JP4799986B2 - Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same - Google Patents

Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same Download PDF

Info

Publication number
JP4799986B2
JP4799986B2 JP2005288368A JP2005288368A JP4799986B2 JP 4799986 B2 JP4799986 B2 JP 4799986B2 JP 2005288368 A JP2005288368 A JP 2005288368A JP 2005288368 A JP2005288368 A JP 2005288368A JP 4799986 B2 JP4799986 B2 JP 4799986B2
Authority
JP
Japan
Prior art keywords
layer
antireflection
transfer
transparent panel
antireflection film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005288368A
Other languages
Japanese (ja)
Other versions
JP2007101651A (en
Inventor
富士男 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissha Printing Co Ltd
Original Assignee
Nissha Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissha Printing Co Ltd filed Critical Nissha Printing Co Ltd
Priority to JP2005288368A priority Critical patent/JP4799986B2/en
Publication of JP2007101651A publication Critical patent/JP2007101651A/en
Application granted granted Critical
Publication of JP4799986B2 publication Critical patent/JP4799986B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

本発明は、箔バリ低減性に優れた反射防止加工用転写材とこれを用いた反射防止膜付き透明パネルの製造方法に関する。ここで、反射防止膜付き透明パネルとは、携帯電話、ビデオカメラ、デジタルカメラ、自動車用機器、PDA(PersonalDigitalAssistant)、パーソナルコンピュータ用モニタ、紙のように軽くて薄く柔軟性に富む表示用電子装置である電子ペーパー、テレビ、屋外掲示用電子機器などの各種ディスプレイにおいて、表示画面を透視可能に覆うものである。また、反射防止膜付き透明パネルは、上記各種ディスプレイ以外にも、額縁、写真立て、時計などのカバーや、窓ガラスなどにおいて、透視可能に用いられるものである。   The present invention relates to an antireflection-processing transfer material excellent in foil burr reduction and a method for producing a transparent panel with an antireflection film using the same. Here, the transparent panel with an antireflection film is a mobile phone, a video camera, a digital camera, an automobile device, a PDA (Personal Digital Assistant), a monitor for a personal computer, a light, thin and flexible display electronic device such as paper. In various displays such as electronic paper, televisions, outdoor bulletin electronic devices, and the like, the display screen is transparently covered. Further, the transparent panel with an antireflection film is used in a transparent manner in a cover such as a frame, a photo stand, a clock, a window glass, and the like in addition to the various displays described above.

従来より、携帯電話、ビデオカメラ、デジタルカメラ、自動車用機器などにおいては、ディスプレイ部分に液晶パネルや有機ELパネルなどが用いられており、通常、ディスプレイが破損するのを防止する目的で、透明パネルにより構成されるカバー部品により表示画面などの前面が覆われている。また、このカバー部品には、凸レンズ形状に成形した透明パネルより構成して表示を拡大するものや、縁取りなどの図柄が形成された透明パネルにより構成して画面近辺を装飾するものもある。   Conventionally, in mobile phones, video cameras, digital cameras, automobile equipment, etc., liquid crystal panels and organic EL panels have been used for the display part. Usually, transparent panels are used to prevent damage to the display. The front surface of the display screen or the like is covered with a cover component constituted by Some of these cover parts are composed of a transparent panel molded into a convex lens shape to enlarge the display, and others are composed of a transparent panel on which a pattern such as a border is formed to decorate the vicinity of the screen.

上記カバー部品においては、表示された画面を見やすくするために、透明パネルに反射防止膜の形成が要求される。透明パネルへの反射防止膜の形成方法の一つとして、基体シート上に反射防止層を含む転写層が直接あるいは離型層を介して設けられた反射防止加工用転写材を用いた、熱転写法または成形同時転写法が特許文献1に開示されている。   In the cover part, in order to make the displayed screen easy to see, it is required to form an antireflection film on the transparent panel. As one of the methods for forming an antireflection film on a transparent panel, a thermal transfer method using a transfer material for antireflection processing in which a transfer layer including an antireflection layer is directly or via a release layer on a substrate sheet Alternatively, a molding simultaneous transfer method is disclosed in Patent Document 1.

熱転写法とは、転写材を成形品に重ね合わせ、基体シート側から転写ロール等で加熱加圧することにより必要領域の転写層を成形品に接着させた後、基体シートを剥離して、被転写物面に前記領域の転写層のみを転移する方法である。また、成形同時転写法とは、転写材を成形金型内に挟み込み、転写層側からキャビテイ内に溶融樹脂を射出充填して樹脂成形品を得るのと同時にその面に転写材を接着させ、冷却固化後、基体シートを剥離して、成形品に必要領域の転写層を転移する方法である。
特開2002−221603号公報
In the thermal transfer method, a transfer material is superimposed on a molded product, and a transfer layer in a required area is adhered to the molded product by heating and pressing with a transfer roll or the like from the substrate sheet side, and then the substrate sheet is peeled off to be transferred. In this method, only the transfer layer in the region is transferred to the object surface. In addition, the molding simultaneous transfer method is a method in which a transfer material is sandwiched in a molding die, molten resin is injected and filled into the cavity from the transfer layer side to obtain a resin molded product, and at the same time, the transfer material is adhered to the surface, In this method, after cooling and solidifying, the base sheet is peeled off and the transfer layer in the necessary region is transferred to the molded product.
JP 2002-221603 A

