JP4691585B2 - Detoxification facility for organic halogen contaminants and detoxification method for organic halogen contaminants - Google Patents

Description

  The present invention relates to an organic halogen contaminant detoxification treatment facility and an organic halogen contaminant detoxification treatment method for detoxifying a contaminant contaminated with an organic halogen compound.

Organohalogen compounds usually cause many health damages to the human body. For example, polychlorinated biphenyl (hereinafter also referred to as “PCB”), dioxins and the like are known to cause serious health damage.
For this reason, detoxification treatment of contaminants contaminated with organic halogen compounds (hereinafter also simply referred to as “contaminants”) has been widely performed.

In order to ensure the safety of workers, the detoxification treatment of contaminants contaminated with these organic halogen compounds can be done by exposure to gas containing organic halogen compounds or scattering of liquids containing organic halogen compounds. It is implemented by forming a space in a closed room that is not normally accessible to workers.
For example, paragraph [0028] of Patent Document 1 below describes that an operator operates a device in a shielding room through a transparent board to perform a detoxification process of contaminants.

If the shielding room exposed to the gas containing the organic halogen compound is a large-scale one, the maintenance of the equipment in the shielding room will be carried out by personnel.
Further, when the shielding room is a small one such as a glove box, the glove box is opened and internal apparatus maintenance is performed.
For this reason, it is necessary to purify the surroundings before and after the maintenance work, and a great deal of labor is required if a failure of the apparatus occurs in the work space exposed to the gas containing the organic halogen compound.
Usually, when a failure of the apparatus occurs, it is necessary to interrupt the process for a long time, and the processing efficiency is greatly reduced.

  For this reason, conventionally, in an organic halogen contaminant detoxification treatment facility, it has been required to reduce the interruption of processing due to apparatus maintenance or the like in order to suppress a decrease in processing efficiency.

However, conventional organic halogen contaminant detoxification treatment facilities are not in a state where the frequency of apparatus maintenance is sufficiently reduced.
Therefore, in the organic halogen contaminant detoxification treatment method, it has been difficult to suppress a decrease in treatment efficiency.
JP 2003-285041 A

  An object of the present invention is to provide an organic halogen contaminant detoxification treatment facility capable of reducing the frequency of maintenance and an organic halogen contaminant detoxification treatment method capable of suppressing a decrease in treatment efficiency.

  The present inventor has intensively studied to solve the above problem, and has an organic halogen contamination having a working space exposed to a gas containing an organic halogen compound and having a light source for illuminating the working space. In the detoxification facility, it is found that the organic halogen compound is dehalogenated by ultraviolet rays contained in the illumination light to generate a corrosive gas such as hydrogen halide. It has arrived.

  That is, the present invention has a working space exposed to a gas containing an organic halogen compound, a light source that illuminates the working space, and is contaminated with an organic halogen compound, in order to solve the above-described problem. An organic halogen contaminant detoxification facility in which contaminants are detoxified in the work space, and the light source has a light intensity of 380 nm or less as 1% or less with respect to the intensity of visible light exceeding 380 nm. An organic halogen contaminant detoxification treatment facility characterized in that a light source that emits reduced light is used.

  In order to solve the above-mentioned problems, the present invention renders the pollutant contaminated with the organic halogen compound in the work space while illuminating the work space exposed to the gas containing the organic halogen compound using a light source. A light source that emits light in which the intensity of light having a wavelength of 380 nm or less is reduced to 1% or less with respect to the intensity of visible light exceeding 380 nm as the light source. An organic halogen pollutant detoxification method is provided, wherein the illumination is performed using a light source.

In this specification, the term “visible light” or “visible light” is intended to mean “light having a wavelength of more than 380 nm and not more than 800 nm”. In addition, since ordinary illumination light does not include deep ultraviolet light (vacuum ultraviolet light) of 200 nm or less, the intensity of light having a wavelength of 380 nm or less is measured by measuring the intensity of light having a wavelength of 200 to 380 nm. Usually can be determined. In the following description, the term “ultraviolet light” or “visible light” intends “light with a wavelength of 200 to 380 nm” unless otherwise specified.
Therefore, as to whether or not “the intensity of light having a wavelength of 380 nm or less is 1% or less with respect to the intensity of visible light exceeding 380 nm”, the integrated value of the intensity of light having a wavelength of 200 to 380 nm is I _This can be determined by confirming that I _UV ≦ 0.01 × I _VIS , where _UV is the integral value of the intensity of light with a wavelength greater than 380 nm and less than or equal to 800 nm, and I _VIS .
The intensity of this light can be measured by using a spectrophotometer or the like.

According to the present invention, generation of corrosive gas such as hydrogen halide in the working space can be suppressed. Therefore, it is possible to reduce the failure occurrence frequency of the devices provided in the work space.
That is, according to the present invention, the maintenance frequency of the organic halogen contaminant detoxification treatment facility can be reduced.
In addition, since the maintenance frequency is reduced, it is possible to shorten the interruption period in the processing of contaminants.
That is, according to the present invention, it is possible to suppress a decrease in processing efficiency in the organic halogen contaminant detoxification method.

Hereinafter, preferred embodiments of the present invention will be described (based on the accompanying drawings).
FIG. 1 is a schematic diagram showing an organic halogen contaminant detoxification treatment facility in the present embodiment. In the figure, reference numeral 1 denotes an organic halogen contaminant in which a contaminant contaminated with an organic halogen compound is detoxified. Indicates detoxification processing equipment.

2 is a demolition work room in which demolition treatment is mainly performed in the detoxification treatment by the organic halogen contaminant detoxification treatment facility 1, and 21 is an entry / exit of the worker A to / from the demolition work room 2. It is a door for.
Reference numeral 22 denotes a ceiling of the demolition work room 2, and 23 denotes an illumination device (hereinafter also referred to as “ceiling lamp 23”) provided on the ceiling 22 to illuminate the inside of the demolition work room 2. .
Reference numeral 24 denotes a floor surface of the dismantling work chamber 2.

Reference numeral 3 denotes a glove box provided inside the dismantling work chamber 2, in which devices (not shown) are provided so that various operations can be performed.
31 is a housing that forms the main body of the glove box 3, and the housing 31 is positioned at a substantially central portion of the dismantling work chamber 2 with a lower portion buried below the floor surface 24. It is provided in the place.
31 a represents an exposed portion exposed above the floor surface 24 of the casing 31, and the exposed portion 31 a of the casing 31 is from the ceiling lamp 23 irradiated from the external space side of the glove box 3. It is made of a transparent plate so that light can be taken into the glove box 3 and illuminated.

Reference numeral 32 denotes an opening provided in the exposed portion 31a of the casing 31, and the opening 32 is opened to a size that allows the operator's two arm portions to be inserted with a margin.
33 is a glove provided in the glove box 3 in a state of being inserted through the opening 32, and the glove 33 is formed of a flexible material.
Further, the glove 33 has a length that can accommodate the entire arm of the worker A, and an opening end for inserting the arm is bonded to the peripheral edge of the opening 32 of the housing 31 so that the glove box 3 is provided.

The entire periphery of the opening end of the globe 33 is adhered to the periphery of the opening 32, and the opening 32 is sealed by the globe 33.
That is, the organic halogen contaminant detoxification treatment facility 1 of the present embodiment is not exposed to the internal working space exposed to the gas containing the organic halogen compound and the gas containing the organic halogen compound in which the worker A is active. A glove box 3 that divides the external space by a transparent plate material forming the exposed portion 31 a and the globe 33 is provided.

  34, a glove box 3 is used to illuminate the interior of the glove box 3 when the illumination is irradiated from the ceiling lamp 23 through the transparent plate material forming the exposed portion 31a when the worker A performs the dismantling operation. An illumination device (hereinafter also referred to as “work lamp 34”) provided in the box 3.

Reference numeral 4 denotes a pole transformer that is dismantled inside the glove box 3, and the pole transformer 4 is an insulation mainly composed of 1,2,4-trichlorobenzene and biphenyl pentachloride. Oil is used.
That is, in the organic halogen contaminant detoxification treatment facility 1 of the present embodiment, the pole transformer 4 is detoxified as a contaminant contaminated with the organic halogen compound, and the work space inside the glove box 3 is this It will be exposed to a gas containing 1,2,4-trichlorobenzene and biphenyl pentachloride used for the pole transformer 4.

  5 is a roller conveyor for transporting the pole transformer 4 from the front chamber (not shown) adjacent to the dismantling work chamber 2 into the glove box 3 of the dismantling work chamber 2 in the organic halogen contaminant detoxification treatment facility 1. It is.

Although not described in detail here, the glove box 3 is provided with exhaust means (not shown) so that the inside can be maintained at a slightly negative pressure, and the exhaust means dismantles contaminants. It is prevented that the organic halogen compound scattered or volatilized by the work leaks out of the glove box 3.
That is, the organic halogen contaminant detoxification treatment facility 1 of this embodiment forms a working space exposed only to a gas containing an organic halogen compound only inside the glove box 3, and dismantles outside the glove box 3. The interior space of work chamber 2 (the exterior space of glove box 3) is formed to be a clean area that is not exposed to a gas containing an organic halogen compound.

Next, the ceiling lamp 23 and the work lamp 34 will be described in more detail with reference to FIGS.
FIG. 2 is a schematic cross-sectional view of the ceiling lamp 23, and 23a represents a fluorescent lamp as a light source.
Moreover, the ceiling lamp 23 is a fluorescent lamp (hereinafter also referred to as “ultraviolet cut fluorescent lamp 23a”) that has the same luminous intensity as a general fluorescent lamp, but the emitted light hardly contains ultraviolet rays. It has been.

More specifically, the ultraviolet cut fluorescent lamp 23a emits light in a state in which ultraviolet rays are cut by 99% or more as compared with a general fluorescent lamp, and the emitted light has an intensity of light having a wavelength of 380 nm or less. It is reduced to 1% or less for the intensity of visible light exceeding.
Reference numeral 23b denotes a reflective shade arranged to cover the ultraviolet cut fluorescent lamp 23a from above so as to reflect the light emitted from the ultraviolet cut fluorescent lamp 23a toward the floor surface 24 side.
Reference numeral 23d denotes a glass tube that forms the outer shell of the ultraviolet cut fluorescent lamp 23a, and mercury vapor is sealed inside the glass tube 23d.
Then, an electron beam can be generated by discharge inside the glass tube 23d, and the electron beam can collide with the mercury to generate ultraviolet rays.
Reference numeral 23e denotes a phosphor layer formed of a phosphor that emits visible light when irradiated with ultraviolet rays generated inside the glass tube 23d, and the phosphor layer 23e is formed on the inner surface side of the glass tube 23d. Has been.
Reference numeral 23f denotes an ultraviolet absorbing layer formed between the phosphor layer 23e and the glass tube 23d. The ultraviolet cut fluorescent lamp 23a has the ultraviolet absorbing layer 23f so that ultraviolet rays can leak to the outside. It is prevented.

  That is, in a general fluorescent lamp, ultraviolet rays generated from mercury are converted into visible light by the phosphor layer 23e, and a part thereof is emitted to the outside through the phosphor layer 23e. On the other hand, in the ultraviolet cut fluorescent lamp 23a used in the ceiling lamp 23 of the organic halogen contaminant detoxification treatment facility 1 of the present embodiment, the ultraviolet ray that has passed through the phosphor layer 23e is captured and emitted by the ultraviolet absorbing layer 23f. The intensity of light having a wavelength of 380 nm or less is reduced to 1% or less with respect to the intensity of visible light exceeding 380 nm.

