JP4905775B2 - Antireflection film, polarizing plate, image display device, and production method of antireflection film - Google Patents

Description

  The present invention relates to an antireflection film, a polarizing plate using the antireflection film, and an image display device using the antireflection film or the polarizing plate on the outermost surface of a display.

  In general, an antireflection film is used for an image display device such as a cathode ray tube display (CRT), a plasma display (PDP), an electroluminescence display (ELD), and a liquid crystal display (LCD). To prevent image reflection, it is placed on the top surface of the display to reduce reflectivity using the principle of optical interference.

Such an antireflection film can be generally produced by forming a low refractive index layer having an appropriate film thickness having a lower refractive index than that of the support on the support. In order to realize a low reflectance, it is desirable to use a material having a refractive index as low as possible for the low refractive index layer.
Moreover, since an antireflection film is used for the outermost surface of a display, high scratch resistance is required. In order to realize high scratch resistance in a thin film having a thickness of around 100 nm, the strength of the coating itself and the adhesion to the lower layer are required.
In addition, anti-reflection film is used on the outermost surface of the display device, so it is resistant to various stains such as fingerprints in exhibitions and daily use, even if it is attached or wiped off In other words, both are called antifouling properties).

In order to lower the refractive index of the material, there are means such as (1) introducing fluorine atoms, (2) lowering the density (introducing voids), etc., both of which decrease the film strength and interface adhesion, The scratch resistance is in the direction of decreasing, and it has been a difficult task to achieve both low refractive index and high scratch resistance.
Further, in order to increase the hardness of the coating itself, it is important to sufficiently advance the curing reaction. Patent Documents 1 to 5 propose methods for curing a low refractive index layer of an antireflection film by reacting a hydroxyl group of a fluoropolymer with a curing agent using an acid catalyst.
Moreover, in order to improve antifouling property, the example of the fluorine-containing polymer which introduce | transduced the silicon into the polymer principal chain is described in patent documents 1-4.

  On the other hand, Patent Documents 6 to 9 propose a cured composition, a paint, or the like using an amine salt of sulfonic acid as a catalyst.

Special No. 3498381 JP-A-11-189621 Japanese Patent Laid-Open No. 11-228631 JP 2004-307524 A JP 2003-26732 A Japanese Patent Laid-Open No. 62-174276 Japanese Patent Laid-Open No. 1-259071 JP-A-2-173172 JP-A-2-302477

Regarding the curing, the techniques of Patent Documents 1 to 5 use p-toluenesulfonic acid as the acid catalyst, and the curing activity is high, but the curing reaction proceeds partially during storage, so the coating solution is not sufficiently stable. Since there are restrictions on the coating conditions, it has been desired to achieve both curing activity and coating solution stability.
From the viewpoint of improving the antifouling property, the method of introducing silicon into the polymer main chain described in Patent Documents 1 to 4 may weaken the coating film.

  Moreover, there is no example which applied the technique of patent documents 6-9 to an antireflection film, and the selection criteria of a base are not shown.

  An object of the present invention is to provide an antireflection film having excellent scratch resistance and antifouling properties while achieving both storage stability and curing activity of a coating solution. Furthermore, it is providing the polarizing plate and image display apparatus using such an antireflection film.

As a result of intensive studies to solve the above-described problems, the present inventors have found that the above-described problems can be solved and the object can be achieved, and the present invention has been completed.
That is, the present invention achieves the object by the following configuration.

（式（１）中、Ｒ^１、Ｒ^２は同一であっても異なっていてもよく、アルキル基又はアリール基を表す。ｐは１０〜５００の整数を表す。）
（２）塗布組成物が更に、（Ｄ）オルガノシラン化合物又は、該オルガノシラン化合物の加水分解物及び／又はその部分縮合物から構成される組成物、を含有することを特徴とする上記（１）に記載の反射防止フイルム。 (1) On the support, the following components (A), (B), (C) and at least one salt composed of a nitrogen-containing organic base having a boiling point of 35 ° C. or higher and 85 ° C. or lower and an acid are included. An antireflection film comprising a low refractive index layer formed by coating a coating composition.
(A) A polymer unit having a main chain composed of only carbon atoms, a fluorine-containing vinyl monomer polymer unit, a hydroxyl group-containing vinyl monomer polymer unit, and a graft site containing a polysiloxane repeating unit represented by the following general formula 1 in the side chain And a hydroxyl group-containing vinyl monomer polymerized unit content of more than 20 mol%. However, the polymer does not have a polysiloxane structure in the main chain.
(B) A crosslinking agent capable of reacting with a hydroxyl group.
(C) A compound containing two or more (meth) acryloyl groups in one molecule.
General formula 1

(In formula (1), R ¹ and R ² may be the same or different and each represents an alkyl group or an aryl group. P represents an integer of 10 to 500.)
(2) The coating composition further comprises (D) an organosilane compound or a composition composed of a hydrolyzate of the organosilane compound and / or a partial condensate thereof (1) ) Antireflective film.

( 3 ) The antireflection film as described in (1) or (2) above, wherein the coating composition further comprises (E) inorganic particles having a particle size of 1 nm to 100 nm.
(4) The antireflection film as described in (3) above, wherein the inorganic particles are hollow silica particles.

（式（１）中、Ｒ ^１ 、Ｒ ^２ は同一であっても異なっていてもよく、アルキル基又はアリール基を表す。ｐは１０〜５００の整数を表す。）

なお、本発明は上記（１）〜（１０）に記載された、反射防止フィルム、偏光板、画像表示装置及び反射防止フイルムの製造方法であるが、参考のため、明細書中にはその他の事項についても記載してある。 (5) Any of the above (1) to (4), wherein the coating composition further comprises (F) a polysiloxane compound containing a hydroxyl group or a functional group that reacts with a hydroxyl group to form a bond. Anti-reflective film according to crab.
(6) the organic base pKa of the conjugate acid is characterized and 5.0 to 10.5 der Turkey (1) to (5) anti-reflection film according to any one of.
(7 ) Between the support and the low refractive index layer, there is at least one layer having a refractive index higher than that of the low refractive index layer, and the layer is an organosilane compound or a hydrolyzate of the organosilane compound and The antireflection film according to any one of the above (1) to ( 6 ), comprising a composition comprising // or a partial condensate thereof.
( 8 ) A polarizing plate, wherein the antireflection film according to any one of (1) to ( 7 ) is used for one of the two protective films of the polarizing film in the polarizing plate.
( 9 ) An image display device, wherein the antireflection film according to any one of (1) to ( 7 ) or the polarizing plate according to ( 8 ) is used on the outermost surface of the display.
(10) On the support, the following components (A), (B), (C), and at least one salt composed of a nitrogen-containing organic base having a boiling point of 35 ° C. or higher and 85 ° C. or lower and an acid are included. A method for producing an antireflection film, wherein a coating composition is applied to form a low refractive index layer.
(A) A polymer unit having a main chain composed of only carbon atoms, a fluorine-containing vinyl monomer polymer unit, a hydroxyl group-containing vinyl monomer polymer unit, and a graft site containing a polysiloxane repeating unit represented by the following general formula 1 in the side chain And a hydroxyl group-containing vinyl monomer polymerized unit content of more than 20 mol%. However, the polymer does not have a polysiloxane structure in the main chain.
(B) A crosslinking agent capable of reacting with a hydroxyl group.
(C) A compound containing two or more (meth) acryloyl groups in one molecule.
General formula 1

(In formula (1), R ¹ and R ² may be the same or different and each represents an alkyl group or an aryl group. P represents an integer of 10 to 500.)

In addition, although this invention is a manufacturing method of the anti-reflective film, polarizing plate, image display apparatus, and anti-reflective film which were described in said (1)-(10), for reference, other specifications are included in this specification. The matter is also described.

  The antireflection film of the present invention is excellent in scratch resistance and antifouling properties while having sufficient antireflection properties. Moreover, since it manufactures using the coating liquid which made the preservability and hardening activity compatible, manufacturing aptitude is high. Furthermore, the image display device provided with the antireflection film of the present invention and the image display device provided with a polarizing plate using the antireflection film of the present invention have little reflection of external light and background reflection, and are extremely visible. High nature.

  Hereinafter, the present invention will be described in more detail. In the present specification, when a numerical value represents a physical property value, a characteristic value, etc., the description “(numerical value 1) to (numerical value 2)” means “(numerical value 1) or more and (numerical value 2) or less” . In the present specification, the description “(meth) acrylate” means “at least one of acrylate and methacrylate”. The same applies to “(meth) acrylic acid” and the like. Further, in the present specification, the “antireflection film of the present invention” may be referred to as “the film of the present invention” or simply “film” when the meaning is clear from the preceding and following sentences.

1. Constituents of Antireflective Film of the Present Invention First, constituents such as various compounds that can be used in the support and constituent layers constituting the antireflective film of the present invention will be described.

1- (1) Binder component added as monomer The constituent layer of the film of the present invention can be formed by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound. That is, a coating composition containing an ionizing radiation-curable polyfunctional monomer or polyfunctional oligomer is coated on a transparent support, and the binder layer is formed by crosslinking reaction or polymerization reaction of the polyfunctional monomer or polyfunctional oligomer. can do. It is preferable that the binder component added as a monomer is contained in the coating composition which forms the hard-coat layer and / or low-refractive-index layer of the antireflection film of this invention mentioned later.
The functional group of the ionizing radiation-curable polyfunctional monomer or polyfunctional oligomer is preferably a light, electron beam, or radiation polymerizable group, and among them, a photopolymerizable functional group is preferable.
Examples of the photopolymerizable functional group include unsaturated polymerizable functional groups such as a (meth) acryloyl group, a vinyl group, a styryl group, and an allyl group. Among them, a (meth) acryloyl group is preferable. In particular, as the component (C) of the low refractive index layer in the present invention, a compound containing two or more (meth) acryloyl groups in one molecule described below can be used.

Specific examples of the photopolymerizable polyfunctional monomer having a photopolymerizable functional group include (meth) alkylene glycols such as neopentyl glycol acrylate, 1,6-hexanediol (meth) acrylate, and propylene glycol di (meth) acrylate. Acrylic acid diesters;
(Meth) acrylic acid diesters of polyoxyalkylene glycols such as triethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate;
(Meth) acrylic acid diesters of polyhydric alcohols such as pentaerythritol di (meth) acrylate;
(Meth) acrylic acid diesters of ethylene oxide or propylene oxide adducts such as 2,2-bis {4- (acryloxy · diethoxy) phenyl} propane and 2-bis {4- (acryloxy · polypropoxy) phenyl} propane ;
Etc.

  Furthermore, epoxy (meth) acrylates, urethane (meth) acrylates, and polyester (meth) acrylates are also preferably used as the photopolymerizable polyfunctional monomer.

  Among these, esters of polyhydric alcohol and (meth) acrylic acid are preferable. More preferably, a polyfunctional monomer having 3 or more (meth) acryloyl groups in one molecule is preferable. Specifically, trimethylolpropane tri (meth) acrylate, trimethylolethane tri (meth) acrylate, 1,2,4-cyclohexanetetra (meth) acrylate, pentaglycerol triacrylate, pentaerythritol tetra (meth) acrylate, penta Erythritol tri (meth) acrylate, (di) pentaerythritol triacrylate, (di) pentaerythritol pentaacrylate, (di) pentaerythritol tetra (meth) acrylate, (di) pentaerythritol hexa (meth) acrylate, tripentaerythritol triacrylate , Tripentaerythritol hexatriacrylate and the like. In the present specification, “(meth) acrylate”, “(meth) acrylic acid”, and “(meth) acryloyl” represent “acrylate or methacrylate”, “acrylic acid or methacrylic acid”, and “acryloyl or methacryloyl”, respectively. .

As the monomer used for the binder, monomers having different refractive indexes of the polymer can be used in order to control the refractive index of each layer. Examples of particularly high refractive index monomers include bis (4-methacryloylthiophenyl) sulfide, vinyl naphthalene, vinyl phenyl sulfide, 4-methacryloxyphenyl-4′-methoxyphenyl thioether, and the like.
Further, for example, dendrimers described in JP-A-2005-76005 and JP-A-2005-36105, and norbornene ring-containing monomers as described in JP-A-2005-60425 can also be used.

Two or more polyfunctional monomers may be used in combination.
Polymerization of the monomer having an ethylenically unsaturated group can be performed by irradiation with ionizing radiation or heating in the presence of a photo radical initiator or a thermal radical initiator.
It is preferable to use a photopolymerization initiator for the polymerization reaction of the photopolymerizable polyfunctional monomer. As the photopolymerization initiator, a photoradical polymerization initiator and a photocationic polymerization initiator are preferable, and a photoradical polymerization initiator is particularly preferable.

1- (2) Binder component added as a polymer In the present invention, a polymer or a cross-linked polymer can be used as a binder of a constituent layer. The crosslinked polymer preferably has an anionic group. The polymer having a crosslinked anionic group has a structure in which the main chain of the polymer having an anionic group is crosslinked. The binder component added as a polymer is preferably contained in a coating composition for forming a hard coat layer and / or a low refractive index layer of the antireflection film of the present invention described later.

Examples of the polymer main chain include polyolefin (saturated hydrocarbon), polyether, polyurea, polyurethane, polyester, polyamine, polyamide and melamine resin. A polyolefin main chain, a polyether main chain and a polyurea main chain are preferable, a polyolefin main chain and a polyether main chain are more preferable, and a polyolefin main chain is most preferable.
The polyolefin main chain consists of saturated hydrocarbons. The polyolefin main chain is obtained, for example, by an addition polymerization reaction of an unsaturated polymerizable group. The polyether main chain has repeating units bonded by an ether bond (—O—). The polyether main chain is obtained, for example, by a ring-opening polymerization reaction of an epoxy group. In the polyurea main chain, repeating units are bonded by a urea bond (—NH—CO—NH—). The polyurea main chain is obtained, for example, by a condensation polymerization reaction between an isocyanate group and an amino group. The polyurethane main chain has repeating units bonded by urethane bonds (—NH—CO—O—). The polyurethane main chain is obtained, for example, by a polycondensation reaction between an isocyanate group and a hydroxyl group (including an N-methylol group). The polyester main chain has repeating units bonded by an ester bond (—CO—O—). The polyester main chain is obtained, for example, by a polycondensation reaction between a carboxyl group (including an acid halide group) and a hydroxyl group (including an N-methylol group). The polyamine main chain has repeating units bonded by imino bonds (—NH—). The polyamine main chain is obtained, for example, by a ring-opening polymerization reaction of an ethyleneimine group. The polyamide main chain has repeating units bonded by an amide bond (—NH—CO—). The polyamide main chain is obtained, for example, by a reaction between an isocyanate group and a carboxyl group (including an acid halide group). The melamine resin main chain is obtained, for example, by a polycondensation reaction between a triazine group (eg, melamine) and an aldehyde (eg, formaldehyde). In the melamine resin, the main chain itself has a crosslinked structure.

The anionic group is bonded directly to the main chain of the polymer or bonded to the main chain via a linking group. The anionic group is preferably bonded to the main chain as a side chain via a linking group.
Examples of the anionic group include a carboxylic acid group (carboxyl), a sulfonic acid group (sulfo), and a phosphoric acid group (phosphono), and a sulfonic acid group and a phosphoric acid group are preferable.
The anionic group may be in a salt state. The cation that forms a salt with the anionic group is preferably an alkali metal ion. Moreover, the proton of the anionic group may be dissociated.
The linking group that binds the anionic group and the polymer main chain is preferably a divalent group selected from —CO—, —O—, an alkylene group, an arylene group, and combinations thereof.

  The crosslinked structure is a structure in which two or more main chains are chemically bonded (preferably covalent bonds), but it is preferable to covalently bond three or more main chains. The cross-linked structure is preferably composed of a divalent or higher valent group selected from —CO—, —O—, —S—, a nitrogen atom, a phosphorus atom, an aliphatic residue, an aromatic residue, and combinations thereof.

  The crosslinked polymer having an anionic group is preferably a copolymer having a repeating unit having an anionic group and a repeating unit having a crosslinked structure. The proportion of the repeating unit having an anionic group in the copolymer is preferably 2 to 96% by mass, more preferably 4 to 94% by mass, and most preferably 6 to 92% by mass. The repeating unit may have two or more anionic groups. The proportion of the repeating unit having a crosslinked structure in the copolymer is preferably 4 to 98% by mass, more preferably 6 to 96% by mass, and most preferably 8 to 94% by mass.

The repeating unit of the polymer having a crosslinked anionic group may have both an anionic group and a crosslinked structure. Further, other repeating units (repeating units having neither an anionic group nor a crosslinked structure) may be contained.
Other repeating units are preferably a repeating unit having an amino group or a quaternary ammonium group and a repeating unit having a benzene ring. The amino group or the quaternary ammonium group has a function of maintaining the dispersed state of the inorganic particles, like the anionic group. The same effect can be obtained even when the amino group, quaternary ammonium group and benzene ring are contained in a repeating unit having an anionic group or a repeating unit having a crosslinked structure.
In a repeating unit having an amino group or a quaternary ammonium group, the amino group or quaternary ammonium group is directly bonded to the main chain of the polymer or bonded to the main chain through a linking group. The amino group or quaternary ammonium group is preferably bonded to the main chain as a side chain via a linking group. The amino group or quaternary ammonium group is preferably a secondary amino group, a tertiary amino group or a quaternary ammonium group, more preferably a tertiary amino group or a quaternary ammonium group. The group bonded to the nitrogen atom of the secondary amino group, tertiary amino group or quaternary ammonium group is preferably an alkyl group, preferably an alkyl group having 1 to 12 carbon atoms, Is more preferably an alkyl group of 1 to 6. The counter ion of the quaternary ammonium group is preferably a halide ion. The linking group that connects the amino group or quaternary ammonium group to the polymer main chain is a divalent group selected from -CO-, -NH-, -O-, an alkylene group, an arylene group, and combinations thereof. Preferably there is. When the polymer having a crosslinked anionic group contains a repeating unit having an amino group or a quaternary ammonium group, the ratio is preferably 0.06 to 32% by mass, and 0.08 to 30% by mass. It is more preferable that it is 0.1 to 28% by mass.

1- (3) Fluorine-containing polymer binder [low refractive index layer component (A) of the present invention]
In the present invention, the low refractive index layer has a main chain composed only of carbon atoms, each containing at least one fluorine-containing vinyl monomer polymerization unit and a hydroxyl group-containing vinyl monomer polymerization unit, and the hydroxyl group-containing vinyl monomer polymerization unit. A fluorine-containing polymer having a content rate exceeding 20 mol% and having no polysiloxane structure in the main chain is used.
(Fluorine-containing vinyl monomer polymerization unit)
In the present invention, the structure of the fluorine-containing vinyl monomer polymerization unit contained in the fluorine-containing polymer used for forming the low refractive index layer is not particularly limited, and examples thereof include fluorine-containing olefin, perfluoroalkyl vinyl ether, and vinyl ether having a fluorine-containing alkyl group. And polymerized units based on (meth) acrylate and the like. The fluorine-containing polymer is preferably a copolymer of a fluorine-containing olefin and a vinyl ether because of suitability for production and properties required for a low refractive index layer such as a refractive index and film strength. More preferably, it is a copolymer. Further, as a copolymer component, perfluoroalkyl vinyl ether, vinyl ether having a fluorine-containing alkyl group, (meth) acrylate, or the like may be included for the purpose of reducing the refractive index.

  As the perfluoroolefin, those having 3 to 7 carbon atoms are preferable, perfluoropropylene or perfluorobutylene is preferable from the viewpoint of polymerization reactivity, and perfluoropropylene is particularly preferable from the viewpoint of availability.

  The content of perfluoroolefin in the polymer is 25 to 75 mol%. In order to lower the refractive index of the material, it is desired to increase the introduction rate of perfluoroolefin, but in the point of polymerization reactivity, introduction of about 50 to 70 mol% is the limit in a general solution-based radical polymerization reaction. There is more than that. In the present invention, the content is preferably 30% to 70% by mole, more preferably 30% to 60% by mole, still more preferably 35% to 60% by mole, and 40% to 60%. It is particularly preferred that it is mol%.

  Further, the fluorine-containing polymer used in the present invention may be copolymerized with a fluorine-containing vinyl ether represented by the following M1 in order to reduce the refractive index. The copolymer component may be introduced into the polymer in a co-range of 0 to 40 mol%, preferably 0 to 30 mol%, particularly preferably 0 to 20 mol%.

In M1, Rf ¹¹¹ represents a fluorinated alkyl group having 1 to 30 carbon atoms, preferably a fluorinated alkyl group having 1 to 20 carbon atoms, particularly preferably 1 to 15 carbon atoms, and a straight chain {for example, —CF ₂ CF ₃ , —CH ₂ (CF ₂ ) _a H, —CH ₂ CH ₂ (CF ₂ ) _a F (a: integer of 2 to 12), etc.} or branched structure {eg, CH (CF ₃ ) ₂ , CH ₂ CF (CF ₃ ) ₂ , —CH (CH ₃ ) CF ₂ CF ₃ , —CH (CH ₃ ) (CF ₂ ) ₅ CF ₂ H, etc.} and an alicyclic structure (Preferably a 5-membered or 6-membered ring such as a perfluorocyclohexyl group, a perfluorocyclopentyl group or an alkyl group substituted therewith) and an ether bond (for example, —CH ₂ OCH ₂ CF ₂ CF _3, -CH _{CH 2 OCH 2 (CF 2)} b H, -CH 2 CH 2 OCH 2 (CF 2) b F (b: 2~12 _integer), the _CH like _{2 CH 2 OCF 2 CF 2 OCF} 2 CF 2 H) You may have. Note that the substituent represented by Rf ¹¹¹ is not limited to the substituent described here.

  Examples of the monomer represented by M1 include “Macromolecules”, Vol. 32 (21), p. 7122 (1999), a method in which a fluorine-containing alcohol is allowed to act on a leaving group-substituted alkyl vinyl ether such as vinyloxyalkyl sulfonate and vinyloxyalkyl chloride as described in JP-A-2-721. A method of exchanging vinyl groups by mixing a fluorine-containing alcohol and a vinyl ether such as butyl vinyl ether in the presence of a palladium catalyst as described in International Patent Application No. 92/05135; as described in US Pat. No. 3,420,793. , A method in which a fluorine-containing ketone and dibromoethane are reacted in the presence of a potassium fluoride catalyst, followed by a de-HBr reaction with an alkali catalyst;

  Although the preferable example of the structural component represented by M1 below is shown, it is not limited to these.

  The fluorine-containing polymer used in the present invention may be copolymerized with perfluorovinyl ether represented by the following M2 in order to reduce the refractive index. The copolymer component may be introduced into the polymer in the range of 0 to 40 mol%, preferably 0 to 30 mol%, more preferably 0 to 20 mol%.

In M2, Rf ¹¹² represents a fluorinated alkyl group having 1 to 30 carbon atoms, preferably a fluorinated alkyl group having 1 to 20 carbon atoms, particularly preferably 1 to 10 carbon atoms, and 1 to 10 carbon atoms. More preferably, it is a perfluoroalkyl group. The fluorinated alkyl group may have a substituent. Specific examples of Rf ¹¹² include -CF ₃ {M2- (1)}, -CF ₂ CF ₃ {M2- (2)}, -CF ₂ CF ₂ CF ₃ {M2- (3)}, -CF ₂ CF (OCF ₂ CF ₂ CF ₃ ) CF ₃ {M2- (4)} and the like.

(Hydroxyl group-containing vinyl monomer polymerization unit)
The fluorine-containing polymer used in the present invention contains hydroxyl group-containing vinyl monomer polymerized units, and the content thereof needs to be larger than 20 mol in the polymer. Since the hydroxyl group has a function of reacting with the crosslinking agent and curing, the higher the hydroxyl group content, the more preferable it is to form a hard film. The content is preferably more than 20 mol% and 70 mol% or less, More than 20 mol% and 60 mol% or less are more preferable, and 25 mol% or more and 55 mol% or less are still more preferable.

  As the hydroxyl group-containing vinyl monomer, any vinyl ethers, (meth) acrylates, styrenes and the like can be used as long as they are copolymerizable with the above-described fluorine-containing vinyl monomer polymerization unit. For example, when a perfluoroolefin (such as hexafluoropropylene) is used as the fluorine-containing vinyl monomer, it is preferable to use a hydroxyl group-containing vinyl ether having good copolymerization properties, specifically 2-hydroxyethyl vinyl ether, 4-hydroxybutyl. Examples thereof include, but are not limited to, vinyl ether, 6-hydroxyhexyl vinyl ether, 8-hydroxyoctyl vinyl ether, diethylene glycol vinyl ether, triethylene glycol vinyl ether, 4- (hydroxymethyl) cyclohexyl methyl vinyl ether, and the like.

(Constitutional unit having polysiloxane structure)
The fluorine-containing polymer used in the present invention preferably has a structural unit having a polysiloxane structure in order to impart antifouling properties. The fluorine-containing polymer having a polysiloxane structure useful in the present invention includes (a) a fluorine-containing vinyl monomer polymerization unit, (b) a hydroxyl group-containing vinyl monomer polymerization unit, and (c) a side chain represented by the following general formula 1. Examples thereof include fluorine-containing polymers each containing at least one kind of polymerized unit having a graft site containing a polysiloxane repeating unit, the main chain of which is composed of only carbon atoms.
General formula 1

In formula (I), R ¹ and R ² may be the same or different and each represents an alkyl group or an aryl group. As an alkyl group, C1-C4 is preferable and a methyl group, a trifluoromethyl group, an ethyl group etc. are mentioned as an example. The aryl group preferably has 6 to 20 carbon atoms, and examples thereof include a phenyl group and a naphthyl group. Among these, a methyl group and a phenyl group are preferable, and a methyl group is particularly preferable. p represents an integer of 10 to 500, preferably 10 to 350, and particularly preferably 10 to 250.

  As described in, for example, J. Appl. Polym. Sci. 78, 1955 (2000), JP-A-56-28219, etc., the polymer having a polysiloxane structure represented by the general formula 1 in the side chain is an epoxy. Reactive groups (for example, amino groups, mercapto groups, carboxyl groups, hydroxyl groups with respect to epoxy groups and acid anhydride groups) with respect to polymers having reactive groups such as groups, hydroxyl groups, carboxyls, and acid anhydride groups ) At one end of the polysiloxane (for example, Silaplane series (manufactured by Chisso Corporation)) by a polymer reaction, or a method of polymerizing a polysiloxane-containing silicon macromer. It can be preferably used. In the present invention, a method of introducing by polymerization of silicon macromer is more preferable.

  Any silicon macromer may be used as long as it has a polymerizable group capable of copolymerization with a fluorine-containing olefin, and preferably has a structure represented by any one of formulas 2 to 5.

In General Formulas 2 to 5, R ¹ , R ² and p represent the same meaning as in General Formula 1, and preferred ranges are also the same. R ^{3 to} R ⁵ each independently represents a substituted or unsubstituted monovalent organic group or a hydrogen atom, an alkyl group having 1 to 10 carbon atoms (for example, a methyl group, an ethyl group, an octyl group, etc.), a carbon number of 1 10 to 10 alkoxy groups (for example, methoxy group, ethoxy group, propyloxy group and the like), aryl groups having 6 to 20 carbon atoms (for example, phenyl group, naphthyl group and the like) are preferable, and alkyl groups having 1 to 5 carbon atoms are particularly preferable. . R ⁶ represents a hydrogen atom or a methyl group. L ₁ represents an arbitrary linking group having 1 to 20 carbon atoms, and examples thereof include a substituted or unsubstituted linear, branched or alicyclic alkylene group, or a substituted or unsubstituted arylene group. It is an unsubstituted linear alkylene group of 1 to 20, particularly preferably an ethylene group or a propylene group. These compounds are synthesized, for example, by the method described in JP-A-6-322053.

Any of the compounds represented by the general formulas 2 to 5 can be preferably used in the present invention. Among them, the structure represented by the general formula 2, 3 or 4 is particularly preferred from the viewpoint of copolymerization with the fluorinated olefin. Those are preferred. The polysiloxane moiety preferably occupies 0.01 to 20% by mass of the graft copolymer, more preferably 0.05 to 15% by mass, and particularly preferably 0.5 to 10% by mass. %.
The structural unit having a polysiloxane structure is preferably 0.01 mol% or more and 2 mol% or less, more preferably 0.01 mol% or more and 1 mol% or less, with respect to the molecular weight of the entire fluoropolymer in the present invention. It is more preferably 0.01 mol% or more and 2 mol% or less, and most preferably 0.05 mol% or more and 2 mol% or less.

  Although the preferable example of the polymer unit of the polymer graft part which contains a polysiloxane part in the side chain useful for this invention below is shown, this invention is not limited to these.

  By introducing the polysiloxane structure, the film is imparted with antifouling property and dustproof property, and the film surface is provided with slipperiness, which is advantageous for scratch resistance.

(Other polymer units)
The copolymer component that forms a polymer unit other than the above can be appropriately selected from various viewpoints such as hardness, adhesion to a substrate, solubility in a solvent, transparency, and the like. For example, methyl vinyl ether, ethyl vinyl ether Examples thereof include vinyl ethers such as t-butyl vinyl ether, n-butyl vinyl ether, cyclohexyl vinyl ether and isopropyl vinyl ether, and vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl cyclohexanecarboxylate. The introduction amount of these copolymerization components is in the range of 0 to 40 mol%, preferably in the range of 0 to 30 mol%, particularly preferably in the range of 0 to 20 mol%.

(Preferred form of fluoropolymer)
A particularly preferable form of the polymer in the present invention is a form represented by the general formula 7.
General formula 7:

In General Formula 7, Rf ¹¹ represents a perfluoroalkyl group having 1 to 5 carbon atoms. With respect to the monomer constituting the moiety represented by —CF ₂ CF (Rf ¹¹ ) —, the above description applies as an example of perfluoroolefin. In the general formula 7, Rf ¹² has the same definition as described in the fluorine-containing vinyl ether (Rf ¹¹² in the compound represented by the formula M2), and the preferred range is also the same. A ¹¹ and B ¹¹ each represent a hydroxyl group-containing vinyl monomer polymerization unit and an arbitrary constituent unit. A ¹¹ is the same as the definition of the hydroxyl group-containing vinyl monomer polymerization unit described above, and B ¹¹ is not particularly limited, but vinyl ethers and vinyl esters are more preferable from the viewpoint of copolymerization. Specific examples include the monomers exemplified in the above (other polymerization units) and the monomer represented by the formula M1.

Y ¹¹ represents a structural unit having a polysiloxane structure, and the form thereof may be a polymer unit having a graft site comprising a polysiloxane repeating unit represented by the general formula 1 in the side chain. Their definitions and preferred ranges are the same as those described above (constituent units having a polysiloxane structure).

  a to d each represent a mole fraction (%) of each component, and a + b + c + d = 100. 30 ≦ a ≦ 70 (more preferably 30 ≦ a ≦ 60, more preferably 35 ≦ a ≦ 60), 0 ≦ b ≦ 40 (more preferably 0 ≦ b ≦ 30, still more preferably 0 ≦ b ≦ 20). 20 ≦ c ≦ 70 (more preferably 20 <c ≦ 60, still more preferably 25 ≦ c ≦ 55) and 0 ≦ d ≦ 40 (more preferably 0 ≦ d ≦ 30).

  y represents the mass fraction (%) of the structural unit containing polysiloxane with respect to the molecular weight of the whole fluorine-containing polymer, and 0.01 ≦ y ≦ 20 (more preferably 0.05 ≦ y ≦ 15, still more preferably 0). .5 ≦ y ≦ 10).

  The number average molecular weight of the fluorine-containing polymer (preferably the fluorine-containing polymer represented by the general formula 7) used for forming the low refractive index layer in the present invention is preferably 5,000 to 1,000,000, more preferably. Is from 8,000 to 500,000, particularly preferably from 10,000 to 100,000.

  Here, the number average molecular weight is expressed in terms of polystyrene by GTH analyzer using TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (both trade names manufactured by Tosoh Corporation) by solvent THF and differential refractometer detection. Molecular weight.

One of the particularly preferred polymer forms in the present invention is a form represented by the following general formula 8.
General formula 8:

  In the general formula 8, a1, c1 and d1 each represent a mole fraction (%) of each component, and a1 + b1 + c1 = 100. 30 ≦ a1 ≦ 70 (more preferably 30 ≦ a1 ≦ 60, more preferably 35 ≦ a1 ≦ 60, most preferably 40 ≦ a1 ≦ 55), 20 ≦ c1 ≦ 50 (more preferably 20 <c1 ≦ 45, More preferably 25 ≦ c1 ≦ 40, most preferably 30 ≦ c1 ≦ 40), 0 ≦ d1 ≦ 30 (more preferably 5 ≦ d1 <30, still more preferably 10 ≦ d1 ≦ 25, most preferably 10 ≦ d1 ≦ 20). )

In Formula ^{8, Y 12} represents a structural unit having a polysiloxane structure represented by the general formula 2, a number average molecular weight is preferably from 1,000 to 40,000, more to be 3,000 to 20,000 Preferably, it is 5000-15000. Preferable specific examples of Y ¹² include S- (1), S- (2), S- (7), S- (37) or S- (38), and S- (1), S- (2), S- (37) and S- (38) are more preferable, and S- (2), S- (37) and S- (38) are more preferable.

  y1 represents the mass fraction (%) of the structural unit containing polysiloxane with respect to the molecular weight of the whole fluorine-containing polymer, and is 0.01 ≦ y1 ≦ 20 (more preferably 1 ≦ y1 ≦ 15, still more preferably 2 ≦ y1). ≦ 10 Most preferably 3 ≦ y1 ≦ 7) is satisfied.

  The number average molecular weight of the fluorine-containing polymer represented by the general formula 8 is preferably 5,000 to 500,000, more preferably 6,000 to 100,000, and particularly preferably 7,000 to 50,000. It is. The number average molecular weight is the same as the molecular weight expressed in terms of polystyrene as described above.

  Although the specific example of the fluorine-containing polymer in this invention is shown in Table 1 thru | or Table 5, this invention is not limited to these. Tables 1 to 5 show combinations of polymerized units in the fluoropolymer.

(Table 2)

With respect to the fluorine-containing polymer constituent components in the above tables, the molar ratio of each component is shown. The abbreviations are as follows.
HFP: hexafluoropropylene,
HEVE: 2-hydroxyethyl vinyl ether,
HBVE: 4-hydroxybutyl vinyl ether,
HOVE: 8-hydroxyoctyl vinyl ether,
DEGVE: Diethylene glycol vinyl ether,
HMcHVE: 4- (hydroxymethyl) cyclohexylmethyl vinyl ether,
EVE: ethyl vinyl ether,
cHVE: cyclohexyl vinyl ether,
tBuVE: t-butyl vinyl ether, VAc: vinyl acetate.

  The fluorine-containing polymer used in the present invention shown in the above Tables 1 to 5 includes a fluorine-containing polymer component (fluorine-containing vinyl monomer polymerized unit and hydroxyl group-containing vinyl monomer polymerized unit) and a silicone-containing component (polysiloxane). A structural unit having a structure. The component of the fluoropolymer is the mole fraction (%) of each component, and the silicone-containing component is the mass% of each component (represents the mass fraction (%) of the silicone-containing component relative to the total molecular weight of the fluorine-containing polymer). Each is shown. The structural unit (silicone-containing structural component) having a polysiloxane structure has a large molecular weight, and the mole fraction of the unit in the fluorine-containing polymer has a very small contribution of 2 mol% or less. Therefore, the molar fraction was calculated excluding the silicone-containing component.

  In the present invention, the fluorine-containing polymers represented by P1 to P59 are P2, P3, P10 to P12, P14, P17, P18, P20, P22 to P26, P29, P38, P39, P41, P42, P44, P45, P49 to P59 are preferable, P14, P17, P18, P20, P22 to P24, P38, P39, P41, P42, P44, P45, and P49 to P59 are more preferable, and P49 to P59 are more preferable.

  The fluorine-containing polymer used in the present invention can be synthesized by various polymerization methods such as solution polymerization, precipitation polymerization, suspension polymerization, precipitation polymerization, bulk polymerization, and emulsion polymerization. Moreover, it is compoundable by well-known operations, such as a batch type, a semi-continuous type, and a continuous type.

  The polymerization initiation method includes a method using a radical initiator, a method of irradiating light or radiation, and the like. These polymerization methods and polymerization initiation methods are, for example, the revised version of Tsuruta Junji “Polymer Synthesis Method” (published by Nikkan Kogyo Shimbun, 1971), Takatsu Otsu, Masato Kinoshita, “Experimental Methods for Polymer Synthesis” It is described in pp. 47-154 published in 1972.

  Among the above polymerization methods, a solution polymerization method using a radical initiator is particularly preferable. Solvents used in the solution polymerization method are, for example, ethyl acetate, butyl acetate, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, tetrahydrofuran, dioxane, N, N-dimethylformamide, N, N-dimethylacetamide, benzene, toluene, acetonitrile, A single organic solvent such as methylene chloride, chloroform, dichloroethane, methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, or a mixture of two or more thereof may be used, or a mixed solvent with water may be used.

  The polymerization temperature needs to be set in relation to the molecular weight of the polymer to be produced, the type of initiator, etc., and can be from 0 ° C. or lower to 100 ° C. or higher, but it is preferable to perform polymerization in the range of 40 to 100 ° C. .

  The reaction pressure can be appropriately selected, but is usually 0.01 to 10 MPa, preferably 0.05 to 5 MPa, more preferably about 0.1 to 2 MPa. The reaction time is about 5 to 30 hours.

  The obtained polymer can be used as it is for the application of the present invention, or can be purified by reprecipitation or liquid separation operation.

1- (4) Organosilane Compound [Constituent Component (D) of Low Refractive Index Layer of Film of the Present Invention]
In the low refractive index layer of the film of the present invention, an organosilane compound, a hydrolyzate of the organosilane compound and / or a partial condensate thereof (hereinafter, these reaction component solutions are also referred to as “sol components”). It is preferable to contain it from the point of abrasion resistance.
These compounds function as a binder by applying the curable composition and then condensing in a drying and heating process to form a cured product. Moreover, when it has a polyfunctional acrylate polymer, the binder which has a three-dimensional structure is formed by irradiation of actinic light.

The organosilane compound is preferably represented by the following general formula [A].
Formula [A]
^{_{(R 10) m -Si (X}} ) 4-m
In the general formula [A], R ¹⁰ represents a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group. Examples of the alkyl group include methyl, ethyl, propyl, isopropyl, hexyl, decyl, hexadecyl and the like. The alkyl group preferably has 1 to 30 carbon atoms, more preferably 1 to 16 carbon atoms, and particularly preferably 1 to 6 carbon atoms. Examples of the aryl group include phenyl and naphthyl, and a phenyl group is preferable.
X represents a hydroxyl group or a hydrolyzable group, for example, an alkoxy group (preferably an alkoxy group having 1 to 5 carbon atoms, such as a methoxy group or an ethoxy group), a halogen atom (for example, Cl, Br, I or the like). ) And R ² COO (R ² is preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, such as CH ₃ COO, C ₂ H ₅ COO, etc.), preferably An alkoxy group, particularly preferably a methoxy group or an ethoxy group.
m represents an integer of 1 to 3, preferably 1 or 2, and particularly preferably 1.

When R ¹⁰ or X there are a plurality, a plurality of R ¹⁰ or X groups may be different, even the same, respectively.
The substituent contained in R ¹⁰ is not particularly limited, but a halogen atom (fluorine, chlorine, bromine, etc.), a hydroxyl group, a mercapto group, a carboxyl group, an epoxy group, an alkyl group (methyl, ethyl, i-propyl, propyl, t-butyl etc.), aryl groups (phenyl, naphthyl etc.), aromatic heterocyclic groups (furyl, pyrazolyl, pyridyl etc.), alkoxy groups (methoxy, ethoxy, i-propoxy, hexyloxy etc.), aryloxy (phenoxy etc.) ), Alkylthio groups (methylthio, ethylthio, etc.), arylthio groups (phenylthio, etc.), alkenyl groups (vinyl, 1-propenyl, etc.), acyloxy groups (acetoxy, acryloyloxy, methacryloyloxy, etc.), alkoxycarbonyl groups (methoxycarbonyl, ethoxy) Carbonyl), arylo Xyloxycarbonyl groups (phenoxycarbonyl, etc.), carbamoyl groups (carbamoyl, N-methylcarbamoyl, N, N-dimethylcarbamoyl, N-methyl-N-octylcarbamoyl, etc.), acylamino groups (acetylamino, benzoylamino, acrylicamino, methacrylic) Amino) and the like, and these substituents may be further substituted.

When there are a plurality of R ^{10 s} , at least one of them is preferably a substituted alkyl group or a substituted aryl group.
Among the organosilane compounds represented by the general formula [A], an organosilane compound having a vinyl polymerizable substituent represented by the following general formula [B] is preferable.
General formula [B]

In the general formula [B], R ¹ represents a hydrogen atom, a methyl group, a methoxy group, an alkoxycarbonyl group, a cyano group, a fluorine atom, or a chlorine atom. Examples of the alkoxycarbonyl group include a methoxycarbonyl group and an ethoxycarbonyl group. A hydrogen atom, a methyl group, a methoxy group, a methoxycarbonyl group, a cyano group, a fluorine atom and a chlorine atom are preferred, a hydrogen atom, a methyl group, a methoxycarbonyl group, a fluorine atom and a chlorine atom are more preferred, and a hydrogen atom and a methyl group Is particularly preferred.
Y represents a single bond or * -COO-**, * -CONH-** or * -O-**, preferably a single bond, * -COO-** or * -CONH-**, * -COO-** is more preferable, and * -COO-** is particularly preferable. Here, * represents a position bonded to ═C (R ¹ ) —, and ** represents a position bonded to L.

  L represents a divalent linking chain. Specifically, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, a substituted or unsubstituted alkylene group having a linking group (for example, ether, ester, amide, etc.) inside, and a linking group inside. A substituted or unsubstituted arylene group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, an alkylene group having a linking group therein is preferred, an unsubstituted alkylene group, an unsubstituted arylene group Further, an alkylene group having an ether or ester linking group inside is more preferable, an unsubstituted alkylene group, and an alkylene group having an ether or ester linking group inside is particularly preferable. Examples of the substituent include a halogen, a hydroxyl group, a mercapto group, a carboxyl group, an epoxy group, an alkyl group, and an aryl group, and these substituents may be further substituted.

n represents 0 or 1. n is preferably 0.
R ¹⁰ has the same meaning as in formula [A], preferably a substituted or unsubstituted alkyl group or an unsubstituted aryl group, and more preferably an unsubstituted alkyl group or an unsubstituted aryl group.
X is synonymous with X in the general formula [A], preferably a halogen atom, a hydroxyl group or an unsubstituted alkoxy group, more preferably a chlorine atom, a hydroxyl group or an unsubstituted alkoxy group having 1 to 6 carbon atoms, a hydroxyl group or a carbon atom. A C 1-3 alkoxy group is more preferable, and a methoxy group is particularly preferable. When there are a plurality of Xs, the plurality of Xs may be the same or different.

  Two or more compounds of the general formula [A] and general formula [B] may be used in combination. When using together, it is preferable to use together the compound which has polymeric groups, such as a vinyl polymeric group, and the compound which does not have a polymeric group. Although the specific example of a compound represented by general formula [A] and general formula [B] is shown below, it is not limited.

  Of these, (M-1), (M-2), (M-5) and (M-11) are particularly preferred. When using together, it is preferable to use together the compound which has a vinyl polymerizable group like M-1, for example, and the compound which does not have a polymerizable group like M-11.

  The hydrolyzate and / or partial condensate of the organosilane compound is generally produced by treating the organosilane compound in the presence of a catalyst. Catalysts include inorganic acids such as hydrochloric acid, sulfuric acid and nitric acid; organic acids such as oxalic acid, acetic acid, formic acid, methanesulfonic acid and toluenesulfonic acid; inorganic bases such as sodium hydroxide, potassium hydroxide and ammonia; triethylamine, Examples thereof include organic bases such as pyridine; metal alkoxides such as triisopropoxyaluminum and tetrabutoxyzirconium; metal chelate compounds having a metal such as Zr, Ti or Al as a central metal. In the present invention, it is preferable to use a metal chelate compound, an acid catalyst of inorganic acids and organic acids. Inorganic acids are preferably hydrochloric acid and sulfuric acid, and organic acids are preferably those having an acid dissociation constant (pKa value (25 ° C.)) of 4.5 or less in water, and further, acid dissociation constants in hydrochloric acid, sulfuric acid and water. Is preferably an organic acid having an acid dissociation constant of 2.5 or less in hydrochloric acid, sulfuric acid or water, more preferably an organic acid having an acid dissociation constant of 2.5 or less in water. Specifically, methanesulfonic acid, oxalic acid, phthalic acid, and malonic acid are more preferable, and oxalic acid is particularly preferable.

As the metal chelate compound, (wherein, ^{R 3} represents an alkyl group having 1 to 10 carbon atoms) Formula ^R 3 OH alcohol and ^R 4 COCH ₂ COR ⁵ (formula represented by, ^{R 4} is the number of carbon atoms 1 to 10 alkyl groups, R ⁵ represents an alkyl group having 1 to 10 carbon atoms or a compound represented by an alkoxy group having 1 to 10 carbon atoms), and is selected from Zr, Ti, and Al. Any metal having a central metal as the metal can be used without any particular limitation. Within this category, two or more metal chelate compounds may be used in combination. The metal chelate compound used in the present invention has a general formula of Zr (OR ³ ) _p1 (R ⁴ COCHCOR ⁵ ) _p2 , Ti (OR ³ ) _q1 (R ⁴ COCHCOR ⁵ ) _q2 , and Al (OR ³ ) _r1 (R ⁴ Those selected from the group of compounds represented by COCHCOR ⁵ ) _r2 are preferred, and serve to promote the condensation reaction of the hydrolyzate and / or partial condensate of the organosilane compound.
R ³ and R ⁴ in the metal chelate compound may be the same or different and each is an alkyl group having 1 to 10 carbon atoms, specifically, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, sec -Butyl group, t-butyl group, n-pentyl group, phenyl group and the like. R ⁵ represents an alkyl group having 1 to 10 carbon atoms as described above, or an alkoxy group having 1 to 10 carbon atoms such as a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, and n-butoxy. Group, sec-butoxy group, t-butoxy group and the like. Moreover, p1, p2, q1, q2, r1, and r2 in the metal chelate compound represent integers determined so as to be p1 + p2 = 4, q1 + q2 = 4, and r1 + r2 = 3, respectively.

Specific examples of these metal chelate compounds include tri-n-butoxyethyl acetoacetate zirconium, di-n-butoxybis (ethylacetoacetate) zirconium, n-butoxytris (ethylacetoacetate) zirconium, tetrakis (n-propylacetate). Zirconium chelate compounds such as acetate) zirconium, tetrakis (acetylacetoacetate) zirconium, tetrakis (ethylacetoacetate) zirconium; diisopropoxy bis (ethylacetoacetate) titanium, diisopropoxy bis (acetylacetate) titanium, diiso Titanium chelate compounds such as propoxy bis (acetylacetone) titanium; diisopropoxyethyl acetoacetate aluminum, diisopropyl Poxyacetylacetonate aluminum, isopropoxybis (ethylacetoacetate) aluminum, isopropoxybis (acetylacetonate) aluminum, tris (ethylacetoacetate) aluminum, tris (acetylacetonato) aluminum, monoacetylacetonate bis (ethyl) An aluminum chelate compound such as acetoacetate) aluminum.
Among these metal chelate compounds, tri-n-butoxyethyl acetoacetate zirconium, diisopropoxybis (acetylacetonato) titanium, diisopropoxyethyl acetoacetate aluminum, and tris (ethyl acetoacetate) aluminum are preferable. These metal chelate compounds can be used individually by 1 type or in mixture of 2 or more types. Moreover, the partial hydrolyzate of these metal chelate compounds can also be used.

  In the present invention, it is preferable that a β-diketone compound and / or a β-ketoester compound is further added to the curable composition. This will be further described below.

The β-diketone compound and / or β-ketoester compound represented by the general formula R ⁴ COCH ₂ COR ⁵ is used in the present invention, and is used as a stability improver for the curable composition used in the present invention. It works. Here, R ⁴ represents an alkyl group having 1 to 10 carbon atoms, and R ⁵ represents an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. That is, by coordinating with a metal atom in the metal chelate compound (zirconium, titanium and / or aluminum compound), the condensation reaction of the hydrolyzate and / or partial condensate of the organosilane compound by these metal chelate compounds is performed. It is considered that the promoting action is suppressed and the storage stability of the resulting composition is improved. R ⁴ and R ⁵ constituting the β- diketone compound and / or β- ketoester compound are the same as R ⁴ and R ⁵ constituting the metal chelate compound.

  Specific examples of the β-diketone compound and / or β-ketoester compound include acetylacetone, methyl acetoacetate, ethyl acetoacetate, acetoacetate-n-propyl, acetoacetate-i-propyl, acetoacetate-n-butyl, acetoacetate. Acetic acid-sec-butyl, acetoacetic acid-t-butyl, 2,4-hexane-dione, 2,4-heptane-dione, 3,5-heptane-dione, 2,4-octane-dione, 2,4-nonane -Dione, 5-methyl-hexane-dione and the like can be mentioned. Of these, ethyl acetoacetate and acetylacetone are preferred, and acetylacetone is particularly preferred. These β-diketone compounds and / or β-ketoester compounds may be used alone or in combination of two or more. In the present invention, the β-diketone compound and / or β-ketoester compound is preferably used in an amount of 2 mol or more, more preferably 3 to 20 mol, per 1 mol of the metal chelate compound. If it is less than 2 mol, the storage stability of the resulting composition may be inferior, which is not preferable.

The amount of the organosilane compound or its hydrolyzate and / or its partial condensate is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, based on the total solid content of the low refractive index layer. Preferably, 1-20 mass% is the most preferable.
The organosilane compound may be added directly to the curable composition (coating liquid for antiglare layer, low refractive index layer, etc.), but the organosilane compound is treated in the presence of a catalyst in advance to prepare the organosilane compound. It is preferable to prepare a hydrolyzate and / or partial condensate of a silane compound and prepare the curable composition using the obtained reaction solution (sol solution). In the present invention, first, the organosilane compound A composition containing a hydrolyzate and / or a partial condensate and a metal chelate compound is prepared, and a liquid obtained by adding a β-diketone compound and / or a β-ketoester compound thereto is added to at least an antiglare layer or a low refractive index layer. It is preferable to coat it in a single layer coating solution.

A silicon-containing compound described in the following a, b, and c can be further added to the component (D).
a. Silicon alkoxide is a compound represented by RmSi (OR ′) n, wherein R and R ′ represent an alkyl group having 1 to 10 carbon atoms, and m and n are integers such that m + n = 4, respectively. For example, tetramethoxysilane, tetraethoxysilane, tetra-iso-propoxysilane, tetra-n-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-tert-butoxysilane, tetrapentaethoxysilane, Tetrapenta-iso-propoxysilane, tetrapenta-n-proxysilane, tetrapenta-n-butoxysilane, tetrapenta-sec-butoxysilane, tetrapenta-tert-butoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, Methyl tributoxy silane, dimethyl dimethoxy silane, dimethyl diethoxy silane, dimethyl ethoxy silane, dimethyl methoxy silane, dimethyl propoxy silane, dimethyl butyl Kishishiran, methyldimethoxysilane, methyldiethoxysilane, hexyl trimethoxysilane.

b. Silane coupling agents For example, γ- (2-aminoethyl) aminopropyltrimethoxysilane, γ- (2-aminoethyl) aminopropylmethyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ Aminopropyltriethoxysilane, γ-methacryloxypropyltrimethoxysilane, N-β- (N-vinylbenzylaminoethyl) -γ-aminopropylmethoxysilane hydrochloride, γ-glycidoxypropyltrimethoxysilane, aminosilane , Methyltrimethoxysilane, vinyltriacetoxysilane, γ-mercaptopropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, hexamethyldisilazane, vinyltris (β-methoxyethoxy) silane, octadecyldimethyl [3- (to Trimethoxysilyl) propyl] ammonium chloride, methyl trichlorosilane, dimethyl dichlorosilane, and the like.

c. Ionizing radiation curable silicon compound A plurality of groups that undergo reactive crosslinking by ionizing radiation, for example, an organosilicon compound having a polymerizable double bond group and having a molecular weight of 5,000 or less. Such reactive organosilicon compounds may be one end vinyl functional polysilane, both end vinyl functional polysilane, one end vinyl functional polysiloxane, both end vinyl functional polysiloxane, or a vinyl functionality obtained by reacting these compounds. Examples include polysilane, vinyl functional polysiloxane, and the like.

  Examples of other compounds include (meth) acryloxysilane compounds such as 3- (meth) acryloxypropyltrimethoxysilane and 3- (meth) acryloxypropylmethyldimethoxysilane.

  For example, the following reactive organosilicon compound described in JP-A-2003-39586 can be used in combination with the binder. The reactive organosilicon compound is used in the range of 10 to 100% by mass with respect to the total of the ionizing radiation curable resin and the reactive organosilicon compound. In particular, when the ionizing radiation curable organosilicon compound (c) is used, it is possible to form a conductive layer using only this as a resin component.

1- (5) Initiator Polymerization of monomers having various ethylenically unsaturated groups can be performed by irradiation with ionizing radiation or heating in the presence of a photo radical initiator or a thermal radical initiator.
In preparing the film of the present invention, a photoinitiator or a thermal initiator can be used in combination.

<Photoinitiator>
Examples of photo radical polymerization initiators include acetophenones, benzoins, benzophenones, phosphine oxides, ketals, anthraquinones, thioxanthones, azo compounds, peroxides (JP-A No. 2001-139663, etc.), 2, 3 -Dialkyldione compounds, disulfide compounds, fluoroamine compounds, aromatic sulfoniums, lophine dimers, onium salts, borate salts, active esters, active halogens, inorganic complexes, coumarins and the like.
Examples of acetophenones include 2,2-dimethoxyacetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, 1-hydroxy-dimethylphenylketone, 1-hydroxy-dimethyl-p-isopropylphenylketone, 1-hydroxy Cyclohexyl phenyl ketone, 2-methyl-4-methylthio-2-morpholinopropiophenone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, 4-phenoxydichloroacetophenone, 4-t- Butyl-dichloroacetophenone is included.

  Examples of benzoins include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzyl dimethyl ketal, benzoin benzene sulfonate, benzoin toluene sulfonate, benzoin methyl ether, benzoin ethyl ether and benzoin isopropyl ether It is. Examples of benzophenones include benzophenone, hydroxybenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 2,4-dichlorobenzophenone, 4,4-dichlorobenzophenone and p-chlorobenzophenone, 4,4'-dimethylaminobenzophenone (Michler ketone), 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone and the like are included.

  Examples of the borate salt are described in Japanese Patent Nos. 2764769 and 2002-116539, and Kunz, Martin “Rad Tech'98. Proceeding April 19-22, 1998, Chicago”. And the organic borate compounds described. For example, the compounds described in JP-A-2002-116539, paragraph numbers [0022] to [0027] can be mentioned. Examples of other organic boron compounds include JP-A-6-348011, JP-A-7-128785, JP-A-7-140589, JP-A-7-306527, and JP-A-7-292014. Specific examples include organoboron transition metal coordination complexes and the like, and specific examples include ion complexes with cationic dyes.

Examples of phosphine oxides include 2,4,6-trimethylbenzoyldiphenylphosphine oxide.
Examples of the active esters include 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], sulfonic acid esters, cyclic active ester compounds, and the like.
Specifically, Examples 1 to 21 described in JP-A 2000-80068 are particularly preferable.
Examples of the onium salts include aromatic diazonium salts, aromatic iodonium salts, and aromatic sulfonium salts.

Specific examples of the active halogens include Wakabayashi et al., “Bull Chem. Soc Japan” 42, 2924 (1969), US Pat. No. 3,905,815, and JP-A-5-27830. , M.M. P. Examples include the compounds described in Hutt “Journal of Heterocyclic Chemistry”, Vol. 1 (No. 3), (1970), etc., and in particular, oxazole compounds substituted with a trihalomethyl group: s-triazine compounds. More preferred are s-triazine derivatives in which at least one mono-, di- or trihalogen-substituted methyl group is bonded to the s-triazine ring. Specific examples include S-triazine and oxathiazole compounds, such as 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl). -4,6-bis (trichloromethyl) -s-triazine, 2- (p-styrylphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3-Br-4-di (ethyl) Acetate) amino) phenyl) -4,6-bis (trichloromethyl) -s-triazine, 2-trihalomethyl-5- (p-methoxyphenyl) -1,3,4-oxadiazole. Specifically, p.14 to p30 in JP-A-58-15503, p6-p10 in JP-A-55-77742, and p287 in JP-B-60-27673. 1-No. 8, No. pp. 443 to p444 of JP-A-60-239736. 1-No. 17, No. 4,701,399. Compounds such as 1-19 are particularly preferred. Examples of inorganic complexes include bis (η ⁵ -2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium.
Examples of coumarins include 3-ketocoumarin.

These initiators may be used alone or in combination.
“Latest UV Curing Technology”, Technical Information Association, 1991, p. 159, and “UV curing system” written by Kayo Kiyomi, 1989, General Technology Center, p. Various examples are also described in 65-148 and are useful in the present invention.

  Commercially available radical photopolymerization initiators include KAYACURE (DETX-S, BP-100, BDKM, CTX, BMS, 2-EAQ, ABQ, CPTX, EPD, ITX, QTX, BTC, manufactured by Nippon Kayaku Co., Ltd. MCA, etc.), Irgacure (651, 184, 500, 819, 907, 369, 1173, 1870, 2959, 4265, 4263, etc.) manufactured by Ciba Specialty Chemicals Co., Ltd., Esacure (KIP100F, KB1, manufactured by Sartomer) EB3, BP, X33, KT046, KT37, KIP150, TZT) and the like and combinations thereof are preferred examples.

  It is preferable to use a photoinitiator in the range of 0.1-15 mass parts with respect to 100 mass parts of polyfunctional monomers, More preferably, it is the range of 1-10 mass parts. In particular, by adding a photopolymerization initiator to the low refractive index layer of the present invention in the range of 0.1 to 5 parts by mass per solid content of the low refractive index layer, the low refractive index layer itself is cured and bonded to the interface. Is strengthened, and the scratch resistance can be improved.

<Photosensitizer>
In addition to the photopolymerization initiator, a photosensitizer may be used. Specific examples of the photosensitizer include n-butylamine, triethylamine, tri-n-butylphosphine, Michler's ketone and thioxanthone.
Further, one or more auxiliary agents such as an azide compound, a thiourea compound, and a mercapto compound may be used in combination.
Examples of commercially available photosensitizers include KAYACURE (DMBI, EPA) manufactured by Nippon Kayaku Co., Ltd.

<Thermal initiator>
As the thermal radical initiator, organic or inorganic peroxides, organic azo, diazo compounds, and the like can be used.
Specifically, benzoyl peroxide, halogen benzoyl peroxide, lauroyl peroxide, acetyl peroxide, dibutyl peroxide, cumene hydroperoxide, butyl hydroperoxide as organic peroxides, hydrogen peroxide, peroxides as inorganic peroxides. Diazo compounds such as 2,2′-azobis (isobutyronitrile), 2,2′-azobis (propionitrile), 1,1′-azobis (cyclohexanecarbonitrile) as azo compounds such as ammonium sulfate and potassium persulfate And diazoaminobenzene, p-nitrobenzenediazonium and the like.

1- (6) Crosslinkable Compound [Constituent Component (B) of Low Refractive Index Layer of the Present Invention]

[Curing agent]
The low refractive index layer in the present invention uses a curable composition containing a fluorine-containing polymer containing a hydroxyl group and a compound (curing agent) capable of reacting with the hydroxyl group in the fluorine-containing polymer, a so-called curable resin composition. Preferably it is formed. The curing agent preferably has two or more sites that react with a hydroxyl group, and more preferably has four or more sites.

  The structure of the curing agent is not particularly limited as long as it has the above number of functional groups capable of reacting with hydroxyl groups. For example, polyisocyanates, partial condensates of isocyanate compounds, multimers, polyhydric alcohols, low molecular weight polyester films And the like, block polyisocyanate compounds in which isocyanate groups are blocked with a blocking agent such as phenol, aminoplasts, polybasic acids or anhydrides thereof.

  Among them, in the present invention, aminoplasts that undergo a crosslinking reaction with a hydroxyl group-containing compound under acidic conditions are preferable from the viewpoints of both the stability during storage and the activity of the crosslinking reaction, and the strength of the formed film. Aminoplasts contain an amino group capable of reacting with a hydroxyl group present in the fluorine-containing polymer, that is, a hydroxyalkylamino group or an alkoxyalkylamino group, or a carbon atom adjacent to a nitrogen atom and substituted with an alkoxy group. A compound. Specific examples include melamine compounds, urea compounds, benzoguanamine compounds, and the like.

  The melamine compounds are generally known as compounds having a skeleton in which a nitrogen atom is bonded to a triazine ring, and specific examples include melamine, alkylated melamine, methylol melamine, and alkoxylated methyl melamine. . In particular, methylolated melamine and alkoxylated methyl melamine obtained by reacting melamine and formaldehyde under basic conditions and derivatives thereof are preferable, and alkoxylated methyl melamine is particularly preferable in view of storage stability. There are no particular restrictions on methylolated melamine and alkoxylated methylmelamine. For example, use of various resins obtained by the method described in “Plastic Materials Course [8] Urea Melamine Resin” (Nikkan Kogyo Shimbun) Is also possible.

  As the urea compound, in addition to urea, an alkoxylated methylurea which is a polymethylolated urea derivative thereof, and a compound having a glycoluril skeleton or a 2-imidazolidinone skeleton having a cyclic urea structure are also preferable. As for the amino compounds such as the urea derivatives, various resins described in the above-mentioned “Yurea / Melamine resin” can be used.

  As the compound suitably used as the crosslinking agent in the present invention, a melamine compound or a glycoluril compound is particularly preferable from the viewpoint of compatibility with the fluorine-containing copolymer, and among these, from the viewpoint of reactivity, the crosslinking agent is in the molecule. The compound preferably contains a nitrogen atom and contains two or more carbon atoms substituted with an alkoxy group adjacent to the nitrogen atom. Particularly preferred compounds are compounds having structures represented by the following H-1 and H-2, and partial condensates thereof. In the formula, R represents an alkyl group having 1 to 6 carbon atoms or a hydroxyl group.

  As addition amount of aminoplast with respect to a fluorine-containing polymer, it is 1-50 mass parts per 100 mass parts of copolymers, Preferably it is 3-40 mass parts, More preferably, it is 5-30 mass parts. If it is 1 part by mass or more, the durability as a thin film that is a feature of the present invention can be sufficiently exhibited, and if it is 50 parts by mass or less, the low refractive index layer in the present invention when used for optical applications. This is preferable because the low refractive index, which is a characteristic of the above, can be maintained. From the viewpoint of keeping the refractive index low even when a curing agent is added, a curing agent that has a small increase in refractive index even when added is preferable, and from this viewpoint, the above compound has a skeleton represented by H-2. Compounds are more preferred.

1- (7) Curing Catalyst The film of the present invention cures the film by a crosslinking reaction between the hydroxyl group of the fluoropolymer and the curing agent while heating. In this system, since curing is accelerated by acid, it is desirable to add an acidic substance to the curable resin composition. However, when a normal acid is added, the crosslinking reaction proceeds in the coating solution, and failure (unevenness, Cause repellency. Therefore, in order to achieve both storage stability and curing activity in a thermosetting system, it is more preferable to add a compound that generates an acid by heating as a curing catalyst.

  The curing catalyst is preferably a salt composed of an acid and an organic base. Examples of the acid include organic acids such as sulfonic acid, phosphonic acid, and carboxylic acid, and inorganic acids such as sulfuric acid and phosphoric acid. From the viewpoint of compatibility with the polymer, organic acids are more preferable, and sulfonic acid and phosphonic acid are more preferable. Sulphonic acid is most preferred. Preferred sulfonic acids include p-toluenesulfonic acid (PTS), benzenesulfonic acid (BS), p-dodecylbenzenesulfonic acid (DBS), p-chlorobenzenesulfonic acid (CBS), 1,4-naphthalenedisulfonic acid (NDS). ), Methanesulfonic acid (MsOH), nonafluorobutane-1-sulfonic acid (NFBS), etc., and any of them can be preferably used (the abbreviations in parentheses).

  The curing catalyst varies greatly depending on the basicity and boiling point of the organic base combined with the acid. The curing catalyst preferably used in the present invention is described below from each viewpoint.

  First, the basicity of the organic base will be described. The lower the basicity of the organic base, the higher the acid generation efficiency during heating, which is preferable from the viewpoint of curing activity. However, if the basicity is too low, the storage stability becomes insufficient. Therefore, it is preferable to use an organic base having an appropriate basicity. When expressed using pKa of a conjugate acid as a basic index, the pKa of the organic base used in the present invention needs to be 5.0 to 10.5, and more preferably 6.0 to 10.0. 6.5 to 10.0 is more preferable. The value of pKa of organic base in aqueous solution is described in Chemical Handbook Fundamentals (5th revised edition, edited by The Chemical Society of Japan, Maruzen, 2004) Volume II, pages II-334 to 340. An organic base having an appropriate pKa can be selected. Further, a compound having an appropriate pKa in terms of structure can be preferably used even if not described in this document. Table 6 shows compounds having appropriate pKa described in the literature, but compounds that can be preferably used in the present invention are not limited thereto.

    Next, the boiling point of the organic base will be described. The lower the boiling point of the organic base, the higher the acid generation efficiency during heating, which is preferable from the viewpoint of curing activity. Therefore, it is preferable to use an organic base having an appropriate boiling point. The boiling point of the base is preferably 120 ° C. or lower.

Examples of the organic base that can be preferably used in the present invention include, but are not limited to, the following compounds. Figures in parentheses indicate boiling points.
b-3: pyridine (115 ° C), b-14: 4-methylmorpholine (115 ° C), b-20: diallylmethylamine (111 ° C), b-19: triethylamine (88.8 ° C), b-21 : T-butylmethylamine (67-69 ° C), b-22: dimethylisopropylamine (66 ° C), b-23: diethylmethylamine (63-65 ° C), b-24: dimethylethylamine (36-38 ° C) ), B-18: trimethylamine (3-5 ° C.).
The boiling point of the organic base used in the present invention is particularly preferably 35 ° C. or higher and 85 ° C. or lower. By using an organic base in this range, the curing activity, scratch resistance, and coating solution stability can be kept good. The boiling point is more preferably 45 ° C. or higher and 80 ° C. or lower, and most preferably 55 ° C. or higher and 75 ° C. or lower.

  When used as the acid catalyst of the present invention, a salt composed of the acid and the organic base may be isolated and used, or the acid and the organic base may be mixed to form a salt in the solution, and the solution may be used. . Further, only one kind of acid or organic base may be used, or a plurality of kinds may be mixed and used. When the acid and the organic base are mixed and used, it is preferable that the equivalent ratio of the acid and the organic base is 1: 0.9 to 1.5, preferably 1: 0.95 to 1.3. Is more preferable, and 1: 1.0 to 1.1 is preferable.

  The use ratio of the acid catalyst is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 5 parts by mass, and still more preferably 100 parts by mass of the fluoropolymer in the curable resin composition. 0.2 to 3 parts by mass.

<Photosensitive acid generator, photoacid generator>
In the present invention, in addition to the thermal acid generator described above, a compound that generates an acid upon irradiation with light, that is, a photosensitive acid generator may be further added. The photoacid generator that can be used in the present invention is described in detail below.

  Examples of the acid generator include a photoinitiator for photocationic polymerization, a photodecolorant for dyes, a photochromic agent, a known acid generator used in a microresist, and the like, a known compound, and a mixture thereof. Is mentioned. The photosensitive acid generator is a substance that imparts photosensitivity to the coating film of the curable resin composition and enables the coating film to be photocured by, for example, irradiation with radiation such as light. Examples of the photosensitive acid generator include (1) various onium salts such as iodonium salt, sulfonium salt, phosphonium salt, diazonium salt, ammonium salt, iminium salt, arsonium salt, selenonium salt, pyridinium salt; (2) β Sulfone compounds such as ketoesters and β-sulfonylsulfones and their α-diazo compounds; (3) sulfonic acid esters such as alkylsulfonic acid esters, haloalkylsulfonic acid esters, arylsulfonic acid esters and iminosulfonates; and (4) sulfones. Imide compounds; (5) Diazomethane compounds; and the like, and can be used as appropriate. Of these, diazonium salts, iodonium salts, sulfonium salts, and iminium salts are preferable from the viewpoint of photosensitivity at the start of photopolymerization, material stability of the compound, and the like. Examples thereof include compounds described in paragraph numbers [0058] to [0059] of JP-A-2002-29162.

  The photosensitive acid generator can be used alone or in combination of two or more, and can also be used in combination with the thermal acid generator. The use ratio of the photosensitive acid generator is preferably 0 to 20 parts by mass, more preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the fluoropolymer in the curable resin composition. If the ratio of the photosensitive acid generator is less than or equal to the upper limit, it is preferable because the resulting cured film has excellent strength and good transparency.

The photosensitive acid generator can be used in layers other than the above-described low refractive index layer, for example, a hard coat layer, and the use ratio thereof is preferably 0.01 to 10 parts with respect to 100 parts by mass of the curable resin composition. Part by mass, more preferably 0.1 to 5 parts by mass.
In addition, as specific compounds and usage, for example, the contents described in JP-A-2005-43876 can be used.

1- (8) Translucent Particles Various translucent particles are used for imparting antiglare properties (surface scattering properties) and internal scattering properties to the film of the present invention, particularly the antiglare layer and the hard coat layer. I can do it.

The translucent particles may be organic particles or inorganic particles. As the particle size is not varied, the scattering characteristics are less varied, and the design of the haze value is facilitated. As the translucent particles, plastic beads are preferable, and those having particularly high transparency and a difference in refractive index with the binder are preferable.
As organic particles, polymethyl methacrylate particles (refractive index 1.49), crosslinked poly (acryl-styrene) copolymer particles (refractive index 1.54), melamine resin particles (refractive index 1.57), polycarbonate particles ( Refractive index 1.57), polystyrene particles (refractive index 1.60), crosslinked polystyrene particles (refractive index 1.61), polyvinyl chloride particles (refractive index 1.60), benzoguanamine-melamine formaldehyde particles (refractive index 1. 68) etc. are used.
Examples of the inorganic particles include silica particles (refractive index: 1.44), alumina particles (refractive index: 1.63), zirconia particles, titania particles, and inorganic particles having hollows and pores.

Of these, cross-linked polystyrene particles, cross-linked poly ((meth) acrylate) particles, and cross-linked poly (acryl-styrene) particles are preferably used, and a binder is selected according to the refractive index of each light-transmitting particle selected from these particles. By adjusting the refractive index, the internal haze, surface haze, and centerline average roughness of the present invention can be achieved.
Furthermore, a binder (a refractive index after curing is 1.50 to 1.53) mainly composed of a tri- or higher functional (meth) acrylate monomer and a crosslinked poly (meth) acrylate weight having an acrylic content of 50 to 100 weight percent. It is preferable to use a combination of translucent particles composed of a combination, and in particular, a combination of a binder and translucent particles composed of a crosslinked poly (styrene-acrylic) copolymer (with a refractive index of 1.48 to 1.54). preferable.

The refractive index of the binder (translucent resin) and translucent particles in the present invention is preferably 1.45 to 1.70, more preferably 1.48 to 1.65. In order to make the refractive index within the above range, the type and amount ratio of the binder and translucent particles may be appropriately selected. How to select can be easily known experimentally in advance.
In the present invention, the difference in refractive index between the binder and the translucent particles (the refractive index of the translucent particles−the refractive index of the binder) is preferably 0.001 to 0.030 as an absolute value, More preferably, it is 0.001-0.020, More preferably, it is 0.001-0.015. If this difference exceeds 0.030, problems such as film character blur, a decrease in dark room contrast, and surface turbidity occur.

  Here, the refractive index of the binder can be quantitatively evaluated by directly measuring it with an Abbe refractometer or by measuring a spectral reflection spectrum or a spectral ellipsometry. The refractive index of the translucent particles is measured by measuring the turbidity by dispersing an equal amount of the translucent particles in the solvent in which the refractive index is changed by changing the mixing ratio of two types of solvents having different refractive indexes. It is measured by measuring the refractive index of the solvent when the turbidity is minimized with an Abbe refractometer.

  In the case of the above translucent particles, the translucent particles easily settle in the binder, and therefore an inorganic filler such as silica may be added to prevent sedimentation. As the amount of the inorganic filler added increases, it is more effective in preventing the translucent particles from settling, but adversely affects the transparency of the coating film. Therefore, preferably, an inorganic filler having a particle size of 0.5 μm or less is contained in an amount of less than 0.1% by mass so as not to impair the transparency of the coating film with respect to the binder.

  The average particle size of the translucent particles is preferably 0.5 to 10 μm, more preferably 2.0 to 6.0 μm. If the average particle size is less than 0.5 μm, the light scattering angle distribution spreads to a wide angle, which may cause blurring of characters on the display. On the other hand, if it exceeds 10 μm, it is necessary to increase the thickness of the layer to be added, which causes problems such as curling and cost increase.

  Moreover, you may use together and use 2 or more types of translucent particle | grains from which a particle diameter differs. It is possible to impart an antiglare property with a light-transmitting particle having a larger particle diameter, and to reduce the surface roughness with a light-transmitting particle having a smaller particle diameter.

  The said translucent particle | grain is mix | blended so that 3-30 mass% may be contained in the addition layer total solid. More preferably, it is 5-20 mass%. If it is less than 3% by mass, the effect of addition is insufficient, and if it exceeds 30% by mass, problems such as image blur, surface turbidity and glare occur.

Moreover, the density of the translucent particles is preferably 10 to 1000 mg / m ² , more preferably 100 to 700 mg / m ² .

<Translucent particle preparation, classification method>

  Examples of the method for producing translucent particles according to the present invention include suspension polymerization, emulsion polymerization, soap-free emulsion polymerization, dispersion polymerization, seed polymerization, and the like. Good. These production methods are described in, for example, “Experimental Methods for Polymer Synthesis” (Takayuki Otsu and Masami Kinoshita, Kagaku Dojinsha), pages 130 and 146 to 147, “Synthetic Polymers” Vol. 1, 246 to 290. And the methods described in pages 3, 3 and 1 to 108, and the like, and patents 2543503, 3508304, 2746275, 3521560, 3580320 And the methods described in JP-A-10-1561, JP-A-7-2908, JP-A-5-297506, JP-A-2002-145919, and the like.

The particle size distribution of the translucent particles is preferably monodisperse particles in terms of haze value and diffusibility control, and uniformity of the coated surface. For example, when particles having a particle size of 20% or more than the average particle size are defined as coarse particles, the proportion of coarse particles is preferably 1% or less, more preferably 0.1% or less of the total number of particles. Yes, more preferably 0.01% or less. Particles having such a particle size distribution are also effective means of classification after preparation or synthesis reaction, and particles having a desired distribution can be obtained by increasing the number of classifications or increasing the degree of classification. .
It is preferable to use a method such as an air classification method, a centrifugal classification method, a sedimentation classification method, a filtration classification method, or an electrostatic classification method for classification.

1- (9) Inorganic particles Various inorganic particles can be used in the present invention in order to improve physical properties such as hardness, optical properties such as reflectance, and scattering properties.
Examples of the inorganic particles include oxides of at least one metal selected from silicon, zirconium, titanium, aluminum, indium, zinc, tin, and antimony. Inorganic particles shown as component E are also included. Specific examples include ZrO ₂ , TiO ₂ , Al ₂ O ₃ , In ₂ O ₃ , ZnO, SnO ₂ , Sb ₂ O ₃ , ITO, and the like. In addition, BaSO ₄ , CaCO ₃ , talc and kaolin are included.

  The particle diameter of the inorganic particles used in the present invention is preferably as fine as possible in the dispersion medium, and the weight average diameter is 1 to 200 nm. Preferably it is 5-150 nm, More preferably, it is 10-100 nm, Most preferably, it is 10-80 nm. A film that does not impair the transparency can be formed by refining the inorganic particles to 100 nm or less. The particle diameter of the inorganic particles can be measured by a light scattering method or an electron micrograph.

The specific surface area of the inorganic particles is preferably from 10 to 400 m ² / g, more preferably from 20 to 200 m ² / g, and most preferably from 30 to 150 m ² / g.

The inorganic particles used in the present invention are preferably added to a coating solution for a layer used as a dispersion in a dispersion medium.
As the dispersion medium for the inorganic particles, a liquid having a boiling point of 60 to 170 ° C. is preferably used. Examples of dispersion media include water, alcohol (eg, methanol, ethanol, isopropanol, butanol, benzyl alcohol), ketone (eg, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone), ester (eg, methyl acetate, ethyl acetate, Propyl acetate, butyl acetate, methyl formate, ethyl formate, propyl formate, butyl formate), aliphatic hydrocarbons (eg, hexane, cyclohexane), halogenated hydrocarbons (eg, methylene chloride, chloroform, carbon tetrachloride), aromatic Hydrocarbon (eg, benzene, toluene, xylene), amide (eg, dimethylformamide, dimethylacetamide, n-methylpyrrolidone), ether (eg, diethyl ether, dioxane, tetrahydrofuran), ether alcohol (eg, 1-methyl) Carboxymethyl-2-propanol) are included. Toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and butanol are particularly preferred.
Particularly preferred dispersion media are methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone.

  The inorganic particles are dispersed using a disperser. Examples of dispersers include sand grinder mills (eg, pinned bead mills), high speed impeller mills, pebble mills, roller mills, attritors and colloid mills. A sand grinder mill and a high-speed impeller mill are particularly preferred. Further, preliminary dispersion processing may be performed. Examples of the disperser used for the preliminary dispersion treatment include a ball mill, a three-roll mill, a kneader, and an extruder.

<High refractive index particles>
For the purpose of increasing the refractive index of the layer constituting the present invention, a cured product of a composition in which inorganic particles having a high refractive index are dispersed in a monomer, an initiator, and an organically substituted silicon compound is preferably used.
As the inorganic particles in this case, ZrO ₂ and TiO _{2 are} particularly preferably used from the viewpoint of refractive index. ZrO ₂ is most preferable for increasing the refractive index of the hard coat layer, and TiO ₂ fine particles are most preferable as the particles for the high refractive index layer and the medium refractive index layer.

As the TiO ₂ particles, inorganic particles mainly containing TiO ₂ containing at least one element selected from cobalt, aluminum, and zirconium are particularly preferable. The main component means a component having the largest content (mass%) among the components constituting the particles.
The particles mainly composed of TiO ₂ in the present invention preferably have a refractive index of 1.90 to 2.80, more preferably 2.10 to 2.80, and 2.20 to 2.80. Most preferably.
The weight average diameter of primary particles of TiO ₂ as a main component is preferably 1 to 200 nm, more preferably 1 to 150 nm, still more preferably 1 to 100 nm, and particularly preferably 1 to 80 nm.

The crystal structure of the particles containing TiO ₂ as a main component is preferably a rutile, rutile / anatase mixed crystal, anatase, or amorphous structure, and particularly preferably a rutile structure. The main component means a component having the largest content (mass%) among the components constituting the particles.

By containing at least one element selected from Co (cobalt), Al (aluminum), and Zr (zirconium) in particles containing TiO ₂ as a main component, the photocatalytic activity of TiO ₂ can be suppressed. The weather resistance of the inventive film can be improved.
A particularly preferable element is Co (cobalt). It is also preferable to use two or more types in combination.
The inorganic particles mainly composed of TiO ₂ of the present invention may have a core / shell structure by surface treatment as described in JP-A No. 2001-166104.

  The addition amount of the monomer and inorganic particles in the layer is preferably 10 to 90% by mass, more preferably 20 to 80% by mass, based on the total mass of the binder. Two or more kinds of inorganic particles may be used in the layer.

<Low Refractive Index Particle> [Constituent Component (E) of Low Refractive Index Layer of the Present Invention]
The inorganic particles to be contained in the low refractive index layer desirably have a low refractive index, and examples thereof include fine particles of magnesium fluoride and silica. In particular, silica fine particles are preferable in terms of refractive index, dispersion stability, and cost.
The average particle diameter of the silica fine particles is preferably 30% to 150% of the thickness of the low refractive index layer, more preferably 35% to 80%, and still more preferably 40% to 60%. That is, when the thickness of the low refractive index layer is 100 nm, the particle diameter of the silica fine particles is preferably 30 nm to 150 nm, more preferably 35 nm to 80 nm, and still more preferably 40 nm to 60 nm.

  If the particle size of the silica fine particles is too small, the effect of improving the scratch resistance is reduced. If it is too large, fine irregularities are formed on the surface of the low refractive index layer, and the appearance such as black tightening and the integrated reflectance are deteriorated. The silica fine particles may be either crystalline or amorphous, and may be monodispersed particles or aggregated particles as long as a predetermined particle size is satisfied. The shape is most preferably a spherical diameter, but there is no problem even if the shape is indefinite.

In addition, at least one kind of silica fine particles having an average particle size of less than 25% of the thickness of the low refractive index layer (referred to as “silica fine particles with small size particle size”) is used as silica fine particles with the above particle size (“large size particles” It is preferably used in combination with “silica fine particles having a diameter”.
Since the fine silica particles having a small size can be present in the gaps between the fine silica particles having a large size, the fine particles can contribute as a retaining agent for the fine silica particles having a large size.
When the low refractive index layer is 100 nm, the average particle size of the silica fine particles having a small size is preferably from 1 nm to 20 nm, more preferably from 5 nm to 15 nm, and particularly preferably from 10 nm to 15 nm. Use of such silica fine particles is preferable in terms of raw material costs and a retaining agent effect.

The coating amount of the low refractive index particles is ^{preferably 1mg / m 2 ~100mg / m 2} , more preferably ^{5mg / m 2 ~80mg / m 2} , more preferably from ^{10mg / m 2 ~60mg / m 2} . If the amount is too small, the effect of improving the scratch resistance is reduced. If the amount is too large, fine irregularities are formed on the surface of the low refractive index layer, and the appearance such as black tightening and the integrated reflectance are deteriorated.

<Hollow silica particles>
For the purpose of further reducing the refractive index, it is preferable to use hollow silica fine particles.

The hollow silica fine particles preferably have a refractive index of 1.15 to 1.40, more preferably 1.17 to 1.35, and most preferably 1.17 to 1.30. The refractive index here represents the refractive index of the entire particle, and does not represent the refractive index of only the outer shell silica forming the hollow silica particles. At this time, when the radius of the cavity in the particle is a and the radius of the particle outer shell is b, the following formula (VIII)
(Formula VIII)
x = (4πa3 / 3) / (4πb3 / 3) × 100
Is preferably 10 to 60%, more preferably 20 to 60%, and most preferably 30 to 60%. If the hollow silica particles are made to have a lower refractive index and a higher porosity, the thickness of the outer shell becomes thinner and the strength of the particles becomes weaker. From the viewpoint of scratch resistance, the low refractive index is less than 1.15. Rate particles are not preferred.

  A method for producing hollow silica is described in, for example, Japanese Patent Application Laid-Open Nos. 2001-233611 and 2002-79616. In particular, particles having cavities inside the shell and having fine pores in the shell are particularly preferred. The refractive index of these hollow silica particles can be calculated by the method described in JP-A-2002-79616.

The coating amount of the hollow silica is ^preferably from ^{1mg / m 2 ~100mg / m 2} , more preferably ^{5mg / m 2 ~80mg / m 2} , more preferably from ^{10mg / m 2 ~60mg / m 2} . If the amount is too small, the effect of reducing the refractive index and the effect of improving the scratch resistance are reduced. If the amount is too large, fine irregularities are formed on the surface of the low refractive index layer, and the appearance such as black tightening and the integrated reflectance are deteriorated.
The average particle diameter of the hollow silica is preferably 30% to 150% of the thickness of the low refractive index layer, more preferably 35% to 80%, and still more preferably 40% to 60%. That is, if the thickness of the low refractive index layer is 100 nm, the particle size of the hollow silica is preferably 30 nm to 150 nm, more preferably 35 nm to 100 nm, and still more preferably 40 nm to 65 nm.
If the particle size of the silica particles is too small, the proportion of cavities will decrease and a decrease in refractive index cannot be expected.If it is too large, fine irregularities will be formed on the surface of the low refractive index layer, and the appearance such as black tightening and integrated reflectance will be reduced. Getting worse. The silica fine particles may be either crystalline or amorphous, and monodisperse particles are preferred. The shape is most preferably a spherical diameter, but there is no problem even if the shape is indefinite.
Further, two or more kinds of hollow silica having different particle average particle sizes can be used in combination. Here, the average particle diameter of the hollow silica can be determined from an electron micrograph.
The specific surface area of the hollow silica in the present invention is preferably from 20 to 300 m ² / g, more preferably 30~120m ² / g, most preferably 40~90m ² / g. The surface area can be determined by the BET method using nitrogen.

  In the present invention, silica particles having no voids can be used in combination with hollow silica. The preferred particle size of silica without voids is 30 nm to 150 nm, more preferably 35 nm to 100 nm, and most preferably 40 nm to 80 nm.

1- (10) Conductive Particles Various conductive particles can be used for imparting conductivity to the film of the present invention.
The conductive particles are preferably formed from a metal oxide or nitride. Examples of metal oxides or nitrides include tin oxide, indium oxide, zinc oxide and titanium nitride. Tin oxide and indium oxide are particularly preferred. The conductive inorganic particles are mainly composed of oxides or nitrides of these metals, and can further contain other elements. The main component means a component having the largest content (mass%) among the components constituting the particles. Examples of other elements include Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, S, B, Nb, In, V and halogen atoms are included. In order to increase the conductivity of tin oxide and indium oxide, it is preferable to add Sb, P, B, Nb, In, V and a halogen atom. Particularly preferred are tin oxide containing Sb (ATO) and indium oxide containing Sn (ITO). The ratio of Sb in ATO is preferably 3 to 20% by mass. The ratio of Sn in ITO is preferably 5 to 20% by mass.

The average particle diameter of the primary particles of the conductive inorganic particles used for the antistatic layer is preferably 1 to 150 nm, more preferably 5 to 100 nm, and most preferably 5 to 70 nm. The average particle diameter of the conductive inorganic particles in the antistatic layer to be formed is 1 to 200 nm, preferably 5 to 150 nm, more preferably 10 to 100 nm, and more preferably 10 to 80 nm. Most preferred. The average particle diameter of the conductive inorganic particles is an average diameter weighted by the mass of the particles and can be measured by a light scattering method or an electron micrograph.
The specific surface area of the conductive inorganic particles is preferably from 10 to 400 m ² / g, more preferably from 20 to 200 m ² / g, and most preferably from 30 to 150 m ² / g.

  The conductive inorganic particles may be surface treated. The surface treatment is performed using an inorganic compound or an organic compound. Examples of inorganic compounds used for the surface treatment include alumina and silica. Silica treatment is particularly preferred. Examples of organic compounds used for the surface treatment include polyols, alkanolamines, stearic acid, silane coupling agents, and titanate coupling agents. Silane coupling agents are most preferred. Two or more kinds of surface treatments may be performed in combination. The shape of the conductive inorganic particles is preferably a rice grain shape, a spherical shape, a cubic shape, a spindle shape or an indefinite shape.

Two or more kinds of conductive particles may be used in a specific layer or as a film.
The proportion of the conductive inorganic particles in the antistatic layer is preferably 20 to 90% by mass, preferably 25 to 85% by mass, and more preferably 30 to 80% by mass.

  The conductive inorganic particles can be used for forming an antistatic layer in a dispersion state.

1- (11) Surface Treatment Agent Inorganic particles used in the present invention are plasma in order to stabilize dispersion in a dispersion or coating solution, or to increase affinity and binding properties with a binder component. A physical surface treatment such as a discharge treatment or a corona discharge treatment, or a chemical surface treatment with a surfactant or a coupling agent may be performed.

The surface treatment can be performed using a surface treatment agent of an inorganic compound or an organic compound. Examples of inorganic compounds used for the surface treatment include inorganic compounds containing cobalt (CoO ₂ , Co ₂ O ₃ , Co ₃ O _4, etc.) and inorganic compounds containing aluminum (Al ₂ O ₃ , Al (OH) ₃ Etc.), zirconium-containing inorganic compounds (such as ZrO ₂ and Zr (OH) ₄ ), silicon-containing inorganic compounds (such as SiO ₂ ), and iron-containing inorganic compounds (such as Fe ₂ O ₃ ). .
An inorganic compound containing cobalt, an inorganic compound containing aluminum, and an inorganic compound containing zirconium are particularly preferable, and an inorganic compound containing cobalt, Al (OH) ₃ , and Zr (OH) ₄ are most preferable.
Examples of organic compounds used for the surface treatment include polyols, alkanolamines, stearic acid, silane coupling agents, and titanate coupling agents. Silane coupling agents are most preferred. In particular, the surface treatment is preferably performed with at least one of a silane coupling agent (organosilane compound), a partial hydrolyzate thereof, and a condensate thereof.

Examples of titanate coupling agents include metal alkoxides such as tetramethoxy titanium, tetraethoxy titanium, and throat tetraisopropoxy titanium, and preneact (KR-TTS, KR-46B, KR-55, KR-41B, etc .; Ajinomoto Co., Inc. ))).
Examples of the organic compound used for the surface treatment include polyols, alkanolamines, and other organic compounds having an anionic group, and particularly preferable are organic compounds having a carboxyl group, a sulfonic acid group, or a phosphoric acid group. is there. Stearic acid, lauric acid, oleic acid, linoleic acid, linolenic acid and the like can be preferably used.
The organic compound used for the surface treatment preferably further has a crosslinked or polymerizable functional group. Crosslinkable or polymerizable functional groups include ethylenically unsaturated groups (for example, (meth) acrylic groups, allyl groups, styryl groups, vinyloxy groups, etc.) that can undergo addition reactions and polymerization reactions with radical species, cationic polymerizable groups (Epoxy groups, oxatanyl groups, vinyloxy groups, etc.), polycondensation reactive groups (hydrolyzable silyl groups, etc., N-methylol groups) and the like can be mentioned, and groups having an ethylenically unsaturated group are preferred.

  Two or more kinds of these surface treatments can be used in combination, and it is particularly preferable to use an inorganic compound containing aluminum and an inorganic compound containing zirconium.

When the inorganic particles are silica, the use of a coupling agent is particularly preferred. As the coupling agent, an alkoxy metal compound (eg, titanium coupling agent, silane coupling agent) is preferably used. Of these, silane coupling treatment is particularly effective. The above-mentioned coupling agent is used as a surface treatment agent for the inorganic filler of the low refractive index layer in advance for surface treatment prior to the preparation of the layer coating solution. It is preferable to make it contain in a layer.
The silica fine particles are preferably dispersed in the medium in advance before the surface treatment in order to reduce the load of the surface treatment.
Specific examples of the surface treatment agent and the surface treatment catalyst that can be preferably used in the present invention include organosilane compounds and catalysts described in WO 2004/017105.

1- (12) Dispersant Various dispersants can be used for dispersing the particles used in the present invention.
The dispersant preferably further contains a crosslinkable or polymerizable functional group. Crosslinkable or polymerizable functional groups include ethylenically unsaturated groups (for example, (meth) acryloyl groups, allyl groups, styryl groups, vinyloxy groups, etc.) that can undergo addition reactions and polymerization reactions with radical species, and cationic polymerizable groups (epoxies). Groups, oxatanyl groups, vinyloxy groups, etc.), polycondensation reactive groups (hydrolyzable silyl groups, etc., N-methylol groups) and the like, and functional groups having an ethylenically unsaturated group are preferred.

It is preferable to use a dispersant having an anionic group for the dispersion of inorganic particles, particularly the dispersion of inorganic particles mainly composed of TiO ₂ , more preferably an anionic group and a cross-linkable or polymerizable functional group, It is particularly preferable that the dispersant has the cross-linked or polymerizable functional group in the side chain.

  As the anionic group, a group having an acidic proton such as a carboxyl group, a sulfonic acid group (sulfo), a phosphoric acid group (phosphono), a sulfonamide group, or a salt thereof is effective, and in particular, a carboxyl group, a sulfonic acid group, A phosphoric acid group or a salt thereof is preferable, and a carboxyl group and a phosphoric acid group are particularly preferable. The number of anionic groups contained in the dispersing agent per molecule may be plural, but is preferably 2 or more on average, more preferably 5 or more, Particularly preferred is 10 or more. Moreover, the anionic group contained in a dispersing agent may contain multiple types in 1 molecule.

In the dispersant having an anionic group in the side chain, the composition of the anionic group-containing repeating unit is in the range of 10 ^{−4 to} 100 mol%, preferably 1 to 50 mol%, particularly preferably 5 in the total repeating units. ˜20 mol%.

  The dispersant preferably further contains a crosslinkable or polymerizable functional group. Crosslinkable or polymerizable functional groups include ethylenically unsaturated groups (for example, (meth) acryloyl groups, allyl groups, styryl groups, vinyloxy groups, etc.) that can undergo addition reactions and polymerization reactions with radical species, and cationic polymerizable groups (epoxies). Groups, oxatanyl groups, vinyloxy groups, etc.), polycondensation reactive groups (hydrolyzable silyl groups, etc., N-methylol groups) and the like, and functional groups having an ethylenically unsaturated group are preferred.

  The average number of cross-linkable or polymerizable functional groups contained in the dispersant per molecule is preferably 2 or more, more preferably 5 or more, and particularly preferably 10 or more. Moreover, the crosslinking or polymerizable functional group contained in the dispersant may contain a plurality of types in one molecule.

In the preferred dispersant for use in the present invention, examples of the repeating unit having an ethylenically unsaturated group in the side chain include poly-1,2-butadiene and poly-1,2-isoprene structures or (meth) acrylic acid. An ester or amide repeating unit to which a specific residue (the R group of —COOR or —CONHR) is bonded can be used. Examples of the specific residue (R _{^{group), - (CH 2) n}} -CR 21 = CR 22 R 23, - (CH 2 O) n-CH 2 CR 21 = CR 22 R 23, - (CH ^{_{2 CH 2 O) n-CH}} 2 CR 21 = CR 22 R 23, - (CH 2) n-NH-CO-O-CH 2 CR 21 = CR 22 R 23, - (CH 2) n-O-CO —CR ²¹ ═CR ²² R ²³ and — (CH ₂ CH ₂ O) ₂ —X (R ^{21 to} R ²³ are each a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group, or an alkoxy group. R ²¹ and R ²² or R ²³ may be bonded to each other to form a ring, n is an integer of 1 to 10, and X is a dicyclopentadienyl residue. There are). Specific examples of R of the ester residue include —CH ₂ CH═CH ₂ (corresponding to an allyl (meth) acrylate polymer described in JP-A No. 64-17047), —CH ₂ CH ₂ O—CH ₂ CH. _{= CH 2, -CH 2 CH 2} OCOCH = CH 2, -CH 2 CH 2 OCOC (CH 3) = CH 2, -CH 2 C (CH 3) = CH 2, -CH 2 CH = CH-C 6 H ₅ , —CH ₂ CH ₂ OCOCH═CH—C ₆ H ₅ , —CH ₂ CH ₂ —NHCOO—CH ₂ CH═CH ₂ and —CH ₂ CH ₂ O—X (X is a dicyclopentadienyl residue) Is included. Specific examples of R of the amide residue include —CH ₂ CH═CH ₂ , —CH ₂ CH ₂ —Y (Y is a 1-cyclohexenyl residue) and —CH ₂ CH ₂ —OCO—CH═CH ₂ , _{-CH 2 CH 2 -OCO-C (} CH 3) = CH 2 are included.

  In the dispersant having an ethylenically unsaturated group, a free radical (a polymerization initiation radical or a growth radical of a polymerization process of a polymerizable compound) is added to the unsaturated bond group, and the polymer compound is directly or between molecules. Addition polymerization is carried out through the polymerization chain, and a crosslink is formed between the molecules to cure. Alternatively, atoms in the molecule (for example, hydrogen atoms on carbon atoms adjacent to the unsaturated bond group) are extracted by free radicals to form polymer radicals that are bonded together to form a bridge between the molecules. Harden.

  The weight average molecular weight (Mw) of the dispersant having an anionic group and a crosslinkable or polymerizable functional group and having the crosslinkable or polymerizable functional group in the side chain is not particularly limited, but is preferably 1000 or more. . The more preferred weight average molecular weight (Mw) of the dispersant is 2,000 to 1,000,000, more preferably 5,000 to 200,000, and particularly preferably 10,000 to 100,000.

  The cross-linkable or polymerizable functional group-containing unit may constitute all repeating units other than the anionic group-containing repeating unit, preferably 5 to 50 mol% of the total cross-linking or repeating unit, particularly Preferably it is 5-30 mol%.

  The dispersant may be a copolymer with an appropriate monomer other than a monomer having a crosslinking or polymerizable functional group or an anionic group. Although it does not specifically limit regarding a copolymerization component, It selects from various viewpoints, such as dispersion stability, compatibility with another monomer component, and the intensity | strength of a formed film. Preferable examples include methyl (meth) acrylate, n-butyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, styrene and the like.

  The form of the dispersant is not particularly limited, but is preferably a block copolymer or a random copolymer, and particularly preferably a random copolymer from the viewpoint of cost and ease of synthesis.

  The amount of the dispersant used relative to the inorganic particles is preferably in the range of 1 to 50% by mass, more preferably in the range of 5 to 30% by mass, and most preferably 5 to 20% by mass. Two or more dispersants may be used in combination.

1- (13) Antifouling agent For the purpose of imparting antifouling properties, water resistance, chemical resistance, slipping properties and the like to the film of the present invention, particularly the uppermost layer of the film, known polysiloxane type or fluorine type It is preferable to add an antifouling agent, a slip agent and the like as appropriate.
When these additives are added, it is preferably added in the range of 0.01 to 20% by mass of the total solid content of the low refractive index layer, more preferably in the range of 0.05 to 10% by mass. Particularly preferred is 0.1 to 5% by mass.

[Compound having a polysiloxane structure] [Component (F) of the low refractive index layer of the film of the present invention]
Next, the compound having a polysiloxane structure will be described.
In the present invention, a compound having a polysiloxane structure is used for the purpose of improving scratch resistance by imparting slipperiness and imparting antifouling property. There is no restriction | limiting in particular in the structure of a compound, What has a substituent in the terminal and / or side chain of a compound chain | strand which contains multiple dimethylsilyloxy units as a repeating unit is mentioned. The compound chain containing dimethylsilyloxy as a repeating unit may contain a structural unit other than dimethylsilyloxy.

  Although there is no restriction | limiting in particular in the molecular weight of the compound which has a polysiloxane structure, It is preferable that it is 100,000 or less, It is especially preferable that it is 50,000 or less, It is most preferable that it is 3000-30000.

  From the viewpoint of preventing transcription, it preferably contains a hydroxyl group or a functional group that reacts with the hydroxyl group to form a bond. This bond formation reaction preferably proceeds rapidly under heating conditions and / or in the presence of a catalyst. Examples of such a substituent include an epoxy group and a carboxyl group. Although the following are mentioned as an example of a preferable compound, It is not limited to these.

(Including hydroxyl group)
“X-22-160AS”, “KF-6001”, “KF-6002”, “KF-6003”, “X-22-170DX”, “X-22-176DX”, “X-22-176D”, “X-22-176F” {manufactured by Shin-Etsu Chemical Co., Ltd.}; “FM-4411”, “FM-4421”, “FM-4425”, “FM-0411”, “FM-0421”, “ "FM-0425", "FM-DA11", "FM-DA21", "FM-DA25" {above, manufactured by Chisso Corporation}; "CMS-626", "CMS-222" {above, manufactured by Gelest} .

(Containing functional groups that react with hydroxyl groups)
"X-22-162C", "KF-105" {manufactured by Shin-Etsu Chemical Co., Ltd.}; "FM-5511", "FM-5521", "FM-5525", "FM-6611", " FM-6621 "," FM-6625 "{above, manufactured by Chisso Corporation}.

  In addition to the polysiloxane compound, another polysiloxane compound may be used in combination. Preferable examples include those having a substituent at the terminal and / or side chain of a compound chain containing a plurality of dimethylsilyloxy units as repeating units. The compound chain containing dimethylsilyloxy as a repeating unit may contain a structural unit other than dimethylsilyloxy. The substituents may be the same or different, and a plurality of substituents are preferable. Examples of preferred substituents include groups containing acryloyl group, methacryloyl group, vinyl group, aryl group, cinnamoyl group, oxetanyl group, fluoroalkyl group, polyoxyalkylene group, carboxyl group, amino group and the like. Although there is no restriction | limiting in particular in molecular weight, It is preferable that it is 100,000 or less, It is more preferable that it is 50,000 or less, It is especially preferable that it is 3000-30000, It is most preferable that it is 10,000-20000. Although there is no restriction | limiting in particular in silicone atom content of a silicone type compound, it is preferable that it is 18.0 mass% or more, it is especially preferable that it is 25.0-37.0 mass%, and 30.0-37.0. Most preferably, it is mass%. Examples of preferred silicone compounds are X-22-174DX, X-22-2426, X-22-164B, X22-164C, X-22-1821 (above trade names) and Chisso (manufactured by Shin-Etsu Chemical Co., Ltd.). Co., Ltd., FM-0725, FM-7725, FM6621, FM-1121 and Gelest DMS-U22, RMS-033, RMS-083, UMS-182, DMS-H21, DMS-H31, HMS-301, FMS121, Examples thereof include, but are not limited to, FMS123, FMS131, FMS141, and FMS221 (hereinafter, trade names).

As the fluorine compound used as an antifouling agent, a compound having a fluoroalkyl group is preferred. The fluoroalkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, and a straight chain (for example, —CF ₂ CF ₃ , —CH ₂ (CF ₂ ) ₄ H, —CH ₂ (CF ₂ ) 8CF ₃ , —CH ₂ CH ₂ (CF ₂ ) ₄ H, etc.), even branched structures (eg, CH (CF ₃ ) ₂ , CH ₂ CF (CF ₃ ) ₂ , CH (CH ₃ ) CF ₂ CF ₃ , CH (CH ₃ ) (CF ₂ ) ₅ CF ₂ H, etc.), but alicyclic structures (preferably 5-membered or 6-membered rings such as perfluorocyclohexyl group and perfluorocyclopentyl group) Or an alkyl group substituted with these, and may have an ether bond (for example, CH ₂ OCH ₂ CF ₂ CF ₃ , CH ₂ CH ₂ OCH ₂ C ₄ F ₈ H, CH ₂ CH ₂ O _{CH 2 CH 2 C 8 F 17} , CH 2 CH 2 OCF 2 CF 2 OCF 2 CF 2 H , etc.). A plurality of the fluoroalkyl groups may be contained in the same molecule.

  It is preferable that the fluorine-based compound further has a substituent that contributes to bond formation or compatibility with the low refractive index layer film. The substituents may be the same or different, and a plurality of substituents are preferable. Examples of preferred substituents include acryloyl group, methacryloyl group, vinyl group, aryl group, cinnamoyl group, epoxy group, oxetanyl group, hydroxyl group, polyoxyalkylene group, carboxyl group, amino group and the like. The fluorine-based compound may be a polymer or an oligomer with a compound not containing a fluorine atom, and the molecular weight is not particularly limited. Although there is no restriction | limiting in particular in fluorine atom content of a fluorine-type compound, It is preferable that it is 20 mass% or more, It is especially preferable that it is 30-70 mass%, It is most preferable that it is 40-70 mass%. Examples of preferred fluorine-based compounds include Daikin Chemical Industries, Ltd., R-2020, M-2020, R-3833, M-3833 (named above), Dainippon Ink Co., Ltd., Megafac F-171. , F-172, F-179A, and defender MCF-300 (named above), but are not limited thereto.

  For the purpose of imparting properties such as dust resistance and antistatic properties, a known cationic surfactant or a dustproof agent such as a polyoxyalkylene compound, an antistatic agent, or the like can be appropriately added. These dustproofing agent and antistatic agent may contain the structural unit as a part of the function in the above-mentioned silicone compound or fluorine compound. When these are added as additives, it is preferably added in the range of 0.01 to 20% by mass of the total solid content of the low refractive index layer, more preferably in the range of 0.05 to 10% by mass. Particularly preferred is 0.1 to 5% by mass. Examples of preferred compounds include, but are not limited to, Dainippon Ink Co., Ltd., MegaFace F-150 (trade name), Toray Dow Corning Co., Ltd., SH-3748 (trade name), and the like. Do not mean.

1- (14) Surfactant For the film of the present invention, in order to ensure surface uniformity such as coating unevenness, drying unevenness, point defect, etc., any one of fluorine-based and silicone-based surfactants, or Both of them are preferably contained in the coating composition for forming the light diffusion layer. In particular, a fluorine-based surfactant can be preferably used because an effect of improving surface defects such as coating unevenness, drying unevenness, and point defects appears at a smaller addition amount. Productivity can be improved by giving high-speed coating suitability while improving surface uniformity.

  Preferable examples of the fluorosurfactant include a fluoroaliphatic group-containing copolymer (sometimes abbreviated as “fluorine polymer”), and the fluoropolymer includes the following monomer (i): An acrylic resin, a methacrylic resin, and a vinyl monomer copolymerizable with the acrylic resin, the methacrylic resin characterized by containing a corresponding repeating unit, or a repeating unit corresponding to the monomer (ii) below: Copolymers are useful.

(I) Fluoroaliphatic group-containing monomer represented by the following general formula A

In the general formula A, R ¹¹ represents a hydrogen atom or a methyl group, X represents an oxygen atom, a sulfur atom or —N (R ¹² ) —, m is an integer of 1 to 6 and n is an integer of 2 to 4. To express. R ¹² represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, specifically a methyl group, an ethyl group, a propyl group, or a butyl group, preferably a hydrogen atom or a methyl group. X is preferably an oxygen atom.

(Ii) a monomer represented by the following general formula (b) that can be copolymerized with the monomer (i)

In the general formula (b), R ¹³ represents a hydrogen atom or a methyl group, Y represents an oxygen atom, a sulfur atom or —N (R ¹⁵ ) —, R ¹⁵ represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, specifically Specifically, it represents a methyl group, an ethyl group, a propyl group, or a butyl group, preferably a hydrogen atom or a methyl group. Y is an oxygen atom, -N (H) -, and -N (CH ₃₎ - are preferred.
R ¹⁴ represents a linear, branched or cyclic alkyl group having 4 to 20 carbon atoms which may have a substituent. Examples of the substituent for the alkyl group represented by R ¹⁴ include a hydroxyl group, an alkylcarbonyl group, an arylcarbonyl group, a carboxyl group, an alkyl ether group, an aryl ether group, a halogen atom such as a fluorine atom, a chlorine atom, and a bromine atom, a nitro group, and a cyano group. , Amino groups and the like, but not limited thereto. Examples of the linear, branched or cyclic alkyl group having 4 to 20 carbon atoms include a butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group and undecyl group which may be linear or branched. , Dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, octadecyl group, eicosanyl group, etc., and monocyclic cycloalkyl groups such as cyclohexyl group, cycloheptyl group and bicycloheptyl group, bicyclodecyl group, tricycloundecyl group, A polycyclic cycloalkyl group such as a tetracyclododecyl group, an adamantyl group, a norbornyl group, a tetracyclodecyl group, or the like is preferably used.

  The amount of the fluoroaliphatic group-containing monomer represented by the general formula (a) used in the fluoropolymer used in the present invention is 10 mol% or more based on each monomer of the fluoropolymer, preferably Is 15 to 70 mol%, more preferably in the range of 20 to 60 mol%.

The preferred weight average molecular weight of the fluoropolymer used in the present invention is preferably 3000 to 100,000, more preferably 5,000 to 80,000.
Furthermore, the preferable addition amount of the fluoropolymer used in the present invention is in the range of 0.001 to 5% by mass, preferably in the range of 0.005 to 3% by mass, and more preferably, with respect to the coating solution. It is the range of 0.01-1 mass%. If the addition amount of the fluorine-based polymer is less than 0.001% by mass, the effect is insufficient, and if it exceeds 5% by mass, the coating film may not be sufficiently dried or the performance as a coating film (for example, reflectance) Adversely affect the scratch resistance).

1- (15) Thickener The film of the present invention may use a thickener to adjust the viscosity of the coating solution.
In particular, it is preferable to add a thickener to the hard coat layer containing scattering particles. By increasing the viscosity, it is possible to reduce the speed of floating and settling of the scattering particles. The term “thickener” as used herein means that the viscosity of the liquid is increased by adding it, and preferably 0.05 to 50 cP (mPa · m) as the magnitude of increase in the viscosity of the coating liquid when added. s), more preferably 0.10 to 20 cP (mPa · s), and most preferably 0.10 to 10 cP (mPa · s).

Examples of such thickeners include, but are not limited to:
Poly-ε-caprolactone poly-ε-caprolactone diol poly-ε-caprolactone triol polyvinyl acetate poly (ethylene adipate)
Poly (1,4-butylene adipate)
Poly (1,4-butylene glutarate)
Poly (1,4-butylene succinate)
Poly (1,4-butylene terephthalate)
polyethylene terephthalate)
Poly (2-methyl-1,3-propylene adipate)
Poly (2-methyl-1,3-propylene glutarate)
Poly (neopentyl glycol adipate)
Poly (neopentyl glycol sebacate)
Poly (1,3-propylene adipate)
Poly (1,3-propylene glutarate)
Polyvinyl butyral polyvinyl formal polyvinyl acetal polyvinyl propanal polyvinyl hexanal polyvinyl pyrrolidone polyacrylic ester polymethacrylic acid ester cellulose acetate cellulose propionate cellulose acetate butyrate

  In addition, smectite, fluorine tetrasilicon mica, bentonite, silica, montmorillonite and sodium polyacrylate described in JP-A-8-325491, ethylcellulose, polyacrylic acid, organic clay described in JP-A-10-219136, Known viscosity modifiers and thixotropic agents can be used.

1- (16) Coating solvent As a solvent used in the coating composition for forming each layer of the present invention, each component can be dissolved or dispersed, and a uniform surface is likely to be formed in the coating process and the drying process. Various solvents selected from the viewpoints of ensuring liquid storage stability and having an appropriate saturated vapor pressure can be used.
Two or more kinds of solvents can be mixed and used. In particular, from the viewpoint of drying load, it is preferable that a solvent having a boiling point of 100 ° C. or lower at normal pressure and room temperature as a main component and a small amount of solvent having a boiling point of 100 ° C. or higher for adjusting the drying speed.

  Examples of the solvent having a boiling point of 100 ° C. or lower include hydrocarbons such as hexane (boiling point 68.7 ° C.), heptane (98.4 ° C.), cyclohexane (80.7 ° C.), benzene (80.1 ° C.), Halogenated carbonization such as dichloromethane (39.8 ° C), chloroform (61.2 ° C), carbon tetrachloride (76.8 ° C), 1,2-dichloroethane (83.5 ° C), trichloroethylene (87.2 ° C) Hydrogens, diethyl ether (34.6 ° C), diisopropyl ether (68.5 ° C), dipropyl ether (90.5 ° C), ethers such as tetrahydrofuran (66 ° C), ethyl formate (54.2 ° C), Esters such as methyl acetate (57.8 ° C.), ethyl acetate (77.1 ° C.), isopropyl acetate (89 ° C.), acetone (56.1 ° C.), 2-butanone (methyl ether) Ketones such as Luketone, 79.6 ° C, methanol (64.5 ° C), ethanol (78.3 ° C), 2-propanol (82.4 ° C), 1-propanol (97.2 ° C), etc. Alcohols, cyano compounds such as acetonitrile (81.6 ° C.), propionitrile (97.4 ° C.), carbon disulfide (46.2 ° C.), and the like. Of these, ketones and esters are preferable, and ketones are particularly preferable. Among the ketones, 2-butanone is particularly preferable.

  Examples of the solvent having a boiling point of 100 ° C or higher include, for example, octane (125.7 ° C), toluene (110.6 ° C), xylene (138 ° C), tetrachloroethylene (121.2 ° C), chlorobenzene (131.7 ° C), Dioxane (101.3 ° C.), dibutyl ether (142.4 ° C.), isobutyl acetate (118 ° C.), cyclohexanone (155.7 ° C.), 2-methyl-4-pentanone (same as MIBK, 115.9 ° C.), Examples thereof include 1-butanol (117.7 ° C.), N, N-dimethylformamide (153 ° C.), N, N-dimethylacetamide (166 ° C.), dimethyl sulfoxide (189 ° C.) and the like. Cyclohexanone and 2-methyl-4-pentanone are preferable.

1- (17) Others In addition to the above-described components, the film of the present invention includes a resin, a coupling agent, a coloring inhibitor, a coloring agent (pigment, dye), an antifoaming agent, a leveling agent, a flame retardant, and an ultraviolet absorber. , Infrared absorbers, adhesion-imparting agents, polymerization inhibitors, antioxidants, surface modifiers, and the like can also be added.

1- (18) Support The support of the film of the present invention is not particularly limited, such as a transparent resin film, a transparent resin plate, a transparent resin sheet, and transparent glass. Transparent resin films include cellulose acylate films (for example, cellulose triacetate film (refractive index 1.48), cellulose diacetate film, cellulose acetate butyrate film, cellulose acetate propionate film), polyethylene terephthalate film, polyethersulfone. Films, polyacrylic resin films, polyurethane resin films, polyester films, polycarbonate films, polysulfone films, polyether films, polymethylpentene films, polyetherketone films, (meth) acrylonitrile films, and the like can be used.

<Cellulose acylate film>
Among them, a cellulose acylate film having high transparency, optically low birefringence, easy production, and generally used as a protective film for a polarizing plate is preferable, and a cellulose triacetate film is particularly preferable. The thickness of the transparent support is usually about 25 μm to 1000 μm.

In the present invention, it is preferable to use cellulose acetate having an acetylation degree of 59.0 to 61.5% for the cellulose acylate film.
The degree of acetylation means the amount of bound acetic acid per unit mass of cellulose. The degree of acetylation follows the measurement and calculation of the degree of acetylation in ASTM: D-817-91 (test method for cellulose acetate and the like).
The viscosity average degree of polymerization (DP) of cellulose acylate is preferably 250 or more, and more preferably 290 or more.
The cellulose acylate used in the present invention has a Mw / Mn (Mw is a mass average molecular weight, Mn is a number average molecular weight) value by gel permeation chromatography close to 1.0, in other words, a molecular weight distribution. Narrow is preferred. The specific value of Mw / Mn is preferably 1.0 to 1.7, more preferably 1.3 to 1.65, and most preferably 1.4 to 1.6. preferable.

In general, the 2, 3, and 6 hydroxyl groups of cellulose acylate are not evenly distributed by 1/3 of the total substitution degree, and the substitution degree of the 6-position hydroxyl group tends to be small. In the present invention, it is preferable that the substitution degree of the 6-position hydroxyl group of cellulose acylate is larger than that of the 2- and 3-positions.
The hydroxyl group at the 6-position with respect to the total substitution degree is preferably substituted with 32% or more of an acyl group, more preferably 33% or more, particularly preferably 34% or more. Furthermore, the substitution degree of the 6-position acyl group of cellulose acylate is preferably 0.88 or more. The 6-position hydroxyl group may be substituted with a propionyl group, butyroyl group, valeroyl group, benzoyl group, acryloyl group or the like, which is an acyl group having 3 or more carbon atoms, in addition to the acetyl group. The degree of substitution at each position can be determined by NMR.
In the present invention, as cellulose acylate, paragraphs “0043” to “0044” [Example] [Synthesis Example 1], paragraphs “0048” to “0049” [Synthesis Example 2], and paragraph “ Cellulose acetate obtained by the method described in “0051” to “0052” [Synthesis Example 3] can be used.

<Polyethylene terephthalate film>
In the present invention, a polyethylene terephthalate film is also preferably used because it is excellent in transparency, mechanical strength, flatness, chemical resistance and moisture resistance, and is inexpensive.
In order to further improve the adhesion strength between the transparent plastic film and the hard coat layer provided thereon, the transparent plastic film is more preferably subjected to an easy adhesion treatment.
Examples of commercially available PET films with an easily adhesive layer for optics include Cosmo Shine A4100 and A4300 manufactured by Toyobo Co., Ltd.

2. Layers constituting antireflection film The antireflection film of the present invention is obtained by mixing and coating each layer constituent of the previous period on the above-mentioned support, and then the antireflection film of the present invention. It describes about the layer which comprises.

2- (1) Anti-glare layer The anti-glare layer is formed for the purpose of contributing to the film anti-glare properties by surface scattering as defined in the present invention, and preferably hard coat properties for improving the scratch resistance of the film. Is done.

As a method of forming the antiglare property, a method of laminating and forming a mat-shaped shaping film having fine irregularities on the surface as described in JP-A-6-16851, as described in JP-A-2000-206317 A method of forming by curing shrinkage of an ionizing radiation curable resin due to a difference in the amount of ionizing radiation, and as described in JP-A No. 2000-338310, when the weight ratio of a good solvent to a translucent resin decreases by drying. A method of solidifying a light-sensitive fine particle and a translucent resin while gelling to form unevenness on the coating film surface, a method of imparting surface unevenness by external pressure as described in JP-A-2000-275404, etc. These known methods can be used.
The antiglare layer that can be used in the present invention preferably contains a binder capable of imparting hard coat properties, translucent particles for imparting antiglare properties, and a solvent as essential components. It is preferable that irregularities on the surface be formed by the protrusions of the protrusions themselves or protrusions formed by an aggregate of a plurality of particles.
The antiglare layer formed by dispersing the matte particles is composed of a binder and translucent particles dispersed in the binder. The antiglare layer having antiglare properties preferably has both antiglare properties and hard coat properties.

As specific examples of the mat particles, particles of inorganic compounds such as silica particles and TiO ₂ particles; resin particles such as acrylic particles, crosslinked acrylic particles, polystyrene particles, crosslinked styrene particles, melamine resin particles, and benzoguanamine resin particles are preferable. Can be mentioned. Of these, crosslinked styrene particles, crosslinked acrylic particles, and silica particles are preferred.
The shape of the mat particles can be either spherical or irregular.

  The particle size distribution of the matte particles is measured by a Coulter counter method, and the measured distribution is converted into a particle number distribution.

  The internal haze and surface haze of the present invention can be achieved by adjusting the refractive index of the translucent resin in accordance with the refractive index of each translucent particle selected from these particles. Specifically, a translucent resin (having a refractive index after curing of 1.55 to 1.70) mainly composed of a trifunctional or higher functional (meth) acrylate monomer preferably used in the antiglare layer of the present invention described later. And a combination of translucent particles and / or benzoguanamine particles made of a crosslinked poly (meth) acrylate polymer having a styrene content of 50 to 100% by mass, particularly the translucent resin and styrene content of 50 to 100. A combination with translucent particles (having a refractive index of 1.54 to 1.59) made of a crosslinked poly (styrene-acrylate) copolymer having a mass% is particularly preferred.

The translucent particles are preferably blended in the formed antiglare layer so as to be contained in an amount of 3 to 30% by mass in the total solid content of the antiglare layer. More preferably, it is 5-20 mass%. When it is less than 3% by mass, the antiglare property is insufficient, and when it exceeds 30% by mass, problems such as image blur, surface turbidity and glare occur.
Moreover, the density of the translucent particles is preferably 10 to 1000 mg / m ² , more preferably 100 to 700 mg / m ² .

The absolute value of the difference between the refractive index of the translucent resin and the refractive index of the translucent particles is preferably 0.04 or less. The absolute value of the difference between the refractive index of the translucent resin and the refractive index of the translucent particles is preferably 0.001 to 0.030, more preferably 0.001 to 0.020, and still more preferably 0.001. ~ 0.015. When this difference exceeds 0.040, problems such as film character blur, a decrease in dark room contrast, and surface turbidity occur.
Here, the refractive index of the translucent resin can be quantitatively evaluated by directly measuring the refractive index with an Abbe refractometer or by measuring a spectral reflection spectrum or a spectral ellipsometry. The refractive index of the translucent particles is measured by measuring the turbidity by dispersing an equal amount of the translucent particles in the solvent in which the refractive index is changed by changing the mixing ratio of two types of solvents having different refractive indexes. It is measured by measuring the refractive index of the solvent when the turbidity is minimized with an Abbe refractometer.

  Two or more kinds of mat particles having different particle diameters may be used in combination. It is possible to impart anti-glare properties with mat particles having a larger particle size and to impart other optical characteristics with mat particles having a smaller particle size. For example, when an anti-glare antireflection film is attached to a high-definition display of 133 ppi or higher, a problem in display image quality called “glare” may occur. “Glitter” is derived from the fact that pixels are enlarged or reduced due to unevenness present on the surface of the antiglare and antireflection antireflection film, resulting in loss of luminance uniformity, but particles smaller than mat particles that impart antiglare properties. It can be greatly improved by using mat particles having a diameter different from that of the binder.

  The film thickness of the antiglare layer is preferably 1 to 10 μm, and more preferably 1.2 to 8 μm. If it is too thin, the hard property is insufficient, and if it is too thick, curling and brittleness may be deteriorated and workability may be lowered.

  On the other hand, the center line average roughness (Ra) of the antiglare layer is preferably in the range of 0.10 to 0.40 μm. If it exceeds 0.40 μm, problems such as glare and whitening of the surface when external light is reflected occur. Further, it is preferable that the value of the transmitted image definition is 5 to 60%.

  The strength of the antiglare layer is preferably H or more, more preferably 2H or more, and most preferably 3H or more in a pencil hardness test.

2- (2) Hard Coat Layer In addition to the antiglare layer, the film of the present invention can be provided with a hard coat layer in order to impart the physical strength of the film.
Preferably, a low refractive index layer is provided thereon, and more preferably, an intermediate refractive index layer and a high refractive index layer are provided between the hard coat layer and the low refractive index layer to constitute an antireflection film.
The hard coat layer may be composed of two or more layers.

  The refractive index of the hard coat layer in the present invention is preferably in the range of 1.48 to 2.00, more preferably 1.52 to 1, from the optical design for obtaining an antireflection film. .90, more preferably 1.55 to 1.80. In the present invention, since there is at least one low refractive index layer on the hard coat layer, if the refractive index is too small, the antireflection property is lowered, and if it is too large, the color of the reflected light tends to be strong. is there.

From the viewpoint of imparting sufficient durability and impact resistance to the film, the thickness of the hard coat layer is usually about 0.5 μm to 50 μm, preferably 1 μm to 20 μm, more preferably 2 μm. 10 μm, most preferably 3 μm to 7 μm.
Further, the strength of the hard coat layer is preferably H or more, more preferably 2H or more, and most preferably 3H or more in a pencil hardness test.
Furthermore, in the Taber test according to JIS K5400, the smaller the wear amount of the test piece before and after the test, the better.

The hard coat layer is preferably formed by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound. For example, it may be formed by applying a coating composition containing an ionizing radiation-curable polyfunctional monomer or polyfunctional oligomer on a transparent support and subjecting the polyfunctional monomer or polyfunctional oligomer to a crosslinking reaction or a polymerization reaction. it can.
The functional group of the ionizing radiation-curable polyfunctional monomer or polyfunctional oligomer is preferably a light, electron beam, or radiation polymerizable group, and among them, a photopolymerizable functional group is preferable.
Examples of the photopolymerizable functional group include unsaturated polymerizable functional groups such as a (meth) acryloyl group, a vinyl group, a styryl group, and an allyl group. Among them, a (meth) acryloyl group is preferable.

  The hard coat layer contains matte particles having an average particle diameter of 1.0 to 10.0 μm, preferably 1.5 to 7.0 μm, such as inorganic compound particles or resin particles, for the purpose of imparting internal scattering properties. May be.

  For the purpose of controlling the refractive index of the hard coat layer, a high refractive index monomer, inorganic particles, or both can be added to the binder of the hard coat layer. In addition to the effect of controlling the refractive index, the inorganic particles also have the effect of suppressing cure shrinkage due to the crosslinking reaction. In the present invention, a polymer formed by polymerizing the polyfunctional monomer and / or the high refractive index monomer after the hard coat layer is formed, and the inorganic particles dispersed therein are referred to as a binder.

  For the purpose of maintaining the sharpness of the image, it is preferable to adjust the sharpness of the transmitted image in addition to adjusting the uneven shape of the surface. The clearness of the transmitted image of the clear antireflection film is preferably 60% or more. The transmitted image clarity is generally an index indicating the degree of blurring of an image reflected through a film, and the larger this value, the clearer and better the image viewed through the film. The transmitted image definition is preferably 70% or more, and more preferably 80% or more.

2- (3) High Refractive Index Layer, Medium Refractive Index Layer The film of the present invention can be provided with a high refractive index layer and a medium refractive index layer to enhance antireflection properties.
In the following specification, the high refractive index layer and the middle refractive index layer may be collectively referred to as a high refractive index layer. In the present invention, “high”, “medium”, and “low” in the high refractive index layer, medium refractive index layer, and low refractive index layer represent the relative refractive index relationship between the layers. In terms of the relationship with the transparent support, the refractive index preferably satisfies the relationship of transparent support> low refractive index layer, high refractive index layer> transparent support.
In the present specification, the high refractive index layer, the middle refractive index layer, and the low refractive index layer may be collectively referred to as an antireflection layer.

  In order to construct an antireflection film by constructing a low refractive index layer on a high refractive index layer, the refractive index of the high refractive index layer is preferably 1.55 to 2.40, more preferably 1 .60 to 2.20, more preferably 1.65 to 2.10, and most preferably 1.80 to 2.00.

  When an antireflection film is prepared by coating a medium refractive index layer, a high refractive index layer, and a low refractive index layer in order from the support, the refractive index of the high refractive index layer is 1.65 to 2.40. Preferably, it is preferably 1.70 to 2.20. The refractive index of the middle refractive index layer is adjusted to be a value between the refractive index of the low refractive index layer and the refractive index of the high refractive index layer. The refractive index of the middle refractive index layer is preferably 1.55 to 1.80.

The inorganic particles mainly composed of TiO ₂ used for the high refractive index layer and the medium refractive index layer are used for forming the high refractive index layer and the medium refractive index layer in the state of dispersion.
In the dispersion of the inorganic particles, the inorganic particles are dispersed in the dispersion medium in the presence of a dispersant.

  The high refractive index layer and the medium refractive index layer used in the present invention are preferably used in a dispersion liquid in which inorganic particles are dispersed in a dispersion medium, preferably a binder precursor necessary for matrix formation (for example, an ionizing radiation curable composition described later). Polyfunctional monomer, polyfunctional oligomer, etc.), photopolymerization initiator, etc. are added to form a coating composition for forming a high refractive index layer and a medium refractive index layer, and a high refractive index layer and a medium refractive index layer are formed on a transparent support. It is preferable that the coating composition is applied and cured by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound (for example, a polyfunctional monomer or a polyfunctional oligomer).

Furthermore, it is preferable to cause the binder of the high refractive index layer and the medium refractive index layer to undergo a crosslinking reaction or a polymerization reaction with the dispersant simultaneously with or after the coating of the layer.
The binder of the high refractive index layer and the medium refractive index layer produced in this way is, for example, the above-mentioned preferred dispersant and ionizing radiation curable polyfunctional monomer or polyfunctional oligomer are crosslinked or polymerized to form a binder. The anionic group of the dispersant is incorporated. Furthermore, the binder of the high refractive index layer and the medium refractive index layer has a function in which the anionic group maintains the dispersion state of the inorganic particles, and the crosslinked or polymerized structure imparts a film forming ability to the binder and contains inorganic particles. To improve the physical strength, chemical resistance and weather resistance of the high refractive index layer and medium refractive index layer.

  The binder of the high refractive index layer is added in an amount of 5 to 80% by mass based on the solid content of the coating composition of the layer.

The content of the inorganic particles in the high refractive index layer is preferably 10 to 90% by mass, more preferably 15 to 80% by mass, and particularly preferably 15 to 75% by mass with respect to the mass of the high refractive index layer. . Two or more kinds of inorganic particles may be used in combination in the high refractive index layer.
When the low refractive index layer is provided on the high refractive index layer, the refractive index of the high refractive index layer is preferably higher than the refractive index of the transparent support.
The high refractive index layer contains an ionizing radiation curable compound containing an aromatic ring, an ionizing radiation curable compound containing a halogenated element other than fluorine (for example, Br, I, Cl, etc.), and atoms such as S, N, P, etc. A binder obtained by a crosslinking or polymerization reaction such as an ionizing radiation curable compound can also be preferably used.

  The film thickness of the high refractive index layer can be appropriately designed depending on the application. When using a high refractive index layer as an optical interference layer described later, the thickness is preferably 30 to 200 nm, more preferably 50 to 170 nm, and particularly preferably 60 to 150 nm.

The haze of the high refractive index layer is preferably as low as possible when it does not contain particles that impart an antiglare function. It is preferably 5% or less, more preferably 3% or less, and particularly preferably 1% or less.
The high refractive index layer is preferably constructed directly on the transparent support or via another layer.

2- (4) Low Refractive Index Layer The film of the present invention needs to use a low refractive index layer in order to reduce the reflectance.

The refractive index of the low refractive index layer is preferably 1.20 to 1.46, more preferably 1.25 to 1.46, and particularly preferably 1.30 to 1.46.
The thickness of the low refractive index layer is preferably 50 to 200 nm, and more preferably 70 to 100 nm. The haze of the low refractive index layer is preferably 3% or less, more preferably 2% or less, and most preferably 1% or less. The specific strength of the low refractive index layer is preferably H or higher, more preferably 2H or higher, and most preferably 3H or higher in a pencil hardness test under a 500 g load.
Further, in order to improve the antifouling performance of the optical film, it is preferable that the contact angle of water on the surface is 90 degrees or more. More preferably, it is 95 degrees or more, and particularly preferably 100 degrees or more.

  The curable composition preferably contains (A) the fluoropolymer, (B) inorganic particles, and (C) an organosilane compound.

  In the low refractive index layer, a binder is used for dispersing and fixing the fine particles of the present invention. As the binder, the binder described in the hard coat layer can be used, but it is preferable to use a fluorine-containing polymer having a low refractive index or a fluorine-containing sol-gel material. The fluorine-containing polymer or fluorine-containing sol-gel is a material that has a dynamic friction coefficient of 0.03 to 0.30 on the surface of the low refractive index layer formed by crosslinking by heat or ionizing radiation and a contact angle of 85 to 120 ° with water. Is preferred.

2- (5) Antistatic layer, conductive layer
In the present invention, it is preferable to provide an antistatic layer from the viewpoint of preventing static electricity on the film surface. The antistatic layer can be formed by, for example, applying a conductive coating solution containing conductive fine particles and a reactive curable resin, or depositing or sputtering a metal or metal oxide that forms a transparent film. Conventionally known methods such as a method of forming a conductive thin film can be listed. The conductive layer can be formed directly on the support or via a primer layer that strengthens adhesion to the support. Further, the antistatic layer can be used as a part of the antireflection film. In this case, when used in a layer close to the outermost layer, sufficient antistatic properties can be obtained even if the film is thin.

  The thickness of the antistatic layer is preferably from 0.01 to 10 μm, more preferably from 0.03 to 7 μm, and even more preferably from 0.05 to 5 μm. The surface resistance of the antistatic layer is preferably 105 to 1012 Ω / sq, more preferably 105 to 109 Ω / sq, and most preferably 105 to 108 Ω / sq. The surface resistance of the antistatic layer can be measured by a four probe method.

The antistatic layer is preferably substantially transparent. Specifically, the haze of the antistatic layer is preferably 10% or less, more preferably 5% or less, further preferably 3% or less, and most preferably 1% or less. . The transmittance of light having a wavelength of 550 nm is preferably 50% or more, more preferably 60% or more, further preferably 65% or more, and most preferably 70% or more.
The antistatic layer of the present invention has excellent strength, and the specific antistatic layer has a pencil hardness of 1 kg, preferably H or higher, more preferably 2H or higher, more preferably 3H or higher. Is more preferable, and 4H or more is most preferable.

2- (6) Antifouling layer An antifouling layer can be provided on the outermost surface of the present invention. The antifouling layer lowers the surface energy of the antireflection layer and makes it difficult to attach hydrophilic or lipophilic stains. The antifouling layer can be formed using a fluorine-containing polymer or an antifouling agent.
The thickness of the antifouling layer is preferably 2 to 100 nm, and more preferably 5 to 30 nm.

2- (7) Interference unevenness (rainbow unevenness) prevention layer When there is a substantial refractive index difference (refractive index difference of 0.03 or more) between the transparent support and the hard coat layer, or between the transparent support and the antiglare layer, Reflected light is generated at the transparent support / hard coat layer or at the transparent support / antiglare interface. This reflected light interferes with the reflected light on the surface of the antireflection layer, and may cause interference unevenness due to subtle film thickness unevenness of the hard coat layer (or antiglare layer). In order to prevent such interference unevenness, for example, an interference having an intermediate refractive index n _P between the transparent support and the hard coat layer (or antiglare layer) and a film thickness d _P satisfying the following equation: An unevenness prevention layer can also be provided.

Formula (dp)
d _P = (2N−1) × λ / (4n _P )
However, λ is a wavelength of visible light and any value in the range of 450 to 650 nm, and N represents a natural number.

  Moreover, when bonding an antireflection film to an image display etc., an adhesive layer (or adhesive layer) may be laminated | stacked on the side which has not laminated | stacked the antireflection layer of a transparent support body. In such an embodiment, when there is a substantial refractive index difference (0.03 or more) between the transparent support and the pressure-sensitive adhesive layer (or adhesive layer), the transparent support / pressure-sensitive adhesive layer (or adhesive layer) The reflected light interferes with the reflected light on the surface of the antireflection layer, and the interference unevenness due to the film thickness unevenness of the support or the hard coat layer may occur as described above. For the purpose of preventing such interference unevenness, an interference unevenness preventing layer similar to the above can be provided on the side of the transparent support on which the antireflection layer is not laminated.

  Such an interference non-uniformity prevention layer is described in detail in Japanese Patent Application Laid-Open No. 2004-345333, and the interference non-uniformity prevention layer introduced here can also be used in the present invention.

2- (8) Easy-Adhesion Layer An easy-adhesion layer can be applied to the film of the present invention. An easy-adhesion layer means the layer which provides the function which makes it easy to adhere | attach a protective film for polarizing plates, its adjacent layer, or a hard-coat layer and a support body, for example.
Examples of the easy adhesion treatment include a treatment of providing an easy adhesion layer on a transparent plastic film with an easy adhesive composed of polyester, acrylic acid ester, polyurethane, polyethyleneimine, silane coupling agent and the like.
Examples of the easy-adhesion layer preferably used in the present technology include a layer containing a polymer compound having a -COOM (M represents a hydrogen atom or a cation) group, and a more preferable embodiment is a film substrate. A layer containing a polymer compound having a —COOM group is provided on the side, and a layer containing a hydrophilic polymer compound as a main component is provided on the polarizing film side adjacent to the layer. Examples of the polymer compound having -COOM group herein include styrene-maleic acid copolymer having -COOM group, vinyl acetate-maleic acid copolymer having -COOM group, and vinyl acetate-maleic acid-maleic anhydride. For example, a vinyl acetate-maleic acid copolymer having a -COOM group is preferably used. These polymer compounds are used alone or in combination of two or more, and the preferred weight average molecular weight is about 500 to 500,000. Particularly preferred examples of the polymer compound having a —COOM group include those described in JP-A-6-094915 and JP-A-7-333436.

The hydrophilic polymer compound is preferably a hydrophilic cellulose derivative (eg, methyl cellulose, carboxymethyl cellulose, hydroxy cellulose, etc.), a polyvinyl alcohol derivative (eg, polyvinyl alcohol, vinyl acetate-vinyl alcohol copolymer, polyvinyl acetal, polyvinyl formal). , Polyvinyl benzal, etc.), natural polymer compounds (eg, gelatin, casein, gum arabic, etc.), hydrophilic polyester derivatives (eg, partially sulfonated polyethylene terephthalate), hydrophilic polyvinyl derivatives (eg, poly -N-vinylpyrrolidone, polyacrylamide, polyvinylindazole, polyvinylpyrazole and the like), and may be used alone or in combination of two or more.
The thickness of the easy adhesion layer is preferably in the range of 0.05 to 1.0 μm. If it is thinner than 0.05 μm, it is difficult to obtain sufficient adhesiveness, and if it is thicker than 1.0 μm, the adhesive effect is saturated.

2- (9) Anti-curl layer The film of the present technology may be subjected to anti-curl processing. Anti-curl processing gives the function of trying to curl with the surface to which it is applied inside, but by applying this processing, some surface processing is performed on one side of the transparent resin film, It works to prevent curling with the surface facing inward when different degrees and types of surface treatment are applied.
The anti-curl layer may be provided on the side opposite to the side having the anti-glare layer or anti-reflection layer of the base material, or for example, an easy-adhesion layer may be coated on one side of the transparent resin film, and the anti-curl processing is performed on the opposite side The mode which coats is mentioned.

  Specific examples of the anti-curl processing include solvent coating, and a method of applying a solvent and a transparent resin layer such as cellulose triacetate, cellulose diacetate, and cellulose acetate propionate. The method using a solvent is specifically performed by applying a composition containing a solvent for dissolving or swelling a cellulose acylate film used as a protective film for a polarizing plate. Accordingly, the coating solution for the layer having a function of preventing curling preferably contains a ketone-based or ester-based organic solvent. Examples of preferable ketone-based organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl lactate, acetyl acetone, diacetone alcohol, isophorone, ethyl-n-butyl ketone, diisopropyl ketone, diethyl ketone, di-n-propyl ketone, Examples thereof include methylcyclohexanone, methyl-n-butyl ketone, methyl-n-propyl ketone, methyl-n-hexyl ketone, methyl-n-heptyl ketone, etc. Examples of preferable ester organic solvents include methyl acetate, ethyl acetate, acetic acid Examples include butyl, methyl lactate, and ethyl lactate. However, as a solvent to be used, in addition to a solvent mixture to be dissolved and / or a solvent to be swollen, it may further contain a solvent that does not dissolve, and a composition in which these are mixed at an appropriate ratio depending on the degree of curl of the transparent resin film and the type of resin. This is done using the product and the coating amount. In addition, the anti-curl function is exhibited even if transparent hard processing or antistatic processing is applied.

2- (10) Water Absorbing Layer A water absorbent can be used in the film of the present invention. The water absorbent can be selected from compounds having a water absorption function, mainly alkaline earth metals. Examples thereof include BaO, SrO, CaO, and MgO. Further, it can be selected from metal elements such as Ti, Mg, Ba, and Ca. The particle size of these absorbent particles is preferably 100 nm or less, and more preferably 50 nm or less.
The layer containing these water absorbents may be prepared by using a vacuum deposition method or the like in the same manner as the barrier layer described above, or nanoparticles may be prepared by various methods. The thickness of the layer is preferably 1 to 100 nm, and more preferably 1 to 10 nm. The layer containing the water absorbent is between the support and the laminate (a laminate of the barrier layer and the organic layer), between the uppermost layer of the laminate, between the laminates, or in the organic layer or barrier layer in the laminate. It may be added. When added to the barrier layer, a co-evaporation method is preferably used.

2- (11) Primer Layer / Inorganic Thin Film Layer In the film of the present invention, the gas barrier property can be enhanced by installing a known primer layer or inorganic thin film layer between the support and the laminate. .
As the primer layer, for example, an acrylic resin, an epoxy resin, a urethane resin, a silicone resin or the like can be used. In the present invention, an organic-inorganic hybrid layer is used as the primer layer, an inorganic vapor deposition layer or a sol-gel is used as the inorganic thin film layer. A dense inorganic coating thin film by the method is preferred. As an inorganic vapor deposition layer, vapor deposition layers, such as a silica, a zirconia, an alumina, are preferable. The inorganic vapor deposition layer can be formed by a vacuum vapor deposition method, a sputtering method, or the like.

3. Film Layer Structure For the film of the present invention, a known layer structure can be used using the above-described layers. For example, the following are typical examples.
a. Support / hard coat layer b. Support / hard coat layer / low refractive index layer (see FIG. 1)
c. Support / hard coat layer / high refractive index layer / low refractive index layer (see FIG. 2)
d. Support / hard coat layer / medium refractive index layer / high refractive index layer / low refractive index layer (see FIG. 3).

When the hard coat layer (2) is applied on the support (1) and the low refractive index layer (5) is laminated as shown in FIG. 1 (b), it can be suitably used as an antireflection film. By forming the low refractive index layer (5) on the hard coat layer with a film thickness of about 1/4 of the wavelength of light, surface reflection can be reduced by the principle of thin film interference.
Moreover, even if the high refractive index layer (4) and the low refractive index layer (2) are laminated after the hard coat layer (2) is applied on the support (1) as shown in FIG. It can use suitably as a prevention film. Further, as shown in FIG. 3 (d), the support, the hard coat layer (2), the medium refractive index layer (3), the high refractive index layer (4), and the low refractive index layer (5) are arranged in this order. By installing, the reflectance can be reduced to 1% or less.

  In the constitutions a to d, the hard coat layer (2) can be an antiglare layer having antiglare properties. The antiglare property may be formed by dispersion of matte particles as shown in FIG. 4 or may be formed by surface shaping by a method such as embossing as shown in FIG. The antiglare layer formed by dispersing the matte particles is composed of a binder and translucent particles dispersed in the binder. The antiglare layer having antiglare properties preferably has both antiglare properties and hard coat properties, and may be composed of a plurality of layers, for example, 2 to 4 layers.

In addition, interference unevenness (rainbow unevenness) prevention layer, antistatic layer (reduction of surface resistance value from the display side, etc.) may be provided between the support and the surface layer or the outermost layer. Or when there is a problem with dust on the surface), another hard coat layer (when one hard coat layer or antiglare layer is insufficient in hardness), gas barrier layer, water absorption layer ( Moisture-proof layer), adhesion improving layer, antifouling layer (contamination preventing layer), and the like.
The refractive index of each layer constituting the antiglare antireflection film having an antireflection layer in the invention preferably satisfies the following relationship.
Refractive index of hard coat layer> refractive index of transparent support> refractive index of low refractive index layer

4). Manufacturing Method The film of the present invention can be formed by the following method, but is not limited to this method.
4- (1) Adjustment of coating solution

<Preparation>
First, a coating solution containing components for forming each layer is prepared. In that case, the raise of the moisture content in a coating liquid can be suppressed by suppressing the volatilization amount of a solvent to the minimum. The moisture content in the coating solution is preferably 5% or less, more preferably 2% or less. The suppression of the volatilization amount of the solvent is achieved by improving the hermeticity at the time of stirring after putting each material into the tank, minimizing the air contact area of the coating liquid during the transfer operation, and the like. Moreover, you may provide the means to reduce the moisture content in a coating liquid during application | coating, or before and behind that.

<Physical properties of coating solution>
In the coating method of the present invention, the upper limit speed at which coating is possible is greatly affected by the liquid physical properties, so it is necessary to control the liquid physical properties, particularly the viscosity and surface tension at the moment of coating.
The viscosity of the low refractive index layer of the present invention is preferably 2.0 [mPa · s] or less, more preferably 1.5 [mPa · s] or less, and most preferably 1.0 [mPa · s]. It is as follows. Since there are some coating solutions whose viscosity changes depending on the shear rate, the above value indicates the viscosity at the shear rate at the moment of coating. When a thixotropic agent is added to the coating solution and the coating solution is subjected to high shear, the viscosity is low, and when the coating solution is hardly sheared, if the viscosity is high, unevenness during drying is less likely to occur.
Moreover, although it is not a liquid physical property, the quantity of the coating liquid apply | coated to a transparent support body also affects the upper limit speed | rate which can be apply | coated. The amount of the coating solution applied to the transparent support is preferably 2.0 to 5.0 [ml / m ² ]. Increasing the amount of the coating liquid applied to the transparent support is preferable because the upper limit of the application rate can be increased, but if the amount of the coating liquid applied to the transparent support is increased too much, the load on drying increases. It is preferable to determine the optimal amount of coating liquid to be applied to the transparent support depending on the liquid formulation and process conditions.
The surface tension is preferably in the range of 15 to 36 [mN / m]. It is preferable to reduce the surface tension by adding a leveling agent or the like because unevenness during drying is suppressed. On the other hand, if the surface tension is too low, the upper limit speed at which coating can be performed is reduced. Therefore, the range of 17 [mN / m] to 32 [mN / m] is more preferable, and 19 [mN / m] to 26 [ mN / m] is more preferable.

<Filtration>
The coating solution used for coating is preferably filtered before coating. As a filter for filtration, it is preferable to use a filter having a pore diameter as small as possible within a range in which components in the coating solution are not removed. For filtration, a filter having an absolute filtration accuracy of 0.1 to 10 μm is used, and a filter having an absolute filtration accuracy of 0.1 to 5 μm is preferably used. The thickness of the filter is preferably 0.1 to 10 mm, and more preferably 0.2 to 2 mm. In that case, the filtration pressure is preferably 1.5 MPa or less, more preferably 1.0 MPa or less, and further preferably 0.2 MPa or less.
The filtration filter member is not particularly limited as long as it does not affect the coating solution. Specifically, the same thing as the filtration member of the wet dispersion of an inorganic compound mentioned above is mentioned.
Further, it is also preferable that the filtered coating solution is ultrasonically dispersed immediately before coating to assist defoaming and dispersion holding of the dispersion.

4- (2) Treatment before coating The support used in the present invention is preferably subjected to a surface treatment before coating. Specific examples include corona discharge treatment, glow discharge treatment, flame treatment, acid treatment, alkali treatment, and ultraviolet irradiation treatment. In addition, as described in JP-A-7-333433, it is preferable to provide an undercoat layer.

Furthermore, as a dust removing method used in the dust removing step as a pre-process for application, a method of pressing a nonwoven fabric, a blade or the like on the film surface described in JP-A-59-150571, JP-A-10-309553 A method of blowing the air with high cleanliness described at a high speed to peel off the deposits from the film surface and sucking it with a suction port close to it, blowing compressed air that is ultrasonically vibrated as described in JP-A-7-333613 Examples thereof include a dry dust removing method such as a method for peeling and sucking adhered substances (manufactured by Shinkosha, New Ultra Cleaner, etc.).
In addition, a method of introducing a film into a cleaning tank and peeling off deposits with an ultrasonic vibrator, supplying a cleaning liquid to the film described in Japanese Patent Publication No. 49-13020, and then blowing and sucking high-speed air As described in JP-A-2001-38306, a wet dust removal method such as a method in which a web is continuously rubbed with a roll wetted with a liquid and then washed by spraying the liquid onto the rubbed surface is used. Can do. Among such dust removal methods, a method using ultrasonic dust removal or a method using wet dust removal is particularly preferable in terms of dust removal effect.
In addition, it is particularly preferable to remove static electricity on the film support before performing such a dust removal step from the viewpoint of increasing dust removal efficiency and suppressing adhesion of dust. As such a static elimination method, a corona discharge ionizer, a light irradiation ionizer such as UV or soft X-ray, or the like can be used. The charged voltage of the film support before and after dust removal and coating is desirably 1000 V or less, preferably 300 V or less, and particularly preferably 100 V or less.

From the viewpoint of maintaining the flatness of the film, the temperature of the cellulose acylate film in these treatments is preferably Tg or less, specifically 150 ° C. or less.
When the cellulose acylate film is adhered to the polarizing film as in the case of using the film of the present invention as a protective film for a polarizing plate, from the viewpoint of adhesiveness to the polarizing film, acid treatment or alkali treatment, that is, cellulose acylate. It is particularly preferred to carry out a saponification treatment on the rate.
From the viewpoint of adhesiveness and the like, the surface energy of the cellulose acylate film is preferably 55 mN / m or more, more preferably 60 mN / m or more and 75 mN / m or less, and it can be adjusted by the surface treatment. .

4- (3) Coating Each layer of the film of the present invention can be formed by the following coating method, but is not limited to this method.
Dip coating method, air knife coating method, curtain coating method, roller coating method, wire bar coating method, gravure coating method or extrusion coating method (die coating method) (see US Pat. No. 2,681,294), micro gravure coating method, etc. Known methods are used, and among them, the microgravure coating method and the die coating method are preferable.

  The micro gravure coating method used in the present invention is a gravure roll having a diameter of about 10 to 100 mm, preferably about 20 to 50 mm and engraved with a gravure pattern on the entire circumference, below the support and in the transport direction of the support. The gravure roll is rotated in reverse with respect to the gravure roll, the excess coating liquid is scraped off from the surface of the gravure roll by a doctor blade, and a fixed amount of the coating liquid is removed from the support in a position where the upper surface of the support is in a free state. The coating method is characterized in that the coating liquid is transferred onto the lower surface for coating. A roll-shaped transparent support is continuously unwound, and at least one layer of at least one of a hard coat layer or a low refractive index layer containing a fluorine-containing olefin-based polymer is formed on one side of the unwound support. It can be applied by a gravure coating method.

  As coating conditions by the micro gravure coating method, the number of gravure patterns imprinted on the gravure roll is preferably 50 to 800 lines / inch, more preferably 100 to 300 lines / inch, and the depth of the gravure pattern is 1 to 600 μm. Is preferable, 5 to 200 μm is more preferable, the rotation speed of the gravure roll is preferably 3 to 800 rpm, more preferably 5 to 200 rpm, and the conveyance speed of the support is 0.5 to 100 m / min. It is preferably 1 to 50 m / min.

In order to supply the film of the present invention with high productivity, an extrusion method (die coating method) is preferably used. In particular, in a region with a small amount of wet coating (20 cc / m ² or less), such as a hard coat layer or an antireflection layer, the uniformity of the coating film can be improved by adopting the production method described in JP-A-2006-122889. Can be improved.

4- (4) <Drying>
The film of the present invention is preferably applied on a support directly or via another layer and then conveyed by a web to a heated zone to dry the solvent.
Various knowledges can be used as a method for drying the solvent. Specific examples include JP-A Nos. 2001-286817, 2001-314798, 2003-126768, 2003-315505, and 2004-34002.
The temperature of the drying zone is preferably 25 ° C. to 140 ° C., the first half of the drying zone is preferably at a relatively low temperature, and the latter half is preferably at a relatively high temperature. However, it is preferably below the temperature at which components other than the solvent contained in the coating composition of each layer start to volatilize. For example, some of the commercially available photo radical generators used in combination with ultraviolet curable resins volatilize around several tens of percent within a few minutes in warm air at 120 ° C. Some acrylate monomers and the like undergo volatilization in warm air at 100 ° C. In such a case, it is preferable that it is below the temperature at which components other than the solvent contained in the coating composition of each layer start to volatilize as described above.

Moreover, the dry wind after apply | coating the coating composition of each layer on a support body has the wind speed of the coating-film surface of 0.1-2 m / sec while the solid content concentration of the said coating composition is 1-50%. It is preferable to be in the range in order to prevent drying unevenness.
Moreover, after apply | coating the coating composition of each layer on a support body, the temperature difference of the conveyance roll which contacts the surface opposite to the coating surface of a support body in a drying zone, and a support body is 0 to 20 degreeC or less. Then, the drying nonuniformity by the heat transfer nonuniformity on a conveyance roll can be prevented, and it is preferable.

4- (5) Curing After drying the solvent, the film of the present invention can be passed through a zone in which each coating film is cured by ionizing radiation and / or heat on the web to cure the coating film.

It is preferable that the film of the present invention is first heated at a temperature of 70 ° C. or higher and 130 ° C. or lower for 5 to 20 minutes, and then cured by an active energy ray typified by ultraviolet rays.
The temperature of thermosetting is preferably 70 ° C. or higher and 120 ° C. or lower, and most preferably 80 ° C. or higher and 115 ° C. or lower.
The ionizing radiation species in the present invention is not particularly limited, and is appropriately selected from ultraviolet rays, electron beams, near ultraviolet rays, visible light, near infrared rays, infrared rays, X-rays and the like according to the type of curable composition forming the film. Although it can be selected, ultraviolet rays and electron beams are preferred, and ultraviolet rays are particularly preferred because they are easy to handle and high energy can be easily obtained. As the ultraviolet light source for photopolymerizing the ultraviolet reactive compound, any light source that generates ultraviolet light can be used. For example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. An ArF excimer laser, a KrF excimer laser, an excimer lamp, synchrotron radiation, or the like can also be used. Among these, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a xenon arc, and a metal halide lamp can be preferably used.

  Moreover, an electron beam can be used similarly. As an electron beam, 50 to 1000 keV, preferably 100 to 100, emitted from various electron beam accelerators such as a cockroft Walton type, a bandegraph type, a resonance transformation type, an insulated core transformer type, a linear type, a dynamitron type, and a high frequency type. An electron beam having an energy of 300 keV can be given.

Irradiation conditions vary depending on each lamp, but the energy intensity of irradiated light is preferably 10 mJ / cm ² or more, more preferably 50 mJ / cm ^{2 to} 10000 mJ / cm ² , and particularly preferably 50 mJ / cm ^{2 to} 2000 mJ. / Cm ² . At that time, the irradiation distribution in the width direction of the web is preferably 50 to 100%, more preferably 80 to 100%, including both ends with respect to the central maximum irradiation.

In the present invention, at least one layer laminated on the support is irradiated with ionizing radiation and heated to a film surface temperature of 60 ° C. or more for 0.5 seconds or more from the start of irradiation with ionizing radiation, with an oxygen concentration of 10 volumes. It is preferable to cure by the step of irradiating with ionizing radiation in an atmosphere of less than or equal to%.
It is also preferable to heat in an atmosphere having an oxygen concentration of 3% by volume or less simultaneously and / or continuously with ionizing radiation irradiation.
In particular, it is preferable that the low refractive index layer which is the outermost layer and has a small film thickness is cured by this method. The curing reaction is accelerated by heat, and a film having excellent physical strength and chemical resistance can be formed.

  The time for irradiating with ionizing radiation is preferably 0.7 seconds or longer and 60 seconds or shorter, and more preferably 0.7 seconds or longer and 10 seconds or shorter. If it is 0.5 seconds or less, the curing reaction cannot be completed, and sufficient curing cannot be performed. Also, maintaining low oxygen conditions for a long time is not preferable because the equipment becomes large and a large amount of inert gas is required.

  The oxygen concentration is preferably formed by a crosslinking reaction or a polymerization reaction of an ionizing radiation curable compound in an atmosphere of 6% by volume or less, more preferably 4% by volume or less, particularly preferably 2% by volume of oxygen. Hereinafter, it is most preferably 1% by volume or less. In order to reduce the oxygen concentration more than necessary, a large amount of inert gas such as nitrogen is required, which is not preferable from the viewpoint of production cost.

  As a method of reducing the oxygen concentration to 10% by volume or less, it is preferable to replace the atmosphere (nitrogen concentration of about 79% by volume, oxygen concentration of about 21% by volume) with another gas, particularly preferably replacement with nitrogen (nitrogen purge). It is to be.

By supplying inert gas to the ionizing radiation irradiation chamber and slightly blowing it to the web entrance side of the irradiation chamber, the entrained air accompanying the web transfer can be eliminated and the oxygen concentration in the reaction chamber can be effectively reduced. It is possible to efficiently reduce the substantial oxygen concentration on the extreme surface where the inhibition of curing due to is large. The direction of the inert gas flow on the web entrance side of the irradiation chamber can be controlled by adjusting the balance between supply and exhaust of the irradiation chamber.
Direct blowing of an inert gas onto the web surface is also preferably used as a method for removing the carried air.

  Further, by providing a front chamber in front of the reaction chamber and excluding oxygen on the web surface in advance, the curing can proceed more efficiently. Further, the side surface constituting the web entrance side of the ionizing radiation reaction chamber or the front chamber is preferably 0.2 to 15 mm in gap with the web surface in order to use the inert gas efficiently, more preferably, 0.1%. The thickness is preferably 2 to 10 mm, and most preferably 0.2 to 5 mm. However, in order to continuously manufacture the web, it is necessary to join and connect the webs, and a method of sticking with a joining tape or the like is widely used for joining. For this reason, if the gap between the entrance surface of the ionizing radiation reaction chamber or the front chamber and the web is too narrow, there arises a problem that the joining member such as the joining tape is caught. For this reason, in order to narrow the gap, it is preferable to make at least a part of the entrance surface of the ionizing radiation reaction chamber or the front chamber movable, and to widen the gap by the junction thickness when the junction enters. In order to realize this, the entrance surface of the ionizing radiation reaction chamber or the front chamber is made movable in the forward and backward direction, and when the joint passes, the gap is moved back and forth to widen the gap, It is possible to move the chamber entrance surface vertically with respect to the web surface and move up and down to widen the gap as the joint passes.

  In curing, the film surface is preferably heated at 60 ° C. or higher and 170 ° C. or lower. At 60 ° C. or lower, there is little curing by heating, and at 170 ° C. or higher, problems such as deformation of the substrate occur. A more preferable temperature is 60 ° C to 100 ° C. The film surface refers to the film surface temperature of the layer to be cured. The time for the film to reach the temperature is preferably 0.1 second or more and 300 seconds or less from the start of UV irradiation, and more preferably 10 seconds or less. If the time for maintaining the temperature of the film surface in the above temperature range is too short, the reaction of the curable composition that forms the film cannot be accelerated, and conversely, if it is too long, the optical performance of the film deteriorates and the equipment is large. Manufacturing problems such as

  There is no particular limitation on the heating method, but a method of heating a roll to contact the film, a method of spraying heated nitrogen, irradiation with far infrared rays or infrared rays is preferable. A method of heating a rotating metal roll described in Japanese Patent No. 2523574 by flowing a medium such as hot water, steam or oil can also be used. As a heating means, a dielectric heating roll or the like may be used.

  The ultraviolet irradiation may be performed every time one layer is provided for each of a plurality of constituent layers, or may be performed after lamination. Or you may irradiate combining these. From the viewpoint of productivity, it is preferable to irradiate ultraviolet rays after laminating multiple layers.

In the present invention, at least one layer laminated on the support can be cured by multiple times of ionizing radiation. In this case, it is preferable that at least two ionizing radiations are performed in a continuous reaction chamber in which the oxygen concentration does not exceed 3% by volume. By performing multiple times of ionizing radiation irradiation in the same low oxygen concentration reaction chamber, the reaction time required for curing can be effectively ensured.
In particular, when the production rate is increased for high productivity, ionizing radiation irradiation is required multiple times to ensure the energy of ionizing radiation necessary for the curing reaction.

  Further, when the curing rate (100-residual functional group content) is a certain value of less than 100%, the lower layer has a curing rate of the upper layer when a layer is provided thereon and cured by ionizing radiation and / or heat. When the height is higher than before, the adhesion between the lower layer and the upper layer is improved, which is preferable.

4- (6) Handling In order to continuously produce the film of the present invention, a process of continuously feeding a roll-shaped support film, a process of applying and drying a coating liquid, a process of curing a coating film, and curing The process of winding up the support film which has a layer is performed.
The film support is continuously sent out from the roll-shaped film support to the clean room. In the clean room, the static electricity charged on the film support is removed by an electrostatic charge-off device, and then the film support adheres on the film support. Remove the foreign material that has been removed with a dust remover. Subsequently, the coating liquid is applied onto the film support in the application section installed in the clean room, and the applied film support is sent to the drying chamber and dried.
The film support having the dried coating layer is fed from the drying chamber to the curing chamber, and the monomer contained in the coating layer is polymerized and cured. Further, the film support having the cured layer is sent to the curing unit to complete the curing, and the film support having the layer having been completely cured is wound up into a roll shape.

The above steps may be performed every time each layer is formed, or a plurality of coating parts-drying chambers-curing parts may be provided to continuously form each layer.
In order to produce the film of the present invention, as described above, simultaneously with the microfiltration operation of the coating liquid, the coating process in the coating unit and the drying process performed in the drying chamber are performed in a high clean air atmosphere, and It is preferable that dust and dust on the film are sufficiently removed before application. The air cleanliness of the coating process and the drying process is desirably class 10 (353 particles / 0.5 m or more / (cubic meter) or less) based on the standard of air cleanliness in the US Federal Standard 209E. Preferably it is class 1 (35.5 particles / (cubic meter) or less) having a particle size of 0.5 μm or more. Moreover, it is more preferable that the degree of air cleanliness is high also in the feeding and winding parts other than the coating-drying process.

4- (7) Saponification treatment When making a polarizing plate using the film of the present invention as one of the surface protective films of two polarizing films, the surface on the side to be bonded to the polarizing film should be hydrophilized. Thus, it is preferable to improve the adhesion on the bonding surface.

a. Method of immersing in alkaline solution This is a method that saponifies all surfaces that are reactive with alkali on the entire surface of the film by immersing the film in an alkaline solution under appropriate conditions, and does not require special equipment. From the viewpoint of cost. The alkaline liquid is preferably a sodium hydroxide aqueous solution. A preferred concentration is 0.5 to 3 mol / L, particularly preferably 1 to 2 mol / L. The liquid temperature of a preferable alkali liquid is 30-75 degreeC, Most preferably, it is 40-60 degreeC.
The combination of the saponification conditions is preferably a combination of relatively mild conditions, but can be set depending on the material and composition of the film and the target contact angle.
After being immersed in the alkaline solution, it is preferable to sufficiently wash with water or neutralize the alkaline component by immersing in a dilute acid so that the alkaline component does not remain in the film.

By saponification treatment, the surface opposite to the surface having the coating layer is hydrophilized. The protective film for polarizing plate is used by adhering the hydrophilic surface of the transparent support to the polarizing film.
The hydrophilized surface is effective for improving the adhesiveness with the adhesive layer mainly composed of polyvinyl alcohol.
In the saponification treatment, the lower the contact angle of water on the surface of the transparent support opposite to the side having the coating layer, the better from the viewpoint of adhesion to the polarizing film, but the dipping method has the coating layer at the same time. Since it is damaged by alkali from the surface to the inside, it is important to set the minimum reaction conditions. When the contact angle to water of the transparent support on the opposite surface is used as an index of damage to each layer due to alkali, particularly when the transparent support is triacetylcellulose, preferably 10 to 50 degrees, more preferably Is 30 to 50 degrees, more preferably 40 to 50 degrees. If it is 50 degrees or more, there is a problem in the adhesion to the polarizing film, which is not preferable. On the other hand, if it is less than 10 degrees, the film suffers too much damage, which impairs physical strength and is not preferable.

b. Method of applying alkaline solution As a means of avoiding damage to each film in the above-mentioned immersion method, an alkali solution is applied, heated, washed with water, and dried only on the surface opposite to the surface having the coating layer under appropriate conditions. A liquid coating method is preferably used. The application in this case means that an alkaline solution or the like is brought into contact only with the surface to be saponified, and in addition to the application, it may be carried out by spraying or contacting a belt containing the solution. Including. By adopting these methods, a separate facility and process for applying an alkaline solution are required, which is inferior to the immersion method (1) from the viewpoint of cost. On the other hand, since the alkali solution contacts only the surface to be saponified, the opposite surface can have a layer using a material that is weak against the alkali solution. For example, vapor deposition films and sol-gel films have various effects such as corrosion, dissolution, and peeling due to alkali solution, so it is not desirable to use the immersion method. Is possible.

  In any of the saponification methods (1) and (2), since each layer can be formed by unwinding from a roll-shaped support, it may be performed by a series of operations in addition to the film manufacturing process. . Furthermore, the polarizing plate can be produced more efficiently than the same operation with a single wafer by continuously performing the pasting step with the polarizing plate made of the unwound support.

c. Method of protecting and saponifying with a laminate film As in (2) above, when the coating layer is insufficient in resistance to an alkaline solution, a laminate film is pasted on the surface on which the final layer is formed after forming the final layer. By immersing them in an alkaline solution after combining them, only the triacetyl cellulose surface opposite to the surface on which the final layer is formed can be hydrophilized, and then the laminate film can be peeled off. Even in this method, the hydrophilic treatment necessary for the polarizing plate protective film can be applied only to the surface opposite to the surface on which the final layer of the triacetyl cellulose film is formed without damaging the coating layer. Compared with the method (2), there is an advantage that a laminate film is generated as waste, but a device for applying a special alkaline solution is unnecessary.

d. Method of immersing in alkaline solution after forming up to middle layer Although resistant to alkaline solution up to lower layer, but insufficient resistance to alkaline solution of upper layer, dip into alkaline solution after forming up to lower layer to make both sides hydrophilic The upper layer can also be formed after processing. Although the manufacturing process is complicated, for example, in a film composed of an antiglare layer and a low refractive index layer of a fluorine-containing sol-gel film, when there is a hydrophilic group, the interlayer adhesion between the antiglare layer and the low refractive index layer is improved. There are advantages to doing.

e. Method of forming a coating layer on a saponified triacetyl cellulose film A saponification of a triacetyl cellulose film by immersing it in an alkaline solution in advance and applying the coating layer directly on one side or via another layer You may form. In the case of saponification by dipping in an alkaline solution, the interlayer adhesion with the triacetyl cellulose surface hydrophilized by saponification may deteriorate. In such a case, after saponification, only the surface on which the coating layer is to be formed is treated by corona discharge, glow discharge or the like to remove the hydrophilic surface and then form the coating layer. Further, when the coating layer has a hydrophilic group, the interlayer adhesion may be good.

4- (8) Production of Polarizing Film The film of the present invention can be used as a polarizing film and a protective film disposed on one side or both sides thereof, and can be used as a polarizing film.
As one protective film, the film of the present invention is used. The other protective film may be a normal cellulose acetate film, but is produced by the above-mentioned solution casting method and at a stretch ratio of 10 to 100%. It is preferable to use a cellulose acetate film stretched in the width direction in the form of a roll film.
Furthermore, in the polarizing plate of the present invention, it is preferable that one side is an antireflection film, whereas the other protective film is an optical compensation film having an optically anisotropic layer made of a liquid crystalline compound.

Examples of the polarizing film include an iodine polarizing film, a dye polarizing film using a dichroic dye, and a polyene polarizing film. The iodine polarizing film and the dye polarizing film are generally produced using a polyvinyl alcohol film.
The transparent support of the antireflection film and the slow axis of the cellulose acetate film and the transmission axis of the polarizing film are arranged so as to be substantially parallel.

The moisture permeability of the protective film is important for the productivity of the polarizing plate. The polarizing film and the protective film are bonded together with an aqueous adhesive, and the adhesive solvent is dried by diffusing in the protective film. The higher the moisture permeability of the protective film, the faster the drying and the higher the productivity. However, if the protective film is too high, moisture will enter the polarizing film depending on the usage environment (high humidity) of the liquid crystal display device. Polarization ability decreases.
The moisture permeability of the protective film is determined by the thickness, free volume, hydrophilicity / hydrophobicity, etc. of the transparent support or polymer film (and polymerizable liquid crystal compound).
When using the film of the present invention as a protective film of a polarizing plate, the moisture permeability is preferably from 100~1000g ^/ m 2 · 24hrs, and more preferably a 300~700g ^/ m 2 · 24hrs.
In the case of film formation, the thickness of the transparent support can be adjusted by lip flow rate and line speed, or stretching and compression. Since the moisture permeability varies depending on the main material to be used, it is possible to make a preferable range by adjusting the thickness.
In the case of film formation, the free volume of the transparent support can be adjusted by the drying temperature and time.
Also in this case, moisture permeability varies depending on the main material to be used, so that a preferable range can be obtained by adjusting the free volume.
The hydrophilicity / hydrophobicity of the transparent support can be adjusted by an additive. The moisture permeability can be increased by adding a hydrophilic additive to the free volume, and conversely, the moisture permeability can be lowered by adding a hydrophobic additive.
By independently controlling the moisture permeability, a polarizing plate having an optical compensation ability can be manufactured at low cost with high productivity.

As the polarizing film, a known polarizing film or a polarizing film cut out from a long polarizing film whose absorption axis is neither parallel nor perpendicular to the longitudinal direction may be used. A long polarizing film whose absorption axis is neither parallel nor perpendicular to the longitudinal direction is produced by the following method.
That is, a polarizing film stretched by applying tension while holding both ends of a continuously supplied polymer film by a holding means, stretched at least 1.1 to 20.0 times in the film width direction, The progress of the film is such that the difference between the moving speeds in the longitudinal direction of the holding device is within 3%, and the angle formed by the film moving direction at the exit of the step of holding both ends of the film and the substantial stretching direction of the film is inclined by 20 to 70 °. The film can be produced by a stretching method in which the direction is bent while holding both ends of the film. In particular, those inclined by 45 ° are preferably used from the viewpoint of productivity.

The method for stretching the polymer film is described in detail in paragraphs 0020 to 0030 of JP-A-2002-86554.
Of the two protective films of the polarizer, the film other than the antireflection film is preferably an optical compensation film having an optical compensation layer comprising an optically anisotropic layer. The optical compensation film (retardation film) can improve the viewing angle characteristics of the liquid crystal display screen.
A known film can be used as the optical compensation film, but the optical compensation film described in JP-A-2001-100042 is preferable in terms of widening the viewing angle.

6). Form of use of the present invention The film of the present invention is used in image display devices such as liquid crystal display devices (LCD), plasma display panels (PDP), electroluminescence displays (ELD) and cathode ray tube display devices (CRT). The optical filter according to the present invention can be used on a known display such as a plasma display panel (PDP) or a cathode ray tube display (CRT).

6- (1) Liquid Crystal Display Device The film and polarizing plate of the present invention can be advantageously used for an image display device such as a liquid crystal display device, and are preferably used for the outermost layer of the display.
The liquid crystal display device has a liquid crystal cell and two polarizing plates arranged on both sides thereof, and the liquid crystal cell carries a liquid crystal between two electrode substrates. Furthermore, one optically anisotropic layer may be disposed between the liquid crystal cell and one polarizing plate, or two optically anisotropic layers may be disposed between the liquid crystal cell and both polarizing plates.

  The liquid crystal cell is preferably in TN mode, VA mode, OCB mode, IPS mode or ECB mode.

<TN mode>
In the TN mode liquid crystal cell, rod-like liquid crystal molecules are substantially horizontally aligned when no voltage is applied, and are twisted and aligned at 60 to 120 °.
The TN mode liquid crystal cell is most frequently used as a color TFT liquid crystal display device, and is described in many documents.

<VA mode>
In a VA mode liquid crystal cell, rod-like liquid crystalline molecules are aligned substantially vertically when no voltage is applied.
The VA mode liquid crystal cell includes (1) a narrowly defined VA mode liquid crystal cell in which rod-like liquid crystalline molecules are aligned substantially vertically when no voltage is applied, and substantially horizontally when a voltage is applied (Japanese Patent Laid-Open No. Hei 2-). (2) Liquid crystal cell (SID97, Digest of Tech. Papers) (Proceedings) No. 28 (1997) 845 in which the VA mode is converted into a multi-domain (MVA mode) in order to expand the viewing angle. (3) Liquid crystal cell in a mode (n-ASM mode) in which rod-like liquid crystalline molecules are substantially vertically aligned when no voltage is applied and twisted multi-domain alignment is applied when a voltage is applied (Preliminary Collection 58 of the Japan Liquid Crystal Society) -59 pages (1998)) and (4) SURVAVAL mode liquid crystal cells (presented at LCD International 98).

<OCB mode>
The OCB mode liquid crystal cell is a bend alignment mode liquid crystal cell in which rod-like liquid crystalline molecules are aligned in substantially opposite directions (symmetrically) at the upper and lower portions of the liquid crystal cell. US Pat. No. 4,583,825, This is disclosed in each publication of Japanese Patent No. 5410422. Since the rod-like liquid crystal molecules are symmetrically aligned at the upper and lower portions of the liquid crystal cell, the bend alignment mode liquid crystal cell has a self-optical compensation function. Therefore, this liquid crystal mode is called an OCB (Optically Compensatory Bend) liquid crystal mode. The bend alignment mode liquid crystal display device has an advantage of high response speed.

<IPS mode>
The IPS mode liquid crystal cell is a type in which a nematic liquid crystal is switched by applying a lateral electric field. IDRC (Asia Display '95), pages 577-580 and pages 707-710.

<ECB mode>
In an ECB mode liquid crystal cell, rod-like liquid crystalline molecules are substantially horizontally aligned when no voltage is applied. The ECB mode is one of the liquid crystal display modes having the simplest structure, and is described in detail in, for example, Japanese Patent Application Laid-Open No. 5-203946.

5- (2) Display other than liquid crystal display device <PDP>
A plasma display panel (PDP) is generally composed of a gas, a glass substrate, an electrode, an electrode lead material, a thick film printing material, and a phosphor. Two glass substrates are a front glass substrate and a rear glass substrate. An electrode and an insulating layer are formed on the two glass substrates. A phosphor layer is further formed on the rear glass substrate. Two glass substrates are assembled and gas is sealed between them.
Plasma display panels (PDP) are already commercially available. The plasma display panel is described in JP-A-5-205643 and JP-A-9-306366.

The front plate may be disposed on the front surface of the plasma display panel. The front plate preferably has sufficient strength to protect the plasma display panel. The front plate can be used with a gap from the plasma display panel, or can be used by directly pasting the front plate to the plasma display body.
In an image display device such as a plasma display panel, an optical filter can be directly attached to the display surface. When a front plate is provided in front of the display, an optical filter can be attached to the front side (outside) or the back side (display side) of the front plate.

<Touch panel>
The film of the present invention can be applied to touch panels described in JP-A-5-127822 and JP-A-2002-48913.

<Organic EL device>
The film of the present invention can be used as a substrate (base film) such as an organic EL element or a protective film.
When the film of the present invention is used for an organic EL device or the like, JP-A-11-335661, JP-A-11-335368, JP-A-2001-192651, JP-A-2001-192652, JP-A-2001-192653, JP-A-2001-335776, JP-A-2001-247859, JP-A-2001-181616, JP-A-2001-181617, JP-A-2002-181816, JP-A-2002-181617, JP-A-2002-056776, etc. The contents described in each publication can be applied. Moreover, it is preferable to use together with the content of each gazette of Unexamined-Japanese-Patent No. 2001-148291, Unexamined-Japanese-Patent No. 2001-221916, and Unexamined-Japanese-Patent No. 2001-231443.

6). Various characteristic values Various measurement methods related to the present invention and preferable characteristic values are shown below.
6- (1) Reflectance Specular reflectance and color are measured by attaching an adapter “ARV-474” to a spectrophotometer “V-550” [manufactured by JASCO Corporation], and a wavelength of 380 to 780 nm. In the region, it is possible to measure the specular reflectivity at an exit angle of -5 ° at an incident angle of 5 °, calculate an average reflectivity of 450 to 650 nm, and evaluate the antireflection property. It is preferable that the antiglare antireflection film of the present invention has a specular reflectance of 2.0% or less and a transmittance of 90% or more because reflection of external light can be suppressed and visibility is improved. The specular reflectance is particularly preferably 1.5% or less, and most preferably the reflectance is 1.0% or less by using a layer structure as described in 3-d.

6- (2) color antireflection performance polarizing plate of the present invention, the CIE standard illuminant _{D 65,} with respect to the incident angle of 5 ° incident light at 780nm region from the wavelength 380 nm, of the specularly reflected light color, That is, the color tone can be evaluated by obtaining the L ^* , a ^* , and b ^* values of the CIE 1976 L ^* a ^* b ^* color space.
The L ^* , a ^* , and b ^* values are preferably in the ranges of 3 ≦ L ^* ≦ 20, −7 ≦ a ^* ≦ 7, and −10 ≦ b ^* ≦ 10, respectively. By setting it within this range, the color of reflected light from red purple to blue purple, which has been a problem with conventional polarizing plates, is reduced, and further 3 ≦ L ^* ≦ 10, 0 ≦ a ^* ≦ 5, and − 7 ≦ b ^* ≦ 0 is greatly reduced, and when applied to a liquid crystal display device, when applied to a liquid crystal display device, such as indoor fluorescent lamps, a slight brightness of bright external light is reflected. Neutral, don't mind. Specifically, if a ^* ≦ 7, the reddish color will not be too strong, and if a ^* ≧ −7, the cyan color will not be too strong. If b ^* ≧ −7, the bluish color does not become too strong, and if b ^* ≦ 0, the yellowish color does not become too strong.

Furthermore, the color uniformity of the reflected light is a change in color according to the following formula from a ^* b ^* on the L ^* a ^* b ^* chromaticity diagram obtained from the reflection spectrum of the reflected light from 380 nm to 680 nm. Can be obtained as a rate.

Here, a ^* _max and a ^* _min are the maximum value and minimum value of the a ^* value, respectively; b ^* _max and b ^* _min are the maximum value and minimum value of the b ^* value, respectively; a ^* _av and b ^* _av ^Are average values of a ^* value and a ^* value, respectively. The color change rate is preferably 30% or less, more preferably 20% or less, and most preferably 8% or less.

The film of the present invention preferably has a Delta] E _w is 15 or less is the change in color before and after the weather resistance test, more preferably 10 or less, and most preferably 5 or less. In this range, low reflection and reduction in the color of reflected light can be achieved at the same time. The color tone when reflected is neutral, and the quality of the displayed image is good, which is preferable.

The color change ΔE _w can be obtained according to the following formula (22).
Formula (22): ΔE _w = [(ΔL _w ) ² + (Δa _w ) ² + (Δb _w ) ² ] ^1/2
Here, ΔL _w , Δa _w , and Δb _w are change amounts of the L ^* value, the a ^* value, and the b ^* value before and after the weather resistance test.

6- (3) Transmission Image Sharpness The transmission image definition is an optical comb having a slit width of 0.5 mm using an image clarity measuring instrument (ICM-2D type) manufactured by Suga Test Instruments Co., Ltd. according to JIS-K7105. Can be measured.

  The transmitted image definition of the film of the present invention is preferably 15 to 100%. The transmitted image clarity is generally an index indicating the degree of blurring of an image reflected through a film, and the larger this value, the clearer and better the image viewed through the film. When the film of the present invention is an antiglare film, if the transmitted image sharpness is 15% to 40%, sufficient antiglare property and improvement of “image blur, dark room contrast reduction” are compatible, preferable.

6- (4) Surface Roughness Centerline average roughness (Ra) can be measured according to JIS-B0601.
The antireflection film of the present invention has a surface roughness of 0.08 to 0.30 μm in the center line average roughness, 10 times the average roughness Rz is 10 times or less of Ra, and an average mountain valley distance Sm of 1 to 100 μm. The standard deviation of the height of the convex part from the deepest part of the concavo-convex portion is 0.5 μm or less, the standard deviation of the average mountain-valley distance Sm with respect to the center line is 20 μm or less, and the surface with an inclination angle of 0 to 5 degrees is 10% or more. Such a design is preferable because sufficient anti-glare properties and a visually uniform matte feeling can be achieved. If Ra is less than 0.08, sufficient antiglare property cannot be obtained, and if it exceeds 0.30, problems such as glare and surface whitening when external light is reflected occur.

6- (5) Haze The haze of the film of the present invention is the haze value defined in JIS-K7105. Based on the measurement method defined in JIS-K7361-1, manufactured by Nippon Denshoku Industries Co., Ltd. It is automatically measured as haze measured using a turbidimeter “NDH-1001DP” = (diffused light / total transmitted light) × 100 (%).

The surface haze and internal haze can be measured by the following procedure.
(1) The total haze value (H) of the film is measured according to JIS-K7136.
(2) A few drops of silicone oil are added to the front and back surfaces of the low refractive index layer side of the film, and sandwiched from the front and back using two 1 mm thick glass plates (micro slide glass product number S 9111, manufactured by MATSANAMI), Two glass plates and a film are optically closely adhered to each other, and the haze is measured in a state where surface haze is removed, and only the silicone oil is sandwiched between two separately measured glass plates to subtract the measured haze. The calculated value is calculated as the internal haze (Hi) of the film.
(3) A value obtained by subtracting the internal haze (Hi) calculated in (2) from the total haze (H) measured in (1) above is calculated as the surface haze (Hs) of the film.

6- (7) Scratch resistance <Steel wool scratch resistance evaluation>
By using a rubbing tester and carrying out a rubbing test under the following conditions, it can be used as an index of scratch resistance.
・ Evaluation environmental conditions: 25 ° C., 60% RH,
Rubbing material: Steel wool (manufactured by Nippon Steel Wool Co., Ltd., gelled No. 0000). Wrap around the tip (1cm x 1cm) of the scraper of the tester that comes into contact with the sample, and fix the band.
・ Movement distance (one way): 13cm,
・ Rubbing speed: 13 cm / second,
Load: 500 g / cm ² and 200 g / cm ²
-Tip contact area: 1 cm x 1 cm, rubbing frequency: 10 reciprocations.
An oil-based black ink is applied to the back side of the sample that has been rubbed, and scratches on the rubbed portion are visually observed with reflected light, and evaluation is made based on the difference in the amount of reflected light from other than the rubbed portion.

<Eraser scuff resistance evaluation>
By using a rubbing tester and carrying out a rubbing test under the following conditions, it can be used as an index of scratch resistance.
・ Evaluation environmental conditions: 25 ° C., 60% RH,
・ Scraping material: Plastic eraser (MONO made by Dragonfly Pencil Co., Ltd.). Used by fixing to the tip (1cm x 1cm) of the scraper of the tester that comes into contact with the sample.
・ Movement distance (one way): 4cm
・ Rubbing speed: 2 cm / second,
・ Load: 500 g / cm ²
-Tip contact area: 1 cm x 1 cm
・ Rubbing frequency: 100 round trips.
An oil-based black ink is applied to the back side of the sample that has been rubbed, and scratches on the rubbed portion are visually observed with reflected light, and evaluation is made based on the difference in the amount of reflected light from other than the rubbed portion.

<Taper test>
In the Taber test according to JIS-K5400, the scratch resistance can be evaluated from the wear amount of the test piece before and after the test.
The smaller the amount of wear, the better.

6- (8) Hardness <Pencil hardness>
The strength of the film of the present invention can be evaluated by a pencil hardness test according to JIS-K5400.
The pencil hardness is preferably H or higher, more preferably 2H or higher, and most preferably 3H or higher.

<Surface elastic modulus>
The surface elastic modulus in the present invention is a value determined using a micro surface hardness tester (manufactured by Fisher Instruments: Fisherscope H100VP-HCU). Specifically, using a diamond pyramid indenter (tip-to-face angle: 136 °), the indentation depth is measured under an appropriate test load within a range where the indentation depth does not exceed 1 μm. This is the elastic modulus obtained from the change in load and displacement over time.
Further, the surface hardness can be obtained as a universal hardness by using the above-mentioned micro surface hardness tester. The universal hardness is a value obtained by measuring the indentation depth of a quadrangular pyramid indenter under a test load and dividing the test load by the surface area of the indent calculated from the geometric shape of the indent generated by the test load. It is known that there is a positive correlation between the surface elastic modulus and the universal hardness.

The universal hardness of the crosslinkable polymer defined in the present invention is determined by the following measurement procedure using a microhardness meter H100 manufactured by Fischer Instruments Co., Ltd. with respect to the crosslinkable polymer film having a thickness of about 20 to 30 μm cured on a glass plate. The universal hardness (N / mm ² ).
Appropriate bar coater is selected so that the film thickness after curing of a coating solution with a solid content of about 25% containing the necessary catalyst, crosslinking agent, polymerization initiator, etc. in addition to the crosslinkable polymer is about 20-30 μm. TOSHINRIKO. CO. Made of LTD (26 mm × 76 mm × 1.2 mm) coated on a polished glass slide plate. In the case where the crosslinkable polymer is thermosetting, a thermosetting condition for sufficiently curing the film is obtained in advance (for example, 125 ° C. for 10 minutes), and when the crosslinkable polymer is ionizing radiation curable, the film is similarly formed. The curing conditions for sufficient curing are obtained in advance (as an example, the oxygen concentration is 12 ppm, the UV irradiation amount is 750 mJ / cm ² ). Indentation area for each load F when the conical diamond indenter is pushed in by increasing the load continuously from 0 to 4 mN for each film and making the film thickness of 1/10 that is not affected by the glass plate hardness of the base material maximum Universal hardness is calculated from N = 6 measurement average value of F / A determined from A (mm ² ).
The surface hardness can be determined by nanoindentation described in JP-A-2004-354828. In this case, the hardness is preferably 2 GPa to 4 GPa, and the nanoindentation elastic modulus is preferably 10 GPa to 30 GPa.

6- (9) Antifouling test <Magic wiping>
The film is fixed on the glass surface with an adhesive, and a circle with a diameter of 5 mm is written three times with a pen tip (thin) of black magic “Mckey extra fine (product name: made by ZEBRA)” at 25 ° C. and 60 RH%. After 5 seconds, wipe it back and forth 20 times with a load that dents the bundle of Bencot (Brand name, Asahi Kasei Co., Ltd.) folded into 10 sheets. The writing and wiping are repeated under the above-mentioned conditions until the magic mark does not disappear by wiping, and the antifouling property can be evaluated by the number of times of wiping.
The number of times until it no longer disappears is preferably 5 times or more, and more preferably 10 times or more.

  For Black Magic, Magic Ink No. 700 (M700-T1 black) Using an ultra-fine sample, draw a circle with a diameter of 1 cm on the sample, paint it, rub it with Bencott (Asahi Kasei Co., Ltd.) after standing for 24 hours, and evaluate whether the magic is wiped off. .

6- (10) Contact angle Using a contact angle meter [“CA-X” type contact angle meter, manufactured by Kyowa Interface Science Co., Ltd.], using pure water as a liquid in a dry state (20 ° C./65% RH) Then, a droplet having a diameter of 1.0 mm was formed on the needle tip, and this was brought into contact with the surface of the film to form a droplet on the film. The angle formed between the tangent to the liquid surface and the film surface at the point where the film and the liquid are in contact with each other is defined as the contact angle.
The contact angle of the film of the present invention is preferably 94 degrees or more with respect to pure water. It is more preferably 97 degrees or more, and most preferably 101 degrees or more.

6- (11) Surface free energy The surface energy can be determined by the contact angle method, the wet heat method, and the adsorption method as described in “Basics and Applications of Wetting”, Realize, Inc., 1989.12.10. . In the case of the film of the present invention, it is preferable to use a contact angle method.
Specifically, two kinds of solutions having known surface energies are dropped on a cellulose acylate film, and at the intersection of the surface of the droplet and the surface of the film, the angle formed between the tangent line drawn on the droplet and the film surface, The surface angle of the film can be calculated by defining the angle containing the droplet as the contact angle.

The surface free energy (γs ^v : unit, mN / m) of the film of the present invention is D.I. K. Owens: J.M. Appl. Polym. Sci. , Vol. 13, p. 1741 (1969), from the contact angles θ _H2O and θ _{CH2I2 of} pure water H ₂ O and methylene iodide CH ₂ I ₂ experimentally determined on the antireflection film, It represents the surface tension of the antireflection film defined by the value γs ^v (= γs ^d + γs ^h ) represented by the sum of γs ^d and γs ^h obtained from equations a and b. The gamma] s ^v is small, the more high repellency of the surface with a low surface free energy, generally excellent antifouling property.
a. 1 + cos θ _H2O =
_{^{2√γs d (√γ H2O d / γ}} H2O v) + 2√γs h (√γ H2O h / γ H2O v)
b. 1 + cos θ _CH2I2 =
_{^{2√γs d (√γ CH2I2 d / γ}} CH2I2 v) + 2√γs h (√γ CH2I2 h / γ CH2I2 v)
γ _{H 2 O} ^d = 21.8, γ _{H 2 O} ^h = 51.0, γ _{H 2 O} ^v = 72.8,
γ _CH2I2 ^d = 49.5, _γCH2I2 ^h = 1.3, _γCH2I2 ^v = 50.8
In the contact angle measurement, after the film was conditioned for 1 hour or more at 25 ° C. and 60%, 2 μl of the droplet was formed into a film using an automatic contact angle meter CA-V150 manufactured by Kyowa Interface Science Co., Ltd. The contact angle was determined 30 seconds after dropping.

  The surface free energy of the film of the present invention is preferably 25 mN / m or less, and particularly preferably 20 mN / m or less.

6- (12) Curl The curl is measured by using the curl measurement template of Method A in “Measuring Method of Curling of Photographic Film” of JIS-K7619-1988.
The measurement conditions are 25 ° C., relative humidity 60%, and humidity control time 10 hours.
The film according to the present invention preferably has a value when curl is expressed by the following mathematical formula in a range of minus 15 to plus 15, more preferably in a range of minus 12 to plus 12, more preferably minus 10. ~ Plus 10. In this case, the measurement direction of the curl in the sample is measured in the conveyance direction of the base material in the case of application in a web form.
(Formula) Curl = 1 / R R is the radius of curvature (m)
This is an important characteristic for preventing cracks and film peeling during film production, processing, and market handling. It is preferable that the curl value is in the above range and the curl is small.
Here, “curl plus” means a curl in which the coating side of the film is inside the curve, and “minus” means a curl in which the coating side is outside the curve.

  In the film according to the present invention, the absolute value of the difference between the curl values when the relative humidity is changed to 80% and 10% based on the curl measurement method is preferably 24 to 0, and preferably 15 to 0. Is more preferable, and 8 to 0 is most preferable. This is a property related to handling, peeling and cracking when films are attached under various humidity.

6- (13) Adhesion evaluation The adhesion between the layers of the film or between the support and the coating layer can be evaluated by the following method.
Nitto Denko Co., Ltd. Polyester adhesive tape with 11 squares and 11 horizontal cuts at 1 mm intervals and a total of 100 squares on the surface of the coated layer. (NO.31B) is pressure-bonded, and the test for peeling off after leaving for 24 hours is repeated three times at the same place, and the presence or absence of peeling is visually observed.

  Of 100 squares, peeling is preferably within 10 mm, and more preferably within 2 mm.

6- (14) Brittleness test (crack resistance)
Crack resistance is an important characteristic for preventing crack defects by handling such as film application, processing, cutting, adhesive application, and application to various objects.
A film sample is cut into 35 mm x 140 mm, left to stand for 2 hours at a temperature of 25 ° C and a relative humidity of 60%, and then the curvature diameter at which cracks start to occur when rolled into a cylinder is measured to evaluate surface cracks. can do.

  The crack resistance of the film of the present invention is preferably 50 mm or less, more preferably 40 mm or less, and most preferably 30 mm or less when the film is rolled with the coating layer side facing outward. About the crack of an edge part, it is preferable that there is no crack or the length of a crack is less than 1 mm on average.

6- (15) Dust removability The film of the present invention can be attached to a monitor, dust (futon, fiber waste from clothes) can be sprinkled on the monitor surface, the dust can be wiped off with a cleaning cloth, and the dust removability can be evaluated.
It is preferable to remove completely by wiping 6 times, and it is more preferable to remove dust completely by wiping within 3 times.

6- (16) Performance of liquid crystal display device Hereinafter, a method for evaluating characteristics and a preferable situation when the film of the present invention is used on a display device will be described.
The polarizing plate on the viewing side provided in the liquid crystal display device (TH-15TA2, manufactured by Matsushita Electric Industrial Co., Ltd.) using a TN type liquid crystal cell is peeled off, and the film or polarizing plate of the present invention is used instead. It sticks through an adhesive so that the transmission side of a polarizing plate may correspond with the polarizing plate stuck on the product at the visual recognition side. In a 500 lux bright room, the liquid crystal display device is displayed in black, and the following various characteristics can be evaluated visually from various viewing angles.

<Evaluation of image unevenness and color>
Using the created liquid crystal display device, unevenness and color change during black display (L1) are visually evaluated by a plurality of observers.
It is preferable that three people or less can recognize the unevenness, left-right color change, color change due to temperature and humidity, and white blur, and more preferably no one can recognize it.
In addition, reflection of external light is performed using a fluorescent lamp, and a change in reflection can be relatively evaluated visually.

<Light leakage of black display>
The light leakage rate of black display in the azimuth direction 45 ° and polar angle direction 70 ° from the front of the liquid crystal display device is measured. The light leakage rate is preferably 0.4% or less, and more preferably 0.1% or less.

<Contrast and viewing angle>
Contrast and viewing angle were measured using a measuring machine ("EZ-Contrast 160D" ELD
The contrast ratio and the viewing angle in the left-right direction (direction perpendicular to the rubbing direction of the cell) (the width of the angle range in which the contrast ratio is 10 or more) can be examined using IM.

Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited thereto. In the following Examples and Synthesis Examples,% represents mass% unless otherwise specified.
Hereinafter, nitrogen-containing organic bases b-1 (N, N-dimethylaniline) and b-23 (diethylmethylamine) having a boiling point of 35 ° C. or more and 85 ° C. or less are used as the base of the curing catalyst of [Example 2]. The coating liquid No. Films using LLL-54, -57, -58, -59, -62, -63 are a description of the direct examples of the present invention (see Table 9).
On the other hand, the coating liquid No. [Example 1] which does not use a nitrogen-containing organic base having a boiling point of 35 ° C. or more and 85 ° C. or less as a curing catalyst while being described as “the present invention” in the specification. Films using LLL-1 to 53 (base: not used) or the like (see Tables 7 and 8), or coating solution No. in [Example 2]. The description of films using LLL-55, -56, -60, -61 (bases b-14, b-19: boiling point above 85 ° C) (see Table 9) is not an example of the present invention. These are descriptions as reference examples for understanding the present invention.

<Preparation of antireflection film>
[Synthesis of fluoropolymer]
Synthesis Example 1: Synthesis of fluorinated polymer P1 Into a 100 mL stainless steel autoclave with a stirrer, 40 mL of ethyl acetate, 14.7 g of hydroxyethyl vinyl ether (HEVE) and 0.55 g of dilauroyl peroxide were charged, and the system was deaerated. And replaced with nitrogen gas. Further, 25 g of hexafluoropropylene (HFP) was introduced into the autoclave and heated to 65 ° C. The pressure when the temperature in the autoclave reached 65 ° C. was 5.4 kg / cm ² . The reaction was continued for 8 hours while keeping the inside of the autoclave at 65 ° C. When the pressure reached 3.2 kg / cm ² , the heating was stopped and the mixture was allowed to cool.

  When the internal temperature dropped to room temperature, unreacted monomers were driven out, the autoclave was opened, and the reaction solution was taken out. The obtained reaction solution was poured into a large excess of hexane, the solvent was removed by decantation, and the precipitated polymer was taken out. Further, this polymer was dissolved in a small amount of ethyl acetate and reprecipitated twice from hexane to completely remove the residual monomer. After drying, 28 g of copolymer P1 having a molar ratio of HFP: HEVE of 1: 1 was obtained. The number average molecular weight of the obtained polymer was 15,000.

Synthesis Examples 2-5
Fluoropolymers P18, P37, P39 and P45 were synthesized in substantially the same manner as the synthesis of P1 in Synthesis Example 1 except that the raw materials were changed to those shown in Tables 1 to 5. The number average molecular weights of the obtained fluoropolymers are shown in Tables 1 and 2 above.

Synthesis Example 6: Synthesis of fluorinated polymer P49 To a stainless steel autoclave with a content of 2 dm ³ , 133.0 g of 2-butanone, 33.0 g of 2-propanol, 52.9 g of hydroxyethyl vinyl ether (HEVE), ethyl vinyl ether ( EVE) 28.8 g, Silaplane FM-0721 15.0 g, V-65 (Wako Pure Chemical Industries, Ltd. polymerization initiator) 3.9 g were charged, and the system was replaced with nitrogen gas. Further, 184.1 g of hexafluoropropylene (HFP) was introduced into the autoclave and the temperature was raised to 60 ° C. The pressure when the temperature in the autoclave reached 60 ° C. was 0.93 MPa. The reaction was continued for 8 hours while maintaining the temperature in the autoclave at 60 ° C., and then the temperature in the autoclave was increased to 80 ° C. and the reaction was continued for another 1 hour. . After the internal temperature dropped to room temperature, unreacted monomers were driven out, the autoclave was opened, and the reaction solution was taken out. The yield of the obtained polymer was 217.0 g. The number average molecular weight of the obtained polymer was 11,000.

Synthesis example 7
A fluoropolymer P54 was synthesized in substantially the same manner as the synthesis of P49 in the above synthesis example. The number average molecular weight of the obtained polymer is shown in Table 5.

Synthesis Example 8: Synthesis of p-toluenesulfonate 3.0 g of diethylmethylamine was dissolved in 30 cm ³ of 2-butanone, and 5.7 g of p-toluenesulfonic acid monohydrate was added little by little while stirring. After further stirring for 1 hour, the solvent was distilled off under reduced pressure, and the resulting solid was recrystallized from acetone to obtain diethyl methylamine salt of p-toluenesulfonic acid.

(Preparation of sol solution a)
To a reactor equipped with a stirrer and a reflux condenser, 120 parts of methyl ethyl ketone, 100 parts of acryloyloxypropyltrimethoxysilane (KBM-5103, manufactured by Shin-Etsu Chemical Co., Ltd.), 3 parts of diisopropoxyaluminum ethyl acetoacetate are added and mixed. After that, 30 parts of ion-exchanged water was added and reacted at 60 ° C. for 4 hours, and then cooled to room temperature. The mass average molecular weight was 1600, and among the components higher than the oligomer component, the component having a molecular weight of 1000 to 20000 was 100%. Further, from the gas chromatography analysis, the raw material acryloyloxypropyltrimethoxysilane did not remain at all. Sol solution a was adjusted with methyl ethyl ketone so that the solid content was 29%.

(Preparation of sol liquid b)
In a reactor equipped with a stirrer and a reflux condenser, 80 parts of acryloxypropyltrimethoxysilane, 20 parts of methyltrimethoxysilane (KBM-13, manufactured by Shin-Etsu Chemical Co., Ltd.), 3 parts of diisopropoxyaluminum ethyl acetoacetate After mixing, 3 parts of ion-exchanged water was added and reacted at 40 ° C. for 60 minutes. The mass average molecular weight was 800, and among the components higher than the oligomer component, the component having a molecular weight of 1000 to 20000 was 30%. From the gas chromatography analysis, the raw materials acryloxypropyltrimethoxysilane and methyltrimethoxysilane had a residual ratio of 10% or less.

(Preparation of hollow silica dispersion A)
Hollow silica fine particle sol (Isopropyl alcohol silica sol, average particle diameter 40 nm, shell thickness 6 nm, silica concentration 20% by mass, silica particle refractive index 1.30, prepared by changing the size according to Preparation Example 4 of JP-A-2002-79616 ) After adding 500 parts to 30 parts of acryloyloxypropyltrimethoxysilane (KBM-5103, Shin-Etsu Chemical Co., Ltd.), 2 parts of trimethylmethoxysilane, and 1.5 parts of diisopropoxyaluminum ethyl acetate, ion exchange was performed. Nine parts of water was added. After reacting at 60 ° C. for 8 hours, the mixture was cooled to room temperature, and 1.8 parts of acetylacetone was added.
While adding cyclohexanone to 500 g of this dispersion so that the silica content was almost constant, solvent substitution was performed by distillation under reduced pressure at a pressure of 20 kPa. Foreign matter was not generated in the dispersion, and the viscosity when the solid content was adjusted to 26% by mass with cyclohexanone was 10 mPa · s at 25 ° C. When the residual amount of isopropyl alcohol in the obtained dispersion A was analyzed by gas chromatography, it was 1.0%.

[Preparation of antireflection film]
[Preparation of coating solutions for low refractive index layers (LLL-1 to LLL-53)]
Each component shown in Table 7 was mixed and dissolved in MEK to prepare a coating solution for a low refractive index layer having a solid content of 8%. The values in parentheses in Table 7 represent parts by mass of the solid content of each component.

(* 1): 1: 1 mixture of sol solution a and DPHA (mass ratio)
(* 2): 3: 7 mixture of MEK-ST-L and MEK-ST (mass ratio)
(* 3): 39: 9 mixture of hollow silica and MEK-ST-L (mass ratio)
The material names and product names in Table 7 are as follows.
“MEK-ST”: Colloidal silica average particle size of 10 to 15 nm manufactured by Nissan Chemical Industries, Ltd.
“MEK-ST”: Colloidal silica average particle size of about 50 nm manufactured by Nissan Chemical Industries, Ltd.
“Hollow silica”: the hollow silica dispersion A.
The solid content in Table 7 represents the total of silica and surface treatment agent.
“Cymel 303”: methylolated melamine manufactured by Nippon Cytec Industries, Ltd., “Takenate D110”: isocyanate curing agent manufactured by Takeda Pharmaceutical Co., Ltd.
“DPHA”: Nippon Kayaku Co., Ltd. UV curable resin,
“PTS”: p-toluenesulfonic acid monohydrate.

  Ha and Hb each represent a compound having the following structure.

The fluorine-containing polymer PR1 in Table 7 is a compound having the following structure, and was synthesized under the same conditions as described in the following patents.
PR1: copolymer of Example 2 described in Japanese Patent No. 3498481,
The numbers represent the mole fraction of each monomer.

[Preparation of coating solution for antiglare layer (HCL-1)]
"PET-30" 50.0g
"Irgacure 184" 2.0g
"SX-350" (30%) 1.5g
Cross-linked acrylic-styrene particles (30%) 13.9g
"Sol liquid b" 10.0g
Toluene 38.5g

  The mixed solution was filtered through a polypropylene filter having a pore size of 30 μm to prepare a hard coat layer coating solution (HCL-1).

The compounds used are shown below.
"PET-30": A mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate {manufactured by Nippon Kayaku Co., Ltd.}
"Irgacure 184": polymerization initiator {Ciba Specialty Chemicals Co., Ltd.},
“SX-350”: Cross-linked polystyrene particles having an average particle size of 3.5 μm {refractive index: 1.60, manufactured by Soken Chemical Co., Ltd., 30% toluene dispersion. Use after dispersion at 10,000 rpm for 20 minutes in a Polytron disperser},
Cross-linked acrylic-styrene particles: average particle size 3.5 μm {refractive index 1.55, manufactured by Soken Chemical Co., Ltd., 30% toluene dispersion. Use after dispersion for 20 minutes at 10,000 rpm in a Polytron disperser}.

[Preparation of Antireflection Film Sample 101]
An 80 μm-thick triacetyl cellulose film “TAC-TD80U” {manufactured by Fuji Photo Film Co., Ltd.} is unwound in a roll form, and the hard coat layer coating solution (HCL-1) is directly Using a micro gravure roll with a diameter of 50 mm having a gravure pattern of 180 lines / in and a depth of 40 μm, and a doctor blade, it was applied under the conditions of a gravure roll rotation speed of 30 rpm and a conveyance speed of 30 m / min, and dried at 60 ° C. for 150 seconds Furthermore, using an “air-cooled metal halide lamp” {manufactured by Eye Graphics Co., Ltd.) with an oxygen concentration of 0.1 vol% under a nitrogen purge, ultraviolet rays having an irradiance of 400 mW / cm ² and an irradiation amount of 100 mJ / cm ² Was applied to cure the coating layer, and a 6 μm thick layer was formed and wound up. The surface roughness of the antiglare layer (HC-1) thus obtained was Ra = 0.18 μm, Rz = 1.40 μm, the surface haze was 12%, and the internal haze was 29%. .

On the antiglare layer thus obtained, the low refractive index layer coating liquid LLL-1 was used, and the low refractive index layer film thickness was adjusted to 95 nm. Produced. The coating solution was applied after mixing the components for 2 hours, the low refractive index layer was dried at 110 ° C. for 10 minutes, and the ultraviolet curing condition was nitrogen so that the atmosphere had an oxygen concentration of 0.01% by volume or less. While purging, a 240 W / cm “air-cooled metal halide lamp” {manufactured by Eye Graphics Co., Ltd.) was used to obtain an irradiation amount of irradiance of 120 mW / cm ² and irradiation energy intensity of 240 mJ / cm ² .

[Preparation of antireflection films 102 to 153]
In the production of the antireflection film (101), in the same manner as the antireflection film 101 except that (LLL-2) to (LLL-53) are used instead of using the coating liquid for low refractive index layer (LLL-1). Thus, antireflection films 102 to 153 were produced.

[Saponification treatment of antireflection film]
The obtained antireflection film was treated and dried under the following saponification standard conditions.
Alkaline bath: 1.5 mol / dm ³ aqueous sodium hydroxide solution at 55 ° C. for 120 seconds.
First washing bath: tap water, 60 seconds.
Neutralization bath: 0.05 mol / dm ³ sulfuric acid, 30 ° C. for 20 seconds.
Second washing bath: tap water, 60 seconds.
Drying: 120 ° C., 60 seconds.

[Evaluation of antireflection film]
The following evaluation was performed using the saponified antireflection film thus obtained.

(Evaluation 1) Measurement of average reflectance An average reflectance of 450 to 650 nm was used by the method described in the present text. As for the sample processed into the polarizing plate, the polarizing plate type is used as it is, and in the case of a display device that does not use the film itself or the polarizing plate, the back surface of the antireflection film is roughened and then blackened. Were subjected to light absorption treatment (transmittance at 380 to 780 nm was less than 10%) and measured on a black table.

(Evaluation 2) Steel Wool Scratch Resistance Evaluation Oil-based black ink was applied to the back side of the sample that had been tested and rubbed, and visually observed with reflected light, and scratches on the rubbed portion were evaluated according to the following criteria. . Load was 500g / cm ^2.
○: Even if you look very carefully, no scratches are visible.
○ △: Slightly weak scratches are visible when viewed very carefully.
Δ: Weak scratches are visible.
Δ ×: moderate scratches are visible.
X: There is a scratch that can be seen at first glance.

(Evaluation 3) Eraser abrasion scratch resistance evaluation The oil-based black ink was applied to the back side of the sample which had been tested and rubbed, and visually observed with reflected light, and the scratch on the scraped portion was evaluated according to the following criteria. .
○: Even if you look very carefully, no scratches are visible.
○ △: Slightly weak scratches are visible when viewed very carefully.
Δ: Weak scratches are visible.
Δ ×: moderate scratches are visible.
X: There is a scratch that can be seen at first glance.
XX: Single-sided film is damaged.

(Evaluation 4) Magic wiping property The test was performed by the method described in the text, and the number of times until the magic did not disappear was determined. The number of times until it no longer disappears is preferably 5 times or more, and more preferably 10 times or more.

(Evaluation 5) Dust removal property Tested by the method described herein, the number of times of wiping until dust was wiped off was determined. It is preferable to remove completely by wiping 6 times, and it is more preferable to remove dust completely by wiping within 3 times.

  The evaluation results are shown in Table 8.

As is clear from this example, the antireflective film containing the constituents of the present invention using the polymer of the present invention exceeding 20% of the hydroxyl group content of the present invention is excellent in SW abrasion resistance and eraser abrasion resistance. It turns out that it is excellent also in antifouling property. Various performance improvement by the hydroxyl group content in a fluoropolymer exceeding 20% can be shown by the comparison with the antireflection films 101-112 and 139-144.
Moreover, it turns out that magic wiping property is improved greatly by having a polysiloxane structure as a polymer graft chain (comparison of antireflection films 107-112 and 113-119).
It can also be seen that the reflectance is greatly reduced when hollow silica is used (see antireflection films 134, 135, 137, 138, and 149).

[Preparation of antireflection film]
[Preparation of coating solutions for low refractive index layer (LLL-54 to LLL-63)]
In the coating liquids LLL-17 and LLL-38 for the low refractive index layer of Example 1, coating liquids LLL-54 to 58 and LLL-59 to 63 in which the types of curing catalysts were changed as shown in Table 6 were prepared. In changing the curing catalyst, the acid was changed to be equimolar. The base was used in an amount equivalent to a 1-to-1 equivalent to the acid.

(Preparation of hard coat layer coating solution (HCL-2))
90 parts by mass of MEK, 10 parts by mass of cyclohexanone, 85 parts by mass of partially caprolactone-modified polyfunctional acrylate (DPCA-20, manufactured by Nippon Kayaku Co., Ltd.), KBM-5103 (silane coupling agent: Shin-Etsu Chemical Co., Ltd.) 10 parts by mass) and 5 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) were added and stirred. It filtered with the polypropylene filter with the hole diameter of 0.4 micrometer, and prepared the coating liquid (HCL-2) for hard-coat layers.

[Preparation and Evaluation of Antireflection Film Samples 201 to 212]
An 80 μm-thick triacetyl cellulose film “TAC-TD80U” (manufactured by Fuji Photo Film Co., Ltd.) is unwound in a roll form, and the above hard coat layer coating liquid (HCL-2) is directly Using a micro gravure roll with a diameter of 50 mm having a gravure pattern of 180 lines / in and a depth of 40 μm, and a doctor blade, it was applied under the conditions of a gravure roll rotation speed of 30 rpm and a conveyance speed of 30 m / min, and dried at 60 ° C. for 150 seconds. Further, using an “air-cooled metal halide lamp” {manufactured by Eye Graphics Co., Ltd.) having an oxygen concentration of 0.1 vol% under a nitrogen purge and having an irradiance of 400 mW / cm ² and an irradiation energy intensity of 100 mJ / cm ² The coating layer was cured by irradiating with ultraviolet rays to form a 7 μm thick layer and wound up. The surface roughness of the hard coat layer (HC-2) thus obtained was Ra = 0.005 μm and Rz = 0.01 μm.
The above-mentioned low refractive index layer was applied on the hard coat 201 according to Example 1 to produce antireflection films 201 to 212. The standard condition was 2 hours from the preparation of the low refractive index layer to the coating. In addition, a sample with a heat curing time shortened to 110 ° C.-5 minutes was produced at the same time, and subjected to saponification treatment under the same conditions as in Example 1 to evaluate the eraser rubbing resistance.
Further, the coating solution was applied after the coating solution for the low refractive index layer was stored for 1 month and 3 months at 30 ° C. with light shielding and sealing. Oil-based black ink was applied to the back surface of the coating film, and the A4 size area was evaluated according to the following criteria.
○: Even if you look very carefully, no failure is visible.
○ △: Slightly weak failure is seen when viewed very carefully (1-3 / A4).
(Triangle | delta): The weak failure is visible (4-10 pieces / A4).
X: Failure is visible at a glance (11 or more / A4).
Table 9 shows the evaluation results.

  As is clear from this example, it is understood that an antireflection film having excellent storage stability and scratch resistance can be obtained by using an acid combined with the base of the present invention as a curing catalyst.

A multilayer antireflection film shown below was prepared.
(Preparation of hard coat layer coating solution (HCL-3))
The following composition was put into a mixing tank and stirred to obtain a hard coat layer coating solution.
750.0 parts by mass of trimethylolpropane triacrylate (TMPTA, Nippon Kayaku Co., Ltd.), 270.0 parts by mass of poly (glycidyl methacrylate) having a weight average molecular weight of 15000, 730.0 parts by mass of methyl ethyl ketone, 500.0 cyclohexanone Mass parts, 25.0 parts by mass of a cationic photopolymerization initiator (Lordsil 2074), and 50.0 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals) were added and stirred.
The mixture was filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a hard coat layer coating solution (HCL-3).

(Preparation of titanium dioxide fine particle dispersion)
As the titanium dioxide fine particles, titanium dioxide fine particles (MPT-129C, manufactured by Ishihara Sangyo Co., Ltd., TiO ₂ : Co ₃ O ₄ : containing cobalt and subjected to surface treatment using aluminum hydroxide and zirconium hydroxide: Al ₂ O ₃ : ZrO ₂ = 90.5: 3.0: 4.0: 0.5 mass ratio) was used.
The following dispersant (Chemical Formula 11) 41.1 parts by mass and cyclohexanone 701.8 parts by mass were added to 257.1 parts by mass of these particles and dispersed by dynomill to prepare a titanium dioxide dispersion having a mass average diameter of 70 nm. .

(Preparation of coating solution for medium refractive index layer)
In 99.1 parts by mass of the above titanium dioxide dispersion, 68.0 parts by mass of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA), 3.6 parts by mass of a photopolymerization initiator (Irgacure 907), light A sensitizer (Kayacure DETX, manufactured by Nippon Kayaku Co., Ltd.) 1.2 parts by mass, 279.6 parts by mass of methyl ethyl ketone and 1049.0 parts by mass of cyclohexanone were added and stirred. After sufficiently stirring, the solution was filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating solution for a medium refractive index layer.

(Preparation of coating solution for high refractive index layer)
To 469.8 parts by mass of the above titanium dioxide dispersion, 40.0 parts by mass of a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate (DPHA, Nippon Kayaku Co., Ltd.), a photopolymerization initiator (Irgacure 907) 3.3 parts by mass, manufactured by Ciba Specialty Chemicals Co., Ltd., 1.1 parts by mass of photosensitizer (Kayacure-DETX, manufactured by Nippon Kayaku Co., Ltd.), 526.2 parts by mass of methyl ethyl ketone, and cyclohexanone 459 .6 parts by mass was added and stirred. The solution was filtered through a polypropylene filter having a pore size of 0.4 μm to prepare a coating solution for a high refractive index layer.

(Preparation of antireflection film (301))
The hard coat layer coating solution was applied on a triacetyl cellulose film (TD80UF, manufactured by Fuji Photo Film Co., Ltd.) having a thickness of 80 μm using a gravure coater. After drying at 100 ° C., using a 160 W / cm air-cooled metal halide lamp (manufactured by Eye Graphics Co., Ltd.) while purging with nitrogen so that the atmosphere has an oxygen concentration of 1.0 vol% or less, an irradiance of 400 mW / The coating layer was cured by irradiating ultraviolet rays having a cm ² and an irradiation amount of 300 mJ / cm ² to form a hard coat layer having a thickness of 8 μm.
On the hard coat layer, a medium refractive index layer coating solution, a high refractive index layer coating solution, and a low refractive index layer coating solution LLL-1 were continuously applied using a gravure coater having three coating stations. .

The medium refractive index layer was dried at 90 ° C. for 30 seconds, and the ultraviolet curing condition was 180 W / cm air-cooled metal halide lamp (eye graphics) while purging with nitrogen so that the atmosphere had an oxygen concentration of 0.1% by volume or less. The amount of radiation was 400 mW / cm ² and the irradiation energy intensity was 400 mJ / cm ² . The medium refractive index layer after curing had a refractive index of 1.630 and a film thickness of 67 nm.

The drying condition of the high refractive index layer is 90 ° C. for 30 seconds, and the UV curing condition is 240 W / cm air-cooled metal halide lamp (eye graphics) while purging with nitrogen so that the atmosphere has an oxygen concentration of 0.1% by volume or less. The amount of irradiation was 600 mW / cm ² and the irradiation energy intensity was 400 mJ / cm ² .
The cured high refractive index layer had a refractive index of 1.905 and a film thickness of 107 nm.

The low refractive index layer was dried at 110 ° C. for 10 minutes, and the ultraviolet curing conditions were 240 W / cm “air-cooled metal halide lamp” while purging with nitrogen so that the oxygen concentration was 0.01 vol% or less { using eye graphics Co., Ltd.}, and the irradiance 120 mW / cm ^2, irradiation amount of the irradiation energy intensity 480 mJ / cm ^2.
The low refractive index layer after curing had a refractive index of 1.45 and a film thickness of 85 nm.

Samples 302 to 353 were prepared in the same manner as the sample 301 except that the coating liquid for the low refractive index layer was changed to (LLL-2) to (LLL-53) for the sample 301 thus obtained. . As a result of the saponification treatment and evaluation according to Example 1, the reflectance of each sample was greatly reduced by providing the middle refractive index layer and the high refractive index layer. According to the present invention, it has been found that an antireflection film having low reflection and excellent magic wiping and scratch resistance can be obtained.
Furthermore, a sample in which 5% by mass of KBM-5103 (silane coupling agent: manufactured by Shin-Etsu Chemical Co., Ltd.) was added to the high refractive index layer with respect to the total solid content was evaluated. In the case of using a fluorine-containing polymer exceeding 20 mol%, the steel wool scuff resistance was particularly improved.

(Preparation of hard coat layer coating solution (HCL-4))
Desolite Z7404 (zirconia fine particle-containing hard coat composition: manufactured by JSR Corporation) 100 parts by mass, DPHA (UV curable resin: Nippon Kayaku Co., Ltd.) 31 parts by mass, KBM-5103 (silane coupling agent: Shin-Etsu) Chemical Industry Co., Ltd.) 10 parts by mass, KE-P150 (1.5 μm silica particles: Nippon Shokubai Co., Ltd.) 8.9 parts by mass, MXS-300 (3 μm cross-linked PMMA particles: manufactured by Soken Chemical Co., Ltd.) 3.4 parts by mass MEK 29 parts by mass and MIBK 13 parts by mass were charged into a mixing tank and stirred to obtain a hard coat layer coating solution.

(Preparation of antireflection film)
A triacetyl cellulose film (TD80U, manufactured by Fuji Photo Film Co., Ltd.) as a support is unrolled in a roll form, and the above coating liquid for hard coat layer has a diameter of 135 lines / inch and a gravure pattern with a depth of 60 μm. Using a 50 mm micro gravure roll and a doctor blade, the coating was carried out under conditions of a conveyance speed of 10 m / min, dried at 60 ° C. for 150 seconds, and further under a nitrogen purge, an air-cooled metal halide lamp (Igraphics Corporation) )), The coating layer was cured by irradiating ultraviolet rays having an irradiance of 400 mW / cm ² and an irradiation energy intensity of 250 mJ / cm ² to form a hard coat layer and wound up. The hard coat 301 was produced by adjusting the rotation speed of the gravure roll so that the thickness of the hard coat layer after curing was 4.0 μm. The surface roughness of the hard coat 401 thus obtained was Ra = 0.02 μm, RMS = 0.03 μm, and Rz = 0.25 μm. (Ra (center line average roughness), RMS (root mean square roughness), Rz (n-point average roughness) are measured by scanning probe microscope system SPI3800 Seiko Instruments Inc.).

  As a result of applying the low refractive index layer of Example 1 on the hard coat 401, performing saponification treatment and evaluating in accordance with Example 1, it is low reflection, scratch resistance and magic wiping according to the present invention. It was found that an antireflection film excellent in the film thickness can be obtained.

(Preparation of hard coat layer coating solution (HCL-5))
With respect to 40 parts by mass of MEK, 15 parts by mass of cyclohexanone, 28 parts by mass of a mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate (PET-30, Nippon Kayaku Co., Ltd.), dipentaerythritol pentaacrylate and dipentaerythritol hexa 12 parts by mass of a mixture of acrylates (DPHA, Nippon Kayaku Co., Ltd.), 5 parts by mass of cohesive silica (secondary agglomerated diameter 1.5 μm, primary particle diameter tens of nm, manufactured by Nippon Silica Co., Ltd.) 1 part by weight of an initiator (Irgacure 184, manufactured by Ciba Specialty Chemicals), 0.2 part by weight of a photopolymerization initiator (Irgacure 907, manufactured by Ciba Specialty Chemicals), a fluorine-based surface modifier (SP-13) 0.08 part by mass is added and stirred to obtain a coating solution for the hard coat layer HCL-5) was prepared.
・ SP-13 Fluorine surface modifier

(Coating of hard coat 501)
A triacetyl cellulose film (TAC-TD80U, manufactured by Fuji Photo Film Co., Ltd.) is unwound in a roll form, and a hard coat layer coating solution (HCL-5) is directly extruded using a coater having a throttle die. did. After applying at a transfer speed of 30 m / min, drying at 30 ° C. for 15 seconds and 90 ° C. for 20 seconds, and further using a 160 W / cm air-cooled metal halide lamp (made by Eye Graphics Co., Ltd.) under a nitrogen purge. Then, the coating layer was cured by irradiating with ultraviolet rays having an irradiation energy intensity of 90 mJ / cm ² to form an antiglare layer having an antiglare thickness of 2.5 μm, and a wound hard coat 501 was produced. The hard coat 501 had a surface haze of 6 and an internal haze of 1.

A coating solution for a low refractive index layer was prepared by adding 0.5 part by mass of PM980M (photopolymerization initiator, manufactured by Wako Pure Chemical Industries) in the coating solutions for low refractive index layer LLL-51 and LLL-53 of Example 1. .
The coating solution for the low refractive index layer was applied on the hard coat 501 and subjected to saponification treatment, and evaluation according to Example 1 was performed. As a result, it was reproduced that according to the present invention, an antireflection film having low reflection and excellent scratch resistance and magic wiping property can be obtained.

<Preparation of polarizing plate with antireflection film>
A polarizing film was prepared by adsorbing iodine to a stretched polyvinyl alcohol film. A saponified antireflection film of Example 1 was attached to one side of the polarizing film using a polyvinyl alcohol adhesive so that the support (triacetylcellulose) side of the antireflection film was the polarizing film side. . A viewing angle widening film “Wide View Film SA12B” (manufactured by Fuji Photo Film Co., Ltd.) having an optical compensation layer was saponified and attached to the other side of the polarizing film using a polyvinyl alcohol adhesive. In this way, a polarizing plate was produced. As a result of performing the evaluation according to Example 1 in this polarizing plate state, the same effect was obtained by using the low refractive index layer of the present invention.

  As a result of producing a TN mode transmissive liquid crystal display device equipped with the produced polarizing plate of the present invention, it was confirmed that the visibility, scratch resistance and antifouling property were excellent.

  When the antireflection film sample of Example 2 was bonded to the glass plate on the surface of the organic EL display device via an adhesive, reflection on the glass surface was suppressed, and a display device with high visibility was obtained.

It is a schematic sectional drawing which shows typically preferable embodiment of the film of this invention. It is a schematic sectional drawing which shows typically preferable embodiment of the film of this invention. It is a schematic sectional drawing which shows typically preferable embodiment of the film of this invention. It is a schematic sectional drawing which shows typically preferable embodiment of the film of this invention. It is a schematic sectional drawing which shows typically preferable embodiment of the film of this invention.

Explanation of symbols

(1) Support (2) Hard coat layer (3) Medium refractive index layer (4) High refractive index layer (5) Low refractive index layer

Claims (10)

A coating composition comprising , on a support, the following components (A), (B), (C) and at least one salt comprising a nitrogen-containing organic base having a boiling point of 35 ° C. or higher and 85 ° C. or lower and an acid . An antireflection film having a low refractive index layer formed by coating
(A) A polymer unit having a main chain composed of only carbon atoms, a fluorine-containing vinyl monomer polymer unit, a hydroxyl group-containing vinyl monomer polymer unit, and a graft site containing a polysiloxane repeating unit represented by the following general formula 1 in the side chain And a hydroxyl group-containing vinyl monomer polymerized unit content of more than 20 mol%. However, the polymer does not have a polysiloxane structure in the main chain.
(B) A crosslinking agent capable of reacting with a hydroxyl group.
(C) A compound containing two or more (meth) acryloyl groups in one molecule.
General formula 1

(In formula (1), R ¹ and R ² may be the same or different and each represents an alkyl group or an aryl group. P represents an integer of 10 to 500.) The coating composition further comprises (D) an organosilane compound or a composition composed of a hydrolyzate of the organosilane compound and / or a partial condensate thereof . Anti-reflection film.   The antireflection film according to claim 1 or 2, wherein the coating composition further comprises (E) inorganic particles having a particle size of 1 nm to 100 nm. The antireflection film according to claim 3, wherein the inorganic particles are hollow silica particles.   The antireflection according to any one of claims 1 to 4, wherein the coating composition further comprises (F) a polysiloxane compound containing a hydroxyl group or a functional group that reacts with the hydroxyl group to form a bond. Film. Antireflection film according to any one of claims 1 to 5 organic base having a pKa of conjugate acid and wherein the 5.0 to 10.5 der Turkey. There is at least one layer having a higher refractive index than the low refractive index layer between the support and the low refractive index layer, and the layer is an organosilane compound or a hydrolyzate of the organosilane compound and / or its antireflection film according to any one of claims 1 to 6, characterized in that it contains composition comprised partial condensate. A polarizing plate antireflection film according to any one of claims 1 to 7, characterized in that is used in one of two protective films of the polarizing film in the polarizing plate. The image display apparatus characterized by polarizing plate according to the antireflection film or claim 8 according to any one of claims 1 to 7 is used on the outermost surface of a display. A coating composition comprising, on a support, the following components (A), (B), (C) and at least one salt comprising a nitrogen-containing organic base having a boiling point of 35 ° C. or higher and 85 ° C. or lower and an acid. Is applied to form a low refractive index layer.
(A) A polymer unit having a main chain composed of only carbon atoms, a fluorine-containing vinyl monomer polymer unit, a hydroxyl group-containing vinyl monomer polymer unit, and a graft site containing a polysiloxane repeating unit represented by the following general formula 1 in the side chain And a hydroxyl group-containing vinyl monomer polymerized unit content of more than 20 mol%. However, the polymer does not have a polysiloxane structure in the main chain.
(B) A crosslinking agent capable of reacting with a hydroxyl group.
(C) A compound containing two or more (meth) acryloyl groups in one molecule.
General formula 1

  (In formula (1), R ¹ , R ² May be the same or different and each represents an alkyl group or an aryl group. p represents an integer of 10 to 500. )

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