JP4936608B2 - Glassy carbon-coated ion implanter components - Google Patents

Description

【００５０】
表１に示した結果より明らかなように、イオン通路壁の正反射率が１０％以上、平均粗さが０．０３〜３μｍ、及び、最大粗さが０．３〜３０μｍの範囲内である実施例１〜５に係るガラス状炭素被覆部材で測定された異物量は極めて少なく、また、ガラス状炭素膜に剥離は発生していなかった。
一方、比較例１、２に係る部材は、基体がガラス状炭素膜により被覆されていないものであったため、基体から飛散した異物が大量に測定された。
また、比較例３に係るガラス状炭素被覆部材は、イオン通路壁の正反射率が低く、また、イオン通路壁の平均粗さ及び最大粗さともに、大きかったため、ガラス状炭素膜の剥離は発生していなかったが、異物量が多かった。
【００５１】
【発明の効果】
以上の説明しように、本発明のガラス状炭素被覆部材によると、イオンビームが照射される基体表面に被覆されたガラス状炭素膜の表面にイオンビームが接触又は衝突しても飛散する異物が殆ど存在しないため、イオンビーム中に不純物や異物が混入することがなく、純粋なイオンビームをシリコンウエハに注入することができ、異物がシリコンウエハ上に付着することもない。また、ガラス状炭素膜の基体に対する接着強度が優れたものであるため、ガラス状炭素膜が容易に剥離することがなく、耐久性に優れたガラス状炭素被覆部材となる。
【図面の簡単な説明】
【図１】本発明のガラス状炭素被覆部材の一例を模式的に示した斜視図である。
【図２】従来のイオン注入装置の一例を模式的に示した説明図である。
【符号の説明】
１０ ガラス状炭素被覆部材
１１ ガラス状炭素膜
１２ 基体
１３ イオン通路壁
１９ シリコンウエハ
２０ イオン注入装置
２１ イオン発生装置
２２ 引き出し部
２３ イオン分析部
２４ 加速部
２５ 収束部
２６ 走査部
２７ イオン打ち込み室
２８ スリット部材[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a glassy carbon-coated ion implanter member used in an ion guide slit member or the like in an ion implanter.
[0002]
[Prior art]
The technique of implanting impurities in an ion state in a semiconductor is a technique that was industrialized in the 1970s, and is currently widely used in many silicon semiconductor products including LSI. In ion implantation in a semiconductor device, a target impurity element is ionized into a silicon wafer and accelerated to an energy of several tens to several hundreds eV.
[0003]
At this time, if a component other than the target element is present, impurities other than the target are implanted into the silicon wafer, and there is a risk that the initial performance cannot be obtained.
For this reason, the components of the ion implantation apparatus are required to have high-purity materials that do not adversely affect the semiconductor.
[0004]
FIG. 2 is an explanatory view showing an example of a conventional ion implantation apparatus.
As shown in FIG. 2, the conventional ion implantation apparatus 20 includes a gas containing a target impurity element in a high-density plasma state, an ion generation apparatus 21 that generates ions by plasma, and generated ions. An extraction unit 22 that supplies energy necessary for extraction from the ion generator 21, an ion analysis unit 23 that sorts extracted ions into target ions, and an acceleration unit 24 that accelerates ions and generates an ion beam are provided. ing.
[0005]
Further, the ion implantation apparatus 20 includes a converging unit 25 that converges the ion beam, a scanning unit 26 that scans the ion beam uniformly onto the surface of the silicon wafer, and an ion implantation chamber 27 that implants ions into the silicon wafer 19. The members constituting the ion implantation apparatus 20 are connected to each other by a slit member 28 capable of running an ion beam.
[0006]
That is, the ions generated in the ion generator 21 are converted into an ion beam in the acceleration unit 24 through the extraction unit 22 and the ion analysis unit 23, and this ion beam enters the slit member 28 in the order of the convergence unit 25 and the scanning unit 26. The silicon wafer 19 installed in the ion implantation chamber 27 is implanted.
[0007]
The material of the parts that make contact with the ion beam in each member constituting such an ion implantation apparatus 20 has a high purity, and is a material for preventing the introduction of foreign substances, and structural considerations have been made. However, high energy ions collide with the ion generator that is the ion source and the slit member 28 in the scanning unit, so impurities and foreign matters from the constituent materials are likely to be mixed, and consideration should be given to other materials. It is.
[0008]
Conventionally, as such a high-purity material, a graphite material that does not adversely affect a silicon wafer and can easily ensure a high-purity material has been used.
[0009]
[Problems to be solved by the invention]
However, since the graphite material is an aggregate of fine particles such as coke, when the ion beam collides, fine foreign matters (graphite particles) are mixed. As a result, foreign matter adheres to the silicon wafer, resulting in poor product yield.
[0010]
Furthermore, in order to solve the above problems, the present inventors coat the surface of a graphite substrate with a high-purity pyrolytic carbon film having a thickness of 20 to 50 μm, as disclosed in JP-A-8-171883. Therefore, it was proposed to produce carbon parts. However, the high-purity pyrolytic carbon film formed in this way is etched and consumed by the ion beam in the ion implantation apparatus, and the graphite base material may be exposed, and also prevents the graphite base material from being exposed. Therefore, if the high-purity pyrolytic carbon film is made thick, the coating may be peeled off due to a mismatch in thermal expansion coefficient with the base material, and there is still room for improvement.
[0011]
JP-A-5-246703 proposes the use of glassy carbon as a slit member. However, since this slit member needs to process hard glassy carbon itself, it has a desired shape. It was difficult to obtain a slit member, and the manufacturing process was complicated.
[0012]
Moreover, the slit member made of glassy carbon has a significantly smaller amount of fine foreign matters (graphite particles) scattered from the surface when exposed to an ion beam than the slit member made of graphite. However, when foreign matter is mixed into the ion beam and the foreign matter adheres to the silicon wafer, the defect rate of semiconductor chips manufactured using this silicon wafer greatly increases. Less was desired.
[0013]
In view of such conventional problems, the present invention does not mix foreign matter into the ion beam and can inject a pure ion beam into a silicon wafer, so that foreign matter does not adhere to the silicon wafer, Another object of the present invention is to provide a glassy carbon-coated ion implantation apparatus member having excellent durability because the glassy carbon film coated on the substrate does not easily peel off.
[0014]
[Means for Solving the Problems]
In order to achieve the above object, the inventors of the present invention have described the surface state of a glassy carbon film with respect to a glassy carbon-coated ion implantation apparatus member in which at least the surface of a substrate irradiated with an ion beam is coated with a glassy carbon film. As a result of various studies on the relationship between the surface and the fine foreign matter generation mechanism, it has been found that there is a close relationship between the smoothness and surface roughness of the surface of the glassy carbon film and the amount of foreign matter generated.
[0015]
That is, normally, a glassy carbon film exhibits an amorphous, uniform and continuous dense structure, and when such a glassy carbon film is exposed to an ion beam, the surface thereof is uniformly consumed and becomes fine. Foreign matter (graphite particles) never leaves. However, if the smoothness and surface roughness of the surface of the glassy carbon film are out of a certain range, the amount of foreign matter scattered from the surface of the glassy carbon film increases or the glassy carbon film peels off. This has been newly found and the present invention has been completed.
Here, the smoothness of the surface of the glassy carbon film is evaluated by the regular reflectance of light incident at an angle of 30 degrees with respect to the surface of the glassy carbon film, and the surface of the surface of the glassy carbon film is measured. The roughness is evaluated based on the average roughness Ra and the maximum roughness Rmax according to JIS B 0601.
[0016]
The present invention is a glassy carbon-coated ion implantation apparatus member in which at least the surface of a substrate irradiated with an ion beam is coated with a glassy carbon film,
The surface of the glassy carbon film has a regular reflectance of 10% or more of light incident at an angle of 30 degrees with respect to the surface of the glassy carbon film, and an average roughness Ra according to JIS B 0601 is 0.03. It is a member for glass-like carbon film ion implantation apparatus characterized by having a maximum roughness Rmax of 0.3 to 30 μm.
Hereinafter, the present invention will be specifically described by way of embodiments.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
The present invention is a glassy carbon-coated ion implantation apparatus member in which at least the surface of a substrate irradiated with an ion beam is coated with a glassy carbon film,
The surface of the glassy carbon film has a regular reflectance of 10% or more of light incident at an angle of 30 degrees with respect to the surface of the glassy carbon film, and an average roughness Ra according to JIS B 0601 is 0.03. It is a member for glass-like carbon film ion implantation apparatus characterized by having a maximum roughness Rmax of 0.3 to 30 μm.
[0018]
FIG. 1 is a partial cross-sectional view schematically showing an example of a glassy carbon-coated ion implantation apparatus member (hereinafter also referred to as a glassy carbon-coated member) according to the present invention.
As shown in FIG. 1, the glassy carbon-coated member 10 of the present invention is composed of a base 12 having a through hole near its center and a glassy carbon film 11 coated on the inner wall surface of the through hole of the base 12. Has been.
[0019]
In the glassy carbon-coated member 10 of the present invention, the inner wall surface of the through hole of the substrate 12 is covered with a glassy carbon film 11, and an ion beam is applied to the surface (ion passage wall 13) of the glassy carbon film 11. Run. That is, even if there are impurities and foreign matter scattered from the inner wall surface of the substrate 12, the inner wall surface of the substrate 12 is completely covered with the glassy carbon film 11, so that the impurities and foreign materials are ion passage walls. 13 does not scatter and does not enter the ion beam.
In addition, the outer peripheral part of the base | substrate 12 may be coat | covered with the glassy carbon film. Impurities and foreign matters scattered from the outer peripheral portion of the substrate 12 may also be indirectly mixed into the ion beam. Depending on the method of coating the glassy carbon film, only the inner wall surface of the through hole of the substrate 12 is made of glass. This is because it may be difficult to cover with the carbon film.
[0020]
In the glassy carbon-coated member 10 of the present invention, the regular reflectance of light incident at an angle of 30 degrees with respect to the ion passage wall 13 is 10% or more, and the average roughness Ra according to JIS B 0601 is 0.03 to 0.03. 3 μm and the maximum roughness Rmax is 0.3 to 30 μm. Since such an ion passage wall 13 has almost no unevenness on the surface thereof, the ion passage wall 13 can be used even when a mechanical impact such as contact or collision of a high-energy ion beam is applied to the ion passage wall 13. The wall 13 is not chipped, and foreign particles (fine particles generated by the chipping) are not mixed into the ion beam. Further, since the glassy carbon film 11 is excellent in adhesive strength with the base 12, the glassy carbon film 11 does not peel from the base 12.
[0021]
When the regular reflectance of the ion passage wall 13 is less than 10%, the ion passage wall 13 has many minute irregularities even if the average roughness Ra and the maximum roughness Rmax of the ion passage wall 13 are within the above-described ranges. When a mechanical impact such as contact or collision of a high-energy ion beam is applied, the minute uneven protrusions may be chipped, and the chipped protrusions may be formed on the surface of the silicon wafer. Adheres to foreign matter.
[0022]
Further, if the average roughness Ra of the ion passage wall 13 according to JIS B 0601 is less than 0.03 μm, it takes a considerable time for polishing work or the like to make the ion passage wall 13 smooth as described above. This leads to a decrease in productivity and an increase in cost. On the other hand, if the average roughness Ra of the ion passage wall 13 exceeds 3 μm, even if the regular reflectance and the maximum roughness Rmax of the ion passage wall 13 are within the above-described ranges, relatively large irregularities are formed on the ion passage wall 13. When there is a part where it exists and a mechanical impact is applied, such as when a high-energy ion beam contacts or collides with the convex and concave portions of the concave and convex portions, chipping occurs. It adheres on the wafer and becomes foreign matter.
[0023]
Furthermore, if the maximum roughness Rmax according to JIS B 0601 of the ion passage wall 13 is less than 0.3 μm, it takes a considerable time to polish the ion passage wall 13, which causes a decrease in productivity and an increase in cost. On the other hand, when the maximum roughness Rmax of the ion passage 13 exceeds 30 μm, even if the regular reflectance and the average roughness Ra of the ion passage wall 13 are within the above-described range, there are large irregularities on the ion passage wall 13. As a result, chipping occurs when a mechanical impact is applied, such as when a high-energy ion beam touches or collides with the large concave and convex portion, and the chipped convex portion adheres to the silicon wafer. It becomes.
[0024]
That is, in the glassy carbon-coated member 10 of the present invention, the regular reflectance, the average roughness Ra, and the maximum roughness Rmax of the ion passage wall 13 must all be within the above ranges, and any one of them Outside the above range, the effects of the present invention cannot be obtained.