FIG. 3 is a schematic cross-sectional view of the work lamp 34, and 34 a represents a white light emitting diode module (hereinafter also referred to as “white LED module 34 a”) that is a light source.
34d is a light emitting diode (hereinafter also referred to as "blue LED 34d") that generates blue light from the side surface when a voltage is applied, and 34e is mounted with the blue LED 34d and causes the blue LED 34d to emit light. This is a circuit board on which the electrical circuit is formed.
34f is a recessed portion formed by recessing the surface of the circuit board 34e in a mortar shape, and the blue LED 34d reflects the light generated from the side surface portion to the inclined surface of the recessed portion 34f to the front side. In order to irradiate, it is mounted on the bottom of the recessed portion 34f.

Reference numeral 34g denotes a transparent resin layer covering the surface side of the circuit board 34e, and the transparent resin layer 34g is formed with a protruding portion 34h protruding in a substantially spherical shape at a position covering the recessed portion 34f.
The protrusion 34h is provided on the transparent resin layer 34g so as to function as a lens for collecting and irradiating the light generated from the blue LED 34d (light reflected from the inclined surface of the recessed portion 34f) to the front side. .

The surface 34j of the circuit board 34e is coated with a yellow phosphor that converts the irradiated blue light into yellow light, including the slope of the recessed portion 34f, and the white LED module 34a During the operation, the light emitted to the front side through the transparent resin layer 34g is formed in white by the blue light emitted from the blue LED 34d and the yellow light reflected from the yellow phosphor.
The white LED module 34a uses a blue LED 34d that hardly generates ultraviolet rays. The white light emitted is 1 with respect to the intensity of visible light having a wavelength of 380 nm or less exceeding 380 nm. % Or less.

The work lamp 34 is provided in the ceiling portion of the glove box 3, and the ceiling portion is in a state where the light emitting direction of the white LED module 34 a is directed to the lower surface side and the back surface is in contact with the inner surface of the glove box 3. Is provided.
That is, the ceiling lamp 23 is provided in a clean area that is not exposed to a gas containing an organic halogen compound, whereas the work lamp 34 is provided in a working space that is exposed to a gas containing an organic halogen compound. Is provided.

  As described above, in the organic halogen contaminant detoxification treatment facility 1 according to the present embodiment, the ceiling lamp 23 is used as a light source for illuminating the work space (inside the glove box) exposed to the gas containing the organic halogen compound. The fluorescent lamp 23a and the white LED module 34a used for the working lamp are provided. Both of these light sources have an intensity of light having a wavelength of 380 nm or less with respect to the intensity of visible light exceeding 380 nm. Thus, light that is reduced to 1% or less is generated.

In the glove box 3, as described above, the disassembly treatment of the pole transformer 4 to which the insulating oil mainly composed of 1,2,4-trichlorobenzene and pentachlorobiphenyl is attached is performed. The light that illuminates the work space in 3 is in a state in which light with a wavelength of 380 nm or less is sufficiently reduced.
Therefore, the risk of generating corrosive gas such as hydrogen chloride from organic halogen compounds such as 1,2,4-trichlorobenzene and pentachloride biphenyl can be reduced.
That is, it is possible to suppress the occurrence of corrosion in the glove box 3 itself and the devices inside the glove box 3, and the frequency of device maintenance can be reduced.

This will be further explained. The energy of light increases in inverse proportion to the wavelength. Therefore, when light having a wavelength of 380 nm or less is irradiated on the organic halogen compound in a high intensity state, the organic halogen compound molecules (interatomic bonds) are broken by the energy of the light.
At this time, in a portion with a large electrical bias such as a bond between a carbon atom and a halogen, it is easily attacked by radicals generated by breaking the bond between atoms, and a wavelength of 380 nm or less is applied to a substance having such a molecular structure. When this light is irradiated, dehalogenation occurs.

In addition, in compounds having an aromatic ring, the absorption peak of electronic transition in which the orbit of π electron is excited from the binding orbital to the antibonding orbital exists in the ultraviolet region, and the extension of the π electron conjugated system does not occur. When it occurs, the absorption peak of electronic transition is shifted to the long wavelength side.
That is, light in a wide range of wavelengths is absorbed in a region of 380 nm or less.

In polychlorinated biphenyls such as 1,2,4-trichlorobenzene and pentachlorobiphenyl, since a large amount of chlorine with a large electrical bias is bonded to the benzene ring, a wide range of wavelengths in the region of 380 nm or less. It easily absorbs light and generates electron transition of π electrons.
Therefore, among the organic halogen compounds, 1,2,4-trichlorobenzene and polychlorinated biphenyl are easily dehalogenated, and hydrogen chloride gas and the like are generated when light containing 380 nm or less is irradiated to a gas containing them. The Rukoto.
Then, the generated hydrogen chloride gas causes, for example, corrosion on metal parts of devices provided in the glove box.
For this reason, in conventional organohalogen compound detoxification equipment, for example, it is exposed to a gas containing 1,2,4-trichlorobenzene or polychlorinated biphenyl, and maintenance work is frequently performed in places where illumination is performed. Need to be implemented.

Moreover, for example, when parts are replaced by maintenance, an organic halogen compound is usually attached to the parts to be replaced.
Therefore, maintenance of devices provided in a space exposed to a gas containing polychlorinated biphenyl or the like that may cause health damage to the human body requires careful work.
As for 1,2,4-trichlorobenzene, PCB 118 (2,3 ′, 4,4) known as a coplanar PCB when two molecules of 1,2,4-trichlorobenzene are combined by dehydrochlorination. ', 5-pentachlorobiphenyl) may be formed.
Therefore, careful work is required for the maintenance of the devices provided in the space exposed to the gas containing 1,2,4-trichlorobenzene.

In addition, when hydrogen chloride gas is generated in an air-conditioning management area with little moisture, a large amount of hydrogen chloride gas is absorbed in a small amount of moisture, and high-concentration hydrochloric acid is generated.
This hydrochloric acid causes corrosion of the equipment and may be generated in any part of the ventilation system leading to the work space exposed to the organic halogen compound. According to the present invention, the hydrochloric acid is exposed to the organic halogen compound. Corrosion generated at locations away from the work space can also be suppressed.
That is, pipe corrosion, which has been difficult to predict and difficult to take countermeasures, can be suppressed.

That is, in the organic halogen contaminant detoxification treatment facility of the present embodiment, the generation of hydrogen chloride gas is reduced compared to the conventional organic halogen contaminant detoxification treatment facility, and equipment maintenance due to corrosion or the like can be performed. Can be reduced.
Therefore, an organic halogen contaminant detoxification method that can efficiently detoxify contaminants can be implemented.

As described above, in the organic halogen contaminant detoxification treatment facility of the present embodiment, the generation of hydrogen chloride gas is reduced as compared with the conventional organic halogen contaminant detoxification treatment facility, and the apparatus is caused by corrosion or the like. Maintenance such as the like can be reduced.
Therefore, an organic halogen contaminant detoxification method that can efficiently detoxify contaminants can be implemented.

  In addition, when used for detoxification treatment of contaminants contaminated by organic halogen compounds including polychlorinated biphenyl and 1,2,4-trichlorobenzene, the effect can be made more remarkable.

  In this embodiment, the light source is installed at a location closer to the contaminant to be detoxified, so that the visibility of the worker is improved and the detoxification process can be performed efficiently. In the present invention, for example, a ceiling lamp in a dismantling work room or the like is installed without installing a lighting device in the glove box. Thus, it is also possible to perform illumination by making light enter the glove box through a transparent plate material that forms the exposed portion of the glove box from an illumination device provided outside the glove box (external space).

  In the present embodiment, as a light source that generates light in which the intensity of light having a wavelength of 380 nm or less is reduced to 1% or less with respect to the intensity of visible light exceeding 380 nm, an ultraviolet cut fluorescent lamp, a white LED, or the like However, in the present invention, the light source is not limited to such a light source, and an ultraviolet cut mercury lamp, a sodium lamp, or the like may be employed.

  Moreover, in this embodiment, since a worker can touch a contaminant through a glove and the detoxification process of the contaminant can be efficiently performed, a work room (work space) for the detoxification process is provided. In the present invention, an organic halogen contaminant detoxification treatment facility equipped with a small scale (glove box) has been described as an example. However, in the present invention, a work chamber (work space) exposed to a gas containing an organic halogen compound is For example, it can also be a large scale having a size that allows personnel to enter and exit.

  Moreover, in this embodiment, the dismantling equipment of the pole transformer was exemplified as the organic halogen contaminant detoxification processing equipment. For example, oil removal from the pillar transformer or cleaning of the dismantling material after dismantling the pillar transformer Such facilities that perform the detoxification treatment are also intended as detoxification treatment facilities for organic halogen contaminants.

  Furthermore, in this embodiment, the pole transformer is exemplified as the contaminant to be detoxified, but the contaminant such as a capacitor using PCB-containing insulating oil or soil containing dioxin or residual agricultural chemicals is harmless. The various facilities for the chemical treatment are also intended by the present invention as a treatment for detoxifying organic halogen contaminants.

  Next, the present invention will be described in more detail by giving experimental data using 1,2,4-trichlorobenzene.

(Preprocessing)
(Degradation inhibitor removal)
In the experiment, commercially available 1,2,4-trichlorobenzene was used.
Since commercially available 1,2,4-trichlorobenzene usually contains a deterioration inhibitor, extraction with water was performed to eliminate the influence of this deterioration inhibitor.
More specifically, commercially available 1,2,4-trichlorobenzene and water were mixed and placed in a separatory funnel, and the separatory funnel was attached to a shaker and shaken.
Thereafter, the separatory funnel was allowed to stand to separate 1,2,4-trichlorobenzene and water, and only 1,2,4-trichlorobenzene was taken out from the separatory funnel.

(dehydration)
Anhydrous sodium sulfate was added to 1,2,4-trichlorobenzene taken out from the separatory funnel for dehydration, and anhydrous sodium sulfate was filtered off to complete the pretreatment of 1,2,4-trichlorobenzene for use in the experiment.
Hereinafter, unless otherwise specified, “1,2,4-trichlorobenzene” refers to this “1,2,4-trichlorobenzene after pretreatment”.

(Evaluation)
Thirteen evaluation samples were prepared in which about 25 g of 1,2,4-trichlorobenzene was placed in a glass vial, and one of these 13 samples was immediately polychlorinated for grasping the initial state. The biphenyl (PCB) content was measured.
For the measurement of the polychlorinated biphenyl content, gas chromatography (Gas Chromatography / Electron Capture Detector: hereinafter also referred to as “GC-ECD”) was used.
The remaining 12 samples were divided into 6 groups (2 each), and the first group wrapped the vials with aluminum foil, shielded from light, and stored for 3 days. The PCB content was measured by GC-ECD as in the first group.
Next, the second group continued to irradiate UV light having a wavelength of 253.7 nm for 3 days, and then the PCB content was measured by GC-ECD in the same manner as the first group.
Next, after continuing to irradiate a general fluorescent light for 3 days, the third group measured the PCB content by GC-ECD in the same manner as the first group.
The fourth group is then wrapped in an ultraviolet absorption filter (Maywa Gravure, window decoration sheet, model name “GES-4610CP”, UV removal rate of 99% or more based on JIS A5759), and the vial is light-shielded. Then, after continuing to irradiate ultraviolet light having a wavelength of 253.7 nm for 5 days, the PCB content was measured by GC-ECD as in the first group.
Next, the fifth group wraps it in an ultraviolet absorption filter (Asahi Pen Co., Ltd., sheet for sealing, model name “M-21”, UV removal rate of 99% or more based on JIS A5759) and performs light shielding treatment on the vial. Then, after continuing to irradiate ultraviolet light having a wavelength of 253.7 nm for 5 days, the PCB content was measured by GC-ECD as in the first group.
Furthermore, the sixth group is a vial bottle that is wrapped in an ultraviolet absorption filter (Lintec Commerce, Home Glass Mate light soft eyeglass sheet, model name “HGM-16”, UV removal rate of 95% or more based on JIS A5759). After being subjected to light shielding treatment and continuously irradiated with ultraviolet light having a wavelength of 253.7 nm for 5 days, the PCB content was measured by GC-ECD as in the first group.
The results are shown in Table 1.

  Next, PCBs contained in each group of samples were qualitatively analyzed with a gas chromatograph mass spectrometer (hereinafter also referred to as “GC-MS”). As a result, biphenyl pentachloride was 95% or more of the total PCBs. It was found that occupied.

  From this, it is considered that the reaction represented by the following formula (1) occurs, and it is considered that dehalogenation and dimerization of 1,2,4-trichlorobenzene are generated by light of 380 nm or less.

Also from this experimental result, it can be seen that dehalogenation of 1,2,4-trichlorobenzene can be suppressed by sufficiently reducing the ultraviolet ray by the ultraviolet filter.
That is, according to this invention, it turns out that the organic halogen contaminant detoxification processing equipment which can reduce a maintenance frequency, and the organic halogen contaminant detoxification processing method which can suppress the fall of processing efficiency can be provided.

Schematic which shows the organic halogen contaminant detoxification processing equipment of one Embodiment. The schematic sectional drawing which shows an example of an illuminating device. The schematic sectional drawing which shows the other example of an illuminating device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Organohalogen contaminant detoxification processing equipment 2 Demolition work room 3 Glove box 4 Pillar transformer 22 Ceiling 23 Ceiling lamp 23a Fluorescent lamp (ultraviolet cut fluorescent lamp)
23d Glass tube 23e Phosphor layer 23f Ultraviolet absorption layer 24 Floor 31 Housing 31a Exposed portion 32 Opening portion 33 Globe 34 Work light 34a White LED module 34e Circuit board 34f Recessed portion 34g Transparent resin layer 34h Protruding portion 34j Surface A Worker

Claims (6)

An organic space having a working space exposed to a gas containing an organic halogen compound, a light source that illuminates the working space, and a contaminant contaminated with the organic halogen compound is detoxified in the working space Halogen contaminant detoxification treatment facility,
Harmless organic halogen contaminants characterized in that a light source that emits light whose intensity is reduced to 1% or less with respect to the intensity of visible light exceeding 380 nm is used as the light source. Processing equipment.   2. The organic halogen contaminant detoxification facility according to claim 1, wherein polychlorinated biphenyl is contained in the gas as the organic halogen compound.   3. The organic halogen contaminant detoxification facility according to claim 1 or 2, wherein 1,2,4-trichlorobenzene is contained in the gas as the organic halogen compound. An organic halogen pollutant detoxification treatment method for detoxifying contaminants contaminated with organic halogen compounds in the work space while illuminating a work space exposed to a gas containing an organic halogen compound with a light source. There,
The organic halogen is characterized in that the illumination is performed using a light source that emits light having a light intensity of a wavelength of 380 nm or less being reduced to 1% or less with respect to an intensity of visible light exceeding 380 nm. Contaminant detoxification method.   The organic halogen contaminant detoxification method according to claim 4, wherein polychlorinated biphenyl is contained in the gas as the organic halogen compound.   The organic halogen contaminant detoxification method according to claim 4 or 5, wherein 1,2,4-trichlorobenzene is contained in the gas as the organic halogen compound.

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