JP5029192B2 - Method for manufacturing color filter for liquid crystal display device, and color filter for liquid crystal display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter for a liquid crystal display device, to manufacture the color filter preventing a second photospacer from being peeled off without restrictions on design. <P>SOLUTION: [A] A first mask PM11 having a pattern corresponding to a first photospacer Ps-1e and a pattern corresponding to a second photospacer Ps-2e and not wider than the pattern of the first photospacer is used to apply first exposure, development, and postbaking to a coating, thereby forming a second photospacer Ps-2' which has the same height as the first photospacer. [B] A second mask PM12 having a pattern corresponding to the second photospacer is used to apply second exposure L2 to the second photospacer, thereby forming the second photospacer. The wavelength of the second exposure is 185 and/or 254 nm. <P>COPYRIGHT: (C)2009,JPO&amp;INPIT

Description

  The present invention relates to the formation of a photo spacer of a color filter for a liquid crystal display device, and in particular, a color for a liquid crystal display device having a second photo spacer that does not peel off when two types of photo spacers are formed simultaneously. Regarding filters.

FIG. 11 is a plan view schematically showing an example of a color filter used in a liquid crystal display device. FIG. 12 is a cross-sectional view taken along line XX ′ of the color filter shown in FIG.
As shown in FIGS. 11 and 12, the color filter (4) used in the liquid crystal display device has a black matrix (41), a colored pixel (42), and a transparent conductive film (43) on a glass substrate (40). Are formed sequentially.
FIG. 11 and FIG. 12 schematically show a color filter, and 12 colored pixels (42) are represented. In an actual color filter, for example, several hundreds are displayed on a 17-inch diagonal screen. A large number of colored pixels of about μm are arranged.

As a method of manufacturing a color filter having the above structure, which is used in many liquid crystal display devices, first, a black matrix is formed on a glass substrate, and then a colored pixel is aligned with this black matrix pattern. A method of forming a transparent conductive film and aligning a transparent conductive film is widely used.
The black matrix (41) is a matrix having light shielding properties, the colored pixels (42) have, for example, red, green, and blue filter functions, and the transparent conductive film (43) is transparent. Provided as a simple electrode.

  The black matrix (41) is composed of a matrix portion (41A) between the colored pixels (42) and a frame portion (41B) surrounding the peripheral portion of the region (display portion) where the colored pixels (42) are formed. Yes. The black matrix determines the position of the colored pixels of the color filter, makes the size uniform, and shields unwanted light when used in a display device, making the image of the display device uniform and uniform. In addition, it has a function of making an image with improved contrast.

The black matrix is formed on the glass substrate by, for example, forming a metal thin film on the glass substrate (40) and photoetching the metal thin film.
Alternatively, the black matrix (41) is formed on the glass substrate (40) by photolithography using a black photoresist for forming a black matrix.

  In addition, the colored pixel (42) is formed by providing a coating film on a glass substrate on which the black matrix is formed using, for example, a negative coloring photoresist in which a pigment or other pigment is dispersed. A method of forming colored pixels by exposure to light and development is used. In addition, the transparent conductive film (43) is formed on a glass substrate on which a black matrix and colored pixels are formed by, for example, forming a transparent conductive film by sputtering using ITO (Indium Tin Oxide). ing.

The color filter shown in FIGS. 11 and 12 has a basic function as a color filter used in a liquid crystal display device. The liquid crystal display device incorporates such a color filter to realize full color display, and its application range is dramatically expanded, and many products using liquid crystal display devices such as liquid crystal color TVs and notebook PCs are created. It was done.

  With the development and practical use of various liquid crystal display devices, the color filters used in the liquid crystal display devices have, for example, 1) a protective layer (overcoat layer) and 2) a transmissive display in addition to the above basic functions. A transparent resin film for adjusting the phase of light passing through the region and the reflective display region, or adjusting the gap, 3) a light scattering layer for the reflective display region of the color filter, and 4) a photo spacer having a spacer function (Protrusions) 5) Various functions such as alignment control protrusions for controlling the alignment of liquid crystals have been added based on the use and specifications of the color filter.

