JP4775357B2 - High voltage IC - Google Patents

High voltage IC Download PDF

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JP4775357B2
JP4775357B2 JP2007270332A JP2007270332A JP4775357B2 JP 4775357 B2 JP4775357 B2 JP 4775357B2 JP 2007270332 A JP2007270332 A JP 2007270332A JP 2007270332 A JP2007270332 A JP 2007270332A JP 4775357 B2 JP4775357 B2 JP 4775357B2
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JP2008091932A (en
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龍彦 藤平
幸雄 矢野
直樹 熊谷
重行 大日方
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Fuji Electric Co Ltd
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この発明は、パワーデバイスの制御駆動用などに用いられる高耐圧ＩＣで、パワーデバイスとは別の半導体基板または同一半導体基板上に形成される高耐圧ＩＣに関する。   The present invention relates to a high voltage IC used for control drive of a power device and the like, and relates to a high voltage IC formed on a semiconductor substrate different from the power device or on the same semiconductor substrate.

ここでは参考文献が多数あるため、文献名はまとめて番号を付けて〔発明が解決しようとする課題〕の項の最後に記載し、文章中では文献名の番号を[ ]で示すことに留めた。また参考文献のUSP Noの後に（ ）で示した内容は特許内容を簡単に説明したものである。
パワーデバイス[1] 〜[4] は、モータ制御用のインバータやコンバータ、照明用のインバータ、各種電源およびソレノイドやリレーの駆動用スイッチ等の多くの分野で広く利用されている。このパワーデバイスの駆動や制御は、従来個別の半導体素子や電子部品を組み合わせて構成した電子回路[5],[6] によっていたが、近年ＬＳＩ（高集積度ＩＣ、ＩＣとは集積回路のこと）技術を利用した数十Ｖ級の低耐圧ＩＣ[7],[8] や数百Ｖ級の高耐圧ＩＣ[9],[10]が実用化されており、さらに駆動・制御回路とパワーデバイスとを同一半導体基板に集積化したパワーＩＣ[11],[12] が用いられインバータやコンバータなどの変換装置などの小型化や高信頼性が図られている。
図３３はモータ制御用インバータのパワー部分を中心に説明する回路構成図である。三相モータＭｏを駆動するために用いるパワーデバイス（ここではＩＧＢＴであるＱ１〜Ｑ６とダイオードであるＤ１〜Ｄ６を示す）はブリッジ回路を構成し同一パッケージに収納されたパワーモジュール[13]の構造をしている。ここでＩＧＢＴとは絶縁ゲート型バイポーラトランジスタのことである。主電源ＶCCは通常直流１００〜４００Ｖと高電圧である。主電源ＶCCの高電位側をＶCCH、低電位側をＶCCLと表した場合、ＶCCH に接続されるＩＧＢＴＱ１〜Ｑ３を駆動するためには、ＩＧＢＴのゲート電極の電位はこれよりさらに高電位となるため、駆動回路にはフォトカプラ（ＰＣ：Ｐｈｏｔｏ Ｃｏｕｐｌｅｒ）や高耐圧ＩＣ（ＨＶＩＣ：Ｈｉｇｈ Ｖｏｌｔａｇｅ Ｉｎｔｅｇｒａｔｅｄ Ｃｉｒｃｕｉｔ）が用いられる。駆動回路の入出力端子Ｉ／Ｏ（Ｉｎｐｕｔ／Ｏｕｔｐｕｔ）は通常マイクロコンピュータへ接続され、そのマイクロコンピュータによりインバータ全体の制御がなされる。 Since there are many references here, the document names should be numbered together and listed at the end of the [Problem to be Solved by the Invention] section, and the number of the document name should be indicated by [] in the text. It was. The contents shown in parentheses after USP No. in the reference are a brief explanation of the patent contents.
Power devices [1] to [4] are widely used in many fields such as inverters and converters for motor control, inverters for lighting, various power supplies, solenoid and relay drive switches, and the like. This power device has been driven and controlled by electronic circuits [5] and [6] that are configured by combining individual semiconductor elements and electronic components. However, in recent years, LSI (highly integrated IC, IC is an integrated circuit). ) Several tens of V class low voltage ICs [7], [8] and several hundred V class high voltage ICs [9], [10] using technology have been put into practical use. Power ICs [11], [12], in which devices are integrated on the same semiconductor substrate, are used to achieve downsizing and high reliability of converters such as inverters and converters.
FIG. 33 is a circuit diagram illustrating the power portion of the motor control inverter. The power device used to drive the three-phase motor Mo (here, IGBTs Q1 to Q6 and diodes D1 to D6 are shown) constitutes a bridge circuit and is a structure of the power module [13] housed in the same package I am doing. Here, IGBT is an insulated gate bipolar transistor. The main power supply V CC is usually a high voltage of 100 to 400 VDC. When the high potential side of the main power supply V CC is represented as V CCH and the low potential side is represented as V CCL , the potential of the gate electrode of the IGBT is higher than this in order to drive the IGBTs Q1 to Q3 connected to V CCH. Because of the potential, a photocoupler (PC: Photo Coupler) or a high voltage integrated circuit (HVIC) is used for the drive circuit. The input / output terminal I / O (Input / Output) of the drive circuit is normally connected to a microcomputer, and the microcomputer controls the entire inverter.

図３４は図３３で用いられる高耐圧ＩＣ（ＨＶＩＣ）の内部構成ユニットのブロック図を示す。その構成をつぎに説明する。入出力端子Ｉ／Ｏを通してマイクロコンピュータと信号のやりとりを行い、どのＩＧＢＴをオンさせ、どれをオフさせるかの制御信号を発生させる制御回路ＣＵ（Ｃｏｎｔｒｏｌ Ｕｎｉｔ）と、この制御回路ＣＵからの信号を入力ラインＳＩＮ４〜６で受けてＩＧＢＴのゲートドライブ用の出力ラインＯＵＴ４〜６から信号を出力し、またＩＧＢＴの過電流を電流検出端子[14]ＯＣ４〜６で、過熱を温度端子[15]ＯＴ４〜６で検出し、異常信号を出力ラインＳＯＵＴ４〜６で出力し、図３３の主電源ＶCCの低電位側ＶCCLに接続するＩＧＢＴＱ４〜Ｑ６を駆動する、ゲート駆動回路ＧＤＵ（Ｇａｔｅ Ｄｒｉｖｅ Ｕｎｉｔ）４〜６と、ＧＤＵ４〜６と同じ機能で主電源ＶCCの高電位側ＶCCHに接続するＱ１からＱ３を駆動するゲート駆動回路ＧＤＵ１〜３と、ＶCCLレベルの制御回路ＣＵの信号とＶCCH レベルとＶCCLレベルの間を行き来するＧＤＵ１〜３の信号（ＳＩＮ１〜３、ＳＯＵＴ１〜３）との間を媒介する働きをするレベルシフト回路ＬＳＵ（Ｌｅｖｅｌ Ｓｈｉｆｔ Ｕｎｉｔ）とから構成されている。ＧＤＵ１〜３のドライブ電源（図３５参照）ＶDD1〜ＶDD3の高電位側をＶDDH1〜ＶDDH3、低電位側をＶDDL1〜ＶDDL3で示し、ＧＤＵ４〜６のドライブ電源は共通電源ＶDDC（図３５でも省略されている）であり、この共通電源ＶDDCの高電位側をＶDDHC、低電位側をＶDDLCで示す。またＧＤＵ４〜６およびＣＵのドライブ共通電源ＶDDCは１０〜２０Ｖ程度であり、この共通電源ＶDDCの低電位側ＶDDLCは図３３の主電源ＶCCの低電位側ＶCCLに接続する。 FIG. 34 shows a block diagram of an internal configuration unit of the high voltage IC (HVIC) used in FIG. The configuration will be described next. A control circuit CU (Control Unit) that exchanges signals with the microcomputer through the input / output terminal I / O, generates a control signal for turning on and off which IGBT, and a signal from the control circuit CU. The signals are received by the input lines SIN4 to SIN6 and output from the IGBT gate drive output lines OUT4 to OUT6. The IGBT overcurrent is detected by the current detection terminals [14] OC4-6, and the overheat is detected by the temperature terminal [15] OT4. To 6 and outputs abnormal signals on the output lines SOUT4 to SOUT6 to drive the IGBTs Q4 to Q6 connected to the low potential side V CCL of the main power supply V CC in FIG. 33, and a gate drive circuit GDU (Gate Drive Unit) 4 to 6 and a gate drive circuit GDU for driving Q1 to Q3 connected to the high potential side V CCH of the main power supply V CC with the same function as GDU 4 to 6 And 1~3, GDU1~3 signals alternate between the signal and V CCH level and the V CCL level of V CCL level of the control circuit CU (SIN1~3, SOUT1~3) serves to mediate between the A level shift circuit LSU (Level Shift Unit) is included. GDU1~3 drive power high potential side of (see FIG. 35) V DD1 ~V DD3 V DDH1 ~V DDH3, shows a low potential side V DDL1 ~V DDL3, drive power GDU4~6 common power supply V DDC (This is also omitted in FIG. 35). The high potential side of the common power supply V DDC is indicated by V DDHC and the low potential side is indicated by V DDLC . The drive common power supply V DDC of GDUs 4 to 6 and CU is about 10 to 20 V, and the low potential side V DDLC of this common power supply V DDC is connected to the low potential side V CCL of the main power supply V CC of FIG.

図３５は図３４のＧＤＵ１とＩＧＢＴＱ１のさらに詳細な接続図を示す。ここではその他のＧＤＵとＩＧＢＴは省略している。ＧＤＵ１のドライブ電源ＶDD1は１０〜２０Ｖ程度であり、その低電位側ＶDDL1はＩＧＢＴＱ1 のエミッタ端子Ｅに即ちインバータ出力のＵ相に接続され、ＩＧＢＴＱ１のコレクタ端子Ｃが主電源ＶCCの高電位側ＶCCHに接続されている。このため、ＩＧＢＴＱ１がオンした時はＶDDL1の電位はＶCCH の電位とほぼ等しくなり、またＩＧＢＴＱ１がオフした時はＶDDL1の電位はＶCCLの電位とほぼ等しくなる。従って、ＧＤＵ１と他の回路ユニットとの間には主電源ＶCCの電圧より、さらに高い絶縁耐圧が必要であり、このことはＧＤＵ２、３についても同様である。そしてレベルシフト回路ＬＳＵはそれ自体が高耐圧でなければならない。同図においてＩＧＢＴＱ１は電流検出端子[16]Ｍと温度検出素子θおよび温度検出端子[17]Ｔｅｍｐを備え、ゲート駆動回路ＧＤＵ１は電流検出端子ＯＣ１や温度検出端子ＯＴ１によりＩＧＢＴＱ１の異常を検出し、異常信号を出力ラインＳＯＵＴ１から出力する。ＯＵＴ１はゲート駆動端子である。
図３６は図３３と同一回路をインテリジェントパワーモジュール[18]と呼ばれる製品を用いて構成した構成図である。この場合ゲート駆動回路ＧＤＵ１〜ＧＤＵ６は、低耐圧ＩＣや個別電子部品および半導体素子からなり、パワーデバイス（Ｑ１〜Ｑ６、Ｄ１〜Ｄ６）とともにパワーデバイス側のパッケージに備えられている。この場合でも、外付けの駆動回路としてはフォトカプラ（ＰＣ）や高耐圧ＩＣ（ＨＶＩＣ）が用いられる。 FIG. 35 shows a more detailed connection diagram between GDU1 and IGBT Q1 of FIG. Other GDUs and IGBTs are omitted here. The drive power supply V DD1 of GDU1 is about 10-20V, its low potential side V DDL1 is connected to the emitter terminal E of IGBTQ1 , that is, the U phase of the inverter output, and the collector terminal C of IGBTQ1 is the high potential of the main power supply V CC . Connected to side V CCH . Therefore, IGBT Q1 is the potential of V DDL1 when turned on becomes substantially equal to the potential of V CCH, also the potential of V DDL1 when IGBT Q1 is turned off is approximately equal to the potential of V CCL. Therefore, a higher withstand voltage is required between GDU1 and the other circuit units than the voltage of main power supply V CC , and this is the same for GDU2 and 3. The level shift circuit LSU must itself have a high breakdown voltage. In the figure, the IGBT Q1 has a current detection terminal [16] M, a temperature detection element θ, and a temperature detection terminal [17] Temp. The gate drive circuit GDU1 detects an abnormality in the IGBT Q1 by the current detection terminal OC1 and the temperature detection terminal OT1, An abnormal signal is output from the output line SOUT1. OUT1 is a gate drive terminal.
FIG. 36 is a configuration diagram in which the same circuit as FIG. 33 is configured using a product called an intelligent power module [18]. In this case, the gate drive circuits GDU1 to GDU6 are composed of a low breakdown voltage IC, individual electronic components, and semiconductor elements, and are provided in the power device side package together with the power devices (Q1 to Q6, D1 to D6). Even in this case, a photocoupler (PC) or a high voltage IC (HVIC) is used as an external drive circuit.

図３７は図３６のＩＧＢＴＱ１およびＧＤＵ１のまわりの回路を詳細に示したものである。ＳＩＮ１およびＳＯＵＴ１は外部の構成となるＰＣやＨＶＩＣに接続される。
またその他の構成例として、ＧＤＵ１とＱ１を１チップ（同一の半導体基板）に集積化するパワーＩＣ技術[19],[20] や図３６の全ての回路を１チップに集積化するパワーＩＣ技術[11],[12] も開示されている。
図３８は図３４に示した高耐圧ＩＣ（ＨＶＩＣ）のチップの平面図を示し、各回路ユニットの配置が分かるように描いている。他の回路ユニットから高耐圧で分離される必要のあるＧＤＵ１は接合分離[21],[22],[10]や誘電体分離[23],[11],[12]により電気的に分離された島の中に形成されており、その周縁部を高耐圧接合終端構造[11],[21] ＨＶＪＴ（絶縁するために高電圧が印加される接合の終端部の構造をいう）により囲まれている。レベルシフト回路ＬＳＵの中には主電源ＶCCの低電位側の電位ＶCCLレベルの信号をドライブ電源ＶDD1の低電位側の電位ＶDDL1レベルの信号（入力ラインＳＩＮ１の信号）にレベルシフトするための高耐圧ｎチャネルＭＯＳＦＥＴ（ＨＶＮ）が設けられている。この高耐圧ｎチャネルＭＯＳＦＥＴには、中心のドレイン電極ＤNを囲んで高耐圧接合終端構造[10],[11] ＨＶＪＴが設けられている。またＧＤＵ１の分離された島の中にはＶDDL1レベルの信号（出力ラインＳＯＵＴ１の信号）をＶCCLレベルの信号にレベルシフトするための高耐圧ｐチャネルＭＯＳＦＥＴ（ＨＶＰ）が設けられており、この場合もドレイン電極ＤPを囲んで高耐圧接合終端構造ＨＶＪＴが設けられている。そして、ＧＤＵ１の入力ラインＳＩＮ１と出力ラインＳＯＵＴ１が、高耐圧接合終端構造ＨＶＪＴの上を通ってＧＤＵ１とＬＳＵの間にそれぞれ跨がって配線されている。また各ＧＤＵには図３５で示したＯＵＴ端子、ＯＣ端子、ＯＴ端子が配置され、ＧＤＵ１〜ＧＤＵ３にはＶDDH1〜ＶDDH3の端子、ＶDDL1〜ＶDDL3の端子が配置され、またＧＤＵ４〜ＧＤＵ６にはＶDDHCの端子とＶDDLCの端子が配置されている。同図ではＧＤＵ１とＧＤＵ４の詳細な説明をし、他のＧＤＵは詳細な配置説明は省略した。 FIG. 37 shows a detailed circuit around the IGBT Q1 and GDU1 of FIG. SIN1 and SOUT1 are connected to an external PC or HVIC.
As another configuration example, power IC technology [19], [20] for integrating GDU1 and Q1 on one chip (same semiconductor substrate) and power IC technology for integrating all the circuits in FIG. 36 on one chip. [11], [12] are also disclosed.
FIG. 38 is a plan view of the high voltage IC (HVIC) chip shown in FIG. 34, which is drawn so that the arrangement of each circuit unit can be understood. GDU1 that needs to be separated from other circuit units with high withstand voltage is electrically separated by junction separation [21], [22], [10] and dielectric separation [23], [11], [12] Is formed in the island, and its peripheral part is surrounded by a high-voltage junction termination structure [11], [21] HVJT (refers to the structure of the junction termination where high voltage is applied to insulate) ing. In the level shift circuit LSU, the signal of the potential V CCL level on the low potential side of the main power supply V CC is level shifted to the signal of the potential V DDL1 level on the low potential side of the drive power supply V DD1 (signal on the input line SIN1). A high breakdown voltage n-channel MOSFET (HVN) is provided. This high voltage n-channel MOSFET, surrounds the drain electrode D N of the central high voltage junction terminating structure [10], it provided that [11] HVJT. Further, a high voltage p-channel MOSFET (HVP) for level-shifting a V DDL1 level signal (output line SOUT1 signal) to a V CCL level signal is provided in the isolated island of GDU1. It surrounds the drain electrode D P is the high voltage junction terminating structure HVJT is provided also. The input line SIN1 and the output line SOUT1 of the GDU1 are routed between the GDU1 and the LSU over the high voltage junction termination structure HVJT. The OUT terminal shown in FIG. 35 for each GDU, OC terminal, OT terminal is located, GDU1～GDU3 terminal V DDH1 ~V DDH3, the terminal of the V DDL1 ~V DDL3 arranged to also GDU4~GDU6 The V DDHC terminal and the V DDLC terminal are arranged in the. In the same figure, GDU1 and GDU4 are described in detail, and detailed arrangement description of other GDUs is omitted.

前記した従来の高耐圧ＩＣやパワーＩＣの課題は６００Ｖを越える高耐圧化が困難なこと、製造コストが高いことなどであるが、さらに詳細に説明すると次のようになる。（１）分離技術に関する課題
先に述べたように、他の部分と電位の大きく異なる回路ユニット（例えば図３８のＧＤＵ１、２、３）を他の部分から電気的に高耐圧で分離する分離技術には誘電体分離[11],[12],[23]、接合分離[10],[21],[22]、自己分離[20],[24] などの技術がある。しかし誘電体分離や接合分離は分離構造が複雑で製造コストが高く、耐圧が高くなるほど、この製造コストがさらに高くなる。また自己分離は製造コストは低く抑えられるが、ＣＭＯＳ（相補形ＭＯＳＦＥＴ）構成では高耐圧化技術が未だ開発されておらず、一方、高耐圧化が可能なＮＭＯＳ（ｎチャネルＭＯＳＦＥＴ）構成ではアナログ回路（先で述べた電流検出回路や温度検出回路を指す）の高精度化が極めて困難である。（２）高耐圧接合終端構造ＨＶＪＴに関する課題
高耐圧接合終端構造は、縦型パワーデバイス用のもの[25],[26] 、横型高耐圧デバイス用のもの[27],[28],[29]など個々の用途別に各種構造が開示されている。しかしながら、高耐圧化したＩＣであるＨＶＩＣやパワーデバイスを集積した高耐圧パワーＩＣにおいては、集積回路ユニット間の高耐圧接合終端構造（図３８のＧＤＵ１〜３の回り）、高耐圧横型ｎチャネルＭＯＳＦＥＴ用の高耐圧接合終端構造（図３８のＨＶＮのＤNの回り）、高耐圧横型ｐチャネルＭＯＳＦＥＴ用の高耐圧接合終端構造（図３８のＨＶＰのＤPの回り）、さらには縦型パワーデバイス用の高耐圧接合終端構造など多くの用途の高耐圧接合終端構造を同一チップ上に形成する必要がある。従来のような汎用性の少ない構造で高耐圧ＩＣやパワーＩＣを実現しようとすると、多くの異なる高耐圧接合終端構造ＨＶＪＴを同一チップ上に形成しなければならず、製造コストが高くなる。（３）配線下の高耐圧接合終端構造に関する課題
高耐圧ＩＣでは、電位の大きく異なる集積回路ユニット（例えば図３８のＧＤＵ１とＬＳＵ）間での信号のやり取りを行うため、高耐圧接合終端構造ＨＶＪＴ上に配線を通すことが必要とされる。ところが、高耐圧接合終端構造ＨＶＪＴ上を配線を通すとこの配線の電位の影響を受けて、高耐圧接合終端構造ＨＶＪＴの耐圧が低下する問題がある[30]。この問題を解決するために、いくつかの構造[10],[11],[12],[31] が提案されているが、構造が複雑なため製造コストが高くなる。またこれらの提案されている構造では配線の影響を皆無にできなく、耐圧低下の程度を少なくしている丈であり、６００Ｖ程度の耐圧までは実用化できても、それ以上の耐圧のものはまだ実現していない。 The problems of the conventional high withstand voltage IC and power IC described above are that it is difficult to achieve a high withstand voltage exceeding 600 V, and the manufacturing cost is high. The details will be described as follows. (1) Issues related to separation technology As described above, a separation technology that electrically separates a circuit unit (for example, GDU1, 2, and 3 in FIG. 38) having a greatly different potential from other portions from other portions with high withstand voltage. There are techniques such as dielectric separation [11], [12], [23], junction separation [10], [21], [22], self-separation [20], [24]. However, dielectric separation and junction separation have a complicated separation structure and a high manufacturing cost. The higher the withstand voltage, the higher the manufacturing cost. In addition, although the self-isolation can keep the manufacturing cost low, a high voltage withstanding technology has not yet been developed in the CMOS (complementary MOSFET) configuration, while an analog circuit is provided in the NMOS (n channel MOSFET) configuration capable of increasing the withstand voltage. It is extremely difficult to improve the accuracy of the current detection circuit and the temperature detection circuit described above. (2) Issues with high voltage junction termination structure HVJT The high voltage junction termination structure is for vertical power devices [25], [26] and for horizontal high voltage devices [27], [28], [29 Various structures are disclosed for each application. However, in a high voltage power IC in which an HVIC and a power device integrated with high breakdown voltage are integrated, a high voltage junction termination structure between integrated circuit units (around GDU1 to 3 in FIG. 38), a high voltage lateral n-channel MOSFET. high voltage junction terminating structure use (around D N of HVN in Figure 38), the high voltage junction terminating structure for high voltage lateral p-channel MOSFET (around HVP of D P in FIG. 38), more vertical power device It is necessary to form a high voltage junction termination structure for many applications such as a high voltage junction termination structure for the same chip on the same chip. If a high voltage IC and a power IC are to be realized with a conventional structure with less versatility, many different high voltage junction termination structures HVJT must be formed on the same chip, which increases the manufacturing cost. (3) Problems with high-voltage junction termination structure under wiring In a high-voltage IC, a high-voltage junction termination structure HVJT is used to exchange signals between integrated circuit units (for example, GDU1 and LSU in FIG. 38) having greatly different potentials. It is necessary to pass the wiring over. However, when a wiring is passed over the high-voltage junction termination structure HVJT, there is a problem that the breakdown voltage of the high-voltage junction termination structure HVJT decreases due to the influence of the potential of the wiring [30]. In order to solve this problem, several structures [10], [11], [12], [31] have been proposed, but the manufacturing cost increases due to the complexity of the structure. In addition, these proposed structures do not completely eliminate the influence of wiring, and have a length that reduces the degree of withstand voltage reduction. Even if it can be put to practical use up to a withstand voltage of about 600V, It has not been realized yet.

この発明は、前記課題を解決するために、高耐圧に耐える第二領域および第四領域を設け、縦型パワーデバイスの高耐圧接合終端構造、集積回路ユニット間を分離する高耐圧接合終端構造、ｎチャネルまたはｐチャネルの高耐圧横型ＭＯＳＦＥＴの高耐圧接合終端構造など幅広く利用できる汎用性が高く、低コストな高耐圧接合終端構造とし、配線が横切っても耐圧が低下せずに高耐圧が維持できる、低コストな高耐圧接合終端構造とすることで、製造コストの低い高耐圧ＩＣを提供することができる。参考文献〔１〕USP 4,364,073(IGBT関連)〔２〕USP 4,893,165(ノンパンチスルー形IGBT関連)〔３〕USP 5,008,725(パワーMOSFET関連)〔４〕EP 0,071,916、特開昭58-39065に対応( 高速ダイオード内蔵パワーMOSFET関連)〔５〕USP 5,091,664(駆動回路関連)〔６〕USP 5,287,023(駆動回路関連)〔７〕USP 4,947,234(低耐圧ICとパワーデバイス関連)〔８〕USP 4,937,646(低耐圧ICとパワーデバイス関連)〔９〕A.Wegener and M.Amato "A HIGH VOLTAGE INTERFACE IC FOR HALF-BRIDGECIRCUITS" Electrochemical Society Extended Abstracts, vol.89-1, pp.476-478(1989)〔１０〕T.Terashima et al "Structure of 600V IC and A New Voltage Sensing Device" IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs,pp.224-229(1993)〔１１〕K.Endo et al "A 500V 1A 1-chip Inverter IC with a New Electric Field Reduction Structure" IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices and ICs,pp.379-383(1994)〔１２〕N.Sakurai et al "A three-phase inverter IC for AC220V with a drasticall small chip size and highly intelligent functions" IEEE Proceeding of The 5th International Symposium on Power Semiconductor Devices andICs,pp.310-315(1993)〔１３〕M.Mori et al "A HIGH POWER IGBT MODULE FOR TRACTION MOTOR DRIVE"IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs,pp.287-289(1993)〔１４〕USP 5,159,516 （電流検出方法関連）〔１５〕USP 5,070,322 （温度検出方法関連）〔１６〕USP 5,097,302 （電流検出用素子関連)〔１７〕USP 5,304,837 （温度検出用素子関連)〔１８〕K.Reinmuth et al "Intelligent Power Modules for Driving Systems"IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices and ICs,pp.93-97(1994)〔１９〕USP 4,677,325 (IPS関連）〔２０〕USP 5,053,838 (IPS関連）〔２１〕R.Zambrano et al "A New Edge Structure for 2kVolt Power IC Operation" IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices and ICs,pp.373-378(1994)〔２２〕M.F.Chang et al "Lateral HVIC with 1200-V Bipolar and Field-Effect Devices"IEEE Transactions on Electron devices, vol.ED-33, No.12, pp.1992-2001(1986)〔２３〕T.Ohoka et al "A WAFER BONDED SOI STRUCTURE FOR INTELLIGENT POWER ICs" IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs,pp.119-123(1993)〔２４〕J.P.MILLER "A VERY HIGH VOLTAGE TECHNOLOGY(up to 1200V) FOR VERTICAL SMARTPOEWR ICs" Electrochemical Society Extended Abstracts, vol.89-1, pp.403-404(1989)〔２５〕USP 4,399,449 （パワーデバイスのHVJT関連)〔２６〕USP 4,633,292 （パワーデバイスのHVJT関連)〔２７〕USP 4,811,075 （横型MOSFETのHVJT関連)〔２８〕USP 5,258,636 （横型MOSFETのHVJT関連)〔２９〕USP 5,089,871 （横型MOSFETのHVJT関連）〔３０〕P.K.T.MOK and C.A.T.SALAMA "Interconnect Induced Breakdown in HVIC's" Electrochemical Society Extended Abstracts, vol. 89-1, pp. 437
-38(1989)〔３１〕USP 5,043,781 ( パワーIC関連) In order to solve the above problems, the present invention provides a second region and a fourth region that can withstand a high breakdown voltage, a high breakdown voltage junction termination structure of a vertical power device, a high breakdown voltage junction termination structure that separates integrated circuit units, Highly versatile and low-cost high-voltage junction termination structure that can be used widely, such as n-channel or p-channel high-voltage lateral MOSFET high-voltage junction termination structure, and maintains high breakdown voltage without lowering the breakdown voltage even when wires cross. By using a low-cost, high-breakdown-voltage junction termination structure, a high-breakdown-voltage IC with a low manufacturing cost can be provided. References [1] USP 4,364,073 (IGBT-related) [2] USP 4,893,165 (non-punch-through IGBT-related) [3] USP 5,008,725 (power MOSFET-related) [4] EP 0,071,916; (5) USP 5,091,664 (Drive circuit related) [6] USP 5,287,023 (Drive circuit related) [7] USP 4,947,234 (Low voltage IC and power device related) [8] USP 4,937,646 (Low voltage IC) (9) A. Wegener and M. Amato "A HIGH VOLTAGE INTERFACE IC FOR HALF-BRIDGECIRCUITS" Electrochemical Society Extended Abstracts, vol.89-1, pp.476-478 (1989) [10] T.Terashima et al "Structure of 600V IC and A New Voltage Sensing Device" IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs, pp.224-229 (1993) [11] K. Endo et al "A 500V 1A 1- chip Inverter IC with a New Electric Field Reduction Structure "IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices an d ICs, pp. 379-383 (1994) [12] N. Sakurai et al "A three-phase inverter IC for AC220V with a drasticall small chip size and highly intelligent functions" IEEE Proceeding of The 5th International Symposium on Power Semiconductor Devices and ICs, pp. 310-315 (1993) [13] M. Mori et al "A HIGH POWER IGBT MODULE FOR TRACTION MOTOR DRIVE" IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs, pp. 287-289 (1993 ) [14] USP 5,159,516 (Current detection method related) [15] USP 5,070,322 (Temperature detection method related) [16] USP 5,097,302 (Current detection element related) [17] USP 5,304,837 (Temperature detection element related) [18] K. Reinmuth et al "Intelligent Power Modules for Driving Systems" IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices and ICs, pp. 93-97 (1994) [19] USP 4,677,325 (IPS related) [20] USP 5,053,838 ( [21] R. Zambrano et al "A New Edge Structure for 2kVolt Power IC Op eration "IEEE Proceeding of the 6th International Symposium on Power Semiconductor Devices and ICs, pp. 373-378 (1994) [22] MFChang et al" Lateral HVIC with 1200-V Bipolar and Field-Effect Devices "IEEE Transactions on Electron devices, vol.ED-33, No. 12, pp. 1992-2001 (1986) [23] T. Ohoka et al "A WAFER BONDED SOI STRUCTURE FOR INTELLIGENT POWER ICs" IEEE Proceeding of the 5th International Symposium on Power Semiconductor Devices and ICs 119-123 (1993) [24] JPMILLER "A VERY HIGH VOLTAGE TECHNOLOGY (up to 1200V) FOR VERTICAL SMARTPOEWR ICs" Electrochemical Society Extended Abstracts, vol.89-1, pp.403-404 (1989) [25] ] USP 4,399,449 (HVJT related to power devices) [26] USP 4,633,292 (HVJT related to power devices) [27] USP 4,811,075 (HVJT related to horizontal MOSFETs) [28] USP 5,258,636 (HVJT related to horizontal MOSFETs) [29] USP 5,089,871 (Related to HVJT of lateral MOSFET) [30] PKTMOK and CATSALAMA "Interconnect Induced Breakdown in HVIC's" Electrochemical Society Extended Abstracts, vol. 89-1, pp. 437
-38 (1989) [31] USP 5,043,781 (Power IC related)

この発明は前記の目的を達成するために、高耐圧ＩＣが、第二導電形の領域と該第二導電形の領域内にループ状に形成された第一導電形の領域とからなるｐｎ接合を有する高耐圧接合終端構造と、該高耐圧接合終端構造のループの内側に形成された少なくとも１つのＭＩＳトランジスタと、該高耐圧接合終端構造のループ上で前記第二導電形の領域が露出する部分に設けられた第一のドレイン電極,ループの外側に設けられた第一のゲート電極と第一のソース電極とを有する第二導電形チャネルの高耐圧ＭＩＳトランジスタとを備えたこととする。あるいは、第二導電形の領域と該第二導電形の領域内にループ状に形成された第一導電形の領域とからなるｐｎ接合を有する高耐圧接合終端構造と、該高耐圧接合終端構造のループの内側に形成された少なくとも１つのＭＩＳトランジスタと、該高耐圧接合終端構造のループ内に設けられた第二のドレイン電極,ループの内側に設けられた第二のゲート電極と第二のソース電極とを有する第一導電形チャネルの高耐圧ＭＩＳトランジスタとを備えたこととする。この発明によれば、耐圧クラスの異なる回路ユニットでも同一の高耐圧接合終端構造でよく、低コスト化できる。   In order to achieve the above object, the present invention provides a pn junction in which a high voltage IC includes a second conductivity type region and a first conductivity type region formed in a loop shape in the second conductivity type region. A high breakdown voltage junction termination structure, at least one MIS transistor formed inside the loop of the high breakdown voltage junction termination structure, and the region of the second conductivity type exposed on the loop of the high breakdown voltage junction termination structure The first drain electrode provided in the portion, the first gate electrode provided outside the loop, and the high breakdown voltage MIS transistor having the second conductivity type channel having the first source electrode are provided. Alternatively, a high breakdown voltage junction termination structure having a pn junction comprising a second conductivity type region and a first conductivity type region formed in a loop shape in the second conductivity type region, and the high breakdown voltage junction termination structure At least one MIS transistor formed inside the loop, a second drain electrode provided in the loop of the high withstand voltage junction termination structure, a second gate electrode provided inside the loop, and a second A high-voltage MIS transistor having a first conductivity type channel having a source electrode is provided. According to the present invention, even the circuit units having different withstand voltage classes may have the same high withstand voltage junction termination structure, and the cost can be reduced.

この発明によれば、第一領域と第二領域の接合を逆バイアスし、第二領域の表面層に形成した第三領域に空乏層が達しないように第二領域を設けることで、第三領域内に設けた各種デバイスが、低コストで第一領域から電気的に絶縁分離することができる。この接合構造を採用することで、耐圧クラスの異なる回路ユニットでも同一の高耐圧接合終端構造でよく、低コスト化できる。また、この接合構造で耐圧を確保するので、高耐圧接合終端構造部上に橋渡しする配線で耐圧低下が生じなくなる。またパワーデバイスを固着する金属板に温度検出部などを備える高耐圧ＩＣを固着したり、パワーデバイス上にこの高耐圧ＩＣを固着したり、また同一半導体基板にパワーデバイスとこの高耐圧ＩＣを集積することで高精度の温度検出ができる。以上のことから、低コストで高性能な高耐圧ＩＣの実現が可能となる。   According to the present invention, the junction between the first region and the second region is reverse-biased, and the second region is provided so that the depletion layer does not reach the third region formed in the surface layer of the second region. Various devices provided in the region can be electrically isolated from the first region at low cost. By adopting this junction structure, circuit units having different withstand voltage classes may have the same high withstand voltage junction termination structure, and the cost can be reduced. In addition, since the breakdown voltage is secured by this junction structure, the breakdown voltage does not decrease in the wiring that bridges the high breakdown voltage junction termination structure. In addition, a high voltage IC having a temperature detector is fixed to a metal plate to which the power device is fixed, this high voltage IC is fixed on the power device, and the power device and this high voltage IC are integrated on the same semiconductor substrate. This makes it possible to detect temperature with high accuracy. From the above, it is possible to realize a high voltage IC with high performance at low cost.

図１はこの発明の第１参考例の要部断面図を示す。図３８の高耐圧接合終端構造ＨＶＪＴに囲まれたＧＤＵ１〜３の部分にこの発明が適用されている。以下、一部実施例を除き第一導電形をｐ形、第二導電形をｎ形として説明する。
高耐圧ＩＣ（ＨＶＩＣ）はホウ素をドープしたｐ形半導体基板からなる第一領域１と、その表面層に選択的にリンのイオン注入を行って高温の熱拡散により形成したｎ形の第二領域２と、第二領域２の表面層に選択的にホウ素のイオン注入を行って高温の熱拡散により形成したｐ形の第三領域３と、第二領域２の表面層に選択的にリンをイオン注入し高温の熱拡散により形成したｎ形の第五領域５と、第三領域３の表面層に選択的にホウ素をイオン注入し高温の熱拡散により形成されたｐ形の第六領域６と、第二領域２の表面層に選択的に形成したｐ形の高濃度領域１１（第一ソース領域と第一ドレイン領域になる）とこのｐ形の高濃度領域１１に挟まれた第二領域２上にゲート絶縁膜１３を介して形成されたゲート電極となる多結晶シリコン膜１５とで構成されるｐチャネルＭＯＳＦＥＴ（ｐｃｈＭＯＳＦＥＴ）と、第三領域３の表面層に選択的に形成されたｎ形の高濃度領域１２（第二ソース領域と第二ドレイン領域になる）とこのｎ形の高濃度領域１２に挟まれた第三領域３上にゲート絶縁膜１３を介して形成されたゲート電極となる多結晶シリコン膜１５とで構成されるｎチャネルＭＯＳＦＥＴ（ｎｃｈＭＯＳＦＥＴ）と、第一領域１と第二領域２との間の第一のｐｎ接合１０４に高い逆バイアス電圧が印加されたときに表面付近での電界集中によるブレークダウンが生じないように、第一領域１を囲んで設けられた高耐圧接合終端構造ＨＶＪＴとからなる。ｐ形の高濃度領域１１は高濃度のホウ素がドープされ、ｎ形の高濃度領域は高濃度のリンがドープされている。ゲート絶縁膜１３は厚みが２００〜５００Å程度のシリコン酸化膜で形成される。第一領域１上、第二領域２上および第五領域５上の一部にフィールド絶縁膜１４が厚み５０００〜１００００Å程度のシリコン酸化膜で形成され、その上に選択的に導電膜であるリンドープされたｎ形の多結晶シリコン膜１５が厚さ３０００〜６０００Å程度で形成される。またこの多結晶シリコン膜１５は第三領域３と第二領域２の向かい合う領域にも同図に示すように形成される。層間絶縁膜１６は例えば常圧ＣＶＤ等により形成された、厚さ５０００〜１００００ÅのＢＰＳＧ膜である。第一金属膜１７は第一主面側の配線や電極として用いる例えば厚さ５０００〜１００００Å程度のＡｌ−１％Ｓｉ膜である。第一領域１の不純物濃度は１０13〜１０15ｃｍ-3程度であり、例えば６００Ｖ耐圧の高耐圧ＩＣでは１．５×１０14ｃｍ-3以下、１２００Ｖ耐圧の高耐圧ＩＣでは８×１０13ｃｍ-3以下というように必要とする耐圧により適切な不純物濃度が異なる。第一領域１の不純物濃度と第二領域２の不純物のドープ量（ドーピング量）は第一領域１と第二領域２との間の第一のｐｎ接合１０４が高電圧に逆バイアスされたときでも第一のｐｎ接合１０４の両側に拡がる空乏層１０１の第二領域２側での空乏層端１０２が第三領域３へは届かず第二領域２内に止まるように設定される。これを満たすには、第三領域３下の第三領域３と第一領域１とに挟まれた第二領域２の部分の正味のドープ量を１×１０12ｃｍ-2以上、３×１０13ｃｍ-2以下にすることが効果的である。典型的な例を次に示す。第二領域２の形成を５×１０12〜１×１０13ｃｍ-2のドープ量のリンの選択的なイオン注入と１１５０℃、３〜１０時間程度の熱拡散を行いその深さを３〜８μｍ程度に設定し、第三領域３の形成を１×１０13〜５×１０13ｃｍ-2のドープ量のホウ素の選択的なイオン注入と１１００℃、２〜１０時間程度の熱拡散により行い、その深さを１〜４μｍ程度に設定する。第五領域５および第六領域６のドープ量は１×１０14〜１×１０15ｃｍ-2程度、ｐ形およびｎ形の高濃度領域１１、１２のドープ量は１×１０15〜１×１０16ｃｍ-2程度である。高耐圧接合終端構造ＨＶＪＴは、従来技術の引用文献の中から色々な構造を用いることが可能であり、また引用した以外の構造も用いることもできる。第二領域２内に設けた比較的高濃度にドープされたｎ形の第五領域５は、第一領域１をコレクタ、第二領域２をベース、第三領域３をエミッタとする寄生バイポーラトランジスタのベース抵抗を低く抑えて、その誤動作を防ぐためのものである。この第五領域５は、第三領域に対向する第二領域２の表面層や第一領域１に対向する第二領域２の表面層に形成し、できる限り第三領域３の回りを概ね囲うように設けたり、第二領域２表面上でＭＯＳＦＥＴなどの素子を形成しない領域（フィールド領域）の大半を覆うように設けたりすることで誤動作を防止する効果が高まる。また第三領域３内に設けた比較的高濃度にドープされたｐ形の第六領域６は第二領域２をコレクタ、第三領域３をベース、ｎ形の高濃度領域１２をエミッタとする寄生バイポーラトランジスタのベース抵抗を低く抑えてその誤動作を防ぐものである。この第六領域６においても、前記第五領域５の形成と同様の配置上の工夫することで効果を高めることができる。 FIG. 1 shows a cross-sectional view of a main part of a first reference example of the present invention. The present invention is applied to the GDUs 1 to 3 surrounded by the high voltage junction termination structure HVJT in FIG. Hereinafter, the first conductivity type is assumed to be p-type and the second conductivity type is assumed to be n-type except for some embodiments.
The high breakdown voltage IC (HVIC) is a first region 1 made of a p-type semiconductor substrate doped with boron, and an n-type second region formed by high-temperature thermal diffusion by selectively implanting phosphorus ions into the surface layer. 2, p-type third region 3 formed by high-temperature thermal diffusion by selectively implanting boron ions into the surface layer of second region 2, and phosphorus selectively on the surface layer of second region 2. An n-type fifth region 5 formed by ion implantation and high-temperature thermal diffusion, and a p-type sixth region 6 formed by high-temperature thermal diffusion by selectively implanting boron into the surface layer of the third region 3. And a p-type high concentration region 11 (to be a first source region and a first drain region) selectively formed on the surface layer of the second region 2 and a second sandwiched between the p-type high concentration region 11. Polycrystalline silicon to be a gate electrode formed on the region 2 via the gate insulating film 13 A p-channel MOSFET (pchMOSFET) constituted by the film 15, and an n-type high concentration region 12 (which becomes a second source region and a second drain region) selectively formed in the surface layer of the third region 3; An n-channel MOSFET (nchMOSFET) composed of a polycrystalline silicon film 15 serving as a gate electrode formed on the third region 3 sandwiched between the n-type high-concentration regions 12 via a gate insulating film 13; The first region 1 is made to prevent breakdown due to electric field concentration near the surface when a high reverse bias voltage is applied to the first pn junction 104 between the first region 1 and the second region 2. The high-voltage junction termination structure HVJT is provided in an enclosed manner. The p-type high concentration region 11 is doped with high concentration boron, and the n-type high concentration region is doped with high concentration phosphorus. The gate insulating film 13 is formed of a silicon oxide film having a thickness of about 200 to 500 mm. A field insulating film 14 is formed of a silicon oxide film having a thickness of about 5000 to 10,000 mm on a part of the first region 1, the second region 2 and the fifth region 5. The formed n-type polycrystalline silicon film 15 is formed with a thickness of about 3000 to 6000 mm. The polycrystalline silicon film 15 is also formed in a region where the third region 3 and the second region 2 face each other as shown in FIG. The interlayer insulating film 16 is a BPSG film having a thickness of 5000 to 10000 mm formed by, for example, atmospheric pressure CVD. The first metal film 17 is, for example, an Al-1% Si film having a thickness of about 5000 to 10000 mm used as a wiring or electrode on the first main surface side. The impurity concentration of the first region 1 is about 10 13 to 10 15 cm −3 , for example, 1.5 × 10 14 cm −3 or less in a 600V high-voltage IC and 8 × 10 13 in a 1200V high-voltage IC. The appropriate impurity concentration varies depending on the required breakdown voltage, such as cm −3 or less. The impurity concentration in the first region 1 and the doping amount (doping amount) of the impurity in the second region 2 are obtained when the first pn junction 104 between the first region 1 and the second region 2 is reverse-biased to a high voltage. However, the depletion layer end 102 on the second region 2 side of the depletion layer 101 spreading on both sides of the first pn junction 104 is set so as not to reach the third region 3 and to remain in the second region 2. In order to satisfy this, the net doping amount of the second region 2 sandwiched between the third region 3 and the first region 1 below the third region 3 is set to 1 × 10 12 cm −2 or more and 3 × 10. It is effective to make it 13 cm -2 or less. A typical example is shown below. The formation of the second region 2 is performed by selective ion implantation of phosphorus with a doping amount of 5 × 10 12 to 1 × 10 13 cm −2 and thermal diffusion at 1150 ° C. for about 3 to 10 hours. The third region 3 is formed by selective ion implantation of boron with a doping amount of 1 × 10 13 to 5 × 10 13 cm −2 and thermal diffusion at 1100 ° C. for about 2 to 10 hours. The depth is set to about 1 to 4 μm. The doping amount of the fifth region 5 and the sixth region 6 is about 1 × 10 14 to 1 × 10 15 cm −2 , and the doping amount of the p-type and n-type high concentration regions 11 and 12 is 1 × 10 15 to 1 ×. It is about 10 16 cm -2 . The high-voltage junction termination structure HVJT can use various structures from cited documents of the prior art, and structures other than those cited can also be used. A relatively highly doped n-type fifth region 5 provided in the second region 2 is a parasitic bipolar transistor having the first region 1 as a collector, the second region 2 as a base, and the third region 3 as an emitter. This is to keep the base resistance of the substrate low and prevent its malfunction. The fifth region 5 is formed on the surface layer of the second region 2 facing the third region or the surface layer of the second region 2 facing the first region 1 and surrounds the third region 3 as much as possible. The effect of preventing malfunction can be enhanced by providing the cover so as to cover most of the region (field region) where the element such as MOSFET is not formed on the surface of the second region 2. The relatively heavily doped p-type sixth region 6 provided in the third region 3 has the second region 2 as a collector, the third region 3 as a base, and the n-type high concentration region 12 as an emitter. The base resistance of the parasitic bipolar transistor is kept low to prevent its malfunction. Also in the sixth region 6, the effect can be enhanced by devising the arrangement similar to the formation of the fifth region 5.

同図に示した高耐圧ＩＣ（ＨＶＩＣ）の例は第一導電形がｐ形、第二導電形がｎ形であるので、第一領域１は図３４のＶDDLC即ち図３３のＶCCL に接続され、第三領域３は図３４のＶDDL1即ち図３３のＵ相に接続され、第二領域２は１５Ｖ程度のドライブ電源ＶDD1から高電位側の出力ＶDDH1が接続される。また同図では簡略化のため、第二領域２および第三領域３内にｐチャネルＭＯＳＦＥＴとｎチャネルＭＯＳＦＥＴのみを図示したが、実際はこれらの素子以外に抵抗やコンデンサ、ダイオードやバイポーラトランジスタなどの各種デバイスを多数集積化して形成することができ、これらのデバイスを用いてゲート駆動回路ＧＤＵ１（図３３および図３５）を構成することができる。そして、後述する構造の高耐圧ｎチャネルＭＯＳＦＥＴ（ＨＶＮ）や高耐圧ｐチャネルＭＯＳＦＥＴ（ＨＶＰ）を図３８に示したように加え、ＧＤＵ１とＬＳＵとの間の信号配線である入力ラインＳＩＮ１と出力ラインＳＯＵＴ１を形成すれば図３３〜図３５に説明した高耐圧ＩＣとなる。
図２は第２参考例を示す要部構造図で、同図（ａ）は図３８におけるＧＤＵ１と高耐圧接合終端構造ＨＶＪＴに対応する部分の要部平面図で、同図（ｂ）は同図（ａ）のＸ−Ｘで切断した要部断面図である。同図（ａ）において、ＧＤＵ１は高耐圧接合終端構造ＨＶＪＴに周囲を囲まれた第二領域２および第四領域４に形成されている。同図（ｂ）において、第二領域２に囲まれて、第二領域２とは分離されたｎ形の第四領域４が設けられ、この第二領域２と第四領域４とに跨がって多結晶シリコンからなるループ状の第一導電膜７がフィールド絶縁膜１４を介して設けられている。この第一導電膜７と図１の多結晶シリコン膜１５とは同様の働きをする。同図（ｂ）では第四領域４は一つしか描いていないが、当然必要により複数（もしくは多数）設けることもできる。第四領域４は第二領域２の形成と同時にリンを選択的にイオン注入するときのマスクのパターン形状を変えるだけで形成される。この第四領域４にはｎｐｎトランジスタを形成した例が示してあり、第六領域６の形状と同時に形成したベース領域３１、ｎ形の高濃度領域１２の形成と同時に形成したエミッタ領域３２およびコレクタとしての第二領域２を備え、第二領域２内に設けるのと同じ理由で第四領域４にも第五領域５を設けている。第二領域２内と第三領域３内とにｐチャネルＭＯＳＦＥＴ（ｐｃｈＭＯＳＦＥＴ）とｎチャネルＭＯＳＦＥＴ（ｎｃｈＭＯＳＦＥＴ）とを設けた例を示しているが、第二領域２および第三領域３には前記同様多くの種類のデバイスを集積化することができ、また同様に第四領域４にも第三領域３と同様のｐ形の領域（図示されていないが仮に第七領域と呼ぶこととする）を設けて、この第四領域４および第七領域に多くの種類のデバイスを集積化することができる。第四領域４は第二領域２のドライブ電源ＶDD1 と異なる電源ＶEE1 （例えば１５ＶのＶDD1を降圧安定化したアナログ回路用の１０Ｖ電源やロジック回路用の５Ｖ電源など）の回路ユニットとして利用でき、また同図（ｂ）に示すようにコレクタ（Ｃ）が第二領域２から独立したバイポーラトランジスタとしても利用することができるので、この第四領域４の利用により回路設計の自由度が非常に大きくなる。 In the example of the high breakdown voltage IC (HVIC) shown in the figure, the first conductivity type is p-type and the second conductivity type is n-type, so the first region 1 is at V DDLC in FIG. 34, that is, V CCL in FIG. The third region 3 is connected to V DDL1 in FIG. 34, that is, the U phase in FIG. 33, and the second region 2 is connected to a high-potential side output V DDH1 from a drive power supply V DD1 of about 15V. For simplification, only the p-channel MOSFET and the n-channel MOSFET are shown in the second region 2 and the third region 3 for the sake of simplicity. However, in addition to these elements, various elements such as resistors, capacitors, diodes, and bipolar transistors are actually used. A large number of devices can be integrated, and the gate drive circuit GDU1 (FIGS. 33 and 35) can be configured using these devices. Then, a high breakdown voltage n-channel MOSFET (HVN) and a high breakdown voltage p-channel MOSFET (HVP) having a structure to be described later are added as shown in FIG. 38, and an input line SIN1 and an output line which are signal wirings between GDU1 and LSU. If SOUT1 is formed, the high voltage IC described with reference to FIGS.
FIG. 2 is a main part structural view showing a second reference example. FIG. 2A is a main part plan view of a part corresponding to the GDU1 and the high voltage junction termination structure HVJT in FIG. 38, and FIG. It is principal part sectional drawing cut | disconnected by XX of figure (a). In FIG. 2A, the GDU 1 is formed in the second region 2 and the fourth region 4 surrounded by the high voltage junction termination structure HVJT. In FIG. 2B, an n-type fourth region 4 is provided that is surrounded by the second region 2 and separated from the second region 2, and straddles the second region 2 and the fourth region 4. Thus, a loop-shaped first conductive film 7 made of polycrystalline silicon is provided via a field insulating film 14. The first conductive film 7 and the polycrystalline silicon film 15 shown in FIG. Although only one fourth region 4 is shown in FIG. 5B, a plurality (or many) of the fourth regions 4 can naturally be provided if necessary. The fourth region 4 is formed only by changing the pattern shape of the mask when phosphorus is selectively ion-implanted simultaneously with the formation of the second region 2. The fourth region 4 shows an example in which an npn transistor is formed. A base region 31 formed simultaneously with the shape of the sixth region 6, an emitter region 32 formed simultaneously with the formation of the n-type high concentration region 12, and a collector. The fifth region 5 is also provided in the fourth region 4 for the same reason as that provided in the second region 2. Although an example in which a p-channel MOSFET (pchMOSFET) and an n-channel MOSFET (nchMOSFET) are provided in the second region 2 and the third region 3 is shown, the second region 2 and the third region 3 are the same as described above. Many kinds of devices can be integrated. Similarly, the fourth region 4 has a p-type region similar to the third region 3 (not shown, but tentatively referred to as a seventh region). It is possible to integrate many kinds of devices in the fourth area 4 and the seventh area. The fourth area 4 is used as a circuit unit for a power supply V EE1 (for example, a 10V power supply for an analog circuit or a 5V power supply for a logic circuit in which a 15 V V DD1 is stepped down and stabilized) different from the drive power supply V DD1 of the second area 2 Further, as shown in FIG. 5B, the collector (C) can be used as a bipolar transistor independent of the second region 2, so that the use of the fourth region 4 provides a great degree of freedom in circuit design. Become bigger.

また同図（ｂ）において、第二領域２と第四領域４に挟まれた第一領域１表面上にはフィールド絶縁膜１４を介して第二領域２と第四領域４とに跨がる導電膜７が設けられており、高電圧が印加される第一領域１と第二領域２との間の第一のｐｎ接合１０４と第一領域１と第四領域４との間の第四のｐｎ接合１０５が不連続であることによる電界集中を防止し、高い耐圧が確保できるようになっている。この導電膜７は浮遊電位状態（フローティング）にしておくよりも、第二領域２もしくは第四領域４に電気的に接続し、電位的に安定化しておく方が好ましい。また第二領域２と第四領域４の間の分離耐圧を高くとりたい場合には、第一導電形がｐ形の場合は、この第一導電膜７を第二領域２と第四領域４のうち低電位側の領域に接続し、ｎ形の場合は高電位側の領域に接続するとよい。こうすれば、第一導電膜７をゲートとする寄生のＭＯＳＦＥＴがオンし難くなるからである。
図３は第３参考例を示す要部構造図で、同図（ａ）はゲート駆動回路ユニットを１チップ化したときの平面図、同図（ｂ）はその断面図、同図（ｃ）はゲート駆動回路ユニット（１チップ化されている）とパワーデバイス（例えばＩＧＢＴとダイオード）とがヒートシンク上に形成された断面図である。ここでは前記説明とは導電形を逆にし、第一導電形をｎ形、第二導電形をｐ形とした。 In FIG. 2B, the surface of the first region 1 sandwiched between the second region 2 and the fourth region 4 extends over the second region 2 and the fourth region 4 via the field insulating film 14. A conductive film 7 is provided, and a first pn junction 104 between the first region 1 and the second region 2 to which a high voltage is applied, and a fourth between the first region 1 and the fourth region 4. Thus, electric field concentration due to the discontinuity of the pn junction 105 is prevented, and a high breakdown voltage can be secured. The conductive film 7 is preferably electrically connected to the second region 2 or the fourth region 4 and stabilized in potential rather than being in a floating potential state (floating). Further, when it is desired to obtain a high isolation breakdown voltage between the second region 2 and the fourth region 4, when the first conductivity type is p-type, the first conductive film 7 is connected to the second region 2 and the fourth region 4. Of these, it is preferable to connect to a region on the low potential side, and in the case of n-type, it is preferable to connect to a region on the high potential side. This is because it becomes difficult to turn on a parasitic MOSFET having the first conductive film 7 as a gate.
FIG. 3 is a structural diagram of a main part showing a third reference example. FIG. 3A is a plan view when the gate drive circuit unit is made into one chip, FIG. 3B is a sectional view thereof, and FIG. FIG. 3 is a cross-sectional view in which a gate drive circuit unit (which is made into one chip) and a power device (for example, an IGBT and a diode) are formed on a heat sink. Here, the conductivity type is reversed from the above description, the first conductivity type is n-type, and the second conductivity type is p-type.

同図（ａ）において、ｎ形の第一領域１上に高耐圧接合終端構造ＨＶＪＴに囲まれてｐ形の第二領域２が設けられている。この図は図２、３、６のゲート駆動回路ユニットであるＧＤＵ１部分だけを１チップに集積化した高耐圧ＩＣ（ＧＤＵＩＣ１）の平面図を示す。
同図（ｂ）において、ｎ形の第一領域１に形成されたｐ形の第二領域２およびｎ形の第三領域３に、ｎチャネルＭＯＳＦＥＴ（ｎｃｈＭＯＳＦＥＴ）とｐチャネルＭＯＳＦＥＴ（ｐｃｈＭＯＳＦＥＴ）がそれぞれ形成されている。この第二領域２および第三領域３にも当然多くの種類のデバイスが集積化できる。この高耐圧ＩＣ（ＧＤＵＩＣ１）の裏面には、例えばＴｉ／Ｎｉ／Ａｕの三層の金属膜からなる第二金属膜１８が設けられ、はんだで金属板と固着できるようにしてある。
同図（ｃ）において、高耐圧ＩＣ（ＧＤＵＩＣ１）がｎチャネル形の縦型パワーデバイスＱ１（ＩＧＢＴなど）およびダイオードＤ１と共に図３３および図３５のＶCCH に接続されることになる金属板３３上にはんだ接合で固着される。この場合、第一導電形がｎ形であるので、この高耐圧ＩＣ（ＧＤＵＩＣ１）の裏面をパワーデバイスの裏面（コレクタまたはドレイン）が固着している金属板３３に接着しても、第一領域１と第二領域２との間の第一のｐｎ接合１０４は常に逆バイアスとなり、第二領域２に形成された各種デバイスは第一領域１から電気的に絶縁され、動作上全く問題ない。尚、金属板３３は例えばセラミックからなる絶縁板３４を介して銅やアルミニウムからなるヒートシンク３５上に設置されている。 In FIG. 2A, a p-type second region 2 is provided on an n-type first region 1 surrounded by a high voltage junction termination structure HVJT. This figure shows a plan view of a high voltage IC (GDUIC1) in which only the GDU1 portion, which is the gate drive circuit unit of FIGS.
In FIG. 2B, an n-channel MOSFET (nchMOSFET) and a p-channel MOSFET (pchMOSFET) are respectively formed in a p-type second region 2 and an n-type third region 3 formed in the n-type first region 1. Is formed. Naturally, many kinds of devices can be integrated in the second region 2 and the third region 3. A second metal film 18 made of, for example, a three-layer metal film of Ti / Ni / Au is provided on the back surface of the high voltage IC (GDUIC1) so that it can be fixed to the metal plate with solder.
In FIG. 5C, the high voltage IC (GDUIC1) is connected to the V CCH in FIGS. 33 and 35 together with the n-channel vertical power device Q1 (IGBT or the like) and the diode D1. It is fixed by soldering. In this case, since the first conductivity type is n-type, even if the back surface of the high breakdown voltage IC (GDUIC1) is bonded to the metal plate 33 to which the back surface (collector or drain) of the power device is fixed, the first region The first pn junction 104 between the first region 2 and the second region 2 is always reverse-biased, and the various devices formed in the second region 2 are electrically isolated from the first region 1, and there is no problem in operation. The metal plate 33 is installed on a heat sink 35 made of copper or aluminum via an insulating plate 34 made of ceramic, for example.

図４は第４参考例の要部構造図を示し、同図（ａ）はＧＤＵ１の部分だけを１チップに集積化した高耐圧ＩＣであるＧＤＵＩＣ１の平面図、同図（ｂ）はその断面図、同図（ｃ）はＧＤＵＩＣ１をパワーデバイスＱ１のエミッタ（もしくはソース）電極上に固着した断面図である。同図（ａ）は図３（ａ）と同じであるため説明は省略する。同図（ｂ）において、第一領域１および第三領域３はｐ形、第二領域２はｎ形である。また同図（ｃ）において、ＧＤＵＩＣ１とパワーデバイスＱ１のエミッタ（もしくはソース）電極との固着は例えばエポキシ系の接着剤が使用できる。またこの場合も第一導電形がｐ形であればｐｎ接合１０４は常に逆バイアスとなるので、前記で述べたように動作上全く問題ない。
図５は第５参考例の要部構造図を示し、同図（ａ）は平面図、同図（ｂ）は断面図である。同図（ａ）において、高耐圧接合終端構造ＨＶＪＴでｎチャネル形の縦型パワーデバイスＱ１（ここではＩＧＢＴを示す）が囲まれ、さらにＧＤＵ１がこのパワーデバイスＱ１で囲まれている。
同図（ｂ）において、Ｑ１のｐ形のベース領域３６に囲まれた第二領域２がｎ形のドリフト領域４０である第一領域１の表面層に形成されている。第二領域２とＱ１のベース領域３６の間の第一領域１の表面にフィールド絶縁膜１４を介して第一導電膜７が形成される。この第一導電膜７はＱ１のエミッタ電極と共に図２の第一導電膜７と同じ働きをする。Ｑ１はＩＧＢＴを示し、第一領域１の第二主面側にｎ+ バッファ層３８およびｐ+ 基板３９があり、ｐ+基板３９表面上に第二金属膜１８が形成され、周縁部はパッシベーション膜１９（例えば１００００Åのシリコン窒化膜）が被覆されている。 FIG. 4 shows a structural diagram of the main part of the fourth reference example. FIG. 4A is a plan view of GDUIC1, which is a high voltage IC in which only the GDU1 is integrated on one chip, and FIG. FIG. 1C is a cross-sectional view in which GDUIC1 is fixed on the emitter (or source) electrode of power device Q1. Since FIG. 3A is the same as FIG. 3A, description thereof is omitted. In FIG. 2B, the first region 1 and the third region 3 are p-type, and the second region 2 is n-type. Further, in FIG. 3C, for example, an epoxy adhesive can be used for fixing the GDUIC 1 to the emitter (or source) electrode of the power device Q1. Also in this case, if the first conductivity type is p-type, the pn junction 104 is always reverse-biased, so that there is no problem in operation as described above.
FIGS. 5A and 5B are main part structural views of a fifth reference example. FIG. 5A is a plan view and FIG. 5B is a cross-sectional view. In FIG. 2A, an n-channel vertical power device Q1 (shown here as an IGBT) is surrounded by a high breakdown voltage junction termination structure HVJT, and GDU1 is further surrounded by the power device Q1.
In FIG. 2B, the second region 2 surrounded by the p-type base region 36 of Q <b> 1 is formed in the surface layer of the first region 1 that is the n-type drift region 40. A first conductive film 7 is formed on the surface of the first region 1 between the second region 2 and the base region 36 of Q1 via the field insulating film 14. The first conductive film 7 functions in the same manner as the first conductive film 7 of FIG. 2 together with the emitter electrode of Q1. Q1 indicates an IGBT, and an n + buffer layer 38 and a p + substrate 39 are formed on the second main surface side of the first region 1, a second metal film 18 is formed on the surface of the p + substrate 39, and a peripheral portion is a passivation. A film 19 (for example, a 10,000-nm silicon nitride film) is covered.

図６は第６参考例の要部平面図、図７は第７参考例の要部平面図を示す。これらは別の参考例である。図３の参考例ではＧＤＵ１のみの例を示したが、これらの図は図３４および図３８に示すものに対応した参考例で、図６は高耐圧接合終端構造ＨＶＪＴがＧＤＵ４〜ＧＤＵ６とＣＵおよびＬＳＵを一括して取り囲んでいる参考例を示し、図７は高耐圧接合終端構造ＨＶＪＴが図３８の各回路ユニットを一括して取り囲んでいる参考例を示す。図７は図６と比べ、入力ラインＳＩＮ１、出力ラインＳＯＵＴ１の各配線が横切る高耐圧接合終端構造ＨＶＪＴの数が少ないため、（図６は３個、図７は２個）、耐圧低下が起こり難い。また各回路ユニットの説明は前記と同様のため省略する。
図８以降において、図中の番号の（ ）内の番号は、図１ないし図５の参考例に対応する番号と同じ製造方法で、それらと同時に同一チップ上に形成され得るものであることを示している。また第一導電形をｐ形、第二導電形をｎ形とした場合で説明する。当然逆の導電形にしてもよい。
図８は第８参考例でダイオードに用いた場合の高耐圧接合終端構造図を示し、同図（ａ）は要部断面図、同図（ｂ）、同図（ｃ）は平面図である。
同図（ａ）において、第一領域１はホウ素をドープした半導体基板で濃度は１０13〜１０15ｃｍ-3程度である。この濃度は必要とする耐圧により異なる。第八領域８は、第一領域１の表面からの選択的なリンのイオン注入（ドーズ量：３×１０12〜１×１０13ｃｍ-2程度）と１１５０℃、３〜１０時間程度の熱拡散により形成し、その拡散深さは３〜８μｍ程度である。第九領域９は、第八領域８の表面からの選択的なホウ素のイオン注入（ドーズ量：１×１０12〜１．５×１０13ｃｍ-2程度）と１１５０℃、１〜５時間程度の熱拡散により形成し、その拡散深さは１．５〜５μｍ程度である。ｎ形の高濃度領域４５は、カソード電極Ｋと第八領域８の電気的接続を良好にするために設けた領域で、例えば選択的なリンのイオン注入（ドーズ量：１×１０14〜１×１０15ｃｍ-2程度）と１０００〜１１００℃程度の熱処理により第五領域（図１参照のこと）と同時に形成される。ｐ形の高濃度領域４６は、アノード電極Ａと第九領域９の電気的接続を良好にするために設けた領域で、例えば選択的なホウ素のイオン注入（１×１０14〜１×１０15ｃｍ-2程度）と１０００〜１１００℃程度の熱処理により第六領域６（図１参照のこと）と同時に形成される。フィールド絶縁膜１４および第九領域９上の絶縁膜４１は熱酸化膜で、膜厚は５０００〜１００００Å程度である。カソード電極Ｋとアノード電極Ａは例えばＡｌ−１％Ｓｉからなる第一金属膜１７からなり、膜厚は５０００〜１００００Å程度である。パッシベーション膜１９は、例えばアモルファスシリコン膜やシリコンリッチのＳｉＮ膜（窒化膜）で膜厚は５０００〜１５０００Å程度である。この場合、抵抗性フィールドプレートとして用いるために、高抵抗膜４４として第九領域９上の絶縁膜４１上にカソード電極Ｋと共通の第二導電膜４２とアノード電極Ａと共通の第三導電膜４３の双方に接触して設けられている。高抵抗膜４４の抵抗率はシート抵抗で１０13〜１０11Ω／□程度である。第二導電膜４２および第三導電膜４３は、フィールドプレートとして第九領域９の上の絶縁膜４１上へ延在している。第九領域下の第一領域１と第九領域とに挟まれた第八領域部分１１６の正味のドーピング量は１×１０11ｃｍ-2以上、４×１０12ｃｍ-2以下となるように設定されており、第九領域９の正味のドーピング量は１×１０11ｃｍ-2以上、２×１０12ｃｍ-2以下となるように設定されている。これにより、第一領域１と第八領域８の間の第二のｐｎ接合１１１と第八領域８と第九領域９の間の第三のｐｎ接合１１２がともに逆バイアスされたときに、第二のｐｎ接合１１１の両側に拡がる第二の空乏層１１３と第三のｐｎ接合１１２の両側に拡がる第三の空乏層１１４とは第八領域８内で結合し、また第三の空乏層１１４は第九領域９の表面１１５まで達している。つまり、この高耐圧接合終端構造ＨＶＪＴのアノード電極Ａとカソード電極Ｋとに平面上で挟まれた第八領域８および第九領域９には、第一領域１まで達する空乏層（結合した第二の空乏層１１３と第三の空乏層１１４）が水平方向にも垂直方向にも拡がり、その結果高い耐圧が得られる。垂直方向に拡がるのは第一領域１が低濃度であるためである。第二導電膜４２は、第二導電形の高濃度領域４５近辺での電界集中を防ぐために、第三導電膜４３は、ｐ形の高濃度領域４６近辺での電界集中を防ぐために有効である。高抵抗膜４４は、第二導電膜４２と第三導電膜４３の間を高抵抗膜４４を介して流れる電流が、高抵抗膜４４に沿って生ずる水平方向の滑らかな電位分布を第九領域９上の絶縁膜４１の容量を介して絶縁膜下の半導体領域内へ静電的に作用させ、半導体領域の空乏層中の電位分布を水平方向に滑らかに安定化させるので、より一層小さい高耐圧接合終端構造の水平距離で高耐圧を得るために効果的である。 FIG. 6 is a plan view of relevant parts of a sixth reference example, and FIG. 7 is a plan view of relevant parts of a seventh reference example. These are other reference examples. In the reference example of FIG. 3, only the GDU 1 is shown, but these figures are reference examples corresponding to those shown in FIGS. 34 and 38, and FIG. 6 shows the high-voltage junction termination structure HVJT having GDU4 to GDU6 and CU. It shows a reference example surrounds collectively LSU, Figure 7 shows a reference example high voltage junction terminating structure HVJT surrounds collectively each circuit unit of Figure 38. Compared with FIG. 6, FIG. 7 has a smaller number of high voltage junction termination structures HVJT that the wirings of the input line SIN1 and output line SOUT1 cross (three in FIG. 6 and two in FIG. 7). hard. The description of each circuit unit is omitted because it is the same as described above.
In FIG. 8 and subsequent figures, the numbers in parentheses () in the figure indicate that they can be formed on the same chip at the same time by the same manufacturing method as the numbers corresponding to the reference examples in FIGS. Show. The case where the first conductivity type is p-type and the second conductivity type is n-type will be described. Of course, the conductivity type may be reversed.
FIG. 8 shows a high breakdown voltage junction termination structure diagram when used in a diode in the eighth reference example, where FIG. 8A is a sectional view of the main part, FIG. 8B and FIG. 8C are plan views. .
In FIG. 2A, the first region 1 is a boron-doped semiconductor substrate having a concentration of about 10 13 to 10 15 cm −3 . This concentration depends on the required pressure resistance. The eighth region 8 includes selective phosphorus ion implantation from the surface of the first region 1 (dose amount: about 3 × 10 12 to 1 × 10 13 cm −2 ) and heat at 1150 ° C. for about 3 to 10 hours. It is formed by diffusion, and the diffusion depth is about 3 to 8 μm. In the ninth region 9, selective boron ion implantation (dose amount: about 1 × 10 12 to 1.5 × 10 13 cm −2 ) from the surface of the eighth region 8 and 1150 ° C. for about 1 to 5 hours. The diffusion depth is about 1.5 to 5 μm. The n-type high concentration region 45 is a region provided in order to improve the electrical connection between the cathode electrode K and the eighth region 8. For example, selective phosphorus ion implantation (dose amount: 1 × 10 14 −1 × 10 15 cm approximately -2) the fifth region by heat treatment at about 1000 to 1100 ° C. (see FIG. 1) at the same time is formed. The p-type high-concentration region 46 is a region provided for improving the electrical connection between the anode electrode A and the ninth region 9, for example, selective boron ion implantation (1 × 10 14 to 1 × 10 15). It is formed simultaneously with the sixth region 6 (see FIG. 1) by heat treatment at about 1000 cm −2 and about 1000 to 1100 ° C. The field insulating film 14 and the insulating film 41 on the ninth region 9 are thermal oxide films, and the film thickness is about 5000 to 10,000 mm. The cathode electrode K and the anode electrode A are made of the first metal film 17 made of, for example, Al-1% Si, and the film thickness is about 5000 to 10,000 mm. The passivation film 19 is, for example, an amorphous silicon film or a silicon-rich SiN film (nitride film) and has a thickness of about 5000 to 15000 mm. In this case, the second conductive film 42 common to the cathode electrode K and the third conductive film common to the anode electrode A are formed on the insulating film 41 on the ninth region 9 as the high resistance film 44 for use as a resistive field plate. 43 in contact with both. The resistivity of the high resistance film 44 is about 10 13 to 10 11 Ω / □ in terms of sheet resistance. The second conductive film 42 and the third conductive film 43 extend as a field plate onto the insulating film 41 on the ninth region 9. The net doping amount of the eighth region portion 116 sandwiched between the first region 1 and the ninth region below the ninth region is 1 × 10 11 cm −2 or more and 4 × 10 12 cm −2 or less. The net doping amount of the ninth region 9 is set to be 1 × 10 11 cm −2 or more and 2 × 10 12 cm −2 or less. Thereby, when the second pn junction 111 between the first region 1 and the eighth region 8 and the third pn junction 112 between the eighth region 8 and the ninth region 9 are both reverse-biased, The second depletion layer 113 extending on both sides of the second pn junction 111 and the third depletion layer 114 extending on both sides of the third pn junction 112 are combined in the eighth region 8, and the third depletion layer 114 Reaches the surface 115 of the ninth region 9. That is, the eighth region 8 and the ninth region 9 sandwiched between the anode electrode A and the cathode electrode K of the high breakdown voltage junction termination structure HVJT on the plane are depleted layers (coupled second regions) reaching the first region 1. The depletion layer 113 and the third depletion layer 114) extend both in the horizontal direction and in the vertical direction, resulting in a high breakdown voltage. The reason for spreading in the vertical direction is that the first region 1 has a low concentration. The second conductive film 42 is effective for preventing electric field concentration in the vicinity of the second conductivity type high concentration region 45, and the third conductive film 43 is effective for preventing electric field concentration in the vicinity of the p type high concentration region 46. . The high resistance film 44 has a ninth horizontal region in which a smooth current distribution in the horizontal direction is generated along the high resistance film 44 when a current flowing between the second conductive film 42 and the third conductive film 43 via the high resistance film 44 is generated. 9 is electrostatically applied to the semiconductor region under the insulating film through the capacitance of the insulating film 41 on the upper surface 9, and the potential distribution in the depletion layer of the semiconductor region is smoothly stabilized in the horizontal direction. This is effective for obtaining a high breakdown voltage at the horizontal distance of the breakdown junction termination structure.

同図（ｂ）は、同図（ａ）の高耐圧接合終端構造の平面的な配置図を示し、同図（ａ）に一点鎖線で示した中心線を軸に同心円上の配置で、アノード電極Ａとカソード電極Ｋに挟まれた高耐圧接合終端構造ＨＶＪＴが円形のループで帯状に設けられている。この配置は小さい活性面積のデバイスに適する。
同図（ｃ）も、同図（ａ）の高耐圧接合終端構造ＨＶＪＴの平均的な配置の例であり、この場合大きい活性面積のデバイスに適するように櫛歯状に配置されたアノード電極Ａとカソード電極Ｋに挟まれた高耐圧接合終端構造ＨＶＪＴが、櫛歯の間をぬって曲がりくねった形のループで、帯状に設けられている。
尚、ループ状とは、帯状で、かつ円形や櫛歯形などの形状をした環状のものをいう。
図９は第９参考例の要部断面構造を示す。これは、従来から高耐圧ＩＣに用いられている接合分離の構造に本発明を適用したものである。図８（ａ）との違いは、第八領域８が第一領域１上へのエピタキシャル成長により形成された層であり、したがって、この第八領域８を他の部分から電気的に分離するための高濃度のｐ形の分離領域４７を設けている点である。その他の部分は図８（ａ）と全く同じであり同じ番号を付けている。エピタキシャル成長により形成された第八領域８は厚さが５〜１５μｍ程度でリンが１×１０15から１×１０16ｃｍ-3程度ドープされている。分離領域４７は、第八領域８のエピタキシャル成長後第九領域９の形成前に、例えばドーズ量が１×１０15ｃｍ-2のホウ素の選択的なイオン注入と１２００℃、２〜１０時間程度の熱拡散により形成する。第八領域８のエピタキシャル成長による形成と分離領域４７の形成に関する分、図８の実施例よりコストは高くなり、また分離領域４７の形成のために、高温の熱処理が必要となり、この高温の熱処理で発生するシリコン結晶内の欠陥による良品率の低下も多少招くが、接合分離という従来技術の上にそのまま適用できるという便利さがある。同図の平面的な配置は図８（ｂ）、（ｃ）と同様である。 FIG. 4B shows a plan layout of the high voltage junction termination structure of FIG. 4A, and shows a concentric arrangement with the center line indicated by a dashed line in FIG. A high withstand voltage junction termination structure HVJT sandwiched between the electrode A and the cathode electrode K is provided in a belt shape with a circular loop. This arrangement is suitable for small active area devices.
FIG. 8C is also an example of an average arrangement of the high voltage junction termination structure HVJT in FIG. 9A, and in this case, the anode electrode A arranged in a comb shape so as to be suitable for a device having a large active area. The high-voltage junction termination structure HVJT sandwiched between the cathode electrode K and the cathode electrode K is provided in a belt-like shape with a loop looped between the comb teeth.
The loop shape means a belt-like and annular shape having a circular shape or a comb shape.
FIG. 9 shows a cross-sectional structure of an essential part of the ninth reference example. This is an application of the present invention to a junction isolation structure conventionally used in high voltage ICs. The difference from FIG. 8A is a layer in which the eighth region 8 is formed by epitaxial growth on the first region 1, and therefore, the eighth region 8 is electrically isolated from other portions. A high concentration p-type isolation region 47 is provided. The other parts are the same as those in FIG. The eighth region 8 formed by epitaxial growth has a thickness of about 5 to 15 μm and is doped with phosphorus of about 1 × 10 15 to 1 × 10 16 cm −3 . The isolation region 47 is formed by selective ion implantation of boron having a dose of 1 × 10 15 cm −2 and 1200 ° C. for about 2 to 10 hours after the epitaxial growth of the eighth region 8 and before the formation of the ninth region 9. It is formed by thermal diffusion. The cost associated with the formation of the eighth region 8 by epitaxial growth and the formation of the isolation region 47 is higher than that of the embodiment of FIG. 8, and a high temperature heat treatment is required to form the isolation region 47. Although there is a slight decrease in the yield rate due to defects in the generated silicon crystal, there is the convenience that it can be applied as it is on the conventional technique of junction separation. The planar arrangement in the figure is the same as in FIGS. 8B and 8C.

図１０は第１０参考例の要部断面図を示す。第一領域１、第八領域８、第九領域９、フィールド絶縁膜１４、第九領域９上の絶縁膜４１（１４）、第二導電膜４２および第三導電膜４３、パッシベーション膜１９、および高抵抗膜４４（１９）は図８の参考例と同じである。本参考例が違う点は、高耐圧接合終端構造ＨＶＪＴを挟んで、一方の側にｎ形の高濃度領域５０（１２）を介して第八領域８と電気的に接続された第一のドレイン電極Ｄ１（この場合、第二の導電体４２と共通）を備え、他方の側に第九領域９と電気的につながったｐ形のベース領域４８と、このベース領域４８中に選択的に設けられた高濃度のｎ形のソース領域４９と、第八領域８とソース領域４９とに挟まれたベース領域４８表面のｎチャネル領域５２と、少なくともチャネル領域上に設けられた第一のゲート絶縁膜５１および第三のゲート電極Ｇ１と、少なくとも前記ｎ形のソース領域４９に電気的に接続された第一のソース電極Ｓ１（この場合第三導電膜４３と共通）とを備えたｎ形チャネル（この場合ｎチャネル）の高耐圧ＭＩＳトランジスタ（この場合ＭＯＳＦＥＴ）であることと、第三のゲート電極Ｇ１と第一のソース電極Ｓ１との間の電気的な絶縁を行うための層間絶縁膜１６を備え、これがさらに第九領域９上の絶縁膜４１（１６）としても用いられる点である。同図の平面的配置も、図中の一点鎖線のいずれかを中心にした図８（ｂ）のような同心円状の配置や、図中の一点鎖線での折り返しによる同図（ｃ）のような櫛歯状の配置など、いろいろな配置が可能である。   FIG. 10 shows a cross-sectional view of the main part of a tenth reference example. The first region 1, the eighth region 8, the ninth region 9, the field insulating film 14, the insulating film 41 (14) on the ninth region 9, the second conductive film 42 and the third conductive film 43, the passivation film 19, and The high resistance film 44 (19) is the same as the reference example of FIG. The difference between this reference example is that the first drain electrically connected to the eighth region 8 via the n-type high concentration region 50 (12) on one side with the high voltage junction termination structure HVJT interposed therebetween. A p-type base region 48 that includes an electrode D1 (in this case, common to the second conductor 42) and is electrically connected to the ninth region 9 on the other side, and is selectively provided in the base region 48 High-concentration n-type source region 49, n-channel region 52 on the surface of base region 48 sandwiched between eighth region 8 and source region 49, and a first gate insulation provided at least on the channel region An n-type channel comprising a film 51 and a third gate electrode G1, and at least a first source electrode S1 (in this case common to the third conductive film 43) electrically connected to the n-type source region 49 (In this case, n-channel) high voltage MIS It is a transistor (in this case, a MOSFET), and includes an interlayer insulating film 16 for electrical insulation between the third gate electrode G1 and the first source electrode S1, and this further includes an upper layer on the ninth region 9. It is also used as the insulating film 41 (16). The planar arrangement of the figure is also a concentric arrangement as shown in FIG. 8B centering on one of the dashed lines in the figure, or as shown in FIG. 8C by folding back along the dashed line in the figure. Various arrangements such as a comb-like arrangement are possible.

図１１は、第１１参考例の要部断面図を示す。第一領域１、第八領域８、第九領域９、フィールド絶縁膜１４、第九領域９上の絶縁膜４１（１４）、第二および第三の導電体４２および４３、パッシベーション膜１９、および高抵抗膜４４（１９）は図８の参考例と同じである。本参考例が違う点は、高耐圧接合終端構造ＨＶＪＴを挟んで、一方の側に第八領域８表面上に選択的に形成されたｐ形のソース領域５６（１１）と、第九領域９とｐ形のソース領域５６（１１）とに挟まれた第八領域８表面のｐ形チャネル領域５４と、少なくともｐ形チャネル領域５４上に形成された第二のゲート絶縁膜５３（１３）およびこのゲート絶縁膜５３（１３）上の第四のゲート電極Ｇ２と、少なくとも前記ｐ形のソース領域５６（１１）と電気的に接続された第二のソース電極Ｓ２とを備え、他方の側に第九領域９とｐ形の高濃度領域５５（１１）を介して電気的に接続した第二のドレイン電極Ｄ２とを備えていることである。
図１２は第１２参考例の要部断面図を示す。高耐圧接合終端構造ＨＶＪＴに囲まれ、ｎ形の第八領域８とｎ形の第二領域２とを同一拡散工程で同時に形成し、第二領域２の表面層に選択的に形成されたｐ形の第三領域３と、第二領域２の表面層に形成されたｐ形チャネルのＭＩＳトランジスタと、第三領域３の表面層に形成されたｎ形チャネルのＭＩＳトランジスタとを形成する。また第二領域２と第八領域８を連結して一体の領域を形成してもよい。これ以降の図の説明で第八領域の番号を８（２）としたのは第二領域と同一工程で第八領域を形成し得ることを示している。また同図の平面的な配置は、図６のＧＤＵ１がその例となる。 FIG. 11 is a cross-sectional view of a main part of an eleventh reference example. The first region 1, the eighth region 8, the ninth region 9, the field insulating film 14, the insulating film 41 (14) on the ninth region 9, the second and third conductors 42 and 43, the passivation film 19, and The high resistance film 44 (19) is the same as the reference example of FIG. The difference between this reference example is that a p-type source region 56 (11) selectively formed on the surface of the eighth region 8 on one side and the ninth region 9 across the high voltage junction termination structure HVJT. And a p-type channel region 54 on the surface of the eighth region 8 sandwiched between the p-type source region 56 (11), a second gate insulating film 53 (13) formed on at least the p-type channel region 54, and A fourth gate electrode G2 on the gate insulating film 53 (13) and a second source electrode S2 electrically connected to at least the p-type source region 56 (11) are provided on the other side. The ninth region 9 is provided with the second drain electrode D2 electrically connected through the p-type high concentration region 55 (11).
FIG. 12 shows a cross-sectional view of the main part of a twelfth reference example. P surrounded by the high withstand voltage junction termination structure HVJT, and the n-type eighth region 8 and the n-type second region 2 are simultaneously formed in the same diffusion step, and selectively formed on the surface layer of the second region 2 The third region 3 having a shape, the p-channel MIS transistor formed in the surface layer of the second region 2, and the n-channel MIS transistor formed in the surface layer of the third region 3 are formed. Further, the second region 2 and the eighth region 8 may be connected to form an integral region. In the explanation of the subsequent drawings, the number of the eighth area is set to 8 (2), which means that the eighth area can be formed in the same process as the second area. An example of the planar arrangement of FIG. 6 is GDU1 of FIG.

図１３は第１実施例の要部平面図を示す。図３８の従来例との相違点は第一の出力配線６１と第二の出力配線６２下の電界強度を弱めるために、ＧＤＵ１を取り囲む第一の高耐圧接合終端構造ＨＶＪＴ１と、ＧＤＵ１内およびＬＳＵ内に形成される横型ＭＯＳＦＥＴを取り囲む第二の高耐圧接合終端構造ＨＶＪＴ２とが同一構造の高耐圧接合終端構造ＨＶＪＴで構成され、かつ一体となっている点である。このように構成することで、第一の出力配線６１および第二の出力配線６２と、これらの出力配線の下の高耐圧接合終端構造ＨＶＪＴの電位差を他の高耐圧接合終端構造ＨＶＪＴより小さくできる。そのため、これらの出力配線６１、６２の電位が高耐圧接合終端構造部の半導体表面の電位分布に及ぼす影響を軽減し、耐圧低下を防止できる。図中の符号は図３８と同一であるので、その説明は省略する。第一の出力配線６１、第二の出力配線６２は図３８のＳＩＮ１とＳＯＵＴ１に対応する。Ｓ１、Ｓ２は第一、第二のソース電極を示し、Ｄ１、Ｄ２は第一、第二のドレイン電極を示す。
図１４は電位差の強弱を図１３の平面図に示した図である。出力配線６１、６２付近では電位差が小さく、その他の箇所では大きい。
図１５は第２実施例の要部断面図で、図１３のＡ−Ａ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。 FIG. 13 is a plan view of the main part of the first embodiment. The difference from the conventional example of FIG. 38 is that in order to weaken the electric field strength under the first output wiring 61 and the second output wiring 62, the first high-voltage junction termination structure HVJT1 surrounding GDU1, the GDU1 and the LSU The second high voltage junction termination structure HVJT2 surrounding the lateral MOSFET formed therein is composed of and integrated with the high voltage junction termination structure HVJT having the same structure. With this configuration, the potential difference between the first output wiring 61 and the second output wiring 62 and the high breakdown voltage junction termination structure HVJT below these output wirings can be made smaller than that of the other high breakdown voltage junction termination structures HVJT. . Therefore, the influence of the potentials of these output wirings 61 and 62 on the potential distribution on the semiconductor surface of the high breakdown voltage junction termination structure can be reduced, and the breakdown voltage can be prevented from lowering. The reference numerals in the figure are the same as those in FIG. The first output wiring 61 and the second output wiring 62 correspond to SIN1 and SOUT1 in FIG. S1 and S2 indicate first and second source electrodes, and D1 and D2 indicate first and second drain electrodes.
FIG. 14 is a diagram showing the strength of the potential difference in the plan view of FIG. The potential difference is small in the vicinity of the output wirings 61 and 62, and large in other portions.
FIG. 15 is a cross-sectional view of the main part of the second embodiment, showing a cross-sectional view of the main part and a potential distribution diagram of the cutting section along the line AA of FIG. 13. FIG. 15 (a) is a cross-sectional view of the main part. ) Is a potential distribution diagram.

図１６は第２実施例の要部断面図で、図１３のＢ−Ｂ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。
図１７は第２実施例の要部断面図で、図１３のＣ−Ｃ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。
図１５ないし図１７において、図１３で示す高耐圧接合終端構造ＨＶＪＴがＧＤＵ１用と高耐圧ｎチャネルＭＯＳＦＥＴ（ＨＶＮ）用と高耐圧ｐチャネルＭＯＳＦＥＴ（ＨＶＰ）用とがそれぞれ共用の一体構造とすることで、高耐圧ｎおよびｐチャネルＭＯＳＦＥＴ（高耐圧ＭＩＳトランジスタの一つ）のドレイン電極Ｄ１、Ｄ２のまわりの高耐圧接合終端構造ＨＶＪＴのうち、ソース電極Ｓ１、Ｓ２のある側に面している高耐圧接合終端構造ＨＶＪＴ部分には約４００Ｖ程度（図１５ではＤ１の左側、図１６ではＤ２の右側）の高い電圧が印加されるのに対し、反対側に面している高耐圧接合終端構造ＨＶＪＴ部分には１５Ｖ程度の微小な電圧（図１５ではＤ１の右側、図１６ではＤ２の左側、つまり第一、第二の出力配線６１、６２のある側）が印加される丈である。この僅かな電位差しかない高耐圧接合終端構造ＨＶＪＴを横切らせて、第一、第二の出力配線６１、６２を配置することで、半導体領域の電位分布に殆ど影響を与えず配線することができる。したがって耐圧低下を生じさせずに配線できる。 FIG. 16 is a cross-sectional view of the main part of the second embodiment, showing a cross-sectional view of the main part and a potential distribution diagram of the cutting section taken along line BB in FIG. 13. FIG. 16 (a) is a cross-sectional view of the main part. ) Is a potential distribution diagram.
FIG. 17 is a cross-sectional view of the main part of the second embodiment, showing a cross-sectional view of the main part and a potential distribution diagram of the section cut along the line CC in FIG. 13. FIG. 17 (a) is a cross-sectional view of the main part. ) Is a potential distribution diagram.
15 to 17, the high withstand voltage junction termination structure HVJT shown in FIG. 13 has a common integrated structure for GDU1, high withstand voltage n channel MOSFET (HVN), and high withstand voltage p channel MOSFET (HVP). In the high breakdown voltage junction termination structure HVJT around the drain electrodes D1 and D2 of the high breakdown voltage n and p channel MOSFET (one of the high breakdown voltage MIS transistors), the high facing the side where the source electrodes S1 and S2 are located. A high voltage of about 400 V (the left side of D1 in FIG. 15 and the right side of D2 in FIG. 16) is applied to the breakdown voltage junction termination structure HVJT, whereas the high breakdown voltage junction termination structure HVJT facing the opposite side is applied. A small voltage of about 15 V is applied to the portion (the right side of D1 in FIG. 15 and the left side of D2 in FIG. 16, that is, the first and second output wirings 61 and 62) Is a length of a side) is applied. By arranging the first and second output wirings 61 and 62 across the high withstand voltage junction termination structure HVJT having a slight potential difference, wiring can be performed with little influence on the potential distribution in the semiconductor region. . Therefore, wiring can be performed without causing a decrease in breakdown voltage.

図１８ないし図２０は第３実施例の要部断面図を示し、図１３のＡ−Ａ線、Ｂ−Ｂ線、Ｃ−Ｃ線の各切断部に相当する要部断面図を示す。これは第２実施例の変形例である。
図１８ないし図２０と図１５ないし図１７との違いは高電圧に曝される側の半導体領域にｎ形の高濃度領域５８を第一領域１と第二領域８（又は２）に跨がって埋め込み、さらにソース電極Ｓ１側である低電位側にｐ形の高濃度領域４７を第一領域１に接するように形成することでさらに前記の効果を高めている。
図２１は第４実施例の要部平面図を示す。図１３との違いは高耐圧接合終端構造ＨＶＪＴの平面的な配置のされ方であり、この実施例では第一、第二の出力配線６１、６２の近傍において、高耐圧接合終端構造ＨＶＪＴを設けていない点である。これは図１３〜図１７において説明したように、この領域には大きな電位差が発生しないので、必ずしも高耐圧接合終端構造ＨＶＪＴを設ける必要がない。
図２２ないし図２６は第４実施例の要部断面図と電位分布を示す。
図２２は図２１のＡ−Ａ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。図１５との違いは、第一の出力配線６１下の第九領域９がこの場合なくしてあり、第八領域８のみが設けられていることである。これは先に説明したように、この領域には大きな電位差が発生しないので高耐圧接合終端構造ＨＶＪＴを設ける必要がないためである。 18 to 20 are main part cross-sectional views of the third embodiment, and are main part cross-sectional views corresponding to the cut portions of the lines AA, BB, and CC in FIG. This is a modification of the second embodiment.
The difference between FIG. 18 to FIG. 20 and FIG. 15 to FIG. 17 is that the n-type high concentration region 58 is straddled between the first region 1 and the second region 8 (or 2) in the semiconductor region exposed to the high voltage. The above effect is further enhanced by forming the p-type high concentration region 47 in contact with the first region 1 on the low potential side which is the source electrode S1 side.
FIG. 21 shows a plan view of the main part of the fourth embodiment. The difference from FIG. 13 is how the high voltage junction termination structure HVJT is arranged in a plane. In this embodiment, the high voltage junction termination structure HVJT is provided in the vicinity of the first and second output wirings 61 and 62. That is not the point. As described with reference to FIGS. 13 to 17, since a large potential difference does not occur in this region, it is not always necessary to provide the high voltage junction termination structure HVJT.
FIGS. 22 to 26 are sectional views of main parts and potential distribution of the fourth embodiment.
22A and 22B show a cross-sectional view and a potential distribution diagram of the main part of the section cut along the line AA in FIG. 21, where FIG. The difference from FIG. 15 is that the ninth region 9 under the first output wiring 61 is eliminated in this case, and only the eighth region 8 is provided. This is because, as described above, since no large potential difference is generated in this region, it is not necessary to provide the high breakdown voltage junction termination structure HVJT.

図２３は図２１のＢ−Ｂ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。図１６との違いは、第二の出力配線６２下の第九領域９が設けられていないことであり、理由は図２２の場合と同じである。
図２４は図２１のＣ−Ｃ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。これらは図１７と同じであるので説明は省略する。
図２５は図２１のＸ−Ｘ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。第一の出力配線６１下には第九領域９が設けられていない。その理由は先に述べた通りで、この領域には大きな電位差が発生しないためである。
図２６は図２１のＹ−Ｙ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。第二の出力配線６２下には第九領域が設けられていない。その理由は先に述べた通りで、この領域には大きな電位差が発生しないためである。
図２７ないし図３１は第５実施例の要部断面図と電位分布図を示し、第４実施例の変形例である。 FIG. 23 is a cross-sectional view of the main part and a potential distribution diagram of the section cut along the line B-B in FIG. 21, where FIG. The difference from FIG. 16 is that the ninth region 9 under the second output wiring 62 is not provided, and the reason is the same as in FIG.
24A and 24B show a cross-sectional view and a potential distribution diagram of the main part of the section cut along the line C-C in FIG. 21, where FIG. Since these are the same as those in FIG.
FIG. 25 shows a cross-sectional view and a potential distribution diagram of the main part of the XX line cutting section of FIG. 21, wherein FIG. 25 (a) is a main part cross-sectional view, and FIG. The ninth region 9 is not provided under the first output wiring 61. The reason is as described above, because a large potential difference does not occur in this region.
26A and 26B show a cross-sectional view and a potential distribution diagram of the main part of the YY line cutting portion of FIG. 21, wherein FIG. 26A is a main-part cross-sectional view and FIG. The ninth region is not provided under the second output wiring 62. The reason is as described above, because a large potential difference does not occur in this region.
FIGS. 27 to 31 are sectional views and potential distribution diagrams of the main part of the fifth embodiment, which are modifications of the fourth embodiment.

図２７は図２１のＡ−Ａ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。図２２との違いは、第一の出力配線６１下の第九領域９および第八領域８の両方とも設けられていない部分があることである。この理由も先に述べたのと同じである。ただし、この実施例のように第八領域８、第九領域９の両領域がなく、第一領域１の表面が第一の出力配線６１下にある場合には、後に示す図３０で説明するような注意が必要である。
図２８は図２１のＢ−Ｂ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。図２３との違いは、第二の出力配線６２下に第九領域９および第八領域の両領域とも設けられていないことであり、その理由は図２７の場合と同じである。
図２９は図２１のＣ−Ｃ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。これらは図１７と同じであるので説明は省略する。
図３０は図２１のＸ−Ｘ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。第一の出力配線６１下には第九領域９および第八領域８の両領域とも設けられていない。その理由は先に述べた通りで、この領域には大きな電位差が発生しないためである。ただし、第八領域８に挟まれた第一領域１が半導体基板の表面に達する部分は電位的に安定にするため、第一の出力配線６１で完全に覆った方がよい。そうしない場合にはその部分で耐圧低下が生じる場合があるからである。 FIG. 27 shows a cross-sectional view of the main part and a potential distribution diagram of the section cut along the line AA in FIG. 21, wherein FIG. The difference from FIG. 22 is that there is a portion where neither the ninth region 9 nor the eighth region 8 under the first output wiring 61 is provided. The reason for this is the same as described above. However, when both the eighth region 8 and the ninth region 9 are not present as in this embodiment and the surface of the first region 1 is under the first output wiring 61, it will be described later with reference to FIG. Such attention is necessary.
FIG. 28 shows a cross-sectional view of the main part and a potential distribution diagram of the section cut along the line BB in FIG. 21, wherein FIG. The difference from FIG. 23 is that neither the ninth area 9 nor the eighth area is provided under the second output wiring 62, and the reason is the same as in FIG.
FIG. 29 shows a cross-sectional view of a main part and a potential distribution diagram of the section cut along the line CC in FIG. 21, wherein FIG. 29A is a cross-sectional view of the main part and FIG. Since these are the same as those in FIG.
FIG. 30 shows a cross-sectional view and a potential distribution diagram of the main part of the XX line cutting section of FIG. 21, wherein FIG. 30 (a) is a main part cross-sectional view, and FIG. Neither the ninth area 9 nor the eighth area 8 is provided under the first output wiring 61. The reason is as described above, because a large potential difference does not occur in this region. However, it is preferable to completely cover the portion where the first region 1 sandwiched between the eighth regions 8 reaches the surface of the semiconductor substrate with the first output wiring 61 in order to stabilize the potential. If this is not done, the breakdown voltage may drop in that portion.

図３１は図２１のＹ−Ｙ線切断部の要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図である。第二の出力配線６２下には第九領域および第八領域８の両領域とも設けられていない。その理由は先に述べた通りで、この領域には大きな電位差が発生しないためである。
図３２は第６実施例の要部平面図を示す。
この場合は高耐圧接合終端構造ＨＶＪＴは単なるループ状に設けられている。前記した図１３や図２１の場合は高耐圧接合終端構造ＨＶＪＴは平面的配置で凸凹形状に設けられていた。その理由は高耐圧ｎチャネルトランジスタＨＶＮのドレインＤ１とＧＤＵ１を形成する第二領域８（又は２）（例えば図１５）との距離および高耐圧ｐチャネルトランジスタＨＶＰのドレインＤ２とｐ形の高濃度領域５７（例えば図１９）との距離をそれぞれ大きくとることによって寄生的なもれ電流を小さくするためであった。
しかし図３２の場合は、高耐圧接合終端構造ＨＶＪＴが凸凹のない形状に設けられている。この場合は、図１３や図２１に比較して高耐圧接合終端構造の占める面積が小さくなるという利点がある。ただし、この場合は、前述した寄生的なもれ電流が大きくなり、高耐圧ＩＣの無効な消費電力の増大につながるデメリットも大きい。６００Ｖを越えるような高耐圧ＩＣの場合は図２１の実施例の方が適している。 FIG. 31 shows a cross-sectional view and a potential distribution diagram of the main part of the YY line cutting part of FIG. 21, wherein FIG. 31 (a) is a main part cross-sectional view and FIG. Neither the ninth area nor the eighth area 8 is provided under the second output wiring 62. The reason is as described above, because a large potential difference does not occur in this region.
FIG. 32 shows a plan view of the main part of the sixth embodiment.
In this case, the high voltage junction termination structure HVJT is provided in a simple loop shape. In the case of FIG. 13 and FIG. 21 described above, the high withstand voltage junction termination structure HVJT is provided in an uneven shape in a planar arrangement. The reason is that the distance between the drain D1 of the high breakdown voltage n-channel transistor HVN and the second region 8 (or 2) (for example, FIG. 15) forming the GDU1, and the drain D2 of the high breakdown voltage p-channel transistor HVP and the p-type high concentration region. This is to reduce the parasitic leakage current by increasing the distance from each of the terminals 57 (for example, FIG. 19).
However, in the case of FIG. 32, the high breakdown voltage junction termination structure HVJT is provided in a shape without irregularities. In this case, there is an advantage that the area occupied by the high-breakdown-voltage junction termination structure is smaller than in FIGS. However, in this case, the parasitic leakage current described above becomes large, and there is a great demerit that leads to an increase in invalid power consumption of the high voltage IC. In the case of a high voltage IC exceeding 600V, the embodiment of FIG. 21 is more suitable.

この発明の第１参考例の要部断面図Sectional view of the main part of the first reference example of the present invention この発明の第２参考例を示す要部構造図で、（ａ）はＧＤＵ１と高耐圧接合終端構造ＨＶＪＴに対応する部分の要部平面図で、（ｂ）は（ａ）のＸ−Ｘで切断した要部断面図FIG. 6 is a main part structure diagram showing a second reference example of the present invention, in which (a) is a main part plan view of a part corresponding to GDU1 and high voltage junction termination structure HVJT, and (b) is an XX in (a). Cutaway main part sectional view この発明の第３参考例を示す要部構造図で、（ａ）はゲート駆動回路ユニットを１チップ化したときの平面図、（ｂ）はその断面図、（ｃ）はゲート駆動回路ユニットとパワーデバイスとがヒートシンク上に形成された断面図FIG. 4 is a structural diagram of a main part showing a third reference example of the present invention, in which (a) is a plan view when the gate drive circuit unit is made into one chip, (b) is a sectional view thereof, and (c) is a gate drive circuit unit; Cross section of power device and heat sink この発明の第４参考例の要部構造図を示し、（ａ）はＧＤＵ１の部分だけを１チップに集積化した高耐圧ＩＣであるＧＤＵＩＣ１の平面図、（ｂ）はその断面図、（ｃ）はＧＤＵＩＣ１をパワーデバイスＱ１のエミッタ（もしくはソース）電極上に固着した断面図The principal part structure figure of the 4th reference example of this invention is shown, (a) is a top view of GDUIC1 which is high voltage | pressure-resistant IC which integrated only the part of GDU1 on 1 chip, (b) is the sectional drawing, (c) ) Is a cross-sectional view of GDUIC1 fixed on the emitter (or source) electrode of power device Q1. この発明の第５参考例の要部構造図を示し、（ａ）は平面図、（ｂ）は断面図The principal part structural drawing of the 5th reference example of this invention is shown, (a) is a top view, (b) is sectional drawing. この発明の第６参考例の要部平面図The principal part top view of the 6th reference example of this invention この発明の第７参考例の要部平面図The principal part top view of the 7th reference example of this invention この発明の第８参考例でダイオードに用いた場合の高耐圧接合終端構造図を示し、（ａ）は要部断面図、（ｂ）は平面図、（ｃ）は別の平面図The high voltage | pressure-resistant junction termination structure figure at the time of using for a diode in the 8th reference example of this invention is shown, (a) is principal part sectional drawing, (b) is a top view, (c) is another top view. この発明の第９参考例の要部断面構造図Cross-sectional structure diagram of relevant parts of a ninth reference example of the present invention この発明の第１０参考例の要部断面図Sectional view of essential parts of a tenth reference example of the invention この発明の第１１参考例の要部断面図Sectional view of essential parts of an eleventh reference example of the present invention この発明の第１２参考例の要部断面図Sectional view of the principal part of the twelfth reference example of the present invention この発明の第１実施例の要部平面図The principal part top view of 1st Example of this invention 図１３に電位差の強弱を示した図Fig. 13 shows the potential difference. この発明の第２実施例で図１３のＡ−Ａ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 13 is a cross-sectional view of a main part and a potential distribution diagram of the section cut along the line AA in FIG. 13 according to the second embodiment of the present invention. この発明の第２実施例で図１３のＢ−Ｂ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 13 is a cross-sectional view of a main part and a potential distribution diagram of the cutting section taken along the line BB in FIG. 13 in the second embodiment of the present invention. この発明の第２実施例で図１３のＣ−Ｃ線切断部に相当する要部断面図と電位分布図を示し、同図（ａ）は要部断面図、同図（ｂ）は電位分布図13 is a cross-sectional view of a main part corresponding to the section cut along the line CC in FIG. 13 and a potential distribution diagram according to the second embodiment of the present invention, where (a) is a cross-sectional view of the main part and (b) is a potential distribution. Figure この発明の第３実施例で図１３のＡ−Ａ線切断部に相当する要部断面図FIG. 13 is a cross-sectional view of the main part corresponding to the AA line cutting part of FIG. 13 in the third embodiment of the present invention. この発明の第３実施例で図１３のＢ−Ｂ線切断部に相当する要部断面図FIG. 13 is a cross-sectional view of an essential part corresponding to the cut line BB in FIG. 13 in the third embodiment of the present invention. この発明の第３実施例で図１３のＣ−Ｃ線切断部に相当する要部断面図FIG. 13 is a cross-sectional view of the main part corresponding to the section cut along the line CC in FIG. 13 in the third embodiment of the present invention. この発明の第４実施例の要部平面図The principal part top view of 4th Example of this invention この発明の第４実施例で図２１のＡ−Ａ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main part and a potential distribution diagram of an AA line cutting portion in FIG. 21 according to the fourth embodiment of the present invention. この発明の第４実施例で図２１のＢ−Ｂ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main part and a potential distribution diagram of the cutting section taken along the line BB in FIG. 21 according to the fourth embodiment of the present invention. この発明の第４実施例で図２１のＣ−Ｃ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of the main part and a potential distribution diagram of the section cut along the line CC in FIG. 21 according to the fourth embodiment of the present invention. この発明の第４実施例で図２１のＸ−Ｘ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of the main part and a potential distribution diagram of the section cut along the XX line in FIG. 21 in the fourth embodiment of the present invention, where FIG. この発明の第４実施例で図２１のＹ−Ｙ線切断部の要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main portion and a potential distribution diagram of the YY line cutting portion of FIG. 21 in the fourth embodiment of the present invention, where FIG. この発明の第５実施例で図２１のＡ−Ａ線切断部に相当する要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main part corresponding to the section cut along the line AA in FIG. 21 and a potential distribution diagram in the fifth embodiment of the present invention; この発明の第５実施例で図２１のＢ−Ｂ線切断部に相当する要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main part corresponding to the section cut along line BB in FIG. 21 and a potential distribution diagram according to the fifth embodiment of the present invention. この発明の第５実施例で図２１のＣ−Ｃ線切断部に相当する要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main part corresponding to the section cut along the line CC in FIG. 21 and a potential distribution diagram in the fifth embodiment of the present invention. この発明の第５実施例で図２１のＸ−Ｘ線切断部に相当する要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 shows an essential part sectional view and potential distribution diagram corresponding to the XX line cutting section of FIG. 21 in the fifth embodiment of the present invention, where (a) is a principal part sectional view and (b) is a potential distribution diagram. この発明の第５実施例で図２１のＹ−Ｙ線切断部に相当する要部断面図と電位分布図を示し、（ａ）は要部断面図、（ｂ）は電位分布図FIG. 21 is a cross-sectional view of a main portion corresponding to the YY line cutting portion of FIG. 21 and a potential distribution diagram according to the fifth embodiment of the present invention, in which FIG. この発明の第６実施例の要部平面図The principal part top view of 6th Example of this invention モータ制御用インバータのパワー部分を中心に説明する回路構成図Circuit configuration diagram focusing on the power part of the motor control inverter 図３３で用いられる高耐圧ＩＣの内部構成のブロック図Block diagram of the internal configuration of the high voltage IC used in FIG. 図３４のＧＤＵ１とＩＧＢＴＱ１のさらに詳細な接続図More detailed connection diagram between GDU1 and IGBTQ1 in FIG. 図３３と同一回路をインテリジェントパワーモジュールと呼ばれる製品を用いて構成した構成図Configuration diagram in which the same circuit as FIG. 33 is configured using a product called an intelligent power module 図３６のＩＧＢＴＱ１のまわりの回路を詳細に示した構成図Configuration diagram showing in detail the circuit around IGBT Q1 in FIG. 図３４に示した高耐圧ＩＣのチップの平面図Plan view of the chip of the high voltage IC shown in FIG.

符号の説明Explanation of symbols

１ 第一領域
２ 第二領域
３ 第三領域
４ 第四領域
５ 第五領域
６ 第六領域
７ 第一導電膜
８ 第八領域
９ 第九領域
１１ ｐ形の高濃度領域
１２ ｎ形の高濃度領域
１３ ゲート絶縁膜
１４ フィールド絶縁膜
１５ 多結晶シリコン膜
１６ 層間絶縁膜
１７ 第一金属膜
１８ 第二金属膜
１９ パッシベーション膜
３１ ベース領域
３２ エミッタ領域
３３ 金属板
３４ 絶縁板
３５ ヒートシンク
３６ ベース領域
３７ ソース領域
３８ ｎ+ バッファ層
３９ ｐ+ 基板
４０ ｎ形ドリフト領域
４１ 第九領域上の絶縁膜
４２ 第二導電膜
４３ 第三導電膜
４４ 高抵抗膜
４５ ｎ形の高濃度領域
４６ ｐ形の高濃度領域
４７ ｐ形の分離領域
４８ ベース領域
４９ ｎ形のソース領域
５０ ｎ形の高濃度領域
５１ 第一のドレイン電極
５２ ｎ形のチャネル領域
５３ 第二のゲート絶縁膜
５４ ｐ形のチャネル領域
５５ ｐ形の高濃度領域
５６ ｐ形のソース領域
５７ ｐ形の高濃度領域
５８ ｎ形の埋め込み領域
６１ 第一の出力配線
６２ 第二の出力配線
１０１ 空乏層
１０２ 空乏層端
１０４ 第一のｐｎ接合
１０５ 第四のｐｎ接合
１１１ 第二のｐｎ接合
１１２ 第三のｐｎ接合
１１３ 第二の空乏層
１１４ 第三の空乏層
１１５ 第九領域の表面
２０２ 第二領域（ＬＳＵ側）
２０５ 第五領域（ＬＳＵ側）
２１１ ｐ形の高濃度領域
ＨＶＩＣ 高耐圧ＩＣ
ＨＶＪＴ 高耐圧接合終端構造
ｎｃｈＭＯＳＦＥＴ ｎチャネルＭＯＳＦＥＴ
ｐｃｈＭＯＳＦＥＴ ｐチャネルＭＯＳＦＥＴ
ＶDD1 ドライブ電源
Ｓ ソース端子
Ｓ１ 第一のソース電極（端子）
Ｓ２ 第二のソース電極（端子）
Ｄ ドレイン端子
Ｄ１ 第一のドレイン電極（端子）
Ｄ２ 第二のドレイン電極（端子）
Ｇ ゲート端子
Ｇ１ 第三のゲート電極（端子）
Ｇ２ 第四のゲート電極（端子）
ＮＰＮ ｎｐｎトランジスタ
Ｅ エミッタ端子
Ｂ ベース端子
Ｃ コレクタ端子
ＶEE1 電源
Ｑ１ パワーデバイス（ＩＧＢＴ）
Ｑ２ パワーデバイス（ＩＧＢＴ）
Ｑ３ パワーデバイス（ＩＧＢＴ）
Ｑ４ パワーデバイス（ＩＧＢＴ）
Ｑ５ パワーデバイス（ＩＧＢＴ）
Ｑ６ パワーデバイス（ＩＧＢＴ）
Ｄ１ パワーデバイス（ダイオード）
Ｄ２ パワーデバイス（ダイオード）
Ｄ３ パワーデバイス（ダイオード）
Ｄ４ パワーデバイス（ダイオード）
Ｄ５ パワーデバイス（ダイオード）
Ｄ６ パワーデバイス（ダイオード）
Ｍｏ モータ
ＶCC 主電源
ＰＣ フォトカプラ
Ｉ／Ｏ 入出力端子
ＣＵ 制御回路
ＬＳＵ レベルシフト回路
ＧＤＵ１ ゲート駆動回路
ＧＤＵ２ ゲート駆動回路
ＧＤＵ３ ゲート駆動回路
ＧＤＵ４ ゲート駆動回路
ＧＤＵ５ ゲート駆動回路
ＧＤＵ６ ゲート駆動回路
ＳＩＮ 入力ライン
ＳＯＵＴ 出力ライン
ＶDDC 共通電源
ＶDDHC 共通電源の高電位側
ＶDDLC 共通電源の低電位側
ＶDD ドライブ電源
ＶDDH1 ドライブ電源の高電位側
ＶDDH2 ドライブ電源の高電位側
ＶDDH3 ドライブ電源の高電位側
ＶDDL1 ドライブ電源の低電位側
ＶDDL2 ドライブ電源の低電位側
ＶDDL3 ドライブ電源の低電位側
ＯＵＴ ゲート駆動端子
ＯＣ 電流検出端子
ＯＴ 温度検出端子
Ｍ 電流検出端子（ＩＧＢＴ側）
Ｔｅｍｐ 温度検出端子（温度検出素子側）
θ 温度検出素子
Ｋ カソード
Ａ アノード
Ｕ Ｕ相
ＨＶＮ 高耐圧ｎチャネルＭＯＳＦＥＴ
ＨＶＰ 高耐圧ｐチャネルＭＯＳＦＥＴ
ＤN ドレイン電極
ＤP ドレイン電極
1 First area
2 Second area
3 Third area
4 Fourth area
5 Fifth area
6 Sixth area
7 First conductive film
8 Eighth area
9 Ninth region 11 High concentration region of p-type 12 High concentration region of n-type 13 Gate insulating film 14 Field insulating film 15 Polycrystalline silicon film 16 Interlayer insulating film 17 First metal film 18 Second metal film 19 Passivation film 31 Base Region 32 emitter region 33 metal plate 34 insulating plate 35 heat sink 36 base region 37 source region 38 n + buffer layer 39 p + substrate 40 n-type drift region 41 insulating film on the ninth region 42 second conductive film 43 third conductive film 44 High-resistance film 45 n-type high-concentration region 46 p-type high-concentration region 47 p-type isolation region 48 base region 49 n-type source region 50 n-type high-concentration region 51 first drain electrode 52 n-type Channel region 53 second gate insulating film 54 p-type channel region 55 p-type high concentration region 56 p-type source region 57 p-type high concentration region 58 n-type buried region 61 first output wiring 62 second output wiring 101 depletion layer 102 depletion layer end 104 first pn junction 105 fourth pn junction 111 second pn junction 112 Third pn junction 113 Second depletion layer 114 Third depletion layer 115 Surface of ninth region 202 Second region (LSU side)
205 Fifth area (LSU side)
211 p-type high concentration region HVIC high voltage IC
HVJT High voltage junction termination structure nchMOSFET nchannel MOSFET
pchMOSFET pchannel MOSFET
V DD1 drive power supply
S source terminal S1 first source electrode (terminal)
S2 Second source electrode (terminal)
D Drain terminal D1 First drain electrode (terminal)
D2 Second drain electrode (terminal)
G Gate terminal G1 Third gate electrode (terminal)
G2 Fourth gate electrode (terminal)
NPN npn transistor
E Emitter terminal
B Base terminal
C Collector terminal V EE1 power supply Q1 Power device (IGBT)
Q2 Power device (IGBT)
Q3 Power device (IGBT)
Q4 Power device (IGBT)
Q5 Power device (IGBT)
Q6 Power device (IGBT)
D1 Power device (diode)
D2 Power device (diode)
D3 Power device (diode)
D4 Power device (diode)
D5 Power device (diode)
D6 Power device (diode)
Mo motor V CC Mains PC photocoupler I / O output terminal CU control circuit LSU level shift circuit GDU1 gate drive circuit GDU2 gate drive circuit GDU3 gate drive circuit GDU4 gate drive circuit GDU5 gate drive circuit GDU6 gate drive circuit SIN input line SOUT output line V DDC common power V DDHC high potential side V DDLC low potential side V DD drive power V DDH1 high potential side V ddH 2 high potential side V DDH3 high potential side of the drive power to the drive power to the drive power of the common power of the common power V DDL1 Drive power supply low potential side V DDL2 Drive power supply low potential side V DDL3 Drive power supply low potential side OUT Gate drive terminal OC Current detection terminal OT Temperature detection terminal
M Current detection terminal (IGBT side)
Temp Temperature detection terminal (temperature detection element side)
θ Temperature sensing element
K cathode
A anode
U U phase HVN High voltage n-channel MOSFET
HVP high voltage p-channel MOSFET
D N drain electrode D P drain electrode

Claims (2)

第二導電形の領域と該第二導電形の領域内にループ状に形成された第一導電形の領域とからなるｐｎ接合を有する高耐圧接合終端構造と、該高耐圧接合終端構造のループの内側に形成された少なくとも１つのＭＩＳトランジスタと、該高耐圧接合終端構造のループ上で前記第二導電形の領域が露出する部分に設けられた第一のドレイン電極,ループの外側に設けられた第一のゲート電極と第一のソース電極とを有する第二導電形チャネルの高耐圧ＭＩＳトランジスタとを備えたことを特徴とする高耐圧ＩＣ。 A high breakdown voltage junction termination structure having a pn junction comprising a second conductivity type region and a first conductivity type region formed in a loop shape in the second conductivity type region, and a loop of the high breakdown voltage junction termination structure At least one MIS transistor formed inside the first drain electrode, a first drain electrode provided in a portion where the region of the second conductivity type is exposed on the loop of the high voltage junction termination structure, and provided outside the loop A high breakdown voltage IC comprising a second breakdown channel high breakdown voltage MIS transistor having a first gate electrode and a first source electrode. 第二導電形の領域と該第二導電形の領域内にループ状に形成された第一導電形の領域とからなるｐｎ接合を有する高耐圧接合終端構造と、該高耐圧接合終端構造のループの内側に形成された少なくとも１つのＭＩＳトランジスタと、該高耐圧接合終端構造のループ内に設けられた第二のドレイン電極,ループの内側に設けられた第二のゲート電極と第二のソース電極とを有する第一導電形チャネルの高耐圧ＭＩＳトランジスタとを備えたことを特徴とする高耐圧ＩＣ。 A high breakdown voltage junction termination structure having a pn junction comprising a second conductivity type region and a first conductivity type region formed in a loop shape in the second conductivity type region, and a loop of the high breakdown voltage junction termination structure At least one MIS transistor formed inside the second drain electrode provided in the loop of the high voltage junction termination structure, a second gate electrode and a second source electrode provided inside the loop And a high breakdown voltage MIS transistor having a first conductivity type channel.
JP2007270332A 1995-04-12 2007-10-17 High voltage IC Expired - Lifetime JP4775357B2 (en)

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JP1995086601 1995-04-12
JP1995141469 1995-06-08
JP14146995 1995-06-08
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US5047358A (en) * 1989-03-17 1991-09-10 Delco Electronics Corporation Process for forming high and low voltage CMOS transistors on a single integrated circuit chip
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