JP4918454B2 - Resin base material provided with metal decorative film protected by protective film, and method for laminating metal decorative film on resin base material - Google Patents

Resin base material provided with metal decorative film protected by protective film, and method for laminating metal decorative film on resin base material Download PDF

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JP4918454B2
JP4918454B2 JP2007270848A JP2007270848A JP4918454B2 JP 4918454 B2 JP4918454 B2 JP 4918454B2 JP 2007270848 A JP2007270848 A JP 2007270848A JP 2007270848 A JP2007270848 A JP 2007270848A JP 4918454 B2 JP4918454 B2 JP 4918454B2
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metal decorative
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resin base
decorative film
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鋼 入倉
真淑 野口
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Ulvac Inc
Kojima Industries Corp
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Description

本発明は、保護膜で保護された金属装飾膜を備えた樹脂製基材及び樹脂製基材への金属装飾膜の積層方法に関する。   The present invention relates to a resin base material provided with a metal decorative film protected by a protective film, and a method for laminating the metal decorative film on the resin base material.

従来、電子機器、家電製品、自動車用外装・内装等に使用される樹脂製基材の表面に、金属光沢を与えるために湿式メッキ工法、スパッタリング工法や真空蒸着工法により金属装飾膜を形成するようにしている。
前記金属装飾膜を、湿式メッキ工法により形成する場合には、その膜厚が数十μmと比較的厚いため、金属装飾膜の上から有機溶剤を用いて保護膜を塗装しても、樹脂製基材は有機溶剤により侵されることはない。
しかしながら、スパッタリング工法や真空蒸着工法により成膜された金属装飾膜では、その膜厚が数十〜数百nmと比較的薄いために、前記湿式メッキ工法と同様に保護膜を有機溶剤を用いて塗装すると、有機溶剤が金属装飾膜に浸透して、更に、その下の樹脂製基材を侵してしまい金属装飾膜が剥離してしまうという問題があった。
この問題を解決するために、樹脂製基材上に有機溶剤の浸透を防ぐための保護膜を湿式工法や塗装工法により形成する方法が考えられるが、樹脂製基材表面に形成されたヘアライン加工やエンボス加工により形成された微細凹凸面がある場合には、この保護膜がうまく凹凸面に沿うように積層されず、その上に金属装飾膜を形成しても、所望の意匠性が得られないという問題があった。
Conventionally, a metal decorative film is formed by wet plating, sputtering or vacuum deposition to give a metallic luster to the surface of resin substrates used in electronic equipment, home appliances, automotive exteriors and interiors, etc. I have to.
When the metal decoration film is formed by a wet plating method, the film thickness is relatively large, such as several tens of μm. Therefore, even if a protective film is coated on the metal decoration film using an organic solvent, The substrate is not attacked by the organic solvent.
However, in the metal decorative film formed by sputtering method or vacuum vapor deposition method, the film thickness is relatively thin such as several tens to several hundreds nm, so that the protective film is made of an organic solvent in the same manner as the wet plating method. When applied, the organic solvent penetrates into the metal decorative film, and further, there is a problem that the resin base material under the organic solvent is invaded and the metal decorative film is peeled off.
In order to solve this problem, a method of forming a protective film for preventing the penetration of an organic solvent on a resin base material by a wet method or a coating method is conceivable. If there is a fine uneven surface formed by embossing, this protective film is not laminated well along the uneven surface, and even if a metal decorative film is formed on it, the desired design property can be obtained There was no problem.

そこで、本発明は、有機溶剤を用いて保護膜を形成しても樹脂製基材が侵されることがない保護膜で保護された金属装飾膜を備えた樹脂製基材及び樹脂製基材への金属装飾膜の積層方法を提供することを目的とする。   Therefore, the present invention provides a resinous substrate and a resinous substrate provided with a metal decorative film protected by a protective film that does not attack the resinous substrate even if a protective film is formed using an organic solvent. An object of the present invention is to provide a method for laminating a metal decorative film.

上記課題を解決するために、本発明者等は、鋭意検討の結果、樹脂製基材上に有機溶剤が浸透することがない高分子からなる薄膜を蒸着重合法により形成することを知見し、下記の通り解決手段を見出した。
即ち、本発明の金属装飾膜の積層方法は、請求項1に記載の通り、保護膜で保護された金属装飾膜を樹脂製基材に積層する方法であって、前記樹脂製基材上に、蒸着重合法による高分子膜と、金属装飾膜とを積層した後、有機溶剤を用いて保護膜を積層することを特徴とする。
また、請求項2に記載の本発明は、請求項1に記載の金属装飾膜の積層方法において、前記金属装飾膜は、乾式工程により形成することを特徴とする。
また、請求項3に記載の本発明は、請求項1又は2に記載の金属装飾膜の積層方法において、前記高分子膜は、ポリ尿素膜であることを特徴とする。
また、本発明の樹脂製部材は、請求項4に記載の通り、有機溶剤を用いて形成された保護膜で保護された金属装飾膜を備えた樹脂製基材であって、前記樹脂製基材の表面に蒸着重合で得られた高分子膜を介して前記金属装飾膜が設けられていることを特徴とする。
また、請求項5に記載の本発明は、請求項4に記載の樹脂製基材において、前記高分子膜は、ポリ尿素膜であることを特徴とする。
In order to solve the above problems, the present inventors have found that, as a result of intensive studies, a thin film made of a polymer that does not penetrate an organic solvent on a resin substrate is formed by a vapor deposition polymerization method. The solution was found as follows.
That is, the method for laminating a metal decorative film according to the present invention is a method for laminating a metal decorative film protected by a protective film on a resin base material as described in claim 1, wherein the metal decorative film is formed on the resin base material. A polymer film formed by vapor deposition polymerization and a metal decoration film are laminated, and then a protective film is laminated using an organic solvent.
According to a second aspect of the present invention, in the metal decorative film laminating method according to the first aspect, the metal decorative film is formed by a dry process.
According to a third aspect of the present invention, in the metal decorative film laminating method according to the first or second aspect, the polymer film is a polyurea film.
The resin member according to the present invention is a resin base material provided with a metal decorative film protected by a protective film formed using an organic solvent, as defined in claim 4, wherein the resin base The metal decoration film is provided on the surface of the material through a polymer film obtained by vapor deposition polymerization.
The present invention according to claim 5 is the resin substrate according to claim 4, wherein the polymer film is a polyurea film.

本発明の樹脂製基材への金属装飾膜の積層方法によれば、金属装飾膜の上から保護膜を有機溶剤を用いて積層しても、有機溶剤により樹脂製基材が侵されることがない。その結果、金属装飾膜の剥離を防ぐことができる。
また、本発明の樹脂製基材によれば、金属装飾膜は、剥離することが抑えられ、しかも、樹脂製基材表面にエンボス加工やヘアライン加工等により形成された凹凸面の形状を損なうことのない金属装飾膜となるため、優れた意匠性を有するものとすることができる。
According to the method for laminating a metal decorative film on a resinous base material of the present invention, even if a protective film is laminated using an organic solvent on the metal decorative film, the resinous base material may be attacked by the organic solvent. Absent. As a result, peeling of the metal decorative film can be prevented.
Further, according to the resin base material of the present invention, the metal decorative film is suppressed from peeling, and the shape of the uneven surface formed on the resin base material surface by embossing or hairline processing is impaired. Therefore, it can have excellent design properties.

次に、本発明の実施の形態について説明する。
本発明の金属装飾膜の積層方法は、樹脂製基材上に、まず、蒸着重合法により高分子膜を積層する。
高分子膜の成膜速度については、特に制限はないが、0.5μm/min以下とすることが好ましい。これは、成膜条件をモノマーの反応律速にし、表面形状にそって膜を形成させるためである。
前記高分子膜を形成する材料としては、ポリ尿素膜、ポリイミド、ポリアミド、ポリオキサジアゾール、ポリウレタン、ポリアゾメチン等の蒸着重合可能な高分子材料であれば特に制限するものではないが、ポリ尿素膜とすることが好ましい。樹脂製基材を保護する特性に優れているからである。
前記ポリ尿素膜は、芳香族アルキル、脂環状又は脂肪族のジイソシアネートモノマーと、芳香族アルキル、脂環状又は脂肪族のジアミンモノマーの蒸着重合により得ることができる。
原料モノマーのジイソシアネートとしては、例えば、化1に示される芳香族アルキルジイソシアネート、例えば、化2に示される脂環状ジイソシアネート又は、例えば、化3に示される脂肪族ジイソシアネートを使用することができる。

Figure 0004918454

Figure 0004918454

Figure 0004918454
Next, an embodiment of the present invention will be described.
In the method for laminating a metal decorative film according to the present invention, a polymer film is first laminated on a resin substrate by vapor deposition polymerization.
The film formation rate of the polymer film is not particularly limited, but is preferably 0.5 μm / min or less. This is because the film forming conditions are controlled by the monomer reaction rate, and the film is formed along the surface shape.
The material for forming the polymer film is not particularly limited as long as it is a polymer material capable of vapor deposition polymerization such as polyurea film, polyimide, polyamide, polyoxadiazole, polyurethane, and polyazomethine. A film is preferred. It is because it is excellent in the characteristic which protects the resin-made base materials.
The polyurea film can be obtained by vapor deposition polymerization of an aromatic alkyl, alicyclic or aliphatic diisocyanate monomer and an aromatic alkyl, alicyclic or aliphatic diamine monomer.
As the diisocyanate of the raw material monomer, for example, an aromatic alkyl diisocyanate represented by Chemical Formula 1, such as an alicyclic diisocyanate represented by Chemical Formula 2, or an aliphatic diisocyanate represented by Chemical Formula 3, for example, can be used.
Figure 0004918454

Figure 0004918454

Figure 0004918454

また、原料モノマーのジアミンとしては、例えば、化4に示される芳香族アルキルジアミン、例えば、化5に示される脂環状ジアミン又は例えば、化6に示される脂肪族ジアミンを使用することができる。

Figure 0004918454

Figure 0004918454

Figure 0004918454
Moreover, as a diamine of a raw material monomer, the aromatic alkyldiamine shown by Chemical formula 4, For example, the alicyclic diamine shown by Chemical formula 5, For example, the aliphatic diamine shown by Chemical formula 6 can be used.
Figure 0004918454

Figure 0004918454

Figure 0004918454

これらの原料モノマーを真空中で蒸発させ、樹脂製基材上において重合反応させることにより、ポリ尿素膜とすることができる。尚、真空の圧力については特に制限するものではないが、10-3〜100Pa程度とすることができる。 A polyurea film can be obtained by evaporating these raw material monomers in a vacuum and polymerizing them on a resin substrate. The vacuum pressure is not particularly limited, but can be about 10 −3 to 100 Pa.

尚、上記原料モノマーの具体例は以下の通りである。
<ジイソシアネート>
芳香族アルキル:1,3−ビス(イソシアネートメチル)ベンゼン、1,3−ビス(1−イソシアネート−1−メチルエチル)ベンゼン等
脂環状:1,3−ビス(イソシアネートメチル)シクロヘキサン、3−イソシアネートメチル−3,5,5−トリメチルヘキシルイソシアネート、メチレンビス(4−シクロヘキシルイソシアネート)、2,5(2,6)−ビス(イソシアネートメチル)ビシクロ[2,2,1]ヘプタン等
脂肪族:1,6−ジイソシアネートヘキサン、1,5−ジイソシアネート−2−メチルペンタン、1,8−ジイソシアネートオクタン、1,12−ジイソシアネートドデカン、テトライソシアネートシラン、モノメチルトリイソシアネートシラン等
<ジアミン>
芳香族アルキル:1,3−ビス(アミノメチル)ベンゼン、1,4−ビス(アミノメチル)ベンゼン、イソフタル酸ジヒドラジド等
脂環状:1,3−ビス(アミノメチル)シクロヘキサン、1,4−ビス(アミノメチル)シクロヘキサン、3−アミノメチル−3,5,5−トリメチルヘキシルアミン、1,2−ジアミンシクロヘキサン、1,4−ジアミノシクロヘキサン、メチレンビス(4−シクロヘキシルアミン)、ピペラジン、2−ピペラジン、2,5−ジメチルピペラジン、2,6−ジメチルピペラジン、N,N’−ビス(3−アミノプロピル)ピペラジン、1,3−ジ(4−ピペリジル)プロパン、ヒダントイン、ヘキサヒドロ−1H−1,4−ジアゼピン、バルビツール酸等
脂肪族:1,6−ジアミノヘキサン、1,7−ジアミノヘプタン、1,8−ジアミノオクタン、1,9−ジアミノノナン、1,10−ジアミノデカン、1,12−ジアミノドデカン、ビス(2−アミノエチル)アミン、ビス(3−アミノプロピル)アミン、N,N’−ビス(アミノプロピル)メチルアミン、N−(3−アミノプロピル)−1,4−ブタンジアミン、N,N’−(3−アミノプロピル)−1,4−ブタンジアミン、アジピン酸ジヒドラジド、ドデカン二酸ジヒドラジド、セバシン酸ジヒドラジド等
Specific examples of the raw material monomer are as follows.
<Diisocyanate>
Aromatic alkyl: 1,3-bis (isocyanatemethyl) benzene, 1,3-bis (1-isocyanate-1-methylethyl) benzene, etc. Alicyclic: 1,3-bis (isocyanatemethyl) cyclohexane, 3-isocyanatemethyl −3,5,5-trimethylhexyl isocyanate, methylenebis (4-cyclohexylisocyanate), 2,5 (2,6) -bis (isocyanatomethyl) bicyclo [2,2,1] heptane, etc. Aliphatic: 1,6- Diisocyanate hexane, 1,5-diisocyanate-2-methylpentane, 1,8-diisocyanate octane, 1,12-diisocyanate dodecane, tetraisocyanate silane, monomethyltriisocyanate silane, etc. <diamine>
Aromatic alkyl: 1,3-bis (aminomethyl) benzene, 1,4-bis (aminomethyl) benzene, isophthalic acid dihydrazide, etc. Alicyclic: 1,3-bis (aminomethyl) cyclohexane, 1,4-bis ( (Aminomethyl) cyclohexane, 3-aminomethyl-3,5,5-trimethylhexylamine, 1,2-diaminecyclohexane, 1,4-diaminocyclohexane, methylenebis (4-cyclohexylamine), piperazine, 2-piperazine, 2, 5-dimethylpiperazine, 2,6-dimethylpiperazine, N, N′-bis (3-aminopropyl) piperazine, 1,3-di (4-piperidyl) propane, hydantoin, hexahydro-1H-1,4-diazepine, Aliphatic acids such as barbituric acid: 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1,9-diaminononane, 1,10-diaminodecane, 1,12-diaminodo Can, bis (2-aminoethyl) amine, bis (3-aminopropyl) amine, N, N′-bis (aminopropyl) methylamine, N- (3-aminopropyl) -1,4-butanediamine, N N '-(3-aminopropyl) -1,4-butanediamine, adipic acid dihydrazide, dodecanedioic acid dihydrazide, sebacic acid dihydrazide, etc.

前記高分子膜の膜厚は、1μm〜50μmとすることが好ましく、更に好ましくは5μmとすることが好ましい。1μm未満であると、有機溶剤の樹脂製基材への浸透を防げず、50μm超えであると、表面の意匠性を失う可能性があるからである。   The film thickness of the polymer film is preferably 1 μm to 50 μm, more preferably 5 μm. This is because if it is less than 1 μm, the organic solvent cannot be prevented from penetrating into the resin base material, and if it exceeds 50 μm, the surface design may be lost.

上記のように高分子膜が形成された樹脂製基材上に、次に、金属装飾膜を、スパッタリング、真空蒸着、イオンプレーティング等により積層する。
この金属装飾膜の膜厚は、特に制限するものではないが、10nm〜1000nm程度とすること好ましい。10nm未満であると、金属光沢が出ず、1000nm超えであると、膜にクラック等の不具合が発生するからである。また、金属装飾膜を構成する材料についても特に制限するものではないが、例えば、Cr、Al、SUS等を使用することができる。
また、前記金属装飾膜は、スパッタリング法、真空蒸着法、イオンプレーティング法等の乾式工程により形成することが好ましい。廃液等の環境負荷物質の発生を少なくすることができるからである。
Next, a metal decorative film is laminated on the resin base material on which the polymer film is formed as described above by sputtering, vacuum deposition, ion plating, or the like.
The thickness of the metal decorative film is not particularly limited, but is preferably about 10 nm to 1000 nm. If the thickness is less than 10 nm, the metallic luster does not appear, and if it exceeds 1000 nm, defects such as cracks occur in the film. Moreover, although it does not restrict | limit especially about the material which comprises a metal decoration film, For example, Cr, Al, SUS, etc. can be used.
The metal decorative film is preferably formed by a dry process such as sputtering, vacuum deposition, or ion plating. This is because the generation of environmentally hazardous substances such as waste liquid can be reduced.

そして、次に、金属装飾膜上に、有機溶剤を用いて保護膜を積層する。保護膜の材料としては、具体的には、アクリル系、ウレタン系、アクリルウレタン系等を使用することができる。尚、有機溶剤としては、例えば、アルコール系、アセトン系等を使用することができる。
この保護膜の膜厚は、例えば、20μm程度とすることができる。
Then, a protective film is laminated on the metal decorative film using an organic solvent. Specifically, acrylic, urethane, acrylurethane, or the like can be used as the material for the protective film. In addition, as an organic solvent, alcohol type, acetone type etc. can be used, for example.
The thickness of the protective film can be set to about 20 μm, for example.

上記のようにして、蒸着重合法により形成された高分子膜に、金属装飾膜を積層すれば、有機溶剤を用いて保護膜を積層した場合に、有機溶剤が金属装飾膜を透過しても、蒸着重合法により形成された高分子膜により樹脂製基材は侵されることがない。   As described above, if a metal decorative film is laminated on the polymer film formed by the vapor deposition polymerization method, even when the organic solvent permeates the metal decorative film when the protective film is laminated using an organic solvent. The resin substrate is not attacked by the polymer film formed by the vapor deposition polymerization method.

尚、本発明における樹脂製基材は、樹脂であれば特に制限するものではないが、例えば、ABS(アクリロニトリル・ブタジエン・スチレン)、PC(ポリカーボネート)、PBT(ポリブチレンテレフタレート)等を使用することができる。また、樹脂製基材は、特に平面形状に限定されるものではなく、複雑な三次元形状であってもよい。   The resin substrate in the present invention is not particularly limited as long as it is a resin. For example, ABS (acrylonitrile / butadiene / styrene), PC (polycarbonate), PBT (polybutylene terephthalate), or the like is used. Can do. The resin substrate is not particularly limited to a planar shape, and may be a complicated three-dimensional shape.

また、本発明は、前記樹脂製基材には、エンボス加工やヘアライン加工により、高さ100nm〜1mm程度の凹凸面が形成されている場合に特に有効である。高分子膜を凹凸面の形状に沿った薄膜を形成するため、その上に積層される金属装飾膜も、前記凹凸面の形状に沿うようにすることができるからである。   Moreover, this invention is especially effective when the uneven surface of about 100 nm-1 mm in height is formed in the said resin-made base materials by embossing or hairline processing. This is because, since the polymer film is formed into a thin film along the shape of the uneven surface, the metal decorative film laminated thereon can also conform to the shape of the uneven surface.

以下、図面を参照して本発明の一実施例について説明する。
図1は、本発明の方法を実施するための装置の一例を示すもので、図中1は処理室を示し、処理室1内にポリ尿素膜を形成せしめるべきPC樹脂製基材2をホルダー3に回転自在に支持した。また、処理室1は、外部の真空ポンプその他の真空排気系4と、流路5,6を介して原料モノマーを封入した容器7,8とに接続した。原料モノマーには、メチレンビス(4−シクロヘキシルアミン)と、1,3−ビス(イソシアナートメチル)シクロヘキサンとを使用した。尚、図中9はPC樹脂製基材2と両蒸発用容器7,8との介在されるバルブを示す。
An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 shows an example of an apparatus for carrying out the method of the present invention. In FIG. 1, reference numeral 1 denotes a processing chamber, and a PC resin base material 2 on which a polyurea film is to be formed in the processing chamber 1 is a holder. 3 was supported rotatably. Further, the processing chamber 1 was connected to an external vacuum pump or other evacuation system 4 and containers 7 and 8 filled with raw material monomers via flow paths 5 and 6. Methylene bis (4-cyclohexylamine) and 1,3-bis (isocyanatomethyl) cyclohexane were used as raw material monomers. In the figure, reference numeral 9 denotes a valve in which the PC resin substrate 2 and the evaporation containers 7 and 8 are interposed.

次に、容器7内のメチレンビス(4−シクロヘキシルアミン)を84℃に加熱し、ガラス製の容器8内の1,3−ビス(イソシアナートメチル)シクロヘキサンを76℃に加熱し、処理室1内の圧力を1Paとなるまで真空排気系4により排気を行い、同室内の温度を20℃とし、PC樹脂製基材2の温度を20℃としてから、各原料モノマーを処理室1内に導入し、下記化7で示す蒸着重合反応により、PC樹脂製基材2上に成膜速度0.4μm/minでポリ尿素膜を積層した。尚、原料モノマー導入後の処理室1内の圧力は、5Paであった。   Next, methylenebis (4-cyclohexylamine) in the container 7 is heated to 84 ° C., and 1,3-bis (isocyanatomethyl) cyclohexane in the glass container 8 is heated to 76 ° C. The pressure in the chamber is evacuated by the evacuation system 4 until the temperature in the chamber is 20 ° C. and the temperature of the PC resin substrate 2 is 20 ° C., and then each raw material monomer is introduced into the processing chamber 1. A polyurea film was laminated on the PC resin substrate 2 at a film formation rate of 0.4 μm / min by the vapor deposition polymerization reaction shown in Chemical Formula 7 below. The pressure in the processing chamber 1 after the introduction of the raw material monomer was 5 Pa.

Figure 0004918454
Figure 0004918454

次に、図2に示すように、ポリ尿素膜10上に、スパッタリングにより、膜厚0.1μmのCrからなる金属装飾膜11を積層し、その上に、アクリルウレタンを有機溶剤を用いて塗布することにより保護膜12を積層し、実施例の樹脂製基材とした。   Next, as shown in FIG. 2, a metal decorative film 11 made of Cr having a film thickness of 0.1 μm is laminated on the polyurea film 10 by sputtering, and acrylic urethane is applied thereon using an organic solvent. By doing so, the protective film 12 was laminated | stacked and it was set as the resin-made base materials of an Example.

比較のために、蒸着重合法によりポリ尿素膜を積層しなかった以外は、実施例と同様にした樹脂製基材を比較例として作製した。   For comparison, a resin substrate was prepared as a comparative example in the same manner as in the example except that the polyurea film was not laminated by vapor deposition polymerization.

上記実施例と比較例のそれぞれの金属装飾膜を1mm角となるように、保護膜上から切れ目を入れ、JIS H8504による剥離試験をしたところ、実施例では、100個の片について剥離が見られなかったのに対して、比較例では、ほぼ全てが剥離した。
この結果から、比較例では、有機溶剤により樹脂製基材が侵され、金属装飾膜との密着性が失われているのに対して、実施例では、有機溶剤により樹脂製基材が侵されておらず、金属装飾膜との密着性が確保できていることがわかった。
When the metal decorative film of each of the examples and comparative examples was cut from the protective film so as to be 1 mm square, and a peel test was performed according to JIS H8504, in the example, peeling was observed for 100 pieces. In contrast, almost all peeled off in the comparative example.
From this result, in the comparative example, the resin base material was attacked by the organic solvent and the adhesion to the metal decorative film was lost, whereas in the example, the resin base material was attacked by the organic solvent. It was found that the adhesion to the metal decorative film could be secured.

本発明は、電子機器(例えば、携帯電話外装)、家電製品(例えば、冷蔵庫の取っ手)、自動車用外装(例えば、フロントグリル)、内装部品(例えば、センターコンソール)等の樹脂製基材に広く利用することができる。   The present invention is widely applicable to resinous substrates such as electronic devices (for example, mobile phone exteriors), home appliances (for example, refrigerator handles), automotive exteriors (for example, front grills), interior parts (for example, center consoles), and the like. Can be used.

本発明の一実施例に使用する装置構成の説明図Explanatory drawing of the apparatus structure used for one Example of this invention 本発明の一実施例の樹脂製基材の積層構造の説明図Explanatory drawing of the laminated structure of the resin-made base materials of one Example of this invention

符号の説明Explanation of symbols

1 処理室
2 樹脂製基材
3 ホルダー
4 真空排気系
5 流路
6 流路
7 容器
8 容器
9 バルブ
10 ポリ尿素膜(高分子膜)
11 金属装飾膜
12 保護膜
DESCRIPTION OF SYMBOLS 1 Processing chamber 2 Resin base material 3 Holder 4 Vacuum exhaust system 5 Channel 6 Channel 7 Container 8 Container 9 Valve 10 Polyurea membrane (polymer membrane)
11 Metal decorative film 12 Protective film

Claims (5)

保護膜で保護された金属装飾膜を樹脂製基材に積層する方法であって、前記樹脂製基材上に、蒸着重合法による高分子膜と、金属装飾膜とを積層した後、有機溶剤を用いて保護膜を積層することを特徴とする樹脂製基材への金属装飾膜の積層方法。   A method of laminating a metal decorative film protected by a protective film on a resin base material, wherein a polymer film by vapor deposition polymerization and a metal decorative film are laminated on the resin base material, and then an organic solvent A method for laminating a metal decorative film on a resin substrate, comprising laminating a protective film using 前記金属装飾膜は、乾式工程により形成することを特徴とする請求項1に記載の樹脂製基材への金属装飾膜の積層方法。   The method for laminating a metal decorative film on a resin base material according to claim 1, wherein the metal decorative film is formed by a dry process. 前記高分子膜は、ポリ尿素膜であることを特徴とする請求項1又は2に記載の樹脂製基材への金属装飾膜の積層方法。   The method for laminating a metal decorative film on a resin substrate according to claim 1 or 2, wherein the polymer film is a polyurea film. 有機溶剤を用いて形成された保護膜で保護された金属装飾膜を備えた樹脂製基材であって、前記樹脂製基材の表面に蒸着重合で得られた高分子膜を介して前記金属装飾膜が設けられていることを特徴とする樹脂製基材。 A resin base material provided with a metal decorative film protected by a protective film formed using an organic solvent, wherein the metal is interposed on the surface of the resin base material through a polymer film obtained by vapor deposition polymerization. A resin base material provided with a decorative film. 前記高分子膜は、ポリ尿素膜であることを特徴とする請求項4に記載の樹脂製基材。   The resin base material according to claim 4, wherein the polymer film is a polyurea film.
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