JP4835837B2 - Photodiode and manufacturing method thereof - Google Patents

Description

  The present invention relates to a photodiode and a method for manufacturing the same, and more particularly to a photodiode for converting light signals including infrared, visible and ultraviolet to electrical signals at high speed, which are required in the information processing and communication fields, and a method for manufacturing the same.

  In order to convert an optical signal into an electric signal at high speed, a photodiode using a photoelectric conversion phenomenon in a semiconductor is often used. There are various types of photodiodes such as a pn type, a pin type, a Schottky type, and an MSM (metal-semiconductor-metal) type. The main factors that limit the response speed of photoelectric conversion in the photodiode are the circuit time constant determined by the product of the load resistance and the capacitance generated by the depletion layer, and the carrier transit time required for carriers to pass through the depletion layer. In order to improve the high-speed response of the photodiode, it is required to reduce the circuit time constant and the carrier transit time.

  One of the photodiodes capable of high-speed response is an MSM type, which is expected as a photoelectric conversion element used in the information processing and communication fields. This MSM type photodiode is generally a kind of Schottky photodiode having a Schottky barrier in the vicinity of two electrodes. In an MSM type photodiode, by using an electrode having a comb-like structure, a high electric field can be applied to the light absorption layer at a low voltage, the traveling time of carriers can be shortened, and a relatively fast response speed can be achieved. be able to.

  In recent years, various attempts have been made to increase the speed and efficiency of an MSM photodiode using metal surface plasmons.

  For example, in the optoelectronic coupler described in Patent Document 1, a device structure is used in which interdigitated metal electrodes arranged periodically on a flat semiconductor surface are arranged so that the positive electrode and the negative electrode are nested and face each other. ing. FIG. 31 is a perspective view of the device structure, and FIG. 32 is a sectional view taken along line B-B ′ of FIG. This Patent Document 1 describes an MSM type photodiode in which incident light and surface plasmon are coupled by resonance. As shown in FIG. 32, the first electrode 1 and the second electrode 2 are periodically arranged to combine the incident light and the surface plasmon on the electrode metal surface, so that the first electrode 1 and the second electrode 2 Enhanced near-field light can be generated at the interface between the electrode 2 and the semiconductor layer 3.

  However, the MSM photodiode described in Patent Document 1 cannot provide sufficient quantum efficiency. The reason why sufficient quantum efficiency cannot be obtained is that the photodiode of Patent Document 1 does not have a light energy confinement structure, and therefore, the ratio of incident light that is dissipated as transmitted light without being absorbed by the depletion layer is high. Can be mentioned. That is, by forming a resonance state between the incident light and the surface plasmon, enhanced near-field light can be generated inside the semiconductor, but it does not have a light energy confinement structure and therefore propagates inside the semiconductor. Surface plasmons are likely to be coupled to the propagating light, so that there are many components that become transmitted light without being absorbed by the depletion layer. In the structure described in Patent Document 1, a metal electrode is provided on a flat semiconductor surface. However, since there is no semiconductor depletion layer in the gap (gap portion) between the electrodes, the metal electrode is generated at the position of this gap. The near-field light component cannot be absorbed by the depletion layer. This means that there is a component that cannot be effectively used in the generated near-field light, and the quantum efficiency is reduced accordingly.

  Furthermore, in the MSM type photodiode described in Patent Document 1, the contribution of carriers generated in a relatively deep region from the semiconductor surface is relatively large, so that a sufficient response speed cannot be obtained. As described above, in the structure of Patent Document 1, many carriers are generated in the deep region away from the semiconductor surface due to a large amount of transmitted light component. Becomes longer. For this reason, the high-speed response of the light receiving element is hindered.

  Patent Document 2 discloses a photodetector that can provide an MSM photodiode on an insulating layer so as to have a resonant structure and can increase the intensity of light by causing resonance in a surface plasmon mode. Yes. Patent Document 2 further describes that a Bragg reflector is provided below the light receiving portion to increase the quantum efficiency.

  However, even the MSM photodiode described in Patent Document 2 is not provided with an efficient optical energy confinement structure, so that the ratio of incident light that is not absorbed by the depletion layer but becomes transmitted light is high, and sufficient Quantum efficiency cannot be obtained. By adopting a resonant structure in which an insulating layer is provided under the light absorption layer, the component that becomes transmitted light in the incident light can be reduced, but still a sufficient light energy confinement effect cannot be obtained. Surface plasmons are combined with propagating light propagating through the semiconductor, and as a result, the ratio of incident light that is not absorbed by the depletion layer but becomes transmitted light increases. Furthermore, the photodiode of Patent Document 2 can improve the quantum efficiency when a Bragg reflector is provided below the light receiving layer, but increases the manufacturing process and increases the thickness of the light receiving element. Mass production and high integration become difficult.

  Patent Document 3 is a Schottky photodiode using surface plasmons, in which a hole having a diameter smaller than the incident light wavelength and a conductive film having periodic irregularities around the hole on the surface are provided on the semiconductor. Discloses a photodiode that generates a surface plasmon resonance state and performs photoelectric conversion via enhanced near-field light.

  In the device described in Patent Document 3, near-field light is generated at the position of a hole having a diameter smaller than the incident light wavelength by surface plasmon resonance due to incident light, so that the position where photoelectric conversion occurs in the semiconductor layer is extremely narrow. It is possible to limit the travel distance of the optical carrier, and to enable a high-speed response. However, since this photodiode also does not have a light energy confinement structure, components dissipated as transmitted light cannot be ignored, leaving room for improving efficiency. Further, the photodiode described in Patent Document 3 has a problem that the manufacturing process is complicated because it is necessary to accurately position the position of the light absorption layer on the semiconductor layer side and the position of the hole of the conductive film. .

In order to generate a surface plasmon resonance state, it is effective to form periodic irregularities on the surface of the light receiving surface, but even a photodiode that does not use the surface plasmon resonance state can be used. Have periodic irregularities (for example, Patent Documents 4 to 6). In the device described in Patent Document 4, an MSM photodiode is used as a light receiving element, an HBT (heterojunction bipolar transistor) is used as an amplifying element for amplifying a light receiving current from the light receiving element, and the light receiving element and the amplifying element are combined. They are integrated and integrated. Therefore, periodic irregularities are formed on the surface of the light receiving surface so that the light receiving element portion becomes a convex portion. In Patent Document 5, a striped periodic concavo-convex structure is formed on the surface of a semiconductor substrate so that a polarization component can be detected, an anode electrode is provided on the upper surface of the convex portion of the periodic concavo-convex structure, and the back side of the semiconductor substrate Discloses a light receiving element provided with a cathode electrode. Patent Document 6 discloses a pseudo-barrier layer made of p-type InGaAs so as to form a periodic concavo-convex structure in order to improve light receiving efficiency and response speed while suppressing dark current in a light receiving element having an MSM structure. It is disclosed that an anode electrode is formed on a light absorption layer, an anode electrode is disposed on the pseudo-barrier layer, and a cathode electrode is disposed on the light absorption layer at a position between adjacent pseudo-barrier layers. In the light receiving elements or photodiodes disclosed in these Patent Documents 4 to 6, the electrode formed on the surface of the light receiving surface prevents light from entering the semiconductor layer, so that from the viewpoint of improving the light receiving efficiency. Therefore, it is required to reduce the electrode area. In the structures disclosed in Patent Documents 4 to 6, if the thickness of the light absorption layer is reduced for high-speed response, the component of the incident light that passes through the light absorption layer increases and the quantum efficiency (sensitivity) increases. If the light absorption layer is made thicker with the aim of improving the sensitivity, the traveling distance of the carrier is increased accordingly, and the response speed is lowered.
Japanese National Patent Publication No. 10-509806 (pages 26-33, FIG. 1) Japanese translation of PCT publication No. 2003-520438 (pages 14-19, FIGS. 1-3) WO2005 / 098966 (Fig. 1) JP-A-6-132511 Japanese Patent Laid-Open No. 9-246586 JP-A-11-340481

  As described above, a light receiving element or photodiode that does not use surface plasmon resonance has a problem in that the quantum efficiency is not high in the first place, and the improvement in quantum efficiency and the response speed are in a trade-off relationship. Even in photodiodes that use surface plasmon resonance to achieve high speed and high efficiency, it is not possible to ignore components of incident light that do not contribute to photocurrent, and there is room for improvement in quantum efficiency. It is left.

  Accordingly, a first object of the present invention is to provide a photodiode that achieves both higher efficiency and faster response.

  Another object of the present invention is to provide a photodiode that can be easily mass-produced and highly integrated, and a method for manufacturing the same.

  The photodiode of the present invention has a structure in which periodic irregularities are formed on the surface, and at least the convexities of the periodic irregularities are formed of a semiconductor, and the first arranged on the upper surface of the convexities of the periodic irregularities. An electrode and a second electrode disposed on the bottom surface of the concave portion of the periodic unevenness and electrically connected to the semiconductor.

  In such a photodiode, the first and second electrodes respectively formed on the convex and concave portions of the periodic unevenness are also arranged with a periodic three-dimensional structure. Since the electrode is naturally formed of a conductive film, a periodic uneven structure by the conductive film is formed on the surface of the structure, and these periodically and three-dimensionally arranged electrodes are incident. It plays a role in forming a resonance state by combining light and surface plasmons. As a result, strong near-field light is generated in the vicinity of the interface between the electrode and the semiconductor. This near-field light generates a photovoltaic force by generating electron-hole pairs in a depletion layer in the semiconductor.

