number Publication date
JP2011009394A (en) 2011-01-13

Similar Documents

Publication Publication Date Title
JP5090404B2 (en) Manufacturing method of resin tablet for optical semiconductor sealing, resin tablet for optical semiconductor sealing obtained thereby, and optical semiconductor device using the same
TWI449748B (en) Granular epoxy resin composition for encapsulation of semiconductor and, semiconductor device made with the same and process for manufacturing semiconductor device
JP2006216899A (en) Molding material for compression molding and resin-sealed semiconductor device
JP5086945B2 (en) Manufacturing method of semiconductor device
TWI743632B (en) Semiconductor sealing molding material, manufacturing method of semiconductor sealing molding material, and semiconductor device using the same
TWI551352B (en) Manufacturing method of resin composition for sealing semiconductors and pulverizing apparatus
JP6520779B2 (en) Method of manufacturing epoxy resin granular material for semiconductor encapsulation, and method of manufacturing semiconductor device
CN105122442A (en) Compound semiconductor device, method for manufacturing same, and resin-sealed semiconductor device
US11702537B2 (en) Tablet-type epoxy resin composition for sealing semiconductor device, and semiconductor device sealed using the same
JP4634083B2 (en) Manufacturing method of tablets for semiconductor encapsulation
TWI796507B (en) Resin composition for sheet-like sealing, and semiconductor device
JP2006339226A (en) Semiconductor sealing tablet, its manufacturing method, and semiconductor device using the same
TWI293314B (en) Method for producing a semiconductor-molding tablet, a semiconductor-molding tablet obtained thereby and a semiconductor device using the same
JP7510843B2 (en) Resin molding for sealing optical semiconductors, optical semiconductor sealing material, and optical semiconductor device
KR101900549B1 (en) Granule type epoxy resin composition for encapsulating a semiconductor deviece and semiconductor device encapsuled by using the same
JP4569296B2 (en) Manufacturing method of resin tablet for semiconductor sealing and manufacturing method of resin molding
JP6555000B2 (en) Manufacturing method of epoxy resin granular body for semiconductor sealing, and manufacturing method of semiconductor device
JP7002866B2 (en) Resin composition for encapsulating powdered and granular semiconductors and semiconductor devices
JP6070529B2 (en) Method for producing granular semiconductor sealing resin composition and semiconductor device
JPH033258A (en) Optical semiconductor device, manufacture of the same, and optical semiconductor sealing resin composition used therefor
KR101933270B1 (en) Method for granulating an epoxy resin composition for encapsulating semiconductor device and semiconductor device encapsulated using the same
JP2006294677A (en) Manufacturing method of tablet for sealing semiconductor element
CN113462121A (en) Resin molding for optical semiconductor encapsulation and method for producing same
JPS63160256A (en) Manufacture of semiconductor device
JP2012035468A (en) Method and apparatus for manufacturing epoxy resin molding material and resin sealing type semiconductor apparatus

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111202

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120731

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120904

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120912

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150921

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5090404

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees