JP4871007B2 - Catalyst filling method and catalyst filling apparatus - Google Patents

Catalyst filling method and catalyst filling apparatus Download PDF

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JP4871007B2
JP4871007B2 JP2006095432A JP2006095432A JP4871007B2 JP 4871007 B2 JP4871007 B2 JP 4871007B2 JP 2006095432 A JP2006095432 A JP 2006095432A JP 2006095432 A JP2006095432 A JP 2006095432A JP 4871007 B2 JP4871007 B2 JP 4871007B2
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catalyst
reaction vessel
catalyst filling
buffer space
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JP2007268373A (en
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規寿 神家
満秋 越後
征雄 安田
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Osaka Gas Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

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Description

本発明は、反応容器に触媒を充填するための触媒充填方法、およびその方法の実施に用いる触媒充填装置に関する。より詳細には、本発明は、固体高分子型燃料電池発電システムにおいて、原料ガスを改質するための改質装置等に使用される反応容器に触媒を充填するための触媒充填方法、およびその方法の実施に用いる触媒充填装置に関する。   The present invention relates to a catalyst filling method for filling a reaction vessel with a catalyst, and a catalyst filling apparatus used for carrying out the method. More specifically, the present invention relates to a catalyst filling method for filling a catalyst in a reaction vessel used in a reformer for reforming a raw material gas in a polymer electrolyte fuel cell power generation system, and the The present invention relates to a catalyst filling apparatus used for carrying out the method.

固体高分子型燃料電池発電システムは、原料ガスから水素を得る改質装置、水素と酸素とから電気を生成する固体高分子型燃料電池、排熱を回収する排熱回収装置等で構成されている。これらの装置のうち改質装置は、水蒸気を用いて原料ガスを水素に改質する改質器、改質器の出口ガス(水素)中の一酸化炭素を二酸化炭素に変成するCO変成器、CO変成器の出口ガス(二酸化炭素)中に残存する一酸化炭素を高度に除去するCO除去器等を備えており、改質器、CO変成器、およびCO除去器の夫々は、各反応を進行させるために、触媒を反応容器に充填して構成されている。
このような改質器等を製造するにあたり、反応容器を組み立てる途中段階において触媒を充填する技術としては、例えば、特許文献1に示すものがあった。
特許文献1の触媒充填方法およびその装置は、触媒導入管に接続された触媒充填用管路を反応器の触媒充填空間に連通させ、吸引装置を用いて触媒導入管より吸入した触媒を、前記触媒充填用管路を介して触媒充填空間に供給するものである。
A polymer electrolyte fuel cell power generation system includes a reformer that obtains hydrogen from a raw material gas, a polymer electrolyte fuel cell that generates electricity from hydrogen and oxygen, an exhaust heat recovery device that recovers exhaust heat, and the like. Yes. Among these apparatuses, the reformer is a reformer that reforms the raw material gas into hydrogen using steam, a CO converter that converts carbon monoxide in the outlet gas (hydrogen) of the reformer into carbon dioxide, A CO remover that highly removes carbon monoxide remaining in the outlet gas (carbon dioxide) of the CO converter is provided. Each of the reformer, the CO converter, and the CO remover performs each reaction. In order to proceed, the reaction vessel is filled with a catalyst.
In manufacturing such a reformer or the like, as a technique for filling the catalyst in the middle of assembling the reaction vessel, for example, there is one shown in Patent Document 1.
In the catalyst filling method and apparatus of Patent Document 1, the catalyst filling pipe connected to the catalyst introduction pipe is communicated with the catalyst filling space of the reactor, and the catalyst sucked from the catalyst introduction pipe using the suction device is The catalyst is supplied to the catalyst filling space via the catalyst filling pipe line.

特開2004−231496号公報JP 2004-231396 A

固体高分子型燃料電池発電システムの改質装置を大量生産しようとする場合、反応容器への触媒の充填を自動的に行うことが好ましい。しかしながら、上記特許文献1に代表される従来の触媒充填方法および装置では、触媒充填空間(反応容器)に吸引装置や触媒容器を接続して密閉状態にしておく必要があることから、触媒の自動充填を行うことは想定していないものと考えられる。従って、特許文献1の技術に自動充填をそのまま適用し、大量生産を行ったとしても、触媒投入量の把握が困難なため、反応容器中での触媒の充填状態(例えば、充填量や充填密度)にムラが発生する場合がある。
例えば、反応容器中の触媒充填量が不足している場合、輸送時や設置工事等の際に反応容器が傾くと内部の触媒が偏ることがある。このような場合、反応ガスは、図4に示すように、触媒の堆積量が少ない側に偏流し、触媒と反応ガスとの均等な接触ができなくなると考えられる。また、触媒充填量が過剰である場合も、気流が触媒間をスムーズに通過できなくなることから、図5に示すように、反応ガスは触媒全体に行き渡ることができなくなり、偏流が発生し易くなるものと考えられる。
従って、特許文献1等の従来技術によって製造した改質装置では、反応ガスの偏流が生じ易くなる等の理由により、所定の性能を発揮することができないという問題がある。
When mass production of the reformer of the polymer electrolyte fuel cell power generation system is desired, it is preferable to automatically fill the reaction vessel with the catalyst. However, in the conventional catalyst filling method and apparatus represented by the above-mentioned Patent Document 1, it is necessary to connect a suction device or a catalyst container to the catalyst filling space (reaction vessel) and keep it in a sealed state. It is considered that filling is not assumed. Therefore, even if automatic filling is applied as it is to the technique of Patent Document 1 and mass production is performed, it is difficult to grasp the amount of catalyst input, and therefore the state of catalyst filling in the reaction vessel (for example, filling amount and packing density). ) May be uneven.
For example, when the catalyst filling amount in the reaction vessel is insufficient, the internal catalyst may be biased when the reaction vessel is inclined during transportation or installation work. In such a case, as shown in FIG. 4, it is considered that the reaction gas drifts to the side where the amount of deposited catalyst is small, and the catalyst and the reaction gas cannot be evenly contacted. Further, even when the catalyst filling amount is excessive, since the airflow cannot pass smoothly between the catalysts, the reaction gas cannot spread over the entire catalyst as shown in FIG. It is considered a thing.
Therefore, the reformer manufactured by the conventional technology such as Patent Document 1 has a problem that the predetermined performance cannot be exhibited because the drift of the reaction gas is likely to occur.

本発明は上記問題点に鑑みてなされたものであり、その目的とするところは、触媒の自動充填にも対応可能な触媒充填方法、およびこれに用いる触媒充填装置を提供することにある。   The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a catalyst filling method that can cope with automatic filling of a catalyst and a catalyst filling device used therefor.

本発明に係る触媒充填方法の特徴構成は、受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に触媒を供給する供給工程と、
前記反応容器中に堆積した前記触媒に、前記反応容器を振動させる振動装置および前記触媒充填空間に気流を導入する通気装置のうちの少なくとも一方を用いて外力を作用させて前記触媒の堆積面の高さを均等化する均等化工程と、
均等化した前記堆積面が予め設定した所定の高さ位置に達したか否かをセンサにより検知する検知工程と、を包含することにある。
The characteristic configuration of the catalyst filling method according to the present invention is a supply step of supplying a catalyst to a reaction vessel provided with a receiving member and a holding member and partitioned inside a first buffer space, a catalyst filling space, and a second buffer space; ,
The catalyst deposited in said reaction vessel, said reaction vessel by applying a force using at least one of the venting device for introducing the air flow to the vibration device and the catalyst filling space vibrate the deposition surface of the catalyst An equalization process to equalize the height;
And a detection step of detecting by a sensor whether or not the equalized deposition surface has reached a predetermined height position set in advance.

本構成の触媒充填方法は、受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に対して行うものであり、当該方法において、均等化工程によって高さを均等化させた触媒の堆積面が、予め設定した所定の高さ位置に達したか否かを検知する検知工程を実行する。このため、受け部材と押え部材とによって区画された触媒充填空間に触媒を略過不足なく充填することが可能となり、適切な触媒充填密度を実現することができる。本構成の触媒充填方法は、自動充填にも対応できるものである。
また、上記触媒充填空間は、第1バッファ空間および第2バッファ空間に挟まれた状態にあるので、反応ガスを反応容器に入れると、第1バッファ空間または第2バッファ空間においてガス圧が平均化される。このため、反応ガスの偏流等が発生せず、反応ガスは触媒充填空間全体に行き渡って均等な接触が実現される。
The catalyst filling method of the present configuration is performed on a reaction vessel in which a receiving member and a pressing member are provided and the inside is partitioned into a first buffer space, a catalyst filling space, and a second buffer space. A detection step is performed for detecting whether or not the catalyst deposition surface whose height has been equalized by the equalization step has reached a predetermined height position set in advance. For this reason, it becomes possible to fill the catalyst filling space defined by the receiving member and the pressing member without substantial excess and deficiency, and to realize an appropriate catalyst filling density. The catalyst filling method of this configuration can also cope with automatic filling.
Further, since the catalyst filling space is sandwiched between the first buffer space and the second buffer space, when the reaction gas is put into the reaction vessel, the gas pressure is averaged in the first buffer space or the second buffer space. Is done. For this reason, the drift of the reaction gas does not occur, and the reaction gas spreads over the entire catalyst filling space to achieve uniform contact.

そして、本構成の触媒充填方法においては、反応容器を振動させる振動装置を用いることにより、反応容器内部に堆積した触媒の堆積面の高さが確実に均等化され、触媒が押え部材の高さ位置に達したときも略平坦な堆積面を形成することができる。このため、触媒を触媒充填空間に過不足なく充填することが可能となり、触媒全体の充填密度も略一定となって、触媒と反応ガスとを接触させる際における反応ガスの偏流を確実に無くすことができる。 In the catalyst filling method of this configuration, by using a vibration device that vibrates the reaction vessel, the height of the deposited surface of the catalyst deposited inside the reaction vessel is surely equalized, and the catalyst has a height of the holding member. Even when the position is reached, a substantially flat deposition surface can be formed. For this reason, the catalyst can be filled in the catalyst filling space without excess or deficiency, the packing density of the entire catalyst becomes substantially constant, and the drift of the reaction gas is reliably eliminated when the catalyst and the reaction gas are brought into contact with each other. Can do.

本発明に係る触媒充填方法の更なる特徴構成は、前記通気装置は、前記第1バッファ空間および前記第2バッファ空間の少なくとも何れか一方から気流を導入する点にある Further characteristic feature of the catalyst filling method of the present invention, the venting device is that the introduction of the air flow from at least one of said first buffer space and the second buffer space.

本構成の触媒充填方法においては、第1バッファ空間および第2バッファ空間の少なくとも何れか一方から気流を導入する通気装置を用いることにより、反応容器内部の触媒充填空間において触媒を流動させて攪拌することができる。この攪拌された触媒が再度堆積すると、堆積表面は平坦になって確実に均等化され、触媒全体の充填密度も略一定になる。このため、触媒と反応ガスとを接触させる際における反応ガスの偏流を確実に無くすことができる。   In the catalyst filling method of this configuration, the catalyst is fluidized and stirred in the catalyst filling space inside the reaction vessel by using a venting device that introduces an air flow from at least one of the first buffer space and the second buffer space. be able to. When the stirred catalyst is deposited again, the deposited surface is flattened to ensure equalization, and the packing density of the entire catalyst becomes substantially constant. For this reason, the drift of the reaction gas when the catalyst and the reaction gas are brought into contact with each other can be reliably eliminated.

本発明に係る触媒充填装置の特徴構成は、受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に触媒を供給するべく、当該反応容器に対して挿入深さを変更可能なノズルと、前記反応容器中に堆積した前記触媒に外力を作用させて、前記触媒の堆積状態を変化させる外力付与手段と、前記ノズル中の前記触媒の流動状態を検知するセンサと、を備え
前記外力付与手段は、前記反応容器を振動させる振動装置および前記触媒充填空間に気流を導入する通気装置のうちの少なくとも一方としたことにある。
The characteristic configuration of the catalyst filling device according to the present invention is that the receiving member and the holding member are provided, and the catalyst is supplied to a reaction vessel partitioned into a first buffer space, a catalyst filling space, and a second buffer space. A nozzle capable of changing the insertion depth with respect to the reaction vessel; an external force applying means for applying an external force to the catalyst deposited in the reaction vessel to change a deposition state of the catalyst; and the catalyst in the nozzle comprising a sensor for detecting a flow state, and
The external force applying means is at least one of a vibration device for vibrating the reaction vessel and a venting device for introducing an air flow into the catalyst filling space .

本構成の触媒充填装置においては、前記触媒充填方法と同様の作用効果が得られるものである。すなわち、本構成の触媒充填装置は、受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に触媒を供給するべく、当該反応容器に対して挿入深さを変更可能なノズルと、反応容器中に堆積した触媒に外力を作用させて、触媒の堆積状態を変化させる外力付与手段と、ノズル中の触媒の流動状態を検知するセンサとを備えている。このため、受け部材と押え部材とによって区画された触媒充填空間に触媒を略過不足なく充填することが可能となり、適切な触媒充填密度を実現することができる。本構成の触媒充填装置は、自動充填にも対応できるものである。
また、上記触媒充填空間は、第1バッファ空間および第2バッファ空間に挟まれた状態にあるので、反応ガスを反応容器に入れると、第1バッファ空間または第2バッファ空間においてガス圧が平均化される。このため、反応ガスの偏流等が発生せず、反応ガスは触媒充填空間全体に行き渡って均等な接触が実現される。
In the catalyst filling apparatus of this configuration, the same effects as those of the catalyst filling method can be obtained. That is, the catalyst filling device of this configuration is provided with a receiving member and a holding member, and the reaction vessel is supplied to the reaction vessel that is partitioned into a first buffer space, a catalyst filling space, and a second buffer space. A nozzle capable of changing the insertion depth, external force applying means for applying an external force to the catalyst accumulated in the reaction vessel to change the catalyst accumulation state, and a sensor for detecting the flow state of the catalyst in the nozzle And. For this reason, it becomes possible to fill the catalyst filling space defined by the receiving member and the pressing member without substantial excess and deficiency, and to realize an appropriate catalyst filling density. The catalyst filling device of this configuration can also cope with automatic filling.
Further, since the catalyst filling space is sandwiched between the first buffer space and the second buffer space, when the reaction gas is put into the reaction vessel, the gas pressure is averaged in the first buffer space or the second buffer space. Is done. For this reason, the drift of the reaction gas does not occur, and the reaction gas spreads over the entire catalyst filling space to achieve uniform contact.

本発明に係る触媒充填装置の更なる特徴構成は、前記反応容器に対して前記ノズルの挿入深さを変更することにより、前記ノズルの先端部の高さ位置を所定の高さ位置に調整可能である点にある。 A further characteristic configuration of the catalyst filling device according to the present invention is that the height position of the tip of the nozzle can be adjusted to a predetermined height position by changing the insertion depth of the nozzle with respect to the reaction vessel. In that point.

本構成の触媒充填装置においては、ノズルの先端部の高さ位置を調整することができるので、反応容器の形状等に応じた最適な触媒充填状態を容易に実現することができる。   In the catalyst filling apparatus of this configuration, the height position of the tip of the nozzle can be adjusted, so that an optimum catalyst filling state according to the shape of the reaction vessel and the like can be easily realized.

本発明に係る触媒充填装置の更なる特徴構成は、前記振動装置は、前記反応容器に当接する当接部と、当該当接部に振動を伝達する駆動モータと、を備えた点にある Further characteristic feature of the catalyst loading apparatus according to the present invention, the vibration device is said reaction in contact with the container abutment, in that and a driving motor for transmitting the vibration to the abutting portion.

本構成の触媒充填装置においても、前記触媒充填方法と同様の作用効果が得られるものである。すなわち、本構成の触媒充填装置では、外力付与手段として振動装置を用いることにより、反応容器内部に堆積した触媒の堆積面の高さが確実に均等化され、触媒が押え部材の高さ位置に達したときも略平坦な堆積面を形成することができる。このため、触媒を触媒充填空間に過不足なく充填することが可能となり、触媒全体の充填密度も略一定となって、触媒と反応ガスとを接触させる際における反応ガスの偏流を確実に無くすことができる。   Also in the catalyst filling apparatus of this configuration, the same effect as the catalyst filling method can be obtained. That is, in the catalyst filling apparatus of this configuration, the vibration device is used as the external force applying means, so that the height of the deposited surface of the catalyst deposited inside the reaction vessel is reliably equalized, and the catalyst is positioned at the height position of the presser member. Even when it reaches, a substantially flat deposition surface can be formed. For this reason, the catalyst can be filled in the catalyst filling space without excess or deficiency, the packing density of the entire catalyst becomes substantially constant, and the drift of the reaction gas is reliably eliminated when the catalyst and the reaction gas are brought into contact with each other. Can do.

本発明に係る触媒充填装置の更なる特徴構成は、前記通気装置は、前記第1バッファ空間および前記第2バッファ空間の少なくとも何れか一方から気流を導入する点にある Further characteristic feature of the catalyst loading apparatus according to the present invention, the venting device is that the introduction of the air flow from at least one of said first buffer space and the second buffer space.

本構成の触媒充填装置においても、前記触媒充填方法と同様の作用効果が得られるものである。すなわち、本構成の触媒充填装置では、外力付与手段として第1バッファ空間および第2バッファ空間の少なくとも何れか一方から気流を導入する通気装置を用いることにより、反応容器内部の触媒充填空間において触媒を流動させて攪拌することができる。この攪拌された触媒が再度堆積すると、堆積表面は平坦になって確実に均等化され、触媒全体の充填密度も略一定になる。このため、触媒と反応ガスとを接触させる際における反応ガスの偏流を確実に防止することができる。   Also in the catalyst filling apparatus of this configuration, the same effect as the catalyst filling method can be obtained. That is, in the catalyst filling apparatus of the present configuration, the aeration apparatus that introduces an air flow from at least one of the first buffer space and the second buffer space is used as the external force applying means, so that the catalyst is contained in the catalyst filling space inside the reaction vessel. It can be fluidized and stirred. When the stirred catalyst is deposited again, the deposited surface is flattened to ensure equalization, and the packing density of the entire catalyst becomes substantially constant. For this reason, the drift of the reaction gas when the catalyst and the reaction gas are brought into contact with each other can be reliably prevented.

以下、本発明の実施の形態を図面に基づいて説明する。なお、本発明は以下の実施の形態および図面に記載される構成に限定されるものではなく、これらと均等な構成も含み得る。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, this invention is not limited to the structure described in the following embodiment and drawing, The structure equivalent to these can also be included.

図1は、本発明の触媒充填装置100の概略斜視図である。触媒充填装置100は、例えば、固体高分子型燃料電池発電システムの改質装置に使用される反応容器50に、白金触媒、パラジウム触媒、ルテニウム触媒等の触媒Cを充填するために用いられるものである。触媒充填装置100は、ノズル10およびセンサ20を備え、さらに後述の外力付与手段を備えている。   FIG. 1 is a schematic perspective view of a catalyst filling apparatus 100 of the present invention. The catalyst filling device 100 is used, for example, for filling a reaction vessel 50 used in a reforming device of a polymer electrolyte fuel cell power generation system with a catalyst C such as a platinum catalyst, a palladium catalyst, or a ruthenium catalyst. is there. The catalyst filling device 100 includes a nozzle 10 and a sensor 20, and further includes an external force applying unit described later.

触媒充填装置100によって触媒Cを充填する対象となる反応容器50は、筐体51、受け部材52および押え部材53を備えている。受け部材52は筐体51の内部下方に、押え部材53は筐体51の内部上方に夫々設けられ、反応容器50の内部空間を、第1バッファ空間S1、触媒充填空間S2、および第2バッファ空間S3に区画している。
受け部材52は、その周囲が筐体51の下方内周面に溶接等によって接続された板状の部材である。この板状の受け部材52は、第2バッファ空間S3と触媒充填空間S2とに亘ってガスを通気させることができるように、多数の孔を備えている。受け部材52としては、例えば、パンチングメタルやメッシュ部材等を採用することができる。孔径またはメッシュサイズは、触媒Cの抜け落ちを防止するために触媒Cの平均粒径よりも小さくしておく。
一方、押え部材53は、その周囲が筐体51の上方内周面に溶接等によって接続された板状の部材である。押え部材53を溶接する高さ位置hを変更することにより、反応容器50に充填する触媒Cの充填量を決定することができる。押え部材53は、第1バッファ空間S1と触媒充填空間S2とに亘ってガスを通気させることができるように、多数の孔を備えている。この押え部材53も上記受け部材52と同様に、例えば、孔径またはメッシュサイズが触媒Cの平均粒径よりも小さいパンチングメタルやメッシュ部材等を採用することができる。さらにこの押え部材53には、触媒Cを充填するための充填孔54が設けられている。
筐体51は、例えば、皿状の2つの金属製容器形成部材をプレス加工等によって形成し、両者の周縁部を合わせて溶接することにより構成可能である。また、筐体51の上部にも、押え部材53の充填口54に対応する位置に、触媒Cを充填するための外部充填口55が設けられている。さらに、受け部材52を溶接した位置より下方の筐体51の側面には、第2バッファ空間S3に気流を流通させる導管56が取り付けられている。
A reaction vessel 50 that is to be filled with the catalyst C by the catalyst filling device 100 includes a housing 51, a receiving member 52, and a pressing member 53. The receiving member 52 is provided below the inside of the housing 51, and the pressing member 53 is provided above the inside of the housing 51, and the internal space of the reaction vessel 50 is divided into the first buffer space S1, the catalyst filling space S2, and the second buffer. It is partitioned into a space S3.
The receiving member 52 is a plate-like member whose periphery is connected to the lower inner peripheral surface of the housing 51 by welding or the like. The plate-shaped receiving member 52 has a large number of holes so that gas can be passed through the second buffer space S3 and the catalyst filling space S2. As the receiving member 52, for example, a punching metal or a mesh member can be employed. The pore size or mesh size is made smaller than the average particle size of the catalyst C in order to prevent the catalyst C from falling off.
On the other hand, the pressing member 53 is a plate-like member whose periphery is connected to the upper inner peripheral surface of the casing 51 by welding or the like. By changing the height position h at which the presser member 53 is welded, the filling amount of the catalyst C filled in the reaction vessel 50 can be determined. The pressing member 53 has a large number of holes so that gas can be passed through the first buffer space S1 and the catalyst filling space S2. Similarly to the receiving member 52, for example, a punching metal or a mesh member whose hole diameter or mesh size is smaller than the average particle diameter of the catalyst C can be used for the pressing member 53. Further, the holding member 53 is provided with a filling hole 54 for filling the catalyst C.
The housing 51 can be configured by, for example, forming two dish-shaped metal container forming members by press working or the like, and welding the peripheral portions of the two together. In addition, an external filling port 55 for filling the catalyst C is also provided at an upper portion of the casing 51 at a position corresponding to the filling port 54 of the pressing member 53. Further, a conduit 56 for circulating the airflow in the second buffer space S3 is attached to the side surface of the casing 51 below the position where the receiving member 52 is welded.

触媒充填装置100のノズル10は、反応容器50に触媒Cを供給するために使用され、反応容器50に対して挿入深さを変更可能に構成されている。ノズル10は、筐体51の外部充填口55、および押え部材53の充填口54を介して、反応容器50の内部に向けられている。このようなノズル10を使用すると、触媒Cが反応容器50の外に飛散せず、確実に反応容器50に充填することができる。
また、ノズル10の先端部10aは、ノズル10の挿入深さを変更することにより、高さ位置を調整することができる。このため、反応容器50の形状等に応じてノズル10の先端部10aの高さ位置を選択でき、良好な触媒充填状態を容易に得ることができる。
なお、ノズル10の先端部10aを押え部材53の高さ位置hと略同じ位置に調整しておけば、一回の充填作業で触媒Cを最大量供給することができる。
The nozzle 10 of the catalyst filling device 100 is used to supply the catalyst C to the reaction vessel 50 and is configured such that the insertion depth can be changed with respect to the reaction vessel 50. The nozzle 10 is directed to the inside of the reaction vessel 50 through the external filling port 55 of the housing 51 and the filling port 54 of the pressing member 53. When such a nozzle 10 is used, the catalyst C does not scatter outside the reaction vessel 50 and can be reliably filled into the reaction vessel 50.
Further, the height position of the tip portion 10 a of the nozzle 10 can be adjusted by changing the insertion depth of the nozzle 10. For this reason, the height position of the front-end | tip part 10a of the nozzle 10 can be selected according to the shape etc. of the reaction container 50, and a favorable catalyst filling state can be obtained easily.
If the tip 10a of the nozzle 10 is adjusted to a position substantially the same as the height position h of the pressing member 53, the maximum amount of the catalyst C can be supplied in one filling operation.

触媒充填装置100のセンサ20は、ノズル10中を流動する触媒Cの流動状態を検知することができる。詳細は後述の「触媒充填方法」において説明するが、例えば、ノズル10の先端部10aが押え部材53の高さ位置hと略同じ位置に設定されている場合、ノズル10から放出された触媒Cが押え部材53の高さ位置に達すると、ノズル10からの触媒Cの供給が停止される。これを流動状態の変化としてセンサ20が検知することにより、所定の触媒充填量に達したか否かを判断できるのである。
センサ20としては、例えば、ノズル10の触媒Cが通過する箇所を挟み込むように設置された赤外線発光素子20aおよび赤外線検出素子20bからなる赤外線検出装置を採用することができる。
The sensor 20 of the catalyst filling device 100 can detect the flow state of the catalyst C flowing through the nozzle 10. Details will be described in the “catalyst filling method” described later. For example, when the tip portion 10 a of the nozzle 10 is set at a position substantially the same as the height position h of the pressing member 53, the catalyst C discharged from the nozzle 10 is used. Reaches the height position of the pressing member 53, the supply of the catalyst C from the nozzle 10 is stopped. By detecting this as a change in the flow state, the sensor 20 can determine whether or not a predetermined catalyst filling amount has been reached.
As the sensor 20, for example, an infrared detecting device including an infrared light emitting element 20 a and an infrared detecting element 20 b installed so as to sandwich a portion through which the catalyst C of the nozzle 10 passes can be employed.

触媒充填装置100は、さらに、反応容器50中に堆積した触媒Cに外力を作用させて、触媒Cの堆積状態を変化させる外力付与手段を備えている。外力付与手段は、図1に示すように、反応容器50を振動させる振動装置(例えば、バイブレータ)30や、第1バッファ空間S1および第2バッファ空間S3の少なくとも何れか一方から気流を導入する通気装置(例えば、ブロア)40等の機械的手段によって構成することができる。
振動装置30は、例えば、反応容器50に当接する当接部31と、当該当接部31に振動を伝達する駆動モータ32とを備えた構成のものを用いることができる。
通気装置40は、例えば、筐体51の下方の導管56に接続し、受け部材52の孔を介して触媒充填空間S2中に気流を圧送可能な構成のものを用いることができる。なお、筐体51の上方に別の導管(図示せず)を設け、これに通気装置40を接続して押え部材53の孔を介して触媒充填空間S2中に気流を圧送可能にしてもよい。
上記の他に、反応容器50を傾けたり振ったりして、触媒Cの堆積面の高さを均等化することをもって外力付与手段とすることも可能である。
外力付与手段については、後述の「触媒充填方法」において具体的に説明する。
The catalyst filling device 100 further includes an external force applying unit that applies an external force to the catalyst C deposited in the reaction vessel 50 to change the deposition state of the catalyst C. As shown in FIG. 1, the external force applying means is a ventilation device that introduces an airflow from a vibration device (for example, a vibrator) 30 that vibrates the reaction vessel 50 or at least one of the first buffer space S1 and the second buffer space S3. It can be constituted by mechanical means such as an apparatus (for example, blower) 40 or the like.
As the vibration device 30, for example, a configuration including a contact portion 31 that contacts the reaction vessel 50 and a drive motor 32 that transmits vibration to the contact portion 31 can be used.
For example, the venting device 40 may be configured to be connected to the conduit 56 below the casing 51 and capable of pumping an airflow into the catalyst filling space S <b> 2 through the hole of the receiving member 52. Note that another conduit (not shown) may be provided above the casing 51, and the ventilation device 40 may be connected to the conduit 51 so that the airflow can be pumped into the catalyst filling space S2 through the hole of the pressing member 53. .
In addition to the above, it is also possible to use the external force applying means by equalizing the height of the catalyst C deposition surface by tilting or shaking the reaction vessel 50.
The external force applying means will be specifically described in “Catalyst filling method” described later.

次に、本発明の触媒充填方法に関する実施形態について、図2および3を参照しながら説明する。   Next, an embodiment relating to the catalyst filling method of the present invention will be described with reference to FIGS.

<第1実施形態>
図2の(a)〜(e)は、本発明の第1実施形態による触媒充填方法を説明するための概略図である。各図においてノズル10に描かれている矢印は触媒Cが供給状態であることを示しており、矢印が長いほど単位時間当たりの触媒供給量が多いことを意味する。
<First Embodiment>
(A)-(e) of Drawing 2 is a schematic diagram for explaining the catalyst filling method by a 1st embodiment of the present invention. In each figure, the arrow drawn on the nozzle 10 indicates that the catalyst C is in the supply state, and the longer the arrow, the greater the amount of catalyst supply per unit time.

初めに、反応容器50中に触媒Cの供給を開始する(図2(a))。しばらくすると、ノズル10の真下付近を中心として触媒Cが堆積し、堆積面の高さが不均等になる(図2(b))。そこで、触媒Cの堆積面の高さの均等化を行う。この均等化は、振動装置(例えば、バイブレータ)30を用いて行うことができる。図2(b)のように触媒Cの堆積面の高さが不均等である場合において振動装置30を起動すると、触媒Cに振動が付与され触媒Cが流動し、やがて堆積面が均等化される。図2(b)中の点線が均等化後の堆積面である。また、反応容器50中の触媒Cの堆積量が多くなると、ノズル10の先端部10a付近に堆積した触媒Cが溜まり易くなり、触媒供給量はやや減少する(図2(c))。この場合にも、上記と同様の方法により均等化を適宜行う。図2(c)の点線が均等化後の堆積面である。やがて、触媒Cが反応容器50の内部の押え部材53の高さ位置まで堆積すると、ノズル10からの触媒Cの供給が停止される(図2(d))。これをセンサ20によって検知し、反応容器50中の触媒Cが押え部材53の高さ位置に達して充填が終了したと判断する。   First, the supply of the catalyst C into the reaction vessel 50 is started (FIG. 2 (a)). After a while, the catalyst C is deposited around the vicinity of the nozzle 10 and the height of the deposited surface becomes uneven (FIG. 2B). Therefore, the height of the deposited surface of the catalyst C is equalized. This equalization can be performed using a vibration device (for example, a vibrator) 30. When the vibration device 30 is activated in the case where the height of the deposition surface of the catalyst C is uneven as shown in FIG. 2B, the vibration is applied to the catalyst C, the catalyst C flows, and the deposition surface is eventually equalized. The The dotted line in FIG. 2B is the deposition surface after equalization. Further, when the amount of catalyst C deposited in the reaction vessel 50 increases, the catalyst C deposited near the tip 10a of the nozzle 10 tends to accumulate, and the amount of catalyst supply decreases slightly (FIG. 2 (c)). Also in this case, equalization is appropriately performed by the same method as described above. The dotted line in FIG. 2C is the deposition surface after equalization. Eventually, when the catalyst C accumulates to the height position of the pressing member 53 inside the reaction vessel 50, the supply of the catalyst C from the nozzle 10 is stopped (FIG. 2 (d)). This is detected by the sensor 20 and it is determined that the catalyst C in the reaction vessel 50 has reached the height position of the pressing member 53 and has been filled.

以上のように、上記第1実施形態による触媒充填方法においては、センサ20がノズル10中の触媒Cの流動状態を検知することにより、均等化した堆積面が予め設定した所定の高さ位置(上記第1実施形態では、押え部材53の高さ位置h)に達したか否かを検知することができる。このため、触媒Cの充填が行われる反応容器50が既に組み立て済みのものであっても、適切に触媒を充填することができる。すなわち、受け部材52と押え部材53とによって区画された触媒充填空間S2に触媒Cが略過不足なく充填され、適切な充填密度となる。従って、本実施形態の触媒充填方法は、自動充填にも適した方法である。
また、触媒Cが適切に充填された触媒充填空間S2は、第1バッファ空間S1および第2バッファ空間S3に挟まれた状態にあるので、反応ガスを反応容器50に入れると、第1バッファ空間S1または第2バッファ空間S3においてガス圧が平均化される。このため、図2(e)に示すように、反応ガスは偏流等を起こさず、触媒充填空間S2全体に行き渡って触媒Cとの均等な接触が可能となる。
As described above, in the catalyst filling method according to the first embodiment, the sensor 20 detects the flow state of the catalyst C in the nozzle 10 so that the equalized deposition surface has a predetermined height position ( In the first embodiment, it is possible to detect whether or not the height position h) of the pressing member 53 has been reached. For this reason, even if the reaction vessel 50 in which the catalyst C is charged is already assembled, the catalyst can be appropriately charged. That is, the catalyst filling space S2 defined by the receiving member 52 and the pressing member 53 is filled with the catalyst C without substantial excess and deficiency, and an appropriate filling density is obtained. Therefore, the catalyst filling method of this embodiment is also a method suitable for automatic filling.
Further, since the catalyst filling space S2 appropriately filled with the catalyst C is sandwiched between the first buffer space S1 and the second buffer space S3, when the reaction gas is put into the reaction vessel 50, the first buffer space S2 is filled. The gas pressure is averaged in S1 or the second buffer space S3. For this reason, as shown in FIG. 2 (e), the reaction gas does not cause a drift or the like, and reaches the entire catalyst filling space S2 to be able to contact the catalyst C evenly.

<第2実施形態>
図3の(a)〜(c)は、本発明の第2実施形態による触媒充填方法を説明するための概略図である。この第2実施形態が上記第1実施形態と異なるのは、均等化工程において触媒Cに外力を作用させる手段として、第1バッファ空間S1および第2バッファ空間S2の少なくとも何れか一方から気流を導入する通気装置40を用いている点である。通気装置40としては、例えば、ブロアを用いることができる
<Second Embodiment>
FIGS. 3A to 3C are schematic views for explaining a catalyst filling method according to the second embodiment of the present invention. The second embodiment differs from the first embodiment in that air current is introduced from at least one of the first buffer space S1 and the second buffer space S2 as means for applying an external force to the catalyst C in the equalization step. The ventilation device 40 is used. For example, a blower can be used as the ventilation device 40.

反応容器50中への触媒Cの供給開始後しばらくすると、ノズル10の真下付近を中心として触媒Cが堆積する(図3(a))。ここで、通気装置40を起動し、反応容器50の下方の導管56から気流を導入して反応容器50内部の触媒Cを流動させる(図3(b))。所定時間経過後、通気装置40を停止すると触媒Cは再度堆積し、その堆積面の高さは略均等化される(図3(c))。この通気工程は、ノズル10からの触媒Cの供給中に、または供給を一時中断して適宜行うことができる。また、触媒Cの充填作業中、常に通気工程を行ってもよい。そして、触媒Cが押え部材53の高さ位置に到達する直前にも通気工程を実行することにより、受け部材52と押え部材53との間の空間に触媒Cを略完全に充填することができる。   After a while after the start of the supply of the catalyst C into the reaction vessel 50, the catalyst C is deposited around the vicinity of the nozzle 10 (FIG. 3A). Here, the aeration device 40 is activated, and an air flow is introduced from the conduit 56 below the reaction vessel 50 to cause the catalyst C inside the reaction vessel 50 to flow (FIG. 3B). When the aeration apparatus 40 is stopped after a predetermined time has elapsed, the catalyst C is deposited again, and the height of the deposited surface is substantially equalized (FIG. 3C). This aeration step can be appropriately performed during the supply of the catalyst C from the nozzle 10 or by temporarily stopping the supply. Further, during the filling operation of the catalyst C, an aeration process may be always performed. Then, the catalyst C can be almost completely filled into the space between the receiving member 52 and the pressing member 53 by performing the ventilation process immediately before the catalyst C reaches the height position of the pressing member 53. .

以上のように、第2実施形態による触媒充填方法では、外力付与手段として第1バッファ空間S1および第2バッファ空間S3の少なくとも何れか一方から気流を導入する通気装置40を用いることにより、反応容器50内部の触媒充填空間S2において触媒Cを流動させて攪拌することができる。この攪拌された触媒Cが反応容器50中に再度堆積すると、堆積表面は平坦になって確実に均等化され、触媒全体の充填密度も略一定になる。このため、触媒Cと反応ガスとを接触させる際に、反応ガスの偏流を確実に防止することができる。従って、本実施形態の触媒充填方法は、自動充填にも適した方法である。   As described above, in the catalyst filling method according to the second embodiment, the reaction vessel is used by using the venting device 40 that introduces an air flow from at least one of the first buffer space S1 and the second buffer space S3 as the external force applying means. The catalyst C can be flowed and stirred in the catalyst filling space S2 in the interior 50. When the stirred catalyst C is deposited again in the reaction vessel 50, the deposition surface is flattened and uniformized reliably, and the packing density of the entire catalyst becomes substantially constant. For this reason, when the catalyst C and the reaction gas are brought into contact with each other, the drift of the reaction gas can be reliably prevented. Therefore, the catalyst filling method of this embodiment is also a method suitable for automatic filling.

なお、この第2実施形態による通気装置と、先に説明した第1実施形態による振動装置とを組み合わせて均等化工程を実施することも勿論可能である。そのような場合、反応容器50中においてより強力な攪拌作用が得られるため、触媒Cが比較的比重が大きく流動し難いものであっても十分な攪拌が可能となり、堆積表面の高さが確実に均等化される。   Of course, it is possible to perform the equalization step by combining the ventilation device according to the second embodiment and the vibration device according to the first embodiment described above. In such a case, since a stronger stirring action can be obtained in the reaction vessel 50, even if the catalyst C has a relatively large specific gravity and is difficult to flow, sufficient stirring is possible, and the height of the deposition surface is ensured. Is equalized.

本発明の触媒充填方法および触媒充填装置は、上述した固体高分子型燃料電池発電システムに使用される改質器等への触媒の充填以外にも種々の分野において適用することができる。例えば、工業製品の製造において容器に粉体工業用薬品を充填する場合、食品製造業において容器に調味料等の粉体物を充填する場合等においても、本発明を適用することが可能である。   The catalyst filling method and the catalyst filling apparatus of the present invention can be applied in various fields other than the catalyst filling into the reformer or the like used in the above-described polymer electrolyte fuel cell power generation system. For example, the present invention can be applied to the case where a container is filled with a chemical for powder industry in the manufacture of industrial products, or the case where a container is filled with a powdered material such as a seasoning in the food manufacturing industry. .

本発明の触媒充填装置の概略斜視図Schematic perspective view of the catalyst filling apparatus of the present invention 本発明の第1実施形態による触媒充填方法を説明するための概略図Schematic for demonstrating the catalyst filling method by 1st Embodiment of this invention. 本発明の第2実施形態による触媒充填方法を説明するための概略図Schematic for demonstrating the catalyst filling method by 2nd Embodiment of this invention. 触媒が偏って充填されている場合を表す従来技術の概略図Schematic diagram of the prior art showing the case where the catalyst is packed unevenly 触媒充填量が過剰である場合を表す従来技術の概略図Schematic diagram of the prior art showing when the catalyst charge is excessive

10 ノズル
20 センサ
30 バイブレータ(振動装置)
40 ブロア(通気装置)
50 反応容器
52 受け部材
53 押え部材
100 触媒充填装置
S1 第1バッファ空間
S2 触媒充填空間
S3 第2バッファ空間
C 触媒
10 Nozzle 20 Sensor 30 Vibrator (vibration device)
40 Blower (Ventilator)
50 reaction vessel 52 receiving member 53 holding member 100 catalyst filling device S1 first buffer space S2 catalyst filling space S3 second buffer space C catalyst

Claims (6)

受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に触媒を供給する供給工程と、
前記反応容器中に堆積した前記触媒に、前記反応容器を振動させる振動装置および前記触媒充填空間に気流を導入する通気装置のうちの少なくとも一方を用いて外力を作用させて前記触媒の堆積面の高さを均等化する均等化工程と、
均等化した前記堆積面が予め設定した所定の高さ位置に達したか否かをセンサにより検知する検知工程と、を包含する触媒充填方法。
A supply step of supplying a catalyst to a reaction vessel provided with a receiving member and a pressing member and partitioned inside a first buffer space, a catalyst filling space, and a second buffer space;
The catalyst deposited in said reaction vessel, said reaction vessel by applying a force using at least one of the venting device for introducing the air flow to the vibration device and the catalyst filling space vibrate the deposition surface of the catalyst An equalization process to equalize the height;
And a detection step of detecting by a sensor whether or not the equalized deposited surface has reached a predetermined height position set in advance.
前記通気装置は、前記第1バッファ空間および前記第2バッファ空間の少なくとも何れか一方から気流を導入する請求項1に記載の触媒充填方法。2. The catalyst filling method according to claim 1, wherein the aeration apparatus introduces an air flow from at least one of the first buffer space and the second buffer space. 受け部材と押え部材とを設けて内部を第1バッファ空間、触媒充填空間、および第2バッファ空間に区画した反応容器に触媒を供給するべく、当該反応容器に対して挿入深さを変更可能なノズルと、The insertion depth can be changed with respect to the reaction vessel so as to supply the catalyst to the reaction vessel that is provided with a receiving member and a pressing member and is divided into a first buffer space, a catalyst filling space, and a second buffer space. A nozzle,
前記反応容器中に堆積した前記触媒に外力を作用させて、前記触媒の堆積状態を変化させる外力付与手段と、An external force applying means for applying an external force to the catalyst deposited in the reaction vessel to change a deposition state of the catalyst;
前記ノズル中の前記触媒の流動状態を検知するセンサと、を備え、A sensor for detecting a flow state of the catalyst in the nozzle,
前記外力付与手段は、前記反応容器を振動させる振動装置および前記触媒充填空間に気流を導入する通気装置のうちの少なくとも一方とする触媒充填装置。The catalyst filling device, wherein the external force applying means is at least one of a vibration device that vibrates the reaction vessel and a venting device that introduces an air flow into the catalyst filling space.
前記反応容器に対して前記ノズルの挿入深さを変更することにより、前記ノズルの先端部の高さ位置を所定の高さ位置に調整可能である請求項3に記載の触媒充填装置。The catalyst filling apparatus according to claim 3, wherein a height position of a tip portion of the nozzle can be adjusted to a predetermined height position by changing an insertion depth of the nozzle with respect to the reaction container. 前記振動装置は、前記反応容器に当接する当接部と、当該当接部に振動を伝達する駆動モータと、を備えた請求項3または4に記載の触媒充填装置。The catalyst filling device according to claim 3, wherein the vibration device includes a contact portion that contacts the reaction container, and a drive motor that transmits vibration to the contact portion. 前記通気装置は、前記第1バッファ空間および前記第2バッファ空間の少なくとも何れか一方から気流を導入する請求項3〜5のいずれか一項に記載の触媒充填装置。The catalyst filling device according to any one of claims 3 to 5, wherein the ventilation device introduces an air flow from at least one of the first buffer space and the second buffer space.
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