JP4819032B2 - Processing equipment for copper etching waste liquid containing hydrogen peroxide - Google Patents
Processing equipment for copper etching waste liquid containing hydrogen peroxide Download PDFInfo
- Publication number
- JP4819032B2 JP4819032B2 JP2007339370A JP2007339370A JP4819032B2 JP 4819032 B2 JP4819032 B2 JP 4819032B2 JP 2007339370 A JP2007339370 A JP 2007339370A JP 2007339370 A JP2007339370 A JP 2007339370A JP 4819032 B2 JP4819032 B2 JP 4819032B2
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen peroxide
- copper
- waste liquid
- anode
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Water Treatment By Electricity Or Magnetism (AREA)
- ing And Chemical Polishing (AREA)
- Electrolytic Production Of Metals (AREA)
Description
本発明はプリント配線板の製造において、銅板や銅箔の表面処理で発生する、過酸化水素を含む銅エッチング廃液の処理装置に関する。
本装置は、過酸化水素と銅を多量に含んだ廃液中より過酸化水素を安全に分解し、銅を有効な金属として回収する装置および方法に関する。
The present invention relates to an apparatus for treating a copper etching waste liquid containing hydrogen peroxide, which is generated by surface treatment of a copper plate or copper foil in the production of a printed wiring board.
The present apparatus relates to an apparatus and method for safely decomposing hydrogen peroxide from a waste liquid containing a large amount of hydrogen peroxide and copper and recovering copper as an effective metal.
一般にプリント配線板の銅板や銅箔の表面処理で発生する、銅と過酸化水素を多量に含んだ廃液は、中和処理によって銅を水酸化物として廃液から分離され、この銅水酸化物は、産業廃棄物としてセメントなどにより安定化処理され、埋め立て処理されるか、精錬原料として回収する方法がある。一方、過酸化水素は中和処理においてある程度分解するが、残分は還元剤や分解触媒で分解し無害化する方法がある。
特許文献１には、過酸化水素を電気的に分解する槽と該処理液を更に電気分解して廃液中より銅を回収する方法が開示されているが、回収した銅の純度が低いなどの問題を有している。
Patent Document 1 discloses a tank for electrically decomposing hydrogen peroxide and a method for recovering copper from waste liquid by further electrolyzing the treatment liquid. However, the purity of recovered copper is low. Have a problem.
高濃度の過酸化水素の分解は、中和処理の際分解触媒が共存した場合、過酸化水素が暴走的に自己分解し、ミストの飛散や廃液の沸騰、さらには槽の破損を引き起こす危険性を伴う。
中和により多量に含まれた銅イオンの処理は、アルカリ性薬剤が必要であり、中和反応によって生ずる水酸化物のろ過分離が必要である。またそのろ過設備にも多大な費用が掛かる。
Decomposition of high-concentration hydrogen peroxide is a risk that, if a decomposition catalyst coexists during neutralization, hydrogen peroxide will run out of control, causing mist scattering, waste liquid boiling, and tank damage. Accompanied by.
Treatment of copper ions contained in a large amount by neutralization requires an alkaline agent, and requires filtration and separation of hydroxide produced by the neutralization reaction. The filtration equipment is also very expensive.
分離した水酸化物は安定化処理し、埋め立てる方法が取られてきたが、作業が煩雑で、埋め立て後の二次汚染の心配もある。更に近年埋立地の確保が極めて難しくなってきている。また精錬所にて回収する方法もあるが、多量の水を含んだ水酸化物を精錬所まで運ぶ費用も多大で、精錬所も極めて少ないのが現状である。
本発明は過酸化水素の分解速度を制御しながら安全に分解し、貴重な銅をきわめて効率よく高純度の金属として有効的に回収することができる設備を提供するものである。
Although the method of stabilizing and separating the separated hydroxide has been taken, the work is complicated and there is a concern of secondary contamination after the landfill. In recent years, it has become extremely difficult to secure landfills. There is also a method of collecting at a smelter, but the cost of transporting a hydroxide containing a large amount of water to the smelter is great, and there are very few smelters at present.
The present invention provides a facility capable of safely decomposing while controlling the decomposition rate of hydrogen peroxide and effectively recovering valuable copper as a highly pure metal with high efficiency.
本発明者等は上記の課題を解決すべく鋭意研究を行った結果、銅エッチング廃液を、排ガス処理設備を併設する過水電解処理槽に送り込み、過酸化水素の分解を制御しながら緩やかに分解する。過酸化水素分解後、廃液は銅回収槽に移し、電気分解により高純度の銅金属として回収できることを見出し、本発明を完成するに到った。すなわち本発明は、過酸化水素を含有する銅エッチング廃液の処理装置に関するものであり、以下のとおりである。 As a result of diligent research to solve the above-mentioned problems, the present inventors sent copper etching waste liquid to a superaqueous electrolytic treatment tank equipped with an exhaust gas treatment facility, and slowly decomposed it while controlling the decomposition of hydrogen peroxide. To do. After the hydrogen peroxide decomposition, the waste liquid was transferred to a copper recovery tank, and it was found that it could be recovered as high-purity copper metal by electrolysis, and the present invention was completed. That is, this invention relates to the processing apparatus of the copper etching waste liquid containing hydrogen peroxide, and is as follows.
１．過酸化水素を含む銅エッチング廃液を処理する装置であって、該廃液の（１）廃液ストック槽と（２）陽極の表面に凹凸を施し、表面積が平面に対し５〜１０倍の表面積を持つ白金電極および陰極はステンレス板であり、極間を３０〜３００ｍｍに保ち、陽極／陰極の面積比を１／１〜１／０．２に、処理廃液量に対し電極面積の比率は０．４〜２．０ｄｍ２／Ｌとし、液を攪拌するための強制循環ポンプを有する過酸化水素分解槽と、（３）過酸化水素水処理受槽、および（４）陽極に炭素、陰極には銅板を電極とし、極間は１００ｍｍ〜３００ｍｍ、陽極／陰極の面積比は１／１〜１／０．５で、液量に対する電極面積の比率は０．４〜１．２ｄｍ２／Ｌである銅回収槽からなることを特徴とする過酸化水素を含有する銅エッチング廃液の処理装置。
２．過酸化水素分解槽処理液中の過酸化水素の濃度を１.８ｗ／ｗ％以下に分解することを特徴とする第１項記載の過酸化水素を含有する銅エッチング廃液の処理装置。
３．銅回収層での銅回収後の廃液中の銅濃度を０.１ｗ／ｗ％以下であることを特徴とする第１項記載の過酸化水素を含有する銅エッチング廃液の処理装置。
４．過酸化水素分解槽の液温を２０℃〜６０℃に制御する冷却装置と排ガス処理設備を付帯することを特徴とする第１項記載の過酸化水素を含有する銅エッチング廃液の処理装置。
５．過酸化水素を含む銅エッチング廃液を処理する装置であって、該廃液の（１）廃液ストック槽と（２）陽極の表面に凹凸を施し、表面積が平面に対し５〜１０倍の表面積を持つ白金電極および陰極はステンレス板であり、極間を３０〜３００ｍｍに保ち、陽極／陰極の面積比を１／１〜１／０．２に、処理廃液量に対し電極面積の比率は０．４〜２．０ｄｍ２／Ｌとし、液を攪拌するための強制循環ポンプを有し、電流密度５〜５０Ａ／ｄｍ２で過酸化水素を電解する過酸化水素分解槽と、過酸化水素分解後、この処理水を（３）過酸化水素水処理受槽に貯留し、その後過酸化水素処理水を（４）陽極に炭素、陰極には銅板を電極とし、極間は１００ｍｍ〜３００ｍｍに、陽極／陰極の面積比は１／１〜１／０．５で、液量に対する電極面積の比率は０．４〜１．２ｄｍ２／Ｌとした銅回収槽に移送し、電流密度は０．５Ａ／ｄｍ２〜５Ａ／ｄｍ２の範囲内で電解し、純度９９．８％以上の銅を析出させ回収することを特徴とする過酸化水素を含有する銅エッチング廃液の処理方法。
1. An apparatus for treating a copper etching waste liquid containing hydrogen peroxide, wherein the (1) waste liquid storage tank and (2) the surface of the anode of the waste liquid are uneven, and the surface area is 5 to 10 times the surface area of the plane. The platinum electrode and the cathode are stainless plates, the distance between the electrodes is kept at 30 to 300 mm, the anode / cathode area ratio is 1/1 to 1 / 0.2, and the ratio of the electrode area to the amount of processing waste liquid is 0.4. ˜2.0 dm 2 / L, a hydrogen peroxide decomposition tank having a forced circulation pump for stirring the liquid, (3) a hydrogen peroxide treatment tank, and (4) carbon for the anode and a copper plate for the cathode Copper recovery with electrodes having a gap of 100 mm to 300 mm, an anode / cathode area ratio of 1/1 to 1 / 0.5, and a ratio of electrode area to liquid volume of 0.4 to 1.2 dm 2 / L Copper etching waste containing hydrogen peroxide, characterized by comprising a tank Liquid processing equipment.
2. The apparatus for treating a copper etching waste liquid containing hydrogen peroxide according to claim 1, wherein the concentration of hydrogen peroxide in the hydrogen peroxide decomposition bath treatment liquid is decomposed to 1.8 w / w% or less.
3. The copper etching waste liquid treatment apparatus containing hydrogen peroxide according to claim 1, wherein the copper concentration in the waste liquid after copper recovery in the copper recovery layer is 0.1 w / w% or less.
4). The apparatus for treating a copper etching waste liquid containing hydrogen peroxide according to claim 1, further comprising a cooling device for controlling the liquid temperature of the hydrogen peroxide decomposition tank to 20 ° C to 60 ° C and an exhaust gas treatment facility.
5). An apparatus for treating a copper etching waste liquid containing hydrogen peroxide, wherein the (1) waste liquid storage tank and (2) the surface of the anode of the waste liquid are uneven, and the surface area is 5 to 10 times the surface area of the plane. The platinum electrode and the cathode are stainless plates, the distance between the electrodes is kept at 30 to 300 mm, the anode / cathode area ratio is 1/1 to 1 / 0.2, and the ratio of the electrode area to the amount of processing waste liquid is 0.4. and ~2.0dm 2 / L, has a forced circulation pump for stirring the liquid, and hydrogen peroxide decomposition tank for electrolysis of hydrogen peroxide at a current density of 5~50A / dm 2, after the hydrogen peroxide decomposition, This treated water is stored in (3) a hydrogen peroxide treatment tank, and then treated with hydrogen peroxide (4) carbon as the anode and a copper plate as the cathode, and the gap between the electrodes is 100 mm to 300 mm. The area ratio is 1/1 to 1 / 0.5, and the electrode surface with respect to the liquid volume Ratios transferred to copper recovery tank was 0.4~1.2dm 2 / L, current density electrolysis in the range of 0.5A / dm 2 ~5A / dm 2 , 99.8% or more purity A method for treating a copper etching waste solution containing hydrogen peroxide, wherein copper is deposited and recovered.
以上のように本発明の装置は、過酸化水素を制御しながら分解し、高純度の銅を回収することができ、安全、且つ安定的に処理でき環境に配慮した装置である。 As described above, the device of the present invention is an environment-friendly device that can decompose hydrogen peroxide while controlling it and recover high-purity copper, and can safely and stably process the copper.
本発明の回収装置は、廃液を受け入れる廃液ストック槽と過酸化水素を分解する過水分解槽と過酸化水素水処理受槽および銅を回収する槽からなる。
廃液はストック槽で貯留し、過酸化水素分解槽に移す、電気分解の効率上、移送する廃液量は、分解槽の容量の７０〜９０％とし、更に好ましくは８０〜８５％とする。
過水分解槽には、電解設備が設置されていて、電解により過酸化水素を制御しながら分解する、このとき分解熱により液温が上昇するが、液温制御装置で温度を２０℃〜６０℃に、更に好ましくは３０℃〜６０℃に制御することにより、課題である暴発的な分解を回避し安全に分解処理する。そして、電解と同時に強制循環ポンプにて液の攪拌を行う。また排ガス処理装置を設置し、排ガスによる作業環境の悪化を防止する。
The recovery apparatus of the present invention comprises a waste liquid stock tank for receiving waste liquid, a perhydrolysis tank for decomposing hydrogen peroxide, a hydrogen peroxide treatment receiving tank, and a tank for recovering copper.
The waste liquid is stored in a stock tank and transferred to a hydrogen peroxide decomposition tank. For the efficiency of electrolysis, the amount of waste liquid to be transferred is 70 to 90%, more preferably 80 to 85% of the capacity of the decomposition tank.
The perhydrolysis tank is equipped with an electrolysis facility, and decomposes while controlling hydrogen peroxide by electrolysis. At this time, the liquid temperature rises due to the heat of decomposition, but the temperature is controlled at 20 ° C. to 60 ° C. with the liquid temperature control device. By controlling the temperature at 0 ° C., more preferably 30 ° C. to 60 ° C., it is possible to avoid the sudden decomposition that is a problem and to safely perform the decomposition treatment. And simultaneously with electrolysis, a liquid is stirred with a forced circulation pump. In addition, an exhaust gas treatment device will be installed to prevent the working environment from deteriorating due to the exhaust gas.
電解設備の電極は、陽極の表面に凹凸を施し、表面積が平面に対し５〜１０倍の表面積を持つ白金電極で、陰極にステンレス板とし、極間を３０〜３００ｍｍに保ち、陽極／陰極の面積比を１／１〜１／０．２とする。
処理廃液量に対し電極面積の比率は、０．４〜２．０ｄｍ２／Ｌとし、電流密度を５〜５０Ａ／ｄｍ２で過酸化水素の分解を行う。この分解は過酸化水素濃度を１．８％以下まで、より好ましくは１％以下、更に好ましくは０.８％以下とすることができる。
The electrode of the electrolysis equipment is a platinum electrode having a surface irregularity on the surface of the anode, a surface area of 5 to 10 times that of the plane, a cathode made of a stainless steel plate, keeping the gap between 30 to 300 mm, The area ratio is set to 1/1 to 1 / 0.2.
The ratio of electrode area to processing waste liquid is a 0.4~2.0dm 2 / L, performs decomposition of hydrogen peroxide current density at 5~50A / dm 2. This decomposition can reduce the hydrogen peroxide concentration to 1.8% or less, more preferably 1% or less, and still more preferably 0.8% or less.
過酸化水素を分解した処理水は銅回収槽に移す。銅の回収槽にも電解設備が設置されていて、陽極に炭素、陰極には銅板を用い、極間は１００ｍｍ〜３００ｍｍに保ち、陽極／陰極の面積比は１／１〜１／０．５とする。液量に対する電極面積の比率は０．４〜１．２ｄｍ２／Ｌとし、電流密度は０．５Ａ／ｄｍ２〜５Ａ／ｄｍ２の範囲内で電解することにより、銅を析出させ回収する。回収した銅の純度は９９．８％以上、更に好ましくは９９．９％以上であり、銅の回収率は９５％以上、好ましくは９７％以上、更に好ましくは９８％以上の回収を可能とする。 The treated water decomposed hydrogen peroxide is transferred to a copper recovery tank. Electrolytic equipment is also installed in the copper recovery tank, carbon is used for the anode, a copper plate is used for the cathode, the distance between the electrodes is kept at 100 mm to 300 mm, and the anode / cathode area ratio is 1/1 to 1 / 0.5. And The ratio of the electrode area to the liquid amount is 0.4 to 1.2 dm 2 / L, and the current density is electrolyzed within the range of 0.5 A / dm 2 to 5 A / dm 2 to precipitate and collect copper. The purity of the recovered copper is 99.8% or higher, more preferably 99.9% or higher, and the copper recovery rate is 95% or higher, preferably 97% or higher, more preferably 98% or higher. .
以下に本発明の実施例について図面を参照して説明する。
廃液組成；過酸化水素７ｗ/ｗ％、硫酸濃度３ｗ/ｗ％、銅濃度３４.９ｇ/Ｌ
廃液処理量；５００Ｌ（銅含有量１７．４５Kg、銅濃度３.５ｗ/ｗ％）
を図１の装置を用いて処理した。
Embodiments of the present invention will be described below with reference to the drawings.
Waste liquid composition: hydrogen peroxide 7 w / w%, sulfuric acid concentration 3 w / w%, copper concentration 34.9 g / L
Waste liquid treatment amount : 500 L (copper content 17.45 kg, copper concentration 3.5 w / w%)
Was processed using the apparatus of FIG.
過酸化水素濃度の分析方法；３００ｍｌコニカルビーカにサンプルを、ホールピペットを用いて正確に０.５ｍｌを採取し、純水１００ｍｌを加え、これに２０ｗ/ｗ％硫酸約１０ｍｌを加える。次に、１/１０Ｎ過マンガン酸カリウムを用いて滴定する（滴定量Ａｍｌ）。終点は、無色から薄いピンク色に呈色し、３０秒消えない点とする。
過酸化水素濃度（ｇ/Ｌ）＝（過マンガン酸カリウムのファクター×Ａ×０.１７/０.５）×１０＝過マンガン酸カリウムのファクター×Ａ×３.４
銅濃度の分析方法；３００ｍｌコニカルビーカにサンプルを、ホールピペットを用いて正確に０.２ｍｌを採取し、純水１００ｍｌを加え、これに緩衝溶液約２０ｍｌを加える。次に、Ｘ・Ｏ指示薬を２〜３滴加え、６０〜７０℃に加熱する。１/１００ＭのＥＤＴＡ溶液にて滴定定する（滴定量Ｂｍｌ）。終点は、赤紫色から黄緑色に呈色する点とする。
銅濃度（ｇ/Ｌ）＝ＥＤＴＡのファクター×Ｂ×０.６３５４/０.２＝ＥＤＴＡのファクター×Ｂ×３.１７７
Analytical method of hydrogen peroxide concentration: A sample is taken into a 300 ml conical beaker and 0.5 ml is accurately collected using a whole pipette, 100 ml of pure water is added, and about 10 ml of 20 w / w% sulfuric acid is added thereto. Next, it titrates using 1 / 10N potassium permanganate (titer Aml). The end point is a point that changes from colorless to light pink and does not disappear for 30 seconds.
Hydrogen peroxide concentration (g / L) = (factor of potassium permanganate × A × 0.17 / 0.5) × 10 = factor of potassium permanganate × A × 3.4
Analytical method of copper concentration: Take a sample in a 300 ml conical beaker, accurately 0.2 ml using a whole pipette, add 100 ml of pure water, and add about 20 ml of buffer solution to this. Next, add 2-3 drops of X • O indicator and heat to 60-70 ° C. Titrate with 1/100 M EDTA solution (titrate Bml). The end point is a point that turns from red purple to yellow-green.
Copper concentration (g / L) = EDTA factor × B × 0.6354 / 0.2 = EDTA factor × B × 3.177
図１において、1は廃液ストック槽であり廃液を一旦この槽に受け、その量が過水分解槽４の容量の８５％以上溜まった時点で、廃液ストック槽１から過水分解槽４に、過水分解槽送液ポンプ２にて廃液を送液し、過水分解槽４の８２％の容量になった時点で一旦ポンプ２を停止する。つぎにバルブを循環に切り替えポンプ２を作動させ流量を上げ強制攪拌を開始する。次に過酸化水素分解整流器５の電流値を１，７００Ａ(１４Ａ／ｄｍ２)にセットし電解を開始する。このとき陽極に表面積が平面に対し１０倍の凹凸のある白金電極（有効面積７００ｄｍ２）、陰極にステンレス板（有効面積１４４ｄｍ２）を有し、極間を５０ｍｍに保ち、陽極／陰極の面積比を５／１とした。
同時に冷却装置６および排気洗浄装置７を稼動させ廃液温度を６０℃以上に上がらないよう制御した。加えて排ガス処理も実施した。
分解開始６時間後、過酸化水素濃度は０．４％に低下した。整流器および強制循環ポンプを止め、次に８の過酸化水素水処理受槽へ廃液を移し、更に廃液を９の銅回収槽へ移した。
循環ポンプ１１を稼動させる。陽極に炭素（有効面積７００ｄｍ２）、陰極には銅板（有効面積６００ｄｍ２）を電極とし、極間は２００ｍｍに、陽極／陰極の面積比は１／０.８５とした。整流器を稼動させ銅の回収を開始する。このとき電流は１，８００Ａ（３Ａ/ｄｍ２）で９.５時間行い、銅を１７.２５Ｋｇ回収した。回収した銅の純度は９９．９％以上で、回収率は９８.９ｗ/ｗ％であった。最終処理液中の銅濃度０.０４ｗ/ｗ％、過酸化水素濃度０．００１ｗ／ｗ％であった。
In FIG. 1, reference numeral 1 denotes a waste liquid stock tank. The waste liquid is once received in this tank, and when the amount of the waste water tank is 85% or more of the capacity of the superhydrolysis tank 4, The waste liquid is fed by the overwater decomposition tank liquid feed pump 2, and when the capacity of the overwater decomposition tank 4 reaches 82%, the pump 2 is temporarily stopped. Next, the valve is switched to circulation, the pump 2 is operated, the flow rate is increased, and forced stirring is started. Next, the current value of the hydrogen
At the same time, the cooling device 6 and the exhaust gas cleaning device 7 were operated to control the waste liquid temperature so as not to rise above 60 ° C. In addition, exhaust gas treatment was carried out.
Six hours after the start of decomposition, the hydrogen peroxide concentration dropped to 0.4%. The rectifier and the forced circulation pump were stopped, and then the waste liquid was transferred to the hydrogen peroxide solution treatment receiving tank of No. 8, and the waste liquid was further transferred to the copper recovery tank of No. 9.
The circulation pump 11 is operated. Carbon (effective area 700 dm 2 ) was used for the anode, and a copper plate (effective area 600 dm 2 ) was used for the cathode, the gap between the electrodes was 200 mm, and the anode / cathode area ratio was 1 / 0.85. Activate the rectifier and start collecting copper. At this time, the current was 1,800 A (3 A / dm 2 ) for 9.5 hours, and 17.25 kg of copper was recovered. The purity of the recovered copper was 99.9% or more, and the recovery rate was 98.9 w / w%. The copper concentration in the final treatment solution was 0.04 w / w% and the hydrogen peroxide concentration was 0.001 w / w%.
これらの処理を行うことにより原液廃液中の過酸化水素濃度は初期の７ｗ/ｗ％から過酸化水素の分解処理後０.４ｗ/ｗ％へ、更に銅回収処理終了後０．００１ｗ/ｗ％に低減した。銅濃度は３.５ｗ/ｗ％より０.０４ｗ/ｗ％に低減でき、これまで廃棄されてきた銅を９９．９％以上の純度で１７.２５Ｋｇ有効回収することができた。これらの操作は、安全に、且つ安定的に、更に低コストで実施することができ、これらの処理を行った最終処理液は、通常の工場廃水として処理、廃棄することができた。 By carrying out these treatments, the hydrogen peroxide concentration in the stock solution waste liquid is changed from the initial 7 w / w% to 0.4 w / w% after the decomposition of hydrogen peroxide, and further 0.001 w / w% after the copper recovery process is completed Reduced to The copper concentration could be reduced from 3.5 w / w% to 0.04 w / w%, and 17.25 Kg of copper that had been discarded so far could be effectively recovered with a purity of 99.9% or more. These operations can be carried out safely and stably at a lower cost, and the final treatment liquid subjected to these treatments can be treated and discarded as normal factory waste water.
１ 廃液ストック槽
２ 過水分解槽送液ポンプ兼強制循環ポンプ
３ 装置の動力制御盤
４ 過酸化水素分解槽
５ 過酸化水素分解整流器
６ 冷却装置
７ 排気洗浄装置
８ 過酸化水素水処理受槽
９ 銅回収槽
10 銅回収整流器
11 銅回収循環ポンプ
DESCRIPTION OF SYMBOLS 1 Waste liquid stock tank 2 Superwater decomposition tank liquid feed pump and forced circulation pump 3 Power control panel of apparatus 4 Hydrogen
10 Copper recovery rectifier
11 Copper recovery circulation pump
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007339370A JP4819032B2 (en) | 2007-12-28 | 2007-12-28 | Processing equipment for copper etching waste liquid containing hydrogen peroxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007339370A JP4819032B2 (en) | 2007-12-28 | 2007-12-28 | Processing equipment for copper etching waste liquid containing hydrogen peroxide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009160486A JP2009160486A (en) | 2009-07-23 |
| JP4819032B2 true JP4819032B2 (en) | 2011-11-16 |
Family
ID=40963714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007339370A Active JP4819032B2 (en) | 2007-12-28 | 2007-12-28 | Processing equipment for copper etching waste liquid containing hydrogen peroxide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4819032B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8158532B2 (en) | 2003-10-20 | 2012-04-17 | Novellus Systems, Inc. | Topography reduction and control by selective accelerator removal |
| US8530359B2 (en) | 2003-10-20 | 2013-09-10 | Novellus Systems, Inc. | Modulated metal removal using localized wet etching |
| US8372757B2 (en) | 2003-10-20 | 2013-02-12 | Novellus Systems, Inc. | Wet etching methods for copper removal and planarization in semiconductor processing |
| US7972970B2 (en) | 2003-10-20 | 2011-07-05 | Novellus Systems, Inc. | Fabrication of semiconductor interconnect structure |
| US7605082B1 (en) | 2005-10-13 | 2009-10-20 | Novellus Systems, Inc. | Capping before barrier-removal IC fabrication method |
| US8597461B2 (en) | 2009-09-02 | 2013-12-03 | Novellus Systems, Inc. | Reduced isotropic etchant material consumption and waste generation |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5248576B2 (en) * | 1973-06-25 | 1977-12-10 | ||
| JPH0461986A (en) * | 1990-06-27 | 1992-02-27 | Nec Toyama Ltd | Treatment of waste liquid of sulfuric acid/hydrogen peroxide etching |
| JP4184816B2 (en) * | 2003-01-30 | 2008-11-19 | 日鉄鉱業株式会社 | Copper etching waste treatment method |
| JP2005187865A (en) * | 2003-12-25 | 2005-07-14 | Nittetsu Mining Co Ltd | Method and apparatus for recovering copper from copper etching waste solution by electrolysis |
-
2007
- 2007-12-28 JP JP2007339370A patent/JP4819032B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009160486A (en) | 2009-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4819032B2 (en) | Processing equipment for copper etching waste liquid containing hydrogen peroxide | |
| CN100591616C (en) | Technical method for electrorefining diamond | |
| US10221491B2 (en) | Process and apparatus for generating or recovering hydrochloric acid from metal salt solutions | |
| Li et al. | Extraction of copper from copper and cadmium residues of zinc hydrometallurgy by oxidation acid leaching and cyclone electrowinning | |
| KR20120083447A (en) | Hydrometalurgical process and apparatus for recovering metals from waste material | |
| CN108642503A (en) | A method of removing fluorine, chlorion from high-concentration industrial spent acid | |
| US7285677B1 (en) | System and method for recovering CTA residues and purifying/regenerating catalyst | |
| EP2995702A1 (en) | Zinc production method | |
| JP2010059502A (en) | Treatment method and device for copper etching waste solution | |
| CN111943423A (en) | Method and system for treating acidic copper-containing etching liquid | |
| CN108425017B (en) | The method of valuable metal is recycled from copper indium gallium selenide refuse battery chip | |
| CN102828027B (en) | Dechlorination method for indium raffinate | |
| JP5124824B2 (en) | Method for treating a compound containing gallium | |
| US9371592B2 (en) | Method for electrochemical modification of liquid stream characteristics | |
| JP2927352B1 (en) | Etching waste liquid recycling method and its apparatus | |
| JP4184816B2 (en) | Copper etching waste treatment method | |
| WO2008050675A1 (en) | Method and apparatus for separation/collection of pcb | |
| JP2006176353A (en) | Method for recovering hydrochloric acid and copper from copper etching waste liquid | |
| EP1534879B1 (en) | Methods and apparatus for reducing sulfur impurities and improving current efficiencies of inert anode aluminium production cells | |
| KR20020094482A (en) | Method of recovering silver | |
| JPS61133192A (en) | Treatment of waste copper liquid containing hydrochloric acid | |
| RU2765894C1 (en) | Method for processing the solution for etching printed circuit boards | |
| CN114195099B (en) | Method for preparing electronic grade hydrogen fluoride and electronic grade hydrofluoric acid by in-situ arsenic removal of multichannel microreactor | |
| CN213327146U (en) | Acid copper-containing etching liquid treatment system | |
| JP2006272051A (en) | Waste water treatment method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20101006 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110614 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110719 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110809 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110830 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110831 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140909 Year of fee payment: 3 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 4819032 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140909 Year of fee payment: 3 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |