JP4859217B2 - 金属酸化物触媒 - Google Patents
金属酸化物触媒 Download PDFInfo
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- JP4859217B2 JP4859217B2 JP2006234407A JP2006234407A JP4859217B2 JP 4859217 B2 JP4859217 B2 JP 4859217B2 JP 2006234407 A JP2006234407 A JP 2006234407A JP 2006234407 A JP2006234407 A JP 2006234407A JP 4859217 B2 JP4859217 B2 JP 4859217B2
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- Prior art keywords
- metal oxide
- ions
- oxide catalyst
- metal
- oxygen
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- 229910044991 metal oxide Inorganic materials 0.000 title claims description 51
- 150000004706 metal oxides Chemical class 0.000 title claims description 50
- 239000003054 catalyst Substances 0.000 title claims description 44
- 239000001301 oxygen Substances 0.000 claims description 78
- 229910052760 oxygen Inorganic materials 0.000 claims description 78
- -1 oxygen ions Chemical class 0.000 claims description 63
- 239000013078 crystal Substances 0.000 claims description 49
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 47
- 229910021645 metal ion Inorganic materials 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 14
- 239000002131 composite material Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 7
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000383 hazardous chemical Substances 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 2
- 229910052845 zircon Inorganic materials 0.000 claims description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 44
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 17
- 238000001179 sorption measurement Methods 0.000 description 11
- 239000011941 photocatalyst Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000013459 approach Methods 0.000 description 6
- 238000003776 cleavage reaction Methods 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- 238000000329 molecular dynamics simulation Methods 0.000 description 6
- 230000007017 scission Effects 0.000 description 6
- 238000004088 simulation Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000006555 catalytic reaction Methods 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 229910001456 vanadium ion Inorganic materials 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910001451 bismuth ion Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910001449 indium ion Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 150000002496 iodine Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 238000002256 photodeposition Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Description
J. A. Baglio, G.. Gashurov, Acta Cryst. B24, 292 (1968). P. M. Touboul and P. Toledano, Acta Cryst. B36, 240 (1980). S. Tokunaga, H. Kato, A. Kudo, Chem. Mater. 13 (2001) 4624−4628 A. W. Sleight, H. -y. Chen, A. Ferretti, D. E. Cox, Mater. Res. Bull. 14 (1979) 1571−1581
2.YO8多面体
3.劈開位置
4.酸素イオン
5.バナジウムイオン
6.イットリウムイオン
7.バナジウムイオンに酸素イオンが3配位した構造
8.水素イオン
9.酸素イオンが3配位したバナジウムイオンに水分子の−OHが乖離吸着した部分(円内)
10.イットリウムイオンに酸素イオンが7配位した構造
11.水分子
12.酸素イオンが7配位したイットリウムイオンに水分子が分子吸着した部分(円内)
13.InO6八面体
14.インジウムイオン
15.酸素イオンが四配位したインジウムイオンに水分子の−OHが乖離吸着した部分(円内)
16.BiO8多面体
17.ビスマスイオン
18.酸素イオンが5配位したビスマスイオンに水分子が分子吸着した部分(円内)
Claims (7)
- 室温安定状態における結晶構造中に金属イオン(Mn+)がx個の酸素イオンで囲まれた構造(MOx)を有する酸化物よりなり、表面に接触した水分子H−O−H又は水酸基を有するQ−O−H型有機分子(Qは任意の基)を分解する金属酸化物触媒(但しSi4+,B3+も金属イオン(Mn+)の範疇とする。)であって、その表面にある構造(MOx)における金属イオンと酸素イオンの平均距離が2.2オングストローム以下である酸素イオンの一部を除去してあり、前記金属イオンは、In3+,Ga3+,Al3+,B3+,Si4+,Ge4+,Sn4+,Ti4+,Zr4+,Hf4+,V5+,Nb5+,Ta5+,Sb5+,Bi5+,W6+,Mo6+,Cr6+イオンの一種又はそれ以上であり、前記(MOx)のxが6である8面体であって、除去する酸素イオンが5個以下であるか、又は、前記(MOx)のxが4である4面体であって、除去する酸素イオンが3個以下であることを特徴とする金属酸化物触媒。
- 請求項1に記載の金属酸化物触媒で金属的電気伝導を示さない半導体であることを特徴とする金属酸化物触媒。
- 請求項1又は2に記載の金属酸化物触媒において、その母体結晶内部が、組成RVO4で表されるバナジウム含有複合酸化物(式中、RはY元素)であることを特徴とする金属酸化物触媒。
- 請求項3に記載の金属酸化物触媒において、母体結晶内部が、I41/amd空間群に属すジルコンタイプ結晶構造を持つことを特徴とする金属酸化物触媒。
- 請求項1又は2に記載の金属酸化物触媒において、その母体結晶内部が、組成TVO4で表されるバナジウム含有複合酸化物(式中、TはIn)であることを特徴とする金属酸化物触媒。
- 請求項1又は2に記載の金属酸化物触媒において、その母体結晶内部が、組成InVO4で表され、Cmcm空間群に属する結晶構造を持つことを特徴とする金属酸化物触媒。
- 請求項1から6のいずれかに記載の金属酸化物触媒の存在下で、化学物質あるいは有害化学物質に、光を照射すること、あるいは加熱することを特徴とする、化学物質あるいは有害化学物質の分解方法。
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JP4859217B2 true JP4859217B2 (ja) | 2012-01-25 |
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JP2018149457A (ja) * | 2015-07-03 | 2018-09-27 | 株式会社日立製作所 | 排ガス浄化触媒 |
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JP3718710B2 (ja) * | 2001-07-23 | 2005-11-24 | 独立行政法人物質・材料研究機構 | 可視光応答性光触媒及びそれを用いた水素製造方法と有害化学物質分解方法 |
JP3735711B2 (ja) * | 2002-03-06 | 2006-01-18 | 独立行政法人物質・材料研究機構 | 可視光応答性稀土類化合物光触媒とそれを用いた水素の製造方法及び有害化学物質分解方法 |
JP4000374B2 (ja) * | 2003-10-10 | 2007-10-31 | 独立行政法人物質・材料研究機構 | 半導体金属酸化物光触媒およびそれを用いた有害化学物質の分解方法 |
JP2005217385A (ja) * | 2004-01-31 | 2005-08-11 | National Institute For Materials Science | 亜鉛含有金属酸化物半導体およびその製造方法 |
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