JP4636573B2 - Method for forming light diffusion layer of reflective liquid crystal display device - Google Patents

Method for forming light diffusion layer of reflective liquid crystal display device Download PDF

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Publication number
JP4636573B2
JP4636573B2 JP2000332184A JP2000332184A JP4636573B2 JP 4636573 B2 JP4636573 B2 JP 4636573B2 JP 2000332184 A JP2000332184 A JP 2000332184A JP 2000332184 A JP2000332184 A JP 2000332184A JP 4636573 B2 JP4636573 B2 JP 4636573B2
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Japan
Prior art keywords
light
liquid crystal
crystal display
photosensitive resin
diffusion layer
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JP2000332184A
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Japanese (ja)
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JP2002139728A (en
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奈央 福本
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Kyocera Display Corp
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Kyocera Display Corp
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Description

【0001】
【発明の属する技術分野】
本発明は反射型液晶表示素子の光拡散層の形成方法に関し、さらに詳しく言えば、素子表面での外光の正反射角度とずれたところに明るさのピークを有する内面光拡散層の形成方法に関するものである。
【0002】
【従来の技術】
反射型液晶表示素子は、そのセル内面に光の拡散・反射層を形成することにより、外部からの光を有効に利用して明るい表示が得られるようにしている。その拡散層には様々な形態が知られているが、中でも露光機のコリメーションアングルおよび光の回折を利用したフォトリソ法による内面凹凸層が一般的に採用されている。
【0003】
ところで、反射型液晶表示素子には、その構造上、素子表面からの反射によって液晶表示が見づらくなるという固有的な問題が存在する。これを防止するため、従来においては、素子表面にアンチグレア処理やアンチリフレクター処理を施したり、もしくは入射光の角度を変換するフィルムを貼り付けるようにしている。
【0004】
また、別の方法として、内面凹凸層の反射のピークを、素子表面での外光の正反射角度からずらして液晶表示を見やすくするため、基板内面に塗布される感光性樹脂に表示面の上端から下端にかけて所定勾配の傾斜面を持たせた上で、その傾斜面上に内面凹凸層を形成することも行なわれている。
【0005】
【発明が解決しようとする課題】
しかしながら、素子表面に上記のような処理を施す場合には、コストが高くつくばかりでなく、液晶表示そのものが暗くなったり、コントラストが低下してしまうという課題が生ずる。また、傾斜面上に内面凹凸層を形成する方法では、製造工程が複雑になるとともに、面内のギャップ差が大きくなるため、これが表示ムラの原因となるので好ましくない。
【0008】
【課題を解決するための手段】
発明は、液晶表示がもっとも明るく見える角度と、素子表面での外光の正反射角度とをずらせて液晶表示を見やすくするため、観察面側透明電極基板との間で液晶層を挟持する裏面側透明電極基板の内面に感光性樹脂を塗布し、露光機からの光をフォトマスクを介して上記感光性樹脂に照射し現像することにより、上記裏面側透明電極基板の内面に微細な凹凸面を有する光拡散層を形成するにあたって、上記フォトマスクに同フォトマスクの法線に対する光傾斜角が漸次変化するプリズムを取り付け、上記露光機からの光を上記フォトマスクの法線に対して所定角度傾けて上記感光性樹脂を露光することを特徴としている。
【0009】
この場合、上記感光性樹脂に対する光の入射角は、上記法線に対して80゜以下、特には45゜以下で、さらにはその光入射角の変換量を連続的に変化させることが好ましい。また、上記感光性樹脂がポジ型感光性樹脂であることが好ましい。
【0010】
【発明の実施の形態】
まず、図1の実施形態を示した断面図により、本発明による反射型液晶表示素子の全体的な構成について説明する。この反射型液晶表示素子1は、裏面側透明電極基板2と、外光が入射される観察面側透明電極基板3とを備えている。
【0011】
裏面側透明電極基板2の内面には、微細な凹凸面を有する内面凹凸層(光拡散層)21が設けられており、この内面凹凸層21上には、例えばアルミニウム膜よりなる光反射層22が形成されている。
【0012】
光反射層22上には、例えばアクリル性樹脂をスピンナーにて塗布してなる表面平滑化層23が形成されている。なお、カラー表示の場合には、光反射層22上に電着法などによりカラーフィルタ層が設けられ、その上に表面平滑化層23が形成される。
【0013】
裏面側透明電極基板2には、上記表面平滑化層23上に透明導電膜としてのITO(Indium Tin Oxide)をスパッタしたものが用いられ、その表示部には所定にパターニングされた表示電極としてのITOパターン2aが形成されている。
【0014】
この実施形態において、観察面側透明電極基板3には引出電極形成用の端子部31が連設されており、観察面側透明電極基板3の表示部および端子部31には表示電極および引出電極としてのITOパターン3aが形成されている。
【0015】
裏面側透明電極基板2および観察面側透明電極基板3は、それらの各表示部を対向させた状態で周辺シール材4を介して互いに貼り合わせられる。なお、各表示部間には、そのセルギャップを一定に保つための図示しない面内スペーサが配置され、そのセルギャップ内に所定の液晶層6が封入されている。
【0016】
また、周辺シール材4内には、例えば導電ビーズからなるトランスファ材41が含まれており、このトランスファ材41を介して裏面側透明電極基板2のITOパターン2aが観察面側透明電極基板3の端子部31に形成されている引出電極に接続されている。観察面側透明電極基板3の表示面側には、位相差板7および偏光板8が貼着されている。
【0017】
図2に、裏面側透明電極基板2上に形成される内面凹凸層21の一部を拡大して示す。この図から分かるように、内面凹凸層21の凹溝211は、観察面側透明電極基板3の素子面(表示面)の法線Vに対して非対称となるように形成されている。
【0018】
すなわち、凹溝211は、観察面側透明電極基板3の素子面と平行な面を基準面として、傾斜が緩やかでスロープが長い斜面212と、傾斜がきつくスロープが短い斜面213とを含み、これにより、内面凹凸層21の反射のピークと、上記素子面での外光の正反射角度とがずらされ、液晶表示が見やすくなる。なお、図2は凹溝211を理想的に示したものであり、実際にはかなり変形された斜面も含まれる。
【0019】
上記凹溝211は、裏面側透明電極基板2上に感光性樹脂を均一厚さに塗布し、フォトマスクを介して紫外線を露光し現像した後、所定温度で焼成することにより形成されるが、一例として図3に示すフォトマスク100を用いることにより、凹溝211を非対称形状とすることができる。
【0020】
フォトマスク100は、ガラス基材101の裏面側に、多数の光透過孔を有する例えばクロム膜よりなるマスク102を形成したものであってよいが、その上面にはプリズム103が密着して取り付けられている。プリズム103の大きさは画面サイズ、画素サイズのいずれでもよい。
【0021】
このフォトマスク100によれば、図4に拡大して示すように、図示しない露光機からマスク法線に沿って照射された光(紫外線)がプリズム103により方向変換され、感光性樹脂に対し斜め方向から入射される。したがって、凹溝211の片側で露光量が多くなり、その反対側では露光量が少なくなるため、非対称の凹溝211が形成されることになる。
【0022】
ここで、凹溝211の傾斜が緩やかでスロープが長い斜面212の上記基準面に対する傾斜角をαとし、マスクの法線に対する光の傾斜角をβとすると、傾斜角αは傾斜角βに依存する。傾斜角βは80゜以下(特には45゜以下)が好ましい。
【0023】
実験によれば傾斜角βを45゜とした場合、約5゜の傾斜角αが得られた。この実験サンプルの反射測定を行なったところ、図5に示すように、素子面での外光の正反射角度をθとして、その正反射角度θから2αずれたところで内面凹凸層21による反射強度のピークが認められた。
【0024】
このように、内面凹凸層21による反射強度のピークを、素子面での外光の正反射角度とずれたところに設定したとしても、人がその表示を見る角度によっては、表示面の上端側と下端側とで、表示面の法線と目線とのなす角度が異なる場合があるため、表示面内でも反射強度が異なり、表示の明るさが一様でなくなることがある。
【0025】
これに対処するには、本発明の別の実施形態として、図6に示すように、マスクの法線に対する光傾斜角βが漸次変化するプリズム104を有するフォトマスク100を用いればよい。なお、プリズム角は曲線状に変化していることが好ましいが、場合によっては階段状に変化させたものでもよい。
【0026】
この別の実施形態において、プリズム104の図6において左端に位置する最大傾斜角γはマスク面に対して65゜であり、この最大傾斜角γ近辺でのマスクの法線に対する光の傾斜角βは45゜である。
【0027】
そして、プリズム104の傾斜角γは、図6において右側に行くにしたがって連続的に小さくなり、最終的に右端における傾斜角γは0゜で、光の傾斜角βも0゜となる。このように、光の傾斜角βを漸次変化させることにより、凹溝211の形状が、図6において拡大して示すように、左側部分Bの非対称形状から右側部分Aの対称形状へとなめらかに変化することになる。
【0028】
【実施例】
内面凹凸層形成用のフォトマスクの上面に、画面サイズの大きさで入射角が0〜45゜まで徐々に変化するようなガラス製プリズムを貼り付けた。そして、このフォトマスクを日立DECO社製の一括露光機LE−4050内にセットし、日本合成ゴム社製ポジ型感光性樹脂PC−403を2.5μm厚に塗布した基板を露光・現像・焼成して内面凹凸層を形成した。なお、画面の上端から下端までの長さは5cmとした。
【0029】
この凹凸面上にアルミニウム製反射膜をスパッタにより形成した後、基板の上端・中央・下端の計3個所の反射特性を測定した。反射特性の測定は、光を−30゜で入射させ、ディテクタ角度を55゜〜−20゜まで2.5゜刻みとして行なった。その結果、上端から中央そして下端に行くにしたがって反射のピークとなるディテクタ角度が約30゜,25゜,20゜と変化し、目視では面内で一様な明るさが得られていることが確認できた。
【0030】
【発明の効果】
以上説明したように、本発明によれば、光拡散層である内面凹凸層の凹溝形状を表示面の法線に対して非対称形状として、液晶表示がもっとも明るく見える角度と、表示面での外光の正反射角度とをずらせたことにより、素子表面にアンチグレア処理などを施すことなく、液晶表示を見やすくすることができる。
【0031】
また、プリズムにより光の入射角を変化させて、凹溝の非対称形状を画面の上端側から下端側にかけて漸次変化させることにより、表示画面内で一様な明るさをもつ反射型液晶表示素子が得られる。
【図面の簡単な説明】
【図1】本発明の実施形態に係る反射型液晶表示素子の全体構成を示した断面図。
【図2】上記反射型液晶表示素子に含まれている内面凹凸層の一部拡大断面図。
【図3】上記内面凹凸層を形成するためのフォトマスクを模式的に示した断面図。
【図4】上記内面凹凸層の形成方法を説明するための説明図。
【図5】上記実施形態の反射特性を示したグラフ。
【図6】本発明の別の実施形態を示した説明図。
【符号の説明】
1 反射型液晶表示素子
2 裏面側透明電極基板
21 内面凹凸層
211 凹溝
212,213 斜面
22 光反射層
23 表面平滑化層
3 表面側透明電極基板
4 周辺シール材
100 フォトマスク
101 ガラス基材
102 マスク
103,104 プリズム
[0001]
BACKGROUND OF THE INVENTION
The present invention also relates to a method for preparation of light-diffusing layer in the reflection type liquid crystal display element, more particularly, formation of the inner surface light diffusion layer having a brightness peak at offset specular reflection angle of the external light on the element surface It is about the method .
[0002]
[Prior art]
In the reflective liquid crystal display element, a light diffusing / reflecting layer is formed on the inner surface of the cell so that a bright display can be obtained by effectively using light from the outside. Various forms are known for the diffusion layer. Among them, an inner surface uneven layer by a photolithography method utilizing a collimation angle of an exposure machine and light diffraction is generally employed.
[0003]
By the way, the reflection type liquid crystal display element has a unique problem that the liquid crystal display becomes difficult to see due to reflection from the surface of the element due to its structure. In order to prevent this, conventionally, an antiglare process or an antireflector process is applied to the element surface, or a film for converting the angle of incident light is attached.
[0004]
As another method, the upper end of the display surface is applied to the photosensitive resin applied to the inner surface of the substrate in order to make the liquid crystal display easier to see by shifting the reflection peak of the inner concavo-convex layer from the regular reflection angle of the external light on the element surface. An inclined surface having a predetermined gradient from the bottom to the bottom is formed, and an inner surface uneven layer is formed on the inclined surface.
[0005]
[Problems to be solved by the invention]
However, when the above-described treatment is performed on the element surface, not only is the cost high, but there is a problem that the liquid crystal display itself becomes dark or the contrast is lowered. Further, the method of forming the inner surface uneven layer on the inclined surface is not preferable because the manufacturing process becomes complicated and the gap difference in the surface becomes large, which causes display unevenness.
[0008]
[Means for Solving the Problems]
In order to make the liquid crystal display easier to see by shifting the angle at which the liquid crystal display looks brightest and the regular reflection angle of external light on the element surface, the back surface sandwiching the liquid crystal layer with the transparent electrode substrate on the observation surface side By applying a photosensitive resin to the inner surface of the side transparent electrode substrate, and irradiating the photosensitive resin with light from an exposure device through a photomask and developing the surface, a fine uneven surface is formed on the inner surface of the rear surface side transparent electrode substrate. When the light diffusing layer having the above structure is formed, a prism whose light inclination angle with respect to the normal line of the photomask is gradually changed is attached to the photomask, and the light from the exposure device is set at a predetermined angle with respect to the normal line of the photomask. The photosensitive resin is exposed at an angle.
[0009]
In this case, it is preferable that the incident angle of light with respect to the photosensitive resin is 80 ° or less, particularly 45 ° or less with respect to the normal line, and that the conversion amount of the light incident angle is continuously changed. The photosensitive resin is preferably a positive photosensitive resin.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
First, the overall configuration of a reflective liquid crystal display device according to the present invention will be described with reference to a cross-sectional view illustrating the embodiment of FIG. The reflective liquid crystal display element 1 includes a back surface side transparent electrode substrate 2 and an observation surface side transparent electrode substrate 3 on which external light is incident.
[0011]
An inner surface uneven layer (light diffusion layer) 21 having a fine uneven surface is provided on the inner surface of the back surface side transparent electrode substrate 2, and a light reflection layer 22 made of, for example, an aluminum film is provided on the inner surface uneven layer 21. Is formed.
[0012]
On the light reflection layer 22, for example, a surface smoothing layer 23 formed by applying an acrylic resin with a spinner is formed. In the case of color display, a color filter layer is provided on the light reflection layer 22 by an electrodeposition method or the like, and a surface smoothing layer 23 is formed thereon.
[0013]
The back surface side transparent electrode substrate 2 is formed by sputtering ITO (Indium Tin Oxide) as a transparent conductive film on the surface smoothing layer 23, and the display portion has a predetermined patterned display electrode. An ITO pattern 2a is formed.
[0014]
In this embodiment, a terminal portion 31 for forming an extraction electrode is connected to the observation surface side transparent electrode substrate 3, and a display electrode and an extraction electrode are provided on the display portion and the terminal portion 31 of the observation surface side transparent electrode substrate 3. An ITO pattern 3a is formed.
[0015]
The back surface side transparent electrode substrate 2 and the observation surface side transparent electrode substrate 3 are bonded to each other via the peripheral sealing material 4 with their respective display portions facing each other. An in-plane spacer (not shown) for keeping the cell gap constant is disposed between the display portions, and a predetermined liquid crystal layer 6 is sealed in the cell gap.
[0016]
The peripheral sealing material 4 includes a transfer material 41 made of, for example, conductive beads, and the ITO pattern 2a of the back surface side transparent electrode substrate 2 is formed on the observation surface side transparent electrode substrate 3 via the transfer material 41. It is connected to an extraction electrode formed on the terminal portion 31. On the display surface side of the observation surface side transparent electrode substrate 3, a retardation film 7 and a polarizing plate 8 are attached.
[0017]
FIG. 2 shows an enlarged part of the inner surface uneven layer 21 formed on the back side transparent electrode substrate 2. As can be seen from this figure, the concave groove 211 of the inner surface uneven layer 21 is formed to be asymmetric with respect to the normal V of the element surface (display surface) of the observation surface side transparent electrode substrate 3.
[0018]
That is, the concave groove 211 includes a slope 212 having a gentle slope and a long slope, and a slope 213 having a short slope and a short slope with respect to a plane parallel to the element surface of the observation surface side transparent electrode substrate 3. As a result, the reflection peak of the inner uneven layer 21 is shifted from the regular reflection angle of the external light on the element surface, so that the liquid crystal display is easy to see. FIG. 2 ideally shows the concave groove 211, and actually includes a considerably deformed slope.
[0019]
The concave groove 211 is formed by applying a photosensitive resin on the back side transparent electrode substrate 2 to a uniform thickness, exposing and developing ultraviolet rays through a photomask, and baking at a predetermined temperature. By using the photomask 100 shown in FIG. 3 as an example, the groove 211 can be asymmetrical.
[0020]
The photomask 100 may be formed by forming a mask 102 made of, for example, a chromium film having a large number of light transmitting holes on the back surface side of the glass substrate 101, and a prism 103 is attached to the upper surface thereof in close contact. ing. The size of the prism 103 may be either a screen size or a pixel size.
[0021]
According to the photomask 100, as shown in an enlarged view in FIG. 4, light (ultraviolet rays) irradiated along a mask normal from an exposure machine (not shown) is redirected by the prism 103, and is oblique to the photosensitive resin. Incident from the direction. Accordingly, the amount of exposure increases on one side of the groove 211 and the amount of exposure decreases on the opposite side, so that an asymmetric groove 211 is formed.
[0022]
Here, when the inclination angle of the inclined surface 212 of the concave groove 211 with a gentle slope and a long slope with respect to the reference surface is α and the inclination angle of light with respect to the normal of the mask is β, the inclination angle α depends on the inclination angle β. To do. The inclination angle β is preferably 80 ° or less (particularly 45 ° or less).
[0023]
According to experiments, when the inclination angle β is 45 °, an inclination angle α of about 5 ° is obtained. When the reflection measurement of this experimental sample was performed, as shown in FIG. 5, the reflection intensity of the inner uneven layer 21 was shifted by 2α from the regular reflection angle θ, where θ is the regular reflection angle of external light on the element surface. A peak was observed.
[0024]
Thus, even if the peak of the reflection intensity by the inner surface uneven layer 21 is set at a position deviated from the regular reflection angle of the external light on the element surface, depending on the angle at which the person views the display, the upper end side of the display surface Since the angle formed between the normal line of the display surface and the line of sight may be different between the lower end side and the lower end side, the reflection intensity is different within the display surface, and the display brightness may not be uniform.
[0025]
In order to cope with this, as another embodiment of the present invention, as shown in FIG. 6, a photomask 100 having a prism 104 whose light inclination angle β with respect to the normal line of the mask gradually changes may be used. The prism angle is preferably changed in a curved shape, but may be changed in a step shape depending on circumstances.
[0026]
In this alternative embodiment, the maximum inclination angle γ located at the left end of the prism 104 in FIG. 6 is 65 ° with respect to the mask surface, and the light inclination angle β with respect to the mask normal near the maximum inclination angle γ. Is 45 °.
[0027]
Then, the inclination angle γ of the prism 104 continuously decreases toward the right side in FIG. 6, and finally the inclination angle γ at the right end is 0 ° and the light inclination angle β is also 0 °. In this way, by gradually changing the light inclination angle β, the shape of the groove 211 is smoothly changed from the asymmetric shape of the left portion B to the symmetrical shape of the right portion A as shown in an enlarged manner in FIG. Will change.
[0028]
【Example】
A glass prism having an incident angle gradually changing from 0 to 45 ° depending on the size of the screen was attached to the upper surface of the photomask for forming the inner surface uneven layer. Then, this photomask is set in a Hitachi DECO collective exposure machine LE-4050, and a substrate coated with a positive photosensitive resin PC-403 made by Nippon Synthetic Rubber Co., Ltd. in a thickness of 2.5 μm is exposed, developed and baked. Thus, an inner surface uneven layer was formed. The length from the upper end to the lower end of the screen was 5 cm.
[0029]
After an aluminum reflective film was formed on the concavo-convex surface by sputtering, the reflection characteristics were measured at a total of three locations: the upper end, the center, and the lower end of the substrate. The reflection characteristics were measured by making light incident at −30 ° and setting the detector angle in increments of 2.5 ° from 55 ° to −20 °. As a result, the detector angle at which the peak of reflection changes from the upper end to the center and the lower end changes to about 30 °, 25 °, and 20 °, and visual uniform brightness is obtained. It could be confirmed.
[0030]
【The invention's effect】
As described above, according to the present invention, the groove shape of the inner concavo-convex layer that is the light diffusion layer is asymmetric with respect to the normal of the display surface, and the angle at which the liquid crystal display looks brightest and the By shifting the regular reflection angle of the external light, the liquid crystal display can be easily seen without performing anti-glare treatment or the like on the element surface.
[0031]
In addition, by changing the incident angle of light by a prism and gradually changing the asymmetrical shape of the groove from the upper end side to the lower end side of the screen, a reflective liquid crystal display element having uniform brightness in the display screen is obtained. can get.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an overall configuration of a reflective liquid crystal display element according to an embodiment of the present invention.
FIG. 2 is a partially enlarged cross-sectional view of an inner surface uneven layer included in the reflective liquid crystal display element.
FIG. 3 is a cross-sectional view schematically showing a photomask for forming the inner concavo-convex layer.
FIG. 4 is an explanatory diagram for explaining a method of forming the inner surface uneven layer.
FIG. 5 is a graph showing reflection characteristics of the embodiment.
FIG. 6 is an explanatory view showing another embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Reflective type liquid crystal display element 2 Back surface side transparent electrode substrate 21 Inner surface uneven | corrugated layer 211 Grooves 212 and 213 Slope 22 Light reflection layer 23 Surface smoothing layer 3 Front surface side transparent electrode substrate 4 Peripheral sealing material 100 Photomask 101 Glass base material 102 Mask 103,104 Prism

Claims (4)

観察面側透明電極基板との間で液晶層を挟持する裏面側透明電極基板の内面に感光性樹脂を塗布し、露光機からの光をフォトマスクを介して上記感光性樹脂に照射し現像することにより、上記裏面側透明電極基板の内面に微細な凹凸面を有する光拡散層を形成するにあたって、
上記フォトマスクに同フォトマスクの法線に対する光傾斜角が漸次変化するプリズムを取り付け、上記露光機からの光を上記フォトマスクの法線に対して所定角度傾けて上記感光性樹脂を露光することを特徴とする反射型液晶表示素子の光拡散層の形成方法。
A photosensitive resin is applied to the inner surface of the back surface side transparent electrode substrate that sandwiches the liquid crystal layer with the observation surface side transparent electrode substrate, and the photosensitive resin is irradiated with light from the exposure device through a photomask and developed. By forming a light diffusion layer having a fine irregular surface on the inner surface of the back side transparent electrode substrate,
A prism whose light inclination angle with respect to the normal of the photomask gradually changes is attached to the photomask, and the photosensitive resin is exposed by inclining light from the exposure machine by a predetermined angle with respect to the normal of the photomask. A method for forming a light diffusion layer of a reflective liquid crystal display element .
上記感光性樹脂に対する光の入射角が、上記法線に対して80゜以下であることを特徴とする請求項に記載の反射型液晶表示素子の光拡散層の形成方法。2. The method of forming a light diffusion layer of a reflective liquid crystal display element according to claim 1 , wherein an incident angle of light with respect to the photosensitive resin is 80 [deg.] Or less with respect to the normal line. 上記プリズムによる光入射角の変換量が連続的に変化していることを特徴とする請求項またはに記載の反射型液晶表示素子の光拡散層の形成方法。The method of forming the light diffusion layer in the reflection type liquid crystal display device according to claim 1 or 2, characterized in that the conversion amount of the light incident angle by the prism is continuously changed. 上記感光性樹脂がポジ型感光性樹脂であることを特徴とする請求項1ないし3のいずれか1項に記載の反射型液晶表示素子の光拡散層の形成方法。4. The method for forming a light diffusing layer of a reflective liquid crystal display element according to claim 1, wherein the photosensitive resin is a positive photosensitive resin.
JP2000332184A 2000-10-31 2000-10-31 Method for forming light diffusion layer of reflective liquid crystal display device Expired - Fee Related JP4636573B2 (en)

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Publication number Priority date Publication date Assignee Title
JPH1010307A (en) * 1996-06-18 1998-01-16 Asahi Glass Co Ltd Production of optical diffraction gating and optical head device formed by using the same
JPH1114983A (en) * 1997-06-25 1999-01-22 Sharp Corp Liquid crystal display element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1010307A (en) * 1996-06-18 1998-01-16 Asahi Glass Co Ltd Production of optical diffraction gating and optical head device formed by using the same
JPH1114983A (en) * 1997-06-25 1999-01-22 Sharp Corp Liquid crystal display element

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