JP4719246B2 - Crimp unit structure - Google Patents

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JP4719246B2
JP4719246B2 JP2008120504A JP2008120504A JP4719246B2 JP 4719246 B2 JP4719246 B2 JP 4719246B2 JP 2008120504 A JP2008120504 A JP 2008120504A JP 2008120504 A JP2008120504 A JP 2008120504A JP 4719246 B2 JP4719246 B2 JP 4719246B2
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crimping
phase
tool
unit structure
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JP2008199060A (en
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尚士 秋口
光芳 永野
規充 向江
茂也 坂口
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Panasonic Corp
Nippon Tungsten Co Ltd
Panasonic Holdings Corp
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Nippon Tungsten Co Ltd
Matsushita Electric Industrial Co Ltd
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Description

本発明は、ガラス基板電極端子とフレキシブル基板電極端子の接合や、ガラエポ基板電極端子とフレキシブル基板電極端子の接合に用いる圧着ユニット構造に関する。   The present invention relates to a pressure-bonding unit structure used for joining a glass substrate electrode terminal and a flexible substrate electrode terminal, and joining a glass epoxy substrate electrode terminal and a flexible substrate electrode terminal.

係る電極端子の接合に用いられる圧着ユニットを構成する圧着ツール材としては、下記の特許文献に記載されているように、ステンレススチールのような金属材料、超硬合金、アルミナ系セラミック材料が知られている。
特開平7−235563号公報 特開平11−145165号公報 特開2002−261121号公報
As described in the following patent documents, metal materials such as stainless steel, cemented carbides, and alumina-based ceramic materials are known as crimping tool materials constituting the crimping unit used for joining the electrode terminals. ing.
JP 7-235563 A JP-A-11-145165 JP 2002-261121 A

近年、その接合する電極端子の形成ピッチが小さくなる傾向にあり、より低コストで、高精度、高信頼性の接合が求められるようになった。そのためには、被圧着材を両面から挟み込む圧着ユニットの圧着面の平行平面度を正確に維持する必要がある。   In recent years, the formation pitch of the electrode terminals to be joined tends to be reduced, and high-precision and high-reliability joining is required at a lower cost. For this purpose, it is necessary to accurately maintain the parallel flatness of the crimping surface of the crimping unit that sandwiches the material to be crimped from both sides.

ところが、上記従来の圧着ツール材は、熱膨張係数や、熱伝導係数の関係から、2つのツールの圧着面の平行平面度を正確に保持するのが難しく、また、接合時のツール内の温度のばらつきが大きく、接着材の硬化性にばらつきが発生したり、フレキシブル基板の伸び等の変形が不均一となる傾向がある。そのため、電極端子同士の接合不良が発生する可能性が高く、また、低コスト、高精度、高信頼性を十分に満足できないことがあった。   However, it is difficult for the above-mentioned conventional crimping tool materials to accurately maintain the parallel flatness of the crimping surfaces of the two tools due to the relationship between the thermal expansion coefficient and the thermal conductivity coefficient, and the temperature in the tool at the time of joining. There is a tendency that the variation of the adhesive material is uneven, the variation in the curability of the adhesive material, and the deformation such as the elongation of the flexible substrate become non-uniform. For this reason, there is a high possibility that bonding failure between the electrode terminals occurs, and the low cost, high accuracy, and high reliability may not be sufficiently satisfied.

本発明が解決しようとする課題は、圧着面の平行平面度を正確に保持するのができ、接合不良の発生がなく、低コストで、高精度、高信頼性を十分に満足でき、とくに、ガラス基板と接着材とFPC基板である被圧着材に好適に適用できる圧着ユニット構造を提供することにある。   The problem to be solved by the present invention is that the parallel flatness of the crimping surface can be accurately maintained, there is no occurrence of poor bonding, low cost, high accuracy, and high reliability can be sufficiently satisfied. An object of the present invention is to provide a pressure bonding unit structure that can be suitably applied to a material to be bonded which is a glass substrate, an adhesive, and an FPC substrate.

本発明の圧着ユニット構造は、 被圧着材を挟んで上下に配置した2つの圧着ツールと、その2つの圧着ツールの圧着面を平行に保持する上下の保持部とを備え、上の保持部のみに、カートリッジ型の加熱ヒータを保持部の中心に対して左右に均等に偶数個配置し、 前記カートリッジ型の加熱ヒータの有効長さは、前記保持部へ差し込まれる前記カートリッジ型ヒータの奥行き長さの±20%の範囲であり、前記圧着ツールが、Siを50体積%以上含有するSi基セラミック材からなり、このSi基セラミック材は、α−Si相とβ−Si相の2相の結晶をもち、2相に占めるα−Si相の割合が体積%で12以上39.8以下であり、前記α−Siが、Siの一部がY,Mg,OあるいはAlによって置換されたものであり、β−Si3N4相は、Siの一部がOあるいはAlによって置換されたものであり、且つ、前記Si 基セラミック材は、圧着面は平行度5μm以下、平面度2μm以下に加工して使用することによって圧着面の平行平面度を正確に維持することができる。 The crimping unit structure of the present invention includes two crimping tools arranged vertically with a material to be crimped interposed therebetween, and upper and lower holding parts that hold the crimping surfaces of the two crimping tools in parallel, and only the upper holding part. In addition, an even number of cartridge-type heaters are arranged evenly on the left and right with respect to the center of the holding portion, and the effective length of the cartridge-type heater is the depth length of the cartridge-type heater inserted into the holding portion. in the range of ± 20% of the crimping tool, Si 3 N 4 and consists Si 3 N 4 group ceramic material containing more than 50 vol%, the Si 3 N 4 group ceramic material, alpha-Si 3 N 4 phase and β-Si 3 N 4 phase crystals, and the proportion of α-Si 3 N 4 phase in the two phases is 12 % or more and 39.8 or less by volume%, and the α-Si 3 N 4, some the Si 3 N 4 is Y, g, has been replaced by O, or Al, the beta-Si3 N4 phase state, and are not part the Si 3 N 4 is replaced by O or Al, and the Si 3 N 4 group ceramic material In addition, the parallel flatness of the pressure-bonding surface can be accurately maintained by processing the pressure-bonding surface to have a parallelism of 5 μm or less and a flatness of 2 μm or less .

前記被圧着材を挟んで上下に配置した2つの圧着ツール材としては、Siを50体積%以上含有し、α−Si相とβ−Si相の2相の結晶をもち、2相に占めるα−Si相の割合が体積%で5以上50以下であるSi基セラミック材を用いることによって、圧着ユニット構造と相俟って被圧着材を両面から挟み込む圧着面の平行平面度をさらに正確に維持することができる。 As the two crimping tool member disposed vertically across the sheath pressing member, the Si 3 N 4 containing 50% by volume or more, of α-Si 3 N 4 phase and β-Si 3 N 4 phase 2 phase By using a Si 3 N 4 based ceramic material having a crystal and a ratio of α-Si 3 N 4 phase occupying 2 phases in a volume% of 5 or more and 50 or less, a material to be bonded in combination with the pressure bonding unit structure It is possible to more accurately maintain the parallel flatness of the pressure-bonding surface that sandwiches from both sides.

Siは、熱膨張係数が従来の金属材料、超硬合金、アルミナ系セラミック材料のような加熱圧着ツール材と比較して数分の一と小さいため、室温から高温まで優れた平面精度が維持でき、高精度、低コスト、高信頼性の接合が可能な加熱圧着ツール材として使用できる。そして、加熱圧着ツール材として、所望の強靭性、熱膨張係数を確保するためには、Siを50体積%以上含有するSi基セラミック材とすることが必須である。 Si 3 N 4 has a coefficient of thermal expansion that is a fraction of that of conventional metal tools, cemented carbide, and alumina-based ceramic materials, so it has excellent plane accuracy from room temperature to high temperatures. Can be maintained, and can be used as a thermocompression bonding tool material that can be bonded with high accuracy, low cost, and high reliability. Then, the thermocompression bonding tool material, in order to ensure desired toughness, thermal expansion coefficient, it is essential that the Si 3 N 4 group ceramic material containing Si 3 N 4 50% by volume or more.

また、このSi基セラミック材は、α−Si相とβ−Si相の2相の結晶をもち、2相に占めるα−Si相の割合が体積%で5以上50以下である必要がある。 Further, this Si 3 N 4 base ceramic material has two-phase crystals of α-Si 3 N 4 phase and β-Si 3 N 4 phase, and the proportion of α-Si 3 N 4 phase in the two phases is volume. % Needs to be 5 or more and 50 or less.

α−Si相は、Siの一部がY,Mg,O,Alによって置換されたものであり、β−Si相は、Siの一部がO,Alで置換されたものである。このα−Si相とβ−Si相の2相の結晶をもつセラミック材は、α−Si相とβ−Si相のいずれかの単独相からなるセラミックス材より、結晶組織が微細で、曲げ強度が高く、気孔率が0.5%以下と少ないため、優れた平面度、面粗度をもつ加熱圧着面が得られる。 In the α-Si 3 N 4 phase, a part of Si 3 N 4 is substituted with Y, Mg, O, and Al, and in the β-Si 3 N 4 phase, a part of Si 3 N 4 is O. , Al. The α-Si 3 N 4 phase and β-Si 3 N 4 phase ceramic material having a two-phase crystals consists either alone phase of α-Si 3 N 4 phase and β-Si 3 N 4 phase Since the crystal structure is finer than the ceramic material, the bending strength is high, and the porosity is as low as 0.5% or less, a thermocompression bonding surface having excellent flatness and surface roughness can be obtained.

本発明の圧着ツール材を使用した圧着ユニット構造を使用しての接合は、高精度の接合が可能で、接合不良の発生がなく、かつ、低コスト、高信頼性を十分に満足できるものである。   Joining using the crimping unit structure using the crimping tool material of the present invention is capable of highly accurate joining, does not cause joining failure, and can sufficiently satisfy low cost and high reliability. is there.

以下、本発明の実施の形態を実施例によって説明する。   Hereinafter, embodiments of the present invention will be described by way of examples.

図2は、本発明の圧着ユニット構造10の例を示す。同図において、1、2は上下それぞれのユニット基材を、また、3、4は上下それぞれのツール押さえを示す。上下の圧着ツール7、8は、それぞれ、ユニット基材1、2に、ツール押さえ3、4で挟まれ、ネジ5,6によってネジ止めされている。9は、上の圧着ツール7が保持されているユニット基材1の上部のみに配置されているヒーターを示す。上の圧着ツール7は本発明による圧着ツール材を用いるが、下の圧着ツール8としては、本発明による圧着ツール材の使用が好ましい。また、ヒータ9としては、カートリッジ型ヒーターが好ましいが、特にこれに限定されない。ヒーターの有効長さは、差し込まれるユニット基材1の長さの±20%の範囲内であるのが好ましい。20%よりも長いと、ヒーターが断線する可能性があり、20%以下であると、加熱のための熱容量が不足する。圧着の際に、上下のユニット基材1,2を駆動する手段としては、シリンダーによる駆動や、モーターによる駆動、あるいは、その両方を会わせた駆動が採用可能である。   FIG. 2 shows an example of the crimping unit structure 10 of the present invention. In the same figure, 1 and 2 show the unit base material of each of upper and lower sides, and 3 and 4 show the tool presser of each of the upper and lower sides. The upper and lower crimping tools 7, 8 are sandwiched between the unit bases 1, 2 by the tool holders 3, 4, and are fixed by screws 5, 6. Reference numeral 9 denotes a heater arranged only on the upper part of the unit base 1 on which the upper crimping tool 7 is held. The upper crimping tool 7 uses the crimping tool material according to the present invention, but the lower crimping tool 8 preferably uses the crimping tool material according to the present invention. The heater 9 is preferably a cartridge type heater, but is not particularly limited thereto. The effective length of the heater is preferably within a range of ± 20% of the length of the unit base 1 to be inserted. If it is longer than 20%, the heater may be disconnected, and if it is 20% or less, the heat capacity for heating is insufficient. As a means for driving the upper and lower unit bases 1 and 2 at the time of pressure bonding, driving by a cylinder, driving by a motor, or driving in which both are combined can be employed.

図2は、図1に示す圧着ユニット構造10におけるヒーター9の配置を側面から見た図を示すもので、上の圧着ツール7が保持されているユニット基材1の上部のみに配置されているヒーター9は、図2に示す上のユニット基材1の中心に対して、左右に均等に、偶数個配置されている。   FIG. 2 is a side view of the arrangement of the heater 9 in the crimping unit structure 10 shown in FIG. 1 and is disposed only on the upper portion of the unit base 1 on which the upper crimping tool 7 is held. An even number of heaters 9 are arranged equally on the left and right with respect to the center of the upper unit base 1 shown in FIG.

上下の圧着ツール7、8は、以下の要領で調製した。   The upper and lower crimping tools 7 and 8 were prepared as follows.

主成分として、α−Si相とβ−Si相を所定の割合で含む平均粒子径が0.5ミクロンのSi粉末と、焼結助剤として平均粒子径1.0ミクロン以下のY、AlN、MgO、TiNなどの粉末を添加し、メタノール溶媒中で純度が99.5%以上のZrO製ボールを入れたゴムライニングポット中で20時間分散混合を行った。得られたスラリーを取り出した後、アルコール系のバインダーを添加して、クローズドスプレードライヤーによって窒素雰囲気中で造粒混合を行った。得られた造粒粉を金型プレスによって4×5×45mmの曲げ試験片、Φ20×3tmmの熱伝導率測定用試料を作製し、脱脂の後、窒素ガス中、2023K〜2123Kの温度域で普通焼結を行った。また、焼結試料の一部を、1923K〜2023Kの温度域で窒素ガスを用いたHIP処理を行った。 As main components, an Si 3 N 4 powder containing an α-Si 3 N 4 phase and a β-Si 3 N 4 phase at a predetermined ratio and having an average particle size of 0.5 microns, and an average particle size of 1 as a sintering aid Disperse and mix for 20 hours in a rubber lining pot containing ZrO 2 balls with a purity of 99.5% or more in a methanol solvent by adding powder of Y 2 O 3 , AlN, MgO, TiN, etc. Went. After the obtained slurry was taken out, an alcohol-based binder was added and granulated and mixed in a nitrogen atmosphere with a closed spray dryer. A 4 × 5 × 45 mm bending test piece and Φ20 × 3 tmm thermal conductivity measurement sample are prepared from the obtained granulated powder by a die press, and after degreasing, in a nitrogen gas in a temperature range of 2023K to 2123K. Normal sintering was performed. A part of the sintered sample was subjected to HIP treatment using nitrogen gas in the temperature range of 1923K to 2023K.

図3は、得られた本発明に係る試料の各温度における熱膨張係数の変化を、Al−TiCとSKD−60と対比して示す。同図に示されているように、本発明に係るSi基セラミック材は、熱膨張率の温度変化がSKD−60の1/5以下、Al−TiCセラミックスの1/3以下であって、しかも温度変化に対する影響を受けにくいことを示している。これは室温での高い精度が高温でも維持されることを意味する。 FIG. 3 shows the change of the thermal expansion coefficient at each temperature of the obtained sample according to the present invention in comparison with Al 2 O 3 —TiC and SKD-60. As shown in the figure, the Si 3 N 4 based ceramic material according to the present invention has a temperature change of the thermal expansion coefficient of 1/5 or less of SKD-60, and 1/3 of Al 2 O 3 —TiC ceramics. It is shown below, and it is difficult to be affected by temperature change. This means that high accuracy at room temperature is maintained even at high temperatures.

表1は、試料No.1〜13に示す各組成のものを本発明に係る圧着ユニット構造の圧着ツールとしての特性を評価したものである。同表において、試料No.1〜5は本発明の実施例を、また、No.6〜13は比較例としてSUS304、SKD61の金属製、WC−Co超硬合金、Al、Al−TiC、ZrOのセラミックスなどの材料と比較したものである。 Table 1 shows Sample No. The characteristics as the crimping tool of the crimping unit structure according to the present invention were evaluated for each of the compositions shown in 1-13. In the same table, sample No. Nos. 1 to 5 are examples of the present invention. 6-13 shows a comparison as a comparative example SUS304, SKD61 made of a metal, WC-Co cemented carbide, Al 2 O 3, Al 2 O 3 -TiC, the materials such as ZrO 2 ceramic.

本発明に係る圧着ツール材は、上記の調製法に準じて作成し、図1と図2に示す圧着ユニット構造の圧着ツールに合わせた形状に研削加工した。圧着ツール材の圧着面は平面度2μm以下に加工し、実機による評価を行ったものである。それぞれの評価結果を表1に示す。   The crimping tool material according to the present invention was prepared according to the above-described preparation method, and was ground into a shape suitable for the crimping tool having the crimping unit structure shown in FIGS. The crimping surface of the crimping tool material is processed to have a flatness of 2 μm or less and evaluated by an actual machine. Each evaluation result is shown in Table 1.

Figure 0004719246
Figure 0004719246

平面度と熱膨張率
圧着ツールの使用温度は、通常423〜673Kであるため、室温で加工する圧着使用面は使用温度で熱膨張による変形がある。その変形は転写される圧着面の平面度の劣化を意味するため、室温から高温にかけて平面度の変化は可能な限り少ないことが必要となる。本発明の圧着ツールの273〜1273Kの間の平均熱膨張率は、3.2〜3.5×10−6/Kで、比較例の場合と対比して極めて小さいものであった。
Flatness and coefficient of thermal expansion Since the working temperature of the crimping tool is usually 423 to 673K, the crimping working surface processed at room temperature is deformed due to thermal expansion at the working temperature. The deformation means deterioration of the flatness of the pressure-bonding surface to be transferred, so that the change in flatness from room temperature to high temperature needs to be as small as possible. The average coefficient of thermal expansion between 273 and 1273 K of the crimping tool of the present invention was 3.2 to 3.5 × 10 −6 / K, which was extremely small as compared with the comparative example.

圧着ツールは圧力を伝達して被処理物を接着するものであるため、圧力に対する抵抗性が高くなければならない。すなわち、どのような形状の圧力面であっても破損することが許されない用途である。そこで、JIS曲げ試験片の測定面(底面)中央部に2Rのノッチ(溝)を加工して曲げ強度の低下を測定した。その結果、強度が高い材料が有利ではあるが、セラミックスの中ではNo.1からNo.5までのSi系材料やZrO系材料の低下は小さい。本発明のSi系材料の中でも、α−Si相が多い材料やβ−Si相の単独相からなるSiセラミックスよりも気孔が少なく曲げ強度が高いα−β相複合型のSiセラミック材料のほうが、より強度低下が少ないことが認められ、より好ましい特性であることがわかった。 Since the crimping tool transmits pressure and adheres an object to be processed, it must have high resistance to pressure. That is, it is an application in which any shape of the pressure surface is not allowed to break. Accordingly, a 2R notch (groove) was machined in the center of the measurement surface (bottom surface) of the JIS bending test piece to measure the decrease in bending strength. As a result, a material having high strength is advantageous, but the degradation of Si 3 N 4 -based materials and ZrO 2 -based materials from No. 1 to No. 5 is small among ceramics. Among the Si 3 N 4 -based materials of the present invention, α has a lower bending strength and higher bending strength than a material having many α-Si 3 N 4 phases or Si 3 N 4 ceramics composed of a single phase of β-Si 3 N 4 phase. It was found that the -β phase composite type Si 3 N 4 ceramic material is less preferable in strength reduction and has more preferable characteristics.

表1の試料No.6は、分散強化を目的にSiCを55重量%(換算で55体積%)添加したものであるが、緻密性が十分ではなく、低強度で面粗度が荒れるなど、使用に耐えない状態であった。このことから、Si成分としては50体積%以上であることが好ましいといえる。 Sample No. in Table 1 No. 6 is the addition of SiC by 55 wt% (55 vol% in terms of conversion) for the purpose of dispersion strengthening. However, the denseness is not sufficient, the strength is low, the surface roughness is rough, and the like cannot be used. there were. Therefore, the Si 3 N 4 component can be said that preferably at least 50% by volume.

圧力ツールは加熱圧着するときに大気雰囲気で423〜673Kの高温にさらされるため、酸化の問題がある。酸化はツール成分の酸化による酸化物生成、酸化による昇華など、変質によって表面に与えるダメージが大きいので、平面度や面粗度の劣化を引き起こす。表1に示されるように、比較のAl、ZrO以外は酸化され易く、本発明のSiセラミックスが最も良い結果を示した。 Since the pressure tool is exposed to a high temperature of 423 to 673 K in an air atmosphere when thermocompression bonding is performed, there is a problem of oxidation. Oxidation causes damage to the surface due to alteration such as oxide generation due to oxidation of tool components and sublimation due to oxidation, which causes deterioration of flatness and surface roughness. As shown in Table 1, other than comparative Al 2 O 3 and ZrO 2 were easily oxidized, and the Si 3 N 4 ceramic of the present invention showed the best results.

本発明のSi基セラミックス焼結体を作成し、図1と図2に示す圧着ユニット構造に合わせた形状に研削加工して圧着ツールを作成した。使用する圧着面は平行度5μm以下、平面度2μm以下に加工し、実機による評価を行った。 A Si 3 N 4 based ceramic sintered body according to the present invention was prepared and ground into a shape matching the crimp unit structure shown in FIGS. 1 and 2 to produce a crimp tool. The pressure-bonding surface to be used was processed to have a parallelism of 5 μm or less and a flatness of 2 μm or less, and evaluated with an actual machine.

図1に示すヒーター9(カートリッジ型、直径8mm、有効長さ35mm)を上のユニット基材1に4本配置したものを用い、圧着ツール7,8(長さ100mm、幅4mm、高さ15mm)として研削加工した表1の組成No.1のSi基セラミックスを上下のユニット基材1,2に、ツール押さえ3,4にてネジ止めし、所定の位置にFPCが接着剤シートにより仮止めされたガラス基板の圧着位置を、前記圧着ツール7,8間に配置して、453K、3.92MPa、20秒の条件にて、加圧加熱して硬化した。 Using four heaters 9 (cartridge type, diameter 8 mm, effective length 35 mm) shown in FIG. 1 arranged on the unit base 1 above, crimping tools 7 and 8 (length 100 mm, width 4 mm, height 15 mm) The composition No. in Table 1 was ground as 1 Si 3 N 4 base ceramics are screwed to the upper and lower unit bases 1 and 2 with the tool holders 3 and 4, and the crimping position of the glass substrate on which the FPC is temporarily fixed by the adhesive sheet is set at a predetermined position. These were placed between the crimping tools 7 and 8 and cured by pressurizing and heating under the conditions of 453K, 3.92 MPa and 20 seconds.

比較例として、上の圧着ツールに従来使用してきたAl−TiCセラミックスを用いて評価した。実施例と比較例のサンプルをn=10個ずつ作製し、室温358K、湿度65%の条件で2000時間使用した場合、本発明の圧着ユニット構造による接合不良の発生率は0であったのに対し、比較例の場合は20であった。また、453K、3.92MPaの条件で20秒保持後室温まで冷却する加圧加熱急冷却のサイクルを590サイクル繰り返した場合、本発明の圧着ユニット構造による接合不良の発生率は0であったのに対し、比較例の場合は30であった。 As a comparative example, evaluation was performed using Al 2 O 3 —TiC ceramics conventionally used for the above crimping tool. When n = 10 samples of Examples and Comparative Examples were prepared and used for 2000 hours under conditions of room temperature of 358K and humidity of 65%, the incidence of joint failure due to the crimping unit structure of the present invention was 0. On the other hand, it was 20 in the comparative example. In addition, when the pressure heating and rapid cooling cycle of cooling to room temperature after holding for 20 seconds under the condition of 453K and 3.92 MPa was repeated 590 cycles, the incidence of bonding failure due to the crimping unit structure of the present invention was 0. On the other hand, in the case of the comparative example, it was 30.

本発明の圧着ユニット構造の例を示す。The example of the crimping unit structure of this invention is shown. 図1に示す圧着ユニット構造におけるヒーターの配置を側面から見た図である。It is the figure which looked at the arrangement | positioning of the heater in the crimping | compression-bonding unit structure shown in FIG. 1 from the side surface. 本発明に係る圧着ツール材の熱膨張率を示す図である。It is a figure which shows the thermal expansion coefficient of the crimping | compression-bonding tool material which concerns on this invention.

符号の説明Explanation of symbols

1、2:ユニット基材
3、4:ツール押さえ
5、6:ネジ
7、8:圧着ツール
9:ヒーター
10:圧着ユニット構造
1, 2: Unit base material 3, 4: Tool holder 5, 6: Screw 7, 8: Crimping tool 9: Heater 10: Crimp unit structure

Claims (1)

被圧着材を挟んで上下に配置した2つの圧着ツールと、その2つの圧着ツールの圧着面を平行に保持する上下の保持部とを備え、
上の保持部のみに、カートリッジ型の加熱ヒータを保持部の中心に対して左右に均等に偶数個配置し、
前記カートリッジ型の加熱ヒータの有効長さは、前記保持部へ差し込まれる前記カートリッジ型ヒータの奥行き長さの±20%の範囲であり、
前記圧着ツールが、Siを50体積%以上含有するSi基セラミック材からなり、
このSi基セラミック材は、α−Si相とβ−Si相の2相の結晶をもち、2相に占めるα−Si相の割合が体積%で12以上39.8以下であり、
前記α−Siが、Siの一部がY,Mg,OあるいはAlによって置換されたものであり、
β−Si相は、Siの一部がOあるいはAlによって置換されたものであり、
且つ、
前記Si 基セラミック材は、圧着面は平行度5μm以下、平面度2μm以下に加工して使用する
圧着ユニット構造。
Two crimping tools arranged up and down across the material to be crimped, and an upper and lower holding part that holds the crimping surfaces of the two crimping tools in parallel,
An even number of heaters of the cartridge type are arranged evenly on the left and right with respect to the center of the holding part only on the upper holding part,
The effective length of the cartridge-type heater is in a range of ± 20% of the depth length of the cartridge-type heater inserted into the holding portion,
The crimping tool, becomes a Si 3 N 4 from Si 3 N 4 group ceramic material containing 50% by volume or more,
This Si 3 N 4 based ceramic material has two-phase crystals of α-Si 3 N 4 phase and β-Si 3 N 4 phase, and the proportion of α-Si 3 N 4 phase in the two phases is volume%. 12 or more and 39.8 or less ,
The α-Si 3 N 4 is a part of Si 3 N 4 substituted with Y, Mg, O or Al,
β-Si 3 N 4 phase state, and are not part the Si 3 N 4 is replaced by O or Al,
and,
The Si 3 N 4 based ceramic material has a pressure bonding unit structure in which the pressure bonding surface is processed to have a parallelism of 5 μm or less and a flatness of 2 μm or less .
JP2008120504A 2008-05-02 2008-05-02 Crimp unit structure Expired - Fee Related JP4719246B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01316702A (en) * 1988-06-16 1989-12-21 Mitsubishi Rayon Co Ltd Production of lens sheet
JPH07288267A (en) * 1994-04-18 1995-10-31 Toshiba Corp Outer lead bonding equipment
JPH09162206A (en) * 1995-12-06 1997-06-20 Hitachi Ltd Semiconductor manufacturing device
JPH1150016A (en) * 1997-07-30 1999-02-23 Seiko Epson Corp Application of adhesive tape and device therefor
JPH1165473A (en) * 1997-08-26 1999-03-05 Fujitsu Ltd Connecting method for signal cable of flat display device
JPH1174318A (en) * 1997-08-28 1999-03-16 Matsushita Electric Ind Co Ltd Device and method of mounting of electronic part
JP2000012629A (en) * 1998-06-22 2000-01-14 Sony Chem Corp Thermocompression bonding head and device using the same
JP2000277893A (en) * 1999-03-23 2000-10-06 Seiko Epson Corp Head for thermocompression bonding, and thermocompression bonding apparatus provided with the same
JP2002016106A (en) * 2000-06-29 2002-01-18 Shibaura Mechatronics Corp Electronic component pressing device
JP2002217241A (en) * 2001-01-16 2002-08-02 Murata Mfg Co Ltd Heating stage
JP2002246422A (en) * 2001-02-16 2002-08-30 Shibaura Mechatronics Corp Electronic component pressure bonder and electronic component bonding method
JP2003201180A (en) * 2001-12-28 2003-07-15 Nippon Tungsten Co Ltd Si3N4 BASED CERAMIC MEMBER FOR PRESS ATTACHING UNDER HEATING

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