JP4650866B2 - UV-absorbing resin, resin composition for film formation using the same, and film peeling method - Google Patents

UV-absorbing resin, resin composition for film formation using the same, and film peeling method Download PDF

Info

Publication number
JP4650866B2
JP4650866B2 JP2001195250A JP2001195250A JP4650866B2 JP 4650866 B2 JP4650866 B2 JP 4650866B2 JP 2001195250 A JP2001195250 A JP 2001195250A JP 2001195250 A JP2001195250 A JP 2001195250A JP 4650866 B2 JP4650866 B2 JP 4650866B2
Authority
JP
Japan
Prior art keywords
group
general formula
hydrogen atom
represented
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001195250A
Other languages
Japanese (ja)
Other versions
JP2003012726A (en
Inventor
邦夫 有本
昌宏 栄川
英樹 若生
千人 田子
英夫 西田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ishihara Chemical Co Ltd
Original Assignee
Ishihara Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ishihara Chemical Co Ltd filed Critical Ishihara Chemical Co Ltd
Priority to JP2001195250A priority Critical patent/JP4650866B2/en
Publication of JP2003012726A publication Critical patent/JP2003012726A/en
Application granted granted Critical
Publication of JP4650866B2 publication Critical patent/JP4650866B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/008Temporary coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10Block or graft copolymers containing polysiloxane sequences

