JP4810324B2 - Saturated steam temperature measuring device - Google Patents

Saturated steam temperature measuring device Download PDF

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JP4810324B2
JP4810324B2 JP2006172044A JP2006172044A JP4810324B2 JP 4810324 B2 JP4810324 B2 JP 4810324B2 JP 2006172044 A JP2006172044 A JP 2006172044A JP 2006172044 A JP2006172044 A JP 2006172044A JP 4810324 B2 JP4810324 B2 JP 4810324B2
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temperature
steam
container
water
treatment tank
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JP2008002922A (en
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盛 甲田
友彦 高瀬
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Hisaka Works Ltd
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Description

本発明は飽和蒸気雰囲気或いは減圧下の蒸気雰囲気の処理槽における飽和蒸気温度を測定する装置であり、蒸し、加熱調理器、蒸気殺菌機その他飽和蒸気で加熱する装置全般で使用することのできる測定装置に関する。   The present invention is an apparatus for measuring saturated steam temperature in a treatment tank of a saturated steam atmosphere or a steam atmosphere under reduced pressure, and can be used in steaming, heating cookers, steam sterilizers and other devices that are heated with saturated steam in general. Relates to the device.

蒸気加熱装置内に発生する過熱温度(スーパーヒート)を拾うことなく、正確な飽和蒸気温度を安定的に測定することにより処理装置の温度を制御すると共に圧力の制御をし、製品温度と同等の温度管理を実現する。   Without picking up the superheat temperature generated in the steam heating device, the temperature of the processing device is controlled and the pressure is controlled by stably measuring the accurate saturated steam temperature, which is equivalent to the product temperature. Realize temperature control.

従来から加熱処理装置では、処理槽内の飽和蒸気温度又は飽和蒸気圧力を測定して温度を調節する装置が用いられている。
特開平8−170807号公報 特開平10−19684号公報
2. Description of the Related Art Conventionally, in a heat treatment apparatus, an apparatus that adjusts the temperature by measuring a saturated vapor temperature or a saturated vapor pressure in a treatment tank has been used.
JP-A-8-170807 Japanese Patent Laid-Open No. 10-19684

解決しようとする問題点は、大気圧以下の処理槽内に送入された蒸気は必ずスーパーヒートするので、温度センサーがこの過熱蒸気の影響を受けて、飽和蒸気温度よりも高い温度を計測してしまい、処理槽内温度を正しく制御することができない点である。特に昇温・加熱時にこの過熱温度を拾うため、早めに設定温度をキャッチしてしまい、実質設定温度による製品の殺菌ができない点である。   The problem to be solved is that the steam sent into the treatment tank below atmospheric pressure always superheats, so the temperature sensor is affected by this superheated steam and measures a temperature higher than the saturated steam temperature. Therefore, the temperature inside the processing tank cannot be correctly controlled. In particular, since this superheated temperature is picked up during heating and heating, the set temperature is caught early, and the product cannot be sterilized by the substantially set temperature.

特開平10−19684号公報では、減圧雰囲気内で所定水位まで水を入れた容器を設置する例が開示されている。この例では給水部材の下端を容器内の水中に設置し、水面上の上端に温度センサーの感温部を設けている。   Japanese Patent Application Laid-Open No. 10-19684 discloses an example in which a container filled with water up to a predetermined water level in a reduced pressure atmosphere is installed. In this example, the lower end of the water supply member is installed in the water in the container, and a temperature sensor temperature sensor is provided at the upper end of the water surface.

この構成によると、給水部材で吸上げられた水が蒸発する時の気化熱を奪った状態の温度を感温部で計測しており、飽和蒸気温度を直接計測するものではない。また予め記憶した飽和蒸気と飽和蒸気圧との関係から圧力を演算する圧力演算手段を設けて、処理槽を圧力によって制御している。   According to this configuration, the temperature in a state where the heat of vaporization when water sucked up by the water supply member evaporates is measured by the temperature sensing unit, and the saturated steam temperature is not directly measured. Further, a pressure calculating means for calculating the pressure from the relationship between the saturated steam and the saturated vapor pressure stored in advance is provided, and the processing tank is controlled by the pressure.

