JP4938692B2 - プラズマクラスタツールを設定するための方法 - Google Patents
プラズマクラスタツールを設定するための方法 Download PDFInfo
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- JP4938692B2 JP4938692B2 JP2007557072A JP2007557072A JP4938692B2 JP 4938692 B2 JP4938692 B2 JP 4938692B2 JP 2007557072 A JP2007557072 A JP 2007557072A JP 2007557072 A JP2007557072 A JP 2007557072A JP 4938692 B2 JP4938692 B2 JP 4938692B2
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- 238000004519 manufacturing process Methods 0.000 claims description 3
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
- G05B19/0426—Programming the control sequence
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/23—Pc programming
- G05B2219/23195—Memory stores available, allowable, possible options, variations, alternatives of program or modules
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/23—Pc programming
- G05B2219/23255—Object oriented programming, OOP
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/24—Pc safety
- G05B2219/24167—Encryption, password, user access privileges
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/25—Pc structure of the system
- G05B2219/25066—Configuration stored in each unit
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/25—Pc structure of the system
- G05B2219/25076—Configure connected module only if allowed, registered module
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/25—Pc structure of the system
- G05B2219/25314—Modular structure, modules
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/20—Pc systems
- G05B2219/26—Pc applications
- G05B2219/2602—Wafer processing
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Storage Device Security (AREA)
- Stored Programmes (AREA)
- Drying Of Semiconductors (AREA)
Description
(付録B)本発明の実施形態において、例のプロセスモジュールのための、例configoptions.txtファイルのリストを提供する。
(付録C)本発明の実施形態において、ターゲットクラスタツールに関する高水準設定詳細を示す、システム全体の設定ファイル(sysconfig.txt)のリストを提供する。
(付録D)本発明の実施形態において、例のクラスタツールの移送チャンバのためのコンポーネントレベルの設定ファイル(configoptions.txt)を提供する。
(付録E)本発明の実施形態において、例のクラスタツールのために再生されたオプション定義ファイル、TMCImage.cfgを提供する。
(付録F)本発明の実施形態において、例のクラスタツールのための前述されたファイルTMCImageTRMesD3Port.cfgのリストを提供する。
(付録G)本発明の実施形態において、定義ファイルTMCImageTMResD2Port.cfgを提供する。
(付録H)本発明の実施形態において、プロセスモジュールのためのオプション定義ファイル(pm.cfg)を提供する。
Claims (7)
- 複数のモジュールを有する特定のプラズマクラスタツールを設定するための方法であって、
プラズマクラスタツールのための設定定義(configuration definitions)を含む、モジュールオプション定義ファイルのセットを提供することと、
意図される前記設定の為の特定のプラズマクラスタツールを特に識別するデータを含む、ツール特定保護情報のセットを提供することと、
前記特定のプラズマクラスタツールに指定される設定を特定する、ツール特定オプション仕様のセットを提供することと、
前記特定のプラズマクラスタツールに課される設定制約(configuration restrictions)をカプセル化し、前記特定のプラズマクラスタツールを設定することにおいて必要とされるように構成される、キーファイルを生成すること、を含み
さらに、前記キーファイルは、前記モジュールオプション定義ファイルのセット、前記ツール特定保護情報のセット、及び前記ツール特定オプション仕様のセットを利用して生成され、
当該キーファイルを使用して、設定アプリケーションを実行すると、
前記特定のプラズマクラスタツールを設定するために、システム全体の設定ファイルと、コンポーネントに特定の設定ファイルのセットが作成されることを特徴とする方法。 - 前記キーファイルが、前記特定のプラズマクラスタツールだけに設定することを制約する情報を含む請求項1に記載の方法。
- 前記情報がホストコンピュータと関連するMAC(メディアアクセスコントローラ)アドレスを含み、前記ホストコンピュータが生産環境において前記プラズマクラスタツールを制御するように設定される請求項2に記載の方法。
- 前記情報はホストコンピュータと関連するインターネットプロトコル(IP)アドレスを含み、前記ホストコンピュータが生産環境において前記プラズマクラスタツールを制御するように設定される請求項2に記載の方法。
- 前記キーファイルが、前記プラズマクラスタツールの許可された使用がいつ期限切れになるのかを指定する情報を含む請求項2に記載の方法。
- 前記キーファイルが、前記プラズマクラスタツールの特定のコンポーネントの許可された使用がいつ期限切れになるのかを指定する情報を含む請求項2に記載の方法。
- 前記ツール特定オプション仕様のセットの少なくとも一部がカスタマ注文システムから自動的に抽出される請求項1に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65686205P | 2005-02-25 | 2005-02-25 | |
US60/656,862 | 2005-02-25 | ||
US11/098,037 US7162317B2 (en) | 2005-02-25 | 2005-03-31 | Methods and apparatus for configuring plasma cluster tools |
US11/098,037 | 2005-03-31 | ||
PCT/US2006/005740 WO2006093695A2 (en) | 2005-02-25 | 2006-02-16 | Methods and apparatus for configuring plasma cluster tools |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008538254A JP2008538254A (ja) | 2008-10-16 |
JP2008538254A5 JP2008538254A5 (ja) | 2012-02-16 |
JP4938692B2 true JP4938692B2 (ja) | 2012-05-23 |
Family
ID=36932412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007557072A Active JP4938692B2 (ja) | 2005-02-25 | 2006-02-16 | プラズマクラスタツールを設定するための方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7162317B2 (ja) |
EP (1) | EP1854036A4 (ja) |
JP (1) | JP4938692B2 (ja) |
KR (1) | KR101221256B1 (ja) |
IL (1) | IL185375A (ja) |
MY (1) | MY142106A (ja) |
RU (1) | RU2406137C2 (ja) |
TW (1) | TWI382325B (ja) |
WO (1) | WO2006093695A2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7536538B1 (en) | 2005-03-31 | 2009-05-19 | Lam Research Corporation | Cluster tools for processing substrates using at least a key file |
US7882076B2 (en) * | 2006-12-14 | 2011-02-01 | Lam Research Corporation | Primary server architectural networking arrangement and methods therefor |
AU2011255219A1 (en) * | 2010-05-21 | 2012-12-13 | Unisys Corporation | Configuring the cluster |
US10204311B2 (en) | 2014-04-30 | 2019-02-12 | Bristol, Inc. | Configuring workflows in a host device operating in a process control system |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH10149968A (ja) * | 1996-11-15 | 1998-06-02 | Kokusai Electric Co Ltd | 半導体製造装置の通信制御装置 |
JP3393035B2 (ja) * | 1997-05-06 | 2003-04-07 | 東京エレクトロン株式会社 | 制御装置及び半導体製造装置 |
US6321134B1 (en) * | 1997-07-29 | 2001-11-20 | Silicon Genesis Corporation | Clustertool system software using plasma immersion ion implantation |
EP0921713A3 (en) * | 1997-12-03 | 1999-08-11 | Matsushita Electric Works, Ltd. | Plasma processing apparatus and method |
JPH11194928A (ja) * | 1997-12-29 | 1999-07-21 | Tokyo Electron Ltd | 制御装置 |
US6415193B1 (en) * | 1999-07-08 | 2002-07-02 | Fabcentric, Inc. | Recipe editor for editing and creating process recipes with parameter-level semiconductor-manufacturing equipment |
JP4545252B2 (ja) * | 1999-09-01 | 2010-09-15 | 東京エレクトロン株式会社 | 半導体製造装置 |
US6592709B1 (en) * | 2000-04-05 | 2003-07-15 | Applied Materials Inc. | Method and apparatus for plasma processing |
JP2002015968A (ja) * | 2000-06-28 | 2002-01-18 | Tokyo Electron Ltd | 半導体製造装置における入出力ボードの自動認識方法及び半導体製造装置 |
KR100382725B1 (ko) * | 2000-11-24 | 2003-05-09 | 삼성전자주식회사 | 클러스터화된 플라즈마 장치에서의 반도체소자의 제조방법 |
US6724404B1 (en) * | 2001-02-06 | 2004-04-20 | Lsi Logic Corporation | Cluster tool reporting system |
US7082345B2 (en) * | 2001-06-19 | 2006-07-25 | Applied Materials, Inc. | Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities |
JP2004047837A (ja) * | 2002-07-12 | 2004-02-12 | Tokyo Electron Ltd | 基板処理装置のプログラム追加方法及び基板処理システム |
KR101009384B1 (ko) * | 2003-02-18 | 2011-01-19 | 도쿄엘렉트론가부시키가이샤 | 처리시스템의 자동 구성 방법 |
US7275062B2 (en) * | 2003-03-10 | 2007-09-25 | Fisher-Rosemount Systems, Inc. | Automatic linkage of process event data to a data historian |
US7353379B2 (en) * | 2005-02-25 | 2008-04-01 | Lam Research Corporation | Methods for configuring a plasma cluster tool |
-
2005
- 2005-03-31 US US11/098,037 patent/US7162317B2/en active Active
-
2006
- 2006-02-16 WO PCT/US2006/005740 patent/WO2006093695A2/en active Application Filing
- 2006-02-16 EP EP06720862A patent/EP1854036A4/en not_active Withdrawn
- 2006-02-16 KR KR1020077020845A patent/KR101221256B1/ko active IP Right Grant
- 2006-02-16 RU RU2007135341/08A patent/RU2406137C2/ru not_active IP Right Cessation
- 2006-02-16 JP JP2007557072A patent/JP4938692B2/ja active Active
- 2006-02-24 MY MYPI20060806A patent/MY142106A/en unknown
- 2006-02-27 TW TW095106650A patent/TWI382325B/zh active
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- 2007-08-20 IL IL185375A patent/IL185375A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
MY142106A (en) | 2010-09-15 |
US7162317B2 (en) | 2007-01-09 |
TWI382325B (zh) | 2013-01-11 |
JP2008538254A (ja) | 2008-10-16 |
KR20080004461A (ko) | 2008-01-09 |
EP1854036A2 (en) | 2007-11-14 |
TW200703052A (en) | 2007-01-16 |
IL185375A0 (en) | 2008-02-09 |
RU2007135341A (ru) | 2009-03-27 |
EP1854036A4 (en) | 2009-12-30 |
US20060194351A1 (en) | 2006-08-31 |
WO2006093695A3 (en) | 2007-05-31 |
KR101221256B1 (ko) | 2013-01-11 |
WO2006093695A2 (en) | 2006-09-08 |
RU2406137C2 (ru) | 2010-12-10 |
IL185375A (en) | 2011-08-31 |
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