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silicon Polymers (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、金属、プラスチック、ガラス、セラミック、木材等の基材表面やそれらの塗装表面等の下地基材への耐候性及び耐久性に優れたコーティング剤、特に、紫外線に対する保護機能を有する紫外線吸収性コーティング剤として用いられる紫外線吸収性樹脂、それを用いた被膜形成用樹脂組成物及び被膜剥離方法に関するものである。
【0002】
【従来の技術】
従来から太陽光中の紫外線を遮断するものとして、アクリル酸エステル系のポリマーにベンゾフェノン系化合物、ベンゾトリアゾール系化合物などの紫外線吸収剤を配合し、これを金属、プラスチック、ガラス、セラミック、木材等の基材表面に塗布することが行われている。
しかし、前述のような紫外線吸収剤は、一般にポリマーとの相溶性が悪く、多量に配合すると不溶化して透明性を損ない、また塗布時には一時的に透明であっても、経時的にブリードやブルーミングを生じ易く、性能の劣化や生態への毒性が問題になっている。これらの問題を解決するため重合性二重結合を有するベンゾフェノン系またはベンゾトリアゾール系化合物を、単独重合、あるいは重合性モノマーと共重合させる方法(特開平9−3395、特開平9−12642、特開平9−202874)が知られている。
【0003】
【発明が解決しようとする課題】
しかしながら前記紫外線吸収性重合物は、太陽光で暴露された屋外で使用されることが多く、耐候性は向上するが、十分とは言えず、また、耐水性が悪いという問題点がある。
本発明はかかる事情に鑑みなされたものであって、耐久性のある紫外線吸収性重合物及びそれを用いた被膜形成用樹脂組成物及び被膜剥離方法を提供することを目的とするものである。
【0004】
【課題を解決するための手段】
即ち、本発明の紫外線吸収性樹脂は、一般式(1)または(2)で表わされる反応型紫外線吸収性化合物と一般式(3)で表わされる重合性ジメチルポリシロキサンを必須成分として成る共重合体であり、ジメチルポリシロキサン骨格と紫外線吸収剤骨格を有するため、水や光、熱に対して安定な構造を有していることを特徴とするものである。また、カルボキシル基を導入した場合には、アルカリ剤を用いて被膜を剥離して除去できることを特徴とするものである。
すなわち、本発明にかかる紫外線吸収性樹脂組成物及び紫外線吸収剤は、一般式(1)
【化8】
{式中、Xは水素原子又はハロゲン基、Rは水素原子又は炭素数1〜8の炭化水素基、
は一般構造式 −R−(CH0〜2−R
但し、Rは−O−基、−CH−基、若しくは−CH(OH)−基が有り、又は無いことを示し、Rは構造式
【化9】
又は
【化10】
(但し、Rは水素原子または−CH基を示す。で表わされる基である。)}
または一般式(2)
【化11】
{式中、Yは水素原子又は水酸基、Rは水素原子又はRと同一の基、Rは一般構造式
−R−(CH0〜2−R
但し、Rは−O−基、−CH−基、若しくは−CH(OH)−基が有り、又は無いことを示し、Rは構造式
【化12】
又は
【化13】
(但し、R10は水素原子または−CH基を示す。
で表わされる基である。}
で表わされる反応型紫外線吸収性単量体と一般式(3)
【化14】
{式中、R11は、水素原子又はメチル基
R12は、メチル基又はシアノ基
R13は、アルキレン基又はアルキレンオキシ基(炭素原子数1〜10)
Aは、酸素原子又はイミノ基
aは、0〜6の整数
bは、10〜500の整数を示す。}
で表わされるジメチルポリシロキサン単量体を反応させた紫外線吸収性樹脂であって、一般式(1)または(2)で表わされる反応型紫外線吸収作用をもつ化合物のポリマー中の含有率が0.1質量%〜85質量%であり、残部が一般式(3)で表わされる重合性ジメチルポリシロキサンである紫外線吸収性樹脂である。
また、本発明は、一般式(3)で表わされる重合性ジメチルポリシロキサンのポリマー中の含有率が10質量%〜70質量%であり、残部が一般式(1)または一般式(2)で表わされる反応型紫外線吸収作用をもつ化合物である紫外線吸収性樹脂である。
さらに、本発明の紫外線吸収性樹脂は、ポリマーを構成する成分として、不飽和カルボン酸および/または(メタ)アクリル酸エステルをさらに含むことができる。
また、本発明では、樹脂の酸価を50〜500とすることができる。
さらに本発明は、このような紫外線吸収性樹脂と、脂肪族炭化水素系溶剤、芳香族炭化水素系溶剤、ニトロ化及び塩化炭化水素系溶剤、アルコール系溶剤、ケトン系溶剤、エーテルアルコール及びエーテル系溶剤、エステル及びエーテルエステル系溶剤からなる溶剤及び添加剤が酸化安定剤、光安定剤、紫外線吸収剤、流動性改善剤、顔料から選ばれた1種又は2種以上である添加剤とからなる被膜形成用樹脂組成物である。
また、本発明は、このような被膜形成用樹脂組成物からなる塗膜を、pH8以上のアルカリ剤と反応させることにより塗膜を除去する方法である。
【0005】
【発明の実施の形態】
本発明で用いる一般式(1)で表わされる反応型紫外線吸収剤の例として、2−(2’−ヒドロキシ−5’−(メタクリロイルオキシエチル)フェニル)−2H−ベンゾトリアゾール、2−(2’−ヒドロキシ−5’−(メタクリロイルオキシプロピル)フェニル)−2H−ベンゾトリアゾール、2−(2’−ヒドロキシ−3’−t−ブチル−5’−(メタクリロイルオキシエチル)フェニル)−2H−ベンゾトリアゾール、2−(2’−ヒドロキシ−5’−t−ブチル−3’−(メタクリロイルオキシエチル)フェニル)−2H−ベンゾトリアゾール、2−(2’−ヒドロキシ−5’−(メタクリロイルオキシエチル)フェニル)−5−クロロ−2H−ベンゾトリアゾール等が挙げられる。これらを単一で使用することができ、又は二種類以上を併用することもできる。
【0006】
本発明で用いる一般式(2)で表わされる反応型紫外線吸収剤の例として、2−ベンゾイル−5−(2’−ヒドロキシ−3’−メタアクロイルオキシプロポキシ)−フェノール、2−ベンゾイル−5−(2’−メタアクロイルオキシエトキシ)−フェノール、2−ベンゾイル−5−(2’−アクロイルオキシエトキシ)−フェノール等が挙げられる。これらを単一で使用することができ、又は二種類以上を併用することもできる。
また、一般式(1)及び(2)で表わされる反応型紫外線吸収剤を併用して用いても問題はない。
一般式(3)で表わされる重合性ジメチルポリシロキサンの市販品の例としては、高分子アゾ重合開始剤VPS−0501、VPS−1001(いずれも和光純薬工業株式会社製)などが挙げられる。
【0007】
本発明における共重合体組成物の反応型紫外線吸収剤の含有率は0.1質量%〜85質量%の範囲であり、0.5質量%〜80質量%の範囲が好ましく、1質量%〜50質量%の範囲がさらに好ましい。
共重合体組成物の反応型紫外線吸収剤の含有率が0.1質量%未満であると、得られる共重合体組成物の紫外線吸収能が不十分となるので好ましくない。上記含有量が85質量%を越えると、重合開始剤である重合性ジメチルポリシロキサンの濃度が低くなり、重合が起こりにくくなるので好ましくない。
また、重合性ジメチルポリシロキサンの含有率は、10質量%〜70質量%の範囲である。10質量%未満であると、重合開始剤としての濃度が低くなり、重合が起こりにくくなるので、得られた共重合体を塗料として用いた時、膜強度も弱く、塗膜の耐水性も悪くなる。70質量%を越えると、得られた共重合体を塗料として用いた時、造膜成分である(メタ)アクリル酸エステルを十分配合させることができないので、造膜性と被塗物への密着性に劣る。
共重合体の構成成分に、重合性ジメチルポリシロキサン、反応型紫外線吸収剤の他に、(メタ)アクリル酸エステル単量体及び/または重合性不飽和カルボン酸単量体を添加して重合させることで、重合体自身の物性を向上させ、これを塗料として被塗物へ塗布した場合、塗膜物性を向上させることができる。
【0008】
本発明の共重合体の成分として併用できる単量体としては、(メタ)アクリル酸エステルの例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸−2−エチルへキシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸シクロへキシル、(メタ)アクリル酸シクロペンチル、(メタ)アクリル酸シクロドデシル、グリシジル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート、ヒドロキシプロピル(メタ)アクリレート等が挙げられる。
重合性不飽和カルボン酸単量体の例としては、(メタ)アクリル酸、クロトン酸、イタコン酸、(無水)マレイン酸、フマル酸等が挙げられる。
必要に応じて、スチレン、等の芳香族不飽和単量体、塩化ビニル、塩化ビニリデン等のハロゲン含有不飽和単量体、(メタ)アクリルアミド、ビニルピリジン、ビニルイミダゾール、N,N’−ジメチルアミノエチル(メタ)アクリレート等の含窒素不飽和単量体、(メタ)アクリロ二トリル等の不飽和シアン化合物、酢酸ビニル等のビニルエステル、ビニルエーテル等を添加することもできる。
(メタ)アクリル酸エステル単量体及び/または重合性不飽和カルボン酸単量体は単独で用いてもよく、また、二種類以上併用してもよい。
【0009】
重合性不飽和カルボン酸を構造成分とし、酸価を50〜500とした共重合体を塗料として用いた場合の塗膜は、塗膜が汚れた場合や、被塗物の保護を必要としなくなった場合にpH8以上のアルカリ剤で容易に脱膜することができる。
共重合体の酸価が50未満では共重合体のアルカリ剤による溶解性が悪くなるために、脱膜性が低下し、500を越えると塗膜の耐水性が低下する。
【0010】
上記共重合体は、前述した化合物と溶媒を加え、窒素置換した後、所定の温度で攪拌することにより容易に得られる。
ここで用いる溶媒の例としては、メタノール、エタノール、イソプロパノール、ノルマルプロパノール等の脂肪族アルコール類、酢酸エチル、酢酸ブチル等の酢酸エステル類、トルエン、キシレン等の芳香族炭化水素類、N,N’−ジメチルホルムアミド、クロロホルム、テトラヒドロフラン、アセトン等が挙げられる。これらは単独で用いてもよいし、二種類以上併用してもよい。
反応系には、分子量を調節する目的で、ドデシルメルカプタン、2−メルカプトエタノール、四塩化炭素等の連鎖移動剤や重合調節剤を用いてもよい。
さらに、共重合反応後、未反応モノマーを重合させることを目的として、重合開始剤を用いることができる。上記の重合開始剤としては、例えば、アゾビスイソブチロ二トリル、ベンゾイルパーオキサイド、ジ−t−ブチルパーオキサイド等のラジカル重合開始剤が挙げられる。
ここで得られた共重合体は単独で、塗料として用いてもよいし、紫外線吸収剤として、プラスチックや塗料に配合してもよい。
【0011】
また、本発明による樹脂は、耐候性のさらなる向上を目的として、4−ヒドロキシ−2,2,6,6−テトラメチルピペリジン、4−ステアロイルオキシ−2,2,6,6−テトラメチルピペリジン、ジ(2,2,6,6−テトラメチルピペリジン−4−イル)−セバシン酸エステル、ジ(1,2,2,6,6−ペンタメチルピペリジン−4−イル)−セバシン酸エステル、2−(4−2,2,6,6−テトラメチルピペリジン)−アミノ−2−メチル−(4−2,2,6,6−テトラメチルピペリジン)−プロピオンアミドのようなHALSと称される光安定剤や酸化防止剤との併用もできる。
また、本発明による樹脂は、光への安定性が、非常に優れているので、酸化チタン、酸化亜鉛、酸化スズ、酸化ジルコニウム、酸化ニオブ、酸化タングステン、酸化鉄、酸化カドミウム、硫化モリブデン、炭化珪素、砒化ガリウム、硫化カドミウムのような光触媒と併用することができる。
