JP4958010B2 - Thin film laminate manufacturing equipment - Google Patents

Thin film laminate manufacturing equipment Download PDF

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JP4958010B2
JP4958010B2 JP2008034346A JP2008034346A JP4958010B2 JP 4958010 B2 JP4958010 B2 JP 4958010B2 JP 2008034346 A JP2008034346 A JP 2008034346A JP 2008034346 A JP2008034346 A JP 2008034346A JP 4958010 B2 JP4958010 B2 JP 4958010B2
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flexible substrate
strip
shaped flexible
belt
thin film
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JP2009191326A (en
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勝治 横山
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Fuji Electric Co Ltd
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Fuji Electric Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/30Orientation, displacement, position of the handled material
    • B65H2301/32Orientation of handled material
    • B65H2301/323Hanging
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B10/00Integration of renewable energy sources in buildings
    • Y02B10/10Photovoltaic [PV]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)

Description

本発明は、住宅の屋根、ビルディングの屋上等に設置することにより太陽光を利用して電力を発生する薄膜太陽電池の光電変換ユニットを形成する薄膜積層体等に適用され、成膜室内に、可撓性フィルム基板を走行させて、該成膜室内で可撓性フィルム基板上に薄膜を連続的に形成する薄膜積層体を製造する装置に関する。   The present invention is applied to a thin film laminate or the like that forms a photoelectric conversion unit of a thin film solar cell that generates power using sunlight by installing it on the roof of a house, the roof of a building, etc. The present invention relates to an apparatus for manufacturing a thin film laminate in which a flexible film substrate is run and a thin film is continuously formed on the flexible film substrate in the film forming chamber.

半導体薄膜などの薄膜積層体の基板には、通常、高剛性の基板が用いられている。しかしながら、例えば太陽電池等に使用される光電変換素子の基板には、軽量で取り扱いが容易であるといった利便性や、大量生産によるコスト低減のため、樹脂などの可撓性基板も用いられている。   As a substrate for a thin film laminate such as a semiconductor thin film, a highly rigid substrate is usually used. However, a flexible substrate such as a resin is also used for a substrate of a photoelectric conversion element used for, for example, a solar cell for convenience such as light weight and easy handling and cost reduction due to mass production. .

このような可撓性基板を用いて薄膜積層体を製造する装置として、特許文献1(特開2005−72408号公報)には、連続して配列された複数の成膜室に、帯状の可撓性基板を通し、各成膜室で停止した状態の前記基板の表面上に成膜を行い、次いでこの可撓性基板を次の成膜室の位置まで搬送する操作を繰り返し、可撓性基板の上に複数の異なる性質の薄膜を積層するという成膜装置が提供されている。
特開2005-72408号公報
As an apparatus for manufacturing a thin film laminate using such a flexible substrate, Patent Document 1 (Japanese Patent Application Laid-Open No. 2005-72408) discloses a strip-like structure in a plurality of continuously formed film forming chambers. The film is formed on the surface of the substrate stopped in each film formation chamber through the flexible substrate, and then the operation of transporting the flexible substrate to the position of the next film formation chamber is repeated. There has been provided a film forming apparatus in which a plurality of thin films having different properties are stacked on a substrate.
JP 2005-72408 A

このような成膜装置としては、帯状可撓性基板の幅方向を水平方向に保持して、帯状可撓性基板を水平方向に搬送して成膜を行うタイプと、帯状可撓性基板の幅方向を鉛直方向に保持して、帯状可撓性基板を水平方向に搬送して成膜を行うタイプなどがある。
後者のタイプは、前者のタイプに比べ、帯状可撓性基板の表面が汚染されにくい等の利点があるが、成膜室の数が多くなると、重力や可撓性基板の伸びにより、可撓性基板の表面に皺が発生したり、可撓性基板が幅方向に蛇行したり、下方へ垂れ下がったりするという問題がある。
As such a film forming apparatus, there are a type in which the width direction of the belt-like flexible substrate is held in the horizontal direction and the belt-like flexible substrate is transported in the horizontal direction to form a film, and a belt-like flexible substrate There is a type in which film formation is performed by holding the width direction in the vertical direction and transporting the belt-like flexible substrate in the horizontal direction.
The latter type has an advantage over the former type in that the surface of the strip-shaped flexible substrate is less likely to be contaminated. However, when the number of film forming chambers increases, the flexibility increases due to gravity and the elongation of the flexible substrate. There is a problem that wrinkles occur on the surface of the conductive substrate, the flexible substrate meanders in the width direction, or hangs downward.

かかる問題を解消するため、多数配列された成膜室のうちの中央に位置する2室の成膜室の問に中間室を配置し、ここで基板の幅方向の全面にわたって基板表面と接触する側端位置制御(EPC)ローラを設けることが提案されている。
しかしながら、通常、成膜は比較的に高い温度で行われることから、このようなステンレス製のEPCローラを成膜室の間に配置すると、当該EPCローラによって可撓性基板が急冷され、皺が発生するなどの問題がある。
In order to solve such a problem, an intermediate chamber is disposed between two film forming chambers located at the center of a plurality of film forming chambers, and contacts the substrate surface over the entire surface in the width direction of the substrate. It has been proposed to provide side end position control (EPC) rollers.
However, since the film formation is usually performed at a relatively high temperature, when such a stainless steel EPC roller is disposed between the film formation chambers, the flexible substrate is rapidly cooled by the EPC roller, and the wrinkles are generated. There are problems such as occurring.

