JP4969047B2 - Photomask and photomask manufacturing method - Google Patents
Photomask and photomask manufacturing method Download PDFInfo
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- JP4969047B2 JP4969047B2 JP2005046714A JP2005046714A JP4969047B2 JP 4969047 B2 JP4969047 B2 JP 4969047B2 JP 2005046714 A JP2005046714 A JP 2005046714A JP 2005046714 A JP2005046714 A JP 2005046714A JP 4969047 B2 JP4969047 B2 JP 4969047B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000000576 coating method Methods 0.000 claims description 117
- 239000011248 coating agent Substances 0.000 claims description 115
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 39
- 229910052804 chromium Inorganic materials 0.000 claims description 38
- 239000011651 chromium Substances 0.000 claims description 38
- 239000007788 liquid Substances 0.000 claims description 38
- 150000001282 organosilanes Chemical class 0.000 claims description 33
- 125000003700 epoxy group Chemical group 0.000 claims description 31
- 229920002050 silicone resin Polymers 0.000 claims description 17
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 5
- 230000000052 comparative effect Effects 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 229920000180 alkyd Polymers 0.000 description 8
- 229920001296 polysiloxane Polymers 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 238000007865 diluting Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- -1 γ-glycidoxypropyl Chemical group 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 101100460719 Mus musculus Noto gene Proteins 0.000 description 1
- 101100187345 Xenopus laevis noto gene Proteins 0.000 description 1
- UYNDTGSKTBWYDX-UHFFFAOYSA-N [diacetyloxy-[3-(oxiran-2-ylmethoxy)propyl]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)CCCOCC1CO1 UYNDTGSKTBWYDX-UHFFFAOYSA-N 0.000 description 1
- CMEYFXQCAOKFSL-UHFFFAOYSA-N [diacetyloxy-[4-(oxiran-2-yl)butyl]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)CCCCC1CO1 CMEYFXQCAOKFSL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- CRSOKXHGCLHRFF-UHFFFAOYSA-N diethoxy-bis(oxiran-2-ylmethoxymethyl)silane Chemical compound C1OC1COC[Si](OCC)(OCC)COCC1CO1 CRSOKXHGCLHRFF-UHFFFAOYSA-N 0.000 description 1
- RIIYEOHOQDANAR-UHFFFAOYSA-N diethoxy-bis[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C1OC1COCCC[Si](OCC)(OCC)CCCOCC1CO1 RIIYEOHOQDANAR-UHFFFAOYSA-N 0.000 description 1
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 1
- OLGFJVSABRBVFE-UHFFFAOYSA-N dimethoxy-bis(oxiran-2-ylmethoxymethyl)silane Chemical compound C1OC1COC[Si](OC)(OC)COCC1CO1 OLGFJVSABRBVFE-UHFFFAOYSA-N 0.000 description 1
- KYZBSTMQNIESBN-UHFFFAOYSA-N dimethoxy-bis[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound C1OC1COCC[Si](OC)(OC)CCOCC1CO1 KYZBSTMQNIESBN-UHFFFAOYSA-N 0.000 description 1
- XZXYTQWKUONLLI-UHFFFAOYSA-N dimethoxy-bis[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C1OC1COCCC[Si](OC)(OC)CCCOCC1CO1 XZXYTQWKUONLLI-UHFFFAOYSA-N 0.000 description 1
- CAEPKDWOZATEMI-UHFFFAOYSA-N dimethoxy-methyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C)(OC)COCC1CO1 CAEPKDWOZATEMI-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- OGANKJGJBLMLGD-UHFFFAOYSA-N ethenyl-dimethoxy-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C=C)(OC)COCC1CO1 OGANKJGJBLMLGD-UHFFFAOYSA-N 0.000 description 1
- FPXODGDDDJHWJL-UHFFFAOYSA-N ethoxy-tris(oxiran-2-ylmethoxymethyl)silane Chemical compound C1OC1COC[Si](COCC1OC1)(OCC)COCC1CO1 FPXODGDDDJHWJL-UHFFFAOYSA-N 0.000 description 1
- CCXVULQMXGVDGY-UHFFFAOYSA-N ethoxy-tris[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound C1OC1COCC[Si](CCOCC1OC1)(OCC)CCOCC1CO1 CCXVULQMXGVDGY-UHFFFAOYSA-N 0.000 description 1
- KXVVDFQYEAYAMG-UHFFFAOYSA-N ethoxy-tris[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C1OC1COCCC[Si](CCCOCC1OC1)(OCC)CCCOCC1CO1 KXVVDFQYEAYAMG-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- BFMUNUUIHLWYSN-UHFFFAOYSA-N ethyl-dimethoxy-(oxiran-2-ylmethoxymethyl)silane Chemical compound CC[Si](OC)(OC)COCC1CO1 BFMUNUUIHLWYSN-UHFFFAOYSA-N 0.000 description 1
- YYDBOMXUCPLLSK-UHFFFAOYSA-N ethyl-dimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC[Si](OC)(OC)CCCOCC1CO1 YYDBOMXUCPLLSK-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- LQKLWNAGFLCROC-UHFFFAOYSA-N methoxy-dimethyl-(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](C)(C)COCC1CO1 LQKLWNAGFLCROC-UHFFFAOYSA-N 0.000 description 1
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 description 1
- ZMSUPALKGKBJTG-UHFFFAOYSA-N methoxy-methyl-(oxiran-2-ylmethoxymethoxy)-phenylsilane Chemical compound C(C1CO1)OCO[Si](OC)(C1=CC=CC=C1)C ZMSUPALKGKBJTG-UHFFFAOYSA-N 0.000 description 1
- ZNEANRFOVQWASK-UHFFFAOYSA-N methoxy-tris(oxiran-2-ylmethoxymethyl)silane Chemical compound C1OC1COC[Si](COCC1OC1)(OC)COCC1CO1 ZNEANRFOVQWASK-UHFFFAOYSA-N 0.000 description 1
- KNDSIIWXDUZDJI-UHFFFAOYSA-N methoxy-tris[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound C1OC1COCC[Si](CCOCC1OC1)(OC)CCOCC1CO1 KNDSIIWXDUZDJI-UHFFFAOYSA-N 0.000 description 1
- KWALCKUJBZXIJB-UHFFFAOYSA-N methoxy-tris[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C1OC1COCCC[Si](CCCOCC1OC1)(OC)CCCOCC1CO1 KWALCKUJBZXIJB-UHFFFAOYSA-N 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- HHPPHUYKUOAWJV-UHFFFAOYSA-N triethoxy-[4-(oxiran-2-yl)butyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCCC1CO1 HHPPHUYKUOAWJV-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HGCVEHIYVPDFMS-UHFFFAOYSA-N trimethoxy(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)silane Chemical compound C1C(C[Si](OC)(OC)OC)CCC2OC21 HGCVEHIYVPDFMS-UHFFFAOYSA-N 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- NVHGPBWXDPPIDQ-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-yl)ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1CO1 NVHGPBWXDPPIDQ-UHFFFAOYSA-N 0.000 description 1
- DBUFXGVMAMMWSD-UHFFFAOYSA-N trimethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OC)(OC)OC)CCC2OC21 DBUFXGVMAMMWSD-UHFFFAOYSA-N 0.000 description 1
- CESKYMDZTHKIPO-UHFFFAOYSA-N tris(2-methoxyethoxy)-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCOCC1CO1 CESKYMDZTHKIPO-UHFFFAOYSA-N 0.000 description 1
- AXLLBZRZUBSGGF-UHFFFAOYSA-N tris(2-methoxyethoxy)-[4-(oxiran-2-yl)butyl]silane Chemical compound COCCO[Si](OCCOC)(OCCOC)CCCCC1CO1 AXLLBZRZUBSGGF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
本発明は、表面がクロムからなる被塗布物の表面に塗膜を形成するための易接着処理液、塗膜形成材料、および塗膜の形成方法に関し、特に被塗布物との接着性に優れた塗膜を得ることができる易接着処理液、塗膜形成材料、および塗膜の形成方法に関する。 The present invention relates to an easy-adhesion treatment liquid for forming a coating film on the surface of an object to be coated, the surface of which is made of chromium, a film-forming material, and a method for forming the film, and particularly excellent in adhesion to the object to be coated. The present invention relates to an easy-adhesion treatment solution, a film-forming material, and a method for forming a coating film.
通常、プリント配線板は、基板材料の表面にドライフィルムなどのフォトレジストを積層し、このフォトレジストの表面にフォトマスクの露光用パターンが形成された面を密着し、フォトマスクを介してフォトレジストを露光した後、フォトマスクを剥離し、フォトレジストを現像し、エッチング処理が施されることにより製造される。この際に剥離されたフォトマスクは、次のプリント配線板の作製へと繰り返し使用される。 Usually, a printed wiring board is formed by laminating a photoresist such as a dry film on the surface of a substrate material, and closely adhering the surface on which the exposure pattern of the photomask is formed on the surface of the photoresist. After the exposure, the photomask is peeled off, the photoresist is developed, and an etching process is performed. The photomask peeled at this time is repeatedly used for the production of the next printed wiring board.
近年、プリント配線板などの高密度化への要求が著しく、これに使用するフォトマスクの寸法精度の向上が必要となってきている。このために、ガラスを支持体として、この上に感光乳剤からなる層を設けたガラス乾板を用いたフォトマスクが使用され、さらに高精細なものは、このような感光乳剤からなる層の代りにクロムを蒸着して用いられている。 In recent years, there has been a great demand for higher density of printed wiring boards and the like, and it has become necessary to improve the dimensional accuracy of photomasks used therefor. For this purpose, a photomask using a glass plate on which glass is used as a support and on which a layer made of a photosensitive emulsion is provided is used, and a higher definition is used instead of the layer made of such a photosensitive emulsion. It is used by depositing chromium.
クロムは通常、表面硬度が高く、傷つきにくいものであるが、このようなクロムの蒸着されたフォトマスクは、露光を繰り返す際に、静電気スパークにより蒸着されたクロム層が断線し、ピンホールを発生してしまうという問題が生じた。 Chromium usually has a high surface hardness and is hard to be scratched. However, such a chrome-deposited photomask generates pinholes when the chrome layer deposited by electrostatic sparks breaks during repeated exposure. The problem of end up occurred.
一方、通常、感光乳剤からなる層が設けられたフォトマスクには、繰り返し使用するためフォトレジストの付着等を防止する目的で、露光用パターンの形成された面に透明保護フィルムを貼り合わせることがある(特許文献1)。 On the other hand, a photomask provided with a layer of a photosensitive emulsion is usually laminated with a transparent protective film on the surface on which an exposure pattern is formed for the purpose of preventing the adhesion of a photoresist for repeated use. Yes (Patent Document 1).
そこで、このようなクロムの蒸着されたフォトマスクの表面に、上記のような透明保護フィルムを貼着することにより、フォトレジストの付着と、クロム層の断線を防止することが考えられるが、クロムの蒸着されたフォトマスクは、フォトマスク自体が高精細であるため、上記のような透明保護フルムを貼着すると、露光精度が低下してしまうという問題が生じた。 Therefore, it is conceivable to prevent adhesion of the photoresist and disconnection of the chromium layer by sticking the transparent protective film as described above to the surface of the photomask on which chromium is deposited. Since the photomask deposited with a high-definition photomask itself has a problem in that the exposure accuracy decreases when the transparent protective film as described above is attached.
また、クロムの蒸着されたフォトマスクの表面に、塗膜形成用塗布液を塗布することにより塗膜(保護膜)を形成して、フォトレジストの付着と、クロム層の断線を防止することも考えられるが、一般にクロムと有機物との接着性が低いため、クロム層と塗膜との接着性が十分ではなく、クロム層から塗膜が剥がれてしまい繰り返し露光を行なうことができなかった。 In addition, a coating film (protective film) is formed on the surface of the photomask on which chromium has been deposited by applying a coating liquid for forming a coating film to prevent adhesion of the photoresist and disconnection of the chromium layer. Although it is conceivable, since the adhesion between chromium and organic matter is generally low, the adhesion between the chromium layer and the coating film is not sufficient, and the coating film is peeled off from the chromium layer, so that repeated exposure cannot be performed.
ところで、一般に、無機物と有機物の接着性を向上させるためには、シランカップリング剤を用いることが知られている。そこで、通常、市販されているシランカップリング剤を塗膜形成用塗布液に添加し、塗膜中にシランカップリング剤を含有させてみたところ、全く効果が得られなかった。また、前記シランカップリング剤を易接着処理液として、クロム層上に塗布したところ、易接着処理を完了させるためには、高温で長時間(150℃、90分程度)のキュアリングが必要であったため、コストも時間もかかるものとなってしまった。さらには、前記易接着処理したクロム層の上に、上記と同様の塗膜形成用塗布液を塗布したところ、ある程度の接着性は向上したが、形成された塗膜はムラが生じており、均一で美しい塗膜を得ることはできなかった。 By the way, it is generally known to use a silane coupling agent in order to improve the adhesion between an inorganic substance and an organic substance. Therefore, when a commercially available silane coupling agent was added to the coating solution for forming a coating film and the silane coupling agent was contained in the coating film, no effect was obtained. In addition, when the silane coupling agent was applied onto the chromium layer as an easy-adhesion treatment liquid, curing at a high temperature for a long time (about 150 ° C. for about 90 minutes) was required to complete the easy-adhesion treatment. It was costly and time consuming. Furthermore, when a coating solution for coating film formation similar to the above was applied on the chromium layer subjected to the easy adhesion treatment, the adhesiveness was improved to some extent, but the formed coating film was uneven. A uniform and beautiful coating film could not be obtained.
そこで、本発明は、クロムの蒸着されたフォトマスクのように、表面がクロムからなる被塗布物の表面に、比較的低温で短時間のキュアリングにより易接着処理を行なうことができると共に、前記被塗布物との接着性が良好で、かつ均一で美しい塗膜を形成することができる易接着処理液、塗膜形成材料、および塗膜の形成方法を提供することを目的とする。 Therefore, the present invention can perform an easy adhesion treatment on the surface of an object to be coated made of chromium like a photomask on which chromium is vapor-deposited by curing at a relatively low temperature in a short time. An object of the present invention is to provide an easy-adhesion treatment liquid, a film-forming material, and a method for forming a coating film, which can form a uniform and beautiful coating film with good adhesion to an object to be coated.
即ち、本発明のフォトマスクは、表面がクロムからなるフォトマスク上に、易接着層を介して塗膜を有してなり、前記易接着層は、エポキシ基を有するオルガノシランの加水分解部分縮合物を含む易接着層用塗布液から形成されてなり、前記塗膜は、シリコーン樹脂およびアミノアルキド樹脂を含む塗膜形成用塗布液から形成されてなることを特徴とするものである。 That is, the photomask of the present invention has a coating film on a photomask whose surface is made of chromium via an easy adhesion layer, and the easy adhesion layer is hydrolyzed partial condensation of an organosilane having an epoxy group. The coating film is formed from a coating liquid for forming a coating film containing a silicone resin and an aminoalkyd resin .
また、好ましくは、前記エポキシ基を有するオルガノシランがγ−グリシドキシプロピルトリメトキシシランであることを特徴とするものである。 Preferably, the organosilane having an epoxy group is γ-glycidoxypropyltrimethoxysilane.
また、本発明のフォトマスクの製造方法は、表面がクロムからなるフォトマスク上に、エポキシ基を有するオルガノシランの加水分解部分縮合物を含む易接着層用塗布液を塗布、乾燥して易接着層を形成し、当該易接着層上に、シリコーン樹脂およびアミノアルキド樹脂を含む塗膜形成用塗布液を塗布、乾燥して塗膜を形成することを特徴とするものである。 In addition, the method for producing a photomask of the present invention comprises applying a coating solution for an easy-adhesion layer containing a hydrolyzed partial condensate of an organosilane having an epoxy group onto a photomask whose surface is made of chromium, and drying it easily A layer is formed, and a coating film-forming coating solution containing a silicone resin and an aminoalkyd resin is applied onto the easy-adhesion layer and dried to form a coating film .
本発明によれば、表面がクロムからなる被塗布物の表面に、比較的低温で短時間のキュアリングにより易接着処理を行なうことができると共に、前記被塗布物との接着性が良好で、かつ均一で美しい塗膜を形成することができる。 According to the present invention, the surface of an object to be coated made of chromium can be subjected to an easy adhesion treatment by relatively short curing at a relatively low temperature, and the adhesiveness to the object to be coated is good. A uniform and beautiful coating film can be formed.
以下、各構成要素の実施の形態について説明する。まず、本発明の易接着処理液について説明する。易接着処理液は表面がクロムからなる被塗布物と有機物である塗膜との接着性を向上させるために用いられるものであり、本発明においてはエポキシ基を有するオルガノシランの加水分解部分縮合物を含むものである。 Hereinafter, embodiments of each component will be described. First, the easy adhesion treatment liquid of the present invention will be described. The easy-adhesion treatment liquid is used for improving the adhesion between the coated object made of chromium and the coating film which is an organic substance. In the present invention, the hydrolyzed partial condensate of organosilane having an epoxy group Is included.
