JP4978153B2 - Manufacturing method of color filter for transflective liquid crystal display device - Google Patents

Description

  The present invention relates to a method for manufacturing a color filter for a transflective liquid crystal display device in which the thickness of a colored layer in a reflected light region can be easily controlled.

  In recent years, a transflective liquid crystal display device utilizing external light reflection and backlight transmitted light has been developed as a liquid crystal display device. The transflective liquid crystal display device uses external light to display. The conventional reflective color liquid crystal display device is advantageous in that it also has a backlight and can perform display (transmission display) using the backlight even when the surroundings are dark. However, in the color filter used in such a transflective liquid crystal display device, since the external light passes through the colored layer twice as incident light and reflected light, the color of the reflected light region that is displayed by the external light In some cases, there is a problem that the characteristics and the color characteristics of the transmitted light region where the display is performed by the backlight light are different.

  In order to solve such a problem, for example, a method of forming a thick colored layer in the transmitted light region and forming a thin colored layer in the reflected light region, etc. A method of forming a layer has been adopted. As such a method, for example, a method has been proposed in which a transparent resin layer is formed on a substrate in a region for reflected light, and a colored layer is formed so as to cover the transparent resin layer (Patent Document 1 and Patent Document 2). According to this method, the thickness of the colored layer formed on the transparent resin layer can be reduced, and the thickness of the colored layer in the reflected light region and the thickness of the colored layer in the transmitted light region. And the color characteristics of each region can be adjusted. Further, at this time, the cell gap when the color filter is disposed facing the counter substrate is adjusted by the step generated on the colored layer surface between the reflected light region and the transmitted light region, and the reflected light region and the transmitted light are adjusted. There is also an advantage that the optical path difference of light in the service area can be adjusted.

  However, when the above method is used, the colored layer formed in the reflected light region is thinner than the colored layer formed in the transmitted light region, but is sufficiently thin. However, there is a problem that it is difficult to increase the brightness of the reflected light region.

JP 2004-85986 A JP 2003-57433 A

  Therefore, it is desired to provide a method for manufacturing a color filter for a transflective liquid crystal display device, which can easily control the thickness of the colored layer in the reflected light region.

  The present invention comprises a base material, a transparent resin layer formed in a pattern on the base material, and a colored layer formed so as to cover the base material and the transparent resin layer, A region where the transparent resin layer and the colored layer are laminated in this order is used as a reflected light region, and a region where the base material and the colored layer are laminated in this order is used as a transmitted light region. A method for producing a color filter for a transflective liquid crystal display device to be used, wherein a transparent resin layer forming step of forming a patterned transparent resin layer on the substrate, and coloring on the substrate and the transparent resin layer A colored layer forming step of applying a layer forming coating liquid to form a patterned colored layer, a transparent resin layer formed by the transparent resin layer forming step, and a colored layer formed by the colored layer forming step And post-baking process to post-bake at the same time Has, in the post-baking step, to provide a method of manufacturing a transflective color filter for a liquid crystal display device characterized by deflating the transparent resin layer.

  In the present invention, the colored layer is formed on the transparent resin layer after shrinkage by applying the colored layer forming coating solution onto the thick transparent resin layer before being post-baked in the colored layer forming step. Compared with the case where the coating liquid for coating is applied, it is possible to form the colored layer forming coating liquid on the transparent resin layer thinner. Therefore, by performing the post-baking step of post-baking the transparent resin layer and the colored layer at the same time, a colored layer having a thinner film thickness can be formed on the transparent resin layer. Therefore, it is possible to manufacture a color filter for a transflective liquid crystal display device in which the luminance in the reflected light region is high and high-quality color display is possible.

  Moreover, in this invention, it is preferable to have the different colored layer formation process which forms the different colored layer of the color different from the colored layer formed at the said colored layer formation process in the pattern after the said post-baking process. As a result, since the different colored layer is formed on the transparent resin layer after the post-baking, the colored layer and the different colored layer can be formed on the transparent resin layers having different thicknesses. It becomes possible to control the thickness of the colored layer in the light region for each color.

  Furthermore, in this invention, it is preferable that the shrinkage rate of the transparent resin layer in the said post-baking process exists in the range of 50%-85%. Thereby, the transparent resin layer can be formed thicker in the transparent resin layer forming step, and the colored layer can be formed thinner on the transparent resin layer.

  According to the present invention, since the colored layer in the reflected light region can be formed thin, it is possible to produce a color filter for a transflective liquid crystal display device with high brightness in the reflected light region.

  Hereinafter, the manufacturing method of the color filter for transflective liquid crystal display devices of the present invention will be described in detail.

  A method for producing a color filter for a transflective liquid crystal display device according to the present invention is formed so as to cover a base material, a transparent resin layer formed in a pattern on the base material, and the base material and the transparent resin layer. A region where the base material, the transparent resin layer, and the colored layer are laminated in this order is used as a reflected light region, and the base material and the colored layer are A method for producing a color filter for a transflective liquid crystal display device using a region laminated in this order as a region for transmitted light, wherein the transparent resin layer forming step of forming the patterned transparent resin layer on the substrate A colored layer forming step of applying a colored layer forming coating solution on the substrate and the transparent resin layer to form a patterned colored layer; and a transparent resin layer formed by the transparent resin layer forming step The colored layer formed by the colored layer forming step Simultaneously and a post-baking step of post-baking, in the post-baking step, characterized in that to shrink the transparent resin layer.

  In the method for producing a color filter for a transflective liquid crystal display device of the present invention, for example, as shown in FIG. 1, a transparent resin layer forming step (FIG. (A)), and a colored layer forming step (FIG. 1 (b)) for applying a colored layer forming coating solution on the substrate 1 and the transparent resin layer 2 to form a patterned colored layer 3; And a post-baking step (FIG. 1C) for post-baking the transparent resin layer 2 and the colored layer 3 simultaneously. Here, a region where the base material 1, the transparent resin layer 2, and the colored layer 3 are laminated is a reflected light region r, and a region where the base material 1 and the colored layer 3 are formed is a transmitted light region t.

Generally, when forming a colored layer on a transparent resin layer for the purpose of forming a colored layer with a thin film thickness in the reflected light region, after the post baking of the transparent resin layer, the colored layer is formed on the transparent resin layer. The method of apply | coating the coating liquid and forming a colored layer is employ | adopted. Therefore, the colored layer forming coating solution is applied onto the transparent resin layer shrunk by post-baking.
On the other hand, in the present invention, post-baking with respect to the transparent resin layer is performed together with post-baking with respect to the colored layer after coating the colored layer forming coating solution on the transparent resin layer to form the colored layer. As a result, the transparent resin layer to which the colored layer forming coating solution is applied is in a non-shrinkable state before post-baking, and therefore has a thicker transparent resin layer than the transparent resin layer after post-baking. The colored layer forming coating solution is applied on top. As a result, the thickness of the colored layer forming coating liquid applied on the transparent resin layer can be reduced. The thicker the transparent resin layer, the thinner the colored layer forming coating solution on the transparent resin layer when a fluid coating solution such as the colored layer forming coating solution is applied. This is because the film thickness of the colored layer forming coating solution remaining on the transparent resin layer can be reduced.
Then, after the colored layer forming step, the transparent resin layer shrinks by performing a post-baking step in which the colored layer and the transparent resin layer are simultaneously post-baked, and as a result, the thin colored film is formed on the transparent resin layer. A layer can be formed. Therefore, a thin colored layer can be formed on the reflected light region, and a color filter for a transflective liquid crystal display device with high brightness in the reflected light region can be formed.
Hereafter, each process of the manufacturing method of the color filter for transflective liquid crystal display devices of this invention is demonstrated in detail.

1. Transparent resin layer formation process First, the transparent resin layer formation process in this invention is demonstrated. The transparent resin layer forming step in the present invention is a step of forming the transparent resin layer in a pattern only on the reflected light region of the substrate. The method for forming the transparent resin layer in a pattern by this step is not particularly limited as long as the transparent resin layer can be formed on the reflected light region of the base material. For example, the photosensitive resin A coating solution for forming a transparent resin layer containing, can be applied by a general coating method such as a spin coating method or a die coating method, and then exposed to a pattern and developed.

  The transparent resin layer formed by this process will not be specifically limited if the target shrinkage rate can be obtained in the post-baking process mentioned later. Such a transparent resin layer preferably has a shrinkage rate obtained in a post-bake process described later in the range of 50% to 85%, more preferably in the range of 50% to 80%, and particularly 50% to 70%. %, More preferably in the range of 50% to 60%. By having the shrinkage rate within the above range, the transparent resin layer formed in this step can be made thicker, and a thinner colored layer can be formed in the colored layer forming step described later. Because it can be done. The shrinkage rate is a value expressed as a percentage of (film thickness of the transparent resin layer after post-baking) / (film thickness of the transparent resin layer before post-baking).

  In this step, as the transparent resin layer forming coating solution used for forming the transparent resin layer, the obtained transparent resin layer has a high visible light transmittance, and the resulting transparent resin layer is a post-bake step described later. There is no particular limitation as long as the desired shrinkage can be obtained. Examples of the material constituting such a coating solution for forming a transparent resin layer include a photosensitive resin, a photopolymerization initiator, and a solvent.

  Examples of the photosensitive resin contained in the coating solution for forming a transparent resin layer used in this step include polymerizable monomer components and polymer components. Examples of the monomer component include 1,4-butanediol diacrylate, diethylene glycol diacrylate, neopentyl glycol diacrylate, pentaerythritol triacrylate, trimethylolpropane triacrylate, pentaerythritol acrylate, dipentaerythritol hexaacrylate, and pentaerythritol penta Acrylates such as acrylates and melamines; alkylol melamines such as N, N-dimethylolmelamine, N, N, N ′, N′-tetramethylolmelamine, hexamethylolmelamine, hexa-n-butyrololmelamine; N , N-di (methoxymethyl) melamine, N, N, N ′,-tetra (methoxymethyl) melamine, hexa (methoxymethyl) melamine, hexa (n-but Shimechiru) include alkoxy melamines such as melamine such as melamine, among others melamines are preferred, alkylol melamines and the like are preferable. This is because the alkylol melamines are heat-condensed and alcohols such as methanol and ethanol are volatilized, resulting in a high shrinkage rate.

  Examples of the polymer component include epoxy acrylates such as o-cresol novolak epoxy acrylate and phenol novolak epoxy acrylate; polyester acrylate; polyurethane acrylate; polyether acrylate; oligomer acrylate; alkyd acrylate; polyol acrylate; An acid copolymer etc. are mentioned.

In this step, the mass ratio of the monomer component to the polymer component in the transparent resin layer forming coating liquid is such that the mass of the polymer component is 0.3 to 1 when the mass of the monomer component is 1. .2 in the range of 0.5 to 1.0, and particularly preferably in the range of 0.5 to 0.8. Thereby, in the post-bake process to be described later, since the shrinkage rate of the transparent resin layer can be increased, it is possible to form a thicker transparent resin layer in this process. .
Here, the mass of the polymer component and the mass of the monomer component indicate the total content of each component. For example, when two or more types of monomers are used for the monomer component, the total monomer component Means the mass of

  Further, examples of the photopolymerization initiator include benzophenone, Irgacure 184, Irgacure 369, Irgacure 651, Irgacure 907, Darocur (all trade names of Ciba Specialty Chemicals).

  Furthermore, as the solvent, 3-methoxybutyl acetate, propylene glycol monomethyl ether acetate as an acetate type, diethylene glycol ethyl ether, diethylene glycol dimethyl ether as an ethylene glycol type, ethyl-3 ethoxypropionate as a propionic acid ester type, etc. Can be mentioned.

  The film thickness of the transparent resin layer formed in this step is such that the colored layer can be thinly formed to such an extent that the display quality is not impaired, and the optical path in the reflected light region and the transmitted light region after the post-bake step described later The film thickness is not particularly limited as long as the difference can be controlled, and is appropriately selected depending on the shrinkage ratio of the transparent resin layer in the post-bake process described later, the use of the color filter for the transflective liquid crystal display device, and the like. . Specifically, the film thickness of such a transparent resin layer is preferably in the range of 1.0 μm to 8.0 μm, more preferably in the range of 3.0 μm to 7.0 μm, particularly 4.0 μm to 6. It is preferable to be in the range of 0 μm. If the film thickness of the transparent resin layer exceeds the above range, the color layer formed on the transparent resin layer is too thin, and the color filter for a transflective liquid crystal display device is used as a transflective liquid crystal display device. This is because the display quality may be degraded. Further, if the film thickness of the transparent resin layer is less than the above range, it is difficult to form the colored layer formed on the transparent resin layer to have a desired thin film thickness, and for a transflective liquid crystal display device. This is because when the color filter is a transflective liquid crystal display device, the brightness in the reflected light region may not be good.