For example, in the spacer function, in a conventional liquid crystal display device, transparent spherical particles (beads) of glass or synthetic resin called spacer beads are dispersed to form a gap between the substrates.
Since these spacers are transparent particles, if a spacer is included with the liquid crystal in the pixel, light will leak through the spacer during black display, and the substrate in which the liquid crystal material is enclosed Due to the presence of the spacers between them, the alignment of the liquid crystal molecules in the vicinity of the spacers is disturbed, and light leakage occurs at this part, and the contrast is lowered and the display quality is adversely affected.

As a technique for solving such a problem, a method of forming a photo spacer (protrusion) having a spacer function at a position of a black matrix between pixels by using a photosensitive resin and by a photolithography method has been developed.
FIG. 9 is a partial cross-sectional view of such a color filter for a liquid crystal display device. As shown in FIG. 9, in the color filter (7) for a liquid crystal display device, a black matrix (41), a colored pixel (42), and a transparent conductive film (43) are sequentially formed on a glass substrate (40). A photospacer (44) as a protrusion having a spacer function is formed on the transparent conductive film (43) above the black matrix (41). In the liquid crystal display device using such a color filter (7) for the liquid crystal display device, the photo spacer (44) is formed at a position avoiding the inside of the pixel, and thus the contrast is improved.

In a panel assembling process for attaching a color filter for a liquid crystal display device and a counter substrate to form a panel, a seal portion (not shown) is provided in the peripheral portion, a load is applied between the upper and lower surface plates, and the seal portion and the photo spacer (44) The photo spacer undergoes some elastic deformation due to the load applied at this time, and the gap between the substrates is set in this deformed state.
When the photo spacer (44) is formed at a certain density in the plane, if the cross-sectional area of the photo spacer is small, the gap between the substrates is difficult to be uniform in the panel assembly process, and the liquid crystal display device has uneven color. Since the cross-sectional area of the photo spacer (44) is larger than a certain size, for example, when the height of the photo spacer (44) is about 2 μm to 5 μm which is the inter-substrate gap, the shape is an angle. A round rectangle or rhombus with a horizontal cross section having a diagonal length (12 × 12 μm) to (40 × 40 μm) is used.

In this way, the gap between the substrates is set by the photospacer, but the deformation of the photospacer when a normal load is applied to the panel is reduced, and the photospacer of the photospacer when an excessive load is applied In order to prevent plastic deformation and destruction, the density of the photo spacer may be increased.
However, if the density of the photo spacer is sufficiently high, plastic deformation and destruction can be prevented, but there is a problem that vacuum bubbles (low temperature bubbles) are generated in the panel.

Generation | occurrence | production of a vacuum bubble (low temperature bubble) generate | occur | produces, for example in the case of panel assembly. The members constituting the panel, such as liquid crystal and photo spacers, are once thermally expanded by heating when the substrates are bonded together. All members constituting the liquid crystal cell tend to shrink when the panel after bonding is cooled. Among the constituent members, the contraction rate of the liquid crystal is the largest, so it tends to shrink in the direction of reducing the gap between the substrates.
At this time, if the deformation of the photo spacer cannot follow the amount of change that the gap between the substrates tends to shrink, a negative pressure is generated inside the panel, resulting in the generation of vacuum bubbles (cold bubbles) in the panel. become.

As a technique for increasing the density of the photospacer in order to avoid the generation of low-temperature bubbles during the panel assembly and to prevent plastic deformation and destruction of the photospacer when an excessive load is applied to the panel, there are 2 techniques for increasing the density of the photospacer. A color filter for a liquid crystal display device having a kind of photospacer has been proposed. FIG. 1 is a cross-sectional view schematically showing an example of a color filter for a liquid crystal display device provided with two types of photo spacers. As shown in FIG. 1, in this color filter for a liquid crystal display device, a black matrix (41), a colored pixel (42), a transparent conductive film (43), and a photo spacer are sequentially formed on a glass substrate (40). Is.
The photo spacer is composed of a first photo spacer (Ps-1) and a second photo spacer (Ps-2).

The first photospacer (Ps-1) sets a gap between the substrates. The first photo spacer (Ps-1) is deformed when a load is applied to the panel, and is restored when the load is removed. Moreover, it has the elasticity which deform | transforms following the thermal expansion and thermal contraction of the liquid crystal with temperature.
The second photo spacer (Ps-2) is a photo spacer having a lower height than the first photo spacer (Ps-1). This second photospacer (Ps-2) is for preventing the plastic deformation and destruction of the first photospacer (Ps-1) by dispersing the load when an excessive load is applied to the panel.

  When manufacturing a color filter having a specification in which the photo spacer shown in FIG. 1 is added to the color filter shown in FIG. 11, for example, a second photo spacer (Ps-2) having a particularly large load resistance is required. In the case of using a photoresist of a material different from that used for forming the first photospacer (Ps-1) for forming the second photospacer (Ps-2), the first photospacer (Ps-1) is used. ) And a step of forming the second photospacer (Ps-2) are added to manufacture a color filter having a desired specification. However, in many cases, the same photo resist is used and the first photo spacer (Ps-1) and the second photo spacer (Ps-2) having a lower height than the first photo spacer (Ps-1) are simultaneously used. A color filter is manufactured inexpensively by the forming method.

As a first method of simultaneously forming two types of photo spacers having different heights using the same photoresist, for example, the pattern (opening) on the photomask to be used is narrowed to reduce the light intensity, For example, a method of forming a photo spacer having a low thickness can be used.
FIG. 2 is a cross-sectional view illustrating the first method. As shown in FIG. 2, a photoresist layer (60) is formed on a glass substrate (40) on which a black matrix (41), a colored pixel (42), and a transparent conductive film (43) are sequentially formed. A photomask (PM1) is arranged above the gap (G) for proximity exposure.

The photomask (PM1) is formed with patterns (openings) corresponding to the formation of the first photospacer (Ps-1c) and the second photospacer (Ps-2c). The film surface (51) of the photomask faces the photoresist layer (60). FIG. 2 shows an example in which a negative photoresist is used.
The width (W3) of the pattern (opening) corresponding to the formation of the first photospacer (Ps-1c) on the photomask (PM1) is substantially equal to the width of the formed first photospacer (Ps-1c). Are the same.

  On the other hand, the width (W4) of the pattern (opening) corresponding to the formation of the second photo spacer (Ps-2c) having a height lower than that of the first photo spacer (Ps-1c) is the first photo spacer (Ps-1c). ) Is narrower than the width (W3) of the pattern (opening) corresponding to the formation of () (W3> W4). This is to reduce the light intensity by narrowing the width of the pattern (opening) and to form a photo spacer with a low height.

The advantage of the first method of simultaneously forming two kinds of photo spacers having different heights using the same photoresist is that the second height of the desired height is adjusted by adjusting the width of the opening on the photomask. Since the photospacer (Ps-2c) can be obtained, the structure of the photomask used is simple and inexpensive.
However, the disadvantage of this first method is that the exposure to the photoresist layer (60) is performed so that the first photospacer (Ps-1c) is well formed. -2c) is insufficiently exposed, the bottom of the photoresist layer is not sufficiently cured, and the height of the formed second photospacer (Ps-2c) is increased and formed. The narrow second photospacer (Ps-2c) is easy to peel off from the transparent conductive film (43).

  In addition, a method of forming two types of photo spacers simultaneously using the same photoresist, and providing a difference in height from the glass substrate (40) of the two types of photo spacers, in other words, as a second method, For example, there may be mentioned a method in which an extension portion of a colored pixel is previously laminated at a position where the first photo spacer is provided, and the first photo spacer is formed on this lamination.

FIG. 3 is a cross-sectional view illustrating the second method. As shown in FIG. 3, a glass in which a black matrix (41), a red colored pixel (42R), a green colored pixel (42G), a blue colored pixel (not shown), and a transparent conductive film (43) are sequentially formed. A photoresist layer (60) is formed on the substrate (40), and a photomask (PM2) is disposed thereon with a gap (G) for proximity exposure.
In the black matrix (41), an extended portion of the red colored pixel (42R), an extended portion of the green colored pixel (42G), and a blue colored pixel piece (42Bb) are sequentially provided to form a laminate. The first photospacer (Ps-1d) is formed on this stack.

