JP4645694B2 - Electrolytic processing method - Google Patents

Electrolytic processing method Download PDF

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JP4645694B2
JP4645694B2 JP2008190760A JP2008190760A JP4645694B2 JP 4645694 B2 JP4645694 B2 JP 4645694B2 JP 2008190760 A JP2008190760 A JP 2008190760A JP 2008190760 A JP2008190760 A JP 2008190760A JP 4645694 B2 JP4645694 B2 JP 4645694B2
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hole
electrode
opening
peripheral wall
wall portion
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JP2008290240A (en
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昭憲 松熊
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Denso Corp
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Description

本発明は、被加工物と電極との間に電解液を満たして両者間に電流を供給することにより行う電解加工方法及び電解加工装置に関し、特に、被加工物に、第1の孔と、第1の孔の周壁部に開口する第2の孔とが形成されている場合に、第1の孔の周壁部と第2の孔の周壁部とが接する部分であるエッジ部を、略曲面状に加工するための電解加工方法及び電解加工装置に関する。   The present invention relates to an electrolytic processing method and an electrolytic processing apparatus that are performed by filling an electrolytic solution between a workpiece and an electrode and supplying a current between the two, and in particular, a first hole in the workpiece, When the second hole opened in the peripheral wall portion of the first hole is formed, an edge portion which is a portion where the peripheral wall portion of the first hole and the peripheral wall portion of the second hole are in contact with each other is substantially curved. The present invention relates to an electrolytic processing method and an electrolytic processing apparatus for processing into a shape.

従来の電解加工方法は、図9(a)に示すように、電極102の形状を、製品の形状に合わせて形成しておき、硝酸ナトリウム(NaNO3)や塩化ナトリウム(NaCl)等の水溶液からなる電解液103中で、電極102と被加工物101とを所定の間隔を置いて対向させ、被加工物101と電極102との間にパルス電流を供給することにより行っていた。 In the conventional electrolytic processing method, as shown in FIG. 9 (a), the shape of the electrode 102 is formed in accordance with the shape of the product, and an aqueous solution such as sodium nitrate (NaNO 3 ) or sodium chloride (NaCl) is used. In the electrolytic solution 103, the electrode 102 and the workpiece 101 are opposed to each other with a predetermined interval, and a pulse current is supplied between the workpiece 101 and the electrode 102.

被加工物が鉄材であるとして、電解加工のメカニズムについて説明すると、被加工物101は電流供給開始時に、酸化膜Fe23に覆われた状態であり、この状態で電流が供給されると、酸化膜は、Fe23+6H++2e→2Fe2++3H2Oで示される反応によって電解液中に溶解する。そして、Fe2++2OH-→Fe(OH)2で示される反応により、スラッジFe(OH)2が発生し、一方、2H++2e→H2で示される反応により、水素ガスが発生する。電流が停止されると、スラッジとガスの排出が、電解液の流れにより促進され、被加工物101の母材が表面に現れて、被加工物101の表面が再び酸化膜で覆われる。そして、電流の供給、停止が繰り返されることにより、かかる酸化膜生成、酸化膜溶解、スラッジ及びガスの発生、スラッジ及びガスの排出、が繰り返されて、被加工物101の加工が進展することとなる。 Assuming that the workpiece is an iron material, the mechanism of electrolytic machining will be described. When the current supply is started, the workpiece 101 is covered with the oxide film Fe 2 O 3 , and current is supplied in this state. The oxide film is dissolved in the electrolytic solution by a reaction represented by Fe 2 O 3 + 6H + + 2e → 2Fe 2+ + 3H 2 O. Then, sludge Fe (OH) 2 is generated by the reaction represented by Fe 2+ + 2OH → Fe (OH) 2 , while hydrogen gas is generated by the reaction represented by 2H + + 2e → H 2 . When the current is stopped, the discharge of sludge and gas is promoted by the flow of the electrolytic solution, the base material of the workpiece 101 appears on the surface, and the surface of the workpiece 101 is again covered with the oxide film. Then, by repeatedly supplying and stopping the current, such oxide film generation, oxide film dissolution, sludge and gas generation, sludge and gas discharge are repeated, and the processing of the workpiece 101 progresses. Become.

ここで、従来の電解加工方法では、図9(b)に示すように、加工が進むにつれて電極102を被加工物101の方に送ることにより、電極102と被加工物101との間隔を一定に保ち、電解液の流れの安定を図って、電極102の形状を、被加工物101に、いわば転写していた。   Here, in the conventional electrolytic processing method, as shown in FIG. 9B, the electrode 102 is sent toward the workpiece 101 as the processing proceeds, so that the distance between the electrode 102 and the workpiece 101 is constant. Therefore, the shape of the electrode 102 was transferred to the workpiece 101 so as to stabilize the flow of the electrolytic solution.

なお、従来の電解加工装置としては、次のものが知られている。
特開平9−141528号公報
The following are known as conventional electrolytic processing apparatuses.
JP-A-9-141528

しかし、従来の電解加工方法では、図10(a)(b)に示すように、被加工物1に、第1の孔11と、第1の孔11に交差する第2の孔12とが形成されている場合に、第1の孔11の周壁部11aと第2の孔12の周壁部12aとが接する部分であるエッジ部13に、転写により、図10(c)のようなR付け(曲面付け、丸み付け)加工をしようとしても、第1の孔11と第2の孔12との交差部分に対して、R形状を有する電極を挿入し、加工が進むにつれてその電極を送ることは、困難であるという問題があった。   However, in the conventional electrolytic processing method, as shown in FIGS. 10A and 10B, the workpiece 1 has a first hole 11 and a second hole 12 intersecting the first hole 11. When formed, an R portion as shown in FIG. 10C is applied to the edge portion 13 where the peripheral wall portion 11a of the first hole 11 and the peripheral wall portion 12a of the second hole 12 are in contact with each other by transfer. (Curved, rounded) Even if processing is attempted, an electrode having an R shape is inserted into the intersection of the first hole 11 and the second hole 12, and the electrode is fed as processing proceeds. Had the problem of being difficult.

ここで、交差とは、十字をなすように交わる場合のみならず、一方が他方に突き当たった状態で交わる場合(例えば、図10の第1の孔11と第2の孔12のように略T字形状をなす場合や、略Y字形状をなす場合)も含むものとする。かかる2つの孔の交差部分が、例えば高圧燃料の通路となるような場合には、その交差部分のエッジ部を丸めておくことが、耐圧性向上のためには望ましい。   Here, the term “crossing” refers not only to the case of crossing so as to form a cross, but also to the case of crossing in a state where one of the two hits the other (for example, approximately T like the first hole 11 and the second hole 12 in FIG. 10). It also includes a case of a letter shape or a case of a substantially Y shape). For example, when the intersection of the two holes serves as a passage for high-pressure fuel, it is desirable to round the edge of the intersection to improve pressure resistance.

そこで、図11に示すように、第2の孔12からのみ電極104を挿入し、電解液を第1の孔11から第2の孔12に流入させるとともに、被加工物1と電極104との間に電流を供給すると、エッジ部13は電解加工されるが、単に角を取る所謂ダラシ加工や、バリ取り加工はできるものの、R付け加工を含めて、エッジ部13を略曲面状にする加工はできないという問題があった。なお、第2の孔12の加工したくない部分には、絶縁部材105を対向させている。   Therefore, as shown in FIG. 11, the electrode 104 is inserted only from the second hole 12, and the electrolytic solution flows into the second hole 12 from the first hole 11. When an electric current is supplied between them, the edge portion 13 is electrolytically processed. However, the edge portion 13 can be processed into a substantially curved surface including a rounding process, although so-called dulling processing and deburring processing can be performed. There was a problem that I could not. Note that the insulating member 105 is opposed to a portion of the second hole 12 that is not desired to be processed.

また、図12に示すように、第1の孔11からのみ電極106を挿入し、電解液を電極106内に形成された流路106bを介して、第1の孔11に流入させ、第1の孔11から第2の孔12に流入させると、エッジ部13は加工されるが、やはりダラシ加工やバリ取り加工はできるものの、略曲面状にする加工はできないという問題があった。なお、電極106には第2の孔12に対向させて突出部106aが形成され、また、第1の孔11には絶縁部材107が挿入されて、加工したくない部分を覆っている。   Also, as shown in FIG. 12, the electrode 106 is inserted only from the first hole 11, and the electrolytic solution is caused to flow into the first hole 11 through the flow path 106 b formed in the electrode 106, The edge portion 13 is processed when it is caused to flow into the second hole 12 from the hole 11, but there is a problem that it is not possible to process it into a substantially curved surface although it can still be dulled and deburred. The electrode 106 is formed with a protruding portion 106a facing the second hole 12, and the insulating member 107 is inserted into the first hole 11 to cover a portion that is not desired to be processed.

この発明は、上述した問題を解決するものであり、被加工物に、第1の孔と、第1の孔の周壁部に開口する第2の孔とが形成されている場合に、第1の孔の周壁部と第2の孔の周壁部とが接する部分であるエッジ部を、略曲面状に加工することが可能な電解加工方法を提供することを目的とする。   The present invention solves the above-described problem. When the first hole and the second hole opened in the peripheral wall portion of the first hole are formed in the workpiece, the first hole is formed. It is an object of the present invention to provide an electrolytic processing method capable of processing an edge portion, which is a portion where the peripheral wall portion of the second hole and the peripheral wall portion of the second hole are in contact, into a substantially curved surface shape.

なお、この明細書及び特許請求の範囲において、略曲面状とは、略滑らかに曲がった面をなしている状態を言い、複数の曲がった面が略滑らかに連続している状態(波形面状)も含む意である。   In this specification and claims, the substantially curved surface shape means a state in which a substantially smoothly curved surface is formed, and a state in which a plurality of curved surfaces are substantially smoothly continuous (corrugated surface shape). ).

本発明の電解加工方法は、第1の孔と前記第1の孔の周壁部に開口する第2の孔とが形成された被加工物の、前記第1の孔の周壁部と前記第2の孔の周壁部とが接する部分であるエッジ部を加工する電解加工方法であって、前記第1の孔に、前記第2の孔の開口部に対向する部位が開口した絶縁部材を配置して、前記絶縁部材と前記第1の孔の周壁部との間の少なくとも前記第2の孔の開口部の周囲に、前記第1の孔の周壁部の、前記第2の孔の開口部の周囲に、前記第1の孔の径方向における外方に凹む凹部を設けることにより、チャンバーを設け、前記第1の孔または前記第2の孔の少なくとも一方に、電極を挿入し、前記第1の孔から前記第2の孔の開口部を介して前記第2の孔に電解液を流入させるとともに、前記被加工物と前記電極との間に電流を供給して、前記エッジ部を加工することを特徴とする。 In the electrolytic processing method of the present invention, the peripheral wall portion of the first hole and the second hole of the workpiece in which the first hole and the second hole opening in the peripheral wall portion of the first hole are formed. An electrolytic processing method for processing an edge portion, which is a portion in contact with a peripheral wall portion of a hole, wherein an insulating member having a portion facing the opening portion of the second hole is disposed in the first hole. The opening of the second hole of the peripheral wall of the first hole is at least around the opening of the second hole between the insulating member and the peripheral wall of the first hole. A chamber is provided by providing a recess recessed outward in the radial direction of the first hole, and an electrode is inserted into at least one of the first hole or the second hole. The electrolyte is allowed to flow into the second hole from the hole of the second hole through the opening of the second hole. By supplying a current between, characterized by processing the edge portion.

これによれば、チャンバーが電解液の液溜りになることにより、第1の孔から第2の孔に流れ込むときの電解液の急縮が抑制されて、電解液の流れが安定化するので、第1の電極及び第2の電極を、送りを行わない固定電極としても、第1の電極及び第2の電極と被加工物との間隔の変化による電解液の流れの変化を抑制でき、安定してガスやスラッジを排出でき、エッジ部の加工形状を安定化できるとともに、エッジ部を略曲面状に加工することが可能となる。   According to this, since the chamber becomes a liquid reservoir of the electrolytic solution, the rapid contraction of the electrolytic solution when flowing from the first hole into the second hole is suppressed, and the flow of the electrolytic solution is stabilized. Even if the first electrode and the second electrode are fixed electrodes that do not feed, the change in the flow of the electrolyte due to the change in the distance between the first electrode and the second electrode and the workpiece can be suppressed, and the stable Thus, gas and sludge can be discharged, the processing shape of the edge portion can be stabilized, and the edge portion can be processed into a substantially curved shape.

(第1実施形態)本発明の第1実施形態の電解加工方法について、図面に基づいて説明する。図1及び図2に示すように、鉄製の被加工物1には、断面略円形の第1の孔11と、断面略円形の第2の孔12とが形成されている。第2の孔12は、第1の孔11よりも小径である。第2の孔12は、図10に示すように、第1の孔11に対して略T字形状をなすように交差しており、第1の孔11の周壁部11aに一端が開口している。本実施形態では、絶縁性を有する部材(以下、絶縁部材と言う。)2と、第1の電極3と、第2の電極4とを備えた電解加工装置を用いて、第1の孔11の周壁部11aと第2の孔12の周壁部12aとが接する部分(すなわち、周壁部11aと周壁部12aとをつなぐ部分)であるエッジ部13を加工する。   (First Embodiment) An electrolytic processing method according to a first embodiment of the present invention will be described with reference to the drawings. As shown in FIGS. 1 and 2, a first workpiece 11 having a substantially circular cross section and a second hole 12 having a substantially circular cross section are formed in the iron workpiece 1. The second hole 12 has a smaller diameter than the first hole 11. As shown in FIG. 10, the second hole 12 intersects the first hole 11 so as to form a substantially T shape, and one end is open to the peripheral wall portion 11 a of the first hole 11. Yes. In the present embodiment, the first hole 11 is formed using an electrolytic processing apparatus including an insulating member (hereinafter referred to as an insulating member) 2, a first electrode 3, and a second electrode 4. The edge portion 13, which is a portion where the peripheral wall portion 11 a and the peripheral wall portion 12 a of the second hole 12 are in contact (that is, a portion connecting the peripheral wall portion 11 a and the peripheral wall portion 12 a) is processed.

絶縁部材2は、有底の略円筒形状に形成されている。絶縁部材2の上壁部22は、中央部に略円形状の挿入口23が形成された略円環状をなし、外径は第1の孔11と略同径とされている。絶縁部材2の下壁部21は、第1の孔11と略同径の略円形状をなしている。絶縁部材2の周壁部24は、挿入口23よりも大径で第1の孔11よりも小径の外径を有する略円筒形状とされている。すなわち、下壁部21と上壁部22とは、周壁部24よりも外側に鍔状に突出している。周壁部24には、上壁部22と下壁部21との中間位置に、第2の孔12よりも大径の略円形状の開口部25が形成されている。   The insulating member 2 is formed in a bottomed substantially cylindrical shape. The upper wall portion 22 of the insulating member 2 has a substantially annular shape in which a substantially circular insertion port 23 is formed in the central portion, and has an outer diameter substantially the same as that of the first hole 11. The lower wall portion 21 of the insulating member 2 has a substantially circular shape having the same diameter as that of the first hole 11. The peripheral wall portion 24 of the insulating member 2 has a substantially cylindrical shape having an outer diameter that is larger than the insertion port 23 and smaller than the first hole 11. That is, the lower wall portion 21 and the upper wall portion 22 protrude in a bowl shape outward from the peripheral wall portion 24. A substantially circular opening 25 having a diameter larger than that of the second hole 12 is formed in the peripheral wall portion 24 at an intermediate position between the upper wall portion 22 and the lower wall portion 21.

第1の電極3は、有底の略円筒形状に形成され、外径は挿入口23と略同径である。第1の電極3の上端には、流入口34が形成されている。第1の電極3の周壁部33には、2つの流出口31が、互いに対向するように形成されている。各流出口31は、開口部25より小径で、第2の電極4よりも大径の略円形状をなしている。   The first electrode 3 is formed in a substantially cylindrical shape with a bottom, and the outer diameter is substantially the same as that of the insertion port 23. An inlet 34 is formed at the upper end of the first electrode 3. Two outflow ports 31 are formed in the peripheral wall portion 33 of the first electrode 3 so as to face each other. Each outflow port 31 has a substantially circular shape having a smaller diameter than the opening 25 and a larger diameter than the second electrode 4.

第2の電極4は、第2の孔12よりも小径の略丸棒状に形成されており、先端部41とは反対側の基端部には、絶縁部材42が配設されている。   The second electrode 4 is formed in a substantially round bar shape having a smaller diameter than the second hole 12, and an insulating member 42 is disposed at the base end portion opposite to the tip end portion 41.

次に、以上のように構成された絶縁部材2、第1の電極3、及び、第2の電極4の配置手順について説明する。   Next, the arrangement | positioning procedure of the insulating member 2, the 1st electrode 3, and the 2nd electrode 4 comprised as mentioned above is demonstrated.

本実施形態では、まず、絶縁部材2を、開口部25が周壁部11aにおける第2の孔12の開口部12bに対向するように、第1の孔11内に挿入する。   In the present embodiment, first, the insulating member 2 is inserted into the first hole 11 so that the opening 25 faces the opening 12b of the second hole 12 in the peripheral wall 11a.

次に、第1の電極3を、挿入口23から絶縁部材2内に、流出口31の1つが開口部12bに対向するように、絶縁部材2内に挿入する。流出口31、31を区別するときは、開口部12bに対向する流出口31を流出口31a、その反対側の流出口31を流出口31bと表記する。流出口31aは、開口部25の開口面を介して開口部12bと対向し、流出口31aの周囲に相当する第1の電極3の一部が、開口部12bの周囲と対向することとなる。流出口31aは、後述するように、第2の電極4の先端部41が挿入される被挿入部となる。   Next, the first electrode 3 is inserted into the insulating member 2 from the insertion port 23 so that one of the outlets 31 faces the opening 12b. When distinguishing the outflow ports 31, 31, the outflow port 31 facing the opening 12b is referred to as an outflow port 31a, and the outflow port 31 on the opposite side is referred to as an outflow port 31b. The outflow port 31a faces the opening 12b through the opening surface of the opening 25, and a part of the first electrode 3 corresponding to the periphery of the outflow port 31a faces the periphery of the opening 12b. . As will be described later, the outflow port 31a serves as an insertion portion into which the distal end portion 41 of the second electrode 4 is inserted.

そして、第1の電極3の周壁部33と絶縁部材2の周壁部24との間には間隔があき、周壁部24と第1の孔11の周壁部11aとの間にも間隔があくことから、周壁部33と周壁部11aとの間には間隔が置かれることとなる。また、第1の電極3の下壁部32と絶縁部材2の下壁部21との間にも、間隔が置かれる。   And there is a gap between the peripheral wall 33 of the first electrode 3 and the peripheral wall 24 of the insulating member 2, and there is also a gap between the peripheral wall 24 and the peripheral wall 11 a of the first hole 11. Therefore, a space is provided between the peripheral wall portion 33 and the peripheral wall portion 11a. Further, a space is also provided between the lower wall portion 32 of the first electrode 3 and the lower wall portion 21 of the insulating member 2.

なお、絶縁部材2内に第1の電極3を挿入しておいてから、その絶縁部材2を第1の孔11内に挿入してもよい。   Note that the insulating member 2 may be inserted into the first hole 11 after the first electrode 3 has been inserted into the insulating member 2.

次に、第2の電極4を、第2の孔12内に、第2の孔12の周壁部12aとの間に間隔を置いて、開口部12bとは反対側の開口部から挿入する。そして、第2の電極4の先端部41を、開口部12bから第1の孔11内に突出させる。すなわち、第2の電極4の先端部41を含む一部を、開口部12bから第1の孔11内に延設する。   Next, the second electrode 4 is inserted into the second hole 12 from the opening on the side opposite to the opening 12 b with a space between the second wall 4 and the peripheral wall 12 a of the second hole 12. And the front-end | tip part 41 of the 2nd electrode 4 is protruded in the 1st hole 11 from the opening part 12b. That is, a part including the tip portion 41 of the second electrode 4 is extended from the opening 12 b into the first hole 11.

そして、さらに、第2の電極4の先端部41を、開口部25に挿通して、流出口31a内に挿入する。ここで、先端部41が流出口31aに挿入できるということは、開口部25及び流出口31aが開口部12bに対向しており、第2の電極4が第2の孔12の軸方向に略沿って挿入されていることを意味する。すなわち、先端部41を流出口31aに挿入することにより、絶縁部材2、第1の電極3、及び、第2の電極4を正しく配置できることとなる。   Further, the tip 41 of the second electrode 4 is inserted through the opening 25 and inserted into the outlet 31a. Here, the fact that the tip portion 41 can be inserted into the outlet 31 a means that the opening 25 and the outlet 31 a are opposed to the opening 12 b, and the second electrode 4 is substantially in the axial direction of the second hole 12. It is inserted along. In other words, the insulating member 2, the first electrode 3, and the second electrode 4 can be correctly arranged by inserting the distal end portion 41 into the outflow port 31 a.

また、被加工物1が+側、第1の電極3及び第2の電極4が−側になるように、被加工物1と第1の電極3及び第2の電極4との間に、パルス電源5を接続する。なお、この接続は、絶縁部材2、第1の電極3、及び、第2の電極4の上述した配置の前か後かを問わない。   Further, between the workpiece 1 and the first electrode 3 and the second electrode 4 so that the workpiece 1 is on the + side and the first electrode 3 and the second electrode 4 are on the − side, A pulse power supply 5 is connected. This connection may be made before or after the above-described arrangement of the insulating member 2, the first electrode 3, and the second electrode 4.

以上のように、絶縁部材2、第1の電極3、及び、第2の電極4を配置後、図示しないポンプにより、流入口34を介して第1の電極3内に電解液(本実施形態ではNaNO3)を供給する。電解液は、図1及び図2の矢印に示すように、各流出口31から、第1の電極3と絶縁部材2との間に流出し、さらに、開口部25から、絶縁部材2と周壁部11aとの間に流出する。なお、流出口31bから流出した電解液は、第1の電極3の周壁部33と、絶縁部材2の周壁部24との間を流通して、開口部25から流出する。開口部25から流出した電解液は、開口部12bを介して第2の孔12に流入する。 As described above, after disposing the insulating member 2, the first electrode 3, and the second electrode 4, an electrolytic solution (this embodiment) is placed in the first electrode 3 through the inflow port 34 by a pump (not shown). Then, NaNO 3 ) is supplied. As shown by the arrows in FIGS. 1 and 2, the electrolyte flows out from each outlet 31 between the first electrode 3 and the insulating member 2, and further, from the opening 25, the insulating member 2 and the peripheral wall. It flows out between the part 11a. The electrolyte flowing out from the outlet 31 b flows between the peripheral wall portion 33 of the first electrode 3 and the peripheral wall portion 24 of the insulating member 2 and flows out from the opening 25. The electrolytic solution flowing out from the opening 25 flows into the second hole 12 through the opening 12b.

電解液は、第1の孔11内の絶縁部材2の上壁部22から下壁部21までの部分と、第2の孔12内とを満たした状態で、第1の孔11から第2の孔12へ流れるように、供給され続ける。なお、電解液が満たされた電解液槽内に被加工物1を配置するか否かは問わない。   The electrolytic solution is filled from the first hole 11 to the second hole in a state where the portion from the upper wall portion 22 to the lower wall portion 21 of the insulating member 2 in the first hole 11 and the inside of the second hole 12 are filled. It continues to be supplied so as to flow to the holes 12 of In addition, it does not ask | require whether the to-be-processed object 1 is arrange | positioned in the electrolyte solution tank with which the electrolyte solution was satisfy | filled.

そして、電解液を供給する一方、パルス電源5により、被加工物1と第1の電極3との間、及び、被加工物1と第2の電極4との間に、パルス電流を供給する。すると、図3の矢印に示すように、絶縁部材2及び絶縁部材42に対向する部分を除いて、被加工物1は、第1の電極3と第2の電極4から電流を受けることとなる。特に、エッジ部13の角部13aは、開口部12bの周囲に対向する第1の電極3の一部と、開口部12b(開口部12bの周縁部がエッジ部13に相当する。)を通って第1の孔11内に配置される第2の電極4の一部とから電流を受けて、電流が集中することとなるので、エッジ部13は略曲面状に加工されることとなる。また、第1の電極3と第2の電極4の両方からの電流を受けるので、エッジ部13の加工速度が速くなるとともに、要求されるR(曲率半径)の大きさの確保が可能となる。   While supplying the electrolytic solution, a pulse current 5 supplies a pulse current between the workpiece 1 and the first electrode 3 and between the workpiece 1 and the second electrode 4. . Then, as shown by the arrows in FIG. 3, the workpiece 1 receives current from the first electrode 3 and the second electrode 4 except for the portions facing the insulating member 2 and the insulating member 42. . In particular, the corner portion 13a of the edge portion 13 passes through a part of the first electrode 3 facing the periphery of the opening portion 12b and the opening portion 12b (the peripheral portion of the opening portion 12b corresponds to the edge portion 13). Then, current is received from a part of the second electrode 4 disposed in the first hole 11 and the current is concentrated, so that the edge portion 13 is processed into a substantially curved surface shape. Further, since the current from both the first electrode 3 and the second electrode 4 is received, the processing speed of the edge portion 13 is increased and the required R (curvature radius) can be ensured. .

また、第1の電極3の周壁部33には、流出口31、31が対向して設けられ、下壁部32には流出口が設けられていないので、電解液が第1の電極3から対称的に流出し、電解液の流れの偏りは小さくなる。このため、エッジ部13を通過する電解液の流れも、エッジ部13全周で略均等となって乱れにくくなり、エッジ部13の加工形状を安定させることができる。   Moreover, since the outflow ports 31 and 31 are provided to face the peripheral wall portion 33 of the first electrode 3 and the outflow port is not provided to the lower wall portion 32, the electrolyte is supplied from the first electrode 3. It flows out symmetrically and the deviation of the flow of the electrolyte is reduced. For this reason, the flow of the electrolyte solution that passes through the edge portion 13 is also substantially uniform along the entire circumference of the edge portion 13 and is less likely to be disturbed, and the processed shape of the edge portion 13 can be stabilized.

さらに、絶縁部材2の開口部25は、上壁部22と下壁部21との中間位置に形成されており、開口部25の位置に合わせて流出口31aが配置されることから、流出口31a、31bは、上壁部22と下壁部21との中間位置に配置される。このため、開口部12bには、図2における上側と下側とから略均等に電解液が流れ込んで、流れが乱れにくくなり、エッジ部13の加工形状は更に安定することとなる。   Further, the opening 25 of the insulating member 2 is formed at an intermediate position between the upper wall portion 22 and the lower wall portion 21, and the outlet 31 a is arranged in accordance with the position of the opening 25. 31 a and 31 b are arranged at an intermediate position between the upper wall portion 22 and the lower wall portion 21. For this reason, the electrolytic solution flows into the opening 12b from the upper side and the lower side in FIG. 2 almost evenly, and the flow is hardly disturbed, and the processed shape of the edge portion 13 is further stabilized.

また、図4に示すように、電解液の供給方向を変えた実験では、第2の孔12から第1の孔11に電解液を供給した場合(正流方向)には、エッジ部13に角やしわが発生し、第1の孔11から、第2の孔12の軸方向に略沿って、第2の孔12に電解液を供給した場合(逆流方向)には、エッジ部13にR付けが可能であり、第1の孔11から、第2の孔12の軸方向に対して略直交する方向に電解液を流すことにより、第2の孔12に電解液を供給した場合(横流方向)には、エッジ部13のR付けが不均一となった。すなわち、R付けするためには、本実施形態のように、第1の孔11から、第2の孔12の軸方向に略沿って、第2の孔12に電解液を供給する逆流方向が、良いことが分かった。なお、図4に示す実験では、逆流方向の場合に流れ跡が発生したので、更に流れを安定させるために、本実施形態では、チャンバー6を設けた。   As shown in FIG. 4, in an experiment in which the supply direction of the electrolytic solution is changed, when the electrolytic solution is supplied from the second hole 12 to the first hole 11 (positive flow direction), the edge portion 13 is In the case where corners and wrinkles are generated and electrolyte is supplied from the first hole 11 to the second hole 12 substantially along the axial direction of the second hole 12 (in the reverse flow direction), When the electrolyte solution is supplied to the second hole 12 by flowing the electrolyte solution from the first hole 11 in a direction substantially orthogonal to the axial direction of the second hole 12 (see FIG. In the lateral flow direction), the edge portion 13 was not evenly rounded. That is, in order to apply R, there is a reverse flow direction in which the electrolytic solution is supplied from the first hole 11 to the second hole 12 substantially along the axial direction of the second hole 12 as in the present embodiment. I found it good. In the experiment shown in FIG. 4, since a flow trace was generated in the case of the backward flow direction, the chamber 6 was provided in the present embodiment in order to further stabilize the flow.

図5は、本実施形態のように、絶縁部材2の周壁部24を、第1の孔11の周壁部11aから離して配置することにより、絶縁部材2と周壁部11aとの間にチャンバー6を設けた場合の電解液の流れの様子の説明図であり、図6は、周壁部24と周壁部11aとを離間させず、チャンバー6が設けられていない場合の電解液の流れの様子の説明図である。そして、図5(a)のB、C、Dに示す部位の流れを、図5(b)(c)(d)に示し、図6(a)のB、Cに示す部位の流れを、図6(b)(c)に示す。   FIG. 5 shows the chamber 6 between the insulating member 2 and the peripheral wall portion 11a by disposing the peripheral wall portion 24 of the insulating member 2 away from the peripheral wall portion 11a of the first hole 11 as in this embodiment. FIG. 6 is an explanatory diagram of the state of the electrolyte solution when the chamber 6 is provided, and FIG. 6 is a diagram of the state of the electrolyte solution when the chamber 6 is not provided without separating the peripheral wall portion 24 and the peripheral wall portion 11a. It is explanatory drawing. And the flow of the site | part shown to B, C, D of Fig.5 (a) is shown to FIG.5 (b) (c) (d), The flow of the site | part shown to B, C of Fig.6 (a) is shown, It shows to FIG.6 (b) (c).

図5及び図6から分かるように、チャンバー6が設けられていない場合には、図6(a)の矢印に示すように、流れの急縮(急激な縮小)が起こって、流れが乱れてしまうが、チャンバー6を設けた場合には、流れの急縮が抑えられて、流れの乱れが抑制され、図5(c)に示すように、流れが再層流化する。これは、図5(d)の矢印Eに示すように、チャンバー6が液溜りとなることにより、チャンバー6内の流れ(矢印F)で、開口部25から噴出される流れが、第2の孔12の開口部12b側へ押さえ込まれるからであると推測される。   As can be seen from FIG. 5 and FIG. 6, when the chamber 6 is not provided, as shown by the arrow in FIG. 6A, the flow suddenly contracts (rapid reduction) and the flow is disturbed. However, when the chamber 6 is provided, the rapid contraction of the flow is suppressed, the turbulence of the flow is suppressed, and the flow is relaminarized as shown in FIG. This is because, as indicated by an arrow E in FIG. 5 (d), when the chamber 6 becomes a liquid pool, the flow in the chamber 6 (arrow F) causes the flow ejected from the opening 25 to be the second. It is presumed that this is because the hole 12 is pressed to the opening 12b side.

すなわち、本実施形態によれば、チャンバー6が電解液の液溜りになることにより、第1の孔11から第2の孔12に流れ込むときの電解液の急縮が抑制されて、電解液の流れが安定化する。このため、第1の電極3及び第2の電極4を、送りを行わない固定電極としても、第1の電極3及び第2の電極4と被加工物1との間隔の変化による電解液の流れの変化を抑制でき、安定してガスやスラッジを排出でき、エッジ部13の加工形状を安定させることができて、エッジ部13を略曲面状に加工することが可能となる。   That is, according to the present embodiment, the chamber 6 becomes a reservoir of the electrolytic solution, so that the rapid contraction of the electrolytic solution when flowing from the first hole 11 to the second hole 12 is suppressed, and the electrolytic solution The flow stabilizes. For this reason, even if the first electrode 3 and the second electrode 4 are fixed electrodes that are not fed, the electrolyte solution due to a change in the distance between the first electrode 3 and the second electrode 4 and the workpiece 1 The change in flow can be suppressed, gas and sludge can be discharged stably, the processing shape of the edge portion 13 can be stabilized, and the edge portion 13 can be processed into a substantially curved surface shape.

(第2実施形態)次に、第2実施形態の電解加工方法について説明する。なお、第1実施形態の各構成要素と対応する構成要素については、第1実施形態と同じ符号を用い、その説明を適宜省略する。図7に示すように、第2実施形態では、第1の電極3及び第2の電極4の形状は、第1実施形態と同じであるが、絶縁部材2の形状が異なる。第2実施形態に用いる絶縁部材2は、周壁部24が、第1の孔11と略同径の外径を有する略円筒形状とされている。すなわち、第1実施形態に用いた絶縁部材2では、下壁部21と上壁部22とが、周壁部24よりも外側に鍔状に突出していたが、第2実施形態に用いる絶縁部材2では、上壁部22、周壁部24、及び、下壁部21の外径は、同じとされ、下壁部21と上壁部22とが鍔状に突出してはいない。   (Second Embodiment) Next, the electrolytic processing method of the second embodiment will be described. In addition, about the component corresponding to each component of 1st Embodiment, the code | symbol same as 1st Embodiment is used and the description is abbreviate | omitted suitably. As shown in FIG. 7, in the second embodiment, the shapes of the first electrode 3 and the second electrode 4 are the same as those in the first embodiment, but the shape of the insulating member 2 is different. The insulating member 2 used in the second embodiment has a substantially cylindrical shape in which the peripheral wall portion 24 has an outer diameter substantially the same as that of the first hole 11. That is, in the insulating member 2 used in the first embodiment, the lower wall portion 21 and the upper wall portion 22 protrude in a bowl shape outward from the peripheral wall portion 24, but the insulating member 2 used in the second embodiment. Then, the outer diameter of the upper wall part 22, the surrounding wall part 24, and the lower wall part 21 is made the same, and the lower wall part 21 and the upper wall part 22 do not protrude in a bowl shape.

また、第2実施形態では、被加工物1の第2の孔12の開口部12bの周囲を、切削加工等により欠落させることにより、第1の孔11の周壁部11aには、第2の孔12の開口部12bの周囲に、第1の孔11の径方向における外方に凹む凹部11bが設けられている。   In the second embodiment, the periphery of the opening 12b of the second hole 12 of the workpiece 1 is omitted by cutting or the like, so that the peripheral wall 11a of the first hole 11 has a second A recess 11 b that is recessed outward in the radial direction of the first hole 11 is provided around the opening 12 b of the hole 12.

かかる凹部11bが設けられた状態で、絶縁部材2を第1の孔11に挿入すると、絶縁部材2と第1の孔11の周壁部11aとの間の、第2の孔12の開口部12bの周囲に、チャンバー6が設けられる。そして、第1の電極3と第2の電極4とを、第1実施形態と同様に挿入し、流入口34から電解液を供給すると、チャンバー6が液溜りとなって、第1実施形態と同様の効果が得られる。なお、図7には図示しないが、被加工物1と、第1の電極3及び第2の電極4との間には、パルス電源5により電流を供給する。   When the insulating member 2 is inserted into the first hole 11 with the recess 11b provided, the opening 12b of the second hole 12 between the insulating member 2 and the peripheral wall portion 11a of the first hole 11 is provided. Is provided with a chamber 6. And if the 1st electrode 3 and the 2nd electrode 4 are inserted similarly to 1st Embodiment and electrolyte solution is supplied from the inflow port 34, the chamber 6 will become a liquid reservoir, and 1st Embodiment Similar effects can be obtained. Although not shown in FIG. 7, a current is supplied by a pulse power source 5 between the workpiece 1 and the first electrode 3 and the second electrode 4.

(第3実施形態)第1、第2実施形態は、第1の孔11と第2の孔12とが略T字形状をなして交差する場合の加工方法であったが、図8に示すように、第1の孔11と第2の孔12とが略十字形状をなして交差しており、第1の孔11の周壁部11aに、開口部12bと対向して、第2の孔12の開口部12cが形成されている場合にも、本発明は適応可能である。以下、かかる場合の実施形態(第3実施形態)について説明する。なお、第1実施形態の各構成要素と対応する構成要素については、第1実施形態と同じ符号を用い、その説明を適宜省略する。   (Third Embodiment) The first and second embodiments are processing methods in the case where the first hole 11 and the second hole 12 intersect with each other in a substantially T shape, and are shown in FIG. As described above, the first hole 11 and the second hole 12 intersect each other in a substantially cross shape, and the second hole is opposed to the peripheral wall 11a of the first hole 11 so as to face the opening 12b. The present invention can also be applied to the case where twelve openings 12c are formed. Hereinafter, an embodiment (third embodiment) in such a case will be described. In addition, about the component corresponding to each component of 1st Embodiment, the code | symbol same as 1st Embodiment is used and the description is abbreviate | omitted suitably.

第3実施形態では、図8に示すように、絶縁部材2に、開口部25に対向するもう1つの開口部26を設けておき、絶縁部材2と第2の電極3とを、第1の孔11に挿入する。そして、第2の電極4を第2の孔12に挿入して、先端部41を、開口部12bから第1の孔11内に入れ、開口部25、流出口31a、31b、開口部26、開口部12cに、この順に挿通する。これにより、第2の電極4は、第1の電極3を貫通して第1の電極3と交差するとともに、第1の孔11を横切るように第1の孔11と交差した状態となる。そして、第2の電極4の一部である中間部43が、開口部12b、12cから第1の孔11内に延設された形となる。なお、第3実施形態の先端部41は絶縁部材とされている。   In the third embodiment, as shown in FIG. 8, the insulating member 2 is provided with another opening 26 facing the opening 25, and the insulating member 2 and the second electrode 3 are connected to the first member. Insert into hole 11. Then, the second electrode 4 is inserted into the second hole 12, the tip 41 is inserted into the first hole 11 from the opening 12b, the opening 25, the outlets 31a and 31b, the opening 26, The openings 12c are inserted in this order. As a result, the second electrode 4 passes through the first electrode 3 and intersects the first electrode 3 and also intersects the first hole 11 so as to cross the first hole 11. And the intermediate part 43 which is a part of 2nd electrode 4 becomes the form extended in the 1st hole 11 from the opening parts 12b and 12c. In addition, the front-end | tip part 41 of 3rd Embodiment is used as the insulating member.

かかる状態で、電解液及び電流を第1実施形態と同様に供給すれば、電解液が第1の孔11から開口部12b、12cを介して第2の孔12に流入するとともに、エッジ部13、及び、開口部12cの周縁部であるエッジ部14が、第1の電極3と第2の電極4の両方から電流を受けることになり、電流がエッジ部13、14に集中して、エッジ部13、14が略曲面状に加工されることとなる。   In this state, if the electrolytic solution and the current are supplied in the same manner as in the first embodiment, the electrolytic solution flows from the first hole 11 into the second hole 12 through the openings 12b and 12c, and the edge portion 13 is supplied. And the edge part 14 which is the peripheral part of the opening part 12c will receive an electric current from both the 1st electrode 3 and the 2nd electrode 4, an electric current concentrates on the edge parts 13 and 14 and an edge The parts 13 and 14 are processed into a substantially curved surface shape.

(その他の実施形態)なお第1、第2、第3実施形態では、面粗度向上のためパルス電源5を用いたが、単なる直流電源を用いることも可能である。   (Other Embodiments) In the first, second, and third embodiments, the pulse power source 5 is used for improving the surface roughness, but a simple DC power source may be used.

また、第1実施形態では、周壁部24を全周に亙って周壁部11aから離間させることにより、チャンバー6を第1の孔11の全周に亙って設けたが、チャンバー6は、第2実施形態のように、少なくとも第2の孔12の開口部12bの周囲に設ければよい。これは、第2実施形態のように、開口部12bの周囲に凹部11bを設けることによっても実現できるが、第2実施形態のような絶縁部材2において、開口部25の周囲を、絶縁部材2の径方向における内方に凹ませることによっても実現できる。   In the first embodiment, the chamber 6 is provided over the entire circumference of the first hole 11 by separating the peripheral wall portion 24 from the peripheral wall portion 11a over the entire circumference. What is necessary is just to provide at least around the opening part 12b of the 2nd hole 12 like 2nd Embodiment. This can also be realized by providing the recess 11b around the opening 12b as in the second embodiment. However, in the insulating member 2 as in the second embodiment, the insulating member 2 surrounds the opening 25. It can also be realized by indenting inward in the radial direction.

さらに、絶縁部材2の下壁部21と、第1の電極3の下壁部32との間に、間隙を設けない実施形態とすることもできる。   Furthermore, an embodiment in which no gap is provided between the lower wall portion 21 of the insulating member 2 and the lower wall portion 32 of the first electrode 3 can be provided.

すなわち、特許請求の範囲を逸脱しない範囲で、本発明は種々の実施形態を採り得る。   That is, the present invention can take various embodiments without departing from the scope of the claims.

第1実施形態の電解加工装置の概略断面図である。It is a schematic sectional drawing of the electrolytic processing apparatus of 1st Embodiment. 図1のII−II部位の概略断面及び電源を示す図である。It is a figure which shows the schematic cross section and power supply of the II-II site | part of FIG. 第1実施形態の電流の流れの様子の説明図である。It is explanatory drawing of the mode of the electric current flow of 1st Embodiment. 電解液の供給方向を変えて加工を行い、エッジ部の形状を調べた実験結果を示す図である。It is a figure which shows the experimental result which processed by changing the supply direction of electrolyte solution, and investigated the shape of the edge part. チャンバーを設けたときの電解液の流れの様子の説明図である。It is explanatory drawing of the mode of the flow of electrolyte solution when providing a chamber. チャンバーを設けないときの電解液の流れの様子の説明図である。It is explanatory drawing of the mode of the flow of electrolyte solution when not providing a chamber. 第2実施形態の電解加工装置の概略断面図である。It is a schematic sectional drawing of the electrolytic processing apparatus of 2nd Embodiment. 第3実施形態の電解加工装置の概略断面及び電源を示す図である。It is a figure which shows the schematic cross section and power supply of the electrolytic processing apparatus of 3rd Embodiment. 従来の電解加工の説明図である。It is explanatory drawing of the conventional electrolytic processing. (a)は、被加工物を第1の孔の軸方向に垂直な面で切断したときの概略断面図、(b)は、被加工物を第1の孔の軸方向に沿った面で切断したときの概略斜視図、(c)は、(b)においてエッジ部を加工した状態の図である。(A) is a schematic sectional view when the workpiece is cut along a plane perpendicular to the axial direction of the first hole, and (b) is a plane along the axial direction of the first hole. The schematic perspective view when cut | disconnected, (c) is a figure of the state which processed the edge part in (b). 第1の孔にのみ電極を挿入して電解加工を行った場合の説明図である。It is explanatory drawing at the time of performing an electrochemical process by inserting an electrode only in the 1st hole. 第2の孔にのみ電極を挿入して電解加工を行った場合の説明図である。It is explanatory drawing at the time of inserting an electrode only in the 2nd hole and performing electrolytic processing.

符号の説明Explanation of symbols

1…被加工物
2…絶縁部材
3…第1の電極
4…第2の電極
6…チャンバー
11…第1の孔
11a…周壁部
11b…凹部
12…第2の孔
12a…周壁部
12b、12c…開口部
13、14…エッジ部
25、26…開口部
31…流出口
DESCRIPTION OF SYMBOLS 1 ... Workpiece 2 ... Insulating member 3 ... 1st electrode 4 ... 2nd electrode 6 ... Chamber 11 ... 1st hole 11a ... Peripheral wall part 11b ... Recessed part 12 ... 2nd hole 12a ... Peripheral wall part 12b, 12c ... Opening 13, 14 ... Edge 25,26 ... Opening 31 ... Outlet

Claims (1)

第1の孔と前記第1の孔の周壁部に開口する第2の孔とが形成された被加工物の、前記第1の孔の周壁部と前記第2の孔の周壁部とが接する部分であるエッジ部を加工する電解加工方法であって、
前記第1の孔に、前記第2の孔の開口部に対向する部位が開口した絶縁部材を配置して、前記絶縁部材と前記第1の孔の周壁部との間の少なくとも前記第2の孔の開口部の周囲に、前記第1の孔の周壁部の、前記第2の孔の開口部の周囲に、前記第1の孔の径方向における外方に凹む凹部を設けることにより、チャンバーを設け、
前記第1の孔または前記第2の孔の少なくとも一方に、電極を挿入し、
前記第1の孔から前記第2の孔の開口部を介して前記第2の孔に電解液を流入させるとともに、前記被加工物と前記電極との間に電流を供給して、前記エッジ部を加工することを特徴とする電解加工方法。
The peripheral wall portion of the first hole and the peripheral wall portion of the second hole of the workpiece in which the first hole and the second hole opened in the peripheral wall portion of the first hole are in contact with each other. An electrochemical machining method for machining an edge part, which is a part,
An insulating member having a portion facing the opening of the second hole is disposed in the first hole, and at least the second portion between the insulating member and the peripheral wall of the first hole. By providing a recess recessed outward in the radial direction of the first hole around the opening of the second hole around the opening of the first hole, around the opening of the second hole. Provided,
Inserting an electrode into at least one of the first hole or the second hole;
The electrolyte is allowed to flow from the first hole to the second hole through the opening of the second hole, and an electric current is supplied between the workpiece and the electrode, and the edge portion An electrolytic processing method characterized by processing the material.
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JP6011242B2 (en) * 2012-10-23 2016-10-19 大信精機株式会社 Electrolytic processing equipment
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59205221A (en) * 1983-05-06 1984-11-20 Sankei Kogyosho:Kk Electropolishing method of cylinder internal surface opening edge and electrode available thereof
JPS62251014A (en) * 1986-04-22 1987-10-31 Besuto Eng:Kk Electrode for electro-chemical machining and electrolytic deburring

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59205221A (en) * 1983-05-06 1984-11-20 Sankei Kogyosho:Kk Electropolishing method of cylinder internal surface opening edge and electrode available thereof
JPS62251014A (en) * 1986-04-22 1987-10-31 Besuto Eng:Kk Electrode for electro-chemical machining and electrolytic deburring

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