【0012】
本発明の樹脂は、単独で若しくは他の樹脂を配合して被膜形成用樹脂組成物として利用することが出来る。
併用できる樹脂としては、アルキッド系樹脂、アミノアルキド系樹脂、アミノ系樹脂、ビニル系樹脂、アクリル樹脂、ポリエステル系樹脂、エポキシ系樹脂、ポリウレタン系樹脂、塩化ゴム系樹脂、カシュー系樹脂、フェノール系樹脂、ブチラ-ル系樹脂、フッ素系樹脂、シリコーン系樹脂、天然樹脂等が挙げられるが、これらの樹脂を単独で用いてもよいし、二種類以上併用してもよい。。
使用できる溶剤としては、脂肪族炭化水素系溶剤、芳香族炭化水素系溶剤、ニトロ化及び塩化炭化水素系溶剤、アルコール系溶剤、ケトン系溶剤、エーテルアルコール及びエーテル系溶剤、エステル及びエーテルエステル系溶剤等が挙げられるが、これらの樹脂を単独で用いてもよいし、二種類以上併用してもよい。。
流動性改善剤としては、ステアリン酸アルミニウム、脂肪酸アマイド、有機ベントナイト等チキソトロピー剤やグリセリン等のレベリング剤がある。
また、本発明の樹脂は、溶剤を揮散させた後、紫外線吸収剤として使用することもでき、ポリプロピレン、ポリエチレン、ポリエチレンテレフタレート、ポリスチレン、アクリロニトリル−スチレン樹脂、アクリロニトリル−ブタジエン樹脂、ポリカーボネート、塩化ビニル等のプラスチックに配合し、混錬して使用することもできる。
また、天然ゴム、SBR、NBR、イソプレンゴム、EPDM、シリコーンゴム等のゴム類に配合することもできる。
【0013】
本発明による酸価50〜500の樹脂で作られた被膜をはく離するアルカリ剤としては、アンモニア、水溶性アミノアルコール類、水溶性脂肪族アミン類および各種アルカリ無機塩類等を適当に水に溶解させてpH8以上に調整したものであり、必要に応じて界面活性剤などを添加することができる。
以下、実施例により本発明を説明するが、本発明はこれらの例によって何ら限定されるものではない。
【0014】
【実施例】
(実施例1〜6)
容器100mlの重合反応器に一般式(1)あるいは(2)で示される反応型紫外線吸収剤、一般式(3)で示される重合性ジメチルポリシロキサン、アクリル系単量体を表1に示した配合量で仕込み、溶剤としてテトラヒドロフラン25gを加え、窒素気流中で攪拌しながら60℃の温度で還流させ、10時間反応させた。反応後、重合禁止剤としてハイドロキノン0.01gを添加して重合反応を終了させ、表1に示した実施例1〜6の共重合体の溶液を得た。得られた共重合体溶液の不揮発分のGPC測定では、単一ピークが得られた。また、ポリスチレン換算での数平均分子量を求めた。酸価は中和法により測定した。
(比較例1)
容器100mlの重合反応器に一般式(3)で示される重合性ジメチルポリシロキサン、アクリル酸、メタアクリル酸メチルを表1に示した配合量で仕込み、溶剤としてイソプロピルアルコール25gを加え、窒素気流中で攪拌しながら70℃の温度で6時間反応させた。反応後、重合禁止剤としてハイドロキノン0.01gを添加して重合反応を終了させ、表1に示した比較例1の共重合体の溶液を得た。得られた共重合体溶液の不揮発分のGPC測定では、単一ピークが得られた。また、ポリスチレン換算での数平均分子量を求めた。酸価は中和法により測定した。
(比較例2)
容器100mlの四つ口フラスコに一般式(1)で示される反応型紫外線吸収剤、メタアクリル酸メチルを表1に示した配合量で仕込み、溶剤としてトルエン25gを加え、攪拌しながら80℃まで昇温した。そして窒素気流中、重合開始剤としてアゾビスイソブチロニトリルを0.05gを添加し、80℃の温度で12時間反応させた。反応後、重合禁止剤としてハイドロキノン0.01gを添加して重合反応を終了させ、表1に示した比較例2の共重合体の溶液を得た。得られた共重合体溶液の不揮発分のGPC測定では、単一ピークが得られた。また、ポリスチレン換算での数平均分子量を求めた。酸価は中和法により測定した。
【0015】
(性能試験)
実施例1〜6、比較例1〜2で得た共重合体を、以下に述べる方法で性能評価した。
各実施例及び比較例で得られた共重合物溶液を清浄なガラス板に布で直接塗布して乾燥し、接触角を測定して、pH8のアルカリ剤(簡単に組成を示す例えばアンモニア水)で脱膜性を判定した。また、塗布したガラス板を48時間、水に浸積し、その後、引き上げて目視により観察し、透明性を判定した。
0.1gのSolvent Yellow 151染料をエタノールに溶解し、各共重合体溶液に加え、これを清浄なガラス板に布で直接塗布して乾燥し、波長490nm(可視光線部最大吸収波長)の透過率を測定した。さらに、フェードメーター(F.O.M)試験(JIS B 7754に規定するもの)で192時間暴露し、透過率の変化を調べた。
【表1】
【0016】
【本発明の効果】
表1の結果から明らかなように、本発明の共重合体は紫外線吸収性重合物であり、耐候性、耐水性のある被膜形成用樹脂組成物及び被膜剥離方法を提供することが判明した。
[0001]
BACKGROUND OF THE INVENTION
The present invention is a coating agent having excellent weather resistance and durability to a base material such as metal, plastic, glass, ceramic, and wood, and a base material such as a painted surface, in particular, an ultraviolet ray having a protective function against ultraviolet rays. The present invention relates to a UV-absorbing resin used as an absorptive coating agent, a film-forming resin composition using the same, and a film peeling method.
[0002]
[Prior art]
Conventionally, UV absorbers such as benzophenone compounds and benzotriazole compounds are blended into acrylic ester polymers to block ultraviolet rays in sunlight, and this is used for metals, plastics, glass, ceramics, wood, etc. Application to the surface of a substrate is performed.
However, UV absorbers such as those mentioned above are generally poorly compatible with polymers, and when blended in large amounts, they become insoluble and impair transparency, and even if temporarily transparent at the time of application, bleeding and blooming over time Deterioration of performance and toxicity to ecology are problems. In order to solve these problems, a benzophenone-based or benzotriazole-based compound having a polymerizable double bond is homopolymerized or copolymerized with a polymerizable monomer (JP 9-3395, JP 9-12642, JP 9-202874) is known.
[0003]
[Problems to be solved by the invention]
However, the UV-absorbing polymer is often used outdoors exposed to sunlight, and the weather resistance is improved, but it is not sufficient, and there is a problem that the water resistance is poor.
This invention is made | formed in view of this situation, Comprising: It aims at providing the durable ultraviolet-absorbing polymer, the resin composition for film formation using the same, and a film peeling method.
[0004]
[Means for Solving the Problems]
That is, the ultraviolet absorbing resin of the present invention comprises a co-polymer comprising a reactive ultraviolet absorbing compound represented by the general formula (1) or (2) and a polymerizable dimethylpolysiloxane represented by the general formula (3) as essential components. Since it is a coalescence and has a dimethylpolysiloxane skeleton and an ultraviolet absorber skeleton, it has a structure that is stable to water, light, and heat. In addition, when a carboxyl group is introduced, the coating can be peeled off using an alkaline agent.
That is, the ultraviolet absorbing resin composition and the ultraviolet absorber according to the present invention are represented by the general formula (1).
[Chemical 8]
{Wherein X is a hydrogen atom or a halogen group, R 1 is a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms,
R 2 has the general structural formula —R 3 — (CH 2 ) 0 -2 -R 4.
Where R 3 represents the presence or absence of a —O— group, —CH 2 — group, or —CH (OH) — group, and R 4 represents the structural formula
Or [Chemical Formula 10]