上記の熱転写法及び成形同時転写法では、成形品である透明パネル1の転写面積より大きく設けられた転写層111の非転写部分、特に透明パネル1が穴1aを有するような形状の場合は穴1aをふさぐように設けられた転写層の非転写部分において、基体シートが剥離された後、透明パネル1の周囲や穴1aに転写層111が付着したまま薄く不規則な突起となる、いわゆる箔バリ5が生じやすい(図6参照)。この反射防止膜付き透明パネル108に発生した箔バリ5は、後の工程で除去することになる。例えば、手作業で粘着テープに箔バリを接着させて、一個づつ地道に取り去る等である。   In the thermal transfer method and the simultaneous molding transfer method described above, when the non-transfer portion of the transfer layer 111 provided larger than the transfer area of the transparent panel 1 that is a molded product, particularly when the transparent panel 1 has a shape having the hole 1a, a hole is formed. In a non-transfer portion of the transfer layer provided so as to cover 1a, after the substrate sheet is peeled off, a so-called foil that becomes thin and irregular protrusions with the transfer layer 111 attached to the periphery of the transparent panel 1 or the hole 1a Burr 5 is likely to occur (see FIG. 6). The foil burr 5 generated in the transparent panel 108 with the antireflection film is removed in a later step. For example, foil burrs are adhered to the adhesive tape manually and removed one by one on the ground.

しかし、転写層111の非転写部分は、転写部分と異なり、透明パネル1の表面に一体化されていないので脆く、熱転写法における転写ロール等による加圧や成形同時転写法における型締め時の成形金型による当たりなどにより衝撃を受けて破壊されやすくなっているという問題がある。その結果、箔バリ5を構成する皮膜は、箔バリ5の除去工程前に反射防止膜付き透明パネル108から分離して脱落片となることがある。   However, unlike the transfer portion, the non-transfer portion of the transfer layer 111 is not integrated with the surface of the transparent panel 1 and is fragile, and is formed by pressing with a transfer roll or the like in the thermal transfer method or molding at the time of mold clamping in the simultaneous molding transfer method. There is a problem that it is easily broken due to an impact due to a hit with a mold. As a result, the film forming the foil burr 5 may be separated from the transparent panel 108 with the antireflection film and fallen off before the foil burr 5 is removed.

この脱落片は、脱落の直後又はしばらくの間塵となって宙に舞い、転写機のロールや成形金型のキャビティ形成面に静電気の作用などによって付着する。この場合、基体シートと転写機のロールまたは成形金型との間に脱落片が異物として混入している状態で、次サイクル以降の転写をすることになる。その結果、脱落片混入の跡が反射防止膜付き透明パネル8表面に打痕として現われ、著しく美観を損ねるおそれがある。   This drop-off piece becomes dust immediately after the drop-off or for a while, and floats in the air, and adheres to the roll forming surface of the transfer machine or the cavity forming surface of the molding die by the action of static electricity. In this case, the transfer after the next cycle is performed in a state in which the falling pieces are mixed as foreign matter between the base sheet and the roll or molding die of the transfer machine. As a result, traces of drop-off pieces appear as dents on the surface of the transparent panel 8 with the antireflection film, and there is a risk that the aesthetics will be significantly impaired.

打痕対策として、転写機や成形金型周辺へイオンブロー装置、除電装置、吸引装置等を設置して、転写機のロールや成形金型のキャビティ形成面に脱落片が付着しないようにすることもできるが、その場合、これらの装置の設置費、メンテナンスにコストがかかってしまう。   As a measure against dents, install an ion blower, static eliminator, suction device, etc. around the transfer machine and molding die to prevent falling pieces from adhering to the roll forming surface of the transfer machine and the cavity forming surface of the molding die. However, in that case, the installation cost and maintenance of these devices are expensive.

したがって、本発明は上記のような欠点を解消し、箔バリが発生しにくい、いわゆる箔バリ低減性に優れた反射防止加工用転写材とこれを用いた反射防止膜付き透明パネルの製造方法を提供することを目的とする。   Accordingly, the present invention provides a transfer material for antireflection processing which is excellent in so-called foil burr reduction property and a method for producing a transparent panel with an antireflection film using the same, which eliminates the above-mentioned drawbacks and hardly generates foil burrs. The purpose is to provide.

上記目的を達成するために、本発明は、基体シート上に反射防止層を含む転写層が該転写層の総厚みが0.15〜0.8μmとなるように形成された、反射防止膜付き透明パネルを製造するための反射防止加工用転写材の製造方法であって、前記反射防止層を形成する場合や、前記反射防止層の上に接着層を形成する場合に、セル容積が2〜5.5cm /m の版を用いてグラビア印刷により形成し、さらに前記グラビア印刷版が、セルの形状が四角錘型で、線数が250〜600線、版深度5〜20μmのものであるように構成した。 In order to achieve the above object, the present invention provides an antireflection film, wherein a transfer layer including an antireflection layer is formed on a substrate sheet so that the total thickness of the transfer layer is 0.15 to 0.8 μm. A method for producing an antireflection-processing transfer material for producing a transparent panel, wherein the cell volume is 2 to 2 when the antireflection layer is formed or an adhesive layer is formed on the antireflection layer. It is formed by gravure printing using a 5.5 cm 3 / m 2 plate, and the gravure printing plate has a quadrangular pyramid shape with a cell number of 250 to 600 lines and a plate depth of 5 to 20 μm. configured in a certain way.

本発明は、前記した構成からなるので、次のような効果を有する。   Since this invention consists of an above-described structure, it has the following effects.

すなわち、本発明の反射防止加工用転写材は、転写層の総厚みが従来の3〜20μmに対して0.15〜0.8μmと非常に薄いため、転写層が切断しやすく、転写層の熱転写法や成形同時転写法により反射防止膜付き透明パネルを得るときに、箔バリが透明パネルの周囲や穴に付着したり、箔バリの脱落片が塵となって透明パネル表面に付着したりして不良が発生することが少ない。つまり箔バリ低減性に優れており、反射防止膜付き透明パネルを効率よく得ることができる。   That is, the transfer material for antireflection processing of the present invention has a total transfer layer thickness of 0.15 to 0.8 μm, which is very thin as compared with the conventional 3 to 20 μm. When obtaining a transparent panel with an antireflection film by thermal transfer method or simultaneous molding transfer method, foil burrs adhere to the periphery and holes of the transparent panel, or foil burrs fall off as dust and adhere to the transparent panel surface. As a result, defects are rarely generated. That is, the foil burr reduction property is excellent, and a transparent panel with an antireflection film can be obtained efficiently.

図面を参照しながら本発明の実施の形態について詳しく説明する。   Embodiments of the present invention will be described in detail with reference to the drawings.

図1及び図2は、反射防止加工用転写材の一実施例を示す断面図である。図3及び図4は反射防止膜付き透明パネルの製造方法の一実施例を示す断面図である。図5は本発明の反射防止膜付き透明パネルの一実施例を示す断面図である。図中、1は透明パネル、1aは穴、2は接着層、3は離型層、4は反射防止層、6は反射防止加工用転写材、7は基体シート、8は反射防止膜付き透明パネル、9は成形金型、10は溶融樹脂、11は転写層、12は耐熱ゴム状弾性体である。   1 and 2 are cross-sectional views showing an embodiment of a transfer material for antireflection processing. 3 and 4 are cross-sectional views showing an embodiment of a method for producing a transparent panel with an antireflection film. FIG. 5 is a sectional view showing an embodiment of the transparent panel with an antireflection film of the present invention. In the figure, 1 is a transparent panel, 1a is a hole, 2 is an adhesive layer, 3 is a release layer, 4 is an antireflection layer, 6 is a transfer material for antireflection processing, 7 is a base sheet, and 8 is transparent with an antireflection film. A panel, 9 is a molding die, 10 is a molten resin, 11 is a transfer layer, and 12 is a heat-resistant rubber-like elastic body.

まず、本発明の箔バリ低減性に優れた反射防止加工用転写材6の説明をする。   First, the anti-reflection transfer material 6 having excellent foil burr reduction properties of the present invention will be described.

反射防止加工用転写材6は、基体シート7上に反射防止層4を含む転写層11が形成されたものであり、透明パネルの表面に必要領域の転写層が接着された後は基体シート7が剥がされ、転写層11が透明パネル表面に形成される(図1,2参照)。   The transfer material 6 for antireflection processing is obtained by forming a transfer layer 11 including an antireflection layer 4 on a base sheet 7, and after the transfer layer of a necessary region is adhered to the surface of the transparent panel, the base sheet 7. Is peeled off, and the transfer layer 11 is formed on the surface of the transparent panel (see FIGS. 1 and 2).

基体シート7の材質としては、ポリプロピレン系樹脂、ポリエチレン系樹脂、ポリアミド系樹脂、ポリエステル系樹脂、アクリル系樹脂、ポリ塩化ビニル系樹脂などの樹脂シートなどを使用することができる。   As a material of the base sheet 7, a resin sheet such as a polypropylene resin, a polyethylene resin, a polyamide resin, a polyester resin, an acrylic resin, or a polyvinyl chloride resin can be used.

基体シート7からの反射防止層4の剥離性がよい場合には、基体シート7上に反射防止層4を含む転写層11を直接設けることができる(図1参照)。基体シート7からの転写層11の剥離性を改善するためには、基体シート7上に転写層11を設ける前に、離型層3を全面的に形成してもよい(図2参照)。   When the peelability of the antireflection layer 4 from the base sheet 7 is good, the transfer layer 11 including the antireflection layer 4 can be directly provided on the base sheet 7 (see FIG. 1). In order to improve the peelability of the transfer layer 11 from the base sheet 7, the release layer 3 may be formed on the entire surface before the transfer layer 11 is provided on the base sheet 7 (see FIG. 2).

反射防止層4の材質としては、Al↓2O↓3、ZnO2、MgF↓2などの金属化合物の蒸着層や、SiO↓2、MgF↓2などの低屈折率の金属化合物とZnO↓2、TiO↓2などの高屈折率の金属化合物とを積層した蒸着層や、フッ素系ポリマーや酸化ケイ素ゲルなどからなる樹脂コーティング層などを用いることができる。また、これらを組み合わせたものであってもよい。   The material of the antireflection layer 4 includes a vapor deposition layer of a metal compound such as Al ↓ 2O ↓ 3, ZnO2 and MgF ↓ 2, a metal compound having a low refractive index such as SiO ↓ 2 and MgF ↓ 2, and ZnO ↓ 2 and TiO2. A vapor deposition layer obtained by laminating a metal compound having a high refractive index such as ↓ 2 or a resin coating layer made of a fluorine-based polymer or silicon oxide gel can be used. A combination of these may also be used.

反射防止層4の形成方法としては、真空蒸着法、スパッタリング法、イオンプレーティング法などがある。あるいは金属アルコラート、金属キレートなどの有機金属化合物を浸積法あるいはグラビア印刷などの印刷法、コーティング法などにより基体シート7上に塗布し、その後、光照射あるいは乾燥により金属酸化物皮膜を形成して反射防止層4を得る方法もある。   Examples of the method for forming the antireflection layer 4 include a vacuum deposition method, a sputtering method, and an ion plating method. Alternatively, an organic metal compound such as a metal alcoholate or metal chelate is applied onto the substrate sheet 7 by a printing method such as an immersion method or gravure printing or a coating method, and then a metal oxide film is formed by light irradiation or drying. There is also a method for obtaining the antireflection layer 4.

反射防止層4の膜厚は、一般式n×d=λ/4または一般式n×d=3λ/4(ただし、nは低屈折率物質の屈折率、dは低屈折率物質の膜厚、λは低反射中心波長をそれぞれ示す)を満たすように適宜選択するとよい。このような厚さで反射防止層4を形成すると、反射防止層4の表面からの反射光と反対面からの反射光とが干渉によって打ち消しあって反射率が低減し、最もすぐれた反射防止効果が発揮される。たとえば、屈折率が1.36の反射防止層4であれば、透過する光の中心波長が550nmのとき、反射防止層4の厚さは0.1μm程度が最適となる。   The film thickness of the antireflection layer 4 is the general formula n × d = λ / 4 or the general formula n × d = 3λ / 4 (where n is the refractive index of the low refractive index material and d is the thickness of the low refractive index material) , Λ may be selected as appropriate so as to satisfy the low reflection center wavelength. When the antireflection layer 4 is formed with such a thickness, the reflected light from the surface of the antireflection layer 4 and the reflected light from the opposite surface cancel each other out due to interference, and the reflectance is reduced, so that the best antireflection effect is achieved. Is demonstrated. For example, in the case of the antireflection layer 4 having a refractive index of 1.36, when the center wavelength of transmitted light is 550 nm, the thickness of the antireflection layer 4 is optimally about 0.1 μm.

反射防止層4は、低屈折率層一層だけでもよいし、低屈折率層と高屈折率層などの複合層であってもよい。複合層にすると反射防止性をより向上できる。複合層にすると工数が増えるのを解消するため、ロールツーロールによる連続コート方式で反射防止層4を形成すれば、非常に効率的である。なお、ここでいう低屈折率および高屈折率とは、これらの層の下側に位置する層が有する屈折率との比較結果をいう。たとえば、反射防止層5が一層構成である場合は、後述する接着層2(接着層2がない場合は透明パネル1)が有する屈折率が比較対象となる。また、反射防止層4が複合層である場合は、反射防止層4を構成する各層の直下に位置する層の屈折率がそれぞれ比較対象となる。   The antireflection layer 4 may be a single low refractive index layer or a composite layer such as a low refractive index layer and a high refractive index layer. When a composite layer is used, the antireflection property can be further improved. In order to eliminate the increase in the number of steps when the composite layer is formed, it is very efficient to form the antireflection layer 4 by a roll-to-roll continuous coating method. Here, the low refractive index and the high refractive index refer to a comparison result with the refractive index of a layer located below these layers. For example, when the antireflection layer 5 has a single-layer structure, the refractive index of the adhesive layer 2 described later (the transparent panel 1 when there is no adhesive layer 2) is a comparison target. Further, when the antireflection layer 4 is a composite layer, the refractive indexes of the layers located immediately below each layer constituting the antireflection layer 4 are to be compared.

なお、必要に応じて転写層11のうち基体シート7の剥離によって最表面となる層として防汚層を設けてもよい。防汚層の材質としては、末端基にフッ素を有する界面活性剤などを用いるとよい。防汚層を設けるには、コーティング法、浸漬法、真空蒸着法などによるとよい。   In addition, you may provide an antifouling layer as a layer which becomes the outermost surface by peeling of the base material sheet 7 among the transfer layers 11 as needed. As a material for the antifouling layer, a surfactant having fluorine at the terminal group may be used. In order to provide the antifouling layer, a coating method, a dipping method, a vacuum deposition method or the like may be used.

また、反射防止層4の上に、これらの層と透明パネル8と接着するための接着層2を形成するとよい(図2参照)。接着層2としては、透明パネルの素材に適した感熱性あるいは感圧性の樹脂を適宜使用する。   Moreover, it is good to form the contact bonding layer 2 for adhere | attaching these layers and the transparent panel 8 on the antireflection layer 4 (refer FIG. 2). As the adhesive layer 2, a heat-sensitive or pressure-sensitive resin suitable for a transparent panel material is appropriately used.

たとえば、透明パネル1の材質がアクリル系樹脂の場合はアクリル系樹脂を用いるとよい。また、透明パネル1の材質がポリフェニレンオキシド・ポリスチレン系樹脂、ポリカーボネート系樹脂、ポリスチレン系ブレンド樹脂の場合は、これらの樹脂と親和性のあるアクリル系樹脂、ポリスチレン系樹脂、ポリアミド系樹脂などを使用すればよい。さらに、透明パネル1の材質がポリプロピレン樹脂の場合は、塩素化ポリオレフィン樹脂、塩素化エチレン−酢酸ビニル共重合体樹脂、環化ゴム、クマロンインデン樹脂が使用可能である。接着層2の形成方法としては、グラビア印刷法の他、グラビアコート法、ロールコート法、コンマコート法などのコート法、オフセット印刷法などの印刷法がある。   For example, when the material of the transparent panel 1 is an acrylic resin, an acrylic resin may be used. When the material of the transparent panel 1 is polyphenylene oxide / polystyrene resin, polycarbonate resin, or polystyrene blend resin, acrylic resin, polystyrene resin, polyamide resin, or the like having an affinity for these resins should be used. That's fine. Furthermore, when the material of the transparent panel 1 is a polypropylene resin, chlorinated polyolefin resin, chlorinated ethylene-vinyl acetate copolymer resin, cyclized rubber, and coumarone indene resin can be used. As a method for forming the adhesive layer 2, there are a gravure printing method, a coating method such as a roll coating method and a comma coating method, and a printing method such as an offset printing method in addition to a gravure printing method.

ただし、本発明のような箔バリ低減効果を得るには、反射防止層4を含めた転写層11の総厚みが0.8μmよりも薄くなるようにすることが重要である。0.8μmよりも膜厚が厚くなると箔バリが急激に多くなり(具体的には、箔バリ発生率が10%を超え)、本発明の特長が得られなくなる。なお、箔バリが殆ど出なくなる(具体的には、箔バリ発生率が3%以下になる)ようにするには、反射防止層4を含めた転写層11の総厚みが0.4μmよりも薄くなるようにするとよい(下表参照)。また、反射防止効果を発揮するのに最低限必要な反射防止層4の厚みや、反射防止層4以外の転写層11の存在を考慮すると、本発明における転写層11の総厚みの下限は0.15μm以上となる。   However, in order to obtain the foil burr reduction effect as in the present invention, it is important to make the total thickness of the transfer layer 11 including the antireflection layer 4 thinner than 0.8 μm. When the film thickness is greater than 0.8 μm, the number of foil burrs increases rapidly (specifically, the rate of occurrence of foil burrs exceeds 10%), and the features of the present invention cannot be obtained. In order to make almost no foil burrs (specifically, the rate of occurrence of foil burrs is 3% or less), the total thickness of the transfer layer 11 including the antireflection layer 4 is less than 0.4 μm. It is recommended to make it thinner (see the table below). Further, considering the minimum thickness of the antireflection layer 4 necessary for exhibiting the antireflection effect and the presence of the transfer layer 11 other than the antireflection layer 4, the lower limit of the total thickness of the transfer layer 11 in the present invention is 0. .15 μm or more.

Figure 0004799986
Figure 0004799986

なお、本発明における反射防止層4や接着層2などにおいてグラビア印刷を行う場合、形成される層の厚みを薄くするにはセル容積が2〜5.5cm/mの版を用いるのが好ましい。具体的には、セルの形状を四角錘型にし、線数は250〜600線、版深度5〜20μmにすれば、上記のセル容積の版が得られる(下記表2参照)。 When performing gravure printing on the antireflection layer 4 or the adhesive layer 2 in the present invention, a plate having a cell volume of 2 to 5.5 cm 3 / m 2 is used to reduce the thickness of the formed layer. preferable. Specifically, if the shape of the cell is a quadrangular pyramid, the number of lines is 250 to 600 lines, and the plate depth is 5 to 20 μm, the plate with the above cell volume can be obtained (see Table 2 below).

Figure 0004799986
Figure 0004799986

例えば、上記のセル容積の版を用いて、接着層2のインキを通常のグラビア印刷の適正粘度で印刷すれば、厚みが0.1〜0.4μmの接着層2が形成される。   For example, if the ink of the adhesive layer 2 is printed with an appropriate viscosity for normal gravure printing using the plate having the cell volume described above, the adhesive layer 2 having a thickness of 0.1 to 0.4 μm is formed.

なお、転写層11の構成は、上記した態様に限定されるものではない。たとえば、反射防止層4の材質として透明パネルとの接着性に優れたものを使用する場合には、接着層2を省略しても構わない。   The configuration of the transfer layer 11 is not limited to the above-described aspect. For example, when using a material having excellent adhesion to the transparent panel as the material of the antireflection layer 4, the adhesive layer 2 may be omitted.

以上に述べたような構成の箔バリ低減性に優れた反射防止加工用転写材6を用い、熱転写法または成形同時転写法を利用して反射防止膜付き透明パネルを容易に得ることができる。   A transparent panel with an antireflection film can be easily obtained using the transfer material 6 for antireflection processing having the above-described configuration and excellent anti-foil burr reduction property, using a thermal transfer method or a simultaneous molding transfer method.

次に、前記した転写材6を用い、熱転写法にて反射防止膜付き透明パネル8を製造する方法ついて説明する(図3参照)。   Next, a method for manufacturing the transparent panel 8 with an antireflection film using the transfer material 6 described above by a thermal transfer method will be described (see FIG. 3).

まず、透明パネル1表面に、シリコンラバーなどの耐熱ゴム状弾性体(転写ロール又は転写パッド)12を備えたロール転写機、アップダウン転写機などの転写機内に透明パネル1を載置し、前記反射防止加工用転写材6を送り込みその転写層11側を透明パネル1表面に密着させる。その際、枚葉の転写材を1枚づつ送り込んでもよいし、長尺の転写材の必要部分を間欠的に送り込んでもよい。   First, the transparent panel 1 is placed in a transfer machine such as a roll transfer machine or an up-down transfer machine provided with a heat-resistant rubber-like elastic body (transfer roll or transfer pad) 12 such as silicon rubber on the surface of the transparent panel 1. The transfer material 6 for antireflection processing is fed in and the transfer layer 11 side is brought into close contact with the surface of the transparent panel 1. At that time, a single sheet of transfer material may be fed one by one, or a necessary part of a long transfer material may be intermittently fed.

次に、耐熱ゴム状弾性体12を介し反射防止加工用転写材6の基体シート7側から熱と圧力とを加える。こうすることにより、転写層11が透明パネル1表面に接着する。   Next, heat and pressure are applied from the base sheet 7 side of the antireflection transfer material 6 through the heat-resistant rubber-like elastic body 12. By doing so, the transfer layer 11 adheres to the surface of the transparent panel 1.

冷却後、基体シート7を剥がすと、基体シート7と転写層11との境界面で剥離が起こり、転写が完了する。また、基体シート7上に離型層3を設けた場合は、基体シート7を剥がすと、離型層3と転写層11との境界面で剥離が起こり、転写が完了する。このようにして反射防止膜付き透明パネル8を得ることができる。   When the substrate sheet 7 is peeled off after cooling, peeling occurs at the boundary surface between the substrate sheet 7 and the transfer layer 11, and the transfer is completed. When the release layer 3 is provided on the base sheet 7, when the base sheet 7 is peeled off, peeling occurs at the boundary surface between the release layer 3 and the transfer layer 11, and the transfer is completed. Thus, the transparent panel 8 with an antireflection film can be obtained.

また、前記した転写材6を用い、成形同時転写法にて反射防止膜付き透明パネル8を製造する方法について説明する(図4参照)。   In addition, a method for manufacturing the transparent panel 8 with the antireflection film using the transfer material 6 described above by the simultaneous molding transfer method will be described (see FIG. 4).

まず、成形金型9内に前記反射防止加工用転写材6を送り込む。その際、枚葉の転写材を1枚づつ送り込んでもよいし、長尺の転写材の必要部分を間欠的に送り込んでもよい。   First, the anti-reflection transfer material 6 is fed into the molding die 9. At that time, a single sheet of transfer material may be fed one by one, or a necessary part of a long transfer material may be intermittently fed.

成形金型9を閉じた後、ゲートから溶融樹脂10をキャビティ13内に射出充填させ、透明パネル1を成形するのと同時にその表面に反射防止加工用転写材6を接着させる。   After the molding die 9 is closed, molten resin 10 is injected and filled into the cavity 13 from the gate, and at the same time as the transparent panel 1 is molded, the antireflection transfer material 6 is adhered to the surface thereof.

冷却固化後、成形金型9を開いて反射防止加工用転写材6と透明パネル1の一体化物を取り出し、基体シート7を剥がすと、基体シート7又は離型層3と転写層11との境界面で剥離が起こり、成形同時転写が完了する。このようにして反射防止膜付き透明パネル8を得ることができる。   After cooling and solidification, the molding die 9 is opened to take out an integrated product of the antireflection processing transfer material 6 and the transparent panel 1, and the base sheet 7 is peeled off, whereby the boundary between the base sheet 7 or the release layer 3 and the transfer layer 11. Peeling occurs on the surface, and simultaneous molding transfer is completed. Thus, the transparent panel 8 with an antireflection film can be obtained.

なお、上記した透明パネル1の形状は、全体が平板状のものであっても、二次元あるいは三次元の曲面を有するものであってもよい。   The transparent panel 1 may have a flat plate shape as a whole or a two-dimensional or three-dimensional curved surface.

上記した透明パネル1に用いることができる材質としては、ポリスチレン系樹脂、ポリオレフィン系樹脂、ABS樹脂、AS樹脂、AN樹脂などの汎用樹脂を挙げることができる。また、ポリフェニレンオキシド・ポリスチレン系樹脂、ポリカーボネート系樹脂、ポリアセタール系樹脂、アクリル系樹脂、ポリカーボネート変性ポリフェニレンエーテル樹脂、ポリブチレンテレフタレート樹脂、超高分子量ポリエチレン樹脂などの汎用エンジニアリング樹脂や、ポリスルホン樹脂、ポリフェニレンサルファイド系樹脂、ポリフェニレンオキシド系樹脂、ポリアリレート樹脂、ポリエーテルイミド樹脂、ポリイミド樹脂、液晶ポリエステル樹脂、ポリアリル系耐熱樹脂などのスーパーエンジニアリング樹脂を使用することもできる。また、これらの成形樹脂にシリカビーズやアクリルビーズなどからなる光拡散剤などを混入してもよい。さらに、熱転写法によって反射防止膜付き透明パネル8を得る場合には、透明パネル1の材質としてガラスを用いることもできる。   Examples of the material that can be used for the transparent panel 1 include general-purpose resins such as polystyrene resin, polyolefin resin, ABS resin, AS resin, and AN resin. Also, general engineering resins such as polyphenylene oxide / polystyrene resins, polycarbonate resins, polyacetal resins, acrylic resins, polycarbonate-modified polyphenylene ether resins, polybutylene terephthalate resins, ultrahigh molecular weight polyethylene resins, polysulfone resins, polyphenylene sulfide Super engineering resins such as resins, polyphenylene oxide resins, polyarylate resins, polyetherimide resins, polyimide resins, liquid crystal polyester resins, and polyallyl heat-resistant resins can also be used. Moreover, you may mix the light-diffusion agent etc. which consist of silica beads, acrylic beads, etc. in these molding resin. Further, when the transparent panel 8 with the antireflection film is obtained by the thermal transfer method, glass can be used as the material of the transparent panel 1.

厚さ38μmポリエステルフィルムを基体シートとし、その上に厚さ0.12μmのウレタンアクリレート系樹脂からなる反射防止層と、厚さ0.18μmのアクリル系樹脂からなる接着層を、セル容積が2.9cm/m(セル形状:四角錘型、線数:400線、版深度:10μm)のグラビア版を用いて形成し、反射防止加工用転写材6を得た。 A cell sheet having an antireflection layer made of a urethane acrylate resin having a thickness of 0.12 μm and an adhesive layer made of an acrylic resin having a thickness of 0.18 μm on the polyester sheet having a thickness of 38 μm. It was formed using a gravure plate of 9 cm 3 / m 2 (cell shape: quadrangular pyramid type, number of lines: 400 lines, plate depth: 10 μm), and transfer material 6 for antireflection processing was obtained.

ついで、上記反射防止加工用転写材を成形金型内に挟み込み、転写層側からキャビティ内にアクリル系樹脂からなる透明な溶融樹脂を射出充填して透明パネルを得るのと同時にその表面に必要領域の転写層を接着させ、冷却固化後、基体シートを剥離することにより、透明パネル表面に反射防止層を含む転写層が形成された反射防止膜付き透明パネルを得た。   Next, the antireflection processing transfer material is sandwiched in a molding die, and a transparent panel is obtained by injection-filling a transparent molten resin made of acrylic resin into the cavity from the transfer layer side, and at the same time, a necessary area on the surface thereof. The transfer layer was adhered, and after cooling and solidifying, the base sheet was peeled off to obtain a transparent panel with an antireflection film in which a transfer layer including an antireflection layer was formed on the surface of the transparent panel.

このようにして得られる反射防止膜付き透明パネルの箔バリの発生率および箔バリの塵付着による不良発生率を、2000個について測定したところ、箔バリの発生率1.3%、箔バリの塵付着による不良発生率1.6%と、従来の箔バリの発生率(通常、30%程度)および箔バリの塵付着による不良発生率(通常、10%程度)より低く、生産性に優れたものであった。   The occurrence rate of the foil burrs of the transparent panel with the antireflection film thus obtained and the failure occurrence rate due to the dust adhesion of the foil burrs were measured for 2000 pieces, and the occurrence rate of the foil burrs was 1.3%. Defect occurrence rate due to dust adhesion is 1.6%, lower than conventional foil burr occurrence rate (usually about 30%) and defect occurrence rate due to dust adhesion of foil burr (usually around 10%), and excellent productivity It was.

厚さ25μmポリエステルフィルムを基体シートとし、その上に厚さ0.10μmのウレタンアクリレート系樹脂からなる反射防止層と、厚さ0.13μmのアクリル系樹脂からなる接着層を、セル容積が2.6cm/m(セル形状;四角錘型、線数:500線、版深度:10μm)のグラビア版を用いて形成し、反射防止加工用転写材6を得た。 A cell sheet having an antireflection layer made of a urethane acrylate resin having a thickness of 0.10 μm and an adhesive layer made of an acrylic resin having a thickness of 0.13 μm on the polyester sheet having a thickness of 25 μm. It was formed using a gravure plate of 6 cm 3 / m 2 (cell shape; quadrangular pyramid type, number of lines: 500 lines, plate depth: 10 μm), and transfer material 6 for antireflection processing was obtained.

ついで、転写機にアクリル板(透明パネル)と上記反射防止加工用転写材を載置し、熱ロールでもって、アクリル板と反射防止加工用転写材とを押圧し、冷却後基体シートを剥離することにより、透明パネル表面に反射防止層を含む転写層が形成された反射防止膜付き透明パネルを得た。   Next, an acrylic plate (transparent panel) and the antireflection processing transfer material are placed on the transfer machine, the acrylic plate and the antireflection processing transfer material are pressed with a hot roll, and the substrate sheet is peeled off after cooling. Thus, a transparent panel with an antireflection film in which a transfer layer including an antireflection layer was formed on the transparent panel surface was obtained.

このようにして得られる反射防止膜付き透明パネルの箔バリの発生率および箔バリの塵付着による不良発生率を、2000個について測定したところ、箔バリの発生率 1.2%、箔バリの塵付着による不良発生率1.5%と、従来の箔バリの発生率(通常、30%程度)および箔バリの塵付着による不良発生率(通常、10%程度)より低く、生産性に優れたものであった。   When the occurrence rate of foil burrs in the transparent panel with the antireflection film thus obtained and the defect occurrence rate due to dust adhesion of the foil burrs were measured for 2000 pieces, the occurrence rate of foil burrs was 1.2%, Defect occurrence rate due to dust adhesion is 1.5%, lower than conventional foil burr occurrence rate (usually about 30%) and defect occurrence rate due to dust adhesion of foil burr (usually around 10%), and excellent productivity It was.

反射防止加工用転写材の一実施例を示す断面図である。It is sectional drawing which shows one Example of the transfer material for antireflection processing. 反射防止加工用転写材の一実施例を示す断面図である。It is sectional drawing which shows one Example of the transfer material for antireflection processing. 反射防止膜付き透明パネルの製造方法の一実施例を示す断面図である。It is sectional drawing which shows one Example of the manufacturing method of the transparent panel with an antireflection film. 反射防止膜付き透明パネルの製造方法の一実施例を示す断面図である。It is sectional drawing which shows one Example of the manufacturing method of the transparent panel with an antireflection film. 本発明に係る反射防止膜付き透明パネルの一実施例を示す断面図である。It is sectional drawing which shows one Example of the transparent panel with an antireflection film concerning this invention. 従来技術に係る反射防止膜付き透明パネルの一実施例を示す断面図である。It is sectional drawing which shows one Example of the transparent panel with an antireflection film concerning a prior art.

符号の説明Explanation of symbols

1 透明パネル
1a 穴
2 接着層
3 離型層
4 反射防止層
5 箔バリ
6 反射防止加工用転写材
7 基体シート
8 反射防止膜付き透明パネル
9 成形金型
10 溶融樹脂
11 転写層
12 耐熱ゴム状弾性体
108 反射防止膜付き透明パネル
111 転写層
DESCRIPTION OF SYMBOLS 1 Transparent panel 1a Hole 2 Adhesive layer 3 Release layer 4 Antireflection layer 5 Foil burr 6 Transfer material for antireflection processing 7 Base sheet 8 Transparent panel with antireflection film 9 Molding die 10 Molten resin 11 Transfer layer 12 Heat resistant rubber Elastic body 108 Transparent panel with antireflection film 111 Transfer layer

Claims (1)

基体シート上に反射防止層を含む転写層が該転写層の総厚みが0.15〜0.8μmとなるように形成された、反射防止膜付き透明パネルを製造するための反射防止加工用転写材の製造方法であって、前記反射防止層を形成する場合や、前記反射防止層の上に接着層を形成する場合に、セル容積が2〜5.5cmTransfer for antireflection processing for producing a transparent panel with an antireflection film in which a transfer layer including an antireflection layer is formed on a base sheet so that the total thickness of the transfer layer is 0.15 to 0.8 μm A method for producing a material, wherein the cell volume is 2 to 5.5 cm when the antireflection layer is formed or an adhesive layer is formed on the antireflection layer. 3 /m/ M 2 の版を用いてグラビア印刷により形成し、さらに前記グラビア印刷版が、セルの形状が四角錘型で、線数が250〜600線、版深度5〜20μmのものであることを特徴とする反射防止加工用転写材の製造方法。And the gravure printing plate has a quadrangular pyramidal shape, 250 to 600 lines, and a plate depth of 5 to 20 μm. A method for producing a transfer material for prevention processing.
JP2005288368A 2005-09-30 2005-09-30 Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same Active JP4799986B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005288368A JP4799986B2 (en) 2005-09-30 2005-09-30 Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005288368A JP4799986B2 (en) 2005-09-30 2005-09-30 Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same

Publications (2)

Publication Number Publication Date
JP2007101651A JP2007101651A (en) 2007-04-19
JP4799986B2 true JP4799986B2 (en) 2011-10-26

Family

ID=38028677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005288368A Active JP4799986B2 (en) 2005-09-30 2005-09-30 Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same

Country Status (1)

Country Link
JP (1) JP4799986B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5100608B2 (en) * 2008-10-27 2012-12-19 レノボ・シンガポール・プライベート・リミテッド Injection resin transfer substrate and method for producing resin molded product
MY175748A (en) * 2012-11-27 2020-07-08 Panasonic Ip Man Co Ltd In-mold molding method, in-mold transfer film and manufacturing method therefor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08248404A (en) * 1995-03-06 1996-09-27 Oike Ind Co Ltd Antireflection transfer foil
JP2002207104A (en) * 2000-10-17 2002-07-26 Nissha Printing Co Ltd Antireflection member, method for producing the same and antireflection transfer material
JP2002258411A (en) * 2001-03-02 2002-09-11 Dainippon Printing Co Ltd Lenticular lens sheet with light-shield zone and its manufacturing method

Also Published As

Publication number Publication date
JP2007101651A (en) 2007-04-19

Similar Documents

Publication Publication Date Title
JP4021925B2 (en) Protective panel for electronic device display window and method for manufacturing protective panel
KR100846269B1 (en) Antireflective formed article and method for preparation thereof, and mold for antireflective formed article
JP6035599B2 (en) Double-sided adhesive film
KR101323600B1 (en) Filter for protecting touch screen panel
TWI587187B (en) Substrate attached with decorative material and method for manufacturing the same, touch panel and information display device
WO2017148053A1 (en) Anti-shatter film and manufacturing method, touch panel and display device thereof
JP2007279756A (en) Electronic apparatus with protective panel attached to display window
JP5399196B2 (en) Gas barrier film and manufacturing method thereof
JP2002189107A (en) Antireflection member
CN205705588U (en) Non-plane toughened glass with line decoration
EP2808167B1 (en) Method of manufacturing case frame
JP4799986B2 (en) Transfer material for antireflection processing excellent in foil burr reduction and manufacturing method of transparent panel with antireflection film using the same
JP3571021B2 (en) Anti-reflective molded product, method for producing the same, mold for anti-reflective molded product
JP6593116B2 (en) Plate with printing layer and display device using the same
JP2014201027A (en) Decorative cover substrate for touch panel and method for manufacturing the same
JP2014203335A (en) Decorative cover base material for touch panel and manufacturing method therefor
JP2002040208A (en) Antireflection cover component and method for producing the same
JP3736840B2 (en) Anti-reflection transfer material
JP2011191368A (en) Antireflection member, method for manufacturing antireflection member, electro-optical device, and electronic equipment
KR101579454B1 (en) Display pretection film and Method for manufactureing the same
JP6309729B2 (en) Manufacturing method of cover glass for electronic equipment
JP2001281412A (en) Antireflection member and method for producing the same
JP2015025107A (en) Manufacturing method of foil indicator sheet and foil indicator sheet
CN206277749U (en) A kind of Antistatic type organosilicon PET protection film
KR20190118304A (en) antispattering flexible decoration film

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080710

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110225

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110308

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110509

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110531

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110714

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110802

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110803

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140812

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4799986

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140812

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250