The photomask (PM2) is formed with patterns (openings) corresponding to the formation of the first photospacer (Ps-1d) and the second photospacer (Ps-2d). The film surface (51) of the photomask faces the photoresist layer (60). FIG. 3 shows an example in which a negative photoresist is used.
The width (W5) of the formed first photo spacer (Ps-1d) and the width (W6) of the formed second photo spacer (Ps-2d) are substantially the same.

However, since the first photospacer (Ps-1d) is formed on the laminate, the height of the two photospacers from the glass substrate (40) has a difference indicated by the reference symbol (H7). .
The width (W5) of the pattern (opening) corresponding to the formation of the first photo spacer (Ps-1d) of the photomask (PM2) is substantially the same as the width of the first photo spacer (Ps-1d) to be formed. It is. The width (W6) of the pattern (opening) corresponding to the formation of the second photospacer (Ps-2d) is substantially the same as the width of the second photospacer (Ps-2d) to be formed.

A second method in which the same photoresist is used, a first photo spacer is provided on a previously formed laminate, and two types of photo spacers having different heights from the glass substrate (40) are simultaneously formed. For example, the width (W6) of the opening can be made substantially the same as the width (W5) of the opening corresponding to the formation of the first photospacer (Ps-1d). The variation in the height of the photo spacer (Ps-2d) is reduced, and the second photo spacer (Ps-2d) is removed from the transparent conductive film (43).
However, the disadvantage of this second method is that the stack width needs to be sufficiently wide in order to make the height (H5) of the first photospacer (Ps-1d) the desired height. In reality, there are significant restrictions from the design aspect.

As shown in FIG. 4, in general, the thickness of the coating film on the photoresist is larger than the thickness (H6) of the coating film on the flat red colored pixel (42R). H5) is thinner (H6> H5).
By making the width (W7) of the stack sufficiently wide, this difference can be reduced and the thickness can be made substantially the same. For example, the width of the black matrix (41) is limited, so It is often impossible to make the width (W7) sufficiently wide.
JP 2003-84289 A JP 2005-84492 A

The present invention has been made to solve the problems of the first method and the second method. The same photoresist is used for the color filter for the liquid crystal display device, and two kinds of different heights are used. In the method for manufacturing a color filter for a liquid crystal display device that forms a photo spacer, the width of the second photo spacer is not made smaller than the width of the first photo spacer, that is, the second photo spacer is not peeled off from the transparent conductive film. It is an object of the present invention to provide a method for manufacturing a color filter for a liquid crystal display device, which can manufacture a color filter without providing a stack under the first photo spacer, that is, without being restricted from the design aspect. Is.
It is another object of the present invention to provide a color filter for a liquid crystal display device manufactured using the method for manufacturing a color filter for a liquid crystal display device.

The present invention relates to a method for producing a color filter for a liquid crystal display device in which two types of photo spacers having different heights are formed by exposure through a photomask to a coating film of the same photoresist and development processing.
[A] 1) As a photomask, it corresponds to the formation of a pattern having a width corresponding to the formation of the first photospacer of the two types of photospacers and the formation of the second photospacer having a height lower than that of the first photospacer. Using the first mask provided with a pattern having a width not narrower than the width of the pattern corresponding to the formation of the first photospacer,
2) First exposure to the coating film of the photoresist for forming the first photo spacer and the second photo spacer provided on the glass substrate on which the colored pixels are formed, and development and post. Bake to form a first photo spacer and a front second photo spacer having the same height as the first photo spacer,
[B] 1) As a photomask, a pattern having a width not corresponding to the width of the pattern corresponding to the formation of the first photospacer corresponding to the formation of the second photospacer having a height lower than that of the first photospacer is provided. Using the second mask
2) The height of the front second photo spacer is made lower than the height of the first photo spacer by the second exposure through the second mask to the front second photo spacer formed on the glass substrate. A method for producing a color filter for a liquid crystal display device, characterized in that a two-photo spacer is formed.

  The present invention is also the method for producing a color filter for a liquid crystal display device according to the above invention, wherein the second exposure is performed before post-baking.

  According to the present invention, in the method for manufacturing a color filter for a liquid crystal display device according to the above invention, the wavelength of the light source for the second exposure is 185 nm and / or 254 nm. Is the method.

  Moreover, this invention is manufactured using the manufacturing method of the color filter for liquid crystal display devices of Claim 1, Claim 2, or Claim 3, The liquid crystal display device color filter characterized by the above-mentioned.

The present invention [A] 1) As a photomask, a pattern having a width corresponding to the formation of the first photospacer and a pattern width corresponding to the formation of the first photospacer corresponding to the formation of the second photospacer Using a first mask provided with a pattern having a width that is not narrower 2) First exposure to the coating film of the photoresist for forming the first photo spacer and the second photo spacer through the first mask, and development , Post-baking, forming a first photo spacer, and a front second photo spacer having the same height as the first photo spacer,
[B] 1) Use a second mask provided with a pattern having a width not narrower than the width of the pattern corresponding to the formation of the first photospacer as the photomask, and 2) a second mask to the previous second photospacer. Since the second exposure via the second photo spacer, the height of the front second photo spacer is lower than the height of the first photo spacer, so that the second photo spacer is formed. This is a method for manufacturing a color filter for a liquid crystal display device, in which a color filter in which a photospacer does not peel from a transparent conductive film can be manufactured without any restrictions from the design aspect.

  In addition, since the present invention is manufactured using the above-described method for manufacturing a color filter for a liquid crystal display device, the second photo spacer manufactured without any restrictions from the design surface is a color filter that does not peel from the transparent conductive film. .

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 8 is a cross-sectional view schematically showing one embodiment of a color filter for a liquid crystal display device manufactured by the method for manufacturing a color filter for a liquid crystal display device according to the present invention. As shown in FIG. 8, this color filter for a liquid crystal display device has a black matrix (41), a colored pixel (42), a transparent conductive film (43), and two kinds of different heights on a glass substrate (40). Photo spacers are sequentially formed.

The photo spacer in this color filter is composed of a first photo spacer (Ps-1e) and a second photo spacer (Ps-2e). The first photo spacer (Ps-1e) sets a gap between the substrates, The second photospacer (Ps-2e) prevents plastic deformation and destruction of the first photospacer (Ps-e) due to an excessive load.
The width (W10) of the second photo spacer (Ps-2e) is not narrower than the width (W9) of the first photo spacer (Ps-1e). FIG. 9 shows the width (W10) and the width (W9). The same example is shown.
The height (H12) of the second photospacer (Ps-2e) is the height of the first photospacer (Ps-1e) by the second exposure to the front second photospacer (Ps-2e ′) described later. It is lower than (H9).

  5 to 7 are cross-sectional views illustrating a method for manufacturing a color filter for a liquid crystal display device according to the present invention. As shown in FIG. 5, a photoresist layer (60) is formed on a glass substrate (40) on which a black matrix (41), a colored pixel (42), and a transparent conductive film (43) are sequentially formed. Is provided with a first exposure mask (PM11) with a gap (G) for proximity exposure.

On the first photomask (PM11), patterns (openings) corresponding to the formation of the first photospacer (Ps-1e) and the second photospacer (Ps-2e) are formed. FIG. 5 shows an example in which a negative photoresist is used.
The width (W9) of the pattern (opening) corresponding to the formation of the first photospacer (Ps-1e) on the first photomask (PM11) is the width of the first photospacer (Ps-1e) to be formed. Is almost the same. The same applies to the width (W10) of the second photospacer (Ps-2e). In FIG. 5, the width (W9) of the pattern (opening) corresponding to the formation of the first photospacer (Ps-1e) and the pattern (opening) corresponding to the formation of the second photospacer (Ps-2e). Have the same width (W10).

In FIG. 6, the development and post-bake performed after the first exposure (L1) are finished, and the first photospacer (Ps-1e) and the front second photospacer (Ps-2e ′) are formed. Steps are shown.
As shown in FIG. 6, on the colored pixel (42) through the transparent conductive film (43), the first photospacer (Ps-1e) having the same width and height and the front second photospacer (Ps). -2e ') is formed (W9 = W10, H9 = H10).

  Thus, the advantage of the manufacturing method of the present invention in which two identical photo spacers are simultaneously formed is that the structure of the photomask used is simple and inexpensive. Also, the photoresist layer (60) is exposed to the same sufficient exposure so that both the first photospacer (Ps-1e) and the front second photospacer (Ps-2e ′) are well formed. Therefore, the photoresist layer is sufficiently cured to the bottom, and both the photo spacers are difficult to peel off from the transparent conductive film (43).

FIG. 7 is a cross-sectional view showing a state of the second exposure (L2). As shown in FIG. 7, a gap (G) for proximity exposure is formed above the glass substrate (40) on which the first photospacer (Ps-1e) and the front second photospacer (Ps-2e ′) are formed. A second photomask (PM12) is provided.
The second photomask (PM12) has a pattern (opening) corresponding to the formation of the second photospacer and having the same width (W10) as the width (W9) of the pattern corresponding to the formation of the first photospacer. Is provided. The portion corresponding to the first photospacer (Ps-1e) has no opening and is shielded from light.

By the second exposure (L2) through the second photomask (PM12), the front second photospacer (Ps-2e ′) starts photodisintegration and is higher than the first photospacer (Ps-1e). The second photo spacer (Ps-2e) is formed (H9> H1).
2).
Further, the width (W10) of the second photospacer (Ps-2e) is not changed by the second exposure (L2) (W9 = W10).

  Thus, according to the method for manufacturing a color filter for a liquid crystal display device according to the present invention, the width of the second photo spacer is not narrower than the width of the first photo spacer, so that the bottom of the photoresist layer is sufficiently cured. The variation in height of the second photo spacer is reduced, and the second photo spacer is difficult to peel off from the transparent conductive film. In addition, since no lamination is provided below the first photospacer, the color filter manufacturing method is not subject to restrictions from the design aspect.

5 to 8, the two photo spacers having different heights have the second photo spacer (Ps-2e) having a height (H12) and the first photo spacer (Ps-1e) having a height (H9). An example in which the width (W9) of the first photospacer (Ps-1e) is the same as the width (W10) of the second photospacer (Ps-2e) is lower (H12 <H9).
However, in the present invention, the width (W10) of the second photospacer (Ps-2e) can be made wider than the width (W9) of the first photospacer (Ps-1e).

  By making the width (W10) of the second photo spacer (Ps-2e) wider than the width (W9) of the first photo spacer (Ps-1e), for example, when an excessive load is applied to the panel, The function of the second photospacer for dispersing the load and preventing the plastic deformation and destruction of the first photospacer is strengthened, and it becomes possible to easily cope with the case where an excessive load is applied to the panel.

As the first photomask, a rectangular pattern (opening) having a size (14 μm × 18 μm) corresponding to the formation of the first photospacer and a size (14 μm × 18 μm) corresponding to the formation of the second photospacer A rectangular pattern (opening) provided was used.
Further, as a photoresist for forming the first photospacer and the second photospacer, JSR Co., Ltd. product: negative photoresist, product number NN810 was used.

The photoresist coating film is provided on a glass substrate at a thickness of 4.0 μm, the proximity exposure gap is set to 120 μm, and the irradiation light from the ultra-high pressure mercury lamp is 150 mJ / through the first photomask. A first exposure giving cm ² was performed.
Development was performed using an alkali-free solution at a development rate of 3.0 μm / min. After the development, a post-baking treatment at 230 ° C. for 40 minutes was performed to obtain a first photospacer and a front second photospacer. The first photospacer and the front second photospacer had the same size (approximately 14 μm × 18 μm) and the same height (approximately 4 μm).

  Next, a second photomask provided with a rectangular pattern (opening) having a size (14 μm × 18 μm) corresponding to the formation of the second photospacer was used. A pattern (opening) is not provided in a portion corresponding to the formation of the first photospacer of the second photomask.

On the glass substrate on which the first photospacer and the front second photospacer are formed, the wavelength of 254 nm from the low-pressure mercury lamp (so-called sterilization lamp) and the distance between the low-pressure mercury lamp and the glass substrate are passed through the second photomask. The first exposure was performed while maintaining 16.5 mm ± 5 mm.
The irradiance was a wavelength of 254 nm: 4.0 mW / cm. FIG. 10 shows the relationship between the irradiation time and the amount of change in the height of the front second photospacer.

It is sectional drawing which showed typically an example of the color filter for liquid crystal display devices which provided two types of photo spacers. It is sectional drawing explaining a 1st method. It is sectional drawing explaining a 2nd method. It is explanatory drawing of the thickness of the coating film of a photoresist. It is sectional drawing explaining the manufacturing method of this invention. FIG. 5 is a cross-sectional view showing a stage where post-baking is completed and a first photo spacer and a front second photo spacer are formed. It is sectional drawing which shows the state of 2nd exposure. It is sectional drawing which showed typically one Example of the color filter for liquid crystal display devices manufactured by the manufacturing method of the color filter for liquid crystal display devices by this invention. It is a fragmentary sectional view of the color filter for liquid crystal display devices in which the photo spacer was formed. It is explanatory drawing which showed the relationship between irradiation time and the variation | change_quantity of the height of a front 2nd photospacer. It is the top view which showed typically an example of the color filter used for a liquid crystal display device. It is sectional drawing in the X-X 'line | wire of the color filter shown in FIG.

Explanation of symbols

4, 7 ... Color filter 40 for liquid crystal display device ... Glass substrate 41 ... Black matrix 41A ... Matrix portion 41B ... Frame portion 42 ... Colored pixel 42Bb ... Blue colored pixel piece 42R ... red colored pixel 42G ... green colored pixel 43 ... transparent conductive film 44 ... photo spacer 60 ... photoresist layer G ... proximity exposure gaps H3, H5, H9 ... Height of first photo spacer H4, H6, H10, H12 ... Height of second photo spacer H10 ... Height of front second photo spacer L ... Exposure light L1 ... First exposure L2 ... Second exposure Ps-1, Ps-1c, Ps-1d... First photospacer Ps-2, Ps-2c, Ps-2d... Second photospacer Ps-1e. In First photo spacer Ps-2e ... Second photo spacer Ps-2e 'in the present invention Second photo spacer in the present invention PM1, PM2 ... Photo mask PM11, PM12 ... First photo mask , Second photomasks W3, W5, W9..., Opening widths W4, W6, W10 corresponding to the formation of the first photo spacer, and opening widths W7 corresponding to the formation of the second photo spacer. -Stack width

Claims (4)

In a method for producing a color filter for a liquid crystal display device in which two types of photo spacers having different heights are formed by exposure through a photomask to the same photoresist coating film and development processing,
[A] 1) As a photomask, it corresponds to the formation of a pattern having a width corresponding to the formation of the first photospacer of the two types of photospacers and the formation of the second photospacer having a height lower than that of the first photospacer. Using the first mask provided with a pattern having a width not narrower than the width of the pattern corresponding to the formation of the first photospacer,
2) First exposure to the coating film of the photoresist for forming the first photo spacer and the second photo spacer provided on the glass substrate on which the colored pixels are formed, and development and post. Bake to form a first photo spacer and a front second photo spacer having the same height as the first photo spacer,
[B] 1) As a photomask, a pattern having a width not corresponding to the width of the pattern corresponding to the formation of the first photospacer corresponding to the formation of the second photospacer having a height lower than that of the first photospacer is provided. Using the second mask
2) The height of the front second photo spacer is made lower than the height of the first photo spacer by the second exposure through the second mask to the front second photo spacer formed on the glass substrate. A method for producing a color filter for a liquid crystal display device, comprising forming a two-photo spacer.   The method of manufacturing a color filter for a liquid crystal display device according to claim 1, wherein the second exposure is performed before post-baking.   The method of manufacturing a color filter for a liquid crystal display device according to claim 1 or 2, wherein the wavelength of the light source for the second exposure is 185 nm and / or 254 nm.   A color filter for a liquid crystal display device produced by using the method for producing a color filter for a liquid crystal display device according to claim 1, 2 or 3.

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