(However, R 5 represents a hydrogen atom or a —CH 3 group.)}
Or general formula (2)
Embedded image
{In the formula, Y is a hydrogen atom or a hydroxyl group, R 6 is a hydrogen atom or R 7 the same group, R 7 is the general structural formula -R 8 - (CH 2) 0~2 -R 9
Where R 8 represents the presence or absence of an —O— group, —CH 2 — group, or —CH (OH) — group, and R 9 represents the structural formula
Or [Chemical Formula 13]
(However, R 10 represents a hydrogen atom or a —CH 3 group.
It is group represented by these. }
Reactive UV-absorbing monomer represented by the general formula (3)
Embedded image
{Wherein R11 is a hydrogen atom or a methyl group R12 is a methyl group or a cyano group R13 is an alkylene group or an alkyleneoxy group (1 to 10 carbon atoms)
A represents an oxygen atom or an imino group a, an integer b of 0 to 6 represents an integer of 10 to 500. }
A dimethylpolysiloxane monomers UV absorbing resin obtained by reacting represented in the general formula (1) or the content of the polymer compound having a reactive ultraviolet absorption represented by (2) 0. It is 1 mass%-85 mass%, and the remainder is an ultraviolet-absorbing resin which is a polymerizable dimethylpolysiloxane represented by the general formula (3) .
In the present invention, the content of the polymerizable dimethylpolysiloxane represented by the general formula (3) in the polymer is 10% by mass to 70% by mass, and the balance is the general formula (1) or the general formula (2). It is a UV-absorbing resin that is a compound having a reactive UV-absorbing action .
Furthermore, the ultraviolet absorbing resin of the present invention can further contain an unsaturated carboxylic acid and / or a (meth) acrylic acid ester as a component constituting the polymer.
Moreover, in this invention, the acid value of resin can be 50-500.
Furthermore, the present invention provides such an ultraviolet absorbing resin , an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent, a nitration and chlorinated hydrocarbon solvent, an alcohol solvent, a ketone solvent, an ether alcohol and an ether solvent. A solvent and an additive comprising a solvent, an ester, and an ether ester solvent are one or more additives selected from an oxidation stabilizer, a light stabilizer, an ultraviolet absorber, a fluidity improver, and a pigment. It is a resin composition for film formation.
Moreover, this invention is a method of removing a coating film by making the coating film which consists of such a resin composition for film formation react with the alkaline agent of pH8 or more.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
Examples of the reactive ultraviolet absorber represented by the general formula (1) used in the present invention include 2- (2′-hydroxy-5 ′-(methacryloyloxyethyl) phenyl) -2H-benzotriazole, 2- (2 ′ -Hydroxy-5 '-(methacryloyloxypropyl) phenyl) -2H-benzotriazole, 2- (2'-hydroxy-3'-t-butyl-5'-(methacryloyloxyethyl) phenyl) -2H-benzotriazole, 2- (2′-hydroxy-5′-t-butyl-3 ′-(methacryloyloxyethyl) phenyl) -2H-benzotriazole, 2- (2′-hydroxy-5 ′-(methacryloyloxyethyl) phenyl)- 5-chloro-2H-benzotriazole and the like can be mentioned. These can be used alone or in combination of two or more.
[0006]
Examples of the reactive ultraviolet absorber represented by the general formula (2) used in the present invention include 2-benzoyl-5- (2′-hydroxy-3′-methacryloyloxypropoxy) -phenol and 2-benzoyl-5. -(2'-methacryloyloxyethoxy) -phenol, 2-benzoyl-5- (2'-acryloyloxyethoxy) -phenol and the like. These can be used alone or in combination of two or more.
Moreover, there is no problem even if the reactive ultraviolet absorbers represented by the general formulas (1) and (2) are used in combination.
Examples of commercially available polymerizable dimethylpolysiloxane products represented by the general formula (3) include polymer azo polymerization initiators VPS-0501 and VPS-1001 (both manufactured by Wako Pure Chemical Industries, Ltd.).
[0007]
The content of the reactive ultraviolet absorber in the copolymer composition in the present invention is in the range of 0.1% by mass to 85% by mass, preferably in the range of 0.5% by mass to 80% by mass, and 1% by mass to The range of 50% by mass is more preferable.
If the content of the reactive ultraviolet absorber in the copolymer composition is less than 0.1% by mass, the ultraviolet absorption ability of the copolymer composition obtained is insufficient, such being undesirable. When the content exceeds 85% by mass, the concentration of the polymerizable dimethylpolysiloxane that is a polymerization initiator is lowered, and polymerization is difficult to occur.
Moreover, the content rate of polymeric dimethylpolysiloxane is the range of 10 mass%-70 mass%. If it is less than 10% by mass, the concentration as a polymerization initiator will be low and polymerization will be difficult to occur. Therefore, when the obtained copolymer is used as a paint, the film strength will be weak and the water resistance of the paint film will be poor. Become. If it exceeds 70% by mass, when the obtained copolymer is used as a paint, the (meth) acrylic acid ester, which is a film-forming component, cannot be blended sufficiently. Inferior to sex.