本発明はこのような実状に鑑みてなされたものであって、その目的は、帯状可撓性基板の幅方向を鉛直方向に向けながら、帯状可撓性基板を水平方向に長い距離にわたり搬送しても、帯状可撓性基板の表面に皺が発生したり、帯状可撓性基板が幅方向に蛇行したり、あるいは下方へ垂れ下がったりするのを防止することが可能な薄膜積層体の製造装置を提供することにある。   The present invention has been made in view of such a situation, and an object of the present invention is to convey the strip-shaped flexible substrate over a long distance in the horizontal direction while directing the width direction of the strip-shaped flexible substrate in the vertical direction. However, an apparatus for manufacturing a thin film laminate that can prevent wrinkles from occurring on the surface of the strip-shaped flexible substrate, meandering the strip-shaped flexible substrate in the width direction, or drooping downward. Is to provide.

上記従来技術の有する課題を解決するために、本発明は、帯状可撓性基板の表面に複数の薄膜を積層して薄膜積層体を製造する装置であって、前記帯状可撓性基板の幅方向が鉛直方向になるようにして、前記帯状可撓性基板を水平方向に搬送する基板搬送手段と、前記帯状可撓性基板の搬送方向に沿って連続して配列され、前記帯状可撓性基板の表面に成膜を行う複数の成膜室とを具備する薄膜積層体の製造装置において、前記複数の成膜室のそれぞれの間に配置され、前記帯状可撓性基板の鉛直方向上側の端部両面を挟む複数対のスパイラルローラを備えている。   In order to solve the above-described problems of the prior art, the present invention provides an apparatus for manufacturing a thin film laminate by laminating a plurality of thin films on the surface of a strip-shaped flexible substrate, the width of the strip-shaped flexible substrate being The belt-like flexible substrate is arranged continuously along the carrying direction of the belt-like flexible substrate, and a substrate carrying means for carrying the belt-like flexible substrate in the horizontal direction so that the direction is vertical. In a manufacturing apparatus for a thin film stack including a plurality of film forming chambers for forming a film on a surface of a substrate, the thin film stack body is disposed between each of the plurality of film forming chambers, A plurality of pairs of spiral rollers sandwiching both end surfaces are provided.

上記発明において、好ましくは次のように構成する。
(1)前記複数の成膜室のうちの中央に位置する2室の成膜室の間において、前記上側の端部を挟む対のスパイラルローラが、連続して2対以上設置されている。
(2)前記スパイラルローラは、ローラ端部から形成されるスパイラル状の溝または突起の形態を有し、該スパイラル状の溝または突起の搬送方向に直角な線に対する傾斜角度は、1°〜6°の範囲である。
In the said invention, Preferably it comprises as follows.
(1) Two or more pairs of spiral rollers sandwiching the upper end are continuously provided between two film forming chambers located in the center of the plurality of film forming chambers.
(2) The spiral roller has a form of a spiral groove or protrusion formed from an end of the roller, and the inclination angle of the spiral groove or protrusion with respect to a line perpendicular to the conveying direction is 1 ° to 6 °. It is in the range of °.

上述の如く、本発明によれば、帯状可撓性基板の表面に複数の薄膜を積層して薄膜積層体を製造するものであって、前記帯状可撓性基板の幅方向が鉛直方向になるようにして、前記帯状可撓性基板を水平方向に搬送する基板搬送手段と、前記帯状可撓性基板の搬送方向に沿って連続して配列され、前記帯状可撓性基板の表面に成膜を行う複数の成膜室とを具備しており、前記複数の成膜室のそれぞれの間に配置され、前記帯状可撓性基板の鉛直方向上側の端部両面を挟む複数対のスパイラルローラを備えているので、帯状可撓性基板が水平方向に搬送される際に、帯状可撓性基板を上方に持ち上げる力が発生し、帯状可撓性基板の鉛直方向における位置を精度高く維持することができる。
これにより、帯状可撓性基板が複数の成膜室の問を長い距離にわたって搬送されても、帯状可撓性基板に皺が発生したり、帯状可撓性基板が幅方向に蛇行したり、帯状可撓性基板が下方へ垂れ下がったりするのを防ぐことができる。
As described above, according to the present invention, a thin film laminate is manufactured by laminating a plurality of thin films on the surface of a strip-shaped flexible substrate, and the width direction of the strip-shaped flexible substrate is a vertical direction. In this way, the substrate transport means for transporting the belt-like flexible substrate in the horizontal direction and the belt-like flexible substrate are continuously arranged along the transport direction of the belt-like flexible substrate, and are formed on the surface of the belt-like flexible substrate. A plurality of film forming chambers, and a plurality of pairs of spiral rollers disposed between each of the plurality of film forming chambers and sandwiching both end surfaces on the upper side in the vertical direction of the belt-like flexible substrate. Therefore, when the strip-shaped flexible substrate is transported in the horizontal direction, a force for lifting the strip-shaped flexible substrate is generated, and the position of the strip-shaped flexible substrate in the vertical direction is maintained with high accuracy. Can do.
Thereby, even if the belt-like flexible substrate is transported over a long distance through a plurality of film formation chambers, wrinkles occur in the belt-like flexible substrate, the belt-like flexible substrate meanders in the width direction, It is possible to prevent the belt-like flexible substrate from hanging down.

また、本発明に係る簿膜積層体の製造装置は、前記複数の成膜室のうちの中央に位置する2室の成膜室の間において、前記上側の端部を挟む対のスパイラルローラが、連続して2対以上設置され、あるいは、ローラ端部から形成されるスパイラル状の溝または突起の形態を有し、該スパイラル状の溝または突起の搬送方向に直角な線に対する傾斜角度は、1°〜6°の範囲であるので、帯状可撓性基板の皺の発生、帯状可撓性基板の幅方向への蛇行、帯状可撓性基板の下方への垂れ下がりの防止効果をより一層高めることができる。   Further, the book film laminate manufacturing apparatus according to the present invention includes a pair of spiral rollers sandwiching the upper end portion between two film forming chambers located in the center of the plurality of film forming chambers. Two or more pairs in succession, or having a spiral groove or protrusion formed from the end of the roller, and the inclination angle of the spiral groove or protrusion with respect to a line perpendicular to the conveying direction is: Since it is in the range of 1 ° to 6 °, the effect of preventing wrinkles of the strip-shaped flexible substrate, meandering in the width direction of the strip-shaped flexible substrate, and drooping down of the strip-shaped flexible substrate is further enhanced. be able to.

