JP4678561B2 - Curable resin composition - Google Patents
Curable resin composition Download PDFInfo
- Publication number
- JP4678561B2 JP4678561B2 JP2010525151A JP2010525151A JP4678561B2 JP 4678561 B2 JP4678561 B2 JP 4678561B2 JP 2010525151 A JP2010525151 A JP 2010525151A JP 2010525151 A JP2010525151 A JP 2010525151A JP 4678561 B2 JP4678561 B2 JP 4678561B2
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- JP
- Japan
- Prior art keywords
- parts
- compound
- group
- curable resin
- resin composition
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims description 38
- 150000001875 compounds Chemical class 0.000 claims description 126
- -1 silane compound Chemical class 0.000 claims description 104
- 239000000203 mixture Substances 0.000 claims description 86
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 81
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 58
- 239000010954 inorganic particle Substances 0.000 claims description 55
- 229910000077 silane Inorganic materials 0.000 claims description 49
- 239000001257 hydrogen Substances 0.000 claims description 46
- 229910052739 hydrogen Inorganic materials 0.000 claims description 46
- 125000004432 carbon atom Chemical group C* 0.000 claims description 28
- 239000003999 initiator Substances 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 20
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 238000010526 radical polymerization reaction Methods 0.000 claims description 6
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 83
- 150000003254 radicals Chemical class 0.000 description 43
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 37
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 230000000052 comparative effect Effects 0.000 description 32
- 239000002904 solvent Substances 0.000 description 30
- 239000000463 material Substances 0.000 description 24
- 150000004756 silanes Chemical class 0.000 description 22
- 238000003756 stirring Methods 0.000 description 22
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 238000000576 coating method Methods 0.000 description 18
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 16
- 238000010992 reflux Methods 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 15
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 13
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 13
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 13
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 10
- 239000002245 particle Substances 0.000 description 10
- 229920000728 polyester Polymers 0.000 description 10
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 239000002585 base Substances 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 8
- 150000003077 polyols Chemical class 0.000 description 8
- 238000012546 transfer Methods 0.000 description 8
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 7
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 7
- 229920005862 polyol Polymers 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical class C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 6
- 239000008119 colloidal silica Substances 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 5
- 229920002284 Cellulose triacetate Polymers 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 5
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 5
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 5
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 5
- 239000003963 antioxidant agent Substances 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 239000012948 isocyanate Substances 0.000 description 5
- 229940059574 pentaerithrityl Drugs 0.000 description 5
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 239000005056 polyisocyanate Substances 0.000 description 5
- 229920001228 polyisocyanate Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000007859 condensation product Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000012975 dibutyltin dilaurate Substances 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N fumaric acid group Chemical group C(\C=C\C(=O)O)(=O)O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 150000002440 hydroxy compounds Chemical class 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid group Chemical group C(\C=C/C(=O)O)(=O)O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000012719 thermal polymerization Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical group NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- 239000004386 Erythritol Substances 0.000 description 3
- UNXHWFMMPAWVPI-UHFFFAOYSA-N Erythritol Natural products OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 3
- 239000005058 Isophorone diisocyanate Substances 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 239000005062 Polybutadiene Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002118 epoxides Chemical class 0.000 description 3
- UNXHWFMMPAWVPI-ZXZARUISSA-N erythritol Chemical compound OC[C@H](O)[C@H](O)CO UNXHWFMMPAWVPI-ZXZARUISSA-N 0.000 description 3
- 229940009714 erythritol Drugs 0.000 description 3
- 235000019414 erythritol Nutrition 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical group OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 150000007519 polyprotic acids Polymers 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- PFEFOYRSMXVNEL-UHFFFAOYSA-N 2,4,6-tritert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 PFEFOYRSMXVNEL-UHFFFAOYSA-N 0.000 description 2
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- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- SAMYCKUDTNLASP-UHFFFAOYSA-N hexane-2,2-diol Chemical compound CCCCC(C)(O)O SAMYCKUDTNLASP-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000944 linseed oil Substances 0.000 description 1
- 235000021388 linseed oil Nutrition 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CSWFWSPPZMEYAY-UHFFFAOYSA-N octadecyl dihydrogen phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(O)O CSWFWSPPZMEYAY-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005606 polypropylene copolymer Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- GDESWOTWNNGOMW-UHFFFAOYSA-N resorcinol monobenzoate Chemical compound OC1=CC=CC(OC(=O)C=2C=CC=CC=2)=C1 GDESWOTWNNGOMW-UHFFFAOYSA-N 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 229960002920 sorbitol Drugs 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F292/00—Macromolecular compounds obtained by polymerising monomers on to inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/442—Block-or graft-polymers containing polysiloxane sequences containing vinyl polymer sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
本発明は、基材の保護層として用いることができ、高硬度の硬化被膜を形成する活性エネルギー線硬化性樹脂組成物に関する。 The present invention relates to an active energy ray-curable resin composition that can be used as a protective layer for a substrate and forms a hardened cured film.
物品は、その物品同士の接触、他の物品との接触、あるいは、置かれる環境の影響により、傷付いたり、変形したりする外的な変化やその物品を構成する材料が劣化する内的な変化を受ける。このような変化を防ぐために、物品の表面に保護層を設けたり、物品そのものを強化したりすることがなされる。 Due to the contact between the articles, contact with other articles, or the influence of the environment in which the article is placed, the external changes that are damaged or deformed, and the materials that make up the article deteriorate. Undergo change. In order to prevent such a change, a protective layer is provided on the surface of the article, or the article itself is strengthened.
プラスチックは、加工性が良く、軽量、安価等の理由で、各種分野で使用されている。しかし、加工性が良い反面、柔らかく、表面に傷が付き易いなどの欠点がある。この欠点を改良するために、ハードコート材を塗布し、表面に保護層を設けることが一般的に行われている。このハードコート材として、シリコン系樹脂組成物、アクリル系樹脂組成物、メラミン系樹脂組成物等の熱硬化型樹脂組成物が用いられてきたが、硬化時間が長い、熱に弱いプラスチックには適用できない等の欠点があった。 Plastics are used in various fields because of their good processability, light weight, and low cost. However, the processability is good, but there are drawbacks such as softness and easy scratching on the surface. In order to improve this defect, it is common practice to apply a hard coat material and provide a protective layer on the surface. Thermosetting resin compositions such as silicon resin compositions, acrylic resin compositions, and melamine resin compositions have been used as this hard coat material, but they are applicable to heat-sensitive plastics with a long curing time. There were drawbacks such as inability to do so.
近年、活性エネルギー線硬化性樹脂組成物が、(1)速硬化性であること、(2)エネルギー効率が高いこと、(3)低温で硬化が可能であること等の利点があり、ハードコート材として、急速に採用されている。とりわけ、フィルム用ハードコート材としては、紫外線などの活性エネルギー線の照射により、直ちに硬化し硬い被膜を形成するため、加工処理スピードが速く、硬さ、耐擦傷性、耐汚染性等に優れ、連続加工処理ができるため、活性エネルギー線硬化型ハードコート材を用いることが主流である。 In recent years, the active energy ray-curable resin composition has advantages such as (1) fast curing, (2) high energy efficiency, and (3) curing at low temperatures, It has been adopted rapidly as a material. In particular, as a hard coating material for film, since it hardens immediately upon irradiation with active energy rays such as ultraviolet rays to form a hard coating, the processing speed is fast, and it has excellent hardness, scratch resistance, stain resistance, etc. Since continuous processing is possible, it is mainstream to use an active energy ray-curable hard coat material.
液晶ディスプレイ、プラズマディスプレイ、タッチパネルディスプレイ等の表示体で、ハードコート材で保護したフィルムを、表面に設けることが、急速に広まっている。とりわけ、液晶ディスプレイは大型化し、かつ不特定多数の消費者に使用されるようになったため、それに用いるハードコート材には、より高い硬度、耐擦傷性、硬化時のフィルムのカールが小さいものが要求されるようになった。 2. Description of the Related Art It is rapidly becoming widespread to provide a film protected by a hard coat material on a display body such as a liquid crystal display, a plasma display, and a touch panel display. In particular, liquid crystal displays have become larger and are used by an unspecified number of consumers, so hard coat materials used for them have higher hardness, scratch resistance, and curling of the film when cured. It came to be required.
物品に保護層を設ける方法として、転写用積層体を成形体に転写する転写法がある。転写用積層体中に入れたハードコート材保護層を、転写後、成形体の最外層になるように転写している。家電、自動車等の分野の物品で、この転写法が採用されており、冷蔵庫の外板、携帯電話の筐体等で使用されている。この転写用積層体のハードコート材保護層にも活性エネルギー線硬化性樹脂組成物が、用いられている。不特定多数の消費者が使用するため、より高い硬度、耐擦傷性が要求され、かつ転写の際の作業性を高めるため、転写材のカールが小さいことが要求されている。 As a method for providing a protective layer on an article, there is a transfer method in which a transfer laminate is transferred to a molded body. After the transfer, the hard coat material protective layer placed in the transfer laminate is transferred so as to be the outermost layer of the molded body. This transfer method is used in articles in the fields of home appliances, automobiles, etc., and is used in the outer panel of refrigerators, the case of mobile phones, and the like. The active energy ray-curable resin composition is also used for the hard coat material protective layer of the transfer laminate. In order to be used by an unspecified number of consumers, higher hardness and scratch resistance are required, and in order to improve workability during transfer, curling of the transfer material is required to be small.
また、活性エネルギー線硬化性樹脂組成物は、紫外線などの活性エネルギー線を照射後、直ちに硬化し硬い被膜を形成する特徴があるため、活性エネルギー線硬化性樹脂組成物を型に接触した状態で硬化させると、その型を転写でき、特殊な形状を有する成形体を製造できる。例えば、フレネルレンズシート等の光学シートは、この方法で製造されている。この製法においても、より高い硬度、耐擦傷性が要求され、かつ作業性を高めるため、硬化被膜のカールが小さい活性エネルギー線硬化性樹脂組成物が要求されている。 In addition, since the active energy ray-curable resin composition has a characteristic of forming a hard film immediately after irradiation with active energy rays such as ultraviolet rays, the active energy ray-curable resin composition is in contact with the mold. When cured, the mold can be transferred and a molded body having a special shape can be produced. For example, an optical sheet such as a Fresnel lens sheet is manufactured by this method. Also in this production method, an active energy ray curable resin composition having a small cured film curl is required in order to require higher hardness and scratch resistance and to improve workability.
ハードコート材の性能の尺度として、鉛筆硬度が使われている。
特許文献1では、ポリイソシアネートと1分子中に1つの水酸基及び2つ以上の(メタ)アクリロイル基を有するアクリレートとの付加反応物であるウレタンアクリレート、及び側鎖に反応性官能基を有する(メタ)アクリレート系重合体に、前記反応性官能基と反応が可能な官能基を有するα,β−不飽和化合物を付加反応させた(メタ)アクリロイル基を有する重合体を用いると、基材がPETフィルムで、塗膜膜厚5−6μmで、カールがなく、鉛筆硬度が3Hになる技術が開示されている。ところが、上記の表示体等の用途では、不特定多数の消費者が使用するため、より硬い、鉛筆硬度4Hが望まれている。Pencil hardness is used as a measure of the performance of hard coat materials.
In Patent Document 1, urethane acrylate which is an addition reaction product of polyisocyanate and acrylate having one hydroxyl group and two or more (meth) acryloyl groups in one molecule, and a reactive functional group in the side chain (meta ) When a polymer having a (meth) acryloyl group obtained by addition reaction of an α, β-unsaturated compound having a functional group capable of reacting with the reactive functional group is used for the acrylate polymer, the base material is PET. A technique is disclosed in which the film has a coating film thickness of 5-6 μm, no curling, and a pencil hardness of 3H. However, in applications such as the above-mentioned display body and the like, since it is used by an unspecified number of consumers, a harder pencil hardness of 4H is desired.
耐摩耗性を上げるために、コロイダルシリカなどのシリカ微粒子を配合した材料が種々提案されている。
例えば、特許文献2では、コロイダルシリカ表面をメタクリロキシシランで修飾した粒子とアクリレートとの組成物を、光硬化型コーティング剤として用いることが開示されている。耐摩耗性は良いが、鉛筆硬度は、3Hに達しない。In order to increase the wear resistance, various materials containing silica fine particles such as colloidal silica have been proposed.
For example, Patent Document 2 discloses the use of a composition of acrylate and particles obtained by modifying the surface of colloidal silica with methacryloxysilane as a photocurable coating agent. Abrasion resistance is good, but pencil hardness does not reach 3H.
特許文献3には、シリカ粒子と不飽和基を有する化合物とを、N原子、C原子、S原子またはO原子をもつ化学結合で結合させた反応性シリカ粒子を用い、耐擦傷性及び硬化性を改良する技術が開示されている。この技術も、耐摩耗性はよいが、PETフィルム基材上で、塗膜厚を5−6μmの鉛筆硬度は、3Hに達しない。膜厚を15μmにしても、3Hまでしか上がらない。原因は、塗膜自身の硬さが不十分であるためか、鉛筆に引っかかりやすい塗膜の物性であるためと考えられる。 Patent Document 3 uses a reactive silica particle obtained by bonding a silica particle and a compound having an unsaturated group with a chemical bond having an N atom, a C atom, an S atom, or an O atom, and provides scratch resistance and curability. A technique for improving the above is disclosed. Although this technique also has good wear resistance, the pencil hardness with a coating thickness of 5-6 μm does not reach 3H on a PET film substrate. Even if the film thickness is 15 μm, it can only rise to 3H. The cause is thought to be that the hardness of the coating film itself is insufficient or that the physical properties of the coating film are easily caught by a pencil.
また、特許文献4に、無機粒子を用いていないが、(メタ)アクリロイル基を有するアルコキシシラン部分縮合物とアルコキシシラン部分縮合物を縮合させて得られるシリカ粒子を含む硬化性組成物の開示があるが、この技術においても、耐摩耗性はよいが、具体的な硬度の記載はない。 Patent Document 4 discloses a curable composition containing silica particles obtained by condensing an alkoxysilane partial condensate having a (meth) acryloyl group and an alkoxysilane partial condensate, although inorganic particles are not used. Although this technique also has good wear resistance, there is no description of specific hardness.
本発明が解決しようとする課題は、紫外線などの活性エネルギー線の照射により硬化した際、発生するカールが小さく、かつ鉛筆硬度が高く、高耐擦傷性の硬化被膜を得ることができる活性エネルギー線硬化性樹脂組成物を提供することである。 The problem to be solved by the present invention is an active energy ray that can produce a cured film with low curl, high pencil hardness, and high scratch resistance when cured by irradiation with active energy rays such as ultraviolet rays. It is to provide a curable resin composition.
本発明は、無機粒子(1)、シラン化合物またはその部分加水分解縮合物(2)、及び活性水素を有するラジカル重合性化合物(3)を反応させて得られる化合物(A)を含有する硬化性樹脂組成物において、化合物(A)が、シラン化合物またはその部分加水分解縮合物(2)との化学結合を介して、無機粒子(1)と活性水素を有するラジカル重合性化合物(3)とが結合して構成されることにより、上記課題を解決する硬化性樹脂組成物を提供するものである。 The present invention is a curable composition comprising a compound (A) obtained by reacting inorganic particles (1), a silane compound or a partially hydrolyzed condensate thereof (2), and a radical polymerizable compound (3) having active hydrogen. In the resin composition, the compound (A) is composed of an inorganic particle (1) and a radically polymerizable compound (3) having active hydrogen via a chemical bond with a silane compound or a partially hydrolyzed condensate (2) thereof. By combining and comprising, the curable resin composition which solves the said subject is provided.
本発明によれば、紫外線などの活性エネルギー線の照射により硬化した際、発生するカールが小さく、かつ鉛筆硬度が高く、高耐擦傷性の硬化被膜を得ることができる活性エネルギー線硬化性樹脂組成物、及びそれを硬化させてなる硬化物を提供することができる。
本発明の硬化物は、ハードコート膜として有用であり、各種基材の保護膜として利用することができる。ADVANTAGE OF THE INVENTION According to this invention, the active energy ray curable resin composition which can obtain the hardened | cured film with a small curl which is hardened | cured when it hardens | cures by irradiation of active energy rays, such as an ultraviolet-ray, high pencil hardness, and high abrasion And a cured product obtained by curing the product.
The cured product of the present invention is useful as a hard coat film and can be used as a protective film for various substrates.
本発明者等は、本課題解決を目的として鋭意検討した結果、
無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)と活性水素を有するラジカル重合性化合物(3)を反応させて得られる化合物(A)を含有する硬化性樹脂組成物により、上記課題の解決が達成される事を見いだし、本発明を完成するに至った。As a result of intensive studies aimed at solving this problem, the present inventors,
A curable resin composition containing a compound (A) obtained by reacting inorganic particles (1), a silane compound or a partially hydrolyzed condensate thereof (2) and a radical polymerizable compound (3) having active hydrogen, The inventors have found that the above problems can be solved and have completed the present invention.
以下、本発明を詳細に説明する。
本発明の化合物(A)は、シラン化合物またはその部分加水分解縮合物(2)との化学結合を介して、無機粒子(1)と活性水素を有するラジカル重合性化合物(3)とが結合して構成されるものである特徴を有する。Hereinafter, the present invention will be described in detail.
In the compound (A) of the present invention, the inorganic particles (1) and the radically polymerizable compound (3) having active hydrogen are bonded through a chemical bond with the silane compound or a partially hydrolyzed condensate (2) thereof. It has the characteristic which is comprised.
本発明の無機粒子(1)としては、シリカ、チタニア、アルミナ、亜鉛華、タルク、マイカ、クレー、カオリン、水酸化アルミ等の微紛状粒子或いはコロイド分散物が挙げられる。これら無機粒子の中では、シリカ、シリカーチタニア、シリカーアルミナ、シリカージルコニア、シリカーセリアなどのシリカ系複合酸化物が良く、シラノール基を持つ無機粒子が最も好ましい。 Examples of the inorganic particles (1) of the present invention include fine particles such as silica, titania, alumina, zinc white, talc, mica, clay, kaolin, and aluminum hydroxide, or colloidal dispersions. Among these inorganic particles, silica-based composite oxides such as silica, silica-titania, silica-alumina, silica-zirconia, and silica-ceria are preferable, and inorganic particles having a silanol group are most preferable.
無機粒子(1)のうち、例えばシリカ粒子として、乾燥した粉末状で市販されている粉体状シリカ粒子または、水もしくは有機溶剤で分散した状態で市販されているコロイダルシリカを挙げることができる。粒子の平均粒径としては、例えば1nm〜15μmが好ましいが、塗膜の透明性が必要な場合には、1μm以下の細かい粒子径が好ましく、より好ましくは3nm〜500nmであり、特に10〜40nmが好ましい。このシリカ粒子の平均粒径は、例えば、公知慣用の不活性気体の低温低湿物理吸着によるBET法により測定することができる。 Among the inorganic particles (1), for example, silica particles that are commercially available in dry powder form or colloidal silica that is commercially available in a state of being dispersed in water or an organic solvent can be used. The average particle diameter of the particles is preferably 1 nm to 15 μm, for example, but when the transparency of the coating film is required, a fine particle diameter of 1 μm or less is preferable, more preferably 3 nm to 500 nm, and particularly 10 to 40 nm. Is preferred. The average particle diameter of the silica particles can be measured, for example, by a BET method by low-temperature low-humidity physical adsorption of a known and usual inert gas.
用いられるシリカ粒子のうち、コロイダルシリカが特に好ましい。コロイダルシリカの分散媒は特に限定されないが、水以外であれば、例えば、メタノール、イソプロピルアルコール、n−ブタノール、エチレングリコール、エチレングリコールモノプロピルエーテル、ジメチルホルムアミド、メチルエチルケトン、メチルイソブチルケトン、キシレン等の溶剤が用いられる。これらの希釈用の溶剤として、混合性のある溶剤を用いる事ができる。 Of the silica particles used, colloidal silica is particularly preferred. The dispersion medium of colloidal silica is not particularly limited, but other than water, for example, solvents such as methanol, isopropyl alcohol, n-butanol, ethylene glycol, ethylene glycol monopropyl ether, dimethylformamide, methyl ethyl ketone, methyl isobutyl ketone, and xylene Is used. A solvent having a mixing property can be used as the solvent for dilution.
また、粉体状シリカ粒子を用いるときの溶媒として必要であれば、塗料に用いる通常の溶剤を用いてよく、これらの溶剤としてトルエン、キシレン等の芳香族炭化水素、メタノール、エタノール、イソプロピルアルコール等のアルコール類;酢酸エチル、酢酸ブチル、エチルソルブアセテート等のエステル類;メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類等が挙げられる。これら溶剤は1種を単独で使用しても、2種以上を混合して使用しても良い。 In addition, if necessary as a solvent when using powdered silica particles, ordinary solvents used in paints may be used, such as aromatic hydrocarbons such as toluene and xylene, methanol, ethanol, isopropyl alcohol, etc. Alcohols; esters such as ethyl acetate, butyl acetate, and ethyl sorb acetate; ketones such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. These solvents may be used alone or in combination of two or more.
シリカ粒子としては、コロイダルシリカとして、例えば、日産化学工業(株)製のスノーテックス20、スノーテックス30、メタノールシリカゾル、MA−ST−MS、IPA−ST、IPA−ST−MS、IPA−ST−L、IPA−ST−ZL、IPA−ST−UP、EG−ST、NPC−ST−30、MEK−ST、MEK−ST−MS、MIBK−ST−MS、MIBK−ST、XBA−ST、PMA−ST、DMAC−ST等をあげることができる。粉体状シリカとしては、例えば、日本アエロジル(株)製のアエロジル50、アエロジル130、アエロジル200、アエロジル300、アエロジル380、富士シリシア(株)製のサイリシア250、サイリシア310P、サイリシア470、サイリシア530等を挙げることができるが、これらに限らない。
また、これらシリカ粒子は、1種で使用する事も、2種以上を組み合わせて使用する事もできる。Examples of the silica particles include colloidal silica such as Snowtex 20, Snowtex 30, methanol silica sol, MA-ST-MS, IPA-ST, IPA-ST-MS, IPA-ST- manufactured by Nissan Chemical Industries, Ltd. L, IPA-ST-ZL, IPA-ST-UP, EG-ST, NPC-ST-30, MEK-ST, MEK-ST-MS, MIBK-ST-MS, MIBK-ST, XBA-ST, PMA- ST, DMAC-ST, etc. can be mentioned. Examples of the powdered silica include Aerosil 50, Aerosil 130, Aerosil 200, Aerosil 300, Aerosil 380 manufactured by Nippon Aerosil Co., Ltd., Silicia 250, Silicia 310P, Silicia 470, and Silicia 530 manufactured by Fuji Silysia Co. But are not limited to these.
These silica particles can be used alone or in combination of two or more.
本発明のシラン化合物またはその部分加水分解縮合物(2)としては、一般式(4) The silane compound of the present invention or a partially hydrolyzed condensate (2) thereof has the general formula (4)
(式中、R1は、炭素数1〜18のアルキル基、炭素数3〜8のシクロアルキル基、炭素数2〜6のアルケニル基、炭素数6〜8のアリール基、炭素数1〜18のアルコキシ基、及び炭素数6〜8のアリールオキシ基からなる群から任意に選ばれる基、R2は、炭素数1〜18のアルキル基又は炭素数6〜8のアリール基であり、nは1〜20の整数を表す。)
で表されるシラン化合物またはその部分加水分解縮合物である。(In the formula, R 1 is an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group having 6 to 8 carbon atoms, or 1 to 18 carbon atoms. R 2 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 8 carbon atoms, and n is a group arbitrarily selected from the group consisting of an alkoxy group of 6 and an aryloxy group having 6 to 8 carbon atoms. Represents an integer of 1 to 20.)
Or a partially hydrolyzed condensate thereof.
一般式(4)で表されるシラン化合物またはその部分加水分解縮合物のうち、シラン化合物としては、例えば、下記式(5) Of the silane compound represented by the general formula (4) or its partial hydrolysis-condensation product, examples of the silane compound include the following formula (5):
(式中、R1は、炭素数1〜18のアルキル基、炭素数3〜8のシクロアルキル基、炭素数2〜6のアルケニル基、炭素数6〜8のアリール基、炭素数1〜18のアルコキシ基、及び炭素数6〜8のアリールオキシ基からなる群から任意に選ばれる基、R2は、炭素数1〜18のアルキル基又は炭素数6〜8のアリール基であり、pは0又は1を表す。)
で表されるシラン化合物であり、炭素数1〜18のアルキル基としては、例えば、メチル、エチル、プロピル、iso−プロピル、ブチル、iso−ブチル、sec−ブチル、tert−ブチル、ペンチル、iso−ペンチル、sec−ペンチル、ヘキシル、ヘプチル、n−オクチル、イソオクチル、2−エチルヘキシル、ノニル、デシル、イソデシル、ドデシル、テトラデシル、ヘキサデシル、オクタデシル等を、炭素数3〜8のシクロアルキル基としては、例えば、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル等を、炭素数1〜18のアルケニル基としては、例えば、ビニル基、アリル基、ヘキセニル基等を、炭素数6〜8のアリール基としては、例えば、ベンジル、1−フェニルエチル、2−フェニルエチル、o、mまたはp−メチルベンジル基等を挙げることができる。(In the formula, R 1 is an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group having 6 to 8 carbon atoms, or 1 to 18 carbon atoms. R 2 is an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 8 carbon atoms, and p is an arbitrary group selected from the group consisting of an alkoxy group having a carbon number of 6 to 8 and an aryloxy group having 6 to 8 carbon atoms. Represents 0 or 1)
As the alkyl group having 1 to 18 carbon atoms, for example, methyl, ethyl, propyl, iso-propyl, butyl, iso-butyl, sec-butyl, tert-butyl, pentyl, iso- Examples of cycloalkyl groups having 3 to 8 carbon atoms such as pentyl, sec-pentyl, hexyl, heptyl, n-octyl, isooctyl, 2-ethylhexyl, nonyl, decyl, isodecyl, dodecyl, tetradecyl, hexadecyl, octadecyl, etc. Cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like, as the alkenyl group having 1 to 18 carbon atoms, for example, vinyl group, allyl group, hexenyl group and the like as aryl groups having 6 to 8 carbon atoms. Is, for example, benzyl, 1-pheny Ethyl, mention may be made of 2-phenylethyl, o, m or p- methylbenzyl group.
更に、具体的には、テトラメトキシシラン、テトラエトキシシラン、テトラ(n−プロポキシ)シラン、テトライソブトキシシラン、テトラキス(2−メトキシエトキシシラン)等のテトラアルコキシシラン類、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリプロポキシシラン、メチルトリブトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、イソプロピルトリメトキシシラン、イソプロピルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン等のトリアルコキシシラン類等を挙げることができる。 More specifically, tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetra (n-propoxy) silane, tetraisobutoxysilane, tetrakis (2-methoxyethoxysilane), methyltrimethoxysilane, methyltrimethoxysilane, Ethoxysilane, methyltripropoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, isopropyltrimethoxysilane, isopropyltriethoxysilane, vinyltrimethoxy Examples include trialkoxysilanes such as silane, vinyltriethoxysilane, phenyltrimethoxysilane, and phenyltriethoxysilane.
また、一般式(4)のシラン化合物の部分加水分解縮合物とは、アルコキシシランの1種または2種以上の縮合したものをいう。アルコキシシランの縮合物の縮合度は、制限しないが、取扱いに優れることから、Si原子を平均2〜10個含む縮合物が好ましい。一般式(4)のシラン化合物の縮合物の構造に特に制限はなく、直鎖状でも分岐構造でもよいが、直鎖状が好ましい。また、分岐鎖同士間に、あるいは、分岐鎖と主鎖との間に酸素原子を介する結合があっても良い。 Moreover, the partial hydrolysis-condensation product of the silane compound of General formula (4) means what condensed 1 type, or 2 or more types of alkoxysilane. The condensation degree of the alkoxysilane condensate is not limited, but is preferably a condensate containing an average of 2 to 10 Si atoms because of excellent handling. There is no restriction | limiting in particular in the structure of the condensate of the silane compound of General formula (4), Although a linear or branched structure may be sufficient, a linear form is preferable. Further, there may be a bond through oxygen atoms between the branched chains or between the branched chain and the main chain.
例えば、コルコート(株)社製メチルシリケート51(テトラメトキシシランの平均4量体)、扶桑化学工業(株)製メチルシリケート53A(テトラメトキシシランの平均7量体)、三菱化学社製MKCシリケートMS56(テトラメトキシシランの平均10量体)、コルコート(株)社製エチルシリケート40(テトラエトキシシランの平均5量体)、コルコート(株)社製エチルシリケート40T(エチルシリケート40からテトラエトキシシランを除去したもの)、エチルシリケート48(テトラエトキシシランの平均10量体)、信越化学工業社製KC−89、KR−500、KR−213、KR−9218が市販されている。アルコキシ基の加熱縮合反応において、低温で反応をさせたい場合や反応速度を速くしたい場合は、一般式(4)中のR1からR2のいずれかをメトキシ基とすることが好ましい。また、一般式(4)のシラン化合物またはその部分加水分解縮合物のアルコキシシランの縮合物では、テトラアルコキシシラン類またはトリアルコキシシラン類の縮合物が好ましい。For example, methyl silicate 51 (an average tetramer of tetramethoxysilane) manufactured by Colcoat Co., Ltd., methyl silicate 53A (an average heptamer of tetramethoxysilane) manufactured by Fuso Chemical Industry Co., Ltd., MKC silicate MS56 manufactured by Mitsubishi Chemical Corporation (Average tetramer of tetramethoxysilane), Ethyl silicate 40 manufactured by Colcoat Co., Ltd. (average pentamer of tetraethoxysilane), Ethyl silicate 40T manufactured by Colcoat Co., Ltd. (Tetraethoxysilane was removed from ethyl silicate 40) ), Ethyl silicate 48 (average tetramer of tetraethoxysilane), Shin-Etsu Chemical Co., Ltd. KC-89, KR-500, KR-213, and KR-9218 are commercially available. In the heat condensation reaction of an alkoxy group, when it is desired to perform the reaction at a low temperature or to increase the reaction rate, it is preferable that any one of R 1 to R 2 in the general formula (4) is a methoxy group. Moreover, in the condensate of alkoxysilane of the silane compound of General formula (4) or its partial hydrolysis condensate, the condensate of tetraalkoxysilanes or trialkoxysilanes is preferable.
本発明の活性水素を有するラジカル重合性化合物(3)としては、一つの分子の中に活性水素を有する基を1個以上、ラジカル重合性基を1個以上有する化合物であり、活性水素を与える基の例としては、水酸基、カルボキシル基、メルカプト基、アミノ基、スルホン酸基、リン酸基、シラノ−ル基等を挙げることができ、中でも水酸基が最も好ましい。
ラジカル重合性基としては、(メタ)アクリロイル基、(メタ)アクリルアミド基、アリル基、ビニル基、マレイミド基、フマル酸基、イタコン酸基、マレイン酸基等が挙げられるが、なかでも(メタ)アクリロイル基、(メタ)アクリルアミド基、及びビニル基が挙げられ、これらの基は硬化が速く有効である。
活性水素を有するラジカル重合性化合物(3)の具体的な例として、水酸基を有しかつ(メタ)アクリロイル基を有する化合物を挙げることができ、この化合物は、アルコール型、トリメチロールプロパン型、ペンタエリスリトール型、エポキシ型、イソシアヌレート型に分類することができる。The radically polymerizable compound (3) having active hydrogen of the present invention is a compound having one or more groups having active hydrogen and one or more radically polymerizable groups in one molecule, and gives active hydrogen. Examples of the group include a hydroxyl group, a carboxyl group, a mercapto group, an amino group, a sulfonic acid group, a phosphoric acid group, and a silanol group, and among them, the hydroxyl group is most preferable.
Examples of the radical polymerizable group include (meth) acryloyl group, (meth) acrylamide group, allyl group, vinyl group, maleimide group, fumaric acid group, itaconic acid group, maleic acid group, etc. Examples include an acryloyl group, a (meth) acrylamide group, and a vinyl group, and these groups are effective in rapid curing.
Specific examples of the radically polymerizable compound (3) having active hydrogen include a compound having a hydroxyl group and a (meth) acryloyl group, and this compound includes alcohol type, trimethylolpropane type, penta It can be classified into erythritol type, epoxy type and isocyanurate type.