本発明は処理槽において、大気圧より下の雰囲気で初期脱気、復圧、再脱気、昇温、加熱、真空冷却等の各段階を行う場合(図7、表1参照)、過熱温度の影響を受けないよう処理槽内に飽和蒸気層を構成する容器を設置して、直接飽和蒸気温度を測定するようにした。   In the present invention, in the treatment tank, when performing each stage such as initial degassing, repressure, redegassing, temperature rise, heating, vacuum cooling, etc. in an atmosphere below atmospheric pressure (see FIG. 7, Table 1), the superheat temperature A container constituting a saturated vapor layer was installed in the treatment tank so as not to be affected by this, and the saturated vapor temperature was directly measured.

大気圧以下の処理槽内の温度は、底部においてスーパーヒートの影響を受けることが少ないことが知られている。本発明はこの処理槽底部のような状態、即ち水溜りの近くである、気体蒸気が停滞する、処理槽自身の温度が低いところである、と言う状態が飽和蒸気温度を測定するのに最適であるという知見に基づき開発されたものである。   It is known that the temperature in the treatment tank below atmospheric pressure is less affected by superheat at the bottom. In the present invention, the state of the bottom of the treatment tank, that is, near the water pool, the state where the gas vapor is stagnant, or the temperature of the treatment tank itself is low, is optimal for measuring the saturated vapor temperature. It was developed based on the knowledge that there is.

そして、処理槽と連通する隙間を蓋に設け、水を収容した容器を処理槽内に設置した。この容器内に飽和蒸気層を形成し、温度センサーを水面と蓋との間の飽和蒸気層に設置して、気体の自由分子運動の原理により、処理槽内の飽和蒸気温度が温度センサーへ確実且つ正確に伝わるようにした。   A gap communicating with the treatment tank was provided in the lid, and a container containing water was installed in the treatment tank. A saturated vapor layer is formed in this container, and a temperature sensor is installed in the saturated vapor layer between the water surface and the lid, so that the saturated vapor temperature in the treatment tank is assured to the temperature sensor by the principle of free molecular movement of the gas. And it was communicated accurately.

以下具体的な手段を示す。   Specific means will be described below.

第1発明は飽和蒸気雰囲気又は減圧下の蒸気雰囲気とした処理槽内に設置され、水を収容した耐熱性の容器と、処理槽と連通する隙間を設けた容器の蓋と、容器内の水面と蓋との間に形成した過熱蒸気の影響を受けない飽和蒸気層と、この飽和蒸気層で水面と蓋との間で水面に近接して設置された温度センサーを有する測温部と、から成る飽和蒸気温度測定装置とした。   1st invention is installed in the processing tank made into the saturated steam atmosphere or the steam atmosphere under pressure reduction, the heat-resistant container which accommodated water, the cover of the container which provided the clearance gap connected to a processing tank, and the water surface in a container A saturated steam layer that is not affected by the superheated steam formed between the water surface and the lid, and a temperature measuring unit that has a temperature sensor installed in the saturated steam layer between the water surface and the lid in the vicinity of the water surface, It was set as the saturated vapor temperature measuring apparatus which consists of.

従って、温度制御がより精確に且つ敏速にでき、正しい温度による製品の処理を可能とした。   Therefore, the temperature control can be performed more accurately and quickly, and the product can be processed at the correct temperature.

第2発明では、容器に一定水位の水を保持するようオーバーフロー用の切欠部を設けた。   In the second aspect of the invention, the overflow notch is provided in the container so as to hold water at a constant water level.

第3発明では、処理槽の蒸気入口の内方に送入される蒸気を分散する邪魔板を設置した。   In 3rd invention, the baffle plate which disperse | distributes the steam sent inward of the steam inlet of a processing tank was installed.

第4発明では、処理槽の長さ方向中央上方に蒸気入口部を設け、飽和蒸気層に温度センサーを設置した容器を処理槽の製品出入口に近い側壁で高さ方向中央に設けた。   In the fourth aspect of the invention, a steam inlet is provided at the upper center of the processing tank in the longitudinal direction, and a container in which a temperature sensor is installed in the saturated steam layer is provided at the center in the height direction on the side wall near the product inlet / outlet of the processing tank.

処理槽内に水を収容した耐熱性の容器を設置し、処理槽と連通する蓋を設け、この蓋と水面との間に過熱蒸気の影響を受けない飽和蒸気層を構成して、温度センサーを設置したので、飽和蒸気温度を直接測定し、正確且つ敏速な温度測定ができるようになった。   Install a heat-resistant container containing water in the treatment tank, provide a lid that communicates with the treatment tank, and configure a saturated vapor layer that is not affected by superheated steam between this lid and the water surface. As a result, the saturated steam temperature can be measured directly and the temperature can be measured accurately and promptly.

処理槽に送入される蒸気を入口に設けた邪魔板により分散させると処理槽内の蒸気分布が均一となり更に過熱温度の影響を受け難くなる。   When the steam fed into the treatment tank is dispersed by the baffle plate provided at the inlet, the vapor distribution in the treatment tank becomes uniform and is less susceptible to the overheating temperature.

正確な測定温度に従って処理槽へ送入される蒸気量をコントロールすることにより所定の温度による製品の加熱処理ができ、飽和蒸気温度の精確な把握と、飽和蒸気圧力の調節もできるようになった。   By controlling the amount of steam fed into the treatment tank according to the exact measured temperature, the product can be heat-treated at a predetermined temperature, and the saturated steam temperature can be accurately grasped and the saturated steam pressure can be adjusted. .

処理槽内に設置したボックス、箱などの容器に水を入れ、切欠部によりオーバーフローして所定量の水を保持するようにした。   Water was put into a container such as a box or a box installed in the treatment tank, and overflowed by the notch to hold a predetermined amount of water.

大気圧以下の処理槽内雰囲気で、初期脱気、復圧、再脱気、昇温、加熱、真空冷却等の処理をする場合、加熱時に容器内の水は凝縮されて水の量が増え、真空冷却時には水が沸騰して減少するので、容器内の水がなくならないよう蒸発状態を計算して水が保持されている。   When processing such as initial degassing, return pressure, re-degassing, temperature rise, heating, vacuum cooling, etc. in the atmosphere inside the treatment tank below atmospheric pressure, the water in the container is condensed during heating and the amount of water increases. Since the water boils and decreases during vacuum cooling, the evaporation state is calculated so that the water in the container does not disappear, and the water is retained.

処理槽の大きさや被処理物の種類等により1バッチの運転では、水の量が異なるが、一例を挙げれば下記のように水の量が変化する。   In one batch operation, the amount of water varies depending on the size of the treatment tank, the type of object to be treated, etc., but the amount of water varies as follows, for example.

水がなくならないよう予め容器内の水量は計算されているが、加熱処理時に補充することができる。   Although the amount of water in the container is calculated in advance so that water does not run out, it can be replenished during the heat treatment.

処理槽 直径 1000mm 全長 1900mm
容器(SUS) 縦 120mm、横 120mm、 高さ 50mm
容器に設けた切欠部の高さ 32.5mm
水の量 切欠部まで水を張った場合の容積は438.6ml 高さ 31.5mm
である。
真空冷却時(80℃から30℃まで冷却時)の蒸発量 39.8mlで
水の高さ 28.6mmとなった。
Treatment tank Diameter 1000mm Total length 1900mm
Container (SUS) length 120mm, width 120mm, height 50mm
The height of the notch provided in the container 32.5mm
The amount of water The volume when water is filled up to the notch is 438.6 ml, height 31.5 mm
It is.
Evaporation amount at vacuum cooling (cooling from 80 ° C to 30 ° C) 39.8ml
The height of the water was 28.6 mm.

容器には、過熱温度の影響がなく処理槽と連通する隙間を有する蓋を取付け、蒸気が出入りできる飽和蒸気層を構成したので、飽和蒸気温度を直接且つ即座に測定できるようになった。   The vessel was provided with a lid having a gap communicating with the treatment tank without being affected by the overheating temperature, and constituted a saturated vapor layer through which the vapor could enter and exit, so that the saturated vapor temperature could be measured directly and immediately.

図示した例では容器と蓋とを別にしているが、一体型としてもよい。   In the illustrated example, the container and the lid are separately provided, but may be integrated.

図1は、本発明に用いる容器と測温部を示す斜視図である。図2は断面図、図3は分解斜視図である。   FIG. 1 is a perspective view showing a container and a temperature measuring unit used in the present invention. 2 is a sectional view, and FIG. 3 is an exploded perspective view.

1は容器で、箱、ボックスその他水を収容する耐熱性の器である。2は蓋で、容器1の上端に設けて両側に隙間3を形成し処理槽と連通させた。4は切欠部で、容器内に保持される水7を一定水位に保持できるようにした。5は温度センサー、6は測温部である。   Reference numeral 1 denotes a container, which is a heat-resistant container for storing water such as a box, a box or the like. Reference numeral 2 denotes a lid, which is provided at the upper end of the container 1 to form a gap 3 on both sides to communicate with the treatment tank. Reference numeral 4 denotes a notch, which can keep the water 7 held in the container at a constant water level. 5 is a temperature sensor, and 6 is a temperature measuring unit.

8は飽和蒸気層であり、容器1内の水面と蓋2との間にスーパーヒートの影響がないように構成されている。蓋2は、隙間3により容器が処理槽9と連通すると共に温度センサー5の上方を覆っているので蒸気が凝縮して温度センサーに影響するのを防止している。   Reference numeral 8 denotes a saturated vapor layer, which is configured so as not to be affected by superheat between the water surface in the container 1 and the lid 2. The lid 2 prevents the steam from condensing and affecting the temperature sensor because the container communicates with the treatment tank 9 through the gap 3 and covers the temperature sensor 5.

蓋2は図示した例では分離可能にしているが、水の注入ができ、隙間が形成できれば一体型でもよい。   The lid 2 is separable in the illustrated example, but may be an integral type as long as water can be injected and a gap can be formed.

図4、図5において、9は処理槽であり、容器1は処理槽9の出入口10側に近接して高さ方向の中間部に設けられている。容器1内部の水7が1バッチ運転において凝縮され、水の量が増えた場合は、切欠部4から排出され、また真空冷却時に水が沸騰して減少する場合に処理槽出入口の近辺にあるので、次の処理に備えて水の補給が容易となっている。   4 and 5, reference numeral 9 denotes a processing tank, and the container 1 is provided in the intermediate portion in the height direction in the vicinity of the entrance / exit 10 side of the processing tank 9. When the water 7 inside the container 1 is condensed in one batch operation and the amount of water increases, it is discharged from the notch 4, and when water is boiled and reduced during vacuum cooling, it is in the vicinity of the treatment tank entrance / exit. Therefore, it is easy to supply water for the next treatment.

11は蒸気送入口で、処理槽9の中央部上端に取付けられ、内部には邪魔板12が設けられている。この邪魔板12により蒸気が分散して均一な加熱ができるようになっている。上記の容器1が処理槽9の出入口10側に近接することにより、蒸気送入口11より離れており、過熱蒸気の影響を受けないように配置されている。
13は被処理物を示す。
Reference numeral 11 denotes a steam inlet, which is attached to the upper end of the central portion of the processing tank 9, and a baffle plate 12 is provided inside. The baffle plate 12 disperses the steam so that uniform heating can be achieved. When the container 1 is close to the inlet / outlet 10 side of the processing tank 9, it is separated from the steam inlet 11 and is arranged so as not to be affected by the superheated steam.
Reference numeral 13 denotes an object to be processed.

独立の金属製(好ましくはSUS)小箱を、蒸気送入口から離れ、製品が装填されたバスケットの横に常設した。これにより処理槽からの伝導伝熱を直接受け難い配置とした。   An independent metal (preferably SUS) small box was permanently placed next to the basket loaded with product away from the steam inlet. Thereby, it was set as the arrangement | positioning which cannot receive the heat conduction from a processing tank directly.

小箱に水を張り、長さ100mmの温度センサーを水上10mm程度の空間にセットした。温度センサーは全長を水面に近接させているが、接触しないようにした。   A small box was filled with water, and a temperature sensor having a length of 100 mm was set in a space of about 10 mm above the water. The temperature sensor was placed close to the water surface, but it was not touched.

小箱に蓋を取り付け、両端に約10mmの隙間を空ける。これにより処理槽と連通し、一旦入った蒸気を滞留させる。   Attach a lid to the small box and leave a gap of about 10 mm at both ends. Thereby, it communicates with the treatment tank and the steam once entered is retained.

温度センサーから蓋の内側までの距離を約30mmとした。   The distance from the temperature sensor to the inside of the lid was about 30 mm.

小箱を設けることにより、処理槽内の蒸気の流れから隔離し、蓋で包含された蒸気と水面との間の伝熱で飽和蒸気になった蒸気分子を、気体の自由分子運動の原理により、温度センサーへ確実に接触させるようにした。   By providing a small box, the steam molecules isolated from the steam flow in the treatment tank and saturated with heat transferred between the steam contained in the lid and the water surface are converted according to the principle of free molecular motion of the gas. To ensure contact with the temperature sensor.

図6は処理槽9で飽和蒸気温度による処理経路を示すもので、蒸気送入口11に接続された脱気・真空冷却経路(A)、復圧・昇温・加熱経路(B)及び真空ブレイク経路(C)を設けている。   FIG. 6 shows a processing path depending on the saturated steam temperature in the processing tank 9, and a degassing / vacuum cooling path (A), return pressure / temperature rising / heating path (B) connected to the steam inlet 11, and a vacuum break. Route (C) is provided.

図7は処理工程を示すもので、a、b、c、d、e、f、gの工程が行われる。その詳細は表1に示すとおりである。   FIG. 7 shows processing steps, and steps a, b, c, d, e, f, and g are performed. The details are shown in Table 1.

Figure 0004810324
Figure 0004810324

先ず初期脱気として処理槽9内の空気を抜く(図6A 動作)。次いで処理槽に蒸気を入れて復圧し、圧力を設定値まで上げる(図6B 動作)。再度処理槽内の気体を抜き、設定温度まで蒸気を入れて飽和蒸気温度による加熱を行う(図6B 動作)。加熱は設定温度をキープして行われる。加熱終了後、処理槽内の圧力を下げて製品の水分を蒸発させ(図6A動作)、冷却する(図6C 動作)。   First, the air in the treatment tank 9 is removed as initial degassing (operation in FIG. 6A). Next, steam is put into the treatment tank to restore the pressure, and the pressure is raised to a set value (operation in FIG. 6B). The gas in the treatment tank is again evacuated, steam is added to the set temperature, and heating is performed at the saturated steam temperature (operation in FIG. 6B). Heating is performed while keeping the set temperature. After the heating is completed, the pressure in the treatment tank is lowered to evaporate the moisture in the product (operation in FIG. 6A) and cool (operation in FIG. 6C).

図8のグラフは、設定温度85℃において本発明の飽和蒸気温度測定装置による測定グラフである。(A)は本発明測定装置による測定値であり、(B)は製品温度を示している。(A)と(B)は加熱処理温度において、正確な温度制御が行われている。(C)は大気圧以下の処理槽内に発生する過熱温度(スーパーヒート)を示しているが、この温度に影響されていない。   The graph of FIG. 8 is a measurement graph by the saturated steam temperature measuring device of the present invention at a set temperature of 85 ° C. (A) is a measurement value by this invention measuring apparatus, (B) has shown product temperature. In (A) and (B), accurate temperature control is performed at the heat treatment temperature. (C) shows the superheat temperature (superheat) generated in the treatment tank below atmospheric pressure, but is not affected by this temperature.

処理槽 株式会社日阪製作所製 RIC-100/20-1
大きさ 直径1000x1900mm 内容積 1.78m
処理された製品 小魚 62Kg
昇温時間 40℃ 85℃ 1分37秒
加熱温度(設定温度) 85℃
加熱時間 2分30秒
真空冷却圧力 −98Kps
真空冷却温度 約 30℃
真空冷却時間 3分30秒
Treatment tank RIC-100 / 20-1 manufactured by Nisaka Manufacturing Co., Ltd.
Size Diameter 1000x1900mm Internal volume 1.78m 3
Processed product Small fish 62Kg
Temperature rise time 40 ° C 85 ° C 1 minute 37 seconds Heating temperature (set temperature) 85 ° C
Heating time 2 minutes 30 seconds Vacuum cooling pressure -98 Kps
Vacuum cooling temperature about 30 ℃
Vacuum cooling time 3 minutes 30 seconds

計測器 山武株式会社製 HYY-2.3-30-10-Pt100-316-A-D
製品温度の測定 トレー内に積み込まれた製品の最上段の中央に設置。
過熱温度の測定 処理槽の側壁に直接設置。
Measuring instrument HYY-2.3-30-10-Pt100-316-AD manufactured by Yamatake Corporation
Product temperature measurement Installed in the center of the top of the product loaded in the tray.
Measurement of overheating temperature Installed directly on the side wall of the treatment tank.

図9のグラフは従来例の測定結果を示すもので、設定温度85℃に対して高い過熱温度(D)を拾うこととなり、処理工程中加熱時に図6に示す工程(B)において、、蒸気コントロール弁の開度を絞る動作が行なわれ、製品温度が下がってしまう欠点がある。設定温度85℃に対して、グラフ(B)で明らかなように製品温度が80℃を下がるような結果が示されている。処理槽、計測器、製品温度、過熱温度の測定等は実施例1と同様である。   The graph of FIG. 9 shows the measurement result of the conventional example, and a high superheat temperature (D) is picked up with respect to the set temperature of 85 ° C. In the process (B) shown in FIG. There is a drawback that the operation of reducing the opening degree of the control valve is performed and the product temperature is lowered. As is apparent from the graph (B) with respect to the set temperature of 85 ° C., the results show that the product temperature falls below 80 ° C. The treatment tank, measuring instrument, product temperature, superheat temperature measurement, and the like are the same as in the first embodiment.

本発明では、上記のように容器1を処理槽9内に設置して、一定水位の水の保持、蓋2で形成される隙間3による処理槽との連通、更に容器内に飽和蒸気層8が構成されている。従って、精確な温度測定とこの温度による処理槽の温度制御を実現できるようになった。特に飽和蒸気層8では温度センサー5と測温部6が処理槽の過熱蒸気による影響を全く受けないようになっているので、従来見られた高い温度を拾う難点を解消した。   In the present invention, the container 1 is installed in the treatment tank 9 as described above, water at a constant water level is maintained, communication with the treatment tank is made by the gap 3 formed by the lid 2, and the saturated vapor layer 8 is further contained in the container. Is configured. Therefore, accurate temperature measurement and temperature control of the treatment tank by this temperature can be realized. In particular, in the saturated steam layer 8, the temperature sensor 5 and the temperature measuring unit 6 are not affected at all by the superheated steam in the processing tank, so the problem of picking up the high temperature that has been seen in the past has been solved.

従来の温度測定では、製品である小魚の温度と殺菌装置に設けた制御用の温度とは、蒸気の流れや槽内の空気等の存在により、均一とならず小魚の品質と殺菌を確保するための制御が困難であった。本発明では設定温度に限りなく近い正確な温度測定ができ、制御が可能となったので品質のよい製品が得られる。   In the conventional temperature measurement, the temperature of the small fish that is the product and the control temperature provided in the sterilizer are not uniform due to the flow of steam, the presence of air in the tank, etc., and ensure the quality and sterilization of the small fish. Because of this, it was difficult to control. In the present invention, accurate temperature measurement as close as possible to the set temperature can be performed and control can be performed, so that a product with high quality can be obtained.

上記のように、本発明では容器内の飽和蒸気層の温度を直接に測温し、これにより加熱処理又は殺菌処理が正確に制御できるようになった。   As described above, in the present invention, the temperature of the saturated vapor layer in the container is directly measured, whereby the heat treatment or sterilization treatment can be accurately controlled.

処理槽内の飽和蒸気温度の測定が正確になったので、処理槽を用いる蒸し、加熱調理器、蒸気殺菌機その他飽和蒸気で加熱する装置全般での温度制御に使用することができ、産業上の利用が広く且つ容易で格段に正確な測定と温度制御が実現できる。   Since the measurement of the saturated steam temperature in the treatment tank has become accurate, it can be used for temperature control in steaming, heating cookers, steam sterilizers, and other devices that use saturated steam in general. Can be used widely and easily, and can achieve extremely accurate measurement and temperature control.

容器の概観を示す斜視図。The perspective view which shows the external appearance of a container. 容器の断面図。Sectional drawing of a container. 容器を分離して示した斜視図。The perspective view which separated and showed the container. 処理槽内部の説明図。Explanatory drawing inside a processing tank. 処理槽の断面図。Sectional drawing of a processing tank. 処理工程を示す経路図。The path | route diagram which shows a process process. 処理工程の動作を示す説明図。Explanatory drawing which shows operation | movement of a process process. 本発明による測定値と製品温度との関係図。The relationship figure between the measured value and product temperature by this invention. 従来例の測定値と製品温度との関係図。The related figure of the measured value and product temperature of a prior art example.

符号の説明Explanation of symbols

1: 容器
2: 蓋
3: 隙間
4: 切欠部
5: 温度センサー
6: 測温部
7: 水
8: 飽和蒸気層
9: 処理槽
10:処理槽出入口
11:蒸気送入口
12:邪魔板
13:被加熱物
A: 本発明の測定値
B: 製品温度
C: 過熱温度
D: 従来例の測定値
1: Container 2: Lid 3: Gap 4: Notch 5: Temperature sensor 6: Temperature measuring unit 7: Water 8: Saturated steam layer 9: Treatment tank 10: Treatment tank inlet / outlet 11: Steam inlet / outlet 12: Baffle plate 13: Object to be heated
A: Measurement value of the present invention
B: Product temperature
C: Overheating temperature
D: Measurement value of conventional example

Claims (4)

飽和蒸気雰囲気又は減圧下の蒸気雰囲気とした処理槽内に設置され、水を収容した耐熱性の容器と、
処理槽と連通する隙間を設けた容器の蓋と、
容器内の水面と蓋との間に形成した過熱蒸気の影響を受けない飽和蒸気層と、
この飽和蒸気層で水面と蓋との間で水面に近接して設置された温度センサーを有する測温部と、
から成る飽和蒸気温度測定装置。
A heat-resistant container installed in a treatment tank having a saturated steam atmosphere or a steam atmosphere under reduced pressure and containing water;
A container lid provided with a gap communicating with the treatment tank;
A saturated vapor layer not affected by superheated steam formed between the water surface in the container and the lid;
A temperature measuring unit having a temperature sensor installed in the saturated vapor layer in the vicinity of the water surface between the water surface and the lid;
Saturated steam temperature measuring device.
容器に一定水位の水を保持するようオーバーフロー用の切欠部を設けた請求項1記載の飽和蒸気温度測定装置。   2. The saturated steam temperature measuring device according to claim 1, wherein the container is provided with a notch for overflow so as to hold water at a constant water level. 処理槽の蒸気入口の内方に送入される蒸気を分散する邪魔板を設置した請求項1記載の飽和蒸気温度測定装置。   2. The saturated steam temperature measuring apparatus according to claim 1, further comprising a baffle plate that disperses the steam fed into the steam inlet of the treatment tank. 処理槽の長さ方向中央上方に蒸気入口部を設け、飽和蒸気層に温度センサーを設置した容器を処理槽の製品出入口に近い側壁で高さ方向中央に設けた請求項1記載の飽和蒸気温度測定装置。
The saturated steam temperature according to claim 1, wherein a steam inlet is provided at the upper center in the length direction of the processing tank, and a container having a temperature sensor installed in the saturated steam layer is provided in the center in the height direction on the side wall near the product inlet / outlet of the processing tank. measuring device.
JP2006172044A 2006-06-22 2006-06-22 Saturated steam temperature measuring device Expired - Fee Related JP4810324B2 (en)

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US4699080A (en) * 1986-05-15 1987-10-13 Dynapert-Htc Corporation Temperature sensors for vapor processing systems
US5031612A (en) * 1990-04-24 1991-07-16 Devilbiss Health Care, Inc. System and method for delivering warm humidified air
JPH0868583A (en) * 1994-08-29 1996-03-12 Shinku Dream:Kk Temperature detecting structure for vacuum cooler
JPH08170807A (en) * 1994-12-15 1996-07-02 Tlv Co Ltd Steam heating equipment
JPH1019684A (en) * 1996-06-27 1998-01-23 Miura Co Ltd Temperature and pressure measuring device in pressure-reduced atmosphere
JP2000028466A (en) * 1998-07-15 2000-01-28 Tlv Co Ltd Diagnostic apparatus for detecting means of pressure or temperature for saturated vapor
JP3931755B2 (en) * 2002-07-24 2007-06-20 トヨタ自動車株式会社 Evaporative fuel processing device for internal combustion engine
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