以下、本発明の薄膜積層体の製造装置について、図面を参照して、その実施形態に基づき更に詳細に説明する。
なお、ここでは、薄膜積層体の具体的な構成について特に言及しないが、本発明は、例えば、太陽電池用の光電変換素子や、有機EL等の半導体薄膜などの薄膜積層体の製造に適用することができる。
Hereinafter, the manufacturing apparatus of the thin film laminated body of this invention is demonstrated still in detail based on the embodiment with reference to drawings.
In addition, although it does not mention in particular here about the specific structure of a thin film laminated body, this invention is applied to manufacture of thin film laminated bodies, such as a semiconductor thin film, such as a photoelectric conversion element for solar cells, and organic EL, for example. be able to.

図1は、本発明に係る薄膜積層体の製造装置の実施の形態を模式的に示す平面図である。図2は、図1のA−A線から見た正面図である。なお、図面はデフォルメされており、実物を縮尺通りに描いたものではない。   FIG. 1 is a plan view schematically showing an embodiment of a thin film laminate manufacturing apparatus according to the present invention. FIG. 2 is a front view taken along line AA in FIG. The drawings are deformed and are not drawn to scale.

図1及び図2に示すように、本実施形態の薄膜積層体(例えば薄膜光電変換素子)の製造装置は、帯状可撓性基板1を送り出す巻出部10と、帯状可撓性基板1の蛇行を制御する蛇行制御部20と、帯状可撓性基板1の搬送方向を規定するガイド部30と、帯状可撓性基板1上に複数の薄膜を積層する成膜部40と、帯状可撓性基板1の搬送を制御する搬送部60と、薄膜積層体が形成された帯状可撓性基板1を巻き取る巻取部70とから主に構成されている。なお、帯状可撓性基板1は、その幅方向が鉛直方向を向きながら、水平方向へと搬送されるようになっている。   As shown in FIG. 1 and FIG. 2, the apparatus for manufacturing a thin film laminate (for example, a thin film photoelectric conversion element) of this embodiment includes an unwinding unit 10 that sends out a strip-shaped flexible substrate 1, and a strip-shaped flexible substrate 1. A meandering control unit 20 for controlling meandering, a guide unit 30 for defining the transport direction of the strip-shaped flexible substrate 1, a film forming unit 40 for laminating a plurality of thin films on the strip-shaped flexible substrate 1, and a strip-shaped flexible substrate The transport unit 60 that controls transport of the conductive substrate 1 and a winding unit 70 that winds the strip-shaped flexible substrate 1 on which the thin film laminate is formed are mainly configured. In addition, the strip | belt-shaped flexible board | substrate 1 is conveyed by the horizontal direction, while the width direction faces a perpendicular direction.

巻出部10には、帯状可撓性基板1がロール状に巻かれた原反から、当該帯状可撓性基板1を送り出す巻出コア11と、該巻出コア11から送り出された帯状可撓性基板1の張力を制御するテンションローラ12,13が設けられている。これら巻出ローラ11及びテンションローラ12,13は、軸方向が鉛直方向になるようにそれぞれ設置され、テンションローラ12,13は巻出コア11の下流側に配置されている。
なお、以下に説明する各ローラも、特に言及しない限り、軸方向が鉛直方向になるように設置されている。
The unwinding section 10 includes an unwinding core 11 that feeds out the band-shaped flexible substrate 1 from the original roll on which the band-shaped flexible substrate 1 is wound in a roll shape, and a band-shaped flexible member that is fed out from the unwinding core 11 Tension rollers 12 and 13 for controlling the tension of the flexible substrate 1 are provided. The unwinding roller 11 and the tension rollers 12 and 13 are installed such that the axial direction is the vertical direction, and the tension rollers 12 and 13 are disposed on the downstream side of the unwinding core 11.
Each roller described below is also installed so that the axial direction is the vertical direction unless otherwise specified.

前記蛇行制御部20には、巻出部10からの帯状可撓性基板1が鉛直方向、すなわち幅方向に蛇行するのを防ぐために、3本の側端位置制御(EPC)ローラ21〜23が設けられている。これらEPCローラ21〜23は、帯状可撓性基板1の幅よりも広いローラ面を有している。   The meander control unit 20 includes three side end position control (EPC) rollers 21 to 23 to prevent the belt-like flexible substrate 1 from the unwinding unit 10 from meandering in the vertical direction, that is, the width direction. Is provided. These EPC rollers 21 to 23 have a roller surface wider than the width of the strip-shaped flexible substrate 1.

ガイド部30には、蛇行制御部20から帯状可撓性基板1を受け取り、帯状可撓性基板1の進行方向を90°変えて成膜部40へと送るガイドローラ31,32が設けられている。下流側のガイドローラ32には、帯状可撓性基板1の側端位置を検出するEPC蛇行センサ(図示省略)が設けられている。なお、EPC蛇行センサは、必要により、帯状可撓性基板1の搬送経路に適宜設けることができる。   The guide unit 30 is provided with guide rollers 31 and 32 that receive the strip-shaped flexible substrate 1 from the meandering control unit 20 and change the traveling direction of the strip-shaped flexible substrate 1 to the film forming unit 40 by changing it by 90 °. Yes. The guide roller 32 on the downstream side is provided with an EPC meandering sensor (not shown) that detects the side end position of the strip-shaped flexible substrate 1. The EPC meandering sensor can be appropriately provided in the transport path of the strip-shaped flexible substrate 1 as necessary.

成膜部40には、帯状可撓性基板1の表面上に順次、薄膜を積層するために、複数の成膜室42a〜42mが、一直線上に配列されている。また、これら成膜室42a〜42mの基板入口の手前側には、それぞれ、帯状可撓性基板1を挟む一対のスパイラルローラ44a〜44mが設けられている。
スパイラルローラ44a〜44m は、図2に示すように、帯状可撓性基板1の鉛直方向上側の端部と、下側の端部の両方に配置されている。また、スパイラルローラ44a〜44mは、詳しくは後述するが、図2に示すように、水平方向に対して基本的には水平設置であるか、傾斜させて設置されている。
In the film forming unit 40, a plurality of film forming chambers 42 a to 42 m are arranged in a straight line in order to sequentially stack thin films on the surface of the strip-shaped flexible substrate 1. A pair of spiral rollers 44a to 44m sandwiching the belt-like flexible substrate 1 are provided on the front side of the substrate entrance of these film forming chambers 42a to 42m, respectively.
As shown in FIG. 2, the spiral rollers 44 a to 44 m are arranged at both the upper end portion and the lower end portion of the strip-like flexible substrate 1 in the vertical direction. As will be described in detail later, the spiral rollers 44a to 44m are basically horizontally installed or inclined with respect to the horizontal direction as shown in FIG.

図1及び図2中には、13室の成膜室42a〜42mが示されているが、これら複数の成膜室のほぼ中央の位置、すなわち第7成膜室42gと第8成膜室42hとの間には、連続して複数対のスパイラルローラ52a,52bが設けられている。このように中央の位置に連続して複数対のスパイラルローラ52a,52bを設けることで、フィルム基板の質量支持と搬送精度調整を行うことが可能となる。
また、最後の成膜室、すなわち第13成膜室42mの基板出口の外側にも、連続して複数対のスパイラルローラ52c,52dが設けられている。このように最後の成膜室42mの後に連続して複数対のスパイラルローラ52c,52dを設けることで、フィルム基板の質量支持と搬送精度調整を行うことが可能となる。
FIGS. 1 and 2 show thirteen film forming chambers 42a to 42m. The center positions of the plurality of film forming chambers, that is, the seventh film forming chamber 42g and the eighth film forming chamber are shown. A plurality of pairs of spiral rollers 52a and 52b are provided continuously between 42h. In this way, by providing a plurality of pairs of spiral rollers 52a and 52b continuously at the center position, it is possible to perform mass support and conveyance accuracy adjustment of the film substrate.
Also, a plurality of pairs of spiral rollers 52c and 52d are continuously provided outside the substrate outlet of the last film forming chamber, that is, the thirteenth film forming chamber 42m. As described above, by providing a plurality of pairs of spiral rollers 52c and 52d continuously after the last film formation chamber 42m, it is possible to perform mass support and conveyance accuracy adjustment of the film substrate.

搬送部60には、成膜室40からの帯状可撓性基板1の進行方向を90°変えるフードローラ61と、帯状可撓性基板1を搬送方向に送る巻取ロール62,63が設けられ、巻取ロール62,63はフードローラ61の下流側に配置されている。
また、巻取部70には、帯状可撓性基板1の張力を制御するテンションローラ71,72と、薄膜積層体が形成された帯状可撓性基板1をロール状に巻き取る巻取コア71が設けられ、テンションローラ71,72は巻取コア71の上流側に配置されている。
The transport unit 60 is provided with a hood roller 61 that changes the traveling direction of the strip-shaped flexible substrate 1 from the film forming chamber 40 by 90 °, and winding rolls 62 and 63 that send the strip-shaped flexible substrate 1 in the transport direction. The winding rolls 62 and 63 are arranged on the downstream side of the hood roller 61.
The winding unit 70 includes tension rollers 71 and 72 for controlling the tension of the strip-shaped flexible substrate 1 and a winding core 71 that winds the strip-shaped flexible substrate 1 on which the thin film laminate is formed in a roll shape. The tension rollers 71 and 72 are disposed on the upstream side of the winding core 71.

次に、成膜室42の構造についてより詳細に説明する。
帯状可撓性基板1の表面上に複数の異なる性質の薄膜を積層することから、各成膜室の構造は、形成する薄膜の種類によって異なるが、ここでは、プラズマCVDによってアモルファスシリコン層を成膜する成膜室について説明する。その他の種類の薄膜を形成する場合であっても、成膜室内を気密状態にするのであれば、同様の構造を採用することができる。
Next, the structure of the film forming chamber 42 will be described in more detail.
Since a plurality of thin films having different properties are laminated on the surface of the strip-shaped flexible substrate 1, the structure of each film forming chamber varies depending on the type of thin film to be formed. Here, an amorphous silicon layer is formed by plasma CVD. A film formation chamber for film formation will be described. Even when other types of thin films are formed, the same structure can be adopted as long as the film forming chamber is hermetically sealed.

図3(A)は、図1に示した成膜室42を模式的に拡大した断面平面図である。また、図3(B)は、図3(A)のB−B線から見た正面図である。
図3(A)及び(B)に示すように、帯状可撓性基板1の両面側には、それぞれ断面コ字形状の成膜室42の壁80a,80bが対向して配置されている。これら壁80a,80b は、成膜する際に、壁の先端部が帯状可撓性基板1の表面に密着するまで可動する構成となっている。なお、壁80(80a,80b) の先端部には、成膜室42内を気密状態にするためのシール材(図示省略〉が取り付けられている。
FIG. 3A is a cross-sectional plan view schematically enlarging the film formation chamber 42 shown in FIG. FIG. 3B is a front view as seen from the line BB in FIG.
As shown in FIGS. 3A and 3B, the walls 80 a and 80 b of the film forming chamber 42 having a U-shaped cross section are arranged on both sides of the belt-like flexible substrate 1 so as to face each other. These walls 80 a and 80 b are configured to move until the tip of the wall is in close contact with the surface of the strip-shaped flexible substrate 1 during film formation. A sealing material (not shown) for attaching the inside of the film forming chamber 42 to the airtight state is attached to the tip of the wall 80 (80a, 80b).