In addition to polymerizable dimethylpolysiloxane and reactive ultraviolet absorber, (meth) acrylic acid ester monomer and / or polymerizable unsaturated carboxylic acid monomer are added to the constituent components of the copolymer for polymerization. Thus, the physical properties of the polymer itself can be improved, and when this is applied as a paint to an object to be coated, the physical properties of the coating film can be improved.
[0008]
As a monomer that can be used in combination as a component of the copolymer of the present invention, examples of (meth) acrylic acid esters include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, ( 2-ethylhexyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, cyclohexyl (meth) acrylate, cyclopentyl (meth) acrylate, cyclododecyl (meth) acrylate, glycidyl (Meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate and the like can be mentioned.
Examples of the polymerizable unsaturated carboxylic acid monomer include (meth) acrylic acid, crotonic acid, itaconic acid, (anhydrous) maleic acid, fumaric acid and the like.
As necessary, aromatic unsaturated monomers such as styrene, halogen-containing unsaturated monomers such as vinyl chloride and vinylidene chloride, (meth) acrylamide, vinylpyridine, vinylimidazole, N, N′-dimethylamino Nitrogen-containing unsaturated monomers such as ethyl (meth) acrylate, unsaturated cyanide compounds such as (meth) acrylonitrile, vinyl esters such as vinyl acetate, vinyl ethers and the like can also be added.
The (meth) acrylic acid ester monomer and / or polymerizable unsaturated carboxylic acid monomer may be used alone or in combination of two or more.
[0009]
The coating film when a copolymer having a polymerizable unsaturated carboxylic acid as a structural component and an acid value of 50 to 500 is used as a coating material does not require protection of the coating object when the coating film becomes dirty. In this case, the film can be easily removed with an alkaline agent having a pH of 8 or higher.
When the acid value of the copolymer is less than 50, the solubility of the copolymer with an alkali agent is deteriorated, so that the film removal property is lowered, and when it exceeds 500, the water resistance of the coating film is lowered.
[0010]
The copolymer can be easily obtained by adding the above-described compound and solvent, purging with nitrogen, and stirring at a predetermined temperature.
Examples of the solvent used here include aliphatic alcohols such as methanol, ethanol, isopropanol and normal propanol, acetates such as ethyl acetate and butyl acetate, aromatic hydrocarbons such as toluene and xylene, N, N ′ -Dimethylformamide, chloroform, tetrahydrofuran, acetone and the like. These may be used alone or in combination of two or more.
For the purpose of adjusting the molecular weight, a chain transfer agent such as dodecyl mercaptan, 2-mercaptoethanol, carbon tetrachloride or a polymerization regulator may be used in the reaction system.
Furthermore, a polymerization initiator can be used for the purpose of polymerizing unreacted monomers after the copolymerization reaction. Examples of the polymerization initiator include radical polymerization initiators such as azobisisobutyronitrile, benzoyl peroxide, and di-t-butyl peroxide.
The copolymer obtained here may be used alone as a paint, or may be blended in a plastic or paint as an ultraviolet absorber.
[0011]
Further, the resin according to the present invention is prepared by using 4-hydroxy-2,2,6,6-tetramethylpiperidine, 4-stearoyloxy-2,2,6,6-tetramethylpiperidine, Di (2,2,6,6-tetramethylpiperidin-4-yl) -sebacic acid ester, di (1,2,2,6,6-pentamethylpiperidin-4-yl) -sebacic acid ester, 2- Light stability called HALS, such as (4-2,2,6,6-tetramethylpiperidine) -amino-2-methyl- (4-2,2,6,6-tetramethylpiperidine) -propionamide Can also be used in combination with an agent or an antioxidant.
Further, since the resin according to the present invention has excellent stability to light, titanium oxide, zinc oxide, tin oxide, zirconium oxide, niobium oxide, tungsten oxide, iron oxide, cadmium oxide, molybdenum sulfide, carbonized carbon It can be used in combination with a photocatalyst such as silicon, gallium arsenide, and cadmium sulfide.
[0012]
The resin of the present invention can be used alone or in combination with other resins as a film-forming resin composition.
Resins that can be used in combination include alkyd resins, amino alkyd resins, amino resins, vinyl resins, acrylic resins, polyester resins, epoxy resins, polyurethane resins, chlorinated rubber resins, cashew resins, and phenol resins. , Butyral resins, fluorine resins, silicone resins, natural resins, and the like. These resins may be used alone or in combination of two or more. .
Solvents that can be used include aliphatic hydrocarbon solvents, aromatic hydrocarbon solvents, nitration and chlorinated hydrocarbon solvents, alcohol solvents, ketone solvents, ether alcohols and ether solvents, esters and ether ester solvents. These resins may be used alone or in combination of two or more. .
Examples of the fluidity improver include thixotropic agents such as aluminum stearate, fatty acid amide, and organic bentonite, and leveling agents such as glycerin.
In addition, the resin of the present invention can be used as an ultraviolet absorber after volatilizing the solvent, such as polypropylene, polyethylene, polyethylene terephthalate, polystyrene, acrylonitrile-styrene resin, acrylonitrile-butadiene resin, polycarbonate, vinyl chloride and the like. It can be blended with plastic and kneaded.
Moreover, it can also mix | blend with rubbers, such as natural rubber, SBR, NBR, isoprene rubber, EPDM, and silicone rubber.
[0013]
As an alkaline agent for peeling a film made of a resin having an acid value of 50 to 500 according to the present invention, ammonia, water-soluble amino alcohols, water-soluble aliphatic amines and various alkali inorganic salts are appropriately dissolved in water. The pH is adjusted to 8 or higher, and a surfactant or the like can be added as necessary.
EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited at all by these examples.
[0014]
【Example】
(Examples 1-6)
Table 1 shows the reaction type ultraviolet absorber represented by the general formula (1) or (2), the polymerizable dimethylpolysiloxane represented by the general formula (3), and the acrylic monomer in a 100 ml polymerization reactor. The mixture was charged in an amount, 25 g of tetrahydrofuran was added as a solvent, and the mixture was refluxed at a temperature of 60 ° C. with stirring in a nitrogen stream and reacted for 10 hours. After the reaction, 0.01 g of hydroquinone was added as a polymerization inhibitor to terminate the polymerization reaction, and the copolymer solutions of Examples 1 to 6 shown in Table 1 were obtained. A single peak was obtained in the GPC measurement of the nonvolatile content of the obtained copolymer solution. Moreover, the number average molecular weight in polystyrene conversion was calculated | required. The acid value was measured by a neutralization method.
(Comparative Example 1)
In a 100 ml polymerization reactor, the polymerizable dimethylpolysiloxane represented by the general formula (3), acrylic acid, and methyl methacrylate are charged in the blending amounts shown in Table 1, and 25 g of isopropyl alcohol is added as a solvent in a nitrogen stream. The mixture was reacted at a temperature of 70 ° C. for 6 hours with stirring. After the reaction, 0.01 g of hydroquinone was added as a polymerization inhibitor to terminate the polymerization reaction, and a copolymer solution of Comparative Example 1 shown in Table 1 was obtained. A single peak was obtained in the GPC measurement of the nonvolatile content of the obtained copolymer solution. Moreover, the number average molecular weight in polystyrene conversion was calculated | required. The acid value was measured by a neutralization method.
(Comparative Example 2)
A 100 ml four-necked flask is charged with the reactive ultraviolet absorber represented by the general formula (1) and methyl methacrylate in the amounts shown in Table 1, and 25 g of toluene is added as a solvent, and the mixture is stirred up to 80 ° C. The temperature rose. Then, 0.05 g of azobisisobutyronitrile was added as a polymerization initiator in a nitrogen stream and reacted at a temperature of 80 ° C. for 12 hours. After the reaction, 0.01 g of hydroquinone was added as a polymerization inhibitor to terminate the polymerization reaction, and a copolymer solution of Comparative Example 2 shown in Table 1 was obtained. A single peak was obtained in the GPC measurement of the nonvolatile content of the obtained copolymer solution. Moreover, the number average molecular weight in polystyrene conversion was calculated | required. The acid value was measured by a neutralization method.
[0015]
(performance test)
The performances of the copolymers obtained in Examples 1 to 6 and Comparative Examples 1 and 2 were evaluated by the method described below.
The copolymer solution obtained in each example and comparative example was directly applied to a clean glass plate with a cloth and dried, and the contact angle was measured to determine an alkaline agent having a pH of 8 (for example, ammonia water having a simple composition). The film removal property was determined. Further, the coated glass plate was immersed in water for 48 hours, and then pulled up and visually observed to determine transparency.
0.1 g of Solvent Yellow 151 dye is dissolved in ethanol, added to each copolymer solution, applied directly to a clean glass plate with a cloth and dried, and transmitted at a wavelength of 490 nm (maximum absorption wavelength of visible light). The rate was measured. Furthermore, it was exposed for 192 hours in a fade meter (FOM) test (specified in JIS B 7754), and the change in transmittance was examined.
[Table 1]
[0016]
[Effect of the present invention]
As is apparent from the results in Table 1, it was found that the copolymer of the present invention is a UV-absorbing polymer, and provides a resin composition for film formation and a film peeling method having weather resistance and water resistance.

Claims (6)

一般式(1)
{式中、Xは水素原子又はハロゲン基、Rは水素原子又は炭素数1〜8の炭化水素基、
は一般構造式 −R−(CH0〜2−R
但し、Rは−O−基、−CH−基、若しくは−CH(OH)−基が有り、又は無いことを示し、Rは構造式
又は
(但し、Rは水素原子または−CH基を示す。
で表わされる基である。)}
または一般式(2)
{式中、Yは水素原子又は水酸基、Rは水素原子又はRと同一の基、Rは構造式
−R−(CH0〜2−R
但し、Rは−O−基、−CH−基、若しくは−CH(OH)−基が有り、又は無いことを示し、Rは構造式
又は
(但し、R10は水素原子または−CH基を示す。
で表わされる基である。)}
で表わされる反応型紫外線吸収作用をもつ化合物と一般式(3)
(式中、R11は、水素原子又はメチル基
R12は、メチル基又はシアノ基
R13は、アルキレン基又はアルキレンオキシ基(炭素原子数1〜10)
Aは、酸素原子又はイミノ基
aは、0〜6の整数
bは、10〜500の整数を示す。)
で表わされる重合性ジメチルポリシロキサンを反応させた紫外線吸収性樹脂であって、一般式(1)または(2)で表わされる反応型紫外線吸収作用をもつ化合物のポリマー中の含有率が0.1質量%〜85質量%であり、残部が一般式(3)で表わされる重合性ジメチルポリシロキサンである紫外線吸収性樹脂。
General formula (1)
{Wherein X is a hydrogen atom or a halogen group, R 1 is a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms,
R 2 has the general structural formula —R 3 — (CH 2 ) 0 -2 -R 4.
However, R 3 represents the presence or absence of an —O— group, —CH 2 — group, or —CH (OH) — group, and R 4 represents a structural formula.
Or
(Wherein, R 5 represents a hydrogen atom or -CH 3 group.
It is group represented by these. )}
Or general formula (2)
{In the formula, Y is a hydrogen atom or a hydroxyl group, R 6 is a hydrogen atom or R 7 the same group, R 7 is structural formula -R 8 - (CH 2) 0~2 -R 9
However, R 8 indicates that the —O— group, —CH 2 — group, or —CH (OH) — group is present or absent, and R 9 represents the structural formula.
Or
(However, R 10 represents a hydrogen atom or a —CH 3 group.
It is group represented by these. )}
And a compound represented by the general formula (3)
(Wherein R11 is a hydrogen atom or methyl group R12 is a methyl group or cyano group R13 is an alkylene group or an alkyleneoxy group (1 to 10 carbon atoms))
A represents an oxygen atom or an imino group a, an integer b of 0 to 6 represents an integer of 10 to 500. )
The content of the compound represented by the general formula (1) or (2) having a reactive ultraviolet absorbing action in the polymer is 0.1. An ultraviolet-absorbing resin, which is a polymerizable dimethylpolysiloxane having a mass% to 85 mass% and the balance being represented by the general formula (3).
一般式(3)で表わされる重合性ジメチルポリシロキサンのポリマー中の含有率が10質量%〜70質量%であり、残部が一般式(1)または一般式(2)で表わされる反応型紫外線吸収作用をもつ化合物である紫外線吸収性樹脂。The content of the polymerizable dimethylpolysiloxane represented by the general formula (3) in the polymer is 10% by mass to 70% by mass, and the balance is the reactive ultraviolet absorption represented by the general formula (1) or the general formula (2). UV-absorbing resin that is a compound with action . ポリマーを構成する成分として、不飽和カルボン酸および/または(メタ)アクリル酸エステルをさらに含むことを特徴とする請求項1または請求項2に記載の紫外線吸収性樹脂。The ultraviolet absorbing resin according to claim 1 or 2 , further comprising an unsaturated carboxylic acid and / or a (meth) acrylic acid ester as a component constituting the polymer. 樹脂の酸価が50〜500であることを特徴とする請求項3に記載した紫外線吸収性樹脂。The ultraviolet-absorbing resin according to claim 3 , wherein the acid value of the resin is 50 to 500. 請求項3または請求項4に記載された紫外線吸収性樹脂と、脂肪族炭化水素系溶剤、芳香族炭化水素系溶剤、ニトロ化及び塩化炭化水素系溶剤、アルコール系溶剤、ケトン系溶剤、エーテルアルコール及びエーテル系溶剤、エステル及びエーテルエステル系溶剤からなる溶剤及び添加剤が酸化安定剤、光安定剤、紫外線吸収剤、流動性改善剤、顔料から選ばれた1種又は2種以上である添加剤からなる被膜形成用樹脂組成物。 The ultraviolet absorbing resin according to claim 3 or 4 , an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent, a nitration and chlorinated hydrocarbon solvent, an alcohol solvent, a ketone solvent, an ether alcohol And an ether solvent, an ester and an ether ester solvent, and an additive that is one or more selected from an oxidation stabilizer, a light stabilizer, an ultraviolet absorber, a fluidity improver, and a pigment A film-forming resin composition comprising: 請求項5に記載された被膜形成用樹脂組成物からなる塗膜を、pH8以上のアルカリ剤と反応させることにより塗膜を除去する方法。 The method of removing a coating film by making the coating film which consists of a resin composition for film formation described in Claim 5 react with the alkaline agent of pH8 or more.
JP2001195250A 2001-06-27 2001-06-27 UV-absorbing resin, resin composition for film formation using the same, and film peeling method Expired - Fee Related JP4650866B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001195250A JP4650866B2 (en) 2001-06-27 2001-06-27 UV-absorbing resin, resin composition for film formation using the same, and film peeling method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001195250A JP4650866B2 (en) 2001-06-27 2001-06-27 UV-absorbing resin, resin composition for film formation using the same, and film peeling method

Publications (2)

Publication Number Publication Date
JP2003012726A JP2003012726A (en) 2003-01-15
JP4650866B2 true JP4650866B2 (en) 2011-03-16

Family

ID=19033262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001195250A Expired - Fee Related JP4650866B2 (en) 2001-06-27 2001-06-27 UV-absorbing resin, resin composition for film formation using the same, and film peeling method

Country Status (1)

Country Link
JP (1) JP4650866B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6143338B2 (en) * 2013-04-10 2017-06-07 大日精化工業株式会社 High refractive index polymer and method for producing the same
JP7075349B2 (en) * 2016-12-14 2022-05-25 東京応化工業株式会社 Surface treatment liquid and surface treatment method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02180909A (en) * 1988-12-30 1990-07-13 Ipposha Oil Ind Co Ltd Benzophenone compound and its homopolymer or copolymer
JP2000044901A (en) * 1998-07-31 2000-02-15 Otsuka Chem Co Ltd Transfer foil
JP2000239599A (en) * 1999-02-17 2000-09-05 Ishihara Chem Co Ltd Alkali coating film-removing type coating composition and method for removing coating film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02180909A (en) * 1988-12-30 1990-07-13 Ipposha Oil Ind Co Ltd Benzophenone compound and its homopolymer or copolymer
JP2000044901A (en) * 1998-07-31 2000-02-15 Otsuka Chem Co Ltd Transfer foil
JP2000239599A (en) * 1999-02-17 2000-09-05 Ishihara Chem Co Ltd Alkali coating film-removing type coating composition and method for removing coating film

Also Published As

Publication number Publication date
JP2003012726A (en) 2003-01-15

Similar Documents

Publication Publication Date Title
JP5290951B2 (en) Water-based resin composition for paint
AU742504B2 (en) Reactive coalescents
JP5637500B2 (en) Method for producing vinyl polymer and vinyl polymer
JP3404160B2 (en) Methacrylic lacquer composition
JP4650866B2 (en) UV-absorbing resin, resin composition for film formation using the same, and film peeling method
JPH06299132A (en) Tacky adhesive composition
JP5122137B2 (en) Graft copolymer, coating agent, and method for forming coating film
JP2009280675A (en) Water-based coating composition
JP2004217695A (en) Aqueous ultraviolet light-absorbing resin composition and method for producing the same
JP3251470B2 (en) UV absorbing copolymer
KR102091156B1 (en) Polymer binder spraying composition for blocking electromagnetic wave and preparation method thereof
EP1041094B1 (en) Water-based coating composition
JP3549030B2 (en) UV absorbing lacquer composition
JP4537552B2 (en) (Meth) acrylic ester resin composition
JP5625268B2 (en) Method for producing polymer
JP2007152962A (en) Ultraviolet-absorbent composite film
JP2009126990A (en) Two-component-curing fluorine-containing vinyl copolymer composition
JP2006124569A (en) Maleimide copolymer, method for producing the same and optical film obtained from the same
JP2001342221A (en) Cyclohexyl group-containing (meth)acrylic acid ester- based copolymer
JP4294765B2 (en) Room temperature curable coating composition
JP2002080680A (en) Resin composition and coating liquid prepared by using the same
JP4070017B2 (en) Aqueous resin dispersion and method for producing the same
JPH08253654A (en) Heat curatable coating composition
EP1046670B1 (en) Ultraviolet absorptive resin composition
JPH078970B2 (en) Curable coating composition

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080312

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100707

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100715

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100825

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101201

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101208

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101210

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131224

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees