JP5018491B2 - Preform manufacturing method - Google Patents

Preform manufacturing method Download PDF

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JP5018491B2
JP5018491B2 JP2008006065A JP2008006065A JP5018491B2 JP 5018491 B2 JP5018491 B2 JP 5018491B2 JP 2008006065 A JP2008006065 A JP 2008006065A JP 2008006065 A JP2008006065 A JP 2008006065A JP 5018491 B2 JP5018491 B2 JP 5018491B2
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rare earth
quartz pipe
preform
earth element
optical fiber
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JP2009167048A (en
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徹也 春名
学 石川
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Sumitomo Electric Industries Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Lasers (AREA)

Description

本発明は、コア部に希土類元素が添加された光ファイバを製造するのに好適なプリフォームを製造する方法に関するものである。
The present invention relates to a method of manufacturing a suitable preform to produce the fiber-optic which a rare earth element is added to the core unit.

希土類元素添加光ファイバは、コア部に希土類元素（例えばＥｒ元素）が添加された光ファイバであって、光ファイバ増幅器における光増幅媒体として用いられる。一般に、光ファイバは、プリフォームの一端を加熱して線引することで製造される。また、このプリフォームを製造する方法は幾つかあるが、そのうちＭＣＶＤ（Modified Chemical Vapor Deposition）法では、石英パイプの内部に原料ガスを導入するとともに該石英パイプを加熱して、原料ガスから生成されたガラス微粒子を石英パイプの内壁に堆積させて多孔質ガラス層を形成し、Ｃｌガス等のハロゲンガス雰囲気下で多孔質ガラス層を更に加熱して脱水・焼結し透明ガラスとする。   The rare earth element-added optical fiber is an optical fiber in which a rare earth element (for example, Er element) is added to a core portion, and is used as an optical amplification medium in an optical fiber amplifier. Generally, an optical fiber is manufactured by heating and drawing one end of a preform. There are several methods for manufacturing this preform. Among them, in the modified chemical vapor deposition (MCVD) method, a raw material gas is introduced into the quartz pipe and the quartz pipe is heated to produce the preform. The fine glass particles are deposited on the inner wall of the quartz pipe to form a porous glass layer, and the porous glass layer is further heated and dehydrated and sintered in a halogen gas atmosphere such as Cl gas to obtain a transparent glass.

希土類元素添加光ファイバを製造するためのプリフォームをＭＣＶＤ法により製造する際には、上記の堆積工程と脱水工程との間に、希土類元素の塩化物を含む溶液を多孔質ガラスに含浸させる含浸工程が設けられる（特許文献１〜３を参照）。このようにして製造されるプリフォームにおいて、ＭＣＶＤ法により堆積・含浸・脱水・焼結された部分がコア部となり、石英パイプがクラッド部となる。   Impregnation in which porous glass is impregnated with a solution containing a rare earth element chloride between the deposition step and the dehydration step when a preform for manufacturing a rare earth element-doped optical fiber is manufactured by the MCVD method. A process is provided (see Patent Documents 1 to 3). In the preform manufactured in this way, the portion deposited, impregnated, dehydrated and sintered by the MCVD method becomes the core portion, and the quartz pipe becomes the cladding portion.

一方、希土類元素を含む多孔質ガラス層を石英パイプの内壁に形成して、Ｃｌガス等のハロゲンガス雰囲気下で多孔質ガラス層を加熱して脱水・焼結し透明ガラスとする方法も知られている（特許文献４を参照）。
特開平５−３３０８４２号公報 特開平６−２９８５４２号公報 特開平７−０６９６６６号公報 特開平９−０２５１３５号公報 On the other hand, a method is also known in which a porous glass layer containing a rare earth element is formed on the inner wall of a quartz pipe, and the porous glass layer is heated and dehydrated and sintered in a halogen gas atmosphere such as Cl gas to obtain transparent glass. (See Patent Document 4).
JP-A-5-330842 JP-A-6-298542 Japanese Patent Application Laid-Open No. 7-069666 Japanese Patent Laid-Open No. 9-025135

しかし、特許文献１〜３に開示されたプリフォーム製造方法では、堆積工程と脱水工程との間に設けられる含浸工程において含浸量を調整するために、多孔質ガラスの厚みに制約があり、それ故に、製造できるプリフォームサイズに制約があり、生産性が非常に低いという問題がある。   However, in the preform manufacturing methods disclosed in Patent Documents 1 to 3, the thickness of the porous glass is limited in order to adjust the amount of impregnation in the impregnation step provided between the deposition step and the dehydration step. Therefore, there is a problem that the preform size that can be manufactured is limited and the productivity is very low.