成膜室42の内部空間には、帯状可撓性基板1を間に挟んで対向するように、高電圧電極81と、基板ヒータを備えた接地電極82とが設置されている。成膜室42を構成する壁80bには、成膜室42内を排気して真空雰囲気にする排気管83が設けられている。
また、成膜室42の壁80には、高電圧電極81と接地電極82との間で生ずるプラズマによって分解して薄膜を形成するためのシラン等の反応ガスを導入する導入管(図示省略)が設けられている。
A high voltage electrode 81 and a ground electrode 82 equipped with a substrate heater are installed in the inner space of the film forming chamber 42 so as to face each other with the belt-like flexible substrate 1 interposed therebetween. An exhaust pipe 83 that exhausts the inside of the film forming chamber 42 to make a vacuum atmosphere is provided on the wall 80 b constituting the film forming chamber 42.
Further, an introduction pipe (not shown) for introducing a reactive gas such as silane to be decomposed by plasma generated between the high voltage electrode 81 and the ground electrode 82 to form a thin film is formed on the wall 80 of the film forming chamber 42. Is provided.

高電圧電極81と接地電極82の幅方向の長さは、図3(B)に示すように、帯状可撓性基板1の両端に薄膜を形成しない余白90ができるように、帯状可撓性基板1の幅よりも短くなっている。そして、この余白90の部分で帯状可撓性基板1を挟むように、帯状可撓性基板1の上側と下側にそれぞれ一対のスパイラルローラ44B,44B1が配置されている。このように薄膜を形成しない余白90の部分の上下をスパイラルローラ44B,44B1で挟むことで、帯状可撓性基板1の薄膜が形成される部分に皺が生じたり、形成した薄膜が損傷したりするのを防ぐことが可能となる。   The length in the width direction of the high-voltage electrode 81 and the ground electrode 82 is such that the strip-like flexibility is formed so that a blank 90 is formed at both ends of the strip-like flexible substrate 1 as shown in FIG. It is shorter than the width of the substrate 1. Then, a pair of spiral rollers 44B and 44B1 are arranged on the upper side and the lower side of the strip-like flexible substrate 1 so that the strip-like flexible substrate 1 is sandwiched between the margins 90. By sandwiching the upper and lower portions of the margin 90 where the thin film is not formed between the spiral rollers 44B and 44B1, wrinkles occur in the portion where the thin film of the strip-shaped flexible substrate 1 is formed, or the formed thin film is damaged. Can be prevented.

また、上側のスパイラルローラ44Bは、該ローラの回転方向が、帯状可撓性基板1の搬送方向(すなわち水平方向)に対して基本的に水平設置されているが、傾斜配置されても良い。
図5に示すように、上側のスパイラルローラ44Bの回転方向と、帯状可撓性基板1の搬送方向との間にスパイラルローラ44Bの端面を基準に、ローラ端部から形成されるスパイラル状の溝44xあるいは突起を有することで、帯状可撓性基板1が水平方向に搬送される際に、帯状可撓性基板1を上方に持ち上げる力が発生し、帯状可撓性基板1の鉛直方向における位置を精度高く維持することができるようになっている。
The upper spiral roller 44B is basically horizontally installed with respect to the direction of conveyance of the belt-shaped flexible substrate 1 (that is, the horizontal direction), but may be inclined.
As shown in FIG. 5, a spiral groove formed from the end of the roller with reference to the end face of the spiral roller 44B between the rotational direction of the upper spiral roller 44B and the transport direction of the belt-like flexible substrate 1 When the belt-shaped flexible substrate 1 is transported in the horizontal direction by having 44x or the protrusion, a force for lifting the belt-shaped flexible substrate 1 upward is generated, and the position of the belt-shaped flexible substrate 1 in the vertical direction is generated. Can be maintained with high accuracy.

スパイラルローラ44Bに刻設された溝44xの傾斜角度θspは、0.1°〜6°の範囲にあるのが好ましい。スパイラルローラ溝44xの傾斜角度θspが大きい程、帯状可撓性基板1を持ち上げる力は高くなるが、溝44xの傾斜角度θspが6°を超えるかまたはローラ自身の静止摩擦力を超えると、帯状可撓性基板1を持ち上げる力はほとんど向上しなくなる。   The inclination angle θsp of the groove 44x formed on the spiral roller 44B is preferably in the range of 0.1 ° to 6 °. As the inclination angle θsp of the spiral roller groove 44x is larger, the force for lifting the belt-shaped flexible substrate 1 becomes higher. However, when the inclination angle θsp of the groove 44x exceeds 6 ° or exceeds the static frictional force of the roller itself, the belt-like shape is increased. The force for lifting the flexible substrate 1 hardly improves.

下側のスパイラルローラ44B1は、該ローラの回転方向が、帯状可撓性基板1の搬送方向(すなわち水平方向)に対して基本的に水平設置されているが、傾斜配置されても良い。
スパイラルローラ44B1の端面を基準に、ローラ端部から形成されるスパイラル状の溝44xあるいは突起を有することで、帯状可撓性基板1が水平方向に搬送される際に、帯状可撓性基板1を下方に引く力が発生し、帯状可撓性基板1が水平方向に搬送される際に、帯状可撓性基板1の表面に皺が発生するのを防ぐことが可能となっている。θspは、0.1°〜6°の範囲にあるのが好ましい。
The lower spiral roller 44 </ b> B <b> 1 is basically horizontally installed with respect to the conveyance direction (that is, the horizontal direction) of the belt-shaped flexible substrate 1, but may be inclined.
By having a spiral groove 44x or a protrusion formed from the end of the roller with reference to the end face of the spiral roller 44B1, the belt-like flexible substrate 1 is transported when the belt-like flexible substrate 1 is conveyed in the horizontal direction. When the belt-like flexible substrate 1 is transported in the horizontal direction, it is possible to prevent wrinkles from being generated on the surface of the belt-like flexible substrate 1. θsp is preferably in the range of 0.1 ° to 6 °.

次に、スパイラルローラ44Bとその付属装置の構成について説明する。
図4は、上側のスパイラルローラ44Bとその付属装置の一例を模式的に示す斜視図である。図5は、図4のスパイラルローラの正面図である。
図4及び図5に示すように、1対のスパイラルローラ44Bは、ローラ固定用軸91の下端にそれぞれ回転可能に設けられている。一方のローラ固定用軸91の上端は、ローラ固定部92の下面に固定されており、他方のローラ固定用軸91の上端は、ローラ可動部93の下面に固定されている。
Next, the configuration of the spiral roller 44B and its attached devices will be described.
FIG. 4 is a perspective view schematically showing an example of the upper spiral roller 44B and its attached device. FIG. 5 is a front view of the spiral roller of FIG.
As shown in FIGS. 4 and 5, the pair of spiral rollers 44 </ b> B is rotatably provided at the lower end of the roller fixing shaft 91. The upper end of one roller fixing shaft 91 is fixed to the lower surface of the roller fixing portion 92, and the upper end of the other roller fixing shaft 91 is fixed to the lower surface of the roller movable portion 93.

ローラ固定部92の上面には、回動支持部94が設けられ、ローラ可動部93の上面には、開口を下向きに配置したコ字形のハンドル部95の一端が設けられている。ハンドル部95の他端は、回動支持部94とヒンジ96を支点に回動可能に支持されている。
そして、ヒンジ96を支点にローラ可動部93を回動させることで、1対のスパイラルローラ44B間で帯状可撓性基板1を挟んだり、スパイラルローラ44B間の距離を離したりできるように構成されている。回動支持部94とハンドル部95の他端側とは、引張りバネ96bで連結されており、1対のスパイラルローラ44B間で帯状可撓性基板1を挟んだ状態のときに、引張りバネ96bの長さが一番短くなるよう構成されている。
A rotation support portion 94 is provided on the upper surface of the roller fixing portion 92, and one end of a U-shaped handle portion 95 having an opening facing downward is provided on the upper surface of the roller movable portion 93. The other end of the handle portion 95 is supported so as to be rotatable about a rotation support portion 94 and a hinge 96.
Then, by rotating the roller movable portion 93 with the hinge 96 as a fulcrum, the belt-like flexible substrate 1 can be sandwiched between the pair of spiral rollers 44B, or the distance between the spiral rollers 44B can be increased. ing. The rotation support portion 94 and the other end side of the handle portion 95 are connected by a tension spring 96b, and when the belt-like flexible substrate 1 is sandwiched between a pair of spiral rollers 44B, the tension spring 96b. Is configured to be the shortest.

帯状可撓性基板1に対するスパイラルローラ44Bの加圧力は、引張りバネ96bの強さにより調整可能である。スパイラルローラ44Bの加圧力は、1〜40Nが好ましい。また、スパイラルローラ44Bの加圧力を1〜4Nと低くすると、スパイラルローラ44Bのスパイラルスパイラルローラ角度θspが例えば40以上と大きい場合でも、帯状可撓性基板1を持ち上げる力を低くすることができる。
一方、スパイラルローラ44Bの加圧力を20〜40Nと高くすると、スパイラルローラ44Bのスパイラルローラスパイラルローラ角度θspが例えば2°以下と小さい場合でも、帯状可撓性基板1を持ち上げる力を高くすることができる。
The pressure applied by the spiral roller 44B to the belt-like flexible substrate 1 can be adjusted by the strength of the tension spring 96b. The applied pressure of the spiral roller 44B is preferably 1 to 40N. Further, when the pressure applied to the spiral roller 44B is lowered to 1 to 4N, even when the spiral spiral roller angle θsp of the spiral roller 44B is as large as 40 or more, for example, the force for lifting the belt-shaped flexible substrate 1 can be reduced.
On the other hand, when the pressing force of the spiral roller 44B is increased to 20 to 40 N, even when the spiral roller angle θsp of the spiral roller 44B is as small as 2 ° or less, for example, the force for lifting the belt-shaped flexible substrate 1 can be increased. it can.

ハンドル部95の一端側には、レバー98の一端がヒンジ97を支点に回動可能に取り付けられている。ヒンジ97の回動軸は、ヒンジ96の回動軸に対して垂直に配置されている。ローラ固定部92は、固定用板90の表面に固定されており、この固定用板90の表面には、バー99がハンドル部95へ突出して設けられている。
このバー99は、ヒンジ96を支点にしてハンドル部95を回動させた時のレバー98の他端の軌道に位置している。すなわち、バー99は、レバー98の他端と接触して、ハンドル部95の回動を妨げる位置にある。また、ヒンジ97を支点にしてレバー98を回動させ、レバー98の他端をバー99から逃がした場合には、ハンドル部95が自由に回動できるように構成されている。
なお、スパイラルローラ44Bは、図5に示すように、該ローラの回転方向が、帯状可撓性基板1の搬送方向に対して水平設置されている。
One end of a lever 98 is attached to one end side of the handle portion 95 so as to be rotatable about a hinge 97 as a fulcrum. The rotation axis of the hinge 97 is arranged perpendicular to the rotation axis of the hinge 96. The roller fixing portion 92 is fixed to the surface of the fixing plate 90, and a bar 99 is provided on the surface of the fixing plate 90 so as to protrude to the handle portion 95.
The bar 99 is positioned on the track of the other end of the lever 98 when the handle portion 95 is rotated with the hinge 96 as a fulcrum. That is, the bar 99 contacts the other end of the lever 98 and is in a position that prevents the handle portion 95 from rotating. Further, when the lever 98 is rotated with the hinge 97 as a fulcrum and the other end of the lever 98 is released from the bar 99, the handle portion 95 can be freely rotated.
As shown in FIG. 5, the spiral roller 44 </ b> B is installed such that the rotation direction of the roller is horizontal with respect to the transport direction of the belt-like flexible substrate 1.

以上は、上側のスパイラルローラ44Bとその付属装置の構成について税明してきたが、下側のスパイラルローラ44B1とその付属装置も、上下が逆になるが、同様の構成にすることができる。また、連続して複数対設けたスパイラルローラも、同様の構成にすることができる。
スパイラルローラ44B,44B1は、帯状可撓性基板1との接触面がシリコンゴムやフッ素等の耐熱性ゴム、PTFE、ポリイミド等の合成樹脂で作られていることが好ましい。また、ステンレス鋼や鉄にクロムめっきを施した素材であっても所定の性能が得られる。
In the above, the configuration of the upper spiral roller 44B and its attachment device has been taxed, but the lower spiral roller 44B1 and its attachment device are also upside down, but can have the same configuration. Further, the spiral rollers provided in a plurality of pairs in succession can also have the same configuration.
In the spiral rollers 44B and 44B1, the contact surface with the belt-like flexible substrate 1 is preferably made of a heat-resistant rubber such as silicon rubber or fluorine, or a synthetic resin such as PTFE or polyimide. Moreover, even if it is the raw material which gave chromium plating to stainless steel or iron, a predetermined performance is obtained.

さらに、本実施形態の製造装置には、帯状可撓性基板1の搬送及び停止、並びに各成膜室42の壁80a,80bの移動を制御する制御手段(図示省略)が設けられている。この制御手段は、必要により、帯状可撓性基板1の蛇行の程度に応じてスパイラルローラ44B,44B1、スパイラルローラ角度θspを変化させる制御を行うことが可能である。   Further, the manufacturing apparatus of the present embodiment is provided with a control means (not shown) for controlling the transport and stop of the belt-like flexible substrate 1 and the movement of the walls 80a and 80b of each film forming chamber 42. This control means can perform control to change the spiral rollers 44B and 44B1 and the spiral roller angle θsp according to the degree of meandering of the belt-like flexible substrate 1 as necessary.

以上の構成の製造装置において、先ず、巻取コア71を回転させて、第1から第13成膜室42a〜42m内を通る帯状可撓性基板1を、巻出コア11から巻取コア71への方向に水平に搬送する。成膜を行う際は、巻取コア71の回転を止めて帯状可撓性基板1を停止した状態にし、次いで、各成膜室42a〜42mの壁80a,80bを帯状可撓性基板1と密着するまで移動させて、該成膜室内を気密状態にする。そして、各成膜室内で帯状可撓性基板1の表面に薄膜を形成する。   In the manufacturing apparatus having the above configuration, first, the winding core 71 is rotated, and the belt-like flexible substrate 1 passing through the first to thirteenth film forming chambers 42 a to 42 m is transferred from the unwinding core 11 to the winding core 71. Transport horizontally in the direction of. When film formation is performed, the winding core 71 is stopped to stop the belt-like flexible substrate 1, and then the walls 80 a and 80 b of the film-forming chambers 42 a to 42 m are connected to the belt-like flexible substrate 1. The film forming chamber is moved until it is in close contact with the inside of the film forming chamber. Then, a thin film is formed on the surface of the strip-shaped flexible substrate 1 in each film forming chamber.

成膜後、成膜室の壁80a,80bを元の位置に戻し、気密状態を解除する。再び、巻取コア71を回転させて、帯状可撓性基板1を隣の成膜室の位置まで搬送する。そして、停止した状態の帯状可撓性基板1に対し、再び各成膜室内を気密状態にして成膜を行う。
このように帯状可撓性基板1の搬送と成膜を繰り返し行うことで、帯状可撓性基板1の表面に薄膜積層体を製造することが可能となる。
After film formation, the walls 80a and 80b of the film formation chamber are returned to their original positions to release the airtight state. The winding core 71 is rotated again, and the belt-shaped flexible substrate 1 is conveyed to the position of the adjacent film forming chamber. Then, the film-forming chamber is again air-tightly formed on the strip-shaped flexible substrate 1 in a stopped state.
Thus, by repeatedly carrying the strip-shaped flexible substrate 1 and forming a film, it is possible to manufacture a thin film laminate on the surface of the strip-shaped flexible substrate 1.

このように、帯状可撓性基板1は、第1成膜室42aから第13成膜室42mまでの長い距離を移動するが、帯状可撓性基板1を、この区間の両端に位置するガイド部30のガイドローラ32と搬送部60のフィードローラ61とでしか支えない場合は、重力や帯状可撓性基板1の伸びにより下方に垂れ下がったり、帯状可撓性基板1の幅方向に蛇行したりするという問題が生じる。
しかし、本実施形態の製造装置によれば、第1から第13成膜室42a〜42mの各基板入口の手前側に設けたスパイラルローラ44a〜44mで、帯状可撓性基板1の上側端部を挟んでいることから、帯状可撓性基板1が下方に垂れ下がるのを防ぐことができ、また、帯状可撓性基板1が第1成膜室42aから第13成膜室42mまでの長い距離を移動しても、蛇行や皺の発生を防ぐことができる。
As described above, the belt-shaped flexible substrate 1 moves a long distance from the first film formation chamber 42a to the thirteenth film formation chamber 42m. However, the belt-shaped flexible substrate 1 is positioned at both ends of this section. When supported only by the guide roller 32 of the section 30 and the feed roller 61 of the transport section 60, it may hang down due to gravity or the extension of the strip-shaped flexible substrate 1, or meander in the width direction of the strip-shaped flexible substrate 1. Problem arises.
However, according to the manufacturing apparatus of the present embodiment, the upper ends of the strip-shaped flexible substrate 1 are formed by the spiral rollers 44a to 44m provided on the front side of the substrate entrances of the first to thirteenth film forming chambers 42a to 42m. Therefore, it is possible to prevent the strip-shaped flexible substrate 1 from drooping downward, and the strip-shaped flexible substrate 1 has a long distance from the first film forming chamber 42a to the thirteenth film forming chamber 42m. Even if is moved, meandering and wrinkles can be prevented.

なお、帯状可撓性基板1の搬送と停止を繰り返すステッピングロール方式の成膜装置について説明してきたが、本発明は、帯状可撓性基板1の幅方向を鉛直方向に向けながら、帯状可撓性基板1を水平方向に長距離にわたって搬送する装置であれば、ステッピングロール方式に限らず、広く適用することができる。   In addition, although the stepping roll type film-forming apparatus which repeats conveyance and a stop of the strip | belt-shaped flexible board | substrate 1 was demonstrated, this invention makes strip | belt-shaped flexible, directing the width direction of the strip | belt-shaped flexible board | substrate 1 to a perpendicular direction. Any device that transports the conductive substrate 1 over a long distance in the horizontal direction can be widely applied without being limited to the stepping roll method.

以上、本発明の実施の形態につき述べたが、本発明は既述の実施の形態に限定されるものではなく、本発明の技術的思想に基づいて各種の変形及び変更が可能である。   While the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications and changes can be made based on the technical idea of the present invention.

本発明の実施の形態に係る薄膜積層体の製造装置を模式的に示す平面図である。It is a top view which shows typically the manufacturing apparatus of the thin film laminated body which concerns on embodiment of this invention. 図1のA−A線から見た正面図である。It is the front view seen from the AA line of FIG. (A)は、図1に示した成膜室を模式的に拡大した断面平面図であり、(B)は(A)のB−B線から見た正面図である。(A) is the cross-sectional top view which expanded the film-forming chamber shown in FIG. 1 typically, (B) is the front view seen from the BB line of (A). スパイラルローラとその付属装置の一例を模式的に示す斜視図である。It is a perspective view which shows typically an example of a spiral roller and its attachment apparatus. 図4のスパイラルローラを示す正面図である。It is a front view which shows the spiral roller of FIG.

符号の説明Explanation of symbols

1 帯状可撓性基板
10 巻出部
11 巻出コア
20 駆動部
30 ガイド部
40 成膜部
42 成膜室
44,44B,44B1 スパイラルローラ
44x スパイラル状の溝または突起
60 搬送部
70 巻取部
81 高電圧電極
82 接地電極
91 ローラ固定用軸
92 ローラ固定部
93 ローラ可動部
94 回転支持部
95 ハンドル部
96,97 ヒンジ
98 レバー
99 バー
DESCRIPTION OF SYMBOLS 1 Strip | belt-shaped flexible substrate 10 Unwinding part 11 Unwinding core 20 Drive part 30 Guide part 40 Film-forming part 42 Film-forming chamber 44, 44B, 44B1 Spiral roller 44x Spiral groove | channel or protrusion 60 Conveying part 70 Winding part 81 High voltage electrode 82 Ground electrode 91 Roller fixing shaft 92 Roller fixing portion 93 Roller movable portion 94 Rotation support portion 95 Handle portion 96, 97 Hinge 98 Lever 99 Bar

Claims (3)

帯状可撓性基板の表面に複数の薄膜を積層して薄膜積層体を製造する装置であって、前記帯状可撓性基板の幅方向が鉛直方向になるようにして、前記帯状可撓性基板を水平方向に搬送する基板搬送手段と、前記帯状可撓性基板の搬送方向に沿って連続して配列され、前記帯状可撓性基板の表面に成膜を行う複数の成膜室とを具備する薄膜積層体の製造装置において、
前記複数の成膜室のそれぞれの間に配置され、前記帯状可撓性基板の鉛直方向上側の端部両面を挟む複数対のスパイラルローラを備えたことを特徴とする薄膜積層体の製造装置。
An apparatus for manufacturing a thin film laminate by laminating a plurality of thin films on a surface of a strip-shaped flexible substrate, wherein the strip-shaped flexible substrate is arranged such that a width direction of the strip-shaped flexible substrate is a vertical direction. And a plurality of film forming chambers that are continuously arranged along the transport direction of the strip-shaped flexible substrate and perform film deposition on the surface of the strip-shaped flexible substrate. In a manufacturing apparatus for a thin film laminate,
An apparatus for manufacturing a thin film laminate, comprising a plurality of pairs of spiral rollers arranged between each of the plurality of film forming chambers and sandwiching both ends of the upper end of the belt-like flexible substrate in the vertical direction.
前記複数の成膜室のうちの中央に位置する2室の成膜室の間において、前記上側の端部を挟む対のスパイラルローラが、連続して2対以上設置されていることを特徴とする請求項1に記載の薄膜積層体の製造装置。   Two or more pairs of spiral rollers sandwiching the upper end between the two film forming chambers located in the center of the plurality of film forming chambers are continuously installed. The apparatus for manufacturing a thin film laminate according to claim 1. 前記スパイラルローラは、ローラ端部から形成されるスパイラル状の溝または突起の形態を有し、該スパイラル状の溝または突起の搬送方向に直角な線に対する傾斜角度は、1°〜6°の範囲であることを特徴とする請求項1または2に記載の薄膜積層体の製造装置。   The spiral roller has a shape of a spiral groove or protrusion formed from an end of the roller, and an inclination angle with respect to a line perpendicular to the conveying direction of the spiral groove or protrusion is in a range of 1 ° to 6 °. The apparatus for producing a thin film laminate according to claim 1 or 2, wherein
JP2008034346A 2008-02-15 2008-02-15 Thin film laminate manufacturing equipment Expired - Fee Related JP4958010B2 (en)

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JP2902944B2 (en) * 1994-06-02 1999-06-07 株式会社富士電機総合研究所 Manufacturing equipment for thin-film photoelectric conversion elements
JP2007261773A (en) * 2006-03-29 2007-10-11 Toray Ind Inc Film processing device and method
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