  Further, in the photodiode of the present invention, since the electrodes are periodically and three-dimensionally arranged on the periodic unevenness as described above, the positions of the convex portions of the first and second electrodes and the periodic unevenness In addition, a structure for confining light energy by surface plasmon excitation can be obtained, and transmitted light can be reduced. Specifically, when incident light arrives from above the periodic unevenness, resonance is caused by the first electrode on the convex portion of the periodic unevenness and the second electrode on the concave portion, particularly by the first electrode on the incident side. Surface plasmon is generated. Further, when the incident light hits the second electrode on the bottom surface of the concave portion of the periodic unevenness, the incident light is reflected to the first electrode side, and further resonance surface plasmon is generated at the first electrode. Thus, according to the present invention, light energy is confined between the first electrode on the convex portion of the periodic unevenness and the second electrode on the concave portion. In this structure, the convex part of the periodic unevenness is made of a semiconductor, and this convex part functions as a depletion layer in the photodiode. As described above, the surface plasmon resonance is excited and the light energy of the incident light is confined, so that in the photodiode of the present invention, a strong near field is present in the depletion layer (that is, the convex portion in the periodic unevenness) that performs photoelectric conversion. Light can be generated.

  Therefore, in the photodiode of the present invention, light energy is confined at a position where the periodic unevenness is formed, so that high quantum efficiency can be obtained. In addition, because most of the carriers are generated by near-field light generated near the electrode surface by surface plasmons, the contribution of carriers generated in the deep region of the semiconductor layer and hindering high-speed response can be reduced, and high-speed response You can get speed.

  An example of such a photodiode of the present invention is that the structure as a whole is composed of a semiconductor, that is, a semiconductor with periodic irregularities formed on the surface, and the upper surface of the periodic irregularities. The first electrode and the second electrode disposed on the bottom surface of the concave portion of the periodic unevenness. Alternatively, in another example, a semiconductor provided as a projecting portion having periodic irregularities is formed on an insulating layer such as a buried oxide film, and the first electrode is formed on the upper surface of the semiconductor, that is, the upper surface of the projecting portion. The second electrode is formed on the surface of the insulating layer, that is, on the bottom surface of the concave portion of the periodic unevenness, so as to be electrically connected to the semiconductor constituting the convex portion.

  In the photodiode of the present invention, the surface plasmon resonance is excited and the light confinement structure is realized by the periodically and three-dimensionally arranged electrodes. In order to obtain such an effect, the period P of the periodic unevenness, the inter-electrode distance d between the first electrode and the second electrode in the height direction of the periodic unevenness, and the size of each electrode, etc. There are preferred values. Although what value is preferable will be described later, generally speaking, in order to excite surface plasmon resonance and confine light, the ratio of the formation area of the first electrode to the upper surface of the convex portion of the periodic unevenness It is preferable that the ratio of the formation area of the second electrode to the bottom surface of the recess is larger. This is a significant feature of the present invention compared with the conventional light receiving element that does not use surface plasmon resonance, especially when the area of the electrode disposed on the light incident side should be reduced.

In the photodiode of the present invention, for example, Ag, Au, Al, Cu or the like can be used as the material constituting the first and second electrodes. As the semiconductor, Si, Si _x Ge _1-x (where 0 <x <1), Ge, GaN, GaAs, GaInAs, GaInP, InP, or the like can be used. Regarding the combination of the electrode material and the semiconductor, it is preferable to use Al as the electrode and Si as the semiconductor in order to construct a photodiode in the ultraviolet region. In order to construct a near-infrared photodiode having a wavelength of about 850 nm or less from the visible light region, it is preferable to use Ag as the electrode and Si as the semiconductor. In order to construct a photodiode that detects light in a longer wavelength region, for example, 1.3 μm band and 1.5 μm band, it is preferable to use Ag or Au as an electrode and SiGe or Ge as a semiconductor. .

  The method for manufacturing a photodiode of the present invention includes a step of forming periodic irregularities on a semiconductor surface, a step of forming a conductive film on the periodic irregularities, and a conductive film attached to the sidewall of the convex portion of the periodic irregularities. By separating the part formed on the convex part of the periodic unevenness of the conductive film and the part formed on the concave part of the periodic unevenness, the first electrode disposed on the convex part of the periodic unevenness and the period And an electrode forming step of obtaining a second electrode arranged in the concave portion of the concave / convex portion.

  Thus, the photodiode of the present invention can be easily manufactured by a relatively simple manufacturing process.

  According to the present invention, at least the convex part of the periodic unevenness is made of a semiconductor, the optical energy is confined in the vicinity of the first and second electrodes and the convex part of the periodic unevenness, and the region where the optical electric field intensity becomes maximum By matching the depletion layer region to perform a photo diode, it is possible to provide a photodiode having both high efficiency and high speed response. In addition, since such a photodiode has a relatively simple device structure, according to the present invention, it is possible to reduce the number of manufacturing processes, and to provide a photodiode that can be easily mass-produced and highly integrated, and a method for manufacturing the photodiode. Can do.

  Next, a preferred embodiment of the present invention will be described in detail with reference to the drawings.

(First embodiment)
FIG. 1 is a perspective view of an MSM photodiode according to the first embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along the line AA ′ of FIG.

  The semiconductor layer 3 is provided on the substrate 4, and the periodic uneven structure 8 is provided on the surface of the semiconductor layer 3. The first electrode 1 is provided on the upper surface of the convex portion of the periodic concavo-convex structure 8, and the second electrode 2 is provided on the bottom surface of the concave portion. A Schottky junction is formed at a portion where the first and second electrodes 1 and 2 are in contact with the semiconductor layer 3, and this photodiode becomes an MSM type. The first electrode 1 and the second electrode 2 are connected to peripheral circuits such as a load resistor 5 and a bias power source 6. In the illustrated example, one end of the load resistor 5 is connected to the first electrode 1, the positive electrode of the bias power source 6 and the other end of the load resistor 5 are connected, and the negative electrode of the bias power source 6 is connected to the second electrode 2. ing. Here, the periodic concavo-convex structure 8 is one in which convex portions and concave portions are alternately arranged in a stripe shape, and the convex portions on the surface of the semiconductor layer 3 are formed in a comb shape, whereby the first electrode 1 is also formed in a comb shape, and the second electrode 2 is formed in a comb shape in the concave portion on the surface of the semiconductor layer 3 so as to alternately mesh with the comb tooth portions of the first electrode 1. . That is, the first electrode 1 and the second electrode 2 have an interdigital type electrode structure, except for whether the first electrode 1 and the second electrode 2 are in the convex portion or the concave portion in the periodic concavo-convex structure. Become.

  As shown in FIG. 2, in the following description, the period in the periodic concavo-convex structure 8 is P, and the interelectrode distance between the first electrode 1 and the second electrode 2 in the height direction in the periodic concavo-convex structure 8. And d is the width of the gap between the first electrode 1 and the second electrode 2 along the direction of the periodic unevenness (the direction in which the convex portion repeats) in the periodic uneven structure 8. Here, since the convex portions and the concave portions are alternately arranged in a stripe shape, the period P is a repetition cycle of the convex portions (or the concave portions). Strictly speaking, the interelectrode distance d is a vertical distance between the lower surface of the first electrode 1 in the convex portion and the upper surface of the second electrode 2 in the concave portion. The electrode gap W represents an interval in the horizontal direction ignoring a step due to the periodic concavo-convex structure 8 between opposing sides of the adjacent first electrode 1 and second electrode 2.

  In such a photodiode, as shown in FIGS. 1 and 2, the incident light 7 enters from above the periodic uneven structure 8. Here, since the first electrode 1 and the second electrode 2 are periodically arranged on the periodic concavo-convex structure 8, the incident light 7 is emitted from the surface plasmons in the first electrode 1 and the second electrode 2. Combines and creates a resonance state with the surface plasmon by the periodic structure. In particular, resonance surface plasmons are strongly generated in the first electrode 1. By generating this resonance state, strong near-field light is generated in the vicinity of the interface between the first electrode 1 and the second electrode 2 and the semiconductor layer 3 at the convex portion of the periodic concavo-convex structure 8. On the other hand, the first electrode 1 and the second electrode 2 are in Schottky junction with the semiconductor layer 3 as described above, and therefore, the vicinity of the first electrode 1 and the second electrode 2, that is, the periodic uneven structure. A depletion layer associated with a Schottky barrier is formed in the semiconductor layer 3 at the position of the convex portion 8. The strong near-field light generated by the resonance surface plasmon generates electron-hole pairs in the depletion layer formed in the convex portion of the periodic concavo-convex structure 8 in this manner, thereby generating a photovoltaic force. As a result, a photocurrent flows through a peripheral circuit including the load resistor 5 and the bias power source 6, and the intensity of the incident light 7 is converted into a potential difference between both ends of the load resistor 5.