一方、特許文献４に開示されたプリフォーム製造方法では、希土類元素をガス状態で供給するので、生産性の点では問題がない。しかし、ガラス微粒子を堆積させて多孔質ガラス層を形成する堆積工程の際の加熱温度は、脱水工程の際の加熱温度より低いことが必要である。それ故、堆積工程の際に、希土類元素を含む有機系の原料ガスの酸化反応が十分に進まず、希土類元素が多孔質ガラス層に取り込まれない。   On the other hand, in the preform manufacturing method disclosed in Patent Document 4, since rare earth elements are supplied in a gas state, there is no problem in terms of productivity. However, the heating temperature in the deposition process in which the glass fine particles are deposited to form the porous glass layer needs to be lower than the heating temperature in the dehydration process. Therefore, during the deposition process, the oxidation reaction of the organic source gas containing the rare earth element does not sufficiently proceed, and the rare earth element is not taken into the porous glass layer.

特に、希土類元素とともにＰ元素が添加された多孔質ガラス層を形成するには、堆積工程の際の加熱温度は更に低いことが必要である。それ故、この場合には、熱源が不安定になって、添加物濃度や堆積速度が変動する、このことから、長手方向に均一なプルフォームを製造することが困難である、という問題もある。   In particular, in order to form a porous glass layer to which a P element is added together with a rare earth element, it is necessary that the heating temperature during the deposition process be further lower. Therefore, in this case, the heat source becomes unstable, the additive concentration and the deposition rate fluctuate, and there is a problem that it is difficult to produce a uniform pull foam in the longitudinal direction. .

本発明は、上記問題点を解消する為になされたものであり、希土類元素およびＰ元素が添加された光ファイバを製造するためのプリフォームを安定して効率よく製造することができるプリフォーム製造方法を提供することを目的とする。
The present invention has been made to solve the above-described problems, and is capable of stably and efficiently producing a preform for producing an optical fiber to which a rare earth element and a P element are added. an object of the present invention is to provide an mETHODS.

本発明に係るプリフォーム製造方法は、Ｐ２Ｏ５を含むガラスを石英パイプの内壁に堆積させる第１工程と、希土類元素を含みＰ２Ｏ５を含まないガラスを石英パイプの内壁に堆積させる第２工程と、を備え、第１工程と第２工程とを交互に繰り返し行って、コア部に希土類元素が添加されたプリフォームを製造することを特徴とする。なお、第１工程において、Ｐ２Ｏ５を含むガラスを石英パイプの内壁に堆積させることを複数回繰返してもよい。また、第２工程において、希土類元素を含みＰ２Ｏ５を含まないガラスを石英パイプの内壁に堆積させることを複数回繰返してもよい。 In the preform manufacturing method according to the present invention, the first step of depositing glass containing P 2 O 5 on the inner wall of the quartz pipe and the glass containing rare earth elements and not containing P 2 O 5 are deposited on the inner wall of the quartz pipe. And a second step, wherein the first step and the second step are alternately repeated to produce a preform in which a rare earth element is added to the core part. In the first step, the deposition of the glass containing P 2 O 5 on the inner wall of the quartz pipe may be repeated a plurality of times. In the second step, the deposition of the glass containing rare earth elements and not containing P 2 O 5 on the inner wall of the quartz pipe may be repeated a plurality of times.

本発明に係るプリフォーム製造方法は、希土類元素がＥｒ元素であるのが好適であり、石英パイプにＦ元素が添加されているのも好適である。また、第１工程において石英パイプを温度１５００℃以下で加熱し、第２工程において石英パイプを温度１８００℃以上で加熱するのが好適である。   In the preform manufacturing method according to the present invention, the rare earth element is preferably an Er element, and it is also preferable that an F element is added to the quartz pipe. Further, it is preferable that the quartz pipe is heated at a temperature of 1500 ° C. or lower in the first step, and the quartz pipe is heated at a temperature of 1800 ° C. or higher in the second step.

本発明によれば、希土類元素およびＰ元素が添加された光ファイバを製造するためのプリフォームを安定して効率よく製造することができるプリフォーム製造方法を提供することができる。 According to the present invention, it is possible to provide a preform manufacturing how that can be efficiently produced a preform for manufacturing an optical fiber with a rare earth element and P element is added stably.

以下、添付図面を参照して、本発明を実施するための最良の形態を詳細に説明する。なお、図面の説明において同一の要素には同一の符号を付し、重複する説明を省略する。   The best mode for carrying out the present invention will be described below in detail with reference to the accompanying drawings. In the description of the drawings, the same elements are denoted by the same reference numerals, and redundant description is omitted.

図１は、一般的なＭＣＶＤ法を説明する図である。ＭＣＶＤ法では、石英パイプ１１の一端から内部に原料ガスを導入するとともに、該石英パイプ１１をバーナ２１により加熱する。このとき、石英パイプ１１の一端から他端へ向けてバーナ２１を移動させる。石英パイプ１１にはＦ元素が添加されていてもよい。この加熱により原料ガスからガラス微粒子が生成され、そのガラス微粒子が石英パイプ１１の内壁に堆積されて多孔質ガラス層１２となる。バーナ２１の移動によって多孔質ガラス層１２が更に加熱されて脱水・焼結され透明ガラス１３とされる。石英パイプ１１の内部に導入される原料ガスには、例えば、ＳｉＣｌ４ガス、Ｅｒ（Ｃ１１Ｈ１９Ｏ２）３ガス、ＡｌＣｌ３ガス、ＰＯＣｌ３ガス、Ｈｅガス、Ｏ２ガスおよびＣｌ２ガスの何れかが必要に応じて含まれる。 FIG. 1 is a diagram for explaining a general MCVD method. In the MCVD method, a raw material gas is introduced from one end of the quartz pipe 11 and the quartz pipe 11 is heated by a burner 21. At this time, the burner 21 is moved from one end of the quartz pipe 11 toward the other end. F element may be added to the quartz pipe 11. By this heating, glass fine particles are generated from the raw material gas, and the glass fine particles are deposited on the inner wall of the quartz pipe 11 to form the porous glass layer 12. Due to the movement of the burner 21, the porous glass layer 12 is further heated, dehydrated and sintered to form the transparent glass 13. Examples of the raw material gas introduced into the quartz pipe 11 include SiCl 4 gas, Er (C 11 H 19 O 2 ) 3 gas, AlCl 3 gas, POCl 3 gas, He gas, O 2 gas, and Cl 2 gas. Is included as necessary.

図２は、実施例および比較例それぞれのプリフォーム製造方法の工程を示す図表である。比較例１，２では、第１〜１１回のスス付け（バーナ２１のトラバース）の全てにおいて、Ｅｒ元素，Ａｌ２Ｏ３およびＰ２Ｏ５を含むＳｉＯ２からなるガラス微粒子を石英パイプ１１の内壁に堆積させる工程（以下「ＥＡＰ工程」という。）を行った。実施例１では、第１，５，９回それぞれにおいて、Ｅｒ元素およびＡｌ２Ｏ３を含むＳｉＯ２からなるガラス微粒子を石英パイプ１１の内壁に堆積させる工程（以下「ＥＡ工程」という。）を行い、第２〜４，６〜８，１０，１１回それぞれにおいて、Ｐ２Ｏ５を含むＳｉＯ２からなるガラス微粒子を石英パイプ１１の内壁に堆積させる工程（以下「Ｐ工程」という。）を行った。また、実施例２では、第１，７，１３回それぞれにおいてＥＡ工程を行い、第２〜６，８〜１２，１４〜１６回それぞれにおいてＰ工程を行った。 FIG. 2 is a chart showing the steps of the preform manufacturing method for each of the examples and comparative examples. In Comparative Examples 1 and 2, glass particles made of SiO 2 containing Er element, Al 2 O 3, and P 2 O 5 were used for the quartz pipe 11 in all of the first to 11th sooting (traverse of the burner 21). A process of depositing on the inner wall (hereinafter referred to as “EAP process”) was performed. In Example 1, in each of the first, fifth, and ninth times, a step of depositing glass fine particles made of SiO 2 containing Er element and Al 2 O 3 on the inner wall of the quartz pipe 11 (hereinafter referred to as “EA step”). And a step of depositing glass particles made of SiO 2 containing P 2 O 5 on the inner wall of the quartz pipe 11 (hereinafter referred to as “P step”) in the second to fourth, sixth to eighth, tenth and eleventh times. went. Moreover, in Example 2, the EA process was performed in each of the first, seventh and thirteenth times, and the P process was performed in each of the second to sixth, eighth to twelfth and fourteenth to sixteenth times.