エポキシ基を有するオルガノシランは、少なくとも一つ以上のエポキシ基を有するものであり、少なくとも一つ以上のエポキシ基を有することにより、例えばエポキシ基の代りにビニル基、アミノ基、メタクリル基などを有するオルガノシランを用いた場合よりも、表面がクロムからなる被塗布物と後述する塗膜形成用塗布液から形成される塗膜との接着性を向上させることができる。このようなエポキシ基を有するオルガノシランとしては、具体的には例えば、グリシドキシメチルトリメトキシシラン、グリシドキシメチルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−グリシドキシプロピルトリ(メトキシエトキシ)シラン、γ−グリシドキシプロピルトリアセトキシシラン、グリシドキシメチル(メチル)ジメトキシシラン、グリシドキシメチル(エチル)ジメトキシシラン、グリシドキシメチル(フェニル)ジメトキシシラン、グリシドキシメチル(ビニル)ジメトキシシラン、グリシドキシメチル(ジメチル)メトキシシラン、γ−グリシドキシプロピル(メチル)ジメトキシシラン、γ−グリシドキシプロピル(エチル)ジメトキシシラン、γ−グリシドキシプロピル(ジメチル)メトキシシラン、ビス−(グリシドキシメチル)ジメトキシシラン、ビス−(グリシドキシメチル)ジエトキシシラン、ビス−(グリシドキシエチル)ジメトキシシラン、ビスー(グリシドキシエチル)ジエトキシシラン、ビス−(グリシドキシプロピル)ジメトキシシラン、ビス−(グリシドキシプロピル)ジエトキシシラン、トリス−(グリシドキシメチル)メトキシシラン、トリス−(グリシドキシメチル)エトキシシラン、トリス−(グリシドキシエチル)メトキシシラン、トリス−(グリシドキシエチル)エトキシシラン、トリス−(グリシドキシプロピル)メトキシシラン、トリス−(グリシドキシプロピル)エトキシシラン、グリシジルメチルトリメトキシシラン、グリシジルメチルトリエトキシシラン、γ−グリシジルプロピルトリエトキシシラン、γ−グリシジルプロピルトリ(メトキシエトキシ)シラン、γ−グリシジルプロピルトリアセトキシシラン、3、4−エポキシシクロヘキシルメチルトリメトキシシラン、3、4−エポキシシクロヘキシルメチルトリエトキシシラン、3、4−エポキシシクロヘキシルエチルトリメトキシシラン、3、4−エポキシシクロヘキシルプロピルトリメトキシシランなどがあげられる。なかでもアルコキシル基の反応性が高く、表面がクロムからなる被塗布物との接着性をより向上させることができるという観点から、γ−グリシドキシプロピルトリメトキシシランとすることが好ましい。 An organosilane having an epoxy group has at least one epoxy group, and has at least one epoxy group, for example, a vinyl group, an amino group, a methacryl group, etc. instead of the epoxy group. Compared to the case where organosilane is used, the adhesion between an object to be coated whose surface is made of chromium and a coating film formed from a coating liquid for forming a coating film described later can be improved. Specific examples of the organosilane having an epoxy group include glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, and γ-glycidoxypropyl. Triethoxysilane, γ-glycidoxypropyltri (methoxyethoxy) silane, γ-glycidoxypropyltriacetoxysilane, glycidoxymethyl (methyl) dimethoxysilane, glycidoxymethyl (ethyl) dimethoxysilane, glycidoxy Methyl (phenyl) dimethoxysilane, glycidoxymethyl (vinyl) dimethoxysilane, glycidoxymethyl (dimethyl) methoxysilane, γ-glycidoxypropyl (methyl) dimethoxysilane, γ-glycidoxypropyl (ethyl) dimethoxysilane γ-glycidoxypropyl (dimethyl) methoxysilane, bis- (glycidoxymethyl) dimethoxysilane, bis- (glycidoxymethyl) diethoxysilane, bis- (glycidoxyethyl) dimethoxysilane, bis- (glycid Xylethyl) diethoxysilane, bis- (glycidoxypropyl) dimethoxysilane, bis- (glycidoxypropyl) diethoxysilane, tris- (glycidoxymethyl) methoxysilane, tris- (glycidoxymethyl) ethoxy Silane, tris- (glycidoxyethyl) methoxysilane, tris- (glycidoxyethyl) ethoxysilane, tris- (glycidoxypropyl) methoxysilane, tris- (glycidoxypropyl) ethoxysilane, glycidylmethyltrimethoxy Silane, glycidyl methyl Riethoxysilane, γ-glycidylpropyltriethoxysilane, γ-glycidylpropyltri (methoxyethoxy) silane, γ-glycidylpropyltriacetoxysilane, 3,4-epoxycyclohexylmethyltrimethoxysilane, 3,4-epoxycyclohexylmethyltri Examples include ethoxysilane, 3,4-epoxycyclohexylethyltrimethoxysilane, 3,4-epoxycyclohexylpropyltrimethoxysilane, and the like. Of these, γ-glycidoxypropyltrimethoxysilane is preferred from the viewpoint that the reactivity of the alkoxyl group is high and the surface can be further improved in adhesion to an object to be coated made of chromium.
このようなエポキシ基を有するオルガノシランは、加水分解部分縮合物とする必要がある。ここで、本発明でいうエポキシ基を有するオルガノシランの加水分解部分縮合物とは、エポキシ基を有するオルガノシランを加水分解し、縮合して得られる縮合物、及び/又は縮合して得られる部分縮合物をいう。このようにエポキシ基を有するオルガノシランを加水分解し縮合することにより、シラノール基が生成して被塗布物への反応性を向上させることができる。これにより、加水分解しなかったものと比べて、低温、短時間のキュアリングで被塗布物との接着性を向上させることができる。キュアリングに要する温度と時間は、選択するエポキシ基を有するオルガノシランの種類によって若干異なるが、γ−グリシドキシプロピルトリメトキシシランの場合は、加水分解しないものを用いた場合には150℃、90分程度であるが、加水分解部分縮合物とすることによって80℃〜100℃、10分〜30分程度とすることができる。さらに、このように低温、短時間のキュアリングによって易接着処理することができることにより、均一な層とすることができ、その上層に後述する塗膜を形成した場合に、ムラが生じ難く均一で美しい塗膜とすることができる。 The organosilane having such an epoxy group needs to be a hydrolyzed partial condensate. Here, the hydrolyzed partial condensate of an organosilane having an epoxy group in the present invention is a condensate obtained by hydrolyzing and condensing an organosilane having an epoxy group, and / or a part obtained by condensation. Refers to condensate. Thus, by hydrolyzing and condensing the organosilane having an epoxy group, a silanol group is generated and the reactivity to an object to be coated can be improved. Thereby, compared with what was not hydrolyzed, adhesiveness with a to-be-coated article can be improved by low temperature and short time curing. The temperature and time required for curing are slightly different depending on the type of organosilane having an epoxy group to be selected. In the case of γ-glycidoxypropyltrimethoxysilane, 150 ° C. is used when an unhydrolyzed one is used. Although it is about 90 minutes, it can be made into 80 to 100 degreeC and about 10 to 30 minutes by setting it as a hydrolysis partial condensate. Furthermore, since it can be easily adhered by low-temperature and short-time curing as described above, a uniform layer can be formed, and when a coating film described later is formed on the upper layer, unevenness is hardly generated and uniform. A beautiful coating film can be obtained.
このようなエポキシ基を有するオルガノシランは、塩酸等の酸や水酸化ナトリウム等の塩基の触媒を用いることにより、加水分解することができる。そして、その後放置する時間によって、所望の縮合度合いとした加水分解部分縮合物とすることができる。 Such an organosilane having an epoxy group can be hydrolyzed by using an acid such as hydrochloric acid or a base catalyst such as sodium hydroxide. And it can be set as the hydrolysis partial condensate made into the desired degree of condensation with the time to leave after that.
このようなエポキシ基を有するオルガノシランの加水分解部分縮合物は、前記易接着処理液中に下限として0.1重量%以上、さらには1重量%以上とするのが好ましく、上限としては30重量%以下、さらには10重量%以下とするのが好ましい。0.1重量%以上とすることにより、表面がクロムからなる被塗布物と後述する塗膜との接着性を向上することができ、30重量%以下とすることにより、ムラが生じ難くなり均一で美しい塗膜とすることができる。 Such a hydrolyzed partial condensate of organosilane having an epoxy group is preferably 0.1% by weight or more, more preferably 1% by weight or more as the lower limit in the easy-adhesion treatment liquid, and the upper limit is 30% by weight. % Or less, more preferably 10% by weight or less. By setting the content to 0.1% by weight or more, it is possible to improve the adhesion between the coating object whose surface is made of chromium and the coating film described later. By setting the content to 30% by weight or less, unevenness hardly occurs and is uniform. It can be made into a beautiful coating film.
以上のような本発明の易接着処理液は、エポキシ基を有するオルガノシランをメタノール、エタノール、及びイソプロピルアルコール等のアルコール系の溶媒で希釈し、酸又は塩基を加えることにより加水分解させ、任意の時間、恒温で撹拌することにより所望の加水分解部分縮合物とし、それをさらに上述と同様のアルコール系の溶媒で希釈することにより得ることができる。 The easy-adhesion treatment liquid of the present invention as described above is prepared by diluting an organosilane having an epoxy group with an alcohol solvent such as methanol, ethanol, and isopropyl alcohol, and hydrolyzing it by adding an acid or a base. The desired hydrolyzed partial condensate can be obtained by stirring at constant temperature for a period of time, and it can be obtained by further diluting with an alcohol solvent similar to the above.
次に、本発明の塗膜形成材料について説明する。本発明の塗膜形成材料は、上述した易接着処理液と、シリコーン樹脂を含む塗膜形成用塗布液の2種類の塗布液からなるものである。 Next, the coating film forming material of the present invention will be described. The coating film-forming material of the present invention comprises two types of coating liquids, that is, the above-described easy adhesion treatment liquid and a coating film-forming coating liquid containing a silicone resin.
塗膜形成用塗布液における樹脂成分はシリコーン樹脂とすることが好ましい。シリコーン樹脂を用いることにより、塗膜となった場合に易接着処理層との接着性を向上させることができ、また耐候性、傷つき防止性、電気絶縁性に優れたものとすることができる。シリコーン樹脂としては、ストレートシリコーン樹脂や、ポリエステル変性、エポキシ変性、アルキッド変性、アクリル変性などの変性シリコーン樹脂などがあげられる。 The resin component in the coating film forming coating solution is preferably a silicone resin. By using a silicone resin, when it becomes a coating film, adhesiveness with an easily bonding process layer can be improved, and it can be excellent in a weather resistance, damage prevention property, and electrical insulation. Examples of the silicone resin include straight silicone resins and modified silicone resins such as polyester-modified, epoxy-modified, alkyd-modified, and acrylic-modified.
さらに、前記塗膜形成用塗布液は、アミノアルキド樹脂を含むことが好ましい。アミノアルキド樹脂を用いることにより、より易接着処理層との接着性を向上させることができ、さらに耐候性、傷つき防止性を低下させることなく、よりムラがなく均一で美しい塗膜を形成することができる。 Furthermore, the coating liquid for forming a coating film preferably contains an aminoalkyd resin. By using amino alkyd resin, it is possible to improve the adhesion with the easy-adhesion treatment layer, and to form a more uniform and beautiful coating film without reducing the weather resistance and scratch resistance. Can do.
このような塗膜形成用塗布液におけるシリコーン樹脂とアミノアルキド樹脂との含有比率は、特に限定されないが、アミノアルキド樹脂100重量部に対してシリコーン樹脂は、25重量部〜75重量部とすることが好ましい。塗膜形成用塗布液におけるシリコーン樹脂とアミノアルキド樹脂との含有比率をこのような範囲とすることにより、耐候性、傷つき防止性を低下させることなく、より易接着処理層との接着性を向上させることができる。 The content ratio of the silicone resin and the amino alkyd resin in the coating liquid for forming a coating film is not particularly limited, but the silicone resin should be 25 to 75 parts by weight with respect to 100 parts by weight of the amino alkyd resin. Is preferred. By making the content ratio of the silicone resin and amino alkyd resin in the coating liquid for coating film formation in such a range, the adhesion to the easy adhesion treatment layer is further improved without lowering the weather resistance and scratch resistance. Can be made.
また、アミノアルキド樹脂におけるアミノ樹脂とアルキド樹脂の重縮合比率は、特に限定されないが、アルキド樹脂が70重量%〜95重量%とすることが好ましい。 Moreover, the polycondensation ratio of the amino resin and the alkyd resin in the amino alkyd resin is not particularly limited, but the alkyd resin is preferably 70% by weight to 95% by weight.
以上のような塗膜形成用塗布液は、上述したシリコーン樹脂やアミノアルキド樹脂を有機溶剤等の希釈溶媒で希釈することにより得ることができる。またこのような塗膜形成用塗布液は、本発明の効果を阻害しない範囲であれば、必要に応じて、滑剤、着色剤、顔料、染料、蛍光増白剤、難燃剤、抗菌剤、防カビ剤、紫外線吸収剤、光安定剤、熱安定剤、酸化防止剤、可塑剤、レベリング剤、流動調整剤、消泡剤、分散剤、貯蔵安定剤、架橋剤等の添加剤を添加してもよい。 The coating liquid for forming a coating film as described above can be obtained by diluting the above-described silicone resin or aminoalkyd resin with a diluting solvent such as an organic solvent. In addition, such a coating liquid for forming a coating film has a lubricant, a colorant, a pigment, a dye, a fluorescent whitening agent, a flame retardant, an antibacterial agent, an antibacterial agent, if necessary, as long as the effect of the present invention is not impaired. Add additives such as fungicides, UV absorbers, light stabilizers, heat stabilizers, antioxidants, plasticizers, leveling agents, flow regulators, antifoaming agents, dispersants, storage stabilizers, crosslinking agents, etc. Also good.
次に、本発明の塗膜の形成方法について説明する。本発明の塗膜の形成方法は、上述した塗膜形成材料を用いた塗膜の形成方法であって、上述した易接着処理液を表面がクロムからなる被塗布物に塗布、乾燥させ、その上に上述した塗膜形成用塗布液を塗布、乾燥させるものである。塗布の方法としては、特に限定されるものではなく、従来公知のコーティング方法、例えば、スピンコーター、バーコーター、ダイコーター、ブレードコーター、ロールコーター、グラビアコーター、フローコーター、ディップコーター、スプレー、スクリーン印刷、刷毛や筆等により塗布する方法があげられる。 Next, the method for forming a coating film of the present invention will be described. The method for forming a coating film according to the present invention is a method for forming a coating film using the above-described coating film-forming material. The above-described easy adhesion treatment liquid is applied to an object to be coated whose surface is made of chromium, and dried. The coating liquid for forming a coating film described above is applied and dried. The coating method is not particularly limited, and conventionally known coating methods such as spin coater, bar coater, die coater, blade coater, roll coater, gravure coater, flow coater, dip coater, spray, screen printing. And a method of applying with a brush or a brush.
以上のように本発明によれば、このようにして塗膜を形成することにより、表面がクロムからなる被塗布物の表面に、接着性が良好で均一で美しい塗膜を形成することができる。 As described above, according to the present invention, by forming a coating film in this way, a uniform and beautiful coating film having good adhesion can be formed on the surface of an object to be coated made of chromium. .
以下、本発明を実施例に基づいてさらに詳細に説明する。なお、本実施例において「部」、「%」は、特に示さない限り重量基準である。 Hereinafter, the present invention will be described in more detail based on examples. In this example, “parts” and “%” are based on weight unless otherwise specified.
[実施例1]
<易接着処理液の調整>
容器に0.2mol/l塩酸50部、純水70部、エタノール1261部を加えて十分に冷却撹拌し、希釈した塩酸溶液を作製した。
[Example 1]
<Adjustment of easy adhesion treatment liquid>
To the container, 50 parts of 0.2 mol / l hydrochloric acid, 70 parts of pure water, and 1261 parts of ethanol were added and sufficiently cooled and stirred to prepare a diluted hydrochloric acid solution.
別の容器にエタノール1242部、エポキシ基を有するオルガノシランとしてγ−グリシドキシプロピルトリメトキシシラン(KBM−403:信越シリコーン社)138部を加えて、25℃に調温した。その後、触媒として上記希釈した塩酸溶液1381部を添加し、25℃の恒温で24時間撹拌し、所望の加水分解部分縮合物とした。さらにイソプロピルアルコールを8280部加えて希釈し、実施例1の易接着処理液を得た。 In a separate container, 1242 parts of ethanol and 138 parts of γ-glycidoxypropyltrimethoxysilane (KBM-403: Shin-Etsu Silicone) as an organosilane having an epoxy group were added, and the temperature was adjusted to 25 ° C. Thereafter, 1381 parts of the diluted hydrochloric acid solution as a catalyst was added and stirred at a constant temperature of 25 ° C. for 24 hours to obtain a desired hydrolyzed partial condensate. Furthermore, 8280 parts of isopropyl alcohol was added and diluted to obtain an easy adhesion treatment liquid of Example 1.
<易接着処理>
表面がクロムからなる被塗布物としてクロムの蒸着されたフォトマスクの表面に、上記易接着処理液をスピンコーター(回転数1000rpm、回転時間30秒)で塗布し、80℃、30分間、乾燥し、易接着処理を施した。
<Easy adhesion treatment>
The above easy-adhesion treatment liquid is applied to the surface of a photomask on which chromium has been deposited as an object to be coated with chromium using a spin coater (rotation speed: 1000 rpm, rotation time: 30 seconds), and dried at 80 ° C. for 30 minutes. An easy adhesion treatment was performed.
<塗膜形成用塗布液の作製、および塗膜の形成>
容器にシリコーン樹脂10部、アミノアルキド樹脂20部、メチルエチルケトン40部、エタノール20部、トルエン10部を入れて撹拌し、実施例1の塗膜形成用塗布液(固形分30%)を作製した。
<Preparation of coating liquid for forming coating film and formation of coating film>
10 parts of silicone resin, 20 parts of amino alkyd resin, 40 parts of methyl ethyl ketone, 20 parts of ethanol and 10 parts of toluene were placed in a container and stirred to prepare a coating liquid for forming a coating film of Example 1 (solid content 30%).
次に、前記塗膜形成用塗布液を上記易接着処理を施した表面がクロムからなる被塗布物にスピンコーター(回転数1000rpm、回転時間30秒)で塗布し、150℃、30分間、乾燥・キュアリングし、実施例1の塗膜を形成した。 Next, the coating liquid for forming a coating film is applied to an object to be coated, the surface of which has been subjected to the above easy adhesion treatment, using a spin coater (rotation speed: 1000 rpm, rotation time: 30 seconds), and dried at 150 ° C. for 30 minutes. Curing was performed to form the coating film of Example 1.
[実施例2]
容器に実施例1と同様にして、希釈した塩酸溶液を作製した。別の容器に、実施例1と同様にして、エタノール1242部、エポキシ基を有するオルガノシラン138部を加えて、25℃に調温した。その後、触媒として上記希釈した塩酸溶液1381部を添加し、25℃の恒温で10分間撹拌し、所望の加水分解部分縮合物とした。さらにイソプロピルアルコールを8280部加えて希釈し、実施例2の易接着処理液を得た。
[Example 2]
A diluted hydrochloric acid solution was prepared in a container in the same manner as in Example 1. In a similar manner to Example 1, 1242 parts of ethanol and 138 parts of an organosilane having an epoxy group were added to another container, and the temperature was adjusted to 25 ° C. Thereafter, 1381 parts of the diluted hydrochloric acid solution was added as a catalyst, and the mixture was stirred at a constant temperature of 25 ° C. for 10 minutes to obtain a desired hydrolyzed partial condensate. Furthermore, 8280 parts of isopropyl alcohol was added and diluted to obtain an easy adhesion treatment liquid of Example 2.
次に、実施例1と同様にして、表面がクロムからなる被塗布物に易接着処理を施し、実施例2の塗膜を形成した。 Next, in the same manner as in Example 1, an easy-adhesion treatment was performed on an object to be coated whose surface is made of chromium, and the coating film of Example 2 was formed.
[参考例1]
実施例1と同様にして、易接着処理液を調整し表面がクロムからなる被塗布物に易接着処理を施した。
[ Reference Example 1 ]
In the same manner as in Example 1, an easy adhesion treatment solution was prepared, and an easy adhesion treatment was performed on an object to be coated having a chromium surface.
次に実施例1の塗膜形成用塗布液の代りに、下記処方の参考例1の塗膜形成用塗布液(固形分25%)を用いた以外は、実施例1と同様にして、参考例1の塗膜を形成した。 Next, instead of the coating solution for forming a coating film of Example 1, the coating solution for forming a coating film of Reference Example 1 (solid content: 25%) having the following formulation was used in the same manner as in Example 1 for reference. The coating film of Example 1 was formed.
<参考例1の塗膜形成用塗布液の処方>
・エポキシ変性シリコーン樹脂(固形分60%) 50部
・トルエン 50部
<Prescription of Coating Solution for Coating Film Formation of Reference Example 1 >
・ Epoxy-modified silicone resin (solid content 60%) 50 parts ・ Toluene 50 parts
[参考例2]
実施例1と同様にして、易接着処理液を調整し表面がクロムからなる被塗布物に易接着処理を施した。
[ Reference Example 2 ]
In the same manner as in Example 1, an easy adhesion treatment solution was prepared, and an easy adhesion treatment was performed on an object to be coated having a chromium surface.
次に実施例1の塗膜形成用塗布液の代りに、下記処方の参考例2の塗膜形成用塗布液(固形分20%)を用いた以外は、実施例1と同様にして、参考例2の塗膜を形成した。 Next, instead of the coating solution for forming a coating film of Example 1, the coating solution for forming a coating film of Reference Example 2 (with a solid content of 20%) having the following prescription was used in the same manner as in Example 1 for reference. The coating film of Example 2 was formed.
<参考例2の塗膜形成用塗布液の処方>
・アクリルポリオール樹脂(固形分50%) 10部
(アクリディックA814:大日本インキ化学工業社)
・イソシアネート系架橋剤(固形分60%) 3.6部
(タケネートD110N:三井武田ケミカル社)
・トルエン 7.5部
・メチルエチルケトン 7.5部
<Prescription of Coating Solution for Coating Film Formation of Reference Example 2 >
・ Acrylic polyol resin (solid content 50%) 10 parts (Acridic A814: Dainippon Ink & Chemicals, Inc.)
・ Isocyanate-based crosslinking agent (solid content 60%) 3.6 parts (Takenate D110N: Mitsui Takeda Chemical Company)
・ Toluene 7.5 parts ・ Methyl ethyl ketone 7.5 parts
[実施例5]
実施例1の易接着処理液で、エポキシ基を有するオルガノシランとしてγ−グリシドキシプロピルトリメトキシシランの代りに、3、4−エポキシシクロヘキシルエチルトリメトキシシラン(KBM−303:信越シリコーン社)を用いた以外は、実施例1と同様にして、実施例5の塗膜を形成した。
[Example 5]
In the easy adhesion treatment solution of Example 1, 3,4-epoxycyclohexylethyltrimethoxysilane (KBM-303: Shin-Etsu Silicone) was used as an organosilane having an epoxy group instead of γ-glycidoxypropyltrimethoxysilane. A coating film of Example 5 was formed in the same manner as Example 1 except that it was used.
[実施例6]
実施例1の易接着処理液で、エポキシ基を有するオルガノシランとしてγ−グリシドキシプロピルトリメトキシシランの代りに、γ−グリシドキシプロピルトリエトキシシラン(KBE−403:信越シリコーン社)を用いた以外は、実施例1と同様にして、実施例6の塗膜を形成した。
[Example 6]
In the easy-adhesion treatment solution of Example 1, γ-glycidoxypropyltriethoxysilane (KBE-403: Shin-Etsu Silicone) was used instead of γ-glycidoxypropyltrimethoxysilane as an organosilane having an epoxy group. A coating film of Example 6 was formed in the same manner as Example 1 except that.
[比較例1]
実施例1の易接着処理液の代りに、加水分解部分縮合物に調整しなかったエポキシ基を有するオルガノシラン(γ−グリシドキシプロピルトリメトキシシラン:KBM−403:信越シリコーン社)を用いた以外は、実施例1と同様にして、表面がクロムからなる被塗布物に易接着処理を施し、比較例1の塗膜を形成した。
[Comparative Example 1]
Instead of the easy-adhesion treatment liquid of Example 1, an organosilane having an epoxy group that was not adjusted to a hydrolyzed partial condensate (γ-glycidoxypropyltrimethoxysilane: KBM-403: Shin-Etsu Silicone) was used. Except for the above, in the same manner as in Example 1, an easy-adhesion treatment was applied to the coated object whose surface is made of chromium, and the coating film of Comparative Example 1 was formed.
[比較例2]
実施例1の易接着処理液の代りに、比較例1と同様にして、加水分解部分縮合物に調整しなかったエポキシ基を有するオルガノシランを用いて、スピンコーターで塗布した。次に、乾燥・キュアリングの時間を150℃、90分間とした以外は、比較例1と同様にして、表面がクロムからなる被塗布物に易接着処理を施し、比較例2の塗膜を形成した。
[Comparative Example 2]
Instead of the easy-adhesion treatment liquid of Example 1, in the same manner as in Comparative Example 1, an organosilane having an epoxy group that was not adjusted to a hydrolyzed partial condensate was used and applied with a spin coater. Next, except that the drying and curing time was set at 150 ° C. for 90 minutes, the surface of the coated object made of chromium was subjected to an easy adhesion treatment in the same manner as in Comparative Example 1, and the coating film of Comparative Example 2 was applied. Formed.
[比較例3〜6]
実施例1の易接着処理液で、エポキシ基を有するオルガノシランの代りに、比較例3としてビニル基を有するオルガノシラン(KBM−1003:信越シリコーン社)、比較例4としてメタクリル基を有するオルガノシラン(KBM−503:信越シリコーン社)、比較例5としてアミノ基を有するオルガノシラン(KBM−903:信越シリコーン社)、比較例6としてフッ素を有するオルガノシラン(KBM−7803:信越シリコーン社)を用いた以外は、実施例1と同様にして、比較例3〜6の塗膜を形成した。
[Comparative Examples 3 to 6]
In the easy-adhesion treatment solution of Example 1, instead of an organosilane having an epoxy group, organosilane having a vinyl group (KBM-1003: Shin-Etsu Silicone) as Comparative Example 3, and organosilane having a methacrylic group as Comparative Example 4 (KBM-503: Shin-Etsu Silicone Co., Ltd.), Comparative Example 5 uses aminosilane-containing organosilane (KBM-903: Shin-Etsu Silicone Co., Ltd.), and Comparative Example 6 uses fluorine-containing organosilane (KBM-7803: Shin-Etsu Silicone Co., Ltd.). A coating film of Comparative Examples 3 to 6 was formed in the same manner as in Example 1 except that.
実施例、及び比較例で得られた塗膜について、表面がクロムからなる被塗布物との接着性と、塗膜の外観について評価した。評価結果を表1に示す。 About the coating film obtained by the Example and the comparative example, the adhesiveness with the to-be-coated object which the surface consists of chromium, and the external appearance of the coating film were evaluated. The evaluation results are shown in Table 1.
(1)接着性の評価
実施例、及び比較例で得られた塗膜を、JIS K5600−5−6:1999に準じて、付着性(クロスカット法)により接着性について評価した。評価は、全く剥離が起きないものを「○」、ほぼ全て剥離してしまうものを「×」とした。
(1) Evaluation of adhesiveness The coating films obtained in Examples and Comparative Examples were evaluated for adhesiveness by adhesion (cross-cut method) according to JIS K5600-5-6: 1999. In the evaluation, “◯” indicates that no peeling occurred, and “×” indicates that almost all peeling occurred.
(2)塗膜の外観の評価
実施例及び比較例で得られた塗膜を目視にて観察し、全くムラがなく均一な塗膜となったものを「○」、少しムラのある塗膜となったもの「△」、ムラが生じピンホール等の塗膜欠陥のあったものを「×」、(1)の試験で表面がクロムからなる被塗布物から塗膜が剥がれたため評価しなかったものを「−」とした。
(2) Evaluation of the appearance of the coating film The coating films obtained in the examples and comparative examples were visually observed. "△", those with unevenness and film defects such as pinholes were evaluated as "X", because the coating film was peeled off from the coated object made of chromium in the test of (1) “−” Was used as the target.
実施例1,2,5,6および参考例1,2はエポキシ基を有するオルガノシランの加水分解部分縮合物を含む易接着処理液であったため、低温、短時間の乾燥で、易接着処理が完了し、得られた塗膜は、表面がクロムからなる被塗布物との接着性に優れたものとなった。 Examples 1 , 2, 5, and 6 and Reference Examples 1 and 2 were easy adhesion treatment liquids containing a hydrolyzed partial condensate of an organosilane having an epoxy group. When completed, the resulting coating film was excellent in adhesiveness to the coated object whose surface is made of chromium.
特に、実施例1〜2、5、6および参考例1の塗膜は、上述の易接着処理液と、シリコーン樹脂を含む塗膜形成用塗布液の2種類の塗布液からなる塗膜形成材料を用いて形成された塗膜であったため、全くムラがなく均一で美しい塗膜となった。 In particular, the coating films of Examples 1 to 2 , 5, 6 and Reference Example 1 consist of two types of coating liquids: the above-mentioned easy adhesion treatment liquid and a coating liquid for coating film formation containing a silicone resin. Since the coating film was formed using, the film was uniform and beautiful without any unevenness.
一方、比較例1は、加水分解部分縮合物に調整しなかったエポキシ基を有するオルガノシランを易接着処理液として用いたため、低温、短時間の乾燥では易接着処理が完了せず、表面がクロムからなる被塗布物との接着性が低いものとなった。 On the other hand, since Comparative Example 1 used an organosilane having an epoxy group that was not adjusted to a hydrolyzed partial condensate as an easy-adhesion treatment liquid, the easy-adhesion treatment was not completed by drying at low temperature for a short time, and the surface was chromium. Adhesiveness with the coated object consisting of was low.
次に、比較例2は、比較例1と同様に、加水分解部分縮合物に調整しなかったエポキシ基を有するオルガノシランを易接着処理液として用い、高温、長時間(150℃、90分)の乾燥・キュアリングをしたところ、易接着処理は完了し、得られた塗膜は、表面がクロムからなる被塗布物との接着性に優れたものとなった。しかし、易接着処理を施すために高温、長時間を要したため、塗膜はムラが生じピンホール等の塗膜欠陥のあるものとなってしまった。 Next, in Comparative Example 2, as in Comparative Example 1, organosilane having an epoxy group that was not adjusted to a hydrolyzed partial condensate was used as an easy-adhesion treatment solution, and the high temperature, long time (150 ° C., 90 minutes) After drying and curing, the easy adhesion treatment was completed, and the obtained coating film was excellent in adhesiveness with the coated object whose surface is made of chromium. However, since it took a high temperature and a long time to perform the easy adhesion treatment, the coating film became uneven and had coating film defects such as pinholes.
次に、比較例3〜6は、オルガノシランの加水分解部分縮合物を含むものを易接着処理液として用いたが、エポキシ基を有するものではなかったため、得られた塗膜は、表面がクロムからなる被塗布物との接着性が低いものとなった。 Next, although Comparative Examples 3-6 used what contained the hydrolysis partial condensate of organosilane as an easily bonding process liquid, since it did not have an epoxy group, the surface of the obtained coating film was chromium. Adhesiveness with the coated object consisting of was low.
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