例えば、アルコール型の例としては、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、ヒドロキシジエチレングリコール(メタ)アクリレート、トリメチロールプロパン型としては、ヒドロキシプロピル化トリメチロールプロパントリアクリレート、ペンタエリスリトール型としては、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリレート、エポキシ型としては、ブトキシヒドロキシプロピルアクリレート、フェノキシヒドロキシプロピルアクリレート、ヒドロキシプロピルジメタクリレート、ジエチレングリコールビス(ヒドロキシプロピルアクリレート)、プロポキシ化ビスフェノールAビス(ヒドロキシプロピルアクリレート)、イソシアヌレート型としては、ビス((メタ)アクリロイルオキシエチル)ヒドロキシエチルイソシアヌレート、ビス((メタ)アクリロイルオキシプロピル)ヒドロキシプロピルイソシアヌレート等が挙げられるが、これらの例に限定されない。
これらは、1種で使用する事も2種以上を組み合わせて使用する事も何ら制限はない。For example, examples of alcohol type include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, hydroxydiethylene glycol (meth) acrylate, and trimethylolpropane type includes hydroxypropylated trimethylolpropane triacrylate, Pentaerythritol types include pentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, and epoxy types include butoxyhydroxypropyl acrylate, phenoxyhydroxypropyl acrylate, hydroxypropyl dimethacrylate, diethylene glycol bis (hydroxypropyl acrylate) , Propoxylated bisphenol A bis (hydroxypro Le acrylate), as the isocyanurate type, bis ((meth) acryloyloxyethyl) hydroxyethyl isocyanurate, bis ((meth) acryloyloxy propyl) but hydroxypropyl isocyanurate, but it is not limited to these examples.
There is no restriction on the use of these alone or in combination of two or more.
また、ラジカル重合性基を2個以上有するトリメチロールプロパン型、ペンタエリスリトール型、エポキシ型、イソシアヌレート型が好ましい。環状構造を有する化合物も好適に用いられ、前述のエポキシ型やイソシアヌレート型が挙げられ、エポキシ型の中にはビスフェノールの様な芳香環型や水添ビスフェノールの様な脂環型が挙げられる。
活性水素を有するラジカル重合性化合物(3)として、好ましい化合物の具体例として、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールペンタアクリレート、ビス(アクリロイルオキシエチル)ヒドロキシエチルイソシアヌレートを挙げることができる。Trimethylolpropane type, pentaerythritol type, epoxy type and isocyanurate type having two or more radically polymerizable groups are preferred. A compound having a cyclic structure is also preferably used, and examples thereof include the aforementioned epoxy type and isocyanurate type, and examples of the epoxy type include an aromatic ring type such as bisphenol and an alicyclic type such as hydrogenated bisphenol.
Specific examples of preferable compounds as the radically polymerizable compound (3) having active hydrogen include pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and bis (acryloyloxyethyl) hydroxyethyl isocyanurate.
次に、本発明の無機粒子を修飾した化合物(A)の製造方法について説明する。
本発明の化合物(A)は、
1)無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)と活性水素を有するラジカル重合性化合物(3)を一括に仕込み、反応させても良いし、
2)無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)を反応させ、シリル基をもつ無機粒子(A1)を生成させた後、活性水素を有するラジカル重合性化合物(3)を反応させても良いし、
3)シラン化合物またはその部分加水分解縮合物(2)と活性水素を有するラジカル重合性化合物(3)を反応させ、シリル基をもつラジカル重合性化合物(A2)と、無機粒子(1)を反応させて得ても良い。Next, the manufacturing method of the compound (A) which modified the inorganic particle of this invention is demonstrated.
Compound (A) of the present invention is
1) The inorganic particles (1), the silane compound or its partially hydrolyzed condensate (2), and the radical polymerizable compound (3) having active hydrogen may be charged and reacted together,
2) After reacting the inorganic particles (1) with the silane compound or its partially hydrolyzed condensate (2) to produce inorganic particles (A1) having a silyl group, the radical polymerizable compound (3) having active hydrogen May be allowed to react,
3) The silane compound or its partially hydrolyzed condensate (2) is reacted with the radical polymerizable compound (3) having active hydrogen, and the radical polymerizable compound (A2) having a silyl group is reacted with the inorganic particles (1). You may get it.
無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)の反応は、シラン化合物の加水分解と無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)の縮重合反応による公知の反応であり、20℃〜150℃程度の温度で5分〜24時間程度の条件下で行なわれる。但し、本発明のように(メタ)アクリロイルオキシ基の様なラジカル反応性基の共存下では、熱によるゲル化を起こさせない条件で反応する事が重要である。好ましくは、20℃〜80℃程度の温度で1時間〜24時間程度の条件で反応を行うのが良い。 The reaction between the inorganic particles (1) and the silane compound or its partially hydrolyzed condensate (2) includes the hydrolysis of the silane compound and the condensation polymerization reaction between the inorganic particles (1) and the silane compound or its partially hydrolyzed condensate (2). The reaction is carried out at a temperature of about 20 ° C. to 150 ° C. for about 5 minutes to 24 hours. However, in the presence of a radical reactive group such as a (meth) acryloyloxy group as in the present invention, it is important to react under conditions that do not cause gelation by heat. Preferably, the reaction is performed at a temperature of about 20 ° C. to 80 ° C. under conditions of about 1 hour to 24 hours.
反応には、特に触媒は必要ではないが、シラン化合物の加水分解反応を促進する必要がある場合は、触媒として酸やアルカリを用いることができる。好ましくは無機酸または有機酸である。無機酸としては、例えば塩酸、硫酸、硝酸、リン酸等を使用できる。有機酸としては、例えばギ酸、酢酸、シュウ酸、アクリル酸、メタクリル酸、p−トルエンスルホン酸、メタンスルホン酸等を使用できる。使用される触媒は、シラン化合物またはその部分加水分解縮合物(2)成分のアルコキシ基(アルコキシ基を1モルとして)に対して、10−4〜1モル%程度用いると良い。また、同時に水をアルコキシ基(アルコキシ基を1モルとして)に対して、10〜200モル%用いると、アルコキシシリル基の加水分解が促進される。A catalyst is not particularly required for the reaction, but an acid or an alkali can be used as the catalyst when it is necessary to promote the hydrolysis reaction of the silane compound. An inorganic acid or an organic acid is preferable. As the inorganic acid, for example, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and the like can be used. As the organic acid, for example, formic acid, acetic acid, oxalic acid, acrylic acid, methacrylic acid, p-toluenesulfonic acid, methanesulfonic acid and the like can be used. The catalyst used is preferably about 10 −4 to 1 mol% based on the alkoxy group of the silane compound or its partially hydrolyzed condensate (2) component (with the alkoxy group as 1 mol). At the same time, when 10 to 200 mol% of water is used with respect to the alkoxy group (with 1 mol of the alkoxy group), hydrolysis of the alkoxysilyl group is promoted.
シラン化合物またはその部分加水分解縮合物(2)と活性水素を有するラジカル重合性化合物(3)の反応は、脱アルコール縮合反応であり、反応促進のため、従来公知の触媒を用いてもよい。例えば、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、マグネシウム、亜鉛、アルミニウム、チタン、コバルト、ゲルマニウム、錫、鉛、アンチモン、砒素、ホウ素、カドミウム、マンガン等の金属や、これらの酸化物、有機酸塩、ハロゲン化物、アルコキシド等がある。特に、有機錫と有機酸化合物が好ましく、ジブチル錫ラウレート、ジブチル錫ジオクタノエート、ジブチル錫オキサイド、オクチル酸錫、アルミニウムトリス(アセチルアセトン)、アルミニウムトリス(アセトアセテートエチル)、アルミニウムジイソプロポキシ(アセトアセテートエチル)、ジルコニウム(アセチルアセトン)、ジルコニウムトリス(アセチルアセトン)、ジルコニウムテトラキス(エチレングリコールモノメチルエーテル)、ジルコニウムテトラキス(エチレングリコールモノエチルエーテル)、ジルコニウムテトラキス(エチレングリコールモノブチルエーテル)、チタニウムテトラキス(エチレングリコールモノメチルエーテル)、チタニウムテトラキス(エチレングリコールモノエチルエーテル)、チタニウムテトラキス(エチレングリコールモノブチルエーテル)などの有機チタニウム化合物などが良い。このような触媒は2種以上を併用してもよい。 The reaction of the silane compound or its partially hydrolyzed condensate (2) and the radically polymerizable compound (3) having active hydrogen is a dealcoholization condensation reaction, and a conventionally known catalyst may be used to accelerate the reaction. For example, metals such as lithium, sodium, potassium, rubidium, cesium, magnesium, zinc, aluminum, titanium, cobalt, germanium, tin, lead, antimony, arsenic, boron, cadmium, manganese, and oxides and organic acid salts thereof , Halides, alkoxides and the like. Particularly preferred are organic tin and organic acid compounds, such as dibutyltin laurate, dibutyltin dioctanoate, dibutyltin oxide, tin octylate, aluminum tris (acetylacetone), aluminum tris (acetoacetate ethyl), aluminum diisopropoxy (acetoacetate ethyl) , Zirconium (acetylacetone), zirconium tris (acetylacetone), zirconium tetrakis (ethylene glycol monomethyl ether), zirconium tetrakis (ethylene glycol monoethyl ether), zirconium tetrakis (ethylene glycol monobutyl ether), titanium tetrakis (ethylene glycol monomethyl ether), titanium Tetrakis (ethylene glycol monoethyl ether), titanium Tetrakis (such as ethylene glycol monobutyl ether) organic titanium compounds such as good. Two or more of such catalysts may be used in combination.
また、本反応では溶剤を使用する事ができる。溶剤としては、例えば、メタノール、エタノール、イソプロピルアルコール等のアルコール類、トルエン、エチルベンゼン、テトラリン、クメン、キシレン等の芳香族炭化水素類;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;ギ酸エステル、酢酸メチル、酢酸エチル、酢酸n−ブチル等のエステル類等が使えるが、これらに限定されるものではない。これら溶剤は1種を単独で使用しても、2種以上を混合して使用しても良い。 In this reaction, a solvent can be used. Examples of the solvent include alcohols such as methanol, ethanol and isopropyl alcohol, aromatic hydrocarbons such as toluene, ethylbenzene, tetralin, cumene and xylene; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; formate ester Esters such as methyl acetate, ethyl acetate, and n-butyl acetate can be used, but are not limited thereto. These solvents may be used alone or in combination of two or more.
また、上記の反応において、ラジカル重合性基の重合を抑制する目的で、ラジカル重合禁止剤を使用することが望ましい。ラジカル重合禁止剤としては、例えば、ハイドロキノン、tert−ブチルハイドロキノン、メトキノン、2,4−ジメチル−6−tert−ブチルフェノール、カテコール、tert−ブチルカテコール等のフェノール系化合物;フェノチアジン、p−フェニレンジアミン、ジフェニルアミン等のアミン類;ジメチルジチオカルバミン酸銅、ジエチルジチオカルバミン酸銅、ジブチルジチオカルバミン酸銅等の銅錯体等が挙げられ、これらの重合禁止剤は、単独で用いることも、2種以上を併用して用いることもできる。重合禁止剤の添加量は、全仕込量に対して10〜10,000ppmの範囲が好ましい。 In the above reaction, it is desirable to use a radical polymerization inhibitor for the purpose of suppressing the polymerization of the radical polymerizable group. Examples of the radical polymerization inhibitor include phenolic compounds such as hydroquinone, tert-butylhydroquinone, methoquinone, 2,4-dimethyl-6-tert-butylphenol, catechol, tert-butylcatechol; phenothiazine, p-phenylenediamine, diphenylamine Examples thereof include copper complexes such as copper dimethyldithiocarbamate, copper diethyldithiocarbamate, and copper dibutyldithiocarbamate. These polymerization inhibitors can be used alone or in combination of two or more. You can also. The addition amount of the polymerization inhibitor is preferably in the range of 10 to 10,000 ppm with respect to the total charge.
無機粒子(1)は、本発明の化合物(A)100質量部中、20〜70質量部が好ましい。20質量部より少ないと、硬度が低下するので好ましくない。また、シラン化合物またはその部分加水分解縮合物(2)は、本発明の化合物(A)中、10〜40質量部が好ましい。10質量部以下では、鉛筆硬度が低下し、40質量部以上では、無機粒子(1)と活性水素を有するラジカル重合性化合物(3)が少なくなり、鉛筆硬度が低下するため好ましくない。活性水素を有するラジカル重合性化合物(3)は、本発明の化合物(A)中、20〜60質量部が好ましい。20質量部以下では、鉛筆硬度が低下するため好ましくなく、60質量部以上では、無機粒子(1)とシラン化合物またはその部分加水分解縮合物(2)が少なくなり、鉛筆硬度が低下するため好ましくない。 As for inorganic particle (1), 20-70 mass parts is preferable in 100 mass parts of compounds (A) of this invention. If the amount is less than 20 parts by mass, the hardness decreases, which is not preferable. Moreover, 10-40 mass parts is preferable in the compound (A) of this invention for a silane compound or its partial hydrolysis-condensation product (2). If it is 10 parts by mass or less, the pencil hardness decreases, and if it is 40 parts by mass or more, the radically polymerizable compound (3) having inorganic particles (1) and active hydrogen decreases, and the pencil hardness decreases, which is not preferable. As for the radically polymerizable compound (3) which has active hydrogen, 20-60 mass parts is preferable in the compound (A) of this invention. If it is 20 parts by mass or less, it is not preferable because the pencil hardness is lowered, and if it is 60 parts by mass or more, it is preferable because the inorganic particles (1) and the silane compound or its partial hydrolysis condensate (2) are reduced and the pencil hardness is reduced. Absent.
また、発明の課題解決のためには、無機粒子(1)としてシリカ粒子を用いた場合、シリカ粒子と加水分解縮合物(2)中に含まれるSiO2の質量の比率(シリカ粒子中のSiO2の質量/加水分解縮合物(2)中のSiO2の質量)が、6/4〜50/1の範囲であることが好ましい。In order to solve the problem of the invention, when silica particles are used as the inorganic particles (1), the ratio of the mass of SiO 2 contained in the silica particles and the hydrolysis condensate (2) (SiO 2 in silica particles). 2 / mass of SiO 2 in the hydrolysis-condensation product (2) is preferably in the range of 6/4 to 50/1.
本発明のラジカル重合性基を2個以上有する化合物(B)としては、活性エネルギー線の照射によりラジカル重合する重合性不飽和基を一分子中に2個以上有する物であればよく、特に限定されない。無機粒子(1)とアルコキシシラン化合物またはその部分加水分解縮合物(2)と活性水素を有するラジカル重合性化合物(3)を反応させて得られる化合物(A)とラジカル重合性基を2個以上有する化合物(B)からなる硬化性樹脂組成物において使用される質量部の比率に特に限定がないが、化合物(A)/化合物(B)=1/99〜90/10質量部が好ましい。 The compound (B) having two or more radically polymerizable groups of the present invention is not particularly limited as long as it has two or more polymerizable unsaturated groups in one molecule that undergo radical polymerization upon irradiation with active energy rays. Not. Two or more compounds (A) and radical polymerizable groups obtained by reacting inorganic particles (1), alkoxysilane compounds or partially hydrolyzed condensates thereof (2) and radical polymerizable compounds (3) having active hydrogen. Although there is no limitation in particular in the ratio of the mass part used in the curable resin composition which has a compound (B) which has, Compound (A) / Compound (B) = 1 / 99-90 / 10 mass part is preferable.
化合物(B)のラジカル重合性基としては、例えば、(メタ)アクリロイル基、(メタ)アクリルアミド基、アリル基、ビニル基、マレイミド基、フマル酸基、イタコン酸基、マレイン酸基等が挙げられるが、なかでも(メタ)アクリロイル基を有する物が硬化も速く最も好ましい。
(メタ)アクリロイル基を、有する物としては、(B−1)ポリオ−ル(メタ)アクリレート、(B−2)ポリエステル(メタ)アクリレート、(B−3)エポキシ(メタ)アクリレート、(B−4)ウレタン(メタ)アクリレート、(B−5)ポリエーテル(メタ)アクリレート等が挙げられる。Examples of the radical polymerizable group of the compound (B) include (meth) acryloyl group, (meth) acrylamide group, allyl group, vinyl group, maleimide group, fumaric acid group, itaconic acid group, maleic acid group and the like. However, among them, a product having a (meth) acryloyl group is most preferable because it cures quickly.
As a thing which has a (meth) acryloyl group, (B-1) polyol (meth) acrylate, (B-2) polyester (meth) acrylate, (B-3) epoxy (meth) acrylate, (B- 4) Urethane (meth) acrylate, (B-5) polyether (meth) acrylate, and the like.