As a material for the first electrode 1 and the second electrode 2, it is preferable to use a conductive metal. Specifically, a material having a small electrical resistance such as Ag or Au and a small surface plasmon loss is particularly preferable. However, it is not limited to these metals, and Al or Cu, which is widely used in semiconductor devices and has established many processing techniques, may be used. When the adhesion between the metal used for the first electrode 1 and the second electrode 2 and the semiconductor constituting the semiconductor layer 3 is poor, Ti, Ta, Cr, W, Ni, etc. are used as the adhesion layer (underlayer). Can also be provided under these electrodes. The thickness of the adhesion layer is particularly preferably 10 nm or less so that optical loss is reduced. Moreover, although the 1st electrode 1 and the 2nd electrode 2 may be comprised with a different metal, the manufacturing method is simpler and preferable to comprise with the same metal. An antireflection film or a protective film made of an insulator may be provided on the surfaces of the first electrode 1 and the second electrode 2. As the material for the antireflection film or protective film, SiO ₂ or SiON that can be easily formed and obtain a stable film is particularly preferable.

As a material of the semiconductor layer 3, a group IV element semiconductor such as Si, Ge, or Si _x Ge _1-x , a GaAs group such as GaN, GaAs, GaInAs, GaInP, or InP, and an InP group III-V compound semiconductor are used. be able to. The semiconductor layer 3 may have a laminated structure of a plurality of semiconductor materials, and an optimum material can be selected according to the wavelength of the substrate 4 or incident light 7 on which the photodiode is manufactured. For example, when the wavelength of the incident light 7 is 1550 nm or 1310 nm, a compound semiconductor, Ge, or Si _x Ge _1-x can be used as the light receiving material. For example, when the wavelength of the incident light 7 is 850 nm, in this wavelength band, Si can be used as a light receiving material in addition to the compound semiconductor or Ge, Si _x Ge _1-x . Any substrate 4 can be used as long as it is generally used in optical devices. For example, a Si substrate, a Ge substrate, a GaAs substrate, an InP substrate, a sapphire substrate, or the like can be used. .

  In addition, when an n-type semiconductor is used as the semiconductor layer 3, an MSM photodiode operates with electrons that are majority carriers. However, an MSM photodiode that operates with holes as majority carriers using a p-type semiconductor may be used. It is not limited. In order to obtain a faster photodiode response, it is preferable to use an n-type semiconductor and generally use electrons whose mobility is higher than that of holes as majority carriers.

  FIG. 1 shows an embodiment in which the entire surface of the light receiving surface is covered with the first electrode 1 and the second electrode 2 except for the side wall portion of the convex portion in the periodic uneven structure 8. It is sufficient that at least a part is covered with the first electrode 1 or the second electrode 2. In the conventional MSM type photodiode shown in FIG. The ratio of the light receiving surface covered with the electrodes (referred to as coverage R) is usually about 50%, but in the photodiode of the present invention, about 70% or more of the light receiving surface is the first electrode 1 or the second electrode. When it is covered with 2, a light energy confinement effect is obtained, which is preferable. For example, the optical energy confinement effect can be obtained even when the entire upper surface of the convex portion and about half of the bottom portion of the concave portion are covered. At this time, about 75% of the light receiving surface is covered with the electrode. It is preferable that 80% or more of the light receiving surface is covered with an electrode. When almost 90% or more of the light receiving surface is covered with the first electrode 1 or the second electrode 2, it is caused by surface plasmon. A remarkable confinement effect of light energy is obtained, which is particularly preferable. Here, the light receiving surface refers to a portion where light is incident on the top surface of the convex portion and the bottom surface of the concave portion of the periodic uneven structure 8. In calculating the ratio of the portion of the light receiving surface covered with the first electrode 1 or the second electrode 2, that is, the coverage ratio R, when the light receiving surface is viewed from directly above, an electrode is apparently formed. A coverage ratio R is obtained by dividing the area of the exposed portion by the apparent area of the light receiving surface. That is, a plane obtained by smoothing the periodic uneven structure 8 is considered, and when the light receiving surface and the electrodes 1 and 2 are projected onto this plane, the area of the electrode after projection relative to the area of the light receiving surface after projection is The coverage ratio R is obtained.

  Further, a part of the side surface of the convex portion of the periodic concavo-convex structure 8 may be covered with the first electrode 1 or the second electrode 2. At this time, it is necessary that the first electrode 1 and the second electrode 2 have a structure that does not short-circuit.

FIG. 3 shows a result obtained by simulation of the relationship between the electrode gap W and the reflectance and transmittance of incident light with respect to the photodiode. Here, Si is used as the semiconductor, Ag is used as the electrode, the wavelength λ of the incident light 7 is 850 nm, the period P is 460 nm, and the inter-electrode distance d is 90 nm. The entire periodic concavo-convex structure 8 including the electrode is provided with a SiO ₂ film as a protective film. In the calculation, the refractive index n _s of the semiconductor (here, Si) was set to 3.4. The reflectance is the proportion of the incident light 7 that is reflected from the electrode surface and returns to the incident direction, and the transmittance is the substrate 4 side of the incident light 7 that is not absorbed by the light absorption layer. It is a ratio of the light which permeate | transmits. FIG. 3 also shows the sum of reflectance and transmittance (reflectance + transmittance). When the sum of reflectance and transmittance is small, incident light 7 is well confined in the periodic concavo-convex structure 8. As a result, it is absorbed more by the semiconductor 3, so that a high quantum efficiency is obtained. In FIG. 3, a value n _s W / λ obtained by dividing the electrode gap W by λ / n _s is used as the horizontal axis.

FIG. 3 shows that when n _s W / λ <0.2, the sum of reflectance and transmittance is reduced, and the effect of confining light energy by surface plasmon resonance is obtained. More preferably, in order to make the sum of the reflectance and the transmittance about 20% or less, it is preferable to satisfy the relationship of n _s W / λ <0.1.

  Regarding the coverage ratio R of the light receiving surface with the electrodes, R = (P−2W) / P is clearly satisfied in the case of the first embodiment in which the electrodes are formed in a stripe shape. A light energy confinement effect by surface plasmon resonance can be obtained when R ≧ 0.8, and the sum of reflectance and transmittance can be reduced to about 20% or less when R> 0.9.

  Next, preferable values for the period P and the inter-electrode distance d of the periodic uneven structure 8 will be described.

The period P and the inter-electrode distance d of the periodic concavo-convex structure 8 are determined so that surface plasmons generated on the surfaces of the first electrode 1 and the second electrode 2 are efficiently combined with the incident light 7. As long as the structure forms a surface plasmon resonance state, preferable values of the period P and the interelectrode distance d are not limited to a specific single range, and may be defined in a plurality of ranges. . The optimum period P and the inter-electrode distance d are correlated with each other, the dielectric constant of the material constituting the first electrode 1 and the second electrode 2, the refractive index n _s of the semiconductor layer 3, and the insulator film on the electrode surface If it is formed, it has a very complicated relationship depending on the refractive index of the insulator film and the wavelength λ of the incident light 7.

FIG. 4 shows a result obtained by simulation of the change in the sum of the reflectance and transmittance of incident light with respect to the photodiode when the period P of the unevenness in the periodic uneven structure 8 and the distance d between the electrodes are changed. Is. Here, Si is used as the semiconductor, and the wavelength λ of the incident light 7 is 850 nm, the period P is 460 nm, and the inter-electrode distance d is 90 nm. The definitions of reflectance and transmittance are the same as those shown in FIG. Here, it indicates the period P lambda / n _s divided by the value n _s P / lambda as the horizontal axis represents the distance between the electrodes d on the vertical axis lambda / n divided by _s value n _s d / lambda, reflecting The sum of rate and transmittance is represented by contour lines and black and white shading. The contour lines are shown in increments of 0.20, 0.40, 0.60, and 0.80. The region where the color is dark represents the region where the sum of the reflectance and the transmittance is small, and indicates that strong absorption occurs due to surface plasmon resonance. That is, the quantum efficiency as a photodiode is high in a region where the color is dark.

From FIG. 4, in order to obtain a light energy confinement effect by surface plasmon resonance, the conditions [1] to [9]:
[1] 0.12 < _ns P / λ <0.47 and _ns d / λ <0.35;
[2] 0.12 <n _s P / λ <0.44 and 0.65 <n _s d / λ <1.15;
[3] 0.12 <n _s P / λ <0.44 and 1.48 <n _s d / λ <1.98;
_{[4] 0.80 <n s P} / λ <0.90 and _{0.44 <n s d / λ <} 0.64;
[5] 4.28 <2n _s P / λ + n _s d / λ <4.60 and 1.08 <n _s d / λ <1.48;
_{[6] 1.37 <n s P} / λ <1.70 and n _s d / λ <0.20;
_{[7] 1.70 <n s P} / λ <1.95 and _{0.12 <n s d / λ <} 0.50;
[8] 3.24 <n _s P / λ + n _s d / λ <3.50 and 1.76 <n _s P / λ <2.25;
[9] 2.45 <n _s P / λ <2.52 and 1.80 <n _s d / λ <1.96
It can be seen that either of these should be satisfied.

More preferably, the sum of the reflectance and the transmittance is about 20% or less, and for this purpose, the following conditions [10] to [14]:
[10] 0.28 < _ns P / λ <0.40 and 0.12 < _ns d / λ <0.24;
[11] 0.28 <n _s P / λ <0.40 and 0.80 <n _s d / λ <1.00;
_{[12] 0.28 <n s P} / λ <0.40 and _{1.64 <n s d / λ <} 1.80;
[13] 1.74 <n _s P / λ <1.90 and 0.20 <n _s d / λ <0.44;
[14] 3.33 <n _s P / λ + n _s d / λ <3.44 and 1.83 <n _s P / λ <1.97
To ensure that one of them is met.