[0025]
Examples of the raw material for the glassy carbon film 11 include organic polymers such as vinyl chloride resin, polyvinyl alcohol, oil-soluble phenol resin, alkylphenol resin, chlorinated paraffin, chlorinated polypropylene, vinyl acetate resin, and polycarbonate resin. Of these, vinyl chloride resin is desirable in view of the inclusion of impurities and the like.
[0026]
In addition, the regular reflectance of the ion passage wall 13 is larger than the regular reflectance of the inner wall surface of the base 12 before being covered with the glassy carbon film 11, and the regular reflectance of the ion passage wall 13 is glass. In view of these points, it is desirable to appropriately determine the thickness of the glassy carbon film 11 because it tends to increase in proportion to the thickness of the glassy carbon film 11. Specifically, the thickness of the glassy carbon film 11 is desirably about 0.5 to 10 μm. If the thickness of the glassy carbon film 11 is less than 0.5 μm, the surface shape of the substrate 12 has a great influence on the surface of the glassy carbon film 11, so that the regular reflectance and average roughness of the glassy carbon film 11 are increased. The thickness and the maximum roughness may be out of the above-mentioned range, and it is difficult to form such a thin glassy carbon film 11 uniformly on the entire inner wall surface of the substrate 12 itself. On the other hand, if the thickness of the glassy carbon film 11 exceeds 10 μm, minute cracks are likely to occur in the glassy carbon film 11, and impurities and foreign matters may be scattered and mixed into the ion beam.
[0027]
Further, it is desirable that an impregnated layer of glassy carbon is formed at the interface between the base 12 and the glassy carbon film 11. This is because the adhesive strength between the glassy carbon film 11 and the substrate 12 is extremely high.
The thickness of the glassy carbon impregnated layer in the substrate 12 is preferably about 500 to 6000 μm from the interface between the substrate 12 and the glassy carbon film 11. If the thickness of the impregnation layer is less than 500 μm, the adhesive strength between the substrate 12 and the glassy carbon film 11 does not become too high, while if the thickness of the impregnation layer exceeds 6000 μm, the predetermined thickness It takes time to form the glassy carbon film 11 and it becomes difficult to control the thickness of the glassy carbon film 11.
[0028]
As shown in FIG. 1, the base body 12 is a quadrangular prism having a through hole formed in the vicinity of the center thereof. However, the shape of the base body 12 is not limited to this. For example, the base body 12 has a through hole in the vicinity of the center thereof. Any shape such as a columnar shape, an elliptical column shape, or a polygonal column shape may be used.
Further, the cross-sectional shape of the through hole is not particularly limited to a rectangular shape as illustrated, and may be any shape such as a circle, an ellipse, or a polygon.
[0029]
It does not specifically limit as a material which comprises the base | substrate 12, For example, a graphite, C / C composite etc. can be mentioned.
[0030]
Further, the inner wall surface of the substrate 12 before being covered with the glassy carbon film 13 preferably has a regular reflectance of 5% or more of light incident at an angle of 30 degrees with respect to the inner wall surface. When the regular reflectance of the inner wall surface of the substrate 12 is less than 5%, the inner wall surface is in a rough state and is covered with particles that are easily detached. Particles may be detached together with the glassy carbon film 11 and mixed into the ion beam, and foreign matter may adhere to the silicon wafer.
[0031]
As described above, in the glassy carbon-coated member of the present invention, at least the substrate surface irradiated with the ion beam is coated with the glassy carbon film, and the surface of the glassy carbon film (ion passage wall) is 30 degrees. The regular reflectance of light incident at an angle is 10% or more, the average roughness Ra according to JIS B 0601 is 0.03 to 3 μm, and the maximum roughness Rmax is 0.3 to 30 μm.
That is, the glassy carbon-coated member of the present invention has a very smooth surface of the ion passage wall on which the ion beam travels and has no large unevenness, so that the ion beam contacts or collides with the ion passage wall. Even when a mechanical impact is applied, no chipping (foreign matter) is generated on the ion passage wall.
Therefore, according to the glassy carbon-coated member of the present invention, foreign matter is hardly mixed in the ion beam, and a pure ion beam can be injected into the silicon wafer, and the foreign matter can adhere to the silicon wafer. Absent. Furthermore, since the adhesive strength between the glassy carbon film and the substrate is excellent, the glassy carbon film is not easily peeled off from the substrate, and the glassy carbon-coated member is excellent in durability.
[0032]
Next, the manufacturing method of the glassy carbon covering member of this invention is demonstrated.
The glassy carbon-coated member of the present invention can be produced by forming a glassy carbon film on the surface of the substrate.
[0033]
First, a substrate is manufactured.
As described above, various materials can be used as the material constituting the substrate. In the following, graphite that is most commonly used in an ion implantation apparatus will be described as an example. .
[0034]
As a method for producing a base made of graphite, various methods can be mentioned. For example, by cutting out an isotropic graphite block obtained by the CIP method, the HIP method, etc., the base 12 shown in FIG. Such a substrate having a through hole in the vicinity of the central portion can be manufactured.
As a method for cutting out the isotropic graphite block, dry cutting or grinding is desirable in order to prevent contamination by the cutting fluid. Further, the isotropic graphite block may be cut out by ultrasonic waves or electron beams.
It is desirable to subject the substrate thus manufactured to a purification treatment with a halogen gas or the like.
[0035]
The inner wall surface of the through hole formed in the vicinity of the central portion of the substrate is preferably polished so that the regular reflectance of light incident at an angle of 30 degrees with respect to the inner wall surface is 5% or more. . The regular reflectance of the light is more preferably 5 to 15%.
For the polishing treatment, for example, a normal polishing method such as buffing, padding, brushing, and paper sanding is sufficient. Particularly when a buffing or padding is used, particles detached by polishing are plugged into the pores of the substrate. Therefore, there is an advantage that the gas impermeability effect after the coating of the glassy carbon film is increased.
[0036]
Next, by coating a glassy carbon film on the inner wall surface of the through hole of the substrate, the regular reflectance of light incident at an angle of 30 degrees with respect to the surface (ion passage wall) of the glassy carbon film is obtained. A glassy carbon-coated member that is 10% or more, has an average roughness Ra according to JIS B 0601 of 0.03 to 3 μm, and a maximum roughness Rmax of 0.3 to 30 μm is manufactured.
[0037]
Examples of the method for coating the surface of the substrate (the inner wall surface of the through-hole) with a glassy carbon film include, for example, an organic polymer solution obtained by dissolving a thermal decomposition product of the above-described organic polymer in a solvent. And a method of baking at about 1000 to 1200 ° C. in an inert or vacuum.
[0038]
Examples of a method of applying the organic polymer solution to the inner wall surface of the through hole of the substrate include a method of applying with a brush, a method of applying by dipping, and the like. The organic polymer solution may be applied to the outer peripheral portion of the substrate in addition to the inner wall surface of the through hole of the substrate.
Then, if necessary, the surface of the glassy carbon film is subjected to polishing treatment such as etching to adjust the regular reflectance, average roughness Ra, maximum roughness Rmax, etc. of the surface of the glassy carbon film (ion passage wall). May be.
【Example】
EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these Examples.
[0039]
Examples 1-3
The surface of isotropic graphite (regular reflectance 0.2%) having the same shape as the substrate 12 shown in FIG. 1 and having a bulk specific gravity of 1.85 is polished with an industrial pad (Scotch Bright 7448). The reflectance was 10 to 15%.
[0040]
Next, polyvinyl chloride was thermally decomposed at 390 ° C. in nitrogen to obtain a tar-like carbon precursor. This carbon precursor is dissolved in trichlene, applied to the surface of the isotropic graphite with a brush, and then baked at 1200 ° C. in a vacuum atmosphere to form a glassy carbon film. A glassy carbon-coated member having a reflectance of 15 to 20%, an average roughness Ra of 0.04 to 1.0 μm, and a maximum roughness Rmax of 0.5 to 10 μm (see Table 1 below) was produced.
[0041]
The regular reflectance is measured by measuring the regular reflectance (%) of incident light at 30 degrees using a gloss meter (manufactured by Minolta Camera Co., Ltd.). The surface roughness is measured by an electronic surface roughness meter (manufactured by Mitutoyo Corporation). The average roughness Ra (μm) and the maximum roughness Rmax (μm) were measured according to JIS B 0601 using a surf test type 201).
[0042]
Examples 4 and 5
The surface of extruded material graphite (regular reflectance 0.1%) having the same shape as the base 12 shown in FIG. 1 and having a bulk specific gravity of 1.60 is polished with an industrial pad (Scotch Prelite 7448), and its regular reflection is obtained. The rate was 5%.
Thereafter, the surface of the extruded graphite was coated with a glassy carbon film in the same manner as in Example 1, and the regular reflectance of the ion passage wall was 10 to 12%, and the average roughness Ra was 2.0 to 2.0. A glassy carbon-coated member having a thickness of 3.0 μm and a maximum roughness Rmax of 20 to 25 μm (see Table 1 below) was produced.
[0043]
Comparative Example 1
A glassy carbon-coated member was produced in the same manner as in Example 1 except that the glassy carbon film was not coated on the inner wall surface of the isotropic graphite substrate.
[0044]
Comparative Example 2
A glassy carbon-coated member was produced in the same manner as in Example 4 except that the glassy carbon film was not coated on the inner wall surface of the extruded graphite base.
[0045]
Comparative Example 3
A glassy carbon-coated member was produced in the same manner as in Example 4 except that the regular reflectance of the ion passage wall was 6%, the average roughness Ra was 4.2 μm, and the maximum roughness Rmax was 40 μm.
[0046]
The amount of foreign matter generated from the ion passage walls of the glassy carbon-coated members produced in Examples 1 to 5 and Comparative Examples 1 to 3 was measured by the following method, and the covering state of the glassy carbon film was observed.
The results are shown in Table 1.
[0047]
(1) Measurement of the amount of foreign matter A sample (7 × 7 × 7, 3 pieces) is placed in a glass cell (15φ × 301), vibrated at an amplitude of 0.05 mm and a frequency of 60 Hz, and foreign matter (fine particles of 0.3 μm or more ) The number was measured with a particle counter.
[0048]
(2) State of glassy carbon film The coated state of the glassy carbon film of the produced glassy carbon-coated member was observed visually to confirm the presence or absence of peeling.
[0049]
[Table 1]

[0050]
As is clear from the results shown in Table 1, the regular reflectance of the ion passage wall is 10% or more, the average roughness is in the range of 0.03 to 3 μm, and the maximum roughness is in the range of 0.3 to 30 μm. The amount of foreign matter measured with the glassy carbon-coated members according to Examples 1 to 5 was extremely small, and no peeling occurred on the glassy carbon film.
On the other hand, in the members according to Comparative Examples 1 and 2, since the base was not covered with the glassy carbon film, a large amount of foreign matter scattered from the base was measured.
Further, the glassy carbon-coated member according to Comparative Example 3 had low regular reflectance of the ion passage wall, and both the average roughness and the maximum roughness of the ion passage wall were large, so that peeling of the glassy carbon film occurred. The amount of foreign material was large.
[0051]
【Effect of the invention】
As explained above, according to the glassy carbon-coated member of the present invention, almost no foreign matter is scattered even if the ion beam contacts or collides with the surface of the glassy carbon film coated on the surface of the substrate irradiated with the ion beam. Since it does not exist, impurities and foreign matter are not mixed in the ion beam, a pure ion beam can be injected into the silicon wafer, and the foreign matter does not adhere to the silicon wafer. Moreover, since the adhesive strength of the glassy carbon film to the substrate is excellent, the glassy carbon film is not easily peeled off, and the glassy carbon-coated member is excellent in durability.
[Brief description of the drawings]
FIG. 1 is a perspective view schematically showing an example of a glassy carbon-coated member of the present invention.
FIG. 2 is an explanatory view schematically showing an example of a conventional ion implantation apparatus.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 10 Glass-like carbon coating member 11 Glass-like carbon film 12 Base | substrate 13 Ion passage wall 19 Silicon wafer 20 Ion implantation apparatus 21 Ion generator 22 Extraction part 23 Ion analysis part 24 Acceleration part 25 Converging part 26 Scan part 27 Ion implantation chamber 28 Slit Element

Claims (2)

A glassy carbon-coated ion implantation apparatus member in which at least the surface of a substrate irradiated with an ion beam is coated with a glassy carbon film,
The surface of the glassy carbon film has a regular reflectance of 10% or more of light incident at an angle of 30 degrees with respect to the surface of the glassy carbon film, and an average roughness Ra according to JIS B 0601 is 1.0. A member for a glassy carbon-coated ion implantation apparatus having a maximum roughness Rmax of 20 to 30 μm and a maximum roughness Rmax of ˜3 μm.   2. The glassy carbon-coated ion implantation apparatus according to claim 1, wherein the substrate surface before being coated with the glassy carbon film has a regular reflectance of 5% or more of light incident on the surface at an angle of 30 degrees. Element.

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