(B−1)ポリオ−ル(メタ)アクリレートとしては、アルキル型、アルキレングリコール型、エステル型、トリメチロールプロパン型、ペンタエリスリトール型、イソシアヌレート型等に類別されるポリオールと(メタ)アクリル酸との脱水、またはエステル交換反応させて得られるアクリレートが含まれる。
(B−2)ポリエステル(メタ)アクリレートとしては、種々のポリオールと多塩基酸より合成したポリエステルに残った水酸基とアクリル酸を縮合させて化合物の中、アクリロイル基が2以上ある化合物が、
(B−3)エポキシ(メタ)アクリレートとしては、2官能以上のエポキシドと(メタ)アクリル酸を反応させて得られるアクリレートが、
(B−4)ウレタン(メタ)アクリレートとしては、主鎖にウレタン結合を有する(メタ)アクリレートのうち、アクリロイル基が2以上ある化合物が、
(B−5)ポリエーテル(メタ)アクリレートとは、主鎖にエーテル結合を有する(メタ)アクリレートのうち、アクリロイル基が2以上ある化合物が挙げられる。(B-1) Polyol (meth) acrylates include polyols categorized as alkyl type, alkylene glycol type, ester type, trimethylolpropane type, pentaerythritol type, isocyanurate type, and (meth) acrylic acid An acrylate obtained by dehydration or transesterification reaction is included.
(B-2) As the polyester (meth) acrylate, a compound having two or more acryloyl groups among the compounds obtained by condensing a hydroxyl group and acrylic acid remaining in a polyester synthesized from various polyols and polybasic acids,
(B-3) As an epoxy (meth) acrylate, an acrylate obtained by reacting a bifunctional or higher functional epoxide with (meth) acrylic acid,
(B-4) As the urethane (meth) acrylate, among (meth) acrylates having a urethane bond in the main chain, a compound having two or more acryloyl groups,
(B-5) Polyether (meth) acrylate includes compounds having two or more acryloyl groups among (meth) acrylates having an ether bond in the main chain.
以下にこれらの具体例を各々示すが、本発明に用いられる化合物は、これら例示した化合物に限定されるものではない。 Specific examples of these are shown below, but the compounds used in the present invention are not limited to these exemplified compounds.
(B−1)ポリオ−ル(メタ)アクリレ−ト;1,4ブタンジオールジアクリレート、ジエチレングリコールジアクリレート、ヒドロキシピバリン酸エステルネオペンチルグリコールジアクリレート、トリメチロールプロパントリアクリレート、ジトリメチロールプロパンテトラアクリレート、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールヘキサアクリレート、トリス(アクリロイルオキシエチル)イソシアヌレート、
(B−2)ポリエステル(メタ)アクリレート;(ポリ)エチレングリコール、(ポリ)プロピレングリコール、(ポリ)テトラメチレングリコール、(ポリ)メチルペンタンジオール等のジオール成分とマレイン酸、フマル酸、コハク酸、アジピン酸、フタル酸、テトラヒドロフタル酸、ダイマー酸、2,2,4−トリメチルアジピン酸、シュウ酸、マロン酸、トリメリット酸、ピロメリット酸等の多塩基酸からなるポリエステルポリオールの(メタ)アクリレート類。(B-1) Polyol (meth) acrylate; 1,4 butanediol diacrylate, diethylene glycol diacrylate, hydroxypivalate ester neopentyl glycol diacrylate, trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, penta Erythritol triacrylate, dipentaerythritol hexaacrylate, tris (acryloyloxyethyl) isocyanurate,
(B-2) Polyester (meth) acrylate; (poly) ethylene glycol, (poly) propylene glycol, (poly) tetramethylene glycol, (poly) methylpentanediol and other diol components and maleic acid, fumaric acid, succinic acid, (Meth) acrylates of polyester polyols composed of polybasic acids such as adipic acid, phthalic acid, tetrahydrophthalic acid, dimer acid, 2,2,4-trimethyladipic acid, oxalic acid, malonic acid, trimellitic acid, pyromellitic acid Kind.
また、前記ジオール成分と多塩基酸とε−カプロラクトン、γ−ブチロラクトン、δ−バレロラクトン又はメチルバレロラクトンからなる環状ラクトン変性ポリエステルジオールの(メタ)アクリレート等の多官能(ポリ)エステル(メタ)アクリレート類等が挙げられるが、これらに限定されるものではない。
(B−3)エポキシ(メタ)アクリレートの原料となるエポキシド;(メチル)エピクロルヒドリンと、水添ビスフェノールA、水添ビスフェノールS、水添ビスフェノールFなどから合成されるエピクロルヒドリン変性水添ビスフェノール型エポキシ樹脂等の脂環式エポキシド、(メチル)エピクロルヒドリンと、ビスフェノールA、ビスフェノールS、ビスフェノールFなどから合成されるエピクロルヒドリン変性ビスフェノール型のエポキシ樹脂等の芳香族エポキシド。
(ポリ)エチレングリコール、(ポリ)プロピレングリコール、(ポリ)ブチレングリコール、(ポリ)テトラメチレングリコール、ネオペンチルグリコールなどのグリコール類、そのアルキレンオキシド変性物のポリグリシジルエーテル、トリメチロールプロパン、トリメチロールエタン、グリセリン、ジグリセリン、エリスリトール、ペンタエリスリトール、ソルビトール、1,4−ブタンジオール、1,6−ヘキサンジオールなどの脂肪族多価アルコールのグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテルの如き脂肪族エポキシ樹脂等のアルキレン型エポキシド。Also, polyfunctional (poly) ester (meth) acrylates such as (meth) acrylates of cyclic lactone-modified polyester diols composed of the diol component, polybasic acid, and ε-caprolactone, γ-butyrolactone, δ-valerolactone or methylvalerolactone However, it is not limited to these.
(B-3) Epoxide as raw material for epoxy (meth) acrylate; epichlorohydrin modified hydrogenated bisphenol type epoxy resin synthesized from (methyl) epichlorohydrin and hydrogenated bisphenol A, hydrogenated bisphenol S, hydrogenated bisphenol F, etc. Aromatic epoxides such as epichlorohydrin-modified bisphenol-type epoxy resins synthesized from alicyclic epoxides of (methyl) epichlorohydrin and bisphenol A, bisphenol S, bisphenol F, and the like.
Glycols such as (poly) ethylene glycol, (poly) propylene glycol, (poly) butylene glycol, (poly) tetramethylene glycol, neopentyl glycol, polyglycidyl ethers of modified alkylene oxides, trimethylolpropane, trimethylolethane Glycidyl ether of aliphatic polyhydric alcohols such as glycerin, diglycerin, erythritol, pentaerythritol, sorbitol, 1,4-butanediol, 1,6-hexanediol, neopentyl glycol diglycidyl ether, 1,6-hexanediol Alkylene type epoxides such as aliphatic epoxy resins such as diglycidyl ether;
また、アジピン酸、セバシン酸、マレイン酸、イタコン酸のなどのカルボン酸のグリシジルエステル、多価アルコールと多価カルボン酸とのポリエステルポリオールのグリシジルエーテル、グリシジル(メタ)アクルレート、メチルグリシジル(メタ)アクリレートの共重合体、高級脂肪酸のグリシジルエステル、エポキシ化アマニ油、エポキシ化大豆油、エポキシ化ひまし油、エポキシ化ポリブタジエン等の脂肪族エポキシ樹脂等が挙げられるが、これに限定されるものではない。
(B−4)ウレタン(メタ)アクリレートとしては、少なくとも一つの(メタ)アクリロイルオキシ基を有するヒドロキシ化合物(B−41)とイソシアネート化合物(B−42)との反応によって得られる(メタ)アクリレートの総称である。In addition, glycidyl esters of carboxylic acids such as adipic acid, sebacic acid, maleic acid, itaconic acid, glycidyl ethers of polyester polyols of polyhydric alcohols and polycarboxylic acids, glycidyl (meth) acrate, methyl glycidyl (meth) acrylate A glycidyl ester of higher fatty acid, epoxidized linseed oil, epoxidized soybean oil, epoxidized castor oil, epoxidized polybutadiene, and the like, but not limited thereto.
(B-4) As urethane (meth) acrylate, (meth) acrylate obtained by reaction of a hydroxy compound (B-41) having at least one (meth) acryloyloxy group and an isocyanate compound (B-42). It is a generic name.
少なくとも一つの(メタ)アクリロイルオキシ基を有するヒドロキシ化合物(B−41)としては、例えば、2−ヒドロキシエチル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、シクロヘキサンジメタノールモノ(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート又はグリシジル(メタ)アクリレート、等が挙げられるが、これらに限定されるものではない。 Examples of the hydroxy compound (B-41) having at least one (meth) acryloyloxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, Examples include, but are not limited to, cyclohexanedimethanol mono (meth) acrylate, polyethylene glycol mono (meth) acrylate, pentaerythritol tri (meth) acrylate, or glycidyl (meth) acrylate.
イソシアネート化合物(B−42);例えば、トリメチレンジイソシアネート、ヘキサメチレンジイソシアネート、1,4−シクロヘキサンジイソシアネート、リジンジイソシアネートメチルエステル、イソホロンジイソシアネート、等の脂肪族イソシアネート類、m−フェニレンジイソシアネート、4,4’−ジフェニルジイソシアネート、1,5−ナフタレンジイソシアネート、4,4’−ジフェニルメタンジイソシアネート(MDI)、2,4−または2,6−トリレンジイソシアネート、等の芳香族イソシアネート類、2,4−トリレンジイソシアネートの3量体、ヘキサメチレンジイソシアネート3量体、イソホロンジイソシアネート3量体、等の変性ポリイソシアネート類、上記イソシアネート化合物と各種ポリオール(B−43)とのウレタン化反応によって得られるポリイソシアネート等が挙げられる。 Isocyanate compound (B-42); For example, aliphatic isocyanates such as trimethylene diisocyanate, hexamethylene diisocyanate, 1,4-cyclohexane diisocyanate, lysine diisocyanate methyl ester, isophorone diisocyanate, m-phenylene diisocyanate, 4,4′- Aromatic isocyanates such as diphenyl diisocyanate, 1,5-naphthalene diisocyanate, 4,4′-diphenylmethane diisocyanate (MDI), 2,4- or 2,6-tolylene diisocyanate, 2,4-tolylene diisocyanate 3 , Modified polyisocyanates such as hexamethylene diisocyanate trimer, isophorone diisocyanate trimer, the above isocyanate compounds and various polyols (B-4) ) Polyisocyanates obtained by urethanization reaction and the like with.
ポリイソシアネートを製造するために用いられるポリオール(B−43)としては、例えば、(ポリ)エチレングリコール、(ポリ)プロピレングリコール、(ポリ)ブチレングリコール、(ポリ)テトラメチレングリコール等の(ポリ)アルキレングリコール類、エチレングリコール、プロパンジオール、プロピレングリコール、テトラメチレングリコール等のアルキレングリコール類のエチレンオキシド変性物、プロピレンオキシド変性物、ブチレンオキシド変性物、テトラヒドロフラン変性物、ε−カプロラクトン変性物、γ−ブチロラクトン変性物、δ−バレロラクトン変性物、メチルバレロラクトン変性物等、
エチレンオキシドとプロピレンオキシドの共重合体、プロピレングリコールとテトラヒドロフランの共重合体、エチレングリコールとテトラヒドロフランの共重合体、等が挙げられるが、これらに限定されるものではない。Examples of the polyol (B-43) used for producing the polyisocyanate include (poly) alkylene such as (poly) ethylene glycol, (poly) propylene glycol, (poly) butylene glycol, and (poly) tetramethylene glycol. Glycols, ethylene glycol, propanediol, propylene glycol, tetramethylene glycol and other alkylene glycol modified ethylene oxide, propylene oxide modified, butylene oxide modified, tetrahydrofuran modified, ε-caprolactone modified, γ-butyrolactone modified , Δ-valerolactone modified product, methyl valerolactone modified product, etc.
Examples include, but are not limited to, a copolymer of ethylene oxide and propylene oxide, a copolymer of propylene glycol and tetrahydrofuran, and a copolymer of ethylene glycol and tetrahydrofuran.
(B−5)ポリエーテル(メタ)アクリレートとしては、ポリエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、ポリテトラメチレングリコールジ(メタ)アクリレート等のアルキレングリコールジ(メタ)アクリレート類;
ネオペンチルグリコール1モルに1モル以上のエチレンオキシド、プロピレンオキシド、ブチレンオキシド及び/又はテトラヒドロフラン等の環状エーテルを付加して得たジオールのジ(メタ)アクリレート、ビスフェノールA、ビスフェノールF、ビスフェノールS等のビスフェノール類のアルキレンオキシド変性体のジ(メタ)アクリレート、水添ビスフェノールA、水添ビスフェノールF、水添ビスフェノールS等の水添ビスフェノール類のアルキレンオキシド変性体のジ(メタ)アクリレート、ジペンタエリスリトール1モルに1モル以上のエチレンオキシド、プロピレンオキシド、ブチレンオキシド及び/又はテトラヒドロフラン等の環状エーテル化合物を付加して得たトリオールのモノ又はポリ(メタ)アクリレート等のトリオール、テトラオール、ペンタオール、ヘキサオール等の多価アルコールの単官能(ポリ)エーテル(メタ)アクリレート又は多官能(ポリ)エーテル(メタ)アクリレート類等が挙げられるが、これらに限定されるものではない。(B-5) As polyether (meth) acrylate, alkylene glycol di (meth) acrylates such as polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate and polytetramethylene glycol di (meth) acrylate;
Di (meth) acrylate of diol obtained by adding 1 mol or more of cyclic ether such as ethylene oxide, propylene oxide, butylene oxide and / or tetrahydrofuran to 1 mol of neopentyl glycol, bisphenol such as bisphenol A, bisphenol F and bisphenol S Dialkylene oxide modified di (meth) acrylate, hydrogenated bisphenol A, hydrogenated bisphenol F, hydrogenated bisphenol S and other hydrogenated bisphenols alkylene oxide modified di (meth) acrylate, dipentaerythritol 1 mol Triol such as mono- or poly (meth) acrylate of triol obtained by adding 1 mol or more of cyclic ether compound such as ethylene oxide, propylene oxide, butylene oxide and / or tetrahydrofuran Monofunctional (poly) ether (meth) acrylates or polyfunctional (poly) ether (meth) acrylates of polyhydric alcohols such as ru, tetraol, pentaol, hexaol and the like, but are not limited thereto is not.
また、本発明において、ラジカル重合性基を2個以上有する化合物(B)としては、これら細述したラジカル重合性基を2個以上有する化合物を、1種で使用する事も、2種以上を組み合わせて使用する事も何ら制限はない。 In the present invention, as the compound (B) having two or more radical polymerizable groups, the compound having two or more radical polymerizable groups described above may be used alone or in combination of two or more. There are no restrictions on using them in combination.
更に、本発明においては、本発明の目的性能を阻害しない範囲において、ラジカル重合性基を1個だけ有する化合物を用いても良い。 Furthermore, in the present invention, a compound having only one radical polymerizable group may be used as long as the target performance of the present invention is not impaired.
また、必要に応じて各種添加剤を添加することができる。
添加剤としては、不飽和二重結合をもたない飽和化合物、光重合開始剤、熱重合開始剤、酸化防止剤、紫外線吸収剤、ラジカル重合禁止剤、前記イソシアネート基含有シラン化合物(2)以外のシランカップリング剤、光安定剤、可塑剤、無機充填剤、有機充填剤、熱安定剤、脱水剤、着色剤、防菌・防カビ剤、難燃剤、艶消し剤、消泡剤、レベリング剤、湿潤・分散剤、沈降防止剤、増粘剤・タレ防止剤、乳化剤、防曇剤、滑剤、防汚剤、帯電防止剤、導電剤等が挙げられる。Moreover, various additives can be added as needed.
Additives other than saturated compounds having no unsaturated double bond, photopolymerization initiators, thermal polymerization initiators, antioxidants, ultraviolet absorbers, radical polymerization inhibitors, and isocyanate group-containing silane compounds (2) Silane coupling agent, light stabilizer, plasticizer, inorganic filler, organic filler, heat stabilizer, dehydrating agent, colorant, antibacterial / antifungal agent, flame retardant, matting agent, antifoaming agent, leveling Agents, wetting / dispersing agents, anti-settling agents, thickeners / anti-sagging agents, emulsifiers, antifogging agents, lubricants, antifouling agents, antistatic agents, conductive agents and the like.
不飽和二重結合をもたない飽和化合物としては、ラジカル反応性の低いあるいは無い液状もしくは固体状のオリゴマーや樹脂を示し、例えば、液状ポリブタジエン、液状ポリブタジエン誘導体、液状クロロプレン、液状ポリペンタジエン、ジシクロペンタジエン誘導体、飽和ポリエステルオリゴマー、ポリエーテルオリゴマー、液状ポリアミド、ポリイソシアネートオリゴマー、石油樹脂、フッ素系オリゴマー/樹脂、シリコン系オリゴマー/樹脂、アルキッド樹脂、エポキシ樹脂・脂肪酸エステル、エポキシ樹脂、ポリウレタン樹脂、アクリル樹脂、等が挙げられるが、これらに限定されるものではない。 Saturated compounds having no unsaturated double bond include liquid or solid oligomers or resins having low or no radical reactivity, such as liquid polybutadiene, liquid polybutadiene derivatives, liquid chloroprene, liquid polypentadiene, dicyclohexane. Pentadiene derivative, saturated polyester oligomer, polyether oligomer, liquid polyamide, polyisocyanate oligomer, petroleum resin, fluorine oligomer / resin, silicon oligomer / resin, alkyd resin, epoxy resin / fatty acid ester, epoxy resin, polyurethane resin, acrylic resin However, it is not limited to these.
酸化防止剤としては、2,6−ジ−t−ブチル−p−クレゾール、ブチル化ヒドロキシアニソール、2,4,6−トリ−t−ブチルフェノール、2,2’−メチレン−ビス(4−メチル−6−t−ブチルフェノール)、4,4’−チオビス(3−メチル−6−t−ブチルフェノール)等のフェノール系酸化防止剤;ジラウリルチオジプロピオナート、ジミリスチルチオジプロピオナート、ジステアリルチオジプロピオナート等の硫黄系酸化防止剤;亜リン酸トリフェニル、亜リン酸ジフェニルイシデシル、亜リン酸トリス(ノニルフェニル)、亜リン酸4,4’−ブチリデン−ビス(3−メチル−6−t−ブチルフェニル−ジトリデシル)、亜リン酸環状ネオペンタンテトライルビス(オクタデシル)等のリン系酸化防止剤、等が挙げられるが、これらに限定されるものではない。これらのなかでもフェノール系酸化防止剤が、特に有効である。酸化防止剤の配合量は、本発明の硬化性組成物100質量部に対して、0.1〜10質量部であり、好ましくは0.5〜8質量部である。 Antioxidants include 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, 2,4,6-tri-t-butylphenol, 2,2′-methylene-bis (4-methyl- 6-t-butylphenol), 4,4'-thiobis (3-methyl-6-t-butylphenol) and other phenolic antioxidants; dilauryl thiodipropionate, dimyristyl thiodipropionate, distearyl thiodipro Sulfur-based antioxidants such as pionate; triphenyl phosphite, diphenyl isdecyl phosphite, tris (nonylphenyl) phosphite, 4,4′-butylidene-bis (3-methyl-6-phosphite) t-butylphenyl-ditridecyl), phosphorous antioxidants such as cyclic neopentanetetraylbis (octadecyl) phosphite, etc. , But it is not limited thereto. Of these, phenolic antioxidants are particularly effective. The compounding quantity of antioxidant is 0.1-10 mass parts with respect to 100 mass parts of curable composition of this invention, Preferably it is 0.5-8 mass parts.
紫外線吸収剤としては、2−ヒドロキシ−4−メトキシベンゾフェノン、2−ヒドロキシ−4−n−オクトキシベンゾフェノン等のベンゾフェノン系紫外線吸収剤;2(2’−ヒドロキシ−5−メチルフェニル)ベンゾトリアゾール、2(2’−ヒドロキシ−3’,5’−ジ−t−ブチルフェニル)ベンゾトリアゾール等のベンゾトリアゾール系紫外線吸収剤;フェニルサリチル酸エステル、p−t−ブチルフェニルサリチル酸エステル、p−オクチルフェニルサリチル酸エステル等のフェニルサリチル酸エステル系紫外線吸収剤;エチル−2−シアノ−3,3−ジフェニルアクリレート、メチル−2−カルボメトキシ−3−(p−メトキシ)−アクリレート等のシアノアクリレート系紫外線吸収剤;ニッケル−[2,2’−チオビス−(4−t−オクチル)−フェノレート]−n−ブチルアミン、ニッケルジブチルジチオカーバメート、コバルトジシクロヘキシルジチオホスフェート等の金属錯塩系紫外線吸収剤;レゾルシノールーモノベンゾエート、2’−エチル−ヘキシル−2−シアン、3−フェニルシンナメート等のその他の紫外線吸収剤等が挙げられるが、これらに限定されるものではない。これらのなかでも特に、ベンゾトリアゾール系が好ましい。 Examples of the ultraviolet absorber include benzophenone-based ultraviolet absorbers such as 2-hydroxy-4-methoxybenzophenone and 2-hydroxy-4-n-octoxybenzophenone; 2 (2′-hydroxy-5-methylphenyl) benzotriazole, 2 Benzotriazole ultraviolet absorbers such as (2′-hydroxy-3 ′, 5′-di-t-butylphenyl) benzotriazole; phenyl salicylic acid ester, pt-butylphenyl salicylic acid ester, p-octylphenyl salicylic acid ester, etc. Phenyl salicylic acid ester UV absorbers; cyanoacrylate UV absorbers such as ethyl-2-cyano-3,3-diphenyl acrylate, methyl-2-carbomethoxy-3- (p-methoxy) -acrylate; nickel- [ 2,2′-thiobis- (4 t-octyl) -phenolate] -n-butylamine, nickel dibutyldithiocarbamate, cobalt dicyclohexyldithiophosphate and other metal complex UV absorbers; resorcinol-monobenzoate, 2′-ethyl-hexyl-2-cyanate, 3-phenyl Although other ultraviolet absorbers, such as a cinnamate, are mentioned, it is not limited to these. Among these, a benzotriazole type is particularly preferable.
紫外線吸収剤の添加量は、本発明の硬化性組成物100質量部に対して、0.1〜10質量部であり、好ましくは0.5〜8質量部である。 The addition amount of an ultraviolet absorber is 0.1-10 mass parts with respect to 100 mass parts of curable compositions of this invention, Preferably it is 0.5-8 mass parts.
光安定化剤としては、ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)セパケート、ビス(2,2,6,6−テトラメチル−4−ピペリジル)セパケート、2−(3,5−ジ−t−ブチル−4−ヒドロキシベンゼル)−2−n−ブチルマロン酸ビス(1,2,2,6,6−ペンタメチル−4−ピペリジル)、コハク酸ジメチル−1−(2−ヒドロキシルエチル)−4−ヒドロキシ−2,2,6,6−テトラメチルピペリジン重緒合物、等のヒンダードアミン系光安定剤が挙げられるが、これらに限定されるものではない。 Examples of the light stabilizer include bis (1,2,2,6,6-pentamethyl-4-piperidyl) separate, bis (2,2,6,6-tetramethyl-4-piperidyl) separate, 2- (3 , 5-di-t-butyl-4-hydroxybenzel) -2-n-butylmalonate bis (1,2,2,6,6-pentamethyl-4-piperidyl), dimethyl succinate-1- (2 (Hydroxylethyl) -4-hydroxy-2,2,6,6-tetramethylpiperidine complex, hindered amine light stabilizers and the like can be mentioned, but are not limited thereto.
その他のシランカップリング剤としては、不飽和シラン、アミノシラン、エポキシシラン、メルカプトシラン等を、添加しても良い。 As other silane coupling agents, unsaturated silane, aminosilane, epoxy silane, mercaptosilane, and the like may be added.
本発明の硬化性樹脂組成物は、溶剤、増粘剤等の添加により様々な塗工方法による塗工が可能である。例えば、ディッピング、スピンコート、カーテンコート、スプレーコート、スクリーンコート、バーコート、グラビアコート、ロールコート、ブレードコート、エアーナイフコート等の塗工方式が挙げられる。溶剤を含む組成物の場合は使用溶媒の乾燥に必要な条件で乾燥した後、熱または活性エネルギー線の照射により重合・硬化させることができる。塗工(乾燥)後の組成物の塗膜厚みは0.5μm〜300μmで任意に選択できる。 The curable resin composition of the present invention can be applied by various coating methods by adding a solvent, a thickener and the like. Examples of the coating method include dipping, spin coating, curtain coating, spray coating, screen coating, bar coating, gravure coating, roll coating, blade coating, and air knife coating. In the case of a composition containing a solvent, the composition can be polymerized and cured by irradiation with heat or active energy rays after drying under the conditions necessary for drying the solvent used. The coating thickness of the composition after coating (drying) can be arbitrarily selected from 0.5 μm to 300 μm.
ここで用いる熱供給源としては、種々の熱源を用いた熱風オーブンや赤外線ランプ、遠赤外線ヒーター等を挙げられる。また、活性エネルギー線としては、紫外線、電子線、α線、β線、γ線のような電離放射線を挙げられる。これらの中で、紫外線、電子線が特に有用である。紫外線発生源としては、紫外線ランプを用いて波長100〜400nmの紫外線を照射する方法が好ましく、この紫外線ランプの具体例としては、低圧水銀ランプ、中圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、キセノンランプ、メタルハライドランプ等が挙げられる。電子線源としては、線状フィラメント型、走査型等の種々のタイプの電子線加速器を使用することができ、放出されるエネルギーが20〜1000keV、好ましくは30〜300keVである電子ビームを、0.1〜10メガラド(Mrad)の線量で照射するとよい。 Examples of the heat supply source used here include hot air ovens, infrared lamps, far-infrared heaters, and the like using various heat sources. Examples of active energy rays include ionizing radiation such as ultraviolet rays, electron beams, α rays, β rays, and γ rays. Among these, ultraviolet rays and electron beams are particularly useful. As an ultraviolet ray generation source, a method of irradiating ultraviolet rays having a wavelength of 100 to 400 nm using an ultraviolet lamp is preferable. Specific examples of the ultraviolet lamp include a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, and an ultrahigh pressure mercury lamp. Xenon lamp, metal halide lamp and the like. As the electron beam source, various types of electron beam accelerators such as a linear filament type and a scanning type can be used. An electron beam whose emitted energy is 20 to 1000 keV, preferably 30 to 300 keV, Irradiation with a dose of 1 to 10 megarads (Mrad) is recommended.
紫外線を用いた硬化には、光重合開始剤を添加することができる。光重合開始剤としては、分子内結合開裂型と分子内水素引き抜き型の2種に大別できる。 A photopolymerization initiator can be added to the curing using ultraviolet rays. Photopolymerization initiators can be broadly classified into two types: intramolecular bond cleavage type and intramolecular hydrogen abstraction type.
光重合開始剤としては、光により、分子内で結合が開裂し、重合開始用活性種が発生するものと、分子間で反応等を起こし、重合開始用活性種が発生するものとある。前者の例として、例えば、ジエトキシアセトフェノン、4−(2−ヒドロキシエトキシ)フェニル−(2−ヒドロキシ−2−プロピル)ケトン、2−メチル−2−モルホリノ(4−チオメチルフェニル)プロパン−1−オン(チバ・ガイギー社製「イルガキュア907」)、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−ブタノン2−ヒドロキシ−2−メチル−1−フェニルプロパン−1−オン(メルク社製「ダロキュア1173」)、1−ヒドロキシシクロヘキシルフェニルケトン(チバ・ガイギー社製「イルガキュア184」)、1−(4−イソプロピルフェニル)−2−ヒドロキシ−2−メチルプロパン−1−オン(メルク社製「ダロキュア1116」)、ベンジルジメチルケタール(チバ・ガイギー社製「イルガキュア651」)、オリゴ{2−ヒドロキシ−2−メチル−1−「4−(1−メチルビニル)フェニル」プロパン}(ラムベルティ社製エサキュアーKIP100)、4−(2−アクリロイル−オキシエトキシ)フェニル−2−ヒドロキシ−2−プロピルケトン(チバ・ガイギー社製「ZLI3331」等のアセトフェノン系、ベンゾイン、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾイン系、1−ヒドロキシシクロヘキシルフェニルケトンとベンゾフェノンとの混合物(チバ・ガイギー社製「イルガキュア500」)、2,4,6−トリメチルベンゾイルジフェニルホスフィンオキサイド(BASF社製「ルシリンTPO」)、ビスアシルホスフィンオキサイド(チバガイギー社製「CGI1700」)等のアシルホスフィンオキサイド系、ベンジル、メチルフェニルグリオキシエステル、3,3’,4,4’,−テトラ(t−ブチルパーオキシカルボニル)ベンゾフェノン(日本油脂社製BTTB)等が挙げられるが、これらに限定されるものではない。 Examples of the photopolymerization initiator include those in which a bond is cleaved in the molecule by light to generate an active species for initiating polymerization, and those in which a reaction or the like occurs between molecules to generate an active species for initiating polymerization. Examples of the former include, for example, diethoxyacetophenone, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 2-methyl-2-morpholino (4-thiomethylphenyl) propane-1- ON ("Irgacure 907" manufactured by Ciba-Geigy), 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone 2-hydroxy-2-methyl-1-phenylpropan-1-one (Merck “Darocur 1173”), 1-hydroxycyclohexyl phenyl ketone (“Irgacure 184” manufactured by Ciba-Geigy), 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one (Merck) "Darocur 1116"), benzyldimethyl ketal (Ciba Geigy) Lugacure 651 "), oligo {2-hydroxy-2-methyl-1-" 4- (1-methylvinyl) phenyl "propane} (Esacure KIP100 manufactured by Ramberty), 4- (2-acryloyl-oxyethoxy) phenyl- 2-hydroxy-2-propylketone (acetphenone series such as “ZLI3331” manufactured by Ciba-Geigy), benzoin series such as benzoin, benzoin isopropyl ether and benzoin isobutyl ether, a mixture of 1-hydroxycyclohexyl phenyl ketone and benzophenone (Ciba “Irgacure 500” manufactured by Geigy Corporation), 2,4,6-trimethylbenzoyldiphenylphosphine oxide (“Lucirin TPO” manufactured by BASF Corporation), bisacylphosphine oxide (“CGI1700 manufactured by Ciba Geigy Corporation) ) And the like, benzyl, methylphenylglyoxyester, 3,3 ′, 4,4 ′,-tetra (t-butylperoxycarbonyl) benzophenone (BTTB manufactured by NOF Corporation) and the like. It is not limited to these.
後者としては、例えば、ベンゾフェノン、ο−ベンゾイル安息香酸メチル、4−フェニルベンゾフェノン、4,4’−ジクロロベンゾフェノン、ヒドロキシベンゾフェノン、4−ベンゾイル−4’−メチル−ジフェニルサルファイド、アクリル化ベンゾフェノン、3,3’,4,4’−テトラ(t−ブチルパーオキシカルボニル)ベンゾフェノン、3,3’−ジメチル−4−メトキシベンゾフェノン等のベンゾフェノン系、2−イソプロピルチオキサントン、2,4−ジメチルチオキサントン、2,4−ジエチルチオキサントン、2,4−ジクロロチオキサントン等のチオキサントン系、ミヒラーケトン、4,4’−ジエチルアミノベンゾフェノン等のアミノベンゾフェノン系、10−ブチル−2−クロロアクリドン、2−エチルアンスラキノン、9,10−フェナンスレンキノン、カンファーキノン等が挙げられるが、これらに限定されるものではない。 Examples of the latter include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4,4'-dichlorobenzophenone, hydroxybenzophenone, 4-benzoyl-4'-methyl-diphenyl sulfide, acrylated benzophenone, 3,3 Benzophenones such as', 4,4'-tetra (t-butylperoxycarbonyl) benzophenone, 3,3'-dimethyl-4-methoxybenzophenone, 2-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4- Thioxanthones such as diethylthioxanthone and 2,4-dichlorothioxanthone, Michler's ketone, aminobenzophenones such as 4,4′-diethylaminobenzophenone, 10-butyl-2-chloroacridone, 2-ethylanthrack Emissions, 9,10-phenanthrenequinone, but camphorquinone, and the like, but is not limited thereto.
光重合開始剤を使用する場合の使用割合は、本発明の活性エネルギー線硬化性樹脂組成物100質量部に対して、0.1〜20.0質量部であり、好ましくは0.5〜10質量部の範囲にあることが好ましい。 The use ratio in the case of using a photoinitiator is 0.1-20.0 mass parts with respect to 100 mass parts of active energy ray-curable resin compositions of this invention, Preferably it is 0.5-10. It is preferably in the range of parts by mass.
本発明の硬化性樹脂組成物に紫外線照射をする場合、上記の光重合開始剤の添加だけでも硬化するが、硬化性をより向上させるために、光増感剤を併用することができる。かかる光増感剤としては、例えばトリエタノールアミン、メチルジエタノールアミン、トリイソプロパノールアミン、4−ジメチルアミノ安息香酸メチル、4−ジメチルアミノ安息香酸エチル、4−ジメチルアミノ安息香酸イソアミル、安息香酸(2−ジメチルアミノ)エチル、4−ジメチルアミノ安息香酸(n−ブトキシ)エチル、4−ジメチルアミノ安息香酸2−エチルヘキシル等のアミン類が挙げられるが、これらに限定されるものではない。 When the curable resin composition of the present invention is irradiated with ultraviolet rays, it is cured only by adding the photopolymerization initiator, but a photosensitizer can be used in combination in order to further improve the curability. Examples of the photosensitizer include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and benzoic acid (2-dimethyl). Examples of amines include, but are not limited to, amino) ethyl, 4-dimethylaminobenzoic acid (n-butoxy) ethyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, and the like.
光増感剤の配合量は、本発明の硬化性樹脂組成物100質量部に対して、0.1〜20質量部であり、好ましくは0.5〜10質量部の範囲にあることが好ましい。 The compounding quantity of a photosensitizer is 0.1-20 mass parts with respect to 100 mass parts of curable resin composition of this invention, It is preferable that it exists in the range of 0.5-10 mass parts preferably. .
熱を用いての硬化には、熱重合開始剤を用いると、低温で短時間の硬化が可能となる。 When a thermal polymerization initiator is used for curing using heat, curing can be performed at a low temperature for a short time.
熱重合開始剤としては、2,4−ジクロロベンゾイルパーオキサイド、ベンゾイルパーオキサイド、1,1−ジ(t−ブチルパーオキシ)−3,3,5−トリメチルシクロヘキサン、n−ブチル−4,4’−ジ(t−ブチルパーオキシ)バレレート、ジクミルパーオキサイド等の過酸化物類;7−アゾビスイソブチルニトリル等のアゾ化合物類等が挙げられるが、これらに限定されるものではない。熱重合開始剤は経時により分解が起きるので、塗工直前に添加することが好ましい。添加量としては、本発明の硬化性樹脂組成物100質量部に対して0.1〜2質量部配合すると良い。 As the thermal polymerization initiator, 2,4-dichlorobenzoyl peroxide, benzoyl peroxide, 1,1-di (t-butylperoxy) -3,3,5-trimethylcyclohexane, n-butyl-4,4 ′ -Peroxides such as di (t-butylperoxy) valerate and dicumyl peroxide; azo compounds such as 7-azobisisobutylnitrile and the like, but are not limited thereto. Since the thermal polymerization initiator decomposes with time, it is preferably added immediately before coating. As addition amount, it is good to mix | blend 0.1-2 mass parts with respect to 100 mass parts of curable resin composition of this invention.
本発明の硬化物は、各種基材へ塗膜することにより各種基材表面の保護膜としての利用が可能である。このような基材として公知慣用のものを使用することができ、例えば、プラスチック、金属、木材、紙、ガラス、スレート等を挙げることができる。これら基材の形状は板状、フィルム状又は3次元成形体でもよい。そして、本発明の硬化物は、高硬度及び耐擦傷性を有するとともに、フィルム作製時のカール性が小さいので、特に大型化した液晶ディスプレイ、プラズマディスプレイ、タッチパネルディスプレイ等の表示体に好ましく使用することができる。 The cured product of the present invention can be used as a protective film on the surface of various substrates by coating on various substrates. As such a base material, known and conventional materials can be used, and examples thereof include plastic, metal, wood, paper, glass, and slate. The shape of these base materials may be a plate shape, a film shape, or a three-dimensional molded body. And since the hardened | cured material of this invention has high hardness and abrasion resistance, and the curl property at the time of film preparation is small, it should be preferably used for display bodies, such as a liquid crystal display, a plasma display, a touch panel display which enlarged especially. Can do.
本発明で使用される透明基材は、光学用途に使用されている素材のものであれば特に限定されないが、特にポリエチレンテレフタレート(PET)、トリアセチルセルロース(TAC)、ポリカーボネート、ポリメタクリレート、ポリスチレン、ポリエステル、ポリオレフィン、エポキシ、メラミン、ABS、AS、シクロオレフィン系樹脂等の各種プラスチックフィルムであることが好ましい。使用される透明基材の厚さは、用途により適宜変更することができるが、例えば、10〜5000μmの厚さの基材を使用することができる。 The transparent substrate used in the present invention is not particularly limited as long as it is a material used for optical applications, but in particular, polyethylene terephthalate (PET), triacetyl cellulose (TAC), polycarbonate, polymethacrylate, polystyrene, Various plastic films such as polyester, polyolefin, epoxy, melamine, ABS, AS, and cycloolefin resin are preferable. Although the thickness of the transparent base material used can be suitably changed according to the use, for example, a base material having a thickness of 10 to 5000 μm can be used.
本発明のハードコートフィルムは、透明基材上に上記硬化膜を積層して得ることができ、好適な透明基材や、硬化膜の塗工方法は、前述の通りである。また、フィルムのヘイズ値が1%を超えると光学用途に使用した場合に像の鮮明度が劣るため好ましくない。このような理由から、フィルムのヘイズは0.5%以下であることが好ましく、0.1%以下であることが特に好ましい。 The hard coat film of this invention can be obtained by laminating | stacking the said cured film on a transparent base material, The suitable transparent base material and the coating method of a cured film are as above-mentioned. Further, if the haze value of the film exceeds 1%, it is not preferable because the sharpness of the image is inferior when used for optical applications. For these reasons, the haze of the film is preferably 0.5% or less, and particularly preferably 0.1% or less.
以下、実施例及び比較例によって本発明を更に具体的に説明する。もとより、本発明は、これらの例に限定されるものではない。「部」は「質量部」を示す。 Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples. Of course, the present invention is not limited to these examples. “Part” means “part by mass”.
(合成例1)ウレタンアクリレート(B−4)の合成
攪拌機、ガス導入管、冷却管、及び温度計を備えたフラスコに、酢酸ブチル263部、イソホロンジイソシアネート222部、メトキシハイドロキノン0.5部、ジブチル錫ジアセテート0.5部を仕込み、70℃に昇温した後、活性水素を有するラジカル重合性化合物(3):ペンタエリスリトールトリアクリレート/ラジカル重合性基を2個以上有する化合物(B):ペンタエリスリトールテトラアクリレート混合物(質量比60/40の混合物)(以下、「PE3A/PE4A=60/40」という)1067部を1時間かけて滴下した。滴下終了後、70℃で3時間反応させ、さらにイソシアネート基を示す2250cm−1の赤外線吸収スペクトルが消失するまで反応を行い、ウレタンアクリレート(B1)/「PE3A/PE4A=60/40」(不揮発分83%の酢酸ブチル溶液)からなる合成物を得た。なお、ウレタンアクリレートの分子量は732である。(Synthesis Example 1) Synthesis of urethane acrylate (B-4) In a flask equipped with a stirrer, a gas introduction tube, a cooling tube, and a thermometer, 263 parts of butyl acetate, 222 parts of isophorone diisocyanate, 0.5 part of methoxyhydroquinone, dibutyl After charging 0.5 part of tin diacetate and raising the temperature to 70 ° C., radically polymerizable compound having active hydrogen (3): pentaerythritol triacrylate / compound having two or more radically polymerizable groups (B): pentane 1067 parts of an erythritol tetraacrylate mixture (mixture having a mass ratio of 60/40) (hereinafter referred to as “PE3A / PE4A = 60/40”) were added dropwise over 1 hour. After completion of the dropwise addition, the mixture is reacted at 70 ° C. for 3 hours, and further reacted until the infrared absorption spectrum of 2250 cm −1 showing the isocyanate group disappears, and urethane acrylate (B1) / “PE3A / PE4A = 60/40” (nonvolatile content) 83% butyl acetate solution) was obtained. The molecular weight of urethane acrylate is 732.
(合成例2)エポキシメタタクリレート(B−3)の合成
攪拌機、ガス導入管、冷却管、及び温度計を備えたフラスコに、グリシジルメタクリレート(以下、「GMA」という。)250部、ラウリルメルカプタン1.6部、メチルイソブチルケトン(以下、「MIBK」という。)1000部及び2,2’−アゾビスイソブチロニトリル(以下、「AIBN」という。)7.5部を仕込み、窒素気流下で攪拌しながら、1時間かけて90℃に昇温し、90℃で1時間反応させた。次いで、90℃で攪拌しながら、GMA750部、ラウリルメルカプタン4.4部、AIBN22.5部からなる混合液を2時間かけて滴下した後、100℃で3時間反応させた。その後、AIBN10部を仕込み、さらに100℃で1時間反応させた後、120℃付近に昇温し、2時間反応させた。60℃まで冷却し、窒素導入管を、空気導入管に付け替え、アクリル酸(以下、「AA」という。)507部、メトキノン2.0部、トリフェニルフォスフィン5.4部を加えて混合した後、空気で反応液をバブリングしながら、110℃まで昇温し、8時間反応させた。その後、メトキノン1.4部を加え、室温まで冷却後、不揮発分が50%になるように、MIBKを加え、ポリエステルメタクリレート(B2)(不揮発分50%のMIBK溶液)を得た。なお、得られたポリエステルメタクリレートの重量平均分子量は11,000(GPCによるポリスチレン換算による)で、(メタ)アクリロイル基当量は300g/eqであった。(Synthesis Example 2) Synthesis of Epoxy Methacrylate (B-3) In a flask equipped with a stirrer, a gas introduction tube, a cooling tube, and a thermometer, 250 parts of glycidyl methacrylate (hereinafter referred to as “GMA”), lauryl mercaptan 1.6 parts, 1000 parts of methyl isobutyl ketone (hereinafter referred to as “MIBK”) and 7.5 parts of 2,2′-azobisisobutyronitrile (hereinafter referred to as “AIBN”) were charged in a nitrogen stream. The mixture was heated to 90 ° C. over 1 hour while being stirred at 50 ° C. and reacted at 90 ° C. for 1 hour. Next, while stirring at 90 ° C., a mixed solution consisting of 750 parts of GMA, 4.4 parts of lauryl mercaptan, and 22.5 parts of AIBN was dropped over 2 hours, and then reacted at 100 ° C. for 3 hours. Thereafter, 10 parts of AIBN was charged and further reacted at 100 ° C. for 1 hour, and then heated to around 120 ° C. and reacted for 2 hours. After cooling to 60 ° C., the nitrogen introduction tube was replaced with an air introduction tube, and 507 parts of acrylic acid (hereinafter referred to as “AA”), 2.0 parts of methoquinone, and 5.4 parts of triphenylphosphine were added and mixed. Then, while bubbling the reaction solution with air, the temperature was raised to 110 ° C. and the reaction was allowed to proceed for 8 hours. Thereafter, 1.4 parts of methoquinone was added, and after cooling to room temperature, MIBK was added so that the nonvolatile content was 50% to obtain polyester methacrylate (B2) (MIBK solution having a nonvolatile content of 50%). In addition, the weight average molecular weight of the obtained polyester methacrylate was 11,000 (in terms of polystyrene by GPC), and the (meth) acryloyl group equivalent was 300 g / eq.
(実施例1)
「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社、固形分30%、溶剤イソプロパノール(以下IPAという)、平均粒子径12.5nm)600部、水22部、エタノール86部を、撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)10部を30分かけ滴下し、次いで、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)54部を1時間かけ滴下して24時間保持した。
本実施例により、無機粒子(1)180部、シラン化合物(2)64部、活性水素を有するラジカル重合性化合物(3)120部からなる化合物(A1)と、ラジカル重合性基を2個以上有する化合物(B)80部、溶剤として、IPA420部、エタノール86部、水22部からなる硬化性樹脂組成物(実施例1組成物)を966部を得た。Example 1
200 parts of “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B): PE4A = 60/40”, inorganic particles (1): Snowtex IPA-ST ( Nissan Chemical Industries, Ltd., solid content 30%, solvent isopropanol (hereinafter referred to as IPA), 600 parts of average particle diameter 12.5 nm, 22 parts of water, 86 parts of ethanol, stirring device, thermometer, reflux condenser, and dropping While stirring at 30 ° C., 10 parts of silane compound (2): MS-51 (manufactured by Colcoat Co., tetramethoxysilane tetramer) was added dropwise over 30 minutes while stirring at 30 ° C. Silane compound (2): 54 parts of ES28 (manufactured by Colcoat Co., Ltd., tetraethoxysilane) was dropped over 1 hour and held for 24 hours.
According to this example, 180 parts of inorganic particles (1), 64 parts of silane compound (2), radically polymerizable compound (3) having 120 parts of active hydrogen (A1), and two or more radically polymerizable groups 966 parts of a curable resin composition (composition of Example 1) comprising 80 parts of the compound (B) having, 420 parts of IPA, 86 parts of ethanol, and 22 parts of water were obtained as a solvent.
(実施例2)
活性水素を有するラジカル重合性化合物(3):ジペンタエリスリトールペンタアクリレート/ラジカル重合性基を2個以上有する化合物(B):ジペンタエリスリトールヘキサアクリレート混合物(質量比35/65の混合物)(以下、「DP5A/DP6A=35/65」という)200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)133部、水12部、エタノール220部を、撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)36部を30分かけ滴下して24時間保持した。
本実施例により、無機粒子(1)40部、シラン化合物(2)36部、活性水素を有するラジカル重合性化合物(3)70部からなる化合物(A2)と、ラジカル重合性基を2個以上有する化合物(B)130部、溶剤として、IPA93部、エタノール220部、水12部を含む硬化性樹脂組成物(実施例2組成物)601部を得た。(Example 2)
Radical polymerizable compound having active hydrogen (3): dipentaerythritol pentaacrylate / compound having two or more radical polymerizable groups (B): dipentaerythritol hexaacrylate mixture (mixture of mass ratio 35/65) (hereinafter, 200 parts of "DP5A / DP6A = 35/65"), inorganic particles (1): 133 parts of Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 12 parts of water, 220 parts of ethanol, a stirrer, a thermometer, A flask equipped with a reflux condenser and a dropping funnel was charged. While stirring at 30 ° C., 36 parts of silane compound (2): ES28 (manufactured by Colcoat Co., Ltd., tetraethoxysilane) was added dropwise over 30 minutes to 24 Held for hours.
According to this example, 40 parts of inorganic particles (1), 36 parts of silane compound (2), radically polymerizable compound (3) having active hydrogen (3) 70 parts, and two or more radically polymerizable groups A curable resin composition (Example 2 composition) 601 parts containing 130 parts of the compound (B) having, and 93 parts of IPA, 220 parts of ethanol, and 12 parts of water as a solvent was obtained.
(実施例3)
活性水素を有するラジカル重合性化合物(3):ジペンタエリスリトールペンタアクリレート/ラジカル重合性基を2個以上有する化合物(B):ジペンタエリスリトールヘキサアクリレート混合物(質量比55/45の混合物)(以下、「DP5A/DP6A=55/45」という)200部、無機粒子(1):スノーテックスIPA−ST―S(日産化学工業株式会社、固形分25%、溶剤IPA、平均粒子径9.5nm)640部、水50部、エタノール50部を、撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)145部を1時間かけ滴下し、次いでシラン化合物(2):メチルトリメトキシシラン10部を15分かけ滴下して24時間保持した。
本実施例により、無機粒子(1)160部、シラン化合物(2)155部、活性水素を有するラジカル重合性化合物(3)110部からなる化合物(A3)と、ラジカル重合性基を2個以上有する化合物(B)90部、溶剤として、IPA480部、水50部を含む硬化性樹脂組成物(実施例3組成物)1045部を得た。(Example 3)
Radical polymerizable compound having active hydrogen (3): dipentaerythritol pentaacrylate / compound having two or more radical polymerizable groups (B): dipentaerythritol hexaacrylate mixture (mixture of mass ratio 55/45) (hereinafter, 200 parts “DP5A / DP6A = 55/45”), inorganic particles (1): Snowtex IPA-ST-S (Nissan Chemical Industries, Ltd., solid content 25%, solvent IPA, average particle size 9.5 nm) 640 Part, 50 parts of water and 50 parts of ethanol were charged into a flask equipped with a stirrer, thermometer, reflux condenser and dropping funnel, and stirred at 30 ° C., while stirring the silane compound (2): ES28 (Colcoat Co., Ltd.). ), Tetraethoxysilane) 145 parts was added dropwise over 1 hour, and then silane compound (2): methyltrimethoxysila 10 parts of 15 minutes over a period dropwise to and held for 24 hours.
According to this example, 160 parts of inorganic particles (1), 155 parts of silane compound (2), radically polymerizable compound (3) having 110 parts of active hydrogen (A3), and two or more radically polymerizable groups 1045 parts of a curable resin composition (Example 3 composition) containing 90 parts of the compound (B) having, 480 parts of IPA as a solvent, and 50 parts of water were obtained.
(実施例4)
「活性水素を有するラジカル重合性化合物(3):DP5A/ラジカル重合性基を2個以上有する化合物(B):DP6A=55/45」140部、活性水素を有するラジカル重合性化合物(3):イソシアヌル酸EO変性ジアクリレート(東亞合成株式会社製:アロニックスM−215)60部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)600部、水14部、エタノール100部を、撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)40部を1時間かけ滴下して24時間保持した。
本実施例により、無機粒子(1)180部、シラン化合物(2)40部、活性水素を有するラジカル重合性化合物(3)137部からなる化合物(A4)と、ラジカル重合性基を2個以上有する化合物(B)63部、溶剤として、IPA420部、エタノール100部、水14部を含む硬化性樹脂組成物(実施例4組成物)954部を得た。Example 4
"Radically polymerizable compound having active hydrogen (3): DP5A / compound having two or more radically polymerizable groups (B): DP6A = 55/45" 140 parts, radically polymerizable compound having active hydrogen (3): 60 parts of isocyanuric acid EO-modified diacrylate (manufactured by Toagosei Co., Ltd .: Aronix M-215), inorganic particles (1): 600 parts of Snowtex IPA-ST (Nissan Chemical Industries), 14 parts of water, 100 parts of ethanol , A silane compound (2): MS-51 (manufactured by Colcoat Co., Ltd., tetramethoxysilane 4 amount) while stirring at 30 ° C. while stirring in a flask equipped with a stirrer, thermometer, reflux condenser, and dropping funnel Body) 40 parts were dropped over 1 hour and held for 24 hours.
According to this example, the compound (A4) composed of 180 parts of inorganic particles (1), 40 parts of a silane compound (2), 137 parts of a radical polymerizable compound (3) having active hydrogen, and two or more radical polymerizable groups 954 parts of a curable resin composition (Example 4 composition) containing 63 parts of the compound (B) having and 420 parts of IPA, 100 parts of ethanol, and 14 parts of water as a solvent were obtained.
(実施例5)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、無機粒子(1):スノーテックスMEK−ST(日産化学工業株式会社、固形分30%、溶剤メチルエチルケトン(以下MEKと示す)、平均粒子径12.5nm))600部、ジブチルスズジラウレート0.5部を仕込み、60℃にて撹拌しながら、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)50部を1時間かけて滴下し、60℃で6時間撹拌してシリル基を持つ無機粒子を得た。また別に、撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」200部、水22部、MEK86部を仕込み、上記シリル基を持つ無機粒子を60℃にて撹拌しながら2時間かけ滴下した。次いで、撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)12部を30分かけ滴下し、80℃で8時間撹拌して塗料を得た。
本実施例により、無機粒子(1)180部、シラン化合物(2)62部、活性水素を有するラジカル重合性化合物(3)120部からなる化合物(A5)と、ラジカル重合性基を2個以上有する化合物(B)80部、溶剤として、MEK506部、水22部を含む硬化性樹脂組成物(実施例5組成物)970部を得た。(Example 5)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, inorganic particles (1): Snowtex MEK-ST (Nissan Chemical Industries, Ltd., solid content 30%, solvent methyl ethyl ketone (hereinafter referred to as MEK) , Average particle diameter 12.5 nm)) 600 parts, dibutyltin dilaurate 0.5 parts, while stirring at 60 ° C., 50 parts of silane compound (2): ES28 (manufactured by Colcoat Co., Ltd., tetraethoxysilane) The solution was added dropwise over 1 hour and stirred at 60 ° C. for 6 hours to obtain inorganic particles having a silyl group. Separately, in a flask equipped with a stirrer, thermometer, reflux condenser, and dropping funnel, “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B)” : PE4A = 60/40 "200 parts, 22 parts of water and 86 parts of MEK were charged, and the above silyl group-containing inorganic particles were added dropwise over 2 hours while stirring at 60 ° C. Subsequently, 12 parts of silane compound (2): MS-51 (manufactured by Colcoat Co., Ltd., tetramethoxysilane tetramer) was dropped over 30 minutes while stirring, and the mixture was stirred at 80 ° C. for 8 hours to obtain a paint. .
According to this example, 180 parts of inorganic particles (1), 62 parts of silane compound (2), radically polymerizable compound (3) having 120 parts of active hydrogen (A5), and two or more radically polymerizable groups 970 parts of curable resin composition (Example 5 composition) containing 80 parts of the compound (B) having, 506 parts of MEK and 22 parts of water as a solvent were obtained.
(実施例6)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」200部、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)40部、ジブチルスズジラウレート0.3部、p−メトキシフェノール0.2部を仕込み、80℃で15時間生成するメタノールを留去しながら撹拌して、シリル基を持つラジカル重合性化合物を得た。次いで、60℃で撹拌しながら、無機粒子(1):スノーテックスMEK−ST(日産化学工業株式会社)600部と水15部の混合溶液を2時間かけ滴下し、そのまま60℃で6時間保持した。
本実施例により、無機粒子(1)180部、シラン化合物(2)40部、活性水素を有するラジカル重合性化合物(3)120部からなる化合物(A6)と、ラジカル重合性基を2個以上有する化合物(B)80部、溶剤として、MEK420部、水15部を含む硬化性樹脂組成物(実施例6組成物)855部を得た。(Example 6)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B): PE4A = 60/40 "200 parts, Silane compound (2): MS-51 (manufactured by Colcoat Co., tetramethoxysilane tetramer) 40 parts, dibutyltin dilaurate 0.3 part, p-methoxyphenol 0.2 part The mixture was stirred while distilling off methanol produced at 80 ° C. for 15 hours to obtain a radical polymerizable compound having a silyl group. Next, while stirring at 60 ° C., a mixed solution of inorganic particles (1): 600 parts of Snowtex MEK-ST (Nissan Chemical Industry Co., Ltd.) and 15 parts of water is dropped over 2 hours, and kept at 60 ° C. for 6 hours. did.
According to this example, 180 parts of inorganic particles (1), 40 parts of silane compound (2), radically polymerizable compound (3) having 120 parts of active hydrogen (A6), and two or more radically polymerizable groups 855 parts of curable resin composition (Example 6 composition) containing 80 parts of the compound (B) having, 420 parts of MEK as a solvent, and 15 parts of water were obtained.
(実施例7)
(実施例1組成物)966部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例7組成物)を得た。
(実施例8)
(実施例2組成物)601部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例8組成物)を得た。
(実施例9)
(実施例3組成物)1045部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例9組成物)を得た。
(実施例10)
(実施例4組成物)954部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例10組成物)を得た。
(実施例11)
(実施例5組成物)970部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例11組成物)を得た。
(実施例12)
(実施例6組成物)855部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例12組成物)を得た。
(実施例13)
(実施例1組成物)241.5部に、(合成例1)で得られたウレタンアクリレート(B−4)134部と光重合開始剤HCPK6部を加え、均一に混合し、(実施例13組成物)を得た。
(実施例14)
(実施例1組成物)241.5部に、(合成例2)で得られたポリエステルメタクリレート(B2)222部と光重合開始剤HCPK6部を加え、均一に混合し、(実施例14組成物)を得た。(Example 7)
(Example 1 composition) To 966 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 7 composition).
(Example 8)
(Example 2 composition) To 601 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 8 composition).
Example 9
(Example 3 composition) To 1045 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 9 composition).
(Example 10)
(Example 4 composition) To 954 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 10 composition).
(Example 11)
(Example 5 composition) To 970 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 11 composition).
(Example 12)
(Example 6 composition) To 855 parts, 6 parts of photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 12 composition).
(Example 13)
(Example 1 Composition) To 241.5 parts, 134 parts of urethane acrylate (B-4) obtained in (Synthesis Example 1) and 6 parts of photopolymerization initiator HCPK were added and mixed uniformly. (Example 13) Composition) was obtained.
(Example 14)
(Example 1 composition) To 241.5 parts, 222 parts of polyester methacrylate (B2) obtained in (Synthesis Example 2) and 6 parts of photopolymerization initiator HCPK were added and mixed uniformly. (Example 14 composition) )
(実施例15)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)600部、水14部、エタノール100部を仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−56(三菱化学(株)製、テトラメトキシシラン10量体)36部を1時間かけ滴下して24時間保持した。
成分(1)180部、成分(2)36部、成分(3)120部からなる化合物(A12)と、化合物(B)80部、溶剤として、IPA420部、エタノール100部、水14部を含む合成物(実施例15組成物)950部を得た。(Example 15)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B): PE4A = 60/40 "200 parts, inorganic particles (1): 600 parts of Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 14 parts of water, and 100 parts of ethanol were added, and the mixture was stirred at 30 ° C while stirring the silane compound (2 ): 36 parts of MS-56 (manufactured by Mitsubishi Chemical Corporation, tetramethoxysilane 10-mer) was added dropwise over 1 hour and held for 24 hours.
Including 180 parts of component (1), 36 parts of component (2), 120 parts of compound (3), 80 parts of compound (B), as solvent, 420 parts of IPA, 100 parts of ethanol, 14 parts of water 950 parts of the composite (composition of Example 15) were obtained.
(実施例16)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):DP5A/ラジカル重合性基を2個以上有する化合物(B):DP6A=55/45」200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)580部、水13部、エタノール90部を仕込み、30℃にて撹拌しながら、シラン化合物(2):ES−48(コルコート(株)製、テトラエトキシシラン10量体)45部を1時間かけ滴下して24時間保持した。
成分(1)174部、成分(2)45部、成分(3)110部からなる化合物(A13)と、化合物(B)90部、溶剤として、IPA406部、エタノール90部、水13部を含む合成物(実施例16組成物)928部を得た。(Example 16)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): DP5A / compound having two or more radical polymerizable groups (B): DP6A = 55/45 "200 parts, inorganic particles (1): 580 parts of Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 13 parts of water and 90 parts of ethanol were charged, and the silane compound (2 ): 45 parts of ES-48 (manufactured by Colcoat Co., Ltd., tetraethoxysilane 10-mer) was added dropwise over 1 hour and held for 24 hours.
Compound (A13) comprising 174 parts of component (1), 45 parts of component (2), 110 parts of component (3), 90 parts of compound (B), and as a solvent, 406 parts of IPA, 90 parts of ethanol, and 13 parts of water 928 parts of the composite (Example 16 composition) were obtained.
(実施例17)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、活性水素を有するラジカル重合性化合物(3):イソシアヌル酸EO変性ジアクリレート(東亞合成株式会社製:アロニックスM−215)200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)630部、水18部、エタノール140部を仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)51部を1時間かけ滴下して24時間保持した。
成分(1)189部、成分(2)51部、成分(3)200部からなる化合物(A14)と、溶剤として、IPA441部、エタノール140部、水18部を含む合成物(実施例17組成物)1039部を得た(Example 17)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, a radically polymerizable compound having active hydrogen (3): isocyanuric acid EO-modified diacrylate (manufactured by Toagosei Co., Ltd .: Aronix M-215) 200 Part, inorganic particles (1): 630 parts of Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 18 parts of water, 140 parts of ethanol, and while stirring at 30 ° C., the silane compound (2): MS-51 51 parts (manufactured by Colcoat Co., Ltd., tetramethoxysilane tetramer) was added dropwise over 1 hour and held for 24 hours.
Compound (A) comprising 189 parts of component (1), 51 parts of component (2), 200 parts of component (3), and 441 parts of IPA, 140 parts of ethanol and 18 parts of water as solvent (Example 17 composition) Thing) Obtained 1039 parts
(実施例18)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」220部、無機粒子(1):スノーテックスIPA−ST−ZL(日産化学工業株式会社、固形分30%、溶剤IPA、平均粒子径85nm)480部、水25部、エタノール200部を仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラメトキシシラン4量体)70部を1時間かけ滴下して24時間保持した。
成分(1)144部、成分(2)70部、成分(3)132部からなる化合物(A15)と、化合物(B)88部、溶剤として、IPA336部、エタノール200部、水25部を含む合成物(実施例18組成物)995部を得た。(Example 18)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B): PE4A = 60/40 "220 parts, inorganic particles (1): Snowtex IPA-ST-ZL (Nissan Chemical Co., Ltd., solid content 30%, solvent IPA, average particle diameter 85 nm) 480 parts, water 25 parts, ethanol 200 parts And stirring at 30 ° C., 70 parts of silane compound (2): MS-51 (manufactured by Colcoat Co., Ltd., tetramethoxysilane tetramer) was added dropwise over 1 hour and held for 24 hours.
Compound (A15) composed of 144 parts of component (1), 70 parts of component (2), 132 parts of component (3), 88 parts of compound (B), as solvent, IPA 336 parts, ethanol 200 parts, water 25 parts 995 parts of the composite (Example 18 composition) were obtained.
(実施例19)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):DP5A/ラジカル重合性基を2個以上有する化合物(B):DP6A=55/45」200部、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)653部、水3部、エタノール110部を仕込み、30℃にて撹拌しながら、シラン化合物(2):MS−51(コルコート(株)製、テトラエトキシシラン4量体)8部を30分かけ滴下して24時間保持した。
成分(1)196部、成分(2)8部、成分(3)110部からなる化合物(A16)と、化合物(B)90部、溶剤として、IPA457部、エタノール110部、水3部を含む合成物(実施例19組成物)974部を得た。(Example 19)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): DP5A / compound having two or more radical polymerizable groups (B): DP6A = 55/45 ", 200 parts, inorganic particles (1): 653 parts of Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 3 parts of water, and 110 parts of ethanol were charged with stirring at 30 ° C while the silane compound (2 ): 8 parts of MS-51 (manufactured by Colcoat Co., Ltd., tetraethoxysilane tetramer) was dropped over 30 minutes and held for 24 hours.
Compound (A16) comprising 196 parts of component (1), 8 parts of component (2), 110 parts of component (3), 90 parts of compound (B), as solvent, 457 parts of IPA, 110 parts of ethanol, 3 parts of water 974 parts of the composite (Example 19 composition) were obtained.
(実施例20)
(実施例15組成物)950部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例20組成物)を得た。
(実施例21)
(実施例16組成物)928部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例21組成物)を得た。
(実施例22)
(実施例17組成物)1039部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例22組成物)を得た。
(実施例23)
(実施例18組成物)995部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例23組成物)を得た。
(実施例24)
(実施例19組成物)974部に、光重合開始剤1−ヒドロキシシクロヘキシルフェニルケトン(以下、HCPKと示す)6部を加え、均一に混合し、(実施例24組成物)を得た。(Example 20)
(Example 15 composition) To 950 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 20 composition).
(Example 21)
(Example 16 composition) To 928 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 21 composition).
(Example 22)
(Example 17 composition) To 1039 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 22 composition).
(Example 23)
(Example 18 composition) To 995 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 23 composition).
(Example 24)
(Example 19 composition) To 974 parts, 6 parts of a photopolymerization initiator 1-hydroxycyclohexyl phenyl ketone (hereinafter referred to as HCPK) was added and mixed uniformly to obtain (Example 24 composition).
(比較例1)
「活性水素を有するラジカル重合性化合物(3):DP5A/ラジカル重合性基を2個以上有する化合物(B):DP6A=55/45」200部、水240部、エタノール400部を撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)700部を1時間かけ滴下して24時間保持した。
本比較例により、無機粒子(1)0部、シラン化合物(2)700部、活性水素を有するラジカル重合性化合物(3)110部からなる、無機粒子(1)を含まない化合物と、ラジカル重合性基を2個以上有する化合物(B)90部、溶剤として、エタノール400部、水240部を含む(比較例1組成物)1540部を得た。(Comparative Example 1)
“Radically polymerizable compound having active hydrogen (3): DP5A / compound having two or more radically polymerizable groups (B): DP6A = 55/45” 200 parts, 240 parts of water, 400 parts of ethanol, stirring device, temperature A flask equipped with a total, a reflux condenser, and a dropping funnel was added and 700 parts of silane compound (2): ES28 (manufactured by Colcoat Co., Ltd., tetraethoxysilane) was added dropwise over 1 hour while stirring at 30 ° C. For 24 hours.
According to this comparative example, a compound composed of 0 parts of inorganic particles (1), 700 parts of silane compound (2), 110 parts of radically polymerizable compound (3) having active hydrogen and free of inorganic particles (1), and radical polymerization 90 parts of the compound (B) having 2 or more sex groups and 1540 parts of a solvent containing 400 parts of ethanol and 240 parts of water (composition of Comparative Example 1) were obtained.
(比較例2)
「活性水素を有するラジカル重合性化合物(3):DP5A/ラジカル重合性基を2個以上有する化合物(B):DP6A=55/45」200部、水100部、エタノール200部を撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに仕込み、30℃にて撹拌しながら、シラン化合物(2):ES28(コルコート(株)製、テトラエトキシシラン)300部を1時間かけ滴下して24時間保持した。
本比較例により、無機粒子(1)0部、シラン化合物(2)300部、活性水素を有するラジカル重合性化合物(3)110部からなる、無機粒子(1)を含まない化合物(A8)と、ラジカル重合性基を2個以上有する化合物(B)90部、溶剤として、エタノール200部、水100部を含む(比較例2組成物)800部を得た。(Comparative Example 2)
“Radically polymerizable compound having active hydrogen (3): DP5A / compound having two or more radically polymerizable groups (B): DP6A = 55/45” 200 parts, water 100 parts, ethanol 200 parts, stirring device, temperature A flask equipped with a total, a reflux condenser and a dropping funnel was added, and 300 parts of silane compound (2): ES28 (manufactured by Colcoat Co., Ltd., tetraethoxysilane) was added dropwise over 1 hour while stirring at 30 ° C. For 24 hours.
According to this comparative example, the compound (A8) comprising no inorganic particles (1), comprising 0 parts of inorganic particles (1), 300 parts of silane compound (2) and 110 parts of radical polymerizable compound (3) having active hydrogen, and In addition, 90 parts of a compound (B) having two or more radical polymerizable groups, and 800 parts of ethanol (200 parts of ethanol and 100 parts of water) as a solvent were obtained.
(比較例4)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、無機粒子(1):スノーテックスMEK−ST(日産化学工業株式会社)600部、水22部、ジブチルスズジラウレート0.5部を仕込み、60℃にて撹拌しながら、3−アクリロキシプロピルトリエトキシシラン(信越化学工業株式会社製 KBM−5103)94部を1時間かけて滴下し、60℃で6時間撹拌して無機粒子を得た。
本比較例により、無機粒子(1)180部、無機粒子(1)と反応し、かつ、反応性基を持つ3−アクリロキシプロピルトリエトキシシラン94部からなる化合物(A10)と、溶剤として、MEK420部、水22部を含む(比較例4組成物)716部を得た。(Comparative Example 4)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, inorganic particles (1): 600 parts of Snowtex MEK-ST (Nissan Chemical Industry Co., Ltd.), 22 parts of water, 0.5 parts of dibutyltin dilaurate And stirring at 60 ° C., 94 parts of 3-acryloxypropyltriethoxysilane (KBM-5103 manufactured by Shin-Etsu Chemical Co., Ltd.) was added dropwise over 1 hour, and stirred at 60 ° C. for 6 hours to form inorganic particles. Got.
According to this comparative example, 180 parts of the inorganic particles (1), the compound (A10) comprising 94 parts of 3-acryloxypropyltriethoxysilane that reacts with the inorganic particles (1) and has a reactive group, 716 parts of MEK 420 parts and 22 parts of water (comparative composition 4) were obtained.
(比較例5)
撹拌装置、温度計、還流冷却器、及び滴下ロートを備えたフラスコに、「活性水素を有するラジカル重合性化合物(3):PE3A/ラジカル重合性基を2個以上有する化合物(B):PE4A=60/40」200部、ジブチルスズジラウレート0.3部、p−メトキシフェノール0.2部を仕込み、60℃で撹拌しながら3−イソシアネートプロピルトリエトキシシラン(信越化学工業株式会社製 KBE−9007)50部を30分かけ滴下し、その後80℃にて15時間撹拌した。その後、無機粒子(1):スノーテックスIPA−ST(日産化学工業株式会社)667部、水11部、エタノール60部を1時間かけて滴下して塗料を得た。
本比較例により、無機粒子(1)200部、無機粒子(1)と活性水素を有するラジカル重合性化合物(3)を結合し得る3−イソシアネートプロピルトリエトキシシランを50部、活性水素を有するラジカル重合性化合物(3)120部からなる化合物(A11)と、ラジカル重合性基を2個以上有する化合物(B)80部、溶剤として、MEK467部、水11部、エタノール60部を含む(比較例5組成物)988部を得た。(Comparative Example 5)
In a flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, “radical polymerizable compound having active hydrogen (3): PE3A / compound having two or more radical polymerizable groups (B): PE4A = 60/40 "200 parts, dibutyltin dilaurate 0.3 part, p-methoxyphenol 0.2 part, and 3-isocyanatopropyltriethoxysilane (KBE-9007 manufactured by Shin-Etsu Chemical Co., Ltd.) 50 with stirring at 60 ° C The portion was added dropwise over 30 minutes and then stirred at 80 ° C. for 15 hours. Thereafter, 667 parts of inorganic particles (1): Snowtex IPA-ST (Nissan Chemical Industry Co., Ltd.), 11 parts of water and 60 parts of ethanol were dropped over 1 hour to obtain a paint.
According to this comparative example, 200 parts of inorganic particles (1), 50 parts of 3-isocyanatopropyltriethoxysilane capable of binding the radically polymerizable compound (3) having inorganic particles (1) and active hydrogen, radicals having active hydrogen Polymeric compound (3) comprising 120 parts of compound (A11), 80 parts of compound (B) having two or more radical polymerizable groups, MEK 467 parts, water 11 parts, ethanol 60 parts as a solvent (comparative example) 5 Compositions) 988 parts were obtained.
(比較例6)(Comparative Example 6)
「DP5A/DP6A=55/45」200部、HCPK6部、エタノール300部を均一に混合し、(比較例6組成物)を得た。200 parts of “DP5A / DP6A = 55/45”, 6 parts of HCPK, and 300 parts of ethanol were mixed uniformly to obtain (composition of Comparative Example 6).
(比較例7)(Comparative Example 7)
(比較例1組成物)1540部に、光重合開始剤HCPK6部を加え、均一に混合し、(比較例7組成物)を得た。(Comparative Example 1 composition) To 1540 parts, 6 parts of a photopolymerization initiator HCPK was added and mixed uniformly to obtain (Comparative Example 7 composition).
(比較例8)(Comparative Example 8)
(比較例2組成物)800部に、光重合開始剤HCPK6部を加え、均一に混合し、(比較例8組成物)を得た。(Comparative Example 2 composition) To 800 parts, 6 parts of a photopolymerization initiator HCPK was added and mixed uniformly to obtain (Comparative Example 8 composition).
(比較例10)(Comparative Example 10)
「DP5A/DP6A=55/45」200部と(比較例4組成物)716部に、光重合開始剤HCPK6部を加え、均一に混合し、(比較例10組成物)を得た。6 parts of a photopolymerization initiator HCPK was added to 200 parts of “DP5A / DP6A = 55/45” and 716 parts of (Comparative Example 4 composition), and mixed uniformly to obtain (Comparative Example 10 composition).
(比較例11)
(比較例5組成物)988部に、光重合開始剤HCPK6部を加え、均一に混合し、(比較例11組成物)を得た。(Comparative Example 11)
(Comparative Example 5 Composition) To 988 parts, 6 parts of a photopolymerization initiator HCPK was added and mixed uniformly to obtain (Comparative Example 11 composition).
実施例7〜14、20〜24で得られた(実施例7組成物)〜(実施例14組成物)、(実施例20組成物)〜(実施例24組成物)及び比較例6〜11で得られた(比較例6組成物)〜(比較例11組成物)の配合組成を表1〜3に、各樹脂組成物中の成分ごとの配合量を表4〜6に示す。 (Example 7 composition) to (Example 14 composition), (Example 20 composition) to (Example 24 composition) obtained in Examples 7 to 14 and 20 to 24, and Comparative Examples 6 to 11 Tables 1 to 3 show the blending compositions of (Comparative Example 6 composition) to (Comparative Example 11 composition) obtained in Tables 1 to 3, and Tables 4 to 6 show blending amounts for each component in each resin composition.
(評価用フィルムの作製)
上記で得られた(実施例7組成物)〜(実施例14組成物)、(実施例20組成物)〜(実施例24組成物)及び(比較例6組成物)〜(比較例11組成物)をポリエチレンテレフタレート(以下、「PET」という。)製フィルム基材(東洋紡績株式会社製「コスモシャインA4100 #100」、厚さ:100μm)上に、ワイヤーバー(#4)を用いて塗布し、60℃で1分間加熱後、空気雰囲気下で紫外線照射装置(日本電池株式会社製「GS30型UV照射装置」、ランプ:120W/cmメタルハライドランプ2灯、ランプ高さ:20cm、照射光量:500mJ/cm2)を用いて紫外線を照射し、膜厚10μmの硬化被膜を有するフィルムを得た。(Production of evaluation film)
(Example 7 composition) to (Example 14 composition), (Example 20 composition) to (Example 24 composition) and (Comparative Example 6 composition) to (Comparative Example 11 composition) obtained above. Product) on a film substrate made of polyethylene terephthalate (hereinafter referred to as “PET”) (“Cosmo Shine A4100 # 100” manufactured by Toyobo Co., Ltd., thickness: 100 μm) using a wire bar (# 4). Then, after heating at 60 ° C. for 1 minute, an ultraviolet irradiation device (“GS30 type UV irradiation device” manufactured by Nippon Battery Co., Ltd., lamp: 2 120 W / cm metal halide lamps, lamp height: 20 cm, irradiation light amount: 500 mJ / cm 2 ) was used to irradiate ultraviolet rays to obtain a film having a cured film with a thickness of 10 μm.
(評価用フィルムの表面硬度評価)
上記で得られた評価用フィルムの硬化被膜の表面について、JIS K5600−5−4:1999に準拠し、500g荷重で鉛筆硬度を測定し、下記の基準により表面硬度を評価した。(Evaluation of surface hardness of evaluation film)
About the surface of the cured film of the film for evaluation obtained above, the pencil hardness was measured under a load of 500 g in accordance with JIS K5600-5-4: 1999, and the surface hardness was evaluated according to the following criteria.
○:鉛筆硬度が4H以上
△:鉛筆硬度が3H以上4H未満
×:鉛筆硬度が3H以未満○: Pencil hardness is 4H or more Δ: Pencil hardness is 3H or more and less than 4H ×: Pencil hardness is less than 3H
(評価用フィルムのカール性評価)
上記で得られた評価用フィルムから、10cm×10cm試験片を切り出し、23℃、65%RHの雰囲気下に24時間放置後、試験片の4端について、隣接する2点間の長さを測定し、隣接する2点間で最も小さい長さと他2点間の長さとを測定し、下式によってカール値を算出する。(Evaluation of curl of evaluation film)
A 10 cm × 10 cm test piece was cut out from the evaluation film obtained above, and left for 24 hours in an atmosphere of 23 ° C. and 65% RH, and then the length between two adjacent points was measured at the four ends of the test piece. Then, the smallest length between two adjacent points and the length between the other two points are measured, and the curl value is calculated by the following equation.
カール値(cm)=10−(最小隣接2点間の長さ+他の隣接2点間の長さ)/2
上記で得られたカール値から、下記の基準によりカール性の評価を行った。Curl value (cm) = 10− (length between two adjacent minimum points + length between two other adjacent points) / 2
From the curl value obtained above, the curl property was evaluated according to the following criteria.
○:カール値が6.0cm以下
△:カール値が6.0cmを超え、10.0cm以下
×:カール値が10cmを超える○: Curl value is 6.0 cm or less Δ: Curl value is over 6.0 cm, 10.0 cm or less ×: Curl value is over 10 cm
(評価用フィルムの透明性評価)
上記で得られた評価用フィルムのヘイズ値をヘイズメータNDH2000(日本電色株式会社製)で測定した。得られたヘイズ値から、下記の基準により透明性を評価した。(Transparency evaluation of evaluation film)
The haze value of the film for evaluation obtained above was measured with a haze meter NDH2000 (Nippon Denshoku Co., Ltd.). From the obtained haze value, transparency was evaluated according to the following criteria.
○:ヘイズ値が0.1%以下
△:ヘイズ値が0.1%を超え、0.5%以下
×:ヘイズ値が0.5%を超える○: Haze value is 0.1% or less △: Haze value exceeds 0.1%, 0.5% or less ×: Haze value exceeds 0.5%
(硬化被膜の基材に対する密着性評価)
上記で得られた基材がPETの評価用フィルムと、上記の評価用フィルムの作製においてPET製フィルム基材をトリアセチルセルロース(以下、「TAC」という。)製フィルム基材(富士写真フィルム社製「TAC」、厚さ:80μm)に代えた以外は同様にして作製した基材がTACの評価用フィルムを用意した。これらの評価用フィルムを、JIS K5400に準拠し、フィルムの表面に1mm間隔で縦、横11本の切れ目を入れて100個の碁盤目を作った。次に、市販のセロハンテープをその表面に密着させた後、一気に剥がしたとき、剥離せずに残ったマス目の個数を数え、下記の基準により密着性を評価した。(Evaluation of adhesion of cured film to substrate)
The substrate obtained above is a PET evaluation film, and the PET film substrate is a triacetyl cellulose (hereinafter referred to as “TAC”) film substrate (Fuji Photo Film Co., Ltd.) in the production of the evaluation film. A base material prepared in the same manner except that it was changed to “TAC” (thickness: 80 μm) was prepared. These evaluation films were made according to JIS K5400, and 100 grids were made by making 11 vertical and horizontal cuts at 1 mm intervals on the surface of the film. Next, when a commercially available cellophane tape was adhered to the surface and then peeled off at once, the number of cells remaining without peeling was counted, and the adhesion was evaluated according to the following criteria.
○:残ったマス目が100個
△:残ったマス目が90個以上100未満
×:残ったマス目が90個未満
上記の評価結果を表7〜表9に示す。◯: 100 cells remaining Δ: 90 cells or more and less than 100 ×: Remaining cells less than 90 The above evaluation results are shown in Tables 7 to 9.
なお、表4〜表6において、成分(1)は、無機粒子(1)、成分(2)は、アルコキシシラン化合物またはその部分加水分解縮合物(2)、成分(3)は、活性水素を有するラジカル重合性化合物(3)、成分(B)は、ラジカル重合性基を2個以上有する化合物(B)を示す。 In Tables 4 to 6, component (1) is inorganic particles (1), component (2) is an alkoxysilane compound or a partially hydrolyzed condensate (2) thereof, and component (3) is active hydrogen. The radically polymerizable compound (3) and the component (B) having a compound are compounds (B) having two or more radically polymerizable groups.
表9の比較例7においてはクラックにより測定不能であった。 In Comparative Example 7 in Table 9, measurement was impossible due to cracks.
本発明の樹脂組成物から得られる活性エネルギー線硬化物は、高硬度の被膜として基材の保護層等としての利用が可能である。 The active energy ray cured product obtained from the resin composition of the present invention can be used as a protective layer for a substrate as a high-hardness film.
Claims (10)
及び活性水素を有する基を1個以上、且つラジカル重合性基を2個以上有するラジカル重合性化合物(3)を反応させて得られる化合物(A)を含有する硬化性樹脂組成物であって、化合物(A)が、
一般式(4)で表されるシラン化合物(2)との化学結合を介して、無機粒子(1)と活性水素を有する基を1個以上、且つラジカル重合性基を2個以上有するラジカル重合性化合物(3)とが結合して構成されるものである硬化性樹脂組成物。 Inorganic particles (1), silane compound (2) represented by general formula (4),
And a curable resin composition containing a compound (A) obtained by reacting a radical polymerizable compound (3) having one or more groups having active hydrogen and two or more radical polymerizable groups, Compound (A) is
Radical polymerization having one or more inorganic particles (1) and active hydrogen-containing groups and two or more radical-polymerizable groups via a chemical bond with the silane compound (2) represented by the general formula (4). The curable resin composition which is comprised by combining with the curable compound (3).
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