FIG. 5 shows the relationship between the reflectance, transmittance, and (reflectance + transmittance) for incident light when the interelectrode distance d is fixed at 90 nm in the relationship between the period P and the interelectrode distance d shown in FIG. It is the graph which showed the change. The horizontal axis is a value n _s P / lambda divided by the period P λ / n _s. From FIG. 5, when the inter-electrode distance d is 90 nm, the relationship 1.5 < _ns P / λ <2.1 is satisfied in order to form a surface plasmon resonance state and reduce the reflectance. It is understood that it is more preferable to satisfy the relationship of 1.75 <n _s P / λ <1.90 in order to make the reflectance about 20% or less.

Similarly, FIG. 6 shows the reflectance, transmittance, and (reflectance + transmittance) for incident light when the period P is fixed at 460 nm in the relationship between the period P and the inter-electrode distance d shown in FIG. It is the graph which showed change of. FIG. 6 shows that when the period P is set to 460 nm, 0.1 <n _s d / λ <0.5 or 1.3 <n _s to form a surface plasmon resonance state and reduce the reflectance. It is preferable that the relationship d / λ <1.7 is satisfied, and in order to reduce the reflectance to about 20% or less, 0.20 <n _s d / λ <0.45 or 1.45 <n _s d / λ It can be seen that it is more preferable to satisfy the relationship of <1.65.

The above is based on the result of a simulation performed with the wavelength λ of the incident light 7 set to 850 nm. By selecting the period P and the inter-electrode distance d, the effect of surface plasmon resonance can be obtained not only at this wavelength but also at an arbitrary wavelength. Can do. In the above description, the preferable ranges of the period P and the interelectrode distance d are described in a form normalized by the wavelength (λ / n _s ) of the incident light in the semiconductor. By substituting λ in the equation, the period P and the interelectrode distance d suitable for the incident light wavelength can be obtained. In addition, about the optimal period P with respect to a certain incident light wavelength, and the distance d between electrodes, a more detailed value can be calculated | required by performing electromagnetic field calculation by simulation similarly to the above-mentioned.

  In the photodiode of the present embodiment, a remarkable light energy confinement effect can be obtained with the number of periods of about three or more times as to the number of periods in which the unevenness in the periodic uneven structure 8 is repeated, which is particularly preferable. The number of periods can be determined from the light receiving area required for the photodiode. For example, when the period P of the periodic concavo-convex structure 8 is 460 nm, a light receiving portion having a width of about 10 μm can be obtained by setting the number of periods in which the concavo-convex is repeated to about 20 times. Note that the lengths of the first electrode 1 and the second electrode 2 (the length in the direction perpendicular to the direction of the periodic unevenness in the periodic uneven structure 8 (the direction in which the protrusions repeat)) are surface plasmons. In order to excite resonance, the lower limit is half the wavelength of the incident light. There is no upper limit to this length, and the longer the length, the larger the light receiving area. However, if the length is too long, stray capacitance associated with the electrode increases, which hinders high-speed response.

  In addition, the photodiode according to the present embodiment excites surface plasmon resonance in the periodic concavo-convex structure 8 in which linear convex portions and linear concave portions are alternately arranged, and therefore has a polarization dependency. The surface plasmon is excited by the component of the electric field component of incident light that is directed in the periodic uneven structure 8 in the periodic uneven structure 8 (the direction in which the convex portion repeats). Therefore, the photodiode of the present embodiment exhibits the highest sensitivity to incident light having linearly polarized light such that the period direction of the periodic concavo-convex structure coincides with the electric field E direction, and a signal having such linearly polarized light. It is particularly suitable for light detection.

  Further, although FIG. 1 shows an embodiment in which the incident light 7 is incident vertically from the upper part of the surface of the semiconductor layer 3, the incident light 7 may be incident obliquely. At this time, since the component parallel to the light receiving surface of the wave number of incident light 7 increases as the incident angle increases, it is preferable to increase the period P of the periodic uneven structure 8 in which surface plasmon resonance occurs.

  Furthermore, a back-illuminated photodiode may be used because the same surface plasmon resonance effect can be obtained with the structure shown in FIG. 1 even when the light is incident from the substrate side. At this time, the wavelength of the incident light is preferably a wavelength at which the substrate material does not absorb.

  Hereinafter, the MSM photodiode according to the first embodiment will be described with reference to examples.

Example 1
[Construction]
FIG. 7 is a cross-sectional view of an example of an MSM type photodiode based on the first embodiment. An n-type Si layer 9 is provided as a semiconductor layer on the substrate 4, and a periodic uneven structure 8 is formed on the surface of the n-type Si layer 9. A first electrode 1 and a second electrode 2 each having a laminated structure of a Cr film 12 and an Ag film 11 are provided on the periodic uneven surface of the n-type Si layer 9. The Cr film 12 is provided as a so-called adhesion layer when the Ag film 11 is formed on the n-type Si layer 9. As the substrate 4, a normal Si substrate is used. A SiO ₂ layer 10 is provided as a protective film or antireflection film on the entire surface of the periodic uneven structure 8 including the surfaces of the first electrode 1 and the second electrode 2. Further, on the surface of the SiO ₂ layer 10, the first electrode pad 13 and the second electrode 2 for electrically connecting the first electrode 1 and the second electrode 2 and peripheral circuits such as a load resistance and a bias power source are provided. Electrode pads 14 are provided. The first electrode pad 13 is electrically connected to the first electrode 1 through a hole penetrating the SiO ₂ layer 10, and the second electrode pad 14 is electrically connected to the first electrode through a hole penetrating the SiO ₂ layer 10. 2 is electrically connected.

The n-type Si layer 9 is obtained by implanting donor impurity ions to the silicon semiconductor at about 1 × 10 ¹⁷ cm ⁻³ . The calculated depletion layer width due to the Schottky barrier in the n-type Si layer 9 is about 100 nm when the donor impurity concentration is 1 × 10 ¹⁷ cm ⁻³ in the case of Si, but the near-field light is about 10 nm. Therefore, sufficient quantum efficiency can be obtained even when the donor impurity concentration is increased and the depletion layer width is 50 nm or less. When the depletion layer width is reduced, the carrier traveling time is shortened, so that a faster response can be obtained.

  In this photodiode, as shown in FIGS. 4 to 6, in order to form a surface plasmon resonance state and reduce the reflectance to improve the quantum efficiency, when the wavelength of the incident light 7 is 850 nm, It is preferable that the periodic uneven structure 8 has a period P of 375 to 525 nm and an interelectrode distance d of about 25 nm to 125 nm or 325 nm to 425 nm. In particular, when the period P of the periodic concavo-convex structure 8 is 440 to 475 nm and the inter-electrode distance d is about 50 nm to 110 nm or 365 nm to 410 nm, a significant decrease in reflectance is observed and strong confinement of light energy is obtained. be able to.

[Operation]
Next, the operation of the photodiode of Example 1 will be described. Incident light 7 is incident on the first electrode 1 and the second electrode 2 that are periodically arranged on the periodic uneven structure 8. Incident light 7 combines with the surface plasmons in the first electrode 1 and the second electrode 2 and creates a resonance state with the surface plasmons by the periodic structure. Due to the generation of the resonance state, strong near-field light is generated near the interface between the first electrode 1 and the second electrode 2 and the n-type Si layer 9. This near-field light generates a photoelectromotive force by generating electron-hole pairs in a depletion layer accompanying a Schottky barrier generated in the n-type Si layer 9 in the vicinity of the first electrode 1 and the second electrode 2. As a result, the intensity of the incident light 7 is converted into a potential difference between both ends of the load resistor 5.

FIG. 8A shows a calculation model diagram of the electromagnetic field calculation, and FIG. 8B shows the electric field intensity distribution in the photodiode of Example 1 obtained from the electromagnetic field calculation. FIG. 8B also shows an enlarged view in which the electric field intensity distribution and the calculation model diagram are superimposed. In this electromagnetic field calculation, Si is used as the semiconductor, Ag is used as the electrode metal, SiO ₂ is used as the insulator film 10 provided thereon, the width of the convex portion of the periodic concavo-convex structure 8 is 260 nm, the width of the concave portion is 200 nm, the electrode The distance d is 90 nm, the film thickness of the first electrode 1 and the second electrode 2 is 40 nm, the number of periods is 10, and the wavelength λ of incident light is 850 nm. In FIG. 8B, a relatively white portion indicates a portion where the electric field strength is large, and it is understood from this drawing that strong near-field light is generated at the interface between the Ag film 11 and the n-type Si layer 9. I understand. The convex portion of the n-type Si layer 9 and the vicinity of the Ag film 11 are depleted, and this near-field light generates electron / hole pairs in the depletion layer, thereby obtaining a photodiode with high-speed response and high efficiency. I understand that.

  FIG. 9 shows the reflectance, transmittance, and (reflectance + transmittance) with respect to incident light when the same photodiode structure as in the electromagnetic field calculation shown in FIG. 8A is used and the incident light wavelength λ is changed. It is the graph which showed the result of having calculated | required the change of (2) by simulation. The definitions of reflectance and transmittance are the same as those shown in FIG. When the wavelength λ is 850 nm, a strong resonance of the surface plasmon is obtained. At this time, the reflectance is about 2% and the transmittance is about 4%, and the optical energy is efficiently confined in the depletion layer. I understand that. At a wavelength of 850 nm, the absorption coefficient of Si is 10 times or more larger than the ohmic loss due to surface plasmons in Ag constituting the first electrode 1 and the second electrode 2. Therefore, a high quantum efficiency of 85% or more is possible. This structure is optimized for incident light having a wavelength of 850 nm, and the same effect can be obtained for other wavelengths by optimizing the structure, that is, the period P and the inter-electrode distance d as described above. can get. Further, by using the wavelength dependency shown in FIG. 9, it is possible to selectively receive only a component having a desired wavelength with respect to incident light having a plurality of wavelength components.

If the drift speed of electrons in Si is 10 ⁷ cm / s and the thickness of the depletion layer is 100 to 200 nm, the drift time of electrons is estimated to be 1 to 2 ps in this photodiode. When the MSM junction area serving as the light receiving portion is about 100 μm ² or less, the electrical capacitance of the junction is about 100 fF or less. Assuming that the load resistance is 50Ω, the circuit time constant is about 10 ps or less. Therefore, this MSM type photodiode can respond very quickly.

[Production method]
Next, a manufacturing process of the MSM type photodiode of Example 1 will be described with reference to FIGS.

First, as shown in FIG. 10A, a substrate 4 made of Si is prepared, and n-type Si containing about 1 × 10 ¹⁷ cm ⁻³ of P as a donor impurity element is epitaxially grown thereon by a chemical vapor deposition method. The n-type Si layer 9 is formed. Next, as shown in FIG. 10B, the SiO ₂ layer 10 having a thickness of 50 to 150 nm is formed on the entire surface of the n-type Si layer 9 by thermal oxidation. Next, as shown in FIG. 10C, a resist 15 patterned in accordance with the periodic uneven structure 8 is provided on the SiO ₂ layer by lithography. In this case, the resist 15 is left at a position to be a convex portion in the periodic uneven structure 8. Next, as shown in FIG. 10D, the SiO ₂ layer 10 is removed by dry etching using the resist 15 as a mask. For example, CHF ₃ is used as a reactive gas in the dry etching. As a result, the SiO ₂ layer is removed at the positions of the recesses in the periodic uneven structure 8.

Next, as shown in FIG. 10E, the resist 15 is removed with an organic solvent to obtain a patterned SiO ₂ layer 10. Next, as shown in FIG. 10F, by performing dry etching using the SiO ₂ layer 10 as a mask, the n-type Si layer 9 is patterned to obtain the periodic uneven structure 8. For example, SF ₆ is used as a reactive gas in the dry etching at this time. Next, as shown in FIG. 11G, the SiO ₂ layer 10 is removed by wet etching using HF. As a result, an n-type Si layer 9 (semiconductor layer 3) having a periodic uneven structure 8 formed on the surface is obtained.

Next, as shown in FIG. 11 (h), a Cr film 12 and an Ag film 11 are sequentially formed on the surface of the n-type Si layer 9 on which the periodic concavo-convex structure 8 is formed by vacuum deposition or sputtering. To do. At this time, if the film is formed perpendicular to the substrate surface, the film formed on the side surface of the periodic uneven structure 8 becomes relatively thin. Next, as shown in FIG. 11 (i), the Cr film 12 and the Ag film 11 formed on the side surfaces of the periodic concavo-convex structure 8 are removed by wet etching or dry etching using an ion beam. The Cr film 12 and the Ag film 11 formed on the upper surface of the convex portion of the concavo-convex structure 8 are separated from the Cr film 12 and the Ag film 11 formed on the bottom surface of the concave portion, and the two are insulated. In this way, the first electrode 1 and the second electrode 2 are obtained. In this case, an etchant containing HNO ₃ can be used for the wet etching. Here, Ag is used for the first electrode 1 and the second electrode 2, but when Au is used instead, an etching solution containing KI can be used for wet etching. Further, for dry etching, a gas cluster ion beam obtained by ionizing a cluster made of Ar or a reactive gas can be used, and a processing process with less damage is possible as compared with the case of using a monomer ion beam.

Next, as shown in FIG. 11 (j), the SiO ₂ layer 10 to be a protective film is formed by chemical vapor deposition or sputtering, including the upper surfaces of the first electrode 1 and the second electrode 2, A film is formed on the entire surface of the periodic uneven structure 8. Next, as shown in FIG. 11 (k), holes are formed in the SiO ₂ layer 10 where electrode pads are to be formed by wet etching or dry etching. Finally, as shown in FIG. 11 (l), a conductive metal film is formed by vacuum evaporation or sputtering in the hole formed in the SiO ₂ layer 10, and the first electrode pad 13 and A second electrode pad 14 is formed to obtain a photodiode.

(Example 2)
The MSM type photodiode of Example 2 shown in FIG. 12 is based on the first embodiment of the present invention. The photodiode of Example 1 shown in FIG. Is different in that a SiGe layer 16 is provided. In the periodic concavo-convex structure formed on the surface of the n-type Si layer 9, the SiGe layer 16 is between the upper surface of the convex portion and the first electrode 1 and between the bottom surface of the concave portion and the second electrode 2. positioned. The SiGe layer 16 may also be provided at the position of the side surface of the periodic uneven structure 8. In such a structure, the SiGe layer 16 is formed by forming the periodic uneven structure 8 on the surface of the n-type Si layer 9 and then epitaxially growing SiGe on the surface of the n-type Si layer 9. Similarly, it is obtained by performing electrode formation.

  In this photodiode, by generating strong near-field light in the depletion layer in the SiGe layer 16, it is possible to receive light having a wavelength band of 1.31 μm or 1.55 μm, which cannot be obtained with Si. Similarly, by using a Ge layer or a compound semiconductor layer instead of the SiGe layer 16, light in a wavelength band that cannot be received by Si can be absorbed.

(Example 3)
The MSM type photodiode of Example 3 shown in FIG. 13 is based on the first embodiment of the present invention. The photodiode of Example 1 shown in FIG. The difference is that a layer 17 is provided. The n-type Si layer 9 is provided only at the position of the convex portion in the periodic concavo-convex structure 8. At the position of the concave portion in the periodic concavo-convex structure 8, the n-type Si layer 9 is formed on the buried oxide layer (buried SiO ₂ layer) 17. The electrode 2 is provided directly. The side surface of the second electrode 2 is bonded to the n-type Si layer 9. In this photodiode, by providing a resonance structure based on the difference in refractive index between the n-type Si layer 9 and the buried oxide layer 17, it is possible to further reduce the transmitted light component and further increase the efficiency. That is, since the refractive index of Si is approximately 3.4 and the refractive index of SiO ₂ constituting the buried oxide layer 18 is approximately 1.5, a Fabry-Perot type resonance structure is obtained, and the n-type Si layer Light is reflected at the interface between the buried oxide layer 17 and the buried oxide layer 17, and incident light is confined in the n-type Si layer 9. In order to obtain such an effect, the thickness of the n-type Si layer 9 is preferably an integral multiple of half the wavelength of light in the Si layer. Further, since carriers are generated only in the n-type Si layer 9 on the buried oxide layer 17, carriers generated in a deep region from the surface of the n-type Si layer 9 can be eliminated, and a faster response can be obtained. Can do.

  Such a structure including the buried oxide layer 17 can be obtained by using an SOI (Silicon On Insulator) substrate. Further, when Ge is used as the light receiving material, a GOI (Germanium On Insulator) substrate can be used. For example, using an SOI substrate in which an n-type Si layer is formed on a buried oxide film, the n-type Si layer at a position that becomes a concave portion of the periodic concavo-convex structure is etched away, and then an electrode is provided in the same manner as described above In this case, the photodiode shown in FIG. 13 can be obtained.

Example 4
FIG. 14 shows an MSM type photodiode of Example 4, and FIG. 15 is a cross-sectional view taken along the line CC ′ of FIG. The photodiode of Example 4 is also based on the first embodiment of the present invention. Unlike the photodiodes of the above-described embodiments, the photodiode of Embodiment 4 includes a concentric periodic concavo-convex structure 8 on the surface of an n-type Si layer 9.

  The photodiode shown in FIG. 1 includes the comb-shaped periodic concavo-convex structure 8 and has a property that depends on the polarization of incident light as described above. For this reason, the photodiode shown in FIG. 1 is suitable when the polarization direction of the incident light 7 is constant, and the comb-shaped periodic uneven structure 8 is arranged so that the incident light 7 and the surface plasmon are coupled. Let it be used. On the other hand, in the case of the photodiode shown in FIG. 14, the surface plasmon resonance state can be created for the incident light 7 in all the polarization directions by providing the concentric periodic concavo-convex structure 8. Therefore, the photodiode of Example 4 has an advantage that high photoelectric conversion efficiency can be obtained with respect to the incident light 7 that is not polarized or whose polarization direction changes.

(Example 5)
FIG. 16 shows the MSM photodiode of Example 5, and FIG. 17 is a cross-sectional view taken along the line DD ′ of FIG. This photodiode is also based on the first embodiment. Cylindrical convex portions (protrusions) are periodically arranged on the surface of the n-type Si layer 9 to form the periodic concavo-convex structure 8, and the second electrode is formed in the concave portions (that is, portions other than the cylindrical protrusions). 2 are arranged respectively. An insulator layer 18 is provided on the second electrode 2 so as to surround the cylindrical convex portion. A first electrode 1 is formed on the top surface of the cylindrical convex portion. In this case, since each of the cylindrical convex portions is isolated, for example, a bridge-like shape is formed on the insulator layer 18 so that the first electrodes 1 of the convex portions arranged in the column direction are connected. The 1st electrode 1 is formed in this. The cylindrical rows may be periodically arranged in a square lattice as illustrated, or may be periodically arranged in a triangular lattice. In such a configuration, a pitch between adjacent cylinders is defined as a period P in the periodic uneven structure. In this photodiode, the period P is set to a value similar to that described with reference to FIGS. Further, the diameter of the columnar projection is, for example, about half of the period P. As the material constituting the insulator layer 18, a material that can be easily formed and can obtain a stable film is used. For example, SiO ₂ , SiON, SiN, or the like can be used.

  In such a photodiode, the n-type Si layer 9 is patterned so as to form a columnar column to form a periodic uneven structure, and then a conductive film to be the second electrode 2 is formed, After removing the conductive film on the side surface of the cylinder, the insulator layer 18 is formed on the second electrode 2 so that the cylindrical protrusion is substantially hidden, and then the insulator layer 18 is etched back to form the columnar shape. It can be formed by exposing the upper surface of the projection and patterning the first electrode 1.

  The photodiode of this embodiment has an advantage that a high-speed response can be obtained despite having a large light receiving area since the capacitance of the photodiode is small. In this photodiode, a prismatic convex portion may be used instead of the cylindrical convex portion.

(Second Embodiment)
FIG. 18 shows an MSM photodiode according to the second embodiment of the present invention. The photodiode shown in FIG. 18 is the same as that of the first embodiment shown in FIG. 2, but at least a part of the convex portion of the periodic concavo-convex structure 8 is in contact with the first electrode 1. This is different from the first embodiment in that it is thinner than the first embodiment. In the case shown in FIG. 18, the cross-sectional shape of the convex portion is an inverted trapezoid. Such a structure has an advantage that the first electrode 1 and the second electrode 2 are hardly short-circuited when the photodiode is manufactured.

The structure shown in FIG. 18 protects the Si side walls with C ₄ F ₈ gas, for example, called a Bosch process, when dry etching is performed on the n-type Si layer 9 to form a periodic concavo-convex structure. However, it is obtained by using a process of etching Si with SF ₆ gas and increasing the ratio of SF ₆ as an etching gas in the middle of the Bosch process cell.

(Example 6)
The MSM type photodiode of Example 6 shown in FIG. 19 is based on the second embodiment of the present invention. In this photodiode, the shape of the convex portion of the periodic concavo-convex structure 8 has a two-stage structure of a relatively narrow portion on the substrate 4 side and a relatively wide portion on the upper surface side, The cross-sectional shape is T-shaped. This structure can be obtained by performing two-stage etching when the periodic uneven structure 8 is produced.

(Example 7)
The MSM type photodiode of Example 7 shown in FIG. 20 is based on the second embodiment of the present invention. In this photodiode, the convex portion of the periodic concavo-convex structure 8 is constricted at the bottom, and the cross-sectional shape of the convex portion is a wine glass type. This structure can be obtained by performing two-stage etching when the periodic uneven structure 8 is produced.

(Third embodiment)
FIG. 21 shows an MSM photodiode according to the third embodiment of the present invention. The photodiode shown in FIG. 21 is the same as that of the first embodiment. However, a condensing structure such as a lens 19 is formed on the insulator layer 18 provided so as to cover the periodic uneven structure 8. It differs in the point provided. The lens 19 converges incident light on the light receiving surface of the photodiode. This structure has an advantage that the effective light receiving area can be increased while the capacitance of the photodiode is kept small, since the incident light 7 is condensed by the condensing structure such as the lens 19. Therefore, a photodiode having a large light receiving area, high efficiency, and high speed response can be obtained.

(Example 8)
The MSM type photodiode of Example 8 shown in FIG. 22 is based on the third embodiment of the present invention. A diffraction grating 20 is formed on the upper surface of the SiO ₂ layer 10 as an insulator layer in place of the lens, and the incident light 7 is condensed on the light receiving portion of the photodiode by the diffraction grating 20 so that the surface plasmon is collected. A resonance state can be formed.

(Fourth embodiment)
FIG. 23 shows an MSM photodiode according to the fourth embodiment of the present invention. The photodiode shown in FIG. 23 is the same as that of the first embodiment, but differs in that a reflection structure such as a reflection mirror 22 is provided on the lower side of the semiconductor light absorption layer. Here, the reflecting mirror 22 is formed by polishing the substrate 4 itself so as to have a curvature and depositing a metal film on the surface of the substrate 4. Providing the reflection mirror 22 having such a structure is a technique already known in a general photoelectric conversion element using a compound semiconductor.

  Since the photodiode of the present invention has a light confinement structure, the proportion of the component that transmits to the substrate 4 side in the incident light 7 is smaller than that of the conventional one. However, as described above, the effect of light confinement depends on the wavelength of incident light and the like, and thus transmitted light may not be negligible depending on use conditions. Therefore, the incident light 7 is reflected by the reflecting structure such as the reflecting mirror 22 provided on the back surface of the substrate 4 in this way. The light transmitted through the light receiving layer can be returned to the light receiving layer again, and the photoelectric conversion efficiency in the photodiode can be further increased. By providing the reflecting structure with a condensing function, the effective light receiving area can be increased and the sensitivity can be improved.

Example 9
The MSM type photodiode of Example 9 shown in FIG. 24 is based on the fourth embodiment of the present invention. In the photodiode of Example 1 shown in FIG. 7, the substrate 4 and the n-type Si layer 9 are formed. The reflective multilayer film 21 is provided between them. For example, in the calculation example shown in FIG. 9, about 4% of the incident light 7 is transmitted light. By returning this transmitted light to the light receiving layer again by the reflective multilayer film 21, a more efficient photodiode can be obtained. Is obtained. The reflective multilayer film 21 is obtained by periodically laminating materials having different refractive indexes, for example, Si and SiO ₂ .

  If a compound semiconductor is used as the semiconductor constituting the photodiode, the reflective multilayer film 21 can be easily formed by growing the semiconductor layer on the substrate while changing the composition of the compound semiconductor.

(Fifth embodiment)
FIG. 25 shows an MSM photodiode according to the fifth embodiment of the present invention. This photodiode has a structure in which a light collecting structure is provided around the semiconductor light absorption layer. In the photodiode having the buried oxide film 17 shown in FIG. 13, a metal periodic structure 23 is formed on the buried oxide film 17 at a position outside the formation region of the periodic uneven structure 8. That is, the metal periodic structure 23 is formed along the outer peripheral portion of the second electrode 2. Further, a Bragg reflector 24 is also formed along the outer periphery of the metal periodic structure 23. In this photodiode, the light incident on the metal periodic structure 23 is combined with the surface plasmons in the metal periodic structure 23, and the surface plasmons dissipated toward the outer peripheral portion are reflected by the Bragg reflector 24 and are reflected on the semiconductor layer 3. Collected in the light receiving part. Therefore, this photodiode has an advantage that an effective light receiving area can be increased while keeping its electric capacity small.

(Sixth embodiment)
The present invention can be applied not only to the MSM type photodiode but also to other types of photodiodes. FIG. 26 is a cross-sectional view of a tunnel junction photodiode according to the sixth embodiment of the present invention. This photodiode is structurally similar to that of the first embodiment shown in FIG. 2, but between one or both of the first electrode 1 and the second electrode 2 and the semiconductor layer 3. Is different from that of the first embodiment in that a thin insulating layer 18A is provided to form a tunnel junction. By providing the insulating layer 18A, the adhesion of the electrode metal can be improved. Further, it has an advantage that dark current can be reduced. The insulator layer 18A for forming the tunnel junction is made of, for example, SiO ₂ and has a thickness of about ₁ to ₂ nm.

(Seventh embodiment)
FIG. 27 is a cross-sectional view of a Schottky photodiode according to the seventh embodiment of the present invention. This photodiode is structurally similar to that of the first embodiment shown in FIG. 2, except that the semiconductor layer has an n ⁺ -type semiconductor layer 26 formed on the entire surface of the substrate 4 and periodic irregularities. The n-type semiconductor layer 25 is formed only on the convex portion of the structure, and a Schottky junction is formed between the first electrode 1 and the n-type semiconductor layer 25, and the second electrode 2 and n It differs from that of the first embodiment in that an ohmic junction is formed with the ⁺ type semiconductor layer 26 to form a Schottky photodiode. As described above, the photodiode of the present invention can be formed even on a semiconductor substrate having a laminated structure of the n-type semiconductor layer 25 and the n ⁺ -type semiconductor layer 26, and is the same as that of the first embodiment. An effect is obtained.

Further, instead of the n-type semiconductor layer 25 and the n ⁺ -type semiconductor layer 26, a p-type semiconductor layer and a p ⁺ -type semiconductor layer may be used to form a Schottky photodiode that operates using holes as majority carriers.

  Also in these Schottky photodiodes, a thin insulating film may be provided at the interface between at least one of the first electrode 1 and the second electrode 2 and the semiconductor layer, and a tunnel junction type configuration may be employed.

(Eighth embodiment)
FIG. 28 is a cross-sectional view of a pin-type photodiode according to the eighth embodiment of the present invention. Although this photodiode is structurally similar to that of the first embodiment shown in FIG. 2, the p ⁺ type semiconductor layer 28, the i type semiconductor layer 27, and the n ⁺ type semiconductor layer 26 are used as semiconductor layers. Is different from that of the first embodiment in that a pin junction is obtained using a semiconductor substrate having a laminated structure. An n ⁺ semiconductor layer 26 is formed on the entire surface of the substrate 4, and an i ⁺ semiconductor layer 27 and a p ⁺ semiconductor layer 28 are provided only on the convex portion of the periodic concavo-convex structure. Therefore, the second electrode 2 is bonded to the n ⁺ semiconductor layer 26, and the first electrode 1 is bonded to the p ⁺ semiconductor layer 28.

also it is possible to fabricate the photodiode of the present invention to a semiconductor substrate having a stacked structure of p ⁺ -type semiconductor layer 28 and the i-type semiconductor layer 27 and the n ⁺ -type semiconductor layer 26, p ⁺ -type semiconductor layer By thinning 28 and forming a depletion layer in the vicinity of the electrode, the same effect as in the first embodiment can be obtained. When a pin type photodiode is used, there is an advantage that it is resistant to a high temperature process. Further, even if the p ⁺ type semiconductor 28 and the n ⁺ type semiconductor 26 are arranged in reverse, a pin type photodiode having the same effect can be obtained.

  Also in these pin type photodiodes, a thin insulating film may be provided at the interface between at least one of the first electrode 1 and the second electrode 2 and the semiconductor layer, and a tunnel junction type configuration may be employed.

(Ninth embodiment)
The photodiode according to the present invention can be preferably used for detecting an optical signal at high speed in the field of information processing or optical communication. Hereinafter, examples of devices using the photodiode of the present invention will be described.

  FIG. 29 shows, as a ninth embodiment of the present invention, a 40 Gbps transmission optical receiver module equipped with a photodiode according to the present invention.

  An optical fiber 29 is drawn into the module housing 32 from the outside. In the module housing 32, the photodiode 31 according to the present invention is disposed to face the end face of the optical fiber 29, and between the end face of the optical fiber 29 and the photodiode 31, the optical fiber 29 and the photodiode 31 are disposed. And a lens 19A for condensing the signal light 30 emitted from the optical fiber 29 on the light receiving surface of the photodiode 31 is provided. The photodiode 31 is provided on the side surface of the chip carrier 35, and is connected to a preamplifier IC (integrated circuit) 34 provided on the upper surface of the chip carrier 35 through an electrical wiring 33. The photodiode 31 converts the signal light 30 into an electrical signal and outputs the electrical signal to the preamplifier IC 34 via the electrical wiring 33. The preamplifier IC 34 amplifies the input electric signal. When used for transmission by near-infrared light having a wavelength of 1.55 μm, the photodiode 31 can be a substrate obtained by epitaxially growing Ge on Si or a compound semiconductor substrate.

  In this structure, for example, by using a photodiode 31 having a condensing structure around the semiconductor light absorption layer as in the fifth embodiment shown in FIG. 25, the effective light receiving area is increased, The coupling tolerance regarding the position with the optical fiber 29 can be widened.

(Tenth embodiment)
FIG. 30 shows an LSI (Large Scale Integrated Circuit) chip-to-chip interconnect equipped with a photodiode according to the present invention as a tenth embodiment of the present invention.

  In order to perform high-speed signal transmission between LSIs mounted on a wiring board, it has been studied to connect LSIs with optical fibers and transmit signals using optical signals. Since the signal processing in the LSI is performed on the electrical signal, the signal light from the optical fiber is converted into an electrical signal and supplied to the LSI chip for connection between the optical fiber and each LSI chip, In addition, an optical interconnect that converts an electrical signal output from the LSI chip into an optical signal and introduces it into the fiber is required.

  On one surface of the photodiode / light source mounting board 46, a photodiode 31 according to the present invention and a VCSEL (Vertical Cavity Surface Emitting Laser) light source 36 having an electric modulation mechanism are provided. . The photodiode / light source mounting board 46 is attached to the surface of the LSI package 39 containing the LSI chip. In the LSI package 39, a via 37 for a light source and modulation electrical wiring and a via 38 for electrical wiring for a photodiode are formed. The via 37 is connected to the electrical wiring layer 40 formed on the photodiode / light source mounting board 46 and connected to the VCSEL light source 36. The via 38 is connected to the electrical wiring layer 41 formed on the photodiode / light source mounting board 46 and connected to the photodiode 31.

  The LSI mounting board 44 is disposed so as to face the photodiode / light source board 46. The surface of the LSI mounting board 44 includes an optical fiber 43 for inputting an optical signal, an optical fiber 42 for outputting an optical signal, a concave mirror 45A for directing signal light emitted from the end face of the optical fiber 43 toward the photodiode 31, and a VCSEL light source 36. And a concave mirror 45B for allowing the signal light from the optical fiber 42 to enter. The concave mirror 45A optically couples the optical fiber 43 and the photodiode 31, and the concave mirror 45B optically couples the optical fiber 42 and the VCSEL light source 36.

  In such an optical interconnect, the signal light from the optical signal input fiber 43 is irradiated to the photodiode 31 according to the present invention by the concave mirror 45A, and the LSI responds to the optical signal through the photodiode electrical wiring layer 41. Apply current. When light having a wavelength of 850 nm is used, Si can be used for the photodiode 31 as a semiconductor material that absorbs light. Here, other generally known methods such as a planar optical waveguide can be used instead of an optical fiber for inputting an optical signal. Further, a condensing mechanism such as a convex lens can be used instead of the concave mirror 45A. Or the front-end | tip of an optical fiber can be cut diagonally, and the photodiode 31 and an optical fiber can also be optically connected using the reflection in an end surface. Further, a preamplifier for electric signal amplification can be placed in the middle of the photodiode electric wiring layer 41 immediately after the photodiode 31.

  An electrical signal from the LSI passes through the light source and modulation electrical wiring via 37 and the light source and modulation electrical wiring layer 40, and is converted into an optical signal by a VCSEL (surface emitting laser) light source 36 having an electrical modulation mechanism. The optical signal is reflected by the concave mirror 45B and guided to the optical fiber 42 for optical signal output. The VCSEL light source 36 having an electric modulation mechanism is a known other mechanism that modulates light by an electric signal, for example, a Mach-Zehnder type modulator that modulates light from an external light source by an electro-optic effect or a thermo-optic effect. Can be replaced.

  Here, in the conventional optical interconnect used for the connection between LSI chips, when aiming at a high-speed operation of 20 GHz or more, a photodiode for light reception is an InGaAs grown on an InP substrate for high-speed response. A compound semiconductor material such as is used. Such a compound semiconductor has a problem that the manufacturing cost of the conventional optical interconnect module is high because the compatibility with the manufacturing process of the Si semiconductor device is poor.

  On the other hand, the optical interconnect according to the present embodiment uses the photodiode according to the present invention that uses Si as a semiconductor material, so that the manufacturing cost can be reduced. Since the photodiode according to the present invention can operate at a high speed of 40 GHz or more even if Si is used for the semiconductor layer, the use of the photodiode according to the present invention facilitates the high integration and mass production of the optical interconnect, and the manufacturing cost. Can be lowered.

1 is a perspective view showing an MSM photodiode according to a first embodiment of the present invention. It is sectional drawing in the A-A 'line of FIG. 6 is a graph showing the relationship between the electrode gap W and the reflectance, transmittance, and (reflectance + transmittance) with respect to incident light in the MSM photodiode of the first embodiment. 6 is a graph showing changes in (reflectance + transmittance) with respect to changes in the period P and the inter-electrode distance d in the MSM photodiode of the first embodiment. It is a graph which shows the period P dependence of the reflectance, the transmittance | permeability, and (reflectance + transmittance) in the MSM type photodiode of the first embodiment. 6 is a graph showing the dependency of the reflectance, transmittance, and (reflectance + transmittance) on the inter-electrode distance d in the MSM photodiode of the first embodiment. 2 is a cross-sectional view of an MSM photodiode of Example 1. FIG. 3 is a diagram illustrating a calculation model of electromagnetic field calculation for the MSM type photodiode of Example 1. FIG. It is a figure which shows the calculation result of the electric field intensity distribution about the MSM type photodiode of Example 1. It is a graph which shows the incident light wavelength dependence of the reflectance, the transmittance | permeability, and (reflectance + transmittance | permeability) in the MSM type photodiode of Example 1. 6 is a cross-sectional view showing the process of manufacturing the MSM photodiode of Example 1. FIG. 6 is a cross-sectional view showing the process of manufacturing the MSM photodiode of Example 1. FIG. 3 is a cross-sectional view of an MSM photodiode of Example 2. FIG. 6 is a cross-sectional view of an MSM photodiode of Example 3. FIG. 7 is a plan view of an MSM photodiode of Example 4. FIG. It is sectional drawing in the C-C 'line | wire of FIG. 6 is a perspective view of an MSM photodiode of Example 5. FIG. It is sectional drawing in the D-D 'line | wire of FIG. It is sectional drawing which shows the MSM type photodiode of the 2nd Embodiment of this invention. 6 is a cross-sectional view of an MSM photodiode of Example 6. FIG. 6 is a cross-sectional view of an MSM photodiode of Example 7. FIG. It is sectional drawing which shows the MSM type photodiode which provided the condensing structure on the insulator layer by the 3rd Embodiment of this invention. 10 is a cross-sectional view of an MSM type photodiode of Example 8. FIG. It is sectional drawing which shows the MSM type photodiode which provided the reflection structure in the lower part of the semiconductor light absorption layer by the 4th Embodiment of this invention. 10 is a cross-sectional view of an MSM photodiode of Example 9. FIG. It is sectional drawing which shows the MSM type photodiode which provided the condensing structure around the semiconductor light absorption layer by the 5th Embodiment of this invention. It is sectional drawing which shows the tunnel junction type photodiode of the 6th Embodiment of this invention. It is sectional drawing which shows the Schottky type photodiode of the 7th Embodiment of this invention. It is sectional drawing which shows the pin type photodiode of the 8th Embodiment of this invention. It is sectional drawing which shows the optical receiver module for 40 Gbps transmission which mounts the photodiode based on this invention by the 9th Embodiment of this invention. It is sectional drawing which shows the interconnect between LSI chips which mount the photodiode based on this invention by the 10th Embodiment of this invention. It is a perspective view which shows the conventional MSM type photodiode. FIG. 32 is a cross-sectional view taken along line B-B ′ of FIG. 31.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 1st electrode 2 2nd electrode 3 Semiconductor 4 Board | substrate 5 Load resistance 6 Bias power supply 7 Incident light 8 Periodic uneven structure 9 N-type Si layer 10 SiO ₂ layer 11 Ag film 12 Cr film 13 1st electrode pad 14 Second electrode pad 15 Resist 16 SiGe layer 17 Buried oxide layer 18, 18A Insulator layer 19, 19A Lens 20 Diffraction grating 21 Reflective multilayer film 22 Reflective mirror 23 Metal periodic structure 24 Bragg reflector 25 N-type semiconductor layer 26 n ⁺ Type semiconductor layer 27 i type semiconductor layer 28 p ⁺ type semiconductor layer 29 optical fiber 30 signal light 31 photodiode 32 module housing 33 electrical wiring 34 preamplifier IC
35 Chip carrier 36 VCSEL light source 37 Light source and modulation electrical wiring via 38 Photodiode electrical wiring via 39 LSI package 40 Light source and modulation electrical wiring layer 41 Photodiode electrical wiring layer 42 Optical signal output fiber 43 Optical signal input fiber 44 LSI mounting board 45A, 45B Concave mirror 46 Photodiode / light source mounting board

Claims (14)

A structure having periodic irregularities on the surface, and at least convex portions of the periodic irregularities are formed of a semiconductor;
A first electrode disposed on an upper surface of the convex portion of the periodic unevenness;
A second electrode disposed on a bottom surface of the concave portion of the periodic unevenness and electrically connected to the semiconductor;
Have
Incident light is irradiated on the surfaces of the first and second electrodes, and light energy by surface plasmon resonance excited by the periodic structure of the first and second electrodes is changed between the first electrode and the second electrode. Near-field light is generated near the interface between the first and second electrodes and the semiconductor at the convex portion of the periodic unevenness, and the semiconductor at the convex portion of the periodic unevenness A photodiode in which the near-field light is absorbed in a depletion layer formed on the substrate to generate electron-hole pairs,
Wherein the wavelength of the incident light is lambda, the refractive index of the semiconductor and n _s, before the period of distichum term irregularity is P, the periodic the said first electrode in the height direction of the concavo-convex second The following conditions [1] to [9], where d is the distance between the electrodes of:
[1] 0.12 < _ns P / λ <0.47 and _ns d / λ <0.35;
[2] 0.12 <n _s P / λ <0.44 and 0.65 <n _s d / λ <1.15;
[3] 0.12 <n _s P / λ <0.44 and 1.48 <n _s d / λ <1.98;
_{[4] 0.80 <n s P} / λ <0.90 and _{0.44 <n s d / λ <} 0.64;
[5] 4.28 <2n _s P / λ + n _s d / λ <4.60 and 1.08 <n _s d / λ <1.48;
_{[6] 1.37 <n s P} / λ <1.70 and n _s d / λ <0.20;
_{[7] 1.70 <n s P} / λ <1.95 and _{0.12 <n s d / λ <} 0.50;
[8] 3.24 <n _s P / λ + n _s d / λ <3.50 and 1.76 <n _s P / λ <2.25; and [9] 2.45 <n _s P / λ <2 .52 and _{1.80 <n s d / λ <} 1.9
A photodiode that satisfies any of the following conditions. A structure having periodic irregularities on the surface, and at least convex portions of the periodic irregularities are formed of a semiconductor;
A first electrode disposed on an upper surface of the convex portion of the periodic unevenness;
A second electrode disposed on a bottom surface of the concave portion of the periodic unevenness and electrically connected to the semiconductor;
Have
Incident light is irradiated on the surfaces of the first and second electrodes, and light energy by surface plasmon resonance excited by the periodic structure of the first and second electrodes is changed between the first electrode and the second electrode. Near-field light is generated near the interface between the first and second electrodes and the semiconductor at the convex portion of the periodic unevenness, and the semiconductor at the convex portion of the periodic unevenness A photodiode in which the near-field light is absorbed in a depletion layer formed on the substrate to generate electron-hole pairs,
The wavelength of the incident light is lambda, the refractive index of the semiconductor and n _s, between the first electrode and the second electrode along the direction of the period of the periodic unevenness in the periodic uneven A photodiode satisfying n _s W / λ <0.2, where W is the width of the gap. A structure having periodic irregularities on the surface, and at least convex portions of the periodic irregularities are formed of a semiconductor;
A first electrode disposed on an upper surface of the convex portion of the periodic unevenness;
A second electrode disposed on a bottom surface of the concave portion of the periodic unevenness and electrically connected to the semiconductor;
Have
Incident light is irradiated on the surfaces of the first and second electrodes, and light energy by surface plasmon resonance excited by the periodic structure of the first and second electrodes is changed between the first electrode and the second electrode. Near-field light is generated near the interface between the first and second electrodes and the semiconductor at the convex portion of the periodic unevenness, and the semiconductor at the convex portion of the periodic unevenness A photodiode in which the near-field light is absorbed in a depletion layer formed on the substrate to generate electron-hole pairs,
The ratio of a portion covered by the the light receiving surface first electrode or the second electrode as a coverage R, satisfy R ≧ 0.8, a photodiode. The structure is made of the semiconductor, wherein the periodic uneven as uneven shape of the surface of the semiconductor is formed, a photodiode according to any one of claims 1 to 3. The structure includes an insulating layer, wherein provided as the convex portions on the surface of the insulating layer and a said semiconductor photodiode as claimed in any one of claims 1 to 3. Wherein the first and second electrodes to form the semiconductor Schottky junction respectively, are configured as MSM type photodiode, the photodiode according to any one of claims 1 to 5. A Schottky junction is formed at a portion where one of the first and second electrodes is in contact with the semiconductor, and an ohmic junction is formed at a portion where the other of the first or second electrode is in contact with the semiconductor; shot configured as a key-type photodiode, the photodiode according to any one of claims 1 to 5. The semiconductor has a stacked structure of a p-type semiconductor, an i-type semiconductor, and an n-type semiconductor, the first electrode is in contact with either the p-type semiconductor or the n-type semiconductor, and the second electrode is the p-type semiconductor. type semiconductor and n-type semiconductors other one with contact, it is configured as a pin type photodiode, the photodiode according to any one of claims 1 to 5. The photodiode according to any one of claims 1 to 8 , wherein a thin insulating layer is provided between one or both of the first and second electrodes and the semiconductor to form a tunnel junction. . The photodiode according to any one of claims 1 to 9 , wherein at least a part of a cross-sectional shape of the convex portion of the periodic unevenness is thinner than an upper portion. A manufacturing method of the photodiode according to claim 4,
Forming periodic irregularities on the semiconductor surface;
Forming a conductive film on the periodic irregularities;
By removing the conductive film attached to the side wall of the periodic unevenness convex portion, a portion formed on the periodic unevenness convex portion of the conductive film and a portion formed in the periodic unevenness concave portion An electrode forming step of separating and obtaining a first electrode disposed in the convex portion of the periodic unevenness and a second electrode disposed in the concave portion of the periodic unevenness;
A method for manufacturing a photodiode. The method for manufacturing a photodiode according to claim 11 , wherein in the electrode forming step, the conductive film attached to the side wall of the convex portion of the periodic unevenness is removed by wet etching. Optical communication device comprising a receiving unit photodiodes according to any one of claims 1 to 10. Optical interconnection comprising: a Si substrate photodiode according formed in any one of claims 1 to 10, and an LSI electronic circuit formed in said the photodiode monolithically on a Si substrate.