なお、Ｐ工程は、Ｐ２Ｏ５を含むガラスを石英パイプの内壁に堆積させる第１工程に相当する。また、ＥＡ工程は、希土類元素を含みＰ２Ｏ５を含まないガラスを石英パイプの内壁に堆積させる第２工程に相当する。 The P process corresponds to a first process of depositing glass containing P 2 O 5 on the inner wall of the quartz pipe. The EA step corresponds to a second step of depositing glass containing rare earth elements and not containing P 2 O 5 on the inner wall of the quartz pipe.

実施例１，２および比較例１，２の各工程において、バーナ２１として酸水素バーナを用い、バーナ２１の移動速度を１２０mm/minとした。比較例１，２それぞれのプリフォーム製造方法におけるＥＡＰ工程の条件は図３に示されている。ＥＡＰ工程では、バーナ２１による石英パイプ１１の加熱温度は、比較例１では１５００℃であり、比較例２では１２００℃であった。実施例１，２それぞれのプリフォーム製造方法におけるＥＡ工程の条件は図４に示されている。実施例１，２におけるＥＡ工程では、バーナ２１による石英パイプ１１の加熱温度は１８００℃であった。また、実施例１，２それぞれのプリフォーム製造方法におけるＰ工程の条件は図５に示されている。実施例１，２におけるＰ工程では、バーナ２１による石英パイプ１１の加熱温度は１１００℃であった。   In each process of Examples 1 and 2 and Comparative Examples 1 and 2, an oxyhydrogen burner was used as the burner 21, and the moving speed of the burner 21 was set to 120 mm / min. The conditions of the EAP process in the preform manufacturing methods of Comparative Examples 1 and 2 are shown in FIG. In the EAP process, the heating temperature of the quartz pipe 11 by the burner 21 was 1500 ° C. in Comparative Example 1 and 1200 ° C. in Comparative Example 2. The conditions of the EA process in the preform manufacturing methods of Examples 1 and 2 are shown in FIG. In the EA process in Examples 1 and 2, the heating temperature of the quartz pipe 11 by the burner 21 was 1800 ° C. Moreover, the conditions of P process in each preform manufacturing method of Example 1, 2 are shown by FIG. In the P process in Examples 1 and 2, the heating temperature of the quartz pipe 11 by the burner 21 was 1100 ° C.

図６は、実施例および比較例それぞれのプリフォーム製造方法により製造されたプリフォームのコア部におけるＰ元素濃度，Ａｌ元素濃度およびＥｒ元素濃度を纏めた図表である。比較例１では、Ｐ元素濃度は４.５wt％であり、Ａｌ元素濃度は１.０wt％であり、Ｅｒ元素濃度は３０wtppmであった。比較例２では、Ｐ元素濃度は４.３wt％であり、Ａｌ元素濃度は１.１wt％であり、Ｅｒ元素濃度は１００wtppmであった。実施例１では、Ｐ元素濃度は３.０wt％であり、Ａｌ元素濃度は０.９wt％であり、Ｅｒ元素濃度は５００wtppmであった。また、実施例２では、Ｐ元素濃度は５.８wt％であり、Ａｌ元素濃度は０.９wt％であり、Ｅｒ元素濃度は２０００wtppmであった。   FIG. 6 is a table summarizing the P element concentration, Al element concentration, and Er element concentration in the core portion of the preform manufactured by the preform manufacturing method of each of the examples and comparative examples. In Comparative Example 1, the P element concentration was 4.5 wt%, the Al element concentration was 1.0 wt%, and the Er element concentration was 30 wtppm. In Comparative Example 2, the P element concentration was 4.3 wt%, the Al element concentration was 1.1 wt%, and the Er element concentration was 100 wtppm. In Example 1, the P element concentration was 3.0 wt%, the Al element concentration was 0.9 wt%, and the Er element concentration was 500 wtppm. In Example 2, the P element concentration was 5.8 wt%, the Al element concentration was 0.9 wt%, and the Er element concentration was 2000 wtppm.

以上のように、比較例１，２では、Ｅｒ元素，Ａｌ元素およびＰ元素を同時に添加する工程を一括で行っても、Ｅｒ元素は高々１００wtppm程度しか添加できない。これに対して、実施例１，２のように、Ｅｒ元素添加する工程とＰ元素添加工程とを分けることで、Ｅｒ元素およびＰ元素を共添加した希土類元素添加ファイバ用のガラスプリフォームを製造できることが分かる。   As described above, in Comparative Examples 1 and 2, even if the process of simultaneously adding the Er element, Al element, and P element is performed at a time, the Er element can be added only at most about 100 wtppm. On the other hand, as in Examples 1 and 2, a glass preform for a rare earth element-doped fiber in which an Er element and a P element are co-doped is manufactured by separating the Er element adding process and the P element adding process. I understand that I can do it.

また、実施例１，２では、Ｅｒ元素添加する工程とＰ元素添加工程とを交互に行うので、生産性を高めることができる。また、これらを高温で処理することができるので熱源が安定化され、添加物濃度や堆積速度の変動が抑制されて、長手方向に均一なプルフォームを容易に製造することができる。   In Examples 1 and 2, since the Er element addition step and the P element addition step are alternately performed, productivity can be improved. Further, since these can be processed at a high temperature, the heat source is stabilized, fluctuations in additive concentration and deposition rate are suppressed, and a uniform uniform foam can be easily produced in the longitudinal direction.

図７は、本実施形態に係る光ファイバ増幅器３０の構成図である。この図に示される光ファイバ増幅器３０は、希土類元素添加光ファイバ３１、励起光源３２、光結合部３３および光アイソレータ３４を備える。   FIG. 7 is a configuration diagram of the optical fiber amplifier 30 according to the present embodiment. The optical fiber amplifier 30 shown in this figure includes a rare earth element-doped optical fiber 31, a pumping light source 32, an optical coupling portion 33, and an optical isolator 34.

希土類元素添加光ファイバ３１はコア部とクラッド部とを備え、そのコア部は、Ｐ元素濃度が３wt％以上であり、Ａｌ元素濃度が０.３wt％以上であり、希土類元素濃度が５００wtppm以上である。クラッド部は、コア部を取り囲み、コア部の屈折率より低い屈折率を有する。この希土類元素添加光ファイバ３１は、上述したプリフォーム製造方法により製造されたプリフォームを線引することで得られる。コア部に添加される希土類元素はＥｒ元素であるのが好適であり、また、クラッド部にＦ元素が添加されているのも好適である。希土類元素添加光ファイバ３１は、波長範囲１５６０ｎｍ〜１６２５ｎｍを含む波長範囲において利得を有するのが好適である。   The rare earth element-doped optical fiber 31 includes a core part and a cladding part. The core part has a P element concentration of 3 wt% or more, an Al element concentration of 0.3 wt% or more, and a rare earth element concentration of 500 wt ppm or more. is there. The clad portion surrounds the core portion and has a refractive index lower than that of the core portion. This rare earth element-doped optical fiber 31 is obtained by drawing a preform manufactured by the above-described preform manufacturing method. The rare earth element added to the core is preferably an Er element, and it is also preferable that an F element is added to the cladding. The rare earth element-doped optical fiber 31 preferably has a gain in a wavelength range including a wavelength range of 1560 nm to 1625 nm.

励起光源３２は、希土類元素添加光ファイバ３１のコア部に添加された希土類元素を励起し得る波長の励起光を出力する。光結合部３３は、励起光源３２から出力された励起光を希土類元素添加光ファイバ３１に供給するとともに、希土類元素添加光ファイバ３１から出力された信号光を入力して出射端１ｂへ出力する。光アイソレータ３４は、入射端１ａと希土類元素添加光ファイバ３１との間に設けられ、順方向に光を通過させるが、逆方向には光を通過させない。   The pumping light source 32 outputs pumping light having a wavelength that can pump the rare earth element added to the core of the rare earth element-doped optical fiber 31. The optical coupling unit 33 supplies the pumping light output from the pumping light source 32 to the rare earth element-doped optical fiber 31, inputs the signal light output from the rare earth element added optical fiber 31, and outputs the signal light to the emission end 1b. The optical isolator 34 is provided between the incident end 1a and the rare earth element-doped optical fiber 31, and allows light to pass in the forward direction but does not allow light to pass in the reverse direction.

この光ファイバ増幅器３１では、励起光源３２から出力された励起光は、光結合部３３を経て、希土類元素添加光ファイバ３１に供給される。入射端１ａに入力された信号光は、光アイソレータ３４を経て希土類元素添加光ファイバ３１に入力され、この希土類元素添加光ファイバ３１において光増幅される。この光増幅された信号光は、光結合部３３を経て出射端１ｂから外部へ出力される。この光ファイバ増幅器３１は、広帯域で信号光を光増幅することができる。   In the optical fiber amplifier 31, the pumping light output from the pumping light source 32 is supplied to the rare earth element-doped optical fiber 31 through the optical coupling unit 33. The signal light input to the incident end 1 a is input to the rare earth element-doped optical fiber 31 through the optical isolator 34, and is optically amplified in the rare earth element doped optical fiber 31. The optically amplified signal light is output to the outside from the emission end 1b via the optical coupling unit 33. The optical fiber amplifier 31 can optically amplify signal light over a wide band.

一般的なＭＣＶＤ法を説明する図である。It is a figure explaining the general MCVD method. 実施例および比較例それぞれのプリフォーム製造方法の工程を示す図表である。It is a graph which shows the process of the preform manufacturing method of an Example and each comparative example. 比較例１，２それぞれのプリフォーム製造方法におけるＥＡＰ工程の条件を示す図表である。It is a graph which shows the conditions of the EAP process in the preform manufacturing method of each of Comparative Examples 1 and 2. 実施例１，２それぞれのプリフォーム製造方法におけるＥＡ工程の条件を示す図表である。It is a graph which shows the conditions of the EA process in the preform manufacturing method of each of Examples 1 and 2. 実施例１，２それぞれのプリフォーム製造方法におけるＰ工程の条件を示す図表である。It is a table | surface which shows the conditions of P process in the preform manufacturing method of each of Example 1,2. 実施例および比較例それぞれのプリフォーム製造方法により製造されたプリフォームのコア部におけるＰ元素濃度，Ａｌ元素濃度およびＥｒ元素濃度を纏めた図表である。5 is a table summarizing P element concentration, Al element concentration and Er element concentration in a core portion of a preform manufactured by a preform manufacturing method of each of Examples and Comparative Examples. 本実施形態に係る光ファイバ増幅器１の構成図である。It is a block diagram of the optical fiber amplifier 1 which concerns on this embodiment.

符号の説明Explanation of symbols

１１…石英パイプ、１２…多孔質ガラス層、１３…透明ガラス層、２１…バーナ、３０…光ファイバ増幅器、３１…希土類元素添加光ファイバ、３２…励起光源、３３…光結合部、３４…光アイソレータ。
DESCRIPTION OF SYMBOLS 11 ... Quartz pipe, 12 ... Porous glass layer, 13 ... Transparent glass layer, 21 ... Burner, 30 ... Optical fiber amplifier, 31 ... Rare earth element addition optical fiber, 32 ... Excitation light source, 33 ... Optical coupling part, 34 ... Light Isolator.

Claims (4)

Ｐ２Ｏ５を含むガラスを石英パイプの内壁に堆積させる第１工程と、希土類元素を含みＰ２Ｏ５を含まないガラスを前記石英パイプの内壁に堆積させる第２工程と、を備え、
前記第１工程と前記第２工程とを交互に繰り返し行って、コア部に希土類元素が添加されたプリフォームを製造する、
ことを特徴とするプリフォーム製造方法。 Comprising a first step of depositing a glass containing P 2 O 5 to the inner wall of the quartz pipe, and a second step of depositing a glass containing no P 2 O 5 comprises a rare earth element to the inner wall of the quartz pipe, and
The first step and the second step are alternately repeated to produce a preform in which a rare earth element is added to the core part,
The preform manufacturing method characterized by the above-mentioned. 前記希土類元素がＥｒ元素であることを特徴とする請求項１記載のプリフォーム製造方法。   The preform manufacturing method according to claim 1, wherein the rare earth element is an Er element. 前記石英パイプにＦ元素が添加されていることを特徴とする請求項１記載のプリフォーム製造方法。   The preform manufacturing method according to claim 1, wherein an element F is added to the quartz pipe. 前記第１工程において前記石英パイプを温度１５００℃以下で加熱し、
前記第２工程において前記石英パイプを温度１８００℃以上で加熱する、
ことを特徴とする請求項１記載のプリフォーム製造方法。
Heating the quartz pipe at a temperature of 1500 ° C. or lower in the first step;
Heating the quartz pipe at a temperature of 1800 ° C. or higher in the second step;
The preform manufacturing method according to claim 1.
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