  In this step, as a method for exposing and developing the transparent resin layer forming coating solution applied on the substrate, a method capable of forming the transparent resin layer in a pattern on the reflected light region of the substrate If it is, it will not specifically limit, It can be the same as that at the time of forming the transparent resin layer in the pattern color in the general color filter for transflective liquid crystal display devices.

  Moreover, the base material used in this step is not particularly limited as long as it can form the transparent resin layer and the colored layer, and is a substrate transparent to visible light. It can be the same as the base material used for the color filter for liquid crystal display devices.

  Specifically, in the above-mentioned base material, a flexible rigid material such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate or the like, or a flexible resin film, optical resin plate, etc. The transparent flexible material etc. which have are mentioned.

2. Colored layer forming step Next, the colored layer forming step in the present invention will be described. The colored layer forming step in the present invention is a step of applying a colored layer forming coating solution on the substrate and the transparent resin layer to form a patterned colored layer. In this step, as a method for applying the colored layer forming coating solution and forming the colored layer in a pattern, for example, the colored layer forming coating solution containing a photosensitive resin is applied on the substrate and the transparent resin layer. After coating so as to cover, the coloring layer forming coating solution may be exposed to a pattern and developed.

  The colored layer forming coating liquid used in this step is not particularly limited as long as it has an appropriate fluidity, and the colored layer of a color filter for a general transflective liquid crystal display device is formed. It can be the same as that used in the above. Examples of such a coating solution for forming a colored layer include those containing a photosensitive resin, a colorant such as a pigment, and various additives.

  The method for applying the colored layer forming coating solution in this step is not particularly limited as long as it is a method capable of applying the colored layer forming coating solution on the substrate and the transparent resin layer. For example, a general coating method such as a spin coating method, a die coating method, or a printing method can be used.

  Further, the method for pattern exposure and development of the coating solution for forming a colored layer containing a photosensitive resin is not particularly limited, and a colored layer of a general color filter for a transflective liquid crystal display device is formed. It can be the same as the method used when doing.

  In addition, the colored layer formed in this process should just consist of at least 1 color, for example, may consist of 2 colors, and may consist of all colors. In the case of forming two or more colored layers, this step is repeated for each color of the colored layer before the post-baking step described later.

3. Post-bake process Next, the post-bake process in the present invention will be described. This step is a step of simultaneously post-baking the transparent resin layer formed in a pattern on the substrate and a colored layer formed so as to cover the substrate and the transparent resin layer. 1 (c), a transparent resin layer 2 formed in a pattern on a substrate 1 and a colored layer 3 formed so as to cover the substrate 1 and the transparent resin layer 2 are simultaneously posted. By baking, the transparent resin layer 2 can be contracted. Thereby, this process has the advantage that the colored layer 3 can be formed thinner on the transparent resin layer 2.

  In this step, the heating conditions when post-baking the colored layer and the transparent resin layer are aimed at the transparent resin layer and the colored layer formed so as to cover the substrate and the transparent resin layer. The conditions are not particularly limited as long as the film can be contracted to the film thickness, and the same conditions as the post-baking (firing) conditions in a general method for manufacturing a color filter for a transflective liquid crystal display device are used. Can do. In the present invention, it is particularly preferable to set the heating temperature during post-baking high. This is because a higher shrinkage rate can be achieved. As such heating conditions, it is particularly preferable to set the temperature within the range of 150 ° C. to 250 ° C., and it is particularly preferable to set the temperature within the range of 200 ° C. to 250 ° C., particularly within the range of 230 ° C. to 250 ° C.

  In addition, the film thickness after shrinkage of the transparent resin layer in this step is usually in the range of 0.5 μm to 5.0 μm, and particularly in the range of 2.0 μm to 4.5 μm, particularly 2.5 μm to 3 It is preferable to be within the range of 5 μm.

  Further, in this step, the thickness of the colored layer formed on the substrate, that is, the post-baking thickness of the colored layer in the transmitted light region, is preferably in the range of 1.0 μm to 6.0 μm, Among these, it is preferable to be in the range of 1.5 μm to 5.0 μm, particularly in the range of 1.5 μm to 3.0 μm.

  In this step, the thickness of the colored layer on the transparent resin layer, that is, the post-baking thickness of the colored layer in the reflected light region is preferably in the range of 0.1 μm to 2.0 μm. It is preferably in the range of 2 μm to 1.0 μm, particularly in the range of 0.3 μm to 0.7 μm. When the color layer on the transparent resin layer is within the above range, the luminance in the reflected light region may be high when the color filter for a transflective liquid crystal display device is used in a transflective liquid crystal display device. Because it can.

  Furthermore, when the film thickness of the colored layer after post-baking in the transmitted light region is 1, the film thickness of the colored layer after post-baking in the reflected light region is in the range of 0.1 to 0.8. It is preferable that it is in the range, and it is particularly preferable that it be in the range of 0.2 to 0.5, particularly in the range of 0.2 to 0.3.

  In this step, the difference between the thickness of the post-baked colored layer for transmitted light and the sum of the thickness of the transparent resin layer and the thickness of the colored layer for reflected light in the reflected light region is as follows. It is preferably in the range of 0 μm to 4.0 μm, more preferably in the range of 1.0 μm to 3.0 μm, and particularly preferably in the range of 1.5 μm to 2.0 μm.

4). Other Steps The method for producing a color filter for a transflective liquid crystal display device of the present invention may have other steps in addition to the above-described transparent resin layer forming step, colored layer forming step, and post-baking step. good. As such another process, a process used for manufacturing a general color filter for a transflective liquid crystal display device can be used. Among them, as a process suitably used in the present invention, a post-bake process is preferably used. A different color layer forming step of forming a different color layer of a different color from the color layer formed in the color layer formation step in a pattern can be given.

(Different colored layer forming step)
The different color layer forming step in the present invention will be described. This step is a step performed after the above-described post-baking step, and is a step of forming a different colored layer having a different color from the colored layer formed in the above-described colored layer forming step in a pattern, for example, FIG. As shown in FIG. 2, after the post-baking is performed on the transparent resin layer 2 and the colored layer 3, the different colored layer 4 is formed on the post-baked transparent resin layer 2.

In this process, when the film thickness of the transparent resin layer used in the colored layer forming process described above is compared with the film thickness of the transparent resin layer after the post-baking process, the film thickness of the transparent resin layer after the post-baking process. Is thinner. Therefore, since it becomes possible to form a colored layer on the transparent resin layer of a different film thickness, the film thickness of each colored layer formed on the transparent resin layer can be controlled.
For example, when forming a colored layer having a different thickness for each color on the transparent resin layer, the colored layer to be formed thinly is formed in the above-described colored layer forming step, and the colored layer to be formed thick is formed in the different colored layer forming step. By forming, the thickness of the different color layer formed on the transparent resin layer can be made thicker than the thickness of the color layer formed on the transparent resin layer.
In addition, for example, when a colored layer is formed on a transparent resin layer having the same film thickness, if the colored layer is thickened by only one color, the colored layer that is thickened is added to the above-described colored layer forming step. By forming the remaining colored layers in the different colored layer forming step, the thickness of all the colored layers can be made constant.
Therefore, by carrying out this step, the thickness of each colored layer formed on the transparent resin layer can be controlled, so that it is possible to provide a color filter for a transflective liquid crystal display device excellent in color display. Become.

  The different colored layer formed in this step is not particularly limited as long as it is a colored layer having a color different from that of the colored layer formed in the colored layer forming step. The method for forming such a different colored layer is not particularly limited. For example, a coating solution for forming a different colored layer containing a photosensitive resin is applied to the substrate and the transparent resin layer, and then exposed. And a developing method.

  The coating liquid for forming a different colored layer is particularly limited as long as it is a coating liquid for forming a colored layer capable of forming a colored layer having a different color from the colored layer formed in the colored layer forming step. For example, it may contain a colorant having a color different from the color of the colorant contained in the colored layer forming coating solution used in the colored layer forming step. In addition, the component configuration of such a different color layer forming coating liquid may be the same as that used for forming a color layer of a general color filter for a transflective liquid crystal display device. It may contain a photosensitive resin, a colorant such as a pigment, and various additives.

  In addition, the method of applying the above-mentioned different colored layer forming coating liquid, exposing and developing can be the same as the method of forming the colored layer formed in “2. Colored layer forming step” described above. Explanation here is omitted.

(Other)
The method for producing a color filter for a transflective liquid crystal display device according to the present invention may include a step normally used when producing a color filter for a transflective liquid crystal display device in addition to the above-described steps. As such a process, for example, after the above-mentioned different color layer formation step, a different color layer post-baking step for post-baking the different color layer, or a post-baking color layer and / or a protective layer on the different color layer A protective layer forming step, a light shielding portion forming step of forming a light shielding portion on the substrate, and the like.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

  The following examples illustrate the present invention more specifically.

[Example]
(Shading part forming process)
As a base material, a glass substrate (Corning 1317 glass) having a size of 300 mm × 400 mm and a thickness of 0.7 mm was prepared. This glass substrate was washed according to a conventional method, and a chromium thin film (thickness 1600 mm) was formed on one side of the glass substrate by sputtering. A positive photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied on the chromium thin film, and exposed through a predetermined mask to form a resist pattern. Next, the chromium thin film was etched using this resist pattern as a mask to form a light-shielding portion having a line width of 20 μm.

(Transparent resin layer forming process)
Subsequently, a coating solution for forming a transparent resin layer having the following composition was applied and dried so as to cover the glass substrate and the light shielding portion. This transparent resin layer-forming coating solution was exposed through a photomask and developed to form a transparent resin layer having a line width of 70 μm and an average film thickness of 4.1 μm.

<Coating liquid for forming transparent resin layer>
· Methyl methacrylate-styrene-methacrylic acid copolymer ··· 42 parts by weight · Epicoat 180s70 (manufactured by Mitsubishi Yuka Shell Co., Ltd.) ··· 18 parts by weight · Pentaerythritol pentaacrylate ··· 32 parts by weight · Irga Cure 907 (Ciba Specialty Chemicals) ··· 8 parts by weight · Propylene glycol monomethyl ether acetate ··· 300 parts by weight

(Red colored layer forming step)
A coating solution for forming a colored layer (negative photosensitive resin composition) for the red colored layer having the following composition was applied on the glass substrate by a spin coating method so as to cover the transparent resin layer. Then, it exposed and developed using the said photomask for red patterns, and formed the red colored layer in pattern shape.

<Red colored layer forming coating solution>
Red pigment (Ciba Specialty Chemicals Chromophthal Red A2B) 4.8 parts by weight Yellow pigment (BASF Pariotor Yellow D1819) 1.2 parts by weight Dispersant (by Big Chemie) Dispersic 161) ... 3.0 parts by weight / monomer (SR399 manufactured by Sartomer) ... 4.0 parts by weight / Polymer I ... 5.0 parts by weight / Irgacure 907 (Ciba Specialty Chemicals) 1.4 parts by weight. (2,2'-bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) 6 parts by weight / propylene glycol monomethyl ether acetate 80.0 parts by weight * Polymer I is benzyl methacrylate: styrene: acrylic acid: 2-hydroxy ester 2-methacryloyloxyethyl isocyanate is added in an amount of 16.9 mol% to 100 mol% of the copolymer of methacrylate = 15.6: 37.0: 30.5: 16.9 (molar ratio). The weight average molecular weight is 42500.

(Post bake process)
The transparent resin layer and the red colored layer were heated at 240 ° C. for 60 minutes and post-baked. The average film thickness of the transparent resin layer after post-baking was 3.0 μm, and the shrinkage rate was 73%. The average thickness of the red colored layer in the reflected light region was 0.8 μm, and the average thickness of the red colored layer in the transmitted light region was 1.8 μm. Each said film thickness was computed from what image | photographed the cross-sectional shape of a transparent resin layer and a red colored layer with the scanning electron microscope (SEM).

(Different color layer formation step: formation of green color layer)
On the glass substrate on which the red colored layer is formed, a green colored layer-forming coating solution (negative photosensitive resin composition) for the green colored layer having the following composition is used to form green by the same method as that for the red colored layer. A colored layer was formed and post-baked under the same conditions as the red colored layer. The average thickness of the green colored layer in the reflected light region was 0.8 μm, and the average thickness of the green colored layer in the transmitted light region was 1.8 μm. The film thickness was calculated from the cross-sectional shape of the green colored layer taken with a scanning electron microscope (SEM) or the like.

<Coating liquid for forming green colored layer>
Green pigment (Avisia Monastral Green θY-C) 4.2 parts by weight Yellow pigment (BASF Paliotor Yellow D1819) 1.8 parts by weight Dispersant (Bic Chemie Disper) BIC 161) ... 3.0 parts by weight / monomer (SR399 manufactured by Sartomer) ... 4.0 parts by weight / polymer I ... 5.0 parts by weight / Irgacure 907 (Ciba Specialty Chemicals) ) ... 1.4 parts by weight- (2,2'-bis (o-chlorophenyl) -4,5,4 ', 5'-tetraphenyl-1,2'-biimidazole) ... 0.6 Parts by weight ・ Propylene glycol monomethyl ether acetate ・ ・ ・ 80.0 parts by weight

(Different color layer formation step: formation of a blue color layer)
Similar to the red colored layer on the glass substrate on which the red colored layer and the green colored layer are formed, using a colored layer forming coating liquid (negative photosensitive resin composition) for the blue colored layer having the following composition: A blue colored layer was formed by this method, and post-baking was performed under the same conditions as for the red colored layer. The average thickness of the blue colored layer in the reflected light region was 0.8 μm, and the average thickness of the blue colored layer in the transmitted light region was 1.8 μm. The film thickness was calculated from the cross-sectional shape of the blue colored layer taken with a scanning electron microscope (SEM) or the like.

<Blue colored layer forming coating solution>
-Blue pigment (BASF Heiogen Blue L6700F)-6.0 parts by weight-Pigment derivative (Abyssia Solsperse 6000)-0.6 parts by weight-Dispersant (Bic Chemie Dispersic 161)- 2.4 parts by weight / monomer (SR399 manufactured by Sartomer Co., Ltd.) 4.0 parts by weight Polymer I 5.0 parts by weight Irgacure 907 (Ciba Specialty Chemicals) 4 parts by weight. (2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2′-biimidazole)... 0.6 parts by weight propylene glycol monomethyl Ether acetate ... 80.0 parts by weight

[Comparative example]
A color filter was formed in the same manner as in the example except that the transparent resin layer was post-baked before the red colored layer forming step. The post-baking conditions at this time were the same as the post-baking conditions used in the examples.
The average film thickness of the transparent resin layer after post-baking (before formation of the red colored layer) was 3.0 μm. The average thickness of the red colored layer in the reflected light region is 1.0 μm, the average thickness of the green colored layer and the blue colored layer is 0.8 μm, and the red colored layer, the green colored layer, and the The average thickness of the blue colored layer was 1.8 μm.

[Evaluation]
In the example in which the transparent resin layer and the red colored layer were simultaneously post-baked in the post-baking step, the red colored layer was formed on the transparent resin layer as compared with the comparative example in which the red colored layer was formed after the post-baking of the transparent resin layer. Thinly formed.

It is explanatory drawing for demonstrating the manufacturing method of the color filter for transflective liquid crystal display devices of this invention. It is explanatory drawing for demonstrating the different colored layer formation process in this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Base material 2 ... Transparent resin layer 3 ... Colored layer 4 ... Different colored layer t ... Area for transmitted light r ... Area for reflected light

Claims (1)

It has a base material, a transparent resin layer formed in a pattern on the base material, and a colored layer formed so as to cover the base material and the transparent resin layer, the base material, and the transparent resin A semi-transmission type in which an area in which layers and the colored layer are laminated in this order is used as an area for reflected light, and an area in which the base material and the colored layer are laminated in this order is used as an area for transmitted light A method of manufacturing a color filter for a liquid crystal display device,
A transparent resin layer forming step for forming the patterned transparent resin layer on the substrate, and a colored layer forming coating solution is applied on the substrate and the transparent resin layer to form a patterned colored layer. A colored layer forming step, a transparent resin layer formed by the transparent resin layer forming step, and a post baking step for simultaneously baking the colored layer formed by the colored layer forming step,
In the post-baking step, the transparent resin layer is contracted ,
Furthermore, the transflective type is characterized in that after the post-baking step, a different color layer forming step is performed in which a different color layer having a different color from the color layer formed in the color layer forming step is formed in a pattern. Manufacturing method of color filter for liquid crystal display device.

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